TWI706458B - Substrate processing method, substrate processing apparatus, and computer program - Google Patents

Abstract

The present invention selects one processing area from a plurality of processing areas based on the final use time of the area. The area final use time is the earliest time of the unit final use time or the correction unit final use time of a plurality of processing units belonging to the same processing area. The final use time of the correction unit is the time after the final use time of the unit minus the transport time. And, one processing unit is selected from a plurality of processing units belonging to the selected processing area. Thereafter, the substrate is transported from the carrier on the load port to the selected processing unit by the substrate transport system.

Description

Substrate processing method, substrate processing device and computer program

This application claims priority based on Japanese Patent Application No. 2018-092485 filed on May 11, 2018, and the entire content of the application is incorporated herein by reference.

The present invention relates to a substrate processing method and a substrate processing apparatus for processing a substrate, and a computer program executed by a control device of the substrate processing apparatus. The substrates to be processed include, for example, semiconductor wafers, substrates for optical disks, substrates for magnetic disks, substrates for magneto-optical disks, substrates for photomasks, ceramic substrates, substrates for solar cells, liquid crystal display devices, or organic EL (electroluminescence) FPD (Flat Panel Display) substrates for display devices, etc.

In the manufacturing steps of semiconductor devices, liquid crystal display devices, etc., a substrate processing device that processes substrates such as semiconductor wafers or glass substrates for liquid crystal display devices is used. Patent Document 1 discloses a schedule for a substrate processing apparatus equipped with a plurality of processing units.

In the schedule described in Patent Document 1, a plurality of processing units are classified into a plurality of processing areas based on the length of the transport path or the transport time. When creating a schedule for processing substrates, select one processing area from a plurality of processing areas. After that, one processing unit is selected from a plurality of processing units belonging to the selected processing area. The schedule is made in a way that the selected processing unit processes the substrate. By executing the schedule, the substrates are actually transported and processed.

In addition, the schedule described in Patent Document 1 discloses that the processing area is selected based on the size relationship of the area usage rate. When there are a plurality of processing areas with the same area usage rate, the processing area is selected based on the area's final use time. The area utilization rate is the value obtained by dividing the time required for processing the substrate by the number of effective (available) processing units in the processing area for processing the substrate.

In paragraph 0059 of Patent Document 1, it is stated that "the latest of the cell final times of the processing cells MPC belonging to the processing zone PZ is registered in the storage section 63 as the zone final use time." In paragraph 0099 of Patent Document 1, it is stated that "a first priority is given to the area usage rate, a second priority is given to the area's last use time, and a third priority is given to the zone number (transport distance or transport time). , It is also possible to reverse the priority of the area's final use time and area usage rate."

[Prior Technical Literature] [Patent Literature] [Patent Document 1] Japanese Patent Application Publication No. 2017-183545

[The problem to be solved by the invention]

The schedule described in Patent Document 1 selects a processing area based on the size relationship of the area usage rate, and evenly selects a plurality of processing areas, and creates a schedule in a manner that generally uses all the processing units of the substrate processing apparatus.

However, according to the inventor’s research, it is known that the schedule described in Patent Document 1 cannot determine the input status of the substrates in each processing area. Therefore, even though there are empty processing units in other processing areas, all processing units are still selected for use The situation of the processing area.

Specifically, it can be known that when the processing time of the substrate is reduced, such a processing area is selected. For example, as shown in FIG. 17, even if there are empty processing units MPC in the first processing area PZ1 and the second processing area PZ1, the sixth substrate W6 is processed by the processing unit MPC17 belonging to the third processing area PZ3. In this case, it is necessary to delay the transfer of the substrate W6 until the processing unit MPC17 becomes vacant, resulting in a decrease in the operation rate of the substrate processing apparatus. Therefore, the invention described in Patent Document 1 has room for improvement.

Therefore, one of the objectives of the present invention is to provide a substrate processing method, a substrate processing device, and a computer program that can universally use all the processing units of the substrate processing device and improve the operating rate of the substrate processing device. [Technical means to solve the problem]

An embodiment of the present invention provides a substrate processing method, which is performed by using a substrate transport system to transport the above-mentioned substrate from a carrier on a load port to a substrate processing device that processes a plurality of processing units of the substrate, which includes the following Step: A confirmation step, which confirms that each of the plurality of processing units is based on the transfer time required to transfer the substrate from the carrier on the load port to the processing unit, or means from the load port to the processing Which of the plurality of processing areas classified by the transport distance of the distance of the unit; the unit final use time obtaining step, which, for each of the plurality of processing units, obtains the time that the processing unit used to process the substrate last used The final use time of the unit; the calculation step of correcting the final use time of the unit, which is based on the final use time of the plurality of units obtained in the step of obtaining the final use time of the unit and the transport time of the plurality of processing units, for the plurality of processing For each unit, the calculation means the final use time of the correction unit in the same processing unit as the time after the last use time of the unit minus the transport time; the area final use time specific step is calculated based on the final use time of the correction unit The final use time of the plurality of correction units obtained in the step, and for each of the plurality of processing areas, the region representing the earliest time of the final use time of the correction unit of the plurality of processing units belonging to the same processing area is specified Final use time; an area selection step, which is based on the plurality of final use times of the area specified in the step of specifying the final use time of the area, and from the plurality of processing areas, select the first processing area with the earliest final use time of the area ; Unit selection step, which selects one of the above-mentioned processing units from the plurality of the above-mentioned processing units belonging to the above-mentioned processing area selected in the above-mentioned area selection step; and a substrate transfer step, which uses the above-mentioned transfer system to transfer the substrate from the loading port The above-mentioned carrier is transported to the above-mentioned processing unit selected in the above-mentioned unit selection step.

According to this configuration, the processing area is not selected based on the size relationship of the area usage rate, but one processing area is selected from the plurality of processing areas based on the time when the area is finally used. And, one processing unit is selected from a plurality of processing units belonging to the selected processing area. Thereafter, the substrate is transported from the carrier on the load port to the selected processing unit by the substrate transport system. Therefore, not only when the processing time of the substrate has not changed, but also when the processing time of the substrate is reduced, a plurality of processing areas can be selected equally, and all processing units of the substrate processing apparatus can be universally used. Thereby, the operation rate of the substrate processing apparatus can be improved.

In addition, the area final use time is not based on the earliest unit use time, but is specified based on the earliest correction unit final time. The final use time of the correction unit is the final use time of the unit, which represents the last use time of the processing unit to process the substrate, minus the time required for the carrier on the load port to transport the substrate to the processing unit. Therefore, the transport time difference between multiple processing areas can be reduced, and it can be avoided that only processing areas close to the load port are selected. In this way, a plurality of processing areas can be selected evenly.

Another embodiment of the present invention provides a substrate processing method, which is performed by using a substrate transport system to transport the substrate from a carrier on a load port to a substrate processing apparatus that processes a plurality of processing units of the substrate, which includes the following Step: A confirmation step, which confirms that each of the plurality of processing units belongs to the transport time required to transport the substrate from the carrier on the loading port to the processing unit, or means from the loading port to the processing unit Which of the plurality of processing areas is classified by the transport distance of the distance; the unit final use time obtaining step, which for each of the plurality of processing units, obtains the time that the processing unit used to process the substrate last used Unit final use time; area final use time identification step, which is based on the plurality of the unit final use time obtained in the unit final use time acquisition step, and for each of the plurality of processing areas, the identification indicates that they belong to the same processing The region’s final use time of the region at the earliest time among the above-mentioned unit final use times of the plurality of the above-mentioned processing units; the region selection step is based on the plurality of final use times of the region specified in the step of specifying the region’s final use time, from the above plural Select one of the above-mentioned processing areas among the processing areas with the earliest final use time of the above-mentioned area; the unit selection step, which selects one of the above-mentioned processing units from the plurality of the above-mentioned processing units belonging to the above-mentioned processing area selected in the above-mentioned area selection step; And a substrate transfer step, which uses the transfer system to transfer the substrate from the carrier on the load port to the processing unit selected in the unit selection step.

According to this configuration, the processing area is not selected based on the size relationship of the area usage rate, but one processing area is selected from the plurality of processing areas based on the time when the area is finally used. In addition, one processing unit is selected from a plurality of processing units belonging to the selected processing area. Thereafter, the substrate is transported from the carrier on the load port to the selected processing unit by the substrate transport system. Therefore, not only when the processing time of the substrate has not changed, but also when the processing time of the substrate is reduced, a plurality of processing areas can be selected equally, and all processing units of the substrate processing apparatus can be universally used. Thereby, the operation rate of the substrate processing apparatus can be improved.

The start time of the substrate processing may be the time when the substrate is loaded into the processing unit, or the time when the substrate starts to rotate, or other time. The end time of the substrate processing, that is, the final use time of the unit may be the time when the substrate is removed from the processing unit, or the time when the substrate stops rotating, or it may be a time other than that. The time when the substrate is carried into the processing unit and the time when it is carried out from the processing unit may be, for example, the time when the shutter opening and closing the opening of the processing chamber provided in the processing unit starts to move to the open position (opening position).

In the above two embodiments, at least one of the following features can also be added to the above substrate processing method.

The substrate processing method further includes a transport time registration step before the calculation step of the final use time of the correction unit, which registers the same value as the transport time for a plurality of the processing units belonging to the same processing area.

According to this configuration, for a plurality of processing units belonging to the same processing area, the same value is registered as the transport time. Even if it is a plurality of processing units belonging to the same processing area, the transport distance is strictly different, so the transport time is also strictly different. However, if they belong to the same processing area, the transport time difference is extremely small, and the transport time is approximately the same among the processing units. Therefore, if the same value is registered as the transport time for a plurality of processing units belonging to the same processing area, the transport time difference between the processing areas can be reduced and the transport time setting can be simplified.

The area selection step includes the following steps: a first search step, which searches for the processing area with the earliest final use time of the area among the plurality of processing areas; a second search step, which finds plural numbers in the first search step When one of the above-mentioned processing regions is a candidate region, among the plurality of above-mentioned processing regions included in the above-mentioned candidate region, the above-mentioned processing region with the largest number of the above-mentioned processing units whose final use time of the above-mentioned unit is the earliest is searched; and the selection step is from Among at least one processing area seen in the second search step, one processing area is selected.

According to this configuration, when there are a plurality of processing areas with the earliest area final use time, among the processing areas, the processing area with the largest number of processing units at the earliest final use time is selected. Before transporting the substrate to the selected processing unit, or when transporting the substrate to the selected processing unit, if the processing unit is abnormal, it is necessary to select another processing unit. In this case, if there is another processing unit with the earliest unit final use time in the same processing area, the processing unit can be selected as the new processing unit. Therefore, it is relatively easy to change and set a new transfer path of the substrate.

The region selection step may further include a third search step. When a plurality of the processing regions are seen in the second search step, the plurality of processing regions seen in the second search step are searched The above-mentioned processing area where the above-mentioned transport time or transport distance is the smallest. In this case, the selection step may also be a step of selecting one processing area from at least one processing area seen in the third search step.

The substrate processing method may further include a final use time initialization step before the unit final use time obtaining step, which changes the unit final use time of all the processing units to the same value (for example, 0).

The substrate processing method further includes a substrate processing step of using a processing time shorter than the nearest substrate processing time that is transferred to any one of the plurality of processing units, and after the substrate transport step, select the unit in the unit selection step The processing unit processes the substrate.

According to this structure, the processing time of the substrate is reduced compared with the recent substrate. In this case, one processing area is selected from a plurality of processing areas based on the final use time of the area. Therefore, compared with the case of selecting a processing area based on the size relationship of the area usage rate, a plurality of processing areas can be selected equally. Therefore, even if the transfer path or processing time of the substrate is different, all the processing units can be generally used, which can further improve the operation rate of the substrate processing apparatus.

Still another embodiment of the present invention provides a substrate processing apparatus including: a loading port on which a carrier for accommodating a substrate is placed; and a plurality of processing units for processing the substrate conveyed from the carrier on the loading port; A substrate transport system, which transports the substrate between the carrier on the loading port and the plurality of processing units; and a control device, which controls the substrate transport system.

The above-mentioned control device performs the following steps: the belonging confirmation step, which confirms that each of the above-mentioned plural processing units belongs to the transport time required for transporting the above-mentioned substrate from the above-mentioned carrier on the above-mentioned loading port to the above-mentioned processing unit, or represents the above-mentioned loading Which of the multiple processing areas classified by the transport distance of the distance from the port to the processing unit; the unit final use time obtaining step, which, for each of the multiple processing units, means that the processing unit is used to process the substrate The final use time of the unit at the time of last use; the calculation step of correcting the final use time of the unit is based on the final use time of the plurality of units obtained in the step of obtaining the final use time of the unit and the transport time of the plurality of units. For each of the plurality of processing units, the calculation means the final use time of the correction unit at the time after the last use time of the unit is subtracted from the final use time of the above-mentioned unit in the same processing unit; the area final use time specific step is based on the final use of the correction unit For each of the plurality of processing areas obtained in the use time calculation step, the last use time of the plurality of correction units is identified as the earliest of the last use time of the correction unit of the plurality of processing units belonging to the same processing area The area final use time of the time; the area selection step is based on the plurality of the area final use times specified in the above area final use time identification step, and the one with the earliest final use time of the area is selected from the plurality of processing areas. Processing area; a unit selection step, which selects one of the processing units from among the processing units in the processing area selected in the area selection step; and a substrate transport step, which uses the substrate transport system to transfer the substrate from The carrier on the loading port is transferred to the processing unit selected in the unit selection step. According to this structure, the same effect as the above-mentioned effect can be exhibited.

Still another embodiment of the present invention provides a substrate processing apparatus including: a loading port on which a carrier for accommodating a substrate is placed; and a plurality of processing units for processing the substrate conveyed from the carrier on the loading port; A substrate transport system, which transports the substrate between the carrier on the loading port and the plurality of processing units; and a control device, which controls the substrate transport system.

The control device executes the following steps: the belonging confirmation step, which confirms that each of the plurality of processing units belongs to the transport time required to transport the substrate from the carrier on the loading port to the processing unit, or represents Which of the plurality of processing areas classified by the transport distance of the distance from the load port to the above-mentioned processing unit; the unit final use time obtaining step, which, for each of the above-mentioned plural processing units, means that the above-mentioned processing unit is used to process the above The final use time of the unit at the time of the last use of the substrate; the area final use time specifying step is based on the final use time of the plurality of units obtained in the step of obtaining the final use time of the unit. For each of the plurality of processing units, specify Represents the area final use time of the earliest time of the unit final use time of the plurality of the processing units belonging to the same processing area; the area selection step is based on the final use time of the plurality of areas specified in the specific step of the final use time of the area Use time, from the plurality of processing areas, select the one of the processing areas with the earliest final use time of the area; the unit selection step, which is from the plurality of processing units belonging to the processing area selected in the area selection step, Selecting one of the above-mentioned processing units; and a substrate transport step, which uses the above-mentioned substrate transport system to transport the above-mentioned substrate from the carrier on the loading port to the above-mentioned processing unit selected in the unit selection step. According to this structure, the same effect as the above-mentioned effect can be exhibited.

In the above two embodiments, at least one of the following features can also be added to the substrate processing apparatus.

The control device further executes the transport time registration step before the calculation step of the final use time of the correction unit, which registers the same value as the transport time for the plurality of the processing units belonging to the same processing area. According to this structure, the same effect as the above-mentioned effect can be exhibited.

The area selection step includes the following steps: a first search step, which searches for the processing area with the earliest final use time of the area among the plurality of processing areas; a second search step, which sees a plurality of them in the first search step When the processing area is a candidate area, among the plurality of processing areas contained in the candidate area, the processing area with the largest number of the processing units at the earliest time of the final use of the unit is searched for the processing area; and the selection step is from the above Among at least one of the above-mentioned processing areas seen in the second search step, one of the above-mentioned processing areas is selected. According to this structure, the same effect as the above-mentioned effect can be exhibited.

The control device further executes a substrate processing step, which uses a processing time shorter than the nearest substrate processing time that is transported to any one of the plurality of processing units, and after the substrate transport step, selects the above-mentioned unit in the above-mentioned unit selection step. The processing unit processes the above-mentioned substrate. According to this structure, the same effect as the above-mentioned effect can be exhibited.

Still another embodiment of the present invention provides a computer program, which is executed by a control device provided in a substrate processing device that uses a substrate transfer system to transfer the substrate from a carrier on a load port to a plurality of processing units that process the substrate It is a computer program of the step group in which the computer as the control device executes at least one of the substrate processing methods. The aforementioned computer program can also be recorded on a computer-readable recording medium. The recording medium can be an optical disc such as a laser disc, or a semiconductor memory such as a memory card.

The above and other objects, features, and effects of the present invention are made clear from the description of the embodiments described below with reference to the accompanying drawings.

Fig. 1 is a schematic plan view of a substrate processing apparatus 1 according to an embodiment of the present invention. FIG. 2 is a schematic cross-sectional view of the substrate processing apparatus 1 showing a vertical section along the cutting line II-II shown in FIG. 1.

The substrate processing apparatus 1 is a single-chip apparatus that processes disk-shaped substrates W such as semiconductor wafers one by one. The substrate processing apparatus 1 includes a carrier holding part 2, an indexer part 3 and a processing part 4.

The carrier holding portion 2 includes a plurality of load ports LP for holding a carrier C that is a substrate storage container capable of storing a plurality of substrates W, respectively. The load port LP is a carrier holding unit for holding the carrier C. The loading port LP puts the carrier C into the position of the substrate processing apparatus 1. The vehicle C is opened and closed by the load port LP.

The indexer section 3 includes an indexer robot IR. The indexer robot IR executes: take out the unprocessed substrate W from the carrier C placed on the carrier holding portion 2 and deliver it to the processing section 4 for the loading action; and receive the processed substrate W from the processing section 4 and store it in The storage operation of the carrier C held in the carrier holding portion 2.

The processing unit 4 includes: a plurality of processing units MPC1 to MPC24 (hereinafter collectively referred to as "processing unit MPC"), a first main transfer robot CR1, a second main transfer robot CR2, a first transfer unit PASS1, and a second transfer unit PASS2 . The indexer robot IR, the first main transport robot CR1, and the second main transport robot CR2 constitute a substrate transport system TS1 that transports the substrate W between the carrier holding portion 2 and the holding unit MPC.

In the processing section 4, a conveying path 5 linearly extending from the indexer section 3 is formed in a plan view. In this conveyance path 5, a first transfer unit PASS1, a first main transfer robot CR1, a second transfer unit PASS2, and a second main transfer robot CR2 are arranged in this order from the indexer section 3 side. The first transfer unit PASS1 is a unit for transferring the substrate W between the intermediate indexer robot IR and the first main transfer robot CR1. The second transfer unit PASS2 is a unit that mediates the transfer of the substrate W between the first main transfer robot CR1 and the second main transfer robot CR2. The first and second delivery units PASS1 and PASS2 are provided with a plurality of substrate mounting tables 15 that temporarily hold the substrate W.

A plurality of processing units MPC form a plurality of towers TW1 to TW6 (hereinafter collectively referred to as "tower TW"). Each tower TW includes a plurality of processing units MPC (for example, 4 processing units MPC) stacked one above the other. The plural towers TW are arranged along the conveying path 5. The three towers TW1, TW3, and TW5 are arranged on one side of the conveying path 5. The remaining three towers TW2, TW4, and TW6 are arranged on the other side of the conveying path 5.

The plural processing units MPC form three pairs of towers TW facing each other across the conveying path 5. Specifically, the tower TW1 and the tower TW2 face each other across the conveyance path 5. Similarly, the tower TW3 and the tower TW4 face each other across the conveyance path 5, and the tower TW5 and the tower TW6 face each other across the conveyance path 5.

The distance from the indexer part 3 to the tower TW1 is equal to or approximately the same as the distance from the indexer part 3 to the tower TW2. Therefore, the transport time required to transport the substrate W from the indexer section 3 to the tower TW1 is equal to or substantially the same as the transport time required to transport the substrate W from the indexer section 3 to the tower TW2. That is, each pair of towers (TW1 and TW2, TW3 and TW4, TW5 and TW6) are arranged at positions equal to or approximately the same distance from the indexer section 3. The indexer section 3 conveys the substrate W to each pair of towers TW. The time is equal or roughly equal.

Three pairs of towers (TW1 and TW2, TW3 and TW4, TW5 and TW6) respectively form three treatment zones PZ1, PZ2, and PZ3 (hereinafter collectively referred to as "treatment zone PZ"). That is, a pair of towers TW1 and TW2 oppose one of the pair of towers TW1 and TW2 across the transport path 5 at the position closest to the indexer portion 3 to form the first processing zone PZ1. Next, a pair of towers TW3 and TW4 opposed to one of the pair of towers TW3 and TW4 across the conveying path 5 forms a second processing zone PZ2 at a position close to the indexer portion 3. Next, a pair of towers TW5 and TW6 opposed to one of the pair of towers TW5 and TW6 across the conveying path 5 form a third processing zone PZ3 at a position close to the indexer portion 3.

Between the first processing zone PZ1 and the indexer section 3, a first transfer unit PASS1 is arranged. For the first transfer unit PASS1, on the opposite side of the indexer 3, the first main transfer robot CR1 is arranged. The first main transport robot CR1 is arranged between the pair of towers TW1 and TW2 in a plan view. For the first main transport robot CR1, a second transfer unit PASS2 is arranged on the opposite side of the first transfer unit PASS1. The first main transfer robot CR1 is arranged to face the first transfer unit PASS1, the towers TW1 and TW2 of the first processing zone PZ1, and the second transfer unit PASS2.

For the second transfer unit PASS2, a second main transfer robot CR2 is arranged on the opposite side of the first main transfer robot CR1. The second main transport robot CR2 is arranged between the pair of towers TW3 and TW4 in a plan view, and is arranged between the pair of towers TW5 and TW6 in a plan view. The second main transfer robot CR2 is arranged to face the second transfer unit PASS2 and the towers TW3 to TW6.

The indexer robot IR is a horizontal multi-joint arm robot in this embodiment. The indexer robot IR includes: a hand 11 holding a substrate W, a multi-joint arm 12 coupled with the hand 11, an arm rotation mechanism (not shown) that rotates the multi-joint arm 12 around a vertical rotation axis 13 and a multi-joint arm 12 Up and down arm lifting mechanism (not shown). With such a configuration, the indexer robot IR allows the hand 11 to access the carrier C and the first transfer unit PASS1 held in the arbitrary load port LP, and transfers the substrate W in/out of the access terminal. Thereby, the indexer robot IR transfers the substrate W between the processing unit 4 (more precisely, the first transfer unit PASS1) and the arbitrary carrier C.

For the first main transfer robot CR1 and the second main transfer robot CR2, substrate transfer robots having substantially the same configuration can be used. Such a substrate transfer robot preferably includes: an opponent 21, 22 that holds the substrate W; an opponent advance and retreat mechanism 23, 24 that makes an opponent 21, 22 advance and retreat in the horizontal direction, respectively; a hand rotation mechanism (not shown), It makes a hand advance and retreat mechanism 23, 24 rotate around a vertical rotation axis 25; and a hand lift mechanism (not shown), which makes the hand advance and retreat mechanism 23, 24 move up and down.

With such a configuration, the first main transport robot CR1 and the second main transport robot CR2 can take out the substrate W from the access end with one hand 21 and 22, and carry the substrate W into the access end with the other hand 21 and 22. By applying the substrate transfer robot constructed in this way to the first main transfer robot CR1, the first main transfer robot CR1 can make the hands 21, 22 to the first transfer unit PASS1, form the multiple processing units MPC, towers TW, TW2, And the second transfer unit PASS2 directly accesses, and the substrate W can be transferred in/out of the access terminal. In addition, by applying the substrate transfer robot constructed as described above to the second main transfer robot CR2, the second main transfer robot CR2 allows the hands 21 and 22 to form a plurality of the second transfer unit PASS2 and the towers TW3 to TW6. The processing unit MPC directly accesses and transfers the substrate W to/from the access terminal.

In addition, FIG. 2 shows an example in which the indexer robot IR has one hand 11, but the indexer robot IR may also have two hands 11. In this case, the first main transport robot CR1 may have four hands 21 and 22. Similarly, the second main transport robot CR2 may have four hands 21 and 22. When the indexer robot IR has two hands 11, the indexer robot IR can use the two hands 11 to hold two substrates W at the same time. Therefore, the indexer robot IR can carry out the simultaneous unloading action of simultaneously unloading two substrates W and the simultaneous unloading action of simultaneously loading two substrates W on the carrier C on the load port LP or the first transfer unit PASS1.

Fig. 3 is a schematic cross-sectional view for explaining a configuration example of the processing unit MPC. The processing unit MPC shown in FIG. 3 is a surface cleaning unit that cleans the surface of the substrate with a chemical solution. The processing unit MPC includes a processing chamber 31 provided with an opening 31a for the passage of the substrate W, a processing cup 32 arranged in the processing chamber 31, and a rotating chuck 33 arranged in the processing cup 32. The processing chamber 31 includes a partition 31b with an opening 31a, and a shutter 31c for opening and closing the opening 31a.

The processing unit MPC further includes a chemical liquid nozzle 34 for supplying chemical liquid to the substrate W, and a cleaning liquid nozzle 35 for supplying cleaning liquid (pure water, etc.) to the substrate W. While the rotating chuck 33 holds one substrate W horizontally, it rotates around a vertical rotation axis 36 passing through the center of the substrate W. The chemical liquid nozzle 34 and the cleaning liquid nozzle 35 are pre-arranged in the processing chamber 31, and spray the chemical liquid and the cleaning liquid on the upper surface of the substrate W held by the spin chuck 33, respectively. With such a configuration, it is possible to supply a chemical liquid to the upper surface of the substrate W, and treat the upper surface of the substrate W with the chemical liquid (substrate processing step); and wash off the chemical liquid on the substrate W with the cleaning liquid (substrate processing step) ); and spin drying processing (substrate processing step) to shake off the droplets on the substrate W by centrifugal force.

FIG. 4 is a schematic cross-sectional view for explaining another configuration example of the processing unit MPC. The processing unit MPC shown in FIG. 4 is an end surface cleaning unit that scrubs the peripheral end surface of the substrate W. The processing unit MPC includes a processing chamber 31, a rotating chuck 33 arranged in the processing chamber 31, a chemical liquid nozzle 34, and a scraping member 37 for scrubbing the end surface of the substrate W.

The rotating chuck 33 holds one substrate W horizontally, and rotates with a vertical rotation axis 36 passing through the center of the substrate W. The chemical liquid nozzle 34 supplies chemical liquid to the surface of the substrate W held by the spin chuck 33. If the rotating chuck 33 presses the scraping member 37 against the peripheral end surface of the substrate W while rotating the substrate W, the scraping member 37 wipes the entire peripheral end surface of the substrate W. Thereby, the entire circumference of the peripheral end surface of the substrate W is brushed (substrate processing step).

FIG. 5 is a block diagram for explaining the electrical structure of the substrate processing apparatus 1. The substrate processing apparatus 1 includes a computer 60 as a control device. The computer 60 controls the processing units MPC1 to MPC24, the main transport robots CR1, CR2, and the indexer robot IR. The computer 60 may also be a personal computer (FA personal computer).

The computer 60 includes a control unit 61, an input/output unit 62 and a storage unit 63. The control unit 61 includes a calculation unit such as a CPU. The input/output unit 62 includes output devices such as a display unit, input devices such as a keyboard, a pointing device, and a touch panel. Furthermore, the input/output unit 62 includes a communication module for communicating with an external computer, that is, the host computer 64. The memory portion 63 includes a solid-state memory device, a hard disk drive and other memory devices.

The control unit 61 includes a scheduling function unit 65 and a processing execution instruction unit 66. The scheduling function unit 65 unloads the substrate W from the carrier C, and processes the substrate W by one or more of the processing units MPC1 to MPC24, and then produces the substrate W in order to store the processed substrate W on the carrier C. The resources of the processing device 1 follow a time-series action plan (scheduling table). The processing execution instruction unit 66 follows the schedule created by the scheduling function unit 65 to operate the resources of the substrate processing apparatus 1. The so-called resources refer to various units provided in the substrate processing apparatus 1 for processing substrates. Specifically, the processing units MPC1 to MPC24, the indexer robot IR, the main transport robots CR1 and CR2, and these components are included in the resources of the substrate processing apparatus 1.

The storage unit 63 stores various data and the like. The data stored in the memory section 63 includes the program 70 executed by the control section 61, the process work data (process work information) 80 received from the host computer 64, the schedule data 81 produced by the scheduling function section 65, and each The use history data 82 of the processing unit MPC and each processing area PZ, and the transport time data 83 of each processing area PZ.

The program 70 stored in the memory section 63 includes a schedule creation program 71 for operating the control section 61 as the scheduling function section 65, and a processing execution program 72 for operating the control section 61 as the processing execution instruction section 66 . The program 70 may be pre-installed in the computer 60, may be sent from the recording medium M to the memory section 63, or may be sent to the memory section 63 through the communication module of the input/output section 62. The recording medium M is, for example, an optical disc such as a laser disc or a semiconductor memory such as a memory card. The recording medium M is an example of non-transitory tangible media.

The process job data 80 includes a process job (PJ) code assigned to each substrate W and a process corresponding to the process job code. Process is the data that defines the content of substrate processing, including substrate processing conditions and substrate processing sequence. More specifically, it includes substrate type information, parallel processing unit information, used processing fluid information, and processing time information. The substrate type information is information indicating the type of substrate W to be processed. Specific examples of the types of substrates W are product substrates used to complete products, non-product substrates used to maintain the processing unit MPC, and non-product substrates not used in product manufacturing. The so-called parallel processing unit information refers to processing unit designation information that designates the available processing unit MPC, and parallel processing can be performed by the designated processing unit MPC. That is, the substrate W may be processed by any one of the designated processing units. The so-called processing liquid information is information that specifies the type of processing liquid used to process the substrate. The specific example is information on the type of the designated liquid and the temperature of the liquid. The so-called processing time information refers to the duration of the supply of processing liquid, etc. Use processing fluid information and processing time information are examples of processing condition information.

The so-called process work refers to the processing performed on one or more substrates W in order to implement common processing. The so-called process work code is the identification information (substrate group identification information) used to identify the process work. In other words, common processing is performed on a plurality of substrates W assigned a common process work code by using a process corresponding to the process work code. For example, when a common process is performed on a plurality of substrates W in a continuous processing order (the order of taking out from the carrier C), a common process work code is assigned to the plurality of substrates W. However, there may be situations where the substrate processing content (process) corresponding to different process work codes is the same.

The control unit 61 obtains process work data for each substrate W from the host computer 64 via the input/output unit 62 and stores it in the memory unit 63. The acquisition and storage of the process work data only needs to be performed before the execution of the schedule for each substrate W. For example, after the carrier C is held in the load ports LP1 to LP4, the host computer 64 may immediately assign the control 61 process work data corresponding to the substrate W stored in the carrier C.

The scheduling function unit 65 plans each process work based on the process work data 80 stored in the memory unit 63, and stores the schedule data 81 representing the plan in the memory unit 63. The processing execution instruction unit 66 controls the indexer robot IR, the main transport robots CR1 and CR2, and the processing units MPC1 to MPC24 based on the schedule data 81 stored in the memory unit 63, thereby performing the processing work with the substrate processing apparatus 1.

FIG. 6 is a flowchart for explaining an example of processing executed by the scheduling function unit 65. More specifically, it means that the control unit 61 of the computer 60 executes the schedule creation program 71 and repeats the processing in a specific control cycle. In other words, in the schedule creation program 71, a step group is grouped into the computer 60 to execute the processing shown in FIG. 6.

The host computer 64 assigns process work data to the control unit 61, and the control unit 61 instructs to start the process work defined by the process work data, that is, to start substrate processing (step S1). The control unit 61 receives the process work data and stores it in the storage unit 63. The scheduling function unit 65 uses the process work data to perform scheduling for executing the process work. The start of the manufacturing process can also be instructed by the operator operating the operation part of the input and output part 62.

The scheduling function unit 65 executes the scheduling one by one on more than one substrate W to which the process job (PJ) code contained in the process job data is assigned. First, the scheduling function unit 65 refers to the process corresponding to the process work data, and based on the parallel processing unit information of the process, specifies more than one processing unit MPC that can be used to process the substrate W (step S2). Next, the scheduling function unit 65 executes a processing area selection processing for selecting one processing area PZ to be used for substrate processing (step S3). The details of the processing area selection processing are described below.

Next, the scheduling function unit 65 creates a temporary schedule for processing one substrate W (step S4). For example, in the processing area selection process, the first processing area PZ1 is selected, and the parallel processing unit information of the process corresponding to the process work data includes all the processing units MPC1 to MPC8 of the first processing area PZ1. That is, consider a situation where the substrate processing following the process can be executed in any of the eight processing units MPC1 to MPC8. In this case, the number of paths through which the substrate W passes is eight. That is, the selectable paths for processing the substrate W are 8 paths passing through any one of the processing units MPC1 to MPC8. Therefore, the scheduling function unit 65 creates a temporary schedule corresponding to the eight paths for the one substrate W.

Fig. 7A shows a temporary timetable corresponding to the path through the processing unit MPC1. The temporary schedule includes: a block representing the substrate W being taken out from the carrier C by the indexer robot IR; a block representing the substrate W being taken in (Put) by the indexer robot IR to the first transfer unit PASS1; representing Get the block of the substrate W from the first transfer unit PASS1 by the first main transfer robot CR1; it means that the block of the substrate W is put into the processing unit MPC1 by the first main transfer robot CR1; The processing block for processing the substrate W by the processing unit MPC1; it means the block of the substrate W that has been processed from the processing unit MPC1 by the first main transfer robot CR1; it means the block by the first main transfer robot CR1 puts the block of the substrate W into the first transfer unit PASS1; means that the block of the substrate W is taken out (Get) from the first transfer unit PASS1 by the indexer robot IR; and indicates that the block of the substrate W is loaded by the indexer robot IR Tool C is loaded into the block of the substrate W. The scheduling function unit 65 makes a temporary schedule by sequentially arranging the blocks in a manner that does not overlap each other on the time axis.

If a temporary schedule using the processing unit MPC1 is created, the scheduling function unit 65 creates the same 7 temporary schedules for the same substrate W corresponding to the 7 paths through the processing units MPC2 to MPC8 (the processing blocks are arranged separately Temporary schedule for processing units MPC2～MPC8). In this way, a total of eight temporary schedules are created for one substrate W. In addition, the created temporary schedule is stored in the storage unit 63 as part of the schedule data 81. In the production stage of the temporary schedule, the interference of the blocks related to other substrates W (the overlap on the time axis) is not considered.

When the scheduling function unit 65 finishes making all temporary schedules corresponding to one substrate W (step S5), the main schedule is executed (steps S6 to S9). The so-called master schedule is to arrange it on the time axis in a way that does not make the block of the temporary schedule created and other blocks of each resource overlap. The schedule data created by the master schedule is stored in the memory 63.

More specifically, the scheduling function unit 65 selects one of the plurality of temporary schedules that have been created, and obtains a block constituting the temporary schedule (step S6). The block obtained at this time is the block allocated at the earliest position on the time axis of the temporary schedule among the unallocated blocks. Furthermore, the scheduling function unit 65 searches for the position where the obtained block can be arranged (step S7), and arranges the block at the searched position (step S8). Each block is configured so that the same resource is not reused at the same time, and is the earliest position on the time axis. The same action is repeated for all the blocks constituting the selected temporary schedule (step S9). In this way, by arranging all the blocks constituting the selected temporary timetable, the master schedule corresponding to the temporary timetable is completed. The master schedule is executed on all temporary schedules created (step S10). That is, when the substrate W can be processed by any of the eight processing units MPC1 to MPC8, eight main schedules are executed.

When the eight main schedules are ended, the unit selection process is performed (step S11). In the unit selection process, one main schedule is selected, that is, one main schedule passing through one processing unit MPC is selected, thereby selecting the processing unit MPC that processes one substrate W. In the unit selection process, the substrate W is processed, and the main schedule with the earliest time to return to the carrier C is selected (step S11, unit selection step).

If there are multiple master schedules at the same time when the substrate W is returned to the carrier C (step S12: Yes), the processing unit MPC with the longest elapsed time since the last use is selected, that is, the processing unit with the earliest final use time The main schedule of the unit MPC (step S13, unit selection step). Thereby, the processing unit MPC in one processing zone PZ can be used equally to select the processing unit MPC.

When there are multiple main schedules of the processing unit MPC with the earliest final time (step S14: Yes), select the main schedule of the processing unit MPC with the smaller number (that is, the pre-attached priority is higher) (step S15) , Unit selection step). For example, when the main schedule using the processing unit MPC1 and the main schedule using the processing unit MPC2 are left as candidates, since the processing unit MPC1 has a smaller number than the end of the processing unit MPC2, the main schedule of the processing unit MPC1 is selected Cheng.

In this way, if one main schedule corresponding to one temporary schedule is selected, the schedule for the one substrate W is ended (step S16). In addition, the schedule data representing the selected main schedule is stored in the memory 63. The processing execution instruction unit 66 actually starts the processing of the substrate W at any time thereafter (step S17, substrate transport step and substrate processing step). That is, the substrate transfer operation in which the substrate W is carried out from the carrier C by the indexer robot IR and the substrate W is transferred to the processing unit MPC by the main transfer robots CR1 and CR2 is started.

When the scheduling function unit 65 finishes scheduling for one substrate W, the unit final use time of the processing unit MPC that processes the substrate W is registered in the storage unit 63 (step S18). Furthermore, the scheduling function unit 65 obtains the availability rate of the processing zone PZ to which the processing unit MPC belongs, and registers it in the storage unit 63 (step S19). The details of the investment rate are described below. The final use time of the unit and the available input rate are examples of use history data 82 (refer to FIG. 5). In addition, a series of actions from step S3 to step S20 are executed sequentially on all the substrates W constituting the process work (step S20).

In the processing area selection step (step S3), if the second processing area PZ2 is selected, the scheduling function unit 65 creates, for one substrate W, eight temporary schedules corresponding to the eight paths through the processing units MPC9 to MPC16 ( The processing blocks are respectively arranged in the temporary schedules of the processing units MPC9 to MPC16). In this way, a total of eight temporary schedules are created for one substrate W.

Fig. 7B shows a temporary timetable corresponding to the path through the processing unit MPC9. The temporary schedule includes: a block representing the substrate W being taken out from the carrier C by the indexer robot IR; a block representing the substrate W being taken in (Put) by the indexer robot IR to the first transfer unit PASS1; representing Get the block of the substrate W from the first transfer unit PASS1 by the first main transfer robot CR1; it means put the block of the substrate W into the second transfer unit PASS2 by the first main transfer robot CR1 ; Represents the block of the substrate W that is taken out (Get) from the second transfer unit PASS2 by the second main transfer robot CR2; Represents the block of the substrate W that is transferred (Put) to the processing unit MPC9 by the second main transfer robot CR2 ; Represents the processing block of the substrate W processed by the processing unit MPC9; Represents the block of the processed substrate W that is removed (Get) from the processing unit MPC9 by the second main transport robot CR2; The transfer robot CR2 loads (Put) the block of the substrate W to the second transfer unit PASS2; it means that the block of the substrate W is carried out (Get) from the second transfer unit PASS2 by the first main transfer robot CR1; it means that the block of the substrate W is transferred from the second transfer unit PASS2 by the first main transfer robot CR1; The main transfer robot CR1 loads the block of the substrate W into the first transfer unit PASS1; represents the block of the substrate W from the first transfer unit PASS1 by the indexer robot IR; and represents the block of the substrate W by the indexer robot The IR puts the block of the substrate W into the carrier C. The scheduling function unit 65 makes a temporary schedule by sequentially arranging the blocks in a manner that does not overlap each other on the time axis.

In the processing area selection processing (step S3), if the third processing area PZ3 is selected, the scheduling function unit 65 creates, for one substrate W, eight temporary schedules corresponding to the eight paths through the processing units MPC17 to MPC24 ( The processing areas are respectively arranged in the temporary schedules of the processing units MPC17 to MPC24). In this way, a total of eight temporary schedules are created for one substrate W. FIG. 7C shows a temporary timetable corresponding to the path through the processing unit MPC17. The temporary timetable is roughly the same as the temporary timetable in FIG. 7B.

FIG. 8 is a flowchart for explaining an example of processing area selection processing (step S3 in FIG. 6). 9A and 9B show an example of processing area data stored in the memory section 63 (refer to FIG. 5). 10A to 10E show an example of the available input rate, the final use time of the area, the number of oldest chambers, and the number of effective chambers memorized in the memory part 63.

The number of effective chambers is the number of available (effective) processing units MPC among the plurality of processing units MPC belonging to the same processing zone PZ. The number of the oldest chambers refers to the number of effective processing units MPC that are the earliest at the time of final use of the multiple processing units MPC belonging to the same processing zone PZ. The input rate means the percentage of the ratio of the number of the oldest chambers to the number of effective chambers in the same treatment zone PZ ((the number of oldest chambers/the number of effective chambers)×100). Processing area data, availability rate, area final use time, number of oldest chambers, and number of effective chambers are stored in each processing area as use history data 82.

In the storage section 63, as shown in FIG. 9A, for all the processing units MPC, processing area data indicating the setting of the processing area PZ is registered. In this example, for the processing units MPC1 to MPC8, processing area data "1" indicating that they belong to the first processing area PZ1 is registered. In addition, for the processing units MPC9 to MPC16, processing area data "2" indicating that they belong to the second processing area PZ2 is registered. Furthermore, for the processing units MPC17 to MPC24, processing area data "3" indicating that they belong to the third processing area PZ3 is registered.

When any processing unit MPC cannot be used for substrate processing for maintenance, etc., as shown in Figure 9B, replace the data (number) identifying the processing zone PZ, and register invalid data (for example, data indicating "maintenance", etc.) ). The so-called maintenance, for example, is the cleaning of the processing unit MPC that is regularly scheduled.

When the scheduling function unit 65 selects the processing area PZ that should process each substrate W, based on the processing area data stored in the memory unit 63 (refer to FIG. 5), it determines which processing area PZ each processing unit MPC belongs to and whether there is invalidity The processing unit MPC (Step S31 in Fig. 8, the subordinate confirmation step). In addition, the scheduling function unit 65 reads out the unit final use time of all the processing units MPC1 to MPC24 from the storage unit 63 (step S32 in FIG. 8, the unit final use time acquisition step).

Furthermore, for all the processing units MPC1 to MPC24, the scheduling function unit 65 reads from the storage unit 63 the transfer time required for the substrate W to be transferred from the carrier C on the load port LP to the processing unit MPC. Thereafter, for each processing unit MPC, the scheduling function section 65 subtracts the transport time from the last use time of the unit, uses the obtained value (time) as the last use time of the correction unit, and registers it in the storage section 63 (step S33 in FIG. 8, correction Steps for calculating the final use time of the unit). The final use time of the correction unit is included in the use history data 82. The details of the final use time of the correction unit are described below.

Figures 10A to 10E show the usage history data 82 in the memory section 63 when all the processing units MPC1 to MPC24 are available (effective) and initialized, and the scheduling of multiple substrates W using the same process is performed An example of change.

As shown in FIG. 10A, before scheduling the first substrate W, the input rate of each processing zone PZ (the number of oldest chambers/the number of effective chambers×100) is 100%, and the area of each processing zone PZ The final use time is the initial value (0 in FIG. 10), and the number of the oldest chambers in each treatment zone PZ is 8. The number of effective chambers in each treatment zone PZ is 8. It is applied to the manufacturing process of multiple substrates W, and all the processing units MPC1-MPC24 are designated as parallel processing units.

When the substrate processing apparatus 1 is initialized, the final use time of all units is also initialized, and an initial value (for example, 0) is registered as the final use time of all the processing units MPC1 to MPC24. When the final use time of the unit is a value other than the initial value, the transport time is used to correct the final use time of the unit, but when the final time of the unit is the initial value, the initial value is registered as the final use time of the correction unit. In the example shown in FIG. 10A, since the final use time of the correction units of all the processing units MPC1 to MPC24 is the initial value, the final use time of all areas is the initial value (0 in FIG. 10A).

When selecting the processing zone PZ for processing the first substrate W, the scheduling function unit 65 searches for the processing zone PZ with the earliest final use time among all the processing zones PZ1 to PZ3, and confirms whether the plurality of processing zones PZ are included in the candidate zone (Figure Step S34 of 8, the first search step). When there is one candidate area, that is, when only one processing area PZ with the earliest final use time is seen (step S34 in FIG. 8: No), select the processing area PZ for the first substrate W (Step S35 in Fig. 8, area selection step). In the example shown in FIG. 10A, since the final use time of all areas is the initial value, all the processing areas PZ1 to PZ3 are equivalent to the processing area PZ with the earliest final use time of the area.

When seeing the processing area PZ with the earliest final use time of the plurality of areas (step S34 in FIG. 8: Yes), the scheduling function unit 65 searches for the available input rate (( Number of oldest chambers/number of effective chambers)×100) The largest processing zone PZ, and confirm whether a plurality of processing zones PZ corresponding to the search condition is included in the candidate zone (Step S36 in Fig. 8, the second search step) . When there is one processing area PZ, that is, when the processing area PZ with the largest input rate is one (step S36 in FIG. 8: No), select the processing for the first substrate W Zone PZ (Step S37 in FIG. 8, zone selection step and selection step). In the example shown in FIG. 10A, since the final use time of all units is the initial value, all the processing areas PZ1 to PZ3 are equivalent to the processing area PZ with the largest possible input rate.

When a plurality of processing areas PZ with the largest input rate is seen (step S36 in FIG. 8: Yes), the scheduling function unit 65 is used for the first substrate W to select the plurality of processing areas PZ included in the candidate area The processing area PZ with the smallest area number (that is, the highest priority order added in advance) (step S38 in FIG. 8, area selection step, third search step, and selection step). In the example shown in FIG. 10A, the first processing area PZ1 with the smallest area number is selected as the processing area PZ for processing the first substrate W. Therefore, as shown in FIG. 10B, the number of the oldest chambers in the first treatment zone PZ1 is reduced from 8 to 7, and the input rate of the first treatment zone PZ1 is reduced to 87.5% ((7/8)×100).

When the scheduling of the first substrate W ends, the scheduling function unit 65 estimates the time when the first substrate W ends, and uses the estimated time as the unit final use time of the processing unit MPC for processing the first substrate W, and registers于Memory Department 63. Thereafter, the scheduling function section 65 subtracts the transport time to the processing unit MPC from the unit final use time of the processing unit MPC that processes the first substrate W, and registers the obtained value (time) as the correction unit final use time于Memory Department 63. That is, for the processing unit MPC that processes the first substrate W, the new unit final use time and the correction unit final use time are registered in the storage 63. For the substrate W after the second sheet, if the schedule ends, the new unit final use time and the correction unit final use time are registered in the memory 63 for the processing unit MPC selected for processing the substrate W.

When the scheduling for the first substrate W ends, the final use time of the unit of the processing unit MPC that processes the first substrate W and the final use time of the correction unit are changed to values other than the initial values. The area final use time is the earliest time among the final use times of the correction units of all processing units MPC belonging to the same processing area PZ. Even if the final use time of the correction unit of the processing unit MPC for processing the first substrate W is changed, the final use time of the correction unit of other processing units MPC belonging to the same processing zone PZ as the processing unit MPC is still the initial value. Therefore, the final use time of the area of the processing area PZ to which the processing unit MPC for processing the first substrate W belongs remains the initial value unchanged.

When selecting the processing area PZ for processing the second substrate W, in the same manner as described above, any one of the three processing areas PZ is selected. In the example shown in FIG. 10B, the final use time of each processing area PZ is the initial value, but since the second processing area PZ2 and the third processing area PZ3 correspond to the processing area PZ with the largest input rate, they are used for the second substrate W and the second processing zone PZ2 with the smallest zone number is selected. Therefore, as shown in FIG. 10C, the number of the oldest chambers in the second treatment zone PZ2 is reduced from 8 to 7, and the input rate of the second treatment zone PZ2 is reduced to 87.5% ((7/8)×100).

When selecting the processing area PZ for processing the third substrate W, in the same manner as described above, any one of the three processing areas PZ is selected. In the example shown in FIG. 10C, the final use time of each processing area PZ is the initial value, but since the third processing area PZ3 has the highest input rate, the third processing area PZ3 is selected for the third substrate W. Therefore, as shown in FIG. 10D, the number of the oldest chambers in the third treatment zone PZ3 is reduced from 8 to 7, and the input rate of the third treatment zone PZ3 is reduced to 87.5% ((7/8)×100).

When selecting the processing area PZ for processing the fourth substrate W, in the same manner as described above, any one of the three processing areas PZ is selected. In the example shown in FIG. 10D, the final use time of each processing zone PZ is the initial value. Since the input rate is equal among the three processing zones PZ, it is used for the fourth substrate W and the first process with the smallest zone number is selected Zone PZ1. Therefore, as shown in FIG. 10E, the number of the oldest chambers in the first treatment zone PZ1 is reduced from 7 to 6, and the input rate of the first treatment zone PZ1 is reduced to 75% ((6/8)×100).

The processing area PZ of the substrate W after the fifth sheet is also processed in the same manner as described above, and any one of the three processing areas PZ is selected. If a schedule table using all the processing units MPC belonging to the same processing area PZ is created, for each processing unit MPC belonging to the processing area PZ, the unit final use time and the correction unit final use time are changed to values other than the initial values. In this case, the scheduling function unit 65 registers the earliest time in the final use of the correction units of all the processing units MPC belonging to the processing area PZ as the area final use time and registers it in the storage unit 63. In this way, the final use time of the area is changed to a value other than the initial value.

Figures 11A to 11E show that the four processing units MPC5 to MPC8 belonging to the first processing zone PZ1 are set to be invalid (not usable) for maintenance purposes as shown in Figure 9B, and are used in all other processing units MPC1 to MP4 and MPC9 to MPC24 It is an example of the change of the usage history data 82 in the memory section 63 in the case where the scheduling of a plurality of substrates W using the same process is performed in a usable (valid) and initialized state.

As shown in FIG. 11A, before scheduling the first substrate W, the input rate of each processing zone PZ is 100%, and the final use time of each processing zone PZ is the initial value (0 in FIG. 11). The number of the oldest chambers in the first treatment zone PZ1 is 4, and the number of the oldest chambers in the second treatment zone PZ2 and the third treatment zone PZ3 is 8. The number of effective chambers in the first treatment zone PZ1 is 4, and the number of effective chambers in the second treatment zone PZ2 and the third treatment zone PZ3 is 8. It is applied to the manufacturing process of multiple substrates W, and all the processing units MPC1-MPC24 are designated as parallel processing units.

When selecting the processing zone PZ for the first substrate W, as shown in FIG. 11A, the final use time of the zone is the initial value in any processing zone PZ, and the available input rate is equal among the three processing zones PZ, so the schedule The function unit 65 selects the first processing area PZ1 with the smallest area number as the processing area PZ for processing the first substrate W, and performs scheduling of processing the first substrate W in the first processing area PZ1. Therefore, as shown in FIG. 11B, the number of the oldest chambers in the first treatment zone PZ1 is reduced from 4 to 3, and the input rate of the first treatment zone PZ1 is reduced to 75% ((3/4)×100).

When the processing zone PZ of the second substrate W is selected, as shown in FIG. 11B, the final use time of the zone is the initial value in any processing zone PZ, due to the input rate of the second processing zone PZ2 and the third processing zone PZ3 It is the highest, so the scheduling function unit 65 is used for the second substrate W to select the second processing zone PZ2 with the smallest zone number. Therefore, as shown in FIG. 11C, the number of the oldest chambers in the second treatment zone PZ2 is reduced from 8 to 7, and the input rate of the second treatment zone PZ2 is reduced to 87.5% ((7/8)×100).

When selecting the processing zone PZ for processing the third substrate W, as shown in Figure 11C, the final use time of the zone is the initial value in any processing zone PZ. Since the third processing zone PZ3 has the highest input rate, the scheduling function The portion 65 is used for the third substrate W to select the third processing zone PZ3. Therefore, as shown in FIG. 11D, the number of the oldest chambers in the third treatment zone PZ3 is reduced from 8 to 7, and the input rate of the third treatment zone PZ3 is reduced to 87.5% ((7/8)×100).

When the processing zone PZ of the fourth substrate W is selected for processing, as shown in FIG. 11D, the final use time of the zone is the initial value in any processing zone PZ, due to the input rate of the second processing zone PZ2 and the third processing zone PZ3 The highest, so the scheduling function unit 65 is used for the fourth substrate W to select the second processing zone PZ2 with the smallest zone number. Therefore, as shown in FIG. 11E, the number of the oldest chambers in the second treatment zone PZ2 is reduced from 7 to 6, and the input rate of the second treatment zone PZ2 is reduced to 75% ((6/8)×100).

When the processing zone PZ of the fifth substrate W is selected for processing, as shown in Figure 11E, the final use time of the zone is the initial value in any processing zone PZ. Since the third processing zone PZ3 has the highest input rate, the scheduling function The portion 65 is used for the fourth substrate W to select the third processing zone PZ3. Therefore, as shown in FIG. 11F, the number of the oldest chambers in the third treatment zone PZ3 is reduced from 7 to 6, and the input rate of the third treatment zone PZ3 is reduced to 75% ((6/8)×100).

Fig. 12 shows an example of the final use time of the unit after the final use time of all units has been changed to a value other than the initial value, the transport time, and the final use time of the corrected unit.

FIG. 12 shows an example in which the first to third substrates W are carried into the processing units MPC1, MPC9, and MPC17 in the order of the processing unit MPC1, the processing unit MPC9, and the processing unit MPC17. In the example shown in Figure 12, the final use time of the processing unit MPC1 is 12:00:00, the final use time of the processing unit MPC9 is 12:00:15, and the final use time of the processing unit MPC17 is 12:00 Minutes and 30 seconds.

In addition, FIG. 12 shows an example in which the transport time of the first treatment zone PZ1 is 10 seconds, the transport time of the second treatment zone PZ2 is 15 seconds, and the transport time of the third treatment zone PZ3 is 15 seconds. The transfer time of each processing zone PZ is registered in the transfer time data 83 (refer to FIG. 5) (transfer time registration step). Although the processing unit MPC1 and the processing unit MPC2 belong to the first processing zone PZ1, the distance from the load port LP to the processing unit MPC1 is strictly different from the distance from the load port LP to the processing unit MPC2. Therefore, the transfer time of the substrate W to the processing unit MPC1 is strictly different from the transfer time of the substrate W to the processing unit MPC2. However, in the example shown in FIG. 12, if the processing units MPC belonging to the same processing zone PZ are regarded as substantially equal in transport time, one transport time is registered in all the processing units MPC belonging to the same processing zone PZ.

The scheduling function section 65 subtracts the transport time of the first processing zone PZ1 from the unit final use time of the processing unit MPC1, and registers the obtained value (time) as the correction unit final use time of the processing unit MPC1. Specifically, the scheduling function unit 65 registers 11:59:50 (12:00:00:10-10) as the final use time of the correction unit of the processing unit MPC1. Similarly, the scheduling function unit 65 registers 12:00: 00: 00 (12:00: 00: 15-15) as the final use time of the correction unit of the processing unit MPC9, and sets 12:00: 00: 15 (12:00: 00) 30 seconds-15 seconds) Register as the final use time of the correction unit of the processing unit MPC17.

Next, the scheduling function section 65 registers the earliest time of the final use time of the correction unit of all valid processing units MPC belonging to the same processing area PZ as the area final use time of the processing area PZ, and registers it in the memory section 63 (the area final use Time-specific steps). In the situation illustrated in Fig. 12, the final use time of the correction unit of the processing unit MPC1 is the earliest among the final use time of the correction unit of the processing units MPC1 to MPC8. Furthermore, in the situation illustrated in Figure 12, the final use time of the correction unit of the processing unit MPC9 is the earliest among the final use time of the correction unit of the processing units MPC9 to MPC16, and the final use time of the correction unit of the processing unit MPC17 is between the processing units MPC17 to MPC24. The correction unit is the earliest in the final use time. Therefore, the scheduling function unit 65 registers the final use time of the correction unit of the processing unit MPC1 as the area final use time of the first processing area PZ1, and registers the final use time of the correction unit of the processing unit MPC9 as the area final use time of the second processing area PZ2 The use time is the last use time of the correction unit of the registration processing unit MPC17 as the area last use time of the first processing area PZ1.

FIGS. 13A to 13E show an example of the change of the usage history data 82 in the memory section 63 when the schedule of a plurality of substrates W using the same process is performed after the final usage time of all units is changed to a value other than the initial value.

As shown in Figure 13A, before scheduling the first substrate W, the input rate of each processing zone PZ is 12.5 ((1/8)×100), and the final use time of each processing zone PZ is the initial value For all values other than those, the number of the oldest chambers in each processing zone PZ is 1. The number of effective chambers in each treatment zone PZ is 8. It is applied to the manufacturing process of multiple substrates W, and all the processing units MPC1-MPC24 are designated as parallel processing units.

Fig. 13A shows that the final use time of the area of the first treatment zone PZ1 is 12:00:00:00, the final use time of the second treatment zone PZ2 is 12:00:30, and the final use time of the third treatment zone PZ3 It is 12:01:00. When selecting the processing zone PZ for processing the first substrate W, as shown in FIG. 13A, since the area of the first processing zone PZ1 has the earliest final use time, the scheduling function unit 65 selects the first processing zone PZ1 as the processing first sheet The processing area PZ of the substrate W.

FIG. 13B shows an example of processing the first substrate W with the processing unit MPC with the earliest final use time of the correction unit among all the processing units MPC1 to MPC8 belonging to the first processing zone PZ1. Therefore, the area final use time of the first processing area PZ1 is changed to a time different from the time before the scheduling of the first substrate W is performed. FIG. 13B shows an example in which the area final use time of the first processing area PZ1 is changed from 12:00:00:00 to 12:01:30.

When selecting the processing zone PZ for processing the second substrate W, as shown in FIG. 13B, since the final use time (12:00:00:30) of the area of the second processing zone PZ2 is the earliest, the schedule function unit 65 selects the second process In the area PZ2, as the processing area PZ for processing the second substrate W, a schedule for processing the substrate W by the processing unit MPC with the earliest correction unit final use time among all processing units MPC9 to MPC16 belonging to the second processing area PZ2 is created. Therefore, as shown in FIG. 13C, the area final use time of the second processing area PZ2 is updated from 12:00:30 to 12:02:00.

When selecting the processing zone PZ for processing the third substrate W, as shown in FIG. 13C, since the area final use time (12:01:00) of the third processing zone PZ3 is the earliest, the schedule function unit 65 selects the third process In the area PZ3, as a processing area PZ for processing the third substrate W, a schedule for processing the substrate W by the processing unit MPC with the earliest correcting unit final use time among all processing units MPC17 to MPC24 belonging to the third processing area PZ3 is created. Therefore, as shown in FIG. 13D, the area final use time of the third processing area PZ3 is updated from 12:01:00 to 12:02:30.

When selecting the processing zone PZ for processing the fourth substrate W, as shown in FIG. 13D, since the final use time (12:01:30) of the area of the first processing zone PZ1 is the earliest, the scheduling function unit 65 selects the first process The area PZ1 is a processing area PZ for processing the fourth substrate W. Among all processing units MPC1 to MPC8 belonging to the first processing area PZ1, the processing unit MPC with the earliest final use time of the correction unit is prepared to process the substrate W schedule. Therefore, as shown in FIG. 13E, the area final use time of the first processing area PZ1 is updated from 12:01:30 to 12:03:00.

The processing area PZ of the substrate W after the fifth sheet is also processed in the same manner as described above, and the processing area PZ with the earliest area final use time is selected from the three processing areas PZ. However, if there is a situation of the treatment zone PZ with the earliest final use time of a plurality of zones, select the treatment zone PZ with the largest possible input rate among them. However, when there are still a plurality of processing areas PZ remaining, the processing area PZ with the smallest area number among the remaining plural processing areas PZ is selected.

Next, the scheduling of the case where the processing time of the substrate W is reduced will be described.

First, with reference to FIGS. 14A to 14F and FIGS. 15A to 15B, the schedule of the first embodiment will be described, and then, with reference to FIGS. 16A to 16F and FIG. 17, the schedule of the first comparative example will be described.

14A to 14F are tables showing an example of the input rate, the time of final use of the area, the number of oldest chambers, and the number of effective chambers in the first embodiment. Figures 14A to 14F show that after the first process of processing the substrate W with the first time is performed, the second process of processing the substrate W with the second process time shorter than the first process is performed after the scheduling of a plurality of substrates W is performed In the case of the scheduling of a plurality of substrates W, an example of the change of the usage history data 82 in the memory section 63.

As shown in Figure 14A, before scheduling the first substrate W, the input rate of each processing zone PZ is 100% ((8/8)×100), and the final use time of each processing zone PZ is the initial Value (0 in FIG. 14A), the number of the oldest chambers in each treatment zone PZ is 8. The number of effective chambers in each treatment zone PZ is 8. The final use time of each unit is the initial value. In the first and second processes, all processing units MPC1 to MPC24 are designated as parallel processing units. The first processing time designated in the first process is 240 seconds, for example, and the second processing time designated in the second process is 60 seconds, for example.

When the processing area PZ of the first substrate W of the first process is selected for processing, as shown in FIG. 14A, since the final use time of the area is the initial value in any processing area PZ, the input rate is within the three processing areas PZ Therefore, the scheduling function unit 65 selects the first processing area PZ1 with the smallest area number as the processing area PZ for processing the first substrate W. Therefore, as shown in FIG. 14B, the number of the oldest chambers in the first treatment zone PZ1 is reduced from 8 to 7, and the input rate of the first treatment zone PZ1 is reduced to 87.5% ((7/8)×100).

When the processing area PZ of the second substrate W of the first process is selected for processing, as shown in FIG. 14B, since the final use time of the area is the initial value in any processing area PZ, the second processing area PZ2 and the third processing area PZ3 has the highest input rate, so the scheduling function unit 65 is used for the second substrate W to select the second processing zone PZ2 with the smallest zone number. Therefore, as shown in FIG. 14C, the number of the oldest chambers in the second treatment zone PZ2 is reduced from 8 to 7, and the input rate of the second treatment zone PZ2 is reduced to 87.5% ((7/8)×100).

When selecting the processing area PZ of the third substrate W of the second process whose processing time is different from the first process, as shown in FIG. 14C, since the final use time of the area is the initial value in any processing area PZ, the third The processing zone PZ3 has the highest input rate, so the scheduling function unit 65 is used for the third substrate W to select the third processing zone PZ3. Therefore, as shown in FIG. 14D, the number of the oldest chambers in the third treatment zone PZ3 is reduced from 8 to 7, and the input rate of the third treatment zone PZ3 is reduced to 87.5% ((7/8)×100).

When the processing area PZ of the fourth substrate W of the second process is selected for processing, as shown in FIG. 14D, since the final use time of the area is the initial value in any processing area PZ, the input rate is within the three processing areas PZ Therefore, the scheduling function unit 65 selects the first processing area PZ1 with the smallest area number as the processing area PZ for processing the fourth substrate W. Therefore, as shown in FIG. 14E, the number of the oldest chambers in the first treatment zone PZ1 is reduced from 7 to 6, and the input rate of the first treatment zone PZ1 is reduced to 75% ((6/8)×100).

When the processing area PZ of the fifth substrate W of the second process is selected for processing, as shown in FIG. 14E, since the final use time of the area is the initial value in any processing area PZ, the second processing area PZ2 and the third processing area PZ3 has the highest input rate, so the scheduling function unit 65 is used for the fifth substrate W to select the second processing zone PZ2 with the smallest zone number. Therefore, as shown in FIG. 14F, the number of the oldest chambers in the second treatment zone PZ2 is reduced from 7 to 6, and the input rate of the second treatment zone PZ2 is reduced to 75% ((6/8)×100).

15A and 15B are timing diagrams showing the schedule table of the first embodiment. FIG. 15A shows an example of the schedule after performing the first and second substrates W1 to W2 of the first process of processing the substrate W using the first processing time. In the example shown in FIG. 15A, the first substrate W1 is processed by the processing unit MPC1 of the first processing zone PZ1, and the second substrate W2 is processed by the processing unit MPC9 of the second processing zone PZ2.

FIG. 15B shows an example of the schedule after the third to sixth substrates W3 to W6 are scheduled in the second process of processing the substrate W using the second processing time. In the example shown in FIG. 15B, the processing unit MPC17 in the third processing zone PZ3 processes the third substrate W3 and the processing unit MPC2 in the first processing zone PZ1 processes the fourth substrate W4 to create a schedule. In the example shown in FIG. 15B, the processing unit MPC10 in the second processing zone PZ2 processes the fifth substrate W5, and the processing unit MPC18 in the third processing zone PZ3 processes the sixth substrate W6 to create a schedule.

As shown in FIG. 15B, if the area final use time of the earliest point of the correction unit final use time of all processing units MPC belonging to the same processing area PZ is given priority, the processing area PZ is selected, and the processing time of the substrate W is not In a changed situation, when the processing time of the substrate W is reduced, all the processing areas PZ1 to PZ3 can also be selected equally, and the empty processing unit MPC can be effectively selected. Therefore, compared with the case where the area utilization rate as described later is given priority first and the processing area PZ is selected, the operation rate of the substrate processing apparatus 1 can be improved.

Next, the schedule of the first comparative example will be described with reference to FIGS. 16A to 16F and FIG. 17.

Hereinafter, an example in which the processing area PZ for processing the substrate W is selected based on the area utilization rate is not based on the final use time of the area. The area utilization rate is a value obtained by dividing the time required for processing the substrate W by the number of effective (available) processing units MPC in the processing area PZ for processing the substrate W. If the time required for processing the substrate W is 240 seconds, and the number of effective processing units MPC belonging to the processing area PZ for processing the substrate W is 3, the area utilization rate is 80 (=240/3).

The area final use time shown in FIGS. 16A to 16F does not mean the earliest time of the final use time of the correction unit of all processing units MPC belonging to a certain processing area PZ, but refers to all processing units MPC belonging to a certain processing area PZ The latest time in the final use time of the unit. Therefore, if you create a schedule for processing a substrate W with one processing unit MPC belonging to a certain processing area PZ, even if the final use time of the units of other processing units MPC belonging to the processing area PZ is the initial value, the processing area PZ The final use time of the area is also changed to the final use time of the processing unit MPC for processing the substrate W.

16A to 16F are tables showing an example of the area utilization rate, the area's final use time, and the number of effective chambers in the first comparative example. FIGS. 16A to 16F show that after the first process of applying the first time to process the substrate W, the second process of applying the second process time shorter than the first process time to process the substrate W is performed. An example of the change of the usage history data 82 in the memory section 63 of the scheduling situation of the plurality of substrates W.

As shown in FIG. 16A, before the first substrate W is scheduled, the area utilization rate of each processing area PZ is 0, and the final use time of the area is the initial value (0 in FIG. 16A), and the effectiveness of each processing area PZ The number of chambers is 3. In the first and second processes, all processing units MPC1 to MPC24 are designated as parallel processing units. The first processing time designated by the first process is 240 seconds, for example, and the second processing time designated by the second process is 60 seconds, for example.

When the processing area PZ of the first substrate W of the first process is selected for processing, as shown in FIG. 16A, since the area utilization rate is 0 in any processing area PZ, the final use time of the area is all in any processing area PZ As the initial value, the scheduling function unit 65 selects the first processing zone PZ1 with the smallest zone number as the processing zone PZ for processing the first substrate W. Therefore, as shown in FIG. 16B, the area utilization rate of the first processing area PZ1 increases. FIG. 16B shows an example in which the first treatment time is 240 seconds, and the area utilization rate of the first treatment area PZ1 increases from 0 to 80 (=240/3).

When the processing area PZ of the second substrate W of the first process is selected for processing, as shown in FIG. 16B, since the area utilization rate of the second processing area PZ2 and the third processing area ZP3 is 0, the second processing area PZ2 and the 3 The area final use time of the processing area PZ3 is the initial value, so the scheduling function unit 65 selects the second processing area PZ2 with the smallest area number as the processing area PZ for processing the second substrate W. Therefore, as shown in FIG. 16C, the area utilization rate of the second processing area PZ2 increases. Fig. 16C shows an example in which the first treatment time is 240 seconds, and the area utilization rate of the second treatment area PZ2 increases from 0 to 80 (=240/3).

When selecting the processing area PZ of the third substrate W of the second process that has a different processing time from the first process, as shown in FIG. 16C, since the area usage rate of the third processing area PZ3 is the smallest, the scheduling function unit 65 The third processing zone PZ3 is selected as the processing zone PZ for processing the third substrate W. Therefore, as shown in FIG. 16D, the area utilization rate of the third processing area PZ3 increases. Fig. 16D shows an example in which the second treatment time is 60 seconds, and the area utilization rate of the second treatment zone PZ2 increases from 0 to 20 (=60/3).

When the processing area PZ of the fourth substrate W of the second process is selected for processing, as shown in FIG. 16D, since the area utilization rate of the third processing area PZ3 is still the smallest, the scheduling function unit 65 selects the third processing area PZ3, As a processing zone PZ for processing the fourth substrate W. Therefore, as shown in FIG. 16E, the area utilization rate of the third processing area PZ3 increases. Fig. 16E shows an example in which the area utilization rate of the second treatment area PZ2 is increased to 40 (=120/3).

When the processing area PZ of the fifth substrate W of the second process is selected for processing, as shown in FIG. 16E, since the area utilization rate of the third processing area PZ3 is still the smallest, the scheduling function unit 65 selects the third processing area PZ3, As a processing zone PZ for processing the fifth substrate W. Therefore, as shown in FIG. 16F, the area utilization rate of the third processing area PZ3 increases. Fig. 16F shows an example in which the area utilization rate of the second treatment area PZ2 is increased to 60 (=180/3).

When the processing area PZ of the sixth substrate W of the second process is selected for processing, as shown in FIG. 16F, since the area utilization rate of the third processing area PZ3 is still the smallest, the scheduling function unit 65 selects the third processing area PZ3, As a processing zone PZ for processing the sixth substrate W. Therefore, the area utilization rate of the third processing area PZ3 increases. Specifically, the area utilization rate of the second treatment area PZ2 is increased to 80 (=240/3). Thereby, the area usage rate of the third treatment area PZ3 is equal to the area usage rates of the first treatment area PZ1 and the second treatment area PZ2.

FIG. 17 is a timing chart showing the scheduling table after the area utilization rate is first given priority, the processing area PZ is selected, and the third to sixth substrates W3 to W6 are scheduled.

As described above, when the processing area PZ is selected based on the area usage rate, the third processing area PZ3 is selected for the sixth substrate W6. Therefore, as shown in FIG. 17, even if there are processing units MPC in the first processing area PZ1 and the second processing area PZ2, the processing unit MPC17 belonging to the third processing area PZ3 processes the sixth substrate W6. Make a schedule. Therefore, when the sixth substrate W6 is processed in the first processing zone PZ1 or the second processing zone PZ2, although the transport of the sixth substrate W6 can be started immediately, the sixth substrate W6 is processed in the third processing zone PZ3. In this case, the start of the conveyance must be delayed until the processing unit MPC17 finishes processing the third substrate W3.

As can be seen from comparing FIG. 17 and FIG. 15B, in either case, the third substrate W3 is scheduled to be processed by the processing unit MPC17, but in the example shown in FIG. 15B, the fourth substrate is processed by the processing unit MPC2 W4, the fifth substrate W5 is processed by the processing unit MPC10, and a schedule is created. Furthermore, in the example shown in FIG. 15B, a schedule is created in such a way that the sixth substrate W6 is processed by the processing unit MPC17. Therefore, in the example shown in FIG. 15B, since the empty processing unit MPC is effectively selected, the transport delay as shown in FIG. 17 can be prevented, and the operation rate of the substrate processing apparatus 1 can be improved.

Next, a description will be given of the scheduling of the case where the processing time of the substrate W is reduced after the processing of the substrate W is scheduled by all the effective processing units MPC.

First, the schedule of the second example will be described, and then, the schedule of the second comparative example will be described.

Fig. 18 is a table showing an example of the unit final use time, transport time, and correction unit final use time of the second embodiment. 19A to 19D are time charts showing the schedule table of the second embodiment.

19A to 19B show an example of the schedule after the first to eleventh substrates W1 to W11 of the first process of processing the substrate W using the first processing time. FIG. 19A shows the schedule until the end of the processing of the first substrate W1, and FIG. 19B shows the continuation of FIG. 19A.

FIG. 19C shows an example of the schedule after performing the schedule of the twelfth substrate W12 of the second process of processing the substrate W using the second processing time. FIG. 19D shows an example of the schedule after performing the schedule of the 13th to 15th substrates W13 to W15 of the second process of processing the substrate W using the second processing time.

Figures 19A to 19D show that the processing units MPC1, MPC2, MPC3, MPC9, MPC10, MPC11, MPC17, MPC18, and MPC19 are examples of effective processing units MPC. Therefore, the number of effective chambers in each processing zone PZ is 3. In the first and second processes, all processing units MPC1 to MPC24 are designated as parallel processing units. The first processing time designated by the first process is 240 seconds, for example, and the second processing time designated by the second process is 60 seconds, for example.

Before scheduling the first substrate W, the input rate of each processing zone PZ is 100% ((3/3)×100), the final use time of each processing zone PZ is the initial value, and each processing zone PZ The number of the oldest chambers is 3. The situation before scheduling of the first substrate W is substantially the same as the example described with reference to FIGS. 10A to 10E. Therefore, the scheduling of the first to eleventh substrates W1 to W11 is performed in the same manner as the example described with reference to FIGS. 10A to 10E.

Specifically, as shown in FIG. 19A, the processing unit MPC1 processes the first substrate W1, the processing unit MPC9 processes the second substrate W2, and the processing unit MPC17 processes the third substrate W3 to create a schedule. . In addition, the processing unit MPC2 processes the fourth substrate W4, the processing unit MPC10 processes the fifth substrate W5, and the processing unit MPC18 processes the sixth substrate W6 to create a schedule. In addition, a schedule is created by processing the seventh substrate W7 by the processing unit MPC1, processing the eighth substrate W8 by the processing unit MPC9, and processing the ninth substrate W9 by the processing unit MPC17.

Furthermore, as shown in FIG. 19B, a schedule is created in such a way that the 10th substrate W10 is processed by the processing unit MPC1 and the 11th substrate W11 is processed by the processing unit MPC9. That is, after the processing unit MPC1 processes the first substrate W1, the processing unit MPC1 processes the tenth substrate W10. After the second substrate W2 is processed by the processing unit MPC9, the eleventh substrate W11 is processed by the processing unit MPC9. In this way, a schedule for processing the first to eleventh substrates W1 to W11 is created.

The lower part of FIG. 19B shows the unit final use time (time T1 to T7) of each processing unit MPC after the schedule for processing the 11th substrate W11 is produced. The final use time of the unit of the processing unit MPC1 at the time when the schedule for processing the 11th substrate W11 is made is time T6, the final use time of the unit of the processing unit MPC2 at this time is time T1, and the unit of the processing unit MPC3 at this time is finally The use time is time T3. The earliest time among these is time T1.

FIG. 18 shows the unit final use time, transport time, and correction unit final use time of all effective processing units MPC at the time when the schedule for processing the 11th substrate W11 is made. The transport time of the first processing zone PZ1 to which the processing units MPC1, MPC2, and MPC3 belong is the transport time t1. Therefore, the final use time of the correction unit of the processing unit MPC1 is time T6-transport time t1, the final use time of the correction unit of the processing unit MPC2 is time T1-transport time t1, and the final use time of the correction unit of the processing unit MPC3 is time T3-transport Time t1. The earliest time among these is time T1-transport time t1.

The final use time of the processing unit MPC9 is time T7, the final use time of the processing unit MPC10 is time T2, and the final use time of the processing unit MPC11 is time T4. As shown in FIG. 19B, the earliest time among these is time T2. The transport time of the second processing zone PZ2 to which the processing unit MPC9, the processing unit MPC10, and the processing unit MPC11 belong is the transport time t2. Therefore, the final use time of the correction unit of the processing unit MPC9 is time T7-transport time t2, the final use time of the correction unit of the processing unit MPC10 is time T2-transport time t2, and the final use time of the correction unit of the processing unit MPC11 is time T4-transport Time t2. The earliest time among these is time T2-transport time t2.

The final use time of the processing unit MPC17 is time T1, the final use time of the processing unit MPC18 is time T3, and the final use time of the processing unit MPC19 is time T5. As shown in FIG. 19B, the earliest time among these is time T2. The transport time of the second processing zone PZ2 to which the processing unit MPC17, the processing unit MPC18, and the processing unit MPC19 belong is the transport time t2. Therefore, the final use time of the correction unit of the processing unit MPC17 is time T1-transport time t2, the final use time of the correction unit of the processing unit MPC18 is time T3-transport time t2, and the final use time of the correction unit of the processing unit MPC19 is time T5-transport Time t2. The earliest time among these is time T1-transport time t2.

As shown in FIG. 18, the final use time of the area of the first processing area PZ1 at the time when the schedule for processing the 11th substrate W11 is created is time T1-transport time t1. The final use time of the area of the second processing area PZ2 at this time is time T2-transport time t2. The final use time of the area of the third processing area PZ3 at this time is time T1-transport time t2. As shown near the left end of FIG. 19A, the transport time t1 is shorter than the transport time t2. Therefore, the area final use time (T1-S2) of the third processing area PZ3 is the earliest among the area final use times of the three processing areas PZ.

Since the area final use time of the third processing area PZ3 is the earliest among the area final use times of the three processing areas PZ, the scheduling function unit 65 is used for the 12th substrate W12 to select the third processing area PZ3. FIG. 19C shows an example of scheduling in a manner in which the processing unit MPC17 belonging to the third processing zone PZ3 processes the twelfth substrate W12. In the case of this example, if a schedule for processing the 12th substrate W12 is created, the final use time of the processing unit MPC17 and the final use time of the correction unit are updated, and the final use time of the area of the third processing zone PZ3 is updated.

As seen in FIG. 19C, the processing time (second processing time) of the 12th substrate W12 is shorter than the processing time (first processing time) of the first to eleventh substrates W1 to W11. That is, to the twelfth substrate W12, a second process in which the substrate W is processed by applying a second processing time shorter than the first processing time. Similarly, the second process is also applied to the 13th to 15th substrates W13 to W15. FIG. 19D shows an example of scheduling such that the processing unit MPC2 processes the 13th substrate W13, the processing unit MPC10 processes the 14th substrate W14, and the processing unit MPC18 processes the 15th substrate W15.

Next, referring to FIG. 20, the schedule of the second comparative example will be described.

Figure 20 is a timing chart showing the schedule of the second comparative example. It shows an example of the schedule after the area utilization rate is first given priority, the processing area PZ is selected, and the 12th to 15th substrates W12 to W15 are scheduled. .

In the second comparative example, the number of effective chambers or parallel processing units in each processing zone PZ is the same as in the second embodiment. The first process is applied to the first to eleventh substrates W1 to W11, and the second process is applied to the 12th to 15th substrates W12 to W15. The schedule to the eleventh substrate W11 is the same as in the second embodiment.

As shown in FIG. 20, if the processing area PZ selected based on the area utilization rate is not based on the final use time of the area, the twelfth substrate W12 is processed by the third processing area PZ3 in the same manner as in the second embodiment. The way to make a schedule. FIG. 20 shows an example of scheduling in a manner in which the processing unit MPC17 processes the 12th substrate W12.

On the other hand, when the processing area PZ is selected for the 13th substrate W13, empty processing units MPC (for example, processing unit MPC2 and processing unit MPC10) exist in the first processing area PZ1 and the second processing area. PZ2, but scheduling is performed so that the 13th substrate W13 is processed by the processing unit MPC18 belonging to the third processing zone PZ3. Similarly, the processing unit MPC19 belonging to the third processing zone PZ3 processes the 14th substrate W14, and the processing unit MPC17 belonging to the third processing zone PZ3 processes the 15th substrate W15.

Figure 20 shows the indexer robot IR (refer to Figure 1) simultaneously unloading the 14th to 15th substrates W14~W15 from the carrier C on the load port LP, and simultaneously carrying the 14th to 15th substrates W14~W15 into the load port LP The example of vehicle C above. The same applies to FIGS. 19A to 19D. In the example shown in FIG. 19D, the 14th to 15th substrates W14 to W15 are carried out from the carrier C at the carry-out time X1, and are carried into the carrier C at the carry-in time Y1. In the example shown in FIG. 20, the 14th to 15th substrates W14 to W15 are carried out from the carrier C at the carry-out time X2, and are carried into the carrier C at the carry-in time Y2.

In the second embodiment and the second comparative example, although the 12th to 15th substrates W12 to W15 are processed by a plurality of processing units MPC under the same conditions, as shown in FIG. 19D, the unloading time X1 of the second embodiment is shorter The take-out time X2 of the second comparative example is only earlier than the time Z1, and the take-in time Y1 of the second embodiment is only earlier than the take-in time Y2 of the second comparative example by the time Z1. Therefore, in the second embodiment, the three processing zones PZ can be selected equally, which not only improves the operating rate of the substrate processing apparatus 1, but also increases the number of substrates W processed per unit time compared to the second comparative example. Thereby, the throughput of the substrate processing apparatus 1 can be increased.

As described above, in the present embodiment, the processing area PZ is not selected based on the magnitude of the area usage rate, but one processing area PZ is selected from the plurality of processing areas PZ based on the area's final use time. In addition, one processing unit MPC is selected from a plurality of processing units MPC belonging to the selected processing zone PZ. Thereafter, the substrate W is transferred from the carrier C on the load port LP to the selected processing unit MPC by the indexer robot IR, the first main transfer robot CR1, and the second main transfer robot CR2 included in the substrate transfer system TS1 . Therefore, not only when the processing time of the substrate W does not change, but also when the processing time of the substrate W is reduced, a plurality of processing areas PZ can be selected equally, and all the processing units MPC1 to the substrate processing apparatus 1 can be universally used. MPC24. Thereby, the operation rate of the substrate processing apparatus 1 can be improved.

Moreover, the area final use time is not based on the earliest unit final use time, but is specified based on the earliest correction unit final use time. The final use time of the correction unit is the final use time of the unit, which represents the last use time of the processing unit MPC for processing the substrate W, minus the transport time required for the carrier C on the load port LP to transport the substrate W to the processing unit MPC The moment. Therefore, it is possible to reduce the transport time difference between a plurality of processing areas PZ, and it is possible to avoid selecting only the processing area PZ close to the load port LP. In this way, a plurality of processing areas PZ can be selected evenly.

In this embodiment, for a plurality of processing units MPC belonging to the same processing zone PZ, the same value is registered as the transport time. Even if it is a plurality of processing units MPC belonging to the same processing zone PZ, the transport distance is strictly different, so the transport time is also strictly different. However, if the processing zones PZ belong to the same, the transport time difference is extremely small, and the transport time is approximately the same between the processing units MPC. Therefore, if the same value is registered as the transport time for a plurality of processing units MPC belonging to the same processing area PZ, the transport time difference between the processing areas PZ can be reduced, and the transport time setting can be simplified.

In this embodiment, when there are a plurality of processing areas PZ with the earliest time of final use of the area, the processing area PZ with the largest input rate is selected from the processing areas PZ. This means that in most cases, the processing zone PZ with the largest number of processing units MPC at the time of final use of the unit is selected. Before transporting the substrate W to the selected processing unit MPC, or when transporting the substrate W to the selected processing unit MPC, when an abnormality occurs in the processing unit MPC, another processing unit MPC needs to be reselected. In this case, if there is another processing unit MPC with the earliest unit final use time in the same processing zone PZ, the processing unit MPC can be selected as the new processing unit MPC. Therefore, the new transport path of the substrate W can be changed and set relatively easily.

In this embodiment, since all the processing units MPC can be used universally, it is possible to equally use the equipment provided in the processing unit MPC such as the rotating chuck 33 or the scraping member 37, or to feed the chemical liquid into the chemical liquid nozzle 34 Pumps and other devices associated with the processing unit MPC. Therefore, the consumption level of these consumables can be averaged, and the frequency of maintenance can be reduced. Thereby, the operation rate of the substrate processing apparatus 1 can be further improved.

In the first and second embodiments, an example in which the processing time of the substrate W is reduced from the first processing time to the second processing time has been described. In such a case, since one processing area PZ is selected from a plurality of processing areas PZ based on the time of final use of the area, it is possible to select a plurality of processing areas PZ evenly compared to the case of selecting the processing area PZ based on the size relationship of the area usage rate A treatment zone PZ. Therefore, even if the transfer path or processing time of the substrate W is different, all the processing units MPC can be commonly used, which can further improve the operation rate of the substrate processing apparatus 1.

Other implementation forms

The present invention is not limited to the content of the above-mentioned embodiment, and various modifications can be made.

For example, the processing area PZ may be classified based not on the transport time but on the transport distance.

The number of processing units MPC belonging to the same processing area PZ may also be different among the three processing areas PZ.

The number of processing zones PZ provided in the substrate processing apparatus 1 may also be two or more than five. For example, the second treatment zone PZ2 and the third treatment zone PZ3 may be treated as one treatment zone PZ. Alternatively, the third processing zone PZ3 may be omitted.

When the third processing zone PZ3 is omitted, the first main transport robot CR1 can also carry in and out the substrate W for all the processing units MPC belonging to the first processing zone PZ1 and the second processing zone PZ2. In this case, the second main transfer robot CR2 and the second transfer unit PASS2 are unnecessary.

The transport time of the second treatment zone PZ2 may be different from the transport time of the third treatment zone PZ3, or may be equal to the transport time of the first treatment zone PZ1.

Instead of registering the same value as the transport time for a plurality of processing units MPC belonging to the same processing zone PZ, the transport time may be registered for each processing unit MPC. That is, the transport times registered for a plurality of processing units MPC belonging to the same processing zone PZ may be different from each other.

When seeing the processing area with the earliest final use time of multiple areas (step S34 in Fig. 8: Yes), the scheduling function unit can also search for the oldest chamber in the multiple processing areas included in the candidate area. The processing area PZ is not the processing area PZ with the largest retrieval rate.

When seeing the processing area with the earliest final use time of a plurality of areas (step S34 in FIG. 8: Yes), the processing area PZ may also be selected based on the area number instead of the processing area PZ based on the available input rate. Alternatively, any processing area PZ may be selected from a plurality of processing areas PZ with the earliest time of final use of the area.

It can also replace the final use time of the correction unit, and the final use time of the use unit. Or, instead of the last use time of the unit, the correction unit last use time may be used. For example, the final use time of the area is not based on the final use time of the earliest modified unit, but is specified based on the final use time of the earliest unit. When selecting the processing unit MPC for processing the substrate W, it is also possible to give priority to the earliest correction unit final use time instead of giving priority to the earliest area final use time.

The processing unit MPC3 is not limited to the surface cleaning unit shown in FIG. 3 and the end surface cleaning unit shown in FIG. 4, but may also be a surface scrubbing unit that cleans the surface of the substrate W with a scraping member, or a cleaning unit that cleans the back of the substrate W. Other types of processing units such as the backside cleaning unit. A plurality of processing units may be provided in one substrate processing apparatus 1.

It is also possible to combine two or more of all the above configurations. It is also possible to combine 2 or more of all the above steps.

Although the embodiments of the present invention have been described in detail, these are only specific examples used to clarify the technical content of the present invention, and the present invention is not limited to these specific examples. The spirit and scope of the present invention are merely explained by The scope of the attached patent application is limited.

1‧‧‧Substrate processing equipment 2‧‧‧Vehicle holding part 3‧‧‧Indexer Department 4‧‧‧Processing Department 5‧‧‧Transfer path 11‧‧‧hand 12‧‧‧Multi-joint arm 13‧‧‧Axis of rotation 15‧‧‧Substrate mounting table 21‧‧‧hand 22‧‧‧hand 23‧‧‧Hand advance and retreat mechanism 24‧‧‧Hand advance and retreat mechanism 25‧‧‧Axis of rotation 31‧‧‧Processing chamber 31a‧‧‧Open 31b‧‧‧Partition 31c‧‧‧Block gate 32‧‧‧Treatment Cup 33‧‧‧Rotating Chuck 34‧‧‧Medicinal liquid nozzle 35‧‧‧Cleaning fluid nozzle 36‧‧‧Rotation axis 37‧‧‧Scratching member 60‧‧‧Computer 61‧‧‧Control Department 62‧‧‧Input and output 63‧‧‧Memory Department 64‧‧‧Host computer 65‧‧‧Scheduling function 66‧‧‧Process execution instruction section 70‧‧‧Program 71‧‧‧Schedule making program 72‧‧‧Process execution program 80‧‧‧Process work data 81‧‧‧Schedule data 82‧‧‧Use history data 83‧‧‧Transfer time data C‧‧‧vehicle CR1‧‧‧The first main transfer robot CR2‧‧‧The second main transfer robot IR‧‧‧Indexer Robot LP‧‧‧Load port LP1～LP4‧‧‧Load port M‧‧‧Recording media MPC‧‧‧Processing unit MPC1～24‧‧‧Processing unit PASS1‧‧‧Handover unit PASS2‧‧‧Handover unit PZ‧‧‧Processing area PZ1‧‧‧The first treatment area PZ2‧‧‧Second treatment zone PZ3‧‧‧The third treatment area S1～S20‧‧‧Step S31～S38‧‧‧Step t1‧‧‧Transfer time t2‧‧‧Transfer time TS1‧‧‧Substrate transport system TW‧‧‧Tower TW1～6‧‧‧Tower W‧‧‧Substrate W1～15‧‧‧Substrate X1‧‧‧Move out time X2‧‧‧Moving out time Y1‧‧‧Move in time Y2‧‧‧Move in time

Fig. 1 is a schematic plan view of a substrate processing apparatus according to an embodiment of the present invention. FIG. 2 is a schematic cross-sectional view of the substrate processing apparatus showing a vertical section along the cutting line II-II shown in FIG. 1. FIG. Fig. 3 is a schematic cross-sectional view for explaining a configuration example of the processing unit. Fig. 4 is a schematic cross-sectional view for explaining another configuration example of the processing unit. FIG. 5 is a block diagram for explaining the electrical structure of the substrate processing apparatus. FIG. 6 is a flowchart for explaining an example of processing performed by a computer included in the substrate processing apparatus. Fig. 7A is a timing diagram showing the temporary timetable made during scheduling. FIG. 7B is a timing diagram showing the temporary timetable made during scheduling. Fig. 7C is a timing diagram showing the temporary schedule made during scheduling. FIG. 8 is a flowchart for explaining an example of processing area selection processing (step S3 in FIG. 6). Fig. 9A is a table showing an example of processing area data stored in the memory of the computer. Fig. 9B is a table showing an example of processing area data stored in the memory of the computer. FIG. 10A is a table showing an example of the available input rate, the final use time of the area, the number of the oldest chambers, and the number of effective chambers when the schedule table of the first substrate is made. FIG. 10B is a table showing an example of the available input rate, the final use time of the area, the number of the oldest chambers, and the number of effective chambers when the schedule table of the second substrate is made. FIG. 10C is a table showing an example of the available input rate, the final use time of the area, the number of the oldest chambers, and the number of effective chambers when the schedule of the third substrate is made. FIG. 10D is a table showing an example of the available input rate, the final use time of the area, the number of the oldest chambers, and the number of effective chambers when the schedule of the fourth substrate is made. FIG. 10E is a table showing an example of the available input rate, the final use time of the area, the number of the oldest chambers, and the number of effective chambers when the schedule table of the fifth substrate is made. Figure 11A shows the available input rate, the final use time of the area, the number of oldest chambers, and the number of effective chambers when the schedule of the first substrate is made when the 4 processing units belonging to the first processing area are invalid. A table of examples. Figure 11B shows the available input rate, the final use time of the area, the number of oldest chambers, and the number of effective chambers when the schedule of the second substrate is made when the 4 processing units belonging to the first processing area are invalid. A table of examples. Figure 11C shows the available input rate, the final use time of the area, the number of the oldest chambers, and the number of effective chambers when the schedule of the third substrate is made when the 4 processing units belonging to the first processing area are invalid. A table of examples. Figure 11D shows the available input rate, final use time of the area, the number of oldest chambers, and the number of effective chambers when the fourth substrate schedule is made when the 4 processing units belonging to the first processing area are invalid. A table of examples. Figure 11E shows the available input rate, the final use time of the area, the number of oldest chambers, and the number of effective chambers when the schedule of the fifth substrate is made when the 4 processing units belonging to the first processing area are invalid. A table of examples. Figure 11F shows the available input rate, the final use time of the area, the number of oldest chambers, and the number of effective chambers when the schedule of the sixth substrate is made when the 4 processing units belonging to the first processing area are invalid. A table of examples. Fig. 12 is a table showing an example of the final use time of the unit, the transport time, and the final use time of the correction unit after the schedule table for using all the processing units is created. Figure 13A is a table showing an example of the available input rate, the final use time of the area, the number of oldest chambers, and the number of effective chambers when the schedule table of the first substrate is made after the schedule table of all processing units is made. . Figure 13B is a table showing an example of the available input rate, the final use time of the area, the number of the oldest chambers, and the number of effective chambers when the schedule table of the second substrate is made after the schedule table of all processing units is made. . Figure 13C is a table showing an example of the available input rate, the final use time of the area, the number of the oldest chambers, and the number of effective chambers when the schedule of the third substrate is made after the schedule of all processing units is made. . Figure 13D is a table showing an example of the available input rate, the final use time of the area, the number of the oldest chambers, and the number of effective chambers when the schedule table of the fourth substrate is made after the schedule table of all processing units is made. . Figure 13E is a table showing an example of the available input rate, the final use time of the area, the number of oldest chambers, and the number of effective chambers when the schedule table of the fifth substrate is made after the schedule table of all processing units is made. . FIG. 14A is a table showing an example of the input rate, the final use time of the area, the number of the oldest chambers, and the number of effective chambers of the first embodiment, and shows the state before the schedule for the production of the first substrate. 14B is a table showing an example of the input rate, the final use time of the area, the number of the oldest chambers, and the number of effective chambers of the first embodiment, and shows the state before the schedule of the second substrate. FIG. 14C is a table showing an example of the input rate, the final use time of the area, the number of the oldest chambers, and the number of effective chambers of the first embodiment, and shows the state before the schedule for the third substrate. FIG. 14D is a table showing an example of the input rate, the final use time of the area, the number of the oldest chambers, and the number of effective chambers of the first embodiment, and shows the state before the schedule for the fourth substrate. FIG. 14E is a table showing an example of the input rate, the final use time of the area, the number of the oldest chambers, and the number of effective chambers in the first embodiment, and shows the state before the schedule for the production of the fifth substrate. FIG. 14F is a table showing an example of the input rate, the final use time of the area, the number of the oldest chambers, and the number of effective chambers in the first embodiment, and shows the state before the schedule for the sixth substrate. 15A is a timing chart showing the schedule of the first embodiment, which shows an example of the schedule after the first to second substrates are scheduled in the first process of processing the substrates using the first processing time. 15B is a timing chart showing the schedule table of the first embodiment, which shows an example of the schedule table after the third to sixth substrates are scheduled in the second process of processing the substrates using the second processing time. FIG. 16A is a table showing an example of the area utilization rate, the final use time of the area, and the number of effective chambers in the production of the first comparative example, and shows the state before the production schedule of the first substrate. Fig. 16B is a table showing an example of the area utilization rate, the time of final use of the area, and the number of effective chambers for the production of the first comparative example, and shows the state before the production schedule of the second substrate. FIG. 16C is a table showing an example of the area utilization rate, the final use time of the area, and the number of effective chambers for the production of the first comparative example, and shows the state before the production schedule of the third substrate. FIG. 16D is a table showing an example of the area utilization rate, the final use time of the area, and the number of effective chambers for the production of the first comparative example, and shows the state before the production schedule of the fourth substrate. FIG. 16E is a table showing an example of the area utilization rate, the final use time of the area, and the number of effective chambers for the production of the first comparative example, and shows the state before the production schedule of the fifth substrate. Fig. 16F is a table showing an example of the area utilization rate, the final use time of the area, and the number of effective chambers in the production of the first comparative example, and shows the state before the production schedule of the sixth substrate. FIG. 17 is a timing chart showing the schedule of the first comparative example, showing an example of the schedule after the area utilization rate is first given priority, the processing area is selected, and the third to sixth substrates are scheduled. Fig. 18 is a table showing an example of the unit final use time, transport time, and correction unit final use time of the second embodiment. 19A is a timing chart showing the schedule table of the second embodiment, which shows an example of the schedule table after the first to the eleventh substrates are scheduled in the first process of processing the substrate using the first processing time. FIG. 19B is a timing diagram showing the schedule table of the second embodiment, which is a continuation of FIG. 19A. 19C is a timing chart showing the schedule table of the second embodiment, which shows an example of the schedule table after performing the scheduling of the 12th substrate in the second process of processing the substrates using the second processing time. 19D is a timing chart showing the schedule table of the second embodiment, which shows an example of the schedule table after the 13th to 15th substrates are scheduled in the second process of processing the substrates using the second processing time. FIG. 20 is a timing chart showing the schedule of the second comparative example, showing an example of the schedule after the area utilization rate is first given priority, the processing area is selected, and the 12th to 15th substrates are scheduled.

S31~S38‧‧‧Step

Claims (11)

A substrate processing method, which is executed by a substrate processing device that enables a substrate transport system to transport a substrate from a carrier on a load port to a plurality of processing units for processing the substrate, and includes the following steps: The confirmation step, which confirms that each of the plurality of processing units is based on the transfer time required to transfer the substrate from the carrier on the load port to the processing unit, or represents the transfer time from the load port to the processing unit Which of the plurality of processing areas classified by the transport distance of the distance; the unit final use time obtaining step, for each of the plurality of processing units, obtain the unit representing the time when the processing unit was last used to process the substrate Final use time; the calculation step of the final use time of the correction unit, which is based on the final use time of the plurality of units obtained in the step of obtaining the final use time of the unit, and the transport time of the plurality of processing units. For each of the above-mentioned processing units, the calculation means the final use time of the correction unit after subtracting the transfer time from the final use time of the above-mentioned unit in the same processing unit; the area final use time specific step is based on the calculation step of the final use time of the correction unit For each of the plurality of processing areas obtained in the final use time of the plurality of correction units, specify the region representing the earliest time of the final use time of the correction unit of the plurality of processing units belonging to the same processing area Final use time; an area selection step, which is based on the final use time of the plurality of areas specified in the step of specifying the final use time of the area, selects the area from the plurality of processing areas The one above-mentioned processing area with the earliest final use time; a unit selection step, which selects one of the above-mentioned processing units from among the plurality of above-mentioned processing units belonging to the above-mentioned processing area selected in the above-mentioned area selection step; and a substrate transport step, which makes The transfer system transfers the substrate from the carrier on the loading port to the processing unit selected in the unit selection step. A substrate processing method, which is executed by a substrate processing device that enables a substrate transport system to transport a substrate from a carrier on a load port to a plurality of processing units for processing the substrate, and includes the following steps: The confirmation step, which confirms that each of the plurality of processing units is based on the transfer time required to transfer the substrate from the carrier on the load port to the processing unit, or represents the transfer time from the load port to the processing unit Which of the plurality of processing areas classified by the transport distance of the distance; the unit final use time obtaining step, for each of the plurality of processing units, obtain the unit representing the time when the processing unit was last used to process the substrate Final use time; the area final use time identification step, which is based on the plurality of the unit final use times obtained in the unit final use time acquisition step, and specifies each of the plurality of processing areas to indicate that they belong to the same processing area The region final use time at the earliest time among the above-mentioned unit final use moments of the plurality of the above-mentioned processing units; the region selection step is based on the plurality of the above-mentioned region final use moments specified in the above-mentioned region final use time identification step, from the above plural Among the processing areas, select the one above-mentioned processing area with the earliest final use time of the above-mentioned area; A unit selection step, which selects one of the above-mentioned processing units from the plurality of the above-mentioned processing units belonging to the above-mentioned processing area selected in the above-mentioned area selection step; and a substrate transfer step, which causes the above-mentioned transfer system to transfer the substrate from the loading port The above-mentioned carrier is transported to the above-mentioned processing unit selected in the above-mentioned unit selection step. The substrate processing method of claim 1, wherein before the step of calculating the final use time of the correction unit, it further includes a transport time registration step, which registers the same value as the transport for the plurality of the processing units belonging to the same processing area time. According to the substrate processing method of any one of claims 1 to 3, wherein the region selection step includes the following steps: a first search step, which searches for the processing region with the earliest final use time of the region among the plurality of processing regions; In the second search step, when a plurality of the processing areas are found as candidate areas in the first search step, the processing areas with the earliest final use time of the unit among the plurality of processing areas included in the candidate area are searched The processing area with the largest number of units; and a selecting step, which selects one processing area from at least one processing area found in the second search step. Such as the substrate processing method of any one of claims 1 to 3, which further includes a substrate processing step of processing the substrate with a processing time shorter than the nearest substrate processing time transported to any one of the plurality of processing units. After the transport step, the processing unit selected in the unit selection step is allowed to process the substrate. A substrate processing device, which includes: A load port, which houses a carrier for storing substrates; a plurality of processing units, which process the above-mentioned substrates transported from the above-mentioned carrier on the above-mentioned load port; a substrate transport system, which places the above-mentioned carrier and the above-mentioned carrier on the above-mentioned load port The substrate is transported between a plurality of processing units; and a control device that controls the substrate transport system, and the control device performs the following steps: a confirmation step, which confirms that each of the plurality of processing units is based on the loading port Which of the multiple processing areas classified by the transport time required for the carrier to the processing unit to transport the substrate, or the transport distance representing the distance from the loading port to the processing unit; the step of obtaining the final use time of the unit, For each of the plurality of processing units, it obtains the unit final use time representing the time at which the processing unit was last used to process the substrate; the correction unit final use time calculation step is based on the unit final use time acquisition step The final use time of the plurality of the above-mentioned units, and the above-mentioned transportation time of the above-mentioned plurality of units, for each of the above-mentioned processing units, the calculation indicates that the same processing unit is calculated after subtracting the above-mentioned transportation time from the last use time of the unit The final use time of the correction unit at the time of the time; the area final use time specifying step is based on the final use time of the multiple correction units obtained in the calculation step of the correction unit final use time, specifying each of the multiple processing areas Represents the area final use time of the earliest time among the final use times of the correction units of the plurality of the processing units belonging to the same processing area; An area selection step, which is based on the plurality of the area final use times specified in the area final use time identification step, and selects the first processing area with the earliest final use time of the area from the plurality of processing areas; unit selection step, It selects one of the above-mentioned processing units from among a plurality of the above-mentioned processing units belonging to the above-mentioned processing area selected in the above-mentioned area selection step; and a substrate transfer step, which causes the substrate transfer system to transfer the substrate from the above-mentioned loading port on the loading port. The carrier is transported to the processing unit selected in the unit selection step. A substrate processing apparatus, comprising: a loading port for placing a carrier for storing substrates; a plurality of processing units for processing the substrate transported from the carrier on the loading port; a substrate transport system for loading the substrate The substrate is transported between the carrier on the port and the plurality of processing units; and a control device, which controls the substrate transport system, and the control device performs the following steps: a confirmation step, which confirms each of the plurality of processing units Which of the multiple processing areas classified based on the transport time required to transport the substrate from the carrier on the loading port to the processing unit, or the transport distance representing the distance from the loading port to the processing unit The unit final use time obtaining step, which, for each of the plurality of processing units, obtains the unit final use time representing the time when the processing unit was last used to process the substrate; The area final use time identification step is based on the plurality of the unit final use times obtained in the unit final use time acquisition step, and for each of the plurality of processing areas, a plurality of said processing areas that belong to the same processing area are specified The region final use time at the earliest time among the above unit final use moments of the processing unit; the region selection step is based on the plurality of the above region final use moments specified in the above region final use time identification step, from the plurality of processing regions, Select the one of the above-mentioned processing areas with the earliest final use time of the above-mentioned area; a unit selection step, which selects one of the above-mentioned processing units from the plurality of the above-mentioned processing units belonging to the above-mentioned processing area selected in the above-mentioned area selection step; and the substrate transport step , Which enables the substrate transport system to transport the substrate from the carrier on the loading port to the processing unit selected in the unit selection step. Such as the substrate processing apparatus of claim 6, wherein the control device further executes the transport time registration step before executing the calculation step of the final use time of the correction unit, and the same value is registered as a plurality of the processings belonging to the same processing area The above-mentioned transport time of the unit. For example, the substrate processing apparatus of any one of claims 6 to 8, wherein the region selection step includes the following steps: a first search step of searching for the processing region with the earliest final use time of the region among the plurality of processing regions; 2. A search step, which, when a plurality of the processing areas are found as candidate areas in the first search step, among the plurality of processing areas included in the candidate area, search for the processing unit whose final use time is the earliest The processing area with the largest number; and a selecting step of selecting one of the processing areas from at least one of the processing areas found in the second search step. The substrate processing apparatus of any one of claims 6 to 8, wherein the control device further executes a substrate processing step, which takes a processing time shorter than the nearest substrate processing time transferred to any one of the plurality of processing units, After the substrate transport step, the processing unit selected in the unit selection step is allowed to process the substrate. A computer-readable recording medium, which is recorded with a computer program. The computer program is a substrate processing device that uses a substrate transport system to transport a substrate from a carrier on a loading port to a plurality of processing units for processing the substrate The included control device is executed, and the computer program is incorporated into the step group in such a way that the computer as the above-mentioned control device executes the substrate processing method of any one of claims 1 to 3.

Images