WO2019216379A1

WO2019216379A1 - Substrate processing method, substrate processing device, and computer program

Info

Publication number: WO2019216379A1
Application number: PCT/JP2019/018577
Authority: WO
Inventors: 俊樹森井
Original assignee: 株式会社Ｓｃｒｅｅｎホールディングス
Priority date: 2018-05-11
Filing date: 2019-05-09
Publication date: 2019-11-14
Also published as: KR102398820B1; TW201947654A; CN112106175A; JP6981918B2; TW202046399A; TWI706458B; CN112106175B; JP2019197871A; KR20200138354A; TWI770598B

Abstract

In the present invention, one processing section is selected from among a plurality of processing sections on the basis of the final section usage time. The final section usage time is the latest of the final unit usage times for a plurality of processing units belonging to the same processing section, or the corrected final unit usage times. The corrected unit final use time is the time obtained by substracting the transport time from the final unit usage time. Also, one processing unit is selected from among the plurality of processing units belonging to a selected processing section. Thereafter, a substrate is transported by a substrate transport system from a carrier on a load port to the selected processing unit.

Description

Substrate processing method, substrate processing apparatus, and computer program

This application claims priority based on Japanese Patent Application No. 2018-092485 filed on May 11, 2018, the entire contents of which are incorporated herein by reference.

The present invention relates to a substrate processing method and a substrate processing apparatus for processing a substrate, and a computer program executed by a control device provided in the substrate processing apparatus. Examples of substrates to be processed include semiconductor wafers, optical disk substrates, magnetic disk substrates, magneto-optical disk substrates, photomask substrates, ceramic substrates, solar cell substrates, liquid crystal display devices, and organic EL (electroluminescence) displays. FPD (Flat Panel Display) substrates such as devices are included.

In a manufacturing process of a semiconductor device or a liquid crystal display device, a substrate processing apparatus for processing a substrate such as a semiconductor wafer or a glass substrate for a liquid crystal display device is used. Patent Document 1 discloses scheduling for a substrate processing apparatus including a plurality of processing units.

In the scheduling described in Patent Document 1, a plurality of processing units are classified into a plurality of processing sections based on the transport path length or transport time. When creating a schedule for processing a substrate, one processing section is selected from a plurality of processing sections. Thereafter, one processing unit is selected from a plurality of processing units belonging to the selected processing section. The schedule is created so that the substrate is processed in the selected processing unit. By executing this schedule, the substrate is actually transported and processed.

In the scheduling described in Patent Document 1, when a processing partition is selected based on the size relationship of the partition usage rate and there are a plurality of processing partitions having the same partition usage rate, the processing partition is based on the partition final use time. Is disclosed. The partition usage rate is a value obtained by dividing the time required for processing a substrate by the number of effective (available) processing units in the processing partition for processing the substrate.

In paragraph 0059 of Patent Document 1, there is a description that “the latest one of the unit last use times of the processing units MPC belonging to the processing section PZ is registered in the storage unit 63 as the section last use time”. In paragraph 00099 of Patent Document 1, “the first priority is given to the section usage rate, the second priority is given to the last use time of the section, and the third priority is given to the section number (transport distance or transport time). However, there is a description that the priority order of the partition last use time and the partition usage rate may be reversed.

JP 2017-183545 A

In the scheduling described in Patent Document 1, a plurality of processing sections are selected equally by selecting processing sections based on the size relationship of the section usage rates, and all processing units provided in the substrate processing apparatus are used evenly. A schedule is created so that

However, according to the research of the present inventor, in the scheduling described in Patent Document 1, it is not possible to determine the loading state of the substrate in each processing section, and therefore there are vacant processing units in other processing sections. Nevertheless, it has been found that the processing compartment in use by all processing units may be selected.

Specifically, it has been found that such a processing section is selected when the processing time of the substrate decreases. For example, as shown in FIG. 17, the sixth substrate W6 has a process belonging to the third processing section PZ3 even though there are processing units MPC free in the first processing section PZ1 and the second processing section PZ1. It is processed by the unit MPC17. In this case, it is necessary to delay the conveyance of the substrate W6 until the processing unit MPC17 becomes empty, and the operation rate of the substrate processing apparatus is lowered. Therefore, the invention described in Patent Document 1 has room for improvement.

Accordingly, one of the objects of the present invention is to provide a substrate processing method, a substrate processing apparatus, and a computer program that can uniformly use all the processing units provided in the substrate processing apparatus and increase the operating rate of the substrate processing apparatus. Is to provide.

One embodiment of the present invention is a substrate processing method that is executed by a substrate processing apparatus that transfers a substrate to a substrate transfer system from a carrier on a load port to a plurality of processing units that process the substrate. Each of the units was classified based on a transport time required to transport the substrate from the carrier on the load port to the processing unit, or a transport distance representing a distance from the load port to the processing unit. An affiliation confirmation step for confirming which of the plurality of processing sections belongs, and a unit last use time representing a time at which the processing unit is last used for processing the substrate, for each of the plurality of processing units Unit last use time acquisition step to be acquired, and unit last use time acquisition step Based on the acquired plurality of unit final use times and the transfer times for the plurality of processing units, the corrected unit final use representing the time obtained by subtracting the transfer time from the unit final use time in the same processing unit Based on the correction unit final use time calculation step for calculating the time for each of the plurality of processing units and the plurality of correction unit final use times obtained in the correction unit final use time calculation step, the same processing section A partition final use time specifying step for specifying a partition final use time representing the oldest time among the correction unit final use times of the plurality of processing units belonging to the plurality of processing partitions; and the partition final use At the time of the last use of a plurality of the sections specified in the time specifying step Based on the partition selection step of selecting the one processing partition having the oldest partition last use time from among the plurality of processing partitions, and the plurality of processes belonging to the processing partition selected in the partition selection step A unit selection step for selecting one of the processing units from among the units, and a substrate transfer step for causing the substrate transfer system to transfer the substrate from the carrier on the load port to the processing unit selected in the unit selection step; A substrate processing method is provided.

According to this configuration, instead of selecting a processing partition based on the size relationship of the partition usage rate, one processing partition is selected from a plurality of processing partitions based on the partition last use time. Then, one processing unit is selected from a plurality of processing units belonging to the selected processing section. Thereafter, the substrate is transferred from the carrier on the load port to the selected processing unit by the substrate transfer system. Therefore, not only when the processing time of the substrate does not change but also when the processing time of the substrate decreases, a plurality of processing sections can be selected equally, and all the processing units provided in the substrate processing apparatus should be used evenly. Can do. Thereby, the operation rate of a substrate processing apparatus can be raised.

Moreover, the partition last use time is specified based on the oldest modified unit last use time, not the oldest unit last use time. The correction unit last use time is obtained by subtracting the transport time required to transport the substrate from the carrier on the load port to the processing unit from the unit last use time, which represents the time when the processing unit is last used for substrate processing. Time. Therefore, it is possible to reduce the difference in transport time between the plurality of processing sections, and to avoid selecting only the processing section closer to the load port. Thereby, a plurality of processing sections can be selected more evenly.

Another embodiment of the present invention is a substrate processing method executed by a substrate processing apparatus that transfers a substrate to a substrate transfer system from a carrier on a load port to a plurality of processing units that process the substrate. Each of the processing units is classified based on a transport time required to transport the substrate from the carrier on the load port to the processing unit or a transport distance representing a distance from the load port to the processing unit. An affiliation confirmation step for confirming which one of the plurality of processing sections belongs, and a unit last use time indicating a time when the processing unit is used for the last processing of the substrate, A unit last use time acquisition step to acquire the unit last use time acquisition step. Based on the plurality of unit final use times acquired in step (2), the partition final use time representing the oldest time among the unit final use times of the plurality of processing units belonging to the same processing partition is determined as the plurality of processes. Based on the partition final use time specifying step specified for each of the partitions and the plurality of partition final use times specified in the partition final use time specifying step, the one processing partition having the oldest partition final use time is determined. A section selecting step for selecting from among the plurality of processing sections; a unit selecting step for selecting one processing unit from among the plurality of processing units belonging to the processing section selected in the section selecting step; The unit selection step from the carrier on the load port to the substrate to the substrate transfer system Including a substrate transfer step of conveying to a selected said processing unit, and to provide a substrate processing method.

The start time of the substrate processing may be a time when the substrate is carried into the processing unit, may be a time when the substrate starts to rotate, or may be other than these. The end time of the substrate processing, that is, the unit last use time may be a time when the substrate is carried out of the processing unit, may be a time when the rotation of the substrate is stopped, or may be other than these times. Good. The time when the substrate is carried into the processing unit and the time when the substrate is carried out from the processing unit is, for example, that the shutter that opens and closes the opening provided in the processing chamber of the processing unit is moved to the open position (the position where the opening is opened). It may be a start time.

In the two embodiments described above, at least one of the following features may be added to the substrate processing method.

The substrate processing method further includes a transfer time registration step of registering the same value as the transfer time for the plurality of processing units belonging to the same processing section before the correction unit final use time calculating step.

According to this configuration, the same value is registered as the transport time for a plurality of processing units belonging to the same processing section. Even for a plurality of processing units belonging to the same processing section, since the transport distance is strictly different, the transport time is also strictly different. However, if the processing sections to which they belong are the same, the difference in transport time is small and the transport time is approximately equal between these processing units. Therefore, if the same value is registered as the transport time for a plurality of processing units belonging to the same processing section, it is possible to simplify the setting of the transport time while reducing the difference in transport time between these processing sections.

The partition selection step includes a first search step for searching the processing partition having the oldest partition last use time in the plurality of processing partitions, and a plurality of the processing partitions are found as candidate partitions in the first search step. A second search step of searching for the processing partition having the largest number of the processing units with the oldest unit last use time among the plurality of processing partitions included in the candidate partition, and the second search Selecting one of the processing partitions from at least one of the processing partitions found in the step.

According to this configuration, when there are a plurality of processing partitions having the oldest partition last use time, the processing partition having the largest number of processing units having the oldest unit last use time is selected from those processing partitions. The Before the substrate is transported to the selected processing unit or when the substrate is transported to the selected processing unit, if an abnormality occurs in that processing unit, it is necessary to reselect another processing unit. In such a case, if there is another processing unit with the oldest unit last use time in the same processing section, that processing unit can be selected as a new processing unit. Therefore, a new transport path for the substrate can be set with a relatively simple change.

In the section selection step, when a plurality of the processing sections are found in the second search step, the processing section having the minimum transport time or transport distance is selected as the plurality of processing sections found in the second search step. A third search step for searching in may be further included. In this case, the selecting step may be a step of selecting one processing section from at least one processing section found in the third search step.

The substrate processing method further includes a final use time initialization step of changing the unit final use times of all the processing units to the same value (for example, 0) before the unit final use time acquisition step. Also good.

In the substrate processing method, the substrate is transferred to the processing unit selected in the unit selection step after the substrate transfer step with a processing time shorter than the processing time of the latest substrate transferred to one of the plurality of processing units. A substrate processing step is further included.

According to this configuration, the processing time of the substrate is shorter than that of the latest substrate. Even in such a case, since one processing partition is selected from a plurality of processing partitions based on the partition last use time, a plurality of processes are performed as compared with the case where a processing partition is selected based on the size relationship of the partition usage rate. Partitions can be selected evenly. Therefore, even when the substrate transport path and processing time are different, all the processing units can be used evenly, and the operating rate of the substrate processing apparatus can be further increased.

Still another embodiment of the present invention includes a load port on which a carrier that accommodates a substrate is placed, a plurality of processing units that process the substrate transported from the carrier on the load port, and the load port A substrate processing apparatus comprising: a substrate transport system that transports the substrate between the carrier and the plurality of processing units; and a control device that controls the substrate transport system.

The control device determines a transfer time required for each of the plurality of processing units to transfer the substrate from the carrier on the load port to the processing unit, or a distance from the load port to the processing unit. An affiliation confirmation step for confirming which of the plurality of processing sections classified based on the transport distance represented, and a unit final use time indicating a time at which the processing unit is last used for processing the substrate A unit final use time acquisition step acquired for each of the plurality of processing units, a plurality of unit final use times acquired in the unit final use time acquisition step, and a transport time for the plurality of processing units. Based on the unit last use time in the same processing unit The correction unit final use time calculation step for calculating the correction unit final use time representing the time obtained by subtracting the conveyance time for each of the plurality of processing units, and the plurality of corrections obtained in the correction unit final use time calculation step. Based on the unit last use time, a section last use time representing the oldest time among the correction unit last use times of the plurality of processing units belonging to the same processing section is specified for each of the plurality of processing sections. Based on the partition final use time specifying step and the plurality of partition final use times specified in the partition final use time specifying step, the one processing partition having the oldest partition final use time is designated as the plurality of processing partitions. A section selection step to select from among the processing sections selected in the section selection step A unit selection step of selecting one of the processing units from among the plurality of processing units belonging to the substrate, and the substrate transport system from the carrier on the load port to the processing unit selected in the unit selection step A substrate carrying step for carrying. According to this configuration, the same effect as described above can be obtained.

The control device determines a transfer time required for each of the plurality of processing units to transfer the substrate from the carrier on the load port to the processing unit, or a distance from the load port to the processing unit. An affiliation confirmation step for confirming which of the plurality of processing sections classified based on the transport distance represented, and a unit final use time indicating a time at which the processing unit is last used for processing the substrate A unit final use time acquisition step acquired for each of the plurality of processing units, and a plurality of the unit final use times acquired in the unit final use time acquisition step. The last section representing the oldest time among the unit last use times of the processing unit The partition final use time is determined based on the partition final use time specifying step for specifying the use time for each of the plurality of processing partitions and the plurality of partition final use times specified in the partition final use time specifying step. A section selection step for selecting the oldest one processing section from among the plurality of processing sections, and one processing unit from among the plurality of processing units belonging to the processing section selected in the section selection step. A unit selection step for selecting and a substrate transfer step for causing the substrate transfer system to transfer the substrate from the carrier on the load port to the processing unit selected in the unit selection step. According to this configuration, the same effect as described above can be obtained.

In the above-described two embodiments, at least one of the following features may be added to the substrate processing apparatus.

The control device further executes a transport time registration step of registering the same value as the transport time for the plurality of processing units belonging to the same processing section before the correction unit final use time calculating step. According to this configuration, the same effect as described above can be obtained.

The partition selection step includes a first search step for searching the processing partition having the oldest partition last use time in the plurality of processing partitions, and a plurality of the processing partitions are found as candidate partitions in the first search step. A second search step of searching for the processing partition having the largest number of the processing units with the oldest unit last use time among the plurality of processing partitions included in the candidate partition, and the second search Selecting one of the processing partitions from at least one of the processing partitions found in the step. According to this configuration, the same effect as described above can be obtained.

The control device transfers the substrate after the substrate transport step to the processing unit selected in the unit selection step with a processing time shorter than the processing time of the latest substrate transported to any of the plurality of processing units. A substrate processing step to be processed is further executed. According to this configuration, the same effect as described above can be obtained.

Yet another embodiment of the present invention is a computer program executed by a control device provided in a substrate processing apparatus that transfers a substrate to a substrate transfer system from a carrier on a load port to a plurality of processing units that process the substrate. A computer program in which steps are incorporated so as to cause a computer as the control device to execute at least one of the above-described substrate processing methods is provided. The computer program may be recorded on a computer-readable recording medium. The recording medium may be an optical disk such as a compact disk or a semiconductor memory such as a memory card.

The above-described or other objects, features, and effects of the present invention will be clarified by the following description of embodiments with reference to the accompanying drawings.

1 is a schematic plan view of a substrate processing apparatus according to an embodiment of the present invention. FIG. 2 is a schematic cross-sectional view of the substrate processing apparatus showing a vertical cross section along the cutting line II-II shown in FIG. 1. It is typical sectional drawing for demonstrating the structural example of a processing unit. It is typical sectional drawing for demonstrating the other structural example of a processing unit. It is a block diagram for demonstrating the electrical structure of a substrate processing apparatus. It is a flowchart for demonstrating the process example performed by the computer with which the substrate processing apparatus was equipped. It is a time chart which shows the temporary time table produced in the case of scheduling. It is a time chart which shows the temporary time table produced in the case of scheduling. It is a time chart which shows the temporary time table produced in the case of scheduling. It is a flowchart for demonstrating an example of a process division selection process (step S3 of FIG. 6). It is a table | surface which shows an example of the process division data memorize | stored in the memory | storage part of the computer. It is a table | surface which shows the other example of the process division data memorize | stored in the memory | storage part of the computer. It is a table | surface which shows an example of the injection | pouring possible rate at the time of creating the schedule of the 1st board | substrate, the division last use time, the oldest chamber number, and the number of effective chambers. It is a table | surface which shows an example of the injection | pouring possible rate at the time of creating the schedule of the 2nd board | substrate, division last use time, the oldest number of chambers, and the number of effective chambers. It is a table | surface which shows an example of the injection | pouring possible rate at the time of creating the schedule of the 3rd board | substrate, the division last use time, the oldest chamber number, and the number of effective chambers. It is a table | surface which shows an example of the injection | pouring possible rate at the time of creating the schedule of the 4th board | substrate, the division last use time, the oldest chamber number, and the number of effective chambers. It is a table | surface which shows an example of the injection | pouring possible rate at the time of creating the schedule of the 5th board | substrate, division last use time, the oldest number of chambers, and the number of effective chambers. An example of an input possibility rate, a section last use time, the oldest number of chambers, and the number of effective chambers when creating a schedule for the first substrate in a state where four processing units belonging to the first processing section are invalid is shown. It is a table. An example of an input possibility rate, a section last use time, the oldest number of chambers, and the number of effective chambers when creating a schedule for the second substrate in a state where four processing units belonging to the first processing section are invalid is shown. It is a table. An example of an input possibility rate, a section last use time, an oldest chamber number, and an effective chamber number when creating a schedule for the third substrate in a state where four processing units belonging to the first processing section are invalid is shown. It is a table. An example of an input possibility rate, a section last use time, the oldest number of chambers, and the number of effective chambers when creating a schedule for the fourth substrate in a state where four processing units belonging to the first processing section are invalid is shown. It is a table. An example of an input possibility rate, a section last use time, the oldest number of chambers, and the number of effective chambers when creating a schedule for the fifth substrate in a state where four processing units belonging to the first processing section are invalid is shown. It is a table. An example of an input possibility rate, a section last use time, the oldest number of chambers, and the number of effective chambers when creating a schedule for the sixth substrate in a state where four processing units belonging to the first processing section are invalid is shown. It is a table. It is a table | surface which shows an example of the unit last use time after the schedule which uses all the processing units was created, conveyance time, and correction unit last use time. The table showing an example of the input possibility rate, the last use time of the section, the oldest number of chambers, and the number of effective chambers when creating the schedule for the first substrate after the schedule for using all the processing units is created is there. The table showing an example of the input possibility rate, the last use time of the section, the oldest number of chambers, and the number of effective chambers when creating the schedule for the second substrate after the schedule for using all the processing units is created is there. The table showing an example of the input possibility rate, the last use time of the section, the oldest number of chambers, and the number of effective chambers when creating the schedule for the third substrate after the schedule for using all the processing units is created is there. A table showing an example of the input possibility rate, the last use time of the section, the oldest number of chambers, and the number of effective chambers when creating the schedule for the fourth substrate after the schedule for using all the processing units is created is there. The table showing an example of the input possibility ratio, the last use time of the section, the oldest number of chambers, and the number of effective chambers when creating the schedule for the fifth substrate after the schedule for using all the processing units is created is there. It is a table | surface which shows an example of the input possibility rate, division last use time, the oldest chamber number, and effective chamber number which concern on 1st Example, and has shown the state before producing the schedule of the 1st board | substrate. It is a table | surface which shows an example of the input possibility rate, division last use time, the oldest number of chambers, and the number of effective chambers which concern on 1st Example, and has shown the state before producing the schedule of the 2nd board | substrate. It is a table | surface which shows an example of the injection | throwing-in possible ratio which concerns on 1st Example, the division last use time, the oldest number of chambers, and the number of effective chambers, and has shown the state before producing the schedule of the 3rd board | substrate. It is a table | surface which shows an example of the injection | throwing-in possible ratio which concerns on 1st Example, division last use time, the oldest chamber number, and the number of effective chambers, and has shown the state before producing the schedule of the 4th board | substrate. It is a table | surface which shows an example of the injection | throwing-in possible ratio which concerns on 1st Example, the division last use time, the oldest number of chambers, and the number of effective chambers, and has shown the state before producing the schedule of the 5th board | substrate. It is a table | surface which shows an example of the injection | throwing possibility rate which concerns on 1st Example, the division last use time, the oldest chamber number, and the number of effective chambers, and has shown the state before producing the schedule of the 6th board | substrate. FIG. 4 is a time chart showing a schedule according to the first embodiment, showing an example of a schedule after performing the scheduling of the first and second substrates to which the first recipe for processing the substrate for the first processing time is applied. . FIG. 6 is a time chart showing a schedule according to the first embodiment, showing an example of a schedule after performing scheduling of the third to sixth substrates to which the second recipe for processing the substrate for the second processing time is applied. . It is a table | surface which shows an example of the division | segmentation usage rate which concerns on a 1st comparative example, division | segmentation last use time, and the number of effective chambers, and has shown the state before producing the schedule of the 1st board | substrate. It is a table | surface which shows an example of the division use rate which concerns on a 1st comparative example, division final use time, and the number of effective chambers, and has shown the state before producing the schedule of the 2nd board | substrate. It is a table | surface which shows an example of the division | segmentation usage rate which concerns on a 1st comparative example, division | segmentation last use time, and the number of effective chambers, and has shown the state before producing the schedule of the 3rd board | substrate. It is a table | surface which shows an example of the division | segmentation usage rate which concerns on a 1st comparative example, division | segmentation last use time, and the number of effective chambers, and has shown the state before producing the schedule of the 4th board | substrate. It is a table | surface which shows an example of the division | segmentation usage rate which concerns on a 1st comparative example, division | segmentation last use time, and the number of effective chambers, and has shown the state before producing the schedule of the 5th board | substrate. It is a table | surface which shows an example of the division usage rate which concerns on a 1st comparative example, division final use time, and the number of effective chambers, and has shown the state before producing the schedule of the 6th board | substrate. It is a time chart which shows the schedule which concerns on a 1st comparative example, and shows an example of the schedule after performing the scheduling of the 3rd-6th board | substrates by selecting a process partition first with priority on a partition usage rate. . It is a table | surface which shows an example of the unit last use time, conveyance time, and correction unit last use time which concern on 2nd Example. FIG. 10 is a time chart showing a schedule according to a second embodiment, showing an example of a schedule after performing scheduling of the first to eleventh substrates to which the first recipe for processing the substrate for the first processing time is applied. . It is a time chart which shows the schedule which concerns on 2nd Example, and has shown the continuation of FIG. 19A. It is a time chart which shows the schedule which concerns on 2nd Example, and shows an example of the schedule after performing the scheduling of the 12th board | substrate to which the 2nd recipe which processes a board | substrate for the 2nd processing time was applied. FIG. 10 is a time chart showing a schedule according to a second embodiment, showing an example of a schedule after scheduling of the 13th to 15th substrates to which the second recipe for processing the substrate for the second processing time is applied. . It is a time chart which shows the schedule which concerns on a 2nd comparative example, and shows an example of the schedule after selecting a process partition with priority on a partition usage rate and scheduling the 12th to 15th substrates. .

FIG. 1 is a schematic plan view of a substrate processing apparatus 1 according to an embodiment of the present invention. FIG. 2 is a schematic cross-sectional view of the substrate processing apparatus 1 showing a vertical cross section along the cutting line II-II shown in FIG.

The substrate processing apparatus 1 is a single-wafer type apparatus that processes a disk-shaped substrate W such as a semiconductor wafer one by one. The substrate processing apparatus 1 includes a carrier holding unit 2, an indexer unit 3, and a processing unit 4.

The carrier holding unit 2 includes a plurality of load ports LP each holding a carrier C which is a substrate container capable of accommodating a plurality of substrates W. The load port LP is a carrier holding unit that holds the carrier C. The load port LP is a position where the carrier C is inserted into the substrate processing apparatus 1. The carrier C is opened and closed by the load port LP.

The indexer unit 3 includes an indexer robot IR. The indexer robot IR takes out an unprocessed substrate W from the carrier C placed on the carrier holding unit 2 and delivers it to the processing unit 4, and receives the processed substrate W from the processing unit 4 to receive the carrier holding unit. The storing operation of storing in the carrier C held in 2 is executed.

The processing unit 4 includes a plurality of processing units MPC1 to MPC24 (hereinafter collectively referred to as “processing unit MPC”), a first main transfer robot CR1, a second main transfer robot CR2, a first delivery unit PASS1, A second delivery unit PASS2. The indexer robot IR, the first main transfer robot CR1, and the second main transfer robot CR2 constitute a substrate transfer system TS1 that transfers the substrate W between the carrier holding unit 2 and the processing unit MPC.

In the processing unit 4, a conveyance path 5 extending linearly from the indexer unit 3 is formed in plan view. A first delivery unit PASS1, a first main transport robot CR1, a second delivery unit PASS2, and a second main transport robot CR2 are arranged in this transport path 5 in order from the indexer unit 3 side. The first delivery unit PASS1 is a unit that mediates delivery of the substrate W between the indexer robot IR and the first main transfer robot CR1. The second delivery unit PASS2 is a unit that mediates delivery of the substrate W between the first main transport robot CR1 and the second main transport robot CR2. The first and second transfer units PASS1 and PASS2 include a plurality of substrate platforms 15 that temporarily hold the substrate W.

The plurality of processing units MPC form a plurality of towers TW1 to TW6 (hereinafter collectively referred to as “tower TW”). Each tower TW includes a plurality of processing units MPC (for example, four processing units MPC) stacked one above the other. The plurality of towers TW are arranged along the transport path 5. The three towers TW1, TW3, TW5 are arranged on one side of the transport path 5. The remaining three towers TW2, TW4, TW6 are arranged on the other side of the transport path 5.

The plurality of processing units MPC form three pairs of towers TW that are opposed to each other with the conveyance path 5 interposed therebetween. Specifically, the tower TW1 and the tower TW2 are opposed to each other with the conveyance path 5 interposed therebetween. Similarly, the tower TW3 and the tower TW4 are opposed to each other with the conveyance path 5 interposed therebetween, and the tower TW5 and the tower TW6 are opposed to each other with the conveyance path 5 interposed therebetween.

The distance from the indexer unit 3 to the tower TW1 is equal to or approximately equal to the distance from the indexer unit 3 to the tower TW2. Accordingly, the transfer time required to transfer the substrate W from the indexer unit 3 to the tower TW1 is equal to or substantially equal to the transfer time required to transfer the substrate W from the indexer unit 3 to the tower TW2. That is, each pair of towers (TW1 and TW2, TW3 and TW4, TW5 and TW6) is disposed at a position where the distance from the indexer unit 3 is equal or substantially equal, and the substrate is placed from the indexer unit 3 to each pair of towers TW. The transport time required to transport W is equal or approximately equal.

The three pairs of towers (TW1 and TW2, TW3 and TW4, TW5 and TW6) form three processing sections PZ1, PZ2, and PZ3 (hereinafter collectively referred to as “processing section PZ”). That is, the pair of towers TW1 and TW2 that are opposed to each other with the conveyance path 5 interposed therebetween at the position closest to the indexer unit 3 form the first processing section PZ1. Next, a pair of towers TW3 and TW4 facing each other across the transport path 5 at a position close to the indexer unit 3 forms a second processing section PZ2. Next, a pair of towers TW5 and TW6 facing each other across the transport path 5 at a position close to the indexer unit 3 form a third processing section PZ3.

The first delivery unit PASS1 is arranged between the first processing section PZ1 and the indexer unit 3. A first main transfer robot CR1 is arranged on the opposite side of the indexer unit 3 with respect to the first delivery unit PASS1. The first main transfer robot CR1 is disposed between the pair of towers TW1 and TW2 in plan view. A second delivery unit PASS2 is disposed on the opposite side of the first delivery robot CR1 from the first delivery unit PASS1. The first main transfer robot CR1 is arranged to face the first delivery unit PASS1, the towers TW1 and TW2 of the first processing section PZ1, and the second delivery unit PASS2.

The second main transfer robot CR2 is disposed on the opposite side of the second delivery unit PASS2 from the first main transfer robot CR1. The second main transfer robot CR2 is disposed between the pair of towers TW3 and TW4 in a plan view, and is disposed between the pair of towers TW5 and TW6 in a plan view. The second main transfer robot CR2 is arranged to face the second delivery unit PASS2 and the towers TW3 to TW6.

The indexer robot IR is a horizontal articulated arm type robot in this embodiment. The indexer robot IR includes a hand 11 that holds the substrate W, an articulated arm 12 coupled to the hand 11, an arm rotation mechanism (not shown) that rotates the articulated arm 12 about a vertical rotation axis 13, And an arm lifting mechanism (not shown) for moving the articulated arm 12 up and down. With such a configuration, the indexer robot IR makes the hand 11 access the carrier C and the first delivery unit PASS1 held in an arbitrary load port LP, and loads / unloads the substrate W to / from the access destination. Accordingly, the indexer robot IR transports the substrate W between the processing unit 4 (more precisely, the first delivery unit PASS1) and the arbitrary carrier C.

The first main transfer robot CR1 and the second main transfer robot CR2 can be substrate transfer robots having substantially the same configuration. Such a substrate transfer robot preferably has a pair of

hands

21 and 22 holding the substrate W, a pair of hand advancing and retracting

mechanisms

23 and 24 for moving the pair of

hands

21 and 22 back and forth in the horizontal direction, and a pair of hands. A hand rotation mechanism (not shown) that rotates the advance /

retreat mechanisms

23, 24 around a vertical rotation axis 25 and a hand elevating mechanism (not shown) that moves the hand advance /

retreat mechanisms

23, 24 up and down are included.

With such a configuration, the first main transfer robot CR1 and the second main transfer robot CR2 take out the substrate W from the access destination with one

hand

21, 22 and the substrate W with respect to the access destination with the

other hand

21, 22. Can be carried in. By applying the substrate transfer robot having such a configuration to the first main transfer robot CR1, the first main transfer robot CR1 includes the first transfer unit PASS1, the plurality of processing units MPC that form the towers TW and TW2, and the first transfer unit MPC. 2. The

hands

21 and 22 can be directly accessed to the delivery unit PASS2, and the substrate W can be loaded / unloaded to / from the access destination. Further, by applying the substrate transport robot having the above-described configuration to the second main transport robot CR2, the second main transport robot CR2 has a plurality of processing units forming the second delivery unit PASS2 and the towers TW3 to TW6. The

hands

21 and 22 can be directly accessed to the MPC, and the substrate W can be loaded / unloaded to / from the access destination.

FIG. 2 shows an example in which the indexer robot IR includes one hand 11, but the indexer robot IR may include two hands 11. In this case, the first main transport robot CR1 may include four

hands

21 and 22. Similarly, the second main transport robot CR2 may include four

hands

21 and 22. When the indexer robot IR includes two hands 11, the indexer robot IR can hold the two substrates W at the same time using the two hands 11. Accordingly, the indexer robot IR performs a simultaneous unloading operation for simultaneously unloading two substrates W and a simultaneous unloading operation for simultaneously loading two substrates W with respect to the carrier C on the load port LP and the first delivery unit PASS1. It can be carried out.

FIG. 3 is a schematic cross-sectional view for explaining a configuration example of the processing unit MPC. The processing unit MPC shown in FIG. 3 is a surface cleaning unit that cleans the surface of a substrate with a chemical solution. The processing unit MPC includes a processing chamber 31 provided with an opening 31a through which the substrate W passes, a processing cup 32 disposed in the processing chamber 31, and a spin chuck 33 disposed in the processing cup 32. The processing chamber 31 includes a partition wall 31b provided with an opening 31a and a shutter 31c that opens and closes the opening 31a.

The processing unit MPC further includes a chemical liquid nozzle 34 for supplying a chemical liquid to the substrate W and a rinsing liquid nozzle 35 for supplying a rinsing liquid (pure water or the like) to the substrate W. The spin chuck 33 rotates around a vertical rotation axis 36 passing through the central portion of the substrate W while holding one substrate W horizontally. The chemical liquid nozzle 34 and the rinsing liquid nozzle 35 are arranged in the processing chamber 31 and discharge the chemical liquid and the rinsing liquid toward the upper surface of the substrate W held by the spin chuck 33, respectively. With such a configuration, a chemical solution process (substrate processing step) in which a chemical solution is supplied to the upper surface of the substrate W and the upper surface of the substrate W is processed with the chemical solution, and a rinse treatment (substrate) that rinses the chemical solution on the upper surface of the substrate W with the rinse solution Processing step) and a spin drying process (substrate processing step) in which droplets on the substrate W are shaken off by centrifugal force.

FIG. 4 is a schematic cross-sectional view for explaining another configuration example of the processing unit MPC. The processing unit MPC shown in FIG. 4 is an end surface cleaning unit that scrubs and cleans the peripheral end surface of the substrate W. The processing unit MPC includes a processing chamber 31, a spin chuck 33 arranged in the processing chamber 31, a chemical nozzle 34, and a scrub member 37 that scrubs and cleans the end surface of the substrate W.

The spin chuck 33 rotates around a vertical rotation axis 36 passing through the central portion of the substrate W while holding one substrate W horizontally. The chemical nozzle 34 supplies a chemical to the surface of the substrate W held on the spin chuck 33. When the scrub member 37 is pressed against the peripheral end surface of the substrate W while the spin chuck 33 rotates the substrate W, the scrub member 37 is rubbed against the entire periphery of the peripheral end surface of the substrate W. As a result, the entire periphery of the peripheral end surface of the substrate W is scrubbed (substrate processing step).

FIG. 5 is a block diagram for explaining the electrical configuration of the substrate processing apparatus 1. The substrate processing apparatus 1 includes a computer 60 as a control device. The computer 60 controls the processing units MPC1 to MPC24, the main transfer robots CR1 and CR2, and the indexer robot IR. The computer 60 may be a personal computer (FA personal computer).

The computer 60 includes a control unit 61, an input / output unit 62, and a storage unit 63. The control unit 61 includes an arithmetic unit such as a CPU. The input / output unit 62 includes an output device such as a display unit and an input device such as a keyboard, a pointing device, and a touch panel. Further, the input / output unit 62 includes a communication module for communication with a host computer 64 which is an external computer. The storage unit 63 includes a storage device such as a solid-state memory device or a hard disk drive.

The control unit 61 includes a scheduling function unit 65 and a process execution instruction unit 66. The scheduling function unit 65 unloads the substrate W from the carrier C, processes the substrate W in one or more of the processing units MPC1 to MPC24, and stores the processed substrate W in the carrier C. A plan (schedule) for operating the resources of the substrate processing apparatus 1 in time series is created. The processing execution instruction unit 66 operates the resources of the substrate processing apparatus 1 according to the schedule created by the scheduling function unit 65. The resources are various units provided in the substrate processing apparatus 1 and used for processing the substrate. Specifically, the processing units MPC1 to MPC24, the indexer robot IR, the main transfer robots CR1 and CR2, and their components are included in the resources of the substrate processing apparatus 1.

The storage unit 63 stores various data. The data stored in the storage unit 63 includes a program 70 executed by the control unit 61, process job data (process job information) 80 received from the host computer 64, and schedule data 81 created by the scheduling function unit 65. , Usage history data 82 for each processing unit MPC and each processing section PZ, and transport time data 83 for each processing section PZ are included.

The program 70 stored in the storage unit 63 includes a schedule creation program 71 for operating the control unit 61 as the scheduling function unit 65, and a process execution program 72 for operating the control unit 61 as the process execution instruction unit 66. Including. The program 70 may be preinstalled in the computer 60, may be sent from the recording medium M to the storage unit 63, or is stored in the storage unit 63 through the communication module of the input / output unit 62. It may be sent. The recording medium M is, for example, an optical disk such as a compact disk or a semiconductor memory such as a memory card. The recording medium M is an example of a tangible medium that is not temporary (non-transitory tangible media).

The process job data 80 includes a process job (PJ) code assigned to each substrate W and a recipe associated with the process job code. The recipe is data defining the contents of substrate processing, and includes substrate processing conditions and substrate processing procedures. More specifically, it includes substrate type information, parallel processing unit information, used processing liquid information, processing time information, and the like. The substrate type information is information indicating the type of the substrate W to be processed. Specific examples of the type of the substrate W include a product substrate used for manufacturing a product, a non-product substrate that is used for maintenance of the processing unit MPC and is not used for manufacturing a product. The parallel processing unit information is processing unit designation information that designates an available processing unit MPC, and represents that parallel processing by the designated processing unit MPC is possible. That is, the substrate W may be processed in any of the designated processing units. The used processing liquid information is information that designates the type of processing liquid used for substrate processing. A specific example is information specifying the type of chemical and the temperature of the chemical. The processing time information is a continuation time for supplying the processing liquid. The used processing liquid information and the processing time information are examples of processing condition information.

“Process job” refers to a process performed on one or a plurality of substrates W to be subjected to a common process. The process job code is identification information (substrate group identification information) for identifying a process job. In other words, a plurality of substrates W to which a common process job code is assigned are subjected to a common process using a recipe associated with the process job code. For example, when a common process is performed on a plurality of substrates W in which the processing order (dispensing order from the carrier C) is continuous, a common process job code is assigned to the plurality of substrates W. Is granted. However, the substrate processing content (recipe) corresponding to different process job codes may be the same.

The control unit 61 acquires process job data for each substrate W from the host computer 64 via the input / output unit 62 and stores it in the storage unit 63. The acquisition and storage of the process job data may be performed before the scheduling for each substrate W is executed. For example, immediately after the carrier C is held in the load ports LP1 to LP4, the process job data corresponding to the substrate W accommodated in the carrier C may be given from the host computer 64 to the control unit 61.

The scheduling function unit 65 plans each process job based on the process job data 80 stored in the storage unit 63, and stores schedule data 81 representing the plan in the storage unit 63. The process execution instructing unit 66 controls the indexer robot IR, the main transfer robots CR1 and CR2, and the processing units MPC1 to MPC24 based on the schedule data 81 stored in the storage unit 63, thereby allowing the substrate processing apparatus 1 to perform a process. Run the job.

FIG. 6 is a flowchart for explaining an example of processing executed by the scheduling function unit 65. More specifically, a process that is repeatedly performed at a predetermined control period when the control unit 61 of the computer 60 executes the schedule creation program 71 is shown. In other words, the schedule creation program 71 incorporates a group of steps so as to cause the computer 60 to execute the processing shown in FIG.

The host computer 64 gives process job data to the control unit 61 and instructs the control unit 61 to start a process job defined by the process job data, that is, start substrate processing (step S1). The control unit 61 receives the process job data and stores it in the storage unit 63. Using the process job data, the scheduling function unit 65 performs scheduling for executing the process job. The start of the process job can be instructed by the operator by operating the operation unit of the input / output unit 62.

The scheduling function unit 65 sequentially executes the scheduling for each of the one or more substrates W to which the process job (PJ) code included in the process job data is assigned. First, the scheduling function unit 65 refers to a recipe corresponding to the process job data, and specifies one or more processing units MPC that can be used for processing the substrate W based on the parallel processing unit information of the recipe. (Step S2). Next, the scheduling function unit 65 executes a processing section selection process for selecting one processing section PZ to be used for the substrate processing (step S3). Details of the processing partition selection processing will be described later.

Next, the scheduling function unit 65 creates a temporary time table for processing one substrate W (step S4). For example, it is assumed that the first processing section PZ1 is selected in the processing section selection process, and the parallel processing unit information of the recipe corresponding to the process job data includes all the processing units MPC1 to MPC8 of the first processing section PZ1. That is, consider a case where the substrate processing according to the recipe can be executed in any of the eight processing units MPC1 to MPC8. In this case, there are eight paths through which the substrate W passes. That is, the paths that can be selected for processing the substrate W are eight paths that pass through any of the processing units MPC1 to MPC8. Therefore, the scheduling function unit 65 creates a temporary time table corresponding to the eight routes for the one substrate W.

A temporary time table corresponding to the route passing through the processing unit MPC1 is shown in FIG. 7A. This temporary time table includes a block representing the unloading (Get) of the substrate W from the carrier C by the indexer robot IR, a block representing the unloading (Put) of the substrate W to the first delivery unit PASS1 by the indexer robot IR, and A block representing unloading (Get) of the substrate W from the first delivery unit PASS1 by the first main transport robot CR1, and a block representing unloading (Put) of the substrate W to the processing unit MPC1 by the first main transport robot CR1. A processing block representing processing of the substrate W by the processing unit MPC1, a block representing unloading (Get) of the processed substrate W from the processing unit MPC1 by the first main transport robot CR1, and a first main transport robot CR1. The first delivery unit PAS of the substrate W by 1, a block representing loading (Put) to 1, a block representing unloading (Get) of the substrate W from the first delivery unit PASS 1 by the indexer robot IR, and loading of the substrate W to the carrier C by the indexer robot IR ( And a block representing (Put). The scheduling function unit 65 creates a temporary time table by arranging these blocks in order so as not to overlap each other on the time axis.

When a temporary time table using the processing unit MPC1 is created, the scheduling function unit 65 causes the same seven temporary time tables (same for the same substrate W to correspond to the seven routes respectively passing through the processing units MPC2 to MPC8). A temporary time table in which processing blocks are arranged in the processing units MPC2 to MPC8, respectively. In this way, a total of eight temporary time tables are created for one substrate W. The created temporary time table is stored in the storage unit 63 as a part of the schedule data 81. In the stage of creating the temporary timetable, interference with the block relating to another substrate W (overlap on the time axis) is not considered.

When the scheduling function unit 65 finishes creating all temporary timetables corresponding to one substrate W (step S5), it executes the main scheduling (steps S6 to S9). This scheduling is to arrange the created temporary time table blocks on the time axis so as not to overlap with other blocks of each resource. The schedule data created by this scheduling is stored in the storage unit 63.

More specifically, the scheduling function unit 65 selects one of a plurality of provisional time tables that have been created, and acquires one block constituting the provisional time table (step S6). The block acquired at this time is the block arranged at the earliest position on the time axis of the temporary time table among the unallocated blocks. Further, the scheduling function unit 65 searches for a position where the acquired block can be arranged (step S7), and arranges the block at the searched position (step S8). Each block is arranged at the earliest position on the time axis while preventing the same resource from being used repeatedly at the same time. A similar operation is repeatedly executed for all the blocks constituting the selected temporary time table (step S9). Thus, by arranging all the blocks constituting the selected temporary time table, the main scheduling corresponding to the temporary time table is completed. This main scheduling is executed for all the created temporary time tables (step S10). That is, when there is a possibility that the substrate W is processed by any of the eight processing units MPC1 to MPC8, eight kinds of main scheduling are executed.

When the eight main schedulings are finished, unit selection processing is performed (step S11). In the unit selection process, one main scheduling, that is, main scheduling that passes through one processing unit MPC is selected, and thereby a processing unit MPC that processes one substrate W is selected. In the unit selection process, one main scheduling that selects the earliest time for processing the substrate W and returning it to the carrier C is selected (step S11, unit selection step).

If there are a plurality of main schedulings with the same time for returning the substrate W to the carrier C (step S12: YES), the processing unit MPC with the longest elapsed time from the previous use, that is, the process with the oldest unit last use time. The main scheduling using the unit MPC is selected (step S13, unit selection step). Thereby, the processing units MPC can be selected so that the processing units MPC in one processing section PZ are used evenly.

When there are a plurality of main schedulings using the processing unit MPC having the oldest unit last use time (step S14: YES), the main scheduling using the processing unit MPC having a smaller number (that is, a higher priority order assigned in advance) is selected. (Step S15, unit selection step). For example, when the main scheduling using the processing unit MPC1 and the main scheduling using the processing unit MPC2 remain as candidates, the processing unit MPC1 has a lower end number than the processing unit MPC2, and thus the main scheduling using the processing unit MPC1. Is selected.

Thus, when one main scheduling corresponding to one temporary time table is selected, the scheduling for the one substrate W is completed (step S16). The scheduling data representing the selected main scheduling is stored in the storage unit 63. The process execution instructing unit 66 actually starts the process on the substrate W at an arbitrary timing thereafter (step S17, substrate transfer step and substrate process step). That is, the substrate transport operation is started in which the substrate W is unloaded from the carrier C by the indexer robot IR and the main transport robots CR1 and CR2 transport the substrate W to the processing unit MPC.

When the scheduling for one substrate W is completed, the scheduling function unit 65 registers the unit last use time of the processing unit MPC that processes the substrate W in the storage unit 63 (step S18). Furthermore, the scheduling function unit 65 obtains the input possibility rate of the processing section PZ to which the processing unit MPC belongs and registers it in the storage unit 63 (step S19). Details of the input possibility rate will be described later. The unit last use time and the possible insertion rate are examples of use history data 82 (see FIG. 5). Then, a series of operations from step S3 to step S20 are sequentially executed for all the substrates W constituting the process job (step S20).

When the second processing section PZ2 is selected in the processing section selection process (step S3), the scheduling function unit 65 corresponds to eight paths that respectively pass through the processing units MPC9 to MPC16 for one substrate W. Eight temporary time tables (temporary time tables in which processing blocks are arranged in the processing units MPC9 to MPC16, respectively) are created. As a result, a total of eight temporary time tables are created for one substrate W.

FIG. 7B shows a temporary time table corresponding to the route passing through the processing unit MPC9. This temporary time table includes a block representing the unloading (Get) of the substrate W from the carrier C by the indexer robot IR, a block representing the unloading (Put) of the substrate W to the first delivery unit PASS1 by the indexer robot IR, and A block representing unloading (Get) of the substrate W from the first delivery unit PASS1 by the first main transport robot CR1, and a block representing unloading (Put) to the second delivery unit PASS2 by the first main transport robot CR1; A block representing unloading (Get) of the substrate W from the second delivery unit PASS2 by the second main transfer robot CR2, and a block representing unloading (Put) of the substrate W to the processing unit MPC9 by the second main transfer robot CR2. And the substrate W by the processing unit MPC9 A processing block representing processing to be performed, a block representing unloading (Get) of the processed substrate W from the processing unit MPC9 by the second main transport robot CR2, and a second delivery unit of the substrate W by the second main transport robot CR2. A block representing loading (Put) into the PASS2, a block representing unloading (Get) of the substrate from the second delivery unit PASS2 by the first main transport robot CR1, and a first of the substrate W by the first main transport robot CR1. A block representing the delivery (Put) to one delivery unit PASS1, a block representing the delivery (Get) of the substrate W from the first delivery unit PASS1 by the indexer robot IR, and the carrier C of the substrate W by the indexer robot IR And a block representing the loading (put). The scheduling function unit 65 creates a temporary time table by arranging these blocks in order so as not to overlap each other on the time axis.

When the third processing section PZ3 is selected in the processing section selection process (step S3), the scheduling function unit 65 corresponds to eight routes passing through the processing units MPC17 to MPC24 for one substrate W. Eight temporary time tables (temporary time tables in which processing blocks are arranged in the processing units MPC17 to MPC24) are created. As a result, a total of eight temporary time tables are created for one substrate W. FIG. 7C shows a temporary time table corresponding to a route passing through the processing unit MPC17. This temporary time table is almost the same as the temporary time table of FIG. 7B.

FIG. 8 is a flowchart for explaining an example of the processing partition selection processing (step S3 in FIG. 6). 9A and 9B show an example of processing partition data stored in the storage unit 63 (see FIG. 5). FIG. 10A to FIG. 10E show an example of the possible loading rate, the partition last use time, the oldest chamber number, and the effective chamber number stored in the storage unit 63.

The number of effective chambers is the number of processing units MPC that can be used (effective) among a plurality of processing units MPC belonging to the same processing section PZ. The oldest chamber number is the number of effective processing units MPC having the oldest unit last use time among the plurality of processing units MPC belonging to the same processing section PZ. The chargeable rate is a percentage indicating the ratio of the oldest chamber number to the effective chamber number in the same processing section PZ ((oldest chamber number / effective chamber number) × 100). The processing partition data, the input possible rate, the partition last use time, the oldest chamber number, and the effective chamber number are stored as the use history data 82 for each processing partition.

In the storage unit 63, as shown in FIG. 9A, processing section data representing the setting of the processing section PZ is registered for all processing units MPC. In this example, for the processing units MPC1 to MPC8, processing section data “1” indicating that it belongs to the first processing section PZ1 is registered. Further, for the processing units MPC9 to MPC16, processing section data “2” indicating that it belongs to the second processing section PZ2 is registered. Further, for the processing units MPC17 to MPC24, processing section data “3” indicating that it belongs to the third processing section PZ3 is registered.

When any of the processing units MPC cannot be used for substrate processing due to maintenance or the like, as shown in FIG. 9B, instead of data (number) identifying the processing section PZ, data indicating invalidity (for example, Data indicating “in maintenance” is registered. The maintenance is, for example, regularly cleaning the processing unit MPC.

When the scheduling function unit 65 selects a processing section PZ to be processed for each substrate W, each processing unit MPC performs any processing based on the processing section data stored in the storage unit 63 (see FIG. 5). It is determined whether it belongs to the section PZ and whether there is an invalid processing unit MPC (step S31 in FIG. 8, belonging confirmation step). Then, the scheduling function unit 65 reads out the unit last use times of all the processing units MPC1 to MPC24 from the storage unit 63 (step S32 in FIG. 8, unit last use time acquisition step).

Furthermore, the scheduling function unit 65 reads the transfer time required to transfer the substrate W from the carrier C on the load port LP to the processing unit MPC from the storage unit 63 for all the processing units MPC1 to MPC24. Thereafter, the scheduling function unit 65 subtracts the transport time from the unit last use time for each processing unit MPC, and registers the obtained value (time) in the storage unit 63 as the corrected unit last use time (step in FIG. 8). S33: Correction unit final use time calculation step). The modification unit last use time is included in the use history data 82. Details of the correction unit last use time will be described later.

FIGS. 10A to 10E show the contents of the storage unit 63 when scheduling a plurality of substrates W to which the same recipe is applied in a state where all the processing units MPC1 to MPC24 are usable (valid) and initialized. 2 shows an example of the transition of the usage history data 82.

As shown in FIG. 10A, before the scheduling of the first substrate W, the possible loading rate (the oldest number of chambers / the number of effective chambers × 100) of each processing section PZ is 100%. The section last use time is an initial value (0 in FIG. 10), and the oldest chamber number of each processing section PZ is eight. The number of effective chambers in each processing section PZ is eight. In the recipe applied to a plurality of substrates W, all the processing units MPC1 to MPC24 are designated as parallel processing units.

When the substrate processing apparatus 1 is initialized, all unit last use times are also initialized, and initial values (for example, 0) are registered as unit last use times for all the processing units MPC1 to MPC24. If the unit last use time is a value other than the initial value, the unit last use time is corrected using the transport time. However, if the unit last use time is the initial value, the initial value is the corrected unit last use time. Registered as In the example shown in FIG. 10A, the correction unit final use times of all the processing units MPC1 to MPC24 are initial values, and therefore all the partition final use times are initial values (0 in FIG. 10A).

When the processing section PZ for processing the first substrate W is selected, the scheduling function unit 65 searches for the processing section PZ having the oldest partition last use time among all the processing sections PZ1 to PZ3, and performs a plurality of processing. It is confirmed whether or not the section PZ is included in the candidate sections (step S34 in FIG. 8, first search step). When there is one candidate section, that is, when only one processing section PZ having the oldest section last use time is found (step S34: NO in FIG. 8), the processing section PZ is designated as the first substrate. Select for W (step S35 in FIG. 8, section selection step). In the example shown in FIG. 10A, since all the partition last use times are initial values, all the process partitions PZ1 to PZ3 correspond to the process partition PZ with the oldest partition last use time.

When a plurality of processing partitions PZ having the oldest partition last use time are found (step S34 in FIG. 8: YES), the scheduling function unit 65 has the highest possible input rate ((oldest chamber number / effective chamber number) × 100). This processing section PZ is searched among the plurality of processing sections PZ included in the candidate section, and it is confirmed whether or not the plurality of processing sections PZ corresponding to this search condition are included in the candidate section (step S36 in FIG. 8). Second search step). When one processing section PZ is found, that is, when there is one processing section PZ having the maximum possible loading rate (step S36: NO in FIG. 8), the processing section PZ is designated as the first substrate W. (Step S37 in FIG. 8, section selection step and selection step). In the example shown in FIG. 10A, since all the unit last use times are initial values, all the processing sections PZ1 to PZ3 correspond to the processing section PZ having the maximum possible input rate.

When a plurality of processing partitions PZ having the maximum input rate are found (step S36 in FIG. 8: YES), the scheduling function unit 65 has the smallest partition number among the plurality of processing partitions PZ included in the candidate partition (that is, The processing section PZ having the highest priority assigned in advance is selected for the first substrate W (step S38 in FIG. 8. Section selection step, third search step, and selection step). In the example shown in FIG. 10A, the first processing section PZ1 having the smallest section number is selected as the processing section PZ for processing the first substrate W. Therefore, as shown in FIG. 10B, the number of oldest chambers in the first processing section PZ1 is reduced from 8 to 7, and the input possibility rate of the first processing section PZ1 is 87.5% ((7/8) × 100). To decrease.

When the scheduling for the first substrate W is completed, the scheduling function unit 65 estimates the time when the first substrate W ends, and the estimated time of the processing unit MPC that processes the first substrate W is estimated. The unit last use time is registered in the storage unit 63. Thereafter, the scheduling function unit 65 subtracts the transport time from the unit last use time of the processing unit MPC that processes the first substrate W to the processing unit MPC, and uses the obtained value (time) as the corrected unit last use time. Is registered in the storage unit 63. That is, for the processing unit MPC that processes the first substrate W, the new unit final use time and the corrected unit final use time are registered in the storage unit 63. For the second and subsequent substrates W, when the scheduling is completed, the new unit final use time and the corrected unit final use time are registered in the storage unit 63 for the processing unit MPC selected for processing the substrate W. .

When the scheduling for the first substrate W is completed, the unit last use time and the correction unit last use time of the processing unit MPC that processes the first substrate W are changed to values other than the initial values. The partition last use time is the oldest time among the correction unit last use times of all the processing units MPC belonging to the same processing partition PZ. Even if the correction unit final use time of the processing unit MPC for processing the first substrate W is changed, the correction unit final use time of another processing unit MPC belonging to the same processing section PZ as this processing unit MPC is the initial value. Remains. Therefore, the section last use time of the processing section PZ to which the processing unit MPC that processes the first substrate W belongs remains the initial value.

When selecting the processing section PZ for processing the second substrate W, one of the three processing sections PZ is selected as described above. In the example shown in FIG. 10B, although the final use time of each processing partition PZ is an initial value, the second processing partition PZ2 and the third processing partition PZ3 correspond to the processing partition PZ with the maximum input rate, The second processing section PZ2 having the smallest number is selected for the second substrate W. Therefore, as shown in FIG. 10C, the number of oldest chambers in the second processing section PZ2 is reduced from 8 to 7, and the input possibility rate of the second processing section PZ2 is 87.5% ((7/8) × 100). To decrease.

When selecting the processing section PZ for processing the third substrate W, one of the three processing sections PZ is selected as described above. In the example shown in FIG. 10C, although the final use time of each processing section PZ is the initial value, the third processing section PZ3 has the highest input possibility rate, so the third processing section PZ3 is the third substrate W. Selected for. Therefore, as shown in FIG. 10D, the number of the oldest chambers in the third processing section PZ3 is reduced from 8 to 7, and the charging rate of the third processing section PZ3 is 87.5% ((7/8) × 100). To decrease.

When selecting the processing section PZ for processing the fourth substrate W, one of the three processing sections PZ is selected as described above. In the example shown in FIG. 10D, the section last use time of each processing section PZ is the initial value, and the input possibility rate is the same among the three processing sections PZ. Therefore, there are four first processing sections PZ1 having the smallest section number. Selected for eye substrate W. Therefore, as shown in FIG. 10E, the number of oldest chambers in the first processing section PZ1 is reduced from 7 to 6, and the input possibility rate of the first processing section PZ1 is reduced to 75% ((6/8) × 100). To do.

As for the processing section PZ for processing the fifth and subsequent substrates W, one of the three processing sections PZ is selected as described above. When a schedule for using all the processing units MPC belonging to the same processing partition PZ is created, for each processing unit MPC belonging to the processing partition PZ, the unit final use time and the corrected unit final use time are values other than the initial values. Changed to In this case, the scheduling function unit 65 registers the oldest time among the corrected unit final use times of all the processing units MPC belonging to the processing partition PZ in the storage unit 63 as the partition final use time. Thereby, the partition last use time is changed to a value other than the initial value.

In FIG. 11A to FIG. 11E, as shown in FIG. 9B, the four processing units MPC5 to MPC8 belonging to the first processing section PZ1 are disabled (unusable) for maintenance, and all other processing units MPC1 to MPC1 Example of transition of usage history data 82 in the storage unit 63 when scheduling a plurality of substrates W to which the same recipe is applied in a state where the MPC 4 and MPC 9 to MPC 24 are usable (valid) and initialized. Is shown.

As shown in FIG. 11A, before performing scheduling of the first substrate W, the input possibility rate of each processing section PZ is 100%, and the section last use time of each processing section PZ is an initial value (in FIG. 11). , 0), the oldest chamber number of the first processing section PZ1 is 4, and the oldest chamber number of the second processing section PZ2 and the third processing section PZ3 is eight. The number of effective chambers in the first processing section PZ1 is 4, and the number of effective chambers in the second processing section PZ2 and the third processing section PZ3 is eight. In the recipe applied to a plurality of substrates W, all the processing units MPC1 to MPC24 are designated as parallel processing units.

When the processing section PZ for processing the first substrate W is selected, as shown in FIG. 11A, the section final use time is the initial value for all the processing sections PZ, and the input possibility rate is three processing sections PZ. Therefore, the scheduling function unit 65 selects the first processing section PZ1 having the smallest section number as the processing section PZ for processing the first substrate W, and the first substrate W in the first processing section PZ1. Scheduling to process Therefore, as shown in FIG. 11B, the oldest chamber number of the first processing section PZ1 is decreased from 4 to 3, and the input possibility rate of the first processing section PZ1 is decreased to 75% ((3/4) × 100). To do.

When the processing section PZ for processing the second substrate W is selected, as shown in FIG. 11B, the processing end PZ is the initial value for any processing section PZ, and the second processing section PZ2 and the third processing section The scheduling function unit 65 selects the second processing section PZ2 having the smallest section number for the second substrate W because the PZ3 insertion possibility rate is the highest. Therefore, as shown in FIG. 11C, the oldest number of chambers in the second processing section PZ2 is reduced from 8 to 7, and the charging rate of the second processing section PZ2 is 87.5% ((7/8) × 100). To decrease.

When selecting the processing section PZ for processing the third substrate W, as shown in FIG. 11C, the section final use time is the initial value for any processing section PZ, and the input possibility rate of the third processing section PZ3 is Since it is the highest, the scheduling function unit 65 selects the third processing section PZ3 for the third substrate W. Therefore, as shown in FIG. 11D, the number of oldest chambers in the third processing section PZ3 is reduced from 8 to 7, and the charging rate of the third processing section PZ3 is 87.5% ((7/8) × 100). To decrease.

When the processing section PZ for processing the fourth substrate W is selected, as shown in FIG. 11D, the processing end PZ is the initial value for all processing sections PZ, and the second processing section PZ2 and the third processing section The scheduling function unit 65 selects the second processing section PZ2 having the smallest section number for the fourth substrate W because the PZ3 input possibility rate is the highest. Therefore, as shown in FIG. 11E, the number of oldest chambers in the second processing section PZ2 is decreased from 7 to 6, and the input possibility rate of the second processing section PZ2 is decreased to 75% ((6/8) × 100). To do.

When the processing section PZ for processing the fifth substrate W is selected, as shown in FIG. 11E, the section final use time is the initial value for any processing section PZ, and the input possibility rate of the third processing section PZ3 is Since it is the highest, the scheduling function unit 65 selects the third processing section PZ3 for the fourth substrate W. Therefore, as shown in FIG. 11F, the number of oldest chambers in the third processing section PZ3 is reduced from 7 to 6, and the input possibility rate of the third processing section PZ3 is reduced to 75% ((6/8) × 100). To do.

FIG. 12 shows an example of the unit last use time, the transport time, and the corrected unit last use time after all the unit last use times have been changed to values other than the initial values.

FIG. 12 shows an example in which the first to third substrates W are carried into the processing units MPC1, MPC9, and MPC17 in the order of the processing unit MPC1, the processing unit MPC9, and the processing unit MPC17. In the example shown in FIG. 12, the unit last use time of the processing unit MPC1 is 12:00:00, the unit last use time of the processing unit MPC9 is 12:00:15, and the unit of the processing unit MPC17 The last use time is 12:00:30.

FIG. 12 shows an example in which the transport time of the first processing section PZ1 is 10 seconds, the transport time of the second processing section PZ2 is 15 seconds, and the transport time of the third processing section PZ3 is 15 seconds. ing. The transfer time of each processing section PZ is registered in the transfer time data 83 (see FIG. 5) (transfer time registration step). Although the processing unit MPC1 and the processing unit MPC2 belong to the first processing section PZ1, the distance from the load port LP to the processing unit MPC1 is strictly different from the distance from the load port LP to the processing unit MPC2. Therefore, strictly speaking, the transport time of the substrate W to the processing unit MPC1 is different from the transport time of the substrate W to the processing unit MPC2. However, in the example shown in FIG. 12, if the processing units MPC belong to the same processing section PZ, the transport times are regarded as being substantially equal, and one transport time is registered in all the processing units MPC belonging to the same processing section PZ. Yes.

The scheduling function unit 65 subtracts the transport time of the first processing section PZ1 from the unit last use time of the processing unit MPC1, and registers the obtained value (time) as the correction unit last use time of the processing unit MPC1. Specifically, the scheduling function unit 65 registers 11:59:50 (12: 00: 00-10 seconds) as the correction unit last use time of the processing unit MPC1. Similarly, the scheduling function unit 65 registers 12:00:15 (12: 00: 15-15 seconds) as the correction unit last use time of the processing unit MPC9, and sets the correction unit last use time of the processing unit MPC17. Register 12:00:15 (12: 00: 30-15 seconds).

Next, the scheduling function unit 65 stores the oldest time among the corrected unit final use times of all valid processing units MPC belonging to the same processing partition PZ as the partition final use time of the processing partition PZ in the storage unit 63. Register (partition last use time specifying step). In the example shown in FIG. 12, the correction unit last use time of the processing unit MPC1 is the oldest among the correction unit last use times of the processing units MPC1 to MPC8. In the example shown in FIG. 12, the correction unit final use time of the processing unit MPC9 is the oldest among the correction unit final use times of the processing units MPC9 to MPC16, and the correction unit final use time of the processing unit MPC17 is the processing unit. The oldest correction unit last use time of units MPC17 to MPC24. Accordingly, the scheduling function unit 65 registers the correction unit last use time of the processing unit MPC1 as the partition last use time of the first processing section PZ1, and sets the correction unit last use time of the processing unit MPC9 as the section last use of the second processing section PZ2. The use time is registered, and the correction unit last use time of the processing unit MPC17 is registered as the section last use time of the first processing section PZ1.

13A to 13E show the use history in the storage unit 63 when scheduling of a plurality of substrates W to which the same recipe is applied after all the unit last use times have been changed to values other than the initial values. An example of the transition of the data 82 is shown.

As shown in FIG. 13A, before performing scheduling of the first substrate W, the loading rate of each processing section PZ is 12.5% ((1/8) × 100), and the section of each processing section PZ The last use time is a different value other than the initial value, and the number of oldest chambers in each processing section PZ is 1. The number of effective chambers in each processing section PZ is eight. In the recipe applied to a plurality of substrates W, all the processing units MPC1 to MPC24 are designated as parallel processing units.

FIG. 13A shows that the last use time of the first processing section PZ1 is 12:00:00, the last use time of the second processing section PZ2 is 12:00:30, and the third processing section PZ3. In this example, the last use time of the partition is 12:01:00. When selecting the processing section PZ for processing the first substrate W, as shown in FIG. 13A, since the section last use time of the first processing section PZ1 is the oldest, the scheduling function unit 65 sets the first processing section PZ1. Is selected as the processing section PZ for processing the first substrate W.

FIG. 13B shows an example in which the first substrate W is processed by the processing unit MPC having the oldest modified unit last use time among all the processing units MPC1 to MPC8 belonging to the first processing section PZ1. Therefore, the section last use time of the first processing section PZ1 is changed to a time different from the time before scheduling of the first substrate W. FIG. 13B shows an example in which the partition last use time of the first processing partition PZ1 is updated from 12:00:00 to 12: 1: 30.

When selecting the processing section PZ for processing the second substrate W, as shown in FIG. 13B, since the section last use time (12:00:30) of the second processing section PZ2 is the oldest, the scheduling function unit 65 selects the second processing section PZ2 as the processing section PZ for processing the second substrate W, and the correction unit last use time is the oldest among all the processing units MPC9 to MPC16 belonging to the second processing section PZ2. A schedule for causing the processing unit MPC to process the substrate W is created. Therefore, as shown in FIG. 13C, the section last use time of the second processing section PZ2 is updated from 12:00:30 to 12:02:00.

When selecting the processing section PZ for processing the third substrate W, as shown in FIG. 13C, since the section last use time (12:01:00) of the third processing section PZ3 is the oldest, the scheduling function unit 65 selects the third processing section PZ3 as the processing section PZ for processing the third substrate W, and the correction unit final use time is the oldest among all the processing units MPC17 to MPC24 belonging to the third processing section PZ3. A schedule for causing the processing unit MPC to process the substrate W is created. Therefore, as shown in FIG. 13D, the section last use time of the third processing section PZ3 is updated from 12:01:00 to 12:02:00.

When selecting the processing section PZ for processing the fourth substrate W, as shown in FIG. 13D, since the section last use time (12:01:30) of the first processing section PZ1 is the oldest, the scheduling function unit 65 selects the first processing section PZ1 as the processing section PZ for processing the fourth substrate W, and the correction unit last use time is the oldest among all the processing units MPC1 to MPC8 belonging to the first processing section PZ1. A schedule for causing the processing unit MPC to process the substrate W is created. Therefore, as shown in FIG. 13E, the section last use time of the first processing section PZ1 is updated from 12:01:30 to 12:03:00.

As for the processing section PZ for processing the fifth and subsequent substrates W, the processing section PZ having the oldest section last use time is selected from the three processing sections PZ as described above. If there are a plurality of processing sections PZ having the oldest section last use time, the processing section PZ having the maximum possible input rate is selected from them. If a plurality of processing sections PZ still remain, the processing section PZ having the smallest section number among the plurality of remaining processing sections PZ is selected.

Next, scheduling when the processing time of the substrate W is reduced will be described.

First, scheduling according to the first embodiment will be described with reference to FIGS. 14A to 14F and FIGS. 15A to 15B, and then scheduling according to the first comparative example will be described with reference to FIGS. 16A to 16F and FIG. Will be described.

FIG. 14A to FIG. 14F are tables showing examples of the input possibility rate, the partition last use time, the oldest chamber number, and the effective chamber number according to the first embodiment. 14A to 14F, after scheduling a plurality of substrates W to which the first recipe for processing the substrate W for the first processing time is applied, the substrate W is subjected to a second processing time shorter than the first processing time. An example of the transition of the usage history data 82 in the storage unit 63 when scheduling a plurality of substrates W to which the second recipe is applied is shown.

As shown in FIG. 14A, before performing scheduling of the first substrate W, the input rate of each processing section PZ is 100% ((8/8) × 100), and the final use of each processing section PZ The time is an initial value (0 in FIG. 14A), and the oldest chamber number of each processing section PZ is eight. The number of effective chambers in each processing section PZ is eight. Each unit last use time is an initial value. In the first recipe and the second recipe, all the processing units MPC1 to MPC24 are designated as parallel processing units. The first processing time specified in the first recipe is, for example, 240 seconds, and the second processing time specified in the second recipe is, for example, 60 seconds.

When the processing section PZ for processing the first substrate W to which the first recipe is applied is selected, as shown in FIG. 14A, the section final use time is the initial value for any processing section PZ, and the input possibility rate Are equal among the three processing sections PZ, the scheduling function unit 65 selects the first processing section PZ1 having the smallest section number as the processing section PZ for processing the first substrate W. Therefore, as shown in FIG. 14B, the number of oldest chambers of the first processing section PZ1 is reduced from 8 to 7, and the input possibility rate of the first processing section PZ1 is 87.5% ((7/8) × 100). To decrease.

When the processing section PZ for processing the second substrate W to which the first recipe is applied is selected, as shown in FIG. 14B, the section final use time is the initial value for any processing section PZ, and the second processing is performed. Since the input possibility ratio of the section PZ2 and the third processing section PZ3 is the highest, the scheduling function unit 65 selects the second processing section PZ2 having the smallest section number for the second substrate W. Therefore, as shown in FIG. 14C, the number of oldest chambers in the second processing section PZ2 is reduced from 8 to 7, and the input possibility rate of the second processing section PZ2 is 87.5% ((7/8) × 100). To decrease.

When selecting the processing section PZ for processing the third substrate W to which the second recipe having a processing time different from that of the first recipe is selected, as shown in FIG. Is also an initial value, and the third process section PZ3 has the highest input possibility rate, so the scheduling function unit 65 selects the third process section PZ3 for the third substrate W. Therefore, as shown in FIG. 14D, the number of oldest chambers in the third processing section PZ3 is reduced from 8 to 7, and the charging rate of the third processing section PZ3 is 87.5% ((7/8) × 100). To decrease.

When the processing section PZ for processing the fourth substrate W to which the second recipe is applied is selected, as shown in FIG. 14D, the section final use time is the initial value for any processing section PZ, and the input possibility rate Are equal among the three processing sections PZ, the scheduling function unit 65 selects the first processing section PZ1 having the smallest section number as the processing section PZ for processing the fourth substrate W. Therefore, as shown in FIG. 14E, the number of oldest chambers in the first processing section PZ1 is decreased from 6 to 7, and the input possibility rate of the first processing section PZ1 is decreased to 75% ((6/8) × 100). To do.

When the processing section PZ for processing the fifth substrate W to which the second recipe is applied is selected, as shown in FIG. 14E, the section final use time is the initial value for any processing section PZ, and the second processing is performed. Since the input possibility ratio of the section PZ2 and the third processing section PZ3 is the highest, the scheduling function unit 65 selects the second processing section PZ2 having the smallest section number for the fifth substrate W. Therefore, as shown in FIG. 14F, the number of oldest chambers in the second processing section PZ2 is reduced from 7 to 6, and the input possibility rate of the second processing section PZ2 is reduced to 75% ((6/8) × 100). To do.

15A and 15B are time charts showing a schedule according to the first embodiment. FIG. 15A shows an example of a schedule after scheduling of the first and second substrates W1 and W2 to which the first recipe for processing the substrate W for the first processing time is applied. In the example shown in FIG. 15A, the first substrate W1 is processed by the processing unit MPC1 in the first processing section PZ1, and the second substrate W2 is processed by the processing unit MPC9 in the second processing section PZ2. A schedule has been created.

FIG. 15B shows an example of a schedule after scheduling the third to sixth substrates W3 to W6 to which the second recipe for processing the substrate W for the second processing time is applied. In the example shown in FIG. 15B, the third substrate W3 is processed by the processing unit MPC17 of the third processing section PZ3, and the fourth substrate W4 is processed by the processing unit MPC2 of the first processing section PZ1. A schedule has been created. In the example shown in FIG. 15B, the fifth substrate W5 is processed by the processing unit MPC10 in the second processing section PZ2, and the sixth substrate W6 is processed by the processing unit MPC18 in the third processing section PZ3. A schedule has been created.

As shown in FIG. 15B, if the processing partition PZ is selected with priority given first to the partition last use time representing the oldest time among the correction unit final use times of all the processing units MPC belonging to the same processing partition PZ, Not only when the processing time of the substrate W does not change, but also when the processing time of the substrate W decreases, all the processing sections PZ1 to PZ3 can be selected equally, and an empty processing unit MPC can be selected efficiently. Therefore, the operating rate of the substrate processing apparatus 1 can be increased as compared with the case where the processing section PZ is selected by giving priority to the section usage rate as described later.

Next, scheduling according to the first comparative example will be described with reference to FIGS. 16A to 16F and FIG.

Hereinafter, an example will be described in which the processing section PZ for processing the substrate W is selected based on the section usage rate instead of the section last use time. The partition usage rate is a value obtained by dividing the time required for processing the substrate W by the number of effective (available) processing units MPC in the processing partition PZ that processes the substrate W. If the time required for processing the substrate W is 240 seconds and the number of effective processing units MPC belonging to the processing partition PZ for processing the substrate W is 3, the partition usage rate is 80 (= 240/3). ).

16A to 16F are not the oldest time among the correction unit final use times of all the processing units MPC belonging to a certain processing partition PZ, but all the processing units MPC belonging to a certain processing partition PZ. It means the latest time of the unit last use time. Therefore, when a schedule for processing the substrate W by one processing unit MPC belonging to a certain processing section PZ is created, even if the unit final use time of another processing unit MPC belonging to the processing section PZ is an initial value, The section last use time of the processing section PZ is changed to the unit last use time of the processing unit MPC that processes the substrate W.

FIGS. 16A to 16F are tables showing an example of the partition usage rate, the partition final use time, and the number of effective chambers according to the first comparative example. 16A to 16F, after scheduling a plurality of substrates W to which the first recipe for processing the substrate W for the first processing time is applied, the substrate W is subjected to a second processing time shorter than the first processing time. An example of the transition of the usage history data 82 in the storage unit 63 when scheduling a plurality of substrates W to which the second recipe is applied is shown.

As shown in FIG. 16A, before the scheduling of the first substrate W, the partition usage rate of each processing partition PZ is 0, and the final partition use time is an initial value (0 in FIG. 16A). The number of effective chambers in each processing section PZ is three. In the first recipe and the second recipe, all the processing units MPC1 to MPC24 are designated as parallel processing units. The first processing time specified in the first recipe is, for example, 240 seconds, and the second processing time specified in the second recipe is, for example, 60 seconds.

When the processing section PZ for processing the first substrate W to which the first recipe is applied is selected, as shown in FIG. 16A, the section usage rate is 0 for any processing section PZ, and the section final use time is Since all the processing sections PZ are initial values, the scheduling function unit 65 selects the first processing section PZ1 having the smallest section number as the processing section PZ for processing the first substrate W. Therefore, as shown in FIG. 16B, the partition usage rate of the first processing partition PZ1 increases. FIG. 16B shows an example in which the first processing time is 240 seconds and the partition usage rate of the first processing partition PZ1 is increased from 0 to 80 (= 240/3).

When the processing section PZ for processing the second substrate W to which the first recipe is applied is selected, as shown in FIG. 16B, the section usage rates of the second processing section PZ2 and the third processing section PZ3 are zero. Since the last use time of the second processing section PZ2 and the third processing section PZ3 is an initial value, the scheduling function unit 65 processes the second substrate W in the second processing section PZ2 having the smallest section number. Select as processing section PZ. Therefore, as shown in FIG. 16C, the partition usage rate of the second processing partition PZ2 increases. FIG. 16C shows an example in which the first processing time is 240 seconds and the partition usage rate of the second processing partition PZ2 is increased from 0 to 80 (= 240/3).

When the processing section PZ for processing the third substrate W to which the second recipe having a processing time different from that of the first recipe is applied is selected, as shown in FIG. 16C, the section usage rate of the third processing section PZ3 is Since it is the smallest, the scheduling function unit 65 selects the third processing section PZ3 as the processing section PZ for processing the third substrate W. Therefore, as shown in FIG. 16D, the partition usage rate of the third processing partition PZ3 increases. FIG. 16D shows an example in which the second processing time is 60 seconds and the partition usage rate of the second processing partition PZ2 is increased from 0 to 20 (= 60/3).

When the processing section PZ for processing the fourth substrate W to which the second recipe is applied is selected, as shown in FIG. 16D, the partition usage rate of the third processing section PZ3 is still the smallest, so the scheduling function unit 65 Selects the third processing section PZ3 as the processing section PZ for processing the fourth substrate W. Therefore, as shown in FIG. 16E, the partition usage rate of the third processing partition PZ3 increases. FIG. 16E shows an example in which the partition usage rate of the second processing partition PZ2 is increased to 40 (= 120/3).

When the processing section PZ for processing the fifth substrate W to which the second recipe is applied is selected, as shown in FIG. 16E, the partition usage rate of the third processing section PZ3 is still the smallest, so the scheduling function unit 65 Selects the third processing section PZ3 as the processing section PZ for processing the fifth substrate W. Therefore, as shown in FIG. 16F, the partition usage rate of the third processing partition PZ3 increases. FIG. 16F shows an example in which the partition usage rate of the second processing partition PZ2 is increased to 60 (= 180/3).

When the processing section PZ for processing the sixth substrate W to which the second recipe is applied is selected, the partition usage rate of the third processing section PZ3 is still the smallest as shown in FIG. Selects the third processing section PZ3 as the processing section PZ for processing the sixth substrate W. Therefore, the partition usage rate of the third processing partition PZ3 increases. Specifically, the partition usage rate of the second processing partition PZ2 increases to 80 (= 240/3). Thereby, the partition usage rate of the third processing partition PZ3 becomes equal to the partition usage rates of the first processing partition PZ1 and the second processing partition PZ2.

FIG. 17 is a time chart showing a schedule after the processing section PZ is selected with priority given to the section usage rate, and the third to sixth substrates W3 to W6 are scheduled.

As described above, when the processing section PZ is selected based on the section usage rate, the third processing section PZ3 is selected for the sixth substrate W6. Therefore, as shown in FIG. 17, the sixth substrate W6 belongs to the third processing section PZ3 even though there are processing units MPC free in the first processing section PZ1 and the second processing section PZ2. A schedule is created to be processed by the MPC 17. Therefore, when the sixth substrate W6 is processed in the first processing section PZ1 or the second processing section PZ2, the sixth substrate W6 can be immediately transferred to the third substrate W6. When processing is performed in the processing section PZ3, it is necessary to delay the start of conveyance until the processing unit MPC17 finishes processing the third substrate W3.

As can be seen from a comparison between FIG. 17 and FIG. 15B, in each case, the third substrate W3 is scheduled to be processed by the processing unit MPC17. However, in the example shown in FIG. The substrate W4 is processed by the processing unit MPC2, and a schedule is created so that the fifth substrate W5 is processed by the processing unit MPC10. Further, in the example shown in FIG. 15B, a schedule is created so that the sixth substrate W6 is processed by the processing unit MPC17. Accordingly, in the example shown in FIG. 15B, an empty processing unit MPC is efficiently selected, so that the conveyance delay as shown in FIG. 17 can be prevented and the operating rate of the substrate processing apparatus 1 can be increased.

Next, scheduling when the processing time of the substrate W is reduced after the processing of the substrate W is scheduled in all the effective processing units MPC will be described.

First, scheduling according to the second embodiment will be described, and then scheduling according to the second comparative example will be described.

FIG. 18 is a table showing an example of the unit last use time, the transport time, and the modified unit last use time according to the second embodiment. 19A to 19D are time charts showing schedules according to the second embodiment.

FIGS. 19A to 19B show an example of a schedule after performing scheduling of the first to eleventh substrates W1 to W11 to which the first recipe for processing the substrate W for the first processing time is applied. FIG. 19A shows a schedule up to the time when processing of the first substrate W1 ends, and FIG. 19B shows a continuation of FIG. 19A.

FIG. 19C shows an example of a schedule after scheduling the 12th substrate W12 to which the second recipe for processing the substrate W for the second processing time is applied. FIG. 19D shows an example of a schedule after scheduling the 13th to 15th substrates W13 to W15 to which the second recipe for processing the substrate W for the second processing time is applied.

19A to 19D show examples in which the processing units MPC1, MPC2, MPC3, MPC9, MPC10, MPC11, MPC17, MPC18, and MPC19 are effective processing units MPC. Therefore, the number of effective chambers in each processing section PZ is three. In the first recipe and the second recipe, all the processing units MPC1 to MPC24 are designated as parallel processing units. The first processing time specified in the first recipe is, for example, 240 seconds, and the second processing time specified in the second recipe is, for example, 60 seconds.

Before scheduling the first substrate W, the input possibility rate of each processing section PZ is 100% ((3/3) × 100), and the last use time of each processing section PZ is an initial value. The oldest number of chambers in each processing section PZ is three. The situation before scheduling the first substrate W is substantially the same as the example described with reference to FIGS. 10A to 10E. Therefore, the scheduling of the first to eleventh substrates W1 to W11 is performed in the same manner as the example described with reference to FIGS. 10A to 10E.

Specifically, as shown in FIG. 19A, the first substrate W1 is processed by the processing unit MPC1, the second substrate W2 is processed by the processing unit MPC9, and the third substrate W3 is processed by the processing unit MPC17. A schedule is created to be processed in Also, a schedule is created so that the fourth substrate W4 is processed by the processing unit MPC2, the fifth substrate W5 is processed by the processing unit MPC10, and the sixth substrate W6 is processed by the processing unit MPC18. Is done. Further, a schedule is created so that the seventh substrate W7 is processed by the processing unit MPC1, the eighth substrate W8 is processed by the processing unit MPC9, and the ninth substrate W9 is processed by the processing unit MPC17. Is done.

Further, as shown in FIG. 19B, a schedule is created so that the tenth substrate W10 is processed by the processing unit MPC1 and the eleventh substrate W11 is processed by the processing unit MPC9. That is, the tenth substrate W10 is processed by the processing unit MPC1 after the first substrate W1 is processed by the processing unit MPC1. The eleventh substrate W11 is processed by the processing unit MPC9 after the second substrate W2 is processed by the processing unit MPC9. In this way, a schedule for processing the first to eleventh substrates W1 to W11 is created.

In the lower part of FIG. 19B, the unit last use time (time T1 to T7) of each processing unit MPC after the schedule for processing the eleventh substrate W11 is created is shown. The unit final use time of the processing unit MPC1 at the time when the schedule for processing the eleventh substrate W11 is created is the time T6, and the unit final use time of the processing unit MPC2 at this time is the time T1. The unit last use time of the processing unit MPC3 is time T3. The earliest time among these is time T1.

FIG. 18 shows the unit last use time, transfer time, and correction unit last use time of all effective processing units MPC at the time when the schedule for processing the 11th substrate W11 is created. The transfer time of the first processing section PZ1 to which the processing units MPC1, MPC2, and MPC3 belong is the transfer time t1. Therefore, the correction unit final use time of the processing unit MPC1 is time T6−transport time t1, the correction unit final use time of the processing unit MPC2 is time T1—transport time t1, and the correction unit final use time of the processing unit MPC3 is Time T3−transport time t1. The earliest time among these is time T1−transport time t1.

The unit final use time of the processing unit MPC9 is time T7, the unit final use time of the processing unit MPC10 is time T2, and the unit final use time of the processing unit MPC11 is time T4. As shown in FIG. 19B, the earliest time among these is time T2. The transport time of the second processing section PZ2 to which the processing unit MPC9, the processing unit MPC10, and the processing unit MPC11 belong is a transport time t2. Therefore, the correction unit final use time of the processing unit MPC9 is time T7-transport time t2, the correction unit final use time of the processing unit MPC10 is time T2-transport time t2, and the correction unit final use time of the processing unit MPC11 is Time T4−transport time t2. The earliest time among these is time T2−transport time t2.

The unit final use time of the processing unit MPC17 is time T1, the unit final use time of the processing unit MPC18 is time T3, and the unit final use time of the processing unit MPC19 is time T5. As shown in FIG. 19B, the earliest time among these is time T2. The transfer time of the second processing section PZ2 to which the processing unit MPC17, the processing unit MPC18, and the processing unit MPC19 belong is the transfer time t2. Accordingly, the correction unit final use time of the processing unit MPC17 is time T1−transport time t2, the correction unit final use time of the processing unit MPC18 is time T3−transport time t2, and the correction unit final use time of the processing unit MPC19 is Time T5—transport time t2. The earliest time among these is time T1−transport time t2.

As shown in FIG. 18, the final use time of the first processing section PZ1 at the time when the schedule for processing the eleventh substrate W11 is created is time T1−transport time t1. The section last use time of the second processing section PZ2 at this time is time T2−transport time t2. The section last use time of the third processing section PZ3 at this time is time T1−transport time t2. As shown in the vicinity of the left end of FIG. 19A, the transport time t1 is shorter than the transport time t2. Therefore, the partition last use time (T1-S2) of the third processing partition PZ3 is the oldest among the partition last use times of the three processing partitions PZ.

Since the partition last use time of the third process partition PZ3 is the oldest among the partition last use times of the three process partitions PZ, the scheduling function unit 65 sets the third process partition PZ3 for the 12th substrate W. select. FIG. 19C shows an example in which the twelfth substrate W12 is scheduled to be processed by the processing unit MPC17 belonging to the third processing section PZ3. In this example, when a schedule for processing the 12th substrate W12 is created, the unit last use time and the correction unit last use time of the processing unit MPC17 are updated, and the section last use time of the third processing section PZ3 is updated. Updated.

As can be seen from FIG. 19C, the processing time (second processing time) of the twelfth substrate W12 is shorter than the processing times (first processing time) of the first to eleventh substrates W1 to W11. That is, the second recipe that applies the second processing time shorter than the first processing time to the substrate W12 is applied to the twelfth substrate W12. Similarly, the second recipe is applied to the 13th to 15th substrates W13 to W15. FIG. 19D shows a schedule in which the thirteenth substrate W13 is processed by the processing unit MPC2, the fourteenth substrate W14 is processed by the processing unit MPC10, and the fifteenth substrate W15 is processed by the processing unit MPC18. An example is shown.

Next, scheduling according to the second comparative example will be described with reference to FIG.

FIG. 20 is a time chart showing a schedule according to the second comparative example. After the processing section PZ is selected by giving priority to the section usage rate, the 12th to 15th substrates W12 to W15 are scheduled. An example of the schedule is shown.

In the second comparative example, the number of effective chambers and parallel processing units in each processing section PZ are the same as in the second embodiment. The first recipe is applied to the first to eleventh substrates W1 to W11, and the second recipe is applied to the twelfth to fifteenth substrates W12 to W15. The schedule up to the eleventh substrate W11 is the same as in the second embodiment.

As shown in FIG. 20, when the processing section PZ to be selected based on the section usage rate is selected instead of the section last use time, the twelfth substrate W12 becomes the third processing section PZ3 as in the second embodiment. A schedule is created so that it can be processed. FIG. 20 shows an example in which the twelfth substrate W12 is scheduled to be processed by the processing unit MPC17.

On the other hand, when the selection of the processing section PZ for the thirteenth substrate W13 is started, the processing units MPC that are vacant (for example, the processing unit MPC2 and the processing unit MPC10) become the first processing section PZ1 and the second processing section. Although present in the section PZ2, the thirteenth substrate W13 is scheduled to be processed by the processing unit MPC18 belonging to the third processing section PZ3. Similarly, the fourteenth substrate W14 is processed by the processing unit MPC19 belonging to the third processing section PZ3, and the fifteenth substrate W15 is scheduled to be processed by the processing unit MPC17 belonging to the third processing section PZ3. .

In FIG. 20, the indexer robot IR (see FIG. 1) simultaneously carries the 14th to 15th substrates W14 to W15 from the carrier C on the load port LP, and the 14th to 15th substrates W14 to W15 to the load port LP. The example which carries in to the upper carrier C simultaneously is shown. The same applies to FIGS. 19A to 19D. In the example shown in FIG. 19D, the 14th to 15th substrates W14 to W15 are unloaded from the carrier C at the unloading time X1, and are loaded into the carrier C at the loading time Y1. In the example shown in FIG. 20, the 14th to 15th substrates W14 to W15 are unloaded from the carrier C at the unloading time X2, and are loaded into the carrier C at the loading time Y2.

In the second example and the second comparative example, although the 12th to 15th substrates W12 to W15 are processed by a plurality of processing units MPC under the same conditions, as shown in FIG. The unloading time X1 is earlier by the time Z1 than the unloading time X2 according to the second comparative example, and the unloading time Y1 according to the second embodiment is earlier by the time Z1 than the loading time Y2 according to the second comparative example. Therefore, in the second embodiment, the three processing sections PZ can be selected equally, and not only can the operating rate of the substrate processing apparatus 1 be increased, but also the number of processed substrates W per unit time compared to the second comparative example. Can be increased. Thereby, the throughput of the substrate processing apparatus 1 can be increased.

As described above, in the present embodiment, instead of selecting the processing partition PZ based on the size relationship of the partition usage rate, one processing partition PZ is selected from the plurality of processing partitions PZ based on the partition final use time. To do. Then, one processing unit MPC is selected from the plurality of processing units MPC belonging to the selected processing section PZ. Thereafter, the substrate W is transported from the carrier C on the load port LP to the selected processing unit MPC by the indexer robot IR, the first main transport robot CR1, and the second main transport robot CR2 included in the substrate transport system TS1. The Therefore, not only when the processing time of the substrate W does not change, but also when the processing time of the substrate W decreases, a plurality of processing sections PZ can be selected equally, and all the processing units MPC1 provided in the substrate processing apparatus 1 MPC 24 can be used evenly. Thereby, the operation rate of the substrate processing apparatus 1 can be increased.

Moreover, the partition last use time is specified based on the oldest modified unit last use time, not the oldest unit last use time. The correction unit last use time is the time when the substrate W is transferred from the carrier C on the load port LP to the processing unit MPC from the unit last use time indicating the time when the processing unit MPC is used last for processing the substrate W. This is the time obtained by subtracting the transport time required for. Therefore, the difference in transport time among the plurality of processing sections PZ can be reduced, and it is possible to avoid selecting only the processing section PZ closer to the load port LP. Thereby, the plurality of processing sections PZ can be selected more evenly.

In the present embodiment, the same value is registered as the transport time for a plurality of processing units MPC belonging to the same processing section PZ. Even for a plurality of processing units MPC belonging to the same processing section PZ, the transport distances are strictly different, so the transport times are also strictly different. However, if the processing sections PZ to which they belong are the same, the difference in transport time is small, and the transport time is approximately equal between these processing units MPC. Therefore, if the same value is registered as the transport time for a plurality of processing units MPC belonging to the same processing section PZ, the setting of the transport time can be simplified while reducing the difference in transport time between these processing sections PZ.

In the present embodiment, when there are a plurality of processing sections PZ having the oldest section last use time, the processing section PZ having the maximum possible input rate is selected from among the processing sections PZ. In many cases, this means that the processing section PZ having the largest number of processing units MPC with the oldest unit last use time is selected. If an abnormality occurs in the processing unit MPC before the substrate W is transferred to the selected processing unit MPC or when the substrate W is transferred to the selected processing unit MPC, another processing unit MPC is selected. It is necessary to redo. In such a case, if there is another processing unit MPC having the oldest unit last use time in the same processing section PZ, that processing unit MPC can be selected as a new processing unit MPC. Therefore, a new transport path for the substrate W can be set with a relatively simple change.

In this embodiment, since all the processing units MPC can be used evenly, the processing unit MPC such as a device that is provided in the processing unit MPC such as the spin chuck 33 and the scrub member 37 or a pump that sends the chemical liquid to the chemical nozzle 34 is used. Related devices can be used equally. Therefore, the degree of wear of these consumables can be leveled, and the frequency of maintenance can be reduced. Thereby, the operation rate of the substrate processing apparatus 1 can be further increased.

In the first and second embodiments, the example in which the processing time of the substrate W is reduced from the first processing time to the second processing time has been described. Even in such a case, since one processing partition PZ is selected from among the plurality of processing partitions PZ based on the partition last use time, compared to the case where the processing partition PZ is selected based on the size relationship of the partition usage rate. A plurality of processing sections PZ can be selected equally. Therefore, even when the transport path and processing time of the substrate W are different, all the processing units MPC can be used evenly, and the operating rate of the substrate processing apparatus 1 can be further increased.

Other Embodiments The present invention is not limited to the contents of the above-described embodiments, and various modifications can be made.

For example, the processing section PZ may be classified based on the transport distance instead of the transport time.

The number of processing units MPC belonging to the same processing section PZ may be different among the three processing sections PZ.

The number of processing sections PZ provided in the substrate processing apparatus 1 may be two or five or more. For example, the second processing section PZ2 and the third processing section PZ3 may be handled as one processing section PZ. Alternatively, the third processing section PZ3 may be omitted.

When the third processing section PZ3 is omitted, the first main transfer robot CR1 may carry in and out the substrates W with respect to all the processing units MPC belonging to the first processing section PZ1 and the second processing section PZ2. . In this case, the second main transfer robot CR2 and the second delivery unit PASS2 are unnecessary.

The transport time of the second processing section PZ2 may be different from the transport time of the third processing section PZ3, or may be equal to the transport time of the first processing section PZ1.

The same value is not registered as the transport time for a plurality of processing units MPC belonging to the same processing section PZ, but the transport time may be registered for each processing unit MPC. That is, the transfer times registered for a plurality of processing units MPC belonging to the same processing section PZ may be different from each other.

When a plurality of processing partitions with the oldest partition last use time are found (step S34 in FIG. 8: YES), the scheduling function unit is not the processing partition PZ with the highest possible input rate but the processing partition with the maximum oldest chamber number. The PZ may be searched among a plurality of processing sections included in the candidate section.

When a plurality of processing sections having the oldest section last use time are found (step S34 in FIG. 8: YES), the processing section PZ is selected based on the section number instead of selecting the processing section PZ based on the input possibility rate. May be. Alternatively, an arbitrary processing section PZ may be selected from among a plurality of processing sections PZ having the oldest section last use time.

The unit last use time may be used instead of the modified unit last use time. Alternatively, the modified unit last use time may be used instead of the unit last use time. For example, the partition last use time may be specified based on the oldest unit last use time, not the oldest modified unit last use time. When selecting the processing unit MPC for processing the substrate W, the oldest partition last use time may be given priority first, but the oldest modification unit last use time may be given priority first.

The processing unit MPC is not limited to the front surface cleaning unit shown in FIG. 3 and the end surface cleaning unit shown in FIG. 4, but a front surface scrub cleaning unit that cleans the surface of the substrate W with a scrub member, a back surface cleaning unit that cleans the back surface of the substrate W, and the like. Other types of processing units may be used. A plurality of types of processing units may be provided in one substrate processing apparatus 1.

Two or more of all the above-described configurations may be combined. Two or more of all the above steps may be combined.

Although the embodiments of the present invention have been described in detail, these are only specific examples used to clarify the technical contents of the present invention, and the present invention is construed to be limited to these specific examples. The spirit and scope of the present invention should not be limited only by the appended claims.

1: Substrate processing device 60: Computer (control device)
71: Schedule creation program 72: Processing execution program C: Carrier CR1: First main transfer robot CR2: Second main transfer robot IR: Indexer robot LP: Load port MPC: Processing unit TS1: Substrate transfer system W: Substrate

Claims

A substrate processing method executed by a substrate processing apparatus that transfers a substrate to a substrate transfer system from a carrier on a load port to a plurality of processing units that process the substrate,
Each of the plurality of processing units is based on a transport time required to transport the substrate from the carrier on the load port to the processing unit, or a transport distance representing a distance from the load port to the processing unit. An affiliation confirmation step for confirming which of the plurality of processing sections classified by
A unit final use time acquisition step of acquiring, for each of the plurality of processing units, a unit final use time representing a time at which the processing unit is last used for processing the substrate;
Based on the plurality of unit final use times acquired in the unit final use time acquisition step and the transfer times for the plurality of processing units, the transfer time is subtracted from the unit final use time in the same processing unit. A correction unit final use time calculation step for calculating a correction unit final use time representing each of the plurality of processing units;
Based on the plurality of correction unit final use times obtained in the correction unit final use time calculation step, represents the oldest time among the correction unit final use times of the plurality of processing units belonging to the same processing section. A partition last use time specifying step for specifying a partition last use time for each of the plurality of processing partitions;
A partition selection step of selecting, from the plurality of processing partitions, the one processing partition having the oldest partition final use time based on the plurality of partition final use times specified in the partition final use time specifying step. When,
A unit selection step of selecting one processing unit from among the plurality of processing units belonging to the processing section selected in the section selection step;
A substrate processing method comprising: transferring a substrate from the carrier on the load port to the processing unit selected in the unit selection step in the substrate transport system.
A substrate processing method executed by a substrate processing apparatus that transfers a substrate to a substrate transfer system from a carrier on a load port to a plurality of processing units that process the substrate,
Each of the plurality of processing units is based on a transport time required to transport the substrate from the carrier on the load port to the processing unit, or a transport distance representing a distance from the load port to the processing unit. An affiliation confirmation step for confirming which of the plurality of processing sections classified by
A unit final use time acquisition step of acquiring, for each of the plurality of processing units, a unit final use time representing a time at which the processing unit is last used for processing the substrate;
Based on the plurality of unit final use times acquired in the unit final use time acquisition step, the section final use representing the oldest time among the unit final use times of the plurality of processing units belonging to the same processing section. A partition last use time specifying step of specifying a time for each of the plurality of processing partitions;
A partition selection step of selecting, from the plurality of processing partitions, the one processing partition having the oldest partition final use time based on the plurality of partition final use times specified in the partition final use time specifying step. When,
A unit selection step of selecting one processing unit from among the plurality of processing units belonging to the processing section selected in the section selection step;
A substrate processing method comprising: transferring a substrate from the carrier on the load port to the processing unit selected in the unit selection step in the substrate transport system.
The substrate according to claim 1, further comprising a transfer time registration step of registering the same value as the transfer time for a plurality of the processing units belonging to the same processing section before the correction unit final use time calculating step. Processing method.
The partition selection step includes a first search step for searching the processing partition having the oldest partition last use time in the plurality of processing partitions, and a plurality of the processing partitions are found as candidate partitions in the first search step. A second search step of searching for the processing partition having the largest number of the processing units with the oldest unit last use time among the plurality of processing partitions included in the candidate partition, and the second search The substrate processing method according to any one of claims 1 to 3, further comprising a selection step of selecting one of the processing sections from at least one of the processing sections found in the step.
A substrate processing step of causing the processing unit selected in the unit selection step to process the substrate after the substrate transporting step in a processing time shorter than the processing time of the latest substrate transported to any of the plurality of processing units. The substrate processing method according to any one of claims 1 to 4, further comprising:
A load port on which a carrier for housing a substrate is placed;
A plurality of processing units for processing the substrate transported from the carrier on the load port;
A substrate transfer system for transferring the substrate between the carrier on the load port and the plurality of processing units;
A control device for controlling the substrate transfer system,
The controller is
Each of the plurality of processing units is based on a transport time required to transport the substrate from the carrier on the load port to the processing unit, or a transport distance representing a distance from the load port to the processing unit. An affiliation confirmation step for confirming which of the plurality of processing sections classified by
A unit final use time acquisition step of acquiring, for each of the plurality of processing units, a unit final use time representing a time at which the processing unit is last used for processing the substrate;
Based on the plurality of unit final use times acquired in the unit final use time acquisition step and the transfer times for the plurality of processing units, the transfer time is subtracted from the unit final use time in the same processing unit. A correction unit final use time calculation step for calculating a correction unit final use time representing each of the plurality of processing units;
Based on the plurality of correction unit final use times obtained in the correction unit final use time calculation step, represents the oldest time among the correction unit final use times of the plurality of processing units belonging to the same processing section. A partition last use time specifying step for specifying a partition last use time for each of the plurality of processing partitions;
A partition selection step of selecting, from the plurality of processing partitions, the one processing partition having the oldest partition final use time based on the plurality of partition final use times specified in the partition final use time specifying step. When,
A unit selection step of selecting one processing unit from among the plurality of processing units belonging to the processing section selected in the section selection step;
A substrate processing apparatus that executes a substrate transfer step of causing the substrate transfer system to transfer the substrate from the carrier on the load port to the processing unit selected in the unit selection step.
A load port on which a carrier for housing a substrate is placed;
A plurality of processing units for processing the substrate transported from the carrier on the load port;
A substrate transfer system for transferring the substrate between the carrier on the load port and the plurality of processing units;
A control device for controlling the substrate transfer system,
The controller is
Each of the plurality of processing units is based on a transport time required to transport the substrate from the carrier on the load port to the processing unit, or a transport distance representing a distance from the load port to the processing unit. An affiliation confirmation step for confirming which of the plurality of processing sections classified by
A unit final use time acquisition step of acquiring, for each of the plurality of processing units, a unit final use time representing a time at which the processing unit is last used for processing the substrate;
Based on the plurality of unit final use times acquired in the unit final use time acquisition step, the section final use representing the oldest time among the unit final use times of the plurality of processing units belonging to the same processing section. A partition last use time specifying step of specifying a time for each of the plurality of processing partitions;
A partition selection step of selecting, from the plurality of processing partitions, the one processing partition having the oldest partition final use time based on the plurality of partition final use times specified in the partition final use time specifying step. When,
A unit selection step of selecting one processing unit from among the plurality of processing units belonging to the processing section selected in the section selection step;
A substrate processing apparatus that executes a substrate transfer step of causing the substrate transfer system to transfer the substrate from the carrier on the load port to the processing unit selected in the unit selection step.
The control device further executes a transfer time registration step of registering the same value as the transfer time for a plurality of the processing units belonging to the same processing section before the correction unit final use time calculating step. Item 7. The substrate processing apparatus according to Item 6.
The partition selection step includes a first search step for searching the processing partition having the oldest partition last use time in the plurality of processing partitions, and a plurality of the processing partitions are found as candidate partitions in the first search step. A second search step of searching for the processing partition having the largest number of the processing units with the oldest unit last use time among the plurality of processing partitions included in the candidate partition, and the second search 9. The substrate processing apparatus according to claim 6, further comprising a selection step of selecting one of the processing sections found from at least one of the processing sections found in the step.
The control device transfers the substrate after the substrate transport step to the processing unit selected in the unit selection step with a processing time shorter than the processing time of the latest substrate transported to any of the plurality of processing units. The substrate processing apparatus according to any one of claims 6 to 9, further executing a substrate processing step to be processed.
A computer program executed by a control device provided in a substrate processing apparatus for transporting the substrate to a substrate transport system from a carrier on a load port to a plurality of processing units for processing the substrate,
A computer program in which a group of steps is incorporated so as to cause a computer as the control apparatus to execute the substrate processing method according to any one of claims 1 to 5.