CN207367932U - A kind of wafer machine platform discharging of waste liquid system - Google Patents
A kind of wafer machine platform discharging of waste liquid system Download PDFInfo
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- CN207367932U CN207367932U CN201721399339.9U CN201721399339U CN207367932U CN 207367932 U CN207367932 U CN 207367932U CN 201721399339 U CN201721399339 U CN 201721399339U CN 207367932 U CN207367932 U CN 207367932U
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- liquid level
- process tank
- waste liquid
- level sensor
- control valve
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Abstract
The utility model discloses a kind of wafer machine platform discharging of waste liquid system, and waste liquid is discharged for wafer machine platform, including：First discharge pipe, connected with wafer machine platform to export waste liquid, process tank, blender is equipped with to stir waste liquid with the first discharge pipeline connection to contain waste liquid, and in process tank, second discharge pipe, the bottom of process tank is connected to export waste liquid, main control valve, is arranged on the second discharge pipe to control its opening and closing, and dilution supply line, connected with process tank.Further include the first liquid level sensor, the second liquid level sensor and control device, first liquid level sensor is arranged on process tank lower part, second liquid level sensor is arranged on process tank top, and control device communicates with the first liquid level sensor, the second liquid level sensor and main control valve connect respectively.It can effectively solve the problems, such as waste liquid blocking pipeline.
Description
Technical field
Semiconductor processing technology field is the utility model is related to, especially a kind of wafer machine platform discharging of waste liquid system.
Background technology
Semiconductor crystal wafer is the carrier for producing used in integrated circuits.In the technological process of semiconductor integrated circuit manufacture,
There are nearly more than 100 the step of and crystal column surface to clean and be chemically treated related, these steps account for total production procedure step
25% to 35%.During wafer cleaning, multi-chemical can be used, and produces corresponding cleaning waste liquid.Due to gluing for waste liquid
Denseness greatly and component it is sufficiently complex, during discharging of waste liquid usually blocking pipeline and must arrestment operation carry out
Processing, strong influence manufacturing efficiency.
The content of the invention
The purpose of this utility model is to provide a kind of wafer machine platform discharging of waste liquid system, can effectively solve waste liquid and block pipe
The problem of road.
The technical scheme that the utility model is provided is as follows：A kind of wafer machine platform discharging of waste liquid system, is discharged for wafer machine platform
Waste liquid, including：
First discharge pipe, connects to export waste liquid with the wafer machine platform,
Process tank, blender is equipped with to stir with the described first discharge pipeline connection to contain waste liquid, and in the process tank
Dynamic waste liquid, the process tank top are provided with the first liquid level sensor, and the process tank lower part is provided with the second liquid level sensor；
Second discharge pipe, is connected to the bottom of the process tank to export waste liquid,
Main control valve, is arranged on second discharge pipe to control its opening and closing,
Control device, respectively with the main control valve, first liquid level sensor and second liquid level sensor
Communication connection, and,
Dilution supply line, connects with the process tank；Wherein,
When liquid level is higher than the second liquid level sensor position in the process tank, the control device adjusts the master control
Valve processed is opened, and when liquid level is less than first liquid level sensor in the process tank, the control device adjusts the main control
Valve is closed.
The technical program, waste liquid first passes around to be flowed in pipeline continuous after entering after the stir process of process tank, can be with
Waste liquid is more evenly distributed by the action of stirring, particle smaller, while add the content liquid in dilution increasing waste liquid, make
Waste liquid is obtained to be not easy to block in pipeline.Process tank can be passed through in waste liquid equipped with control valve on the second discharge pipe at the same time
It is sufficiently mixed to enter back into follow-up discharge pipe after mixing and transports, what further reduction waste liquid blocked in pipeline can
Energy.Regulate and control the on-off action of the second discharge pipe by the different liquid levels in process tank, when in process tank accumulating liquid to compared with
During high liquid level, start the waste liquid in emission treatment tank, and when being discharged into liquid in process tank and being discharged into compared with low liquid level, close the
Two vent pathways.It is afterwards just into follow-up in process tank by fully processing that can so ensure the waste liquid in process tank
In discharge pipe.
Specifically, sub-control valve is provided with the dilution supply line, the control device and the sub-control valve
Communication connection,
Wherein, when liquid level is higher than the second liquid level sensor position in the process tank, the control device adjusts institute
State sub-control valve to close, when liquid level is less than first liquid level sensor in the process tank, described in the control device adjustment
Main control valve is opened.
The technical program, can be to avoid the waste of dilution.
Specifically, the blender includes agitating paddle, agitating shaft and motor, the motor drives institute by the agitating shaft
State agitating paddle rotation.
A kind of wafer machine platform discharging of waste liquid system provided by the utility model, can bring following at least one beneficial to effect
Fruit：
1st, waste liquid first passes around flows in the pipeline continued after entering after the stir process of process tank, can pass through stirring
Action makes waste liquid be more evenly distributed, particle smaller, while adds the content liquid in dilution increasing waste liquid so that waste liquid is not allowed
Easily blocked in pipeline.At the same time on the second discharge pipe equipped with control valve, it can be sufficiently mixed in waste liquid by process tank mixed
Enter back into follow-up discharge pipe and transport after even, the further possibility for reducing waste liquid and being blocked in pipeline.
2nd, by the liquid level in process tank or waste liquid, residence time regulates and controls the second delivery pipe in process tank
The on-off action on road.It can ensure the quality that process tank disposes waste liquid, while ensure that the waste liquid in process tank not overflow.
3rd, the discharging of waste liquid action of wafer machine platform and the input action of dilution pipeline are subject to processing the tune of liquid level in tank
Control, when process tank is in low liquid level, wafer machine platform output waste liquid.
Brief description of the drawings
Below by a manner of clearly understandable, preferred embodiment is described with reference to the drawings, to wafer machine platform discharging of waste liquid system
Above-mentioned characteristic, technical characteristic, advantage and its implementation of system are further described.
Fig. 1 is the part schematic diagram of wafer machine platform discharging of waste liquid system.
Drawing reference numeral explanation：100th, wafer machine platform, the 200, first discharge pipe, the 210, second discharge pipe, 211, master control
Valve processed, 300, process tank, 310, agitating paddle, 311, motor, 312, agitating shaft, the 320, first liquid level sensor, the 321, second liquid
Level sensor, 400, control device, 500, dilution supply line.
Embodiment
In order to illustrate the embodiment of the utility model or the technical proposal in the existing technology more clearly, attached drawing will be compareed below
Illustrate specific embodiment of the present utility model.It should be evident that drawings in the following description are only the one of the utility model
A little embodiments, for those of ordinary skill in the art, without creative efforts, can also be according to these
Attached drawing obtains other attached drawings, and obtains other embodiments.
To make simplified form, in each figure only schematically show with the relevant part of the utility model, they are simultaneously
Its practical structures as product is not represented.
As shown in Figure 1, the present embodiment discloses a kind of 100 discharging of waste liquid system of wafer machine platform, it is useless for the discharge of wafer machine platform 100
Liquid, the system include：First discharge pipe 200, process tank 300, the second discharge pipe 210, main control valve 211 and dilution
Supply line 500.
First discharge pipe 200 is connected with wafer machine platform 100 to export waste liquid, 300 and first discharge pipe 200 of process tank
Connection, and blender is equipped with process tank 300, the second discharge pipe 210 is connected to 300 bottom of process tank to export waste liquid, main
Control valve 211 is arranged on to control its opening and closing on the second discharge pipe 210, and dilution supply line 500 is connected with process tank 300
To input dilution into process tank 300.Blender includes agitating paddle 310, agitating shaft 312 and motor 311, motor 311 and passes through
Agitating shaft 312 drives agitating paddle 310 to rotate
Process tank 300 can keep in waste liquid, and waste liquid is stirred in the situation for being passed through dilution, waste liquid can be mixed
That closes is more uniformly distributed, and is easy to flow in pipeline.Main control valve 211 is adjusting opening for process tank 300 and follow-up discharge pipe
Closed state, can control waste liquid stay long enough in process tank 300 to be handled.
Waste liquid residence time in process tank, can be regulated and controled by way of Liquid level or time control.
The embodiment of Liquid level is to add the first liquid level sensor 320, the second liquid level sensor 321 and control
Device 400.First liquid level sensor 320 is arranged on 300 lower part of process tank, and the second liquid level sensor 321 is arranged on process tank 300
Top, control device 400 are communicated respectively at the first liquid level sensor 320, the second liquid level sensor 321 and main control valve 211
Connection.
When the liquid level in process tank 300 is higher than the second 321 position of liquid level sensor, control device 400 adjusts main control
Valve 211 is opened, namely when liquid level relatively up to arrives default liquid level in process tank, opens main control valve 211 so that passing through
The waste liquid of processing flows into the second discharge pipe 210 from process tank 300.And work as liquid level in process tank 300 and be less than the first level sensing
During device 320, control device 400 adjusts main control valve 211 and closes.Namely reach default liquid level height when liquid level is relatively low in process tank
When spending, main control valve 211 is closed so that waste liquid is accumulated in process tank.
The embodiment of time control to add timer (being not drawn into figure) and control device, control device respectively at
The timer and main control valve communication connection, when preset time is reached when the timer, control device tune
Whole main control valve is turned on and off, and can so make it that main control valve opens and closes within the default time cycle.
Further, sub-control valve is provided with dilution supply line 500, control device 400 is communicated with sub-control valve
Connection, wherein, when liquid level is higher than the second 321 position of liquid level sensor in process tank 300, control device 400 adjusts sub-control valve
Close, when liquid level is less than the first liquid level sensor 320 in process tank 300, control device 400 adjusts sub-control valve and opens.
It should be noted that above-described embodiment can be freely combined as needed.The above is only the utility model
Preferred embodiment, it is noted that for those skilled in the art, do not departing from the utility model principle
On the premise of, some improvements and modifications can also be made, these improvements and modifications also should be regarded as the scope of protection of the utility model.
Claims (3)
1. a kind of wafer machine platform discharging of waste liquid system, waste liquid is discharged for wafer machine platform, it is characterised in that including：
First discharge pipe, connects to export waste liquid with the wafer machine platform,
Process tank, with the described first discharge pipeline connection to contain waste liquid, and it is useless to stir equipped with blender in the process tank
Liquid, the process tank lower part are provided with the first liquid level sensor, and the process tank top is provided with the second liquid level sensor；
Second discharge pipe, is connected to the bottom of the process tank to export waste liquid,
Main control valve, is arranged on second discharge pipe to control its opening and closing,
Control device, communicates with the main control valve, first liquid level sensor and second liquid level sensor respectively
Connection, and,
Dilution supply line, connects with the process tank；Wherein,
When liquid level is higher than the second liquid level sensor position in the process tank, the control device adjusts the main control valve
Open, when liquid level is less than first liquid level sensor in the process tank, the control device adjusts the main control valve and closes
Close.
2. wafer machine platform discharging of waste liquid system according to claim 1, it is characterised in that：On the dilution supply line
Sub-control valve is provided with, the control device is connected with sub-control valve communication, wherein,
When liquid level is higher than the second liquid level sensor position in the process tank, the control device adjusts the sub-control valve
Close, when liquid level is less than first liquid level sensor in the process tank, the control device adjusts the main control valve and opens
Open.
3. wafer machine platform discharging of waste liquid system according to claim 1 or 2, it is characterised in that：The blender includes stirring
Paddle, agitating shaft and motor are mixed, the motor drives the agitating paddle to rotate by the agitating shaft.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201721399339.9U CN207367932U (en) | 2017-10-27 | 2017-10-27 | A kind of wafer machine platform discharging of waste liquid system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201721399339.9U CN207367932U (en) | 2017-10-27 | 2017-10-27 | A kind of wafer machine platform discharging of waste liquid system |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN207367932U true CN207367932U (en) | 2018-05-15 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN201721399339.9U Active CN207367932U (en) | 2017-10-27 | 2017-10-27 | A kind of wafer machine platform discharging of waste liquid system |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114326838A (en) * | 2021-12-31 | 2022-04-12 | 燕京啤酒(玉林)有限公司 | Useless yeast is retrieved and is kept in control system |
-
2017
- 2017-10-27 CN CN201721399339.9U patent/CN207367932U/en active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114326838A (en) * | 2021-12-31 | 2022-04-12 | 燕京啤酒(玉林)有限公司 | Useless yeast is retrieved and is kept in control system |
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