WO2019047464A1 - 蒸镀机 - Google Patents

蒸镀机 Download PDF

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Publication number
WO2019047464A1
WO2019047464A1 PCT/CN2018/072702 CN2018072702W WO2019047464A1 WO 2019047464 A1 WO2019047464 A1 WO 2019047464A1 CN 2018072702 W CN2018072702 W CN 2018072702W WO 2019047464 A1 WO2019047464 A1 WO 2019047464A1
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WIPO (PCT)
Prior art keywords
vapor deposition
glass substrate
bracket
metal mask
evaporation
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Ceased
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PCT/CN2018/072702
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English (en)
French (fr)
Inventor
蔡丰豪
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Wuhan China Star Optoelectronics Semiconductor Display Technology Co Ltd
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Wuhan China Star Optoelectronics Semiconductor Display Technology Co Ltd
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Publication of WO2019047464A1 publication Critical patent/WO2019047464A1/zh
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders

Definitions

  • the present invention relates to the field of display technologies, and in particular, to an evaporation machine.
  • the evaporation process is mainly used in the production of organic layers and motor layers of OLED (Organic Light-Emitting Diode), which has the advantages of simple production process, high production precision and small flatness of the film.
  • OLED Organic Light-Emitting Diode
  • the evaporation technique is to evaporate a substrate, and the evaporation range and quality have certain limitations. For example, it is difficult to produce a product larger than the existing vapor deposition product.
  • the invention provides an evaporation machine for sub-regional evaporation to solve the technical problem that the evaporation range is limited.
  • the present invention provides an evaporation machine for vapor deposition of a glass substrate, the vapor deposition machine including a vacuum evaporation chamber, and an evaporation source, a metal mask, and a movement housed in the vacuum evaporation chamber. And a bracket mounted on the moving portion, the metal mask being supported below the bracket and movable above the evaporation source relative to the bracket, The glass substrate is adsorbed on the surface of the bracket facing the metal mask and has a gap with the metal mask, the glass substrate includes at least two evaporation regions, and the moving portion drives the tray The frame moves to drive the glass substrate relative to the metal mask to move the vapor deposition region of the glass substrate to the position of the metal mask.
  • the vapor deposition machine further comprises a baffle supported under the metal mask to face the evaporation source, and the baffle is used to control the evaporation range of the evaporation source.
  • the baffle includes a first plate body, a second plate body, and a guide wheel, wherein the guide wheel is slidably coupled to the first plate body and the second plate body, and the first plate body faces the
  • the position of the evaporation source is provided with a through groove, and the second plate is used for covering the through groove or sliding the through groove.
  • the bracket includes two sets of oppositely disposed frame frames, wherein a middle portion of the frame frame is disposed with an arm, and the frame frame and the surface of the frame arm for adsorbing the glass substrate are provided with a vacuum hole. And inflating to the vacuum hole by a vacuum device to adsorb the glass substrate.
  • the moving portion includes a first screw, a first driving member connected to the first screw, a second screw disposed perpendicular to the first screw, and a second screw connected to the second screw a second driving member
  • the bracket is slidably coupled to the first lead screw
  • the first driving member drives the first screw rod and the bracket moves
  • the first screw rod connects the second screw a lead screw
  • the second driving member driving the second screw to drive the first screw and the bracket to move.
  • first driving member and the second driving member may be a cylinder or a motor.
  • the vapor deposition machine further includes an image capturing device and a bracket disposed opposite to the metal mask, the image capturing device being supported on the bracket, and the steaming of the glass substrate by the image capturing device The plated area is aligned with the metal mask.
  • the evaporation source comprises a heater, a crucible and an evaporation material
  • the top surface of the crucible is provided with a through hole
  • the evaporation material is installed in the crucible and can reach the The vapor deposition zone of the glass substrate
  • the heater is for heating the vapor deposition material
  • the vacuum evaporation chamber has a vacuum tube for evacuating air in the vacuum evaporation chamber.
  • the vapor deposition machine further comprises a control device for controlling activation and shutdown of the first driving member, the second driving member and the image capturing device.
  • the vapor deposition machine of the present invention can realize vapor deposition on all vapor deposition regions of the glass substrate by stepwise movement of the glass substrate, thereby solving the technical problem that the evaporation region is limited, and can realize The product is evaporated to a larger size than the existing vapor deposition products.
  • Figure 1 is a schematic view showing the structure of an evaporation machine of the present invention.
  • Figure 2 is a schematic view showing the structure of the bracket of Figure 1.
  • FIG. 3 is a schematic structural view of the baffle of FIG. 1.
  • the present invention provides an evaporation machine for vapor deposition of a glass substrate 1 , the vapor deposition machine including a vacuum evaporation chamber 2 and a vapor deposition source housed in the vacuum evaporation chamber 2 . 3.
  • the glass substrate 1 includes at least two vapor deposition regions, and the moving portion 5 drives the carriage 6 to move, thereby driving the glass substrate 1 relative to the metal mask 4 to move
  • the vapor deposition region of the glass substrate 1 corresponds to the position of the metal mask 4.
  • the vapor deposition source 3 includes a heater 31, a crucible 32, and a vapor deposition material 33.
  • the top surface of the crucible 32 is provided with a through hole 321, and the vapor deposition material 33 is installed in the crucible 32 and can pass through The through hole 321 reaches the vapor deposition region of the glass substrate 1.
  • the vapor deposition material 33 is a small molecule material or a metal material for forming a film layer on the glass substrate 1; the crucible 32 is made of a high temperature resistant material for storage of the vapor deposition material 33;
  • the heater 31 is for heating the vapor deposition material 33 to a vapor state.
  • the metal mask 4 is made of a metal material and has one or at least two hollow patterns, and the vapor deposition material in the vapor state can pass through the through hole 321 and pass through the The hollow pattern of the metal mask 4 reaches the vapor deposition region of the glass substrate 1, and a patterned film layer is formed on the glass substrate 1.
  • the glass substrate 1 has at least two vapor deposition regions, and the vapor deposition source 3 separately vapor-deposits each of the vapor deposition regions, and after the evaporation of one region is completed, the moving portion 5 drives the tray
  • the frame 6 is moved to make another vapor deposition zone corresponding to the metal mask 4, the vapor deposition source 3 is vapor-deposited to the other vapor deposition zone, and the above steps are repeated to sequentially perform vapor deposition of all vapor deposition zones.
  • the utility model has the beneficial effects that: the moving of the bracket 6 by the moving portion 5 can complete the evaporation of each vapor deposition region of the glass substrate 1 , thereby solving the technical problem that the evaporation region is restricted, and can be fabricated. An evaporation product that is larger than the size of existing vapor deposition products.
  • the moving part 5 includes a first screw rod 51, a first driving member 52 connected to the first screw rod, a second screw rod 53 disposed perpendicularly to the first screw rod 51, and a connection.
  • the bracket 6 is slidably connected to the first screw rod 51, and the first driving member 52 drives the first screw rod 51 and the bracket
  • the frame 6 is moved, the first screw rod 51 is connected to the second screw rod 53, and the second driving member 54 drives the second screw rod 53 to drive the first screw rod 51 and the bracket 6 to move.
  • the first driving member 52 drives the first screw 51 and The carriage 6 moves to drive the glass substrate 1 to another vapor deposition zone in the first direction to complete evaporation of the other evaporation zone; and to perform the vapor deposition zone in the second direction.
  • the second driving member 54 drives the second screw rod 53 to move the first screw rod 51 and the bracket 6 to move.
  • the first direction is a direction parallel to the first lead screw 51
  • the second direction is a direction perpendicular to the first direction.
  • the first drive member 52 and the second drive member 54 may be cylinders or motors.
  • the bracket 6 includes two sets of oppositely disposed frame frames 61, wherein a middle portion of the frame frame 61 is disposed with an arm 62, and the frame frame 61 and the frame arm 62 are attached thereto.
  • a vacuum hole 63 is provided on the surface of the glass substrate 1, and is inflated to the vacuum hole 63 by a vacuum device to adsorb the glass substrate 1.
  • the utility model has the beneficial effects that the glass substrate 1 can be further supported and adsorbed by the frame arm 62 disposed at a central position of the frame frame 61, and the deformation of the metal mask plate 4 or the glass substrate 1 is reduced.
  • the positional deviation can further avoid the technical problem of uneven vapor deposition in the vapor deposition zone when the vapor deposition product is larger than the prior art, and can solve the technical problem that the evaporation range is limited, and realize the vapor deposition ratio.
  • the vapor deposition machine further includes a baffle 7 supported under the metal mask, and the baffle 7 is used to control the evaporation range of the evaporation source 3.
  • the baffle plate 7 includes a first plate body 71, a second plate body 72, and a guide wheel 73.
  • the guide wheel 73 is slidably coupled to the first plate body 71 and the second plate body 72, the first
  • the plate body 71 is provided with a through groove 711 at a position above the vapor deposition source 3
  • the second plate body 72 is for covering the through groove 711 or sliding the through groove 711.
  • the guide wheels 73 are disposed on the opposite sides of the second plate body 72.
  • the opposite sides of the first plate body 71 are provided with two slide rail grooves 712 disposed in parallel.
  • the rail groove 712 corresponds to the guide wheel 73, and the extending direction of the rail groove 712 is parallel to the traveling direction of the guide wheel 73, and the guide wheel 73 is along the sliding groove A 712 is slidably mounted within the rail groove 712.
  • the second plate body 72 slides the through groove 711 to make the vapor deposition source 3 correspond to the metal mask plate 4, Further, the vapor deposition material 33 can reach the metal mask 4 through the through groove 711; when the vapor deposition region of the glass substrate 1 is vapor-deposited, the second plate covers the The groove 711 prevents the vapor deposition material 33 from reaching the non-vapor deposition region of the glass substrate 1, thereby avoiding the unevenness of vapor deposition when the vapor deposition product having a larger size than the conventional vapor deposition product is vapor-deposited. This causes unevenness in the vapor deposition product, thereby further ensuring uniform evaporation of all vapor deposition zones.
  • the vapor deposition machine further includes an image capturing device 8 and a bracket disposed opposite to the metal mask 4 , wherein the image capturing device 8 is supported on the bracket; the image capturing device 8 is configured to The vapor deposition region of the glass substrate 1 is aligned with the metal mask 4. Specifically, after the metal mask 4 and the glass substrate 1 are aligned for the first time, the image capturing device 8 collects the image of the metal mask 4 and the glass substrate 1 , and further Further alignment of the vapor deposition region of the glass substrate 1 with the metal mask 4 is achieved.
  • the vapor deposition machine further includes a processing device, the processing device is connected to the image capturing device 8, and the processing device can calculate the metal mask 4 according to the collection result of the image capturing device 8.
  • a processing device is connected to the image capturing device 8, and the processing device can calculate the metal mask 4 according to the collection result of the image capturing device 8.
  • the second driving member 54 drives the second screw rod 53 to drive the first screw rod 51 and the bracket 6 moving, thereby driving the glass substrate 1 to move, thereby adjusting the position of the glass substrate 1 relative to the metal mask 4.
  • the vapor deposition machine further includes a control device for controlling activation and deactivation of the first driving member 52, the second driving member 54, and the image capturing device 8. Specifically, when a vapor deposition region of the glass substrate 1 is aligned with the metal mask 4, the control device controls the first driving member 52, the second driving member 54, and the image. When the collecting device 8 is activated, when the vapor deposition region of the glass substrate 1 is aligned with the metal mask 4, the first driving member 52, the second driving member 54, and the image capturing device 8 are activated. shut down.
  • the first driving member 52, the second driving member 54, and the image capturing device 8 are activated.
  • the other vapor deposition region of the glass substrate 1 is aligned with the metal mask 4, the first driving member 52, the second driving member 54, and the image capturing device 8 are closed. The above steps are repeated until evaporation of the vapor deposition zone is completed.
  • the chamber wall of the vacuum evaporation chamber of the vapor deposition machine further has a vacuum tube 9 for drawing air in the vacuum evaporation chamber 2.

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

一种蒸镀机，用于对玻璃基板（1）的蒸镀，蒸镀机包括真空蒸镀腔（2）、以及收容于真空蒸镀腔（2）内的蒸镀源（3）、金属掩膜板（4）、移动部（5）以及托架（6），托架（6）装设于移动部（5）上，金属掩膜板（4）被支撑于托架（6）下方并位于蒸镀源（3）上方可相对托架（6）移动，玻璃基板（1）吸附于托架（6）朝向金属掩膜（4）的表面并与金属掩膜板（4）之间留有间隙，玻璃基板（1）至少包括两个蒸镀区域，移动部（5）带动托架（6）移动，进而带动玻璃基板（1）相对于金属掩膜板（4）移动，以使玻璃基板（1）的蒸镀区域与金属掩膜板（4）的位置对应。

Description

蒸镀机
本发明要求2017年9月11日递交的发明名称为“蒸镀机”的申请号201710812416.7的在先申请优先权，上述在先申请的内容以引入的方式并入本文本中。
技术领域
本发明涉及显示技术领域，特别涉及一种蒸镀机。
背景技术
目前，蒸镀制程作为一种制程方式主要使用在OLED(Organic Light-Emitting Diode，有机发光二极管)的有机层及电机层的制作，具有制作流程简单、制作精度高、膜的平坦度小的特点，但是目前蒸镀技术均是对一个基板进行蒸镀，蒸镀范围和质量有一定的局限性，例如很难制作比现有蒸镀产品尺寸大的产品。
发明内容
本发明提供一种蒸镀机，用以分区域蒸镀以解决蒸镀范围受限制的技术问题。
本发明提供一种蒸镀机，用于对玻璃基板的蒸镀，所述蒸镀机包括真空蒸镀腔、以及收容于所述真空蒸镀腔内的蒸镀源、金属掩膜板、移动部以及托架，所述托架装设于所述移动部上，所述金属掩膜板被支撑于所述托架下方并位于所述蒸镀源上方可相对所述托架移动，所述玻璃基板吸附于所述托架朝向所述金属掩膜的表面并与所述金属掩膜板之间留有间隙，所述玻璃基板至少包括两个蒸镀区域，所述移动部带动所述托架移动，进而带动所述玻璃基板相对于所述金属掩膜板移动，以使所述玻璃基板的所述蒸镀区域与所述金属掩膜板的位置对应。
其中，所述蒸镀机还包括被支撑于所述金属掩膜板下方的与所述蒸镀源正对的挡板，所述挡板用于控制所述蒸镀源的蒸镀范围。
其中，所述挡板包括第一板体、第二板体以及导轮，所述导轮与所述第一板体以及所述第二板体滑动连接，所述第一板体朝向所述蒸镀源的位置设置有通槽，所述第二板体用于盖合所述通槽或滑开所述通槽。
其中，所述托架包括两组相对设置的架框，其中一组所述架框的中部位置设置有一架臂，所述架框以及所述架臂吸附所述玻璃基板的表面设有真空孔，通过真空装置充气至所述真空孔以吸附所述玻璃基板。
其中，所述移动部包括第一丝杆、连接于所述第一丝杆的第一驱动件、与所述第一丝杆垂直设置的第二丝杆以及连接于所述第二丝杆的第二驱动件，所述托架与所述第一丝杆滑动连接，所述第一驱动件驱动所述第一丝杆以及所述托架移动，所述第一丝杆连接所述第二丝杆，所述第二驱动件驱动所述第二丝杆带动所述第一丝杆及所述托架移动。
其中，所述第一驱动件以及所述第二驱动件可以为气缸或者马达。
其中，所述蒸镀机还包括相对所述金属掩膜板设置的影像采集装置及支架，所述影像采集装置支撑于所述支架上，所述影像采集装置对所述玻璃基板的所述蒸镀区域与所述金属掩膜进行对位。
其中，所述蒸镀源包括加热器、坩埚以及蒸镀材料，所述坩埚的顶面设置有通孔，所述蒸镀材料装设于所述坩埚中并可通过所述通孔到达所述玻璃基板的所述蒸镀区域，所述加热器用于加热所述蒸镀材料。
其中，所述真空蒸镀腔具有一真空管，所述真空管用于抽走所述真空蒸镀腔内的空气。
其中，所述蒸镀机还包括控制装置，所述控制装置用于控制所述第一驱动件、所述第二驱动件以及所述影像采集装置的启动以及关闭。
综上所述，本发明的蒸镀机通过所述玻璃基板的步进式移动，可以实现对所述玻璃基板所有蒸镀区域的蒸镀，进而解决蒸镀区域受限制的技术问题，可以实现蒸镀比现有蒸镀产品尺寸大的产品。
附图说明
为了更清楚地说明本发明实施例或现有技术中的技术方案，下面将对实施例或现有技术描述中所需要使用的附图作简单地介绍，显而易见地，下面描述 中的附图仅仅是本发明的一些实施例，对于本领域普通技术人员来讲，在不付出创造性劳动的前提下，还可以根据这些附图获得其他的附图。
图1是本发明蒸镀机的结构示意图。
图2是图1中托架的结构示意图。
图3是图1中挡板的结构示意图。
具体实施方式
请参阅图1，本发明提供一种蒸镀机，用于对玻璃基板1的蒸镀，所述蒸镀机包括真空蒸镀腔2以及收容于所述真空蒸镀腔2内的蒸镀源3、金属掩膜板4、移动部5以及托架6，所述托架6装设于所述移动部5上，所述金属掩膜板4被支撑于所述托架6下方并位于所述蒸镀源3上方并可相对所述托架6移动，所述玻璃基板1吸附于所述托架6朝向所述金属掩膜板4的表面并与所述金属掩膜板4之间留有间隙，所述玻璃基板1至少包括两个蒸镀区域，所述移动部5带动所述托架6移动，进而带动所述玻璃基板1相对于所述金属掩膜板4移动，以使所述玻璃基板1的蒸镀区域与所述金属掩膜板4的位置对应。
所述蒸镀源3包括加热器31、坩埚32以及蒸镀材料33，所述坩埚32的顶面设置有通孔321，所述蒸镀材料33装设于所述坩埚32中并可通过所述通孔321到达所述玻璃基板1的所述蒸镀区域。所述蒸镀材料33为小分子材料或者金属材料，用于在所述玻璃基板1上形成膜层；所述坩埚32由耐高温材料制作而成，用于所述蒸镀材料33的存放；所述加热器31用于将所述蒸镀材料33加热至蒸汽状态。
本实施例中，所述金属掩膜板4由金属材料制作而成，具有一个或至少2个镂空的图形，所述蒸汽状态的所述蒸镀材料可以通过所述通孔321并穿过所述金属掩膜板4的所述镂空的图形到达所述玻璃基板1的所述蒸镀区域，进而在所述玻璃基板1上形成有图形的膜层。
所述玻璃基板1具有至少两个蒸镀区域，所述蒸镀源3对每一所述蒸镀区域单独进行蒸镀，在完成一个区域的蒸镀后，所述移动部5带动所述托架6移动，使另一蒸镀区域与所述金属掩膜板4对应，所述蒸镀源3对所述另一蒸镀区域蒸镀，重复上述步骤，依次完成所有蒸镀区域的蒸镀。其有益效果为： 通过所述移动部5带动所述托架6移动，可以实现对所述玻璃基板1的每一个蒸镀区域完成蒸镀，进而解决蒸镀区域受限制的技术问题，可以制作比现有蒸镀产品尺寸大的蒸镀产品。
本实施例中，所述移动部5包括第一丝杆51、连接于所述第一丝杆的第一驱动件52、与所述第一丝杆51垂直设置的第二丝杆53以及连接于所述第二丝杆53的第二驱动件54，所述托架6与所述第一丝杆51滑动连接，所述第一驱动件52驱动所述第一丝杆51以及所述托架6移动，所述第一丝杆51连接所述第二丝杆53，所述第二驱动件54驱动所述第二丝杆53带动所述第一丝杆51及所述托架6移动。具体为，在蒸镀所述玻璃基板1第一方向的蒸镀区域时，当完成所述玻璃基板1一个区域的蒸镀后，所述第一驱动件52驱动所述第一丝杆51及所述托架6移动，进而带动所述玻璃基板1到达所述第一方向的另一个蒸镀区域，完成所述另一个蒸镀区域的蒸镀；在第二方向对所述蒸镀区域进行蒸镀时，在完成所述玻璃基板1的一个区域蒸镀后，所述第二驱动件54驱动所述第二丝杆53带动所述第一丝杆51及所述托架6移动，进而带动所述玻璃基板1到达所述第二方向的另一个蒸镀区域，完成所述另一个蒸镀区域的蒸镀，重复上述步骤，从而完成所述玻璃基板1的所有蒸镀区域的蒸镀。所述第一方向为与所述第一丝杆51平行的方向，所述第二方向为与所述第一方向垂直的方向。
所述第一驱动件52以及所述第二驱动件54可以是气缸或者马达。
请参阅图2，所述托架6包括两组相对设置的架框61，其中一组所述架框61的中部位置设置有一架臂62，所述架框61以及所述架臂62吸附所述玻璃基板1的表面设有真空孔63，通过真空装置充气至所述真空孔63以吸附所述玻璃基板1。其有益效果在于：通过一组所述架框61中部位置设置的所述架臂62，可以进一步支撑和吸附所述玻璃基板1，减少由于所述金属掩膜板4或所述玻璃基板1变形的位置偏差，进而在制作比现有技术尺寸大的蒸镀产品时，可以避免所述蒸镀区域蒸镀不均匀的技术问题，可以解决蒸镀范围受限制的技术问题，实现蒸镀比现有技术尺寸大的蒸镀产品，且所述蒸镀产品的所有蒸镀区域蒸镀均匀。
请参阅图3，所述蒸镀机还包括被支撑于所述金属掩膜板下方的挡板7， 所述挡板7用于控制所述蒸镀源3的蒸镀范围。所述挡板7包括第一板体71、第二板体72以及导轮73，所述导轮73与所述第一板体71以及所述第二板体72滑动连接，所述第一板体71朝向所述蒸镀源3上方的位置设置有通槽711，所述第二板体72用于盖合所述通槽711或滑开所述通槽711。
本实施例中，所述导轮73设于所述第二板体72的相对两侧周缘，所述第一板体71的相对两侧周缘设有两条并行设置的滑轨凹槽712，所述滑轨凹槽712与所述导轮73相对应，且所述滑轨凹槽712的延伸方向与所述导轮73的行进方向平行，所述导轮73沿所述滑轨凹槽712滑动地安装于所述滑轨凹槽712内。具体为，所述玻璃基板1的一个蒸镀区域蒸镀时，所述第二板体72滑开所述通槽711，使所述蒸镀源3与所述金属掩膜板4相对应，进而使所述蒸镀材料33可以通过所述通槽711达到所述金属掩膜板4；所述玻璃基板1的所述蒸镀区域完成蒸镀时，所述第二板体盖合所述通槽711，避免所述蒸镀材料33到达所述玻璃基板1的非蒸镀区域，进而避免在蒸镀比现有蒸镀产品尺寸大的蒸镀产品时，由于蒸镀的的不均匀而造成蒸镀产品的不均匀，从而进一步保证所有蒸镀区域蒸镀均匀。
请继续参阅图1，所述蒸镀机还包括相对所述金属掩膜板4设置的影像采集装置8以及支架，所述影像采集装置8支撑于支架上；所述影像采集装置8对所述玻璃基板1的所述蒸镀区域与所述金属掩膜板4进行对位。具体为，在所述金属掩膜板4与所述玻璃基板1实现第一次对位后，所述影像采集装置8采集所述金属掩膜板4与所述玻璃基板1的标记图像，进而实现所述玻璃基板1的所述蒸镀区域与所述金属掩膜板4的进一步对位。
进一步地，所述蒸镀机还包括处理装置，所述处理装置连接于所述影像采集装置8，且所述处理装置可以根据所述影像采集装置8的采集结果计算所述金属掩膜板4与所述玻璃基板1的所述蒸镀区域的偏移量，并将所述偏移量传送至所述第一驱动件52以及所述第二驱动件54，所述第一驱动件52驱动所述第一丝杆51带动托架6移动，进而带动所述玻璃基板1移动；所述第二驱动件54驱动所述第二丝杆53带动所述第一丝杆51及所述托架6移动，进而带动所述玻璃基板1移动，从而实现调节所述玻璃基板1相对所述金属掩膜板4的位置。
所述蒸镀机还包括控制装置，所述控制装置用于控制所述第一驱动件52、所述第二驱动件54以及所述影像采集装置8的启动以及关闭。具体为，当所述玻璃基板1的一个蒸镀区域与所述金属掩膜板4对位时，所述控制装置控制所述第一驱动件52、所述第二驱动件54及所述影像采集装置8启动，所述玻璃基板1的一个蒸镀区域与所述金属掩膜板4对位完成时，所述第一驱动件52、所述第二驱动件54及所述影像采集装置8关闭。当所述玻璃基板1的一个蒸镀区域完成蒸镀，另一个蒸镀区域蒸镀时，所述第一驱动件52、所述第二驱动件54及所述影像采集装置8启动，所述玻璃基板1的另一个蒸镀区域与所述金属掩膜板4对位完成时，所述第一驱动件52、所述第二驱动件54及所述影像采集装置8关闭。重复上述步骤，至所述蒸镀区域完成蒸镀。
在本实施例中，所述蒸镀机真空蒸镀腔的腔壁还具有一真空管9，所述真空管9用于抽走所述真空蒸镀腔2内的空气。
以上所揭露的仅为本发明较佳实施例而已，当然不能以此来限定本发明之权利范围，本领域普通技术人员可以理解实现上述实施例的全部或部分流程，并依本发明权利要求所作的等同变化，仍属于发明所涵盖的范围。

Claims (10)

  1. 一种蒸镀机，用于对玻璃基板的蒸镀，其中，所述蒸镀机包括真空蒸镀腔、以及收容于所述真空蒸镀腔内的蒸镀源、金属掩膜板、移动部以及托架，所述托架装设于所述移动部上，所述金属掩膜板被支撑于所述托架下方并位于所述蒸镀源上方可相对所述托架移动，所述玻璃基板吸附于所述托架朝向所述金属掩膜的表面并与所述金属掩膜板之间留有间隙，所述玻璃基板至少包括两个蒸镀区域，所述移动部带动所述托架移动，进而带动所述玻璃基板相对于所述金属掩膜板移动，以使所述玻璃基板的所述蒸镀区域与所述金属掩膜板的位置对应。
  2. 根据权利要求1所述的蒸镀机，其中，所述蒸镀机还包括被支撑于所述金属掩膜板下方的与所述蒸镀源正对的挡板，所述挡板用于控制所述蒸镀源的蒸镀范围。
  3. 根据权利要求2所述的蒸镀机，其中，所述挡板包括第一板体、第二板体以及导轮，所述导轮与所述第一板体以及所述第二板体滑动连接，所述第一板体朝向所述蒸镀源的位置设置有通槽，所述第二板体用于盖合所述通槽或滑开所述通槽。
  4. 根据权利要求1所述的蒸镀机，其中，所述托架包括两组相对设置的架框，其中一组所述架框的中部位置设置有一架臂，所述架框以及所述架臂吸附所述玻璃基板的表面设有真空孔，通过真空装置充气至所述真空孔以吸附所述玻璃基板。
  5. 根据权利要求1所述的蒸镀机，其中，所述移动部包括第一丝杆、连接于所述第一丝杆的第一驱动件、与所述第一丝杆垂直设置的第二丝杆以及连接于所述第二丝杆的第二驱动件，所述托架与所述第一丝杆滑动连接，所述第一驱动件驱动所述第一丝杆以及所述托架移动，所述第一丝杆连接所述第二丝杆，所述第二驱动件驱动所述第二丝杆带动所述第一丝杆及所述托架移动。
  6. 根据权利要求5所述的蒸镀机，其中，所述第一驱动件以及所述第二驱动件可以为气缸或者马达。
  7. 根据权利要求6所述的蒸镀机，其中，所述蒸镀机还包括相对所述金属 掩膜板设置的影像采集装置及支架，所述影像采集装置支撑于所述支架上，所述影像采集装置对所述玻璃基板的所述蒸镀区域与所述金属掩膜进行对位。
  8. 根据权利要求1所述的蒸镀机，其中，所述蒸镀源包括加热器、坩埚以及蒸镀材料，所述坩埚的顶面设置有通孔，所述蒸镀材料装设于所述坩埚中并可通过所述通孔到达所述玻璃基板的所述蒸镀区域，所述加热器用于加热所述蒸镀材料。
  9. 根据权利要求1所述的蒸镀机，其中，所述真空蒸镀腔具有一真空管，所述真空管用于抽走所述真空蒸镀腔内的空气。
  10. 根据权利要求7所述的蒸镀机，其中，所述蒸镀机还包括控制装置，所述控制装置用于控制所述第一驱动件、所述第二驱动件以及所述影像采集装置的启动以及关闭。
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