CN206886767U - A kind of silicon chip processes EDI water circulation systems - Google Patents
A kind of silicon chip processes EDI water circulation systems Download PDFInfo
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- CN206886767U CN206886767U CN201720576461.2U CN201720576461U CN206886767U CN 206886767 U CN206886767 U CN 206886767U CN 201720576461 U CN201720576461 U CN 201720576461U CN 206886767 U CN206886767 U CN 206886767U
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Abstract
A kind of silicon chip processes EDI water circulation systems, includes the purge path for the two level RO water tanks set according to water (flow) direction, EDI devices, terminal water tank and the cleaning machine being sequentially connected through water pipe, in addition to control device；The terminal water tank connects to form circulation passage with the water pipe between two level RO water tanks and EDI devices, the two level RO water tanks, EDI devices, motor-driven valve and/or water pump are provided with water pipe and circulation passage between terminal water tank and cleaning machine, liquid level gauge is provided with the terminal water tank, the liquid level gauge, motor-driven valve and water pump are connected with control device, the control device is used for the control when terminal water tank is higher than control liquid level and opens circulation passage, stop being pumped into for water in two level RO water tanks simultaneously, when terminal water tank is less than control liquid level, control closes circulation passage and opens purge path.Controlled by terminal high water tank, pure water is circulated in system, reduced the time of contact of pure water and air and the reaction with carbon dioxide, lift resistivity.
Description
Technical field
It the utility model is related to Wafer Cleaning water treatment facilities field, more particularly to a kind of silicon chip processing EDI water circulations system
System.
Background technology
Due to the continuous development of science and technology, requirement of the production technology to silicon chip increasingly improves, it is desirable to Wafer Cleaning process
Needed for pure water have higher resistivity to obtain the silicon chip of high quality.Pure water making machine of the prior art and terminal are clear
The demand water consumption of washing exists unbalanced, causes to exist pure water in terminal water tank holdup time inconsistent phenomenon, pure in order to reduce
The time of contact of water and air, the reaction with carbon dioxide etc. is reduced, resistivity is lifted, in the prior art often by terminal water tank nitrogen
Sealing gland is deposited, and the prolonged nitrogen preservation of water tank can greatly increase production cost, and water tank can then cause in the case where nitrogen-free is sealed
Pure water and air contact time are long in water tank, then influence to confess the resistivity of water, influence the quality of silicon chip product indirectly.
Utility model content
In view of the shortcomings of the prior art, the utility model provide it is a kind of used in Wafer Cleaning processing, terminal water tank
Effectively lifting pure water confesses the EDI water circulation systems of resistivity in the case of nitrogen-free envelope.
The technical scheme in the invention for solving the above technical problem is：A kind of silicon chip processes EDI water circulation systems,
Including be sequentially connected through water pipe the two level RO water tanks set according to water (flow) direction, EDI devices, terminal water tank and cleaning machine it is clear
Wash path, it is characterised in that：Also include control device；Water pipe between the terminal water tank and two level RO water tanks and EDI devices
Connection forms the circulation passage of terminal water tank-EDI devices-terminal water tank, the two level RO water tanks, EDI devices, terminal water tank
Motor-driven valve and/or water pump are provided with water pipe and circulation passage between cleaning machine, is provided with the terminal water tank
Liquid level gauge, the liquid level gauge, motor-driven valve and water pump are connected with control device, and the control device is used in terminal water tank higher than control
Circulation passage is opened in control during liquid level processed, while stops being pumped into for water in two level RO water tanks, in terminal water tank less than control liquid
Control closes circulation passage and opens purge path during position.
Be provided with the first motor-driven valve and the first water pump between the two level RO water tanks and EDI devices, the terminal water tank and
It is provided with the second water pump between cleaning machine, the terminal water tank is by being provided with the water pipe and the first motor-driven valve of the second motor-driven valve
And the first water pipe connection between water pump；
The liquid level gauge, the first motor-driven valve, the first water pump, the second motor-driven valve and the second water pump are connected with control device, institute
Control device is stated to be used for the first motor-driven valve of control closing when terminal water tank is higher than control liquid level, open the second motor-driven valve and open
Second water pump；When terminal water tank is less than control liquid level, the first motor-driven valve, the second motor-driven valve of closing and unlatching second are opened in control
Water pump；When terminal water tank is less than aqueous position is confessed, control opens the first motor-driven valve, closes the second motor-driven valve and closes the second water
Pump；First water pump is opened in system operation.
Further, less than control liquid level, the aqueous position of confessing is to be supplied water to cleaning machine for the aqueous position of confessing
Minimum liquid level, the second water pump is closed less than when confessing aqueous position in terminal water tank, prevent water pump is dry from inhaling.
Further, the terminal water tank bottom is by being provided with water pipe and the first motor-driven valve and first of the second motor-driven valve
Water pipe connection between water pump.
What the utility model possessed has the beneficial effect that：A kind of silicon chip processing EDI water circulation systems of the present utility model, at end
In the case of holding water tank nitrogen-free envelope, reduce residence time of the pure water in terminal water tank, improve the electricity for confessing pure water indirectly
Resistance rate, by 2.5 M Ω .cms of the existing process without nitrogen-sealed water tank pure water resistivity, it is promoted to 6 M Ω .cm.
Brief description of the drawings
Fig. 1 is theory diagram of the present utility model.
Embodiment
The utility model is described further below in conjunction with the accompanying drawings.A kind of silicon chip processing EDI water as shown in Figure 1 follows
Loop system, including the two level RO water tanks 1 set according to water (flow) direction, EDI devices 2, the and of terminal water tank 3 being sequentially connected through water pipe 5
Cleaning machine 4, in addition to control device, the control device are FX1N-60MR-001 programmable controllers；The two level RO water
The first motor-driven valve 6 and the first water pump 7 are provided between case 1 and EDI devices 2, is set between the terminal water tank 3 and cleaning machine 4
It is equipped with the second water pump 8, the bottom of terminal water tank 3 is by being provided with the water pipe and the first motor-driven valve 6 and first of the second motor-driven valve 9
Water pipe connection between water pump 7.
Liquid level gauge 10, the liquid level gauge 10, the first motor-driven valve 6, the first water pump 7, second are provided with the terminal water tank 3
The water pump 8 of motor-driven valve 9 and second is connected with control device, and the control device is used in terminal water tank 3 higher than control liquid level time control
System closes the first motor-driven valve 6, opens the second motor-driven valve 9 and opens the second water pump 8；In terminal water tank 3 less than control liquid level time control
System opens the first motor-driven valve 6, closes the second motor-driven valve 9 and opens the second water pump 8；When terminal water tank 3 is less than aqueous position is confessed,
Control opens the first motor-driven valve 7, closes the second motor-driven valve 9 and closes the second water pump 8；First water pump 7 is in system operation
It is always on.
Less than liquid level is controlled, the aqueous position of confessing is the minimum liquid level to be supplied water to cleaning machine 4 for the aqueous position of confessing,
The second water pump 8 is closed less than when confessing aqueous position in the liquid level of terminal water tank 3, prevents water pump is dry from inhaling.The liquid level of terminal water tank 3 is less than confession
The situation of water outlet liquid level is only occurred in when terminal water tank 3 is less than control liquid level, and the first motor-driven valve 7 is opened, and the second motor-driven valve 9 closes
Close, and the second water pump 8 continues to the pump water of cleaning machine 4, when the water in two level RO water tanks 1 is handled and defeated in time through EDI devices 2
When being sent in terminal water tank 3, water level continues to be decreased below terminal water tank control liquid level in terminal water tank 3, when cleaning machine 4 needs
Terminal cistern water level is likely to occur when water is big to confess water low liquid level less than terminal water tank and make the 8 dry suction of the second water pump, therefore is controlled
The second water pump 8 is closed in device control processed when the water level in terminal water tank 3 confesses aqueous position less than terminal water tank.
Liquid level information and control device is sent in the terminal water tank 3 that liquid level gauge 10 measures, and control device passes through terminal water
The Liquid level of case 3 realizes management and control production residence time of the water in terminal water tank 3, so as to realize the resistivity of lifting pure water.
When the liquid level of terminal water tank 3 is in high point, system automatically opens up the second motor-driven valve 9, closes RO water tanks 1 to EDI devices 2
Between the first motor-driven valve 6, so as to allow the water in terminal water tank 3 to be circulated through EDI devices 2, reduce pure water in terminal water tank 3
Residence time, carry high-purity water resistivity；When the height of water level of terminal water tank 3 is in low level, system automatically open up RO water tanks 1 to
First motor-driven valve 6 of EDI devices 2, second motor-driven valve 9 on the side of water tank 3 of closing a terminal, it is ensured that the output pure water very first time is for clear
Washing machine platform 4；By the Liquid level of terminal water tank 3, pure water is set to be circulated in system, when reducing contact of the pure water with air
Between, the reaction with carbon dioxide is reduced, lifts resistivity.
EDI water circulation systems of the present utility model by some months actual motion test, pure water terminal water supplying water quality by
2.5 M Ω .cm originally rise to 6 M Ω .cm, and end product quality gets a promotion, and present treatment system can be extended to photovoltaic slice
In nitrogen-free envelope pure water system project, and significant effect can be played.
Claims (4)
1. a kind of silicon chip processes EDI water circulation systems, including the two level RO water set according to water (flow) direction being sequentially connected through water pipe
Case, EDI devices, the purge path of terminal water tank and cleaning machine, it is characterised in that：Also include control device；The terminal water
Water pipe between case and two level RO water tanks and EDI devices, which connects, to be formed the interior circulation of terminal water tank-EDI devices-terminal water tank and leads to
Road, electricity is provided with the water pipe and circulation passage between the two level RO water tanks, EDI devices, terminal water tank and cleaning machine
Valve and/or water pump are moved, liquid level gauge is provided with the terminal water tank, the liquid level gauge, motor-driven valve and water pump and control device connect
Connect, the control device is used for the control when terminal water tank is higher than control liquid level and opens circulation passage, while stops two level RO
Water is pumped into water tank, when terminal water tank is less than control liquid level control close circulation passage and open purge path.
A kind of 2. silicon chip processing EDI water circulation systems according to claim 1, it is characterised in that：The two level RO water tanks
The first motor-driven valve and the first water pump are provided between EDI devices, second is provided between the terminal water tank and cleaning machine
Water pump, the terminal water tank are connected by the water pipe being provided between the water pipe of the second motor-driven valve and the first motor-driven valve and the first water pump
It is logical；
The liquid level gauge, the first motor-driven valve, the first water pump, the second motor-driven valve and the second water pump are connected with control device, the control
Device processed is used for the first motor-driven valve of control closing when terminal water tank is higher than control liquid level, opens the second motor-driven valve and unlatching second
Water pump；When terminal water tank is less than control liquid level, control opens the first motor-driven valve, closes the second motor-driven valve and opens the second water pump；
When terminal water tank is less than aqueous position is confessed, control opens the first motor-driven valve, closes the second motor-driven valve and closes the second water pump；The
One water pump is opened in system operation.
A kind of 3. silicon chip processing EDI water circulation systems according to claim 2, it is characterised in that：It is described to confess aqueous position
Less than control liquid level, the aqueous position of confessing is the minimum liquid level to be supplied water to cleaning machine, is less than in terminal high water tank and confesses
The second water pump is closed during aqueous position, prevents water pump is dry from inhaling.
A kind of 4. silicon chip processing EDI water circulation systems according to claim 2, it is characterised in that：The terminal water tank bottom
End is connected by the water pipe being provided between the water pipe of the second motor-driven valve and the first motor-driven valve and the first water pump.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201720576461.2U CN206886767U (en) | 2017-05-23 | 2017-05-23 | A kind of silicon chip processes EDI water circulation systems |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201720576461.2U CN206886767U (en) | 2017-05-23 | 2017-05-23 | A kind of silicon chip processes EDI water circulation systems |
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| Publication Number | Publication Date |
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| CN206886767U true CN206886767U (en) | 2018-01-16 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN201720576461.2U Active CN206886767U (en) | 2017-05-23 | 2017-05-23 | A kind of silicon chip processes EDI water circulation systems |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110542270A (en) * | 2019-08-06 | 2019-12-06 | 扬州派斯特换热设备有限公司 | Special cooling unit of PCW system |
-
2017
- 2017-05-23 CN CN201720576461.2U patent/CN206886767U/en active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110542270A (en) * | 2019-08-06 | 2019-12-06 | 扬州派斯特换热设备有限公司 | Special cooling unit of PCW system |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20210922 Address after: 651200 No. 1 Jurassic street, Jinshan Town, Lufeng County, Chuxiong Yi Autonomous Prefecture, Yunnan Province Patentee after: Lufeng Longji silicon material Co.,Ltd. Address before: 214000 No. 102, Ximei Road, high tech Zone, Wuxi City, Jiangsu Province Patentee before: WUXI LONGI SILICON MATERIALS Corp. |
|
| TR01 | Transfer of patent right |