WO2019105422A1 - Heating device and heating method - Google Patents

Heating device and heating method Download PDF

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Publication number
WO2019105422A1
WO2019105422A1 PCT/CN2018/118260 CN2018118260W WO2019105422A1 WO 2019105422 A1 WO2019105422 A1 WO 2019105422A1 CN 2018118260 W CN2018118260 W CN 2018118260W WO 2019105422 A1 WO2019105422 A1 WO 2019105422A1
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Prior art keywords
heater
suction cup
heating
heating device
substrate
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PCT/CN2018/118260
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French (fr)
Chinese (zh)
Inventor
程静
朱鸷
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上海微电子装备(集团)股份有限公司
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Publication of WO2019105422A1 publication Critical patent/WO2019105422A1/en

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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere

Definitions

  • the present invention relates to the field of semiconductor technology, and in particular, to a bonding heating device and a heating method.
  • Wafer bonding technology can bond wafers of different materials together.
  • the use of wafer bonding technology to combine new structural materials has great freedom, and is widely used in microelectronic circuits, sensors, power device micromachining, optoelectronic devices, insulating silicon wafers and other fields.
  • the wafer bonding process generally heats a base material such as a silicon wafer or a glass substrate to a certain temperature in a vacuum environment, applies a certain external force, and performs bonding for a certain period of time.
  • the main heating device of the existing wafer bonding apparatus is as shown in FIG. 1 : a heater 13 is formed by burying a heating wire in a metal plate of a superalloy by brazing, and the heater 13 is placed on the heat insulating seat 14 .
  • the suction cup 12 is superimposed on the heater 13, or the heater 13 and the suction cup 12 are combined into one part, and the substrate 11 is adsorbed by the suction cup 12.
  • the heat conduction in the heating process sequentially passes through the heater 13, the suction cup 12, and finally to the substrate 11, completing the heating of the substrate 11. .
  • the heater 13 has a large weight, which has a great influence on the dynamic performance of the table carrying the heating device, is not suitable for the case where the weight is limited, and the thermal expansion during the heating process causes the heater 13 and the suction cup.
  • the thickness of the whole 12 is thickened, so that the flatness (surface flatness) is deteriorated, and the height and flatness of the substrate 11 adsorbed on the chuck 12 are further affected.
  • the machine vision system Since it is necessary to perform position detection on the substrate on the substrate 11 by the machine vision system in the wafer bonding apparatus, when the height of the substrate 11 changes or the flatness is poor, the machine vision system needs to increase the auto focus function, otherwise it is difficult to capture the substrate. Clear imaging of the chip on 11 affects position detection, but increasing this function increases system complexity and reduces yield, while the heater used for heating has a thicker thickness, a larger heat capacity, and a heating and cooling time. Longer, not suitable for occasions where frequent heating, cooling, and heating are required.
  • a thin heater instead of the original thick heater can greatly reduce the weight of the heater.
  • even a thin heater does not solve the increase in the thickness of the heater due to thermal expansion during heating. The flatness is getting worse. Due to the thin thickness of the thin heater, the thickness of the thin heater is less accurate than that of the original thick heater, and it has a certain arc shape, as shown in Fig. 2a (naturally placed suction cup 21, naturally placed thin heating
  • the suction cup is brought into an arc shape, as shown in Fig.
  • the heater 24 causes the height dimension of the substrate relative to the insulating seat and the flatness of the substrate to be uncontrollable.
  • the present invention provides a heating device, which comprises: a heater, a suction cup and an insulation seat.
  • the suction cup is directly fixed on the heat insulating seat, the heat insulating seat supports an edge of a lower surface of the suction cup; the heater is connected to the lower surface of the suction cup and located at the heat insulating seat The inside.
  • the heater is a thin heater.
  • the weight ratio of the heater to the suction cup is less than 1.
  • the heater is in contact with the lower surface of the suction cup.
  • the heating device further includes a flexible fixing device, and the heater is fixed to a lower surface of the suction cup by the flexible fixing device.
  • the flexible fixing device comprises a butterfly spring and a step bolt, and one end of the butterfly spring abuts against the step of the step bolt.
  • step height of the step bolt in the flexible fixing device is determined by the thickness and weight of the heater and the compression amount of the butterfly spring.
  • the force required for the deformation of the butterfly spring in the flexible fixing device is smaller than the force required for the deformation of the suction cup, and the force required for the deformation of the butterfly spring is smaller than that of the heater. The force needed.
  • the heating device further includes a temperature homogenizing layer between the heater and the chuck for achieving uniform heat transfer between the heater and the chuck.
  • the heating device further includes a fixing layer fixed to the lower surface of the heater by the flexible fixing device.
  • the load of the step bolt is greater than a sum of the heater, the temperature homogenizing layer, the fixed layer and the weight of the butterfly spring.
  • the material of the suction cup is a titanium alloy.
  • the total thickness of the suction cup is controlled within 8 mm during the heating process.
  • the present invention provides a heating method for heating a substrate using the heating device described above, comprising: fixing the substrate to an upper surface of the chuck; and heating the substrate.
  • the invention directly fixes the suction cup on the heat insulating seat, and hangs the thin heater on the lower surface of the suction cup, and the force generated by the heat deformation of the heater and the suction cup is axially transmitted downward, thereby reducing the heater.
  • a temperature homogenizing layer is added between the heater and the suction cup to achieve uniform heat transfer between the heater and the suction cup, and a fixed layer is added on the lower surface of the heater to prevent the heater from being locally heated due to the rapid transfer of heat. Warpage occurred.
  • the invention adopts a thin heater, which reduces the weight of the heating device, thereby reducing the load demand on the worktable. Due to the decrease of the thickness of the heater, the heat capacity of the heater is reduced, and the heating and cooling cycle of the heating device is shortened. Increased heating efficiency.
  • FIG. 1 is a schematic structural view of a conventional heating device
  • Figure 2a is a schematic view showing the structure of a naturally placed suction cup and a heater
  • Figure 2b is a schematic structural view of the suction cup and the heater after being fixed
  • FIG. 3 is a schematic structural view of a heating device according to Embodiment 1 of the present invention.
  • FIG. 4 is a schematic structural view of a flexible fixing device according to Embodiment 1 and Embodiment 2 of the present invention.
  • FIG. 5 is a schematic structural view of a heating device according to Embodiment 2 of the present invention.
  • FIG. 6 is a schematic structural view of a heating device according to Embodiment 3 of the present invention.
  • FIG. 3 is a schematic structural diagram of a heating device according to Embodiment 1 of the present invention.
  • the heating device includes a suction cup 32, a temperature homogenizing layer 33, a heater 34, a heat insulating seat 35, and a flexible fixing device 36.
  • the suction cup 32 realizes the load and adsorption of the substrate 31
  • the heater 34 realizes the heat output of the heating device, and the temperature between the suction cup 32 and the heater 34 can be selectively increased according to the type of the heater 34.
  • the layer 33 is configured to achieve uniform heat transfer between the chuck 32 and the heater 34.
  • the temperature homogenizing layer 33 and the heater 34 are hung upside down on the lower surface of the chuck 32 by the flexible fixing device 36.
  • the suction cup 32 is supported by the heat insulating seat 35.
  • FIG. 4 is a schematic structural view of the flexible fixing device 36.
  • the flexible fixing device 36 includes a butterfly spring 41 and a step bolt 42.
  • One end of the butterfly spring 41 abuts against the step of the step bolt 42, and the butterfly spring 41 is further One end abuts against the lower surface of the suction cup 32.
  • the heater 34 and the temperature homogenizing layer 33 are hung upside down on the lower surface of the suction cup 32 by the flexible fixing device 36, that is, the step bolt 42 is fixed under the suction cup 32.
  • the surface of the butterfly spring 41 carries the heater 34 and the temperature homogenizing layer 33 on the step of the step bolt 42.
  • the heater 34 and the temperature homogenizing layer 33 provide a supporting force to ensure the adhesion of the heater 34 to the suction cup 32, wherein the supporting force is greater than the heater 34, the temperature homogenizing layer 33, and
  • the sum of the weights of the butterfly springs 41, preferably, the supporting force is one to two times the sum of the weights of the heater 34, the temperature homogenizing layer 33 and the butterfly spring 41 .
  • the force required for the deformation of the butterfly spring 41 is smaller than the force required for the heater 34 to be deformed by heat.
  • the force required for the deformation of the butterfly spring 41 is smaller than the force required for the heat deformation of the suction cup 32.
  • the heater 32 may be a thick heater or a thin heater, preferably a thin heater, for example, a thin heater having a thickness of about 3 mm, compared to the existing thick heating.
  • the weight of the thin heater itself is greatly reduced, thereby reducing the weight of the heating device, reducing the load requirement on the table, and reducing the heat capacity of the heater 32 due to the decrease in the thickness of the heater 32.
  • the energy consumption of the heating of the heater 32 itself shortens the cycle of heating and cooling of the heating device, and improves the heating efficiency.
  • the material of the suction cup 32 in the embodiment is preferably TA12 (titanium alloy) material, and the high temperature performance of the TA12 material is better than that of the high temperature alloy or stainless steel material used in the prior art suction cup, and the suction cup 32 is reduced.
  • the deformation amount at a high temperature causes the total thickness of the suction cup 32 to be controlled to be less than 8 mm throughout the heating process, and since the density of the TA12 material is about half that of the steel material, the suction cup 32 itself made of the TA12 material is reduced.
  • the weight further reduces the load requirements on the workbench.
  • the present invention also provides a heating method for heating the substrate 31 by using the heating device described above, as follows:
  • the suction cup 32 is placed on the heat insulating seat 35, and the temperature homogenizing layer 33 and the heater 34 are hung upside down on the lower surface of the suction cup 32 by the flexible fixing device 36; preferably, First, the temperature homogenization layer 33 and the heater 34 are bored for the insertion of the butterfly spring 41, and secondly, the depth of the step bolt 42 into the butterfly spring 41 is adjusted to pass the heater 34.
  • the temperature homogenizing layer 33 is attached to the suction cup 32; then, the substrate 31 is fixed to the upper surface of the suction cup 32 by vacuum suction; finally, the heater 34 performs heat output to the substrate 31 is heated.
  • FIG. 5 is a schematic structural diagram of a heating device according to Embodiment 2 of the present invention.
  • the heating device includes a suction cup 52, a temperature homogenizing layer 53, a heater 54, a fixed layer 55, a flexible fixing device 56, and a heat insulating seat 57.
  • the suction cup 52 realizes load and adsorption of the substrate 51
  • the heater 54 realizes heat output of the heating device, and can be selectively added between the suction cup 52 and the heater 54 according to the kind of the heater 54.
  • the temperature homogenization layer 53 realizes uniform heat transfer between the suction cup 52 and the heater 54.
  • a fixed layer 55 may be added to the lower surface of the heater 54 to realize the opposite.
  • the fixing of the heater 54 prevents the heater 54 from being warped due to the inability of the heat to be transferred quickly, and the temperature homogenizing layer 53, the heater 54, and the fixed layer 55 pass the flexibility.
  • the fixing device 56 is hung upside down on the lower surface of the suction cup 52, and the suction cup 52 is supported by the heat insulating seat 57.
  • the heater 54 may be a thin heater, preferably a brittle material heater having a thickness of about 1 mm, such as a ceramic heater, and the ceramic heater has a high heating speed if heated. If the heat is not transferred quickly, the ceramic heater may be locally heated and warped. To avoid such a phenomenon, in this embodiment, a fixed layer 55 is added on the lower surface of the heater 54 for realizing the ceramic heater. Timely delivery of heat. The fixing layer 55 and the temperature homogenizing layer 53 and the heater 54 are hung upside down on the lower surface of the suction cup 52 through the flexible fixing device 56.
  • the weight ratio of the heater 54 and the suction cup 52 in the embodiment is less than 1.
  • the material of the suction cup 52 is preferably TA12 material with good high temperature performance, and the flexible fixing device 56 includes a butterfly.
  • the spring 41 and the step bolt 42 have a load greater than the sum of the heater 54, the temperature homogenizing layer 53, the fixed layer 55, and the butterfly spring 41.
  • the present invention also provides a heating method for heating the substrate 51 by using the heating device described above, as follows:
  • the suction cup 52 is placed on the heat insulation seat 57, and the temperature homogenization layer 53, the heater 54 and the fixed layer 55 are hung upside down to the suction cup 52 by the flexible fixing device 56.
  • a lower surface preferably, a hole is formed in the temperature equalizing layer 53 and the heater 54 for the insertion of the butterfly spring 41, and secondly, the depth of the step bolt 42 into the butterfly spring 41 is adjusted, so that The heater 54 is adhered to the suction cup 52 through the temperature homogenizing layer 53, and the fixing layer 55 is attached to the heater 54; then, the substrate 51 is fixed by vacuum suction.
  • the upper surface of the suction cup 52 is described; finally, the heater 54 performs heat output to heat the substrate 51.
  • FIG. 6 is a schematic structural diagram of a heating device according to Embodiment 3 of the present invention.
  • the heating device includes a suction cup 62, a heater 63, and a heat insulating seat 64.
  • the suction cup 62 realizes load and adsorption of the substrate 61
  • the heater 63 realizes heat output of the heating device
  • the heater 63 is fixed to the lower surface of the suction cup 62, and the suction cup 62 is supported by the heat insulating seat 64.
  • the heater 63 may be a thin heater, preferably a flexible material heater having a thickness of about 0.2 mm, such as a polyimide heater.
  • the polyimide heater is a flexible material, and the deformation generated during thermal expansion does not affect the flatness of the suction cup 62, so that it is not required to be fixed by a flexible fixing device.
  • the weight ratio of the heater 63 and the suction cup 62 is less than 1, and the material of the suction cup 62 is preferably TA12 material with good high temperature performance.
  • the present invention also provides a heating method for heating the substrate 61 by the heating device described above, as follows:
  • the suction cup 62 is placed on the heat insulating seat 64, and a heater 63 is fixed on the lower surface of the suction cup 62; then, the substrate 61 is fixed to the upper surface of the suction cup 62 by vacuum suction; Finally, the heater 63 performs heat output to heat the substrate 61.
  • the present invention directly fixes the suction cup on the heat insulating seat, and the thin heater is hung upside down on the lower surface of the suction cup by the flexible fixing device, and the force generated by the heat deformation of the heater and the suction cup is axially transmitted downward, thereby reducing the heating.
  • the effect of the deformation of the device on the height and flatness of the substrate during heating is added between the heater and the suction cup to achieve uniform heat transfer between the heater and the suction cup, and a fixed layer is added on the lower surface of the heater to prevent the heater from being warped due to the inability of the heat to be transferred quickly. .
  • the invention adopts a thin heater, which reduces the weight of the heating device, thereby reducing the load demand on the worktable. Due to the reduction of the thickness of the heater, the heat capacity of the heater is reduced, and the heating and cooling cycle of the heating device is shortened, thereby improving Heating efficiency.

Abstract

Disclosed are a heating device and a heating method thereof, wherein a sucking disc (32) is directly fixed to a heat insulation seat (35), a thin heater (34) hangs upside down from a lower surface of the sucking disc (32) via a soft fixing device (36), a force generated by thermal deformation of the heater (34) and the sucking disc (32) is delivered axially and downwardly, and the impact of the self-deformation of the heater (34) during heating on the height and flatness of the substrate (31) is reduced. A temperature homogenizing layer (33) is provided between the heater (34) and the sucking disc (32) to realize a uniform heat conduction between the heater (34) and the sucking disc (32), and a fixing layer (55) is provided on a lower surface of the heater (34) to prevent the heater (34) from warping due to the inability to transfer heat rapidly, which results in local heating of the heater. Meanwhile, the technical solution adopts a thin heater (34), the weight of the heating device is reduced, and the load requirement for a workbench is then reduced. Due to the decrease in the thickness of the heater (34), the heat capacity of the heater (34) is reduced, the heating and cooling cycle of the heating device is shortened, and the heating efficiency is improved.

Description

一种加热装置及加热方法Heating device and heating method 技术领域Technical field
本发明涉及半导体技术领域,具体涉及一种键合加热装置及加热方法。The present invention relates to the field of semiconductor technology, and in particular, to a bonding heating device and a heating method.
背景技术Background technique
晶圆键合技术可以将不同材料的晶圆结合在一起。利用晶圆键合技术组合新结构材料有极大的自由度,被广泛应用于微电子电路、传感器、功率器件微机械加工、光电子器件、绝缘性硅晶片等领域。Wafer bonding technology can bond wafers of different materials together. The use of wafer bonding technology to combine new structural materials has great freedom, and is widely used in microelectronic circuits, sensors, power device micromachining, optoelectronic devices, insulating silicon wafers and other fields.
晶圆键合过程一般是将硅片、玻璃衬底等基底材料在真空环境下加热到一定的温度,施加一定的外力,并持续一定时间,进行键合。现有晶圆键合设备的主要加热装置如图1所示:通过钎焊将加热丝埋在高温合金的金属盘中制作加热器13,将所述加热器13置于隔热座14上,在加热器13上叠加吸盘12,或者将加热器13和吸盘12合并成一个零件,通过吸盘12吸附基底11,加热过程热传导依次经过加热器13、吸盘12,最后到基底11,完成基底11加热。该加热装置中,加热器13重量较大,对承载该加热装置的工作台动力学性能影响非常大,不适合用于对重量有限制的场合,而且加热过程中热膨胀会导致加热器13及吸盘12整体厚度变厚,使其平面度(表面平坦程度)变差,进一步影响吸附于吸盘12上基底11的高度及平面度。由于在晶圆键合设备中需要用机器视觉系统对基底11上的芯片进行位置检测,当基底11的高度变化或者平面度很差时,机器视觉系统需要增加自动调焦功能,否则难以捕获基底11上的芯片的清晰成像,影响位置检测,但增加该功能会增加系统复杂度以及减小产率,同时该加热使用的加热器厚度较厚,自身热容较大,加热和冷却消耗的时间较长,不适用于需频繁加热—冷却—加热的场合。The wafer bonding process generally heats a base material such as a silicon wafer or a glass substrate to a certain temperature in a vacuum environment, applies a certain external force, and performs bonding for a certain period of time. The main heating device of the existing wafer bonding apparatus is as shown in FIG. 1 : a heater 13 is formed by burying a heating wire in a metal plate of a superalloy by brazing, and the heater 13 is placed on the heat insulating seat 14 . The suction cup 12 is superimposed on the heater 13, or the heater 13 and the suction cup 12 are combined into one part, and the substrate 11 is adsorbed by the suction cup 12. The heat conduction in the heating process sequentially passes through the heater 13, the suction cup 12, and finally to the substrate 11, completing the heating of the substrate 11. . In the heating device, the heater 13 has a large weight, which has a great influence on the dynamic performance of the table carrying the heating device, is not suitable for the case where the weight is limited, and the thermal expansion during the heating process causes the heater 13 and the suction cup. The thickness of the whole 12 is thickened, so that the flatness (surface flatness) is deteriorated, and the height and flatness of the substrate 11 adsorbed on the chuck 12 are further affected. Since it is necessary to perform position detection on the substrate on the substrate 11 by the machine vision system in the wafer bonding apparatus, when the height of the substrate 11 changes or the flatness is poor, the machine vision system needs to increase the auto focus function, otherwise it is difficult to capture the substrate. Clear imaging of the chip on 11 affects position detection, but increasing this function increases system complexity and reduces yield, while the heater used for heating has a thicker thickness, a larger heat capacity, and a heating and cooling time. Longer, not suitable for occasions where frequent heating, cooling, and heating are required.
采用薄型加热器替代原有厚型加热器,这样能够大幅减少加热器的重量,但是在现有的加热装置中,即使采用薄型加热器也并不能解决加热过程中热 膨胀导致的加热器厚度增加及平面度变差问题。由于薄型加热器厚度较薄,相比于原有厚型加热器来说,其厚度尺寸精度较差且呈现一定的弧型,如图2a所示(自然放置的吸盘21,自然放置的薄型加热器22),在现有加热装置中,薄型加热器和吸盘固定后会将吸盘带成弧形,如图2b所示(吸盘同薄型加热器固定后的吸盘23,吸盘同薄型加热器固定后的加热器24),导致基底相对于隔热座的高度尺寸及基底平面度无法控制。The use of a thin heater instead of the original thick heater can greatly reduce the weight of the heater. However, in the existing heating device, even a thin heater does not solve the increase in the thickness of the heater due to thermal expansion during heating. The flatness is getting worse. Due to the thin thickness of the thin heater, the thickness of the thin heater is less accurate than that of the original thick heater, and it has a certain arc shape, as shown in Fig. 2a (naturally placed suction cup 21, naturally placed thin heating In the existing heating device, after the thin heater and the suction cup are fixed, the suction cup is brought into an arc shape, as shown in Fig. 2b (the suction cup is fixed with the suction cup 23 after the suction cup is fixed, and the suction cup is fixed with the thin heater) The heater 24) causes the height dimension of the substrate relative to the insulating seat and the flatness of the substrate to be uncontrollable.
发明内容Summary of the invention
为解决上述问题,本发明提出了一种加热装置,其特征在于,包括:加热器、吸盘及隔热座,In order to solve the above problems, the present invention provides a heating device, which comprises: a heater, a suction cup and an insulation seat.
所述吸盘直接固定在所述隔热座上,所述隔热座支撑所述吸盘的下表面的边缘;所述加热器连接至所述吸盘的所述下表面以及且位于所述隔热座的内侧。The suction cup is directly fixed on the heat insulating seat, the heat insulating seat supports an edge of a lower surface of the suction cup; the heater is connected to the lower surface of the suction cup and located at the heat insulating seat The inside.
进一步的,所述加热器为薄型加热器。Further, the heater is a thin heater.
进一步的,所述加热器和所述吸盘的重量比小于1。Further, the weight ratio of the heater to the suction cup is less than 1.
进一步的,所述加热器与所述吸盘的所述下表面相贴合。Further, the heater is in contact with the lower surface of the suction cup.
进一步的,所述加热装置还包括柔性固定装置,所述加热器通过所述柔性固定装置固定在所述吸盘的下表面。Further, the heating device further includes a flexible fixing device, and the heater is fixed to a lower surface of the suction cup by the flexible fixing device.
进一步的,所述柔性固定装置包括蝶形弹簧和台阶螺栓,所述蝶形弹簧的一端抵靠在所述台阶螺栓的台阶上。Further, the flexible fixing device comprises a butterfly spring and a step bolt, and one end of the butterfly spring abuts against the step of the step bolt.
进一步的,所述柔性固定装置中所述台阶螺栓的台阶高度由所述加热器的厚度、重量及所述蝶形弹簧的的压缩量决定。Further, the step height of the step bolt in the flexible fixing device is determined by the thickness and weight of the heater and the compression amount of the butterfly spring.
进一步的,所述柔性固定装置中所述蝶形弹簧形变所需要的力小于所述吸盘受热形变所需要的的力,且所述蝶形弹簧形变所需要的力小于所述加热器受热形变所需要的的力。Further, the force required for the deformation of the butterfly spring in the flexible fixing device is smaller than the force required for the deformation of the suction cup, and the force required for the deformation of the butterfly spring is smaller than that of the heater. The force needed.
进一步的,所述加热装置还包括温度均化层,所述温度均化层位于所述 加热器和所述吸盘之间,用于使所述加热器和所述吸盘之间实现均匀热传递。Further, the heating device further includes a temperature homogenizing layer between the heater and the chuck for achieving uniform heat transfer between the heater and the chuck.
进一步的,所述加热装置还包括固定层,所述固定层通过所述柔性固定装置固定于所述加热器的下表面。Further, the heating device further includes a fixing layer fixed to the lower surface of the heater by the flexible fixing device.
进一步的,所述台阶螺栓的负荷大于所述加热器、所述温度均化层、所述固定层和所述蝶形弹簧的自身重量之和。Further, the load of the step bolt is greater than a sum of the heater, the temperature homogenizing layer, the fixed layer and the weight of the butterfly spring.
进一步的,所述吸盘的材料为钛合金。Further, the material of the suction cup is a titanium alloy.
进一步的,所述吸盘的总厚度在加热过程中控制在8mm以内。Further, the total thickness of the suction cup is controlled within 8 mm during the heating process.
相应的,本发明提供一种加热方法,采用以上所述的加热装置对基底进行加热,包括:将所述基底固定在所述吸盘的上表面;对所述基底进行加热。Accordingly, the present invention provides a heating method for heating a substrate using the heating device described above, comprising: fixing the substrate to an upper surface of the chuck; and heating the substrate.
与现有加热装置相比,本发明将吸盘直接固定在隔热座上,将薄型加热器倒挂于吸盘下表面,加热器和吸盘受热形变产生的力轴向向下传递,减小了加热器在加热过程中自身形变对基底的高度及平面度的影响。Compared with the existing heating device, the invention directly fixes the suction cup on the heat insulating seat, and hangs the thin heater on the lower surface of the suction cup, and the force generated by the heat deformation of the heater and the suction cup is axially transmitted downward, thereby reducing the heater. The effect of self-deformation on the height and flatness of the substrate during heating.
进一步的,在加热器与吸盘之间增加温度均化层,实现加热器和吸盘之间的均匀传热,在加热器下表面增加固定层,避免加热器由于热量无法迅速传递致使其局部受热而发生翘曲。Further, a temperature homogenizing layer is added between the heater and the suction cup to achieve uniform heat transfer between the heater and the suction cup, and a fixed layer is added on the lower surface of the heater to prevent the heater from being locally heated due to the rapid transfer of heat. Warpage occurred.
进一步的,本发明采用薄型加热器,降低了加热装置的重量,进而降低了对工作台的负载需求,由于加热器厚度的降低,加热器热容减小,加热装置加热和冷却的周期缩短,提高了加热效率。Further, the invention adopts a thin heater, which reduces the weight of the heating device, thereby reducing the load demand on the worktable. Due to the decrease of the thickness of the heater, the heat capacity of the heater is reduced, and the heating and cooling cycle of the heating device is shortened. Increased heating efficiency.
附图说明DRAWINGS
图1为现有加热装置的结构示意图;1 is a schematic structural view of a conventional heating device;
图2a为自然放置的吸盘和加热器的结构示意图;Figure 2a is a schematic view showing the structure of a naturally placed suction cup and a heater;
图2b为吸盘和加热器固定后的结构示意图;Figure 2b is a schematic structural view of the suction cup and the heater after being fixed;
图3为本发明实施例一所提供的加热装置的结构示意图;3 is a schematic structural view of a heating device according to Embodiment 1 of the present invention;
图4为本发明实施例一和实施例二所提供的柔性固定装置的结构示意图;4 is a schematic structural view of a flexible fixing device according to Embodiment 1 and Embodiment 2 of the present invention;
图5为本发明实施例二所提供的加热装置的结构示意图;5 is a schematic structural view of a heating device according to Embodiment 2 of the present invention;
图6为本发明实施例三所提供的加热装置的结构示意图。FIG. 6 is a schematic structural view of a heating device according to Embodiment 3 of the present invention.
具体实施方式Detailed ways
为使本发明的内容更加清楚易懂,以下结合说明书附图,对本发明的内容做进一步说明。当然本发明并不局限于该具体实施例,本领域的技术人员所熟知的一般替换也涵盖在本发明的保护范围内。In order to make the content of the present invention clearer and easier to understand, the contents of the present invention will be further described below in conjunction with the accompanying drawings. Of course, the invention is not limited to the specific embodiment, and general replacements well known to those skilled in the art are also encompassed within the scope of the invention.
其次,本发明利用示意图进行了详细的表述,在详述本发明实例时,为了便于说明,示意图不依照一般比例局部放大,不应对此作为本发明的限定。In the following, the present invention has been described in detail with reference to the accompanying drawings.
实施例一Embodiment 1
请参考图3,其为本发明实施例一所提供的加热装置的结构示意图。如图3所示,所述加热装置包括吸盘32、温度均化层33、加热器34、隔热座35及柔性固定装置36。所述吸盘32实现基底31的承载与吸附,所述加热器34实现所述加热装置的热量输出,根据所述加热器34的种类可选择在所述吸盘32和加热器34之间增加温度均化层33,实现所述吸盘32与所述加热器34之间的均匀传热,所述温度均化层33和加热器34通过所述柔性固定装置36倒挂于所述吸盘32下表面,所述吸盘32通过隔热座35支撑。Please refer to FIG. 3 , which is a schematic structural diagram of a heating device according to Embodiment 1 of the present invention. As shown in FIG. 3, the heating device includes a suction cup 32, a temperature homogenizing layer 33, a heater 34, a heat insulating seat 35, and a flexible fixing device 36. The suction cup 32 realizes the load and adsorption of the substrate 31, the heater 34 realizes the heat output of the heating device, and the temperature between the suction cup 32 and the heater 34 can be selectively increased according to the type of the heater 34. The layer 33 is configured to achieve uniform heat transfer between the chuck 32 and the heater 34. The temperature homogenizing layer 33 and the heater 34 are hung upside down on the lower surface of the chuck 32 by the flexible fixing device 36. The suction cup 32 is supported by the heat insulating seat 35.
图4为所述柔性固定装置36的结构示意图。如图4所示,所述柔性固定装置36包括蝶形弹簧41和台阶螺栓42,所述蝶形弹簧41的一端抵靠在所述台阶螺栓42的台阶上,所述蝶形弹簧41的另一端抵靠在所述吸盘32的下表面。参考图3和图4,所述加热器34和所述温度均化层33通过所述柔性固定装置36倒挂于所述吸盘32下表面,即所述台阶螺栓42固定于所述吸盘32的下表面,所述蝶形弹簧41承载所述加热器34和所述温度均化层33置于所述台阶螺栓42的台阶上。所述加热器34和所述吸盘32的重量比小于1,使所述加热器34倒挂于所述吸盘32时,所述吸盘32自身高度及平面度不受影响。FIG. 4 is a schematic structural view of the flexible fixing device 36. As shown in FIG. 4, the flexible fixing device 36 includes a butterfly spring 41 and a step bolt 42. One end of the butterfly spring 41 abuts against the step of the step bolt 42, and the butterfly spring 41 is further One end abuts against the lower surface of the suction cup 32. Referring to FIGS. 3 and 4, the heater 34 and the temperature homogenizing layer 33 are hung upside down on the lower surface of the suction cup 32 by the flexible fixing device 36, that is, the step bolt 42 is fixed under the suction cup 32. The surface of the butterfly spring 41 carries the heater 34 and the temperature homogenizing layer 33 on the step of the step bolt 42. When the weight ratio of the heater 34 and the suction cup 32 is less than 1, when the heater 34 is hung upside down to the suction cup 32, the height and flatness of the suction cup 32 itself are not affected.
根据所述加热器34的厚度、重量以及所述蝶形弹簧41的压缩量选择所 述台阶螺栓42的台阶高度,使所述台阶螺栓42在拧紧后通过所述蝶形弹簧41给予所述加热器34和所述温度均化层33提供支撑力,进而保证所述加热器34同所述吸盘32的贴合,其中所述支撑力大于所述加热器34、所述温度均化层33和所述蝶形弹簧41的自身重量之和,优选的,所述支撑力为所述加热器34、所述温度均化层33和所述蝶形弹簧41的自身重量之和的一到两倍。Selecting the step height of the step bolt 42 according to the thickness and weight of the heater 34 and the compression amount of the butterfly spring 41, so that the step bolt 42 is given the heating by the butterfly spring 41 after tightening The heater 34 and the temperature homogenizing layer 33 provide a supporting force to ensure the adhesion of the heater 34 to the suction cup 32, wherein the supporting force is greater than the heater 34, the temperature homogenizing layer 33, and The sum of the weights of the butterfly springs 41, preferably, the supporting force is one to two times the sum of the weights of the heater 34, the temperature homogenizing layer 33 and the butterfly spring 41 .
同时,所述蝶形弹簧41形变所需要的力小于所述加热器34受热形变所需要的力,同样,所述蝶形弹簧41形变所需要的力小于所述吸盘32受热形变所需要的力,当所述加热器34进行热量输出时,自身受热形变会使蝶形弹簧41压缩,减小所述加热器34受热形变对所述吸盘32的影响。At the same time, the force required for the deformation of the butterfly spring 41 is smaller than the force required for the heater 34 to be deformed by heat. Similarly, the force required for the deformation of the butterfly spring 41 is smaller than the force required for the heat deformation of the suction cup 32. When the heater 34 performs heat output, the self-heat deformation causes the butterfly spring 41 to compress, reducing the influence of the heat deformation of the heater 34 on the suction cup 32.
本实施例中所述加热装置中所述加热器32可为厚型加热器或薄型加热器,优选为薄型加热器,例如厚度为3mm左右的薄型加热器,相比于现有的厚型加热器,薄型加热器自身重量都大幅降低,进而降低了所述加热装置的重量,降低了对工作台的负载要求,同时由于所述加热器32厚度的降低,其自身热容减小,降低了所述加热器32自身加热的能量消耗,使所述加热装置加热和冷却的周期缩短,提高了加热效率。In the heating device of the embodiment, the heater 32 may be a thick heater or a thin heater, preferably a thin heater, for example, a thin heater having a thickness of about 3 mm, compared to the existing thick heating. The weight of the thin heater itself is greatly reduced, thereby reducing the weight of the heating device, reducing the load requirement on the table, and reducing the heat capacity of the heater 32 due to the decrease in the thickness of the heater 32. The energy consumption of the heating of the heater 32 itself shortens the cycle of heating and cooling of the heating device, and improves the heating efficiency.
本实施例中所述吸盘32的材质优选为TA12(钛合金)材料,相比现有技术中吸盘所采用的高温合金或不锈钢材料,TA12材料的高温性能更优良,减小所述吸盘32在高温时的形变量,使所述吸盘32的总厚度在整个加热过程中控制在8mm以下,同时由于TA12材料的密度约为钢材料的一半,减小TA12材料制成的所述吸盘32的自身重量,进一步降低了对工作台的负载要求。The material of the suction cup 32 in the embodiment is preferably TA12 (titanium alloy) material, and the high temperature performance of the TA12 material is better than that of the high temperature alloy or stainless steel material used in the prior art suction cup, and the suction cup 32 is reduced. The deformation amount at a high temperature causes the total thickness of the suction cup 32 to be controlled to be less than 8 mm throughout the heating process, and since the density of the TA12 material is about half that of the steel material, the suction cup 32 itself made of the TA12 material is reduced. The weight further reduces the load requirements on the workbench.
本发明还提供了一种加热方法,采用以上所述加热装置对所述基底31进行加热,具体如下:The present invention also provides a heating method for heating the substrate 31 by using the heating device described above, as follows:
首先,将所述吸盘32置于所述隔热座35上,所述温度均化层33及所述加热器34通过所述柔性固定装置36倒挂于所述吸盘32的下表面;优选地, 先在所述温度均化层33及所述加热器34中打孔以供蝶形弹簧41的嵌入,其次,调节所述台阶螺栓42进入蝶形弹簧41的深度,使所述加热器34通过所述温度均化层33与所述吸盘32相贴合;然后,通过真空吸附将所述基底31固定在所述吸盘32的上表面;最后,所述加热器34进行热量输出对所述基底31进行加热。First, the suction cup 32 is placed on the heat insulating seat 35, and the temperature homogenizing layer 33 and the heater 34 are hung upside down on the lower surface of the suction cup 32 by the flexible fixing device 36; preferably, First, the temperature homogenization layer 33 and the heater 34 are bored for the insertion of the butterfly spring 41, and secondly, the depth of the step bolt 42 into the butterfly spring 41 is adjusted to pass the heater 34. The temperature homogenizing layer 33 is attached to the suction cup 32; then, the substrate 31 is fixed to the upper surface of the suction cup 32 by vacuum suction; finally, the heater 34 performs heat output to the substrate 31 is heated.
实施例二Embodiment 2
请参考图5,其为本发明实施例二所提供的加热装置的结构示意图。如图5所示,所述加热装置包括吸盘52、温度均化层53、加热器54、固定层55、柔性固定装置56及隔热座57。所述吸盘52实现基底51的承载与吸附,所述加热器54实现所述加热装置的热量输出,根据所述加热器54的种类可选择在所述吸盘52和所述加热器54之间增加温度均化层53,实现所述吸盘52与所述加热器54之间的均匀传热,根据所述加热器54的种类可选择在所述加热器54下表面增加固定层55,实现对所述加热器54的固定,避免所述加热器54由于热量无法迅速传递致使其局部受热而发生翘曲,所述温度均化层53、所述加热器54及所述固定层55通过所述柔性固定装置56倒挂于所述吸盘52下表面,所述吸盘52通过隔热座57支撑。Please refer to FIG. 5 , which is a schematic structural diagram of a heating device according to Embodiment 2 of the present invention. As shown in FIG. 5, the heating device includes a suction cup 52, a temperature homogenizing layer 53, a heater 54, a fixed layer 55, a flexible fixing device 56, and a heat insulating seat 57. The suction cup 52 realizes load and adsorption of the substrate 51, and the heater 54 realizes heat output of the heating device, and can be selectively added between the suction cup 52 and the heater 54 according to the kind of the heater 54. The temperature homogenization layer 53 realizes uniform heat transfer between the suction cup 52 and the heater 54. According to the type of the heater 54, a fixed layer 55 may be added to the lower surface of the heater 54 to realize the opposite. The fixing of the heater 54 prevents the heater 54 from being warped due to the inability of the heat to be transferred quickly, and the temperature homogenizing layer 53, the heater 54, and the fixed layer 55 pass the flexibility. The fixing device 56 is hung upside down on the lower surface of the suction cup 52, and the suction cup 52 is supported by the heat insulating seat 57.
本实施例中所述加热装置中所述加热器54可为薄型加热器,优选为厚度为1mm左右的脆性材质的加热器,例如陶瓷加热器,所述陶瓷加热器加热速度快,如果加热过快,而热量无法迅速传递,会使陶瓷加热器局部受热发生翘曲,为避免此类现象,本实施例在所述加热器54下表面增加一固定层55,用于实现所述陶瓷加热器热量的及时传递。所述固定层55同所述温度均化层53和所述加热器54通过所述柔性固定装置56倒挂于所述吸盘52下表面。In the heating device of the embodiment, the heater 54 may be a thin heater, preferably a brittle material heater having a thickness of about 1 mm, such as a ceramic heater, and the ceramic heater has a high heating speed if heated. If the heat is not transferred quickly, the ceramic heater may be locally heated and warped. To avoid such a phenomenon, in this embodiment, a fixed layer 55 is added on the lower surface of the heater 54 for realizing the ceramic heater. Timely delivery of heat. The fixing layer 55 and the temperature homogenizing layer 53 and the heater 54 are hung upside down on the lower surface of the suction cup 52 through the flexible fixing device 56.
同实施例一中一样,本实施例中所述加热器54和所述吸盘52的重量比小于1,所述吸盘52的材质优选为高温性能良好的TA12材料,所述柔性固定装置56包括蝶形弹簧41和台阶螺栓42,所述台阶螺栓42的负荷大于所述 加热器54、所述温度均化层53、所述固定层55和所述蝶形弹簧41的自身重量之和。As in the first embodiment, the weight ratio of the heater 54 and the suction cup 52 in the embodiment is less than 1. The material of the suction cup 52 is preferably TA12 material with good high temperature performance, and the flexible fixing device 56 includes a butterfly. The spring 41 and the step bolt 42 have a load greater than the sum of the heater 54, the temperature homogenizing layer 53, the fixed layer 55, and the butterfly spring 41.
本发明还提供了一种加热方法,采用以上所述加热装置对所述基底51进行加热,具体如下:The present invention also provides a heating method for heating the substrate 51 by using the heating device described above, as follows:
首先,将所述吸盘52置于所述隔热座57上,所述温度均化层53、所述加热器54及所述固定层55通过所述柔性固定装置56倒挂于所述吸盘52的下表面;优选地,先在所述温度均化层53及所述加热器54中打孔以供蝶形弹簧41的嵌入,其次,调节所述台阶螺栓42进入蝶形弹簧41的深度,使所述加热器54通过所述温度均化层53与所述吸盘52相贴合,所述固定层55与所述加热器54相贴合;然后,通过真空吸附将所述基底51固定在所述吸盘52的上表面;最后,所述加热器54进行热量输出对所述基底51进行加热。First, the suction cup 52 is placed on the heat insulation seat 57, and the temperature homogenization layer 53, the heater 54 and the fixed layer 55 are hung upside down to the suction cup 52 by the flexible fixing device 56. a lower surface; preferably, a hole is formed in the temperature equalizing layer 53 and the heater 54 for the insertion of the butterfly spring 41, and secondly, the depth of the step bolt 42 into the butterfly spring 41 is adjusted, so that The heater 54 is adhered to the suction cup 52 through the temperature homogenizing layer 53, and the fixing layer 55 is attached to the heater 54; then, the substrate 51 is fixed by vacuum suction. The upper surface of the suction cup 52 is described; finally, the heater 54 performs heat output to heat the substrate 51.
实施例三Embodiment 3
请参考图6,其为本发明实施例三所提供的加热装置的结构示意图。如图6所示,所述加热装置包括吸盘62、加热器63及隔热座64。所述吸盘62实现基底61的承载与吸附,所述加热器63实现所述加热装置的热量输出,加热器63固定在所述吸盘62的下表面,所述吸盘62通过隔热座64支撑。Please refer to FIG. 6 , which is a schematic structural diagram of a heating device according to Embodiment 3 of the present invention. As shown in FIG. 6, the heating device includes a suction cup 62, a heater 63, and a heat insulating seat 64. The suction cup 62 realizes load and adsorption of the substrate 61, the heater 63 realizes heat output of the heating device, and the heater 63 is fixed to the lower surface of the suction cup 62, and the suction cup 62 is supported by the heat insulating seat 64.
本实施例中所述加热装置中所述加热器63可为薄型加热器,优选为厚度为0.2mm左右的柔性材质的加热器,例如聚酰亚胺加热器。所述聚酰亚胺加热器为柔性材质,热膨胀时产生的形变不会影响所述吸盘62的平面度,故不需要采用柔性固定装置进行固定。In the heating device of the present embodiment, the heater 63 may be a thin heater, preferably a flexible material heater having a thickness of about 0.2 mm, such as a polyimide heater. The polyimide heater is a flexible material, and the deformation generated during thermal expansion does not affect the flatness of the suction cup 62, so that it is not required to be fixed by a flexible fixing device.
同上述实施例,本实施例中所述加热器63和所述吸盘62的重量比小于1,所述吸盘62的材质优选高温性能良好的为TA12材料。With the above embodiment, in the present embodiment, the weight ratio of the heater 63 and the suction cup 62 is less than 1, and the material of the suction cup 62 is preferably TA12 material with good high temperature performance.
本发明还提供了一种加热方法,采用以上所述加热装置对所述基底61进行加热,具体如下:The present invention also provides a heating method for heating the substrate 61 by the heating device described above, as follows:
首先,将所述吸盘62置于所述隔热座64上,加热器63固定在所述吸盘 62的下表面;然后,通过真空吸附将所述基底61固定在所述吸盘62的上表面;最后,所述加热器63进行热量输出对所述基底61进行加热。First, the suction cup 62 is placed on the heat insulating seat 64, and a heater 63 is fixed on the lower surface of the suction cup 62; then, the substrate 61 is fixed to the upper surface of the suction cup 62 by vacuum suction; Finally, the heater 63 performs heat output to heat the substrate 61.
综上所述,本发明直接将吸盘固定在隔热座上,通过柔性固定装置将薄型加热器倒挂于吸盘下表面,加热器和吸盘受热形变产生的力轴向向下传递,减小了加热器在加热过程中自身形变对基底的高度及平面度的影响。在加热器与吸盘之间增加温度均化层,实现加热器和吸盘之间的均匀传热,在加热器下表面增加固定层,避免加热器由于热量无法迅速传递致使其局部受热而发生翘曲。同时本发明采用薄型加热器,降低了加热装置的重量,进而降低了对工作台的负载需求,由于加热器厚度的降低,加热器热容减小,加热装置加热和冷却的周期缩短,提高了加热效率。In summary, the present invention directly fixes the suction cup on the heat insulating seat, and the thin heater is hung upside down on the lower surface of the suction cup by the flexible fixing device, and the force generated by the heat deformation of the heater and the suction cup is axially transmitted downward, thereby reducing the heating. The effect of the deformation of the device on the height and flatness of the substrate during heating. A temperature homogenizing layer is added between the heater and the suction cup to achieve uniform heat transfer between the heater and the suction cup, and a fixed layer is added on the lower surface of the heater to prevent the heater from being warped due to the inability of the heat to be transferred quickly. . At the same time, the invention adopts a thin heater, which reduces the weight of the heating device, thereby reducing the load demand on the worktable. Due to the reduction of the thickness of the heater, the heat capacity of the heater is reduced, and the heating and cooling cycle of the heating device is shortened, thereby improving Heating efficiency.
上述仅为本发明的优选实施例而已,并不对本发明起到任何限制作用。任何所属技术领域的技术人员,在不脱离本发明的技术方案的范围内,对本发明揭露的技术方案和技术内容做任何形式的等同替换或修改等变动,均属未脱离本发明的技术方案的内容,仍属于本发明的保护范围之内。The above is only a preferred embodiment of the present invention and does not impose any limitation on the present invention. Any changes in the technical solutions and technical contents disclosed in the present invention may be made by those skilled in the art without departing from the technical scope of the present invention. The content is still within the scope of protection of the present invention.

Claims (14)

  1. 一种加热装置,其特征在于,包括:加热器、吸盘及隔热座,A heating device comprising: a heater, a suction cup and an insulated seat,
    所述吸盘直接固定在所述隔热座上,所述隔热座支撑所述吸盘的下表面的边缘;The suction cup is directly fixed on the heat insulation seat, and the heat insulation seat supports an edge of a lower surface of the suction cup;
    所述加热器连接至所述吸盘的所述下表面以及且位于所述隔热座的内侧。The heater is coupled to the lower surface of the suction cup and to the inside of the insulated seat.
  2. 根据权利要求1所述的加热装置,其特征在于,所述加热器为薄型加热器。The heating apparatus according to claim 1, wherein said heater is a thin heater.
  3. 根据权利要求1所述的加热装置,其特征在于,所述加热器和所述吸盘的重量比小于1。The heating device according to claim 1, wherein the weight ratio of the heater to the suction cup is less than one.
  4. 根据权利要求1所述的加热装置,其特征在于,所述加热器与所述吸盘的所述下表面相贴合。The heating apparatus according to claim 1, wherein said heater is in contact with said lower surface of said suction cup.
  5. 根据权利要求1所述的加热装置,其特征在于,还包括柔性固定装置,所述加热器通过所述柔性固定装置固定在所述吸盘的所述下表面。The heating apparatus according to claim 1, further comprising a flexible fixing means, said heater being fixed to said lower surface of said suction cup by said flexible fixing means.
  6. 根据权利要求5所述的加热装置,其特征在于,所述柔性固定装置包括蝶形弹簧和台阶螺栓,所述蝶形弹簧的一端抵靠在所述台阶螺栓的台阶上。The heating apparatus according to claim 5, wherein said flexible fixing means comprises a butterfly spring and a step bolt, and one end of said disc spring abuts against a step of said step bolt.
  7. 根据权利要求6所述的加热装置,其特征在于,所述台阶螺栓的台阶高度由所述加热器的厚度、重量及所述蝶形弹簧的压缩量决定。The heating apparatus according to claim 6, wherein a step height of said step bolt is determined by a thickness and a weight of said heater and a compression amount of said butterfly spring.
  8. 根据权利要求6所述的加热装置,其特征在于,所述蝶形弹簧形变所需要的力小于所述吸盘受热形变所需要的力,且所述蝶形弹簧形变所需要的力小于所述加热器受热形变所需要的力。A heating apparatus according to claim 6, wherein a force required for deformation of said butterfly spring is smaller than a force required for deformation of said suction cup, and a force required for said deformation of said butterfly spring is smaller than said heating The force required to deform the heat.
  9. 根据权利要求6所述的加热装置,其特征在于,还包括温度均化层,所述温度均化层位于所述加热器和所述吸盘之间,用于使所述加热器和所述吸盘之间实现均匀热传递。A heating apparatus according to claim 6, further comprising a temperature homogenizing layer between said heater and said suction cup for causing said heater and said suction cup Achieve uniform heat transfer between.
  10. 根据权利要求9所述的加热装置,其特征在于,还包括固定层,所述固定层通过所述柔性固定装置固定于所述加热器的下表面。The heating apparatus according to claim 9, further comprising a fixing layer fixed to a lower surface of said heater by said flexible fixing means.
  11. 根据权利要求10所述的加热装置,其特征在于,所述台阶螺栓的负荷大于所述加热器、所述温度均化层、所述固定层和所述蝶形弹簧的自身重量之和。The heating apparatus according to claim 10, wherein said step bolt has a load greater than a sum of said heater, said temperature homogenizing layer, said fixed layer, and said butterfly spring.
  12. 根据权利要求1-11中任一项所述的加热装置,其特征在于,所述吸盘的材料为钛合金。The heating device according to any one of claims 1 to 11, characterized in that the material of the suction cup is a titanium alloy.
  13. 根据权利要求1-11中任一项所述的加热装置,其特征在于,所述吸盘的总厚度在加热过程中控制在8mm以内。Heating device according to any one of claims 1-11, characterized in that the total thickness of the suction cup is controlled within 8 mm during the heating process.
  14. 一种加热方法,采用如权利要求1-13中任一项所述的加热装置对基底进行加热,其特征在于,包括:A heating method for heating a substrate by using the heating device according to any one of claims 1 to 13, characterized in that it comprises:
    将所述基底固定在所述吸盘的上表面;Fixing the substrate on an upper surface of the suction cup;
    对所述基底进行加热。The substrate is heated.
PCT/CN2018/118260 2017-11-30 2018-11-29 Heating device and heating method WO2019105422A1 (en)

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