WO2019244730A1 - Deposition-preventing member and vacuum processing device - Google Patents

Abstract

The present invention provides a technology that enables suppressing particle generation from a deposition-preventing member disposed in an electric discharge space at the time of vacuum processing. The present invention pertains to a deposition-preventing member 30 that prevents a substance generated during vacuum processing from adhering to the interior of a vacuum chamber and that is provided with a frame-like deposition-prevention body member 10 and a holding member 20 for holding the deposition-prevention body member 10. The deposition-prevention body member 10 has plate-like first to fourth components 1-4 that are disposed around a substrate, and the first to fourth components 1-4 are respectively provided with first to fourth grappling parts that are provided to a surface on the side opposite to a surface facing an electric discharge space inside the vacuum chamber so as to be mounted by grappling with first to fourth hooks provided to the holding member 20.

Description

Deposition member and vacuum processing device

{Circle around (1)} The present invention relates to a technique for a deposition-preventing member used in a vacuum processing apparatus such as a sputtering apparatus.

Conventionally, in this type of vacuum processing apparatus, a plate-shaped deposition-preventing member is provided in order to prevent deposition of a film-forming material or the like on a wall or the like in a vacuum chamber when performing vacuum processing such as sputtering.
The deposition-inhibiting member is provided in the vicinity of the substrate in a discharge space for performing plasma processing such as a sputtering apparatus.

In this case, the attachment member is attached to, for example, a frame-shaped holding member in a direction parallel to the substrate in the vacuum chamber.
Conventionally, such a protection member is attached to a holding member using a large number of bolts.

However, there are various problems in the attachment preventing member attached to the holding member.
That is, at the time of film formation by sputtering or the like, the film formation material also adheres to the deposition prevention member. In this case, the film-forming material adheres to the surface of the bolt, causing particles to be generated. For this reason, a cap for preventing the deposition material from being attached is attached to each bolt, but the deposition material attached to the cap also causes the generation of particles.

In addition, since the attachment member is attached to the holding member from the discharge space side by using a large number of bolts, rubbing between the attachment member and the holding member due to the extension of the attachment member due to heat at the time of discharge. And thereby generate particles.

JP-A-4-78132 JP-A-10-060624 JP 2004-315948 A International Publication No. 2006-067836

The present invention has been made in view of such problems of the related art, and an object of the present invention is to suppress particles generated from a deposition prevention member arranged in a discharge space during vacuum processing. It is to provide the technology that can do.

In order to achieve the above object, the present invention is directed to a deposition-preventing member for preventing a substance generated during vacuum processing from adhering to a vacuum chamber, comprising a frame-shaped deposition-preventing body member, A holding member for holding the main body member, wherein the deposition-preventive main body member has a plurality of plate-shaped constituent members provided around the object to be processed, and the plurality of constituent members are configured to discharge electric discharge in the vacuum chamber. The attachment member is provided with a hook portion on a surface opposite to a surface facing the space for hooking and attaching to a plurality of hook portions provided on the holding member.
In the present invention, each constituent member of the deposition-preventing main body member is formed in an elongated shape, and the hooking portion of each of the component members is configured such that, in a state where the deposition-prevention main body member is held by the holding member, A fixing hook for hooking on a fixing hook provided on the hook of the holding member so as not to move in the longitudinal direction, and a hook provided on the holding member in a state in which the constituent members are movable in the longitudinal direction. A hook for movement to be hooked on the hook for movement, wherein the hook for fixation is provided at a central portion of each of the constituent members, and the hook for movement is provided for the constituent member with respect to the hook for fixation. It is also effective when provided on both ends of the.
The present invention is also effective in the case where a plasma shielding wall portion is provided on the peripheral edge of each component of the deposition-inhibiting main body member on the side of the vacuum chamber facing the discharge space.
In the present invention, even in the case where a mounting portion for the holding member is provided so as to extend to the outer side with respect to the plasma shielding wall at the peripheral portion of each component of the deposition-preventing main body member. It is effective.
Further, the present invention includes a vacuum chamber, and an anti-adhesion member provided in the vacuum chamber to prevent a substance generated during vacuum processing from adhering to the vacuum chamber, wherein the anti-adhesion member includes a frame. -Shaped attachment main body member, and a holding member for holding the attachment-prevention main body member, wherein the attachment-prevention main body member has a plurality of plate-shaped constituent members provided around a processing target object, The plurality of constituent members are provided on the surface opposite to the surface facing the discharge space in the vacuum chamber with hook portions for hooking and mounting on the plurality of hook portions provided on the holding member, respectively. This is a vacuum processing apparatus configured to perform a predetermined vacuum processing on an object to be processed disposed near the deposition-inhibiting member.
The present invention is also effective in a case where the vacuum chamber in which a sputtering target is arranged is provided, and sputtering is performed on a processing object arranged in the vicinity of the deposition preventing member.

In the present invention, the plurality of hooks provided on the holding member are hooked on the surface of the plurality of plate-shaped components of the deposition-preventing main body member, which is opposite to the surface facing the discharge space in the vacuum chamber. Since each of the hook portions is provided for mounting by mounting, there is no need to use a large number of bolts with covers unlike the related art in order to hold the deposition-preventing main body member on the holding member.

As a result, according to the present invention, it is possible to reduce the surface area by reducing the unevenness of the surface on the discharge space side of the deposition-preventing member, so that the deposition-preventing member such as a film-forming material adhered at the time of vacuum processing can be formed. Generation of particles due to separation from the surface can be suppressed.

In the present invention, each component member of the deposition-preventing body member is formed in an elongated shape, and the hooking portion of each component member is configured such that each component member extends in the longitudinal direction in a state where the deposition-prevention body member is held by the holding member. A fixing hook that is hooked on a fixing hook provided on the hook portion of the holding member so as not to move, and each component is hooked on a moving hook provided on the hook portion of the holding member so as to be movable in the longitudinal direction. A hook portion for movement, and a hook portion for fixing is provided at a central portion of each of the constituent members, and a hook portion for movement is provided on both ends of the constituent member with respect to the hook portion for fixing. In this case, when a plurality of constituent members are elongated by heat during vacuum processing such as sputtering, the hook portion for movement of the deposition-preventing main body member is hooked on the hook for movement of the holding member. It can be moved respectively in the longitudinal direction of the plurality of components in status.

As a result, according to the present invention, when a plurality of constituent members are each extended by the heat generated during the vacuum processing, the plurality of the constituent members are evenly extended to both ends with reference to the central portion of each constituent member. In this case, warpage and distortion of the deposition-inhibiting member can be suppressed.

Further, in the present invention, when a peripheral wall of each component of the deposition-preventing main body member is provided with a plasma shielding wall extending to a surface side facing the discharge space of the vacuum chamber, Since the amount of a substance such as a film-forming material that adheres to the surface on the side of the discharge space can be reduced, it is possible to further suppress the generation of particles due to separation of the substance from the surface of the deposition prevention member.

Further, in the present invention, when a mounting portion for the holding member is provided so as to extend outward from the plasma shielding wall at a peripheral portion of each component member of the deposition-preventing main body member, Even when the attachment main body member is attached to the holding member using a screw in the above, the substance generated at the time of vacuum processing is blocked by the plasma shielding wall provided on the attachment main body member, Can be prevented from adhering to the mounting portion, so that the generation of particles due to the separation of the substance from the surface of the deposition prevention member can be further suppressed.

Schematic configuration diagram showing the internal configuration of a sputtering apparatus which is an example of a vacuum processing apparatus according to the present invention. FIGS. 2A and 2B are schematic configuration diagrams illustrating examples of a deposition-preventing main body member of the deposition-preventing member according to the present invention. FIG. 2A is a front view as viewed from a discharge space side, and FIG. , Front view from the opposite side of the discharge space FIGS. 3A and 3B are schematic structural views showing examples of the attachment-preventing main body member, FIG. 3A being a front view as viewed from the discharge space side, and FIG. AA line sectional view FIG. 2 is a front view showing an example of a holding member used in the present invention, as viewed from a discharge space side. (A): Explanatory drawing which shows the structure of the fixing | hanging hook part in the 1st and 2nd structural members of a deposition-proof main body member, and the fixing hook in the 1st and 2nd frame parts of a holding member, (b): The deposition-proof main body Explanatory drawing which shows the structure of the hook for movement in the 1st and 2nd component of a member, and the hook for movement in the 1st and 2nd frame part of a holding member. (A) to (d): sectional views showing the configuration and operation of the main part when the first and second components of the deposition-inhibiting main body member are held by the first and second frames of the holding member. (A): Explanatory drawing which shows the structure of the fixing | hanging hook part in the 3rd and 4th structural members of a deposition-proof main body member, and the fixing hook in the 3rd and 4th frame part of a holding member, (b): The deposition-proof main body. Explanatory drawing which shows the structure of the hook part for movement in the 3rd and 4th structural member of a member, and the hook for movement in the 3rd and 4th frame part of a holding member. (A) to (d): sectional views showing the configuration and operation of the main part when the third and fourth components of the deposition-inhibiting main body member are held by the third and fourth frames of the holding member. FIG. 4 is a front view showing an example of the deposition-inhibiting member according to the present invention, as viewed from the discharge space side. 9 is a perspective sectional view taken along line BB of FIG. 9.

Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings.
FIG. 1 is a schematic configuration diagram showing an internal configuration of a sputtering apparatus which is an example of a vacuum processing apparatus according to the present invention.

2 (a) and 2 (b) are schematic structural views showing examples of a deposition-preventing main body member of the deposition-preventing member according to the present invention. FIG. 2 (a) is a front view as viewed from the discharge space side, and FIG. (b) is a front view as seen from the side opposite to the discharge space side.

3A is a schematic configuration diagram showing an example of the deposition-preventing main body member, FIG. 3A is a front view as viewed from the discharge space side, and FIG. 3B is FIG. 2) is a sectional view taken along line AA of FIG.

As shown in FIG. 1, the deposition-preventing main body member 10 of this example constitutes a deposition-preventing member 30 used in a sputtering apparatus 40 that is a vacuum processing apparatus, and is used for a substrate 8 (processing target) in a vacuum chamber 6. In the vicinity, it is arranged while being held by a holding member 20 described later.

Here, in this example, the substrate 8 and the sputtering target (hereinafter, referred to as “target”) 7 are arranged facing each other in a substantially vertical direction, and the deposition-preventing main body member 10 discharges electricity between the substrate 8 and the target 7. It is provided so as to face the space 9.

In the sputtering apparatus 40 having such a configuration, a sputtering gas is introduced between the substrate 8 and the target 7, and a negative voltage is applied to the target 7 to generate plasma discharge.
As a result, the negatively charged target 7 is sputtered by the ions in the plasma, and a film is formed on the substrate 8 by the sputtered particles protruding from the surface of the target 7.

FIG. 2A shows a front side surface of the deposition-preventing main body member 10, and FIG. 2B shows a back side surface of the deposition-preventing main body member 10.
As shown in FIGS. 2A and 2B, the deposition-preventing main body member 10 of this embodiment has, for example, first to fourth component members 1 to 4 in the form of a straight plate, and has a rectangular frame shape having an opening 10a. Is formed.

The deposition-preventing main body member 10 of the present example is made of, for example, aluminum (Al), stainless steel, or titanium (Ti), and is usually arranged in a vertically oriented state.
Here, the deposition-inhibiting main body member 10 is disposed on the left and right sides between the first and second component members 1 and 2 that are disposed on the upper and lower sides and extend in the horizontal direction. And a third component 4 and a fourth component 4 extending in the vertical direction.

Hereinafter, the longitudinal directions of the first component 1 and the second component 2 of the deposition-inhibiting body member 10 are appropriately referred to as “X-axis direction”, and the longitudinal directions of the third component 4 and the fourth component 4 are appropriately designated as “Z”. "Axial direction".

These first to fourth constituent members 1 to 4 are arranged with a slight gap between both ends of adjacent members in consideration of elongation due to heat during vacuum processing.
Among the first to fourth components 1 to 4, the first component 1 and the second component 2, and the third component 3 and the fourth component 4 are straight lines passing through the center point of the deposition-preventing body member 10. Are formed and arranged in a line-symmetrical shape with respect to.

The first to fourth components 1 to 4 are hooked and held on the holding member 20 by a mechanism described later.
The first to fourth component members 1 to 4 extend, for example, perpendicularly toward the discharge space 9 side (surface side) of the first to fourth component members 1 to 4 toward the discharge space 9 shown in FIG. Plasma shielding walls (wall portions for plasma shielding) 1c, 2c, 3c, 4c formed as described above are provided.

Hook portions 1A, 2A, 3A, 4A for hooking and holding the first to fourth component members 1 to 4 on the holding member 20, respectively, on the back side surfaces of the first to fourth component members 1 to 4 of this example. Is provided.

Here, the hooks 1A and 2A of the first and second component members 1 and 2 have a hook 1a for fixing and a hook 1b for movement, respectively, which will be described later, and these hooks 1a and 1h for movement. 1b is provided, for example, linearly in a line along the longitudinal direction (X-axis direction) of the first and second components 1 and 2.

On the other hand, hook portion 3A of the third and fourth components 3, 4, 4A includes a fixed hooking portion 1a, which will be described later, the upper moving hook portion 1b _a, and a hook portion 1b _b for the lower side respectively move a, these and fixing hook 1a, a upper moving hook portion 1b _a, downward movement hooking portion 1b _b is the third and the longitudinal direction of the fourth component 3, 4 (Z axis direction) For example, they are arranged in a line in a straight line.

In the present invention, a fixing hook 1a is provided at a central portion of each of the first and second components 1 and 2, and both ends of the first and second components 1 and 2 are provided with respect to the fixing hook 1a. It is preferable to provide a hook part 1b for movement on the side of the part.

Further, in the present invention, a fixing hook 1a is provided at the center of each of the third and fourth components 3 and 4, and the third and fourth components 3, 4 are attached to the fixing hook 1a. the both ends upward movement hook 1b _a, it is preferable to provide a hook portion 1b _b for downward movement.

In the case of the present invention, there is no particular limitation, but from the viewpoint of preventing warpage of the deposition-inhibiting member 30 and reducing the amount of movement of each end with respect to the fixed position, the first to fourth constituent members are used. A plurality of movements with respect to the fixing hooks 1a provided at the central portions of the first to fourth components so as to be line-symmetric with respect to a straight line (not shown) orthogonal to the longitudinal direction of the first to fourth component members 1 to 4, respectively. use hook 1b (upper side moving hook portion 1b _a, hook 1b _b for the lower side movement) is preferably provided.

In this example, one fixing hook 1a is provided at the central portion of each of the first to fourth components 1 to 4, and the first to fourth components 1 to 4 are provided with respect to the fixing hook 1a. moving hook portion 1b of the plurality of (respectively in this example two) at a position which becomes the line symmetry of the both end portions (upper-side movable hooking portion 1b _a, hook 1b _b for the lower side movement) is provided .

The first to fourth component 1 to hooking fixing provided 4 portions 1a and moving hook 1b (upper side moving hook portion 1b _a, hook 1b _b for the lower side movement), for example long It is formed in a rectangular parallelepiped shape, and has the same width and length, respectively.

On the other hand, a plurality of attachment portions 5 for attaching the first to fourth component members 1 to 4 to the holding member 20 using, for example, bolts, are provided on the peripheral portions of the first to fourth component members 1 to 4, respectively. It is provided to extend (project) outward from the shielding walls 1c to 4c.

FIG. 4 is a front view showing an example of the holding member used in the present invention, as viewed from the discharge space side.
In this example, the holding member 20 is fixed in the sputtering apparatus 40 shown in FIG. 1, and the first to fourth constituent members 1 to 4 of the deposition-preventing main body member 10 are attached to the discharge space 9 side of the holding member 20.

As shown in FIG. 4, the holding member 20 of the present example is formed in a rectangular frame shape.
The holding member 20 is integrally formed using a plate material having high rigidity, has an outer diameter slightly larger than the outer diameter of the above-described deposition-preventing main body member 10, and is slightly larger than the opening 10a of the deposition-preventing main body member 10. An opening 20a having an inner diameter is provided.

The holding member 20 is composed of first to fourth frame portions 11 to 14 corresponding to the first to fourth constituent members 1 to 4 of the deposition-preventing main body member 10. That is, the first frame portion 11 and the second frame portion 12 extending in the horizontal direction are provided above and below the holding member 20, and the left and right sides of the holding member 20 are vertically interposed between the first frame portion 11 and the second frame portion 12. A third frame portion 13 and a fourth frame portion 14 that extend are provided.

Hereinafter, the longitudinal directions of the first frame portion 11 and the second frame portion 12 of the holding member 20 are appropriately referred to as “X-axis direction”, and the longitudinal directions of the third frame portion 13 and the fourth frame portion 14 are appropriately referred to as “Z-axis direction”. "

The surfaces of the first to fourth frame portions 11 to 14 of the holding member 20 on the discharge space 9 side shown in FIG. First to fourth hook portions 11A to 14A corresponding to 1A to 4A are provided.
In this example, the first hook 11A is provided on the first frame 11 on the upper side of the holding member 20, and the second hook 12A is provided on the second frame 12 on the lower side.

On the other hand, a third hook portion 13A is provided in the third frame portion 13 on the left side of the holding member 20 as viewed from the discharge space 9 shown in FIG. 14 is provided with a fourth hook portion 14A.

The first to fourth hook portions 11A to 14A of the holding member 20 have a fixing hook 11a and a moving hook 11b, respectively, which will be described later. The fixing hook 11a and the moving hook 11b The fourth frame portions 11 to 14 are provided in a line in a straight line, for example, along the longitudinal direction.

In the present invention, a fixing hook 11a is provided at a central portion of each of the first to fourth frame portions 11 to 14 of the holding member 20, and the first to fourth frame portions 11 to 14 are attached to the fixing hook 11a. It is preferable to provide the moving hooks 11b at both end sides.

In the case of the present invention, although not particularly limited, from the viewpoint of preventing warpage of the deposition-inhibiting member 30, the fixing hook 11a provided at the central portion of the above-described first to fourth frame portions 11 to 14 may be used. On the other hand, it is preferable to provide a plurality of moving hooks 11b so as to be line-symmetric with respect to the longitudinal direction of the first to fourth frame portions 11 to 14, respectively.

In this example, one fixing hook 11a is provided at the center of each of the first to fourth frame portions 11 to 14, and both ends of the first to fourth frame portions 11 to 14 are provided with respect to the fixing hook 11a. A plurality (two in this example) of moving hooks 11b are provided at positions on the side that are symmetrical with the line.

A moving hook 11b These fixing hooks 11a, the fixing hook 1a and moving hook portion 1b of the deposition-inhibitory body member 10 described above (upper side moving hook portion 1b _a, hook 1b _b for downward movement) Are provided at corresponding positions.

FIG. 5A is an explanatory view showing the configuration of the fixing hooks in the first and second components of the deposition-preventing main body member and the fixing hooks in the first and second frames of the holding member. (b) is an explanatory view showing the configuration of the hook for movement in the first and second components of the deposition-preventing main body member and the hook for movement in the first and second frames of the holding member.

FIGS. 6A to 6D are cross-sectional views showing the configuration and operation of the main part when the first and second components of the deposition-inhibiting main body member are held by the first and second frames of the holding member. is there.

As shown in FIGS. 4 and 5A and 5B, in this example, the fixing hook 11a and the moving hook 11b in the first and second frame portions 11 and 12 of the holding member 20 are attached to the body They are arranged in the fixing hook concave portion 21a and the moving hook concave portion 21b provided in the first and second constituent members 1 and 2 of the member 10, respectively.

Each of the fixing hook concave portion 21a and the moving hook concave portion 21b has a length in the X-axis direction of each of the first and second frame portions 11 and 12 of the holding member 20, which is larger than the length of the upper portion. The lower portion is formed to have a longer length.

The fixing hook 11a and the moving hook 11b are both arranged below the fixing hook concave portion 21a and the moving hook concave portion 21b.
The fixing hooks 11a of the first and second frame portions 11 and 12 are formed, for example, in a rectangular shape, and the height thereof is reduced toward the bottom of the fixing hook concave portion 21a, for example. the tilted planar support surface 11a ₁ were is formed as (see FIG. 6 (a)).

The moving hooks 11b of the first and second frame portions 11 and 12 are formed, for example, in a rectangular shape, and project upward from the upper portion thereof, for example, to a portion away from the bottom of the moving hook concave portion 21b. hook projections 11b ₁ which is is formed (see Figure 6 (b)).
Between the bottom of the hook projections 11b ₁ and the mobile hook recess 21b of the moving hook 11b, is formed a flat supporting portion 11b _2.

In this example, the fixing hook 1a and the moving hook 1b in the first and second components 1 and 2 of the deposition-preventing body 10 are used when the deposition-preventing body 10 is held by the holding member 20, In the first and second frame portions 11 and 12 of the holding member 20, both are configured to be disposed above the fixing hook concave portion 21a and the moving hook concave portion 21b (FIG. 5A ) (B)).

Here, as shown in FIG. 5A, the length (d1) in the X-axis direction of the fixing hook 1a of the first and second components 1 and 2 of the deposition-preventing main body 10 is maintained. The portion above the fixing hook recess 21a in the first and second components 1 and 2 of the member 20 is inserted into the fixing hook recess 21a with a length (d) or less in the X-axis direction (d). ) Is set to be possible (d1 ≦ d).

As a result, the fixing hooks 1a of the first and second components 1 and 2 of the deposition-preventing main body member 10 are inserted into the fixing hook concave portions 21a of the first and second frame portions 11 and 12 of the holding member 20. When they are respectively arranged, they are in close contact with the wall portions 21ah on both sides in the X-axis direction of the fixing hook concave portion 21a, so that they cannot move in the X-axis direction within the fixing hook concave portion 21a. become.

Here, the fixing hooks 1a of the first and second components 1 and 2 of the deposition-preventing main body member 10 have a support surface of the fixing hooks 11a of the first and second frame portions 11 and 12 below. 11a ₁ contact surface 1a ₁ of the adherable flat is provided (see FIG. 6 (a)).

On the other hand, as shown in FIG. 5B, the length (d2) of the first and second components 1 and 2 of the deposition-preventing main body member 10 in the X-axis direction is as follows. Each of the first and second frame portions 11 and 12 of the holding member 20 is set to be smaller than the length (D) in the X-axis direction of a portion above the concave portion 21b for the hook for movement (d2 <D). ).

As a result, the moving hooks 1b of the first and second components 1 and 2 of the deposition-preventing main body member 10 are located in the moving hook concave portions 21b of the first and second frame portions 11 and 12 of the holding member 20. When arranged, a gap 21h is formed between both ends in the X-axis direction of each hook portion 1b in the X-axis direction and walls 21bh on both sides above the recess portion 21b for the hook for movement. The wall portions 21bh on both sides in the X-axis direction of the concave portion 21b are not in contact with each other, and can be moved in the X-axis direction within the moving hook concave portion 21b.

Here, the moving hooks 1b of the first and second components 1 and 2 of the deposition-preventing main body member 10 are provided with hook projections of the moving hooks 11b of the first and second frame portions 11 and 12 below. part 11b ₁ can mate with protrusions 1b ₁ is provided (see Figure 6 (b)).

As will be described later, the hooks 1b for moving the first and second components 1 and 2 of the deposition-preventing main body member 10 are hooks 11b for moving the first and second frame portions 11 and 12 of the holding member 20. Are configured to be movable in the X-axis direction even if they are hooked.

In such a configuration, the following operation is performed when the first and second components 1 and 2 of the deposition-inhibiting main body member 10 are held by the first and second frame portions 11 and 12 of the holding member 20.
First, for example, as shown in FIG. 6A, the back side surface of the deposition-inhibiting main body member 10 and the front side surface of the holding member 20 are opposed to each other, and as shown in FIG. Each of the fixing hooks 1a on the back surface of the first and second component members 1, 2 is inserted into the fixing hook recess 21a on the front surface of the first and second frame portions 11, 12 of the holding member 20, hooked by contacting each of the contact surface 1a ₁ to the supporting surface 11a ₁ of the fixing hooks 11a.

Here, the fixation of the first and second configurations contact surface 1a ₁ of each fixing hook portion 1a of the member 1 and 2, first and second frame portions 11, 12 of the holding member 20 of the deposition-inhibitory body member 10 to be supported in a close contact state tilted supporting surface 11a ₁ of the use hooks 11a.

In this case, as described above, the first and second structural members 1 of the deposition-preventing main body member 10 arranged in the fixing hook concave portions 21a of the first and second frame portions 11 and 12 of the holding member 20, respectively. As shown in FIG. 5 (a), the fixing hook portion 1a is in close contact with the wall portions 21ah on both sides in the X-axis direction of the fixing hook concave portion 21a. It becomes impossible to move in the X-axis direction within 21a.

Further, at the same time as the above-described operation, as shown in FIG. 6B, the back side surface of the deposition-preventing main body member 10 and the front side surface of the holding member 20 face each other, and as shown in FIG. The moving hooks 1b on the back side of the first and second components 1 and 2 of the main body member 10 are connected to the moving hook recesses 21b on the front side of the first and second frames 11 and 12 of the holding member 20. And hook the respective moving hooks 1b on the moving hooks 11b.

In this case, the protruding portion 1b ₁ of the moving hook portion 1b of the first and second components 1 and 2 of the deposition-inhibitory body member 10, for movement of the first and second frame portions 11, 12 of the holding member 20 so enter between the bottom of the mobile hook recess 21b of the hook 11b, a protruding portion 1b ₁ of the moving hook portion 1b of the deposition-inhibitory body member 10, the hook projection 11b of the moving hook 11b of the holding member 20 ₁ and ₁ (see FIGS. 9 and 10 described later).

In this state, the first and the tip portion of the protruding portion 1b ₁ of the moving hook portion 1b of the second component 1 and 2, first and second frame portions 11 of the holding member 20 of the deposition-inhibitory body member 10 , it may not be in contact also in contact with the supporting portion 11b ₂ of the transfer hook 11b of 12.
With the above steps, the step of holding the first and second components 1 and 2 of the deposition-preventing main body member 10 on the first and second frame portions 11 and 12 of the holding member 20 is completed.

FIG. 7A is an explanatory view showing the configuration of the fixing hooks in the third and fourth components of the deposition-preventing main body member and the fixing hooks in the third and fourth frames of the holding member. (b) is an explanatory view showing the configuration of the hook for movement in the third and fourth components of the deposition-preventing main body member and the hook for movement in the third and fourth frames of the holding member.

FIGS. 8A to 8D are cross-sectional views showing the configuration and operation of main parts when the third and fourth constituent members of the deposition-inhibiting main body member are held by the third and fourth frame portions of the holding member. is there.
FIG. 9 is a front view showing an example of the deposition-inhibiting member according to the present invention, viewed from the discharge space side, and FIG. 10 is a perspective sectional view taken along the line BB of FIG.

As shown in FIGS. 4 and 7A and 7B, in this example, the fixing hook 11a and the moving hook 11b in the third and fourth frame portions 13 and 14 of the holding member 20 are attached to the deposition-preventing main body. They are arranged in the fixing hook concave portions 21a and the moving hook concave portions 21b provided on the third and fourth components 3 and 4 of the member 10, respectively.

In the case of this example, the fixing hooks 11a provided on the third and fourth frame portions 13 and 14 of the holding member 20 are the fixing hooks provided on the first and second frame portions 11 and 12 of the holding member 20. It has the same basic configuration as 11a.

The fixing hook concave portions 21a and the moving hook concave portions 21b of the third and fourth frame portions 13 and 14 are arranged so that the third and fourth frame portions 13 and 14 of the holding member 20 have respective lengths in the X-axis direction. In each case, the length of the lower part is longer than the length of the upper part.

The fixing hook 11a and the moving hook 11b are both arranged below the fixing hook concave portion 21a and the moving hook concave portion 21b.
The fixing hooks 11a of the third and fourth frame portions 13 and 14 are formed in, for example, a rectangular shape, and the height thereof becomes lower toward the bottom of the fixing hook recesses 21a, for example. the tilted planar support surface 11a ₁ were is formed as (see FIG. 8 (a)).

The moving hooks 11b of the third and fourth frame portions 13 and 14 are formed, for example, in a rectangular shape, and project upward at the upper portion thereof, for example, at a portion away from the bottom of the moving hook concave portion 21b. hook projections 11b ₁ which is is formed (see Figure 8 (b)).
Between the bottom of the hook projections 11b ₁ and the mobile hook recess 21b of the moving hook 11b, is formed a flat supporting portion 11b _2.

In this example, the third and fourth locking hook 1a in the components 3, 4 and the upper side moving hook portion 1b _a adhesion-preventing body member 10, the lower-side hook portion 1b _b is a deposition-inhibitory body member 10 When held by the holding member 20, both of the third and fourth frame portions 13 and 14 of the holding member 20 are arranged on the Z-axis upper side of the fixing hook concave portion 21 a and the moving hook concave portion 21 b. (See FIGS. 7A and 7B and FIG. 9).

Here, as shown in FIG. 7A, the length (d1) in the X-axis direction of the fixing hooks 1a of the third and fourth components 3, 4 of the deposition-preventing main body 10 is maintained. A portion of the third and fourth frame portions 13 and 14 of the member 20 above the fixing hook concave portion 21a and having a length (d) or less in the X-axis direction is inserted into the fixing hook concave portion 21a (press-fit). ) The length is set so as to be possible (d1 ≦ d).

As a result, the fixing hooks 1a of the third and fourth components 3 and 4 of the attachment-preventing main body member 10 are inserted into the fixing hook recesses 21a of the third and fourth frame portions 13 and 14 of the holding member 20. When they are respectively arranged, they come into close contact with the wall portions 21ah on both sides in the X-axis direction of the fixing hook concave portion 21a, respectively, so that they cannot move in the X-axis direction within the fixing hook concave portion 21a. Become.

Here, the fixing hooks 1a of the third and fourth components 3 and 4 of the attachment-preventing main body member 10 are provided with fixing hooks 11a of the third and fourth frame portions 13 and 14 of the holding member 20 below. contact surface 1a ₁ is provided in the support surface 11a ₁ and adherable planar (see FIG. 8 (a)).

In this example, the third and abutment surface 1a ₁ of the fixing hook portion 1a of the fourth component 3 and 4, third and fourth frame portions 13 and 14 of the holding member 20 of the deposition-inhibitory body member 10 of if it is supported in close contact with the supporting surface 11a ₁ of the fixing hooks 11a, third and fourth frame of the third and fourth configurations total load holding member 20 of the members 3 and 4 of the adhesion-preventing body member 10 It is configured to be supported by the fixing hooks 11a of the parts 13 and 14, respectively.

On the other hand, the third and upper moving hook portion 1b _a and hook 1b _b downward for moving the fourth component 3,4 of the deposition-inhibitory body member 10 of the present embodiment, as shown in FIG. 7 (b) The length (d2) in the X-axis direction is not more than the length (d) in the X-axis direction in a portion of the third and fourth frame portions 13 and 14 of the holding member 20 above the concave portion 21b for the hook for movement. Is set so that the length can be inserted (press-fitted) into the concave portion 21b for the moving hook (d2 ≦ d).

Therefore, in the present example, the adhesion-preventing third and upper moving hook portion 1b _a and hook 1b _b downward for moving the fourth component 3,4 of the body member 10, the third holding members 20 and When each of the fourth hook portions 13 and 14 is disposed in the moving hook concave portion 21b, it comes into close contact with the wall portion 21bh on both sides in the X-axis direction of the moving hook concave portion 21b. It becomes impossible to move in the X-axis direction in the moving hook concave portion 21b.

On the other hand, in the present example, when heat is applied during vacuum processing such as sputtering, the fixing hook 1a located at the center of the third and fourth components 3, 4 of the deposition-preventing main body 10 is Z Although there is almost no effect in the axial direction, the third and fourth components 3, 4 of the deposition-preventing main body member 10 extend in the Z-axis direction. Have been.

First, when the hooked upper side and the lower side moving hook portion 1b _a adhesion-preventing body member 10, a 1b _b to move hook 11b of the holding member 20, as shown in FIG. 8 (d), the deposition preventing third and upper and lower side moving hook portion 1b _a fourth component 3,4 of the body member 10, the protruding portion 1b ₁ of 1b _b, third and fourth frame portions 13 and 14 of the holding member 20 moving enters each between the bottom of the mobile hook recess 21b of the hook 11b, the upper side and the lower side moving hook portion 1b _a, the protrusion 1b ₁ of 1b _b, moving the hook 11b of the holding member 20 of the And the hook protrusion 11b1 of the _second gear mesh with each other.

In such a state, when heat at the time of vacuum processing is applied to the third and fourth components 3 and 4 of the deposition-inhibiting main body member 10, an upper side with respect to the center of the third and fourth components 3 and 4. part of is extended in the Z-axis upward, thereby also hook portion 1b _a for upward movement extending in the Z-axis upward.

As a result, the tip portion of the protruding portion 1b ₁ of the upper moving hook portion 1b _a adhesion-preventing body member 10, these intervals spaced from the support portion 11b ₂ of the mobile hook 11b of the holding member 20 is enlarged.

Thus, in this embodiment, the adhesion-preventing body heat when no applied against member 10, the supporting portion 11b of the movable hook 11b of the upper moving hook portion 1b _a protrusion 1b ₁ of the tip retaining member 20 of the Either a configuration that comes into contact with or a configuration that is separated from the _two can be adopted.

However, the protruding portion 1b ₁ of the upper moving hook portion 1b _a when heat is applied against the deposition preventing the body member 10, the meshing is disengaged between the hook projection 11b ₁ of the transfer hook 11b of the holding member 20 as no, a protruding portion 1b ₁ of the upper moving hook portion 1b _a adhesion-preventing body member 10, be configured properly shape and dimensions of the hook projection 11b ₁ of the transfer hook 11b of the holding member 20 Is preferred.

On the other hand, when heat is applied to the deposition-preventing main body member 10, the lower part of the central part of the third and fourth constituent members 3 and 4 extends downward in the Z-axis, thereby by also hook 1b _b for the side movement extends in the Z-axis downward, the tip is moved downward Z axis.

Therefore, in this example, when heat is applied to the deposition-preventing main body member 10, the distal end of the protrusion ₁ b ₁ of the lower-side hook portion _{1 bb} is supported by the supporting portion 11 b ₂ of the moving hook 11 b of the holding member 20. abuts this to not pressed, when no heat is applied against the deposition preventing the body member 10, the moving hook the tip portion of the protruding portion 1b ₁ of the hook portion 1b _b for the lower side moving retaining member 20 so as to be separated by a predetermined distance relative to the support portion 11b ₂ of the 11b, the projecting portion 1b ₁ of the lower moving hook portion 1b _b of the adhesion-preventing body member 10, the hook projection of the transfer hook 11b of the holding member 20 it is preferable to properly set the shape and dimensions of 11b ₁ and the supporting portion 11b _2.

In such a configuration, when the third and fourth components 3 and 4 of the deposition-preventing main body member 10 are held by the third and fourth frame portions 13 and 14 of the holding member 20, the following operation is performed.
First, for example, as shown in FIG. 8A, the back side surface of the deposition-inhibiting main body member 10 and the front side surface of the holding member 20 are opposed to each other, and as shown in FIG. Each of the fixing hooks 1a on the back surface of the third and fourth component members 3, 4 is inserted into the fixing hook recess 21a on the front surface of the third and fourth frame portions 13, 14 of the holding member 20, hooked by contacting each of the contact surface 1a ₁ to the supporting surface 11a ₁ of the fixing hooks 11a.

Here, the contact surfaces 1 a ₁ of the fixing hooks 1 a of the third and fourth components 3 and 4 of the deposition-preventing main body 10 are fixed to the third and fourth frame portions 13 and 14 of the holding member 20. to be supported in a tilted close contact to the supporting surface 11a ₁ of the use hooks 11a.

In this case, as described above, the third and fourth component members 3 of the deposition-prevention main body member 10 disposed in the fixing hook concave portions 21a of the third and fourth frame portions 13 and 14 of the holding member 20, respectively. As shown in FIG. 7 (a), the fixing hook portion 1a is in close contact with the wall portions 21ah on both sides in the X-axis direction of the fixing hook concave portion 21a. 21a cannot be moved in the X-axis direction.

Further, at the same time as the above-described operation, as shown in FIG. 8B, the back side surface of the deposition-preventing main body member 10 and the front side surface of the holding member 20 face each other, and as shown in FIG. Table of the third and fourth frame portions 13 and 14 of the third and fourth upper side and the lower side moving hook portion 1b _a backside surface of the component 3 and 4, the 1b _b, the holding member 20 of the body member 10 insert the side moving hook recess 21b of hooking each of the upper and lower side moving hook portion 1b _a, a 1b _b to move hook 11b.

In this case, third and upper and lower side moving hook portion 1b _a fourth component 3,4 of the deposition-inhibitory body member 10, the protruding portion 1b ₁ of 1b _b, third and fourth holding members 20 enters each between the bottom of the mobile hook recess 21b of the movable hook 11b of the frame part 13 and 14, the upper side and the lower side moving hook portion 1b _a adhesion-preventing body member 10, the protruding portion 1b of the 1b _{b 1,} to engage the hook protrusion 11b ₁ of the transfer hook 11b of the holding member 20.

With the above steps, the step of holding the third and fourth components 3 and 4 of the deposition-inhibiting main body member 10 on the third and fourth frame portions 13 and 14 of the holding member 20 is completed.
After that, the attachment main body member 10 is tightly fixed to the holding member 20 and held by the attachment portion 5 of the attachment main body member 10 by, for example, fastening a screw (not shown).
As a result, as shown in FIG. 9, the protection member 30 of the present embodiment is obtained.

In the present embodiment described above, the first to fourth constituent members 1 to 4 of the deposition-preventing main body member 10 are held on the surface opposite to the surface facing the discharge space 9 in the vacuum chamber 6. Since the first to fourth hooks 1A to 4A for hooking and attaching to the first to fourth hooks 11A to 14A provided on the member 20 are provided respectively, the attachment-preventing main body member 10 is held by the holding member. It is not necessary to use a large number of bolts with a cover as in the prior art to hold the bolt at 20.

As a result, according to the present embodiment, the surface area can be reduced by reducing the unevenness of the surface of the deposition-inhibiting member 30 on the side of the discharge space 9, so that the surface area of the film-forming material or the like adhered during the vacuum processing can be reduced. Generation of particles due to separation from the surface of the deposition-inhibiting member 30 can be suppressed.

In the present embodiment, the first to fourth component members 1 to 4 of the deposition-preventing main body member 10 are formed in an elongated shape, and the first to fourth hook portions 1A to 1A to 4th of the first to fourth component members 1 to 4 are formed. 4A, the first to fourth hook portions 11A to 11A of the holding member 20 are arranged so that the first to fourth components 1 to 4 do not move in the longitudinal direction in a state where the deposition-preventing main body member 10 is held by the holding member 20. The fixing hook 1a hooked on the fixing hook 11a provided on the holding member 14A, and the first to fourth hook portions 11A to 11H of the holding member 20 in a state where the first to fourth constituent members 1 to 4 can move in the longitudinal direction. moving hook portion 1b (upper side moving hook portion 1b _a, hook 1b _b for downward movement) caught by the moving hook 11b provided in 14A and a, the fixing hook portion 1a first to If it is provided at the center of the four components 1-4 , The mobile hooking portion 1b (upper side moving hook portion 1b _a, the lower side for moving the hook portion 1b _b) is in the both end sides of the first to fourth components 1-4 with respect to the fixed hooking portion 1a When the first to fourth constituent members 1 to 4 are elongated by the heat generated during vacuum processing such as sputtering, the hook portion 1b for movement of the deposition-preventing main body member 10 (the hook for upward movement) is provided. part 1b _a, hook 1b _b for the lower side movement) can be respectively moved in a state hooked to the mobile hook 11b of the holding member 20 in the longitudinal direction of the first to fourth components 1-4.

As a result, according to the present embodiment, when the first to fourth constituent members 1 to 4 are each extended by the heat generated during the vacuum processing, the center of each of the first to fourth constituent members 1 to 4 is set. Since it extends uniformly to both ends with reference to the portion, warpage and distortion of the deposition-inhibiting member 30 during vacuum processing can be suppressed.

Further, in the present embodiment, the plasma shielding wall 1 c extending to the surface of the vacuum chamber 6 facing the discharge space 9 is provided on the peripheral edge of the first to fourth components 1 to 4 of the deposition-preventing main body 10. Since 4c is provided, the amount of a material such as a film-forming material adhered to the surface of the deposition-inhibiting member 30 on the side of the discharge space 9 can be reduced. It is possible to further suppress the generation of particles due to the separation of the particles.

Further, in the present embodiment, the mounting portion 5 for the holding member 20 is provided on the peripheral portion of each component member of the deposition-preventing main body member 10 so as to extend outward from the plasma shielding walls 1c to 4c. Therefore, even when the attachment main body member 10 is attached to the holding member 20 using screws in the attachment part 5, the material generated during the vacuum processing is not affected by the plasma shielding walls 1c to 4c provided on the attachment main body member 10. This prevents the attachment of the deposition-preventing main body member 10 to the mounting portion 5, so that the generation of particles due to the separation of the substance from the surface of the deposition-preventing member 30 can be further suppressed.

Note that the present invention is not limited to the above embodiment, and various changes can be made. For example, the shape of the fixing hook portion 1a of the adhesion-preventing body member 10, as well as, mobile hooking portion 1b, upper moving hook portion 1b _a, the shape and number of the hook portion 1b _b for downward movement, the above-described The present invention is not limited to the above-described embodiment, and can be appropriately changed.

In addition, the shape of the fixing hook 11a of the holding member 20 and the shape and number of the moving hooks 11b are not limited to those in the above-described embodiment, and can be appropriately changed.
Further, the above embodiment has been described by taking as an example the case where the present invention is applied to a sputtering apparatus, but the present invention is not limited to this, and can be applied to various vacuum processing apparatuses.

1 First component 1A Hook 1a Fixing hook 1b Hook 1b _a Upper hook 1b _b Lower hook 1c Plasma shielding wall (for plasma shielding) Wall)
2 2nd constituent member 2A hook part 2c plasma shield wall 3 3rd constituent member 3A hook part 3c plasma shield wall 4 4th member 4A hook part 4c plasma shield wall 5 ... Mounting part 6 ... Vacuum chamber 7 ... Sputtering target 8 ... Substrate (object to be processed)
DESCRIPTION OF SYMBOLS 10: Protective body member 11 ... 1st frame part 11a ... Hook for fixing 11b ... Hook for movement 11A ... 1st hook part 12 ... 2nd frame part 12A ... 2nd hook part 13 ... 3rd frame part 13A ... 3rd Hook portion 14 Fourth frame portion 14A Fourth hook portion 20 Holding member 21a Fixing hook concave portion 21b Moving hook concave portion 30 Protective member 40 Sputtering device (vacuum processing device)

Claims (6)

1. A deposition-preventing member that prevents substances generated during vacuum processing from adhering to the vacuum chamber,
   A frame-shaped deposition-preventing body member,
   A holding member for holding the deposition-preventive body member,
   The deposition-preventing main body member has a plurality of plate-shaped components provided around the object to be processed, and the plurality of components are disposed on a surface opposite to a surface facing a discharge space in the vacuum chamber. An attachment member provided with a hook portion for hooking and attaching to a plurality of hook portions provided on the holding member.
2. Each constituent member of the deposition-preventing body member is formed in an elongated shape, and the hook portion of each component member moves in the longitudinal direction in a state where the deposition-prevention body member is held by the holding member. A fixing hook which is hooked on a fixing hook provided on the hook of the holding member, and a moving hook provided on the hook of the holding member such that each of the constituent members is movable in the longitudinal direction. A hook portion for movement to be hooked on the fixing member, and the hook portion for fixing is provided at a center portion of each of the constituent members, and the hook portion for movement is on both ends of the constituent member with respect to the hook portion for fixing. 2. The deposition-inhibiting member according to claim 1, wherein
3. (4) The deposition-preventing member according to (1), wherein a plasma shielding wall portion is provided at a peripheral portion of each component of the deposition-preventing main body member, the wall portion extending toward a surface of the vacuum tank facing the discharge space.
4. 4. A mounting portion for the holding member is provided at a peripheral portion of each component member of the deposition-inhibiting main body member so as to extend outward with respect to the plasma shielding wall portion. 2. The anti-adhesive member according to claim 1.
5. A vacuum chamber,
   An anti-adhesion member provided in the vacuum chamber to prevent the substance generated during vacuum processing from adhering to the vacuum chamber,
   The deposition prevention member has a frame-shaped deposition prevention main body member and a holding member that holds the deposition prevention main body member,
   The deposition main body member has a plurality of plate-shaped components provided around the processing target,
   The plurality of constituent members are provided on respective surfaces opposite to the surface facing the discharge space in the vacuum chamber, and hook portions for hooking and attaching to the plurality of hook portions provided on the holding member are provided, respectively.
   A vacuum processing apparatus configured to perform a predetermined vacuum processing on an object to be processed disposed near the deposition-inhibiting member.
6. The vacuum processing apparatus according to claim 5, further comprising the vacuum chamber in which a sputtering target is disposed, wherein the vacuum processing apparatus is configured to perform sputtering on a processing target disposed near the deposition-inhibiting member.
   

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