WO2020015021A1 - 一种太阳能电池背面电极的制备方法与应用 - Google Patents
一种太阳能电池背面电极的制备方法与应用 Download PDFInfo
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- WO2020015021A1 WO2020015021A1 PCT/CN2018/098232 CN2018098232W WO2020015021A1 WO 2020015021 A1 WO2020015021 A1 WO 2020015021A1 CN 2018098232 W CN2018098232 W CN 2018098232W WO 2020015021 A1 WO2020015021 A1 WO 2020015021A1
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- 238000002360 preparation method Methods 0.000 title abstract description 24
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims abstract description 82
- 239000000843 powder Substances 0.000 claims abstract description 81
- 230000004888 barrier function Effects 0.000 claims abstract description 55
- 229910052709 silver Inorganic materials 0.000 claims abstract description 53
- 239000004332 silver Substances 0.000 claims abstract description 53
- 239000011230 binding agent Substances 0.000 claims abstract description 45
- 239000011521 glass Substances 0.000 claims abstract description 35
- 229910052751 metal Inorganic materials 0.000 claims abstract description 24
- 239000002184 metal Substances 0.000 claims abstract description 24
- 238000000034 method Methods 0.000 claims abstract description 23
- 150000004767 nitrides Chemical class 0.000 claims abstract description 14
- 239000002245 particle Substances 0.000 claims description 39
- 229910052782 aluminium Inorganic materials 0.000 claims description 33
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 28
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims description 20
- -1 B 2 O 3 Inorganic materials 0.000 claims description 20
- 238000002161 passivation Methods 0.000 claims description 20
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 19
- 239000012752 auxiliary agent Substances 0.000 claims description 18
- 238000002844 melting Methods 0.000 claims description 18
- 230000008018 melting Effects 0.000 claims description 18
- 239000003960 organic solvent Substances 0.000 claims description 16
- 239000011347 resin Substances 0.000 claims description 16
- 229920005989 resin Polymers 0.000 claims description 16
- 229910004205 SiNX Inorganic materials 0.000 claims description 11
- 229910052710 silicon Inorganic materials 0.000 claims description 11
- 239000010703 silicon Substances 0.000 claims description 11
- 229910015902 Bi 2 O 3 Inorganic materials 0.000 claims description 10
- UMVBXBACMIOFDO-UHFFFAOYSA-N [N].[Si] Chemical compound [N].[Si] UMVBXBACMIOFDO-UHFFFAOYSA-N 0.000 claims description 10
- 101001073212 Arabidopsis thaliana Peroxidase 33 Proteins 0.000 claims description 9
- 101001123325 Homo sapiens Peroxisome proliferator-activated receptor gamma coactivator 1-beta Proteins 0.000 claims description 9
- 102100028961 Peroxisome proliferator-activated receptor gamma coactivator 1-beta Human genes 0.000 claims description 9
- 238000007639 printing Methods 0.000 claims description 7
- 229910015621 MoO Inorganic materials 0.000 claims description 5
- 229910006404 SnO 2 Inorganic materials 0.000 claims description 5
- 229910010413 TiO 2 Inorganic materials 0.000 claims description 5
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 5
- GEIAQOFPUVMAGM-UHFFFAOYSA-N ZrO Inorganic materials [Zr]=O GEIAQOFPUVMAGM-UHFFFAOYSA-N 0.000 claims description 5
- 238000009792 diffusion process Methods 0.000 claims description 4
- 239000006259 organic additive Substances 0.000 claims description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims 1
- 229910052681 coesite Inorganic materials 0.000 claims 1
- 229910052593 corundum Inorganic materials 0.000 claims 1
- 229910052906 cristobalite Inorganic materials 0.000 claims 1
- 239000000377 silicon dioxide Substances 0.000 claims 1
- 235000012239 silicon dioxide Nutrition 0.000 claims 1
- 229910052682 stishovite Inorganic materials 0.000 claims 1
- 229910052905 tridymite Inorganic materials 0.000 claims 1
- 229910001845 yogo sapphire Inorganic materials 0.000 claims 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 abstract description 10
- 229910052757 nitrogen Inorganic materials 0.000 abstract description 5
- 150000003377 silicon compounds Chemical class 0.000 abstract 1
- 239000002002 slurry Substances 0.000 description 14
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 10
- 238000001035 drying Methods 0.000 description 9
- 238000005457 optimization Methods 0.000 description 8
- 238000005245 sintering Methods 0.000 description 8
- 238000005516 engineering process Methods 0.000 description 6
- 238000010438 heat treatment Methods 0.000 description 6
- 239000000203 mixture Substances 0.000 description 6
- 238000003756 stirring Methods 0.000 description 6
- 238000003466 welding Methods 0.000 description 5
- 230000002457 bidirectional effect Effects 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 229910044991 metal oxide Inorganic materials 0.000 description 4
- 150000004706 metal oxides Chemical class 0.000 description 4
- 238000012360 testing method Methods 0.000 description 4
- 235000012431 wafers Nutrition 0.000 description 4
- 229910000838 Al alloy Inorganic materials 0.000 description 3
- 238000003723 Smelting Methods 0.000 description 3
- 230000032683 aging Effects 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 239000002270 dispersing agent Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000002003 electrode paste Substances 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- 239000002994 raw material Substances 0.000 description 3
- 238000005215 recombination Methods 0.000 description 3
- 230000006798 recombination Effects 0.000 description 3
- 238000005476 soldering Methods 0.000 description 3
- 239000013008 thixotropic agent Substances 0.000 description 3
- 238000005303 weighing Methods 0.000 description 3
- 241000167857 Bourreria Species 0.000 description 2
- XNRNVYYTHRPBDD-UHFFFAOYSA-N [Si][Ag] Chemical compound [Si][Ag] XNRNVYYTHRPBDD-UHFFFAOYSA-N 0.000 description 2
- 238000000498 ball milling Methods 0.000 description 2
- 229910021419 crystalline silicon Inorganic materials 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 230000007613 environmental effect Effects 0.000 description 2
- 238000011056 performance test Methods 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 238000007873 sieving Methods 0.000 description 2
- 229910000679 solder Inorganic materials 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000000635 electron micrograph Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000009766 low-temperature sintering Methods 0.000 description 1
- 230000005622 photoelectricity Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 238000001878 scanning electron micrograph Methods 0.000 description 1
- 238000012216 screening Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910021332 silicide Inorganic materials 0.000 description 1
- FVBUAEGBCNSCDD-UHFFFAOYSA-N silicide(4-) Chemical compound [Si-4] FVBUAEGBCNSCDD-UHFFFAOYSA-N 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 238000009736 wetting Methods 0.000 description 1
Images
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0224—Electrodes
- H01L31/022408—Electrodes for devices characterised by at least one potential jump barrier or surface barrier
- H01L31/022425—Electrodes for devices characterised by at least one potential jump barrier or surface barrier for solar cells
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0224—Electrodes
- H01L31/022408—Electrodes for devices characterised by at least one potential jump barrier or surface barrier
- H01L31/022425—Electrodes for devices characterised by at least one potential jump barrier or surface barrier for solar cells
- H01L31/022441—Electrode arrangements specially adapted for back-contact solar cells
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
- C09D5/24—Electrically-conducting paints
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/20—Diluents or solvents
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
- C09D7/60—Additives non-macromolecular
- C09D7/61—Additives non-macromolecular inorganic
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
- C09D7/60—Additives non-macromolecular
- C09D7/63—Additives non-macromolecular organic
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
- C09D7/70—Additives characterised by shape, e.g. fibres, flakes or microspheres
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0224—Electrodes
- H01L31/022408—Electrodes for devices characterised by at least one potential jump barrier or surface barrier
- H01L31/022425—Electrodes for devices characterised by at least one potential jump barrier or surface barrier for solar cells
- H01L31/022433—Particular geometry of the grid contacts
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
Definitions
- the invention belongs to the technical field of solar cells, and particularly relates to a method for preparing and applying a back electrode of a solar cell.
- the main function of the silver paste on the back of the solar cell is to provide soldering points for the back of the solar cell, so it has higher requirements on its solderability, solder resistance, adhesion, efficiency improvement and cost reduction.
- a good silver backing paste should have the following advantages: low activity, reducing the reaction between glass frit and passivation film, avoiding the formation of a large number of recombination centers between the silver paste and the silicon wafer or aluminum paste, and increasing the open circuit voltage of the battery. Process window, suitable for low temperature sintering process, excellent adhesion and aging tension. Good printing performance and low silver content.
- the main function of the back silver paste is purely a bus and solder joint, and it does not bear contact with silicon.
- Printing the back silver paste directly on the aluminum paste may cause two problems. First, the contact between the silver and aluminum will affect the welding performance of the back electrode. Second, the edge of the back electrode needs to be covered by the aluminum back field, which increases the back electrode. The width increases the cost of the back electrode paste.
- the present invention provides a method for preparing a back electrode of a solar cell and its application.
- a method for preparing a back electrode of a solar cell A conductive resistance barrier paste is printed or sprayed on the back aluminum paste, and the barrier paste is printed directly on the back aluminum electrode. After drying, printing and matching are performed thereon. The back silver paste used is dried and sintered to form a back electrode.
- the barrier layer slurry includes the following according to parts by weight: metal nitride powder, nitrogen silicon compound powder, oxide powder or low melting point metal powder in total 20 to 80 parts, and lead-free glass powder 0.5 ⁇ 5 parts, organic binder 10 ⁇ 40 parts, organic assistant 0.1 ⁇ 1 part.
- the back silver paste used in combination includes the following according to parts by weight: 5-60 parts of hollow spherical silver powder with special requirements of purity greater than 99.99%, 5-30 parts of flake silver powder, and 0.5-5 of lead-free glass powder 10-50 parts of organic binder, 0.1-1 part of organic auxiliary; wherein the particle diameter D50 of the hollow spherical silver powder is 5-20 ⁇ m, and the particle diameter D50 of the flake silver powder is 2-30 ⁇ m.
- the metal nitride powder includes one or more of ZrN, TiN, TaN, MoN, and CaN, and the particle diameter D50 is 0.1 to 10 ⁇ m;
- the nitrogen-silicon compound powder includes one or more of SiNx, BNx, and VNx with a particle diameter D50 of 0.3 to 15 ⁇ m;
- the oxide powder includes one or more of Al 2 O 3 , SiO 2 , TiO 2 , ZrO, SnO 2 , MoO 2 , CaO, and NiO, and the particle diameter D50 is 0.3 to 15 ⁇ m.
- the lead-free glass powder includes the following in parts by weight: Bi 2 O 3 , B 2 O 3 , ZnO, TeO 2 , SiO 2 , MnO 2 , CaO, Al 2 O 3 , CuO, SrO, BaO It is made by melting several kinds, the particle diameter D50 is controlled within 0.7 ⁇ 5 ⁇ m, and the softening point is adjustable within the range of 500 ⁇ 700 °C.
- the organic binder includes the following according to parts by weight: 1 to 30 parts of organic resin, 50 to 90 parts of organic solvent, and 0.5 to 10 parts of organic auxiliary agent.
- the lead-free glass powder is made of Bi 2 O 3 , B 2 O 3 , SiO 2 , Na 2 O, MnO 2 , CaO, Al 2 O 3 , CuO, ZnO, SrO, BaO, TeO 2 It is made by melting several kinds, the particle diameter D50 is controlled in 0.3 ⁇ 3 ⁇ m, and the softening point is adjustable in the range of 400 ⁇ 600 °C.
- the organic binder includes the following in terms of parts by weight: 0.5 to 20 parts of organic resin, 40 to 90 parts of organic solvent, and 0.5 to 10 parts of organic auxiliary agent.
- the barrier layer paste can be directly sprayed or printed on the aluminum paste, and the width of the back electrode and the printed pattern can be adjusted freely, the thickness is about 1 to 5 ⁇ m; the barrier layer has a bidirectional barrier function, which can Preventing the mutual diffusion of aluminum and silver can also prevent the mutual diffusion of silver and silicon.
- An application of the preparation method of the barrier layer, the preparation method of the back electrode of the solar cell can be, but is not limited to, applied to the back electrode of a PERC cell, and is also applicable to a battery sheet with a high degree of back passivation in an all-aluminum field or on the back. It can be applied to the more sensitive, thin, and easily damaged passivation layer. It is tried on mainstream passivation layers such as SiNx, Al 2 O 3 , SiO 2 .
- the width of the back electrode and the printed pattern can be adjusted at will, thereby reducing the cost of the back electrode paste.
- the printed graphics of the back silver paste may be hollow, bar-shaped, or dot-shaped, and the shielding ratio is 25-50%.
- the present invention realizes the barrier between silver aluminum and silver silicon by two or more printings.
- the method for preparing the back electrode is suitable for solar cells with strong back passivation or back passivation.
- the application of the barrier layer can reduce the formation of silver-aluminum alloy, thereby improving the solderability and soldering resistance of the paste, and improving the welding tension of the back electrode.
- silver powders of different particle sizes and shapes are selected to be used in cooperation with each other to increase the bulk density of the conductive film, increase the contact area between the silver particles, reduce the shrinkage force of the conductive film, and improve the conductive ability of the slurry.
- the back silver paste and barrier layer paste of the present invention use lead-free glass powder, avoiding the use of lead-containing glass powder, and more in line with environmental protection requirements. At the same time, adjust the glass powder to an appropriate activity, so that the glass powder and the silver powder have suitable properties.
- the wettability of the slurry enables the slurry to have a suitable sintering temperature, thereby improving the performance of the slurry as a whole.
- the preparation method of the back electrode of the present invention ensures that it has considerable welding tension and aging tension, and at the same time avoids serious leakage problems caused by metal defects caused by direct contact between silver and silicon wafers or aluminum paste, thereby improving the photoelectricity of crystalline silicon cells. Conversion efficiency.
- FIG. 1 is a schematic diagram of the flake silver powder of the present invention
- FIG. 2 is a schematic view of a micron-sized hollow spherical silver powder according to the present invention.
- FIG. 3 is a schematic diagram of a micron-sized spherical nitrogen silicide powder according to the present invention.
- FIG. 5 is a schematic diagram of a battery structure according to the present invention; 1, PERC back-field aluminum paste, 22, anti-reflection film passivation layer (SiNx / Al 2 O 3, etc.), 4, P-type silicon semiconductor substrate, 5, N-type Impurity layer, 6, anti-reflection film passivation layer, 7, grid-type positive electrode, 8, barrier layer, 9, back silver.
- a method for preparing a back electrode of a solar cell A conductive resistance barrier paste is printed or sprayed on the back aluminum paste. The barrier paste is directly printed on the back aluminum electrode. After drying, a matching back sheet is printed on the back electrode. The silver paste is dried and sintered to form a back electrode.
- the barrier layer paste according to parts by weight includes the following: metal nitride powder, nitrogen silicon compound powder, metal oxide powder or low melting point metal powder total 67 parts, lead-free glass powder 3 parts, organic viscosity
- the binding agent is 29.8 parts, and the organic auxiliary agent is 0.2 parts.
- the back silver paste used in combination includes the following according to parts by weight: 42 parts of hollow spherical silver powder with special requirements of purity greater than 99.99%, 15 parts of flake silver powder, 2.5 parts of lead-free glass powder, and 40.1 parts of organic binder. Organic auxiliary 0.4 parts; wherein, the particle diameter D50 of the hollow spherical silver powder is 1 ⁇ m, and the particle diameter D50 of the flaky silver powder is 6 ⁇ m.
- the metal nitride powder includes one or more of ZrN, TiN, TaN, MoN, and CaN, and the particle diameter D50 is 0.1 ⁇ m.
- the nitrogen-silicon compound powder includes one or more of SiNx, BNx, and VNx, and the particle diameter D50 is 0.3 ⁇ m.
- the oxide powder includes one or more of Al 2 O 3 , SiO 2 , TiO 2 , ZrO, SnO 2 , MoO 2 , CaO, and NiO, and the particle diameter D50 is 0.3 ⁇ m.
- the lead-free glass powder includes the following parts by weight: Bi 2 O 3 , B 2 O 3 , ZnO, TeO 2 , SiO 2 , MnO 2 , CaO, Al 2 O 3 , CuO, SrO, and BaO. It is made by melting, the particle diameter D50 is controlled at 0.7 ⁇ m, and the softening point is adjustable within the range of 500 ° C.
- the organic binder includes the following in parts by weight: 17 parts of organic resin, 80 parts of organic solvent, and 3 parts of organic auxiliary agent.
- the lead-free glass powder is made of Bi 2 O 3 , B 2 O 3 , SiO 2 , Na 2 O, MnO 2 , CaO, Al 2 O 3 , CuO, ZnO, SrO, BaO, TeO 2 Made by melting, the particle size D50 is controlled at 0.3 ⁇ m, and the softening point is adjustable within the range of 400 ° C.
- the organic binder includes the following according to parts by weight: 21 parts of organic resin, 75 parts of organic solvent, and 4 parts of organic auxiliary agent.
- the barrier layer paste can be directly sprayed or printed on the aluminum paste, and the width of the back electrode and the printed pattern can be adjusted freely, the thickness is about 4.5 ⁇ m; the barrier layer has a bidirectional barrier function, which can prevent aluminum and silver Interdiffusion can also prevent the interdiffusion of silver and silicon.
- An application of the preparation method of the barrier layer, the preparation method of the back electrode of the solar cell can be, but is not limited to, applied to the back electrode of a PERC cell, and is also applicable to a battery sheet with a high degree of back passivation in an all-aluminum field or on the back. It can be applied to the more sensitive, thin, and easily damaged passivation layer. It is tried on mainstream passivation layers such as SiNx, Al 2 O 3 , SiO 2 .
- barrier layer paste The specific operations of the barrier layer paste and the back silver paste used are as follows:
- organic resin and organic auxiliary agent are respectively soaked with an organic solvent, the organic resin is soaked under heating and stirring, the temperature is about 90 ° C, and the time is 1 hour, and the thixotropic agent is soaked under heating and stirring , The temperature is about 40 ° C, and the time is 1 hour; then, it is mixed with other organic auxiliaries and organic solvents in a certain ratio to obtain a transparent and uniform organic binder.
- inorganic binder After weighing various raw materials in mass percentage, dry mix them in a V-type mixer, and after mixing, dry them in a constant temperature drying box at about 200 ° C for 2 hours; Sintering and smelting in a 900 ° C muffle furnace for 1 hour. High-temperature nitrogen vacuum protection and sintering technology is used during melting. The use of this technology can overcome the technical problems of preparing low-melting-point and valence-stable glass powder. It is then ball milled and dried. After screening, it is the inorganic binder for back silver paste.
- the preparation method of the back silver paste silver powder, organic binder, inorganic binder, and organic auxiliary agent are dispersed and mixed in a certain ratio, and then milled 6 times using a three-roll mill to make it uniformly dispersed. , To a fineness of ⁇ 15 ⁇ m, that is, the prepared back silver paste for use in combination.
- the preparation method of the barrier layer slurry disperse and mix the metal nitride and oxide powder, organic binder, inorganic binder, and organic auxiliary agent dispersed in advance in a certain proportion, and then use three The roller mill grinds 6 times to make it dispersed uniformly to a fineness of ⁇ 15 ⁇ m, which is the prepared barrier layer slurry.
- a method for preparing a back electrode of a solar cell A conductive resistance barrier paste is printed or sprayed on the back aluminum paste. The barrier paste is directly printed on the back aluminum electrode. After drying, a matching back sheet is printed on the back electrode. The silver paste is dried and sintered to form a back electrode.
- the barrier layer paste according to parts by weight includes the following: metal nitride powder, nitrogen silicon compound powder, oxide powder or low melting point metal powder in total 60 parts, lead-free glass powder 5 parts, organic bonding 34 parts of agent, 1 part of organic assistant.
- the back silver paste used in combination includes the following by weight parts: 40 parts of hollow spherical silver powder with special requirements of purity greater than 99.99%, 20 parts of flake silver powder, 4 parts of lead-free glass powder, 35 parts of organic binder, 1 part of an organic auxiliary; wherein the particle diameter D50 of the hollow spherical silver powder is 3 ⁇ m, and the particle diameter D50 of the flaky silver powder is 5 ⁇ m.
- the metal nitride powder includes one or more of ZrN, TiN, TaN, MoN, and CaN, and the particle diameter D50 is 0.5 ⁇ m.
- the nitrogen-silicon compound powder includes one or more of SiNx, BNx, and VNx, and the particle diameter D50 is 0.7 ⁇ m.
- the metal oxide powder includes one or more of Al 2 O 3 , SiO 2 , TiO 2 , ZrO, SnO 2 , MoO 2 , CaO, and NiO, and the particle diameter D50 is 0.6 ⁇ m.
- the lead-free glass powder includes the following parts by weight: Bi 2 O 3 , B 2 O 3 , ZnO, TeO 2 , SiO 2 , MnO 2 , CaO, Al 2 O 3 , CuO, SrO, and BaO. It is made by melting, the particle size D50 is controlled at 1 ⁇ m, and the softening point is adjustable within the range of 700 ° C.
- the organic binder includes the following according to parts by weight: 20 parts of an organic resin, 70 parts of an organic solvent, and 10 parts of an organic auxiliary agent.
- the lead-free glass powder is made of Bi 2 O 3 , B 2 O 3 , SiO 2 , Na 2 O, MnO 2 , CaO, Al 2 O 3 , CuO, ZnO, SrO, BaO, TeO 2 It is made by melting, the particle diameter D50 is controlled at 3 ⁇ m, and the softening point is adjustable within the range of 600 ° C.
- the organic binder includes the following in terms of parts by weight: 15 parts of organic resin, 75 parts of organic solvent, and 10 parts of organic auxiliary agent.
- the barrier layer paste can be directly sprayed or printed on the aluminum paste, and the width of the back electrode and the printed pattern can be adjusted freely, the thickness is about 5 ⁇ m; the barrier layer has a bidirectional barrier function, which can prevent aluminum and silver Interdiffusion can also prevent the interdiffusion of silver and silicon.
- An application of the preparation method of the barrier layer, the preparation method of the back electrode of the solar cell can be, but is not limited to, applied to the back electrode of a PERC cell, and is also applicable to a battery sheet with a high degree of back passivation in an all-aluminum field or on the back. It can be applied to the more sensitive, thin, and easily damaged passivation layer. It is tried on mainstream passivation layers such as SiNx, Al 2 O 3 , SiO 2 .
- barrier layer paste The specific operations of the barrier layer paste and the back silver paste used are as follows:
- organic resin and organic auxiliaries are respectively soaked with an organic solvent, the organic resin is soaked under heating and stirring, the temperature is about 90 ° C, and the time is 3 hours, and the thixotropic agent is soaked under heating and stirring , The temperature is about 40 ° C, and the time is 2 hours; then, it is mixed with other organic auxiliaries and organic solvents in a certain ratio to obtain a transparent and uniform organic binder.
- the preparation method of the back silver paste silver powder, organic binder, inorganic binder, and organic auxiliary agent are dispersed and mixed in a certain proportion, and then milled 8 times using a three-roll mill to make it uniformly dispersed. , To a fineness of ⁇ 15 ⁇ m, that is, the prepared back silver paste for use in combination.
- the preparation method of the barrier layer slurry disperse and mix the metal nitride and oxide powder, organic binder, inorganic binder, and organic auxiliary agent dispersed in advance in a certain proportion, and then use three The roller mill grinds 8 times to make it uniformly dispersed to a fineness of ⁇ 15 ⁇ m, which is the prepared barrier layer slurry.
- a method for preparing a back electrode of a solar cell A conductive resistance barrier paste is printed or sprayed on the back aluminum paste. The barrier paste is directly printed on the back aluminum electrode. After drying, a matching back sheet is printed on the back electrode. The silver paste is dried and sintered to form a back electrode.
- the barrier layer paste according to parts by weight includes the following: metal nitride powder, nitrogen silicon compound powder, metal oxide powder or low melting point metal powder in total 58 parts, lead-free glass powder 3.5 parts, organic viscosity 37.8 parts of binding agent, 0.7 parts of organic additives.
- the back silver paste used in combination includes the following by weight parts: 45 parts of hollow spherical silver powder with special requirements of purity greater than 99.99%, 18 parts of flake silver powder, 3 parts of lead-free glass powder, and 33.4 parts of organic binder.
- the metal nitride powder includes one or more of ZrN, TiN, TaN, MoN, and CaN, and the particle diameter D50 is 0.6 ⁇ m.
- the nitrogen-silicon compound powder includes one or more of SiNx, BNx, and VNx, and the particle diameter D50 is 0.2 ⁇ m.
- the metal oxide powder includes one or more of Al 2 O 3 , SiO 2 , TiO 2 , ZrO, SnO 2 , MoO 2 , CaO, and NiO, and the particle diameter D50 is 0.9 ⁇ m.
- the lead-free glass powder includes the following parts by weight: Bi 2 O 3 , B 2 O 3 , ZnO, TeO 2 , SiO 2 , MnO 2 , CaO, Al 2 O 3 , CuO, SrO, and BaO. It is made by melting, the particle diameter D50 is controlled at 2.7 ⁇ m, and the softening point is adjustable within the range of 600 ° C.
- the organic binder includes the following according to parts by weight: 20 parts of an organic resin, 75 parts of an organic solvent, and 5 parts of an organic auxiliary agent.
- the lead-free glass powder is made of Bi 2 O 3 , B 2 O 3 , SiO 2 , Na 2 O, MnO 2 , CaO, Al 2 O 3 , CuO, ZnO, SrO, BaO, TeO 2 Made by melting, the particle size D50 is controlled at 2.2 ⁇ m, and the softening point is adjustable within the range of 500 ° C.
- the organic binder includes the following according to parts by weight: 16 parts of an organic resin, 80 parts of an organic solvent, and 4 parts of an organic auxiliary agent.
- the barrier layer paste can be directly sprayed or printed on the aluminum paste, and the width of the back electrode and the printed pattern can be adjusted freely, the thickness is about 3 ⁇ m; the barrier layer has a bidirectional barrier function, which can prevent aluminum and silver Interdiffusion can also prevent the interdiffusion of silver and silicon.
- An application of the preparation method of the barrier layer, the preparation method of the back electrode of the solar cell can be, but is not limited to, applied to the back electrode of a PERC cell, and is also applicable to a battery sheet with a high degree of back passivation in an all-aluminum field or on the back. It can be applied to the more sensitive, thin, and easily damaged passivation layer. It is tried on mainstream passivation layers such as SiNx, Al 2 O 3 , SiO 2 .
- barrier layer paste The specific operations of the barrier layer paste and the back silver paste used are as follows:
- organic resin and organic auxiliary agent are respectively soaked with an organic solvent, the organic resin is soaked under heating and stirring, the temperature is about 90 ° C, and the time is 2 hours, and the thixotropic agent is soaked under heating and stirring , The temperature is about 40 ° C, and the time is 1.5 hours; and then mixed with other organic auxiliaries and organic solvents in a certain ratio to obtain a transparent and uniform organic binder.
- inorganic binder After weighing various raw materials in mass percentage, dry mix them in a V-type mixer, and after mixing, dry in a constant temperature drying oven at about 200 ° C for 3 hours; Sintering and melting for 1.5 hours in a 1000 °C muffle furnace. High temperature nitrogen vacuum protection and sintering technology is used during smelting. The use of this technology can overcome the technical problems of preparing low-melting-point and stable valence glass powder. The glass taken out of the muffle furnace is cooled by a cold roll. Ball milling, drying, and sieving are all inorganic binders for back-to-field silver backing.
- the preparation method of the back silver paste silver powder, organic binder, inorganic binder, and organic auxiliary agent are dispersed and mixed in a certain proportion, and then milled 7 times using a three-roll mill to make it uniformly dispersed. , To a fineness of ⁇ 15 ⁇ m, that is, the prepared back silver paste for use in combination.
- the preparation method of the barrier layer slurry disperse and mix the metal nitride and oxide powder, organic binder, inorganic binder, and organic auxiliary agent dispersed in advance in a certain proportion, and then use three
- the roller mill grinds 6 to 8 times to make it uniformly dispersed to a fineness ⁇ 15 ⁇ m, which is the prepared barrier layer slurry.
- the present invention has carried out specific experimental tests.
- the test results are shown in Table 1 for the back electrode electrical performance test results and Table 2 for the back electrode reliability test results.
- the electron micrograph is shown in Figure 1-4, and the schematic diagram of the battery structure of the present invention is shown in Figure 5. Show.
- the width of the back electrode and the printing pattern can be adjusted at will, thereby reducing the cost of the back electrode paste.
- the printed graphics of the back silver paste may be hollow, bar-shaped, or dot-shaped, and the shielding ratio is 25-50%.
- the invention realizes the barrier between silver aluminum and silver silicon by two or more printings.
- the method for preparing the back electrode is suitable for a solar cell with full aluminum back field or strong back passivation.
- the application of the barrier layer can reduce the formation of silver-aluminum alloy, thereby improving the solderability and soldering resistance of the paste, and improving the welding tension of the back electrode.
- silver powders of different particle sizes and shapes are selected to be used in cooperation with each other to increase the bulk density of the conductive film, increase the contact area between the silver particles, reduce the shrinkage force of the conductive film, and improve the conductivity of the slurry.
- the back silver paste and the barrier layer paste of the present invention use lead-free glass powder, avoiding the use of lead-containing glass powder, and more in line with the requirements of environmental protection.
- the glass powder is adjusted to an appropriate activity, so that the glass powder and the silver powder have proper wetting Properties, so that the slurry has a suitable sintering temperature, thereby improving the performance of the slurry as a whole.
- the preparation method of the back electrode of the invention ensures that it has considerable welding tension and aging tension, and at the same time avoids serious leakage problems caused by metal defects caused by direct contact between silver and silicon wafers or aluminum paste, thereby improving the photoelectric conversion efficiency of crystalline silicon cells. .
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Abstract
Description
Claims (10)
- 一种太阳能电池背面电极的制备方法,其特征在于:在背面铝浆上印刷或喷涂一层导电阻隔层浆料,阻隔层浆料直接印刷在背铝电极上,烘干后,在其上印刷搭配使用的背银浆料,经过烘干,烧结后形成背电极。
- 根据权利要求1所述的太阳能电池背面电极的制备方法,其特征在于:所述的阻隔层浆料按照重量份数包括如下:金属氮化物粉体、氮硅化合物粉体、氧化物粉体或低熔点金属粉体共20~80份,无铅玻璃粉0.5~5份,有机粘结剂10~40份,有机助剂0.1~1份。
- 根据权利要求1所述的太阳能电池背面电极的制备方法,其特征在于:所述搭配使用的背银浆料按照重量份数包括如下:纯度大于99.99%的特殊要求的空心球形银粉5-60份,片状银粉5~30份,无铅玻璃粉0.5~5份,有机粘结剂10~50份,有机助剂0.1~1份;其中,所述的空心球形银粉粒径D50为5~20μm,片状银粉粒径D50为2~30μm。
- 根据权利要求2所述的太阳能电池背面电极的制备方法,其特征在于:所述的金属氮化物粉体包括ZrN、TiN、TaN、MoN、CaN中的一种或几种,粒径D50为0.1~10μm;所述的氮硅化合物粉体包括SiNx、BNx、VNx中的一种或几种粒径D50为0.3~15μm;所述的氧化物粉体包括Al 2O 3、SiO 2、TiO 2、ZrO、SnO 2、MoO 2、CaO、NiO中的一种或几种,粒径D50为0.3~15μm。
- 根据权利要求2的太阳能电池背面电极的制备方法,其特征在于:所述的无铅玻璃粉按照重量份数包括如下:Bi 2O 3、B 2O 3、ZnO、TeO 2、SiO 2、MnO 2、CaO、Al 2O 3、CuO、SrO、BaO中的几种熔制而成,粒径D50控制在0.7~5μm,软化点在500~700℃范围内可调。
- 根据权利要求2的太阳能电池背面电极的制备方法,其特征在于:所述的有机粘结剂按照重量份数包括如下:有机树脂1~30份,有机溶剂50~90份,有机助剂0.5~10份。
- 根据权利要求3的太阳能电池背面电极的制备方法,其特征在于:所述的无铅玻璃粉由Bi 2O 3、B 2O 3、SiO 2、Na 2O、MnO 2、CaO、、Al 2O 3、CuO、ZnO、SrO、BaO、TeO 2中的几种熔制而成,粒径D50控制在0.3~3μm,软化点在400~600℃范围内可调。
- 根据权利要求3的太阳能电池背面电极的制备方法,其特征在于:所述的有机粘结剂按照重量份数包括如下:有机树脂0.5~20份,有机溶剂40~90份,有机助剂0.5~10份。
- 根据权利要求1所述的阻隔层的制备方法,其特征在于:所述的阻隔层浆料可以直接喷涂或印刷在铝浆上,并且可以随意调节背电极宽度及印刷图形,厚度约为1~5μm;所述阻隔层具有双向阻隔的作用,既可以阻止铝与银的互相扩散,也可以阻止银与硅的互相扩散。
- 一种根据权利要求1所述的阻隔层的制备方法的应用,其特征在于:所述太阳能电池背面电极的制备方法可以但不限于应用在PERC电池背电极,对全铝背场或背面钝化程度较高的电池片同样适用,可以应用于比较敏感且较薄,容易被破坏的的钝化层,对SiNx、Al2O3、SiO2等主流钝化层均试用。
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CN112812673A (zh) * | 2021-01-07 | 2021-05-18 | 湖南松井新材料股份有限公司 | 导电银浆及其制备方法、印刷方法和制品 |
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CN110277459B (zh) * | 2019-06-19 | 2021-07-27 | 南通天盛新能源股份有限公司 | 一种p型晶体硅背面电极的制备方法 |
CN110400651B (zh) * | 2019-06-28 | 2021-07-30 | 云南大学 | 一种导电银浆料及其制备方法 |
CN115411148B (zh) * | 2022-09-26 | 2024-05-10 | 通威太阳能(成都)有限公司 | 太阳电池电极的制备方法 |
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