WO2008041389A1 - Substrat de filtre couleur, dispositif d'affichage à cristaux liquides pourvu du substrat de filtre couleur et procédé de fabrication du substrat de filtre couleur - Google Patents

Substrat de filtre couleur, dispositif d'affichage à cristaux liquides pourvu du substrat de filtre couleur et procédé de fabrication du substrat de filtre couleur Download PDF

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Publication number
WO2008041389A1
WO2008041389A1 PCT/JP2007/060533 JP2007060533W WO2008041389A1 WO 2008041389 A1 WO2008041389 A1 WO 2008041389A1 JP 2007060533 W JP2007060533 W JP 2007060533W WO 2008041389 A1 WO2008041389 A1 WO 2008041389A1
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WIPO (PCT)
Prior art keywords
color filter
colored layer
layer
filter substrate
colored
Prior art date
Application number
PCT/JP2007/060533
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English (en)
Japanese (ja)
Inventor
Kazuyoshi Sakuragi
Shingo Kawashima
Yoshinori Kinai
Toshiyuki Tanaka
Ryuhji Kurihara
Original Assignee
Sharp Kabushiki Kaisha
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Application filed by Sharp Kabushiki Kaisha filed Critical Sharp Kabushiki Kaisha
Publication of WO2008041389A1 publication Critical patent/WO2008041389A1/fr

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/201—Filters in the form of arrays
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G02F1/13394—Gaskets; Spacers; Sealing of cells spacers regularly patterned on the cell subtrate, e.g. walls, pillars

Definitions

  • Color filter substrate liquid crystal display device including the same, and method for manufacturing color filter substrate
  • the present invention relates to a color filter substrate, a liquid crystal display device including the same, and a method for manufacturing the color filter substrate, and more particularly to a color filter substrate on which a photospacer is formed.
  • a liquid crystal display device includes a pair of substrates arranged to face each other and a liquid crystal layer provided between the two substrates.
  • a spacer having a predetermined size is sandwiched between a pair of substrates, so that the distance between the substrates is kept constant, and the thickness of the liquid crystal layer (cell thickness) is defined.
  • Patent Document 1 has a plurality of pixel electrodes, and corresponding to each pixel electrode, color filters of three primary colors are provided on the inner surface of at least one substrate.
  • a color liquid crystal display element in which bead-like spacers are attached only to portions corresponding to color filters of a specific color. According to this, it is described that the substrate interval can be kept constant without being affected by the step of the color filter.
  • a photo spacer formed by patterning a photosensitive resin formed only by a bead-shaped spacer by photolithography is also used. ! RU
  • Patent Document 2 discloses a flat panel display in which a photospacer is a flat surface where a black matrix layer made of resin and at least one color filter layer overlap each other, and is formed on a transparent conductive layer. An electrode plate is disclosed. According to this, it is described that the thickness and shape of the photo spacer are stabilized without excessively reducing the thickness of the photo spacer due to the load in the panel assembling process.
  • Patent Document 3 describes a large load in addition to a photospacer for maintaining the distance between substrates.
  • a liquid crystal display device is disclosed in which an auxiliary photospacer that receives a load in a distributed manner only when a load is applied. According to this, it is described that the load can be shared by the auxiliary photospacer for a large load temporarily applied from the outside, and the irreversible deformation of the photospacer can be prevented.
  • Patent Document 1 Japanese Patent Laid-Open No. 63-104021
  • Patent Document 2 JP 2003-107493 A
  • Patent Document 3 Japanese Patent Laid-Open No. 2002-182220
  • the photo spacer is often formed on a color filter substrate which is one of the pair of substrates.
  • the color filter substrate includes an insulating substrate, a color filter layer provided on the insulating substrate, and a transparent common electrode provided on the color filter layer.
  • the color filter layer is provided in a matrix, and each of the colored layers is colored with, for example, three primary colors of red (R), green (G), or blue (B). And a black matrix provided between them.
  • FIG. 14 to FIG. 18 are schematic cross-sectional views of the substrate in each process when manufacturing a power filter substrate having an RGB colored layer.
  • a black colored photosensitive resin is applied on an insulating substrate 110b such as a glass substrate, and then a black matrix 121 is formed by patterning by photolithography.
  • a photosensitive resin 122 colored in red is applied to the substrate on which the black matrix 121 is formed, and then a pattern is formed by photolithography. As shown in FIG. 15, a red layer 122R is formed at a predetermined position between the black matrices 121.
  • a photosensitive resin 123 colored in green is applied on the substrate on which the red layer 122R is formed, and then a pattern is formed by photolithography. As shown, the green layer 123G is formed at a predetermined position between the black matrices 121.
  • a color filter substrate (130a) is manufactured by forming a photo spacer (129a) by photolithography (see FIG. 18).
  • the surface force of the insulating substrate 110b may vary in the distance to the upper end of each photospacer 129a.
  • the two-dotted line on the upper side of FIG. 18 indicates the upper end of the active matrix substrate 120 which is the other substrate of the pair of substrates.
  • the center photospacer 129a in FIG. 18 is disposed on the end of the green layer 123G formed of the photosensitive resin 123 colored in green.
  • the photosensitive resin 123 is easily thickly applied at the peripheral end portion of the red layer 122R formed in the previous step, as shown in FIG. If the coated photosensitive resin 123 is exposed and developed as it is by photolithography, the green layer 123G may be formed thick at the end on the colored layer 122R side. Then, even if each photospacer 129a is formed at the same height by photolithography, the upper end of each photospacer 129a at the center and the right side in FIG. 18 is the upper end of the left photospacer 129a in FIG.
  • the red layer 122R, the green layer 123G, and the blue layer 124B are formed in separate processes, unlike the formation of the black matrix 121 formed in one process, so that they are exposed and developed by photolithography. Depending on these conditions, the film thickness may vary.
  • the present invention has been made in view of the strong point, and its object is to The purpose is to facilitate control of the cell thickness by aligning the upper end positions of the spacers.
  • the present invention corresponds to a pixel defined by a first colored layer, a second colored layer, and a third colored layer that are colored in different colors from each other.
  • the first colored layer is provided on the pedestal portion formed of the same material in the same layer.
  • a color filter substrate includes a transparent insulating substrate, a first colored layer, a second colored layer, and a second colored layer provided in a matrix on the insulating substrate and colored in different colors.
  • a color filter substrate comprising a plurality of colored layers having colored layers and a photospacer erected with respect to the insulating substrate, wherein the photospacer comprises the first colored layer and the second colored layer.
  • the pixels respectively defined by the colored layer and the third colored layer it is provided on a pedestal formed of the same material in the same layer as the first colored layer.
  • the pedestal portion provided for placing the photo spacer is formed of the same material in the same layer as the first colored layer, the first colored layer, the second colored layer, The height of each pedestal portion provided corresponding to the pixel defined by the colored layer and the third colored layer is constant. Since the height of the photo spacer placed on each pedestal is considered to be constant, the upper end positions of the photo spacers are aligned. Therefore, according to the above configuration, it is possible to easily control the cell thickness by aligning the upper end positions of the photo spacers.
  • Patent Document 1 discloses that a spacer is attached only to a portion corresponding to a colored layer of a specific color corresponding to the first colored layer having the above configuration. It is easily affected by the accuracy of the particle size of the spacer itself, and has a spacer in the portion corresponding to the colored layer other than the specific color corresponding to the second colored layer and the third colored layer of the above configuration. Therefore, it is difficult to control the cell thickness.
  • Patent Document 2 discloses that a photospacer is formed on a flat surface including at least one of the color filter layers corresponding to the colored layer having the above-described configuration. Since the color of the color filter layer on which the pixel is formed is different for each pixel, the cell Thickness control is difficult.
  • the photo spacer and the pedestal may be provided for each of the pixels.
  • a black matrix may be provided between the colored layers.
  • the pixels are shielded from light by the black matrix provided between the colored layers.
  • the photo spacer may be provided so as to overlap the black matrix!
  • the black matrix may be provided on the insulating substrate side of the colored layers.
  • the colored layer is disposed in each opening of the black matrix formed on the insulating substrate.
  • Each colored layer may be colored in a color selected from red, green, and blue.
  • a liquid crystal display device includes an active matrix substrate and a color filter substrate that are arranged to face each other, and a liquid crystal layer provided between the active matrix substrate and the color filter substrate.
  • the color filter substrate includes a transparent insulating substrate, a first colored layer, a second colored layer, and a third colored layer that are provided in a matrix on the insulating substrate and are colored in mutually different colors.
  • the pixel is provided on a pedestal formed of the same material in the same layer as the first colored layer.
  • the pedestal portion provided for placing the photo spacer is formed of the same material in the same layer as the first colored layer, the first colored layer, the second colored layer, The height of each pedestal portion provided corresponding to each pixel defined by the colored layer and the third colored layer is the same. Become constant. Since the height of the photo spacer placed on each pedestal is considered to be constant, the upper end positions of the photo spacers are aligned. Therefore, the upper end of each photo spacer can be brought into contact with the surface of the active matrix substrate, so that the thickness (cell thickness) of the liquid crystal layer provided between the active matrix substrate and the color filter substrate can be controlled. It becomes easy. Therefore, according to the above configuration, it is possible to easily control the cell thickness by aligning the upper end positions of the photo spacers.
  • the method for manufacturing a color filter substrate according to the present invention includes a transparent insulating substrate, a first colored layer provided in a matrix on the insulating substrate, and colored in mutually different colors, and a second colored layer.
  • a method of manufacturing a color filter substrate comprising a plurality of colored layers having a layer and a third colored layer and a photospacer erected with respect to the insulating substrate, wherein the insulating substrate is photosensitive. By applying a resin and patterning the photosensitive resin, it corresponds to the pixels defined by the first colored layer and the first colored layer, the second colored layer, and the third colored layer, respectively.
  • a first colored layer forming step for forming a pedestal for mounting the photo spacer, and applying a photosensitive resin to the insulating substrate on which the first colored layer and the pedestal are formed.
  • the second colored layer Forming a second colored layer, and applying a photosensitive resin to the insulating substrate on which the second colored layer is formed, and patterning the photosensitive resin to form a third colored layer.
  • Forming a third colored layer applying a photosensitive resin to the insulating substrate on which the third colored layer is formed, and patterning the photosensitive resin, whereby a photospacer is formed on the pedestal. And a photospacer forming step.
  • the pedestal for placing the photo spacer is formed of the same material in the same layer as the first colored layer.
  • each pedestal provided corresponding to each pixel defined by the 2 colored layer and the 3rd colored layer is constant.
  • the photospacers placed on the pedestals are considered to be formed at a constant height, so that the upper end positions of the photospacers are aligned. Therefore, according to the above method, it is possible to easily control the cell thickness by aligning the upper end positions of the photo spacers.
  • the photospacer has a first colored layer corresponding to the pixels respectively defined by the first colored layer, the second colored layer, and the third colored layer that are colored in different colors. Since it is provided on a pedestal formed of the same material as the same layer, the upper end position of the photospacer can be aligned to facilitate control of the cell thickness.
  • FIG. 1 is a schematic plan view of a color filter substrate 30a according to Embodiment 1.
  • FIG. 2 is a schematic cross-sectional view of a color filter substrate 30a and a liquid crystal display device 50 including the color filter substrate 30a taken along line II-II in FIG.
  • FIG. 3 is a schematic plan view of an active matrix substrate 20 constituting a liquid crystal display device 50.
  • FIG. 3 is a schematic plan view of an active matrix substrate 20 constituting a liquid crystal display device 50.
  • FIG. 4 is a schematic cross-sectional view of the active matrix substrate 20 taken along the line IV-IV in FIG.
  • FIG. 5 is a schematic top view of the photospacer 29.
  • FIG. 5 is a schematic top view of the photospacer 29.
  • FIG. 6 is a schematic sectional view of the photospacer 29 taken along the line VI-VI in FIG.
  • FIG. 7 is a schematic plan view of a color filter substrate 30b according to Embodiment 2.
  • FIG. 8 is a schematic plan view of a color filter substrate 30c according to Embodiment 3.
  • FIG. 9 is a schematic cross-sectional view of a color filter substrate 30d according to Embodiment 4.
  • FIG. 10 is a schematic top view of a photospacer 129a.
  • FIG. 11 is a schematic sectional view of the photospacer 129a along the line XI-XI in FIG.
  • FIG. 12 is a schematic top view of a photospacer 129b.
  • FIG. 13 is a schematic cross-sectional view of a photospacer 129b taken along line XIII—XIII in FIG.
  • FIG. 14 is a schematic cross-sectional view of a substrate coated with a photosensitive resin 122 colored red by a conventional method for producing a color filter substrate.
  • FIG. 15 is a schematic cross-sectional view of a substrate on which a red layer 122R is formed by a conventional method for manufacturing a color filter substrate.
  • FIG. 16 is a schematic view of a photosensitive color colored in green by a conventional color filter substrate manufacturing method. It is a cross-sectional schematic diagram of the board
  • FIG. 17 is a schematic cross-sectional view of a substrate on which a green layer 123G is formed by a conventional color filter substrate manufacturing method.
  • FIG. 18 is a cross-sectional view of a color filter substrate 130a manufactured by a conventional manufacturing method.
  • FIG. 19 is a cross-sectional view of a color filter substrate 130b of a comparative example.
  • FIG. 1 is a schematic plan view showing a color filter substrate 30a constituting the liquid crystal display device 50 according to the present embodiment.
  • FIG. 2 is a schematic cross-sectional view showing the liquid crystal display device 50 according to the present embodiment along the line II-II in FIG. 3 is a schematic plan view showing the active matrix substrate 20 constituting the liquid crystal display device 50, and
  • FIG. 4 is a schematic cross-sectional view of the active matrix substrate 20 taken along line IV-IV in FIG. It is.
  • FIG. 1 is a schematic plan view showing a color filter substrate 30a constituting the liquid crystal display device 50 according to the present embodiment.
  • FIG. 2 is a schematic cross-sectional view showing the liquid crystal display device 50 according to the present embodiment along the line II-II in FIG. 3 is a schematic plan view showing the active matrix substrate 20 constituting the liquid crystal display device 50
  • FIG. 4 is a schematic cross-sectional view of the active matrix substrate 20 taken along line IV-IV in FIG. It is.
  • FIG. 1 is a schematic plan
  • a gate line 12a and a capacitor line, which will be described later, on the active matrix substrate 20 are divided so that the positional relationship between each component on the color filter substrate 30a and each component on the active matrix substrate 20 is divided.
  • 12b and source line 15 are shown as imaginary lines (two-dot chain lines), respectively.
  • the liquid crystal display device 50 is provided between the active matrix substrate 20 and the color filter substrate 30a, and the active matrix substrate 20 and the color filter substrate 30a, which are disposed to face each other. And a liquid crystal layer 40.
  • the active matrix substrate 20 includes a plurality of gate lines 12a provided so as to extend in parallel to each other in the horizontal direction in the figure, and each gate line 12a in the vertical direction in the figure.
  • a plurality of source lines 15 provided so as to extend in parallel to each other in an orthogonal direction, thin film transistors (TFT) 5 provided at respective intersections of the gate lines 12a and the source lines 15, and gate lines 12a
  • TFT thin film transistors
  • a capacitor line 12b provided between the pair of adjacent gate lines 12a and a pair of source lines 15, and a pixel electrode 18 provided corresponding to each TFT 5 in a region surrounded by the pair of adjacent source lines 15.
  • each pixel electrode 18 constitutes a pixel P that is the minimum unit of an image, and the display area is configured by arranging these pixels P in a matrix! RU
  • the TFT 5 includes a gate electrode 12a a provided on the insulating substrate 10a, a gate insulating film 13 provided to cover the gate electrode 12aa, and a gate insulating film 13
  • the semiconductor layer 14 provided in an island shape at a position corresponding to the gate electrode 12aa above, and the source electrode 15a and the drain electrode 15b provided so as to face each other on the semiconductor layer 14 are provided.
  • the gate electrode 12aa is a portion protruding to the side of the gate line 12a
  • the source electrode 15a is a portion protruding to the side of the source line 15.
  • the drain electrode 15b is connected to the pixel electrode 18 through a contact hole 17a formed in the laminated film of the protective insulating film 16 and the interlayer insulating film 17, and the capacitor line 12b at the center of the pixel P is disposed.
  • the capacitor electrode is formed by extending to the region. This capacitor electrode consists of the capacitor line 12b and the gate An auxiliary capacitor is formed together with the insulating film 13.
  • the active matrix 20 has a multilayer laminated structure in which a base coat film 11, a gate insulating film 13, a protective insulating film 16, and an interlayer insulating film 17 are sequentially laminated on an insulating substrate 10a.
  • a gate line 12a, a gate electrode 12aa, and a capacitor line 12b are provided.
  • a semiconductor layer 14 and each source line 15, a source electrode 15a, and a drain electrode 15b disposed above the semiconductor layer 14 are provided. .
  • Pixel electrodes 18 are provided in a matrix on the upper layer of the laminated film of the protective insulating film 16 and the interlayer insulating film 17.
  • the color filter substrate 30a includes an insulating substrate 10b, a black matrix 21 provided in a substantially lattice shape on the insulating substrate 10b, and a black matrix 21 in each opening of the black matrix 21.
  • Red layer 22R, green layer 23G and blue layer 24B provided as colored layer, second colored layer and third colored layer, pedestal portions 22RG and 22RB provided on black matrix 21, and black matrix 21
  • the red layer 22R, the green layer 23G and the blue layer 24B, and the common electrode 26 provided so as to cover the pedestal portions 22RG and 22RB, and the common electrode 26 so as to overlap the pedestal portions (22RG and 22RB).
  • a standing photospacer 29 is a standing photospacer 29.
  • the pedestal portions 22RG and 22RB are formed of the same material in the same layer as the red layer 22R, corresponding to the pixels P defined by the green layer 23G and the blue layer 24B, respectively.
  • the pedestal portion formed corresponding to the pixel P defined by the red layer 22R is an extended portion E in which the red layer 22R extends on the black matrix 21.
  • the liquid crystal layer 40 is made of a nematic liquid crystal material having electro-optical characteristics.
  • the liquid crystal display device 50 configured as described above, in each pixel P, when the gate signal is sent from the gate line 12a and the TFT 5 is turned on, the source signal is sent from the source line 15 and the source electrode 15a And a predetermined charge is written into the pixel electrode 18 via the drain electrode 15b. In rare cases, a potential difference is generated between the pixel electrode 18 and the common electrode 26, and a predetermined voltage is applied to the liquid crystal capacitor formed of the liquid crystal layer 40. In the liquid crystal display device 50, an image is displayed by adjusting the transmittance of light incident from the outside by utilizing the change in the alignment state of liquid crystal molecules according to the magnitude of the applied voltage. .
  • the manufacturing method of this embodiment includes an active matrix substrate manufacturing process, a color filter substrate manufacturing process, and a liquid crystal layer forming process.
  • tantalum oxide (Ta 2 O 3) or the like is formed on the entire substrate on the insulating substrate 10a such as a glass substrate.
  • a metal film having a force such as titanium is formed on the entire substrate on which the base coat film 11 has been formed by sputtering, and then patterned by photolithography to form the gate line 12a and the gate electrode 12aa. And the capacitor line 12b are formed.
  • a silicon nitride film or the like is formed by CVD (Chemical Vapor Deposition) on the entire substrate on which the gate lines 12a and the like are formed, and the gate insulating film 13 is formed.
  • an intrinsic amorphous silicon film and an n + amorphous silicon film doped with phosphorus are continuously formed by CVD on the entire substrate on which the gate insulating film 13 is formed, and then the gate is formed by photolithography.
  • An intrinsic amorphous silicon layer 14a and an n + amorphous silicon layer are formed by patterning islands on the electrode 12aa.
  • a strong metal film such as titanium is formed on the entire substrate on the gate insulating film 13 on which the intrinsic amorphous silicon layer 14a and the like are formed by sputtering, and then a pattern is formed by photolithography.
  • a source line 15, a source electrode 15a, and a drain electrode 15b are formed.
  • the n + amorphous silicon layer is removed by etching using the source electrode 15a and the drain electrode 15b as a mask, thereby forming a channel portion.
  • the intrinsic amorphous silicon layer 14a and the semiconductor layer 14 composed of the n + amorphous silicon layers 14b and 14c are formed, and the TFT 5 is formed.
  • a silicon nitride film or the like is formed on the entire substrate on which the TFT 5 is formed by using the CVD method.
  • a contact hole 17a is formed on the drain electrode 15b overlying the capacitor line 12b by photolithography to form a protective insulating film 16
  • a laminated film composed of the interlayer insulating film 17 is formed.
  • an ITO (Indium Tin Oxide) film is formed on the entire substrate of the interlayer insulating film 17 by a sputtering method, and then a pattern is formed by photolithography to form a pixel electrode 18.
  • the active matrix substrate 20 can be manufactured.
  • a black colored photoresist is formed to a thickness of about 2 m on the entire substrate on the insulating substrate 10b such as a glass substrate, and then a pattern is formed by photolithography to form a black bear tritas 21.
  • a predetermined position and a predetermined opening on the black matrix 21 are formed by photolithography.
  • the base portions 22RG and 22RB and the red layer 22R (and the extending portion E) are formed by patterning the portions (first colored layer forming step).
  • a blue colored photoresist is applied to the entire substrate on which the green layer 23G is formed to a thickness of about 2 m, and then a pattern is formed on a predetermined opening of the black matrix 21 by photolithography.
  • the blue layer 24B is formed (third colored layer forming step).
  • an ITO (Indium Tin Oxide) film is formed with a film thickness of about 1000 A on the entire substrate on which the blue layer 24 B is formed, thereby forming the common electrode 26.
  • a photosensitive acrylic resin or the like is applied to the entire substrate on which the common electrode 26 is formed by a spin coating method or the like to a thickness of about 4 m, and then a pattern is formed by photolithography. Then, the photospacer 29 is formed (photospacer forming step).
  • a polyimide resin is applied to the entire substrate on which the photospacer 29 is formed by spin coating or the like, and then a rubbing process is performed to form an alignment film.
  • the color filter substrate 30a can be manufactured as described above.
  • the active matrix substrate 20 manufactured in the above active matrix substrate manufacturing process is not provided with a liquid crystal inlet portion so as to enclose a display material with a sealing material that has a force such as thermosetting epoxy resin by screen printing.
  • the seal pattern is formed by applying to the frame pattern.
  • the liquid crystal display device 50 of the present embodiment can be manufactured.
  • the liquid crystal display device 50 including the color filter substrate 30a, and the method of manufacturing the color filter substrate 30a, the first colored layer forming step is performed. Since the pedestal portions 22RG and 22RB provided for placing the photospacer 29 are formed of the same material in the same layer as the red layer 22R, the red layer 22R, the green layer 23G and the blue layer 24B are used. The height of each pedestal part (extension part E, 22RG and 22RB) provided corresponding to the specified pixel P is constant.
  • the height of the photospacer 29 placed on each pedestal portion is formed to be constant, so that the upper end position of each photospacer 29 is Can be aligned. Therefore, since the upper end of each photo spacer 29 can contact the surface of the active matrix substrate 20, the thickness (cell thickness) of the liquid crystal layer 40 provided between the active matrix substrate 20 and the color filter substrate 30a can be reduced. Control can be facilitated. Therefore, according to the present embodiment, the cell thickness can be easily controlled by aligning the upper end positions of the photo spacers 29.
  • the photo spacer 29 and the pedestal portion are provided for each pixel P, so that the cell thickness is set for each pixel. It is possible to suppress the occurrence of unevenness of the cell thickness.
  • the photo spacer 29 is provided so as to overlap the black matrix 21, so that the photo spacer 29 affects the display quality of the liquid crystal display device 50. It has been given.
  • the photospacer 29 is made up of a single layer by the photosensitive tantalum resin, the bottom area of the photospacer 29 is formed small, and the photospacer 29 is formed. The area occupied by 29 can be reduced, and the aperture ratio of the pixel P can be improved.
  • the photospacer 29 is further composed of photosensitive acrylic resin, so that variation in height of the photospacer 29 can be suppressed, and the cell thickness can be reduced. Generation of unevenness can be suppressed.
  • FIG. 5 is a schematic top view of the photospacer 29 of the present embodiment, and FIG.
  • FIG. 6 is a schematic cross-sectional view of the photospacer 29 taken along line VI—VI in FIG.
  • FIG. 10 is a schematic top view of a comparative photospacer 129a
  • FIG. 11 is a schematic cross-sectional view of the photospacer 129a along the line XI-XI in FIG.
  • FIG. 12 is a schematic top view of a photo spacer 129b of another comparative example
  • FIG. 13 is a schematic cross sectional view of the photo spacer 129b taken along line XIII-XIII in FIG.
  • a red layer 122R configured by a photoresist colored in red
  • a green layer 123G configured by a photoresist colored in green
  • a blue layer A blue layer 124B composed of a colored photoresist and a rib layer 125A composed of a photosensitive acrylic resin applied to form a rib serving as the alignment center of the liquid crystal layer
  • the bottom areas of the photospacers 129a and 129b are increased, and variations in the film thicknesses of the constituent layers may be accumulated, resulting in variations in the spacer height.
  • the bottom area of the photospacers 129a and 129b is about 11 times the bottom area of the photospacer 29. Become.
  • the photospacer 29 is the red layer 22 Since it is provided so as to overlap R (extension part E), the height of the photospacer 29 required to maintain a predetermined cell thickness is reduced, and is used to form the photospacer 29. Material can be saved.
  • the photospacer 129b is formed directly on the black matrix 121, the height of the photospacer required to maintain a predetermined cell thickness is reduced. It becomes expensive.
  • FIG. 7 is a schematic plan view of the color filter substrate 30b according to this embodiment.
  • the same portions as those in FIGS. 1 to 6 are denoted by the same reference numerals, and detailed description thereof is omitted.
  • the force in which the photo spacer 29 and the pedestal portion (the extended portions E, 22RG, and 22RB) are provided in the portion overlapping the capacitor line 12b on the black matrix 21 is the color of the present embodiment.
  • a photo spacer 29 and a pedestal portion are provided in a portion overlapping the gate line 12a on the black matrix 21, as shown in FIG.
  • the configuration other than the position where the photo spacer 29 and the pedestal portion (extension portions E, 22RG and 22RB) are provided is substantially the same as that of the color filter substrate 30a of the first embodiment. It is the same.
  • FIG. 8 is a schematic plan view of the color filter substrate 30c according to this embodiment.
  • the force in which the photo spacers 29 and the pedestal portions are provided on the black matrix 21.
  • the photo spacers Spacer 29 and pedestal 22RG and 22RB force As shown in FIG. 8, the red layer 22R, the green layer 23G, and the blue layer 24B are provided at the center.
  • pedestals 22RG and 22RB are arranged in a notch provided in the center portion thereof.
  • the central portion is a pedestal portion as it is.
  • FIG. 9 is a schematic cross-sectional view of the color filter substrate 30d according to this embodiment.
  • each pedestal is formed of a red colored photoresist.
  • each pedestal portion (23GR, extended portion E, 23GB) is made of a photoresist colored in green.
  • a green layer 23G is formed by applying a green colored photoresist and then forming a pattern. It will be.
  • each pedestal is made of a blue colored photoresist by applying a blue colored photoresist and then patterning to form a blue layer. May be.
  • the configuration in which the photo spacer and the pedestal portion are provided for each pixel is exemplified.
  • the photo spacer and the pedestal portion are provided for each pixel.
  • a photo spacer and a pedestal that do not need to be provided may be provided for each of a plurality of pixels.
  • each colored layer is composed of red (R), green (G), and blue (B).
  • the present invention provides red (R), green (G) and A complementary color such as white (W) may be added to blue (B), or a combination of cyan (C), magenta (M) and yellow (Y) may be used.
  • the force in which the photo spacer and the pedestal portion are provided on the color filter substrate side is provided on the color filter substrate side.
  • the coloring layer, the photo spacer and the pedestal portion are provided on the active matrix substrate side. Therefore, it can be applied to COA (Colorfilter On Array) liquid crystal display devices.
  • the present invention is useful for the color filter substrate and the liquid crystal display device including the same because the cell thickness can be easily controlled.

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optical Filters (AREA)
  • Liquid Crystal (AREA)

Abstract

La présente invention se rapporte à un substrat de filtre couleur (30a) qui est pourvu d'un substrat isolant transparent (10), d'une pluralité de couches colorées disposées en matrice sur le substrat isolant (10b), dont une couche rouge (22R), une couche verte (23G) et une couche bleue (24B) dans des couleurs différentes les unes des autres, et d'une entretoise photographique (29) qui est positionnée sur le substrat isolant (10b). Les entretoises photographiques (29) sont disposées sur une section à prolongement (E) et des sections de base (22RG et 22RB) formées sur la même couche que la couche de couleur rouge (22R) en utilisant le même matériau que celui de la couche de couleur rouge, par la mise en correspondance des pixels spécifiés par la couche de couleur rouge (22R), la couche de couleur verte (23B) et la couche de couleur bleue (22G), respectivement.
PCT/JP2007/060533 2006-09-29 2007-05-23 Substrat de filtre couleur, dispositif d'affichage à cristaux liquides pourvu du substrat de filtre couleur et procédé de fabrication du substrat de filtre couleur WO2008041389A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2006-268734 2006-09-29
JP2006268734 2006-09-29

Publications (1)

Publication Number Publication Date
WO2008041389A1 true WO2008041389A1 (fr) 2008-04-10

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107688254A (zh) * 2017-10-11 2018-02-13 深圳市华星光电半导体显示技术有限公司 Coa型液晶显示面板及其制作方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003156751A (ja) * 2001-11-19 2003-05-30 Fujitsu Display Technologies Corp 液晶表示装置用基板及びその製造方法及びそれを備えた液晶表示装置
JP2005164757A (ja) * 2003-11-28 2005-06-23 Toshiba Matsushita Display Technology Co Ltd 液晶表示装置の製造方法
JP2006023733A (ja) * 2004-06-11 2006-01-26 Sharp Corp カラーフィルタ基板およびその製造方法ならびにそれを備えた表示装置

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003156751A (ja) * 2001-11-19 2003-05-30 Fujitsu Display Technologies Corp 液晶表示装置用基板及びその製造方法及びそれを備えた液晶表示装置
JP2005164757A (ja) * 2003-11-28 2005-06-23 Toshiba Matsushita Display Technology Co Ltd 液晶表示装置の製造方法
JP2006023733A (ja) * 2004-06-11 2006-01-26 Sharp Corp カラーフィルタ基板およびその製造方法ならびにそれを備えた表示装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107688254A (zh) * 2017-10-11 2018-02-13 深圳市华星光电半导体显示技术有限公司 Coa型液晶显示面板及其制作方法
CN107688254B (zh) * 2017-10-11 2020-05-29 深圳市华星光电半导体显示技术有限公司 Coa型液晶显示面板及其制作方法

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