WO2018196059A1 - 一种显示面板及显示装置 - Google Patents

一种显示面板及显示装置 Download PDF

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Publication number
WO2018196059A1
WO2018196059A1 PCT/CN2017/084860 CN2017084860W WO2018196059A1 WO 2018196059 A1 WO2018196059 A1 WO 2018196059A1 CN 2017084860 W CN2017084860 W CN 2017084860W WO 2018196059 A1 WO2018196059 A1 WO 2018196059A1
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Prior art keywords
output
color filter
spacer
filter substrate
gate line
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Ceased
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PCT/CN2017/084860
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English (en)
French (fr)
Inventor
赵凯祥
张占东
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Wuhan China Star Optoelectronics Technology Co Ltd
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Wuhan China Star Optoelectronics Technology Co Ltd
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Priority to US15/539,812 priority Critical patent/US10345651B2/en
Publication of WO2018196059A1 publication Critical patent/WO2018196059A1/zh
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/133371—Cells with varying thickness of the liquid crystal layer
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/136286—Wiring, e.g. gate line, drain line
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
    • H10D86/40—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs
    • H10D86/441—Interconnections, e.g. scanning lines
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
    • H10D86/40—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs
    • H10D86/60—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs wherein the TFTs are in active matrices
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G02F1/13378—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation
    • G02F1/133784—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation by rubbing
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G02F1/13396—Spacers having different sizes
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G02F1/13398—Spacer materials; Spacer properties

Definitions

  • the present invention belongs to the field of display technologies, and in particular, to a display panel and a display device.
  • the scan line is formed of a metal material, the metal material has a resistance.
  • the voltage on the scan line decreases, a phenomenon known as voltage drop. As shown in FIG. 1, the voltage drop is from low to high as the distance between the pixel A, the pixel B, and the pixel C and the gate line input is from near to far.
  • the gate line voltage drop expression in the existing liquid crystal display panel is:
  • ⁇ Vp represents the voltage drop value
  • C gs represents the capacitance between the gate line and the source/drain of the switching element
  • C lc represents the liquid crystal capacitance
  • C s represents the storage capacitance
  • V ghl represents the ideal input voltage and the actual input voltage. Difference.
  • V a represents the voltage drop of pixel A
  • ⁇ V a represents the pixel A feedthrough voltage
  • V b represents the voltage drop of pixel B
  • ⁇ V b Indicates the pixel B feedthrough voltage
  • V c represents the voltage drop of pixel C
  • ⁇ V c represents the pixel B feedthrough voltage
  • V gh represents the gate line ideal input voltage
  • the present invention provides a display panel and a display device for improving display uniformity of the panel.
  • a display panel comprising:
  • An array substrate on which a plurality of gate lines are arranged in parallel;
  • liquid crystal layer disposed between the array substrate and the color filter substrate
  • the thickness of the liquid crystal layer gradually decreases along the direction from the output proximal end of the gate line to the output distal end.
  • a spacer is further disposed between the array substrate and the color filter substrate, wherein the gap is along a direction from an output proximal end of the gate line to an output distal end. The height of the child gradually decreases.
  • the spacer is formed by irradiating a negative photoresist with a photomask provided with a chromium film of a different thickness at a predetermined light transmitting position.
  • the gap is formed by adjusting a discharge amount of a gap sub-material at a predetermined position on the color filter substrate, or the gap is adjusted by the nozzle for ejecting the gap sub-material The distance of the predetermined position on the color filter substrate or the velocity of the nozzle ejection gap sub-material is formed.
  • a black matrix is further disposed on the color filter substrate, wherein a thickness of the black matrix is gradually increased along a direction from an output proximal end of the gate line to an output distal end .
  • the black matrix is formed by adjusting a discharge amount of a black matrix material at a predetermined position on the color filter substrate, or by adjusting a nozzle for ejecting a black matrix material and the color filter substrate. The distance of the predetermined position or the velocity at which the nozzle ejects the black matrix material is formed.
  • the second alignment layer is disposed on a side of the array substrate adjacent to the liquid crystal layer and a second alignment layer on a side of the color filter substrate adjacent to the liquid crystal layer.
  • the thickness of the first alignment layer or the second alignment layer gradually increases along a direction from the output proximal end of the gate line to the output distal end.
  • the first alignment layer/the second alignment layer is formed by transferring an alignment material onto the array substrate/the color filter substrate by using a printing plate provided with holes of different sizes.
  • the holes in the printing plate are gradually reduced along the direction from the output proximal end of the gate line to the output distal end.
  • a display device comprising the display panel described above.
  • the invention sets the thickness of the liquid crystal layer to gradually decrease along the direction from the output proximal end of the gate line to the output distal end, so that the voltage drop of the scanning signal in the direction from the output proximal end of the gate line to the output distal end is uniform, thereby The output voltage of the panel is evenly distributed, and the uniformity of the panel display is improved.
  • 1 is a schematic diagram of wiring of an array substrate in the prior art
  • FIG. 2 is a schematic diagram showing waveforms of driving voltages of respective pixels corresponding to FIG. 1;
  • FIG. 3 is a schematic structural view of a display panel according to an embodiment of the present invention.
  • FIG. 4 is a schematic view showing a reticle structure and a corresponding gap height gradation according to an embodiment of the present invention
  • FIG. 5 is a schematic view showing a black matrix structure on a color filter substrate according to an embodiment of the present invention.
  • FIG. 6 is a schematic structural view of an alignment layer on a color film substrate side or an array substrate side according to an embodiment of the present invention
  • Figure 7 is a schematic illustration of the transfer of an orientation material using a printing plate in accordance with one embodiment of the present invention.
  • Figure 8 is a schematic view of a printing plate according to an embodiment of the present invention.
  • Figure 9 is a schematic illustration of a gradient of a printing plate aperture in accordance with one embodiment of the present invention.
  • the present invention provides a display panel including an array substrate 11, a color filter substrate 12, and a liquid crystal layer 13.
  • a plurality of gate lines (not shown) are arranged in parallel on the array substrate 11.
  • the liquid crystal layer 13 is disposed between the array substrate 11 and the color filter substrate 12. Wherein, the thickness of the liquid crystal layer gradually decreases along the direction from the output proximal end of the gate line to the output distal end (the direction marked by the arrow, that is, the scanning signal driving circuit from the near and far directions).
  • the liquid crystal layer between the array substrate and the color filter substrate can be equivalent to a liquid crystal capacitor.
  • the liquid crystal capacitance C lc affects the voltage drop ⁇ Vp.
  • the liquid crystal capacitance C lc dielectric constant * area between electrodes / distance between electrodes. That is to say, the larger the distance between the two electrodes of the liquid crystal capacitor, the larger the voltage drop ⁇ Vp, and conversely, the smaller the voltage drop ⁇ Vp.
  • the distance between the two electrodes of the liquid crystal capacitor is gradually reduced, so that the voltage drop ⁇ Vp is gradually decreased in the direction from the proximal end to the distal end of the output end of the gate line.
  • the ⁇ Vp of the output end of the gate line to the output end tends to be uniform, so that the voltage output across the panel is uniform, and the panel is lifted. Uniformity of the display.
  • the display panel further includes a spacer.
  • the spacer is disposed between the array substrate and the color filter substrate. Wherein, the height of the spacer gradually decreases along the direction from the output proximal end of the gate line to the output distal end.
  • a spacer is usually disposed between the array substrate and the color filter substrate, and is fixed on one side of the color filter substrate to serve as a supporting member to keep the distance between the array substrate and the color filter substrate unchanged.
  • the height of the spacer 121 is gradually decreased in the direction from the proximal end to the distal end of the output end of the gate line, so that the distance between the array substrate and the color filter substrate is along the proximal end of the output end of the gate line.
  • the direction to the far end is gradually reduced, so that the thickness of the liquid crystal layer gradually decreases along the output proximal end of the gate line to the output distal end, as shown in FIG.
  • the spacer is formed by illuminating a negative photoresist with a photomask provided with chrome films of different thicknesses at predetermined light transmission locations.
  • the photomask 21 shown in FIG. 4 can be used to illuminate the negative photoresist to form a spacer 121 whose height gradually decreases along the output proximal end of the gate line to the output distal end, as shown in FIG.
  • a negative photoresist material is used to form a spacer, and after the negative photoresist material is exposed to light, the solubility of the photosensitive portion and the non-photosensitive portion is significantly different.
  • the non-photosensitive portion of the photoresist material can be dissolved, leaving the photosensitive portion of the photoresist material as a spacer.
  • the predetermined light transmitting position on the photomask 21 corresponds to the photoresist material of the photosensitive portion.
  • the predetermined light-transmissive position is provided with chromium films of different thicknesses, and the thickness of the chromium film of different thicknesses is different, and the larger the thickness of the chromium film, the less light is transmitted.
  • the thickness of the chrome film at the corresponding position may be set to be the thinnest or no chrome film is provided (as shown in FIG. 4). Then, along the output end of the gate line to the output end, the thickness of the chrome film increases in turn.
  • the exposed gap is adjacent to the gate line output near the maximum height, the output distal gap height is the smallest, and the final gap height is arranged as shown in FIG.
  • the spacer is formed by adjusting the amount of ejection of the spacer material at a predetermined position on the color filter substrate, or the spacer is adjusted by the nozzle for jetting the spacer material and the predetermined condition on the color filter substrate.
  • the distance of the position or the velocity of the nozzle spray gap sub-material is formed.
  • the spacer material when the spacer material is applied at a predetermined position on the color filter substrate, the distance between the coating nozzle and the glass substrate or the velocity of the nozzle ejection gap sub-material is adjusted, and the distance is closer to the near end of the gate line output. Or the speed is slower and the height of the gap is higher. When far from the output end of the grid line, the distance is far or the speed is small, the height of the gap is small, and the height of the finally formed gap is as shown in Fig. 4.
  • the spacer is for supporting the array substrate and the color filter substrate, in order to keep the distance between the array substrate and the color filter substrate constant, two gaps at two end points in the direction from the output proximal end of the gate line to the output distal end
  • the height difference of the sub is set to be no more than 0.2 ⁇ m to prevent the panel picture display from being affected.
  • the display panel further includes a black matrix.
  • the black matrix is disposed on the color filter substrate, wherein the thickness of the black matrix gradually decreases along the direction from the output proximal end of the gate line to the output distal end.
  • the black matrix is generally disposed on the color film substrate for separating the color resist layers on the color filter substrate and avoiding photocurrent generation.
  • the spacers are also usually placed on the black matrix.
  • the thickness of the black matrix 122 is set to gradually increase along the direction from the output proximal end of the gate line to the output distal end, as shown in FIG.
  • the thickness of the liquid crystal layer can be gradually increased in the direction from the output proximal end of the gate line to the output distal end, so that the thickness of the liquid crystal layer gradually decreases in the direction from the output proximal end of the gate line to the output distal end.
  • the black matrix is formed by adjusting a discharge amount of a predetermined position of the black matrix material on the color filter substrate, or by adjusting a nozzle for ejecting the black matrix material and a predetermined position on the color filter substrate.
  • the distance or the velocity at which the nozzle ejects the black matrix material is formed.
  • a method of coating a spacer material may be used to form a black matrix whose thickness is gradually changed, which will not be described in detail herein.
  • the display panel further includes a first alignment layer on the side of the array substrate adjacent to the liquid crystal layer and a second alignment layer on a side of the color filter substrate adjacent to the liquid crystal layer.
  • the thickness of the first alignment layer or the second alignment layer gradually increases along the direction from the output proximal end of the gate line to the output distal end.
  • an alignment layer 123 is disposed on each side of the array substrate and the color filter substrate adjacent to the liquid crystal layer for orienting the liquid crystal molecules in the liquid crystal layer.
  • the thickness of the first alignment layer or the thickness of the second alignment layer is gradually increased in the direction from the output proximal end of the gate line to the output distal end.
  • the thickness of the alignment layer 123 When the thickness of the alignment layer 123 is larger, the cell thickness of the liquid crystal is smaller, and thus the thickness of the liquid crystal layer can be gradually decreased in the direction from the output proximal end of the gate line to the output distal end.
  • the thickness of the first alignment layer and the thickness of the second alignment layer may be simultaneously set to gradually increase along the direction from the output proximal end of the gate line to the output distal end, and the present invention is not limited thereto.
  • the first alignment layer or the second alignment layer is formed by transferring the alignment material onto the array substrate/color film substrate by using a printing plate provided with holes of different sizes.
  • the APR plate is usually used as the printing plate 31 on the drum, and the orientation material is transferred onto the array substrate/color film substrate as shown in FIG.
  • the APR version is a convex plate made of a UV-curable urethane-based resin having pores on its surface as shown in FIG.
  • the holes are filled with the alignment layer material solution. If the holes are large, the solution between the holes is less; if the holes are smaller, the solution is more contained between the holes.
  • a solution formed of the alignment layer material is applied to the APR plate, and the alignment layer material solution can be applied onto the array substrate and the color filter substrate by a transfer technique.
  • the holes in the printing plate are gradually reduced along the direction from the output proximal end of the gate line to the output distal end.
  • the output near the gate line has a larger hole at the near end, and the material of the alignment layer material is less, and the thickness of the alignment layer is smaller.
  • the output distal hole near the grid line is smaller, and the orientation layer material is accommodated in a larger amount, and the orientation layer has a larger thickness.
  • the display panel includes an array substrate, a color filter substrate, and a liquid crystal layer.
  • a plurality of gate lines are arranged in parallel on the array substrate, and the liquid crystal layer is disposed between the array substrate and the color filter substrate.
  • the thickness of the liquid crystal layer gradually decreases along the direction from the output proximal end of the gate line to the output distal end.
  • the display panel further includes a spacer disposed between the array substrate and the color filter substrate.
  • the height of the spacer gradually decreases along the direction from the output proximal end of the gate line to the output distal end.
  • the display panel further includes a black matrix disposed on the color filter substrate.
  • the thickness of the black matrix gradually decreases along the direction from the output near end of the gate line to the far end of the output.
  • the display panel further includes a second alignment layer disposed on a side of the array substrate adjacent to the liquid crystal layer and a side of the color filter substrate adjacent to the liquid crystal layer.
  • the thickness of the first alignment layer or the second alignment layer gradually increases along the direction from the output proximal end of the gate line to the output distal end.

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
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Abstract

一种显示面板及显示装置，该显示面板包括：阵列基板(11)，其上平行设置有多条栅线；彩膜基板(12)；液晶层(13)，其设置于阵列基板(11)和彩膜基板(12)之间，其中，沿栅线的输出近端至输出远端的方向，液晶层(13)的厚度逐渐减小。该显示面板的显示均一性显著提升。

Description

一种显示面板及显示装置
相关申请的交叉引用
本申请要求享有2017年4月24日提交的名称为“一种显示面板及显示装置”的中国专利申请CN201710269609.2的优先权，该申请的全部内容通过引用并入本文中。
技术领域
本发明属于显示技术领域，具体地说，尤其涉及一种显示面板及显示装置。
背景技术
在液晶显示装置进行画面显示时，每帧画面的切换是通过扫描线扫描的方式实现的。
由于扫描线由金属材料形成，金属材料具有电阻。随着传输距离的增大，扫描线上的电压会降低，这种现象称之为压降。如图1所示，随着像素A、像素B和像素C与栅线输入端距离的由近至远，压降由低至高。
具体的，现有液晶显示面板中的栅线压降表达式为：
Figure PCTCN2017084860-appb-000001
其中，ΔVp表示压降值，Cgs表示栅线与开关元件的源极/漏极之间的电容，Clc表示液晶电容，Cs表示存储电容，Vghl表示理想输入电压与实际输入电压的差值。
如图2所示为像素A、像素B和像素C的压降示意图，随着像素A、像素B和像素C与栅线GATE输入端的距离由近至远(即距离扫描信号驱动电路由近及远)，压降由低至高，即Va＜Vb＜Vc，其中，Va表示像素A的压降，ΔVa表示像素A馈通电压，Vb表示像素B的压降，ΔVb表示像素B馈通电压，Vc表示像素C的压降，ΔVc表示像素B馈通电压，Vgh表示栅线理想输入电压。由上述栅线压降表达式可知，ΔVp会造成靠近栅线输入端的画面较亮，远离栅线输入端的画面较暗，影响面板显示均一性。
发明内容
为解决以上问题，本发明提供了一种显示面板及显示装置，用以提升面板的显示均一性。
根据本发明的一个方面，提供了一种显示面板，包括：
阵列基板，其上平行设置有多条栅线；
彩膜基板；
液晶层，其设置于所述阵列基板和所述彩膜基板之间，
其中，沿所述栅线的输出近端至输出远端的方向，所述液晶层的厚度逐渐减小。
根据本发明的一个实施例，还包括间隙子，其设置于所述阵列基板和所述彩膜基板之间，其中，沿所述栅线的输出近端至输出远端的方向，所述间隙子的高度逐渐减小。
根据本发明的一个实施例，所述间隙子通过采用在预定透光位置设置有不同厚度铬膜的光罩照射负性光阻形成。
根据本发明的一个实施例，所述间隙子通过调整间隙子材料在所述彩膜基板上的预定位置的吐出量形成，或者所述间隙子通过调整用于喷射间隙子材料的喷嘴与所述彩膜基板上的预定位置的距离或喷嘴喷射间隙子材料的速度形成。
根据本发明的一个实施例，还包括黑矩阵，其设置于所述彩膜基板上，其中，沿所述栅线的输出近端至输出远端的方向，所述黑矩阵的厚度逐渐增大。
根据本发明的一个实施例，所述黑矩阵通过调整黑矩阵材料在所述彩膜基板上的预定位置的吐出量形成，或者通过调整用于喷射黑矩阵材料的喷嘴与所述彩膜基板上的预定位置的距离或喷嘴喷射黑矩阵材料的速度形成。
根据本发明的一个实施例，还包括分别设置于所述阵列基板靠近所述液晶层一侧的第一取向层和所述彩膜基板靠近所述液晶层的一侧的第二取向层，
其中，沿所述栅线的输出近端至输出远端的方向，所述第一取向层或所述第二取向层的厚度逐渐增大。
根据本发明的一个实施例，所述第一取向层/所述第二取向层通过采用设置有不同大小孔洞的印刷版将取向材料转印在所述阵列基板/所述彩膜基板上形成。
根据本发明的一个实施例，沿所述栅线的输出近端至输出远端的方向，所述印刷版上的孔洞逐渐减小。
根据本发明的另一个方面，还提供了一种显示装置，包括以上所述的显示面板。
本发明的有益效果：
本发明通过沿栅线的输出近端至输出远端的方向，将液晶层的厚度设置为逐渐减小，可以使得扫描信号沿栅线的输出近端至输出远端的方向压降一致，进而使得面板各处输出的电压均匀，提升面板显示的均一性。
本发明的其他优点、目标，和特征在某种程度上将在随后的说明书中进行阐述，并且在某种程度上，基于对下文的考察研究对本领域技术人员而言将是显而易见的，或者可以从本发明的实践中得到教导。本发明的目标和其他优点可以通过下面的说明书，权利要求书，以及附图中所特别指出的结构来实现和获得。
附图说明
附图用来提供对本申请的技术方案或现有技术的进一步理解，并且构成说明书的一部分。其中，表达本申请实施例的附图与本申请的实施例一起用于解释本申请的技术方案，但并不构成对本申请技术方案的限制。
图1是现有技术中的一种阵列基板布线示意图；
图2是对应图1的各像素驱动电压波形示意图；
图3是根据本发明的一个实施例的显示面板结构示意图；
图4是根据本发明的一个实施例的光罩结构及对应的间隙子高度渐变示意图；
图5是根据本发明的一个实施例的彩膜基板上的黑矩阵结构示意图；
图6是根据本发明的一个实施例的彩膜基板侧或阵列基板侧的取向层结构示意图；
图7是根据本发明的一个实施例的采用印刷版转印取向材料的示意图；
图8是根据本发明的一个实施例的印刷版孔洞示意图；
图9是根据本发明的一个实施例的印刷版孔洞渐变示意图。
具体实施方式
以下将结合附图及实施例来详细说明本发明的实施方式，借此对本发明如何应用技术手段来解决技术问题，并达成相应技术效果的实现过程能充分理解并据以实施。本申请实施例以及实施例中的各个特征，在不相冲突前提下可以相互结 合，所形成的技术方案均在本发明的保护范围之内。
如图3所示，本发明提供了一种显示面板，包括阵列基板11、彩膜基板12和液晶层13。阵列基板11上平行设置有多条栅线(未示出)。液晶层13设置于阵列基板11和彩膜基板12之间。其中，沿栅线的输出近端至输出远端的方向(箭头标注方向，即距离扫描信号驱动电路由近及远方向)，液晶层的厚度逐渐减小。
在液晶显示面板中，可以将阵列基板和彩膜基板之间的液晶层等效为一个液晶电容。由栅线压降表达式可知，液晶电容Clc影响压降ΔVp。在其他参数取值不变情况下，液晶电容Clc越大，压降ΔVp越小。由于液晶电容Clc＝介电常数*电极间面积/电极间距离。也就是说，液晶电容的两个电极之间距离越大，则压降ΔVp越大，反之，压降ΔVp越小。因此，沿栅线的输出端近端至远端的方向，液晶电容的两个电极之间的距离逐渐减小，可以使得压降ΔVp沿栅线的输出端近端至远端的方向逐渐降低。这样，通过调整液晶电容的两个电极之间的距离(即液晶层的厚度)可以使得栅线的输出近端至输出远端的ΔVp趋于一致，使得面板各处输出的电压均匀，提升面板显示的均一性。
在本发明的一个实施例中，该显示面板还包括间隙子。该间隙子设置于阵列基板和彩膜基板之间。其中，沿栅线的输出近端至输出远端的方向，间隙子的高度逐渐减小。具体的，通常将间隙子设置于阵列基板和彩膜基板之间，并固定在彩膜基板一侧，用作支撑部件，以保持阵列基板和彩膜基板之间的距离不变。但是，在本发明中，沿栅线的输出端近端至远端的方向，间隙子121的高度逐渐减小，则使得阵列基板和彩膜基板之间的距离沿栅线的输出端近端至远端的方向逐渐减小，使得液晶层的厚度沿栅线的输出近端至输出远端的方向逐渐减小，如图4所示。
在本发明的一个实施例中，该间隙子通过采用在预定透光位置设置有不同厚度铬膜的光罩照射负性光阻形成。具体的，可以采用如图4所示的光罩21照射负性光阻来形成沿栅线的输出近端至输出远端的方向高度逐渐减小的间隙子121，如图4所示。在本发明中采用负性光阻材料来形成间隙子，负性光阻材料经曝光处理后，感光部分与未感光部分的溶解性具有明显差别。未感光部分光阻材料可以溶解掉，留下感光部分光阻材料作为间隙子。其中，光罩21上的预定透光位置对应感光部分的光阻材料。该预定透光位置设置有不同厚度的铬膜，不同厚度的铬膜的透光量不同，并且铬膜厚度越大透过的光越少。
在形成高度最大的间隙子时，该对应位置的铬膜厚度可以设置为最薄，或者不设置有铬膜(如图4所示)。然后沿栅线的输出近端至输出远端的方向，铬膜厚度依次增加。这样曝光出的间隙子靠近栅线输出近端高度最大，输出远端间隙子高度最小，最终的间隙子高度排布如图4所示。
在本发明的一个实施例中，该间隙子通过调整间隙子材料在彩膜基板上的预定位置的吐出量形成，或者间隙子通过调整用于喷射间隙子材料的喷嘴与彩膜基板上的预定位置的距离或喷嘴喷射间隙子材料的速度形成。具体的，在彩膜基板12上的预定位置涂布间隙子材料时，通过调整间隙子的吐出量，在靠近栅线的输出近端时吐出较多，最终成形的间隙子高度较高。在远离栅线输出近端时吐出量较少，最终成形的间隙子高度如图4所示。或者，在彩膜基板上的预定位置涂布间隙子材料时，通过调整涂布喷嘴与玻璃基板之间的距离或喷嘴喷射间隙子材料的速度，在靠近栅线输出近端时，距离较近或速度较慢，间隙子高度较高。在远离栅线输出近端时，距离较远或速度较小，间隙子高度较小，最终成形的间隙子高度如图4所示。
由于间隙子是用于支撑阵列基板和彩膜基板的，为保持阵列基板和彩膜基板之间的距离恒定，沿栅线的输出近端至输出远端的方向的两个端点的两个间隙子的高度差设置为不大于0.2μm，以防止影响面板画面显示。
在本发明的一个实施例中，该显示面板还包括黑矩阵。该黑矩阵设置于彩膜基板上，其中，沿栅线的输出近端至输出远端的方向，黑矩阵的厚度逐渐减小。黑矩阵一般设置在彩膜基板上，用于区隔彩膜基板上的各色阻层，并避免光电流产生。同时，间隙子也通常设置在黑矩阵上。在本发明中，沿栅线的输出近端至输出远端的方向，将黑矩阵122的厚度设置为逐渐增大，如图5所示。这样，可以使得液晶层的厚度沿栅线的输出近端至输出远端的方向逐渐增大，来使得液晶层的厚度沿栅线的输出近端至输出远端的方向逐渐减小。
在本发明的一个实施例中，该黑矩阵通过调整黑矩阵材料在彩膜基板上的预定位置的吐出量形成，或者通过调整用于喷射黑矩阵材料的喷嘴与彩膜基板上的预定位置的距离或喷嘴喷射黑矩阵材料的速度形成。具体的，可以采用涂布间隙子材料的方法来形成厚度逐渐变化的黑矩阵，此处不加详述。
在本发明的一个实施例中，该显示面板还包括阵列基板靠近液晶层一侧的第一取向层和彩膜基板靠近液晶层的一侧的第二取向层。其中，沿栅线的输出近端至输出远端的方向，第一取向层或第二取向层的厚度逐渐增大。在液晶显示面板 中，通常分别在阵列基板和彩膜基板靠近液晶层的一侧各设置有一取向层123，用于对液晶层中的液晶分子进行定向取向。在本发明中，如图6所示，沿栅线的输出近端至输出远端的方向，将第一取向层的厚度或第二取向层的厚度设置为逐渐增大。取向层123的厚度越大时，则液晶的盒厚越少，进而可以使得液晶层的厚度沿栅线的输出近端至输出远端的方向逐渐减小。当然，也可以沿栅线的输出近端至输出远端的方向，将第一取向层的厚度和第二取向层的厚度同时设置为逐渐增大，本发明不限于此。
在本发明的一个实施例中，第一取向层或第二取向层通过采用设置有不同大小孔洞的印刷版将取向材料转印在阵列基板/彩膜基板上形成。通常采用APR版作为印刷版31设置在滚筒上，并将取向材料转印在阵列基板/彩膜基板上，如图7所示。APR版为一种以紫外线固化聚氨酯类树脂为原料的凸板，其表面具有孔洞，如图8所示。孔洞之间会填满取向层材料溶液，孔洞较大，则孔洞之间容纳的溶液较少；孔洞较小，则孔洞之间容纳的溶液较多。将取向层材料形成的溶液涂到APR版上，通过转印技术可以将取向层材料溶液涂布至阵列基板和彩膜基板上。
在本发明的一个实施例中，沿栅线的输出近端至输出远端的方向，印刷版上的孔洞逐渐减小。具体的，如图9所示，沿栅线的输出近端至输出远端的方向，靠近栅线的输出近端孔洞较大，容纳的取向层材料溶液较少，取向层厚度较小。靠近栅线的输出远端孔洞较小，容纳的取向层材料溶液较多，取向层厚度较大。
根据本发明的另一个方面，还提供了一种显示装置，包括以上所述的显示面板。具体的，该显示面板包括阵列基板、彩膜基板和液晶层。阵列基板上平行设置有多条栅线，液晶层设置于阵列基板和彩膜基板之间。沿栅线的输出近端至输出远端的方向，液晶层的厚度逐渐减小。
在本发明的一个实施例中，该显示面板还包括包括间隙子，间隙子设置于阵列基板和彩膜基板之间。沿栅线的输出近端至输出远端的方向，间隙子的高度逐渐减小。
在本发明的一个实施例中，该显示面板还包括黑矩阵，其设置于彩膜基板上。沿栅线的输出近端至输出远端的方向，黑矩阵的厚度逐渐减小。
在本发明的一个实施例中，该显示面板还包括分别设置于阵列基板靠近液晶层一侧的第一取向层和彩膜基板靠近液晶层的一侧的第二取向层。其中，沿栅线的输出近端至输出远端的方向，第一取向层或第二取向层的厚度逐渐增大。
虽然本发明所公开的实施方式如上，但所述的内容只是为了便于理解本发明而采用的实施方式，并非用以限定本发明。任何本发明所属技术领域内的技术人员，在不脱离本发明所公开的精神和范围的前提下，可以在实施的形式上及细节上作任何的修改与变化，但本发明的专利保护范围，仍须以所附的权利要求书所界定的范围为准。

Claims (18)

  1. 一种显示面板，包括：
    阵列基板，其上平行设置有多条栅线；
    彩膜基板；
    液晶层，其设置于所述阵列基板和所述彩膜基板之间，
    其中，沿所述栅线的输出近端至输出远端的方向，所述液晶层的厚度逐渐减小。
  2. 根据权利要求1所述的显示面板，其中，还包括间隙子，其设置于所述阵列基板和所述彩膜基板之间，其中，沿所述栅线的输出近端至输出远端的方向，所述间隙子的高度逐渐减小。
  3. 根据权利要求2所述的显示面板，其中，所述间隙子通过采用在预定透光位置设置有不同厚度铬膜的光罩照射负性光阻形成。
  4. 根据权利要求2所述的显示面板，其中，所述间隙子通过调整间隙子材料在所述彩膜基板上的预定位置的吐出量形成，或者所述间隙子通过调整用于喷射间隙子材料的喷嘴与所述彩膜基板上的预定位置的距离或喷嘴喷射间隙子材料的速度形成。
  5. 根据权利要求1所述的显示面板，其中，还包括黑矩阵，其设置于所述彩膜基板上，其中，沿所述栅线的输出近端至输出远端的方向，所述黑矩阵的厚度逐渐增大。
  6. 根据权利要求5所述的显示面板，其中，所述黑矩阵通过调整黑矩阵材料在所述彩膜基板上的预定位置的吐出量形成，或者通过调整用于喷射黑矩阵材料的喷嘴与所述彩膜基板上的预定位置的距离或喷嘴喷射黑矩阵材料的速度形成。
  7. 根据权利要求1所述的显示面板，其中，还包括分别设置于所述阵列基板靠近所述液晶层一侧的第一取向层和所述彩膜基板靠近所述液晶层的一侧的第二取向层，
    其中，沿所述栅线的输出近端至输出远端的方向，所述第一取向层或所述第二取向层的厚度逐渐增大。
  8. 根据权利要求7所述的显示面板，其中，所述第一取向层/所述第二取向层通过采用设置有不同大小孔洞的印刷版将取向材料转印在所述阵列基板/所述彩膜基板上形成。
  9. 根据权利要求8所述的显示面板，其中，沿所述栅线的输出近端至输出远端的方向，所述印刷版上的孔洞逐渐减小。
  10. 一种显示装置，包括显示面板，所述显示面板包括：
    阵列基板，其上平行设置有多条栅线；
    彩膜基板；
    液晶层，其设置于所述阵列基板和所述彩膜基板之间，
    其中，沿所述栅线的输出近端至输出远端的方向，所述液晶层的厚度逐渐减小。
  11. 根据权利要求10所述的显示装置，其中，还包括间隙子，其设置于所述阵列基板和所述彩膜基板之间，其中，沿所述栅线的输出近端至输出远端的方向，所述间隙子的高度逐渐减小。
  12. 根据权利要求11所述的显示装置，其中，所述间隙子通过采用在预定透光位置设置有不同厚度铬膜的光罩照射负性光阻形成。
  13. 根据权利要求11所述的显示装置，其中，所述间隙子通过调整间隙子材料在所述彩膜基板上的预定位置的吐出量形成，或者所述间隙子通过调整用于喷射间隙子材料的喷嘴与所述彩膜基板上的预定位置的距离或喷嘴喷射间隙子材料的速度形成。
  14. 根据权利要求10所述的显示装置，其中，还包括黑矩阵，其设置于所述彩膜基板上，其中，沿所述栅线的输出近端至输出远端的方向，所述黑矩阵的厚度逐渐增大。
  15. 根据权利要求14所述的显示装置，其中，所述黑矩阵通过调整黑矩阵材料在所述彩膜基板上的预定位置的吐出量形成，或者通过调整用于喷射黑矩阵材料的喷嘴与所述彩膜基板上的预定位置的距离或喷嘴喷射黑矩阵材料的速度形成。
  16. 根据权利要求10所述的显示装置，其中，还包括分别设置于所述阵列基板靠近所述液晶层一侧的第一取向层和所述彩膜基板靠近所述液晶层的一侧的第二取向层，
    其中，沿所述栅线的输出近端至输出远端的方向，所述第一取向层或所述第二取向层的厚度逐渐增大。
  17. 根据权利要求16所述的显示装置，其中，所述第一取向层/所述第二取向层通过采用设置有不同大小孔洞的印刷版将取向材料转印在所述阵列基板/所 述彩膜基板上形成。
  18. 根据权利要求17所述的显示装置，其中，沿所述栅线的输出近端至输出远端的方向，所述印刷版上的孔洞逐渐减小。
PCT/CN2017/084860 2017-04-24 2017-05-18 一种显示面板及显示装置 Ceased WO2018196059A1 (zh)

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