WO2019006904A1 - 一种显示面板及制造方法 - Google Patents

一种显示面板及制造方法 Download PDF

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Publication number
WO2019006904A1
WO2019006904A1 PCT/CN2017/106298 CN2017106298W WO2019006904A1 WO 2019006904 A1 WO2019006904 A1 WO 2019006904A1 CN 2017106298 W CN2017106298 W CN 2017106298W WO 2019006904 A1 WO2019006904 A1 WO 2019006904A1
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Prior art keywords
layer
transparent
display panel
photoresist
photoresist layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/CN2017/106298
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English (en)
French (fr)
Inventor
简重光
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
HKC Co Ltd
Chongqing HKC Optoelectronics Technology Co Ltd
Original Assignee
HKC Co Ltd
Chongqing HKC Optoelectronics Technology Co Ltd
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Application filed by HKC Co Ltd, Chongqing HKC Optoelectronics Technology Co Ltd filed Critical HKC Co Ltd
Priority to US16/628,632 priority Critical patent/US10989969B2/en
Publication of WO2019006904A1 publication Critical patent/WO2019006904A1/zh
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
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    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G02F1/13392—Gaskets; Spacers; Sealing of cells spacers dispersed on the cell substrate, e.g. spherical particles, microfibres
    • G—PHYSICS
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    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1343—Electrodes
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1343—Electrodes
    • G02F1/13439—Electrodes characterised by their electrical, optical, physical properties; materials therefor; method of making
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
    • H10D86/01—Manufacture or treatment
    • H10D86/021—Manufacture or treatment of multiple TFTs
    • H10D86/0231—Manufacture or treatment of multiple TFTs using masks, e.g. half-tone masks
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G02F1/13394—Gaskets; Spacers; Sealing of cells spacers regularly patterned on the cell subtrate, e.g. walls, pillars
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/136222—Colour filters incorporated in the active matrix substrate
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/136231—Active matrix addressed cells for reducing the number of lithographic steps
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/136231—Active matrix addressed cells for reducing the number of lithographic steps
    • G02F1/136236—Active matrix addressed cells for reducing the number of lithographic steps using a grey or half tone lithographic process
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2201/00—Constructional arrangements not provided for in groups G02F1/00 - G02F7/00
    • G02F2201/50—Protective arrangements
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
    • H10D86/40—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs
    • H10D86/451—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs characterised by the compositions or shapes of the interlayer dielectrics
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
    • H10D86/40—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs
    • H10D86/60—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs wherein the TFTs are in active matrices

Definitions

  • the present application relates to the field of display technologies, and in particular, to a display panel and a manufacturing method thereof.
  • the display has many advantages such as thin body, power saving, no radiation, and has been widely used.
  • Most of the displays on the market today are backlight-type displays, which include a display panel and a backlight module.
  • the working principle of the display panel is to place liquid crystal molecules in two parallel substrates, and apply driving voltages on the two substrates to control the rotation direction of the liquid crystal molecules to refract the light of the backlight module to generate a picture.
  • the thin film transistor display includes a display panel and a backlight module, and the display panel includes a color filter substrate (CF Substrate, also referred to as a color filter substrate) and a thin film transistor array substrate (Thin Film Transistor Substrate, TFT Substrate).
  • CF Substrate also referred to as a color filter substrate
  • TFT Substrate thin film transistor array substrate
  • a transparent electrode exists on the opposite inner side of the substrate.
  • a layer of liquid crystal molecules (LC) is sandwiched between the two substrates.
  • the display panel controls the orientation of the liquid crystal molecules by an electric field, changes the polarization state of the light, and achieves the purpose of display by the penetration and blocking of the optical path by the polarizing plate.
  • the technical problem to be solved by the present application is to provide a display panel that effectively reduces the number of processes.
  • the present application also provides a method of manufacturing a display panel.
  • a display panel comprising:
  • An active switch disposed on the substrate
  • the color resist layer is covered with a transparent photoresist layer, and the transparent photoresist layer comprises a protective layer and a spacer unit.
  • the transparent photoresist layer is made of a composite negative photoresist material layer
  • the composite negative photoresist material layer comprises a transparent protective layer and a negative photoresist layer
  • the transparent protective layer and the transparent protective layer The negative photoresist layer stack is arranged.
  • the utility model can effectively simplify the production process of the display panel, reduce the process of the display panel, reduce the production time of the display panel, and further improve the production efficiency of the display panel.
  • the transparent photoresist layer is made of a mixed photoresist material layer, and the mixed photoresist material layer is formed by mixing a transparent protective material and a negative photoresist material.
  • the transparent protective material and the negative photoresist material disposed on the color resist layer can be effectively replaced, and only a photomask can effectively produce the transparent photoresist layer, which can optimize and reduce The number of processes for the display panel.
  • the transparent photoresist layer is provided with a transparent electrode layer, and the spacer unit is disposed through the transparent electrode layer.
  • the transparent electrode layer is disposed on the transparent photoresist layer to ensure that the transparent electrode layer can work well, and the transparent electrode layer and the spacer unit can be effectively disposed through two processes, which can effectively optimize and reduce the display panel. The number of processes.
  • the present application also discloses a method of manufacturing a display panel, the display panel including a substrate, an active switch disposed on the substrate, and a color resist layer disposed on the active switch, including Steps:
  • a transparent photoresist layer covering the color resist layer is obtained by a photomask process.
  • the transparent photoresist layer of the display panel can be well fabricated by a simple mask process, and the protective layer and the spacer unit can be completed at one time, and the transparent photoresist layer can effectively replace the protective layer and the spacer unit.
  • the composite negative photoresist layer with insulating properties is covered on the color resist layer, which can effectively simplify the production process of the display panel, reduce the process of the display panel, reduce the production time of the display panel, and further improve The production efficiency of the display panel; at the same time, the production cost of the display panel can be effectively reduced, and the market competitiveness of the display panel is further improved.
  • the reticle of the reticle process is a multi-gray reticle.
  • the multi-gray mask can be divided into a half-tone mask and a gray-tone mask.
  • the gray dimmer is to make a micro slit below the resolution of the exposure machine, and then to cover a part of the light source by the micro slit portion to achieve the effect of half exposure.
  • the composite negative photoresist material layer comprises a transparent protective layer and a negative photoresist layer
  • the manufacturing step of the composite negative photoresist material layer comprises:
  • a double-layer transparent structure composite negative photoresist material layer is obtained by a photo-curing process and a thermal reaction process.
  • the transparent photoresist layer can be effectively formed, effectively replacing the protective layer and the spacer unit, which can effectively simplify the production process of the display panel and help reduce the display panel.
  • the process reduces the production time of the display panel and further improves the production efficiency of the display panel.
  • the composite negative photoresist material layer is a layer of a mixed photoresist material comprising a transparent protective material and a negative photoresist material
  • the manufacturing step of the mixed photoresist material layer comprises:
  • a layer of a transparent photoresist layer is obtained by a photocuring process and a thermal reaction process.
  • the transparent photoresist layer can be easily and conveniently fabricated by this method, and only a mask is needed.
  • the effective production of a transparent photoresist layer can effectively optimize and reduce the number of processes of the display panel.
  • the step of obtaining a transparent photoresist layer covering the active switch by using a mask process includes:
  • the number of processes of the display panel can be effectively optimized and reduced.
  • the method further comprises the steps of:
  • the present application also discloses a display device including the display panel as described above.
  • the transparent photoresist layer has an effective insulating property, and can effectively replace the process of providing a protective layer on the color resist layer in the color film array substrate product process, thereby effectively optimizing and reducing the number of processes of the display panel, so that the display panel It can be produced more conveniently, which is beneficial to reduce the process of the display panel, further reduce the production time of the display panel, further improve the production efficiency of the display panel, and eliminate the process of providing a protective layer on the color resist layer.
  • the transparent photoresist layer has photosensitivity and higher light transmittance, which can effectively replace the spacer unit with half-tone
  • the mask or the gray-tone mask can complete the setting of the protective layer and the spacer unit at one time, so that the setting of the transparent photoresist layer is convenient and simple, and the production process of the display panel can be simplified, and the display is further displayed. Panel production efficiency.
  • FIG. 1 is a schematic cross-sectional view of an exemplary display panel
  • FIG. 2 is a schematic cross-sectional view showing the structure of an exemplary first substrate layer
  • FIG. 3 is a flow chart of a method of fabricating an exemplary display panel
  • FIG. 4 is a cross-sectional view of a display panel according to another embodiment of the present application.
  • FIG. 5 is a cross-sectional view of a display panel according to another embodiment of the present application.
  • FIG. 6 is a flowchart of a method of manufacturing a display panel according to an embodiment of the present application.
  • FIG. 7 is a flow chart of a method for fabricating a composite negative photoresist material layer of a double-layer transparent structure according to an embodiment of the present application
  • FIG. 8 is a schematic diagram of a method for fabricating a composite negative photoresist material layer of a double-layer transparent structure according to an embodiment of the present application
  • FIG. 9 is a flow chart of a method for fabricating a layer of a transparent photoresist material layer of a transparent structure according to an embodiment of the present application.
  • FIG. 10 is a schematic view showing a method of fabricating a transparent photoresist material layer of a transparent structure according to an embodiment of the present application
  • FIG. 11 is a flowchart of a method of manufacturing a display panel according to an embodiment of the present application.
  • FIG. 12 is a flowchart of a method of manufacturing a display panel according to an embodiment of the present application.
  • FIG. 13 is a flowchart of a method of manufacturing a display panel according to an embodiment of the present application.
  • FIG. 14 is a cross-sectional structural view of a display panel according to an embodiment of the present application.
  • first and second are used for descriptive purposes only and are not to be construed as indicating or implying a relative importance or implicitly indicating the number of technical features indicated. Thus, features defining “first” and “second” may include one or more of the features either explicitly or implicitly.
  • a plurality means two or more unless otherwise stated.
  • the term “comprises” and its variations are intended to cover a non-exclusive inclusion.
  • connection In the description of the present application, it should be noted that the terms “installation”, “connected”, and “connected” are to be understood broadly, and may be fixed or detachable, for example, unless otherwise explicitly defined and defined. Connected, or integrally connected; can be mechanical or electrical; can be directly connected, or indirectly connected through an intermediate medium, can be the internal communication of the two components. For those skilled in the art, the specific meanings of the above terms in the present application can be understood on a case-by-case basis.
  • an exemplary display panel is provided.
  • the display panel includes a substrate 11 , an active switch 2 , and a color resist layer 4 .
  • the active switch 2 is disposed on the substrate 11
  • the color resist layer 4 is disposed on the active switch 2 .
  • the resist layer 4 is covered with a protective layer 5, a transparent electrode layer 7 is provided on the protective layer 5, and a spacer 6 (photo spacer, PS) is provided on the transparent electrode layer 7.
  • the protective layer 5 can effectively protect the color resist layer 4, can effectively avoid the direct corrosion of the color resist layer 4 by the cleaning agent in the subsequent process, effectively reduce the scrapping cost, thereby improving the quality of the display panel, and the spacing unit 6 can provide Good support performance ensures that the liquid crystal in the liquid crystal cell can work effectively.
  • the first substrate layer 1 includes a substrate 11 and an active switch 2.
  • the active switch 2 includes a gate electrode 21 disposed on the substrate 11, a passivation layer on the gate electrode 21, and a passivation layer.
  • the semiconductor layer 22 is provided with a metal layer 23.
  • the metal layer 23 includes a source 231 and a drain 232.
  • the metal layer 23 is provided with an insulating layer 24.
  • the insulating layer 24 can effectively protect the active switch 2. Effectively avoiding direct corrosion of the source 231 and the drain 232 of the active switch 2 by the cleaning agent in the subsequent process, so that the source 231 and the drain 232 can be kept intact, thereby reducing the problem of disconnection and effectively reducing the scrapping cost, thereby further reducing the scrapping cost.
  • the quality of the display panel is improved; and the source 231 and the drain 232 of the active switch 2 are made of a metal material, and the sides of the source 231 and the drain 232 have metal burrs from the microstructure, and the insulating layer 24 can Further protecting the source 231 and the drain 232 effectively avoids the influence of the subsequent process on the source 231 and the drain 232, thereby effectively improving the yield of the display panel.
  • the color resist layer a1 is formed on the insulating layer 24 of the first substrate layer 1 to form the color resist layer 4, and then the insulating layer b1 is formed on the color resist layer 4 to form the protective layer 5, and then the protective layer 5 is formed.
  • the sputtering process c1 for performing the transparent electrode layer forms a transparent electrode material layer, the transparent electrode material layer is subjected to a development etching process d1 to form the transparent electrode layer 7, and the spacer unit process e1 is formed on the transparent electrode layer 7 to form the spacer unit 6.
  • the protective layer 5, the transparent electrode layer 7 and the spacer unit 6 of the existing product need to be processed more than three times, the production steps are complicated, the input cost is high, and the operation is easy to occur, resulting in a good display panel.
  • the rate is not high. Therefore, the present application provides a technical solution that can effectively reduce the number of display panel processes.
  • the display panel includes: a display panel, the display panel includes: a substrate 11; an active switch 2 disposed on the substrate 11; a color resist layer 4, wherein the color resist layer 4 is formed on the active switch 2; the color resist layer 4 is covered with a transparent transparent photoresist layer 3, and the transparent photoresist layer 3 includes a protective layer 5 and a spacer unit 6.
  • the transparent photoresist layer 3 Since the transparent photoresist layer 3 has effective insulating properties, it can effectively replace the color filter on Array (COA) product process in which the protective layer 5 needs to be disposed on the color resist layer 4.
  • COA color filter on Array
  • the process can effectively optimize and reduce the number of processes of the display panel, so that the display panel can be more conveniently produced, which is beneficial to reducing the process of the display panel, further reducing the production time of the display panel, and further improving the production efficiency of the display panel.
  • the process of providing the protective layer 5 on the color resist layer 4 is omitted, the production cost of the display panel can be effectively reduced, and the market competitiveness of the display panel is further improved; and the transparent photoresist layer 3 has photosensitivity and high transparency.
  • the light rate can effectively replace the spacer unit 6, and the half-tone mask or the gray-tone mask can complete the setting of the protective layer 5 and the spacer unit 6 at one time, so that the transparent photoresist layer
  • the setting of 3 is convenient and simple, which can simplify the production process of the display panel and further improve the production efficiency of the panel.
  • the transparent photoresist layer 3 is made of a composite negative photoresist layer 31, and the composite negative photoresist layer 31 includes a transparent protective layer 32 and a negative photoresist layer 33.
  • the layer 32 is stacked with the negative photoresist layer 33.
  • the effect further improves the dark spot of the lighting, so that the display panel display effect is further improved, and the display quality of the display panel is further improved;
  • the negative photoresist layer 33 also has high transmittance and contrast, thereby ensuring the color of the display panel.
  • the brightness is more uniform, effectively improving the quality of the display panel;
  • the transparent protective layer 32 and the negative photoresist layer 33 are stacked, the transparent protective layer 32 is disposed on the lower layer, and the negative photoresist layer 33 is disposed on the upper layer, which will be compound negative
  • the photoresist layer 31 is laid on the color resist layer 4, and the transparent photoresist layer 3 can be effectively formed by matching a half-tone mask or a gray-tone mask, which is an effective alternative.
  • the protective layer 5 and the spacer unit 6 can effectively simplify the production process of the display panel, reduce the process of the display panel, reduce the production time of the display panel, and further improve the display surface.
  • the transparent protective layer 32 may be made of a transparent protective material 321 , the transparent protective material 321 may be a transparent resin or the like, the negative resistive layer 33 may be made of a negative resistive material 331 , and the negative resistive material 331 may be A photosensitive polymer based mainly on acrylates or epoxy.
  • the transparent photoresist layer 3 is made of a mixed photoresist layer 34, and the mixed photoresist layer 34 is formed by mixing a transparent protective material 321 and a negative photoresist material 331.
  • the transparent protective material and the negative photoresist material disposed on the color resist layer 4 can be effectively replaced by the arrangement of the mixed photoresist layer 34 by matching a half-tone mask or a gray-tone
  • the reticle can effectively form the transparent photoresist layer 3, and only a reticle can effectively make the transparent photoresist layer 3, which can effectively optimize and reduce the number of processes of the display panel, so that the display panel can be more conveniently
  • the production process is advantageous for reducing the process of the display panel, further reducing the production time of the display panel, further improving the production efficiency of the display panel, and eliminating the process of providing the protective layer 5 or the spacer unit on the color resist layer 4,
  • the production cost of the display panel is effectively reduced, and the market competitiveness of the display panel is further improved; and the arrangement of the
  • the transparent photoresist layer 3 is provided with a transparent electrode layer 7, and the spacer unit 6 is disposed through the transparent electrode layer 7, that is, the transparent electrode layer 7 is not formed on the spacer unit 6.
  • the transparent electrode layer 7 is disposed on the transparent photoresist layer 3 to ensure that the transparent electrode layer 7 can work well.
  • the transparent electrode layer 7 and the spacer unit 6 can be effectively disposed only by two processes, and the transparent electrode layer 7 is passed through the transparent electrode layer 7. Avoiding the spacing unit 6 arrangement, the mutual interference between the transparent electrode layer 7 and the spacing unit 6 is effectively avoided, the display effect of the display panel is ensured, and the spacing unit 6 is maintained with very good supporting performance, thereby ensuring the display panel.
  • the color and brightness are more uniform, which further improves the display effect of the display panel, and further enhances the competitiveness of the product.
  • the thickness and shape of the spacing unit 6 can be effectively controlled, ensuring that the spacing unit 6 can provide effective supporting performance, further improving the dark spots of the lighting, so that the display panel
  • the display effect is further improved, and the display quality of the display panel is further improved.
  • the first substrate layer 1 and the second substrate layer are disposed in parallel, and the spacer unit is disposed between the first substrate layer 1 and the second substrate layer, and between the first substrate layer 1 and the second substrate layer.
  • a liquid crystal layer (not shown) is formed.
  • the first substrate layer 1 or the second substrate layer may be a color film substrate or a thin film transistor array substrate, and a transparent photoresist layer is disposed on the color filter substrate or the thin film transistor array substrate, and the transparent photoresist layer includes a protective layer and a spacer unit.
  • the display panel includes a substrate 11, an active switch 2 disposed on the substrate 11, and a color resist layer 4 disposed on the active switch 2, including the steps of:
  • the transparent photoresist layer 3 of the display panel can be well fabricated by a simple mask process, and the protective layer 5 and the spacer unit 6 can be completed at one time, and the transparent photoresist layer 3 can be effectively used.
  • the substitute protective layer 5 material and the spacer material cover the composite negative photoresist material layer 31 having the insulating property on the color resist layer 4, which can effectively simplify the production process of the display panel and facilitate the process of reducing the display panel.
  • the production time of the display panel is reduced, and the production efficiency of the display panel is further improved; the features of the transparent photoresist layer 3 are not described again.
  • the reticle process reticle is a gray dimmer or a halftone reticle.
  • the multi-gray mask can be divided into a half-tone mask and a gray-tone mask.
  • the gray dimmer is to make a micro slit below the resolution of the exposure machine, and then to cover a part of the light source by the micro slit portion to achieve the effect of half exposure.
  • a halftone mask is semi-exposure using a semi-transmissive film. Since the above two methods can exhibit three exposure levels of the exposed portion, the half exposed portion and the unexposed portion after one exposure process, the photosensitive layer layers of two thicknesses can be formed after development.
  • the pattern can be transferred to the panel substrate 11 in a relatively small number of sheets, and the panel production efficiency is improved; the multi-gray mask is used in a smaller number than the conventional one.
  • the mask can transfer the pattern onto the material layer, and the multi-gray mask of the panel process can shorten the production efficiency of the panel.
  • the display panel can be improved. Display quality.
  • the composite negative photoresist material layer 31 includes a transparent protective layer 32 and a negative photoresist layer 33.
  • the manufacturing steps of the composite negative photoresist material layer 31 include:
  • the transparent protective material 321 is added to the bottom of the mold, and the negative photoresist material 331 is added to the transparent protective material 321 .
  • the characteristics of the transparent protective layer 32 are determined by the transparent protective material 321 by the photo-curing process and the thermal reaction process.
  • the characteristics of the photoresist layer 33 are determined by the negative photoresist material 331. After the reaction, a composite negative photoresist material layer 31 having a double-layer transparent structure is formed, and the transparent protective layer 32 under the composite negative photoresist material layer 31 is insulated.
  • the negative photoresist layer 33 on the upper layer of the composite negative photoresist layer 31 has a non-high hardness, and the hardness is above 3H, which can provide an effective supporting effect on the substrate 11, and further improve the lighting.
  • the dark spot makes the display panel display effect further, further improving the display quality of the display panel;
  • the negative photoresist layer 33 also has high light transmittance and contrast, thereby ensuring more uniform color and brightness of the display panel, and effectively The quality of the display panel is improved;
  • the transparent protective layer 32 and the negative photoresist layer 33 are stacked, the transparent protective layer 32 is disposed on the lower layer, and the negative photoresist layer 33 is disposed on the upper layer.
  • the layer of the composite negative photoresist layer 31 is laid on the color resist layer 4, and the transparent photoresist layer 3 can be effectively formed by using a halftone mask or a gray dimming cover, effectively replacing the protective layer 5 and the interval.
  • the unit 6 can effectively simplify the production process of the display panel, reduce the process of the display panel, reduce the production time of the display panel, and further improve the production efficiency of the display panel.
  • the mixed photoresist layer 34 is formed by mixing a transparent protective material and a negative photoresist material.
  • the manufacturing steps of the mixed photoresist layer 34 include:
  • the over-curing process and the thermal reaction process can conveniently and simply obtain a transparent negative-type photoresist material layer 31, which is advantageous for large-scale production of composite photoresist materials, further reducing production cost;
  • the arrangement of the resistive material layer 34 can effectively replace the transparent protective material and the negative photoresist material disposed on the color resist layer 4, and the transparent photoresist layer 3 can be effectively formed by using a halftone mask or a gray dimming cover.
  • the transparent photoresist layer 3 can be effectively fabricated by only one mask, which simplifies the process.
  • the step of obtaining a transparent photoresist layer 3 covering the active switch 2 by using a mask process includes:
  • the photosensitive layer is disposed on the composite negative photosensitive layer or the mixed photoresist layer 34, and the photosensitive layer is exposed and developed by a mask process to obtain a desired pattern of the transparent photoresist layer 3, and then the composite is negatively treated with an etching solution.
  • the photosensitive layer is etched, so that the transparent photoresist layer 3 can be obtained conveniently and simply.
  • the composite negative photoresist can effectively realize the functions of the protective layer 5 and the spacer unit 6 and remain on the transparent photoresist layer 3 by the cleaning liquid.
  • the photosensitive layer is removed to facilitate the subsequent process of the display panel, and then other processes are performed on the transparent photoresist layer 3, so that the display panel can be conveniently fabricated.
  • the method further includes the following steps:
  • a transparent electrode material layer is overlaid on the transparent photoresist layer 3, and then a photosensitive layer is disposed on the transparent electrode material layer, and the photosensitive layer is exposed and developed by a mask process to obtain a desired transparent electrode layer 7.
  • the pattern is then etched with an etchant to etch the transparent electrode material layer, and the transparent electrode material layer on the spacer unit 6 is also etched away, so that the transparent electrode layer 7 is disposed away from the spacer unit 6, effectively avoiding the transparent electrode layer.
  • the mutual interference between the 7 and the spacer unit 6 ensures the display effect of the display panel; the transparent electrode layer 7 is ensured to work well, and only the two processes are required to effectively complete the transparent electrode layer 7 and the spacer unit 6.
  • the setting can effectively optimize and reduce the number of processes of the display panel, so that the display panel can be more conveniently produced, which is beneficial to reducing the process of the display panel, further reducing the production time of the display panel, and further improving the production efficiency of the display panel. .
  • the color resist layer a2 is formed on the insulating layer 24 of the first substrate layer 1 to form the color resist layer 4, and then the composite negative photoresist process b2 is formed on the color resist layer 4 to form the transparent resist layer 3.
  • the transparent photoresist layer 3 includes a protective layer 5 and a spacer unit 6, and then a transparent electrode layer sputtering layer c2 is formed on the protective layer 5 to form a transparent electrode material layer, and the transparent electrode material layer is subjected to a development etching process d1 to form a transparent layer.
  • the electrode layer 7 can etch away the transparent electrode material layer on the spacer unit 6 by developing the etching of the transparent electrode material layer, so that the transparent electrode layer 7 is disposed away from the spacer unit 6.
  • the present application further discloses a display device, which includes the above display panel.
  • the specific structure and connection relationship of the display panel can be further described in detail in FIG. 1 to FIG. .
  • the material of the substrate 11 may be glass, plastic or the like.
  • the display panel includes a liquid crystal panel, a plasma panel, and the like.
  • the liquid crystal panel includes an array substrate and a color filter substrate (CF), and the array substrate is disposed opposite to the color filter substrate, and the array substrate A thin film transistor (TFT) is disposed thereon, and a color filter layer is disposed on the color filter substrate.
  • TFT thin film transistor
  • the color filter substrate may include a TFT array
  • the color film and the TFT array may be formed on the same substrate
  • the array substrate may include a color filter layer
  • the display panel of the present application may be a curved type panel.
  • the above content is a further detailed description of the present application in conjunction with the specific alternative embodiments, and it is not considered that the specific implementation of the present application is limited to the description.
  • a number of simple deductions or substitutions may be made without departing from the spirit of the present application. The scope of protection for the application.

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Abstract

本申请公开一种显示面板，所述显示面板包括：基板；在所述基板上形成有主动开关；在所述主动开关上形成有色阻层；所述色阻层上覆盖形成有透明的透明光阻层，所述透明光阻层包括保护层和间隔单元。

Description

一种显示面板及制造方法 【技术领域】
本申请涉及显示技术领域，尤其涉及一种显示面板及制造方法。
【背景技术】
显示器具有机身薄、省电、无辐射等众多优点，得到了广泛的应用。现有市场上的显示器大部分为背光型显示器，其包括显示面板及背光模组(backlight module)。显示面板的工作原理是在两片平行的基板当中放置液晶分子，并在两片基板上施加驱动电压来控制液晶分子的旋转方向，以将背光模组的光线折射出来产生画面。
其中，薄膜晶体管显示器(Thin Film Transistor-Liquid Crystal Display，TFT-LCD)由于具有低的功耗、优异的画面品质以及较高的生产良率等性能，目前已经逐渐占据了显示领域的主导地位。同样，薄膜晶体管显示器包含显示面板和背光模组，显示面板包括彩膜基板(Color Filter Substrate，CF Substrate，也称彩色滤光片基板)和薄膜晶体管阵列基板(Thin Film Transistor Substrate，TFT Substrate)，上述基板的相对内侧存在透明电极。两片基板之间夹一层液晶分子(Liquid Crystal，LC)。显示面板是通过电场对液晶分子取向的控制，改变光的偏振状态，并藉由偏光板实现光路的穿透与阻挡，实现显示的目的。
目前显示面板行业中，色阻层的制作之后需要进行设置保护层，进而保护色阻层以及之前已经做好的结构，至使显示面板的制程步骤非常的繁杂，进一步的提升了显示面板的制造成本。
【发明内容】
本申请所要解决的技术问题是提供一种有效减少制程数的显示面板。
此外，本申请还提供一种显示面板的制造方法。
本申请的目的是通过以下技术方案来实现的：
一种显示面板，所述显示面板包括：
基板；
主动开关，设置在所述基板上；
色阻层，所述色阻层形成于所述主动开关上；
所述色阻层上覆盖形成有透明光阻层，所述透明光阻层包括保护层和间隔单元。
其中，所述透明光阻层采用复合负型光阻材料层制成，所述复合负型光阻材料层包括一层透明保护层和一层负型光阻层，所述透明保护层与所述负型光阻层堆叠设置。这样，通过将透明保护层和负型光阻层各设置一层，透明保护层具备绝缘材料所需的绝缘特性，负型光阻层具有非好高的硬度，能够对基板提供有效的支撑效果，进一步的改善点灯出现暗点，使得显示面板显示效果提升，进一步的提高了显示面板的显示品质；将复合负型光阻材料层铺设在色阻层上，有效的替代保护层和间隔单元，能够有效的简化显示面板的生产流程，有利于减少显示面板的工序，减少显示面板的生产时间，进一步的提高显示面板的生产效率。
其中，所述透明光阻层采用混合光阻材料层制成，所述混合光阻材料层为透明保护材料和负型光阻材料混合形成。这样，通过混合光阻材料层的设置能够有效的替代设置在色阻层上的透明保护材料和负型光阻材料，只需要一道光罩就能够有效的制作透明光阻层，能够优化并减少显示面板的制程数目。
其中，所述透明光阻层上设有透明电极层，所述间隔单元穿过所述透明电极层设置。这样，在透明光阻层设置透明电极层，保证了透明电极层能够良好的进行工作，可以通过两道制程就可以有效的完成透明电极层和间隔单元的设置，能够有效优化并减少显示面板的制程数目。
根据申请的另一方面，本申请还公开了一种显示面板的制造方法，所述显示面板包括基板、设在所述基板上的主动开关和设在所述主动开关上的色阻层，包括步骤：
在所述色阻层上设置透明的复合负型光阻材料层或混合光阻材料层；
采用光罩制程获得覆盖所述色阻层的透明光阻层。
这样，只需要简单的光罩制程就能够很好的进行显示面板的透明光阻层的制作，即可一次性的完成保护层与间隔单元，透明光阻层能够有效的替代保护层和间隔单元，将具有绝缘特性的复合负型光阻材料层覆盖设在色阻层上，这样能够有效的简化显示面板的生产流程，有利于减少显示面板的工序，减少显示面板的生产时间，进一步的提高显示面板的生产效率；同时能够有效的减少显示面板的生产成本，进一步的提升显示面板的市场竞争力。
其中，所述光罩制程的光罩为多灰阶光罩。这样，多灰阶光罩可分为半色调光罩(Half-tone mask)和者灰色调光罩(Gray-tone mask)两种。灰色调光罩是制作出曝光机分辨率以下的微缝，再藉由此微缝部位遮住一部份的光源，以达成半曝光的效果。
其中，所述复合负型光阻材料层包括一层透明保护层和一层负型光阻层，所述复合负型光阻材料层的制作步骤包括：
在模具的底部添加透明保护材料；
在所述模具的透明保护材料上添加负型光阻材料；
采用光固化工艺和热反应制程获得双层透明结构的复合负型光阻材料层。
这样，通过搭配半色调光罩或者灰色调光罩，就可以有效的形成透明光阻层，有效的替代保护层和间隔单元，这样能够有效的简化显示面板的生产流程，有利于减少显示面板的工序，减少显示面板的生产时间，进一步的提高显示面板的生产效率。
其中，所述复合负型光阻材料层为一层包含透明保护材料和负型光阻材料的混合光阻材料层，所述混合光阻材料层的制作步骤包括：
在模具里添加透明保护材料和负型光阻材料的混合物；
采用光固化工艺和热反应制程获得一层透明结构的混合光阻材料层。
这样，采用这种方法简单方便的制作透明光阻层，只需要一道光罩就能够 有效的制作透明光阻层，能够有效优化并减少显示面板的制程数目。
其中，所述采用光罩制程获得覆盖所述主动开关的透明光阻层的步骤包括：
在复合负型光阻材料层或混合光阻材料层上形成感光层；
采用光罩制程获得透明光阻层的图案；
采用蚀刻液蚀刻获得透明光阻层；
去除残留的感光层。
这样，通过透明光阻层的设置，能够有效优化并减少显示面板的制程数目。
其中，所述采用光罩制程获得覆盖所述主动开关的透明光阻层之后还包括步骤：
在透明光阻层上覆盖形成透明电极材料层；
在透明电极层材料层上形成感光层；
采用光罩制程获得透明电极层的图案；
采用蚀刻液蚀刻获得透明电极层；
去除残留的感光层。
根据本申请的另一个方面，本申请还公开了一种显示装置，所述显示装置包括如上所述的显示面板。
本申请由于透明光阻层具有有效的绝缘特性，能够有效的替代彩膜阵列基板产品工艺中需要在色阻层上设置保护层的制程，能够有效优化并减少显示面板的制程数目，使得显示面板的可以更加方便的被生产，有利于减少显示面板的工序，进一步的减少显示面板的生产时间，更进一步的提高显示面板的生产效率；省去了在色阻层上设置保护层的制程，可以有效的减少显示面板的生产成本，进一步的提升显示面板的市场竞争力；而且透明光阻层具有光敏性和更高的透光率，可以有效的替代间隔单元，搭配半色调(half-tone)光罩或者灰色调(gray-tone)光罩可一次性完成保护层和间隔单元的设置，使得透明光阻层的设置的方便简单，可以很好的简化显示面板的生产流程，更进一步的显示面板的生产效率。
【附图说明】
图1是范例的显示面板的剖面示意图；
图2是范例的第一基板层的结构的剖面示意图；
图3是范例的显示面板的制作方法的流程图；
图4是本申请实施例的另一实施例方式显示面板的剖面示意图；
图5是本申请实施例的另一实施例方式显示面板的剖面示意图；
图6是本申请实施例的显示面板的制作方法的流程图；
图7是本申请实施例的双层透明结构的复合负型光阻材料层的制作方法流程图；
图8是本申请实施例的双层透明结构的复合负型光阻材料层的制作方法示意图；
图9是本申请实施例的一层透明结构的混合光阻材料层的制作方法流程图；
图10是本申请实施例的一层透明结构的混合光阻材料层的制作方法示意图；
图11是本申请实施例的显示面板的制作方法的流程图；
图12是本申请实施例的显示面板的制作方法的流程图；
图13是本申请实施例的显示面板的制作方法的流程图；
图14是本申请实施例的显示面板的剖面结构示意图。
【具体实施方式】
这里所公开的具体结构和功能细节仅仅是代表性的，并且是用于描述本申请的示例性实施例的目的。但是本申请可以通过许多替换形式来具体实现，并且不应当被解释成仅仅受限于这里所阐述的实施例。
在本申请的描述中，需要理解的是，术语“中心”、“横向”、“上”、“下”、“左”、“右”、“竖直”、“水平”、“顶”、“底”、“内”、“外”等指示的方位或位 置关系为基于附图所示的方位或位置关系，仅是为了便于描述本申请和简化描述，而不是指示或暗示所指的装置或元件必须具有特定的方位、以特定的方位构造和操作，因此不能理解为对本申请的限制。此外，术语“第一”、“第二”仅用于描述目的，而不能理解为指示或暗示相对重要性或者隐含指明所指示的技术特征的数量。由此，限定有“第一”、“第二”的特征可以明示或者隐含地包括一个或者更多个该特征。在本申请的描述中，除非另有说明，“多个”的含义是两个或两个以上。另外，术语“包括”及其任何变形，意图在于覆盖不排他的包含。
在本申请的描述中，需要说明的是，除非另有明确的规定和限定，术语“安装”、“相连”、“连接”应做广义理解，例如，可以是固定连接，也可以是可拆卸连接，或一体地连接；可以是机械连接，也可以是电连接；可以是直接相连，也可以通过中间媒介间接相连，可以是两个元件内部的连通。对于本领域的普通技术人员而言，可以根据具体情况理解上述术语在本申请中的具体含义。
这里所使用的术语仅仅是为了描述具体实施例而不意图限制示例性实施例。除非上下文明确地另有所指，否则这里所使用的单数形式“一个”、“一项”还意图包括复数。还应当理解的是，这里所使用的术语“包括”和/或“包含”规定所陈述的特征、整数、步骤、操作、单元和/或组件的存在，而不排除存在或添加一个或更多其他特征、整数、步骤、操作、单元、组件和/或其组合。
下面结合附图和较佳的实施例对本申请作进一步说明。
如图1所示，提供一种范例的显示面板，显示面板包括：基板11、主动开关2和色阻层4，主动开关2设在基板11上，色阻层4设在主动开关2上，色阻层4上覆盖设置有保护层5，在保护层5上设有透明电极层7，在透明电极层7上设有间隔单元6(photo spacer，PS)。保护层5能够有效的对色阻层4进行保护，能够有效的避免后续制程中清洗剂对色阻层4的直接腐蚀，有效的降低报废成本，进而提升显示面板的品质，间隔单元6能够提供良好的支撑性能，很好的保证了液晶盒内的液晶能够有效的进行工作。
如2图所示，第一基板层1包括基板11和主动开关2，主动开关2包括设置在基板11上的栅极21，所述栅极21上的钝化层，钝化层上设有半导体层22，半导体层22上设有金属层23，金属层23包括源极231和漏极232，金属层23上设有绝缘层24，绝缘层24能够有效的对主动开关2进行保护，能够有效的避免后续制程中清洗剂对主动开关2的源极231和漏极232的直接腐蚀，使得源极231和漏极232能够保持完好，从而减少产生断线问题，有效的降低报废成本，进而提升显示面板的品质；而且主动开关2的源极231和漏极232为金属材料制成，源极231和漏极232的侧边从微结构来看都有金属毛刺的现象，绝缘层24能够更进一步的对源极231和漏极232进行保护，有效的避免后续的制程对源极231和漏极232的影响，从而有效的提高显示面板的良品率。
如图3所示，在第一基板层1的绝缘层24上进行彩色光阻制程a1形成色阻层4，然后在色阻层4上进行绝缘制程b1形成保护层5，然后在保护层5上进行透明电极层的溅射工艺c1形成透明电极材料层层，对透明电极材料层进行显影蚀刻制程d1形成透明电极层7，再在透明电极层7上进行间隔单元制程e1形成间隔单元6。
进一步可以发现，现有产品制作保护层5、透明电极层7和间隔单元6需要进行三次以上的制程，生产步骤比较复杂，投入的成本较高，而且还容易出现误操作，造成显示面板的良品率不高。因此，本申请提供一种技术方案，可以有效的减少显示面板制程数。
下面结合附图4至附图5和实施例对本申请作进一步说明。
如图4所示，该显示面板包括：一种显示面板，所述显示面板包括：基板11；主动开关2，设置在基板11上；色阻层4，所述色阻层4形成于主动开关2上；所述色阻层4上覆盖形成有透明的透明光阻层3，所述透明光阻层3包括保护层5和间隔单元6。
由于透明光阻层3具有有效的绝缘特性，能够有效的替代彩膜阵列基板(Color Filter On Array，COA)产品工艺中需要在色阻层4上设置保护层5的制 程，能够有效优化并减少显示面板的制程数目，使得显示面板的可以更加方便的被生产，有利于减少显示面板的工序，进一步的减少显示面板的生产时间，更进一步的提高显示面板的生产效率；省去了在色阻层4上设置保护层5的制程，可以有效的减少显示面板的生产成本，进一步的提升显示面板的市场竞争力；而且透明光阻层3具有光敏性和高的透光率，可以有效的替代间隔单元6，搭配半色调(half-tone)光罩或者灰色调(gray-tone)光罩可一次性完成保护层5和间隔单元6的设置，使得透明光阻层3的设置方便简单，可以很好的简化显示面板的生产流程，更进一步的显示面板的生产效率。
如图8所示，透明光阻层3采用复合负型光阻材料层31制成，复合负型光阻材料层31包括一层透明保护层32和一层负型光阻层33，透明保护层32与负型光阻层33堆叠设置。通过将透明保护层32和负型光阻层33各设置一层，透明保护层32具备绝缘材料所需的绝缘特性，负型光阻层33具有高的硬度，能够对基板11提供有效的支撑效果，进一步的改善点灯出现暗点，使得显示面板显示效果更进一步，进一步的提高了显示面板的显示品质；负型光阻层33还具有高的透光率和对比度，从而保证显示面板的颜色和亮度更加的均匀，有效的提升显示面板的品质；将透明保护层32和负型光阻层33堆叠设置，透明保护层32设置在下层，负型光阻层33设置在上层，将复合负型光阻材料层31铺设在色阻层4上，通过搭配半色调(half-tone)光罩或者灰色调(gray-tone)光罩，就可以有效的形成透明光阻层3，有效的替代保护层5和间隔单元6，这样能够有效的简化显示面板的生产流程，有利于减少显示面板的工序，减少显示面板的生产时间，进一步的提高显示面板的生产效率；透明保护层32能够有效的对色阻层4进行保护，能够有效的避免后续制程中清洗剂对色阻层4的直接腐蚀，有效的降低报废成本，进而提升显示面板的品质；透明保护层32可选为透明保护材料321制成，透明保护材料321可以是透明树脂等，负型光阻层33可选为负型光阻材料331制成，负型光阻材料331可以是以丙烯酸酯类为主或者是以环氧类为主的光敏型聚合物。
如图5所示，透明光阻层3采用混合光阻材料层34制成，混合光阻材料层34为透明保护材料321和负型光阻材料331混合形成。通过混合光阻材料层34的设置能够有效的替代设置在色阻层4上的透明保护材料和负型光阻材料，通过搭配半色调(half-tone)光罩或者灰色调(gray-tone)光罩，就可以有效的形成透明光阻层3，只需要一道光罩就能够有效的制作透明光阻层3，能够有效优化并减少显示面板的制程数目，使得显示面板的可以更加方便的被生产，有利于减少显示面板的工序，进一步的减少显示面板的生产时间，更进一步的提高显示面板的生产效率；省去了在色阻层4上设置保护层5或设置间隔单元的制程，可以有效的减少显示面板的生产成本，进一步的提升显示面板的市场竞争力；而且这样间隔单元6与保护层5一体成型的设置，保证了液晶盒内的液晶能够有效的进行工作，从而保证显示面板的颜色和亮度更加的均匀，进一步的提高了显示面板的显示效果，使得产品竞争力更进一步的得到提升。
其中，透明光阻层3上设有透明电极层7，间隔单元6穿过透明电极层7设置，即间隔单元6上未形成透明电极层7。在透明光阻层3设置透明电极层7，保证了透明电极层7能够良好的进行工作，只需要两道制程就可以有效的完成透明电极层7和间隔单元6的设置，通过透明电极层7避开间隔单元6设置，有效的避免了透明电极层7与间隔单元6之间的相互干扰，保证了显示面板的显示效果；而且使得间隔单元6保持非常良好的支撑性能，从而保证显示面板的颜色和亮度更加的均匀，进一步的提高了显示面板的显示效果，使得产品竞争力更进一步的得到提升。
将复合负型光阻材料层31或混合光阻材料层34涂布在色阻层4上，经过曝光、显影、烘烤等步骤得到所需厚度和形状的间隔单元6以及保护层5，然后将具有间隔单元6的基板11与另一基板11直接贴合，两个间隔单元6之间即形成液晶盒；通过光刻过程去控制间隔单元6的形状，通过控制光罩的形状和控制光照的时间，从而能够有效的控制间隔单元6的厚度和形状，保证了间隔单元6能够提供有效的支撑性能，进一步的改善点灯出现暗点，使得显示面板 显示效果更进一步，进一步的提高了显示面板的显示品质。
如图14所示，第一基板层1和第二基板层平行设置，间隔单元设在第一基板层1和第二基板层之间，在第一基板层1与第二基板层之间还形成有液晶层(图未示)。第一基板层1或第二基板层可选为彩膜基板或薄膜晶体管阵列基板，在彩膜基板或薄膜晶体管阵列基板设置透明光阻层，透明光阻层包括保护层和间隔单元。
如图6所示，所述显示面板包括基板11、设在所述基板11上的主动开关2和设在所述主动开关2上的色阻层4，包括步骤：
S11：在所述色阻层上设置透明的复合负型光阻材料层或混合光阻材料层；
S12：采用光罩制程获得覆盖所述色阻层的透明光阻层3。
采用这种方法，只需要简单的光罩制程就能够很好的进行显示面板的透明光阻层3的制作，即可一次性的完成保护层5与间隔单元6，透明光阻层3能够有效的替代保护层5材料和间隔材料，将具有绝缘特性的复合负型光阻材料层31覆盖设在色阻层4上，这样能够有效的简化显示面板的生产流程，有利于减少显示面板的工序，减少显示面板的生产时间，进一步的提高显示面板的生产效率；关于透明光阻层3的的特点不再赘述。
其中，光罩制程的光罩为灰色调光罩或半色调光罩。多灰阶光罩可分为半色调光罩(Half-tone mask)和者灰色调光罩(Gray-tone mask)两种。灰色调光罩是制作出曝光机分辨率以下的微缝，再藉由此微缝部位遮住一部份的光源，以达成半曝光的效果。另一方面，半色调光罩是利用半透过的膜来进行半曝光。因为以上两种方式皆是在一次的曝光过程后即可呈现出曝光部分、半曝光部分及未曝光部分这三种的曝光层次，故在显影后能够形成两种厚度的感光层层。利用这样的光阻厚度差异，便可以较一般少的片数下将图形转写至面板基板11上，并达成面板生产効率的提升；多灰阶光罩由于使用较一般还少的片数之光罩，便能够将图形转印于材料层上，可缩短面板制程的多灰阶光罩将可实现面板生产效率之提升。此外，因为能够表现出半色调，故可以提高显示器面板之 显示品质。
如图7和图8所示，复合负型光阻材料层31包括一层透明保护层32和一层负型光阻层33，复合负型光阻材料层31的制作步骤包括：
S21：在模具的底部添加透明保护材料；
S22：在所述模具的透明保护材料上添加负型光阻材料；
S23：采用光固化工艺和热反应制程获得双层透明结构的复合负型光阻材料层。
将透明保护材料321添加到模具的底部，将负型光阻材料331添加到透明保护材料321上，通过光固化工艺和热反应制程，透明保护层32的特性由透明保护材料321来决定，负型光阻层33的特性则由负型光阻材料331决定，反应后形成双层透明结构的复合负型光阻材料层31，复合负型光阻材料层31下层的透明保护层32具备绝缘材料所需的绝缘特性，复合负型光阻材料层31上层的负型光阻层33具有非好高的硬度，硬度在3H以上，能够对基板11提供有效的支撑效果，进一步的改善点灯出现暗点，使得显示面板显示效果更进一步，进一步的提高了显示面板的显示品质；负型光阻层33还具有高的透光率和对比度，从而保证显示面板的颜色和亮度更加的均匀，有效的提升显示面板的品质；将透明保护层32和负型光阻层33堆叠设置，透明保护层32设置在下层，负型光阻层33设置在上层，将复合负型光阻材料层31铺设在色阻层4上，通过搭配半色调光罩或者灰色调光罩，就可以有效的形成透明光阻层3，有效的替代保护层5和间隔单元6，这样能够有效的简化显示面板的生产流程，有利于减少显示面板的工序，减少显示面板的生产时间，进一步的提高显示面板的生产效率。
如图9和图10所示，混合光阻材料层34为透明保护材料和负型光阻材料混合形成，混合光阻材料层34的制作步骤包括：
S31：在模具里添加透明保护材料和负型光阻材料的混合物；
S32：采用光固化工艺和热反应制程获得一层透明结构的混合光阻材料层。
通过将透明保护材料321和负型光阻材料331的混合物添加到模具内，通 过光固化工艺和热反应制程，可方便简单的获得一层透明结构的复合负型光阻材料层31，有利于进行大规模的复合光阻材料的生产，进一步的减少生产成本；通过混合光阻材料层34的设置能够有效的替代设置在色阻层4上的透明保护材料和负型光阻材料，通过搭配半色调光罩或者灰色调光罩，就可以有效的形成透明光阻层3，只需要一道光罩就能够有效的制作透明光阻层3简化了制程。
如图11所示，所述采用光罩制程获得覆盖所述主动开关2的透明光阻层3的步骤包括：
S41：在复合负型光阻材料层或混合光阻材料层上形成感光层；
S42：采用光罩制程获得透明光阻层的图案；
S43：采用蚀刻液蚀刻获得透明光阻层；
S44：去除残留的感光层。
将感光层设在复合负型感光层或混合光阻材料层34上，通过光罩制程对感光层进行曝光显影，从而获得所需的透明光阻层3的图案，然后采用蚀刻液对复合负型感光层进行蚀刻，从而可以方便简单的获得透明光阻层3，复合负型光阻能够有效的实现保护层5和间隔单元6的功能，通过清洗液对残留在透明光阻层3上的感光层进行去除，方便显示面板后续制程的操作，然后在透明光阻层3上进行其他的制程，从而能够方便的制作显示面板。
如图12所示，所述采用光罩制程获得覆盖所述主动开关2的透明光阻层3之后还包括步骤：
S51：在透明光阻层上覆盖形成透明电极材料层；
S52：在透明电极层材料层上形成感光层
S53：采用光罩制程获得透明电极层的图案；
S54：采用蚀刻液蚀刻获得透明电极层；
S55：去除残留的感光层。
将透明电极材料层覆盖设在透明光阻层3上，然后在透明电极材料层上设置感光层，通过光罩制程对感光层进行曝光显影，从而获得所需的透明电极层7 的图案，然后采用蚀刻液对透明电极材料层进行蚀刻，将间隔单元6上的透明电极材料层也一并蚀刻掉，使得透明电极层7避开间隔单元6设置，有效的避免了透明电极层7与间隔单元6之间的相互干扰，保证了显示面板的显示效果；保证了透明电极层7能够良好的进行工作，只需要两道制程就可以有效的完成透明电极层7和间隔单元6的设置，能够有效优化并减少显示面板的制程数目，使得显示面板的可以更加方便的被生产，有利于减少显示面板的工序，进一步的减少显示面板的生产时间，更进一步的提高显示面板的生产效率。
如图13所示，在第一基板层1的绝缘层24上进行彩色光阻制程a2形成色阻层4，然后在色阻层4上进行复合负型光阻制程b2形成透明光阻层3，透明光阻层3包括保护层5和间隔单元6，然后在保护层5上进行透明电极层的溅射工艺c2形成透明电极材料层层，对透明电极材料层层进行显影蚀刻制程d1形成透明电极层7，通过对透明电极材料层层显影蚀刻可将间隔单元6上的透明电极材料层蚀刻掉，使得透明电极层7避开间隔单元6设置。
根据本申请的另一个方面，本申请还公开了一种显示装置，显示装置包括如上的显示面板，关于显示面板的具体结构和连接关系可参见图1至图7在此不再一一详述。
在上述实施例中，所述基板11的材料可以选用玻璃、塑料等。
在上述实施例中，显示面板包括液晶面板、等离子面板等，以液晶面板为例，液晶面板包括阵列基板和彩膜基板(CF)，所述阵列基板与彩膜基板相对设置，所述阵列基板上设有薄膜晶体管(TFT)，彩膜基板上设有彩色滤光层。
在上述实施例中，彩膜基板可包括TFT阵列，彩膜及TFT阵列可形成于同一基板上，阵列基板可包括彩色滤光层。
在上述实施例中，本申请的显示面板可为曲面型面板。以上内容是结合具体的可选实施方式对本申请所作的进一步详细说明，不能认定本申请的具体实施只局限于这些说明。对于本申请所属技术领域的普通技术人员来说，在不脱离本申请构思的前提下，还可以做出若干简单推演或替换，都应当视为属于本 申请的保护范围。

Claims (15)

  1. 一种显示面板，包括：
    基板；
    主动开关，设置在所述基板上；
    色阻层，所述色阻层形成于所述主动开关上；
    所述色阻层上覆盖形成有透明光阻层；
    其中，所述透明光阻层包括保护层和间隔单元。
  2. 如权利要求1所述的一种显示面板，其中，所述透明光阻层采用复合负型光阻材料层制成，所述复合负型光阻材料层包括一层透明保护层和一层负型光阻层，所述透明保护层与所述负型光阻层堆叠设置。
  3. 如权利要求1所述的一种显示面板，其中，所述透明光阻层采用混合光阻材料层制成，所述混合光阻材料层为透明保护材料和负型光阻材料混合形成。
  4. 如权利要求1所述的一种显示面板，其中，所述透明光阻层上设有透明电极层，所述间隔单元穿过所述透明电极层设置。
  5. 一种显示面板，包括：
    基板；
    主动开关，设置在所述基板上；
    色阻层，所述色阻层形成于所述主动开关上；
    所述色阻层上覆盖形成有透明光阻层，所述透明光阻层包括保护层和间隔单元；所述透明光阻层采用复合负型光阻材料层制成，所述复合负型光阻材料层包括一层透明保护层和一层负型光阻层，所述透明保护层与所述负型光阻层堆叠设置；所述透明光阻层上设有透明电极层，所述间隔单元穿过所述透明电极层设置。
  6. 一种显示面板的制造方法，其中，所述显示面板包括基板、设在所述基板上的主动开关和设在所述主动开关上的色阻层，包括步骤：
    在所述色阻层上设置复合负型光阻材料层或混合光阻材料层；
    采用光罩制程获得覆盖所述色阻层的透明光阻层。
  7. 如权利要求6所述的一种显示面板的制造方法，其中，所述复合负型光阻材料层包括一层透明保护层和一层负型光阻层，所述复合负型光阻材料层的制作步骤包括：
    在模具的底部添加透明保护材料；
    在所述模具的透明保护材料上添加负型光阻材料；
    采用光固化工艺和热反应制程获得双层透明结构的复合负型光阻材料层。
  8. 如权利要求7所述的一种显示面板的制造方法，其中，所述透明保护层与所述负型光阻层堆叠设置。
  9. 如权利要求6所述的一种显示面板的制造方法，其中，所述采用光罩制程获得覆盖所述主动开关的透明光阻层的步骤包括：
    在复合负型光阻材料层上形成感光层；
    采用光罩制程获得透明光阻层的图案；
    采用蚀刻液蚀刻获得透明光阻层；
    去除残留的感光层。
  10. 如权利要求6所述的一种显示面板的制造方法，其中，所述混合光阻材料层为透明保护材料和负型光阻材料混合形成，所述混合光阻材料层的制作步骤包括：
    在模具里添加透明保护材料和负型光阻材料的混合物；
    采用光固化工艺和热反应制程获得一层透明结构的混合光阻材料层。
  11. 如权利要求6所述的一种显示面板的制造方法，其中，所述采用光罩制程获得覆盖所述主动开关的透明光阻层的步骤包括：
    在混合光阻材料层上形成感光层；
    采用光罩制程获得透明光阻层的图案；
    采用蚀刻液蚀刻获得透明光阻层；
    去除残留的感光层。
  12. 如权利要求6所述的一种显示面板的制造方法，其中，所述透明光阻层包括保护层和间隔单元。
  13. 如权利要求6所述的一种显示面板的制造方法，其中，所述透明光阻层上设有透明电极层，所述间隔单元穿过所述透明电极层设置。
  14. 如权利要求6所述的一种显示面板的制造方法，其中，所述光罩为半色调光罩或灰色调光罩。
  15. 如权利要求6所述的一种显示面板的制造方法，其中，所述采用光罩制程获得覆盖所述主动开关的透明光阻层之后还包括步骤：
    在透明光阻层上覆盖形成透明电极材料层；
    在透明电极层材料层上形成感光层；
    采用光罩制程获得透明电极层的图案；
    采用蚀刻液蚀刻获得透明电极层；
    去除残留的感光层。
PCT/CN2017/106298 2017-07-06 2017-10-16 一种显示面板及制造方法 Ceased WO2019006904A1 (zh)

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