WO2019188899A1 - Procédé de développement et dispositif de développement de plaque d'impression - Google Patents

Procédé de développement et dispositif de développement de plaque d'impression Download PDF

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Publication number
WO2019188899A1
WO2019188899A1 PCT/JP2019/012355 JP2019012355W WO2019188899A1 WO 2019188899 A1 WO2019188899 A1 WO 2019188899A1 JP 2019012355 W JP2019012355 W JP 2019012355W WO 2019188899 A1 WO2019188899 A1 WO 2019188899A1
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Prior art keywords
printing plate
developing
developer
concentration
ceramic filter
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PCT/JP2019/012355
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English (en)
Japanese (ja)
Inventor
宏介 深津
雄也 筒井
友明 太田
純 田口
甲樹 松岡
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住友理工株式会社
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Publication of WO2019188899A1 publication Critical patent/WO2019188899A1/fr

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D39/00—Filtering material for liquid or gaseous fluids
    • B01D39/14—Other self-supporting filtering material ; Other filtering material
    • B01D39/20—Other self-supporting filtering material ; Other filtering material of inorganic material, e.g. asbestos paper, metallic filtering material of non-woven wires
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means

Definitions

  • the present invention relates to a developing method and a developing apparatus for a printing plate having a photosensitive resin layer containing a water-insoluble polymer, and more specifically, the printing plate water having a photosensitive resin layer containing a water-insoluble polymer is mainly used.
  • the present invention relates to a developing method and a developing apparatus for developing using an aqueous developer as a component.
  • developing methods for printing plates For example, in a developing method in which development is performed using an aqueous developer containing water as a main component, the printing plate is immersed in an aqueous developer, and an aqueous solution is obtained with a brush. Development is performed by rubbing an uncured portion into the developer. Since the scraped polymer component is accumulated in the developing waste liquid and reused as it is as a developing liquid, a new printing plate is soiled. Therefore, it is necessary to frequently discard the developing waste liquid and make a new adjustment. However, since this generates a large amount of waste, there has been a demand for improvement from the environmental aspect.
  • Patent Document 1 proposes a method of removing a polymer component aggregated by adding a flocculant to the development waste liquid from the development waste liquid.
  • Patent Document 2 proposes a method of treating a developer waste solution by passing it through a packed bed filled with activated carbon and reusing it as a developer.
  • the flocculant may remain in the development waste liquid after processing.
  • the developing waste solution in which the coagulant remains is reused as a developing solution, the polymer component rubbed out during development aggregates and adheres to a printing plate, brush, or the like.
  • the problem to be solved by the present invention is that the clogging of the filter is suppressed in the processing of the developing waste liquid, it can be operated for a long time, and the waste amount of the developing waste liquid is reduced by making the developing waste liquid reusable as the developer. It is another object of the present invention to provide a method for developing a printing plate that is excellent in cost.
  • a printing plate developing method is to develop a printing plate material having a photosensitive resin layer containing a water-insoluble polymer using an aqueous developer containing water as a main component.
  • the ceramic filter has an average pore diameter of a surface side region within a depth of 100 ⁇ m from the surface smaller than an average pore size of an internal region inside than the surface side region. In step, it is an Abstract that uses a plurality of the ceramic filter.
  • the surface potential of the ceramic filter has the same sign as the zeta potential of the development waste liquid.
  • the average pore size of the surface side region of the ceramic filter is preferably in the range of 0.01 to 0.20 ⁇ m.
  • the surface of the ceramic filter is preferably subjected to alumina treatment.
  • the separation step is preferably provided outside the circulation path. The separation step is preferably backwashable.
  • the printing plate developing apparatus develops a printing plate material having a photosensitive resin layer containing a water-insoluble polymer using an aqueous developer containing water as a main component, thereby producing a relief image.
  • the ceramic filter has an average pore diameter in the surface side region within a depth of 100 ⁇ m from the surface in an average of the internal region inside the surface side region.
  • the surface potential of the ceramic filter is preferably the same as the zeta potential of the developing waste liquid.
  • the use of a ceramic filter can easily eliminate the clogging of the filter, so that a long-term operation is possible. Further, since the separation step is a step in which no flocculant is used, there is no possibility that the flocculant remains in the low-concentration developer after separation, and it can be reused as a developer.
  • a low concentration developer having a low water-insoluble polymer concentration is reused as a developer.
  • the printing plate developing method according to the present invention includes a developing step.
  • the development step is not particularly limited as long as it is a method capable of washing out the photosensitive composition of the uncured portion of the printing plate material using an aqueous developer and forming a relief image. For example, there is a step of rubbing the photosensitive composition in the uncured portion with a brush or the like while spraying the developer from the developer supply portion in a shower shape.
  • the development waste solution containing the waste polymer is collected and sent to the developer supply unit through a circulation path, and is used again for developing the printing plate material.
  • a facility for temporarily storing the developer such as a developer tank or a filter tank may be provided.
  • a part or all of the developing waste liquid in the circulation path is extracted and separated into a high concentration developer having a high water-insoluble polymer concentration and a low concentration developer having a low concentration.
  • a separation step is provided.
  • the low-concentration developer is returned to the circulation path and reused as the developer.
  • the concentration of the water-insoluble polymer in the developer can be lowered while reducing the amount of the developer used.
  • the high-concentration developer may be discarded immediately after separation, or may be disposed in the separation device and further discarded after containing a high-concentration water-insoluble polymer. The latter is preferable from the viewpoint of reducing the amount of waste developer waste.
  • the separation step may be provided inside the circulation route or outside the route.
  • “Preparing in the path” refers to, for example, a case where all of the developing waste solution after the washing step flows into the separation step, and the low-concentration developer after the separation step is sent to the developer supply unit and circulated.
  • “Preparing outside the path” means, for example, extracting a part of the developer waste liquid from any place in the circulation path, for example, from the developer tank, and allowing the low concentration developer to flow into any place in the circulation path through the separation step. Point to.
  • the present invention is provided with a separation step capable of maintaining a water-insoluble polymer concentration so as not to cause stains during development and capable of operating for a long time.
  • the separation step by providing the separation step, an increase in the concentration of the water-insoluble polymer in the developer in the circulation path can be suppressed and maintained within a preferable range.
  • the lower limit of the water-insoluble polymer concentration in the developer is preferably 0.001 g / L or more. By setting the water-insoluble polymer concentration to 0.001 g / L or more, the load of the separation process is reduced, and long-term operation is possible.
  • the upper limit of the concentration of the water-insoluble polymer in the developer is preferably 15 g / L or less. More preferably, it is 10 g / L or less, More preferably, it is 5 g / L or less. Aggregation of a water-insoluble polymer can be suppressed as it is 15 g / L or less.
  • the separation step is preferably a step of separating the development waste liquid into a high concentration developer having a high water-insoluble polymer concentration and a low concentration developer having a low concentration without using a flocculant. If a flocculant is used in the separation step, the flocculant may remain in the developer after separation. When the developer in which the flocculant remains is reused, the polymer component rubbed out during the development aggregates and adheres to the printing plate or brush.
  • separation by a filter separation by precipitation
  • separation by precipitation it takes a long time for separation, and a relatively large precipitation tank is used for standing the developing waste liquid. It is necessary to provide.
  • separation by a filter is preferable.
  • the filter to be used is preferably a ceramic filter from the viewpoints of separation ability and durability.
  • the separation step is performed using a ceramic filter
  • the water-insoluble polymer can be removed without using a flocculant, and a preferable concentration range can be obtained.
  • the water-soluble surfactant and other cleaning components are not removed and remain in the developer, the low-concentration developer after separation should be used as a developer without adding a cleaning component. Can do.
  • Fig. 3 shows an example of a ceramic filter.
  • a region within a depth of 100 ⁇ m from the surface is a surface side region 12, and a region inside the surface side region 12 is an internal region 14.
  • the ceramic filter 10 has a rectangular tube shape and has a gap 16 at the center.
  • FIG. 4 shows an arrangement example of a plurality (four) of ceramic filters.
  • the plurality of ceramic filters 10 are arranged side by side at a predetermined interval.
  • the developer waste liquid passes through the surface side region 12 of the ceramic filter 10 from the gap 18 between the ceramic filter 10 and the ceramic filter 10, and passes through the inner region 14 from the surface side region 12. It passes through the gap 16 of the ceramic filter 10 (flows in the direction of arrow A in FIG. 4).
  • the backwashing liquid passes from the gap 16 of the ceramic filter 10 through the inner region 14 of the ceramic filter 10 and from the inner region 14 through the surface side region 12 to the ceramic filter 10 and the ceramic. It passes through the gap 18 between the filters 10 (flows in the direction of arrow B in FIG. 4).
  • the reverse of the amount of filtrate until clogging is improved, compared to the case of using one ceramic filter with the same surface area as the total surface area of the multiple ceramic filters.
  • the amount of washing liquid can be reduced, and the filtration efficiency is improved.
  • a plurality of the same ceramic filters may be used, or a plurality of ceramic filters that are partially or entirely different may be used.
  • the same thing means that the size, thickness, material, and hole diameter are all the same.
  • the same base material is treated in the same manner. Different means that at least one of size, thickness, material, and hole diameter is different.
  • the same base material is surface-treated and not surface-treated, and the same base material is surface-treated with a different material.
  • the average pore diameter of the surface side region 12 within a depth of 100 ⁇ m from the surface is smaller than the average pore size of the internal region 14 inside the surface side region 12.
  • a cleaner filtrate is obtained with a smaller pore size.
  • the pore size is made too small, the filtration efficiency will deteriorate.
  • by reducing the average pore diameter of the surface side region 12 of the ceramic filter a cleaner filtrate is ensured, and by increasing the average pore size of the inner region 14, the length of the section with a small average pore size is obtained. It was decided to reduce the efficiency of filtration by shortening the length and making it difficult for the liquid to pass. Thereby, the amount of backwash liquid with respect to the amount of filtrate until clogging is improved can be reduced as compared with a uniform ceramic filter having a small average pore diameter, and the filtration efficiency is improved.
  • a method of performing surface treatment to a predetermined depth on a uniform base material or laminating with different materials can be considered.
  • the surface treatment it is not necessary to carry out the surface treatment from the surface to a depth of just 100 ⁇ m, and the surface treatment may be performed from the surface to a position below the depth of 100 ⁇ m, such as from the surface to a depth of 50 ⁇ m. To a position with a depth of more than 100 ⁇ m. It is sufficient that the surface treatment is not performed over the entire thickness direction.
  • the ceramic filter tends to have a smaller pore diameter than the base material by surface treatment.
  • the average pore diameter of the surface side region 12 is smaller than the average pore diameter of the internal region 14 by the amount of the surface treatment. Further, even if the surface treatment is performed from the surface to a position with a depth of more than 100 ⁇ m, the average pore diameter of the inner region 14 becomes larger than the average pore diameter of the surface side region 12 by the amount not subjected to the surface treatment.
  • the ceramic filter preferably has the same surface potential as the zeta potential of the developer waste.
  • the surface potential of the ceramic filter is preferably plus (+).
  • the surface potential of the ceramic filter is preferably minus ( ⁇ ).
  • the surface potential of the ceramic filter can be adjusted by the material of the base material, the material of the surface treatment agent, the pH value of the developing waste liquid, and the like. For example, if the pH of the developing waste solution is high, the base material of the base material is alumina, or the surface potential of the ceramic filter subjected to the surface treatment with alumina is negative, and if the pH is low, the surface potential of the ceramic filter is positive. Become.
  • the surface potential is preferably matched with the zeta potential code of the development waste solution.
  • the average pore diameter of the surface side region 12 of the ceramic filter is preferably relatively small, and is preferably in the range of 0.01 to 0.20 ⁇ m. More preferably, it is in the range of 0.01 to 0.15 ⁇ m, and still more preferably in the range of 0.01 to 0.10 ⁇ m.
  • the average pore diameter of the inner region 14 of the ceramic filter is preferably relatively large, and preferably in the range of 0.20 to 2.0 ⁇ m. More preferably, it is in the range of 0.20 to 1.5 ⁇ m, and still more preferably in the range of 0.20 to 1.0 ⁇ m.
  • the average pore diameter of the surface side region 12 of the ceramic filter can be measured by observing the cross section of the surface side region 12 using a scanning microscope.
  • any five pore diameters in the range of 50 ⁇ 50 ⁇ m in the cross section of the surface side region 12 can be measured, and the average value of the measured pore diameters of a total of 15 points can be expressed for any three locations. Further, the average pore diameter of the inner region 14 of the ceramic filter can be measured in the same manner.
  • the thickness of the ceramic filter is not particularly limited, but is preferably 4 mm or more from the viewpoint of the strength of the ceramic filter. More preferably, it is 5 mm or more. Moreover, it is preferable that it is 8 mm or less from viewpoints, such as a waste liquid processing efficiency. More preferably, it is 7 mm or less.
  • the ceramic filter is preferably surface-treated.
  • the surface treatment include alumina treatment, titanium oxide treatment, and chromium oxide treatment. Of these, alumina treatment is preferred. When the surface treatment is performed, the water-insoluble polymer is difficult to adhere to the filter. The above effects are remarkable in the alumina treatment.
  • the separation step preferably includes a backwashable mechanism.
  • a backwashable mechanism When a filter or the like is clogged during a long-term operation or the like, the clogging can be easily eliminated by performing backwashing, and maintenance is easy.
  • a backwashable mechanism is provided, and regular backwashing can be performed for longer operation.
  • the backwashable mechanism includes, for example, a pump that backflows the low-concentration developer in the separation device, and removes the water-insoluble polymer deposited on the ceramic filter. Backwashing may be automated or performed manually.
  • the printing plate material used in the present invention is a printing plate material that is developed using an aqueous developer containing water as a main component.
  • Preferred printing plate materials are as follows.
  • the printing plate material has a photosensitive layer.
  • the photosensitive layer is formed on a substrate, for example.
  • the substrate include a plastic film (plastic sheet) such as a PET film, a metal sheet such as stainless steel and aluminum, and a rubber sheet such as butadiene rubber.
  • the photosensitive layer is formed by layering a photosensitive resin composition.
  • the photosensitive resin composition includes a polymer component such as resin, rubber, and latex, a photopolymerizable monomer, and a photopolymerization initiator, and further includes an additive as necessary.
  • the developing method according to the present invention is effective when the photosensitive layer contains a water-insoluble or hydrophobic polymer component.
  • a water-soluble or hydrophilic polymer component may be included.
  • polymer component resin examples include polyamide, polyvinyl alcohol, polyester, and polyurethane.
  • rubber examples include butadiene rubber, chloroprene rubber, and acrylonitrile butadiene rubber.
  • components washed out with the developer of the photosensitive resin composition include water-soluble or hydrophilic components, water-insoluble or hydrophobic components.
  • the water-soluble polymer or hydrophilic polymer contained in the water-soluble component is a water-soluble or water-swellable polyamide in which a hydrophilic component is introduced into polyamide (dissolved or completely dispersed in water by immersion in water at 25 ° C./24 hours).
  • Polyamide partially saponified polyvinyl acetate and derivatives thereof.
  • Examples of the water-insoluble polymer or hydrophobic polymer contained in the water-insoluble component include various millable rubbers.
  • butadiene rubber examples include butadiene rubber, chloroprene rubber, acrylonitrile butadiene rubber, acrylic rubber, epichlorohydrin rubber, urethane rubber, isoprene rubber, styrene isoprene rubber, styrene butadiene rubber, ethylene-propylene copolymer, and chlorinated polyethylene.
  • the photosensitive resin composition containing a water-insoluble polymer since at least a part of the polymer component is dispersed without being dissolved, there is an advantage that the viscosity of the washing liquid is low and the waste liquid treatment can be easily performed.
  • examples of the photosensitive resin composition for flexographic printing plate materials include those containing water-dispersed latex, millable rubber, photopolymerizable monomer, and photopolymerization initiator.
  • Water-dispersed latex is a polymer particle dispersed in water as a dispersoid. A polymer is obtained by removing water from the water-dispersed latex. The water-dispersed latex can impart water developability to the photosensitive resin composition.
  • water-dispersed latex examples include polybutadiene latex, natural rubber latex, styrene-butadiene copolymer latex, acrylonitrile-butadiene copolymer latex, polychloroprene latex, polyisoprene latex, polyurethane latex, and methyl methacrylate-butadiene copolymer.
  • Water-dispersed latex polymers such as polymer latex, vinylpyridine polymer latex, butyl polymer latex, thiocol polymer latex, and acrylate polymer latex, and other components such as acrylic acid and methacrylic acid are copolymerized with these polymers The polymer obtained by doing this can be mentioned. These may be used alone or in combination of two or more.
  • Millable rubber can increase the rubber elasticity of the photosensitive resin composition. Thereby, for example, it is possible to expect effects such as easy printing on various substrates.
  • Specific examples of the millable rubber include butadiene rubber (BR), nitrile rubber (NBR), acrylic rubber, epichlorohydrin rubber, urethane rubber, isoprene rubber, styrene isoprene rubber, styrene butadiene rubber, ethylene-propylene copolymer, chlorination. Examples thereof include polyethylene. These may be used alone or in combination of two or more.
  • butadiene rubber (BR) and nitrile rubber (NBR) are preferable from the viewpoint of improving the water developability, drying property, and image reproducibility of the photosensitive resin composition. Furthermore, the butadiene rubber (BR) is particularly easy to finely disperse in the photosensitive resin composition, thereby improving the reproducibility of the fine shape and further improving the image reproducibility. preferable.
  • the photopolymerizable monomer can cure or crosslink the photosensitive resin composition.
  • the photopolymerizable monomer include ethylenically unsaturated compounds.
  • the ethylenically unsaturated compound include (meth) acrylic monomers, (meth) acrylic oligomers, and (meth) acrylic modified polymers.
  • the (meth) acryl-modified polymer include (meth) acryl-modified butadiene rubber and (meth) acryl-modified nitrile rubber.
  • the ethylenically unsaturated compound may be a compound having only one ethylenically unsaturated bond or a compound having two or more ethylenically unsaturated bonds.
  • ethylenically unsaturated compound having only one ethylenically unsaturated bond examples include 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, 2-hydroxybutyl (meth) acrylate, 3-chloro-2-hydroxypropyl (meth) acrylate, ⁇ -hydroxy- ⁇ '-(meth) acryloyloxyethyl phthalate and other hydroxyl group-containing (meth) acrylates, methyl (meth) acrylate, ethyl (meth) acrylate, propyl Alkyl (meth) acrylates such as (meth) acrylate, butyl (meth) acrylate, isoamyl (meth) acrylate, 2-ethylhexyl (meth) acrylate, lauryl (meth) acrylate, stearyl (meth) acrylate, cyclohexyl (meth) ) Cyclo
  • ethylenically unsaturated compound having two or more ethylenically unsaturated bonds include alkyldiol di (meth) acrylates such as 1,9-nonanediol di (meth) acrylate, and diethylene glycol di (meth) acrylate.
  • Polyethylene glycol di (meth) acrylate such as polypropylene glycol di (meth) acrylate such as dipropylene glycol di (meth) acrylate, trimethylolpropane tri (meth) acrylate, pentaerythritol tri (meth) acrylate, pentaerythritol tetra (meth) )
  • Compounds with ethylenically unsaturated bonds and active hydrogen such as unsaturated carboxylic acids and unsaturated alcohols, to acrylate, glycerol tri (meth) acrylate, ethylene glycol diglycidyl ether
  • Polyhydric (meth) acrylates obtained by addition reaction of unsaturated epoxy compounds such as polyvalent (meth) acrylates and glycidyl (meth) acrylates obtained by addition reaction with compounds having active hydrogen such as carboxylic acids and amines
  • polyvalent (meth) acrylamides such as methylenebis (meth) acryl
  • the photopolymerization initiator is not particularly limited as long as it initiates photopolymerization of the photopolymerizable monomer.
  • alkylphenones, acetophenones, benzoin ethers, benzophenones, thioxanthones, anthraquinones, benzyls examples thereof include photopolymerization initiators such as biacetyls. Specific examples include benzyl dimethyl ketal, 2-hydroxy-2-methyl-1-phenyl-propan-1-one, methyl-O-benzoylbenzoate, 1-hydroxycyclohexyl phenyl ketone, and the like.
  • the mixing ratio of the water-dispersed latex and the millable rubber in the photosensitive resin composition is preferably 20% or more in terms of the ratio of the weight of the water-dispersed latex to the total weight of the water-dispersed latex and the millable rubber. More preferably, it is 30% or more, More preferably, it is 50% or more. When this mass ratio is 20% or more, water development can be performed at high speed. This is presumably because the permeability of the aqueous developer to the photosensitive resin composition is increased.
  • the photosensitive resin composition can contain a surfactant for the purpose of improving water developability.
  • a surfactant for the purpose of improving water developability.
  • the surfactant include a cationic surfactant, an anionic surfactant, and a nonionic surfactant.
  • an anionic surfactant is particularly preferable.
  • anionic surfactants include aliphatic carboxylates such as sodium laurate and sodium oleate, higher alcohol sulfates such as sodium lauryl sulfate, sodium cetyl sulfate, and sodium oleyl sulfate, Polyoxyethylene alkyl allyl ether sulfate such as sodium polyoxyethylene lauryl ether sulfate, polyoxyethylene alkyl allyl ether sulfate such as sodium polyoxyethylene octylphenyl ether sulfate and sodium polyoxyethylene nonylphenyl ether sulfate, Alkyl sulfonates such as alkyl diphenyl ether disulfonate / sodium dodecyl sulfonate, sodium dialkyl sulfosuccinate, Alkyl allyl sulfonates such as rualkyl disulfonate, sodium dodecylbenzene sulfonate,
  • sulfonic acid surfactants such as alkyl sulfonates and alkyl allyl sulfonates are preferred from the standpoint of excellent water developability of the photosensitive resin composition.
  • the content of the surfactant in the photosensitive resin composition is preferably in the range of 0.1 to 20% as a ratio of the mass of the surfactant to the total mass of the water-dispersed latex, the millable rubber, and the surfactant. . More preferably, it is in the range of 0.1 to 15%, and still more preferably in the range of 0.1 to 10%.
  • this mass ratio 0.1% or more, water development can be performed in a short time. This is presumably because the permeability of the aqueous developer to the photosensitive resin composition is increased. Moreover, drying property improves by making this mass ratio into 20% or less.
  • a thermal polymerization inhibitor (stabilizer) can be added from the viewpoint of increasing the thermal stability during kneading and enhancing the storage stability.
  • the thermal polymerization inhibitor include phenols, hydroquinones, and catechols.
  • the content of the thermal polymerization inhibitor in the photosensitive resin composition is generally in the range of 0.001 to 5% by mass.
  • photosensitive resin composition that can be used in the present invention, those containing various additives in addition to the above may be used.
  • the developer used in the present invention is an aqueous developer containing water as a main component.
  • Preferred aqueous developers are as follows.
  • the aqueous developer may be a solution composed only of water or an aqueous solution to which a compound soluble in water is added.
  • water-soluble compounds include surfactants, acids, bases, salts and the like. From the viewpoint of improving development efficiency, it is preferable to add a compound soluble in water.
  • surfactant examples include a cationic surfactant, an anionic surfactant, and a nonionic surfactant. Specifically, the above-mentioned various surfactants can be mentioned.
  • Examples of the acid include inorganic acids and organic acids such as sulfuric acid, nitric acid, phosphoric acid, formic acid, acetic acid, oxalic acid, succinic acid, citric acid, maleic acid, and paratoluenesulfonic acid.
  • Examples of the base include lithium hydroxide, sodium hydroxide, potassium hydroxide, calcium hydroxide and the like.
  • the aqueous developer may contain water-soluble organic solvent.
  • organic solvent examples include methanol, ethanol, isopropyl alcohol, cellosolve, glycerin, polyethylene glycol, dimethylformamide, dimethylacetamide, and acetone.
  • the developing device for a printing plate includes a developing unit 1 that forms a relief image using an aqueous developer.
  • the developer used in the developing unit 1 is returned to the developing unit 1 through a circulation path composed of the pipes L1 and L2.
  • a developer tank 3 for temporarily storing the developer, a pump 4 for promoting circulation of the developer, and the like are installed.
  • the developing device for a printing plate includes a separation unit 2 that separates a high-concentration developer having a high water-insoluble polymer concentration into a low-concentration developer having a low concentration.
  • the separation unit 2 is a device that separates using a ceramic filter.
  • the separation unit 2 may be installed in the circulation path and supplied with the development waste liquid from the pipe L ⁇ b> 1, and may be installed outside the circulation path as illustrated in FIG. 2. May be connected to another pipe L3 and supplied with a developing waste solution.
  • the separation unit 2 when the separation unit 2 is installed in the circulation path, the low concentration developer is returned to the development unit 1 through the piping L2 of the circulation path.
  • the separation unit 2 when the separation unit 2 is installed outside the circulation path, the separation unit 2 includes an L3 for supplying the developer waste liquid, a pipe L4 for returning the low-concentration developer to the circulation path, and a pump 5. .
  • the pipes L3 and L4 are connected to arbitrary locations in the circulation path. In the example of FIG. 2, it is connected to the developer tank 3. Since the developing solution is stored in the developing solution tank 3, it is convenient as a connection point.
  • the high-concentration developer separated in the separation unit 2 remains in the separation unit 2 and is concentrated to a high-concentration developer having a higher water-insoluble polymer concentration by repeatedly performing the separation step.
  • the concentrated high-concentration developer can be discharged from the pipe L5 by opening the valve 6.
  • a polymer obtained from water-dispersed latex (Nipol LX111NF, manufactured by Zeon Corporation).
  • -BR [Nippon BR1220, manufactured by Nippon Zeon Co., Ltd.]
  • -Acrylic modified liquid BR [Osaka Organic Chemical Co., Ltd., BAC-45] ⁇
  • Acrylic monomer [1,9-nonanediol dimethacrylate, manufactured by NOF Corporation]
  • -Photopolymerization initiator [Ciba Japan Co., Ltd., Irgacure 651]
  • -Surfactant [manufactured by NOF Corporation, Newlex R]
  • Plasticizer [Esso Oil Co., Ltd., Christol 70]
  • Thermal polymerization inhibitor [Seiko Chemical Co., Ltd., MEHQ (hydroquinone monomethyl ether)]
  • the photosensitive resin composition thus obtained was coated with an adhesive on one side of a 125 ⁇ m-thick PET film, and a protective film with an anti-blocking agent applied on one side of a 100 ⁇ m-thick PET film. And the adhesive layer, the photosensitive layer made of the photosensitive resin composition, on the substrate by pressing with a press machine heated to 120 ° C. so that the thickness of the photosensitive resin composition is 1 mm, A printing plate material in which an anti-sticking agent layer and a protective film were laminated in this order was produced.
  • the base is formed by irradiating ultraviolet rays from the substrate side of the printing plate material, and then the protective film is peeled off, and a negative film for image reproducibility evaluation (
  • the halftone dots “150 Lpi / 2%” and “independent point ⁇ 120 ⁇ m” were brought into close contact with each other in vacuum, and the negative film was exposed for 6 minutes from the distance of 15 cm (main exposure) with the above exposure apparatus. Thereafter, the negative film was removed, washed out with an aqueous developer containing a surfactant (1% by mass) for 10 minutes, and then sufficiently dried with hot air at 50 ° C.
  • the printing plate was produced by the above.
  • the structure of the ceramic filter used is as shown in Table 1 below.

Abstract

L'invention concerne un procédé de développement de plaque d'impression qui, dans le traitement de déchets liquides de développement, supprime le colmatage d'un filtre, permet un fonctionnement à long terme, réduit le volume de déchets liquides de développement rejetés en permettant la réutilisation de déchets liquides de développement en tant que solution de développement, et a une excellente performance économique. Le procédé de développement selon la présente invention développe, par l'intermédiaire d'une solution de développement aqueuse, une couche de résine photosensible contenant un polymère insoluble dans l'eau, et implique une voie de circulation dans laquelle des déchets liquides de développement qui ont été utilisés pour un développement sont récupérés et renvoyés à une unité d'alimentation. Une étape de séparation est prévue à l'intérieur ou à l'extérieur de la voie de circulation, et dans l'étape de séparation, la totalité ou une partie des déchets liquides de développement est extraite et ensuite séparée, à l'aide d'un filtre céramique, en une solution de développement à haute concentration ayant une concentration élevée du polymère insoluble dans l'eau et une solution de développement à faible concentration ayant une faible concentration de celui-ci, et la solution de développement à faible concentration est renvoyée à l'intérieur de la voie de circulation. Le filtre céramique comprend un matériau pour lequel la taille de pore moyenne d'une région côté surface à une profondeur dans les 100 µm à partir de la surface est inférieure à la taille de pore moyenne d'une région intérieure plus loin à l'intérieur que la région côté surface, et dans l'étape de séparation, une pluralité de filtres en céramique sont utilisés.
PCT/JP2019/012355 2018-03-30 2019-03-25 Procédé de développement et dispositif de développement de plaque d'impression WO2019188899A1 (fr)

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Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06134267A (ja) * 1992-10-28 1994-05-17 Noritake Co Ltd 板状セラミックフィルター
JPH11212274A (ja) * 1998-01-29 1999-08-06 Toyobo Co Ltd 感光性樹脂版用現像液の処理方法および処理装置
JPH11212275A (ja) * 1998-01-29 1999-08-06 Toyobo Co Ltd 感光性樹脂凸版用現像液の再生方法
JP2000218114A (ja) * 1999-02-01 2000-08-08 Ngk Insulators Ltd セラミックフィルタの製造方法
JP2002136969A (ja) * 2000-09-01 2002-05-14 Haldor Topsoe As 水性懸濁液から微粒子物質を除く方法
JP2009258211A (ja) * 2008-04-14 2009-11-05 Toagosei Co Ltd 導電性高分子膜上のレジスト被膜の除去方法および除去装置
US20100213128A1 (en) * 2009-02-24 2010-08-26 Bradford David C Polymer-containing solvent purifying process

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06134267A (ja) * 1992-10-28 1994-05-17 Noritake Co Ltd 板状セラミックフィルター
JPH11212274A (ja) * 1998-01-29 1999-08-06 Toyobo Co Ltd 感光性樹脂版用現像液の処理方法および処理装置
JPH11212275A (ja) * 1998-01-29 1999-08-06 Toyobo Co Ltd 感光性樹脂凸版用現像液の再生方法
JP2000218114A (ja) * 1999-02-01 2000-08-08 Ngk Insulators Ltd セラミックフィルタの製造方法
JP2002136969A (ja) * 2000-09-01 2002-05-14 Haldor Topsoe As 水性懸濁液から微粒子物質を除く方法
JP2009258211A (ja) * 2008-04-14 2009-11-05 Toagosei Co Ltd 導電性高分子膜上のレジスト被膜の除去方法および除去装置
US20100213128A1 (en) * 2009-02-24 2010-08-26 Bradford David C Polymer-containing solvent purifying process

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