WO2019100485A1 - 彩膜基板、显示面板及彩膜基板的制备方法 - Google Patents

彩膜基板、显示面板及彩膜基板的制备方法 Download PDF

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Publication number
WO2019100485A1
WO2019100485A1 PCT/CN2017/117304 CN2017117304W WO2019100485A1 WO 2019100485 A1 WO2019100485 A1 WO 2019100485A1 CN 2017117304 W CN2017117304 W CN 2017117304W WO 2019100485 A1 WO2019100485 A1 WO 2019100485A1
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Prior art keywords
substrate
glass substrate
retaining wall
color film
color filter
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PCT/CN2017/117304
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English (en)
French (fr)
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王添鸿
陈书志
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深圳市华星光电半导体显示技术有限公司
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Application filed by 深圳市华星光电半导体显示技术有限公司 filed Critical 深圳市华星光电半导体显示技术有限公司
Priority to US15/744,750 priority Critical patent/US10558075B2/en
Publication of WO2019100485A1 publication Critical patent/WO2019100485A1/zh

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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters

Definitions

  • the present invention relates to the field of liquid crystal displays, and in particular, to a method for preparing a color film substrate, a display panel, and a color film substrate.
  • LCDs liquid crystal displays
  • LCDs liquid crystal displays
  • notebooks because of their high image quality, power saving, thin body and wide application range.
  • each sub-pixel has a thin film transistor (TFT) whose gate is connected to a horizontal scanning line, a source is connected to a vertical data line, and a drain is connected to a drain.
  • TFT thin film transistor
  • Applying a sufficient voltage on the horizontal scanning line causes all the TFTs on the horizontal scanning line to be turned on.
  • the pixel electrodes on the horizontal scanning line are connected to the data lines in the vertical direction, thereby connecting the data lines.
  • the display signal voltage is written into the pixel, and the transmittance of different liquid crystals is controlled to achieve the effect of controlling the color.
  • the liquid crystal display panel is composed of a CF (color film) substrate, a TFT (thin film transistor) substrate, a liquid crystal material sandwiched between the CF substrate and the TFT substrate, and a sealant (Sealant), and the molding process generally includes: an array of front segments (Array) Process (film, yellow light, etching and stripping), middle cell (Cell) process (TFT substrate and CF substrate bonding) and rear module (Module) process (drive circuit (IC) and printed circuit board) ).
  • Array array of front segments
  • Cell middle cell
  • Module drive circuit
  • IC printed circuit board
  • the front-end array process mainly forms a TFT substrate to control the movement of liquid crystal molecules;
  • the middle-stage forming process mainly adds liquid crystal between the TFT substrate and the CF substrate;
  • the latter module process is mainly the driving circuit pressing and printing circuit
  • the integration of the plates drives the liquid crystal molecules to rotate and display images.
  • LCD screens use COA (on-array color film) and POA (on-array spacers) technology, and RGB filters and photoresist spacers (PS) are made.
  • COA on-array color film
  • POA on-array spacers
  • PS photoresist spacers
  • the PI alignment film on the CF substrate cannot control the coating accuracy, in order to avoid the display area.
  • the uneven thickness of the PI film on the CF substrate causes unevenness of the screen. Therefore, in general, the PI alignment film on the CF substrate exceeds the position of the sealant used as the sealant to cover the CF substrate. This also causes the water vapor to easily enter the inside of the panel through the PI alignment film on the CF substrate, resulting in shortened device life of the panel or corrosion of the internal wiring of the panel, which causes the panel to display abnormality.
  • Another object of the present invention is to provide a display panel that controls the boundary of the CF side alignment film.
  • the present invention provides a color filter substrate including a first glass substrate and a retaining wall formed on a surface of the first glass substrate facing the array substrate, the retaining wall being the first glass substrate itself The surface of the raised structure, the retaining wall is located in the non-display area.
  • the retaining wall comprises a first retaining wall and a second retaining wall which are spaced apart.
  • the first retaining wall and the second retaining wall respectively surround the center of the first glass substrate in a closed shape.
  • first retaining wall and the second retaining wall are rectangular.
  • the present invention provides a display panel comprising a color film substrate and an array substrate, the color film substrate comprising: a first glass substrate, and a surface formed on the surface of the first glass substrate facing the array substrate
  • the retaining wall is a surface convex structure of the first glass substrate itself, the retaining wall is located in a non-display area, and the display panel is a display panel prepared by an array color film process.
  • the present invention provides a method for preparing a color filter substrate, comprising:
  • Step 1 providing a first glass substrate
  • Step 2 applying a shielding layer on the first glass substrate
  • Step 3 etching the first glass substrate by using an etchant, etching the first glass substrate not blocked by the shielding layer to obtain a retaining wall;
  • Step 4 Remove the occlusion layer.
  • the shielding layer is a sealant.
  • the shielding layer includes a first shielding layer and a second shielding layer disposed at intervals, and the retaining wall includes a first retaining wall and a second retaining wall.
  • the first retaining wall and the second retaining wall respectively surround the center of the first glass substrate in a closed shape.
  • the etchant is hydrogen fluoride.
  • the color film substrate, the display panel and the color film substrate of the present invention are prepared by using the CF side glass substrate itself as an alignment film retaining wall design, and the boundary of the CF side alignment film can be arbitrarily controlled to prevent water vapor from passing through the CF side alignment.
  • the film enters the inside of the panel causing corrosion of the line.
  • FIG. 1 is a schematic view showing a process of a preferred embodiment of a method for preparing a color filter substrate according to the present invention
  • FIG. 2 is a schematic cross-sectional view showing a preferred embodiment of the color filter substrate of the present invention
  • FIG 3 is a schematic view showing the process flow of an LCD containing the color filter substrate of the present invention.
  • FIG. 1 is a schematic diagram of a process of a preferred embodiment of a method for fabricating a color filter substrate according to the present invention
  • the left side view and the right side view respectively show the process process from different angles.
  • the preparation method of the color film substrate mainly comprises:
  • Step 1 providing a first glass substrate 1, that is, providing a CF side glass substrate;
  • Step 2 coating the shielding layer 2 on the first glass substrate 1;
  • the area of the shielding layer 2 corresponds to the retaining wall to be prepared; the shielding layer 2 may be a sealant, that is, a sealant; on the first glass substrate 1, a sealant is applied according to the shape and position of the retaining wall to be prepared (ie, the frame) Glue), the frame glue selects the material which can not be corroded by the etchant, the glue application area depends on the position of the desired CF side alignment film, and the alignment film may be a polyimide film (PI) film;
  • PI polyimide film
  • Step 3 etching the first glass substrate 1 with an etchant, etching the first glass substrate 1 not blocked by the shielding layer 2, and obtaining a retaining wall;
  • the etchant is used to etch the CF side glass substrate, the etchant can select hydrogen fluoride, and the area coated with the sealant blocks the hydrogen fluoride etching, and the height of the first glass substrate 1 before etching is H;
  • Step 4 removing the shielding layer
  • the sealant is removed to form an alignment film retaining wall structure, that is, the first retaining wall 3 and the second retaining wall 4.
  • the first glass substrate 1 has a height of H-L, and the first retaining wall 3 and the second retaining wall 4 are at a height L.
  • the retaining wall to be prepared includes a first retaining wall 3 and a second retaining wall 4 respectively surrounding the first glass substrate 1 in a closed shape, and the first retaining wall 3 and the second retaining wall 4 Can be a rectangle.
  • the shielding layer 2 includes a first shielding layer and a second shielding layer disposed at intervals, so that the corresponding formed retaining wall includes the first retaining wall 3 and the second retaining wall 4.
  • the color filter substrate of the present invention and the display panel comprising the color filter substrate of the present invention can be prepared.
  • FIG. 2 is a schematic cross-sectional view of a color filter substrate according to a preferred embodiment of the present invention.
  • FIG. 2 further includes related color film substrate and array substrate structure.
  • the color filter substrate of the present invention mainly includes: a first glass substrate (ie, a CF side glass substrate) 10, and a block formed on a surface of the first glass substrate 10 facing the second glass substrate (ie, the TFT side glass substrate) 20.
  • the wall in the preferred embodiment, includes a first retaining wall 11 and a second retaining wall 12, the first retaining wall 11 and the second retaining wall 12 being a surface convex structure of the first glass substrate 10 itself, first The retaining wall 11 and the second retaining wall 12 may be located in the non-display area.
  • first retaining wall 11 and the second retaining wall 12 are spaced apart to surround the center of the first glass substrate 10 in a closed shape; the first retaining wall 11 and the second retaining wall 12 may be It is a rectangle.
  • a black matrix 13, an indium tin oxide electrode 14, and an alignment film 15 are provided on the surface of the first glass substrate 10.
  • the sealant 30 is used as a sealant between the first glass substrate 10 and the second glass substrate 20 to be relatively opposed.
  • the surface of the second glass substrate 20 is also provided with an alignment film 21, and correspondingly the first and second retaining walls 11 and 12 are also provided with alignment film walls 22 and 23.
  • the positions of the first retaining wall 11 and the second retaining wall 12 of the present invention may be adjusted as appropriate; when the alignment liquid is applied between the first retaining wall 11 and the second retaining wall 12, the function of the first retaining wall 11 is The alignment liquid is prevented from flowing to the outside of the sealant 30, and the action of the second retaining wall 12 prevents the alignment liquid from flowing to the effective display area (AA).
  • the invention utilizes the CF side substrate glass itself to make the alignment film retaining wall, and is suitable for the LCD product in which all the alignment films adopt the injection process.
  • the boundary of the CF side alignment film can be arbitrarily controlled to prevent water vapor from entering the panel through the CF side alignment film, causing corrosion of the line, and preventing leakage of the alignment liquid to cause light leakage on the screen.
  • FIG. 3 it is a schematic diagram of a process flow of an LCD containing the color filter substrate of the present invention. Since the invention utilizes the CF side substrate glass itself to fabricate the alignment film retaining wall, it can be combined with various existing LCD process flows, and only the step of fabricating the alignment film retaining wall in the CF substrate side process can be added.
  • the process flow of the entire display panel is illustrated from two aspects of a TFT substrate side process (COA) and a CF substrate side process (COA), and the display panel is prepared by an array color film process.
  • COA TFT substrate side process
  • COA CF substrate side process
  • TFT substrate side process sequentially preparing a first layer of metal (ie, gate metal), a gate insulating layer (GI), a second layer of metal (ie, source and drain metal), RGB color resistance, and a passivation layer (PV) ), an indium tin oxide (ITO) electrode, an alignment film (PI).
  • first layer of metal ie, gate metal
  • GI gate insulating layer
  • second layer of metal ie, source and drain metal
  • RGB color resistance ie, source and drain metal
  • PV passivation layer
  • ITO indium tin oxide
  • PI alignment film
  • COA CF substrate side process sequentially perform glass barrier etching to prepare black matrix (BM), indium tin oxide (ITO) electrode, alignment film (PI), and sealant.
  • BM black matrix
  • ITO indium tin oxide
  • PI alignment film
  • a cell process is carried out to bond the TFT substrate and the CF substrate together.
  • the color film substrate, the display panel and the color film substrate of the present invention are prepared by using the CF side glass substrate itself as an alignment film retaining wall design, and the boundary of the CF side alignment film can be arbitrarily controlled to prevent water vapor from passing through the CF side alignment.
  • the film enters the inside of the panel causing corrosion of the line.

Abstract

一种彩膜基板、显示面板及彩膜基板的制备方法。彩膜基板包括：第一玻璃基板（10），以及在第一玻璃基板（10）朝向阵列基板（20）的表面上所形成的挡墙（11，12），挡墙（11，12）为第一玻璃基板（10）自身的表面凸起结构，挡墙（11，12）位于非显示区。还提供了相应的显示面板，以及彩膜基板的制备方法。彩膜基板、显示面板及彩膜基板的制备方法，利用CF侧玻璃基板（10）自身做配向膜（15）挡墙设计，可任意控制CF侧配向膜（15）的边界，防止水气通过CF侧配向膜（15）进入面板内部造成线路腐蚀。

Description

彩膜基板、显示面板及彩膜基板的制备方法 技术领域
本发明涉及液晶显示器领域，尤其涉及一种彩膜基板、显示面板及彩膜基板的制备方法。
背景技术
液晶显示器(Liquid Crystal Display，LCD)等平面显示装置因具有高画质、省电、机身薄及应用范围广等优点，而被广泛的应用于手机、电视、个人数字助理、数字相机、笔记本电脑、台式计算机等各种消费性电子产品，成为显示装置中的主流。
主动式液晶显示器中，每个子像素具有一个薄膜晶体管(TFT)，其栅极(Gate)连接至水平扫描线，源极(Source)连接至垂直方向的数据线，漏极(Drain)则连接至像素电极。在水平扫描线上施加足够的电压，会使得该条水平扫描线上的所有TFT打开，此时该条水平扫描线上的像素电极会与垂直方向上的数据线连通，从而将数据线上的显示信号电压写入像素，控制不同液晶的透光度进而达到控制色彩的效果。
通常液晶显示面板由CF(彩膜)基板、TFT(薄膜晶体管)基板、夹于CF基板与TFT基板之间的液晶材料及密封胶(Sealant)组成，其成型工艺一般包括：前段阵列(Array)制程(薄膜、黄光、蚀刻及剥膜)、中段成盒(Cell)制程(TFT基板与CF基板贴合)及后段模组(Module)制程(驱动电路(IC)与印刷电路板压合)。其中，前段阵列制程主要是形成TFT基板，以便于控制液晶分子的运动；中段成盒制程主要是在TFT基板与CF基板之间添加液晶；后段模组制程主要是驱动电路压合与印刷电路板的整合，进而驱动液晶分子转动，显示图像。
随着曲面屏的市场扩大，液晶屏采用COA(阵列上彩膜)以及POA(阵列上光阻间隔物)的工艺技术越来越广泛，将RGB滤光片以及光阻间隔物(PS)制作在阵列(Array)基板上可以有效的避免大视角色偏以及漏光风险。
然而，若使用了COA以及POA工艺制程，采用注射(inject)工艺来进行PI(聚亚酰胺)配向膜工艺制作的话，CF基板上的PI配向膜就无法控制其涂布精度，为了避免显示区CF基板上PI膜厚不均导致画面不均，因此通常情况下，CF基板上的PI配向膜会超出用作框胶的密封胶(Sealant) 涂布位置，全覆盖CF基板。这也导致了水汽容易通过CF基板上的PI配向膜进入面板内部，导致面板内部器件寿命缩短或面板内部线路发生腐蚀，使得面板显示异常。
发明内容
因此，本发明的目的在于提供一种彩膜基板，控制CF侧配向膜的边界。
本发明的另一目的在于提供一种显示面板，控制CF侧配向膜的边界。
本发明的再一目的在于提供一种彩膜基板的制备方法，制备控制CF侧配向膜的边界的彩膜基板。
为实现上述目的，本发明提供了一种彩膜基板，包括第一玻璃基板，以及在该第一玻璃基板朝向阵列基板的表面上所形成的挡墙，该挡墙为该第一玻璃基板自身的表面凸起结构，所述挡墙位于非显示区。
其中，所述挡墙包括间隔设置的第一挡墙和第二挡墙。
其中，所述第一挡墙和第二挡墙分别呈封闭状环绕该第一玻璃基板的中央。
其中，所述第一挡墙和第二挡墙呈矩形。
为实现上述目的，本发明提供了一种显示面板，包括彩膜基板、阵列基板，所述彩膜基板包括：第一玻璃基板，以及在该第一玻璃基板朝向阵列基板的表面上所形成的挡墙，该挡墙为该第一玻璃基板自身的表面凸起结构，所述挡墙位于非显示区，所述显示面板为采用阵列上彩膜工艺制备的显示面板。
为实现上述目的，本发明提供了一种彩膜基板的制备方法，包括：
步骤1、提供第一玻璃基板；
步骤2、在所述第一玻璃基板上涂布遮挡层；
步骤3、采用蚀刻剂对所述第一玻璃基板进行蚀刻，将未被所述遮挡层遮挡的第一玻璃基板蚀刻掉，得到挡墙；
步骤4、去除遮挡层。
其中，所述遮挡层为框胶。
其中，所述遮挡层包括间隔设置的第一遮挡层和第二遮挡层，所述挡墙包括第一挡墙和第二挡墙。
其中，所述第一挡墙和第二挡墙分别呈封闭状环绕该第一玻璃基板的中央。
其中，所述蚀刻剂为氟化氢。
综上，本发明的彩膜基板、显示面板及彩膜基板的制备方法，利用CF 侧玻璃基板自身做配向膜挡墙设计，可任意控制CF侧配向膜的边界，防止水气通过CF侧配向膜进入面板内部造成线路腐蚀。
附图说明
下面结合附图，通过对本发明的具体实施方式详细描述，将使本发明的技术方案及其他有益效果显而易见。
附图中，
图1为本发明彩膜基板的制备方法一较佳实施例的工艺制程示意图；
图2为本发明彩膜基板一较佳实施例的截面示意图；
图3为含有本发明彩膜基板的LCD的工艺流程示意图。
具体实施方式
参见图1，其为本发明彩膜基板的制备方法一较佳实施例的工艺制程示意图，左侧视图和右侧视图分别从不同角度展示了工艺制程。该彩膜基板的制备方法主要包括：
步骤1、提供第一玻璃基板1，即提供CF侧玻璃基板；
步骤2、在所述第一玻璃基板1上涂布遮挡层2；
所述遮挡层2的区域对应欲制备的挡墙；遮挡层2可以为密封胶，即框胶；在第一玻璃基板1上根据欲制备的挡墙的形状和位置涂布密封胶(即框胶)，框胶选择可不被蚀刻剂腐蚀的材料，涂胶区域视所需CF侧配向膜位置而定，配向膜可以为聚亚酰胺(PI)膜；
步骤3、采用蚀刻剂对所述第一玻璃基板1进行蚀刻，将未被所述遮挡层2遮挡的第一玻璃基板1蚀刻掉，得到挡墙；
使用蚀刻剂对CF侧玻璃基板进行蚀刻，蚀刻剂可选择氟化氢，有用密封胶涂布的区域会阻挡氟化氢蚀刻，蚀刻前第一玻璃基板1高度为H；
步骤4、去除遮挡层；
去除密封胶，形成配向膜挡墙结构，即第一挡墙3和第二挡墙4，蚀刻后第一玻璃基板1高度为H－L，第一挡墙3和第二挡墙4高度为L。
在此较佳实施例中，欲制备的挡墙包括分别呈封闭状环绕该第一玻璃基板1中央的第一挡墙3和第二挡墙4，第一挡墙3和第二挡墙4可以呈矩形。遮挡层2包括间隔设置的第一遮挡层和第二遮挡层，从而所对应形成的挡墙包括第一挡墙3和第二挡墙4。
根据本发明彩膜基板的制备方法，可以制备本发明的彩膜基板及包含本发明彩膜基板的显示面板。
参见图2，其为本发明彩膜基板一较佳实施例的截面示意图，为便于理解本发明，图2中还包括了相关的彩膜基板和阵列基板结构。本发明的彩膜基板主要包括：第一玻璃基板(即CF侧玻璃基板)10，以及在该第一玻璃基板10朝向第二玻璃基板(即TFT侧玻璃基板)20的表面上所形成的挡墙，在此较佳实施例中包括第一挡墙11和第二挡墙12，该第一挡墙11和第二挡墙12为该第一玻璃基板10自身的表面凸起结构，第一挡墙11和第二挡墙12可以位于非显示区。在该较佳实施例中，第一挡墙11和第二挡墙12为间隔设置，可以分别呈封闭状环绕该第一玻璃基板10的中央；第一挡墙11和第二挡墙12可以呈矩形。第一玻璃基板10表面上设有黑色矩阵13，氧化铟锡电极14，以及配向膜15。第一玻璃基板10和第二玻璃基板20之间采用密封胶30作为框胶封装相对在一起。第二玻璃基板20表面也相应设有配向膜21，并且对应于第一挡墙11和第二挡墙12也分别设有配向膜挡墙22和23。
本发明的第一挡墙11和第二挡墙12的位置可视情况做调整；配向液涂布至第一挡墙11和第二挡墙12之间，则第一挡墙11的作用是防止配向液往密封胶30外侧流动，第二挡墙12的作用防止配向液往有效显示区(AA)流动。
本发明利用CF侧基板玻璃自身进行配向膜挡墙制作，适用于所有配向膜采用注射工艺的LCD产品。在注射工艺下可任意控制CF侧配向膜的边界，防止水气通过CF侧配向膜进入面板内部造成线路腐蚀，防止配向液回流导致画面出现漏光。
参见图3，其为含有本发明彩膜基板的LCD的工艺流程示意图。由于本发明是利用CF侧基板玻璃自身进行配向膜挡墙制作，因此可与各种现有LCD工艺流程结合，仅需在CF基板侧制程中加入配向膜挡墙制作的步骤即可。图3中从TFT基板侧制程(COA)和CF基板侧制程(COA)两方面来说明整个显示面板的工艺流程，该显示面板采用阵列上彩膜工艺制备。
TFT基板侧制程(COA)：顺序制备第一层金属(即栅极金属)，栅极绝缘层(GI)，第二层金属(即源漏极金属)，RGB色阻，钝化层(PV)，氧化铟锡(ITO)电极，配向膜(PI)。
CF基板侧制程(COA)：顺序进行玻璃挡墙蚀刻，制备黑色矩阵(BM)，氧化铟锡(ITO)电极，配向膜(PI)，涂密封胶。
进行成盒(Cell)制程，将TFT基板和CF基板贴合到一起。
综上，本发明的彩膜基板、显示面板及彩膜基板的制备方法，利用CF侧玻璃基板自身做配向膜挡墙设计，可任意控制CF侧配向膜的边界，防止 水气通过CF侧配向膜进入面板内部造成线路腐蚀。
以上所述，对于本领域的普通技术人员来说，可以根据本发明的技术方案和技术构思作出其他各种相应的改变和变形，而所有这些改变和变形都应属于本发明后附的权利要求的保护范围。

Claims (10)

  1. 一种彩膜基板，包括第一玻璃基板，以及在该第一玻璃基板朝向阵列基板的表面上所形成的挡墙，该挡墙为该第一玻璃基板自身的表面凸起结构，所述挡墙位于非显示区。
  2. 如权利要求1所述的彩膜基板，其中，所述挡墙包括间隔设置的第一挡墙和第二挡墙。
  3. 如权利要求2所述的彩膜基板，其中，所述第一挡墙和第二挡墙分别呈封闭状环绕该第一玻璃基板的中央。
  4. 如权利要求3所述的彩膜基板，其中，所述第一挡墙和第二挡墙呈矩形。
  5. 一种显示面板，包括彩膜基板、阵列基板，所述彩膜基板包括：第一玻璃基板，以及在该第一玻璃基板朝向阵列基板的表面上所形成的挡墙，该挡墙为该第一玻璃基板自身的表面凸起结构，所述挡墙位于非显示区，所述显示面板为采用阵列上彩膜工艺制备的显示面板。
  6. 一种彩膜基板的制备方法，包括：
    步骤1、提供第一玻璃基板；
    步骤2、在所述第一玻璃基板上涂布遮挡层；
    步骤3、采用蚀刻剂对所述第一玻璃基板进行蚀刻，将未被所述遮挡层遮挡的第一玻璃基板蚀刻掉，得到挡墙；
    步骤4、去除遮挡层。
  7. 如权利要求6所述的彩膜基板的制备方法，其中，所述遮挡层为框胶。
  8. 如权利要求6所述的彩膜基板的制备方法，其中，所述遮挡层包括间隔设置的第一遮挡层和第二遮挡层，所述挡墙包括第一挡墙和第二挡墙。
  9. 如权利要求8所述的彩膜基板的制备方法，其中，所述第一挡墙和第二挡墙分别呈封闭状环绕该第一玻璃基板的中央。
  10. 如权利要求6所述的彩膜基板的制备方法，其中，所述蚀刻剂为氟化氢。
PCT/CN2017/117304 2017-11-22 2017-12-19 彩膜基板、显示面板及彩膜基板的制备方法 WO2019100485A1 (zh)

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Publication number Priority date Publication date Assignee Title
CN109031805A (zh) * 2018-08-22 2018-12-18 惠科股份有限公司 显示面板
CN109273495B (zh) * 2018-09-21 2021-04-20 上海天马有机发光显示技术有限公司 一种oled显示面板及显示装置
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Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005181795A (ja) * 2003-12-22 2005-07-07 Sony Corp 液晶表示装置および液晶表示装置の製造方法
CN102789089A (zh) * 2012-08-10 2012-11-21 京东方科技集团股份有限公司 液晶显示基板及其制作方法、液晶面板和显示装置
CN104865754A (zh) * 2015-06-19 2015-08-26 合肥鑫晟光电科技有限公司 显示面板及其制作方法、显示装置
CN105093705A (zh) * 2015-08-07 2015-11-25 深圳市华星光电技术有限公司 超窄边框显示面板
US20160238866A1 (en) * 2013-08-29 2016-08-18 Sakai Display Products Corporation Liquid Crystal Panel, Liquid Crystal Display Apparatus, and Method of Manufacturing the Liquid Crystal Panel
CN206601549U (zh) * 2017-04-05 2017-10-31 厦门天马微电子有限公司 液晶显示面板及液晶显示装置

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20130235310A1 (en) * 2012-03-06 2013-09-12 Guofu Tang LCD Panel and LCD Device
CN102854669B (zh) * 2012-09-27 2015-01-21 深圳市华星光电技术有限公司 液晶显示面板及其制作方法
CN104950508B (zh) * 2015-06-17 2019-03-26 深圳市华星光电技术有限公司 液晶显示面板

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005181795A (ja) * 2003-12-22 2005-07-07 Sony Corp 液晶表示装置および液晶表示装置の製造方法
CN102789089A (zh) * 2012-08-10 2012-11-21 京东方科技集团股份有限公司 液晶显示基板及其制作方法、液晶面板和显示装置
US20160238866A1 (en) * 2013-08-29 2016-08-18 Sakai Display Products Corporation Liquid Crystal Panel, Liquid Crystal Display Apparatus, and Method of Manufacturing the Liquid Crystal Panel
CN104865754A (zh) * 2015-06-19 2015-08-26 合肥鑫晟光电科技有限公司 显示面板及其制作方法、显示装置
CN105093705A (zh) * 2015-08-07 2015-11-25 深圳市华星光电技术有限公司 超窄边框显示面板
CN206601549U (zh) * 2017-04-05 2017-10-31 厦门天马微电子有限公司 液晶显示面板及液晶显示装置

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