WO2019041654A1 - 一种具有超窄下边框的液晶显示面板及其制造方法 - Google Patents

一种具有超窄下边框的液晶显示面板及其制造方法 Download PDF

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WO2019041654A1
WO2019041654A1 PCT/CN2017/116839 CN2017116839W WO2019041654A1 WO 2019041654 A1 WO2019041654 A1 WO 2019041654A1 CN 2017116839 W CN2017116839 W CN 2017116839W WO 2019041654 A1 WO2019041654 A1 WO 2019041654A1
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tft array
substrate
insulating layer
liquid crystal
array substrate
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PCT/CN2017/116839
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English (en)
French (fr)
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宋文庆
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武汉华星光电技术有限公司
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Priority to US15/743,700 priority Critical patent/US20200174327A1/en
Publication of WO2019041654A1 publication Critical patent/WO2019041654A1/zh

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    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362Active matrix addressed cells
    • G02F1/136227Through-hole connection of the pixel electrode to the active element through an insulation layer
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1345Conductors connecting electrodes to cell terminals
    • G02F1/13458Terminal pads
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/48Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/133351Manufacturing of individual cells out of a plurality of cells, e.g. by dicing
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1345Conductors connecting electrodes to cell terminals
    • G02F1/13456Cell terminals located on one side of the display only

Definitions

  • the present invention relates to the field of display, and in particular to a liquid crystal display panel having an ultra-narrow bottom frame and a method of fabricating the same.
  • the liquid crystal display panel has an effective active area and a peripheral circuit area.
  • a plurality of pixels (pixels) are arranged in the effective display area and a pixel array is formed, and a peripheral circuit is provided with a peripheral circuit.
  • Each pixel includes a thin film transistor and a pixel electrode connected to the thin film transistor, and each pixel is surrounded by two adjacent scan lines and two adjacent data lines.
  • the scan lines and the data lines are extended from the effective display area to the peripheral circuit area, and are electrically connected to the drive IC through the peripheral circuits.
  • the driver chip has a specific size design, and the peripheral circuit is concentrated by connecting one end of the scan line and the data line to the area where the drive core is located.
  • the liquid crystal display panel includes a TFT array substrate 2 ′ and a CF substrate disposed opposite to the TFT array substrate 2 ′. 1' and a liquid crystal layer (not shown) between the two, the glass substrate of the TFT array substrate 2' includes an effective display area 20' located in the middle and a peripheral area 21' located outside the effective display area 20', The CF substrate of the lower frame region 22' of the peripheral region 21' has been cut away, and the glass substrate of the region is etched with a pattern.
  • the width of the lower frame is S (for example, 5 mm), and a data line such as a data line needs to be realized thereon. Design to IC trace, IC Bonding pattern pad (Pad), lighting pattern pad (Pad), QR code, etc.
  • FIG. 2 is a right side view of FIG. 1, from which it can be seen that an LCD conductive pad (LCD pad) is etched in the lower frame region of the glass substrate of the TFT array substrate 2'.
  • the technical problem to be solved by the present invention is to provide a liquid crystal display panel having an ultra-narrow bottom frame and a method of manufacturing the same, which can achieve ultra narrowing of the lower frame.
  • an aspect of an embodiment of the present invention provides a liquid crystal display panel having an ultra-narrow bottom frame, the liquid crystal display panel including a TFT array substrate, a CF substrate disposed opposite to the TFT array substrate, and a liquid crystal layer between the TFT array substrate and the CF substrate, the TFT array substrate includes a substrate, the substrate includes an effective display area in the middle and a peripheral area outside the effective display area, wherein:
  • At least a portion of the lower frame region of the peripheral region of the substrate protrudes beyond the CF substrate, and a pattern is etched on the lower frame region of the substrate, and an insulating layer is disposed thereon, and an upper side of the insulating layer is etched to form a plurality of LCD conductive pads for connecting to a driver chip connection point;
  • a plurality of via holes are formed on the insulating layer, and each of the LCD conductive pads on the upper side of the insulating layer is electrically connected to the TFT array lead-out line etched on the lower frame region of the substrate of the TFT array substrate through a via hole.
  • the insulating layer is a photoresist layer or an organic insulating layer.
  • the LCD conductive pad is an ITO (Indium-Tin Oxide) material, and an inner surface of each via is formed with an ITO film, and each of the LCD conductive pads on the upper side of the insulating layer passes through The ITO film in the hole is electrically connected to a TFT array lead line formed by etching on the lower frame region of the TFT array substrate.
  • ITO Indium-Tin Oxide
  • a method for manufacturing a liquid crystal display panel having an ultra-narrow bottom frame including the following steps:
  • each of the LCD panels including a TFT array substrate, a CF substrate disposed opposite to the TFT array substrate, and the TFT array substrate and the a liquid crystal layer between the CF substrates;
  • each of the LCD conductive pads is electrically connected to a TFT array lead line etched on the lower frame region of the substrate of the TFT array substrate through a via.
  • the insulating layer is a photoresist layer or an organic insulating layer.
  • an insulating layer (photoresist or organic insulating layer) is disposed on the substrate of the TFT array substrate at a lower frame region of the liquid crystal display panel, and then the LCD conductive pad is etched on the insulating layer; At the same time, a via hole is arranged on the insulating layer to electrically connect the LCD conductive pad on the insulating layer to the TFT array lead line on the substrate of the TFT array substrate, thereby transferring the partial pattern originally disposed on the substrate to the insulating layer. Thereby further reducing the length of the lower border;
  • 1 is a plan view showing a conventional liquid crystal display panel
  • Figure 2 is a right side view of Figure 1;
  • FIG. 3 is a schematic plan view of the LCD conductive pad of FIG. 1;
  • Figure 4 is a plan view showing the wiring point of the driving chip of Figure 1;
  • FIG. 5 is a schematic view showing the overlapping structure of the LCD conductive pad and the driving chip conductive pad of FIG. 1;
  • FIG. 6 is a plan view showing an embodiment of a liquid crystal display panel having an ultra-narrow bottom frame provided by the present invention.
  • Figure 7 is a right side view of Figure 6;
  • Figure 8 is a schematic longitudinal sectional view of the insulating layer of Figure 7;
  • Figure 9 is a schematic view showing the electrical connection on the insulating layer of Figure 7;
  • FIG. 10 is a schematic diagram showing the main flow of an embodiment of a method for manufacturing a liquid crystal display panel having an ultra-narrow bottom frame according to the present invention.
  • the liquid crystal display panel having an ultra-narrow bottom frame includes a TFT array substrate 2, a CF substrate 1 disposed opposite to the TFT array substrate 2, and the TFT array substrate 2 and the CF substrate.
  • a pattern 24 is etched on the lower frame region 22 of the substrate of the TFT array substrate 2 , and the pattern 24 may be an ITO pattern.
  • a TFT array lead-out function such as an extracted data line, a scan line, or the like, is further disposed thereon, and an insulating layer 3 is further disposed on the upper side of the insulating layer 3 to form an LCD conductive pad (LCD pad) layer 24 thereon.
  • a plurality of LCD pad 250 is formed for electrically connecting to a driver chip connection point (not shown), specifically, as shown in FIG.
  • Each of the LCD conductive pads 250 can further utilize an extended wiring to electrically connect to the driving chip connection point through an auxiliary conductive pad 251; it can be understood that the LCD conductive pad 250 and the auxiliary conductive pad 251 can be used. ITO material;
  • a plurality of via holes 30 are formed on the insulating layer 3, and each of the LCD conductive pads 250 on the upper side of the insulating layer 3 is etched through a via 30 and a lower frame region of the substrate of the TFT array substrate 2.
  • the TFT array leads the wires for electrical connection.
  • An ITO film (not shown) is formed on the inner wall of each of the via holes 30, and each of the LCD conductive pads 250 on the upper side of the insulating layer 3 passes through the ITO film in the via hole 30 and the substrate of the TFT array substrate 2.
  • a TFT array lead line 240 formed by etching on the lower bezel area is electrically connected.
  • the insulating layer 3 can be a photoresist layer or an organic insulating layer.
  • the length of the bottom frame of the liquid crystal display panel can be reduced to h (corresponding to the length of one Pad in the prior art, for example, in one example, about 1 mm).
  • h can be lower than one quarter of the length S of the lower frame in the prior art.
  • a method for manufacturing a liquid crystal display panel having an ultra-narrow bottom frame is provided. As shown in FIG. 10, in the embodiment, the method includes the following steps:
  • Step S10 cutting the entire substrate that has been produced to form a plurality of individual LCD panels, each of the LCD panels including a TFT array substrate, a CF substrate disposed opposite to the TFT array substrate, and the TFT array substrate And a liquid crystal layer between the CF substrate;
  • Step S11 cutting the CF substrate in the lower frame area of each LCD panel to expose the pattern on the substrate of the TFT array substrate in the area;
  • Step S12 forming an insulating layer on the substrate of the exposed TFT array substrate, etching the insulating layer, forming a plurality of via holes on the insulating layer, and forming a plurality of vias on the upper side of the insulating layer
  • An LCD conductive pad for electrically connecting to a driving chip connection point wherein each of the LCD conductive pads on the upper side of the insulating layer is electrically connected to the TFT array lead line etched on the lower frame area of the TFT array substrate through a via hole .
  • the insulating layer is a photoresist layer or an organic insulating layer.
  • the method further includes the step of forming an ITO film on the inner wall of each of the via holes, wherein the first LCD conductive pad on the upper side of the insulating layer is etched through the ITO film in a via hole and the lower frame region of the TFT array substrate A TFT array lead wire is electrically connected.
  • an insulating layer (photoresist or organic insulating layer) is disposed on the substrate of the TFT array substrate at the lower frame of the liquid crystal display panel, and then the LCD conductive pad is etched on the insulating layer; Providing a via hole on the insulating layer to electrically connect the LCD conductive pad on the insulating layer to the TFT array lead line on the substrate of the TFT array substrate, thereby transferring a portion of the pattern originally disposed on the substrate to the insulating layer, thereby The length of the lower border can be further reduced;

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Abstract

一种具有超窄下边框的液晶显示面板及相应的制造方法,液晶显示面板包括TFT阵列基板(2),CF基板(1),以及位于两者之间的液晶层,TFT阵列基板(2)包括有基板,基板包括位于中间的有效显示区域(20)及位于有效显示区域(20)外侧的外围区域(21),外围区域(21)的下边框区域(22)至少一部分伸出CF基板(1)之外,在下边框区域(22)上蚀刻有图案(24),其上设置有绝缘层(3),在绝缘层(3)上侧蚀刻形成多个LCD导电焊盘(250),绝缘层(3)上形成有多个过孔(30),绝缘层(3)上侧的每一个LCD导电焊盘(250)通过一个过孔(30)与TFT阵列基板(2)的基板下边框区域(22)上蚀刻的图案(24)进行电气连接,可以实现液晶显示面板下边框的超窄化。

Description

一种具有超窄下边框的液晶显示面板及其制造方法
本申请要求于2017年8月28日提交中国专利局、申请号为201710751712.0、发明名称为“一种具有超窄下边框的液晶显示面板及其制造方法”的中国专利申请的优先权,上述专利的全部内容通过引用结合在本申请中。
技术领域
本发明涉及显示领域,特别涉及一种具有超窄下边框的液晶显示面板及其制造方法。
背景技术
液晶显示面板具有有效显示区域(active area)以及周边电路区(peripheral circuit area)。有效显示区域内配置有多个像素(pixel)以及形成像素阵列,周边电路区则设有周边电路(peripheral circuit)。每个像素都包括薄膜晶体管以及与该薄膜晶体管连接的像素电极,且每个像素都被两条相邻的扫描线以及两条相邻的数据线包围。通常,这些扫描线以及数据线会由有效显示区域延伸至周边电路区,并通过周边电路与驱动芯片(drive IC)电性连接。一般而言,驱动芯片有特定尺寸设计,周边电路会由连接扫描线与数据线的一端向驱动芯所在的区域集中。
如图1所示,示出了现有的一种液晶显示面板的平面示意图,从中可以看出,该液晶显示面板包括TFT阵列基板2’、与所述TFT阵列基板2’相对设置的CF基板1’以及位于两者之间的液晶层(未示出),所述TFT阵列基板2’的玻璃基板包括位于中间的有效显示区域20’及位于有效显示区域20’外侧的外围区域21’,其中外围区域21’的下框区域22’的CF基板已被切割掉,此区域的玻璃基板上蚀刻有图案,一般情况下,下边框宽度为S(如5mm),其上需要实现诸如数据线至IC的走线、IC Bonding图形焊盘(Pad)、点灯图形焊盘(Pad)、二维码等设计;
请进一步参照图2至图5所示,图2为图1中的右视示意图,从中可以看出,在TFT阵列基板2’的玻璃基板的下框区域蚀刻有LCD导电焊盘(LCD pad)层24’;请进一步结合图3至图5,现有的LCD结构,LCD上的导电焊盘和驱动IC上的数据焊盘(pad)进行重叠对位,以使信号从驱动IC上传输到玻璃上。
综上,可以看出,在TFT阵列基板2’的玻璃基板需要布置诸多设计部件,在这种结构中,下边框的宽度较长,很难缩减。
发明内容
本发明所要解决的技术问题在于,提供一种具有超窄下边框的液晶显示面板及其制造方法,可以实现下边框的超窄化。
为了解决上述技术问题,本发明的实施例的一方面提供一种具有超窄下边框的液晶显示面板,所述液晶显示面板包括TFT阵列基板、与所述TFT阵列基板相对设置的CF基板以及位于所述TFT阵列基板和所述CF基板之间的液晶层,所述TFT阵列基板包括有基板,所述基板包括位于中间的有效显示区域及位于有效显示区域外侧的外围区域,其中:
所述基板的外围区域的下边框区域至少一部分伸出所述CF基板之外,在所述基板的下边框区域上蚀刻有图案,其上设置有绝缘层,在所述绝缘层上侧蚀刻形成多个用于与驱动芯片接线点相连接的LCD导电焊盘;
所述绝缘层上形成有多个过孔,绝缘层上侧的每一个LCD导电焊盘通过一个过孔与所述TFT阵列基板的基板下边框区域上蚀刻的TFT阵列引出线实现电气连接。
其中,所述绝缘层为光阻层或有机绝缘层。
其中,所述LCD导电焊盘为ITO(Indium-Tin Oxide,氧化铟锡)材料,所述每一过孔内壁形成有ITO膜,所述绝缘层上侧的每一LCD导电焊盘通过一个过孔中的ITO膜与TFT阵列基板下边框区域上蚀刻形成的一个TFT阵列引出线进行电气连接。
相应地,本发明实施例的另一方面,还提供一种具有超窄下边框的液晶显示面板的制造方法,包括如下步骤:
将已生产的整张基板进行切割,形成多个单独的LCD面板,所述每一LCD面板包括TFT阵列基板、与所述TFT阵列基板相对设置的CF基板以及位于所述TFT阵列基板和所述CF基板之间的液晶层;
对每一LCD面板下边框区域的CF基板进行切割,使此区域TFT阵列基板的基板上的图形裸露出来;
在裸露的TFT阵列基板的基板上形成一层绝缘层,并对所述绝缘层进行蚀刻,在所述绝缘层上侧形成多个用于与驱动芯片接线点电气连接的LCD导电焊盘,以及在所述绝缘层上,其中,每一所述LCD导电焊盘通过一个过孔与所述TFT阵列基板的基板下边框区域上蚀刻的一个TFT阵列引出线实现电气连接。
其中,所述绝缘层为光阻层或有机绝缘层。
其中,进一步包括:
在所述每一过孔内壁形成有ITO膜的步骤,所述绝缘层上侧的第一LCD导电焊盘通过一个过孔中的ITO膜与TFT阵列基板下边框区域上蚀刻的一个TFT阵列引出线实现电气连接。
实施本发明实施例,具有如下有益效果:
本发明的实施例中,通过在液晶显示面板的下边框区域处,在TFT阵列基板的基板上设置一层绝缘层(光阻或有机绝缘层),然后在绝缘层上蚀刻LCD导电焊盘;同时在绝缘层上设置过孔,使绝缘层上的LCD导电焊盘与TFT阵列基板的基板上的TFT阵列引出线电气连接,从而将原来设置于基板上的部分图形转移到绝缘层上面来,从而可以进一步减少下边框的长度;
另外,本发明的实施例的结构和电路连接均非常容易实现,适应性强。
附图说明
为了更清楚地说明本发明实施例或现有技术中的技术方案,下面将对实施例或现有技术描述中所需要使用的附图作简单地介绍,显而易见地,下面描述中的附图仅仅是本发明的一些实施例,对于本领域普通技术人员来讲,在不付出创造性劳动的前提下,还可以根据这些附图获得其它的附图。
图1示出了现有的一种液晶显示面板的平面示意图;
图2为图1中的右视示意图;
图3为图1中LCD导电焊盘的平面示意图;
图4为图1中驱动芯片接线点的平面图示意图;
图5是图1中LCD导电焊盘和驱动芯片导电pad重叠结构示意图;
图6是本发明提供的一种具有超窄下边框的液晶显示面板的一个实施例的平面示意图;
图7是图6的右视示意图;
图8是图7中绝缘层的纵剖面连接示意图;
图9是图7中绝缘层上电气连接示意图;
图10是本发明提供的一种具有超窄下边框的液晶显示面板的制造方法的一个实施例的主流程示意图。
具体实施方式
下面将结合本发明实施例中的附图,对本发明实施例中的技术方案进行清楚完整地描述,显然,所描述的实施例仅仅是本发明的一部分实施例,而不是全部的实施例。基于本发明中的实施例,本领域普通技术人员在没有做出创造性劳动的前提下所获得的所有其它实施例,都属于本发明保护的范围。
在此,还需要说明的是,为了避免因不必要的细节而模糊了本发明,在附图中仅仅示出了与根据本发明的方案密切相关的结构和/或处理步骤,而省略了与本发明关系不大的其他细节。
图1是本发明提供的如图6所示,示出了本发明提供的一种具有超窄下边框的液晶显示面板的一个实施例的平面示意图;并请一并结合图7至图9所示,在该实施例中,该具有超窄下边框的液晶显示面板包括TFT阵列基板2、与所述TFT阵列基板2相对设置的CF基板1以及位于所述TFT阵列基板2和所述CF基板1之间的液晶层(未示出),所述TFT阵列基板2包括有基板,在一个例子,该基板可以是玻璃基板,所述基板包括位于中间的有效显示区域20及位于有效显示区域20外侧的外围区域21,其中:
所述外围区域21的下边框区域22至少一部分伸出所述CF基板1之外, 在所述TFT阵列基板2的基板的下边框区域22上蚀刻有图案24,该图案24可以是ITO图案,实现TFT阵列引出线功能,诸如引出的数据线、扫描线等,其上进一步设置一层绝缘层3,在所述绝缘层3上侧蚀刻形成LCD导电焊盘(LCD pad)层24,其上形成有多个LCD导电焊盘(LCD pad)250,用于与驱动芯片接线点(未示出)相电气连接,具体地,如图9所示,在一个例子中,在绝缘层3上,每个LCD导电焊盘250可以进一步利用延伸的布线,通过一辅助导电焊盘251与驱动芯片接线点实现电气连接;可以理解的是,其中LCD导电焊盘250、辅助导电焊盘251均可采用ITO材料;
另外,在所述绝缘层3上形成有多个过孔30,绝缘层3上侧的每一个LCD导电焊盘250通过一个过孔30与所述TFT阵列基板2的基板的下边框区域上蚀刻的TFT阵列引出线进行电气连接。在每一所述过孔30内壁形成有ITO膜(未示出),所述绝缘层3上侧的每一LCD导电焊盘250通过一个过孔30中的ITO膜与TFT阵列基板2的基板的下边框区域上蚀刻形成的一个TFT阵列引出线240进行电气连接。
可以理解的是,所述绝缘层3可以为光阻层或有机绝缘层。
可以理解的是,通过上述图5至图6示出的结构,可以将液晶显示面板下边框的长度缩小至h(相当于现有技术中一个Pad的长度,例如在一个例子中可以为1mm左右),其中h可以低于现有技术中下边框长度S的四分之一。
相应地,本发明实施例的另一方面,还提供了一种具有超窄下边框的液晶显示面板的制造方法,如图10所示,在该实施例中,该方法包括如下步骤:
步骤S10,将已生产的整张基板进行切割,形成多个单独的LCD面板,所述每一LCD面板包括TFT阵列基板、与所述TFT阵列基板相对设置的CF基板以及位于所述TFT阵列基板和所述CF基板之间的液晶层;
步骤S11,对每一LCD面板下边框区域的CF基板进行切割,使此区域TFT阵列基板的基板上的图形裸露出来;
步骤S12,在裸露的TFT阵列基板的基板上形成一层绝缘层,并对所述绝缘层进行蚀刻,在所述绝缘层上形成有多个过孔以及在所述绝缘层上侧形 成多个用于与驱动芯片接线点电气连接的LCD导电焊盘,所绝缘层上侧的每一LCD导电焊盘通过一个过孔与所述TFT阵列基板下边框区域上蚀刻的TFT阵列引出线进行电气连接。
其中,所述绝缘层为光阻层或有机绝缘层。
其中,进一步包括在所述每一过孔内壁形成有ITO膜的步骤,所述绝缘层上侧的第一LCD导电焊盘通过一个过孔中的ITO膜与TFT阵列基板下边框区域上蚀刻的一个TFT阵列引出线进行电气连接。
实施本发明实施例,具有如下有益效果:
本发明的实施例中,通过在液晶显示面板的下边框处,在TFT阵列基板的基板上设置一层绝缘层(光阻或有机绝缘层),然后在绝缘层上蚀刻LCD导电焊盘;同时在绝缘层上设置过孔,使绝缘层上的LCD导电焊盘与TFT阵列基板的基板上的TFT阵列引出线电气连接,从而将原来设置于基板上的部分图形转移到绝缘层上面来,从而可以进一步减少下边框的长度;
另外,本发明的实施例的结构和电路连接均非常容易实现,适应性强。
需要说明的是,在本文中,诸如第一和第二等之类的关系术语仅仅用来将一个实体或者操作与另一个实体或操作区分开来,而不一定要求或者暗示这些实体或操作之间存在任何这种实际的关系或者顺序。而且,术语“包括”、“包含”或者其任何其他变体意在涵盖非排他性的包含,从而使得包括一系列要素的过程、方法、物品或者设备不仅包括那些要素,而且还包括没有明确列出的其他要素,或者是还包括为这种过程、方法、物品或者设备所固有的要素。在没有更多限制的情况下,由语句“包括一个......”限定的要素,并不排除在包括所述要素的过程、方法、物品或者设备中还存在另外的相同要素。
以上所述仅是本申请的具体实施方式,应当指出,对于本技术领域的普通技术人员来说,在不脱离本申请原理的前提下,还可以做出若干改进和润饰,这些改进和润饰也应视为本申请的保护范围。

Claims (8)

  1. 一种具有超窄下边框的液晶显示面板,所述液晶显示面板包括TFT阵列基板、与所述TFT阵列基板相对设置的CF基板以及位于所述TFT阵列基板和所述CF基板之间的液晶层,所述TFT阵列基板包括基板,所述基板包括位于中间的有效显示区域及位于有效显示区域外侧的外围区域,其中:
    所述基板的外围区域的下边框区域至少一部分伸出所述CF基板之外,在所述基板的下边框区域上蚀刻有TFT阵列引出线,其上设置有绝缘层,在所述绝缘层上侧蚀刻形成多个LCD导电焊盘;
    所述绝缘层上形成有多个过孔,绝缘层上侧的每一个LCD导电焊盘通过一个过孔与所述TFT阵列基板的基板下边框区域上蚀刻的TFT阵列引出线实现电气连接。
  2. 如权利要求1所述的一种具有超窄下边框的液晶显示面板,其中,所述绝缘层为光阻层或有机绝缘层。
  3. 如权利要求1所述的一种具有超窄下边框的液晶显示面板,其中,所述LCD导电焊盘为ITO材料,所述每一过孔内壁形成有ITO膜,所述绝缘层上侧的每一LCD导电焊盘通过一个过孔中的ITO膜与TFT阵列基板下边框区域上蚀刻形成的一个TFT阵列引出线进行电气连接。
  4. 如权利要求2所述的一种具有超窄下边框的液晶显示面板,其中,所述LCD导电焊盘为ITO材料,所述每一过孔内壁形成有ITO膜,所述绝缘层上侧的每一LCD导电焊盘通过一个过孔中的ITO膜与TFT阵列基板下边框区域上蚀刻形成的一个TFT阵列引出线进行电气连接。
  5. 一种具有超窄下边框的液晶显示面板的制造方法,其中,包括如下步骤:
    将已生产的整张基板进行切割,形成多个单独的LCD面板,所述每一LCD面板包括TFT阵列基板、与所述TFT阵列基板相对设置的CF基板以 及位于所述TFT阵列基板和所述CF基板之间的液晶层;
    对每一LCD面板下边框区域的CF基板进行切割,使此区域TFT阵列基板的基板上的图形裸露出来;
    在裸露的TFT阵列基板的基板上形成一层绝缘层,并对所述绝缘层进行蚀刻,在所述绝缘层上侧形成多个用于与驱动芯片接线点电气连接的LCD导电焊盘,以及在所述绝缘层上,其中,每一所述LCD导电焊盘通过一个过孔与所述TFT阵列基板的基板下边框区域上蚀刻的TFT阵列引出线实现电气连接。
  6. 如权利要求5所述的一种具有超窄下边框的液晶显示面板的制造方法,其中,所述绝缘层为光阻层或有机绝缘层。
  7. 如权利要求5所述的一种具有超窄下边框的液晶显示面板制造方法,其中,进一步包括:
    在所述每一过孔内壁形成有ITO膜的步骤,所述绝缘层上侧的第一LCD导电焊盘通过一个过孔中的ITO膜与TFT阵列基板下边框区域上蚀刻的一个TFT阵列引出线实现电气连接。
  8. 如权利要求6所述的一种具有超窄下边框的液晶显示面板制造方法,其中,进一步包括:
    在所述每一过孔内壁形成有ITO膜的步骤,所述绝缘层上侧的第一LCD导电焊盘通过一个过孔中的ITO膜与TFT阵列基板下边框区域上蚀刻的一个TFT阵列引出线实现电气连接。
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