CN102654688A - Color-film substrate, manufacturing method and liquid crystal display device thereof - Google Patents
Color-film substrate, manufacturing method and liquid crystal display device thereof Download PDFInfo
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- CN102654688A CN102654688A CN2011103518521A CN201110351852A CN102654688A CN 102654688 A CN102654688 A CN 102654688A CN 2011103518521 A CN2011103518521 A CN 2011103518521A CN 201110351852 A CN201110351852 A CN 201110351852A CN 102654688 A CN102654688 A CN 102654688A
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Abstract
The invention provides a color-film substrate and a manufacturing method and a liquid crystal display device thereof, relates to the field of liquid display, and aims to improve yield of products. The color-film substrate comprises a black matrix and a color film, wherein at least one main partition object and at least one secondary partition object are arranged in a region which right faces to the black matrix; a heightening layer with a certain thickness is arranged in a position between the main partition object and the black matrix, right facing to the main partition object, and the heights of the main partition object and the secondary partition object are identical.
Description
Technical field
The present invention relates to field of liquid crystal display, relate in particular to a kind of color membrane substrates and manufacturing approach thereof, liquid crystal indicator.
Background technology
At TFT-LCD (Thin Film Transistor-Liquid Crystal Display; Thin Film Transistor-LCD) in; Display panels is formed box by color membrane substrates and array base palte, and liquid crystal layer is folded between color membrane substrates and the array base palte.Homogeneity for the thickness that guarantees liquid crystal layer need be provided with chock insulator matter.In present chock insulator matter design, adopt main chock insulator matter and secondary chock insulator matter structure combining usually.
As shown in Figure 1, color membrane substrates 100 comprises substrate 11, black matrix 12, color film 13, insulation course 16, common electrode layer 17, main chock insulator matter 18 and secondary chock insulator matter 19.Wherein, color film 13 comprises three kinds of filter layers of RGB (three kinds of filter layers identify with different fillings respectively) of arranging in order in diagram.In addition, main chock insulator matter 18 is different with the height of secondary chock insulator matter 19, and the height of main chock insulator matter is d
1, the height d of secondary chock insulator matter
2, and d
1Compare d
2Greatly; Main chock insulator matter 18 is used for controlling the thickness of liquid crystal layer, and secondary chock insulator matter 19 is when display panels receives ambient pressure, with main chock insulator matter 18 common pressure-bearings, makes liquid crystal layer keep certain thickness.
But; In the process of making above-mentioned main chock insulator matter 18 and secondary chock insulator matter 19; If adopt negative photoresist as the material of making chock insulator matter, then bigger in the needed exposure of the correspondence position of main chock insulator matter 18, less in the needed exposure of the correspondence position of secondary chock insulator matter 19; When carrying out the different photoetching process of exposure with layer of material, adopt semi-transparent (Half-tone) or GTG (Gray-tone) technology in the prior art usually; In semi-transparent or GTG technology, the subtle change of exposure can have a strong impact on the result of technology, promptly is easy to occur the unequal problem of height of secondary chock insulator matter, thereby influences the yield of product.
Summary of the invention
Embodiments of the invention provide a kind of color membrane substrates and manufacturing approach thereof, liquid crystal indicator, in order to improve the yield of product.
For achieving the above object, embodiments of the invention adopt following technical scheme:
On the one hand, a kind of color membrane substrates is provided, comprises: black matrix and color film; In the zone, be provided with at least one main chock insulator matter and at least one secondary chock insulator matter at said black matrix; It is characterized in that, between said main chock insulator matter and the said black matrix and with said main chock insulator matter over against the position on, be provided with the layer that increases of predetermined thickness, and the height of said main chock insulator matter and said secondary chock insulator matter is identical.
On the one hand, a kind of manufacturing approach of color membrane substrates is provided, comprises:
Utilize composition technology, on transparency carrier, form black matrix;
Utilize composition technology, on the substrate that forms black matrix, form and increase layer and at least three kinds of filter layers;
Forming on the substrate that said filter layer and said increases layer, makes highly identical main chock insulator matter and secondary chock insulator matter, wherein, said main chock insulator matter be arranged on said increase layer over against the position on.
On the one hand, a kind of liquid crystal indicator is provided, comprises above-mentioned color membrane substrates.
The embodiment of the invention provides a kind of color membrane substrates and manufacturing approach thereof, liquid crystal indicator, between main chock insulator matter and the black matrix and with main chock insulator matter over against the position on, be provided with the layer that increases of predetermined thickness, and the height of main chock insulator matter and secondary chock insulator matter is identical; With plane, transparency carrier place is reference surface; Main chock insulator matter exceeds above-mentioned predetermined thickness than secondary chock insulator matter, and this predetermined thickness is the difference in height of needed main chock insulator matter and secondary chock insulator matter in the prior art, and major and minor chock insulator matter height is identical; Thereby can utilize the photoetching process of common mask plate; With respect to available technology adopting semi-transparent (Half-tone) or GTG (Gray-tone) technology, reduced technology difficulty, improved the yield of product.
Description of drawings
In order to be illustrated more clearly in the embodiment of the invention or technical scheme of the prior art; To do to introduce simply to the accompanying drawing of required use in embodiment or the description of the Prior Art below; Obviously, the accompanying drawing in describing below only is some embodiments of the present invention, for those of ordinary skills; Under the prerequisite of not paying creative work, can also obtain other accompanying drawing according to these accompanying drawings.
Fig. 1 is the sectional view of color membrane substrates in the prior art;
Fig. 2 is the sectional view of color membrane substrates in the embodiment of the invention;
Fig. 3, Fig. 4, Fig. 5 are the synoptic diagram of embodiment of the invention color membrane substrates manufacture process.
Reference numeral:
The 100-color membrane substrates; The 11-transparency carrier; 12-deceives matrix; The color film of 13-; The 131-red filter layer; The green filter layer of 132-; The 133-blue color filter layer; The 16-insulation course; The 17-common electrode layer; 18-master's chock insulator matter; The secondary chock insulator matter of 19-; 21-first increases layer; 22-second increases layer.
Embodiment
To combine the accompanying drawing in the embodiment of the invention below, the technical scheme in the embodiment of the invention is carried out clear, intactly description, obviously, described embodiment only is the present invention's part embodiment, rather than whole embodiment.Based on the embodiment among the present invention, those of ordinary skills are not making the every other embodiment that is obtained under the creative work prerequisite, all belong to the scope of the present invention's protection.
As shown in Figure 2, the embodiment of the invention provides a kind of color membrane substrates 100, comprising: black matrix 12 and color film 13; In the zone, be provided with at least one main chock insulator matter 18 and at least one secondary chock insulator matter 19 at said black matrix 12; Between said main chock insulator matter 18 and the said black matrix 12 and with said main chock insulator matter 18 over against the position on, be provided with the layer that increases of predetermined thickness, and said main chock insulator matter 18 is identical with the height of said secondary chock insulator matter 19.
Wherein, the predetermined thickness that increases layer is the difference in height (d of required main chock insulator matter 18 and secondary chock insulator matter 19 among Fig. 1 preferably
1-d
2).In addition, increasing layer can be that in black matrix material, the materials such as material of making color film any processed.Increase layer through this is set, can guarantee under the situation of main chock insulator matter 18 and secondary chock insulator matter 19 its each self-applyings of performance, to make that the height of major-minor chock insulator matter is identical.Facilitate the photoetching process (only to treat the film of patterning, according to the required photoetching process of removing fully or keeping fully of pattern) of utilizing common mask plate like this and make the major-minor chock insulator matter, thereby reduced technology difficulty, improved the yield of product.
Further, said color membrane substrates 100 also comprises: the insulation course 16 that covers said black matrix 12 and said color film 13;
Between said main chock insulator matter 18 and the said black matrix 12 and with said main chock insulator matter 18 over against the position on; The layer that increases that is provided with predetermined thickness is specially; Between said insulation course 16 and the said black matrix 12 and with said main chock insulator matter 18 over against the position on, be provided with the layer that increases of predetermined thickness.
In embodiments of the present invention; Do not limit to and to increase layer and be arranged on certain fixing one deck; For example, can with increase that layer is provided with between common electrode layer 17 and the insulation course 16 and with main chock insulator matter over against the zone, but after taking all factors into consideration multiple situation such as technology and LCD panel display effect; Preferably, will increase that layer is arranged between insulation course and the black matrix and with main chock insulator matter over against the position.
Further, the said in embodiments of the present invention layer that increases is at least one deck, and the number of plies that increases layer is not limited to the number of plies that increases layer among the embodiment, can consider under the factor conditions such as production cost, manufacturing process complexity the selected number of plies that needs.
Preferably, said color film comprises: three kinds of filter layers of RGB, and the said layer that increases is divided into first and increases layer 21 and second and increase layers 22;
Said first increases layer 21 and first filter layer for layer, and said second increases layer 22 and second filter layer for together layer, and wherein, said first filter layer and said second filter layer are any two kinds in said three kinds of filter layers.
In embodiments of the present invention; Said first increases layer 21 and first filter layer for be meant the material film that adopts first filter layer with layer; And use the composition technology of common mask plate; The layer and first filter layer are increased in this Thinfilm pattern formation first, because both are with layer, so first increase the thickness that layers 21 thickness equals first filter layer; Said second increases layer 22 and second filter layer for be meant the material film that adopts second filter layer with layer; And use the composition technology of common mask plate; The layer and second filter layer are increased in this Thinfilm pattern formation second; Because both are with layer, so second increase the thickness that layers 22 thickness equals second filter layer.Consider that the predetermined thickness that increases layer is the required main chock insulator matter of prior art and the difference in height of secondary chock insulator matter; With the thickness of two-layer filter layer about equally; Increase layer so adopt in embodiments of the present invention to make with the method for layer making with two-layer filter layer respectively, can reduce technologic complicacy like this.
The embodiment of the invention provides a kind of method of making color membrane substrates, this method comprise at least S1, S2, and three steps of S3 realize.
S1, as shown in Figure 3 utilizes composition technology, on transparency carrier 11, forms black matrix 12;
S2, utilize composition technology, on the substrate that forms black matrix 12, form and increase layer and at least three kinds of filter layers; In embodiments of the present invention; The number of plies that forms filter layer is at least three layers, that is to say, is forming on the color membrane substrates outside red filter layer, green filter layer, the blue color filter layer; The filter layer of other colors can also be on color membrane substrates, formed, for example white filter layer etc. can also be formed.
In embodiments of the present invention; Filter layer to form three kinds of colors of RGB is an example; As shown in Figure 4, three kinds of filter layers are respectively red filter layer 131, green filter layer 132, blue color filter layer 133, and putting in order in diagram of these three kinds of filter layers is the example as description scheme; Though and three kinds of filter layers of series arrangement in the diagram, three kinds of filter layers in the same pixel of not representing to be meant; That is to say that three kinds of filter layers in the diagram can be in the same pixel, also can be in the different pixels.
Preferably; Increase layer and specifically comprise forming on the substrate that forms black matrix with at least three kinds of filter layers: patterning with the process that forms any two kinds of filter layers in, will cover filter material on the black matrix and keep and increase layer in that the corresponding zone of main chock insulator matter is set with formation.
Concrete, like Fig. 4, when the order that forms three kinds of filter layers is red filter layer, green filter layer, blue color filter layer successively, and select red filter layer and green filter layer any two kinds of filter layers for use as said three kinds of filter layers; Then this step specifically can be, deposit red filter material on the substrate of completing steps S1, and utilize composition technology to form red filter layer 131 and first and increase layer 21; Continue the green filter material of deposition, and utilize composition technology to form green filter layer 132 and second and increase layer 22; Continue deposition blue color filter layer material, and utilize composition technology to form blue color filter layer 133.This concrete grammar is just for reference as an example.
Visible from above-mentioned manufacturing approach, on the substrate that is formed with black matrix, form in the filter layer process, realized that simultaneously method step is comparatively simple, is a kind of preferred manufacturing approach to increasing the setting of layer.Other manufacturing approaches can certainly be arranged, for example, increase in setting shown in Figure 4 on the position of layer, utilize black matrix material to make and increase layer, continue also can accomplish the manufacturing of color membrane substrates according to following steps.
Need to prove, cover the area that the filter material in the corresponding zone of main chock insulator matter is set on the black matrix, can equate with the cross-sectional area of main chock insulator matter with approximate, or greater than the cross-sectional area of main chock insulator matter;
S3, forming on the substrate that said filter layer and said increases layer, makes highly identical main chock insulator matter and secondary chock insulator matter, wherein, said main chock insulator matter be arranged on said increase layer over against the position on.When making highly identical major-minor chock insulator matter, need with main chock insulator matter 18 be arranged on increase layer over against the position on, the setting of secondary chock insulator matter 19 is consistent with prior art, be arranged on black matrix that not setting increases layer over against the zone in.In embodiments of the present invention the cross-sectional area of main chock insulator matter 18 and secondary chock insulator matter 19 is not done qualification, according to actual needs, the cross-sectional area of major-minor chock insulator matter can be the same or different.In addition, because of color membrane substrates has polytype, for example do not have common electrode layer on some color membrane substrates, the implementation method of making polytype color membrane substrates also has a variety of.
Further, as shown in Figure 5 before S3 in making the process of color membrane substrates, make insulation course 16 and common electrode layer 17 being formed with on the substrate that said filter layer and said increases layer.
As shown in Figure 2, on being formed with the substrate that said filter layer and said increases layer, make after insulation course 16 and the common electrode layer 17.On said common electrode layer 17, make highly identical main chock insulator matter 18 and secondary chock insulator matter 19, wherein, said main chock insulator matter 18 be arranged on said increase layer over against the position on.
In above-mentioned each step, all need pass through technological processs such as deposition, exposure, development.
In the color membrane substrates and manufacturing approach thereof that provides in embodiments of the present invention; Through between main chock insulator matter and the black matrix and with main chock insulator matter over against the position on; Be provided with the layer that increases of predetermined thickness, and the height of main chock insulator matter and secondary chock insulator matter is identical, so just can uses the photoetching process of common mask plate to make the major-minor chock insulator matter; With respect to available technology adopting semi-transparent (Half-tone) or GTG (Gray-tone) technology, reduced technology difficulty; And, utilize common mask plate can solve the uneven problem of height when making the major-minor chock insulator matter, improved the yield of product.
The embodiment of the invention also provides a kind of liquid crystal indicator, comprises the color membrane substrates that provides in the foregoing description, and this coloured silk film can be above-mentioned arbitrary color membrane substrates.Concrete, this color membrane substrates comprises: black matrix and color film; In the zone, be provided with at least one main chock insulator matter and at least one secondary chock insulator matter at said black matrix; Between said main chock insulator matter and the said black matrix and with said main chock insulator matter over against the position on, be provided with the layer that increases of predetermined thickness, and the height of said main chock insulator matter and said secondary chock insulator matter is identical.
This liquid crystal indicator can be to comprise the color membrane substrates of box shaping and the display panels of array base palte, and this liquid crystal indicator can also be the LCD that on the basis of this display panels, further comprises backlight.
The above; Be merely embodiment of the present invention, but protection scope of the present invention is not limited thereto, any technician who is familiar with the present technique field is in the technical scope that the present invention discloses; Can expect easily changing or replacement, all should be encompassed within protection scope of the present invention.Therefore, protection scope of the present invention should be as the criterion with the protection domain of said claim.
Claims (8)
1. a color membrane substrates comprises: black matrix and color film; In the zone, be provided with at least one main chock insulator matter and at least one secondary chock insulator matter at said black matrix; It is characterized in that, between said main chock insulator matter and the said black matrix and with said main chock insulator matter over against the position on, be provided with the layer that increases of predetermined thickness, and the height of said main chock insulator matter and said secondary chock insulator matter is identical.
2. color membrane substrates according to claim 1 is characterized in that, said color membrane substrates also comprises: the insulation course that covers said black matrix and said color film;
Between said main chock insulator matter and the said black matrix and with said main chock insulator matter over against the position on, be provided with predetermined thickness increase the layer be specially,
Between said insulation course and the said black matrix and with said main chock insulator matter over against the position on, be provided with the layer that increases of predetermined thickness.
3. color membrane substrates according to claim 1 is characterized in that, the said layer that increases is at least one deck.
4. according to the described color membrane substrates of each claim of claim 1～3, it is characterized in that said color film comprises: three kinds of filter layers of RGB, the said layer that increases is divided into first and increases layer and second increase layer;
Said first increases layer and first filter layer for layer, and said second increases layer and second filter layer for together layer, and said first filter layer and said second filter layer are any two kinds in said three kinds of filter layers.
5. the manufacturing approach of a color membrane substrates is characterized in that, comprising:
Utilize composition technology, on transparency carrier, form black matrix;
Utilize composition technology, on the substrate that forms black matrix, form and increase layer and at least three kinds of filter layers;
Forming on the substrate that said filter layer and said increases layer, makes highly identical main chock insulator matter and secondary chock insulator matter, said main chock insulator matter be arranged on said increase layer over against the position on.
6. method according to claim 5 is characterized in that, said on the substrate that forms black matrix, formation increases layer and comprise with at least three kinds of filter layers:
Patterning with the process that forms any two kinds of filter layers in, will cover filter material on the black matrix and keep and increase layer in that the corresponding zone of main chock insulator matter is set with formation.
7. according to claim 5 or 6 described methods, it is characterized in that said method also comprises:
Make insulation course and/or common electrode layer being formed with on the substrate that said filter layer and said increases layer.
8. a liquid crystal indicator is characterized in that, comprises each described color membrane substrates of claim 1～4.
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Cited By (13)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN103018970A (en) * | 2012-12-14 | 2013-04-03 | 京东方科技集团股份有限公司 | Display substrate, liquid crystal display panel and liquid crystal display device |
| CN104006330A (en) * | 2014-05-08 | 2014-08-27 | 深圳市华星光电技术有限公司 | Backlight module, display device and driving method thereof |
| CN104298010A (en) * | 2014-08-28 | 2015-01-21 | 合肥京东方光电科技有限公司 | Display substrate, display substrate manufacturing method and display device |
| CN104503151A (en) * | 2014-12-19 | 2015-04-08 | 深圳市华星光电技术有限公司 | Liquid crystal display device |
| CN106033164A (en) * | 2015-03-20 | 2016-10-19 | 南京瀚宇彩欣科技有限责任公司 | Display device |
| CN106125412A (en) * | 2016-08-31 | 2016-11-16 | 武汉华星光电技术有限公司 | Display panels |
| CN106292042A (en) * | 2015-05-29 | 2017-01-04 | 鸿富锦精密工业（深圳）有限公司 | Colored filter substrate and manufacture method thereof |
| CN106990619A (en) * | 2016-01-11 | 2017-07-28 | 三星显示有限公司 | Display device |
| CN107688254A (en) * | 2017-10-11 | 2018-02-13 | 深圳市华星光电半导体显示技术有限公司 | COA type liquid crystal display panels and preparation method thereof |
| CN108681142A (en) * | 2018-05-22 | 2018-10-19 | 惠科股份有限公司 | A kind of production method of display panel |
| WO2019071682A1 (en) * | 2017-10-13 | 2019-04-18 | 深圳市华星光电半导体显示技术有限公司 | Method for preparing spacer in liquid crystal display panel and liquid crystal display panel |
| CN111176027A (en) * | 2020-02-20 | 2020-05-19 | Tcl华星光电技术有限公司 | Liquid crystal display panel and preparation method thereof |
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| CN103018970A (en) * | 2012-12-14 | 2013-04-03 | 京东方科技集团股份有限公司 | Display substrate, liquid crystal display panel and liquid crystal display device |
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| CN107688254A (en) * | 2017-10-11 | 2018-02-13 | 深圳市华星光电半导体显示技术有限公司 | COA type liquid crystal display panels and preparation method thereof |
| WO2019071682A1 (en) * | 2017-10-13 | 2019-04-18 | 深圳市华星光电半导体显示技术有限公司 | Method for preparing spacer in liquid crystal display panel and liquid crystal display panel |
| CN108681142A (en) * | 2018-05-22 | 2018-10-19 | 惠科股份有限公司 | A kind of production method of display panel |
| CN111176027A (en) * | 2020-02-20 | 2020-05-19 | Tcl华星光电技术有限公司 | Liquid crystal display panel and preparation method thereof |
| CN113741103A (en) * | 2021-08-12 | 2021-12-03 | 信利（惠州）智能显示有限公司 | Method for improving unstable bright spot abnormality of TN type TFT-LCD display |
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Application publication date: 20120905 |