WO2019071846A1

WO2019071846A1 - Coa liquid crystal display panel and manufacturing method therefor

Info

Publication number: WO2019071846A1
Application number: PCT/CN2017/119123
Authority: WO
Inventors: 石龙强
Original assignee: 深圳市华星光电半导体显示技术有限公司
Priority date: 2017-10-11
Filing date: 2017-12-27
Publication date: 2019-04-18
Also published as: CN107688254A; CN107688254B

Abstract

A color filter on array (COA) liquid crystal display panel and a manufacturing method therefor. The display panel comprises a lower substrate (10) and an upper substrate (20) which are oppositely disposed; the lower substrate (10) comprises a first base substrate (11), a thin film transistor (TFT) layer (12), a first passivation layer (13), a color photoresist layer (14), a second passivation layer (15) and a pixel electrode (16); the color photoresist layer (14) is provided thereon with multiple color resistance projections (145), and the second passivation layer (15) is provided thereon with multiple first transparent projections (151) and second transparent projections (152); the first transparent projections (151) are correspondingly located above the color resistance projections (145), and the first transparent projections (151) and color resistance projections (145) thereunder jointly form a main spacer structure, the second transparent projections (152) forming an auxiliary spacer structure, thus additionally manufacturing spacers is not required.

Description

COA type liquid crystal display panel and manufacturing method thereof

Technical field

The present invention relates to the field of display technologies, and in particular, to a COA type liquid crystal display panel and a method of fabricating the same.

Background technique

Liquid crystal display (LCD) has many advantages such as thin body, power saving, and no radiation, and has been widely used. Such as: LCD TV, mobile phone, personal digital assistant (PDA), digital camera, computer screen or laptop screen.

Generally, a liquid crystal display device includes a housing, a liquid crystal panel disposed in the housing, and a backlight module disposed in the housing. The liquid crystal panel is mainly composed of a thin film transistor array (TFT Array) substrate, a color filter (CF) substrate, and a liquid crystal layer (Liquid Crystal Layer) disposed between the two substrates. The working principle is that the rotation of the liquid crystal molecules of the liquid crystal layer is controlled by applying a driving voltage on the two glass substrates, and the light of the backlight module is refracted to generate a picture. Wherein, the CF substrate mainly comprises a color photoresist layer for forming colored light by a color resist unit (R/G/B), a black matrix (BM) for preventing light leakage at the edge of the pixel, and for maintaining the thickness of the box. Photo Spacer (PS), in large-size LCD panels, usually use two or more types of spacers, such as the main spacer on the CF substrate (Main PS), and auxiliary spacers Sub (PS), which acts as a multi-stage buffer to prevent various Mura or bad occurrences.

COA (Color-filter on Array) technology is an integrated technology for directly forming a color photoresist layer on an array substrate, which can effectively solve the problem of light leakage caused by alignment deviation in the process of the liquid crystal display device. Can significantly increase the display aperture ratio. In addition, the prior art has proposed a technical solution for designing a PS on a TFT array substrate (PS on Arry, POA), which can continue to reduce the difficulty of the color film substrate side. As shown in FIG. 1 , a schematic structural diagram of a liquid crystal panel designed for a COA plus POA, including an upper substrate 100 and a lower substrate 200 , wherein the upper substrate 100 includes an upper substrate 110 and is formed on the upper substrate 110 . a black matrix 120 thereon, an indium tin oxide (ITO) electrode layer 130 formed on the upper substrate 110 and the black matrix 120, the lower substrate 200 including a lower substrate 210 and formed on the lower substrate 210 a TFT layer 220, a first passivation layer (PV1) 230 formed on the TFT layer 220, a color photoresist layer 240 disposed on the first passivation layer 230, and a second passivation disposed on the color photoresist layer 240. a layer (PV2) 250, and a pixel electrode 260 and a spacer 270 disposed on the second passivation layer 250; wherein the second passivation layer 250 is disposed on the color photoresist layer 240 for preventing color light The resist layer 240 contaminates the liquid crystal, generally silicon nitride (SiNx) of inorganic material, and has a very thin thickness of about 200 nm. However, for a large-sized, high-resolution LCD product, in order to reduce the parasitic capacitance effect, the second passivation layer 250 is required. Replaced with an organic polymer material, and thick, about 4 μm; the spacer 270 is in the second passivation layer 250 After into, you need to use an additional mask (Mask) is formed by a photolithography process.

Summary of the invention

The object of the present invention is to provide a COA type liquid crystal display panel, wherein the color photoresist layer and the second passivation layer are provided with protrusions which can function as spacers, thereby reducing the process of a spacer and greatly reducing the process. Cost of production.

Another object of the present invention is to provide a method for fabricating a COA type liquid crystal display panel, which can act as a spacer by providing protrusions on the color photoresist layer and the second passivation layer, thereby reducing a spacer. The process greatly reduces production costs.

In order to achieve the above object, the present invention provides a COA type liquid crystal display panel, comprising: a lower substrate; and an upper substrate disposed opposite to the lower substrate;

The lower substrate includes a first substrate, a TFT layer disposed on the first substrate, a first passivation layer disposed on the TFT layer, and a first passivation layer disposed on the first passivation layer a color photoresist layer, a second passivation layer disposed on the color photoresist layer, and a pixel electrode disposed on the second passivation layer;

a plurality of color resistive protrusions are disposed on the upper surface of the color photoresist layer, and a plurality of first transparent protrusions and a plurality of second transparent protrusions are disposed on the upper surface of the second passivation layer, wherein The plurality of first transparent protrusions respectively correspond to the plurality of color resist protrusions, and each of the first transparent protrusions and the corresponding color resistance protrusions thereof respectively form a main spacer structure, each of the first The two transparent protrusions constitute an auxiliary spacer structure.

The color photoresist layer includes a plurality of color resisting units connected in sequence; the color resisting unit is divided into a red color resisting unit, a green color resisting unit, and a blue color resisting unit;

The color resisting protrusion is formed on the red color resisting unit, the green color resisting unit, or the blue color resisting unit;

The red color resisting unit, the green color resisting unit, and the blue color resisting unit are all negative photoresist materials, and the red color resisting unit, the green color resisting unit, or the blue color resisting unit are all manufactured by one exposure and development process. Wherein, the color resist unit provided with the color resisting protrusion is obtained by one exposure and development by using a halftone mask.

The TFT layer includes a plurality of scan lines perpendicular to each other and a plurality of data lines;

The first transparent protrusion and the second transparent protrusion are respectively located above the scan line or the data line.

The second passivation layer is a positive photoresist material, and the second passivation layer is obtained by one exposure and development using a halftone mask.

The upper substrate includes a second substrate, a black matrix disposed on a side of the second substrate facing the lower substrate, and a second substrate disposed on the second substrate and a black matrix facing the lower substrate a common electrode on one side;

The first transparent protrusion and the second transparent protrusion are correspondingly located below the black matrix.

The invention also provides a method for manufacturing a COA type liquid crystal display panel, comprising the following steps:

Step S1, providing a first substrate, forming a TFT layer on the first substrate, and forming a first passivation layer on the TFT layer;

Step S2, forming a color photoresist layer on the first passivation layer, wherein a plurality of color resistive bumps are disposed on an upper surface of the color photoresist layer;

Step S3, forming a second passivation layer of a transparent organic material on the color photoresist layer, wherein the upper surface of the second passivation layer is provided with a plurality of first transparent protrusions and a plurality of second transparent protrusions The plurality of first transparent protrusions respectively correspond to the plurality of color resist protrusions, and each of the first transparent protrusions and the corresponding color resistance protrusions thereof form a main spacer structure. Each second transparent protrusion constitutes an auxiliary spacer structure;

Step S4, depositing and patterning a pixel electrode on the second passivation layer to obtain a lower substrate;

In step S5, an upper substrate is provided, and the lower substrate and the upper substrate are bonded to each other to obtain a COA liquid crystal display panel.

The color photoresist layer formed in the step S2 includes a plurality of color resisting units connected in sequence; the color resisting unit is divided into a red color resisting unit, a green color resisting unit, and a blue color resisting unit;

The red color resisting unit, the green color resisting unit, and the blue color resisting unit are all negative photoresist materials, and the red color resisting unit, the green color resisting unit, or the blue color resisting unit are all manufactured by one exposure and development process. Wherein, the color resisting unit provided with the color resisting protrusion is formed by using a halftone mask, and in the process of exposing and forming the color resisting unit, the color resisting unit is formed correspondingly by using a halftone mask The position of the color resisting protrusion is subjected to full exposure, and half exposure is performed at other positions corresponding to the formation of the color resisting unit.

The second passivation layer formed in the step S3 is a positive photoresist material, and the second passivation layer is obtained by one exposure and development by using a halftone mask, and the second passivation layer is formed by exposure. The process of using the halftone mask is not exposed at a position corresponding to the first transparent protrusion and the second transparent protrusion forming the second passivation layer, and is performed at other positions corresponding to the formation of the second passivation layer. exposure.

The upper substrate provided in the step S5 includes a second substrate, a black matrix disposed on the second substrate, and a common electrode disposed on the second substrate and the black matrix;

In the step S5, the side on which the black matrix and the common electrode are disposed on the upper substrate faces the lower substrate and is bonded to the lower substrate pair; in the obtained COA type liquid crystal display panel, the first transparent protrusion and the first The two transparent protrusions are correspondingly located below the black matrix.

The present invention also provides a COA type liquid crystal display panel, comprising a lower substrate, and an upper substrate disposed opposite to the lower substrate;

a plurality of color resistive protrusions are disposed on the upper surface of the color photoresist layer, and a plurality of first transparent protrusions and a plurality of second transparent protrusions are disposed on the upper surface of the second passivation layer, wherein The plurality of first transparent protrusions respectively correspond to the plurality of color resist protrusions, and each of the first transparent protrusions and the corresponding color resistance protrusions thereof respectively form a main spacer structure, each of the first The two transparent protrusions constitute an auxiliary spacer structure;

The red color resisting unit, the green color resisting unit, and the blue color resisting unit are all negative photoresist materials, and the red color resisting unit, the green color resisting unit, or the blue color resisting unit are all manufactured by one exposure and development process. Wherein, the color resisting unit provided with the color resisting protrusion is obtained by one exposure and development by using a halftone mask;

The TFT layer includes a plurality of scan lines and a plurality of data lines vertically crossing each other;

The first transparent protrusion and the second transparent protrusion are respectively located above the scan line or the data line;

Wherein, the second passivation layer is a positive photoresist material, and the second passivation layer is obtained by one exposure and development by using a halftone mask;

The upper substrate includes a second substrate, a black matrix disposed on a side of the second substrate facing the lower substrate, and a second substrate and a black matrix disposed on the second substrate a common electrode on one side of the lower substrate;

Advantageous Effects of Invention: The COA type liquid crystal display panel of the present invention includes a lower substrate and an upper substrate disposed opposite to each other; the lower substrate includes a first substrate, a TFT layer, a first passivation layer, a color photoresist layer, and a first substrate a second passivation layer and a pixel electrode, wherein the color resist layer is provided with a plurality of color resistive protrusions on the upper surface thereof, and the second passivation layer is provided with a plurality of first transparent bumps on the upper surface thereof a second transparent protrusion, wherein the plurality of first transparent protrusions respectively correspond to the plurality of color resist protrusions, and each of the first transparent protrusions and the corresponding color resistance protrusions thereof form a common The main spacer structure, each of the second transparent protrusions constitutes an auxiliary spacer structure, so that no additional spacers are produced, a spacer manufacturing process is reduced, and the production cost is greatly reduced. The method for fabricating a COA type liquid crystal display panel of the present invention has a plurality of first transparent protrusions on the upper surface of the second passivation layer by providing a plurality of color resistive protrusions on the upper surface of the color resist layer of the lower substrate And a plurality of second transparent protrusions, wherein the plurality of first transparent protrusions are respectively located above the plurality of color resist protrusions, so that each of the first transparent protrusions and the corresponding color resistance protrusions thereof are common A main spacer structure is formed, and each of the second transparent protrusions constitutes an auxiliary spacer structure, so that no additional spacers are produced, a spacer manufacturing process is reduced, and the production cost is greatly reduced.

The detailed description of the present invention and the accompanying drawings are to be understood,

DRAWINGS

The technical solutions and other advantageous effects of the present invention will be apparent from the following detailed description of the embodiments of the invention.

In the drawings,

1 is a schematic structural view of a COA type liquid crystal display panel in the prior art;

2 is a schematic structural view of a COA liquid crystal display panel of the present invention;

3 is a schematic flow chart of a method for fabricating a COA liquid crystal display panel of the present invention;

4 is a schematic view showing a step S1 of a method for fabricating a COA liquid crystal display panel of the present invention;

5 is a schematic diagram of step S2 of the method for fabricating a COA liquid crystal display panel of the present invention;

6 is a schematic diagram of step S3 of the method for fabricating a COA liquid crystal display panel of the present invention;

Fig. 7 is a schematic view showing a step S4 of the method for fabricating a COA liquid crystal display panel of the present invention.

Detailed ways

In order to further clarify the technical means and effects of the present invention, the following detailed description will be made in conjunction with the preferred embodiments of the invention and the accompanying drawings.

Referring to FIG. 2, the present invention provides a COA type liquid crystal display panel, comprising a lower substrate 10, and an upper substrate 20 disposed opposite the lower substrate 10;

The lower substrate 10 includes a first substrate 11 , a TFT layer 12 disposed on the first substrate 11 , and a first passivation layer 13 disposed on the TFT layer 12 . a color photoresist layer 14 on a passivation layer 13, a second passivation layer 15 disposed on the color photoresist layer 14, and a pixel electrode 16 disposed on the second passivation layer 15;

The second passivation layer 15 is provided with a plurality of color resistive protrusions 145, and the upper surface of the second passivation layer 15 is provided with a plurality of color resistive protrusions 145. a first transparent protrusion 151 and a plurality of second transparent protrusions 152, wherein the plurality of first transparent protrusions 151 are respectively located above the plurality of color resist protrusions 145, and each of the first transparent protrusions 151 The corresponding color resisting protrusions 145 and the underside thereof constitute a main spacer structure, and each of the second transparent protrusions 152 constitutes an auxiliary spacer structure.

Specifically, the second passivation layer 15 has a thickness of 2-6 μm.

Specifically, the clear height of the first transparent protrusion 151 is equal to the clear height of the second transparent protrusion 152, and the height of the main spacer structure is equal to the clear height of the color resist protrusion 145 plus the The clear height of the first transparent protrusion 151.

Specifically, the color photoresist layer 14 includes a plurality of color resist units 141 connected in sequence; the color resist unit 141 is divided into a red color resist unit, a green color resist unit, and a blue color resist unit.

Specifically, the color resisting protrusion 145 is formed on the red color resisting unit, the green color resisting unit, or the blue color resisting unit;

Specifically, the red color resisting unit, the green color resisting unit, and the blue color resisting unit are all negative photoresist materials, and the red color resisting unit, the green color resisting unit, or the blue color resisting unit are all exposed by one exposure and A developing process is produced in which the color resist unit 141 provided with the color resisting protrusions 145 is obtained by one exposure and development using a halftone mask.

Specifically, the TFT layer 12 includes a plurality of scan lines perpendicular to each other and a plurality of data lines (not shown), and the adjacent two color resist units 141 of the color resist layer 14 are on the scan lines, Or the intersection of the data lines and a partial overlap;

The first transparent protrusion 151 and the second transparent protrusion 152 are respectively located above the scan line or the data line, that is, the main spacer structure and the auxiliary spacer structure are correspondingly located on the scan line. , or above the data line.

Specifically, the second passivation layer 15 is a positive photoresist material, and the second passivation layer 15 is formed by one exposure and development using a halftone mask.

Specifically, the upper substrate 20 includes a second substrate 21, a black matrix 22 disposed on a side of the second substrate 21 facing the lower substrate 10, and a second substrate disposed on the second substrate The black matrix 22 and the black matrix 22 face the common electrode 23 on the side of the lower substrate 10.

Specifically, the first transparent protrusion 151 and the second transparent protrusion 152 are respectively located below the black matrix 22, that is, the main spacer structure and the auxiliary spacer structure are correspondingly located in the black matrix. Below the 22nd.

Specifically, the material of the pixel electrode 16 and the common electrode 23 are both ITO.

In the COA type liquid crystal display panel of the present invention, a plurality of color resistive protrusions 145 are disposed on the upper surface of the color photoresist layer 14, and a plurality of first transparent protrusions 151 are disposed on the upper surface of the second passivation layer 15. And a plurality of second transparent protrusions 152, wherein the plurality of first transparent protrusions 151 are respectively located above the plurality of color resist protrusions 145, and each of the first transparent protrusions 151 and the corresponding color resistance thereof The protrusions 145 together constitute a main spacer structure, and each of the second transparent protrusions 152 constitutes an auxiliary spacer structure, thereby eliminating the need for additional spacers, reducing the spacer process and greatly reducing the spacer structure. Production costs.

Referring to FIG. 3, based on the above COA type liquid crystal display panel, the present invention further provides a method for fabricating a COA type liquid crystal display panel, comprising the following steps:

Step S1, as shown in FIG. 4, a first base substrate 11 is provided, a TFT layer 12 is formed on the first base substrate 11, and a first passivation layer 13 is formed on the TFT layer 12.

Specifically, the TFT layer 12 includes a plurality of scanning lines that intersect perpendicularly to each other, and a plurality of data lines (not shown).

Step S2, as shown in FIG. 5, a color photoresist layer 14 is formed on the first passivation layer 13, and a plurality of color resistive protrusions 145 are disposed on the upper surface of the color photoresist layer 14.

Specifically, the color photoresist layer 13 formed in the step S2 includes a plurality of color resist units 141 connected in sequence; the color resist unit 141 is divided into a red color resist unit, a green color resist unit, and a blue color resist unit.

Specifically, two adjacent color resisting units 141 of the color resist layer 14 meet above the scan line or the data line and partially overlap; the color resist protrusion 145 is correspondingly disposed on the scan line, Or above the data line.

Specifically, the color resist protrusion 135 may be formed on the red color resist unit or on the green color resist unit or the blue color resist unit.

Specifically, the red color resisting unit, the green color resisting unit, and the blue color resisting unit are all negative photoresist materials, and the red color resisting unit, the green color resisting unit, or the blue color resisting unit are all exposed by one exposure and The developing process is performed, wherein the color resisting unit 141 provided with the color resisting protrusion 145 is formed by using a halftone mask, and in the process of exposing the color resisting unit 141, using a halftone mask The position corresponding to the color resist protrusion 145 forming the color resist unit 141 is fully exposed, and the half exposure is performed at other positions corresponding to the color resist unit 141.

Step S3, as shown in FIG. 6, a second passivation layer 15 of transparent organic material is formed on the color photoresist layer 14, and a plurality of first transparent protrusions are disposed on the upper surface of the second passivation layer 15. And a plurality of second transparent protrusions 152, wherein the plurality of first transparent protrusions 151 are respectively located above the plurality of color resist protrusions 145, and each of the first transparent protrusions 151 and the lower portion thereof The color resisting protrusions 145 together form a main spacer structure, and each of the second transparent protrusions 152 constitutes an auxiliary spacer structure.

Specifically, the second passivation layer 15 formed in the step S3 is a positive photoresist material, and the second passivation layer 15 is obtained by one exposure and development by using a halftone mask, and is formed by exposure. In the process of the second passivation layer 15, the position of the first transparent protrusion 151 and the second transparent protrusion 152 corresponding to the second passivation layer 15 is not exposed by using the halftone mask, and the corresponding The other locations of the second passivation layer 15 are subjected to half exposure.

Specifically, the first transparent protrusion 151 and the second transparent protrusion 152 are respectively located above the scan line or the data line, that is, the main spacer structure and the auxiliary spacer structure are respectively located correspondingly Above the scan line, or data line.

Step S4, as shown in FIG. 7, a pixel electrode 16 is deposited and patterned on the second passivation layer 15 to obtain a lower substrate 10.

Specifically, the material of the pixel electrode 16 is ITO.

In step S5, the upper substrate 20 is provided, and the lower substrate 10 and the upper substrate 20 are bonded to each other to obtain a COA liquid crystal display panel as shown in FIG. 2.

Specifically, the upper substrate 20 provided in the step S5 includes a second substrate 21, a black matrix 22 disposed on the second substrate 21, and a black substrate 21 and a black substrate. The common electrode 23 on the matrix 22.

Specifically, the material of the common electrode 23 is ITO.

Specifically, in the step S5, the side of the upper substrate 20 on which the black matrix 22 and the common electrode 23 are disposed faces the lower substrate 10 and is bonded to the lower substrate 10; in the obtained COA type liquid crystal display panel, The first transparent protrusion 151 and the second transparent protrusion 152 are respectively located below the black matrix 22, that is, the main spacer structure and the auxiliary spacer structure are respectively located below the black matrix 22.

In the method of fabricating the COA type liquid crystal display panel of the present invention, a plurality of first resists 145 are disposed on the upper surface of the color resist layer 14 of the lower substrate 10, and a plurality of first portions are disposed on the upper surface of the second passivation layer 15. a transparent protrusion 151 and a plurality of second transparent protrusions 152, and the plurality of first transparent protrusions 151 are respectively located above the plurality of color resist protrusions 145 such that each of the first transparent protrusions 151 and The corresponding color resisting protrusions 145 underneath together constitute a main spacer structure, and each of the second transparent protrusions 152 constitutes an auxiliary spacer structure, thereby eliminating the need for additional spacers and reducing a spacer. The process greatly reduces production costs.

In summary, the COA type liquid crystal display panel of the present invention includes oppositely disposed lower and upper substrates; the lower substrate includes a first substrate, a TFT layer, a first passivation layer, a color photoresist layer, and a second a passivation layer and a pixel electrode, wherein a plurality of color resistive protrusions are disposed on an upper surface of the color photoresist layer, and a plurality of first transparent protrusions and a plurality of a second transparent protrusion, wherein the plurality of first transparent protrusions respectively correspond to the plurality of color resist protrusions, and each of the first transparent protrusions and the corresponding color resistance protrusions thereof form a main body The spacer structure, each of the second transparent protrusions constitutes an auxiliary spacer structure, thereby eliminating the need for additional spacer production, reducing a spacer process and greatly reducing production costs. The method for fabricating a COA type liquid crystal display panel of the present invention has a plurality of first transparent protrusions on the upper surface of the second passivation layer by providing a plurality of color resistive protrusions on the upper surface of the color resist layer of the lower substrate And a plurality of second transparent protrusions, wherein the plurality of first transparent protrusions are respectively located above the plurality of color resist protrusions, so that each of the first transparent protrusions and the corresponding color resistance protrusions thereof are common A main spacer structure is formed, and each of the second transparent protrusions constitutes an auxiliary spacer structure, so that no additional spacers are produced, a spacer manufacturing process is reduced, and the production cost is greatly reduced.

In the above, various other changes and modifications can be made in accordance with the technical solutions and technical concept of the present invention, and all such changes and modifications should be included in the appended claims. The scope of protection.

Claims

A COA type liquid crystal display panel includes a lower substrate and an upper substrate disposed opposite to the lower substrate;

The lower substrate includes a first substrate, a TFT layer disposed on the first substrate, a first passivation layer disposed on the TFT layer, and a first passivation layer disposed on the first passivation layer a color photoresist layer, a second passivation layer disposed on the color photoresist layer, and a pixel electrode disposed on the second passivation layer;

a plurality of color resistive protrusions are disposed on the upper surface of the color photoresist layer, and a plurality of first transparent protrusions and a plurality of second transparent protrusions are disposed on the upper surface of the second passivation layer, wherein The plurality of first transparent protrusions respectively correspond to the plurality of color resist protrusions, and each of the first transparent protrusions and the corresponding color resistance protrusions thereof respectively form a main spacer structure, each of the first The two transparent protrusions constitute an auxiliary spacer structure.
The COA liquid crystal display panel of claim 1 , wherein the color photoresist layer comprises a plurality of color resisting units connected in sequence; the color resisting unit is divided into a red color resisting unit, a green color resisting unit, and blue Color resistance unit;

The color resisting protrusion is formed on the red color resisting unit, the green color resisting unit, or the blue color resisting unit;

The red color resisting unit, the green color resisting unit, and the blue color resisting unit are all negative photoresist materials, and the red color resisting unit, the green color resisting unit, or the blue color resisting unit are all manufactured by one exposure and development process. Wherein, the color resist unit provided with the color resisting protrusion is obtained by one exposure and development by using a halftone mask.
The COA type liquid crystal display panel according to claim 1, wherein the TFT layer comprises a plurality of scanning lines and a plurality of data lines vertically crossing each other;

The first transparent protrusion and the second transparent protrusion are respectively located above the scan line or the data line.
The COA type liquid crystal display panel according to claim 1, wherein the second passivation layer is a positive photoresist material, and the second passivation layer is obtained by one exposure and development by using a halftone mask. .
The COA liquid crystal display panel according to claim 1, wherein the upper substrate comprises a second substrate, a black matrix disposed on a side of the second substrate facing the lower substrate, and The second substrate and the black matrix face a common electrode on a side of the lower substrate;

The first transparent protrusion and the second transparent protrusion are correspondingly located below the black matrix.
A method for manufacturing a COA type liquid crystal display panel, comprising the following steps:

Step S1, providing a first substrate, forming a TFT layer on the first substrate, and forming a first passivation layer on the TFT layer;

Step S2, forming a color photoresist layer on the first passivation layer, wherein a plurality of color resistive bumps are disposed on an upper surface of the color photoresist layer;

Step S3, forming a second passivation layer of transparent organic material on the color photoresist layer (14), wherein the second passivation layer is provided with a plurality of first transparent bumps and a plurality of second surfaces on the upper surface a transparent protrusion, wherein the plurality of first transparent protrusions respectively correspond to the plurality of color resist protrusions, and each of the first transparent protrusions and the corresponding color resistance protrusions thereof jointly form a main spacer Structure, each second transparent protrusion constitutes an auxiliary spacer structure;

Step S4, depositing and patterning a pixel electrode on the second passivation layer to obtain a lower substrate;

In step S5, an upper substrate is provided, and the lower substrate and the upper substrate are bonded to each other to obtain a COA liquid crystal display panel.
The method of fabricating a COA liquid crystal display panel according to claim 6, wherein the color photoresist layer formed in the step S2 comprises a plurality of color resisting units connected in sequence; and the color resisting unit is divided into red color resisting units. , a green color resistive unit, and a blue color resisting unit;

The color resisting protrusions (135) are formed on the red color resisting unit, the green color resisting unit, or the blue color resisting unit;

The red color resisting unit, the green color resisting unit, and the blue color resisting unit are all negative photoresist materials, and the red color resisting unit, the green color resisting unit, or the blue color resisting unit are all manufactured by one exposure and development process. Wherein, the color resisting unit provided with the color resisting protrusion is formed by using a halftone mask, and in the process of exposing and forming the color resisting unit, the color resisting unit is formed correspondingly by using a halftone mask The position of the color resisting protrusion is subjected to full exposure, and half exposure is performed at other positions corresponding to the formation of the color resisting unit.
The method of fabricating a COA liquid crystal display panel according to claim 6, wherein the TFT layer comprises a plurality of scan lines perpendicular to each other and a plurality of data lines;

The first transparent protrusion and the second transparent protrusion are respectively located above the scan line or the data line.
The method of fabricating a COA liquid crystal display panel according to claim 6, wherein the second passivation layer formed in the step S3 is a positive photoresist material, and the second passivation layer is formed by using a halftone mask a plate and a single exposure and development process, in the process of exposing to form the second passivation layer, using a halftone mask to form a first transparent protrusion and a second transparent protrusion corresponding to the second passivation layer The position is not exposed, and a half exposure is performed at other positions corresponding to the formation of the second passivation layer.
The method of fabricating a COA liquid crystal display panel according to claim 6, wherein the upper substrate provided in the step S5 comprises a second substrate, a black matrix disposed on the second substrate, and a common electrode on the second substrate and the black matrix;

In the step S5, the side on which the black matrix and the common electrode are disposed on the upper substrate faces the lower substrate and is bonded to the lower substrate pair; in the obtained COA type liquid crystal display panel, the first transparent protrusion and the first The two transparent protrusions are correspondingly located below the black matrix.
A COA type liquid crystal display panel includes a lower substrate and an upper substrate disposed opposite to the lower substrate;

The lower substrate includes a first substrate, a TFT layer disposed on the first substrate, a first passivation layer disposed on the TFT layer, and a first passivation layer disposed on the first passivation layer a color photoresist layer, a second passivation layer disposed on the color photoresist layer, and a pixel electrode disposed on the second passivation layer;

a plurality of color resistive protrusions are disposed on the upper surface of the color photoresist layer, and a plurality of first transparent protrusions and a plurality of second transparent protrusions are disposed on the upper surface of the second passivation layer, wherein The plurality of first transparent protrusions respectively correspond to the plurality of color resist protrusions, and each of the first transparent protrusions and the corresponding color resistance protrusions thereof respectively form a main spacer structure, each of the first The two transparent protrusions constitute an auxiliary spacer structure;

The color photoresist layer includes a plurality of color resisting units connected in sequence; the color resisting unit is divided into a red color resisting unit, a green color resisting unit, and a blue color resisting unit;

The color resisting protrusion is formed on the red color resisting unit, the green color resisting unit, or the blue color resisting unit;

The red color resisting unit, the green color resisting unit, and the blue color resisting unit are all negative photoresist materials, and the red color resisting unit, the green color resisting unit, or the blue color resisting unit are all manufactured by one exposure and development process. Wherein, the color resisting unit provided with the color resisting protrusion is obtained by one exposure and development by using a halftone mask;

The TFT layer includes a plurality of scan lines and a plurality of data lines vertically crossing each other;

The first transparent protrusion and the second transparent protrusion are respectively located above the scan line or the data line;

Wherein, the second passivation layer is a positive photoresist material, and the second passivation layer is obtained by one exposure and development by using a halftone mask;

The upper substrate includes a second substrate, a black matrix disposed on a side of the second substrate facing the lower substrate, and a second substrate and a black matrix disposed on the second substrate a common electrode on one side of the lower substrate;

The first transparent protrusion and the second transparent protrusion are correspondingly located below the black matrix.