WO2020025229A1 - Dispositif de chauffage - Google Patents

Dispositif de chauffage Download PDF

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Publication number
WO2020025229A1
WO2020025229A1 PCT/EP2019/067414 EP2019067414W WO2020025229A1 WO 2020025229 A1 WO2020025229 A1 WO 2020025229A1 EP 2019067414 W EP2019067414 W EP 2019067414W WO 2020025229 A1 WO2020025229 A1 WO 2020025229A1
Authority
WO
WIPO (PCT)
Prior art keywords
metal substrate
thin film
heating element
film heating
doped tin
Prior art date
Application number
PCT/EP2019/067414
Other languages
English (en)
Inventor
Onur Cetin
Pinar YAVUZ
Oguzhan KAYA
Alper YESILCUBUK
Original Assignee
Arcelik Anonim Sirketi
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Arcelik Anonim Sirketi filed Critical Arcelik Anonim Sirketi
Priority to EP19737678.3A priority Critical patent/EP3831166A1/fr
Publication of WO2020025229A1 publication Critical patent/WO2020025229A1/fr

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00—Ohmic-resistance heating
    • H05B3/10—Heating elements characterised by the composition or nature of the materials or by the arrangement of the conductor
    • H05B3/16—Heating elements characterised by the composition or nature of the materials or by the arrangement of the conductor the conductor being mounted on an insulating base
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00—Ohmic-resistance heating
    • H05B3/20—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater
    • H05B3/22—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater non-flexible
    • H05B3/26—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater non-flexible heating conductor mounted on insulating base
    • H05B3/262—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater non-flexible heating conductor mounted on insulating base the insulating base being an insulated metal plate
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B2203/00—Aspects relating to Ohmic resistive heating covered by group H05B3/00
    • H05B2203/013—Heaters using resistive films or coatings
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B2203/00—Aspects relating to Ohmic resistive heating covered by group H05B3/00
    • H05B2203/017—Manufacturing methods or apparatus for heaters

Definitions

  • the present invention relates to a thin film heating element comprising fluorine doped tin oxide, to the production method of the same and the use of the same as heating element.
  • Thin films which are more frequently the subject of research and development studies in the recent years, constitute the basis of electronic device technology.
  • the performance of the thin films used in a wide range of fields is a very critical parameter and is directly related to the production methods.
  • the thin film production methods are divided into three main groups: i) vapor phase deposition, ii) liquid phase deposition, and iii) solid phase deposition. Most used methods among the above-mentioned methods are chemical vapor deposition (CVD) and sol-gel method.
  • FTO fluorine doped tin oxide
  • polymer based materials are used in applications such solar cells. Since glass and polymer based materials have a lower coefficient of thermal conduction than metals, use of said materials in the applications of heating elements causes the base material to heat up late and the relevant product with said materials to lose energy. In particular, the base material being produced from glass limits the complex formability.
  • a planar heat emission device and the production method thereof are disclosed.
  • Said heat emission device comprises a ceramic substrate; a ceramic thin-film heat emission body formed on the ceramic substrate; a metal electrode which is formed on said body; and an electricity insulating protection film also arranged on the body.
  • the aim of the present invention is the realization of a heating apparatus/device/machine comprising a resistance having a thin film heating element wherein the FTO coating is coated onto metal surfaces with high coefficient of heat conduction such as aluminum, etc. and thus the coating is enabled to heat up and heat the base material under the applied voltage.
  • the thin film heating element realized in order to attain the aim of the present invention, explicated in the first claim and the respective claims thereof comprises a metal substrate (base material), a metal oxide and a fluorine doped tin oxide coating.
  • Said thin film heating element is used in heating apparatuses/devices/machines such as laundry dryer, hair dryer, cooker, oven, curling iron, hair straightener, etc.
  • the thin film heating element of the present invention comprises a fluorine doped tin oxide (FTO) coating material and at least one busbar.
  • FTO fluorine doped tin oxide
  • the tin oxide which is a semiconducting material, gains conductivity and electrical properties with the addition of fluorine.
  • the solution conductivity can be adjusted depending on the amount of the added fluorine.
  • the chemical and physical resistances of the FTO are high when it has oxide properties.
  • the thin film heating element of the present invention comprises a metal substrate and a metal oxide layer on said substrate.
  • the metal substrate Since the metal substrate has a high thermal conductivity, it can be used as resistance in heater applications, providing high electrical resistance.
  • the FTO has chemically oxide properties, the FTO and the metal substrate firmly hold on to each other. By means of the open bonds on the metal oxide layer surface, the tin oxide in the FTO coating material holds on to said bonds.
  • the chemical resistance of the final coating is very high and the coating cannot be dissolved with solvents such as alcohol, etc.
  • the metal oxide layer on the metal substrate provides the material with non-conductivity and chemical resistance before coating.
  • the thin film heating element comprises
  • the metal substrate is aluminum
  • Aluminum is a metal with high coefficient of thermal conduction.
  • the use of aluminum substrate provides that the thin film heating element, when used as a heater, heats up under voltage and quickly heats the base material.
  • the use of aluminum, which is a malleable material, as the substrate (base material) allows the production of complex products.
  • the metal oxide layer is anodized aluminum (aluminum oxide).
  • the aluminum oxide layer provides the metal substrate with non-conductivity and chemical resistance before coating.
  • the tin oxide in the FTO coating material holds on to the open bonds on the aluminum oxide layer surface, thus providing a very high chemical resistance for the final coating.
  • the tin film heating element comprises two busbars on the fluorine doped tin oxide coating material.
  • Said busbars supply current/voltage to the coating.
  • two busbar lines are used. While one busbar is charged positively, the other busbar is charged negatively, and thus current passes through the coating, heating the surface.
  • the thin film heating element comprises silver busbar.
  • the production method for the thin film heating element comprises the steps of
  • the metal (aluminum) must be mechanically polished and prepared for the subsequent anodizing process.
  • the mechanical polishing consists of removing oils which may occur on the surface, cleaning the natural oxide layer which occurs on the aluminum surface with chemicals, thus becoming surface active.
  • the aluminum substrate is anodized.
  • the anodizing is an electrochemical process and is carried out by applying voltage in a bath. This process is quicker and more economic than other coating processes and is more suitable for mass production.
  • aluminum is used as the metal substrate, aluminum oxide is used as the metal oxide layer, and silver busbar is used.
  • the metal substrate surface is coated with the fluorine doped tin oxide coating material by means of the spray pyrolysis process.
  • the spray pyrolysis process is applied to the sample on a heated surface, the process ends after the spraying operation and does not contain any extra thermal treatment step.
  • the metal substrate is heated up to 400-450 °C in order to coat the metal substrate surface with the fluorine doped tin oxide material by means of the spray pyrolysis process.
  • the optimum temperature is 400-450 °C for efficiently coating the FTO onto the metal substrate surface by means of the spray pyrolysis process. This is the temperature range required for the formation of the fluorine doped tin oxide molecule structure.
  • the metal substrate surface is coated with the fluorine doped tin oxide solution at room temperature and then cured.
  • the desired coating resistance can be obtained in the application.
  • the conductivity of the applied FTO layer is obtained by adding fluorine into the oxide coating which has a semiconducting matrix.
  • the resistance which is a function of the conductivity, is determined by the content and thickness of the coating. It is possible to control the thickness of said coating which is coated by means of the spray pyrolysis process.
  • the resistance values can be adjusted by changing the amount of fluorine doped tin oxide in a certain area. In short, since the amount of fluorine doped tin oxide in the relevant area increases if the thickness of the coating is increased, the resistance value decreases and the current is enabled to flow more easily. Moreover, if a thin coating is provided, a coating with high resistance can be obtained.
  • the fluorine doped tin oxide solution which is used for coating the metal substrate surface with the fluorine doped tin oxide, comprises tin chloride, water, ammonium fluoride and solvent.
  • the solvent in the fluorine doped tin oxide solution which is used for coating the metal substrate surface with the fluorine doped tin oxide, is alcohol based.
  • the busbars are applied onto the FTO coating by means of brushing, chemical vapor deposition (CVD), physical vapor deposition (PVD) or methods under vacuum.
  • CVD chemical vapor deposition
  • PVD physical vapor deposition
  • a heater which contains the thin film heating element is used in a heating apparatus/device/machine.
  • a heater which contains the thin film heating element is used in a laundry dryer.
  • a heater which contains the thin film heating element is used in a hair dryer.
  • a heater which contains the thin film heating element is used in a curling iron.
  • a heater which contains the thin film heating element is used in a hair straightener.
  • a heater which contains the thin film heating element is used in a cooker.
  • a heater which contains the thin film heating element is used in an oven.
  • a heater which contains the thin film heating element is used in a tea machine.
  • a heater which contains the thin film heating element is used in a coffee machine.
  • a heater which contains the thin film heating element is used in a kettle.

Landscapes

  • Resistance Heating (AREA)

Abstract

La présente invention concerne un dispositif de chauffage utilisé dans des appareils/dispositifs/machines de chauffage et son procédé de production.
PCT/EP2019/067414 2018-08-01 2019-06-28 Dispositif de chauffage WO2020025229A1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
EP19737678.3A EP3831166A1 (fr) 2018-08-01 2019-06-28 Dispositif de chauffage

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
TR201811115 2018-08-01
TR2018/11115 2018-08-01

Publications (1)

Publication Number Publication Date
WO2020025229A1 true WO2020025229A1 (fr) 2020-02-06

Family

ID=67226222

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2019/067414 WO2020025229A1 (fr) 2018-08-01 2019-06-28 Dispositif de chauffage

Country Status (2)

Country Link
EP (1) EP3831166A1 (fr)
WO (1) WO2020025229A1 (fr)

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6037572A (en) * 1997-02-26 2000-03-14 White Consolidated Industries, Inc. Thin film heating assemblies
JP2005019293A (ja) * 2003-06-27 2005-01-20 Asahi Denshi Kogyo Kk ヒータ付ガラス
KR20140120400A (ko) 2013-04-02 2014-10-14 한국세라믹기술원 세라믹박막 발열체를 이용한 면상 발열장치 및 그 제조방법
WO2018028999A1 (fr) * 2016-08-08 2018-02-15 Arcelik Anonim Sirketi Réglage d'élément de chauffage de cuisinière de chauffage à pellicule mince pour le rendement de puissance
CN107858733A (zh) * 2017-11-07 2018-03-30 广东永利坚铝业有限公司 一种铝型材氧化着色方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6037572A (en) * 1997-02-26 2000-03-14 White Consolidated Industries, Inc. Thin film heating assemblies
JP2005019293A (ja) * 2003-06-27 2005-01-20 Asahi Denshi Kogyo Kk ヒータ付ガラス
KR20140120400A (ko) 2013-04-02 2014-10-14 한국세라믹기술원 세라믹박막 발열체를 이용한 면상 발열장치 및 그 제조방법
WO2018028999A1 (fr) * 2016-08-08 2018-02-15 Arcelik Anonim Sirketi Réglage d'élément de chauffage de cuisinière de chauffage à pellicule mince pour le rendement de puissance
CN107858733A (zh) * 2017-11-07 2018-03-30 广东永利坚铝业有限公司 一种铝型材氧化着色方法

Also Published As

Publication number Publication date
EP3831166A1 (fr) 2021-06-09

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