WO2019219273A1 - Procédé de traitement de surface d'une pièce et installation associée - Google Patents
Procédé de traitement de surface d'une pièce et installation associée Download PDFInfo
- Publication number
- WO2019219273A1 WO2019219273A1 PCT/EP2019/056313 EP2019056313W WO2019219273A1 WO 2019219273 A1 WO2019219273 A1 WO 2019219273A1 EP 2019056313 W EP2019056313 W EP 2019056313W WO 2019219273 A1 WO2019219273 A1 WO 2019219273A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- deposition
- substance
- microcontroller
- pulse train
- workpiece
- Prior art date
Links
- 238000000034 method Methods 0.000 title claims abstract description 34
- 230000008021 deposition Effects 0.000 claims abstract description 85
- 239000000126 substance Substances 0.000 claims abstract description 51
- 238000005259 measurement Methods 0.000 claims abstract description 26
- 238000012545 processing Methods 0.000 claims abstract description 13
- 238000000151 deposition Methods 0.000 claims description 96
- 238000006073 displacement reaction Methods 0.000 claims description 48
- 238000001514 detection method Methods 0.000 claims description 26
- 238000007639 printing Methods 0.000 claims description 20
- 238000009434 installation Methods 0.000 claims description 17
- 238000001035 drying Methods 0.000 claims description 16
- 238000004381 surface treatment Methods 0.000 claims description 11
- 238000005070 sampling Methods 0.000 claims description 6
- 101100153331 Mus musculus Timp1 gene Proteins 0.000 claims description 5
- 230000005540 biological transmission Effects 0.000 claims description 3
- 238000006243 chemical reaction Methods 0.000 claims description 3
- 230000006870 function Effects 0.000 claims description 3
- 239000003550 marker Substances 0.000 claims description 3
- 230000003287 optical effect Effects 0.000 description 4
- 238000005034 decoration Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000007641 inkjet printing Methods 0.000 description 2
- 239000002318 adhesion promoter Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 230000002596 correlated effect Effects 0.000 description 1
- 230000000994 depressogenic effect Effects 0.000 description 1
- 239000012636 effector Substances 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 230000003116 impacting effect Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 238000013519 translation Methods 0.000 description 1
- 239000002966 varnish Substances 0.000 description 1
- 239000013598 vector Substances 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J3/00—Typewriters or selective printing or marking mechanisms characterised by the purpose for which they are constructed
- B41J3/407—Typewriters or selective printing or marking mechanisms characterised by the purpose for which they are constructed for marking on special material
- B41J3/4073—Printing on three-dimensional objects not being in sheet or web form, e.g. spherical or cubic objects
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J11/00—Devices or arrangements of selective printing mechanisms, e.g. ink-jet printers or thermal printers, for supporting or handling copy material in sheet or web form
- B41J11/0015—Devices or arrangements of selective printing mechanisms, e.g. ink-jet printers or thermal printers, for supporting or handling copy material in sheet or web form for treating before, during or after printing or for uniform coating or laminating the copy material before or after printing
- B41J11/002—Curing or drying the ink on the copy materials, e.g. by heating or irradiating
- B41J11/0021—Curing or drying the ink on the copy materials, e.g. by heating or irradiating using irradiation
- B41J11/00214—Curing or drying the ink on the copy materials, e.g. by heating or irradiating using irradiation using UV radiation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J3/00—Typewriters or selective printing or marking mechanisms characterised by the purpose for which they are constructed
- B41J3/407—Typewriters or selective printing or marking mechanisms characterised by the purpose for which they are constructed for marking on special material
- B41J3/4073—Printing on three-dimensional objects not being in sheet or web form, e.g. spherical or cubic objects
- B41J3/40731—Holders for objects, e. g. holders specially adapted to the shape of the object to be printed or adapted to hold several objects
Definitions
- the present invention relates to the field of surface treatment of parts, and preferably to the printing of parts by ink jet printing means.
- EP 2 873 496 A1, and EP 0 931 649 A1 for printing a workpiece by ink jet printing means
- the printing head which ejects a substance, such as ink, can be moved. by a robotic arm relative to a piece that remains fixed.
- the printing means which most often incorporate a quadric-chromic assembly, are generally bulky, and it is then very difficult to move them. This is all the more true when these printing means are, in addition, associated with a partial drying module drops of the substance, disposed directly under the print head.
- the print heads may be subject to disturbances or positional variations due to the rapid movement of the robotic arm.
- the present invention aims to provide an improved solution, flexible depending on the geometry of the part, to obtain a high accuracy regardless of the geometry of the part and is intended to overcome the aforementioned drawbacks.
- the invention relates to a method of surface treatment of at least one surface of a part
- a measurement step during which displacement means, to which the piece is fixed at a support forming part of the displacement means, are displaced at a speed of displacement that varies according to the local geometry of the piece, according to a predetermined trajectory and, in a controlled manner, by a management and control unit, relative to deposition means not ejecting substance, and during which a set of instantaneous speeds, over at least a fraction of the surface of the part, is determined by means of a measurement sensor controlled by the management and control unit, then data representative of this set of instantaneous speeds are transmitted and recorded in a computer,
- a step of signal processing subsequent to the measurement step, in which a microcontroller determines, from the data representative of the set of instantaneous speeds previously transmitted by the computer to the microcontroller, a pulse train signal representative of a set of frequencies of ejection of a substance to be deposited by the deposition means on said at least a fraction of the surface of the part, and records the pulse train signal in a storage memory of the microcontroller ,
- a deposition step subsequent to the signal processing step, during which the displacement means are moved in a controlled manner by the management and control unit relative to the deposition means, according to the determined trajectory, and in which and, synchronously, the microcontroller transmits the pulse train signal to the deposition means, and the deposition means eject at least one substance according to the pulse train signal received to deposit the substance on said at least a fraction of the surface of the piece.
- the invention also relates to an installation for surface treatment of at least one surface of a room, characterized in that it is suitable and intended for the implementation of the surface treatment method of at least one surface of one piece according to the invention and in that it comprises:
- moving means adapted and intended to move the workpiece relative to deposition means, and the moving means comprising a support adapted and intended to fix the workpiece relative to the moving means
- a management and control unit adapted and intended to control the displacement of the displacement means according to a predetermined path and a predetermined travel speed, in a controlled manner
- a measurement sensor adapted and intended to determine a set of instantaneous speeds over at least a fraction of the surface of the part
- the deposition means being suitable and intended to eject a substance on the surface of the part
- a microcontroller adapted and intended to determine, from the data representative of the set of instantaneous speeds, a pulse train signal representative of a set of ejection frequencies of the substance to be deposited by the depositing means, and transmitting it to the deposition means for ejecting the substance according to the received pulse train signal.
- FIG. 1 is a view of a part of the installation according to the invention
- FIGS. 2A and 2B are views of the installation according to the invention, during the calibration step of the method according to the invention,
- FIG. 3A is a view of the installation according to the invention, during the step of measuring the method according to the invention,
- FIG. 3B is a view of the part on which are represented the vectors of the instantaneous speeds on the surface of the part,
- FIG. 4 is a schematic view illustrating the method according to the invention.
- FIGS. 5A and 5B are views of the signals obtained during the signal processing step of the method according to the invention.
- FIG. 6 is a view of the installation, during the deposition step of the method according to the invention.
- the method of surface treatment of at least one surface 1 of a part 2 is characterized in that it comprises at least: a measurement step, during which displacement means 3, to which the part 2 is fixed at a support 4 forming part of the displacement means 3, are displaced at a speed of displacement that varies according to the local geometry of the part 2, according to a predetermined trajectory and, in a controlled manner, by a management and control unit 5, relative to deposition means 6 not ejecting substance 13, and during which a set of instantaneous speeds v , v2, v3, v4, v5, on at least a fraction of the surface 1 of the part 2, is determined by means of a measurement sensor 9 controlled by the management and control unit 5, then representative data of this set of instantaneous speeds v1, v2, v3, v4, v5 are transmitted and recorded in a computer 7 (FIGS. 3A and 3B),
- a step of signal processing subsequent to the measuring step, in which a microcontroller 8 determines, from the data representative of the set of instantaneous speeds v1, v2, v3, v4, v5 previously transmitted by the computer 7 to the microcontroller 8, a pulse train signal S representative of a set of ejection frequencies of a substance 13 to be deposited by the deposition means 6 on said at least a fraction of the surface 1 of the part 2 , and stores the pulse train signal S in a storage memory (not shown) of the microcontroller 8 (FIGS. 4 and 5B),
- a deposition step subsequent to the signal processing step, during which the displacement means 3 are moved in a controlled manner by the management and control unit 5 relative to the deposition means 6, according to the trajectory determined, and in which and synchronously, the microcontroller 8 transmits the pulse train signal S to the deposition means 6, and the deposition means 6 eject at least one substance 13 as a function of the train signal. S pulses received to deposit the substance 13 on said at least a fraction of the surface 1 of the part 2 ( Figures 4 and 6).
- This treatment method advantageously allows the decoration of a part 2 by creating a pattern (not shown) by depositing at least one substance 13 by means of deposition means 6. Because of the geometry of the part 2, it is generally necessary to vary the speed of movement of the part 2 and therefore that of the displacement means 3, to avoid collisions with the depositing means 6, during the displacement and to deposit the substance 13 while taking care of correcting the speed variations of the moving means 3. Thanks to the treatment method, according to the invention, this variability in the speed of displacement of the displacement means 3 does not affect the quality of the decoration obtained at the end of the process. treatment according to the invention.
- the instantaneous velocities v1, v2, v3, v4, v5 of the part 2 are measured before the deposition step, on a predetermined trajectory, during the measuring step . Then, these instantaneous speeds v1, v2, v3, v4, v5, are stored in a computer 7.
- the instantaneous speeds v1, v2, v3, v4, v5 can be stored as a table T of instantaneous speeds v1, v2 , v3, v4, v5.
- the displacement means 3 it is possible to move again and, subsequently, the part 2, according to the same predetermined trajectory and the same kinematics, that is to say the same speed of displacement, which can be variable or constant, and in particular during the filing step. From these instantaneous speeds v1, v2, v3, v4, v5 stored in the computer 7, then transmitted to the microcontroller 8, it is also possible to generate a pulse train signal S. During the step deposition, and therefore at the same time, that the part 2 is moved by the displacement means 3 according to the predetermined trajectory, this pulse train signal S is transmitted to the deposition means 6.
- the treatment of the part 2 by the deposition means 6 is adapted to the instantaneous speed v1, v2, v3, v4, v5 of the piece 2.
- the frequency of ejection of substance drops 13 by the deposition means 6 is advantageously correlated with the instantaneous speed v1, v2, v3, v4, v5 of part 2.
- the predetermined path and the kinematics of the displacement means 3 can, moreover, be programmed in advance using a software present in G unit management and control 5. This software, as well as the predetermined trajectory and kinematics can be modified according to needs and with great flexibility.
- this treatment process makes it possible to decorate parts 2 having any type of geometry.
- this treatment method makes it possible to position the pattern freely on the surface 1 of the part 2. This method thus makes it possible to obtain a high accuracy in the deposited patterns, and this, in a constant and continuous manner, including in zones in three dimensions of the piece 2, for example, spokes, edges or the like.
- the part 2 may be a three-dimensional part, for example a vehicle trim part, for example plastic.
- the deposition step may comprise several passages of the surface 1 of the part 2, in front of the deposition means 6, in particular when large patterns must be deposited on the surface 1 of the part 2.
- the step of measurement can be made by successive passes of the surface 1 of the part 2 in front of the measuring sensor 9 to scan the entire surface 1 of the part 2 to be decorated, for example tape by tape.
- the management and control unit 5 and the measuring sensor 9 sequentially measure the instantaneous speeds v1, v2, v3, v4, v5, the successive measurements being separated by a period for scanning Tscrut i, Tscrut i + 1, Tscrut i + 2, Tscrut i + 3, Tscrut i + 4 constant or variable, preferentially between 1 microsecond and 100 milliseconds (FIGS. 3A and 3B).
- the acquisition of the instantaneous speed v1, v2, v3, v4, v5 of the part 2 is carried out every 2 milliseconds.
- this measuring step makes it possible to acquire the instantaneous velocity profile v1, v2, v3, v4, v5 over the entire stroke of the trajectory at a scanning period Tscrut i, Tscrut i + 1, Tscrut i + 2 , Tscrut i + 3, Tscrut i + 4.
- This sampling of the profile of the instantaneous speeds v1, v2, v3, v4, v5 of the trajectory is carried out according to the scanning period Tscrut i, Tscrut i + 1, Tscrut i + 2, Tscrut i + 3, Tscrut i + 4 which can
- the scan period Tscrut i, Tscrut i + 1, Tscrut i + 2, Tscrut i + 3, Tscrut i + 4 may vary during the trajectory to allow more or less accuracy according to the complexity of the contour of the room 2 to follow.
- the instantaneous speed profile v1, v2, v3, v4, v5 is converted by the computer 7, preferably a computer, following periods T1, T2, T3, T4, T5 pulse train respecting the scan period Tscrut i, Tscrut i + l, Tscrut i + 2, Tscrut i + 3, Tscrut i + 4 .
- T1 is 166.4 microseconds
- T2 is 163.2 microseconds
- T3 is 168.5 microseconds
- T4 is 170.6 microseconds
- T5 is 171.2 microseconds.
- the set of period values T1, T2, T3, T4, T5 can be placed in a table T, illustrated in FIG.
- the sequence of pulse train periods T1, T2, T3, T4, T5 is transformed into a pulse train signal S sampled at a sampling period Timp , preferably between 5 microseconds to 100 microseconds, by the microcontroller 8 (FIGS. 5A and 5B).
- the sequence of periods T 1, T 2, T 3, T 4, T 5 is then converted by the microcontroller 8 into a periodic signal, preferably with a square pulse train, compatible with the signal of FIG. expected timing by the deposition means 6.
- the Timp sampling period can be reduced to about 50 microseconds.
- each value of the periods T1, T2, T3, T4, T5 is multiplied to create a pulse train signal S of sampling period Timp during the duration of the scan period Tscrut i.
- the pulse trains are then put end to end by the microcontroller 8 to form the pulse train signal S.
- This pulse train signal S is stored in the storage memory (not shown) of the microcontroller 8.
- the pulse train signal S can be square-faced (FIG.
- the method may comprise a calibration step, prior to the deposition step, during which a first detection sensor 9 ', fixed in relation to the deposition means 6, can detect the passage of a reference or reference element 10 disposed on the part 2 or on the support 4 of the displacement means 3, during the displacement of the displacement means 3, to determine the data relating to the spatial coordinates of the reference element or reference 10 ( Figures 2A and 2B).
- the spatial coordinates of the reference or reference element 10 thus determined can be transmitted and stored. relative to the relative data of the set of instantaneous speeds v1, v2, v3, v4, v5 in the computer 7, in order to generate the pulse train signal S with the aid of the microcontroller 8.
- These spatial coordinates of the reference element or reference 10 correspond to a time reference of the pulse train signal S.
- a second detection sensor 9 " fixed relative to the deposition means 6, can detect the passage of a reference or reference element 10 disposed on the part 2 or on the support 4 of the means of displacement 3, then can transmit an SD trigger signal to the microcontroller 8 to trigger the transmission of the pulse train signal S to the deposition means 6 to trigger the ejection of the substance 13 ( Figures 4 and 6).
- the microcontroller 8 upon receiving the trigger signal SD, the microcontroller 8 outputs the pulse train signal S to the deposition means 6, which makes it possible to synchronize the pulse train signal S with the kinematics of the displacement means 3.
- the reference or reference element 10 which can be accurately measured on the real trajectory of the displacement means 3, it is possible to instruct the deposition means 6 to eject the substance 13 good time on piece 2 and not before or after.
- the synchronization can advantageously be made possible by the passage of the piece 2 in front of the second detection sensor 9 ".
- the detection of the reference or reference element 10 can be performed at the beginning of the trajectory.
- the reference or reference element 10 may be a reflecting surface (not shown) affixed to the surface 1 of the part 2 or to the support 4 of the displacement means 3 and the first detection sensor 9 'or the second 9 "sensor detection can be an optical sensor. In this way, when the optical sensor and the reflecting surface are facing each other, the optical sensor measures a variation in light intensity received.
- the measuring sensor 9, the first detection sensor 9 ', the second detection sensor 9 "used may consist of a telemetric sensor module 12 which is fixed relative to the deposition means 6.
- this telemetric sensor module 12 makes it possible in particular to remotely measure the instantaneous speed v1, v2, v3, v4, v5 of the part 2.
- the measurement sensor 9, the first detection sensor 9 ', the second detection sensor 9 may be optical sensors.
- the measurement sensor 9 is fixed relative to the deposition means 6. More precisely, the measurement sensor 9 is disposed near the deposition means 6. Preferably, the distance between the measurement sensor 9 and the deposition means 6 can be between 3 millimeters and 200 millimeters. Furthermore, during the measurement step, the measurement sensor 9 is disposed substantially opposite the fraction of the surface 1 of the part 2 for which the instantaneous speeds v1, v2, v3, v4, v5 must be measured.
- the microcontroller 8 can transmit the pulse train signal S to the deposition means 6 at a period of between 20 and 100 microseconds.
- the microcontroller 8 used may consist of a microcontroller comprising at least said storage memory (not shown) and a volatile memory (not shown).
- the displacement means 3 used may consist of a robotic arm (not shown) comprising six axes of rotation.
- this robotic arm makes it possible to move the part 2 in front of the depositing means 6 and, more particularly, in front of the printing heads (not shown) described hereinafter.
- the axes of rotation, as well as the movement of the robotic arm are not fixed and completely free. This results in a large latitude of movement of the robotic arm relative to the geometry of the part 2.
- the deposition means 6 and the fraction of the surface 1 of the part 2 for which the instantaneous speeds v1, v2, v3, v4, v5 have been measured and on which the substance 13 is deposited, are substantially opposite one another.
- the deposition means 6 used may consist of printing means comprising at least one printing head, preferably of the ink jet type, for ejecting and depositing at least the substance 13 in the form of drops.
- the print heads can also be fixed and are easily accessible. This configuration facilitates the ink supply of the heads printing. In addition, this results in a decrease in disturbances in the accuracy of the pattern to be deposited.
- the print head can however be mobile, but in a limited manner, that is to say mobile in translation along three axes or in rotation, to adapt to the movement and geometry of the part 2.
- the print head can be mono-chromic, bi-chromic, or a quad-chromic set.
- the substance 13 may be selected alone or in combination from an ink, a colored ink, an ultraviolet cross-linked ink, a varnish, a primer, an adhesion promoter, a tackifier, a coating agent.
- the deposition means 6 may generally comprise any type of effector (not shown) making it possible to treat the surface 1 of the part 2 with the aid of at least one substance 13.
- the print heads may comprise a plurality of nozzles (not shown) arranged on ramps (not shown) which are arranged substantially perpendicular to the surface 1 of the part 2, at least during the deposition step.
- the deposition means 6 may be associated with drying means 11 and during the deposition step, the drying means 11 may at least partially dry the substance 13 after deposition of the substance 13 on said at least a fraction of the surface 1 of the room 2.
- drying means 11 may as well allow the partial drying of the drops ejected by the deposition means 6, as the complete final drying.
- the drying means 11 may be a complete ultraviolet drying system.
- the deposition means 6, the measurement sensor 9, the first detection sensor 9 ', the second detection sensor 9 "and, if appropriate, the drying means 11 can be mounted on the same base 14.
- the surface treatment installation of at least one surface 1 of a part 2 is characterized in that it is suitable and intended for the implementation of the surface treatment method of at least one surface 1 of a part 2 as described previously and in that it comprises: displacement means 3 adapted and intended to move the part 2 relative to deposition means 6, and the displacement means 3 comprising a support 4 adapted and intended to fix the part 2 relative to the displacement means 3,
- a management and control unit 5 adapted and intended to control the displacement of the displacement means 3 according to a predetermined trajectory and a predetermined speed of movement, in a controlled manner
- a measurement sensor 9 adapted and intended to determine a set of instantaneous speeds v1, v2, v3, v4, v5 on at least a fraction of the surface 1 of the part 2,
- the deposition means 6 being able and intended to eject a substance 13 on the surface 1 of the part 2,
- a computer 7 adapted and intended to receive and record data representative of the set of instantaneous speeds v1, v2, v3, v4, v5,
- a microcontroller 8 adapted and intended to determine, from the data representative of the set of instantaneous speeds v1, v2, v3, v4, v5, a pulse train signal S representative of a set of ejection frequencies of the substance 13 to be deposited by the deposition means 6, and to transmit it to the deposition means 6 to eject the substance 13 as a function of the pulse train signal S received.
- the installation may comprise a first detection sensor 9 ', fixed relative to the deposition means 6, adapted and intended to detect the passage of a reference or reference element 10 disposed on the part 2 or on the support 4 of the means of displacement 3, to determine the spatial coordinate data of the reference or reference element 10.
- the installation may comprise a second detection sensor 9 ", fixed relative to the deposition means 6, adapted and intended to detect the passage of a reference element or marker 10 disposed on the part 2 or the support 4 of the means of displacement 3, then to transmit an SD trigger signal to the microcontroller 8 to trigger the transmission of the pulse train signal S to the deposition means 6 to trigger the ejection of the substance 13.
- a second detection sensor 9 " fixed relative to the deposition means 6, adapted and intended to detect the passage of a reference element or marker 10 disposed on the part 2 or the support 4 of the means of displacement 3, then to transmit an SD trigger signal to the microcontroller 8 to trigger the transmission of the pulse train signal S to the deposition means 6 to trigger the ejection of the substance 13.
- the measuring sensor 9, the first detection sensor 9 ', the second detection sensor 9 " may be a telemetric sensor module 12 which is fixed relative to the deposition means 6.
- the measurement sensor 9, the first detection sensor 9 ', the second detection sensor 9 " may be as previously described.
- the microcontroller 8 is adapted and adapted to transform the sequence of pulse train periods Tl, T2, T3, T4, T5 into a pulse train signal S sampled at a sampling period Timp, preferably comprised between 5 microseconds to 100 microseconds.
- the microcontroller 8 may comprise at least one storage memory and a volatile memory.
- the displacement means 3 may consist of a robotic arm comprising six axes of rotation.
- This robotic arm can be as described above.
- the deposition means 6 may consist of printing means comprising at least one printing head, preferably of the ink-jet type for depositing at least the substance 13 in the form of drops.
- the installation may comprise drying means 11 associated with the deposition means 6 and the drying means 11 may be suitable and intended to at least partially dry the substance 13 after deposition of the substance 13 on said at least one fraction on the surface 1 of Exhibit 2.
- the drying means 11 may be as described above.
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- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Health & Medical Sciences (AREA)
- General Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Coating Apparatus (AREA)
- Spray Control Apparatus (AREA)
Abstract
Description
Claims
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201980032187.4A CN112218764B (zh) | 2018-05-14 | 2019-03-13 | 对零件进行表面处理的方法以及相关的设备 |
BR112020022910-5A BR112020022910A2 (pt) | 2018-05-14 | 2019-03-13 | procedimento de tratamento de superfície de uma peça e instalação associada |
EP19709074.9A EP3793835B8 (fr) | 2018-05-14 | 2019-03-13 | Procédé de traitement de surface d'une pièce et installation associée |
US17/054,111 US11840102B2 (en) | 2018-05-14 | 2019-03-13 | Method for treating the surfaces of a part and associated facility |
JP2021514472A JP7482856B2 (ja) | 2018-05-14 | 2019-03-13 | 部品の表面を処理する方法および関連設備 |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR1854024A FR3080998B1 (fr) | 2018-05-14 | 2018-05-14 | Procede de traitement de surface d'une piece et installation associee |
FR1854024 | 2018-05-14 |
Publications (1)
Publication Number | Publication Date |
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WO2019219273A1 true WO2019219273A1 (fr) | 2019-11-21 |
Family
ID=62684965
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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PCT/EP2019/056313 WO2019219273A1 (fr) | 2018-05-14 | 2019-03-13 | Procédé de traitement de surface d'une pièce et installation associée |
Country Status (7)
Country | Link |
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US (1) | US11840102B2 (fr) |
EP (1) | EP3793835B8 (fr) |
JP (1) | JP7482856B2 (fr) |
CN (1) | CN112218764B (fr) |
BR (1) | BR112020022910A2 (fr) |
FR (1) | FR3080998B1 (fr) |
WO (1) | WO2019219273A1 (fr) |
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EP0931649A2 (fr) | 1998-01-27 | 1999-07-28 | Eastman Kodak Company | Dispositif et procédé pour imprimer une surface profilée ayant une topologie complexe |
US20090167817A1 (en) | 2007-12-31 | 2009-07-02 | Exatec Llc | Apparatus and method for printing three dimensional articles |
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EP2873496A1 (fr) | 2013-11-18 | 2015-05-20 | ABB Technology AG | Système d'impression |
US20160263920A1 (en) * | 2015-03-13 | 2016-09-15 | Heidelberger Druckmaschinen Ag | Device and method for printing on a surface of an object |
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US7116401B2 (en) * | 1999-03-08 | 2006-10-03 | Asml Netherlands B.V. | Lithographic projection apparatus using catoptrics in an optical sensor system, optical arrangement, method of measuring, and device manufacturing method |
US6360656B2 (en) | 2000-02-28 | 2002-03-26 | Minolta Co., Ltd. | Apparatus for and method of printing on three-dimensional object |
EP1399267B1 (fr) * | 2001-06-01 | 2010-11-03 | Ulvac, Inc. | Appareil de micro-depot |
GB2379414A (en) * | 2001-09-10 | 2003-03-12 | Seiko Epson Corp | Method of forming a large flexible electronic display on a substrate using an inkjet head(s) disposed about a vacuum roller holding the substrate |
US7769487B2 (en) * | 2003-07-24 | 2010-08-03 | Northeastern University | Process and architecture of robotic system to mimic animal behavior in the natural environment |
US7360853B2 (en) * | 2004-03-04 | 2008-04-22 | Fujifilm Dimatix, Inc. | Morphology-corrected printing |
ES2336987B1 (es) * | 2007-12-31 | 2011-03-22 | ON-LASER SYSTEMS & APPLICATIONS, S.L. | Procedimiento y dispositivo de marcaje rotativo. |
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- 2019-03-13 US US17/054,111 patent/US11840102B2/en active Active
- 2019-03-13 WO PCT/EP2019/056313 patent/WO2019219273A1/fr unknown
- 2019-03-13 BR BR112020022910-5A patent/BR112020022910A2/pt unknown
- 2019-03-13 JP JP2021514472A patent/JP7482856B2/ja active Active
- 2019-03-13 EP EP19709074.9A patent/EP3793835B8/fr active Active
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EP0931649A2 (fr) | 1998-01-27 | 1999-07-28 | Eastman Kodak Company | Dispositif et procédé pour imprimer une surface profilée ayant une topologie complexe |
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Also Published As
Publication number | Publication date |
---|---|
EP3793835B8 (fr) | 2022-11-30 |
EP3793835A1 (fr) | 2021-03-24 |
CN112218764A (zh) | 2021-01-12 |
FR3080998B1 (fr) | 2020-04-24 |
BR112020022910A2 (pt) | 2021-02-23 |
US11840102B2 (en) | 2023-12-12 |
EP3793835B1 (fr) | 2022-07-13 |
JP7482856B2 (ja) | 2024-05-14 |
FR3080998A1 (fr) | 2019-11-15 |
JP2021523007A (ja) | 2021-09-02 |
CN112218764B (zh) | 2022-04-29 |
US20210402799A1 (en) | 2021-12-30 |
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