WO2018195893A1 - 液晶显示面板及其制造方法与应用的显示装置 - Google Patents

液晶显示面板及其制造方法与应用的显示装置 Download PDF

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Publication number
WO2018195893A1
WO2018195893A1 PCT/CN2017/082362 CN2017082362W WO2018195893A1 WO 2018195893 A1 WO2018195893 A1 WO 2018195893A1 CN 2017082362 W CN2017082362 W CN 2017082362W WO 2018195893 A1 WO2018195893 A1 WO 2018195893A1
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WIPO (PCT)
Prior art keywords
substrate
liquid crystal
display panel
crystal display
metal structure
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PCT/CN2017/082362
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English (en)
French (fr)
Inventor
陈猷仁
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HKC Co Ltd
Chongqing HKC Optoelectronics Technology Co Ltd
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HKC Co Ltd
Chongqing HKC Optoelectronics Technology Co Ltd
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Priority to US15/553,987 priority Critical patent/US20180307071A1/en
Publication of WO2018195893A1 publication Critical patent/WO2018195893A1/zh
Anticipated expiration legal-status Critical
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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/136209—Light shielding layers, e.g. black matrix, incorporated in the active matrix substrate, e.g. structurally associated with the switching element

Definitions

  • the present invention relates to an improved manner of a liquid crystal display panel common electrode designed by a color filter film process on a transistor array in the field of liquid crystal display technology, and particularly relates to a color filter film applied to a transistor array by an integrally formed structure of a black matrix and a pad layer.
  • Process design especially for a liquid crystal display panel and a display device thereof.
  • a TFT-LCD Thin Film Transistor-Liquid Crystal Display
  • CF Color Filter
  • TFT Thin Film Transistor
  • the liquid crystal (LC) and the sealant (Sealant) between the film substrate and the transistor array substrate are composed of a film.
  • Transistor array liquid crystal display In Plane Switch
  • vertical alignment Vertical Alignment
  • the in-plane switching mode is the liquid crystal horizontal alignment, and the liquid crystal molecules are rotated in the parallel state during operation.
  • Imaging vertical alignment mode is the vertical alignment of the liquid crystal.
  • the liquid crystal molecules are perpendicular to the two substrates of the screen.
  • the power is applied, the liquid crystal molecules fall down and form a certain angle with the substrate.
  • the common electrode signal of a generally vertical alignment mode liquid crystal cell needs to be guided from the second substrate to the common electrode of the first substrate by means of a transfer pad.
  • the common electrode needs to be formed before the integrally formed structure, so there is a risk of incomplete curing of the sealant at the transfer pad, and the common electrode of the first substrate and the second substrate cannot be formed. Conducted by indium tin oxide.
  • the technical problem to be solved by the present application is to provide a liquid crystal display panel, a display device thereof, and a display device thereof, which are applied to a vertical alignment mode liquid crystal display panel product having a color filter film technology on a transistor array to overcome
  • the common electrodes of the first substrate and the second substrate are incapable of being inactivated by indium tin oxide and incomplete curing of the sealant at the transfer pad.
  • a liquid crystal display panel comprising a first substrate and a second substrate, wherein a common electrode is disposed inside the first substrate, and the black matrix and the pad layer use the same type Material, in the same process, one Formed on the common electrode, which is the integrally formed structure, an inner side of the second substrate is provided with an adapter pad, and an integrally formed structure corresponding to the transfer pad on the first substrate has a hollow structure.
  • the integrally formed structure corresponding to the transfer pad has a light transmissive area and a light shielding area ratio of between 0.5 and 1.5.
  • the frame portion on the inner side of the second substrate is provided with a metal structure as an electrode contact, and is connected to the transfer pad above it.
  • the metal structure has a hollow structure, and a layout shape of the metal structure is complementary to a layout shape of the integrally formed structure in a frame portion, and the metal structure is provided with a blue color. Resistance, red resistance, or stacking blue and red resistance.
  • the present application further provides a liquid crystal display device including a backlight module and a display panel, wherein the display panel includes: a first substrate; a second substrate; a black matrix, including a solid portion, and the solid portion The adjacent hollow portions are disposed in parallel with the first substrate; a pad layer is disposed on the first substrate; wherein the black matrix hollow portions are equally spaced or unequal intervals, the black The light transmissive area and the light shielding area ratio of the matrix are between 0.5 and 1.5; a common electrode is sandwiched between the first substrate and the black matrix, and the hollow area of the black matrix exposes the common electrode
  • An adapter pad is disposed on the second substrate, the adapter pad includes: a metal structure including a solid portion, and a hollow portion adjacent to the solid portion, and is disposed in parallel spaced apart from the second substrate The spacing between the hollow portions of the metal structure may be equal or unequal spacing, and the ratio of the light transmissive area to the shading area of the metal structure is between 0.5 and 1.5.
  • the metal junction a solid portion of the black matrix, the solid portion of the black matrix encompassing a hollow portion of the metal structure; a color resist comprising a solid portion, and a hollow portion adjacent to the solid portion, disposed in parallel
  • the metal structure is included in the metal structure; wherein the spacing of the color-blocking hollow portions may be equal or unequal spacing, and the color resistance may be red resistance, blue resistance, or stacked red a resistance and a blue resistance, wherein the color resistance has a light transmissive area to a light shielding area ratio of between 0.5 and 1.5; and another common electrode is disposed on the second substrate and covers the solid portion of the color resistance And a hollow portion and a solid portion and a hollow portion of the metal structure; a sealant disposed between the first substrate and the second substrate and filling a hollow portion of the color resist, the metal structure a hollow portion and a hollow portion of the black matrix; a conductive gold ball interposed between the first substrate and the second substrate, the conductive gold ball being located on the solid portion of
  • the black matrix and the underlayer are integrally formed on the first substrate in the same process using the same material; wherein the integrally formed structure is located under the common electrode.
  • the integrally formed structure corresponding to the transfer pad is a hollow structure, and further, the integrated structure corresponding to the transfer pad has a light transmission area and a light shielding area ratio of 0.5. Between ⁇ 1.5.
  • the manufacturing method of the liquid crystal display panel further includes the following steps:
  • the metal structure has a hollow structure, and the layout shape of the metal structure is complementary to the layout shape of the integrally formed structure in the frame portion.
  • a blue resistance, a red resistance, or a blue resistance and a red resistance are arranged to compensate for the light leakage caused by the hollow portion of the integrally formed structure, and the optical density value is increased.
  • the application does not additionally increase the cost of the liquid crystal panel process, and can effectively prevent the risk of light leakage at the rear edge of the module.
  • FIG. 1 is a schematic structural view of a liquid crystal display panel of the present application.
  • FIG. 2 is a schematic structural view of a frame area of a liquid crystal display panel of the present application.
  • Figure 3a is a schematic view showing the shape of the hollow structure of the second substrate electrode contact metal piece.
  • Figure 3b is a schematic view showing the hollowed-out shape of the integrally formed structure of the first substrate in the frame portion.
  • Figure 3c is a schematic view of the second substrate bonded to the first substrate.
  • FIG. 4 is a schematic diagram showing the effect of a liquid crystal display panel including a backlight module.
  • FIG. 5 is a schematic view showing six embodiments of the integrally formed structure of the first substrate in the frame portion.
  • Figure 6a is a process flow diagram of the integrally formed structure of the first substrate.
  • Figure 6b is a process flow diagram of the second substrate transfer pad.
  • the word “comprising” is to be understood to include the component, but does not exclude any other component.
  • “on” means located above or below the target component, and does not mean that it must be on the top based on the direction of gravity.
  • the color resist includes a body portion and an extension portion
  • the color resistance in the display region is used to present a plurality of colors
  • the color resistance in the frame region includes a solid portion
  • the solid portion is adjacent to the solid portion.
  • the interval of the color-blocking hollow portion may be equidistant or unequal, and the ratio of the light-transmitting area to the light-shielding area is between 0.5 and 1.5 to compensate for the light leakage caused by the hollow portion of the integrally formed structure. , increase the optical density value.
  • the black matrix and the pad layer on the first substrate are integrally formed on the first substrate by the same material in the same process, thereby completing an integral molding structure;
  • the black matrix layer includes a solid portion, and a hollow portion adjacent to the solid portion, and the hollow portion of the black matrix may have an interval of equal or unequal spacing, and the ratio of the light transmissive area to the shading area is between 0.5 and 1.5. between.
  • FIG. 1 it is a schematic diagram of a liquid crystal display panel of the present application, as shown in FIG. 2 , which is a schematic structural diagram of a frame area of a liquid crystal display panel of the present application.
  • a liquid crystal display panel includes a first substrate 101 and a second substrate 107.
  • a common electrode 102 is disposed inside the first substrate 101, and the common electrode 102 is sandwiched between the first substrate 101 and the second substrate 107.
  • the integrally formed structure 103 which uses the same material for the black matrix and the underlayer, is integrally formed on the common electrode 102 by the same process, and the hollow portion of the black matrix
  • the common electrode 102 is exposed, and the integrally formed structure 103 has an opening design in the frame portion, and has a hollow structure, and the light transmission area and the light shielding area ratio are between 0.5 and 1.5, and the inner side of the second substrate 107 is provided with a common Electrode 102.
  • the liquid crystal display panel of the present application may be a curved liquid crystal display panel.
  • a metal structure 106 is disposed on a portion of the frame portion inside the second substrate 107.
  • the metal structure 106 is designed as an opening, and a hollow portion is present.
  • the metal structure 106 includes a solid portion, and a hollow portion adjacent to the solid portion, the hollow portions of the metal structure 106 may be equally spaced or unequal, and the layout shape of the metal structure 106 and the integrally formed structure 103 are
  • the layout shape of the frame portion is a complementary relationship.
  • the solid portion of the metal structure 106 covers the black moment.
  • the hollow portion of the array 103, the solid portion of the black matrix 103 encompasses the hollow portion of the metal structure 106.
  • the metal structure 106 is provided with a color resistance 105, which may be a blue resistance, a red resistance, or a stacked blue resistance and a red resistance.
  • the color resist 105 is included in the metal structure 106.
  • the color resist 105 is disposed to avoid light leakage caused by the opening design of the integrally formed structure 103 of the first substrate 101 in the frame portion.
  • the two substrate transfer pads are stacked by means of the color resistance 105 to compensate for the light leakage range and increase the optical density value.
  • the common electrode 102 and the color resist 105 and the metal structure 106 in the second substrate frame area are an adapter pad, and the common electrode 102 covers the physical part and the hollow part of the color resist 105 and The solid portion and the hollow portion of the metal structure 106.
  • the conductive gold ball 109 is located above the color resistance of the second substrate and is under the hollow portion of the integrally formed structure of the first substrate.
  • the conductive gold ball 109 is located above the solid portion of the color resist 105 and is embedded in the hollow portion of the black matrix 103.
  • the ultraviolet light 108 is selectively irradiated on the side of the transistor array substrate 107 to cure the sealant 104, wherein the sealant 104 fills the hollow structure of the color resist 105, the hollow portion of the metal structure 106 and the hollow of the black matrix 103 section.
  • this is an embodiment of the shape of the hollow portion of the second substrate metal structure.
  • FIG. 3b it is an embodiment in which the integrally formed structure of the first substrate is partially hollowed out in the frame portion.
  • FIG. 3c which is a schematic view of the second substrate of FIG. 3a combined with the first substrate of FIG. 3b, please refer to FIG. 3a and FIG. 3b simultaneously.
  • the first substrate is integrated.
  • the molding structure is complementarily combined with the metal portion of the second substrate in the frame portion, which compensates for the light leakage caused by the opening design of the integrally formed structure in the frame portion, and increases the optical density value.
  • FIG. 4 it is a schematic diagram of the effect of the liquid crystal display panel including the backlight module of the present application.
  • the frame area around the liquid crystal display panel adopts the integral molding structure of the present application, because the layout shape of the metal structure and the integrally formed structure
  • the layout shape of the frame portion is complementary, which saves the process and reduces the cost on the one hand, and also compensates for the light leakage caused by the hollow portion of the frame portion in the integrally formed structure.
  • FIG. 5 is a schematic view showing six hollow shapes of the integrally formed structure in the frame region according to an embodiment of the present application.
  • the integrated molding structure includes the following embodiments in addition to the central annular structure:
  • the integrally formed structure is a mesh structure.
  • the integrally formed structure is a fan-shaped structure.
  • the integrally formed structure is an interlaced checkerboard structure.
  • the integrally formed structure is an interdigitated sawtooth structure.
  • the integrally formed structure is a circular mesh structure.
  • the hollow structure of the integrally formed structure is a regular light-transmissive shape, and the ratio of the light-transmitting area to the light-shielding area is between 0.5 and 1.5, and the design of the hollow portion can be designed according to the design. Subject to the needs of personnel, there is no restriction.
  • the present application is a process design for applying the integrally formed structure to an RGB or WRGB matrix, especially for a vertical alignment mode.
  • Liquid crystal display panel Since the black matrix and the underlayer use the same material and the same process, the common electrode process of the color filter substrate is adjusted from the black matrix process to the black matrix process. At the common electrode contact of the external circuit, due to the adjustment of the common electrode process of the color filter substrate, correspondingly, the corresponding transfer pad on the frame area of the integrally formed structure needs to be structurally adjusted, and the integrally formed structure is in the frame portion.
  • the shape is designed to be a regular shape that is partially transparent.
  • the metal layout shape corresponding to the second substrate is complementary to the layout shape of the integrally formed structure in the frame portion. At the same time, it is possible to avoid light leakage, and the light leakage stack can be compensated by the color resist stack at the second substrate transfer pad.
  • the present application further provides a liquid crystal display device including a liquid crystal display panel according to any one of the embodiments of FIG. 1 to FIG. 3 in addition to the backlight module.
  • the present invention relates to a method of fabricating a liquid crystal display panel, including the process steps of the first substrate as shown in FIG. 6a:
  • Step S101 laying a common electrode, laying a layer of indium tin oxide as a common electrode on the inner side of the first substrate;
  • Step S102 Laying a black matrix and a pad layer, the black matrix and the pad layer are integrally formed on the first substrate by the same process using the same material.
  • the integrally formed structure is a hollow structure in the frame portion, and the light transmissive area and the light shielding area ratio are between 0.5 and 1.5 and are located under the common electrode.
  • Step S201 connecting the metal structure to the transfer pad, and providing a metal structure on the inner side of the second substrate when the electrode contact is connected to the transfer pad;
  • Step S202 setting a color resistance on the metal structure, setting a blue resistance, a red resistance, or stacking a blue resistance and a red resistance on the metal structure;
  • the metal structure has a hollow structure, and the layout shape of the metal structure is complementary to the layout shape of the integrally formed structure in the frame portion, and the light transmission area and the light shielding area ratio of the metal structure are between 0.5 and 1.5. .

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Abstract

公开了一种液晶显示面板及其制造方法与应用的显示装置。该液晶显示面板包括第一基板（101）和第二基板（107），第一基板（101）内侧设置有公共电极（102），黑矩阵和垫层使用同一种材料，一体成型在公共电极（102）上，第二基板（107）内侧设有转接垫，与转接垫对应的一体成型结构（103）存在镂空结构。在第二基板内侧设有金属结构（106）当电极接点与转接垫连接。金属结构（106）的布局形状与一体成型结构（103）在边框区部分的布局形状为互补关系。

Description

液晶显示面板及其制造方法与应用的显示装置 技术领域
本申请涉及液晶显示器技术领域应用了晶体管阵列上的彩色滤光膜工艺设计的液晶显示面板公共电极的改良方式，尤其涉及黑矩阵和垫层的一体成型结构应用于晶体管阵列上的彩色滤光膜工艺设计，特别针对一种液晶显示面板及其制造方法与应用的显示装置。
背景技术
晶体管阵列液晶显示器(TFT-LCD，Thin Film Transistor-Liquid Crystal Display)由第一基板-彩膜基板(CF，Color Filter)、第二基板-晶体管阵列基板(TFT，Thin Film Transistor)、夹于彩膜基板与晶体管阵列基板之间的液晶(LC，Liquid Crystal)及封框胶(Sealant)组成。
晶体管阵列液晶显示器分面内切换(IPS，In Plane Switch)和垂直配向(VA，Vertical Alignment)两种显示模式：面内切换模式是液晶水平配向，工作时液晶分子在和平行状态下旋转方式显示成像；垂直配向模式是液晶垂直配向，不加电压时液晶分子垂直于屏的两块基板，加电时液晶分子倒下和基板成一定角度。
现在，在晶体管阵列上的彩色滤光膜(COA，Color on Array)技术因具有高穿透低成本的优势，成为各家厂商开发技术主流。延续晶体管阵列上的彩色滤光膜设计，在节省工艺成本上，也有厂商开发黑矩阵(BM，Black Matrix)和垫层(PS，Photo Spacer)一体成型的材料。不过此型材料光学浓度值低，局部地方需借助色阻堆叠的效果来帮助遮光。
但所述一体成型结构应用在具有晶体管阵列上的彩色滤光膜技术的垂直配向模式液晶显示面板产品时，仍存在一些待克服的问题。一般垂直配向模式液晶盒的公共电极信号需要借助转接垫(Transfer Pad)将信号由第二基板导至第一基板的公共电极。但在所述一体成型结构应用上，需要将公共电极做在所述一体成型结构之前，因此转接垫处有框胶固化不完全的风险，并造成第一基板与第二基板的公共电极无法藉由氧化铟锡导通。
发明内容
本申请要解决的技术问题是：提供一种液晶显示面板及其制造方法与应用的显示装置，其应用在具有晶体管阵列上的彩色滤光膜技术的垂直配向模式液晶显示面板产品上，以克服第一基板与第二基板的公共电极无法藉由氧化铟锡导通以及转接垫处框胶固化不完全的缺陷。
为解决上述技术问题，本申请采用的技术方案是：一种液晶显示面板，包括第一基板和第二基板，其中，所述第一基板内侧设置有公共电极，黑矩阵和垫层使用同一种材料，以同一道工艺，一 体成型在所述公共电极上，其为所述一体成型结构，所述第二基板内侧设有转接垫，与转接垫对应的位于所述第一基板的一体成型结构存在镂空结构。
在本申请的一实施例中，与转接垫对应的所述一体成型结构，其透光面积与遮光面积比介于0.5～1.5之间。
在本申请的一实施例中，在第二基板内侧的边框区部分设有金属结构当电极接点，与在其上方的转接垫连接。
在本申请的一实施例中，所述金属结构存在镂空结构，所述金属结构的布局形状与所述一体成型结构在边框区部分的布局形状为互补关系，所述金属结构上设有蓝色阻，红色阻，或者堆叠蓝色阻和红色阻。
本申请更提供一种液晶显示装置，包括一背光模块和一显示面板，其中，所述显示面板包括：一第一基板；一第二基板；一黑矩阵，包括实体部分，以及与实体部分相邻的镂空部分，平行间隔配置于所述第一基板；一垫层，设置于所述第一基板上；其中，所述黑矩阵镂空部分的间隔可为等间距或不等间距，所述黑矩阵的透光面积与遮光面积比介于0.5～1.5之间；一公共电极，夹设于所述第一基板和所述黑矩阵之间，所述黑矩阵的镂空区域暴露出所述公共电极；一转接垫，设置于所述第二基板上，所述转接垫包括包括：一金属结构，包括实体部分，以及与实体部分相邻的镂空部分，平行间隔配置于所述第二基板上；其中，所述金属结构镂空部分的间隔可为等间距或不等间距，所述金属结构的透光面积与遮光面积比介于0.5～1.5之间，优选的，所述金属结构的实体部分涵盖所述黑矩阵的镂空部分，所述黑矩阵的实体部分涵盖所述金属结构的镂空部分；一色阻，包括实体部分，以及与实体部分相邻的镂空部分，平行配置于所述金属结构上，并涵盖于所述金属结构之内；其中，所述色阻镂空部分的间隔可为等间距或不等间距，所述色阻可为红色阻，蓝色阻，或是堆叠红色阻和蓝色阻，所述色阻的透光面积与遮光面积比介于0.5～1.5之间；一另一公共电极，设置于所述第二基板上，并覆盖所述色阻的实体部分和镂空部分以及所述金属结构的实体部分和镂空部分；一框胶，设置于所述第一基板和所述第二基板之间，并填充所述色阻的镂空部分，所述金属结构的镂空部分以及所述黑矩阵的镂空部分；一导电金球，夹设于所述第一基板和所述第二基板之间，所述导电金球位于所述色阻实体部分之上，并嵌入所述黑矩阵的镂空部分。
为解决上述技术问题，本申请采用的另一种技术方案为一种液晶显示面板的制造方法，包括如下步骤：
提供第一基板及第二基板；
形成液晶层于所述第一基板及所述第二基板之间；
第一基板内侧铺设公共电极；
黑矩阵和垫层使用同一种材料，以同一道工艺，一体成型在所述第一基板；其中，所述一体成型结构位于公共电极之下。
在本申请的一实施例中，所述与转接垫对应的一体成型结构为镂空结构，进一步的，所述与转接垫对应的一体成型结构，其透光面积与遮光面积比介于0.5～1.5之间。
在本申请的一实施例中，所述液晶显示面板的制造方法还包括以下步骤：
在所述第二基板内侧的边框区部分设置金属结构当电极接点与所述转接垫连接；
在所述金属结构上设置蓝色阻，红色阻，或者堆叠蓝色阻和红色阻；
在本申请的一实施例中，所述金属结构存在镂空结构，所述金属结构的布局形状与所述一体成型结构在边框区部分的布局形状为互补关系。
黑矩阵和垫层使用同一种材料可简化彩膜工艺流程，但其应用于垂直配向液晶显示面板在液晶面板段工艺的公共电极接点处，则需做结构上的改变，在第二基板的金属上设置蓝色阻、红色阻，或者堆叠蓝色阻和红色阻，以弥补所述一体成型结构镂空部分所致的漏光可能，提高光学浓度值。
有益效果
本申请在工艺流程上，不额外增加液晶面板工艺上成本，且能有效预防模组后边缘漏光的风险。
附图说明
图1本申请的液晶显示面板结构示意图。
图2本申请的液晶显示面板边框区结构示意图。
图3a第二基板电极接点金属片的镂空结构形状的示意图。
图3b第一基板所述一体成型结构在边框区部分镂空形状的示意图。
图3c第二基板与第一基板结合的的示意图。
图4本申请含背光模块的液晶显示面板效果示意图。
图5第一基板所述一体成型结构在边框区部分镂空形状的六个实施例示意图。
图6a第一基板所述一体成型结构的工艺流程图。
图6b第二基板转接垫的工艺流程图。
本发明的实施方式
以下各实施例的说明是参考附加的图式，用以例示本申请可用以实施的特定实施例。本申请所提到的方向用语，例如「上」、「下」、「前」、「后」、「左」、「右」、「内」、「外」、「侧面」等，仅是参考附加图式的方向。因此，使用的方向用语是用以说明及理解本申请，而非用以限制本申请。
附图和说明被认为在本质上是示出性的，而不是限制性的。在图中，结构相似的单元是以相同标号表示。另外，为了理解和便于描述，附图中示出的每个组件的尺寸和厚度是任意示出的，但是 本申请不限于此。
在附图中，为了清晰起见，夸大了层、膜、面板、区域等的厚度。在附图中，为了理解和便于描述，夸大了一些层和区域的厚度。将理解的是，当例如层、膜、区域或基底的组件被称作“在”另一组件“上”时，所述组件可以直接在所述另一组件上，或者也可以存在中间组件。
另外，在说明书中，除非明确地描述为相反的，否则词语“包括”将被理解为意指包括所述组件，但是不排除任何其它组件。此外，在说明书中，“在......上”意指位于目标组件上方或者下方，而不意指必须位于基于重力方向的顶部上。
为更进一步阐述本申请为达成预定目的所采取的技术手段及功效，以下结合附图及较佳实施例，对本申请提出的一种液晶显示面板及其制造方法与应用的显示装置，其具体实施方式、结构、特征以及功效，详细说明如后。
在本申请的一实施例中，所述色阻包括主体部和延长部，位于显示区的色阻用于呈现多种颜色，位于边框区的色阻包括实体部分，以及与实体部分相邻的镂空部分，所述色阻镂空部分的间隔可为等间距或不等间距，其透光面积与遮光面积比介于0.5～1.5之间，以弥补所述一体成型结构镂空部分所致的漏光可能，提高光学浓度值。
在本申请的一实施例中，位于第一基板的所述黑矩阵和垫层使用同一种材料，以同一道工艺，一体成型在第一基板，以此完成一一体成型结构；其中，所述黑矩阵层包括实体部分，以及与实体部分相邻的镂空部分，所述黑矩阵的镂空部分的间隔可为等间距或不等间距，其透光面积与遮光面积比介于0.5～1.5之间。
如图1所示，其为本申请的液晶显示面板示意图，如图2所示，其为本申请的液晶显示面板边框区的具体结构示意图。请同时参考图1和图2，一种液晶显示面板，其包括：第一基板101和第二基板107，第一基板101内侧设置有公共电极102，所述公共电极102夹设于所述第一基板101和所述黑矩阵之间，所述一体成型结构103，其为黑矩阵和垫层使用同一种材料，以同一道工艺，一体成型在公共电极102上，所述黑矩阵的镂空部分暴露出所述公共电极102，所述一体成型结构103在边框区部分做开口设计，存在镂空结构，其透光面积与遮光面积比介于0.5～1.5之间，第二基板107内侧设有公共电极102。
在一实施例中，本申请的液晶显示面板可为一曲面型液晶显示面板。
在第二基板107内侧的边框区部分设有金属结构106当电极接点与转接垫连接，金属结构106做开口设计，存在镂空部分。所述金属结构106包括实体部分，以及与实体部分相邻的镂空部分，所述金属结构106的镂空部分可为等间距或不等间距，金属结构106的布局形状与所述一体成型结构103在边框区部分的布局形状为互补关系，优选的，所述金属结构106的实体部分涵盖所述黑矩 阵103的镂空部分，所述黑矩阵103的实体部分涵盖所述金属结构106的镂空部分。金属结构106上设有色阻105，可为蓝色阻、红色阻，或者堆叠蓝色阻和红色阻。所述色阻105涵盖于所述金属结构106之内，设置色阻105是为了避免因位于第一基板101的所述一体成型结构103在边框区部分做开口设计所致的漏光可能，在第二基板转接垫处借助色阻105堆叠，来弥补漏光范围，提高光学浓度值。其中，位于第二基板边框区的所述公共电极102和所述色阻105以及所述金属结构106为一转接垫，所述公共电极102覆盖所述色阻105的实体部分和镂空部分以及所述金属结构106的实体部分和镂空部分。导电金球109位于第二基板色阻的上面，并处于第一基板所述一体成型结构镂空部分的下面。优选的，所述导电金球109位于所述色阻105实体部分之上，并嵌入所述黑矩阵103的镂空部分。此外，紫外线108选择在晶体管阵列基板107侧照射，固化框胶104，其中所述框胶104填充所述色阻105的镂空结构，所述金属结构106的镂空部分以及所述黑矩阵103的镂空部分。
如图3a所示，其为第二基板金属结构镂空部分形状的一实施例。
如图3b所示，其为第一基板所述一体成型结构在边框区部分镂空形状的一实施例。
如图3c所示，其为图3a的第二基板与图3b的第一基板结合的示意图，请同时参考图3a和图3b，在本申请的一实施例中，所述第一基板的一体成型结构在边框区部分与第二基板的金属部分互补结合，弥补了所述一体成型结构在边框区部分做开口设计所致的漏光可能，提高光学浓度值。
如图4所示，其为本申请含背光模块的液晶显示面板效果示意图，液晶显示面板四周的边框区部分采用本申请的一体成型结构，因所述金属结构的布局形状与所述一体成型结构在边框区部分的布局形状为互补关系，一方面在工艺上节省工序，降低成本，另一方面也弥补了所述一体成型结构在边框区部分的镂空部分所致的漏光可能。
图5为本申请一实施例的所述一体成型结构在边框区部分镂空形状的六个示意图，所述一体成型结构除了中心环形结构外，更包括以下实施例：
在本申请的一实施例中，所述一体成型结构为网状结构。
在本申请的一实施例中，所述一体成型结构为扇形结构。
在本申请的一实施例中，所述一体成型结构为交错棋盘结构。
在本申请的一实施例中，所述一体成型结构为交错锯齿结构。
在本申请的一实施例中，所述一体成型结构为圆形网状结构。
在本申请的一实施例中，所述一体成型结构的镂空结构为规则状的透光形状，其透光面积与遮光面积比均介于0.5～1.5之间，镂空部分的设计造型可根据设计人员的需求而定，不加以限制。
本申请是将所述一体成型结构应用于RGB或WRGB矩阵的工艺设计，特别针对垂直配向模 式的液晶显示面板。由于黑矩阵和垫层使用同一种材料和同一道工艺，因此将彩膜基板的公共电极工艺由黑矩阵工艺后调整至黑矩阵工艺前。在外部电路公共电极接点处因彩膜基板的公共电极工艺调整，相应的，需将所述一体成型结构边框区上对应的转接垫处做结构调整，将所述一体成型结构在边框区部分的形状设计成局部透光的规则形状。相对应第二基板的金属布局形状与所述一体成型结构在边框区部分的布局形状为互补关系。同时避免漏光可能，在第二基板转接垫处借助色阻堆叠来弥补漏光范围。
本申请更提供一种液晶显示装置，除包括背光模块外，还包括图1至图3中任意一项所述实施方案的液晶显示面板。
因此，本申请一种液晶显示面板的制造方法，包括如图6a所示的第一基板的工艺流程步骤：
步骤S101：铺设公共电极，在第一基板的内侧铺设一层氧化铟锡作为公共电极；
步骤S102：铺设黑矩阵和垫层，黑矩阵和垫层使用同一种材料，以同一道工艺，一体成型在第一基板。
优选的，所述一体成型结构在边框区部分为镂空结构，其透光面积与遮光面积比介于0.5～1.5之间并位于公共电极之下。
还包括如图6b所示的第二基板的工艺流程步骤：
步骤S201：设置金属结构与转接垫连接，在第二基板内侧设置金属结构当电极接点与转接垫连接；
步骤S202：金属结构上设置色阻，在金属结构上设置蓝色阻，红色阻，或者堆叠蓝色阻和红色阻；
优选的，所述金属结构存在镂空结构，金属结构的布局形状与所述一体成型结构在边框区部分的布局形状为互补关系，金属结构的透光面积与遮光面积比介于0.5～1.5之间。
以上所述实施例仅是为充分说明本申请而所举的较佳的实施例，本申请的保护范围不限于此。本技术领域的技术人员在本申请基础上所作的等同替代或变换，均在本申请的保护范围之内。本申请的保护范围以权利要求书为准。

Claims (16)

  1. 一种液晶显示面板，包括：
    一第一基板；
    一第二基板，与所述第一基板相对设置；
    一液晶层，夹设于所述第一基板与所述第二基板之间；
    一框胶，设置于所述第一基板与所述第二基板；
    其中，所述第一基板内侧设置有公共电极，黑矩阵和垫层使用同一种材料，以同一道工艺，一体成型在所述第一基板，其为一体成型结构，所述一体成型结构位于所述公共电极之下。
  2. 如权利要求1所述的液晶显示面板，其中所述一体成型结构为镂空结构，其透光面积与遮光面积比介于0.5～1.5之间。
  3. 如权利要求1所述的液晶显示面板，其中所述第二基板内侧设有一金属结构当电极接点。
  4. 如权利要求3所述的液晶显示面板，其中所述金属结构与其上方的转接垫连接。
  5. 如权利要求3所述的液晶显示面板，其中所述金属结构存在镂空结构。
  6. 如权利要求3所述的液晶显示面板，其中所述金属结构的布局形状与所述一体成型结构在边框区部分的布局形状为互补关系。
  7. 如权利要求3所述的液晶显示面板，其中所述金属结构上设有蓝色阻或红色阻，或堆叠蓝色阻和红色阻。
  8. 如权利要求3所述的液晶显示面板，其中所述金属结构的透光面积与遮光面积比介于0.5～1.5之间。
  9. 一种液晶显示面板的制造方法，包括：
    提供第一基板及第二基板；
    形成液晶层于所述第一基板及所述第二基板之间；
    其中，所述第一基板工艺流程包括如下步骤：
    所述第一基板内侧铺设公共电极；
    黑矩阵和垫层铺设在所述公共电极上；
    优选的，所述黑矩阵和所述垫层使用同一种材料，以同一道工艺，一体成型在所述第一基板上。
  10. 如权利要求9所述的液晶显示面板的制造方法，其中所述一体成型结构位于公共电极之下，并与所述第二基板的转接垫相对应。
  11. 如权利要求9所述的液晶显示面板的制造方法，其中所述与转接垫对应的一体成型结构为镂空结构。
  12. 如权利要求9所述的液晶显示面板的制造方法，其中所述一体成型结构的透光面积与遮光面积比介于0.5～1.5之间。
  13. 如权利要求9所述的液晶显示面板的制造方法，其中所述第二基板的转接垫工艺流程包括以下步骤：
    在所述第二基板内侧的边框区部分设置金属结构当电极接点与转接垫连接；
    在所述金属结构上设置蓝色阻，红色阻，或者蓝色阻和红色阻。
  14. 如权利要求13所述的液晶显示面板的制造方法，其中所述金属结构存在镂空结构。
  15. 如权利要求13所述的液晶显示面板的制造方法，其中所述金属结构的布局形状与所述一体成型结构在边框区部分的布局形状为互补关系。
  16. 一种液晶显示装置，包括一背光模块和一显示面板，其中，所述显示面板包括：
    一第一基板；
    一第二基板；
    一黑矩阵，包括实体部分，以及与实体部分相邻的镂空部分，平行间隔配置于所述第一基板；
    一垫层，设置于所述第一基板上；
    其中，所述黑矩阵镂空部分的间隔可为等间距或不等间距，所述黑矩阵的透光面积与遮光面积比介于0.5～1.5之间；
    一公共电极，夹设于所述第一基板和所述黑矩阵之间，所述黑矩阵的镂空区域暴露出所述公共电极；
    一转接垫，设置于所述第二基板上，包括：
    一金属结构，包括实体部分，以及与实体部分相邻的镂空部分，平行间隔配置于所述第二基板上；
    其中，所述金属结构镂空部分的间隔可为等间距或不等间距，所述金属结构的透光面积与遮光面积比介于0.5～1.5之间，优选的，所述金属结构的实体部分涵盖所述黑矩阵的镂空部分，所述黑矩阵的实体部分涵盖所述金属结构的镂空部分；
    一色阻，包括实体部分，以及与实体部分相邻的镂空部分，平行配置于所述金属结构上，并涵盖于所述金属结构之内；
    其中，所述色阻镂空部分的间隔可为等间距或不等间距，所述色阻可为红色阻，蓝色阻，或是堆叠红色阻和蓝色阻，所述色阻的透光面积与遮光面积比介于0.5～1.5之间；
    一另一公共电极，设置于所述第二基板上，并覆盖所述色阻的实体部分和镂空部分以及所述金属结构的实体部分和镂空部分；
    一框胶，设置于所述第一基板和所述第二基板之间，并填充所述色阻的镂空部分，所述金属结构的镂空部分以及所述黑矩阵的镂空部分；
    一导电金球，夹设于所述第一基板和所述第二基板之间，所述导电金球位于所述色阻实体部分之上，并嵌入所述黑矩阵的镂空部分。
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CN108732834B (zh) * 2018-05-25 2021-06-18 上海中航光电子有限公司 显示面板和显示装置
WO2020056837A1 (zh) * 2018-09-20 2020-03-26 惠科股份有限公司 显示面板及显示装置
CN108957871A (zh) * 2018-09-20 2018-12-07 惠科股份有限公司 显示面板及显示装置
CN109407423A (zh) 2018-11-29 2019-03-01 武汉华星光电技术有限公司 液晶显示面板
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