WO2018230514A1 - Hydrophilic-coating-film forming composition and hydrophilic coating film using same - Google Patents
Hydrophilic-coating-film forming composition and hydrophilic coating film using same Download PDFInfo
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- WO2018230514A1 WO2018230514A1 PCT/JP2018/022268 JP2018022268W WO2018230514A1 WO 2018230514 A1 WO2018230514 A1 WO 2018230514A1 JP 2018022268 W JP2018022268 W JP 2018022268W WO 2018230514 A1 WO2018230514 A1 WO 2018230514A1
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- UVSGJXOUSALHPF-UHFFFAOYSA-N CCCCCN1C=NCC1 Chemical compound CCCCCN1C=NCC1 UVSGJXOUSALHPF-UHFFFAOYSA-N 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic System
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/04—Polysiloxanes
- C09D183/08—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen, and oxygen
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/20—Diluents or solvents
Abstract
Description
基板に親水性を付与できるポリマーとしては、たとえば、ホスホリル基含有メタクリル酸エステルのポリマー(特許文献1参照)や、水との相互作用が非常に強いベタイン基を有する化合物に無機基材と共有結合を形成出来る官能基を導入した化合物(特許文献2参照)などが知られている。 As surface characteristics required for a substrate, antifogging properties, antistatic properties, antifouling properties, biocompatibility and the like are known. These surface characteristics are generally achieved by imparting hydrophilicity by coating (coating) a hydrophilic film on the surface of the substrate.
Examples of the polymer that can impart hydrophilicity to the substrate include a phosphoryl group-containing methacrylate polymer (see Patent Document 1) and a compound having a betaine group that has a very strong interaction with water and a covalent bond with an inorganic base material. A compound in which a functional group capable of forming a compound is introduced (see Patent Document 2) is known.
[1] 含窒素複素環構造中の窒素原子に正(+)電荷を有するベタイン基を有するシロキサンモノマーと、水又は有機溶剤と、を含有する親水性コート膜形成用組成物。
[2] 上記に記載の親水性コート膜形成用組成物を、基板上にコートして塗膜を形成し、該塗膜を乾燥し、焼成して被膜を得る親水性コートの成膜方法。
[3] 上記に記載の親水性コート膜形成用組成物から得られる親水性コート膜。 Thus, the present invention has the following gist.
[1] A hydrophilic coating film-forming composition comprising a siloxane monomer having a betaine group having a positive (+) charge on a nitrogen atom in a nitrogen-containing heterocyclic structure, and water or an organic solvent.
[2] A method for forming a hydrophilic coat, wherein the composition for forming a hydrophilic coat film described above is coated on a substrate to form a coating film, the coating film is dried and baked to obtain a coating film.
[3] A hydrophilic coat film obtained from the composition for forming a hydrophilic coat film described above.
本発明の親水性コート膜形成用組成物から得られる親水性コート膜は、眼鏡、カメラなどのレンズ、建屋、車などの窓等の水滴付着防止膜、防曇膜等の用に供することができる。 According to the present invention, it is possible to provide a hydrophilic coating film-forming composition that does not deteriorate hydrophilicity and antifogging property even when stored under high temperature and high humidity conditions, and a hydrophilic coating film from which it can be obtained.
The hydrophilic coating film obtained from the composition for forming a hydrophilic coating film of the present invention can be used for water droplet adhesion prevention films, antifogging films, etc. for lenses such as glasses and cameras, windows of buildings, cars, etc. it can.
本発明の親水性コート膜形成用組成物は、含窒素複素環構造中の窒素原子に+の電荷を有するベタイン基を有するシロキサンモノマーを有する。
ベタインとは、正電荷と負電荷を同一分子内の隣り合わない位置に持ち、正電荷を持つ原子には解離し得る水素原子が結合しておらず、分子全体としては電荷を持たない化合物である。 <Specific siloxane monomer>
The composition for forming a hydrophilic coat film of the present invention has a siloxane monomer having a betaine group having a positive charge on a nitrogen atom in a nitrogen-containing heterocyclic structure.
Betaine is a compound that has positive and negative charges at non-adjacent positions in the same molecule, and has no positively charged hydrogen atoms bound to dissociable hydrogen atoms, and the molecule as a whole has no charge. is there.
R2は、炭素数1~5、好ましくは1~4のアルキル基、炭素数2~5、好ましくは2~4のアルケニル基、又は炭素数2~5、好ましくは2~4のアルキニル基を表す。R2の有する任意の水素原子は、炭素数1~5のアルキル基、フッ素原子などのハロゲン原子、芳香族環、又は脂肪族環で置換されていてもよい。pは、1~3の整数を表す。qは、pが1のとき0~2の整数を表し、pが2のとき0~1の整数を表し、pが3のとき0を表す。 In the above formula [1], R 1 represents an alkyl group having 1 to 5 carbon atoms, preferably 1 to 3 carbon atoms.
R 2 represents an alkyl group having 1 to 5 carbon atoms, preferably 1 to 4 carbon atoms, an alkenyl group having 2 to 5 carbon atoms, preferably 2 to 4 carbon atoms, or an alkynyl group having 2 to 5 carbon atoms, preferably 2 to 4 carbon atoms. To express. Any hydrogen atom of R 2 may be substituted with an alkyl group having 1 to 5 carbon atoms, a halogen atom such as a fluorine atom, an aromatic ring, or an aliphatic ring. p represents an integer of 1 to 3. q represents an integer of 0 to 2 when p is 1, represents an integer of 0 to 1 when p is 2, and represents 0 when p is 3.
Yは、含窒素複素環を含む2価の有機基を表す。例としては、ピリジン、ピペリジン、イミダゾール、オキサゾール、チアゾール、ピラゾール、イミダゾリン、ピラジン、ベンゾイミダゾール、キノリン、イソキノリン、プリン、キノキサリン等が例示され、その中でも、ピリジン、又はイミダゾリンが好ましい。 X represents a single bond, —O—, —COO—, —OCO—, —CONR 3 —, —NR 4 —CO—, or —NR 5 ═NR 6 —. R 3 , R 4 , R 5 and R 6 each independently represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, preferably 1 to 3 carbon atoms.
Y represents a divalent organic group containing a nitrogen-containing heterocyclic ring. Examples include pyridine, piperidine, imidazole, oxazole, thiazole, pyrazole, imidazoline, pyrazine, benzimidazole, quinoline, isoquinoline, purine, quinoxaline, etc. Among them, pyridine or imidazoline is preferable.
ZはCOO-、SO3 -、又はPO4 -を表す。得られるコート膜の耐久性の観点から、SO3 -が好ましい。 M represents a linear or branched alkylene group having 1 to 10 carbon atoms, preferably 1 to 8 carbon atoms, and any hydrogen atom of the alkylene group is an alkyl group having 1 to 5 carbon atoms, preferably 1 to 4 carbon atoms. Alternatively, it may be substituted with a halogen atom such as a fluorine atom. Among these, a linear or branched alkylene group having 2 to 7, preferably 2 to 6 carbon atoms is preferable. M is bonded to the nitrogen atom of Y, and one of M and L forms an N + moiety by the bond with the nitrogen atom of Y.
Z represents COO − , SO 3 − , or PO 4 — . From the viewpoint of durability of the resulting coating film, SO 3 - is preferable.
なかでも、特定シロキサンモノマーとしては、モノマーの安定性、原料入手性の観点から、次のものが好ましい。
Especially, as a specific siloxane monomer, the following are preferable from a viewpoint of monomer stability and raw material availability.
本発明に用いる、特定シロキサンモノマーは、例えば、スルホン酸末端の場合、含窒素複素環構造含有ケイ素化合物に、1,3-プロパンスルトンや1,4-ブタンスルトン、2,4-ブタンスルトンなどのスルトン環化合物を反応させることにより製造できる。 <Method for producing specific siloxane monomer>
The specific siloxane monomer used in the present invention is, for example, in the case of a sulfonic acid terminal, a nitrogen-containing heterocyclic structure-containing silicon compound, a sultone ring such as 1,3-propane sultone, 1,4-butane sultone, or 2,4-butane sultone. It can be produced by reacting a compound.
好ましい溶媒としては、アセトニトリル又はテトラヒドロフランが挙げられる。 Reaction solvents include water, alcohols (methanol, ethanol, 2-propanol, etc.), aprotic polar organic solvents (dimethylformamide, dimethyl sulfoxide, dimethylacetamide, N-methylpyrrolidone, etc.), ethers (diethyl ether, diisopropyl, etc.) Ether, tert-butyl methyl ether, cyclopentyl methyl ether, tetrahydrofuran, dioxane, etc.), aliphatic hydrocarbons (pentane, hexane, heptane, petroleum ether, etc.), aromatic hydrocarbons (benzene, toluene, xylene, mesitylene, Chlorobenzene, dichlorobenzene, nitrobenzene, tetralin, etc.), halogenated hydrocarbons (chloroform, dichloromethane, carbon tetrachloride, dichloroethane, etc.), lower fatty acid esters (acetic acid) Chill, ethyl acetate, butyl acetate, methyl propionate, etc.), nitriles (acetonitrile, propionitrile, butyronitrile, etc.), etc. can be used. These solvents can be appropriately selected in consideration of the ease of reaction and the like, and can be used alone or in combination of two or more. Moreover, depending on the case, the said solvent can also be used as a solvent which does not contain water using a suitable dehydrating agent and a desiccant.
Preferred solvents include acetonitrile or tetrahydrofuran.
原料である含窒素複素環構造含有ケイ素化合物は、市販のものを用いるか、公知の方法によって簡便に得ることが出来る。反応温度は、0℃~各溶媒の沸点が好ましく、より好ましくは0℃~120℃、特に好ましくは5℃~100℃である。 The reaction time is 30 minutes to 180 hours, preferably 2 to 120 hours, and particularly preferably 5 to 100 hours.
As the nitrogen-containing heterocyclic structure-containing silicon compound as a raw material, a commercially available one can be used, or it can be easily obtained by a known method. The reaction temperature is preferably 0 ° C. to the boiling point of each solvent, more preferably 0 ° C. to 120 ° C., particularly preferably 5 ° C. to 100 ° C.
本発明の親水性コート膜形成用組成物は、特定シロキサンモノマー、水又は有機溶剤の他、金属アルコキシド、金属アルコキシドリゴマー、金属アルコキシドポリマー、無機微粒子、レベリング剤及び界面活性剤からなる群から選ばれる少なくとも1種以上を含有させてもよい。 <Other ingredients>
The composition for forming a hydrophilic coating film of the present invention is selected from the group consisting of a specific siloxane monomer, water or an organic solvent, a metal alkoxide, a metal alkoxydrigomer, a metal alkoxide polymer, inorganic fine particles, a leveling agent and a surfactant. You may contain at least 1 or more types.
M1(OR2)n (II)
式(II)中、R2は、炭素数1~5、好ましくは1~3のアルキル基又はアセチル基を表す。nは、2~5の整数を表す。M1は、珪素(Si)、チタン(Ti)、ジルコニウム(Zr)、又はアルミニウム(Al)が好ましく、特には、珪素(Si)又はチタン(Ti)が好ましい。また、nは3又は4が好ましい。 Examples of the metal alkoxide include those represented by the following formula (II) or (III).
M 1 (OR 2 ) n (II)
In the formula (II), R 2 represents an alkyl group or an acetyl group having 1 to 5 carbon atoms, preferably 1 to 3 carbon atoms. n represents an integer of 2 to 5. M 1 is preferably silicon (Si), titanium (Ti), zirconium (Zr), or aluminum (Al), and particularly preferably silicon (Si) or titanium (Ti). N is preferably 3 or 4.
式(III)中、M1、R2は上記式(I)に定義した通りである。R3は、水素原子、又は、ハロゲン原子、ビニル基、スチリル基、フェニル基、ナフチル基、及びアクリル基、メタクリル基若しくはアリール基で置換されていてもよく、かつヘテロ原子を含んでいてもよい炭素数1~30のアルキル基からなる群から選ばれる基である。xは1~3の整数である。ここで、ヘテロ原子は、酸素、窒素、硫黄又はリンであり、好ましくは酸素、窒素又は硫黄である。 R 3 x M 1 (OR 2 ) 4-x (III)
In formula (III), M 1 and R 2 are as defined in formula (I) above. R 3 may be substituted with a hydrogen atom, a halogen atom, a vinyl group, a styryl group, a phenyl group, a naphthyl group, an acryl group, a methacryl group, or an aryl group, and may contain a hetero atom. It is a group selected from the group consisting of alkyl groups having 1 to 30 carbon atoms. x is an integer of 1 to 3. Here, the hetero atom is oxygen, nitrogen, sulfur or phosphorus, preferably oxygen, nitrogen or sulfur.
上記無機微粒子としては、シリカ微粒子、アルミナ微粒子、チタニア微粒子、フッ化マグネシウム微粒子等が好ましく、これらの無機微粒子のコロイド溶液が特に好ましい。コロイド溶液は、無機微粒子粉を分散媒に分散したものでもよいし、市販品のコロイド溶液であってもよい。 Further, the leveling agent, the surfactant and the like are contained in order to improve the uniformity of the coating film, and known ones can be used, and commercially available products are particularly preferable because they are easily available.
As the inorganic fine particles, silica fine particles, alumina fine particles, titania fine particles, magnesium fluoride fine particles and the like are preferable, and a colloidal solution of these inorganic fine particles is particularly preferable. The colloidal solution may be a dispersion of inorganic fine particle powder in a dispersion medium or a commercially available colloidal solution.
無機微粒子の分散媒に用いる有機溶剤としては、メタノール、エタノール、プロパノール、ブタノール、エチレングリコール、プロピレングリコール、ブタンジオール、ペンタンジオール、2-メチル-2,4-ペンタンジオール、ジエチレングリコール、ジプロピレングリコール、エチレングリコールモノプロピルエーテル等のアルコール類;メチルエチルケトン、メチルイソブチルケトン等のケトン類;トルエン、キシレン等の芳香族炭化水素類;ジメチルホルムアミド、ジメチルアセトアミド、N-メチルピロリドン等のアミド類;酢酸エチル、酢酸ブチル、γ-ブチロラクトン等のエステル類;テトラヒドロフラン、1,4-ジオキサン等のエ-テル類を挙げることができる。なかでも、アルコール類又はケトン類が好ましい。これら有機溶剤は、単独で又は2種以上を混合して分散媒として使用することができる。 Examples of the dispersion medium of the inorganic fine particles include water or an organic solvent. As the colloidal solution, the pH or pKa is preferably adjusted to 1 to 10, more preferably 2 to 7, from the viewpoint of the stability of the coating solution for film formation.
Organic solvents used for the dispersion medium of inorganic fine particles include methanol, ethanol, propanol, butanol, ethylene glycol, propylene glycol, butanediol, pentanediol, 2-methyl-2,4-pentanediol, diethylene glycol, dipropylene glycol, ethylene Alcohols such as glycol monopropyl ether; ketones such as methyl ethyl ketone and methyl isobutyl ketone; aromatic hydrocarbons such as toluene and xylene; amides such as dimethylformamide, dimethylacetamide and N-methylpyrrolidone; ethyl acetate and butyl acetate And esters such as γ-butyrolactone; ethers such as tetrahydrofuran and 1,4-dioxane. Of these, alcohols or ketones are preferable. These organic solvents can be used alone or in admixture of two or more as a dispersion medium.
本発明の組成物における上記金属アルコキシド、金属酸化物ゾル又は金属アルコキシドリゴマーの含有量は、特定シロキサンモノマーの100質量部に対して0.5~100質量部であり、好ましくは、1~60質量部である。かかる範囲であると、本発明の組成物が有する親水性及び膜安定性がより発揮できる。 Among the other components that may be contained, preferred are metal alkoxides, metal oxide sols, or metal alkoxy digomers in which a part of the alkoxy groups may be substituted with other organic groups.
The content of the metal alkoxide, metal oxide sol or metal alkoxy driomer in the composition of the present invention is 0.5 to 100 parts by mass, preferably 1 to 60 parts by mass with respect to 100 parts by mass of the specific siloxane monomer. Part. Within such a range, the hydrophilicity and film stability of the composition of the present invention can be more exhibited.
本発明の親水性コート膜形成用組成物は、特定シロキサンモノマーと、水若しくは有機溶剤を1種又は2種以上とを混合ことで得られる溶液である。
有機溶剤としては、メタノール、エタノール、2-プロパノール、ブタノール、ジアセトンアルコール、トリフルオロエタノール、等のアルコール類、アセトン、メチルエチルケトン、メチルイソブチルケトン等のケトン類、エチレングリコール、ジエチレングリコール、プロピレングリコール、へキシレングリコール等のグリコール類、メチルセロソルブ、エチルセロソルブ、ブチルセロソルブ、エチルカルビトール、ブチルカルビトール、エチレングリコールモノメチルエーテル、エチレングリコールジメチルエーテル、エチレングリコール-n-ブチルエーテル、ジエチレングリコールモノメチルエーテル、ジエチレングリコールモノブチルエーテル、ジエチレングリコールジメチルエーテル、プロピレングリコールモノメチルエーテル、プロピレングリコールモノブチルエーテル等のグリコールエーテル、酢酸メチルエステル、酢酸エチルエステル、乳酸エチルエステル等のエステル類、N-メチル-2-ピロリドン、N,N-ジメチルホルムアミド、N,N-ジメチルアセトアミド、γ-ブチロラクトン、ジメチルスルホキシド、テトラメチル尿素、ヘキサメチルホスホトリアミド、m-クレゾール等が挙げられる。
なかでも、有機溶媒としては、モノマーの溶解性の観点により、メタノール、エタノール、2-プロパノール、トリフルオロエタノール等のアルコール類、エチレングリコール、プロピレングリコール、へキシレングリコール等のグリコール類、メチルセロソルブ、エチルセロソルブ、ブチルセロソルブ、エチルカルビトール、ブチルカルビトール、エチレングリコールモノメチルエーテル、エチレングリコールジメチルエーテル、エチレングリコール-n-ブチルエーテル、ジエチレングリコールモノメチルエーテル、ジエチレングリコールモノブチルエーテル、ジエチレングリコールジメチルエーテル、プロピレングリコールモノメチルエーテル、プロピレングリコールモノブチルエーテル等のグリコールエーテル、又はN-メチル-2-ピロリドンであるのが好ましい。 <Hydrophilic coating film forming composition>
The composition for forming a hydrophilic coat film of the present invention is a solution obtained by mixing a specific siloxane monomer and one or more of water or an organic solvent.
Organic solvents include alcohols such as methanol, ethanol, 2-propanol, butanol, diacetone alcohol, trifluoroethanol, ketones such as acetone, methyl ethyl ketone, methyl isobutyl ketone, ethylene glycol, diethylene glycol, propylene glycol, hexylene Glycols such as glycol, methyl cellosolve, ethyl cellosolve, butyl cellosolve, ethyl carbitol, butyl carbitol, ethylene glycol monomethyl ether, ethylene glycol dimethyl ether, ethylene glycol-n-butyl ether, diethylene glycol monomethyl ether, diethylene glycol monobutyl ether, diethylene glycol dimethyl ether, propylene Glycol monomethyl ether Glycol ethers such as propylene glycol monobutyl ether, esters such as acetic acid methyl ester, acetic acid ethyl ester, and lactate ethyl ester, N-methyl-2-pyrrolidone, N, N-dimethylformamide, N, N-dimethylacetamide, γ- Examples include butyrolactone, dimethyl sulfoxide, tetramethylurea, hexamethylphosphotriamide, and m-cresol.
Among them, organic solvents include alcohols such as methanol, ethanol, 2-propanol, and trifluoroethanol, glycols such as ethylene glycol, propylene glycol, and hexylene glycol, methyl cellosolve, and ethyl, from the viewpoint of monomer solubility. Cellosolve, butyl cellosolve, ethyl carbitol, butyl carbitol, ethylene glycol monomethyl ether, ethylene glycol dimethyl ether, ethylene glycol-n-butyl ether, diethylene glycol monomethyl ether, diethylene glycol monobutyl ether, diethylene glycol dimethyl ether, propylene glycol monomethyl ether, propylene glycol monobutyl ether, etc. Glycol ether or N-methyl-2 Preferably a pyrrolidone.
加水分解を行う際、反応温度は0℃~沸点が好ましく、より好ましくは0℃~120℃、特に好ましくは5℃~80℃である。反応時間は10分~80時間が好ましく、より好ましくは30分~50時間、特に好ましくは30分~2時間である。 The specific siloxane monomer contained in the solution may be hydrolyzed. For hydrolysis of specific siloxane monomers, acids such as hydrochloric acid, sulfuric acid, nitric acid, acetic acid, formic acid, succinic acid, maleic acid; alkalis such as ammonia, methylamine, ethylamine, ethanolamine, triethylamine or metal salts such as hydrochloric acid, sulfuric acid, nitric acid A catalyst such as may be used.
In carrying out the hydrolysis, the reaction temperature is preferably 0 ° C. to boiling point, more preferably 0 ° C. to 120 ° C., particularly preferably 5 ° C. to 80 ° C. The reaction time is preferably 10 minutes to 80 hours, more preferably 30 minutes to 50 hours, and particularly preferably 30 minutes to 2 hours.
その際、用いる溶媒は、溶解に用いたと同じ溶媒でもよいし、別の溶媒でもよい。この溶媒は、ケイ素化合物が均一に溶解している限りにおいて特に限定されず、一種でも複数種でも任意に選択して用いることができる。
本発明の組成物における特定シロキサンモノマーの含有量は、SiO2固形分換算濃度で0.005~15質量%が好ましく、0.01~12質量%がより好ましい。かかる濃度範囲であれば、一回の塗布で所望の膜厚を得易く、充分な溶液のポットライフが得られ易い。 In the present invention, the solution obtained by the above-described method may be used as a coating forming composition as it is, or the solution obtained by the above-described method may be concentrated or diluted by adding a solvent, if necessary. Or may be replaced with another solvent.
In this case, the solvent used may be the same solvent used for dissolution or another solvent. This solvent is not particularly limited as long as the silicon compound is uniformly dissolved, and one kind or plural kinds of solvents can be arbitrarily selected and used.
The content of the specific siloxane monomer in the composition of the present invention is preferably 0.005 to 15% by mass, more preferably 0.01 to 12% by mass in terms of SiO 2 solid content concentration. Within such a concentration range, it is easy to obtain a desired film thickness by a single application, and a sufficient pot life of the solution is easily obtained.
本発明の親水性コート膜形成用組成物は、既知の塗布法を適用して、基板上に塗膜を形成し、親水性コート膜とすることが可能である。塗布法としては、例えば、ディップコート法、スピンコート法、スプレーコート法、フローコート法、刷毛塗り法、バーコート法、グラビアコート法、ロール転写法、ブレードコート法、エアーナイフコート法、スリットコート法、スクリーン印刷法、インクジェット法、フレキソ印刷法などが用いられる。この中でも、スピンコート法、スリットコート法、ブレードコート法、スプレーコート法又はディップコート法が好ましい。 <Film formation>
The hydrophilic coating film-forming composition of the present invention can be formed into a hydrophilic coating film by applying a known coating method to form a coating film on a substrate. Examples of coating methods include dip coating, spin coating, spray coating, flow coating, brush coating, bar coating, gravure coating, roll transfer, blade coating, air knife coating, and slit coating. Method, screen printing method, ink jet method, flexographic printing method and the like are used. Among these, a spin coating method, a slit coating method, a blade coating method, a spray coating method, or a dip coating method is preferable.
基板としては、ガラス、プラスチック{ポリメチルメタクリレート、ポリエチレンテレフタレート、ポリブチレンテレフタレート、ポリエチレンナフタレート、ABS、ポリカーボネート、ポリスチレン、エポキシ、不飽和ポリエステル、メラミン、ジアリルフタレート、ポリイミド、ウレタン、ナイロン、ポリエチレン、ポリプロピレン、シクロオレフィンポリマー、ポリ塩化ビニル、フッ素樹脂(ポリテトラフルオロエチレン樹脂、ポリクロロトリフルオロエチレン樹脂、ポリフッ化ビニリデン樹脂、ポリフッ化ビニル樹脂、ペルフルオロアルコキシフッ素樹脂、四フッ化エチレン・六フッ化プロピレン共重合体樹脂、エチレン・四フッ化エチレン共重合体樹脂、エチレン・クロロトリフルオロエチレン共重合体樹脂等)、ポリブタジエン、ポリイソプレン、SBR、ニトリルラバー、EPM、EPDM、エピクロルヒドリンラバー、ネオプレンラバー、ポルサルファイド、ブチルラバー等}、金属(鉄、アルミニウム、ステンレス、チタン、銅、黄銅、これらの合金等)、セルロース、セルロース誘導体、セルロース類似体(キチン、キトサン、ポルフィラン等)あるいは天然繊維(シルク、コットン等)等の基板、シート、フィルム、繊維の表面親水化等が挙げられる。 <Board>
As a substrate, glass, plastic {polymethyl methacrylate, polyethylene terephthalate, polybutylene terephthalate, polyethylene naphthalate, ABS, polycarbonate, polystyrene, epoxy, unsaturated polyester, melamine, diallyl phthalate, polyimide, urethane, nylon, polyethylene, polypropylene, Cycloolefin polymer, polyvinyl chloride, fluorine resin (polytetrafluoroethylene resin, polychlorotrifluoroethylene resin, polyvinylidene fluoride resin, polyvinyl fluoride resin, perfluoroalkoxy fluorine resin, ethylene tetrafluoride / hexafluoropropylene copolymer) Combined resin, ethylene / tetrafluoroethylene copolymer resin, ethylene / chlorotrifluoroethylene copolymer resin, etc.), polybutadiene , Polyisoprene, SBR, nitrile rubber, EPM, EPDM, epichlorohydrin rubber, neoprene rubber, porsulfide, butyl rubber, etc.}, metal (iron, aluminum, stainless steel, titanium, copper, brass, alloys thereof, etc.), cellulose, cellulose Examples include derivatives, cellulose analogs (chitin, chitosan, porphyran, etc.) or natural fibers (silk, cotton, etc.) and the like, sheets, films, fiber surface hydrophilization, and the like.
基材に形成された親水性コート膜形成用組成物の塗膜を、乾燥、焼成することにより本発明の親水性コート膜が得られる。乾燥工程は、室温~150℃の温度範囲であることが好ましく、40~120℃の範囲であることがより好ましい。また、その時間は30秒~10分程度が好ましく、1~8分程度がより好ましい。乾燥方法としては、ホットプレートや熱風循環式オーブンなどを用いることが好ましい。 <Drying>
The hydrophilic coating film of the present invention is obtained by drying and baking the coating film of the composition for forming a hydrophilic coating film formed on the substrate. The drying step is preferably in the temperature range of room temperature to 150 ° C, and more preferably in the range of 40 to 120 ° C. The time is preferably about 30 seconds to 10 minutes, more preferably about 1 to 8 minutes. As a drying method, it is preferable to use a hot plate, a hot air circulating oven, or the like.
焼成工程は、基材の耐熱性、環境面を考慮し、80℃~300℃の温度範囲であることが好ましく、100℃~250℃の範囲内であることがより好ましい。その時間は5分以上が好ましく、15分以上であることがより好ましい。焼成方法としては、ホットプレート、熱循環式オーブン、赤外線オーブンなどを用いることが好ましい。 <Baking>
The firing step is preferably in the temperature range of 80 ° C. to 300 ° C. and more preferably in the range of 100 ° C. to 250 ° C. in consideration of the heat resistance of the substrate and the environmental aspects. The time is preferably 5 minutes or more, and more preferably 15 minutes or more. As a baking method, it is preferable to use a hot plate, a thermal circulation oven, an infrared oven, or the like.
なお、以下における略語は以下のとおりである。
DHIMES:トリエトキシ-3-(2-イミダゾリン-1-イル)プロピルシラン
p-PyTES:2-(4-ピリジルエチル)トリエトキシシラン
DMAPS:3-(N,N-ジメチルアミノプロピル)トリメトキシシラン
MTES:メチルトリエトキシシラン
TFE:トリフルオロエタノール EXAMPLES Hereinafter, although this invention is demonstrated in more detail according to an Example, this invention is not limited to these.
Abbreviations below are as follows.
DHIMES: triethoxy-3- (2-imidazolin-1-yl) propylsilane p-PyTES: 2- (4-pyridylethyl) triethoxysilane DMAPS: 3- (N, N-dimethylaminopropyl) trimethoxysilane MTES: Methyltriethoxysilane TFE: trifluoroethanol
装置:Varian NMR System 400 NB (400 MHz)
測定溶媒:CDCl3、DMSO-d6、
基準物質:テトラメチルシラン(TMS)(δ0.0 ppm for 1H) The products in the following synthesis examples were identified by 1H-NMR analysis. The analysis conditions are as follows.
Apparatus: Varian NMR System 400 NB (400 MHz)
Measuring solvent: CDCl3, DMSO-d6,
Reference substance: Tetramethylsilane (TMS) (δ0.0 ppm for 1H)
滴下後、アセトニトリル(99.8g)で滴下ロート上に残った残留分を流し、反応温度を室温として18時間反応させた。反応終了後、減圧濃縮する事で反応容器内の内部総重量を459gとし、テトラヒドロフラン(1596g)を加えて結晶を析出させ、ろ過、乾燥することでA-1(性状:白色結晶)を244.0g得た(収率:85%)。
1H-NMR(400MHz) in CDCl3:0.57-0.61ppm(m,2H),1.23ppm(t,J=7.2Hz,9H),1.69-1.76ppm(m,2H),2.14-2.21ppm(m,2H)2.90ppm(t,J=7.2Hz,2H),3.57ppm(t,J=7.2Hz,2H),3.78-3.85ppm(m,8H),3.93-3.99ppm(m,4H),8.82ppm(s,1H) A reactor was charged with acetonitrile (398.9 g) and DHIMES (199.5 g, 727 mmol), and then 1,3-propane sultone dissolved in acetonitrile (299.3 g) under a nitrogen atmosphere and ice-cooling conditions. (97.7 g) was added dropwise using a dropping funnel.
After the dropping, the residue remaining on the dropping funnel was poured with acetonitrile (99.8 g), and the reaction was carried out at room temperature for 18 hours. After completion of the reaction, the total internal weight in the reaction vessel was reduced to 459 g by concentration under reduced pressure, tetrahydrofuran (1596 g) was added to precipitate crystals, filtered and dried to give A-1 (property: white crystals) to 244. 0 g was obtained (yield: 85%).
1 H-NMR (400 MHz) in CDCl 3 : 0.57 to 0.61 ppm (m, 2H), 1.23 ppm (t, J = 7.2 Hz, 9H), 1.69 to 1.76 ppm (m, 2H) ), 2.14-2.21 ppm (m, 2H) 2.90 ppm (t, J = 7.2 Hz, 2H), 3.57 ppm (t, J = 7.2 Hz, 2H), 3.78-3. 85 ppm (m, 8H), 3.93-3.99 ppm (m, 4H), 8.82 ppm (s, 1H)
シロキサンモノマーとして、p-PyTESを用いた他は、合成例1と同様に実施することにより、A-2(性状:赤色結晶)を40.5g得た(収率74%)。
The procedure was the same as in Synthesis Example 1, except that p-PyTES was used as the siloxane monomer, to obtain 40.5 g of A-2 (property: red crystals) (yield 74%).
シロキサンモノマーとして、DMAPSを用いた他は、合成例1と同様に実施することにより、A-3(性状:白色結晶)を49.4g得た(収率82%)。
The same procedure as in Synthesis Example 1 was carried out except that DMAPS was used as the siloxane monomer to obtain 49.4 g of A-3 (property: white crystals) (yield 82%).
アセトニトリル(30.1g)中、DHIMES(20.0g,72.9mmol)を仕込み、窒素雰囲気室温条件下で1,4-ブタンスルトン(11.0g)を加えた。続いて、反応温度を45℃として約2日間反応させて原料を消失させた。反応終了後、減圧濃縮することで溶媒を除去し、酢酸エチル(20.0g)とヘキサン(20.0g)を加えて懸濁溶液を作製した。-25℃の冷凍庫にて、懸濁液を一晩放置することで結晶を析出させ、窒素雰囲気下でろ過することで結晶を回収した。得られた結晶をヘキサン(50.0g)でスラリー洗浄し、ろ過、乾燥することでA-4(性状:薄黄色結晶)を20.2g得た(収率:67%)。
DHIMES (20.0 g, 72.9 mmol) was charged in acetonitrile (30.1 g), and 1,4-butane sultone (11.0 g) was added under a nitrogen atmosphere at room temperature. Subsequently, the reaction temperature was set to 45 ° C. and the reaction was carried out for about 2 days to disappear the raw materials. After completion of the reaction, the solvent was removed by concentration under reduced pressure, and ethyl acetate (20.0 g) and hexane (20.0 g) were added to prepare a suspension solution. Crystals were recovered by allowing the suspension to stand overnight in a freezer at −25 ° C., and the crystals were recovered by filtration under a nitrogen atmosphere. The obtained crystals were slurry washed with hexane (50.0 g), filtered and dried to obtain 20.2 g of A-4 (property: light yellow crystals) (yield: 67%).
アセトニトリル(40.0g)中、トリエトキシ-3-(2-イミダゾリン-1-イル)プロピルシラン(20.0g,72.9mmol)を仕込み、窒素雰囲気氷冷条件下で2,4-ブタンスルトン(10.4g)を加えた。続いて、反応温度を室温として約1日間反応させて原料を消失させた。反応終了後、減圧濃縮することで溶媒を除去した。続いて、濃縮溶液を酢酸エチル(80.0g)で希釈し、ヘキサン(80.0g)を加えた結果、懸濁溶液を作製した。-25℃の冷凍庫にて、粘性物質を固化させ、上澄み液を除去した。再度酢酸エチル(70.0g)及びヘキサン(70.0g)を加えて懸濁液を作製し、再度-25℃の冷凍庫で放置した結果、結晶が析出した。窒素雰囲気下でろ過、ヘキサン洗浄し、乾燥することでA-5(性状:白色結晶)を28.2g得た(収率:94%、)。
Triethoxy-3- (2-imidazolin-1-yl) propylsilane (20.0 g, 72.9 mmol) was charged in acetonitrile (40.0 g), and 2,4-butanesultone (10. 4 g) was added. Subsequently, the reaction temperature was set to room temperature and the reaction was carried out for about 1 day to disappear the raw materials. After completion of the reaction, the solvent was removed by concentration under reduced pressure. Subsequently, the concentrated solution was diluted with ethyl acetate (80.0 g), and hexane (80.0 g) was added to prepare a suspension solution. The viscous substance was solidified in a freezer at −25 ° C., and the supernatant was removed. Ethyl acetate (70.0 g) and hexane (70.0 g) were added again to prepare a suspension, which was then left again in a freezer at −25 ° C. As a result, crystals were deposited. Filtration under a nitrogen atmosphere, washing with hexane, and drying gave 28.2 g of A-5 (property: white crystals) (yield: 94%).
200mLフラスコ中にA-1を39.7g及びTFEを36.4g加えて攪拌し、A-1を溶解した。そこに、蓚酸0.3g、水5.4g、及びTFE18.2gの混合物を添加し、室温下で2時間攪拌し、溶液AAを得た。
500mLフラスコ中にて、溶液AA2.5g及びTFE297.5gを混合し、さらに室温下で30分撹拌し、溶液(K1)を得た。 <Preparation Example 1>
39.7 g of A-1 and 36.4 g of TFE were added to a 200 mL flask and stirred to dissolve A-1. Thereto was added a mixture of 0.3 g of succinic acid, 5.4 g of water, and 18.2 g of TFE, and the mixture was stirred at room temperature for 2 hours to obtain a solution AA.
In a 500 mL flask, 2.5 g of solution AA and 297.5 g of TFE were mixed, and further stirred at room temperature for 30 minutes to obtain a solution (K1).
200mLフラスコ中にA-2を39.1g及びTFEを36.7g加えて攪拌し、A-2を溶解した。そこに、蓚酸0.3g、水5.4g、及びTFE18.4gの混合物を添加し、室温下で2時間攪拌し、溶液ABを得た。
500mLフラスコ中にて、溶液AB2.5g及びTFE297.5gを混合し、さらに室温下で30分撹拌し、溶液(K2)を得た。 <Preparation Example 2>
In a 200 mL flask, 39.1 g of A-2 and 36.7 g of TFE were added and stirred to dissolve A-2. Thereto was added a mixture of 0.3 g of succinic acid, 5.4 g of water, and 18.4 g of TFE, and the mixture was stirred at room temperature for 2 hours to obtain a solution AB.
In a 500 mL flask, 2.5 g of solution AB and 297.5 g of TFE were mixed and further stirred at room temperature for 30 minutes to obtain a solution (K2).
200mLフラスコ中にA-1を27.8g、MTESを5.3g、TFEを40.8g加えて攪拌し、A-1及びMTESを溶解した。そこに、蓚酸0.3g、水5.4g、及びTFE20.4gの混合物を添加し、室温下で2時間攪拌し、溶液ACを得た。
500mLフラスコ中にて、溶液AC2.5g及びTFE297.5gを混合し、さらに室温下で30分撹拌し、溶液(K3)を得た。 <Preparation Example 3>
In a 200 mL flask, 27.8 g of A-1, 5.3 g of MTES, and 40.8 g of TFE were added and stirred to dissolve A-1 and MTES. Thereto was added a mixture of 0.3 g of succinic acid, 5.4 g of water, and 20.4 g of TFE, and the mixture was stirred at room temperature for 2 hours to obtain a solution AC.
In a 500 mL flask, 2.5 g of the solution AC and 297.5 g of TFE were mixed, and the mixture was further stirred at room temperature for 30 minutes to obtain a solution (K3).
200mLフラスコ中にA-3を32.9g及びTFEを40.9g加えて攪拌し、A-3を溶解した。そこに、蓚酸0.3g、水5.4g、及びTFE20.5gの混合物を添加し、室温下で2時間攪拌し、溶液ADを得た。
500mLフラスコ中にて、溶液AD2.5g及びTFE297.5gを混合し、さらに室温下で30分撹拌し、溶液(K4)を得た。 <Preparation Example 4>
In a 200 mL flask, 32.9 g of A-3 and 40.9 g of TFE were added and stirred to dissolve A-3. Thereto was added a mixture of 0.3 g of succinic acid, 5.4 g of water, and 20.5 g of TFE, and the mixture was stirred at room temperature for 2 hours to obtain a solution AD.
In a 500 mL flask, 2.5 g of the solution AD and 297.5 g of TFE were mixed, and further stirred at room temperature for 30 minutes to obtain a solution (K4).
100mLフラスコ中にA-4を16.4g及びTFEを14.2g加えて攪拌し、A-3を溶解した。そこに、蓚酸0.1g、水2.2g、及びTFE7.1gの混合物を添加し、室温下で2時間攪拌し、溶液AEを得た。
500mLフラスコ中にて、溶液AE2.5g及びTFE297.5gを混合し、さらに室温下で30分撹拌し、溶液(K5)を得た。 <Preparation Example 5>
In a 100 mL flask, 16.4 g of A-4 and 14.2 g of TFE were added and stirred to dissolve A-3. Thereto was added a mixture of 0.1 g of oxalic acid, 2.2 g of water, and 7.1 g of TFE, and the mixture was stirred at room temperature for 2 hours to obtain a solution AE.
In a 500 mL flask, 2.5 g of solution AE and 297.5 g of TFE were mixed, and the mixture was further stirred at room temperature for 30 minutes to obtain a solution (K5).
100mLフラスコ中にA-5を16.4g及びTFEを14.2g加えて攪拌し、A-3を溶解した。そこに、蓚酸0.1g、水2.2g、及びTFE7.1gの混合物を添加し、室温下で2時間攪拌し、溶液AFを得た。
500mLフラスコ中にて、溶液AF2.5g及びTFE297.5gを混合し、さらに室温下で30分撹拌し、溶液(K6)を得た。 <Preparation Example 6>
In a 100 mL flask, 16.4 g of A-5 and 14.2 g of TFE were added and stirred to dissolve A-3. Thereto was added a mixture of 0.1 g of oxalic acid, 2.2 g of water, and 7.1 g of TFE, and the mixture was stirred at room temperature for 2 hours to obtain a solution AF.
In a 500 mL flask, 2.5 g of the solution AF and 297.5 g of TFE were mixed and further stirred at room temperature for 30 minutes to obtain a solution (K6).
上記調製例1~6で得られた溶液K1~K6を孔径0.5μmのメンブランフィルターで加圧濾過し、ガラス基板にスピンコート法により成膜した。この基板を70℃のホットプレート上で3分間乾燥した後、200℃の熱風循環式オーブンで30分焼成し親水性被膜を得た。
調製例1~3、5~6でそれぞれ得られた溶液K1~K3、K5~K6の上記親水性被膜(KL1~KL5)を実施例1~5とした。また、調製例4で得られた溶液K4の上記親水性被膜(KM1)を比較例1とした。 <Film formation method>
The solutions K1 to K6 obtained in the above Preparation Examples 1 to 6 were filtered under pressure through a membrane filter having a pore size of 0.5 μm, and a film was formed on a glass substrate by a spin coating method. This substrate was dried on a hot plate at 70 ° C. for 3 minutes and then baked in a hot air circulation oven at 200 ° C. for 30 minutes to obtain a hydrophilic coating.
The hydrophilic coatings (KL1 to KL5) of the solutions K1 to K3 and K5 to K6 obtained in Preparation Examples 1 to 3, 5 to 6, respectively, were designated as Examples 1 to 5. The hydrophilic coating (KM1) of the solution K4 obtained in Preparation Example 4 was used as Comparative Example 1.
<水接触角>
協和界面科学社製の自動接触角計CA-Z型を使用して、純水の1マイクロリットルを滴下したときの接触角を測定した。
<高温高湿試験>
上記各被膜(KL1~KL5、KM1)を温度60℃、相対湿度90%の高温高湿槽オーブンにて3日間エージングした。その後、上記手法にて水接触角を測定した。 The following tests were conducted on the coatings of Examples 1 to 3, 5 to 6 (KL1 to KL5) and the coating of Comparative Example 1 (KM1), and the results are shown in Table 1.
<Water contact angle>
Using an automatic contact angle meter CA-Z type manufactured by Kyowa Interface Science Co., Ltd., the contact angle when 1 microliter of pure water was dropped was measured.
<High temperature and high humidity test>
Each of the above coatings (KL1 to KL5, KM1) was aged for 3 days in a high temperature and high humidity oven with a temperature of 60 ° C. and a relative humidity of 90%. Then, the water contact angle was measured by the said method.
上記各被膜(KL1~KL5、KM1)を、純水を用いて室温にて5分超音波洗浄を行い、次いで80℃の熱風循環式オーブンで10分乾燥した。その後、上記高温高湿試験を行った。
<呼気試験>
上記水浸漬試験及び高温高湿試験を行った被膜(KL1~KL5、KM1)に呼気を吹きかけ、被非膜の表面が曇らなかった場合○とし、曇った場合×として、各評価を行った。 <Water immersion test>
Each of the coatings (KL1 to KL5, KM1) was subjected to ultrasonic cleaning with pure water at room temperature for 5 minutes, and then dried in a hot air circulation oven at 80 ° C. for 10 minutes. Thereafter, the high temperature and high humidity test was performed.
<Breath test>
Breathing was blown on the coatings (KL1 to KL5, KM1) subjected to the water immersion test and the high-temperature and high-humidity test, and each evaluation was carried out as ◯ when the surface of the non-film was not clouded and as x when cloudy.
なお、2017年6月14日に出願された日本特許出願2017-117151号の明細書、特許請求の範囲、図面、及び要約書の全内容をここに引用し、本発明の明細書の開示として、取り入れるものである。 In the coatings of Examples 1 to 5, the hydrophilicity was maintained even after the high-temperature and high-humidity test and the water immersion test, and the results of the breath test showed that the antifogging property was also maintained. . In the film of Comparative Example 1, the hydrophilicity was lowered after 3 days at high temperature and high humidity by the water immersion test, and the non-membrane surface was clouded and the antifogging property was also lowered in the breath test.
It should be noted that the entire contents of the specification, claims, drawings, and abstract of Japanese Patent Application No. 2017-117151 filed on June 14, 2017 are cited herein as disclosure of the specification of the present invention. Incorporate.
Claims (14)
- 含窒素複素環構造中の窒素原子に正(+)の電荷を有するベタイン基を有するシロキサンモノマーと、水又は有機溶剤と、を含有する親水性コート膜形成用組成物。 A hydrophilic coating film-forming composition containing a siloxane monomer having a betaine group having a positive (+) charge on a nitrogen atom in a nitrogen-containing heterocyclic structure, and water or an organic solvent.
- 前記シロキサンモノマーが、下記式[1]で表される、請求項1に記載の親水性コート膜形成用組成物。
R2は、炭素数1~5のアルキル基、炭素数2~5のアルケニル基、又は炭素数2~5のアルキニル基を表し、R2の有する任意の水素原子は、炭素数1~5のアルキル基、ハロゲン原子、芳香族環、又は脂肪族環で置換されていてもよい。pは、1~3の整数を表す。qは、pが1のとき0~2の整数を表し、pが2のとき0~1の整数を表し、pが3のとき0を表す。
Lは炭素数1~20のヘテロ原子を有してもよい直鎖状若しくは分岐状のアルキレン基を表し、アルキレン基の有する任意の水素原子は、炭素数1~5のアルキル基、ハロゲン原子、芳香族環、又は脂肪族環で置換されていてもよい。
Xは、単結合、-O-、-COO-、-OCO-、-CONR3-、-NR4-CO-、又は-NR5=NR6-を表す。R3、R4、R5及びR6は、それぞれ独立に、水素原子又は炭素数1~4のアルキル基を表す。
Yは、含窒素複素環を有する2価の有機基を表す。
Mは、炭素数1~10の直鎖状若しくは分岐状のアルキレン基を表し、アルキレン基の有する任意の水素原子は、炭素数1~5のアルキル基又はハロゲン原子で置換されていてもよい。Mは、Yの有する窒素原子と結合し、M及びLのいずれか一方はYの有する窒素原子との結合によりN+部分を形成している。
ZはCOO-、SO3 -、又はPO4 -を表す。 The composition for forming a hydrophilic coat film according to claim 1, wherein the siloxane monomer is represented by the following formula [1].
R 2 represents an alkyl group having 1 to 5 carbon atoms, an alkenyl group having 2 to 5 carbon atoms, or an alkynyl group having 2 to 5 carbon atoms, and an arbitrary hydrogen atom that R 2 has has 1 to 5 carbon atoms It may be substituted with an alkyl group, a halogen atom, an aromatic ring, or an aliphatic ring. p represents an integer of 1 to 3. q represents an integer of 0 to 2 when p is 1, represents an integer of 0 to 1 when p is 2, and represents 0 when p is 3.
L represents a linear or branched alkylene group which may have a hetero atom having 1 to 20 carbon atoms, and an arbitrary hydrogen atom of the alkylene group is an alkyl group having 1 to 5 carbon atoms, a halogen atom, It may be substituted with an aromatic ring or an aliphatic ring.
X represents a single bond, —O—, —COO—, —OCO—, —CONR 3 —, —NR 4 —CO—, or —NR 5 ═NR 6 —. R 3 , R 4 , R 5 and R 6 each independently represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms.
Y represents a divalent organic group having a nitrogen-containing heterocyclic ring.
M represents a linear or branched alkylene group having 1 to 10 carbon atoms, and any hydrogen atom of the alkylene group may be substituted with an alkyl group having 1 to 5 carbon atoms or a halogen atom. M is bonded to the nitrogen atom of Y, and one of M and L forms an N + moiety by the bond with the nitrogen atom of Y.
Z represents COO − , SO 3 − , or PO 4 — . - 前記Yが、ピリジン、ピペリジン、イミダゾール、オキサゾール、チアゾール、ピラゾール、イミダゾリン、ピラジン、ベンゾイミダゾール、キノリン、イソキノリン、プリン、及びキノキサリンからなる群から選ばれる、請求項1又は2に記載の親水性コート膜形成用組成物。 The hydrophilic coating film according to claim 1 or 2, wherein Y is selected from the group consisting of pyridine, piperidine, imidazole, oxazole, thiazole, pyrazole, imidazoline, pyrazine, benzimidazole, quinoline, isoquinoline, purine, and quinoxaline. Forming composition.
- 前記Yが、ピリジン、イミダゾール、イミダゾリン、及びベンゾイミダゾールからなる群から選ばれる、請求項1~3のいずれか1項に記載の親水性コート膜形成用組成物。 The composition for forming a hydrophilic coat film according to any one of claims 1 to 3, wherein Y is selected from the group consisting of pyridine, imidazole, imidazoline, and benzimidazole.
- 前記ベタイン基を有するシロキサンモノマーをSiO2固形分換算にて0.005~12質量%含有する、請求項1~6のいずれか1項に記載の親水性コート膜形成用組成物。 The composition for forming a hydrophilic coat film according to any one of claims 1 to 6, comprising 0.005 to 12% by mass of the siloxane monomer having a betaine group in terms of SiO 2 solid content.
- さらに、金属アルコキシド、金属アルコキシドリゴマー、又は金属アルコキシドポリマーを含有する、請求項1~7のいずれか1項に記載の親水性コート膜形成用組成物。 The composition for forming a hydrophilic coat film according to any one of claims 1 to 7, further comprising a metal alkoxide, a metal alkoxy digomer, or a metal alkoxide polymer.
- さらに、無機微粒子、レベリング剤、又は界面活性剤を含有する、請求項1~8のいずれか1項に記載の親水性コート膜形成用組成物。 The composition for forming a hydrophilic coat film according to any one of claims 1 to 8, further comprising inorganic fine particles, a leveling agent, or a surfactant.
- 請求項1~9のいずれか1項に記載の親水性コート膜形成用組成物を、基板上にコートして塗膜を形成し、該塗膜を乾燥し、焼成して被膜を得る親水性コートの成膜方法。 A hydrophilic coating film obtained by coating the composition for forming a hydrophilic coating film according to any one of claims 1 to 9 on a substrate to form a coating film, drying the coating film, and baking the coating film. Method for forming a coat.
- 前記塗膜を室温から150℃で乾燥し、80~300℃で焼成する請求項10に記載の親水性コートの成膜方法。 The method for forming a hydrophilic coat according to claim 10, wherein the coating film is dried at room temperature to 150 ° C and baked at 80 to 300 ° C.
- 前記焼成後の被膜の厚みが、3~150nmである請求項10又は11に記載の親水性コートの成膜方法。 The method for forming a hydrophilic coat according to claim 10 or 11, wherein the thickness of the film after baking is 3 to 150 nm.
- 請求項1~9のいずれか1項に記載の親水性コート膜形成用組成物から得られる親水性コート膜。 A hydrophilic coat film obtained from the composition for forming a hydrophilic coat film according to any one of claims 1 to 9.
- 水滴付着防止膜又は防曇膜である請求項13に記載の親水性コート膜。 The hydrophilic coating film according to claim 13, which is a water droplet adhesion preventing film or an antifogging film.
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WO2022107543A1 (en) * | 2020-11-20 | 2022-05-27 | 信越化学工業株式会社 | Orgaosilicon compound, hydrolysis condensation product of same, and coating composition |
KR20220120500A (en) | 2021-02-22 | 2022-08-30 | 도오꾜오까고오교 가부시끼가이샤 | Surface treatment liquid and hydrophilizing treatment method |
WO2022180817A1 (en) * | 2021-02-26 | 2022-09-01 | 日本精化株式会社 | Sulfobetaine group-containing organosilicon compound and method for producing same |
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CN113512058B (en) * | 2021-08-10 | 2023-10-03 | 中国科学院深圳先进技术研究院 | Zwitterionic liquid silane coupling agent, synthetic method and application thereof |
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