WO2019218525A1 - 一种超低损耗大有效面积单模光纤及其制造方法 - Google Patents
一种超低损耗大有效面积单模光纤及其制造方法 Download PDFInfo
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- WO2019218525A1 WO2019218525A1 PCT/CN2018/102809 CN2018102809W WO2019218525A1 WO 2019218525 A1 WO2019218525 A1 WO 2019218525A1 CN 2018102809 W CN2018102809 W CN 2018102809W WO 2019218525 A1 WO2019218525 A1 WO 2019218525A1
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- Prior art keywords
- core layer
- optical fiber
- effective area
- layer
- single mode
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- 239000013307 optical fiber Substances 0.000 title claims abstract description 56
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 12
- 239000012792 core layer Substances 0.000 claims abstract description 81
- 239000010410 layer Substances 0.000 claims abstract description 62
- 238000005253 cladding Methods 0.000 claims abstract description 57
- 230000000994 depressogenic effect Effects 0.000 claims abstract description 22
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 16
- 229910000272 alkali metal oxide Inorganic materials 0.000 claims abstract description 11
- 235000012239 silicon dioxide Nutrition 0.000 claims abstract description 9
- 229910052731 fluorine Inorganic materials 0.000 claims abstract description 8
- 239000011737 fluorine Substances 0.000 claims abstract description 8
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 claims abstract 2
- 239000000835 fiber Substances 0.000 claims description 71
- 238000000034 method Methods 0.000 claims description 12
- 238000005452 bending Methods 0.000 claims description 10
- 238000000151 deposition Methods 0.000 claims description 10
- 229910000420 cerium oxide Inorganic materials 0.000 claims description 9
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 claims description 9
- 238000006243 chemical reaction Methods 0.000 claims description 8
- 230000008021 deposition Effects 0.000 claims description 6
- 229910001413 alkali metal ion Inorganic materials 0.000 claims description 5
- 238000005229 chemical vapour deposition Methods 0.000 claims description 5
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 4
- 239000001301 oxygen Substances 0.000 claims description 4
- 229910052760 oxygen Inorganic materials 0.000 claims description 4
- 229910003902 SiCl 4 Inorganic materials 0.000 claims description 3
- 239000007789 gas Substances 0.000 claims description 3
- FUJCRWPEOMXPAD-UHFFFAOYSA-N lithium oxide Chemical compound [Li+].[Li+].[O-2] FUJCRWPEOMXPAD-UHFFFAOYSA-N 0.000 claims description 3
- 229910001947 lithium oxide Inorganic materials 0.000 claims description 3
- CHWRSCGUEQEHOH-UHFFFAOYSA-N potassium oxide Chemical compound [O-2].[K+].[K+] CHWRSCGUEQEHOH-UHFFFAOYSA-N 0.000 claims description 3
- 229910001950 potassium oxide Inorganic materials 0.000 claims description 3
- 239000010453 quartz Substances 0.000 claims description 3
- 239000002994 raw material Substances 0.000 claims description 3
- KKCBUQHMOMHUOY-UHFFFAOYSA-N sodium oxide Chemical compound [O-2].[Na+].[Na+] KKCBUQHMOMHUOY-UHFFFAOYSA-N 0.000 claims description 3
- 229910001948 sodium oxide Inorganic materials 0.000 claims description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 3
- 238000005491 wire drawing Methods 0.000 claims description 3
- 229910052732 germanium Inorganic materials 0.000 abstract description 3
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 abstract description 3
- 239000011162 core material Substances 0.000 description 17
- 230000005540 biological transmission Effects 0.000 description 14
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 6
- 230000009022 nonlinear effect Effects 0.000 description 6
- 239000011521 glass Substances 0.000 description 5
- 230000003287 optical effect Effects 0.000 description 5
- 229910052783 alkali metal Inorganic materials 0.000 description 4
- 150000001340 alkali metals Chemical class 0.000 description 4
- 230000008901 benefit Effects 0.000 description 3
- 239000006185 dispersion Substances 0.000 description 3
- 239000002657 fibrous material Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000005684 electric field Effects 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 230000001427 coherent effect Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 239000002019 doping agent Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 1
- 229910052746 lanthanum Inorganic materials 0.000 description 1
- FZLIPJUXYLNCLC-UHFFFAOYSA-N lanthanum atom Chemical compound [La] FZLIPJUXYLNCLC-UHFFFAOYSA-N 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 230000010287 polarization Effects 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
Images
Classifications
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/02—Optical fibres with cladding with or without a coating
- G02B6/02004—Optical fibres with cladding with or without a coating characterised by the core effective area or mode field radius
- G02B6/02009—Large effective area or mode field radius, e.g. to reduce nonlinear effects in single mode fibres
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/02—Optical fibres with cladding with or without a coating
- G02B6/02004—Optical fibres with cladding with or without a coating characterised by the core effective area or mode field radius
- G02B6/02009—Large effective area or mode field radius, e.g. to reduce nonlinear effects in single mode fibres
- G02B6/02014—Effective area greater than 60 square microns in the C band, i.e. 1530-1565 nm
- G02B6/02019—Effective area greater than 90 square microns in the C band, i.e. 1530-1565 nm
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
- C03B37/018—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD] by glass deposition on a glass substrate, e.g. by inside-, modified-, plasma-, or plasma modified- chemical vapour deposition [ICVD, MCVD, PCVD, PMCVD], i.e. by thin layer coating on the inside or outside of a glass tube or on a glass rod
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
- C03B37/018—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD] by glass deposition on a glass substrate, e.g. by inside-, modified-, plasma-, or plasma modified- chemical vapour deposition [ICVD, MCVD, PCVD, PMCVD], i.e. by thin layer coating on the inside or outside of a glass tube or on a glass rod
- C03B37/01807—Reactant delivery systems, e.g. reactant deposition burners
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
- C03B37/018—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD] by glass deposition on a glass substrate, e.g. by inside-, modified-, plasma-, or plasma modified- chemical vapour deposition [ICVD, MCVD, PCVD, PMCVD], i.e. by thin layer coating on the inside or outside of a glass tube or on a glass rod
- C03B37/01807—Reactant delivery systems, e.g. reactant deposition burners
- C03B37/01838—Reactant delivery systems, e.g. reactant deposition burners for delivering and depositing additional reactants as liquids or solutions, e.g. for solution doping of the deposited glass
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/02—Manufacture of glass fibres or filaments by drawing or extruding, e.g. direct drawing of molten glass from nozzles; Cooling fins therefor
- C03B37/025—Manufacture of glass fibres or filaments by drawing or extruding, e.g. direct drawing of molten glass from nozzles; Cooling fins therefor from reheated softened tubes, rods, fibres or filaments, e.g. drawing fibres from preforms
- C03B37/027—Fibres composed of different sorts of glass, e.g. glass optical fibres
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- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/02—Optical fibres with cladding with or without a coating
- G02B6/036—Optical fibres with cladding with or without a coating core or cladding comprising multiple layers
- G02B6/03605—Highest refractive index not on central axis
- G02B6/03611—Highest index adjacent to central axis region, e.g. annular core, coaxial ring, centreline depression affecting waveguiding
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/02—Optical fibres with cladding with or without a coating
- G02B6/036—Optical fibres with cladding with or without a coating core or cladding comprising multiple layers
- G02B6/03616—Optical fibres characterised both by the number of different refractive index layers around the central core segment, i.e. around the innermost high index core layer, and their relative refractive index difference
- G02B6/03622—Optical fibres characterised both by the number of different refractive index layers around the central core segment, i.e. around the innermost high index core layer, and their relative refractive index difference having 2 layers only
- G02B6/03627—Optical fibres characterised both by the number of different refractive index layers around the central core segment, i.e. around the innermost high index core layer, and their relative refractive index difference having 2 layers only arranged - +
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- G—PHYSICS
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- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/02—Optical fibres with cladding with or without a coating
- G02B6/036—Optical fibres with cladding with or without a coating core or cladding comprising multiple layers
- G02B6/03694—Multiple layers differing in properties other than the refractive index, e.g. attenuation, diffusion, stress properties
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/08—Doped silica-based glasses doped with boron or fluorine or other refractive index decreasing dopant
- C03B2201/12—Doped silica-based glasses doped with boron or fluorine or other refractive index decreasing dopant doped with fluorine
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
- C03B2201/31—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with germanium
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
- C03B2201/50—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with alkali metals
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2203/00—Fibre product details, e.g. structure, shape
- C03B2203/10—Internal structure or shape details
- C03B2203/22—Radial profile of refractive index, composition or softening point
- C03B2203/24—Single mode [SM or monomode]
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2203/00—Fibre product details, e.g. structure, shape
- C03B2203/32—Eccentric core or cladding
Definitions
- the present invention relates to the field of optical fibers, and in particular to an ultra low loss large effective area single mode optical fiber and a manufacturing method thereof.
- the introduction of low-loss large-area fiber is the effect of improving the optical signal-to-noise ratio and reducing the nonlinear effect of the system.
- the nonlinear coefficient is a parameter for the performance of the system caused by the nonlinear effect, which is defined as n 2 /A eff .
- n 2 is the nonlinear refractive index of the transmission fiber
- a eff is the effective area of the transmission fiber. It can be seen from the formula that increasing the effective area of the transmission fiber can reduce the nonlinear effect in the fiber.
- the core layer of the optical fiber and the cladding near it mainly determine the basic performance of the optical fiber, and occupy a large proportion in the cost of manufacturing the optical fiber. If the radial dimension of the design is too large, the manufacturing cost of the optical fiber is inevitably increased. Raise the price of fiber.
- the increase of the effective area of the fiber will bring about deterioration of other parameters of the fiber, such as the cut-off wavelength will become larger; in addition, if the fiber refractive index profile is improperly involved, it will also cause bending performance. Deterioration of parameters such as dispersion.
- the attenuation of the fiber is mainly due to the inherent loss of the fiber and the additional loss caused by the conditions of use after the fiber is made.
- the former includes loss due to scattering loss, absorption loss, and imperfect fiber structure. Additional losses include microbend loss and splice loss. In general, the lower the concentration of the dopant material, the smaller the loss caused by Rayleigh scattering.
- pure silicon core fiber can reduce the scattering loss, but the reduction of scattering loss cannot explain the overall transmission of the fiber.
- the loss is reduced, and some transmission losses are not reduced but increased.
- the root cause is mainly the thermal physical property mismatch of the fiber core package material, especially the matching of high temperature viscosity and thermal expansion coefficient. Therefore, in the actual drawing process, the high-temperature viscosity of the fiber material component is matched, resulting in incomplete fiber structure, which seriously affects the reduction of fiber transmission loss, and it is difficult to realize the manufacture of low-loss fiber; on the other hand, the high-temperature viscosity mismatch is due to
- the core material has different characteristic temperatures such as glass softening temperature. During the drawing process, the different specific temperatures of the core package will cause the fiber to have a large residual stress. This both destroys the designed waveguide structure and affects the strength and service life of the fiber.
- an object of the present invention is to provide an ultra-low loss large effective area single mode optical fiber and a manufacturing method thereof, which can reduce the attenuation coefficient, increase the effective area and the bending resistance.
- the technical solution adopted by the present invention is: an ultra-low loss large effective area single mode optical fiber, the bare optical fiber including a core layer and a cladding layer in order from the inside to the outside, the core layer including from the inside to the outside a core layer and an outer core layer, wherein the inner core layer has a radius R 1 of 1.5 to 3 ⁇ m, and the inner core layer has a relative refractive index difference ⁇ 1 of -0.01% ⁇ ⁇ 1 ⁇ 0, the outer core
- the radius R 2 of the layer is 5-6 ⁇ m, the relative refractive index difference ⁇ 2 of the outer core layer is 0 ⁇ ⁇ 2 ⁇ 0.05%; the core layer is hardly doped, and the core layer is oxidized by fluorine and alkali metal.
- the cladding layer includes a depressed cladding layer and an outer cladding layer which are sequentially disposed from the inside to the outside.
- the radius R 3 of the depressed cladding layer is 40-50 ⁇ m, and the relative refractive index difference ⁇ 3 of the depressed cladding layer is ⁇ 0.25% ⁇ ⁇ 3 ⁇ -0.15%, the ratio of the depressed cladding radius R 3 to the outer core layer radius R 2 R 3 /R 2 ⁇ 8, the outer cladding radius R 4 is 62.5 ⁇ m, and the outer cladding layer is Pure silica glass layer.
- the refractive index of the ruthenium in the outer core layer to the outer core layer is 0.01% to 0.05%.
- the content of alkali metal ions in the core layer is 5 to 1000 ppm.
- the alkali metal oxide is one or more of lithium oxide, sodium oxide, potassium oxide, cerium oxide, cerium oxide, and cerium oxide.
- the effective area of the single mode fiber at a wavelength of 1550 nm is 110 to 140 um 2 .
- the attenuation coefficient of the single mode fiber at a wavelength of 1550 nm is less than 0.170 dB/Km.
- the macrobend loss at a wavelength of 1550 nm is equal to or less than 0.40 dB/Km.
- the single mode fiber has a mode field diameter of 11 to 13 um at a wavelength of 1550 nm.
- the present invention also provides a method for fabricating an ultra low loss large effective area single mode fiber according to any of the above, comprising the steps of: depositing an optical fiber preform on a quartz reaction tube by plasma chemical vapor deposition, the optical fiber
- the preform is made of SiCl 4 , GeCl 4 and C 2 F 6
- the designed light rod profile is prepared by changing the gas flow rate and ratio, as well as the moving speed and deposition number of the reaction zone during the manufacturing process.
- a certain concentration of alkali metal oxide is added, and oxygen is introduced to carry out the reaction to remove water, and finally the high temperature is melted into a rod to prepare an alkali-prepared optical fiber preform, and the alkali-doped optical fiber preform is subjected to wire drawing treatment.
- the temperature of the optical fiber preform drawing is 1800 to 2000 °C.
- the single-mode optical fiber provided by the present invention has a mode field diameter of 12.1 to 13 um at a working wavelength of 1550 nm, which can not only reduce the power density of light, but also increase the effective area of the optical fiber, and the effective area thereof is higher than 122 um 2 . Even reached 130um 2 or so.
- the single-mode optical fiber provided by the present invention has a radius R 1 of the inner core layer of 1.5 to 3 ⁇ m and a radius R 2 of the outer core layer of 5 to 6 ⁇ m.
- the diameter of the core layer is not large, and the cutoff wavelength is not more than 1530 nm. Even reaching 1450nm.
- the invention can reduce the macrobend loss under the bending state of the optical fiber and has superior bending performance, and the macrobend loss of the single mode fiber at the working wavelength of 1550 nm under the bending radius of 10 mm*1 circle Not more than 0.40 dB/km.
- the single-point splice loss is less than 0.05 dB.
- the single-mode fiber diameter is 125um as an example.
- the working wavelength is 1550nm, the attenuation coefficient can reach 0.17dB/km or less, even reaching 0.155dB/Km, which has ultra-low loss characteristics.
- the single-mode optical fiber provided by the present invention by satisfying the waveguide design, limits the relative refractive index and the size ratio of the core layer and the cladding layer, so that the single-mode optical fiber has a large effective area characteristic, and at the same time, satisfies
- the core package viscosity is optimized by limiting the specific composition of the relative refractive index (the refractive index of the enthalpy and fluorine contribution) and doping the alkali metal to reduce the stress between the core layer and the cladding layer.
- the ultra-low loss characteristics of the fiber are realized, and finally the single mode fiber has the characteristics of ultra-low loss and large effective area, which can not only reduce the nonlinear effect in the fiber, but also improve the optical signal noise.
- the transmission capacity is improved, and the diameter of the optical fiber is not very large, and the cut-off wavelength is not more than 1530 nm, which has a good application prospect and social benefit.
- FIG. 1 is a schematic cross-sectional structural view of a bare fiber of a single mode fiber according to an embodiment of the present invention
- FIG. 2 is a schematic diagram of a refractive index provided by an embodiment of the present invention.
- Deposition The process in which a fiber raw material chemically reacts to form doped quartz glass under a certain environment.
- Melting The process of gradually burning a hollow glass tube after deposition into a solid glass rod under a certain heat source.
- Casing A high-purity quartz glass tube that meets a certain cross-sectional area and dimensional uniformity.
- Base tube High purity quartz glass tube for deposition.
- Refractive Index Profile A plot of the refractive index of a fiber or fiber preform (including a fiber core rod) versus its radius.
- Relative refractive index ( ⁇ %) Where n i is the refractive index of the i-th fiber material, i is a positive integer, and n 0 is the refractive index of pure quartz glass.
- E is the transverse component of the electric field associated with propagation and r is the radius of the fiber.
- E is the transverse component of the electric field associated with propagation and r is the radius of the fiber.
- PCVD Plasma chemical vapor deposition.
- MCVD Improved chemical vapor deposition.
- VAD axial vapor deposition
- an embodiment of the present invention provides an ultra-low loss large effective area single mode optical fiber, wherein the bare optical fiber includes a core layer and a cladding layer from the inside to the outside, and the core layer includes the inner layer and the outer layer.
- the inner core layer 1 and the outer core layer 2 the inner core layer 1 has a radius R 1 of 1.5 to 3 ⁇ m, and the inner core layer 1 has a relative refractive index difference ⁇ 1 of -0.01% ⁇ ⁇ 1 ⁇ 0, and the outer core layer 2
- the radius R 2 is 5-6 ⁇ m, and the relative refractive index difference ⁇ 2 of the outer core layer 2 is 0 ⁇ ⁇ 2 ⁇ 0.05%;
- the core layer is hardly doped with lanthanum, and the core layer is silicon dioxide co-doped with fluorine and alkali metal oxide.
- the glass layer; the cladding layer includes a depressed cladding layer 3 and an outer cladding layer 4 which are disposed in order from the inside to the outside.
- the radius R 3 of the depressed cladding layer 3 is 40 to 50 ⁇ m, and the relative refractive index difference ⁇ 3 of the depressed cladding layer 3 is -0.25%. ⁇ 3 ⁇ -0.15%, depressed cladding layer 3 and the outer core radius R 3 2 R 2 ratio of the radius R 3 / R 2 ⁇ 8, outer radius R 4 layer 4 is 62.5 ⁇ m, a pure silica outer cladding 4 Silicon glass layer.
- the inner core layer 1 has a relative refractive index of n1.
- the outer core layer 2 has a relative refractive index of n2.
- the relative refractive index of the depressed cladding 3 is n3.
- the outer cladding 4 has a relative refractive index of n4.
- the relative refractive index difference is adopted, and the relative refractive index n4 of the outer cladding 4 is used, and there is a relative refractive index difference between the layers, and the present invention measures and implements the present invention.
- the relative refractive index difference is calculated as follows:
- n is the refractive index of the corresponding layer compared to the relative refractive index of the outer cladding 4.
- ⁇ in the above formula is the relative refractive index difference ⁇ 1 of the inner core layer 1
- n is the relative refractive index n1 of the inner core layer 1;
- ⁇ in the above formula is the relative refractive index difference ⁇ 2 of the outer core layer 2
- n is the relative refractive index n2 of the outer core layer 2;
- ⁇ in the above formula is the relative refractive index difference ⁇ 3 of the depressed cladding layer 3
- n is the relative refractive index n3 of the depressed cladding layer 3.
- the core layer is hardly doped, and it should be understood that the content of the germanium in the core layer is controlled so that the refractive index of the outer core layer in the outer core layer is 0.01% to 0.05%, and the inner core The contribution of germanium in the layer to the inner core layer has a refractive index of 0.02% to 0.08%.
- the content of alkali metal ions in the core layer is 5 to 1000 ppm.
- the alkali metal oxide is one or more of lithium oxide, sodium oxide, potassium oxide, cerium oxide, cerium oxide, and cerium oxide.
- the single mode fiber has an effective area of 110 to 140 um 2 at a wavelength of 1550 nm.
- the single mode fiber has an attenuation coefficient at a wavelength of 1550 nm of less than 0.170 dB/Km.
- the single mode fiber was wound at a wavelength of 1550 nm when it was wound one turn at a 10 mm bend radius.
- the single mode fiber has a mode field diameter of 11 to 13 um at a wavelength of 1550 nm.
- the embodiment provides a method for manufacturing the ultra low loss large effective area single mode fiber, comprising the steps of: depositing an optical fiber preform on a quartz reaction tube by plasma chemical vapor deposition, and using an electroconductive preform of SiCl 4 , GeCl 4 , C 2 F 6 is the raw material.
- the designed light bar profile is prepared by changing the gas flow rate and ratio, as well as the moving speed and deposition number of the reaction zone, and adding a certain concentration of alkali metal oxide during the forming process.
- the oxygen is reacted to remove water, and finally melted into a rod at a high temperature to prepare an alkali-prepared optical fiber preform, and the alkali-doped optical fiber preform is subjected to wire drawing treatment.
- the temperature of the optical fiber preform drawing is 1800-2000 ° C
- the outer cladding of the optical fiber preform is a pure silica quartz glass layer prepared by OVD, VAD and MCVD.
- the alkali metal oxide can be added to reduce the attenuation caused by hydroxide at the wavelength of 1383 nm in the process of shrinking the rod, and at the same time, by optimizing the fluorine and alkali metal ion doping.
- the concentration can match the viscosity of the core layer and the cladding layer, thereby effectively reducing the increase in fiber attenuation caused by the core stress concentration during the drawing process.
- a certain concentration of alkali metal oxide is doped into the optical fiber, so that the reaction product with oxygen can be dehydrated to reduce the attenuation at the wavelength of 1383 nm, and the core alkali metal ion concentration is optimized, the core stress is lowered, and the core package viscosity is matched.
- the present invention is produced by a PCVD deposition method, and can effectively control the refractive index distribution of each layer.
- PCVD deposition method a PCVD deposition method
- Embodiments 3 to 7 five specific examples of Embodiments 3 to 7 will be described.
- the single-mode optical fiber provided by the present invention has a mode field diameter of 12.1 to 13 um at a working wavelength of 1550 nm, which can not only reduce the power density of light but also increase the effective area of the optical fiber, which is effective.
- the area is higher than 122um 2 and even reaches 130um 2 or so.
- the single-mode optical fiber provided by the invention has a radius R 1 of the inner core layer 1 of 1.5 to 3 ⁇ m, a radius R 2 of the outer core layer 2 of 5 to 6 ⁇ m, a diameter of the core layer is not large, and a cutoff wavelength of not more than 1530 nm, or even Up to 1450nm.
- the invention can reduce the macrobend loss under the bending state of the optical fiber and has superior bending performance.
- the single-mode optical fiber has a macrobend loss of not more than 0.40 at a working wavelength of 1550 nm in a case where the bending radius is 10 mm*1 turn. dB/km.
- the single point splice loss is less than 0.05 dB.
- the single-mode fiber diameter is 125um as an example.
- the working wavelength is 1550nm, the attenuation coefficient can reach 0.17dB/km or less, even reaching 0.155dB/Km, which has ultra-low loss characteristics.
- the present invention can be used as a comparative example in the patent application with the publication number CN106125192A, in which the attenuation coefficient of the optical fiber at 1550 nm is less than or equal to 0.165 dB/km, and the mode field area is greater than or equal to 110 um 2 , with respect to the comparative example, the present invention More specifically, the fiber refractive index profile is provided to meet the waveguide requirements of ultra-low loss large effective area single mode fiber. At the same time, the doping content of bismuth, fluorine and alkali metal and the size ratio of core layer and cladding are specified. The effective area is further improved while ensuring ultra-low attenuation performance, so that the single-mode fiber provided by the present invention has an attenuation coefficient of 0.155 dB/Km at 1550 nm and an effective area of 133 um 2 .
- the single-mode optical fiber provided by the present invention by satisfying the waveguide design, limits the relative refractive index and the size ratio of the core layer and the cladding layer, so that the single-mode optical fiber has a large effective area characteristic, and at the same time, satisfies
- the core package viscosity is optimized by limiting the specific composition of the relative refractive index (the refractive index of the enthalpy and fluorine contribution) and doping the alkali metal to reduce the stress between the core layer and the cladding layer.
- the ultra-low loss characteristics of the fiber are realized, and finally the single mode fiber has the characteristics of ultra-low loss and large effective area, which can not only reduce the nonlinear effect in the fiber, but also improve the optical signal noise.
- the transmission capacity is improved, and the diameter of the optical fiber is not very large, and the cut-off wavelength is not more than 1530 nm, which has a good application prospect and social benefit.
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Abstract
本发明公开了一种超低损耗大有效面积单模光纤及制造方法,其裸光纤由内到外依次包括芯层和包层,所述芯层包括由内而外依次设置的内芯层和外芯层,所述内芯层的半径R 1为1.5~3μm,所述内芯层的相对折射率差Δ 1为-0.01%≤Δ 1≤0,所述外芯层的半径R 2为5~6μm,所述外芯层的相对折射率差Δ 2为0≤Δ 2≤0.05%;所述芯层几乎不掺锗,所述芯层为氟与碱金属氧化物共掺的二氧化硅玻璃层;所述包层包括由内而外依次设置的下陷包层和外包层,所述下陷包层的半径R 3为40~50μm,所述下陷包层的相对折射率差Δ 3为-0.25%≤Δ 3≤-0.15%,所述下陷包层半径R 3与所述外芯层半径R 2的比例R 3/R 2≥8,所述外包层半径R 4为62.5μm,所述外包层为纯二氧化硅玻璃层。本发明能够降低衰减系数,增大有效面积。
Description
本发明涉及光纤领域,具体涉及一种超低损耗大有效面积单模光纤及其制造方法。
随着相干传输技术的出现,在光纤传输领域,原有限制长距离、大容量和高速率传输的一些重要指标已经不再是主要限制因素,在未来的传输系统中色散和偏振模色散的指标将进一步的放宽。然而,传输容量和距离的增长需要更高的入纤功率和更低的光纤损耗来满足可分辨的信噪比需求。而随着光纤功率的增加,不可避免地在光纤芯层产生相位调制、交叉相位调制、四波混频等非线性效应,尤其会产生阈值较低的受激布里渊散射效应,这些效应的产生使得系统产生信号串扰,或者系统的信噪比降低,从而无法继续提高传输容量。
引入低损耗大有效面积光纤,就是为系统提高光信噪比和降低非线性效应的效果。当采用高功率密度系统时,非线性系数是用于非线性效应造成的系统性能优劣的参数,其定义为n
2/A
eff。其中,n
2是传输光纤的非线性折射指数,A
eff是传输光纤的有效面积。由公式可以看出,增加传输光纤的有效面积,能够降低光纤中的非线性效应。
目前大有效面积的折射率剖面设计中,往往通过增大用于传输光信号的光学芯层的直径获得大的有效面积。该类方案存在着一定的设计难点。一方面,光纤的芯层和靠近它的包层主要决定光纤的基本性能,并在光纤制造的成本中占据较大的比重,如果设计的径向尺寸过 大,必然会增加光纤的制造成本,抬高光纤价格。另一方面,相比普通单模光纤,光纤有效面积的增大,会带来光纤其它一些参数的恶化,比如截止波长会变大;此外,光纤折射率剖面如果涉及不当,还会导致弯曲性能、色散等参数的恶化。
在光纤材料中,光纤的衰减主要来源于光纤的固有损耗和光纤制成之后使用条件所造成的附加损耗。前者包括散射损耗、吸收损耗和光纤结构不完善引起的损耗。附加损耗包括微弯损耗和接续损耗。一般来说,掺杂材料的浓度越低,则瑞利散射所引起的损耗越小。
目前采用纯硅芯光纤可以减小散射损耗,但是散射损耗的降低不能说明光纤的整体传输。损耗得到了减低,而且有的传输损耗不但没有降低反而增加。其根本原因主要是光纤芯包材料的热物理性能失配,特别是高温粘度和热膨胀系数的匹配。因此,在实际拉丝过程中光纤材料组分的高温粘度匹配,导致光纤结构不完整,严重影响到了光纤传输损耗的降低,难以实现低损耗光纤的制造;在另一方面,高温粘度失配是由于芯包材料具有不同的玻璃软化温度等特征温度,在拉丝过程中,芯包不同的特定温度又将导致光纤存有很大的残余应力。这既破坏了设计的波导结构,又影响了光纤的强度和使用寿命。
发明内容
针对现有技术中存在的缺陷,本发明的目的在于提供一种超低损耗大有效面积单模光纤及其制造方法,能够降低衰减系数,增大有效面积和抗弯性能。
为达到以上目的,本发明采取的技术方案是:一种超低损耗大有效面积单模光纤,其裸光纤由内到外依次包括芯层和包层,所述芯层包括由内而外依次设置的内芯层和外芯层,所述内芯层的半径R
1为1.5~3μm,所述内芯层的相对折射率差Δ
1为-0.01%≤Δ
1≤0,所述 外芯层的半径R
2为5~6μm,所述外芯层的相对折射率差Δ
2为0≤Δ
2≤0.05%;所述芯层几乎不掺锗,所述芯层为氟与碱金属氧化物共掺的二氧化硅玻璃层;
所述包层包括由内而外依次设置的下陷包层和外包层,所述下陷包层的半径R
3为40~50μm,所述下陷包层的相对折射率差Δ
3为-0.25%≤Δ
3≤-0.15%,所述下陷包层半径R
3与所述外芯层半径R
2的比例R
3/R
2≥8,所述外包层半径R
4为62.5μm,所述外包层为纯二氧化硅玻璃层。
在上述技术方案的基础上,所述外芯层中的锗对所述外芯层的贡献折射率为0.01%~0.05%。
在上述技术方案的基础上,所述芯层中碱金属离子的含量为5~1000ppm。
在上述技术方案的基础上,所述碱金属氧化物为氧化锂、氧化钠、氧化钾、氧化铷、氧化铯、氧化钫中的一种或多种。
在上述技术方案的基础上,该单模光纤在1550nm波长的有效面积为110~140um
2。
在上述技术方案的基础上,该单模光纤在1550nm波长处的衰减系数小于0.170dB/Km。
在上述技术方案的基础上,该单模光纤在10mm弯曲半径下卷绕一圈时,在1550nm波长处的宏弯损耗等于或小于0.40dB/Km。
在上述技术方案的基础上,该单模光纤在1550nm波长处的模场直径为11~13um。
本发明还提供了一种如上述任一所述的超低损耗大有效面积单模光纤的制造方法,包括如下步骤:采用等离子化学气相沉积在石英反应管上沉积制作光纤预制棒,所述光纤预制棒采用SiCl
4、GeCl
4、 C
2F
6为原料,在制作过程中通过改变气体流量和比例,以及反应区的移动速度和沉积趟数制备出设计的光棒剖面,并在成棒过程中加入一定浓度碱金属氧化物,同时通入氧气进行反应去水,最后高温熔缩成棒,制备出掺碱金属的光纤预制棒,将该掺碱金属的光纤预制棒进行拉丝处理。
在上述技术方案的基础上,所述光纤预制棒拉丝的温度为1800~2000℃。
与现有技术相比,本发明的优点在于:
(1)本发明提供的单模光纤,在1550nm工作波长处的模场直径为12.1~13um,不仅能够降低光的功率密度,而且能够增大光纤的有效面积,其有效面积高于122um
2,甚至达到了130um
2左右。
(2)本发明提供的单模光纤,内芯层的半径R
1为1.5~3μm,外芯层的半径R
2为5~6μm,芯层的直径并非很大,而截止波长不大于1530nm,甚至达到1450nm。
(3)本发明能够减小光纤弯曲状态下的宏弯损耗,具有优越的抗弯性能,该单模光纤在弯曲半径为10mm*1圈的情况下,在工作波长为1550nm处的宏弯损耗不大于0.40dB/km。
(4)当该单模光纤互相熔接时,单点熔接损耗小于0.05dB。并且以单模光纤直径为125um为例进行测试,当工作波长在1550nm时,其衰减系数可达到0.17dB/km以下,甚至达到了0.155dB/Km,具有超低损耗的特性。
总之,本发明提供的单模光纤,在满足该波导设计的情况下,通过限制芯层和包层的相对折射率和尺寸比例,使得该单模光纤具有大有效面积的特性,同时,在满足该波导设计中相对折射率的情况下,通过限制相对折射率的具体组成(锗和氟的贡献折射率),并掺杂碱 金属以降低芯层和包层之间的应力,优化芯包粘度,从而达到了芯包粘度的匹配,实现了光纤的超低损耗的特性,最终使得该单模光纤具有超低损耗大有效面积的特性,不仅能够降低光纤中的非线性效应,提高光信噪比,提高了传输容量,而且光纤的直径并非很大,截止波长不大于1530nm,具有较好的应用前景和社会效益。
图1为本发明实施例提供的单模光纤的裸光纤剖面结构示意图;
图2为本发明实施例提供的折射率示意图。
图中:1、内芯层;2、外芯层;3、下陷包层;4、外包层;n2、外芯层的相对折射率;R
1、内芯层的半径;R
2、外芯层的半径;R
3、下陷包层的半径;R
4、外包层的半径;Δ
1、内芯层的相对折射率差;Δ
2、外芯层的相对折射率差;Δ
3、下陷包层的相对折射率差。
以下结合附图及实施例对本发明作进一步详细说明。
本发明涉及的专业术语定义如下:
沉积:光纤原材料在一定的环境下发生化学反应生成掺杂的石英玻璃的工艺过程。
熔缩:将沉积后的空心玻璃管在一定的热源下逐渐烧成实心玻璃棒的工艺过程。
套管:满足一定截面积和尺寸均匀性的高纯石英玻璃管。
基管:用于沉积的高纯石英玻璃管。
折射率剖面(RIP):光纤或光纤预制棒(包括光纤芯棒)的折射率与其半径之间的关系曲线。
有效面积:
其中,E为与传播有关的电场横向分量,r为光纤半径。
模场直径:
其中,E为与传播有关的电场横向分量,r为光纤半径。
PCVD:等离子化学气相沉积。
MCVD:改进的化学气相沉积。
OVD:外部气相沉积。
VAD:轴向气相沉积。
实施例1
参见图1和图2所示,本发明实施例提供一种超低损耗大有效面积单模光纤,其裸光纤由内到外依次包括芯层和包层,芯层包括由内而外依次设置的内芯层1和外芯层2,内芯层1的半径R
1为1.5~3μm,内芯层1的相对折射率差Δ
1为-0.01%≤Δ
1≤0,外芯层2的半径R
2为5~6μm,外芯层2的相对折射率差Δ
2为0≤Δ
2≤0.05%;芯层几乎不掺锗,芯层为氟与碱金属氧化物共掺的二氧化硅玻璃层;包层包括由内而外依次设置的下陷包层3和外包层4,下陷包层3的半径 R
3为40~50μm,下陷包层3的相对折射率差Δ
3为-0.25%≤Δ
3≤-0.15%,下陷包层3半径R
3与外芯层2半径R
2的比例R
3/R
2≥8,外包层4半径R
4为62.5μm,外包层4为纯二氧化硅玻璃层。
内芯层1的相对折射率为n1。
外芯层2的相对折射率为n2。
下陷包层3的相对折射率为n3。
外包层4的相对折射率为n4。
本发明在实现上述折射率时,采用相对折射率差的方式,以外包层4的相对折射率n4为基础,各层之间都有一个相对折射率差,以此标准来测算并实现本发明的各层折射率。相对折射率差采用的计算公式如下:
Δ=(n-n4)/(n+n4)*100%;
其中,n为与外包层4相对折射率相比较的对应层的折射率。
当计算内芯层1与外包层4相对折射率差时,上述公式中的Δ为内芯层1的相对折射率差Δ
1,n为内芯层1的相对折射率n1;
当计算外芯层2与外包层4相对折射率差时,上述公式中的Δ为外芯层2的相对折射率差Δ
2,n为外芯层2的相对折射率n2;
当计算下陷包层3与外包层4相对折射率差时,上述公式中的Δ为下陷包层3的相对折射率差Δ
3,n为下陷包层3的相对折射率n3。
该单模光纤中,芯层几乎不掺锗,应当被理解为,控制锗在芯层内的含量,使得外芯层中的锗对外芯层的贡献折射率为0.01%~0.05%,内芯层中的锗对内芯层的贡献折射率为0.02%~0.08%。
该单模光纤中,芯层中碱金属离子的含量为5~1000ppm。
该单模光纤中,碱金属氧化物为氧化锂、氧化钠、氧化钾、氧化铷、氧化铯、氧化钫中的一种或多种。
该单模光纤在1550nm波长的有效面积为110~140um
2。
该单模光纤在1550nm波长处的衰减系数小于0.170dB/Km。
该单模光纤在10mm弯曲半径下卷绕一圈时,在1550nm波长处。
该单模光纤在1550nm波长处的模场直径为11~13um。
实施例2
本实施例提供了上述超低损耗大有效面积单模光纤的制造方法,包括如下步骤:采用等离子化学气相沉积在石英反应管上沉积制作光纤预制棒,光纤预制棒采用SiCl
4、GeCl
4、C
2F
6为原料,在制作过程中通过改变气体流量和比例,以及反应区的移动速度和沉积趟数制备出设计的光棒剖面,并在成棒过程中加入一定浓度碱金属氧化物,同时通入氧气进行反应去水,最后高温熔缩成棒,制备出掺碱金属的光纤预制棒,将该掺碱金属的光纤预制棒进行拉丝处理。
其中,光纤预制棒拉丝的温度为1800~2000℃,光纤预制棒的外包层为由OVD、VAD和MCVD制备的纯二氧化硅石英玻璃层。
本发明,在满足芯包折射率设计前提下,在缩棒过程中,通过加入碱金属氧化物,既可以降低1383nm波长处由氢氧根引起的衰减,同时通过优化氟、碱金属离子掺杂浓度,可以匹配芯层和包层的粘度,从而有效降低了拉丝过程中纤芯应力集中所造成的光纤衰减增加。
本发明,在光纤中掺入一定浓度碱金属氧化物,使其与氧气反应产物可以脱水从而降低1383nm波长处衰减,同时优化芯层碱金属离子浓度,降低纤芯应力,使芯包粘度匹配。
实施例3~7
本发明中采用PCVD沉积法制作,能有效控制各层折射率分布,以下通过实施例3~7这5个具体实施例进行说明。
表1、本发明单模光纤折射率剖面及掺杂材料含量
表2、本发明单模光纤的主要性能参数
从上面表2中可以看到,本发明提供的单模光纤,在1550nm工作波长处的模场直径为12.1~13um,不仅能够降低光的功率密度,而且能够增大光纤的有效面积,其有效面积高于122um
2,甚至达到了130um
2左右。
本发明提供的单模光纤,内芯层1的半径R
1为1.5~3μm,外芯层2的半径R
2为5~6μm,芯层的直径并非很大,而截止波长不大于1530nm,甚至达到1450nm。
本发明能够减小光纤弯曲状态下的宏弯损耗,具有优越的抗弯性能,该单模光纤在弯曲半径为10mm*1圈的情况下,在工作波长为1550nm处的宏弯损耗不大于0.40dB/km。
当该单模光纤互相熔接时,单点熔接损耗小于0.05dB。并且以单模光纤直径为125um为例进行测试,当工作波长在1550nm时,其衰减系数可达到0.17dB/km以下,甚至达到了0.155dB/Km,具有超低损耗的特性。
本发明可以采用公开号为CN106125192A的专利申请作为对比例,该对比例中,光纤在1550nm时的衰减系数小于等于0.165dB/km,模场面积大于等于110um
2,相对于该对比例,本发明更加具体地提供了光纤折射率剖面以满足超低损耗大有效面积单模光纤的波导要求,同时,对锗、氟以及碱金属的掺杂含量以及芯层和包层的尺寸比例做了具体的限定,在保证超低衰减性能的同时,有效面积得到了进一步地提升,使得本发明提供的单模光纤1550nm时的衰减系数达到了0.155dB/Km,有效面积达到了133um
2。
总之,本发明提供的单模光纤,在满足该波导设计的情况下,通过限制芯层和包层的相对折射率和尺寸比例,使得该单模光纤具有大有效面积的特性,同时,在满足该波导设计中相对折射率的情况下,通过限制相对折射率的具体组成(锗和氟的贡献折射率),并掺杂碱金属以降低芯层和包层之间的应力,优化芯包粘度,从而达到了芯包粘度的匹配,实现了光纤的超低损耗的特性,最终使得该单模光纤具有超低损耗大有效面积的特性,不仅能够降低光纤中的非线性效应,提高光信噪比,提高了传输容量,而且光纤的直径并非很大,截止波长不大于1530nm,具有较好的应用前景和社会效益。
本发明不局限于上述实施方式,对于本技术领域的普通技术人员来说,在不脱离本发明原理的前提下,还可以做出若干改进和润饰,这些改进和润饰也视为本发明的保护范围之内。本说明书中未作详细描述的内容属于本领域专业技术人员公知的现有技术。
Claims (10)
- 一种超低损耗大有效面积单模光纤,其裸光纤由内到外依次包括芯层和包层,其特征在于:所述芯层包括由内而外依次设置的内芯层(1)和外芯层(2),所述内芯层(1)的半径R 1为1.5~3μm,所述内芯层(1)的相对折射率差Δ 1为-0.01%≤Δ 1≤0,所述外芯层(2)的半径R 2为5~6μm,所述外芯层(2)的相对折射率差Δ 2为0≤Δ 2≤0.05%;所述芯层几乎不掺锗,所述芯层为氟与碱金属氧化物共掺的二氧化硅玻璃层;所述包层包括由内而外依次设置的下陷包层(3)和外包层(4),所述下陷包层(3)的半径R 3为40~50μm,所述下陷包层(3)的相对折射率差Δ 3为-0.25%≤Δ 3≤-0.15%,所述下陷包层(3)半径R 3与所述外芯层(2)半径R 2的比例R 3/R 2≥8,所述外包层(4)半径R 4为62.5μm,所述外包层(4)为纯二氧化硅玻璃层。
- 如权利要求1所述的超低损耗大有效面积单模光纤,其特征在于:所述外芯层(2)中的锗对所述外芯层(2)的贡献折射率为0.01%~0.05%。
- 如权利要求1所述的超低损耗大有效面积单模光纤,其特征在于:所述芯层中碱金属离子的含量为5~1000ppm。
- 如权利要求1所述的超低损耗大有效面积单模光纤,其特征在于:所述碱金属氧化物为氧化锂、氧化钠、氧化钾、氧化铷、氧化铯、氧化钫中的一种或多种。
- 如权利要求1所述的超低损耗大有效面积单模光纤,其特征在于:该单模光纤在1550nm波长的有效面积为110~140um 2。
- 如权利要求1所述的超低损耗大有效面积单模光纤,其特征在于:该单模光纤在1550nm波长处的衰减系数小于0.170dB/Km。
- 如权利要求1所述的超低损耗大有效面积单模光纤,其特征在于:该单模光纤在10mm弯曲半径下卷绕一圈时,在1550nm波长处的宏弯损耗等于或小于0.40dB/Km。
- 如权利要求1所述的超低损耗大有效面积单模光纤,其特征在于:该单模光纤在1550nm波长处的模场直径为11~13um。
- 一种如权利要求1至8任一所述的超低损耗大有效面积单模光纤的制造方法,其特征在于,包括如下步骤:采用等离子化学气相沉积在石英反应管上沉积制作光纤预制棒,所述光纤预制棒采用SiCl 4、GeCl 4、C 2F 6为原料,在制作过程中通过改变气体流量和比例,以及反应区的移动速度和沉积趟数制备出设计的光棒剖面,并在成棒过程中加入一定浓度碱金属氧化物,同时通入氧气进行反应去水,最后高温熔缩成棒,制备出掺碱金属的光纤预制棒,将该掺碱金属的光纤预制棒进行拉丝处理。
- 如权利要求9所述的超低损耗大有效面积单模光纤的制造方法,其特征在于:所述光纤预制棒拉丝的温度为1800~2000℃。
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