JP7200937B2 - Composition for forming hydrophilic coating film, and hydrophilic coating film using the same - Google Patents
Composition for forming hydrophilic coating film, and hydrophilic coating film using the same Download PDFInfo
- Publication number
- JP7200937B2 JP7200937B2 JP2019525420A JP2019525420A JP7200937B2 JP 7200937 B2 JP7200937 B2 JP 7200937B2 JP 2019525420 A JP2019525420 A JP 2019525420A JP 2019525420 A JP2019525420 A JP 2019525420A JP 7200937 B2 JP7200937 B2 JP 7200937B2
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- JP
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- Prior art keywords
- coating film
- hydrophilic coating
- forming
- carbon atoms
- composition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 238000000576 coating method Methods 0.000 title claims description 72
- 239000011248 coating agent Substances 0.000 title claims description 63
- 239000000203 mixture Substances 0.000 title claims description 34
- 125000004432 carbon atom Chemical group C* 0.000 claims description 32
- 239000000178 monomer Substances 0.000 claims description 28
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- 229910052751 metal Inorganic materials 0.000 claims description 25
- 239000002184 metal Substances 0.000 claims description 25
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 25
- 238000000034 method Methods 0.000 claims description 19
- 150000004703 alkoxides Chemical class 0.000 claims description 18
- 125000000217 alkyl group Chemical group 0.000 claims description 14
- 239000000758 substrate Substances 0.000 claims description 14
- 239000010419 fine particle Substances 0.000 claims description 13
- 229910052757 nitrogen Inorganic materials 0.000 claims description 13
- 239000003960 organic solvent Substances 0.000 claims description 11
- 125000002947 alkylene group Chemical group 0.000 claims description 10
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 10
- 150000001875 compounds Chemical class 0.000 claims description 9
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- 125000004433 nitrogen atom Chemical group N* 0.000 claims description 9
- 125000005843 halogen group Chemical group 0.000 claims description 7
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- 125000003342 alkenyl group Chemical group 0.000 claims description 2
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- 229910052719 titanium Inorganic materials 0.000 description 7
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 6
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 6
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
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- 150000003377 silicon compounds Chemical class 0.000 description 6
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 5
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 5
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- 229910052782 aluminium Inorganic materials 0.000 description 5
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 5
- 229920005989 resin Polymers 0.000 description 5
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- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 4
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 4
- SVTBMSDMJJWYQN-UHFFFAOYSA-N 2-methylpentane-2,4-diol Chemical compound CC(O)CC(C)(C)O SVTBMSDMJJWYQN-UHFFFAOYSA-N 0.000 description 4
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 4
- KDCGOANMDULRCW-UHFFFAOYSA-N 7H-purine Chemical compound N1=CNC2=NC=NC2=C1 KDCGOANMDULRCW-UHFFFAOYSA-N 0.000 description 4
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 4
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 4
- NQRYJNQNLNOLGT-UHFFFAOYSA-N Piperidine Chemical compound C1CCNCC1 NQRYJNQNLNOLGT-UHFFFAOYSA-N 0.000 description 4
- KYQCOXFCLRTKLS-UHFFFAOYSA-N Pyrazine Chemical compound C1=CN=CC=N1 KYQCOXFCLRTKLS-UHFFFAOYSA-N 0.000 description 4
- SMWDFEZZVXVKRB-UHFFFAOYSA-N Quinoline Chemical compound N1=CC=CC2=CC=CC=C21 SMWDFEZZVXVKRB-UHFFFAOYSA-N 0.000 description 4
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 4
- 239000002612 dispersion medium Substances 0.000 description 4
- 238000007654 immersion Methods 0.000 description 4
- AWJUIBRHMBBTKR-UHFFFAOYSA-N isoquinoline Chemical compound C1=NC=CC2=CC=CC=C21 AWJUIBRHMBBTKR-UHFFFAOYSA-N 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 239000012299 nitrogen atmosphere Substances 0.000 description 4
- 229910052760 oxygen Inorganic materials 0.000 description 4
- 239000001301 oxygen Substances 0.000 description 4
- 239000002245 particle Substances 0.000 description 4
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- XSCHRSMBECNVNS-UHFFFAOYSA-N quinoxaline Chemical compound N1=CC=NC2=CC=CC=C21 XSCHRSMBECNVNS-UHFFFAOYSA-N 0.000 description 4
- 239000002994 raw material Substances 0.000 description 4
- 229910052717 sulfur Inorganic materials 0.000 description 4
- 239000011593 sulfur Substances 0.000 description 4
- 239000000725 suspension Substances 0.000 description 4
- 229910052715 tantalum Inorganic materials 0.000 description 4
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 4
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- CPUDPFPXCZDNGI-UHFFFAOYSA-N triethoxy(methyl)silane Chemical compound CCO[Si](C)(OCC)OCC CPUDPFPXCZDNGI-UHFFFAOYSA-N 0.000 description 4
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- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 3
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- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 3
- 150000002576 ketones Chemical class 0.000 description 3
- 238000002454 metastable transfer emission spectrometry Methods 0.000 description 3
- 125000000962 organic group Chemical group 0.000 description 3
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- DRXHEPWCWBIQFJ-UHFFFAOYSA-N methyl(triphenoxy)silane Chemical compound C=1C=CC=CC=1O[Si](OC=1C=CC=CC=1)(C)OC1=CC=CC=C1 DRXHEPWCWBIQFJ-UHFFFAOYSA-N 0.000 description 1
- RJMRIDVWCWSWFR-UHFFFAOYSA-N methyl(tripropoxy)silane Chemical compound CCCO[Si](C)(OCCC)OCCC RJMRIDVWCWSWFR-UHFFFAOYSA-N 0.000 description 1
- CUIXFHFVVWQXSW-UHFFFAOYSA-N methyl-[3-(oxiran-2-ylmethoxy)propyl]-diphenoxysilane Chemical compound C=1C=CC=CC=1O[Si](OC=1C=CC=CC=1)(C)CCCOCC1CO1 CUIXFHFVVWQXSW-UHFFFAOYSA-N 0.000 description 1
- VOARQMXRPHXHID-UHFFFAOYSA-N methyl-[3-(oxiran-2-ylmethoxy)propyl]-dipropoxysilane Chemical compound CCCO[Si](C)(OCCC)CCCOCC1CO1 VOARQMXRPHXHID-UHFFFAOYSA-N 0.000 description 1
- GEIHDEVWPDTQIM-UHFFFAOYSA-N methyl-tris(phenylmethoxy)silane Chemical compound C=1C=CC=CC=1CO[Si](OCC=1C=CC=CC=1)(C)OCC1=CC=CC=C1 GEIHDEVWPDTQIM-UHFFFAOYSA-N 0.000 description 1
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- INJVFBCDVXYHGQ-UHFFFAOYSA-N n'-(3-triethoxysilylpropyl)ethane-1,2-diamine Chemical compound CCO[Si](OCC)(OCC)CCCNCCN INJVFBCDVXYHGQ-UHFFFAOYSA-N 0.000 description 1
- PHQOGHDTIVQXHL-UHFFFAOYSA-N n'-(3-trimethoxysilylpropyl)ethane-1,2-diamine Chemical compound CO[Si](OC)(OC)CCCNCCN PHQOGHDTIVQXHL-UHFFFAOYSA-N 0.000 description 1
- YLBPOJLDZXHVRR-UHFFFAOYSA-N n'-[3-[diethoxy(methyl)silyl]propyl]ethane-1,2-diamine Chemical compound CCO[Si](C)(OCC)CCCNCCN YLBPOJLDZXHVRR-UHFFFAOYSA-N 0.000 description 1
- MQWFLKHKWJMCEN-UHFFFAOYSA-N n'-[3-[dimethoxy(methyl)silyl]propyl]ethane-1,2-diamine Chemical compound CO[Si](C)(OC)CCCNCCN MQWFLKHKWJMCEN-UHFFFAOYSA-N 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 150000002825 nitriles Chemical class 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- 229920001778 nylon Polymers 0.000 description 1
- UWJJYHHHVWZFEP-UHFFFAOYSA-N pentane-1,1-diol Chemical compound CCCCC(O)O UWJJYHHHVWZFEP-UHFFFAOYSA-N 0.000 description 1
- 239000003208 petroleum Substances 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 239000003495 polar organic solvent Substances 0.000 description 1
- 229920001084 poly(chloroprene) Polymers 0.000 description 1
- 229920002493 poly(chlorotrifluoroethylene) Polymers 0.000 description 1
- 229920003207 poly(ethylene-2,6-naphthalate) Polymers 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920002857 polybutadiene Polymers 0.000 description 1
- 229920001707 polybutylene terephthalate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000005023 polychlorotrifluoroethylene (PCTFE) polymer Substances 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 239000011112 polyethylene naphthalate Substances 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 229920001195 polyisoprene Polymers 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 1
- 239000004810 polytetrafluoroethylene Substances 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 229920002620 polyvinyl fluoride Polymers 0.000 description 1
- 229920002981 polyvinylidene fluoride Polymers 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- IZLFUDHPNDYYHS-UHFFFAOYSA-M potassium;2-bromoacetate Chemical compound [K+].[O-]C(=O)CBr IZLFUDHPNDYYHS-UHFFFAOYSA-M 0.000 description 1
- KPFSGNRRZMYZPH-UHFFFAOYSA-M potassium;2-chloroacetate Chemical compound [K+].[O-]C(=O)CCl KPFSGNRRZMYZPH-UHFFFAOYSA-M 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- HKJYVRJHDIPMQB-UHFFFAOYSA-N propan-1-olate;titanium(4+) Chemical compound CCCO[Ti](OCCC)(OCCC)OCCC HKJYVRJHDIPMQB-UHFFFAOYSA-N 0.000 description 1
- XPGAWFIWCWKDDL-UHFFFAOYSA-N propan-1-olate;zirconium(4+) Chemical compound [Zr+4].CCC[O-].CCC[O-].CCC[O-].CCC[O-] XPGAWFIWCWKDDL-UHFFFAOYSA-N 0.000 description 1
- 229960000380 propiolactone Drugs 0.000 description 1
- FVSKHRXBFJPNKK-UHFFFAOYSA-N propionitrile Chemical compound CCC#N FVSKHRXBFJPNKK-UHFFFAOYSA-N 0.000 description 1
- 239000013558 reference substance Substances 0.000 description 1
- 238000001226 reprecipitation Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- VSZWPYCFIRKVQL-UHFFFAOYSA-N selanylidenegallium;selenium Chemical compound [Se].[Se]=[Ga].[Se]=[Ga] VSZWPYCFIRKVQL-UHFFFAOYSA-N 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- FDRCDNZGSXJAFP-UHFFFAOYSA-M sodium chloroacetate Chemical compound [Na+].[O-]C(=O)CCl FDRCDNZGSXJAFP-UHFFFAOYSA-M 0.000 description 1
- SESSOVUNEZQNBV-UHFFFAOYSA-M sodium;2-bromoacetate Chemical compound [Na+].[O-]C(=O)CBr SESSOVUNEZQNBV-UHFFFAOYSA-M 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 229920003048 styrene butadiene rubber Polymers 0.000 description 1
- 125000005504 styryl group Chemical group 0.000 description 1
- 150000008053 sultones Chemical group 0.000 description 1
- 239000006228 supernatant Substances 0.000 description 1
- UQMOLLPKNHFRAC-UHFFFAOYSA-N tetrabutyl silicate Chemical compound CCCCO[Si](OCCCC)(OCCCC)OCCCC UQMOLLPKNHFRAC-UHFFFAOYSA-N 0.000 description 1
- BFKJFAAPBSQJPD-UHFFFAOYSA-N tetrafluoroethene Chemical group FC(F)=C(F)F BFKJFAAPBSQJPD-UHFFFAOYSA-N 0.000 description 1
- CZDYPVPMEAXLPK-UHFFFAOYSA-N tetramethylsilane Chemical compound C[Si](C)(C)C CZDYPVPMEAXLPK-UHFFFAOYSA-N 0.000 description 1
- ZQZCOBSUOFHDEE-UHFFFAOYSA-N tetrapropyl silicate Chemical compound CCCO[Si](OCCC)(OCCC)OCCC ZQZCOBSUOFHDEE-UHFFFAOYSA-N 0.000 description 1
- JMXKSZRRTHPKDL-UHFFFAOYSA-N titanium ethoxide Chemical compound [Ti+4].CC[O-].CC[O-].CC[O-].CC[O-] JMXKSZRRTHPKDL-UHFFFAOYSA-N 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- YZVRVDPMGYFCGL-UHFFFAOYSA-N triacetyloxysilyl acetate Chemical compound CC(=O)O[Si](OC(C)=O)(OC(C)=O)OC(C)=O YZVRVDPMGYFCGL-UHFFFAOYSA-N 0.000 description 1
- GYZQBXUDWTVJDF-UHFFFAOYSA-N tributoxy(methyl)silane Chemical compound CCCCO[Si](C)(OCCCC)OCCCC GYZQBXUDWTVJDF-UHFFFAOYSA-N 0.000 description 1
- OAVPBWLGJVKEGZ-UHFFFAOYSA-N tributoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OCCCC)(OCCCC)OCCCC)CCC2OC21 OAVPBWLGJVKEGZ-UHFFFAOYSA-N 0.000 description 1
- FQYWWLSIKWDAEC-UHFFFAOYSA-N tributoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCCCO[Si](OCCCC)(OCCCC)CCCOCC1CO1 FQYWWLSIKWDAEC-UHFFFAOYSA-N 0.000 description 1
- MYWQGROTKMBNKN-UHFFFAOYSA-N tributoxyalumane Chemical compound [Al+3].CCCC[O-].CCCC[O-].CCCC[O-] MYWQGROTKMBNKN-UHFFFAOYSA-N 0.000 description 1
- UCSBCWBHZLSFGC-UHFFFAOYSA-N tributoxysilane Chemical compound CCCCO[SiH](OCCCC)OCCCC UCSBCWBHZLSFGC-UHFFFAOYSA-N 0.000 description 1
- MMZPUXVBQAQQDQ-UHFFFAOYSA-N triethoxy(2-pyridin-4-ylethyl)silane Chemical compound CCO[Si](OCC)(OCC)CCC1=CC=NC=C1 MMZPUXVBQAQQDQ-UHFFFAOYSA-N 0.000 description 1
- FRGPKMWIYVTFIQ-UHFFFAOYSA-N triethoxy(3-isocyanatopropyl)silane Chemical compound CCO[Si](OCC)(OCC)CCCN=C=O FRGPKMWIYVTFIQ-UHFFFAOYSA-N 0.000 description 1
- VQFQVYFUZUTIMU-UHFFFAOYSA-N triethoxy(7-oxabicyclo[4.1.0]heptan-4-ylmethyl)silane Chemical compound C1C(C[Si](OCC)(OCC)OCC)CCC2OC21 VQFQVYFUZUTIMU-UHFFFAOYSA-N 0.000 description 1
- DENFJSAFJTVPJR-UHFFFAOYSA-N triethoxy(ethyl)silane Chemical compound CCO[Si](CC)(OCC)OCC DENFJSAFJTVPJR-UHFFFAOYSA-N 0.000 description 1
- UNKMHLWJZHLPPM-UHFFFAOYSA-N triethoxy(oxiran-2-ylmethoxymethyl)silane Chemical compound CCO[Si](OCC)(OCC)COCC1CO1 UNKMHLWJZHLPPM-UHFFFAOYSA-N 0.000 description 1
- OHKFEBYBHZXHMM-UHFFFAOYSA-N triethoxy-[1-(oxiran-2-ylmethoxy)butyl]silane Chemical compound CCO[Si](OCC)(OCC)C(CCC)OCC1CO1 OHKFEBYBHZXHMM-UHFFFAOYSA-N 0.000 description 1
- SJQPASOTJGFOMU-UHFFFAOYSA-N triethoxy-[1-(oxiran-2-ylmethoxy)ethyl]silane Chemical compound CCO[Si](OCC)(OCC)C(C)OCC1CO1 SJQPASOTJGFOMU-UHFFFAOYSA-N 0.000 description 1
- NFRRMEMOPXUROM-UHFFFAOYSA-N triethoxy-[1-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](OCC)(OCC)C(CC)OCC1CO1 NFRRMEMOPXUROM-UHFFFAOYSA-N 0.000 description 1
- UDUKMRHNZZLJRB-UHFFFAOYSA-N triethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OCC)(OCC)OCC)CCC2OC21 UDUKMRHNZZLJRB-UHFFFAOYSA-N 0.000 description 1
- FVMMYGUCXRZVPJ-UHFFFAOYSA-N triethoxy-[2-(oxiran-2-ylmethoxy)butyl]silane Chemical compound CCO[Si](OCC)(OCC)CC(CC)OCC1CO1 FVMMYGUCXRZVPJ-UHFFFAOYSA-N 0.000 description 1
- RWJUTPORTOUFDY-UHFFFAOYSA-N triethoxy-[2-(oxiran-2-ylmethoxy)ethyl]silane Chemical compound CCO[Si](OCC)(OCC)CCOCC1CO1 RWJUTPORTOUFDY-UHFFFAOYSA-N 0.000 description 1
- CFUDQABJYSJIQY-UHFFFAOYSA-N triethoxy-[2-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CC(C)OCC1CO1 CFUDQABJYSJIQY-UHFFFAOYSA-N 0.000 description 1
- NLKPPXKQMJDBFO-UHFFFAOYSA-N triethoxy-[3-(7-oxabicyclo[4.1.0]heptan-4-yl)propyl]silane Chemical compound C1C(CCC[Si](OCC)(OCC)OCC)CCC2OC21 NLKPPXKQMJDBFO-UHFFFAOYSA-N 0.000 description 1
- KPNCYSTUWLXFOE-UHFFFAOYSA-N triethoxy-[3-(oxiran-2-ylmethoxy)butyl]silane Chemical compound CCO[Si](OCC)(OCC)CCC(C)OCC1CO1 KPNCYSTUWLXFOE-UHFFFAOYSA-N 0.000 description 1
- JXUKBNICSRJFAP-UHFFFAOYSA-N triethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCOCC1CO1 JXUKBNICSRJFAP-UHFFFAOYSA-N 0.000 description 1
- PSUKBUSXHYKMLU-UHFFFAOYSA-N triethoxy-[4-(7-oxabicyclo[4.1.0]heptan-4-yl)butyl]silane Chemical compound C1C(CCCC[Si](OCC)(OCC)OCC)CCC2OC21 PSUKBUSXHYKMLU-UHFFFAOYSA-N 0.000 description 1
- GSUGNQKJVLXBHC-UHFFFAOYSA-N triethoxy-[4-(oxiran-2-ylmethoxy)butyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCCOCC1CO1 GSUGNQKJVLXBHC-UHFFFAOYSA-N 0.000 description 1
- QQQSFSZALRVCSZ-UHFFFAOYSA-N triethoxysilane Chemical compound CCO[SiH](OCC)OCC QQQSFSZALRVCSZ-UHFFFAOYSA-N 0.000 description 1
- HGCVEHIYVPDFMS-UHFFFAOYSA-N trimethoxy(7-oxabicyclo[4.1.0]heptan-4-ylmethyl)silane Chemical compound C1C(C[Si](OC)(OC)OC)CCC2OC21 HGCVEHIYVPDFMS-UHFFFAOYSA-N 0.000 description 1
- LFBULLRGNLZJAF-UHFFFAOYSA-N trimethoxy(oxiran-2-ylmethoxymethyl)silane Chemical compound CO[Si](OC)(OC)COCC1CO1 LFBULLRGNLZJAF-UHFFFAOYSA-N 0.000 description 1
- HQYALQRYBUJWDH-UHFFFAOYSA-N trimethoxy(propyl)silane Chemical compound CCC[Si](OC)(OC)OC HQYALQRYBUJWDH-UHFFFAOYSA-N 0.000 description 1
- FFJVMNHOSKMOSA-UHFFFAOYSA-N trimethoxy-[1-(oxiran-2-ylmethoxy)butyl]silane Chemical compound CCCC([Si](OC)(OC)OC)OCC1CO1 FFJVMNHOSKMOSA-UHFFFAOYSA-N 0.000 description 1
- DAVVOFDYOGMLNQ-UHFFFAOYSA-N trimethoxy-[1-(oxiran-2-ylmethoxy)ethyl]silane Chemical compound CO[Si](OC)(OC)C(C)OCC1CO1 DAVVOFDYOGMLNQ-UHFFFAOYSA-N 0.000 description 1
- FNBIAJGPJUOAPB-UHFFFAOYSA-N trimethoxy-[1-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)C(CC)OCC1CO1 FNBIAJGPJUOAPB-UHFFFAOYSA-N 0.000 description 1
- DQZNLOXENNXVAD-UHFFFAOYSA-N trimethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OC)(OC)OC)CCC2OC21 DQZNLOXENNXVAD-UHFFFAOYSA-N 0.000 description 1
- ZNXDCSVNCSSUNB-UHFFFAOYSA-N trimethoxy-[2-(oxiran-2-ylmethoxy)ethyl]silane Chemical compound CO[Si](OC)(OC)CCOCC1CO1 ZNXDCSVNCSSUNB-UHFFFAOYSA-N 0.000 description 1
- HTVULPNMIHOVRU-UHFFFAOYSA-N trimethoxy-[2-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CC(C)OCC1CO1 HTVULPNMIHOVRU-UHFFFAOYSA-N 0.000 description 1
- ZQPNGHDNBNMPON-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)butyl]silane Chemical compound CO[Si](OC)(OC)CCC(C)OCC1CO1 ZQPNGHDNBNMPON-UHFFFAOYSA-N 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- ZOWVSEMGATXETK-UHFFFAOYSA-N trimethoxy-[4-(7-oxabicyclo[4.1.0]heptan-4-yl)butyl]silane Chemical compound C1C(CCCC[Si](OC)(OC)OC)CCC2OC21 ZOWVSEMGATXETK-UHFFFAOYSA-N 0.000 description 1
- GUKYSRVOOIKHHB-UHFFFAOYSA-N trimethoxy-[4-(oxiran-2-ylmethoxy)butyl]silane Chemical compound CO[Si](OC)(OC)CCCCOCC1CO1 GUKYSRVOOIKHHB-UHFFFAOYSA-N 0.000 description 1
- YUYCVXFAYWRXLS-UHFFFAOYSA-N trimethoxysilane Chemical compound CO[SiH](OC)OC YUYCVXFAYWRXLS-UHFFFAOYSA-N 0.000 description 1
- OZWKZRFXJPGDFM-UHFFFAOYSA-N tripropoxysilane Chemical compound CCCO[SiH](OCCC)OCCC OZWKZRFXJPGDFM-UHFFFAOYSA-N 0.000 description 1
- 238000004506 ultrasonic cleaning Methods 0.000 description 1
- 229920006305 unsaturated polyester Polymers 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 239000011345 viscous material Substances 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/04—Polysiloxanes
- C09D183/08—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen, and oxygen
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/20—Diluents or solvents
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Paints Or Removers (AREA)
Description
本発明は、表面を親水化及び防曇効果を有する親水性コート膜形成用組成物、及びそれを用いた親水性コート膜に関する。 TECHNICAL FIELD The present invention relates to a composition for forming a hydrophilic coating film having a hydrophilizing surface and an antifogging effect, and a hydrophilic coating film using the composition.
基材に求められる表面特性には、防曇性、帯電防止性、防汚性及び生体適合性等が知られている。これらの表面特性は、一般的に、基材の表面上に、親水性被膜をコート(被覆)するなどにより親水性を付与することにより達成されている。
基板に親水性を付与できるポリマーとしては、たとえば、ホスホリル基含有メタクリル酸エステルのポリマー(特許文献1参照)や、水との相互作用が非常に強いベタイン基を有する化合物に無機基材と共有結合を形成出来る官能基を導入した化合物(特許文献2参照)などが知られている。Antifog properties, antistatic properties, antifouling properties, biocompatibility, and the like are known as surface properties required for substrates. These surface properties are generally achieved by imparting hydrophilicity to the surface of the base material, such as by coating the surface with a hydrophilic film.
Examples of polymers that can impart hydrophilicity to substrates include polymers of phosphoryl group-containing methacrylic acid esters (see Patent Document 1), and compounds having a betaine group that has a very strong interaction with water, which are covalently bonded to inorganic substrates. is known (see Patent Document 2).
しかし、これらの材料には、高温高湿条件下での保管によって、上記親水性、防曇性などの表面特性が徐々にあるいは急激に劣化していくという問題があった。 However, these materials have a problem that their surface properties such as hydrophilicity and anti-fog properties deteriorate gradually or rapidly when stored under high-temperature and high-humidity conditions.
本発明は、こうした点に鑑みてなされたものであり、本発明の目的は、高温高湿条件下での保管によっても、親水性、防曇性などの表面特性が劣化しない親水性コート膜形成用組成物及びそれを得られる親水性コート膜を提供することにある。 The present invention has been made in view of these points, and an object of the present invention is to form a hydrophilic coating film that does not deteriorate in surface properties such as hydrophilicity and antifogging even when stored under high temperature and high humidity conditions. The object of the present invention is to provide a composition for use in a medical device and a hydrophilic coating film obtained therefrom.
かくして本発明は、次の要旨を有する。
[1] 含窒素複素環構造中の窒素原子に正(+)電荷を有するベタイン基を有するシロキサンモノマーと、水又は有機溶剤と、を含有する親水性コート膜形成用組成物。
[2] 上記に記載の親水性コート膜形成用組成物を、基板上にコートして塗膜を形成し、該塗膜を乾燥し、焼成して被膜を得る親水性コートの成膜方法。
[3] 上記に記載の親水性コート膜形成用組成物から得られる親水性コート膜。Thus, the present invention has the following gists.
[1] A composition for forming a hydrophilic coating film, containing a siloxane monomer having a betaine group having a positive (+) charge on the nitrogen atom in the nitrogen-containing heterocyclic structure, and water or an organic solvent.
[2] A method for forming a hydrophilic coating, comprising coating a substrate with the composition for forming a hydrophilic coating film described above to form a coating film, drying and baking the coating film to obtain a coating film.
[3] A hydrophilic coating film obtained from the composition for forming a hydrophilic coating film described above.
本発明によれば、高温高湿条件下での保管によっても、親水性、防曇性が劣化しない親水性コート膜形成用組成物及びそれを得られる親水性コート膜を提供できる。
本発明の親水性コート膜形成用組成物から得られる親水性コート膜は、眼鏡、カメラなどのレンズ、建屋、車などの窓等の水滴付着防止膜、防曇膜等の用に供することができる。According to the present invention, it is possible to provide a composition for forming a hydrophilic coating film whose hydrophilicity and antifogging properties do not deteriorate even when stored under high-temperature and high-humidity conditions, and a hydrophilic coating film obtained therefrom.
The hydrophilic coating film obtained from the composition for forming a hydrophilic coating film of the present invention can be used as a water droplet adhesion prevention film for glasses, lenses of cameras and the like, windows of buildings, cars, etc., anti-fogging films, and the like. can.
本発明の親水性コート膜形成用組成物は、含窒素複素環構造中の窒素原子に正(+)の電荷を有するベタイン基を有するシロキサンモノマー(以下、特定シロキサンモノマーとも称する。)と、水又は有機溶剤を含有することを特徴とする。 The hydrophilic coating film-forming composition of the present invention comprises a siloxane monomer having a betaine group having a positive (+) charge on the nitrogen atom in the nitrogen-containing heterocyclic structure (hereinafter also referred to as a specific siloxane monomer), water Alternatively, it is characterized by containing an organic solvent.
<特定シロキサンモノマー>
本発明の親水性コート膜形成用組成物は、含窒素複素環構造中の窒素原子に+の電荷を有するベタイン基を有するシロキサンモノマーを有する。
ベタインとは、正電荷と負電荷を同一分子内の隣り合わない位置に持ち、正電荷を持つ原子には解離し得る水素原子が結合しておらず、分子全体としては電荷を持たない化合物である。<Specific siloxane monomer>
The composition for forming a hydrophilic coating film of the present invention has a siloxane monomer having a positively charged betaine group on the nitrogen atom in the nitrogen-containing heterocyclic ring structure.
Betaine is a compound that has a positive charge and a negative charge at positions that are not adjacent to each other in the same molecule, and does not have a dissociable hydrogen atom attached to the positively charged atom, so the molecule as a whole has no charge. be.
特定シロキサンモノマーに含有されるベタイン基の正電荷は、含窒素複素環上の窒素原子に存在する。含窒素複素環の例としては、ピリジン、ピペリジン、イミダゾール、オキサゾール、チアゾール、ピラゾール、イミダゾリン、ピラジン、ベンゾイミダゾール、キノリン、イソキノリン、プリン、キノキサリン等が例示され、その中でも、ピリジン又はイミダゾリンが好ましい。 The positive charge of the betaine group contained in the specific siloxane monomer resides on the nitrogen atom on the nitrogen-containing heterocycle. Examples of nitrogen-containing heterocycles include pyridine, piperidine, imidazole, oxazole, thiazole, pyrazole, imidazoline, pyrazine, benzimidazole, quinoline, isoquinoline, purine, quinoxaline, etc. Among them, pyridine and imidazoline are preferred.
特定シロキサンモノマーは、以下の一般式で表される。
上記式[1]中、R1は、炭素数1~5、好ましくは1~3のアルキル基を表す。
R2は、炭素数1~5、好ましくは1~4のアルキル基、炭素数2~5、好ましくは2~4のアルケニル基、又は炭素数2~5、好ましくは2~4のアルキニル基を表す。R2の有する任意の水素原子は、炭素数1~5のアルキル基、フッ素原子などのハロゲン原子、芳香族環、又は脂肪族環で置換されていてもよい。pは、1~3の整数を表す。qは、pが1のとき0~2の整数を表し、pが2のとき0~1の整数を表し、pが3のとき0を表す。In formula [1] above, R 1 represents an alkyl group having 1 to 5 carbon atoms, preferably 1 to 3 carbon atoms.
R 2 is an alkyl group having 1 to 5 carbon atoms, preferably 1 to 4 carbon atoms, an alkenyl group having 2 to 5 carbon atoms, preferably 2 to 4 carbon atoms, or an alkynyl group having 2 to 5 carbon atoms, preferably 2 to 4 carbon atoms. show. Any hydrogen atom of R 2 may be substituted with an alkyl group having 1 to 5 carbon atoms, a halogen atom such as a fluorine atom, an aromatic ring, or an aliphatic ring. p represents an integer of 1 to 3; q represents an integer of 0 to 2 when p is 1, an integer of 0 to 1 when p is 2, and 0 when p is 3;
Lは炭素数1~20、好ましくは1~10のヘテロ原子を有してもよい直鎖状又は分岐状のアルキレン基を表す。該アルキレン基の任意の水素原子は、炭素数1~5好ましくは1~4のアルキル基又はフッ素原子などのハロゲン原子、芳香族環、又は脂肪族環で置換されていてもよい。その中でも、炭素数2~7、好ましくは2~6の直鎖又は分岐状のアルキレン基が好ましい。ここで、ヘテロ原子とは、酸素、窒素、硫黄、又はリンを意味し、酸素、窒素、又は硫黄が好ましい。 L represents a linear or branched alkylene group having 1 to 20 carbon atoms, preferably 1 to 10 carbon atoms, which may have a heteroatom. Any hydrogen atom of the alkylene group may be substituted with an alkyl group having 1 to 5, preferably 1 to 4 carbon atoms, a halogen atom such as a fluorine atom, an aromatic ring, or an aliphatic ring. Among them, a linear or branched alkylene group having 2 to 7 carbon atoms, preferably 2 to 6 carbon atoms is preferable. Here, heteroatom means oxygen, nitrogen, sulfur or phosphorus, with oxygen, nitrogen or sulfur being preferred.
Xは、単結合、-O-、-COO-、-OCO-、-CONR3-、-NR4-CO-、又は-NR5=NR6-を表す。R3、R4、R5、R6は、それぞれ独立に、水素原子又は炭素数1~4、好ましくは1~3のアルキル基を表す。
Yは、含窒素複素環を含む2価の有機基を表す。例としては、ピリジン、ピペリジン、イミダゾール、オキサゾール、チアゾール、ピラゾール、イミダゾリン、ピラジン、ベンゾイミダゾール、キノリン、イソキノリン、プリン、キノキサリン等が例示され、その中でも、ピリジン、又はイミダゾリンが好ましい。X represents a single bond, -O-, -COO-, -OCO-, -CONR 3 -, -NR 4 -CO-, or -NR 5 =NR 6 -. R 3 , R 4 , R 5 and R 6 each independently represent a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, preferably 1 to 3 carbon atoms.
Y represents a divalent organic group containing a nitrogen-containing heterocycle. Examples include pyridine, piperidine, imidazole, oxazole, thiazole, pyrazole, imidazoline, pyrazine, benzimidazole, quinoline, isoquinoline, purine, quinoxaline, etc. Among them, pyridine or imidazoline is preferred.
Mは、炭素数1~10、好ましくは1~8の直鎖状又は分岐状のアルキレン基を表し、アルキレン基の任意の水素原子は、炭素数1~5、好ましくは1~4のアルキル基又はフッ素原子などのハロゲン原子で置換されていてもよい。その中でも、炭素数2~7、好ましくは2~6の直鎖又は分岐状のアルキレン基が好ましい。Mは、Yの有する窒素原子と結合し、M及びLのいずれか一方は、Yの有する窒素原子との結合によりN+部分を形成している。
ZはCOO-、SO3
-、又はPO4
-を表す。得られるコート膜の耐久性の観点から、SO3
-が好ましい。M represents a linear or branched alkylene group having 1 to 10 carbon atoms, preferably 1 to 8, and any hydrogen atom of the alkylene group is an alkyl group having 1 to 5 carbon atoms, preferably 1 to 4 Alternatively, it may be substituted with a halogen atom such as a fluorine atom. Among them, a linear or branched alkylene group having 2 to 7 carbon atoms, preferably 2 to 6 carbon atoms is preferable. M is bonded to the nitrogen atom of Y, and one of M and L is bonded to the nitrogen atom of Y to form an N + portion.
Z represents COO − , SO 3 − , or PO 4 − . From the viewpoint of the durability of the resulting coating film, SO 3 - is preferred.
特定シロキサンモノマーの具体例を以下に例示するが、これらに限定されない。
式中、Meはメチル基を表し、Etはエチル基を表す。N+部分に関して、互変異性体も含む。
なかでも、特定シロキサンモノマーとしては、モノマーの安定性、原料入手性の観点から、次のものが好ましい。
Among them, the following are preferable as the specific siloxane monomer from the viewpoint of monomer stability and raw material availability.
<特定シロキサンモノマーの製造方法>
本発明に用いる、特定シロキサンモノマーは、例えば、スルホン酸末端の場合、含窒素複素環構造含有ケイ素化合物に、1,3-プロパンスルトンや1,4-ブタンスルトン、2,4-ブタンスルトンなどのスルトン環化合物を反応させることにより製造できる。<Method for producing specific siloxane monomer>
The specific siloxane monomer used in the present invention is, for example, a sultone ring such as 1,3-propanesultone, 1,4-butanesultone and 2,4-butanesultone in a nitrogen-containing heterocyclic structure-containing silicon compound in the case of sulfonic acid termination. It can be produced by reacting compounds.
カルボン酸末端の場合、含窒素複素環構造含有ケイ素化合物に、β-プロピオラクトンなどのラクトン環化合物と反応させることにより得ることが出来る。また、含窒素複素環構造含有ケイ素化合物にアクリル酸を付加させる方法により、カルボン酸末端化合物を得ることもできる。モノクロロ酢酸カリウム、モノクロロ酢酸ナトリウム、モノブロモ酢酸カリウム、モノブロモ酢酸ナトリウなどのハロ酢酸アルカリ金属塩と含窒素複素環構造含有ケイ素化合物を、非水系溶媒中で反応を行うことでもカルボン酸末端化合物を得ることが出来る。 A carboxylic acid-terminated compound can be obtained by reacting a silicon compound containing a nitrogen-containing heterocyclic structure with a lactone ring compound such as β-propiolactone. A carboxylic acid-terminated compound can also be obtained by a method of adding acrylic acid to a nitrogen-containing heterocyclic structure-containing silicon compound. A carboxylic acid-terminated compound can also be obtained by reacting an alkali metal haloacetate such as potassium monochloroacetate, sodium monochloroacetate, potassium monobromoacetate, or sodium monobromoacetate with a nitrogen-containing heterocyclic structure-containing silicon compound in a non-aqueous solvent. can be done.
反応溶媒としては、水、アルコール類(メタノール, エタノール, 2-プロパノールなど)、非プロトン性極性有機溶媒(ジメチルホルムアミド、ジメチルスルホキシド、ジメチルアセトアミド、N-メチルピロリドンなど)、エーテル類(ジエチルエーテル、ジイソプロピルエーテル、 tert-ブチルメチルエーテル、 シクロペンチルメチルエーテル、テトラヒドロフラン、ジオキサンなど)、脂肪族炭化水素類(ペンタン、へキサン、ヘプタン、石油エーテルなど)、芳香族炭化水素類(ベンゼン、トルエン、キシレン、メシチレン、クロロベンゼン、ジクロロベンゼン、ニトロベンゼン、テトラリンなど)、ハロゲン系炭化水素類(クロロホルム、ジクロロメタン、四塩化炭素、ジクロロエタンなど)、低級脂肪酸エステル類(酢酸メチル、酢酸エチル、酢酸ブチル、プロピオン酸メチルなど)、ニトリル類(アセトニトリル、プロピオニトリル、ブチロニトリルなど)などが使用できる。これらの溶媒は、反応の起こり易さなどを考慮して適宜選択することができ、1種単独で又は2種以上混合して用いることができる。また場合によっては、上記溶媒は、適当な脱水剤や乾燥剤を用いて水を含有しない溶媒として用いることもできる。
好ましい溶媒としては、アセトニトリル又はテトラヒドロフランが挙げられる。Examples of reaction solvents include water, alcohols (methanol, ethanol, 2-propanol, etc.), aprotic polar organic solvents (dimethylformamide, dimethylsulfoxide, dimethylacetamide, N-methylpyrrolidone, etc.), ethers (diethyl ether, diisopropyl ether, tert-butyl methyl ether, cyclopentyl methyl ether, tetrahydrofuran, dioxane, etc.), aliphatic hydrocarbons (pentane, hexane, heptane, petroleum ether, etc.), aromatic hydrocarbons (benzene, toluene, xylene, mesitylene, chlorobenzene, dichlorobenzene, nitrobenzene, tetralin, etc.), halogenated hydrocarbons (chloroform, dichloromethane, carbon tetrachloride, dichloroethane, etc.), lower fatty acid esters (methyl acetate, ethyl acetate, butyl acetate, methyl propionate, etc.), nitriles (acetonitrile, propionitrile, butyronitrile, etc.) and the like can be used. These solvents can be appropriately selected in consideration of the easiness of reaction and the like, and can be used singly or in combination of two or more. In some cases, the above solvent can also be used as a solvent that does not contain water by using a suitable dehydrating agent or drying agent.
Preferred solvents include acetonitrile or tetrahydrofuran.
反応時間は、30分~180時間であり、好ましくは2~120時間であり、特に好ましくは5~100時間である。
原料である含窒素複素環構造含有ケイ素化合物は、市販のものを用いるか、公知の方法によって簡便に得ることが出来る。反応温度は、0℃~各溶媒の沸点が好ましく、より好ましくは0℃~120℃、特に好ましくは5℃~100℃である。The reaction time is 30 minutes to 180 hours, preferably 2 to 120 hours, particularly preferably 5 to 100 hours.
The silicon compound containing a nitrogen-containing heterocyclic structure, which is a raw material, is commercially available or can be easily obtained by a known method. The reaction temperature is preferably 0°C to the boiling point of each solvent, more preferably 0°C to 120°C, particularly preferably 5°C to 100°C.
反応生成物である特定シロキサンモノマーが反応有機溶媒中に析出する場合、濾過、乾燥する方法等により高純度化することができる。終始均一系で反応が進行する場合、得られる反応生成物をそのまま用いてもよいが、目的物である特定シロキサンモノマーが固体の場合、反応溶媒を濃縮後に貧溶媒を加えることでの晶析又は再沈殿等の公知の方法により単離、精製することができる。 When the specific siloxane monomer, which is the reaction product, precipitates in the reaction organic solvent, it can be highly purified by a method such as filtration and drying. When the reaction proceeds in a homogeneous system from beginning to end, the resulting reaction product may be used as it is. However, when the target specific siloxane monomer is solid, the reaction solvent is concentrated and then a poor solvent is added for crystallization or It can be isolated and purified by known methods such as reprecipitation.
<その他の成分>
本発明の親水性コート膜形成用組成物は、特定シロキサンモノマー、水又は有機溶剤の他、金属アルコキシド、金属アルコキシドリゴマー、金属アルコキシドポリマー、無機微粒子、レベリング剤及び界面活性剤からなる群から選ばれる少なくとも1種以上を含有させてもよい。<Other ingredients>
The hydrophilic coating film-forming composition of the present invention is selected from the group consisting of specific siloxane monomers, water or organic solvents, metal alkoxides, metal alkoxyligomers, metal alkoxide polymers, inorganic fine particles, leveling agents and surfactants. At least one or more may be contained.
前記金属アルコキシドは、形成したコート膜の機械的安定性を高めるために含有させるものであり、金属アルコキシドの金属としては、ケイ素、チタン、アルミニウム、タンタル、アンチモン、ビスマス、錫、インジウム、亜鉛等が挙げられる。これらのうち、入手性の観点から好ましいのはケイ素、チタン、又はジルコニウムである。 The metal alkoxide is contained in order to enhance the mechanical stability of the formed coat film, and examples of the metal of the metal alkoxide include silicon, titanium, aluminum, tantalum, antimony, bismuth, tin, indium, and zinc. mentioned. Among these, silicon, titanium, or zirconium is preferable from the viewpoint of availability.
前記金属アルコキシドとしては、下記式(II)若しくは(III)で表されるものが挙げられる。
M1(OR2)n (II)
式(II)中、R2は、炭素数1~5、好ましくは1~3のアルキル基又はアセチル基を表す。nは、2~5の整数を表す。M1は、珪素(Si)、チタン(Ti)、ジルコニウム(Zr)、又はアルミニウム(Al)が好ましく、特には、珪素(Si)又はチタン(Ti)が好ましい。また、nは3又は4が好ましい。Examples of the metal alkoxide include those represented by the following formula (II) or (III).
M 1 (OR 2 )n (II)
In formula (II), R 2 represents an alkyl group having 1 to 5 carbon atoms, preferably 1 to 3 carbon atoms, or an acetyl group. n represents an integer of 2-5. M1 is preferably silicon (Si), titanium (Ti), zirconium (Zr), or aluminum (Al), and particularly preferably silicon (Si) or titanium (Ti). Also, n is preferably 3 or 4.
R3
xM1(OR2)4-x (III)
式(III)中、M1、R2は上記式(I)に定義した通りである。R3は、水素原子、又は、ハロゲン原子、ビニル基、スチリル基、フェニル基、ナフチル基、及びアクリル基、メタクリル基若しくはアリール基で置換されていてもよく、かつヘテロ原子を含んでいてもよい炭素数1~30のアルキル基からなる群から選ばれる基である。xは1~3の整数である。ここで、ヘテロ原子は、酸素、窒素、硫黄又はリンであり、好ましくは酸素、窒素又は硫黄である。 R3xM1 (OR2) 4 -x ( III )
In formula (III), M 1 and R 2 are as defined in formula (I) above. R 3 is optionally substituted with a hydrogen atom, a halogen atom, a vinyl group, a styryl group, a phenyl group, a naphthyl group, an acrylic group, a methacrylic group or an aryl group, and may contain a heteroatom. It is a group selected from the group consisting of alkyl groups having 1 to 30 carbon atoms. x is an integer of 1-3. The heteroatoms here are oxygen, nitrogen, sulfur or phosphorus, preferably oxygen, nitrogen or sulfur.
上記式(II)で表される金属アルコキシドとしては、例えば、テトラメトキシシラン、テトラエトキシシラン、テトラプロポキシシラン、テトラブトキシシラン、テトラアセトキシシランなどのシリコンアルコキシド、チタニウムテトラエトキシド、チタニウムテトラプロポキシド、チタニウムテトラブトキシドなどのチタンアルコキシド、ジルコニウムテトラエトキシド、ジルコニウムテトラプロポキシド、ジルコニウムテトラブトキシドなどのジルコニウムテトラアルコキシド、アルミニウムトリブトキシド、アルミニウムトリイソプロポキシド、アルミニウムトリエトキシドなどのアルミニウムトリアルコキシド化合物、タンタリウムペンタプロポキシド、タンタリウムペンタブトキシドなどのタンタリウムペンタアルコキシドなどが挙げられる。これらは、単独で、又は、2種以上組み合わせて使用することができる。 Examples of the metal alkoxide represented by the formula (II) include silicon alkoxides such as tetramethoxysilane, tetraethoxysilane, tetrapropoxysilane, tetrabutoxysilane, and tetraacetoxysilane, titanium tetraethoxide, titanium tetrapropoxide, Titanium alkoxides such as titanium tetrabutoxide, zirconium tetraalkoxides such as zirconium tetraethoxide, zirconium tetrapropoxide, zirconium tetrabutoxide, aluminum trialkoxide compounds such as aluminum tributoxide, aluminum triisopropoxide, aluminum triethoxide, tantalum Examples include tantalum pentaalkoxides such as pentapropoxide and tantalum pentabutoxide. These can be used alone or in combination of two or more.
上記式(III)のM1が珪素であり、かつR3が水素原子である場合、例えば、トリメトキシシラン、トリエトキシシラン、トリプロポキシシラン、トリブトキシシラン等が挙げられる。これらは、単独で、又は2種以上組み合わせて使用することができる。When M1 in the above formula ( III ) is silicon and R3 is a hydrogen atom, examples include trimethoxysilane, triethoxysilane, tripropoxysilane, tributoxysilane and the like. These can be used alone or in combination of two or more.
上記式(III)のM1が珪素であり、かつR3が有機基である場合、例えば、メチルトリメトキシシラン、メチルトリプロポキシシラン、メチルトリアセトキシシラン、メチルトリブトキシシラン、メチルトリペントキシシラン、メチルトリアミロキシシラン、メチルトリフェノキシシラン、メチルトリベンジルオキシシラン、メチルトリフェネチルオキシシラン、グリシドキシメチルトリメトキシシラン、グリシドキシメチルトリエトキシシラン、αーグリシドキシエチルトリメトキシシラン、α-グリシドキシエチルトリエトキシシラン、β-グリシドキシエチルトリメトキシシラン、β-グリシドキシエチルトリエトキシシラン、α-グリシドキシプロピルトリメトキシシラン、α-グリシドキシプロピルトリエトキシシラン、β-グリシドキシプロピルトリメトキシシラン、β-グリシドキシプロピルトリエトキシシラン、γ-グリシドキシプロピルトリメトキシシラン、γ-グリシドキシプロピルトリエトキシシラン、γ-グリシドキシプロピルトリプロポキシシラン、γ-グリシドキシプロピルトリブトキシシラン、γ-グリシドキシプロピルトリフェノキシシラン、α-グリシドキシブチルトリメトキシシラン、α-グリシドキシブチルトリエトキシシラン、β-グリシドキシブチルトリエトキシシラン、γ-グリシドキシブチルトリメトキシシラン、γ-グリシドキシブチルトリエトキシシラン、δ-グリシドキシブチルトリメトキシシラン、δ-グリシドキシブチルトリエトキシシラン、(3,4-エポキシシクロヘキシル)メチルトリメトキシシラン、(3,4-エポキシシクロヘキシル)メチルトリエトキシシラン、β-(3,4-エポキシシクロヘキシル)エチルトリメトキシシラン、β-(3,4-エポキシシクロヘキシル)エチルトリエトキシシラン、β-(3,4-エポキシシクロヘキシル)エチルトリプロポキシシラン、β-(3,4-エポキシシクロヘキシル)エチルトリブトキシシラン、β-(3,4-エポキシシクロヘキシル)エチルトリフェノキシシラン、γ-(3,4-エポキシシクロヘキシル)プロピルトリメトキシシラン、γ-(3,4-エポキシシクロヘキシル)プロピルトリエトキシシラン、δ-(3,4-エポキシシクロヘキシル)ブチルトリメトキシシラン、δ-(3,4-エポキシシクロヘキシル)ブチルトリエトキシシラン、グリシドキシメチルメチルジメトキシシラン、グリシドキシメチルメチルジエトキシシラン、α-グリシドキシエチルメチルジメトキシシラン、α-グリシドキシエチルメチルジエトキシシラン、β-グリシドキシエチルメチルジメトキシシラン、β-グリシドキシエチルエチルジメトキシシラン、α-グリシドキシプロピルメチルジメトキシシラン、α-グリシドキシプロピルメチルジエトキシシラン、β-グリシドキシプロピルメチルジメトキシシラン、β-グリシドキシプロピルエチルジメトキシシラン、γ-グリシドキシプロピルメチルジメトキシシラン、γ-グリシドキシプロピルメチルジエトキシシラン、γ-グリシドキシプロピルメチルジプロポキシシラン、γ-グリシドキシプロピルメチルジブトキシシラン、γ-グリシドキシプロピルメチルジフェノキシシラン、γ-グリシドキシプロピルエチルジメトキシシラン、γ-グリシドキシプロピルエチルジエトキシシラン、γ-グリシドキシプロピルビニルジメトキシシラン、γ-グリシドキシプロピルビニルジエトキシシラン、エチルトリメトキシシラン、エチルトリエトキシシラン、γ-クロロプロピルトリメトキシシラン、γ-クロロプロピルトリエトキシシラン、γ-クロロプロピルトリアセトキシシラン、3,3,3-トリフロロプロピルトリメトキシシラン、γ-メルカプトプロピルトリメトキシシラン、γ-メルカプトプロピルトリエトキシシラン、β-シアノエチルトリエトキシシラン、クロロメチルトリメトキシシラン、クロロメチルトリエトキシシラン、N-(β-アミノエチル)γ-アミノプロピルトリメトキシシラン、N-(β-アミノエチル)γ-アミノプロピルメチルジメトキシシラン、γ-アミノプロピルメチルジメトキシシラン、N-(β-アミノエチル)γ-アミノプロピルトリエトキシシラン、N-(β-アミノエチル)γ-アミノプロピルメチルジエトキシシラン、ジメチルジメトキシシラン、フェニルメチルジメトキシシラン、ジメチルジエトキシシラン、フェニルメチルジエトキシシラン、γ-クロロプロピルメチルジメトキシシラン、γ-クロロプロピルメチルジエトキシシラン、ジメチルジアセトキシシラン、γ-メルカプトプロピルメチルジメトキシシラン、γ-メルカプトメチルジエトキシシラン、γ-ウレイドプロピルトリエトキシシラン、γ-ウレイドプロピルトリメトキシシラン、γ-ウレイドプロピルトリプロポキシシラン、(R)-N-1-フェニルエチル-N’-トリエトキシシリルプロピルウレア、(R)-N-1-フェニルエチル-N’-トリメトキシシリルプロピルウレア、3-イソシアネートプロピルトリエトキシシラン、トリフルオロプロピルトリメトキシシラン、ブロモプロピルトリエトキシシラン、ジエチルジエトキシシラン、ジエチルジメトキシシラン、トリメチルエトキシシラン、トリメチルメトキシシランなどを挙げることができる。これらは、単独で、又は2種以上組み合わせて使用することができる。When M 1 in formula (III) above is silicon and R 3 is an organic group, for example, methyltrimethoxysilane, methyltripropoxysilane, methyltriacetoxysilane, methyltributoxysilane, methyltripentoxysilane , methyltriamyloxysilane, methyltriphenoxysilane, methyltribenzyloxysilane, methyltriphenethyloxysilane, glycidoxymethyltrimethoxysilane, glycidoxymethyltriethoxysilane, α-glycidoxyethyltrimethoxysilane, α-glycidoxyethyltriethoxysilane, β-glycidoxyethyltrimethoxysilane, β-glycidoxyethyltriethoxysilane, α-glycidoxypropyltrimethoxysilane, α-glycidoxypropyltriethoxysilane, β-glycidoxypropyltrimethoxysilane, β-glycidoxypropyltriethoxysilane, γ-glycidoxypropyltrimethoxysilane, γ-glycidoxypropyltriethoxysilane, γ-glycidoxypropyltripropoxysilane, γ-glycidoxypropyltributoxysilane, γ-glycidoxypropyltriphenoxysilane, α-glycidoxybutyltrimethoxysilane, α-glycidoxybutyltriethoxysilane, β-glycidoxybutyltriethoxysilane, γ-glycidoxybutyltrimethoxysilane, γ-glycidoxybutyltriethoxysilane, δ-glycidoxybutyltrimethoxysilane, δ-glycidoxybutyltriethoxysilane, (3,4-epoxycyclohexyl)methyltri Methoxysilane, (3,4-epoxycyclohexyl)methyltriethoxysilane, β-(3,4-epoxycyclohexyl)ethyltrimethoxysilane, β-(3,4-epoxycyclohexyl)ethyltriethoxysilane, β-(3 ,4-epoxycyclohexyl)ethyltripropoxysilane, β-(3,4-epoxycyclohexyl)ethyltributoxysilane, β-(3,4-epoxycyclohexyl)ethyltriphenoxysilane, γ-(3,4-epoxycyclohexyl) ) propyltrimethoxysilane, γ-(3,4-epoxycyclohexyl)propyltriethoxysilane, δ-(3,4-epoxycyclohexyl)butyltrimethoxysilane, δ-(3,4-epoxycyclohexyl)butyltriethoxysilane , glycidoxymethyl methyl Dimethoxysilane, glycidoxymethylmethyldiethoxysilane, α-glycidoxyethylmethyldimethoxysilane, α-glycidoxyethylmethyldiethoxysilane, β-glycidoxyethylmethyldimethoxysilane, β-glycidoxyethylethyl Dimethoxysilane, α-glycidoxypropylmethyldimethoxysilane, α-glycidoxypropylmethyldiethoxysilane, β-glycidoxypropylmethyldimethoxysilane, β-glycidoxypropylethyldimethoxysilane, γ-glycidoxypropyl methyldimethoxysilane, γ-glycidoxypropylmethyldiethoxysilane, γ-glycidoxypropylmethyldipropoxysilane, γ-glycidoxypropylmethyldibutoxysilane, γ-glycidoxypropylmethyldiphenoxysilane, γ- glycidoxypropylethyldimethoxysilane, γ-glycidoxypropylethyldiethoxysilane, γ-glycidoxypropylvinyldimethoxysilane, γ-glycidoxypropylvinyldiethoxysilane, ethyltrimethoxysilane, ethyltriethoxysilane, γ-Chloropropyltrimethoxysilane, γ-Chloropropyltriethoxysilane, γ-Chloropropyltriacetoxysilane, 3,3,3-Trifluoropropyltrimethoxysilane, γ-Mercaptopropyltrimethoxysilane, γ-Mercaptopropyltri ethoxysilane, β-cyanoethyltriethoxysilane, chloromethyltrimethoxysilane, chloromethyltriethoxysilane, N-(β-aminoethyl)γ-aminopropyltrimethoxysilane, N-(β-aminoethyl)γ-aminopropyl methyldimethoxysilane, γ-aminopropylmethyldimethoxysilane, N-(β-aminoethyl)γ-aminopropyltriethoxysilane, N-(β-aminoethyl)γ-aminopropylmethyldiethoxysilane, dimethyldimethoxysilane, phenyl methyldimethoxysilane, dimethyldiethoxysilane, phenylmethyldiethoxysilane, γ-chloropropylmethyldimethoxysilane, γ-chloropropylmethyldiethoxysilane, dimethyldiacetoxysilane, γ-mercaptopropylmethyldimethoxysilane, γ-mercaptomethyldimethoxysilane Ethoxysilane, γ-ureidopropyltriethoxysilane, γ-ureidopropyltrimethoxysilane, γ-ureidopropyltripropoxysilane oran, (R)-N-1-phenylethyl-N'-triethoxysilylpropylurea, (R)-N-1-phenylethyl-N'-trimethoxysilylpropylurea, 3-isocyanatopropyltriethoxysilane, Trifluoropropyltrimethoxysilane, bromopropyltriethoxysilane, diethyldiethoxysilane, diethyldimethoxysilane, trimethylethoxysilane, trimethylmethoxysilane and the like can be mentioned. These can be used alone or in combination of two or more.
上記金属アルコキシドオリゴマー、金属アルコキシドポリマーは、形成したコート膜の機械的安定性を高めるために含有させるものである。これらの金属としては、ケイ素、チタン、アルミニウム、タンタル、アンチモン、ビスマス、錫、インジウム、亜鉛等の単独又は複合酸化物前駆体が用いられる。金属アルコキシドオリゴマー、金属アルコキシドポリマーとしては、市販品であっても、金属アルコキシドなどのモノマーから、加水分解等の常法により得られたものであってもよい。 The metal alkoxide oligomer and metal alkoxide polymer are contained in order to enhance the mechanical stability of the formed coating film. As these metals, silicon, titanium, aluminum, tantalum, antimony, bismuth, tin, indium, zinc and the like can be used alone or as composite oxide precursors. The metal alkoxide oligomers and metal alkoxide polymers may be commercially available products or may be obtained by conventional methods such as hydrolysis from monomers such as metal alkoxides.
市販品の金属アルコキシドリゴマー、金属アルコキシドポリマーの具体例としては、コルコート社製メチルシリケート51、メチルシリケート53A、エチルシリケート40、エチルシリケート48、EMS-485、SS-101等のシロキサンオリゴマー又はシロキサンポリマー、関東化学社製チタニウム-n-ブトキシドテトラマー等のチタノキサンオリゴマーが挙げられる。これらは単独2種以上混合して使用してもよい。 Specific examples of commercially available metal alkoxide oligomers and metal alkoxide polymers include methyl silicate 51, methyl silicate 53A, ethyl silicate 40, ethyl silicate 48, EMS-485, SS-101 manufactured by Colcoat Co., Ltd. Titanoxane oligomers such as titanium-n-butoxide tetramer manufactured by Kanto Kagaku Co., Ltd. can be mentioned. These may be used singly or in combination of two or more.
また、上記レベリング剤、及び界面活性剤等は、塗膜均一性を向上させるために含有させるものであり、公知のものを用いることができ、特に市販品は入手が容易なので好ましい。
上記無機微粒子としては、シリカ微粒子、アルミナ微粒子、チタニア微粒子、フッ化マグネシウム微粒子等が好ましく、これらの無機微粒子のコロイド溶液が特に好ましい。コロイド溶液は、無機微粒子粉を分散媒に分散したものでもよいし、市販品のコロイド溶液であってもよい。The above-mentioned leveling agent, surfactant and the like are contained in order to improve coating uniformity, and known ones can be used, and commercially available products are particularly preferable because they are readily available.
As the inorganic fine particles, silica fine particles, alumina fine particles, titania fine particles, magnesium fluoride fine particles and the like are preferable, and colloidal solutions of these inorganic fine particles are particularly preferable. The colloidal solution may be one in which inorganic fine particles are dispersed in a dispersion medium, or may be a commercially available colloidal solution.
本発明の組成物中に無機微粒子を含有させることにより、形成される硬化被膜の表面形状やその他の機能を付与することが可能となる。無機微粒子は、その平均粒子径が0.001~0.2μmであることが好ましく、更に好ましくは0.001~0.1μmである。該平均粒子径が0.2μmを超える場合には、調製される塗布液を用いて形成される硬化被膜の透明性が低下する場合がある。なお、平均粒子径は、50%体積平均粒径(D50)である。 By including inorganic fine particles in the composition of the present invention, it becomes possible to impart surface shape and other functions to the formed cured film. The inorganic fine particles preferably have an average particle size of 0.001 to 0.2 μm, more preferably 0.001 to 0.1 μm. If the average particle size exceeds 0.2 μm, the transparency of the cured film formed using the prepared coating liquid may be lowered. The average particle size is the 50% volume average particle size (D50).
無機微粒子の分散媒としては、水、又は有機溶剤を挙げることができる。コロイド溶液としては、被膜形成用塗布液の安定性の観点から、pH又はpKaが好ましくは1~10、より好ましくは2~7に調整されていることが好ましい。
無機微粒子の分散媒に用いる有機溶剤としては、メタノール、エタノール、プロパノール、ブタノール、エチレングリコール、プロピレングリコール、ブタンジオール、ペンタンジオール、2-メチル-2,4-ペンタンジオール、ジエチレングリコール、ジプロピレングリコール、エチレングリコールモノプロピルエーテル等のアルコール類;メチルエチルケトン、メチルイソブチルケトン等のケトン類;トルエン、キシレン等の芳香族炭化水素類;ジメチルホルムアミド、ジメチルアセトアミド、N-メチルピロリドン等のアミド類;酢酸エチル、酢酸ブチル、γ-ブチロラクトン等のエステル類;テトラヒドロフラン、1,4-ジオキサン等のエ-テル類を挙げることができる。なかでも、アルコール類又はケトン類が好ましい。これら有機溶剤は、単独で又は2種以上を混合して分散媒として使用することができる。Water or an organic solvent can be used as a dispersion medium for the inorganic fine particles. The colloid solution is preferably adjusted to have a pH or pKa of preferably 1 to 10, more preferably 2 to 7, from the viewpoint of the stability of the film-forming coating liquid.
Organic solvents used as dispersion media for inorganic fine particles include methanol, ethanol, propanol, butanol, ethylene glycol, propylene glycol, butanediol, pentanediol, 2-methyl-2,4-pentanediol, diethylene glycol, dipropylene glycol, and ethylene. alcohols such as glycol monopropyl ether; ketones such as methyl ethyl ketone and methyl isobutyl ketone; aromatic hydrocarbons such as toluene and xylene; amides such as dimethylformamide, dimethylacetamide and N-methylpyrrolidone; ethyl acetate and butyl acetate , γ-butyrolactone and the like; and ethers such as tetrahydrofuran and 1,4-dioxane. Among them, alcohols or ketones are preferable. These organic solvents may be used alone or in combination of two or more as a dispersion medium.
含有してもよいその他の成分のうち、好ましいのはアルコキシ基の一部が他の有機基で置換していてもよい金属アルコキシド、金属酸化物ゾル、又は金属アルコキシドリゴマーである。
本発明の組成物における上記金属アルコキシド、金属酸化物ゾル又は金属アルコキシドリゴマーの含有量は、特定シロキサンモノマーの100質量部に対して0.5~100質量部であり、好ましくは、1~60質量部である。かかる範囲であると、本発明の組成物が有する親水性及び膜安定性がより発揮できる。Among other components that may be contained, preferred are metal alkoxides, metal oxide sols, or metal alkoxyligomers in which some of the alkoxy groups may be substituted with other organic groups.
The content of the metal alkoxide, metal oxide sol, or metal alkoxydrigomer in the composition of the present invention is 0.5 to 100 parts by mass, preferably 1 to 60 parts by mass with respect to 100 parts by mass of the specific siloxane monomer. Department. Within this range, the hydrophilicity and film stability of the composition of the present invention can be exhibited more effectively.
<親水性コート膜形成用組成物>
本発明の親水性コート膜形成用組成物は、特定シロキサンモノマーと、水若しくは有機溶剤を1種又は2種以上とを混合ことで得られる溶液である。
有機溶剤としては、メタノール、エタノール、2-プロパノール、ブタノール、ジアセトンアルコール、トリフルオロエタノール、等のアルコール類、アセトン、メチルエチルケトン、メチルイソブチルケトン等のケトン類、エチレングリコール、ジエチレングリコール、プロピレングリコール、へキシレングリコール等のグリコール類、メチルセロソルブ、エチルセロソルブ、ブチルセロソルブ、エチルカルビトール、ブチルカルビトール、エチレングリコールモノメチルエーテル、エチレングリコールジメチルエーテル、エチレングリコール-n-ブチルエーテル、ジエチレングリコールモノメチルエーテル、ジエチレングリコールモノブチルエーテル、ジエチレングリコールジメチルエーテル、プロピレングリコールモノメチルエーテル、プロピレングリコールモノブチルエーテル等のグリコールエーテル、酢酸メチルエステル、酢酸エチルエステル、乳酸エチルエステル等のエステル類、N-メチル-2-ピロリドン、N,N-ジメチルホルムアミド、N,N-ジメチルアセトアミド、γ-ブチロラクトン、ジメチルスルホキシド、テトラメチル尿素、ヘキサメチルホスホトリアミド、m-クレゾール等が挙げられる。
なかでも、有機溶媒としては、モノマーの溶解性の観点により、メタノール、エタノール、2-プロパノール、トリフルオロエタノール等のアルコール類、エチレングリコール、プロピレングリコール、へキシレングリコール等のグリコール類、メチルセロソルブ、エチルセロソルブ、ブチルセロソルブ、エチルカルビトール、ブチルカルビトール、エチレングリコールモノメチルエーテル、エチレングリコールジメチルエーテル、エチレングリコール-n-ブチルエーテル、ジエチレングリコールモノメチルエーテル、ジエチレングリコールモノブチルエーテル、ジエチレングリコールジメチルエーテル、プロピレングリコールモノメチルエーテル、プロピレングリコールモノブチルエーテル等のグリコールエーテル、又はN-メチル-2-ピロリドンであるのが好ましい。<Composition for forming a hydrophilic coating film>
The composition for forming a hydrophilic coating film of the present invention is a solution obtained by mixing a specific siloxane monomer and one or more of water or an organic solvent.
Organic solvents include alcohols such as methanol, ethanol, 2-propanol, butanol, diacetone alcohol and trifluoroethanol; ketones such as acetone, methyl ethyl ketone and methyl isobutyl ketone; ethylene glycol, diethylene glycol, propylene glycol and hexylene. Glycols such as glycol, methyl cellosolve, ethyl cellosolve, butyl cellosolve, ethyl carbitol, butyl carbitol, ethylene glycol monomethyl ether, ethylene glycol dimethyl ether, ethylene glycol-n-butyl ether, diethylene glycol monomethyl ether, diethylene glycol monobutyl ether, diethylene glycol dimethyl ether, propylene Glycol ethers such as glycol monomethyl ether and propylene glycol monobutyl ether, esters such as methyl acetate, ethyl acetate and ethyl lactate, N-methyl-2-pyrrolidone, N,N-dimethylformamide, N,N-dimethylacetamide , γ-butyrolactone, dimethylsulfoxide, tetramethylurea, hexamethylphosphotriamide, m-cresol and the like.
Among them, organic solvents include alcohols such as methanol, ethanol, 2-propanol and trifluoroethanol; glycols such as ethylene glycol, propylene glycol and hexylene glycol; cellosolve, butyl cellosolve, ethyl carbitol, butyl carbitol, ethylene glycol monomethyl ether, ethylene glycol dimethyl ether, ethylene glycol-n-butyl ether, diethylene glycol monomethyl ether, diethylene glycol monobutyl ether, diethylene glycol dimethyl ether, propylene glycol monomethyl ether, propylene glycol monobutyl ether, etc. Glycol ethers or N-methyl-2-pyrrolidone are preferred.
上記溶液中に含まれる特定シロキサンモノマーは加水分解されていてもよい。特定シロキサンモノマーの加水分解では、塩酸、硫酸、硝酸、酢酸、蟻酸、蓚酸、マレイン酸などの酸;アンモニア、メチルアミン、エチルアミン、エタノールアミン、トリエチルアミンなどのアルカリ若しくは塩酸、硫酸、硝酸などの金属塩などの触媒などを用いてもよい。
加水分解を行う際、反応温度は0℃~沸点が好ましく、より好ましくは0℃~120℃、特に好ましくは5℃~80℃である。反応時間は10分~80時間が好ましく、より好ましくは30分~50時間、特に好ましくは30分~2時間である。The specific siloxane monomer contained in the solution may be hydrolyzed. Acids such as hydrochloric acid, sulfuric acid, nitric acid, acetic acid, formic acid, oxalic acid, and maleic acid; alkalis such as ammonia, methylamine, ethylamine, ethanolamine, and triethylamine; or metal salts such as hydrochloric acid, sulfuric acid, and nitric acid for hydrolysis of specific siloxane monomers. You may use catalysts, such as.
When hydrolyzing, the reaction temperature is preferably 0°C to boiling point, more preferably 0°C to 120°C, and particularly preferably 5°C to 80°C. The reaction time is preferably 10 minutes to 80 hours, more preferably 30 minutes to 50 hours, particularly preferably 30 minutes to 2 hours.
本発明においては、上記した方法で得られた溶液をそのままコート形成用組成物としてもよいし、必要に応じて、上記した方法で得られた溶液を、濃縮したり、溶媒を加えて希釈したり又は他の溶媒に置換してもよい。
その際、用いる溶媒は、溶解に用いたと同じ溶媒でもよいし、別の溶媒でもよい。この溶媒は、ケイ素化合物が均一に溶解している限りにおいて特に限定されず、一種でも複数種でも任意に選択して用いることができる。
本発明の組成物における特定シロキサンモノマーの含有量は、SiO2固形分換算濃度で0.005~15質量%が好ましく、0.01~12質量%がより好ましい。かかる濃度範囲であれば、一回の塗布で所望の膜厚を得易く、充分な溶液のポットライフが得られ易い。In the present invention, the solution obtained by the above method may be directly used as the coating composition, or if necessary, the solution obtained by the above method may be concentrated or diluted by adding a solvent. or other solvents may be substituted.
At that time, the solvent used may be the same solvent as used for dissolution, or may be another solvent. This solvent is not particularly limited as long as the silicon compound is uniformly dissolved therein, and one type or a plurality of types can be arbitrarily selected and used.
The content of the specific siloxane monomer in the composition of the present invention is preferably 0.005 to 15% by mass, more preferably 0.01 to 12% by mass in terms of SiO 2 solid content. Within such a concentration range, it is easy to obtain a desired film thickness with a single application, and it is easy to obtain a sufficient pot life of the solution.
<製膜>
本発明の親水性コート膜形成用組成物は、既知の塗布法を適用して、基板上に塗膜を形成し、親水性コート膜とすることが可能である。塗布法としては、例えば、ディップコート法、スピンコート法、スプレーコート法、フローコート法、刷毛塗り法、バーコート法、グラビアコート法、ロール転写法、ブレードコート法、エアーナイフコート法、スリットコート法、スクリーン印刷法、インクジェット法、フレキソ印刷法などが用いられる。この中でも、スピンコート法、スリットコート法、ブレードコート法、スプレーコート法又はディップコート法が好ましい。<Film formation>
The composition for forming a hydrophilic coating film of the present invention can be used as a hydrophilic coating film by applying a known coating method to form a coating film on a substrate. Examples of coating methods include dip coating, spin coating, spray coating, flow coating, brush coating, bar coating, gravure coating, roll transfer, blade coating, air knife coating, and slit coating. printing method, screen printing method, inkjet method, flexographic printing method, and the like are used. Among these, the spin coating method, slit coating method, blade coating method, spray coating method and dip coating method are preferable.
<基板>
基板としては、ガラス、プラスチック{ポリメチルメタクリレート、ポリエチレンテレフタレート、ポリブチレンテレフタレート、ポリエチレンナフタレート、ABS、ポリカーボネート、ポリスチレン、エポキシ、不飽和ポリエステル、メラミン、ジアリルフタレート、ポリイミド、ウレタン、ナイロン、ポリエチレン、ポリプロピレン、シクロオレフィンポリマー、ポリ塩化ビニル、フッ素樹脂(ポリテトラフルオロエチレン樹脂、ポリクロロトリフルオロエチレン樹脂、ポリフッ化ビニリデン樹脂、ポリフッ化ビニル樹脂、ペルフルオロアルコキシフッ素樹脂、四フッ化エチレン・六フッ化プロピレン共重合体樹脂、エチレン・四フッ化エチレン共重合体樹脂、エチレン・クロロトリフルオロエチレン共重合体樹脂等)、ポリブタジエン、ポリイソプレン、SBR、ニトリルラバー、EPM、EPDM、エピクロルヒドリンラバー、ネオプレンラバー、ポルサルファイド、ブチルラバー等}、金属(鉄、アルミニウム、ステンレス、チタン、銅、黄銅、これらの合金等)、セルロース、セルロース誘導体、セルロース類似体(キチン、キトサン、ポルフィラン等)あるいは天然繊維(シルク、コットン等)等の基板、シート、フィルム、繊維の表面親水化等が挙げられる。<Substrate>
Substrates include glass, plastic {polymethyl methacrylate, polyethylene terephthalate, polybutylene terephthalate, polyethylene naphthalate, ABS, polycarbonate, polystyrene, epoxy, unsaturated polyester, melamine, diallyl phthalate, polyimide, urethane, nylon, polyethylene, polypropylene, Cycloolefin polymer, polyvinyl chloride, fluororesin (polytetrafluoroethylene resin, polychlorotrifluoroethylene resin, polyvinylidene fluoride resin, polyvinyl fluoride resin, perfluoroalkoxy fluororesin, ethylene tetrafluoride/propylene hexafluoride copolymer coalesced resin, ethylene/tetrafluoroethylene copolymer resin, ethylene/chlorotrifluoroethylene copolymer resin, etc.), polybutadiene, polyisoprene, SBR, nitrile rubber, EPM, EPDM, epichlorohydrin rubber, neoprene rubber, porsulfide, butyl rubber, etc.}, metals (iron, aluminum, stainless steel, titanium, copper, brass, alloys thereof, etc.), cellulose, cellulose derivatives, cellulose analogues (chitin, chitosan, porphyran, etc.) or natural fibers (silk, cotton, etc.) Substrates such as, sheets, films, surface hydrophilization of fibers, and the like.
また、必要に応じて、基板等との接着性を向上させるため、予め基板を、プライマー処理、あるいは、真空プラズマ、大気圧プラズマ、コロナ放電処理、フレーム処理、イトロ処理、紫外線照射、オゾン処理等の表面活性化処理(基材表面の表面エネルギーを高くする手法)を行ってもよい。 In addition, if necessary, in order to improve the adhesiveness to the substrate, etc., the substrate is pretreated with a primer, vacuum plasma, atmospheric pressure plasma, corona discharge treatment, flame treatment, Itro treatment, ultraviolet irradiation, ozone treatment, etc. surface activation treatment (method for increasing the surface energy of the base material surface) may be performed.
<乾燥>
基材に形成された親水性コート膜形成用組成物の塗膜を、乾燥、焼成することにより本発明の親水性コート膜が得られる。乾燥工程は、室温~150℃の温度範囲であることが好ましく、40~120℃の範囲であることがより好ましい。また、その時間は30秒~10分程度が好ましく、1~8分程度がより好ましい。乾燥方法としては、ホットプレートや熱風循環式オーブンなどを用いることが好ましい。<Drying>
The hydrophilic coating film of the present invention is obtained by drying and baking the coating film of the composition for forming a hydrophilic coating film formed on the substrate. The temperature of the drying step is preferably in the range of room temperature to 150°C, more preferably in the range of 40 to 120°C. The time is preferably about 30 seconds to 10 minutes, more preferably about 1 to 8 minutes. As a drying method, it is preferable to use a hot plate, a hot air circulation oven, or the like.
<焼成>
焼成工程は、基材の耐熱性、環境面を考慮し、80℃~300℃の温度範囲であることが好ましく、100℃~250℃の範囲内であることがより好ましい。その時間は5分以上が好ましく、15分以上であることがより好ましい。焼成方法としては、ホットプレート、熱循環式オーブン、赤外線オーブンなどを用いることが好ましい。<Firing>
Considering the heat resistance of the base material and the environment, the baking step is preferably carried out at a temperature of 80°C to 300°C, more preferably 100°C to 250°C. The time is preferably 5 minutes or longer, more preferably 15 minutes or longer. As the baking method, it is preferable to use a hot plate, a thermal circulation oven, an infrared oven, or the like.
上記方法で得られた被膜の厚みは必要に応じて選択することができる。親水性コート膜の安定性が得られやすいため、被膜の厚みは3~150nmが好ましい。より好ましくは、5~120nmである。 The thickness of the coating obtained by the above method can be selected according to need. The thickness of the coating is preferably 3 to 150 nm because the stability of the hydrophilic coating film can be easily obtained. More preferably, it is 5 to 120 nm.
以下、実施例にしたがって本発明をさらに詳しく説明するが、本発明はこれらに限定されるものではない。
なお、以下における略語は以下のとおりである。
DHIMES:トリエトキシ-3-(2-イミダゾリン-1-イル)プロピルシラン
p-PyTES:2-(4-ピリジルエチル)トリエトキシシラン
DMAPS:3-(N,N-ジメチルアミノプロピル)トリメトキシシラン
MTES:メチルトリエトキシシラン
TFE:トリフルオロエタノールEXAMPLES The present invention will be described in more detail below according to examples, but the present invention is not limited to these.
The abbreviations used below are as follows.
DHIMES: triethoxy-3-(2-imidazolin-1-yl)propylsilane p-PyTES: 2-(4-pyridylethyl)triethoxysilane DMAPS: 3-(N,N-dimethylaminopropyl)trimethoxysilane MTES: Methyltriethoxysilane TFE: Trifluoroethanol
下記合成例における生成物は、1H-NMR分析により同定した。分析条件は下記の通りである。
装置:Varian NMR System 400 NB (400 MHz)
測定溶媒:CDCl3、DMSO-d6、
基準物質:テトラメチルシラン(TMS)(δ0.0 ppm for 1H)The products in the synthesis examples below were identified by 1H-NMR analysis. Analysis conditions are as follows.
Apparatus: Varian NMR System 400 NB (400 MHz)
Measurement solvent: CDCl3, DMSO-d6,
Reference substance: tetramethylsilane (TMS) (δ0.0 ppm for 1H)
<合成例1:A-1の合成>
反応器中に、アセトニトリル(398.9g)及びDHIMES(199.5g,727mmol)を仕込み、次いで、窒素雰囲気、氷冷条件下にて、アセトニトリル(299.3g)に溶かした1,3-プロパンスルトン(97.7g)を、滴下ロートを用いて滴下した。
滴下後、アセトニトリル(99.8g)で滴下ロート上に残った残留分を流し、反応温度を室温として18時間反応させた。反応終了後、減圧濃縮する事で反応容器内の内部総重量を459gとし、テトラヒドロフラン(1596g)を加えて結晶を析出させ、ろ過、乾燥することでA-1(性状:白色結晶)を244.0g得た(収率:85%)。
1H-NMR(400MHz) in CDCl3:0.57-0.61ppm(m,2H),1.23ppm(t,J=7.2Hz,9H),1.69-1.76ppm(m,2H),2.14-2.21ppm(m,2H)2.90ppm(t,J=7.2Hz,2H),3.57ppm(t,J=7.2Hz,2H),3.78-3.85ppm(m,8H),3.93-3.99ppm(m,4H),8.82ppm(s,1H)Acetonitrile (398.9 g) and DHIMES (199.5 g, 727 mmol) were charged into a reactor, and then 1,3-propanesultone dissolved in acetonitrile (299.3 g) was placed under nitrogen atmosphere and ice cooling conditions. (97.7 g) was added dropwise using a dropping funnel.
After dropping, acetonitrile (99.8 g) was poured to flush the residue remaining on the dropping funnel, and the reaction temperature was raised to room temperature and reacted for 18 hours. After completion of the reaction, concentration was performed under reduced pressure to adjust the total internal weight of the reaction vessel to 459 g. Tetrahydrofuran (1596 g) was added to precipitate crystals, which were filtered and dried to obtain 244 g of A-1 (property: white crystals). 0 g was obtained (yield: 85%).
1 H-NMR (400 MHz) in CDCl 3 : 0.57-0.61 ppm (m, 2H), 1.23 ppm (t, J = 7.2 Hz, 9H), 1.69-1.76 ppm (m, 2H ), 2.14-2.21 ppm (m, 2H), 2.90 ppm (t, J = 7.2 Hz, 2H), 3.57 ppm (t, J = 7.2 Hz, 2H), 3.78-3. 85 ppm (m, 8H), 3.93-3.99 ppm (m, 4H), 8.82 ppm (s, 1H)
<合成例2:A-2の合成>
シロキサンモノマーとして、p-PyTESを用いた他は、合成例1と同様に実施することにより、A-2(性状:赤色結晶)を40.5g得た(収率74%)。
40.5 g of A-2 (property: red crystals) was obtained (yield: 74%) in the same manner as in Synthesis Example 1, except that p-PyTES was used as the siloxane monomer.
<合成例3:A-3の合成>
シロキサンモノマーとして、DMAPSを用いた他は、合成例1と同様に実施することにより、A-3(性状:白色結晶)を49.4g得た(収率82%)。
49.4 g of A-3 (property: white crystals) was obtained (yield: 82%) by carrying out in the same manner as in Synthesis Example 1 except that DMAPS was used as the siloxane monomer.
<合成例4:A-4の合成>
アセトニトリル(30.1g)中、DHIMES(20.0g,72.9mmol)を仕込み、窒素雰囲気室温条件下で1,4-ブタンスルトン(11.0g)を加えた。続いて、反応温度を45℃として約2日間反応させて原料を消失させた。反応終了後、減圧濃縮することで溶媒を除去し、酢酸エチル(20.0g)とヘキサン(20.0g)を加えて懸濁溶液を作製した。-25℃の冷凍庫にて、懸濁液を一晩放置することで結晶を析出させ、窒素雰囲気下でろ過することで結晶を回収した。得られた結晶をヘキサン(50.0g)でスラリー洗浄し、ろ過、乾燥することでA-4(性状:薄黄色結晶)を20.2g得た(収率:67%)。
DHIMES (20.0 g, 72.9 mmol) was charged in acetonitrile (30.1 g), and 1,4-butanesultone (11.0 g) was added under nitrogen atmosphere at room temperature. Subsequently, the reaction temperature was set to 45° C. and the reaction was carried out for about 2 days to eliminate the raw material. After completion of the reaction, the solvent was removed by concentration under reduced pressure, and ethyl acetate (20.0 g) and hexane (20.0 g) were added to prepare a suspension solution. The suspension was allowed to stand overnight in a freezer at −25° C. to precipitate crystals, and the crystals were recovered by filtering under a nitrogen atmosphere. The obtained crystals were slurry-washed with hexane (50.0 g), filtered and dried to obtain 20.2 g of A-4 (property: pale yellow crystals) (yield: 67%).
<合成例5:A-5の合成>
アセトニトリル(40.0g)中、トリエトキシ-3-(2-イミダゾリン-1-イル)プロピルシラン(20.0g,72.9mmol)を仕込み、窒素雰囲気氷冷条件下で2,4-ブタンスルトン(10.4g)を加えた。続いて、反応温度を室温として約1日間反応させて原料を消失させた。反応終了後、減圧濃縮することで溶媒を除去した。続いて、濃縮溶液を酢酸エチル(80.0g)で希釈し、ヘキサン(80.0g)を加えた結果、懸濁溶液を作製した。-25℃の冷凍庫にて、粘性物質を固化させ、上澄み液を除去した。再度酢酸エチル(70.0g)及びヘキサン(70.0g)を加えて懸濁液を作製し、再度-25℃の冷凍庫で放置した結果、結晶が析出した。窒素雰囲気下でろ過、ヘキサン洗浄し、乾燥することでA-5(性状:白色結晶)を28.2g得た(収率:94%、)。
Triethoxy-3-(2-imidazolin-1-yl)propylsilane (20.0 g, 72.9 mmol) was charged in acetonitrile (40.0 g), and 2,4-butanesultone (10. 4g) was added. Subsequently, the reaction temperature was set to room temperature, and the reaction was allowed to proceed for about one day to eliminate the raw materials. After completion of the reaction, the solvent was removed by concentrating under reduced pressure. The concentrated solution was then diluted with ethyl acetate (80.0 g) and hexane (80.0 g) was added, resulting in a suspension solution. The viscous substance was solidified in a freezer at -25°C, and the supernatant was removed. Ethyl acetate (70.0 g) and hexane (70.0 g) were added again to prepare a suspension, which was again allowed to stand in a freezer at -25°C to precipitate crystals. 28.2 g of A-5 (property: white crystals) was obtained by filtering under a nitrogen atmosphere, washing with hexane, and drying (yield: 94%).
<調製例1>
200mLフラスコ中にA-1を39.7g及びTFEを36.4g加えて攪拌し、A-1を溶解した。そこに、蓚酸0.3g、水5.4g、及びTFE18.2gの混合物を添加し、室温下で2時間攪拌し、溶液AAを得た。
500mLフラスコ中にて、溶液AA2.5g及びTFE297.5gを混合し、さらに室温下で30分撹拌し、溶液(K1)を得た。<Preparation Example 1>
39.7 g of A-1 and 36.4 g of TFE were added to a 200 mL flask and stirred to dissolve A-1. A mixture of 0.3 g of oxalic acid, 5.4 g of water and 18.2 g of TFE was added thereto and stirred at room temperature for 2 hours to obtain solution AA.
In a 500 mL flask, 2.5 g of solution AA and 297.5 g of TFE were mixed and stirred at room temperature for 30 minutes to obtain solution (K1).
<調製例2>
200mLフラスコ中にA-2を39.1g及びTFEを36.7g加えて攪拌し、A-2を溶解した。そこに、蓚酸0.3g、水5.4g、及びTFE18.4gの混合物を添加し、室温下で2時間攪拌し、溶液ABを得た。
500mLフラスコ中にて、溶液AB2.5g及びTFE297.5gを混合し、さらに室温下で30分撹拌し、溶液(K2)を得た。<Preparation Example 2>
39.1 g of A-2 and 36.7 g of TFE were added to a 200 mL flask and stirred to dissolve A-2. A mixture of 0.3 g of oxalic acid, 5.4 g of water and 18.4 g of TFE was added thereto and stirred at room temperature for 2 hours to obtain solution AB.
In a 500 mL flask, 2.5 g of solution AB and 297.5 g of TFE were mixed and stirred at room temperature for 30 minutes to obtain solution (K2).
<調製例3>
200mLフラスコ中にA-1を27.8g、MTESを5.3g、TFEを40.8g加えて攪拌し、A-1及びMTESを溶解した。そこに、蓚酸0.3g、水5.4g、及びTFE20.4gの混合物を添加し、室温下で2時間攪拌し、溶液ACを得た。
500mLフラスコ中にて、溶液AC2.5g及びTFE297.5gを混合し、さらに室温下で30分撹拌し、溶液(K3)を得た。<Preparation Example 3>
27.8 g of A-1, 5.3 g of MTES and 40.8 g of TFE were added to a 200 mL flask and stirred to dissolve A-1 and MTES. A mixture of 0.3 g of oxalic acid, 5.4 g of water and 20.4 g of TFE was added thereto and stirred at room temperature for 2 hours to obtain solution AC.
In a 500 mL flask, 2.5 g of solution AC and 297.5 g of TFE were mixed and stirred at room temperature for 30 minutes to obtain solution (K3).
<調製例4>
200mLフラスコ中にA-3を32.9g及びTFEを40.9g加えて攪拌し、A-3を溶解した。そこに、蓚酸0.3g、水5.4g、及びTFE20.5gの混合物を添加し、室温下で2時間攪拌し、溶液ADを得た。
500mLフラスコ中にて、溶液AD2.5g及びTFE297.5gを混合し、さらに室温下で30分撹拌し、溶液(K4)を得た。<Preparation Example 4>
32.9 g of A-3 and 40.9 g of TFE were added to a 200 mL flask and stirred to dissolve A-3. A mixture of 0.3 g of oxalic acid, 5.4 g of water, and 20.5 g of TFE was added thereto and stirred at room temperature for 2 hours to obtain solution AD.
In a 500 mL flask, 2.5 g of the solution AD and 297.5 g of TFE were mixed and stirred at room temperature for 30 minutes to obtain a solution (K4).
<調製例5>
100mLフラスコ中にA-4を16.4g及びTFEを14.2g加えて攪拌し、A-3を溶解した。そこに、蓚酸0.1g、水2.2g、及びTFE7.1gの混合物を添加し、室温下で2時間攪拌し、溶液AEを得た。
500mLフラスコ中にて、溶液AE2.5g及びTFE297.5gを混合し、さらに室温下で30分撹拌し、溶液(K5)を得た。<Preparation Example 5>
16.4 g of A-4 and 14.2 g of TFE were added to a 100 mL flask and stirred to dissolve A-3. A mixture of 0.1 g of oxalic acid, 2.2 g of water and 7.1 g of TFE was added thereto and stirred at room temperature for 2 hours to obtain solution AE.
In a 500 mL flask, 2.5 g of the solution AE and 297.5 g of TFE were mixed and stirred at room temperature for 30 minutes to obtain a solution (K5).
<調製例6>
100mLフラスコ中にA-5を16.4g及びTFEを14.2g加えて攪拌し、A-3を溶解した。そこに、蓚酸0.1g、水2.2g、及びTFE7.1gの混合物を添加し、室温下で2時間攪拌し、溶液AFを得た。
500mLフラスコ中にて、溶液AF2.5g及びTFE297.5gを混合し、さらに室温下で30分撹拌し、溶液(K6)を得た。<Preparation Example 6>
16.4 g of A-5 and 14.2 g of TFE were added to a 100 mL flask and stirred to dissolve A-3. A mixture of 0.1 g of oxalic acid, 2.2 g of water and 7.1 g of TFE was added thereto and stirred at room temperature for 2 hours to obtain a solution AF.
In a 500 mL flask, 2.5 g of solution AF and 297.5 g of TFE were mixed and stirred at room temperature for 30 minutes to obtain solution (K6).
<製膜法>
上記調製例1~6で得られた溶液K1~K6を孔径0.5μmのメンブランフィルターで加圧濾過し、ガラス基板にスピンコート法により成膜した。この基板を70℃のホットプレート上で3分間乾燥した後、200℃の熱風循環式オーブンで30分焼成し親水性被膜を得た。
調製例1~3、5~6でそれぞれ得られた溶液K1~K3、K5~K6の上記親水性被膜(KL1~KL5)を実施例1~5とした。また、調製例4で得られた溶液K4の上記親水性被膜(KM1)を比較例1とした。<Film forming method>
The solutions K1 to K6 obtained in Preparation Examples 1 to 6 above were filtered under pressure through a membrane filter with a pore size of 0.5 μm, and films were formed on glass substrates by spin coating. The substrate was dried on a hot plate at 70° C. for 3 minutes and then baked in a hot air circulating oven at 200° C. for 30 minutes to obtain a hydrophilic film.
The hydrophilic films (KL1 to KL5) of the solutions K1 to K3 and K5 to K6 obtained in Preparation Examples 1 to 3 and 5 to 6, respectively, were designated as Examples 1 to 5. The hydrophilic film (KM1) of the solution K4 obtained in Preparation Example 4 was used as Comparative Example 1.
上記実施例1~3、5~6の被膜(KL1~KL5)及び比較例1の被膜(KM1)について、次の各試験を行い、それらの結果を、表1に示した。
<水接触角>
協和界面科学社製の自動接触角計CA-Z型を使用して、純水の1マイクロリットルを滴下したときの接触角を測定した。
<高温高湿試験>
上記各被膜(KL1~KL5、KM1)を温度60℃、相対湿度90%の高温高湿槽オーブンにて3日間エージングした。その後、上記手法にて水接触角を測定した。The coatings of Examples 1 to 3 and 5 to 6 (KL1 to KL5) and the coating of Comparative Example 1 (KM1) were subjected to the following tests, and the results are shown in Table 1.
<Water contact angle>
Using an automatic contact angle meter CA-Z manufactured by Kyowa Interface Science Co., Ltd., the contact angle was measured when 1 microliter of pure water was dropped.
<High temperature and high humidity test>
Each of the above coatings (KL1 to KL5, KM1) was aged for 3 days in a high-temperature, high-humidity bath oven at a temperature of 60° C. and a relative humidity of 90%. After that, the water contact angle was measured by the above method.
<水浸漬試験>
上記各被膜(KL1~KL5、KM1)を、純水を用いて室温にて5分超音波洗浄を行い、次いで80℃の熱風循環式オーブンで10分乾燥した。その後、上記高温高湿試験を行った。
<呼気試験>
上記水浸漬試験及び高温高湿試験を行った被膜(KL1~KL5、KM1)に呼気を吹きかけ、被非膜の表面が曇らなかった場合○とし、曇った場合×として、各評価を行った。<Water immersion test>
Each of the coatings (KL1 to KL5, KM1) was subjected to ultrasonic cleaning using pure water at room temperature for 5 minutes, and then dried in a hot air circulating oven at 80° C. for 10 minutes. After that, the above high temperature and high humidity test was performed.
<Breath test>
Exhalation was blown to the coating (KL1 to KL5, KM1) that had undergone the water immersion test and the high temperature and high humidity test, and each evaluation was performed, with ○ when the surface of the coating was not clouded, and x when cloudy.
実施例1~5の被膜においては、高温高湿試験後、及び水浸漬試験後であっても親水性が維持され、また呼気試験の結果から、防曇性も維持されていることが分かった。比較例1の被膜においては、水浸漬試験により、高温高湿3日後で親水性が低下しており、呼気試験においても非膜表面が曇り、防曇性も低下していた。
なお、2017年6月14日に出願された日本特許出願2017-117151号の明細書、特許請求の範囲、図面、及び要約書の全内容をここに引用し、本発明の明細書の開示として、取り入れるものである。In the coatings of Examples 1 to 5, the hydrophilicity was maintained even after the high-temperature, high-humidity test and the water immersion test, and the results of the breath test showed that the antifogging properties were also maintained. . In the coating of Comparative Example 1, the water immersion test revealed that the hydrophilicity had decreased after 3 days of high temperature and high humidity, and the non-coating surface became cloudy and the anti-fogging property decreased in the breath test as well.
In addition, the entire contents of the specification, claims, drawings, and abstract of Japanese Patent Application No. 2017-117151 filed on June 14, 2017 are cited here as disclosure of the specification of the present invention. , is to be incorporated.
Claims (11)
前記シロキサンモノマーが、下記式[1]で表される、親水性コート膜形成用組成物。
R2は、炭素数1~5のアルキル基、炭素数2~5のアルケニル基、又は炭素数2~5のアルキニル基を表し、R2の有する任意の水素原子は、炭素数1~5のアルキル基、ハロゲン原子、芳香族環、又は脂肪族環で置換されていてもよい。pは、1~3の整数を表す。qは、pが1のとき0~2の整数を表し、pが2のとき0~1の整数を表し、pが3のとき0を表す。
Lは炭素数1~20のヘテロ原子を有してもよい直鎖状若しくは分岐状のアルキレン基を表し、アルキレン基の有する任意の水素原子は、炭素数1~5のアルキル基、ハロゲン原子、芳香族環、又は脂肪族環で置換されていてもよい。
Xは、単結合、-O-、-COO-、-OCO-、-CONR3-、-NR4-CO-、又は-NR5=NR6-を表す。R3、R4、R5及びR6は、それぞれ独立に、水素原子又は炭素数1~4のアルキル基を表す。
Yは、イミダゾール、イミダゾリン、及びベンゾイミダゾールからなる群から選ばれる。
Mは、炭素数1~10の直鎖状若しくは分岐状のアルキレン基を表し、アルキレン基の有する任意の水素原子は、炭素数1~5のアルキル基又はハロゲン原子で置換されていてもよい。Mは、Yの有する窒素原子と結合し、M及びLのいずれか一方はYの有する窒素原子との結合によりN+部分を形成している。
ZはCOO-、SO3 -、又はPO4 -を表す。 Containing a siloxane monomer having a positively charged betaine group on the nitrogen atom in the nitrogen-containing heterocyclic structure, and water or an organic solvent,
A composition for forming a hydrophilic coating film, wherein the siloxane monomer is represented by the following formula [1].
R 2 represents an alkyl group having 1 to 5 carbon atoms, an alkenyl group having 2 to 5 carbon atoms, or an alkynyl group having 2 to 5 carbon atoms; It may be substituted with an alkyl group, a halogen atom, an aromatic ring, or an aliphatic ring. p represents an integer of 1 to 3; q represents an integer of 0 to 2 when p is 1, an integer of 0 to 1 when p is 2, and 0 when p is 3;
L represents a linear or branched alkylene group optionally having a heteroatom having 1 to 20 carbon atoms, and any hydrogen atom of the alkylene group is an alkyl group having 1 to 5 carbon atoms, a halogen atom, It may be substituted with an aromatic ring or an aliphatic ring.
X represents a single bond, -O-, -COO-, -OCO-, -CONR 3 -, -NR 4 -CO-, or -NR 5 =NR 6 -. R 3 , R 4 , R 5 and R 6 each independently represent a hydrogen atom or an alkyl group having 1 to 4 carbon atoms.
Y is selected from the group consisting of imidazole, imidazoline, and benzimidazole .
M represents a linear or branched alkylene group having 1 to 10 carbon atoms, and any hydrogen atom of the alkylene group may be substituted with an alkyl group having 1 to 5 carbon atoms or a halogen atom. M is bonded to the nitrogen atom of Y, and one of M and L is bonded to the nitrogen atom of Y to form an N + portion.
Z represents COO − , SO 3 − , or PO 4 − .
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