CN106773278A - Colored optical filtering substrates and preparation method thereof, liquid crystal display panel - Google Patents
Colored optical filtering substrates and preparation method thereof, liquid crystal display panel Download PDFInfo
- Publication number
- CN106773278A CN106773278A CN201710203378.5A CN201710203378A CN106773278A CN 106773278 A CN106773278 A CN 106773278A CN 201710203378 A CN201710203378 A CN 201710203378A CN 106773278 A CN106773278 A CN 106773278A
- Authority
- CN
- China
- Prior art keywords
- chock insulator
- insulator matter
- optical filtering
- protective layer
- colored optical
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
- G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
Landscapes
- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Optical Filters (AREA)
Abstract
The invention discloses a kind of colored optical filtering substrates, including underlay substrate and the black matrix" that is formed on underlay substrate, multiple subpixel areas are separated out between the black matrix", chromatic photoresist is formed with each subpixel area；Wherein, planarization protective layer is provided with the chromatic photoresist, main chock insulator matter and auxiliary chock insulator matter is provided with the planarization protective layer raisedly, the main chock insulator matter and auxiliary chock insulator matter is located relatively at the surface between black matrix"；The main chock insulator matter and auxiliary chock insulator matter are transparent photoresist with the material of the planarization protective layer, and the main chock insulator matter and auxiliary chock insulator matter and the planarization protective layer are integrally formed structures.The invention also discloses the preparation method of colored optical filtering substrates as described above, on the underlay substrate with chromatic photoresist, integrally formed planarization protective layer, main chock insulator matter and auxiliary chock insulator matter are prepared using single exposure technique.The invention also discloses the liquid crystal display panel comprising colored optical filtering substrates as described above.
Description
Technical field
The present invention relates to display technology field, more particularly to a kind of colored optical filtering substrates and preparation method thereof, further relate to
Display device comprising the colored optical filtering substrates.
Background technology
Liquid crystal display (LCD, Liquid Crystal Display) has thin fuselage, power saving, radiationless etc. numerous excellent
Point, is widely used.Liquid crystal display major part on existing market is backlight liquid crystal display, and it includes liquid crystal
Display panel and backlight module.Usual liquid crystal display panel is by colored optical filtering substrates (CF, ColorFilter), thin film transistor (TFT)
Array base palte (Array), the liquid crystal layer being sandwiched between colored optical filtering substrates and thin film transistor base plate and sealing glue frame composition.Its
In, thickness of liquid crystal layer is the main chock insulator matter by being arranged between array base palte and colored optical filtering substrates of box thickness (Cell Gap)
The height of (Post Spacer, PS) is controlled, and thickness of liquid crystal layer has to the structural parameters and display quality of liquid crystal display
Important influence.
At present, in liquid crystal display panel, it will usually using chock insulator matters more than two types, such as in colorized optical filtering base
Main chock insulator matter (Main PS) and auxiliary chock insulator matter (Sub PS) are set on plate, play a part of multi-buffer, to prevent various Mura
Or bad generation.Wherein, the height of main chock insulator matter more than auxiliary chock insulator matter height, the quantity of auxiliary chock insulator matter more than it is main every
The quantity of underbed, both need to be formed by different process.After liquid crystal panel is into box, main chock insulator matter has certain compression
Amount, supporting case is thick, in compressive state, and aids in the chock insulator matter not have decrement.When liquid crystal panel is subject to excessive external force,
Auxiliary chock insulator matter is just compressed, and plays Auxiliary support effect.
In the prior art, the preparation technology of colored optical filtering substrates mainly includes：First by a patterning processes in substrate
Black matrix is formed on substrate；On black matrix, three patterning processes are carried out successively, red color resistance, green color blocking are formed respectively
And blue color blocking；Planarization protective layer (Over Coat) is formed in red color resistance, green color blocking and blue color blocking afterwards；Most
Afterwards main chock insulator matter and auxiliary chock insulator matter are formed on planarization protective layer by one to patterning processes twice.
Colored optical filtering substrates are prepared by multiple patterning processes (light shield technique) and several coating techniques, each
Include the techniques such as mask, exposure, development, etching and stripping in secondary patterning processes respectively again, wherein etching technics includes that dry method is carved
Erosion and wet etching.Process in production technology is carried out to simplify treatment, is the technology difficulty for reducing colored optical filtering substrates
And cost-effective important means.
The content of the invention
In view of this, the invention provides a kind of colored optical filtering substrates and preparation method thereof, by colored optical filtering substrates
Structure improvement, reduce the technology difficulty of its preparation method, save production cost.
To achieve these goals, present invention employs following technical scheme：
A kind of colored optical filtering substrates, including underlay substrate and the black matrix" that is formed on the underlay substrate, it is described
Multiple subpixel areas are separated out between black matrix", chromatic photoresist is formed with each subpixel area；Wherein, the chromatic photoresist
On be provided with planarization protective layer, main chock insulator matter and auxiliary chock insulator matter, the master are provided with the planarization protective layer raisedly
Chock insulator matter and auxiliary chock insulator matter are located relatively at the surface of the black matrix"；The main chock insulator matter and auxiliary chock insulator matter are flat with described
The material for changing protective layer is transparent photoresist, and the main chock insulator matter and auxiliary chock insulator matter and the planarization protective layer are one
The structure of shaping.
Wherein, the raised height from the planarization protective layer of the main chock insulator matter is 5~8 μm, the auxiliary chock insulator matter
Raised height is 3~6 μm from the planarization protective layer, and the thickness of the planarization protective layer is 2~5 μm, the master
Height of the height of chock insulator matter more than the auxiliary chock insulator matter.
Wherein, the cross section of the main chock insulator matter and auxiliary chock insulator matter is circle, and longitudinal section is trapezoidal.
Wherein, the subpixel area is arranged to red sub-pixel, green sub-pixels or blue subpixels, the red
Chromatic photoresist in sub-pixel is red photoresistance, and the chromatic photoresist in the green sub-pixels is green photoresistance, the blue son
Chromatic photoresist in pixel is blue light resistance.
Present invention also offers a kind of preparation method of colored optical filtering substrates, the method includes：With chromatic photoresist
On underlay substrate, integrally formed planarization protective layer, main chock insulator matter and auxiliary chock insulator matter are prepared using single exposure technique；
The step is specifically included：
Transparent photoresist layer is formed on the underlay substrate with chromatic photoresist；
One light shield is provided, the transparent photoresist layer is exposed using the light shield；Wherein, the light shield includes
First transparent area, the second transparent area and the 3rd transparent area, the light penetration of first transparent area are more than second printing opacity
The light penetration in area, the light penetration of the light penetration more than the 3rd transparent area of second transparent area；
Transparent photoresist layer after to exposure is developed, and obtains described in the position corresponding to the 3rd transparent area
Planarization protective layer, obtains the main chock insulator matter, saturating corresponding to described second in the position corresponding to first transparent area
The position in light area obtains the auxiliary chock insulator matter.
Specifically, the method comprising the steps of：S1, one underlay substrate of offer simultaneously clean the underlay substrate；S2, in substrate base
On plate black matrix" is prepared using a patterning processes；S3, on the black matrix" using multiple patterning processes prepare
Obtain chromatic photoresist；S4, on the underlay substrate with chromatic photoresist, prepared using single exposure technique integrally formed
Planarization protective layer, main chock insulator matter and auxiliary chock insulator matter；Wherein, the main chock insulator matter and auxiliary chock insulator matter are located relatively at described black respectively
The surface of colour moment battle array.
Wherein, the raised height from the planarization protective layer of the main chock insulator matter is 5~8 μm, the auxiliary chock insulator matter
Raised height is 3~6 μm from the planarization protective layer, and the thickness of the planarization protective layer is 2~5 μm, the master
Height of the height of chock insulator matter more than the auxiliary chock insulator matter.
Wherein, step S3 is specifically included：The red photoresistance of acquisition, green photoresistance and indigo plant are sequentially prepared using three patterning processes
Coloured light hinders.
Wherein, the cross section of the main chock insulator matter and auxiliary chock insulator matter is circle, and longitudinal section is trapezoidal.
Another aspect of the present invention is to provide a kind of liquid crystal display panel, it include the colored optical filtering substrates that are oppositely arranged and
Thin-film transistor array base-plate, liquid crystal molecule is provided between the colored optical filtering substrates and thin-film transistor array base-plate, its
In, the colored optical filtering substrates use colored optical filtering substrates as described above.
The colored optical filtering substrates provided in the one of embodiment of the present invention, planarization protective layer therein, main chock insulator matter
Prepared using transparent photoresist with auxiliary chock insulator matter and to be formed and be integrally formed structure, planarization protective layer, main chock insulator matter
Prepared by single exposure technique with auxiliary chock insulator matter, simplify the processing step of colored optical filtering substrates, reduce technique difficult
Degree, saves production cost.In addition, the main chock insulator matter and auxiliary chock insulator matter and the planarization protective layer are integrally formed knots
Connection between structure, main chock insulator matter and auxiliary chock insulator matter and planarization protective layer is more consolidated, in colored optical filtering substrates and film crystal
Pipe array base palte is formed after liquid crystal cell to box, the stabilization of main chock insulator matter and auxiliary chock insulator matter with bigger support strength and Geng Gao
Property.
Brief description of the drawings
Fig. 1 is the cross-sectional view of colored optical filtering substrates provided in an embodiment of the present invention；
Fig. 2 is the overlooking the structure diagram of colored optical filtering substrates provided in an embodiment of the present invention；
In the preparation method of the colored optical filtering substrates in Fig. 3 a- Fig. 3 h embodiment of the present invention, the device that each step is obtained
The graphical representation of exemplary of structure；
Fig. 4 is the structural representation of liquid crystal display panel provided in an embodiment of the present invention.
Specific embodiment
To make the object, technical solutions and advantages of the present invention clearer, below in conjunction with the accompanying drawings to specific reality of the invention
The mode of applying is described in detail.The example of these preferred embodiments is illustrated in the accompanying drawings.Shown in accompanying drawing and according to
What the embodiments of the present invention of Description of Drawings were merely exemplary, and the present invention is not limited to these implementation methods.
Here, also, it should be noted that in order to avoid having obscured the present invention because of unnecessary details, in the accompanying drawings only
Structure and/or the process step closely related with scheme of the invention is shown, and is eliminated little with relation of the present invention
Other details.
The present embodiment provide firstly a kind of colored optical filtering substrates, and refering to Fig. 1 and Fig. 2, the colored optical filtering substrates include
Multiple sub-pixel areas are separated out between underlay substrate 1 and the black matrix" 2 being formed on the underlay substrate 1, the black matrix" 2
Domain, is formed with chromatic photoresist 3 in each subpixel area.Planarization protective layer 4 is provided with the chromatic photoresist 3, it is described flat
Main chock insulator matter 5 and auxiliary chock insulator matter 6 are provided with smoothization protective layer 4 raisedly, the main chock insulator matter 5 and auxiliary chock insulator matter 6 are with respect to position
In the surface of the black matrix" 2.The main chock insulator matter 5 and auxiliary chock insulator matter 6 are with the material of the planarization protective layer 4
Transparent photoresist, the main chock insulator matter 5 and auxiliary chock insulator matter 6 are integrally formed structures with the planarization protective layer 4.
Specifically, the underlay substrate 1 can be rigid glass substrate, or flexible base board, e.g. by PC
The flexible base board that (polycarbonate, Polycarbonate) material is made.The material of the black matrix" 2 can be resin, chromium, oxygen
Change chromium or nitrogen oxygen chromaking and thing.Cover in the subpixel area that the chromatic photoresist 3 is separated out between being arranged on black matrix" 2 and part
Lid black matrix" 2, two adjacent adjoining positions of chromatic photoresist 3 are located on black matrix" 2.
Display device is typically to mix to realize the display effect of different color by R, G, B are trichromatic, therefore, such as Fig. 1
With shown in Fig. 2, the subpixel area being separated out between the black matrix" 2 is arranged to red sub-pixel, green sub-pixels or blueness
Sub-pixel, the chromatic photoresist 3R in the red sub-pixel is red photoresistance, and the chromatic photoresist 3G in the green sub-pixels is
Green photoresistance, the chromatic photoresist 3B in the blue subpixels is blue light resistance.
The present embodiment provide colored optical filtering substrates from unlike traditional colored optical filtering substrates, in the present embodiment, institute
It is integrally formed structure that main chock insulator matter 5 and auxiliary chock insulator matter 6 are stated with the planarization protective layer 4, i.e. preparing planarization protection
Layer 4 prepares main chock insulator matter 5 and auxiliary chock insulator matter 6 simultaneously, simplifies the processing step of colored optical filtering substrates, reduces technique difficult
Degree, saves production cost.And the main chock insulator matter 5 and auxiliary chock insulator matter 6 and the planarization protective layer 4 are integrally formed
Connection between structure, main chock insulator matter 5 and auxiliary chock insulator matter 6 and planarization protective layer 4 is more consolidated, and improves stability.
Wherein, the thickness of the planarization protective layer can select to be 2~5 μm that the main chock insulator matter 5 is from the planarization
Raised height can select to be 5~8 μm on protective layer 4, and the auxiliary chock insulator matter 6 planarizes projection on protective layer 4 from described
Height can select to be 3~6 μm.And the height of the main chock insulator matter 5 is more than the height of the auxiliary chock insulator matter 6.Further,
In the present embodiment, as depicted in figs. 1 and 2, the cross section of the main chock insulator matter 5 and auxiliary chock insulator matter 6 is respectively circle, longitudinal section point
Wei not be trapezoidal.It should be noted that exemplarily only showing several main chock insulator matters 5 and auxiliary chock insulator matter 6 in Fig. 1 and Fig. 2.
The present embodiment additionally provides the preparation method of colored optical filtering substrates as described above, refering to Fig. 3 a- Fig. 3 h, the method
Including step：
S1, as shown in Figure 3 a, is provided a underlay substrate 1 and is cleaned up the underlay substrate 1 using detergent first.
S2, as shown in Figure 3 b, black matrix" 2 is prepared on the underlay substrate 1 using a patterning processes, described
Multiple subpixel area 2a are separated out between black matrix" 2.
S3, refering to Fig. 3 c-3e, prepare chromatic photoresist 3 using multiple patterning processes on the black matrix" 2.Should
Step is specifically included：
S31, as shown in Figure 3 c, red photoresistance 3R, red light are prepared using a patterning processes on black matrix" 2
Resistance 3R is formed in corresponding subpixel area 2a；
S32, as shown in Figure 3 d, reapplies a patterning processes and green photoresistance 3G is prepared on black matrix" 2, green
Photoresistance 3G is formed in corresponding subpixel area 2a；
S33, as shown in Figure 3 e, reapplies a patterning processes and blue light resistance 3B is prepared on black matrix" 2, blue
Photoresistance 3B is formed in corresponding subpixel area 2a.
S4, refering to Fig. 3 f-3h, on the underlay substrate 1 with chromatic photoresist 3, prepared using single exposure technique
Integrally formed planarization protective layer 4, main chock insulator matter 5 and auxiliary chock insulator matter 6.The step is specifically included：
S41, as illustrated in figure 3f, forms transparent photoresist layer 7 on the underlay substrate 1 with chromatic photoresist 3.It is described
Bright photoresist layer 7 covers the correspondence red photoresistance of the chromatic photoresist 3 3R, green photoresistance 3G and blue light resistance 3B.
S42, as shown in figure 3g a, there is provided light shield 8 is right from the top of the transparent photoresist layer 7 using the light shield 8
The transparent photoresist layer 7 is exposed, and dotted arrow represents exposure light in accompanying drawing 3g.Wherein, the light shield 8 includes the
One transparent area 81, the second transparent area 82 and the 3rd transparent area 83, the light penetration of first transparent area 81 is more than described the
The light penetration of two transparent areas 82, the light of the light penetration more than the 3rd transparent area 83 of second transparent area 82
Transmitance.Wherein, the transparent area 82 of first transparent area 81 and second is located relatively at the surface of the black matrix" 2.
S43, as illustrated in figure 3h, to exposure after transparent photoresist layer 7 develop, corresponding to the 3rd printing opacity
The position in area 83 obtains the planarization protective layer 4, and the main dottle pin is obtained in the position corresponding to first transparent area 81
Thing 5, the auxiliary chock insulator matter 6 is obtained in the position corresponding to second transparent area 82.Wherein, the main chock insulator matter 5 and it is auxiliary every
Underbed 6 is located relatively at the surface of the black matrix" 2 respectively.
In preparation method above, planarization protective layer, main chock insulator matter and auxiliary chock insulator matter are prepared by single exposure technique
Obtain, be compared to prior art, this process simplify the processing step of colored optical filtering substrates, reduce technology difficulty, save
Production cost.
It should be noted that in the preparation method of the above, including mask, exposure in patterning processes respectively again each time, showing
The techniques such as shadow, etching and stripping, wherein etching technics include dry etching and wet etching.Patterning processes have been existing ratios
More ripe technology, herein not reinflated detailed description.
In addition, the present embodiment additionally provides a kind of liquid crystal display panel, as shown in figure 4, the liquid crystal display panel includes
The thin-film transistor array base-plate 100 and colored optical filtering substrates 200 being oppositely arranged, the He of the thin-film transistor array base-plate 100
Liquid crystal molecule 300 is provided between the colored optical filtering substrates 200.Wherein, the colored optical filtering substrates 200 use the present embodiment
Foregoing provided colored optical filtering substrates.
In sum, colored optical filtering substrates for being provided in the embodiment of the present invention and preparation method thereof, planarization therein is protected
Sheath, main chock insulator matter and auxiliary chock insulator matter are prepared using transparent photoresist and to be formed and be integrally formed structure, and planarization is protected
Sheath, main chock insulator matter and auxiliary chock insulator matter are prepared by single exposure technique, simplify the processing step of colored optical filtering substrates,
Technology difficulty is reduced, production cost is saved.In addition, the main chock insulator matter and auxiliary chock insulator matter are with the planarization protective layer
Connection between integrally formed structure, main chock insulator matter and auxiliary chock insulator matter and planarization protective layer is more consolidated, in colorized optical filtering
Substrate is formed after liquid crystal cell with film transistor array base palte to box, and main chock insulator matter and auxiliary chock insulator matter have bigger support strength
Stability higher.
It should be noted that herein, such as first and second or the like relational terms are used merely to a reality
Body or operation make a distinction with another entity or operation, and not necessarily require or imply these entities or deposited between operating
In any this actual relation or order.And, term " including ", "comprising" or its any other variant be intended to
Nonexcludability is included, so that process, method, article or equipment including a series of key elements not only will including those
Element, but also other key elements including being not expressly set out, or also include being this process, method, article or equipment
Intrinsic key element.In the absence of more restrictions, the key element limited by sentence "including a ...", it is not excluded that
Also there is other identical element in process, method, article or equipment including the key element.
The above is only the specific embodiment of the application, it is noted that for the ordinary skill people of the art
For member, on the premise of the application principle is not departed from, some improvements and modifications can also be made, these improvements and modifications also should
It is considered as the protection domain of the application.
Claims (10)
1. a kind of colored optical filtering substrates, including underlay substrate and the black matrix" being formed on the underlay substrate are described black
Multiple subpixel areas are separated out between colour moment battle array, chromatic photoresist is formed with each subpixel area；Characterized in that, the colour
Planarization protective layer is provided with photoresistance, main chock insulator matter and auxiliary chock insulator matter, institute is provided with the planarization protective layer raisedly
State main chock insulator matter and auxiliary chock insulator matter is located relatively at the surface of the black matrix"；
Wherein, the main chock insulator matter and auxiliary chock insulator matter are transparent photoresist with the material of the planarization protective layer, described
Main chock insulator matter and auxiliary chock insulator matter and the planarization protective layer are integrally formed structures.
2. colored optical filtering substrates according to claim 1, it is characterised in that the main chock insulator matter is from the planarization protection
Raised height is 5~8 μm on layer, and the raised height from the planarization protective layer of the auxiliary chock insulator matter is 3~6 μm, institute
The thickness for stating planarization protective layer is 2~5 μm, the height of the height more than the auxiliary chock insulator matter of the main chock insulator matter.
3. colored optical filtering substrates according to claim 1 and 2, it is characterised in that the main chock insulator matter and auxiliary chock insulator matter
Cross section is circle, and longitudinal section is trapezoidal.
4. colored optical filtering substrates according to claim 1, it is characterised in that the subpixel area is arranged to red son
Pixel, green sub-pixels or blue subpixels, the chromatic photoresist in the red sub-pixel are red photoresistance, the green sub- picture
Chromatic photoresist in element is green photoresistance, and the chromatic photoresist in the blue subpixels is blue light resistance.
5. a kind of preparation method of colored optical filtering substrates, it is characterised in that the method includes：In the substrate base with chromatic photoresist
On plate, integrally formed planarization protective layer, main chock insulator matter and auxiliary chock insulator matter are prepared using single exposure technique；The step
Specifically include：
Transparent photoresist layer is formed on the underlay substrate with chromatic photoresist；
One light shield is provided, the transparent photoresist layer is exposed using the light shield；Wherein, the light shield includes first
Transparent area, the second transparent area and the 3rd transparent area, the light penetration of first transparent area is more than second transparent area
Light penetration, the light penetration of the light penetration more than the 3rd transparent area of second transparent area；
Transparent photoresist layer after to exposure is developed, and obtains described flat in the position corresponding to the 3rd transparent area
Change protective layer, the main chock insulator matter is obtained in the position corresponding to first transparent area, corresponding to second transparent area
Position obtain the auxiliary chock insulator matter.
6. colored optical filtering substrates according to claim 5, it is characterised in that the method comprising the steps of：
S1, one underlay substrate of offer simultaneously clean the underlay substrate；
S2, on underlay substrate prepare black matrix" using a patterning processes；
S3, on the black matrix" prepare chromatic photoresist using multiple patterning processes；
S4, on the underlay substrate with chromatic photoresist, using single exposure technique prepare it is integrally formed planarization protect
Sheath, main chock insulator matter and auxiliary chock insulator matter；Wherein, the main chock insulator matter and auxiliary chock insulator matter are located relatively at the black matrix" respectively
Surface.
7. the preparation method of colored optical filtering substrates according to claim 6, it is characterised in that the main chock insulator matter is from described
Raised height is 5~8 μm on planarization protective layer, and the raised height from the planarization protective layer of the auxiliary chock insulator matter is
3~6 μm, the thickness of the planarization protective layer is 2~5 μm, the height of the height more than the auxiliary chock insulator matter of the main chock insulator matter
Degree.
8. the preparation method of colored optical filtering substrates according to claim 6, it is characterised in that step S3 is specifically included：Should
The red photoresistance of acquisition, green photoresistance and blue light resistance are sequentially prepared with three patterning processes.
9. according to the preparation method of any described colored optical filtering substrates of claim 5-8, it is characterised in that the main chock insulator matter
It is circle with the cross section of auxiliary chock insulator matter, longitudinal section is trapezoidal.
10. a kind of liquid crystal display panel, including the colored optical filtering substrates and thin-film transistor array base-plate being oppositely arranged, the coloured silk
Liquid crystal molecule is provided between color optical filtering substrate and thin-film transistor array base-plate, it is characterised in that the colored optical filtering substrates
Using any described colored optical filtering substrates of the claims 1-4.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710203378.5A CN106773278A (en) | 2017-03-30 | 2017-03-30 | Colored optical filtering substrates and preparation method thereof, liquid crystal display panel |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710203378.5A CN106773278A (en) | 2017-03-30 | 2017-03-30 | Colored optical filtering substrates and preparation method thereof, liquid crystal display panel |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN106773278A true CN106773278A (en) | 2017-05-31 |
Family
ID=58965518
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201710203378.5A Pending CN106773278A (en) | 2017-03-30 | 2017-03-30 | Colored optical filtering substrates and preparation method thereof, liquid crystal display panel |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN106773278A (en) |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107121812A (en) * | 2017-06-14 | 2017-09-01 | 合肥市惠科精密模具有限公司 | A kind of TFT LCD liquid crystal display panels and preparation method thereof |
| CN107195664A (en) * | 2017-06-14 | 2017-09-22 | 合肥市惠科精密模具有限公司 | A kind of correction formula AMOLED display panels |
| CN107422521A (en) * | 2017-09-19 | 2017-12-01 | 京东方科技集团股份有限公司 | A kind of color membrane substrates and preparation method thereof, display panel |
| CN107463018A (en) * | 2017-07-06 | 2017-12-12 | 惠科股份有限公司 | A kind of display panel and manufacture method |
| CN107688254A (en) * | 2017-10-11 | 2018-02-13 | 深圳市华星光电半导体显示技术有限公司 | COA type liquid crystal display panels and preparation method thereof |
| CN107706226A (en) * | 2017-10-18 | 2018-02-16 | 京东方科技集团股份有限公司 | Opposite substrate, its preparation method, organic electroluminescence display panel and display device |
| CN108803122A (en) * | 2018-06-21 | 2018-11-13 | 武汉华星光电技术有限公司 | A kind of color membrane substrates and preparation method thereof, display panel |
| WO2020073386A1 (en) * | 2018-10-08 | 2020-04-16 | 惠科股份有限公司 | Display panel and manufacturing method |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104330926A (en) * | 2014-12-02 | 2015-02-04 | 合肥京东方光电科技有限公司 | Display substrate as well as manufacturing method and display panel |
| CN104730607A (en) * | 2015-04-13 | 2015-06-24 | 京东方科技集团股份有限公司 | Color filter, manufacturing method thereof and display device |
| CN105093640A (en) * | 2015-07-28 | 2015-11-25 | 武汉华星光电技术有限公司 | Color filter and manufacturing method thereof |
| CN105116601A (en) * | 2015-09-16 | 2015-12-02 | 武汉华星光电技术有限公司 | Color film substrate and manufacturing method thereof |
| US20160342018A1 (en) * | 2014-12-30 | 2016-11-24 | Shenzhen China Star Optoelectronics Technology Co., Ltd. | Manufacturing Method of a Color Filter Substrate |
-
2017
- 2017-03-30 CN CN201710203378.5A patent/CN106773278A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104330926A (en) * | 2014-12-02 | 2015-02-04 | 合肥京东方光电科技有限公司 | Display substrate as well as manufacturing method and display panel |
| US20160342018A1 (en) * | 2014-12-30 | 2016-11-24 | Shenzhen China Star Optoelectronics Technology Co., Ltd. | Manufacturing Method of a Color Filter Substrate |
| CN104730607A (en) * | 2015-04-13 | 2015-06-24 | 京东方科技集团股份有限公司 | Color filter, manufacturing method thereof and display device |
| CN105093640A (en) * | 2015-07-28 | 2015-11-25 | 武汉华星光电技术有限公司 | Color filter and manufacturing method thereof |
| CN105116601A (en) * | 2015-09-16 | 2015-12-02 | 武汉华星光电技术有限公司 | Color film substrate and manufacturing method thereof |
Cited By (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107195664A (en) * | 2017-06-14 | 2017-09-22 | 合肥市惠科精密模具有限公司 | A kind of correction formula AMOLED display panels |
| CN107121812A (en) * | 2017-06-14 | 2017-09-01 | 合肥市惠科精密模具有限公司 | A kind of TFT LCD liquid crystal display panels and preparation method thereof |
| CN107463018B (en) * | 2017-07-06 | 2020-05-22 | 惠科股份有限公司 | Display panel and manufacturing method |
| CN107463018A (en) * | 2017-07-06 | 2017-12-12 | 惠科股份有限公司 | A kind of display panel and manufacture method |
| CN107422521A (en) * | 2017-09-19 | 2017-12-01 | 京东方科技集团股份有限公司 | A kind of color membrane substrates and preparation method thereof, display panel |
| US10948636B2 (en) | 2017-09-19 | 2021-03-16 | Boe Technology Group Co., Ltd. | Color filter substrate, manufacturing method thereof, and display panel |
| CN107688254B (en) * | 2017-10-11 | 2020-05-29 | 深圳市华星光电半导体显示技术有限公司 | COA type liquid crystal display panel and manufacturing method thereof |
| CN107688254A (en) * | 2017-10-11 | 2018-02-13 | 深圳市华星光电半导体显示技术有限公司 | COA type liquid crystal display panels and preparation method thereof |
| CN107706226A (en) * | 2017-10-18 | 2018-02-16 | 京东方科技集团股份有限公司 | Opposite substrate, its preparation method, organic electroluminescence display panel and display device |
| CN107706226B (en) * | 2017-10-18 | 2021-02-19 | 京东方科技集团股份有限公司 | Opposite substrate, manufacturing method thereof, organic light-emitting display panel and display device |
| CN108803122A (en) * | 2018-06-21 | 2018-11-13 | 武汉华星光电技术有限公司 | A kind of color membrane substrates and preparation method thereof, display panel |
| WO2020073386A1 (en) * | 2018-10-08 | 2020-04-16 | 惠科股份有限公司 | Display panel and manufacturing method |
| US11480718B2 (en) | 2018-10-08 | 2022-10-25 | HKC Corporation Limited | Display panel and manufacturing method therefor |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN106773278A (en) | Colored optical filtering substrates and preparation method thereof, liquid crystal display panel | |
| CN105974651B (en) | The production method of liquid crystal display panel | |
| CN105204217B (en) | Liquid crystal display panel | |
| CN105974636A (en) | Method for manufacturing liquid crystal display panel | |
| US20080124997A1 (en) | Lidquid crystal display device and method for fabricating the same | |
| CN106802511A (en) | A kind of color membrane substrates, its preparation method and relevant apparatus | |
| CN107589588A (en) | Liquid crystal display panel and liquid crystal display device | |
| CN107505760A (en) | The dot structure and liquid crystal display panel of array base palte | |
| CN106125391A (en) | Display floater and display device | |
| CN107703671A (en) | Liquid crystal panel and liquid crystal display device | |
| CN108363233A (en) | Colored filter substrate and preparation method thereof | |
| KR20080001024A (en) | Color filter substrate for liquid crystal display and fabricating method thereof | |
| CN103217832A (en) | Color filter, manufacturing method and displaying device of color filter | |
| CN106773406A (en) | A kind of electronic equipment, array base palte and preparation method thereof | |
| WO2016176882A1 (en) | Colour filter and manufacturing method therefor, and liquid crystal display panel | |
| CN107688254A (en) | COA type liquid crystal display panels and preparation method thereof | |
| CN108897163A (en) | The production method of display panel and display panel | |
| CN109343263A (en) | COA type liquid crystal display | |
| KR20040107048A (en) | Liquid crystal display device and method for manufacturing there of | |
| CN106483707A (en) | Light filter for liquid crystal display and preparation method thereof and liquid crystal display | |
| CN106932985A (en) | COA array base paltes and liquid crystal display panel | |
| CN107463023A (en) | Liquid crystal display panel and liquid crystal display | |
| CN107037657A (en) | A kind of COA substrates and preparation method thereof, display panel, display device | |
| CN107450224A (en) | The preparation method of COA type array base paltes | |
| CN109116619A (en) | Color membrane substrates, display panel, mask plate |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| RJ01 | Rejection of invention patent application after publication | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20170531 |