WO2019056632A1 - Wafer processing device, solution tank thereof, and discharge method for solution tank - Google Patents
Wafer processing device, solution tank thereof, and discharge method for solution tank Download PDFInfo
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- WO2019056632A1 WO2019056632A1 PCT/CN2017/117916 CN2017117916W WO2019056632A1 WO 2019056632 A1 WO2019056632 A1 WO 2019056632A1 CN 2017117916 W CN2017117916 W CN 2017117916W WO 2019056632 A1 WO2019056632 A1 WO 2019056632A1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
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- the invention relates to a safe discharge method for maintaining liquid volume, temperature and concentration in a liquid medicine tank, and a structure of a specific liquid medicine tank involved, a silicon wafer cleaning device or a wet processing device using the liquid medicine tank.
- the process of the chemical liquid reaction cycle is to pump the liquid in the liquid solution tank 004 to the reaction tank 002 through the pump 005, and return to the auxiliary tank through the overflow pipe 003 on both sides of the reaction tank.
- the circulation is carried out, and the liquid medicine is continuously consumed during the reaction with the silicon wafer, resulting in a decrease in the concentration of the mixed solution liquid solution, affecting the temperature of the tank liquid and the quality of the silicon wafer, and thus, when the equipment is in normal operation.
- the intermittent dosing solution is used to maintain the concentration of the mixed solution tank through the refill tank 001.
- the intermittent dosing solution causes the volume of the liquid in the mixed tank to continuously increase, in the event of equipment failure (for example, the pump suddenly stops working). The equipment suddenly powers off, etc.) The liquid in the reaction tank will flow back directly to the mixing tank, causing the liquid to overflow untimely. The liquid directly leaks directly from the service port and the unsealed portion of the tank to the outside of the tank. If the pressure is high, It will cause damage to the tank and cause serious safety hazards.
- the traditional equipment controls the liquid discharge valve 006 on the bottom of the liquid tank through software, and manually discharges in the industrial computer to reduce the volume in the tank.
- the discharge method has disadvantages: 1) It is difficult to find a reasonable discharge time point. Generally rely on the experience of the craftsman; 2) the need for personnel operation and recording is not automatic enough, and it is easy to make mistakes. If the liquid discharge is not timely, it will cause safety hazard in the event of equipment failure; 3) the specific gravity of the liquid after the reaction of the equipment is higher than the proportion of the new tonic solution Small, bottom drainage will cause some new drug solution to drain waste liquid and affect the concentration and temperature in the mixture tank; 4) The general diameter of the drain valve is large and its pressure is high. Waste of liquid and affect the process.
- the object of the present invention is to provide a liquid medicine tank for a silicon wafer processing apparatus, which comprises a tank body, an overflow pipe connecting the overflow ports on the side wall of the tank body, and is connected to the tank. a first draining pipe of the liquid discharge port at the bottom of the body, a drain valve disposed on the first drain pipe, and a second drain pipe disposed at a position of the tank body at a first height from the bottom of the tank, the second row The portion of the liquid conduit outside the tank is connected to the first drain conduit through a control valve.
- the first height is a height corresponding to a volume of liquid remaining in the drug solution tank when the silicon wafer processing apparatus operates normally.
- the first height satisfies the condition that the first height minus the volume of the liquid remaining in the liquid tank when the device is in normal operation is less than the height of the overflow port minus the initial liquid dispensing time of the liquid tank. The height corresponding to the volume of the liquid.
- the inlet of the second drain conduit is connected to the sidewall of the tank.
- the second drain conduit extends from the bottom of the tank to the first height.
- the second drain conduit extends from the top of the tank to the first height and the drain conduit is connected to a row of hydraulic power units.
- the present invention also proposes a silicon wafer processing apparatus using the above chemical liquid tank.
- the silicon wafer processing apparatus is a cleaning apparatus or a wet processing apparatus or the like.
- the invention also proposes a method for maintaining the concentration, temperature and volume of the liquid in the liquid medicine tank, which is opened after the liquid solution tank is finished to process the silicon wafer, or after the silicon wafer is processed, each interval
- the control valve is opened for a period of time.
- the invention has the advantages that: first, since the specific gravity of the liquid after the reaction is smaller than the specific gravity of the new tonic solution, the liquid after the reaction is deposited on the upper part of the liquid, and the liquid medicine after the reaction is discharged. The usage period of the supplementary chemical solution is greatly increased; secondly, the discharge mode can ensure that the volume in the liquid medicine tank is constant, and the amount of the liquid replacement can be kept constant, thereby maintaining the concentration of the liquid medicine tank and the temperature thereof; Third, this emission control method can prevent the safety of hidden liquid from flowing back to the mixed liquid tank in the event of any failure in equipment production. Fourth, it can be fully automated without artificially controlling the amount of rehydration to maintain the concentration of the liquid tank. , volume and temperature; fifth, can reduce the number of discharges of the pump to extend the life of the valve.
- Figure 1 shows a schematic view of the structure of the prior art.
- Figure 2 shows a schematic view of the structure of the present invention.
- the liquid medicine tank 004 includes a tank body, and the side wall of the tank body is provided with overflow.
- the flow port, the overflow port is connected to the overflow pipe 003, the height of the overflow port from the bottom of the tank body is H4, the bottom of the tank body is provided with a liquid discharge port, the first liquid discharge pipe is connected with the liquid discharge port, and the first liquid discharge pipe is arranged
- a drain valve 006 is provided, and then the present invention provides a second drain conduit at a position in the tank body at a first height from the bottom of the tank (point A), and a portion of the second drain conduit outside the tank is connected to the outside through the control valve 007 to
- the first drain conduit, the present invention does not limit the number of second drain conduits, and can be adjusted as needed by those skilled in the art.
- the height of the solution corresponding to the volume of VH1 in the initial dosing of the drug solution tank is H1
- the height corresponding to the volume of liquid remaining in the solution tank when the device is in normal operation is H2
- the position of A (the position of the first height) It can be at the height H2 corresponding to the volume of the remaining liquid in the liquid tank when the silicon wafer processing apparatus is working normally, or at the height H3 above it, and the optimum height H3 satisfies the condition H3 ⁇ H4- H1.
- Figure 2 shows a specific mounting position of the second drain conduit, the inlet of the second drain conduit being connected to the sidewall of the tank.
- the second drain conduit may also extend from the bottom of the tank until the first level is reached.
- the second drain conduit extends from the top of the tank to the first height, and the drain conduit is connected to a row of hydraulic power units.
- a silicon wafer processing apparatus using the above chemical liquid tank for example, a cleaning apparatus or a wet processing apparatus, etc., is within the scope of the present invention.
- the invention adopts the structure of the above chemical liquid tank to maintain the concentration, temperature and volume discharge method of the liquid in the liquid medicine tank, and the chemical liquid tank can be arranged on the industrial control machine to open the control valve after the liquid preparation starts processing the silicon wafer. Or open the control valve at regular intervals for a period of time, such as how long it takes to run (how many products are made) how many seconds to open.
Abstract
A wafer processing device, a solution tank thereof, and a discharge method for a solution tank; the solution tank (004) comprises a tank body, an overflow pipe (003) that is in communication with an overflow port on a sidewall of the tank body, a first discharge pipe that is in communication with a discharge port provided at a bottom portion of the tank body, and a liquid discharge valve (006) that is disposed on the first discharge pipe; a second discharge pipe is disposed at a position (point A) within the tank body at a first height from a tank bottom, a part at which the second discharge pipe is located outside of the tank body is in communication with the first discharge pipe by means of a control valve (007). The solution tank (004) may maintain the temperature, volume, and concentration of a liquid and achieve secure discharge.
Description
本发明涉及一种维持药液槽内液体体积、温度、浓度的安全排放方法，以及涉及到的具体的药液槽的结构，采用该药液槽的硅片清洗设备或湿法处理设备。The invention relates to a safe discharge method for maintaining liquid volume, temperature and concentration in a liquid medicine tank, and a structure of a specific liquid medicine tank involved, a silicon wafer cleaning device or a wet processing device using the liquid medicine tank.
如图1所示，在湿法清洗设备中，药液反应循环的过程是通过泵005把药液槽004内的液体打到反应槽002，在通过反应槽两边溢流管道003回到副槽，进行循环，药液在与硅片反应的过程中不停的被消耗，导致混合液槽药液的浓度降低，影响槽体药液的温度和硅片的质量，因此会在设备正常运行时会通过补液桶001进行间断性加药液维持混合药液槽的浓度，然而间断性加药液会导致混合液槽的药液体积不断增大，在设备发生故障时(例如：泵突然停止工作，设备突然断电等)反应槽的药液会直接倒流回到混合液槽，导致液体溢流不及时，液体直接从槽的维修口及不密封处直接漏液到槽体外，如果压力大可能会导致槽体损坏，造成严重的安全隐患。As shown in Fig. 1, in the wet cleaning device, the process of the chemical liquid reaction cycle is to pump the liquid in the liquid solution tank 004 to the reaction tank 002 through the pump 005, and return to the auxiliary tank through the overflow pipe 003 on both sides of the reaction tank. The circulation is carried out, and the liquid medicine is continuously consumed during the reaction with the silicon wafer, resulting in a decrease in the concentration of the mixed solution liquid solution, affecting the temperature of the tank liquid and the quality of the silicon wafer, and thus, when the equipment is in normal operation. The intermittent dosing solution is used to maintain the concentration of the mixed solution tank through the refill tank 001. However, the intermittent dosing solution causes the volume of the liquid in the mixed tank to continuously increase, in the event of equipment failure (for example, the pump suddenly stops working). The equipment suddenly powers off, etc.) The liquid in the reaction tank will flow back directly to the mixing tank, causing the liquid to overflow untimely. The liquid directly leaks directly from the service port and the unsealed portion of the tank to the outside of the tank. If the pressure is high, It will cause damage to the tank and cause serious safety hazards.
传统设备都是通过软件去控制药液槽底板上的排液阀006，人工在工控机操作排放来减少槽内的体积，这种排放方式存在缺点：1)很难找到合理的排放时间点，一般靠工艺人员经验；2)需要人员操作和记录不够自动化，且容易出错，如果排液不及时会在设备故障时产生安全隐患；3)设备生产时反应后的液体比重比新补药液比重小，底部排液会导致部分新加药液排掉浪费药液及影响混合液槽内浓度、温度；4)一般排液阀的口径大及其压力大，排放时不好控制也会造成药液的浪费及影响工艺。The traditional equipment controls the liquid discharge valve 006 on the bottom of the liquid tank through software, and manually discharges in the industrial computer to reduce the volume in the tank. The discharge method has disadvantages: 1) It is difficult to find a reasonable discharge time point. Generally rely on the experience of the craftsman; 2) the need for personnel operation and recording is not automatic enough, and it is easy to make mistakes. If the liquid discharge is not timely, it will cause safety hazard in the event of equipment failure; 3) the specific gravity of the liquid after the reaction of the equipment is higher than the proportion of the new tonic solution Small, bottom drainage will cause some new drug solution to drain waste liquid and affect the concentration and temperature in the mixture tank; 4) The general diameter of the drain valve is large and its pressure is high. Waste of liquid and affect the process.
发明内容Summary of the invention
本发明的目的是针对上述现有技术存在的缺陷，提供一种用于硅片处理设备的药液槽，包括槽体，连通槽体侧壁上溢流口的溢流管道，连通设置在槽体底部的排液口的第一排液管道，设置在第一排液管道上的排液阀，在槽体内距离槽底第一高度的位置处设置第二排液管道，所述第二排液管道位于槽体外的部分通过控制阀连通至第一排液管道。The object of the present invention is to provide a liquid medicine tank for a silicon wafer processing apparatus, which comprises a tank body, an overflow pipe connecting the overflow ports on the side wall of the tank body, and is connected to the tank. a first draining pipe of the liquid discharge port at the bottom of the body, a drain valve disposed on the first drain pipe, and a second drain pipe disposed at a position of the tank body at a first height from the bottom of the tank, the second row The portion of the liquid conduit outside the tank is connected to the first drain conduit through a control valve.
在一实施例中，所述第一高度为当所述硅片处理设备正常工作时，药液槽内剩余液体的体积对应的高度。In one embodiment, the first height is a height corresponding to a volume of liquid remaining in the drug solution tank when the silicon wafer processing apparatus operates normally.
在另一实施例中，所述第一高度满足条件为：第一高度减去设备正常工作时药液槽还剩 液体的体积对应的高度小于溢流口的高度减去液槽初始配液时液体的体积对应的高度。In another embodiment, the first height satisfies the condition that the first height minus the volume of the liquid remaining in the liquid tank when the device is in normal operation is less than the height of the overflow port minus the initial liquid dispensing time of the liquid tank. The height corresponding to the volume of the liquid.
在第一种结构中，所述第二排液管道的入口连接在槽体侧壁上。In the first configuration, the inlet of the second drain conduit is connected to the sidewall of the tank.
在第二种结构中，所述第二排液管道从槽体底部伸入直至所述第一高度。In the second configuration, the second drain conduit extends from the bottom of the tank to the first height.
在第三种结构中，所述第二排液管道从槽体顶部伸入至所述第一高度，并且所述排液管道连接一排液动力装置。In a third configuration, the second drain conduit extends from the top of the tank to the first height and the drain conduit is connected to a row of hydraulic power units.
本发明还提出了采用上述药液槽的硅片处理设备。所述硅片处理设备为清洗设备或湿法处理设备等。The present invention also proposes a silicon wafer processing apparatus using the above chemical liquid tank. The silicon wafer processing apparatus is a cleaning apparatus or a wet processing apparatus or the like.
本发明还提出了维持上述药液槽内的液体浓度、温度、体积的排放方法，当药液槽配液完毕开始处理硅片后开启所述控制阀，或者在开始处理硅片后，每间隔一段时间开启所述控制阀一段时间。The invention also proposes a method for maintaining the concentration, temperature and volume of the liquid in the liquid medicine tank, which is opened after the liquid solution tank is finished to process the silicon wafer, or after the silicon wafer is processed, each interval The control valve is opened for a period of time.
与现有技术相比，本发明的优点是：第一、由于反应后的液体比重比新补药液比重小，反应后的液体在液体上部沉积，排走的是反应后的药液，可以大大加大补加药液的使用周期；第二、这种排放方式可以确保药液槽内的体积恒定，且补液的量可以保持不变，从而可以维持药液槽的浓度及其温度；第三、这种排放控制方式可以预防设备生产中在发生任何故障时液体倒流到混合液槽导致漫液的安全隐患；第四、可以全自动化不需人为去控制补液量去维持药液槽的浓度、体积和温度；第五、可以减少排液的开关次数延长阀门寿命。Compared with the prior art, the invention has the advantages that: first, since the specific gravity of the liquid after the reaction is smaller than the specific gravity of the new tonic solution, the liquid after the reaction is deposited on the upper part of the liquid, and the liquid medicine after the reaction is discharged. The usage period of the supplementary chemical solution is greatly increased; secondly, the discharge mode can ensure that the volume in the liquid medicine tank is constant, and the amount of the liquid replacement can be kept constant, thereby maintaining the concentration of the liquid medicine tank and the temperature thereof; Third, this emission control method can prevent the safety of hidden liquid from flowing back to the mixed liquid tank in the event of any failure in equipment production. Fourth, it can be fully automated without artificially controlling the amount of rehydration to maintain the concentration of the liquid tank. , volume and temperature; fifth, can reduce the number of discharges of the pump to extend the life of the valve.
图1示出了现有技术的结构示意图。Figure 1 shows a schematic view of the structure of the prior art.
图2示出了本发明的结构示意图。Figure 2 shows a schematic view of the structure of the present invention.
下面结合附图和实施例对发明进行详细的说明，且所描述的实施例仅是本发明的一部分实施例，而不是全部的实施例。The invention will be described in detail below with reference to the drawings and embodiments, and the described embodiments are only a part of the embodiments of the invention, but not all embodiments.
如图2所示，本发明为了维持药液槽内液体的浓度、温度、体积，提出了可以安全排放的药液槽结构，该药液槽004包括槽体，槽体侧壁上设有溢流口，溢流口连通溢流管道003，溢流口距离槽体底部的高度为H4，槽体底部设有排液口，第一排液管道连通排液口，且第一排液管道上设有排液阀006，然后本发明在槽体内距离槽底第一高度的位置处(A点)设置了第二排液管道，第二排液管道位于槽体外的部分通过控制阀007连通至第一排液管道，本发明不限定第二排液管道的数量，本领域内技术人员可以根据需要调整。As shown in FIG. 2, in order to maintain the concentration, temperature and volume of the liquid in the liquid solution tank, the present invention proposes a chemical liquid tank structure which can be safely discharged. The liquid medicine tank 004 includes a tank body, and the side wall of the tank body is provided with overflow. The flow port, the overflow port is connected to the overflow pipe 003, the height of the overflow port from the bottom of the tank body is H4, the bottom of the tank body is provided with a liquid discharge port, the first liquid discharge pipe is connected with the liquid discharge port, and the first liquid discharge pipe is arranged A drain valve 006 is provided, and then the present invention provides a second drain conduit at a position in the tank body at a first height from the bottom of the tank (point A), and a portion of the second drain conduit outside the tank is connected to the outside through the control valve 007 to The first drain conduit, the present invention does not limit the number of second drain conduits, and can be adjusted as needed by those skilled in the art.
药液槽初始配液时的体积为VH1的药液对应槽内的高度为H1，规定设备正常工作时药液 槽还剩液体的体积对应的高度为H2，A的位置(第一高度的位置)可以在当所述硅片处理设备正常工作时，药液槽内剩余液体的体积对应的高度H2处，也可以在其之上的高度H3处，且最佳高度H3满足条件H3＜H4-H1。The height of the solution corresponding to the volume of VH1 in the initial dosing of the drug solution tank is H1, and the height corresponding to the volume of liquid remaining in the solution tank when the device is in normal operation is H2, the position of A (the position of the first height) It can be at the height H2 corresponding to the volume of the remaining liquid in the liquid tank when the silicon wafer processing apparatus is working normally, or at the height H3 above it, and the optimum height H3 satisfies the condition H3<H4- H1.
图2示出的是第二排液管道的一个具体安装位置，第二排液管道的入口连接在槽体侧壁上。在其他实施例中，第二排液管道还可以从槽体底部伸入直至到达第一高度。或者第二排液管道从槽体顶部伸入至第一高度，并且排液管道连接一排液动力装置。这些均应属于本发明的保护范围。Figure 2 shows a specific mounting position of the second drain conduit, the inlet of the second drain conduit being connected to the sidewall of the tank. In other embodiments, the second drain conduit may also extend from the bottom of the tank until the first level is reached. Or the second drain conduit extends from the top of the tank to the first height, and the drain conduit is connected to a row of hydraulic power units. These should all fall within the scope of protection of the present invention.
除了上述药液槽的相关结构，采用了上述药液槽的硅片处理设备，；比如清洗设备或者湿法处理设备等都属于本发明的保护范围内。In addition to the above-described structure of the chemical liquid tank, a silicon wafer processing apparatus using the above chemical liquid tank; for example, a cleaning apparatus or a wet processing apparatus, etc., is within the scope of the present invention.
本发明采用上述药液槽的结构，来维持上述药液槽内液体的浓度、温度、体积的排放方法，可以在工控机上设置药液槽在配完液开始处理硅片后一直开启控制阀，或者每隔一段时间开启控制阀一段时间，例如通过运行多长时间(做了多少产品)开启多少秒的方式等。The invention adopts the structure of the above chemical liquid tank to maintain the concentration, temperature and volume discharge method of the liquid in the liquid medicine tank, and the chemical liquid tank can be arranged on the industrial control machine to open the control valve after the liquid preparation starts processing the silicon wafer. Or open the control valve at regular intervals for a period of time, such as how long it takes to run (how many products are made) how many seconds to open.
上述实施例仅用于说明本发明的具体实施方式。应当指出的是，对于本领域的普通技术人员来说，在不脱离本发明构思的前提下，还可以做出若干变形和变化，这些变形和变化都应属于本发明的保护范围。The above embodiments are merely illustrative of specific embodiments of the invention. It is to be noted that a number of variations and modifications may be made by those skilled in the art without departing from the spirit and scope of the invention.
Claims (9)
- 一种用于硅片处理设备的药液槽，包括槽体，连通槽体侧壁上溢流口的溢流管道，连通设置在槽体底部的排液口的第一排液管道，设置在第一排液管道上的排液阀，其特征在于，在槽体内距离槽底第一高度的位置处设置至少一根第二排液管道，所述第二排液管道位于槽体外的部分通过控制阀连通至第一排液管道。A liquid medicine tank for a silicon wafer processing apparatus, comprising a tank body, an overflow pipe connecting the overflow port on the side wall of the tank body, and a first liquid discharge pipe connecting the liquid discharge port provided at the bottom of the tank body, a drain valve on the first drain pipe, characterized in that at least one second drain pipe is disposed at a position of the tank body from a first height of the groove bottom, and the second drain pipe is located at a portion outside the groove body The control valve is connected to the first drain line.
- 如权利要求1所述的用于硅片处理设备的药液槽，其特征在于，所述第一高度为当所述硅片处理设备正常工作时，药液槽内剩余液体的体积对应的高度。A liquid chemical tank for a silicon wafer processing apparatus according to claim 1, wherein said first height is a height corresponding to a volume of liquid remaining in said chemical liquid tank when said silicon wafer processing apparatus operates normally .
- 如权利要求1所述的用于硅片处理设备的药液槽，其特征在于，所述第一高度满足条件为：第一高度减去设备正常工作时药液槽还剩液体的体积对应的高度小于溢流口的高度减去液槽初始配液时液体的体积对应的高度。The medicinal solution tank for a silicon wafer processing apparatus according to claim 1, wherein the first height satisfies a condition that: the first height is subtracted from a volume of liquid remaining in the medicinal solution tank when the apparatus is in normal operation; The height is less than the height of the overflow port minus the height corresponding to the volume of the liquid at the initial dosing of the liquid tank.
- 如权利要求1至3任意一项所述的用于硅片处理设备的药液槽，其特征在于，所述第二排液管道的入口连接在槽体侧壁上。The medicinal solution tank for a silicon wafer processing apparatus according to any one of claims 1 to 3, wherein the inlet of the second liquid discharge conduit is connected to the side wall of the tank.
- 如权利要求1至3任意一项所述的用于硅片处理设备的药液槽，其特征在于，所述第二排液管道从槽体底部伸入直至所述第一高度。The liquid medicine tank for a silicon wafer processing apparatus according to any one of claims 1 to 3, wherein the second liquid discharge pipe projects from the bottom of the tank body up to the first height.
- 如权利要求1至3任意一项所述的用于硅片处理设备的药液槽，其特征在于，所述第二排液管道从槽体顶部伸入至所述第一高度，并且所述排液管道连接一排液动力装置。The liquid medicine tank for a silicon wafer processing apparatus according to any one of claims 1 to 3, wherein the second liquid discharge duct protrudes from the top of the tank body to the first height, and The drain line connects to a row of hydraulic power units.
- 采用上述任意一项权利要求所述的药液槽的硅片处理设备。A wafer processing apparatus for a drug solution tank according to any of the preceding claims.
- 如权利要求7所述的硅片处理设备，其特征在于，所述硅片处理设备为清洗设备或湿法处理设备。A silicon wafer processing apparatus according to claim 7, wherein said silicon wafer processing apparatus is a cleaning apparatus or a wet processing apparatus.
- 维持如权利要求1至6任意一项所述的药液槽内的液体浓度、温度、体积的排放方法，当药液槽配液完毕开始处理硅片后开启所述控制阀，或者在开始处理硅片后，每间隔一段时间开启所述控制阀一段时间。A method for discharging a liquid concentration, a temperature, and a volume in a chemical solution tank according to any one of claims 1 to 6, wherein the control valve is opened after the liquid solution tank is finished to process the silicon wafer, or the treatment is started. After the silicon wafer, the control valve is opened for a period of time at intervals.
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| CN201710858023.X | 2017-09-21 | ||
| CN201710858023.XA CN107564842B (en) | 2017-09-21 | 2017-09-21 | A kind of discharge method of silicon chip processing device and its dipper, dipper |
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| CN109887861A (en) * | 2019-01-14 | 2019-06-14 | 上海釜川自动化设备有限公司 | A kind of flow-harmonization device and its uniform flow implementation method |
| CN110923787A (en) * | 2019-12-16 | 2020-03-27 | 戚健民 | Integrative seamless groove |
| CN113117388A (en) * | 2019-12-31 | 2021-07-16 | 盛美半导体设备(上海)股份有限公司 | Filtering liquid storage device |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104124147A (en) * | 2013-04-27 | 2014-10-29 | 上海和辉光电有限公司 | An etching machine and a method for cleaning crystals of the etching machine |
| CN204230280U (en) * | 2014-12-11 | 2015-03-25 | 东方日升新能源股份有限公司 | A kind of for regulating the system of Reducing thickness uniformity in silicon chip texture etching slot |
| CN204257600U (en) * | 2014-11-25 | 2015-04-08 | 上海集成电路研发中心有限公司 | A kind of rinse bath for cleaning semiconductor crystal wafer |
| CN204577406U (en) * | 2015-03-23 | 2015-08-19 | 宁晋赛美港龙电子材料有限公司 | The rinse bath of solar silicon wafers cleaning link |
| US20160035597A1 (en) * | 2014-07-29 | 2016-02-04 | SCREEN Holdings Co., Ltd. | Substrate processing apparatus and substrate processing method |
-
2017
- 2017-09-21 CN CN201710858023.XA patent/CN107564842B/en active Active
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Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104124147A (en) * | 2013-04-27 | 2014-10-29 | 上海和辉光电有限公司 | An etching machine and a method for cleaning crystals of the etching machine |
| US20160035597A1 (en) * | 2014-07-29 | 2016-02-04 | SCREEN Holdings Co., Ltd. | Substrate processing apparatus and substrate processing method |
| CN204257600U (en) * | 2014-11-25 | 2015-04-08 | 上海集成电路研发中心有限公司 | A kind of rinse bath for cleaning semiconductor crystal wafer |
| CN204230280U (en) * | 2014-12-11 | 2015-03-25 | 东方日升新能源股份有限公司 | A kind of for regulating the system of Reducing thickness uniformity in silicon chip texture etching slot |
| CN204577406U (en) * | 2015-03-23 | 2015-08-19 | 宁晋赛美港龙电子材料有限公司 | The rinse bath of solar silicon wafers cleaning link |
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