WO2019071846A1 - Panneau d'affichage à cristaux liquides coa et procédé pour sa fabrication - Google Patents

Panneau d'affichage à cristaux liquides coa et procédé pour sa fabrication Download PDF

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Publication number
WO2019071846A1
WO2019071846A1 PCT/CN2017/119123 CN2017119123W WO2019071846A1 WO 2019071846 A1 WO2019071846 A1 WO 2019071846A1 CN 2017119123 W CN2017119123 W CN 2017119123W WO 2019071846 A1 WO2019071846 A1 WO 2019071846A1
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Prior art keywords
color
transparent
substrate
passivation layer
color resisting
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PCT/CN2017/119123
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English (en)
Chinese (zh)
Inventor
石龙强
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深圳市华星光电半导体显示技术有限公司
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Publication of WO2019071846A1 publication Critical patent/WO2019071846A1/fr

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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography

Definitions

  • the present invention relates to the field of display technologies, and in particular, to a COA type liquid crystal display panel and a method of fabricating the same.
  • LCD Liquid crystal display
  • PDA personal digital assistant
  • digital camera computer screen or laptop screen.
  • a liquid crystal display device includes a housing, a liquid crystal panel disposed in the housing, and a backlight module disposed in the housing.
  • the liquid crystal panel is mainly composed of a thin film transistor array (TFT Array) substrate, a color filter (CF) substrate, and a liquid crystal layer (Liquid Crystal Layer) disposed between the two substrates.
  • TFT Array thin film transistor array
  • CF color filter
  • Liquid Crystal Layer Liquid Crystal Layer
  • the CF substrate mainly comprises a color photoresist layer for forming colored light by a color resist unit (R/G/B), a black matrix (BM) for preventing light leakage at the edge of the pixel, and for maintaining the thickness of the box.
  • Photo Spacer (PS) in large-size LCD panels, usually use two or more types of spacers, such as the main spacer on the CF substrate (Main PS), and auxiliary spacers Sub (PS), which acts as a multi-stage buffer to prevent various Mura or bad occurrences.
  • COA Color-filter on Array
  • a color photoresist layer on an array substrate which can effectively solve the problem of light leakage caused by alignment deviation in the process of the liquid crystal display device. Can significantly increase the display aperture ratio.
  • the prior art has proposed a technical solution for designing a PS on a TFT array substrate (PS on Arry, POA), which can continue to reduce the difficulty of the color film substrate side.
  • FIG. 1 a schematic structural diagram of a liquid crystal panel designed for a COA plus POA, including an upper substrate 100 and a lower substrate 200 , wherein the upper substrate 100 includes an upper substrate 110 and is formed on the upper substrate 110 .
  • the lower substrate 200 including a lower substrate 210 and formed on the lower substrate 210 a TFT layer 220, a first passivation layer (PV1) 230 formed on the TFT layer 220, a color photoresist layer 240 disposed on the first passivation layer 230, and a second passivation disposed on the color photoresist layer 240.
  • ITO indium tin oxide
  • the second passivation layer 250 is disposed on the color photoresist layer 240 for preventing color light
  • the resist layer 240 contaminates the liquid crystal, generally silicon nitride (SiNx) of inorganic material, and has a very thin thickness of about 200 nm.
  • SiNx silicon nitride
  • the second passivation layer 250 is required. Replaced with an organic polymer material, and thick, about 4 ⁇ m; the spacer 270 is in the second passivation layer 250 After into, you need to use an additional mask (Mask) is formed by a photolithography process.
  • the object of the present invention is to provide a COA type liquid crystal display panel, wherein the color photoresist layer and the second passivation layer are provided with protrusions which can function as spacers, thereby reducing the process of a spacer and greatly reducing the process. Cost of production.
  • Another object of the present invention is to provide a method for fabricating a COA type liquid crystal display panel, which can act as a spacer by providing protrusions on the color photoresist layer and the second passivation layer, thereby reducing a spacer.
  • the process greatly reduces production costs.
  • the present invention provides a COA type liquid crystal display panel, comprising: a lower substrate; and an upper substrate disposed opposite to the lower substrate;
  • the lower substrate includes a first substrate, a TFT layer disposed on the first substrate, a first passivation layer disposed on the TFT layer, and a first passivation layer disposed on the first passivation layer a color photoresist layer, a second passivation layer disposed on the color photoresist layer, and a pixel electrode disposed on the second passivation layer;
  • a plurality of color resistive protrusions are disposed on the upper surface of the color photoresist layer, and a plurality of first transparent protrusions and a plurality of second transparent protrusions are disposed on the upper surface of the second passivation layer, wherein
  • the plurality of first transparent protrusions respectively correspond to the plurality of color resist protrusions, and each of the first transparent protrusions and the corresponding color resistance protrusions thereof respectively form a main spacer structure, each of the first The two transparent protrusions constitute an auxiliary spacer structure.
  • the color resisting protrusion is formed on the red color resisting unit, the green color resisting unit, or the blue color resisting unit;
  • the red color resisting unit, the green color resisting unit, and the blue color resisting unit are all negative photoresist materials, and the red color resisting unit, the green color resisting unit, or the blue color resisting unit are all manufactured by one exposure and development process.
  • the color resist unit provided with the color resisting protrusion is obtained by one exposure and development by using a halftone mask.
  • the TFT layer includes a plurality of scan lines perpendicular to each other and a plurality of data lines;
  • the first transparent protrusion and the second transparent protrusion are respectively located above the scan line or the data line.
  • the second passivation layer is a positive photoresist material, and the second passivation layer is obtained by one exposure and development using a halftone mask.
  • the upper substrate includes a second substrate, a black matrix disposed on a side of the second substrate facing the lower substrate, and a second substrate disposed on the second substrate and a black matrix facing the lower substrate a common electrode on one side;
  • the first transparent protrusion and the second transparent protrusion are correspondingly located below the black matrix.
  • the invention also provides a method for manufacturing a COA type liquid crystal display panel, comprising the following steps:
  • Step S1 providing a first substrate, forming a TFT layer on the first substrate, and forming a first passivation layer on the TFT layer;
  • Step S2 forming a color photoresist layer on the first passivation layer, wherein a plurality of color resistive bumps are disposed on an upper surface of the color photoresist layer;
  • Step S3 forming a second passivation layer of a transparent organic material on the color photoresist layer, wherein the upper surface of the second passivation layer is provided with a plurality of first transparent protrusions and a plurality of second transparent protrusions
  • the plurality of first transparent protrusions respectively correspond to the plurality of color resist protrusions, and each of the first transparent protrusions and the corresponding color resistance protrusions thereof form a main spacer structure.
  • Each second transparent protrusion constitutes an auxiliary spacer structure;
  • Step S4 depositing and patterning a pixel electrode on the second passivation layer to obtain a lower substrate;
  • step S5 an upper substrate is provided, and the lower substrate and the upper substrate are bonded to each other to obtain a COA liquid crystal display panel.
  • the color photoresist layer formed in the step S2 includes a plurality of color resisting units connected in sequence; the color resisting unit is divided into a red color resisting unit, a green color resisting unit, and a blue color resisting unit;
  • the color resisting protrusion is formed on the red color resisting unit, the green color resisting unit, or the blue color resisting unit;
  • the red color resisting unit, the green color resisting unit, and the blue color resisting unit are all negative photoresist materials, and the red color resisting unit, the green color resisting unit, or the blue color resisting unit are all manufactured by one exposure and development process.
  • the color resisting unit provided with the color resisting protrusion is formed by using a halftone mask, and in the process of exposing and forming the color resisting unit, the color resisting unit is formed correspondingly by using a halftone mask
  • the position of the color resisting protrusion is subjected to full exposure, and half exposure is performed at other positions corresponding to the formation of the color resisting unit.
  • the TFT layer includes a plurality of scan lines perpendicular to each other and a plurality of data lines;
  • the first transparent protrusion and the second transparent protrusion are respectively located above the scan line or the data line.
  • the second passivation layer formed in the step S3 is a positive photoresist material, and the second passivation layer is obtained by one exposure and development by using a halftone mask, and the second passivation layer is formed by exposure.
  • the process of using the halftone mask is not exposed at a position corresponding to the first transparent protrusion and the second transparent protrusion forming the second passivation layer, and is performed at other positions corresponding to the formation of the second passivation layer. exposure.
  • the upper substrate provided in the step S5 includes a second substrate, a black matrix disposed on the second substrate, and a common electrode disposed on the second substrate and the black matrix;
  • the side on which the black matrix and the common electrode are disposed on the upper substrate faces the lower substrate and is bonded to the lower substrate pair; in the obtained COA type liquid crystal display panel, the first transparent protrusion and the first The two transparent protrusions are correspondingly located below the black matrix.
  • the present invention also provides a COA type liquid crystal display panel, comprising a lower substrate, and an upper substrate disposed opposite to the lower substrate;
  • the lower substrate includes a first substrate, a TFT layer disposed on the first substrate, a first passivation layer disposed on the TFT layer, and a first passivation layer disposed on the first passivation layer a color photoresist layer, a second passivation layer disposed on the color photoresist layer, and a pixel electrode disposed on the second passivation layer;
  • a plurality of color resistive protrusions are disposed on the upper surface of the color photoresist layer, and a plurality of first transparent protrusions and a plurality of second transparent protrusions are disposed on the upper surface of the second passivation layer, wherein
  • the plurality of first transparent protrusions respectively correspond to the plurality of color resist protrusions, and each of the first transparent protrusions and the corresponding color resistance protrusions thereof respectively form a main spacer structure, each of the first The two transparent protrusions constitute an auxiliary spacer structure;
  • the color photoresist layer includes a plurality of color resisting units connected in sequence; the color resisting unit is divided into a red color resisting unit, a green color resisting unit, and a blue color resisting unit;
  • the color resisting protrusion is formed on the red color resisting unit, the green color resisting unit, or the blue color resisting unit;
  • the red color resisting unit, the green color resisting unit, and the blue color resisting unit are all negative photoresist materials, and the red color resisting unit, the green color resisting unit, or the blue color resisting unit are all manufactured by one exposure and development process.
  • the color resisting unit provided with the color resisting protrusion is obtained by one exposure and development by using a halftone mask;
  • the TFT layer includes a plurality of scan lines and a plurality of data lines vertically crossing each other;
  • the first transparent protrusion and the second transparent protrusion are respectively located above the scan line or the data line;
  • the second passivation layer is a positive photoresist material, and the second passivation layer is obtained by one exposure and development by using a halftone mask;
  • the upper substrate includes a second substrate, a black matrix disposed on a side of the second substrate facing the lower substrate, and a second substrate and a black matrix disposed on the second substrate a common electrode on one side of the lower substrate;
  • the first transparent protrusion and the second transparent protrusion are correspondingly located below the black matrix.
  • the COA type liquid crystal display panel of the present invention includes a lower substrate and an upper substrate disposed opposite to each other; the lower substrate includes a first substrate, a TFT layer, a first passivation layer, a color photoresist layer, and a first substrate a second passivation layer and a pixel electrode, wherein the color resist layer is provided with a plurality of color resistive protrusions on the upper surface thereof, and the second passivation layer is provided with a plurality of first transparent bumps on the upper surface thereof a second transparent protrusion, wherein the plurality of first transparent protrusions respectively correspond to the plurality of color resist protrusions, and each of the first transparent protrusions and the corresponding color resistance protrusions thereof form a common
  • the main spacer structure, each of the second transparent protrusions constitutes an auxiliary spacer structure, so that no additional spacers are produced, a spacer manufacturing process is reduced, and the production cost is greatly reduced.
  • the method for fabricating a COA type liquid crystal display panel of the present invention has a plurality of first transparent protrusions on the upper surface of the second passivation layer by providing a plurality of color resistive protrusions on the upper surface of the color resist layer of the lower substrate And a plurality of second transparent protrusions, wherein the plurality of first transparent protrusions are respectively located above the plurality of color resist protrusions, so that each of the first transparent protrusions and the corresponding color resistance protrusions thereof are common
  • a main spacer structure is formed, and each of the second transparent protrusions constitutes an auxiliary spacer structure, so that no additional spacers are produced, a spacer manufacturing process is reduced, and the production cost is greatly reduced.
  • FIG. 1 is a schematic structural view of a COA type liquid crystal display panel in the prior art
  • FIG. 2 is a schematic structural view of a COA liquid crystal display panel of the present invention.
  • FIG. 3 is a schematic flow chart of a method for fabricating a COA liquid crystal display panel of the present invention
  • FIG. 4 is a schematic view showing a step S1 of a method for fabricating a COA liquid crystal display panel of the present invention
  • step S2 is a schematic diagram of step S2 of the method for fabricating a COA liquid crystal display panel of the present invention
  • step S3 is a schematic diagram of step S3 of the method for fabricating a COA liquid crystal display panel of the present invention
  • Fig. 7 is a schematic view showing a step S4 of the method for fabricating a COA liquid crystal display panel of the present invention.
  • the present invention provides a COA type liquid crystal display panel, comprising a lower substrate 10, and an upper substrate 20 disposed opposite the lower substrate 10;
  • the lower substrate 10 includes a first substrate 11 , a TFT layer 12 disposed on the first substrate 11 , and a first passivation layer 13 disposed on the TFT layer 12 .
  • the second passivation layer 15 is provided with a plurality of color resistive protrusions 145, and the upper surface of the second passivation layer 15 is provided with a plurality of color resistive protrusions 145.
  • a first transparent protrusion 151 and a plurality of second transparent protrusions 152 wherein the plurality of first transparent protrusions 151 are respectively located above the plurality of color resist protrusions 145, and each of the first transparent protrusions 151
  • the corresponding color resisting protrusions 145 and the underside thereof constitute a main spacer structure, and each of the second transparent protrusions 152 constitutes an auxiliary spacer structure.
  • the second passivation layer 15 has a thickness of 2-6 ⁇ m.
  • the clear height of the first transparent protrusion 151 is equal to the clear height of the second transparent protrusion 152
  • the height of the main spacer structure is equal to the clear height of the color resist protrusion 145 plus the The clear height of the first transparent protrusion 151.
  • the color photoresist layer 14 includes a plurality of color resist units 141 connected in sequence; the color resist unit 141 is divided into a red color resist unit, a green color resist unit, and a blue color resist unit.
  • the color resisting protrusion 145 is formed on the red color resisting unit, the green color resisting unit, or the blue color resisting unit;
  • the red color resisting unit, the green color resisting unit, and the blue color resisting unit are all negative photoresist materials, and the red color resisting unit, the green color resisting unit, or the blue color resisting unit are all exposed by one exposure and A developing process is produced in which the color resist unit 141 provided with the color resisting protrusions 145 is obtained by one exposure and development using a halftone mask.
  • the TFT layer 12 includes a plurality of scan lines perpendicular to each other and a plurality of data lines (not shown), and the adjacent two color resist units 141 of the color resist layer 14 are on the scan lines, Or the intersection of the data lines and a partial overlap;
  • the first transparent protrusion 151 and the second transparent protrusion 152 are respectively located above the scan line or the data line, that is, the main spacer structure and the auxiliary spacer structure are correspondingly located on the scan line. , or above the data line.
  • the second passivation layer 15 is a positive photoresist material, and the second passivation layer 15 is formed by one exposure and development using a halftone mask.
  • the upper substrate 20 includes a second substrate 21, a black matrix 22 disposed on a side of the second substrate 21 facing the lower substrate 10, and a second substrate disposed on the second substrate
  • the black matrix 22 and the black matrix 22 face the common electrode 23 on the side of the lower substrate 10.
  • the first transparent protrusion 151 and the second transparent protrusion 152 are respectively located below the black matrix 22, that is, the main spacer structure and the auxiliary spacer structure are correspondingly located in the black matrix. Below the 22nd.
  • the material of the pixel electrode 16 and the common electrode 23 are both ITO.
  • a plurality of color resistive protrusions 145 are disposed on the upper surface of the color photoresist layer 14, and a plurality of first transparent protrusions 151 are disposed on the upper surface of the second passivation layer 15.
  • each of the second transparent protrusions 152 constitutes an auxiliary spacer structure, thereby eliminating the need for additional spacers, reducing the spacer process and greatly reducing the spacer structure. Production costs.
  • the present invention further provides a method for fabricating a COA type liquid crystal display panel, comprising the following steps:
  • Step S1 as shown in FIG. 4, a first base substrate 11 is provided, a TFT layer 12 is formed on the first base substrate 11, and a first passivation layer 13 is formed on the TFT layer 12.
  • the TFT layer 12 includes a plurality of scanning lines that intersect perpendicularly to each other, and a plurality of data lines (not shown).
  • Step S2 as shown in FIG. 5, a color photoresist layer 14 is formed on the first passivation layer 13, and a plurality of color resistive protrusions 145 are disposed on the upper surface of the color photoresist layer 14.
  • the color photoresist layer 13 formed in the step S2 includes a plurality of color resist units 141 connected in sequence; the color resist unit 141 is divided into a red color resist unit, a green color resist unit, and a blue color resist unit.
  • two adjacent color resisting units 141 of the color resist layer 14 meet above the scan line or the data line and partially overlap; the color resist protrusion 145 is correspondingly disposed on the scan line, Or above the data line.
  • the color resist protrusion 135 may be formed on the red color resist unit or on the green color resist unit or the blue color resist unit.
  • the red color resisting unit, the green color resisting unit, and the blue color resisting unit are all negative photoresist materials, and the red color resisting unit, the green color resisting unit, or the blue color resisting unit are all exposed by one exposure and
  • the developing process is performed, wherein the color resisting unit 141 provided with the color resisting protrusion 145 is formed by using a halftone mask, and in the process of exposing the color resisting unit 141, using a halftone mask The position corresponding to the color resist protrusion 145 forming the color resist unit 141 is fully exposed, and the half exposure is performed at other positions corresponding to the color resist unit 141.
  • Step S3 as shown in FIG. 6, a second passivation layer 15 of transparent organic material is formed on the color photoresist layer 14, and a plurality of first transparent protrusions are disposed on the upper surface of the second passivation layer 15. And a plurality of second transparent protrusions 152, wherein the plurality of first transparent protrusions 151 are respectively located above the plurality of color resist protrusions 145, and each of the first transparent protrusions 151 and the lower portion thereof The color resisting protrusions 145 together form a main spacer structure, and each of the second transparent protrusions 152 constitutes an auxiliary spacer structure.
  • the clear height of the first transparent protrusion 151 is equal to the clear height of the second transparent protrusion 152
  • the height of the main spacer structure is equal to the clear height of the color resist protrusion 145 plus the The clear height of the first transparent protrusion 151.
  • the second passivation layer 15 formed in the step S3 is a positive photoresist material, and the second passivation layer 15 is obtained by one exposure and development by using a halftone mask, and is formed by exposure.
  • the position of the first transparent protrusion 151 and the second transparent protrusion 152 corresponding to the second passivation layer 15 is not exposed by using the halftone mask, and the corresponding The other locations of the second passivation layer 15 are subjected to half exposure.
  • the first transparent protrusion 151 and the second transparent protrusion 152 are respectively located above the scan line or the data line, that is, the main spacer structure and the auxiliary spacer structure are respectively located correspondingly Above the scan line, or data line.
  • Step S4 as shown in FIG. 7, a pixel electrode 16 is deposited and patterned on the second passivation layer 15 to obtain a lower substrate 10.
  • the material of the pixel electrode 16 is ITO.
  • step S5 the upper substrate 20 is provided, and the lower substrate 10 and the upper substrate 20 are bonded to each other to obtain a COA liquid crystal display panel as shown in FIG. 2.
  • the upper substrate 20 provided in the step S5 includes a second substrate 21, a black matrix 22 disposed on the second substrate 21, and a black substrate 21 and a black substrate.
  • the material of the common electrode 23 is ITO.
  • the side of the upper substrate 20 on which the black matrix 22 and the common electrode 23 are disposed faces the lower substrate 10 and is bonded to the lower substrate 10; in the obtained COA type liquid crystal display panel, The first transparent protrusion 151 and the second transparent protrusion 152 are respectively located below the black matrix 22, that is, the main spacer structure and the auxiliary spacer structure are respectively located below the black matrix 22.
  • a plurality of first resists 145 are disposed on the upper surface of the color resist layer 14 of the lower substrate 10, and a plurality of first portions are disposed on the upper surface of the second passivation layer 15.
  • the process greatly reduces production costs.
  • the COA type liquid crystal display panel of the present invention includes oppositely disposed lower and upper substrates; the lower substrate includes a first substrate, a TFT layer, a first passivation layer, a color photoresist layer, and a second a passivation layer and a pixel electrode, wherein a plurality of color resistive protrusions are disposed on an upper surface of the color photoresist layer, and a plurality of first transparent protrusions and a plurality of a second transparent protrusion, wherein the plurality of first transparent protrusions respectively correspond to the plurality of color resist protrusions, and each of the first transparent protrusions and the corresponding color resistance protrusions thereof form a main body
  • the spacer structure, each of the second transparent protrusions constitutes an auxiliary spacer structure, thereby eliminating the need for additional spacer production, reducing a spacer process and greatly reducing production costs.
  • the method for fabricating a COA type liquid crystal display panel of the present invention has a plurality of first transparent protrusions on the upper surface of the second passivation layer by providing a plurality of color resistive protrusions on the upper surface of the color resist layer of the lower substrate And a plurality of second transparent protrusions, wherein the plurality of first transparent protrusions are respectively located above the plurality of color resist protrusions, so that each of the first transparent protrusions and the corresponding color resistance protrusions thereof are common
  • a main spacer structure is formed, and each of the second transparent protrusions constitutes an auxiliary spacer structure, so that no additional spacers are produced, a spacer manufacturing process is reduced, and the production cost is greatly reduced.

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Abstract

L'invention concerne un panneau d'affichage à cristaux liquides avec filtre coloré sur matrice (COA) et un procédé pour sa fabrication. Le panneau d'affichage comporte un substrat inférieur (10) et un substrat supérieur (20) qui sont disposés de façon opposée; le substrat inférieur (10) comporte un premier substrat (11) de base, une couche (12) de transistors à film mince (TFT), une première couche (13) de passivation, une couche (14) de résine photosensible colorée, une seconde couche (15) de passivation et une électrode (16) de pixel; la couche (14) de résine photosensible colorée est surmontée de multiples protubérances colorées (145) de résistance, et la seconde couche (15) de passivation est surmontée de premières protubérances transparentes (151) et de secondes protubérances transparentes (152) multiples; les premières protubérances transparentes (151) sont situées de façon correspondante au-dessus des protubérances colorées (145) de résistance, et les premières protubérances transparentes (151) et les protubérances colorées (145) de résistance sous celles-ci forment conjointement une structure d'entretoise principale, les secondes protubérances transparentes (152) formant une structure d'entretoise auxiliaire, ce qui rend superflue une fabrication supplémentaire d'entretoises.
PCT/CN2017/119123 2017-10-11 2017-12-27 Panneau d'affichage à cristaux liquides coa et procédé pour sa fabrication WO2019071846A1 (fr)

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CN201710943836.9A CN107688254B (zh) 2017-10-11 2017-10-11 Coa型液晶显示面板及其制作方法
CN201710943836.9 2017-10-11

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CN109343265A (zh) * 2018-11-09 2019-02-15 重庆先进光电显示技术研究院 显示面板及其制造方法与显示装置
CN109521614A (zh) * 2018-12-24 2019-03-26 惠科股份有限公司 显示面板、显示装置
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