WO2018171022A1 - 一种显示面板及制造方法和显示装置 - Google Patents

一种显示面板及制造方法和显示装置 Download PDF

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Publication number
WO2018171022A1
WO2018171022A1 PCT/CN2017/084118 CN2017084118W WO2018171022A1 WO 2018171022 A1 WO2018171022 A1 WO 2018171022A1 CN 2017084118 W CN2017084118 W CN 2017084118W WO 2018171022 A1 WO2018171022 A1 WO 2018171022A1
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Prior art keywords
layer
display panel
composite photoresist
color
composite
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PCT/CN2017/084118
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English (en)
French (fr)
Inventor
简重光
Original Assignee
惠科股份有限公司
重庆惠科金渝光电科技有限公司
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Priority to US15/744,792 priority Critical patent/US10725357B2/en
Publication of WO2018171022A1 publication Critical patent/WO2018171022A1/zh

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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/1368—Active matrix addressed cells in which the switching element is a three-electrode device
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/133345—Insulating layers
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
    • H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body
    • H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
    • H01L27/1248—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs with a particular composition or shape of the interlayer dielectric specially adapted to the circuit arrangement
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
    • H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body
    • H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
    • H01L27/1259—Multistep manufacturing methods
    • H01L27/1288—Multistep manufacturing methods employing particular masking sequences or specially adapted masks, e.g. half-tone mask
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/136222—Colour filters incorporated in the active matrix substrate

Definitions

  • the present application relates to the field of display technologies, and more particularly to a display panel, a manufacturing method, and a display device.
  • the display has many advantages such as thin body, power saving, no radiation, and has been widely used.
  • Most of the displays on the market today are backlight-type displays, which include a display panel and a backlight module.
  • the working principle of the display panel is to place liquid crystal molecules in two parallel substrates, and apply driving voltages on the two substrates to control the rotation direction of the liquid crystal molecules to refract the light of the backlight module to generate a picture.
  • the thin film transistor display includes a display panel and a backlight module, and the display panel includes a color filter substrate (CF Substrate, also referred to as a color filter substrate) and a thin film transistor array substrate (Thin Film Transistor Substrate, TFT Substrate).
  • CF Substrate also referred to as a color filter substrate
  • TFT Substrate thin film transistor array substrate
  • a transparent electrode exists on the opposite inner side of the substrate.
  • a layer of liquid crystal molecules (LC) is sandwiched between the two substrates.
  • the display panel controls the orientation of the liquid crystal molecules by an electric field, changes the polarization state of the light, and achieves the purpose of display by the penetration and blocking of the optical path by the polarizing plate.
  • the protective layer of chemical vapor deposition is required before the production of the color photoresist layer, thereby protecting the structure already completed on the display panel, so that the manufacturing process of the display panel is very complicated, and the display panel is further improved. Manufacturing costs.
  • the technical problem to be solved by the present application is to provide a display panel that effectively reduces the number of processes.
  • the present application also provides a method of manufacturing a display panel.
  • a display panel comprising:
  • Active switch disposed on the substrate
  • the active switch is provided with a composite photoresist layer having dielectric characteristics, and the composite photoresist layer is disposed on the active switch.
  • the composite photoresist layer is made of a composite photoresist material, and the composite photoresist material is at least one passivation layer and at least one color layer.
  • the composite photoresist material of the multilayer structure is formed by at least one passivation layer and at least one color layer composite stack, so that the photoresist material has the dielectric properties required for the protective layer material, and also has color. All the RGB colors of the photoresist material ensure that the composite photoresist material can be applied to the display panel very well, which can replace the protective layer material and the color photoresist layer material very effectively and effectively, which can effectively simplify the production of the display panel.
  • the process is beneficial to reduce the process of the display panel, reduce the production time of the display panel, further improve the production efficiency of the display panel, and can greatly reduce the production cost of the display panel, and further improve the market competitiveness of the display panel.
  • the passivation layer and the color layer are each provided with a layer, and the passivation layer is stacked with the color layer.
  • the passivation layer has the dielectric properties required for the protective layer material
  • the color layer has all the RGB colors of the color photoresist material, and the color material is used.
  • Different R/G/B monochromatic colors can be generated, and the passivation layer and the color layer are stacked, which can effectively simplify the production process of the display panel, reduce the process of the display panel, and reduce the production time of the display panel. Further improve the production efficiency of the display panel.
  • the passivation layer is provided with two layers, the color layer is provided with one layer, and the color layer is disposed between two layers of the passivation layer.
  • the passivation layer is provided with two layers
  • the color layer is provided with one layer
  • the color layer is disposed between two layers of the passivation layer.
  • the present application further discloses a method for manufacturing a display panel, the display panel comprising a substrate and an active switch disposed on the substrate, comprising:
  • a composite photoresist layer covering the active switch is obtained by a photomask process.
  • the composite photoresist layer of the display panel can be well fabricated by a simple mask process, and the protective layer and the RBG colored photoresist layer can be completed at one time, and the composite photoresist layer can be Very good and effective alternative layer material and color photoresist layer material, the composite photoresist material with dielectric properties is overlaid on the active switch, which can effectively simplify the production process of the display panel and help reduce the process of the display panel. Reduce the production time of the display panel and further improve the production efficiency of the display panel.
  • the composite photoresist material comprises a passivation layer and a layer of color material
  • the manufacturing step of the composite photoresist material comprises:
  • a two-layer composite photoresist material is obtained by a photocuring process and a thermal reaction process.
  • the passivation material is added to the lower layer of the polymer material, and the color material is added to the upper layer of the polymer material, and the chemical reaction between the double-layer polymer structure and the additive material can be caused by the photo-curing process and the thermal reaction process, and the RGB color
  • the layer is determined by the color material; the lower layer of the polymer material to which the passivation material is added after passivation becomes a non-conductive polymer layer having an insulating effect, and the upper layer of the polymer material to which the color material is added becomes an RGB color.
  • the polymer layer is obtained to obtain a stacked double-layer composite photoresist material, and the manufacturing process is very convenient and simple, and is advantageous for large-scale production of composite photoresist materials, thereby further reducing production costs.
  • the composite photoresist material comprises two layers of a passivation layer and a layer of a color material, and the manufacturing steps of the composite photoresist material comprises:
  • a three-layer composite photoresist material is obtained by a photocuring process and a thermal reaction process.
  • the passivation material is added to the lower layer and the lower layer of the polymer material, and the color material is added to the middle layer of the polymer material, and the chemical reaction of the three-layer polymer structure and the additive is caused by the photo-curing process and the thermal reaction process.
  • the RGB color layer is determined by the color material, and the manufacturing process is very convenient and simple, which is favorable for the production of large-scale composite photoresist materials and further reduces the production cost.
  • the step of fabricating the composite photoresist material comprises:
  • a layer of structured composite photoresist material is obtained by a photocuring process and a thermal reaction process.
  • a mixture of a passivation material and a color material is added to the polymer material, and a photo-curing process and a thermal reaction process can cause a chemical reaction between the polymer structure and the additive, and the RGB color layer is determined by the color material. It is effective to obtain a composite photoresist material that obtains a layer structure.
  • the step of obtaining a composite photoresist layer covering the active switch by using a mask process includes:
  • the photosensitive material is disposed on the composite photoresist material, and the photosensitive material is exposed and developed through the mask process to obtain the desired pattern of the composite photoresist layer, and then the composite photoresist material is etched by using an etching solution, thereby It is very convenient and simple to obtain the composite photoresist layer, and the photoresist material remaining on the composite photoresist layer is removed by the cleaning solution, which facilitates the subsequent process of the display panel, and then performs other processes on the composite photoresist layer, thereby enabling Very convenient to make display panels.
  • the present application also discloses a display device including the display panel as described above.
  • the present application can very well replace the process of forming a protective layer by chemical vapor deposition of SiNx in a color film array substrate product process, which can greatly optimize and reduce the process of the display panel.
  • the number makes the display panel more convenient to be produced, which is beneficial to reducing the process of the display panel, further reducing the production time of the display panel, and better improving the production efficiency of the display panel; eliminating the formation of chemical vapor deposition sputtering SiNx
  • the process of the protective layer can greatly reduce the production cost of the display panel, further enhance the market competitiveness of the display panel; and the composite photoresist layer has RGB color, which can replace the color photoresist layer very well, and can replace the chemical required to be used.
  • the trouble of vapor deposition/etching process requires only a simple yellow light process, and the protective layer and the RBG colored photoresist layer can be completed in one time, so that the setting of the composite photoresist layer is very convenient and simple, and the display panel can be simplified very well.
  • the production process is better for the production efficiency of the display panel.
  • FIG. 1 is a schematic cross-sectional view of a display panel designed by the inventor of the embodiment of the present application;
  • FIG. 2 is a cross-sectional view of a display panel according to another embodiment of the present application.
  • FIG. 3 is a schematic cross-sectional view of a display panel according to another embodiment of the present application.
  • FIG. 4 is a cross-sectional view of a display panel according to another embodiment of the present application.
  • FIG. 5 is a flowchart of a method for manufacturing a display panel according to an embodiment of the present application.
  • FIG. 6 is a schematic view showing a manufacturing method of a two-layer composite photoresist material according to an embodiment of the present application
  • FIG. 7 is a flow chart of a method for fabricating a two-layer composite photoresist material according to an embodiment of the present application.
  • FIG. 8 is a schematic view showing a manufacturing method of a three-layer composite photoresist material according to an embodiment of the present application.
  • FIG. 9 is a flow chart of a method for fabricating a three-layer composite photoresist material according to an embodiment of the present application.
  • FIG. 10 is a schematic view showing a manufacturing method of a one-layer composite photoresist material according to an embodiment of the present application
  • FIG. 11 is a flow chart of a method for fabricating a one-layer composite photoresist material according to an embodiment of the present application
  • FIG. 12 is a flowchart of a method of manufacturing a display panel according to an embodiment of the present application.
  • first and second are used for descriptive purposes only and are not to be construed as indicating or implying a relative importance or implicitly indicating the number of technical features indicated. Thus, features defining “first” and “second” may include one or more of the features either explicitly or implicitly.
  • a plurality means two or more unless otherwise stated.
  • the term “comprises” and its variations are intended to cover a non-exclusive inclusion.
  • connection In the description of the present application, it should be noted that the terms “installation”, “connected”, and “connected” are to be understood broadly, and may be fixed or detachable, for example, unless otherwise specifically defined and defined. Connected, or integrally connected; can be mechanical or electrical; can be directly connected, or indirectly connected through an intermediate medium, can be the internal communication of the two components.
  • Connected, or integrally connected can be mechanical or electrical; can be directly connected, or indirectly connected through an intermediate medium, can be the internal communication of the two components.
  • the specific meanings of the above terms in the present application can be understood on a case-by-case basis.
  • the display panel includes a substrate 1, an active switch 2, and a color photoresist layer 5.
  • the active switch 2 is disposed on the substrate 1, and the active switch 2 and the colored light
  • a protective layer 6 is disposed between the resist layers 5, and the protective layer 6 is disposed on the active switch 2.
  • the protective layer 6 can effectively prevent the direct corrosion of the metal layer of the active switch 2 of the liquid crystal panel by the cleaning agent, so that the metal layer of the active switch 2 can be kept intact, thereby avoiding the problem of disconnection and improving the yield of the display panel and reducing the yield.
  • the scraping cost; and the side of the metal layer of the active switch 2 has a metal burr from the viewpoint of the microstructure, and the protective layer 6 can better cover the metal burr on the metal layer of the active switch 2, which is very effective.
  • the metal burr is prevented from being exposed outside the protective layer 6, so that the protective layer 6 can better protect the metal layer of the active switch 2, further improving the display effect of the display panel, and the product competitiveness is better improved.
  • the inventors have further found that the existing product process uses the protective layer 6 to effectively prevent the developer (KOH solution) in the pattern process of the color resist layer 5 from damaging the metal layer of the active switch 2, but the setting of the protective layer 6 It needs to be produced by CVD (Chemical Vapor Deposition) process, the production steps are complicated, and the input cost is high. Therefore, the inventors have provided a new technical solution that can effectively reduce the number of process display panels.
  • CVD Chemical Vapor Deposition
  • the display panel includes: a substrate 1; an active switch 2, the active switch 2 is disposed on the substrate 1; the active switch 2 is provided with a composite photoresist layer 3 having dielectric characteristics, and the composite photoresist layer 3 is disposed on the cover The active switch 2 is on.
  • the composite photoresist layer 3 Since the composite photoresist layer 3 has very good dielectric properties, it can replace the formation of SiNx by chemical vapor deposition (CVD) in a color filter on Array (COA) product process.
  • the process of the protective layer 6 can greatly optimize and reduce the number of processes of the display panel, so that the display panel can be more conveniently produced, which is advantageous for reducing the process of the display panel, further reducing the production time of the display panel, and better improving the display.
  • the production cost further enhances the market competitiveness of the display panel; and the composite photoresist layer 3 has RGB color, which can replace the color photoresist layer 5 very well, which can replace the trouble of using the CVD/Etching process, and requires only simple
  • the yellow light process can complete the protective layer 6 and the RBG colored photoresist layer in one time, which makes the setting of the composite photoresist layer 3 very convenient and simple, can simplify the production process of the display panel, and better display the panel.
  • the composite photoresist layer 3 is made of a composite photoresist material 31.
  • the composite photoresist material 31 is at least one passivation layer 32 and at least one color layer 33. Forming a multi-layered composite photoresist material 31 by at least one passivation layer 32 and at least one color layer 33, so that the photoresist material has the dielectric properties required for the protective layer 6 material, and With all the RGB colors of the color photoresist material, the composite photoresist material 31 can be applied to the display panel very well, which can replace the protective layer material and the color photoresist layer material very effectively and effectively, and will have dielectric properties.
  • the composite photoresist material 31 is disposed on the active switch 2, and the composite photoresist layer 3 can be formed very well by performing a simple yellow light process, which is very effective in replacing the protective layer 6 and the RBG colored photoresist layer, which can effectively
  • the simplified production process of the display panel is beneficial to reducing the process of the display panel, reducing the production time of the display panel, further improving the production efficiency of the display panel, and greatly reducing the production cost of the display panel, and further improving the display panel.
  • Market Competitiveness is beneficial to reducing the process of the display panel, reducing the production time of the display panel, further improving the production efficiency of the display panel, and greatly reducing the production cost of the display panel, and further improving the display panel.
  • a passivation layer 32 and a color layer 33 are each provided with a layer, and a passivation layer 32 and a color layer 33 are stacked.
  • the passivation layer 32 is provided with the dielectric properties required for the material of the protective layer 6, and the color layer 33 has all the RGB colors of the color resist material, and the color Different materials can be used to produce different R/G/B monochromatic colors.
  • the passivation layer 32 and the color layer 33 are stacked, the passivation layer 32 is disposed on the lower layer, and the color layer 33 is disposed on the upper layer to composite light.
  • the resistive material 31 is laid on the active switch 2, and the composite photoresist layer 3 can be formed very well by performing a simple yellow light process, which is an effective alternative to the protective layer 6 and the RBG colored photoresist layer, which can effectively simplify the display.
  • the production process of the panel is beneficial to reducing the process of the display panel, reducing the production time of the display panel, and further improving the production efficiency of the display panel; the passivation layer 32 can effectively protect the active switch 2, and can effectively avoid subsequent The source of the cleaning agent to the active switch 2 in the process
  • the direct etching of the pole 21 and the drain 22 enables the source 21 and the drain 22 to remain intact, thereby reducing the problem of disconnection, effectively reducing the cost of scrapping, thereby improving the quality of the display panel; and the source 21 of the active switch 2
  • the drain electrode 22 is made of a metal material, and the sides of the source electrode 21 and the drain electrode 22 have metal burrs from the viewpoint of the microstructure, and the passivation layer 32 can better perform the source
  • the passivation layer 32 is provided in two layers, the color layer 33 is provided in one layer, and the color layer 33 is disposed between the two passivation layers 32.
  • a passivation layer 32 and a color material layer 33 are stacked by providing two passivation layers 32 and one color layer 33 and a color layer 33 between the two passivation layers 32. It is provided that the composite photoresist material 31 is laid on the active switch 2, and the composite photoresist layer 3 can be formed very well by performing a simple yellow light process, and the color material layer 33 is disposed on the two passivation layer 32.
  • the color layer 33 can be protected very well, effectively preventing the subsequent process from releasing the harmful organic gas of the organic material of the color layer 33, thereby realizing effective protection of the display panel and increasing its efficiency and life;
  • the composite photoresist material 31 is laid on the active switch 2, and the composite photoresist layer 3 can be formed very well by performing a simple yellow light process, which is very effective in replacing the protective layer 6 and the RBG colored photoresist layer, which can effectively
  • the simplified production process of the display panel is beneficial to reducing the process of the display panel, reducing the production time of the display panel, and further improving the production efficiency of the display panel; and the passivation layer 32 can effectively be active.
  • the protection of the switch 2 is very effective to avoid direct corrosion of the source 21 and the drain 22 of the active switch 2 by the cleaning agent in the subsequent process, so that the source 21 and the drain 22 can be kept intact, thereby reducing the problem of disconnection and effectively
  • the quality of the display panel is improved by reducing the scrapping cost, and the composite photoresist layer 3 is provided with a window 7 at a position opposite to the source 21 and the drain 22.
  • the composite photoresist material 31 is formed by a mixture of a passivation material and a color material.
  • the composite photoresist layer 3 can be formed very well, which is a very good substitute for color.
  • the process of forming a protective layer 6 by chemical vapor deposition of SiNx in a film array substrate product process can greatly optimize and reduce the number of processes of the display panel, so that the display panel can be more conveniently produced, which is advantageous for reducing the process of the display panel.
  • the present application further discloses a method for manufacturing a display panel.
  • the display panel includes a substrate 1 and an active switch 2 disposed on the substrate 1.
  • the method includes the following steps:
  • the composite photoresist layer 3 of the display panel can be well fabricated by a simple mask process, and the protective layer 6 and the RBG colored photoresist layer can be completed at one time, and the composite photoresist layer 3 can be completed.
  • the protective layer material and the color photoresist layer material can be replaced very effectively and effectively, and the composite photoresist material 31 having dielectric properties is overlaid on the active switch 2, which can effectively simplify the production process of the display panel and facilitate display reduction.
  • the process of the panel reduces the production time of the display panel, further improves the production efficiency of the display panel; and because the composite photoresist layer 3 has very good dielectric properties, it can replace the color filter array (Color Filter On Array) very well.
  • COA product process requires chemical vapor deposition (CVD) to deposit SiNx to form protective layer 6, which can optimize and reduce the number of processes of display panel, making display panel more convenient to produce. Conducive to reducing the process of the display panel, further reducing the production time of the display panel, and better improving the life of the display panel Production efficiency; eliminating the process of CVD sputtering SiNx to form the protective layer 6, can greatly reduce the production cost of the display panel, further enhance the market competitiveness of the display panel; and the composite photoresist layer 3 has RGB color, which can be very A good alternative color photoresist layer 5 can replace the trouble of using a CVD/Etching process, and only requires a simple yellow light process to complete the protective layer 6 and the RBG colored photoresist layer in one time, so that the composite photoresist layer 3
  • the setting is very convenient and simple, which can simplify the production process of the display panel and improve the production efficiency of the display panel. At the same time, the production cost of the display panel can be reduced very well, and
  • the composite photoresist material 31 includes a passivation layer 32 and a color layer 33.
  • the manufacturing steps of the composite photoresist material 31 include:
  • a composite photoresist material having a two-layer structure is obtained by a photocuring process and a thermal reaction process.
  • the polymer material is polymethyl methacrylate (PMMA), polystyrene (PS), polyethylene terephthalate (PET), polycarbonate (PC), polyacrylate (PAR) or Any one of transparent epoxy resins; a passivation material 321 is added to the lower layer of the polymer material 4, and a color material 331 is added to the upper layer of the polymer material 4, and the passivation material 321 is a transparent resin, SiO2 or SiNx.
  • PMMA polymethyl methacrylate
  • PS polystyrene
  • PET polyethylene terephthalate
  • PC polycarbonate
  • PAR polyacrylate
  • any one of the colorants 331 selected from any one of red, green, blue, yellow, cyan, and white pigments;
  • the red pigment is selected from the group consisting of lanthanide, quinacridone, and pyrrolopyrrolone or a plurality of;
  • the yellow pigment is selected from one or more of an azo group, an azo condensation type, and a heterocyclic ring;
  • the green pigment is selected from the group consisting of a disazo condensate, a metal complex, and a hydrazine.
  • the blue pigment is selected from the group consisting of hydroxyhydroquinones and/or indigo; through a photocuring process and a thermal reaction process, a chemical reaction between the two-layer polymer structure and the additive may be caused, and the RGB color layer is Determined by the color material 331; the lower layer of the polymer material 4 to which the passivation material 321 is added after passivation becomes non-conductive In the polymer layer of the edge effect, the upper layer of the polymer material 4 to which the color material 331 is added becomes a polymer layer of RGB color, thereby obtaining a stacked two-layer composite photoresist material 31, and the manufacturing process is very convenient and simple.
  • the obtained composite photoresist material 31 is covered on the active switch 2, and the composite photoresist material 31 is subjected to two etching processes through
  • the reaction selectivity of the etching solution is respectively etched the passivation layer 32 or the color layer 33 to form a composite photoresist layer 3;
  • the passivation layer 32 can effectively protect the active switch 2, which can effectively avoid subsequent processes.
  • the direct cleaning of the source 21 and the drain 22 of the active switch 2 by the cleaning agent enables the source 21 and the drain 22 to remain intact, thereby reducing the problem of disconnection, effectively reducing the cost of scrapping, and thereby improving the quality of the display panel.
  • the source 21 and the drain 22 of the active switch 2 are made of a metal material, and the sides of the source 21 and the drain 22 have metal burrs from the micro structure, and the passivation layer 32 can Good source electrode 21 and drain electrode 22 protection, effectively prevent the subsequent influence produced Cheng Duiyuan electrode 21 and the drain 22, so that a very good yield improvement of the display panel.
  • the composite photoresist material 31 includes two passivation layers 32 and a layer of color material.
  • the layer 33, the manufacturing step of the composite photoresist material 31 includes:
  • a three-layer composite photoresist material is obtained by a photocuring process and a thermal reaction process.
  • the passivation material 321 is added to the lower layer and the lower layer of the polymer material 4, and the color material 331 is added to the middle layer of the polymer material 4, and the three-layer polymer structure and the additive are caused by the photo-curing process and the thermal reaction process.
  • the chemical reaction, the RGB color layer is determined by the color material 331; the lower layer and the upper layer of the polymer material 4 to which the passivation material 321 is added after passivation become a non-conductive polymer layer having an insulating effect, and a color material 331 is added.
  • the middle layer of the polymer material 4 becomes a polymer layer of RGB color, thereby obtaining a stacked three-layer composite photoresist material 31, which is very convenient and simple to manufacture, and is advantageous for performing large-scale composite photoresist material 31.
  • Production further reducing the production cost; laying the obtained three-layer composite photoresist material 31 on the active switch 2, performing a three-etching process on the composite photoresist material 31 through a simple yellow light process, and transmitting the etching solution
  • the selective reaction selectively etches the passivation layer 32 or the color layer 33 to form the composite photoresist layer 3 very well.
  • the color layer 33 is disposed between the two passivation layers 32.
  • the color layer 33 is often protected to effectively prevent the subsequent process from releasing the harmful organic gases in the organic material of the color layer 33, thereby effectively protecting the display panel, increasing the efficiency and life thereof;
  • the layer 32 can effectively protect the active switch 2, and can effectively prevent the direct corrosion of the source 21 and the drain 22 of the active switch 2 by the cleaning agent in the subsequent process, so that the source 21 and the drain 22 can be kept intact. Thereby reducing the problem of disconnection, effectively reducing the cost of scrapping, and thereby improving the quality of the display panel.
  • the manufacturing steps of the composite photoresist material 31 include:
  • S42 obtaining a one-layer composite photoresist material by using a photo-curing process and a thermal reaction process.
  • a mixture of the passivation material 321 and the color material 331 is added to the polymer material 4, and a chemical reaction between the polymer structure and the additive is caused by the photocuring process and the thermal reaction process, and the RGB color layer is formed. Then, determined by the color material 331, the composite photoresist material 31 having a structure obtained is effectively obtained; the obtained composite photoresist material 31 of the one layer structure is laid on the active switch 2, and the composite is performed by performing a simple yellow light process.
  • the photoresist material 31 is subjected to an etching process, and the passivation layer 32 or the color layer 33 is separately etched by the reaction selectivity of the etching solution, so that the composite photoresist layer 3 can be formed very well, and the active switch 2 can be effectively performed.
  • the protection can effectively prevent the direct corrosion of the source 21 and the drain 22 of the active switch 2 by the cleaning agent in the subsequent process, so that the source 21 and the drain 22 can be kept intact, thereby reducing the problem of disconnection, and effectively Reduce the cost of scrapping and improve the quality of the display panel.
  • the step of obtaining the composite photoresist layer 3 covering the active switch 2 by using a mask process includes:
  • the photosensitive material is disposed on the composite photoresist material 31, and the photosensitive material is exposed and developed by a mask process to obtain a desired pattern of the composite photoresist layer 3, and then the composite photoresist material 31 is etched by using an etching solution, thereby
  • the composite photoresist layer 3 can be obtained very conveniently and simply, and the photoresist material remaining on the composite photoresist layer 3 is removed by the cleaning liquid, which facilitates the subsequent process of the display panel, and then performs other operations on the composite photoresist layer 3.
  • the process can make the display panel very conveniently; the setting of the composite photoresist layer 3 can greatly optimize and reduce the number of processes of the display panel, so that the display panel can be more conveniently produced, which is beneficial to reducing the process of the display panel. Further reducing the production time of the display panel, and better improving the production efficiency of the display panel; eliminating the process of forming the protective layer 6 by CVD sputtering SiNx, can greatly reduce the production cost of the display panel, and further improve the display panel. Market competitiveness; and the composite photoresist layer 3 has RGB color, which can replace the color photoresist layer 5 very well.
  • the present application further discloses a display device, which includes the above display panel.
  • the specific structure and connection relationship of the display panel can be further omitted from FIG. 1 to FIG. .
  • the material of the substrate 1 may be glass, plastic or the like.
  • the display panel includes a liquid crystal panel, a plasma panel, and the like.
  • the liquid crystal panel includes an array substrate and a color filter substrate (CF), and the array substrate is disposed opposite to the color filter substrate, and the array substrate A liquid crystal and a photo spacer (PS) are disposed between the color filter substrate, and a thin film transistor (TFT) is disposed on the array substrate, and a color filter layer is disposed on the color filter substrate.
  • CF color filter substrate
  • PS photo spacer
  • TFT thin film transistor
  • the color filter substrate may include a TFT array
  • the color film and the TFT array may be formed on the same substrate
  • the array substrate may include a color filter layer
  • the display panel of the present application may be a curved type panel.

Abstract

一种显示面板，包括：基板（1）；设置在基板（1）上的主动开关（2）；主动开关（2）上设置有具有介电特性的复合光阻层（3），复合光阻层（3）覆盖设在主动开关（2）上，能够优化并减少显示面板的制程数目。

Description

一种显示面板及制造方法和显示装置 【技术领域】
本申请涉及显示技术领域，更具体的说，涉及一种显示面板及制造方法和显示装置。
【背景技术】
显示器具有机身薄、省电、无辐射等众多优点，得到了广泛的应用。现有市场上的显示器大部分为背光型显示器，其包括显示面板及背光模组(backlight module)。显示面板的工作原理是在两片平行的基板当中放置液晶分子，并在两片基板上施加驱动电压来控制液晶分子的旋转方向，以将背光模组的光线折射出来产生画面。
其中，薄膜晶体管显示器(Thin Film Transistor-Liquid Crystal Display，TFT-LCD)由于具有低的功耗、优异的画面品质以及较高的生产良率等性能，目前已经逐渐占据了显示领域的主导地位。同样，薄膜晶体管显示器包含显示面板和背光模组，显示面板包括彩膜基板(Color Filter Substrate，CF Substrate，也称彩色滤光片基板)和薄膜晶体管阵列基板(Thin Film Transistor Substrate，TFT Substrate)，上述基板的相对内侧存在透明电极。两片基板之间夹一层液晶分子(Liquid Crystal，LC)。显示面板是通过电场对液晶分子取向的控制，改变光的偏振状态，并藉由偏光板实现光路的穿透与阻挡，实现显示的目的。
目前显示面板行业中，彩色光阻层的制作之前需要进行化学气相沉积设置保护层，进而保护显示面板上已经做好的结构，至使显示面板的制程步骤非常的繁杂，进一步的提升了显示面板的制造成本。
【发明内容】
本申请所要解决的技术问题是提供一种有效减少制程数的显示面板。
此外，本申请还提供一种显示面板的制造方法。
本申请的目的是通过以下技术方案来实现的：
一种显示面板，所述显示面板包括：
基板；
主动开关，设置在基板上；
所述主动开关上设置有具有介电特性的复合光阻层，所述复合光阻层覆盖设在所述主动开关上。
其中，所述复合光阻层采用复合光阻材料制成，所述复合光阻材料为至少一层钝化料层和至少一层颜色料层。这样，通过至少一层钝化料层和至少一层颜色料层复合堆叠形成多层结构的复合光阻材料，使得符合光阻材料同时具备保护层材料所需的介电特性，而且还具有彩色光阻材料所有的RGB颜色，保证复合光阻材料能够非常好的被应用到显示面板的制作，能够非常好有效的替代保护层材料和彩色光阻层材料，这样能够有效的简化显示面板的生产流程，有利于减少显示面板的工序，减少显示面板的生产时间，进一步的提高显示面板的生产效率；而且能够非常好的减少显示面板的生产成本，进一步的提升显示面板的市场竞争力。
其中，所述钝化料层和所述颜色料层均设置一层，所述钝化料层与所述颜色料层堆叠设置。这样，通过将钝化料层和颜色料层各设置一层，钝化料层具备保护层材料所需的介电特性，颜色料层具有彩色光阻材料所有的RGB颜色，而且颜色料使用的不同可以产生不同的R/G/B单色，将钝化料层和颜色料层堆叠设置，能够有效的简化显示面板的生产流程，有利于减少显示面板的工序，减少显示面板的生产时间，进一步的提高显示面板的生产效率。
其中，所述钝化料层设置两层，所述颜色料层设置一层，所述颜色料层设在两层所述钝化料层之间。这样，通过将设置两层钝化料层和一层颜色料层，并将颜色料层设在两层钝化料层之间，这样形成一个钝化料层和颜色料层堆叠设置，将复合光阻材料铺设在主动开关上，通过进行简单的黄光制程，就可以非常好的形成复合光阻层，将颜色料层设在两层钝化料层之间，能够非常好的 对颜色料层进行保护，有效的防止后续制程使颜色料层的有机材料释放出一些有害杂质气体，从而实现对显示面板的有效保护，增加其效率及寿命。
根据本申请的另一个方面，本申请还公开了一种显示面板的制造方法，所述显示面板包括基板和设在基板上的主动开关，包括步骤：
在主动开关上设置复合光阻材料；
采用光罩制程获得覆盖所述主动开关的复合光阻层。
这样，采用这种方法，只需要简单的光罩制程就能够很好的进行显示面板的复合光阻层的制作，即可一次性的完成保护层与RBG有色光阻层，复合光阻层能够非常好有效的替代保护层材料和彩色光阻层材料，将具有介电特性的复合光阻材料覆盖设在主动开关上，这样能够有效的简化显示面板的生产流程，有利于减少显示面板的工序，减少显示面板的生产时间，进一步的提高显示面板的生产效率。
其中，所述复合光阻材料包括一层钝化料层和一层颜色料层，所述复合光阻材料的制作步骤包括：
在高分子材料的下层添加钝化料；
在高分子材料的上层添加颜色料；
采用光固化工艺和热反应制程获得双层结构的复合光阻材料。
这样，将钝化料添加到高分子材料的下层，将颜色料添加到高分子材料的上层，通过光固化工艺和热反应制程，可造成双层高分子结构与添加料的化学反应，RGB颜色层则由颜色料决定；钝化后的添加有钝化料的高分子材料的下层则变成不导电具有绝缘效果之高分子层，添加有颜色料的高分子材料的上层则变成RGB颜色之高分子层，从而获得堆叠的双层结构的复合光阻材料，制作过程非常的方便简单，有利于进行大规模的复合光阻材料的生产，进一步的减少生产成本。
其中，所述复合光阻材料包括两层钝化料层和一层颜色料层，所述复合光阻材料的制作步骤包括：
在高分子材料的下层添加钝化料；
在高分子材料的中层添加颜色料；
在高分子材料的上层添加钝化料；
采用光固化工艺和热反应制程获得三层结构的复合光阻材料。
这样，将钝化料添加到高分子材料的下层和下层，将颜色料添加到高分子材料的中层层，通过光固化工艺和热反应制程，可造成三层高分子结构与添加料的化学反应，RGB颜色层则由颜色料决定，制作过程非常的方便简单，有利于进行大规模的复合光阻材料的生产，进一步的减少生产成本。
其中，所述复合光阻材料的制作步骤包括：
在高分子材料中添加钝化料和颜色料的混合物；
采用光固化工艺和热反应制程获得一层结构的复合光阻材料。
这样，将钝化料和颜色料的混合物添加到高分子材料中，通过光固化工艺和热反应制程，可造成一层高分子结构与添加料的化学反应，RGB颜色层则由颜色料决定，有效的获得获得一层结构的复合光阻材料。
其中，所述采用光罩制程获得覆盖所述主动开关的复合光阻层的步骤包括：
在复合光阻材料上设置感光材料；
采用光罩制程获得复合光阻层的图案；
采用蚀刻液蚀刻获得复合光阻层；
去除残留的感光材料。
这样，将感光材料设在复合光阻材料上，通过光罩制程对感光材料进行曝光显影，从而获得所需的复合光阻层的图案，然后采用蚀刻液对复合光阻材料进行蚀刻，从而可以非常方便简单的获得复合光阻层，通过清洗液对残留在复合光阻层上的光阻材料进行去除，方便显示面板后续制程的操作，然后在复合光阻层上进行其他的制程，从而能够非常方便的制作显示面板。
根据本申请的另一个方面，本申请还公开了一种显示装置，所述显示装置包括如上所述的显示面板。
本申请由于复合光阻层具有非常好的介电特性，能够非常好的替代彩膜阵列基板产品工艺中需要以化学气相沉积溅镀SiNx形成保护层的制程，能够非常优化并减少显示面板的制程数目，使得显示面板的可以更加方便的被生产，有利于减少显示面板的工序，进一步的减少显示面板的生产时间，更好的提高显示面板的生产效率；省去了化学气相沉积溅镀SiNx形成保护层的制程，可以非常好的减少显示面板的生产成本，进一步的提升显示面板的市场竞争力；而且复合光阻层具有RGB颜色，可以非常好的替代彩色光阻层，可取代需要使用化学气相沉积/蚀刻制程的麻烦，只需要简单的黄光制程，即可一次性的完成保护层与RBG有色光阻层，使得复合光阻层的设置非常的方便简单，可以很好的简化显示面板的生产流程，更好的显示面板的生产效率。
【附图说明】
图1是本申请实施例的发明人设计的显示面板的剖面示意图；
图2是本申请实施例的另一实施例方式显示面板的剖面示意图；
图3是本申请实施例的另一实施例方式显示面板的剖面示意图；
图4是本申请实施例的另一实施例方式显示面板的剖面示意图；
图5是本申请实施例的显示面板的制作方法的流程图；
图6是本申请实施例的双层结构的复合光阻材料的制作方法示意图；
图7是本申请实施例的双层结构的复合光阻材料的制作方法流程图；
图8是本申请实施例的三层结构的复合光阻材料的制作方法示意图；
图9是本申请实施例的三层结构的复合光阻材料的制作方法流程图；
图10是本申请实施例的一层结构的复合光阻材料的制作方法示意图；
图11是本申请实施例的一层结构的复合光阻材料的制作方法流程图；
图12是本申请实施例的显示面板的制作方法的流程图。
其中：1、基板，2、主动开关，21、源极，22、漏极，3、复合光阻层，31、复合光阻材料，32、钝化料层，321、钝化料，33、颜色料层，331、颜色料，4、 高分子材料，5、彩色光阻层，6、保护层，7、窗口。
【具体实施方式】
这里所公开的具体结构和功能细节仅仅是代表性的，并且是用于描述本申请的示例性实施例的目的。但是本申请可以通过许多替换形式来具体实现，并且不应当被解释成仅仅受限于这里所阐述的实施例。
在本申请的描述中，需要理解的是，术语“中心”、“横向”、“上”、“下”、“左”、“右”、“竖直”、“水平”、“顶”、“底”、“内”、“外”等指示的方位或位置关系为基于附图所示的方位或位置关系，仅是为了便于描述本申请和简化描述，而不是指示或暗示所指的装置或元件必须具有特定的方位、以特定的方位构造和操作，因此不能理解为对本申请的限制。此外，术语“第一”、“第二”仅用于描述目的，而不能理解为指示或暗示相对重要性或者隐含指明所指示的技术特征的数量。由此，限定有“第一”、“第二”的特征可以明示或者隐含地包括一个或者更多个该特征。在本申请的描述中，除非另有说明，“多个”的含义是两个或两个以上。另外，术语“包括”及其任何变形，意图在于覆盖不排他的包含。
在本申请的描述中，需要说明的是，除非另有明确的规定和限定，术语“安装”、“相连”、“连接”应做广义理解，例如，可以是固定连接，也可以是可拆卸连接，或一体地连接；可以是机械连接，也可以是电连接；可以是直接相连，也可以通过中间媒介间接相连，可以是两个元件内部的连通。对于本领域的普通技术人员而言，可以根据具体情况理解上述术语在本申请中的具体含义。
这里所使用的术语仅仅是为了描述具体实施例而不意图限制示例性实施例。除非上下文明确地另有所指，否则这里所使用的单数形式“一个”、“一项”还意图包括复数。还应当理解的是，这里所使用的术语“包括”和/或“包含”规定所陈述的特征、整数、步骤、操作、单元和/或组件的存在，而不排除存在或添加一个或更多其他特征、整数、步骤、操作、单元、组件和/或其组合。
下面结合附图和较佳的实施例对本申请作进一步说明。
如图1所示，发明人设计了一款未公开的显示面板，显示面板包括：基板1、主动开关2和彩色光阻层5，主动开关2设在基板1上，主动开关2与彩色光阻层5之间设有保护层6，保护层6覆盖设置在主动开关2上。保护层6能够非常有效的避免清洗剂对液晶面板的主动开关2的金属层的直接腐蚀，使得主动开关2的金属层能够保持完好，从而避免产生断线问题，提升显示面板的良品率而降低报废成本；而且主动开关2的金属层的侧边从微结构来看都有金属毛刺的现象，通过设置保护层6能够更好的对主动开关2的金属层上的金属毛刺进行覆盖，非常有效的防止金属毛刺裸露在保护层6外，使得保护层6能够更好的对主动开关2的金属层进行保护，进一步的提高了显示面板的显示效果，使得产品竞争力更好的得到提升。
发明人进一步研究发现，现有产品制程，使用保护层6有效的避免避免在彩色光阻层5的图形制程中的显影液(KOH溶液)破坏主动开关2的金属层，但是保护层6的设置需要通过CVD(化学气相沉积)制程生成，生产步骤比较复杂，而且投入的成本较高。因此，发明人提供一种新的技术方案，可以有效减少制程数的显示面板。
下面结合附图2至附图4和较佳的实施例对本申请作进一步说明。
该显示面板包括：基板1；主动开关2，主动开关2设置在基板1上；所述主动开关2上设置有具有介电特性的复合光阻层3，所述复合光阻层3覆盖设在所述主动开关2上。
由于复合光阻层3具有非常好的介电特性，能够非常好的替代彩膜阵列基板(Color Filter On Array，COA)产品工艺中需要以化学气相沉积(Chemical Vapor Deposition，CVD)溅镀SiNx形成保护层6的制程，能够非常优化并减少显示面板的制程数目，使得显示面板的可以更加方便的被生产，有利于减少显示面板的工序，进一步的减少显示面板的生产时间，更好的提高显示面板的生产效率；省去了CVD溅镀SiNx形成保护层6的制程，可以非常好的减少显示面板 的生产成本，进一步的提升显示面板的市场竞争力；而且复合光阻层3具有RGB颜色，可以非常好的替代彩色光阻层5，可取代需要使用CVD/Etching制程的麻烦，只需要简单的黄光制程，即可一次性的完成保护层6与RBG有色光阻层，使得复合光阻层3的设置非常的方便简单，可以很好的简化显示面板的生产流程，更好的显示面板的生产效率。
其中，复合光阻层3采用复合光阻材料31制成，复合光阻材料31为至少一层钝化料层32和至少一层颜色料层33。通过至少一层钝化料层32和至少一层颜色料层33复合堆叠形成多层结构的复合光阻材料31，使得符合光阻材料同时具备保护层6材料所需的介电特性，而且还具有彩色光阻材料所有的RGB颜色，保证复合光阻材料31能够非常好的被应用到显示面板的制作，能够非常好有效的替代保护层材料和彩色光阻层材料，将具有介电特性的复合光阻材料31覆盖设在主动开关2上，通过进行简单的黄光制程，就可以非常好的形成复合光阻层3，非常有效的替代保护层6与RBG有色光阻层，这样能够有效的简化显示面板的生产流程，有利于减少显示面板的工序，减少显示面板的生产时间，进一步的提高显示面板的生产效率；而且能够非常好的减少显示面板的生产成本，进一步的提升显示面板的市场竞争力。
如图2所示，钝化料层32和颜色料层33均设置一层，钝化料层32与颜色料层33堆叠设置。通过将钝化料层32和颜色料层33各设置一层，钝化料层32具备保护层6材料所需的介电特性，颜色料层33具有彩色光阻材料所有的RGB颜色，而且颜色料使用的不同可以产生不同的R/G/B单色，将钝化料层32和颜色料层33堆叠设置，钝化料层32设置在下层，颜色料层33设置在上层，将复合光阻材料31铺设在主动开关2上，通过进行简单的黄光制程，就可以非常好的形成复合光阻层3，非常有效的替代保护层6与RBG有色光阻层，这样能够有效的简化显示面板的生产流程，有利于减少显示面板的工序，减少显示面板的生产时间，进一步的提高显示面板的生产效率；钝化料层32能够有效的对主动开关2进行保护，能够非常有效的避免后续制程中清洗剂对主动开关2的源 极21和漏极22的直接腐蚀，使得源极21和漏极22能够保持完好，从而减少产生断线问题，有效的降低报废成本，进而提升显示面板的品质；而且主动开关2的源极21和漏极22为金属材料制成，源极21和漏极22的侧边从微结构来看都有金属毛刺的现象，钝化料层32能够更好的对源极21和漏极22进行保护，有效的避免后续的制程对源极21和漏极22的影响，从而非常好的提高显示面板的良品率。
如图3所示，钝化料层32设置两层，颜色料层33设置一层，颜色料层33设在两层钝化料层32之间。通过将设置两层钝化料层32和一层颜色料层33，并将颜色料层33设在两层钝化料层32之间，这样形成一个钝化料层32和颜色料层33堆叠设置，将复合光阻材料31铺设在主动开关2上，通过进行简单的黄光制程，就可以非常好的形成复合光阻层3，将颜色料层33设在两层钝化料层32之间，能够非常好的对颜色料层33进行保护，有效的防止后续制程使颜色料层33的有机材料释放出一些有害杂质气体，从而实现对显示面板的有效保护，增加其效率及寿命；而且将复合光阻材料31铺设在主动开关2上，通过进行简单的黄光制程，就可以非常好的形成复合光阻层3，非常有效的替代保护层6与RBG有色光阻层，这样能够有效的简化显示面板的生产流程，有利于减少显示面板的工序，减少显示面板的生产时间，进一步的提高显示面板的生产效率；同时钝化料层32能够有效的对主动开关2进行保护，非常有效的避免后续制程中清洗剂对主动开关2的源极21和漏极22的直接腐蚀，使得源极21和漏极22能够保持完好，从而减少产生断线问题，有效的降低报废成本，进而提升显示面板的品质，复合光阻层3在源极21和漏极22相对位置设有窗口7。
如图4所示，复合光阻材料31采用钝化料和颜色料的混合物复合而成，通过进行简单的黄光制程，就可以非常好的形成复合光阻层3，能够非常好的替代彩膜阵列基板产品工艺中需要以化学气相沉积溅镀SiNx形成保护层6的制程，能够非常优化并减少显示面板的制程数目，使得显示面板的可以更加方便的被生产，有利于减少显示面板的工序，进一步的减少显示面板的生产时间，更好 的提高显示面板的生产效率；省去了CVD溅镀SiNx形成保护层6的制程，可以非常好的减少显示面板的生产成本，进一步的提升显示面板的市场竞争力。
根据本申请的另一个方面，如图5所示，本申请还公开了一种显示面板的制造方法，显示面板包括基板1和设在基板1上的主动开关2，包括步骤：
S11：在主动开关上设置复合光阻材料；
S12：采用光罩制程获得覆盖主动开关的复合光阻层。
采用这种方法，只需要简单的光罩制程就能够很好的进行显示面板的复合光阻层3的制作，即可一次性的完成保护层6与RBG有色光阻层，复合光阻层3能够非常好有效的替代保护层材料和彩色光阻层材料，将具有介电特性的复合光阻材料31覆盖设在主动开关2上，这样能够有效的简化显示面板的生产流程，有利于减少显示面板的工序，减少显示面板的生产时间，进一步的提高显示面板的生产效率；而且由于复合光阻层3具有非常好的介电特性，能够非常好的替代彩膜阵列基板(Color Filter On Array，COA)产品工艺中需要以化学气相沉积(Chemical Vapor Deposition，CVD)溅镀SiNx形成保护层6的制程，能够非常优化并减少显示面板的制程数目，使得显示面板的可以更加方便的被生产，有利于减少显示面板的工序，进一步的减少显示面板的生产时间，更好的提高显示面板的生产效率；省去了CVD溅镀SiNx形成保护层6的制程，可以非常好的减少显示面板的生产成本，进一步的提升显示面板的市场竞争力；而且复合光阻层3具有RGB颜色，可以非常好的替代彩色光阻层5，可取代需要使用CVD/Etching制程的麻烦，只需要简单的黄光制程，即可一次性的完成保护层6与RBG有色光阻层，使得复合光阻层3的设置非常的方便简单，可以很好的简化显示面板的生产流程，更好的显示面板的生产效率；同时能够非常好的减少显示面板的生产成本，进一步的提升显示面板的市场竞争力。
如图6和图7所示，复合光阻材料31包括一层钝化料层32和一层颜色料层33，复合光阻材料31的制作步骤包括：
S21：在高分子材料的下层添加钝化料；
S22：在高分子材料的上层添加颜色料；
S23：采用光固化工艺和热反应制程获得双层结构的复合光阻材料。
高分子材料为聚甲基丙烯酸甲酯(PMMA)、聚苯乙烯(Polystyrene，PS)、聚对苯二甲酸乙二醇酯(PET)、聚碳酸酯(PC)、聚丙烯酸酯(PAR)或透明环氧树脂中的任意一种；将钝化料321添加到高分子材料4的下层，将颜色料331添加到高分子材料4的上层，钝化料321为透明树脂、SiO2或者SiNx中的任意一种；颜色料331选自红、绿、蓝、黄、青和白色颜料中的任意一种；所述红颜料选自苝系、喹吖啶酮和吡咯并吡咯类中的一种或多种；所述黄颜料选自偶氮类、偶氮缩合型和杂环类中的一种或多种；所述绿颜料选自双偶氮缩合类、金属络合物和酞箐类中的一种或多种；所述蓝颜料选自羟基氢醌类和/或靛青类；通过光固化工艺和热反应制程，可造成双层高分子结构与添加料的化学反应，RGB颜色层则由颜色料331决定；钝化后的添加有钝化料321的高分子材料4的下层则变成不导电具有绝缘效果之高分子层，添加有颜色料331的高分子材料4的上层则变成RGB颜色之高分子层，从而获得堆叠的双层结构的复合光阻材料31，制作过程非常的方便简单，有利于进行大规模的复合光阻材料31的生产，进一步的减少生产成本；将获取的复合光阻材料31覆盖设在主动开关2上，对复合光阻材料31进行两次蚀刻过程，透过蚀刻液的反应选择性来分别蚀刻钝化料层32或颜色料层33，进而形成复合光阻层3；钝化料层32能够有效的对主动开关2进行保护，能够非常有效的避免后续制程中清洗剂对主动开关2的源极21和漏极22的直接腐蚀，使得源极21和漏极22能够保持完好，从而减少产生断线问题，有效的降低报废成本，进而提升显示面板的品质；而且主动开关2的源极21和漏极22为金属材料制成，源极21和漏极22的侧边从微结构来看都有金属毛刺的现象，钝化料层32能够更好的对源极21和漏极22进行保护，有效的避免后续的制程对源极21和漏极22的影响，从而非常好的提高显示面板的良品率。
如图8和图9所示，复合光阻材料31包括两层钝化料层32和一层颜色料 层33，复合光阻材料31的制作步骤包括：
S31：在高分子材料的下层添加钝化料；
S32：在高分子材料的中层添加颜色料；
S33：在高分子材料的上层添加钝化料；
S34：采用光固化工艺和热反应制程获得三层结构的复合光阻材料。
将钝化料321添加到高分子材料4的下层和下层，将颜色料331添加到高分子材料4的中层层，通过光固化工艺和热反应制程，可造成三层高分子结构与添加料的化学反应，RGB颜色层则由颜色料331决定；钝化后的添加有钝化料321的高分子材料4的下层和上层则变成不导电具有绝缘效果之高分子层，添加有颜色料331的高分子材料4的中层则变成RGB颜色之高分子层，从而获得堆叠的三层结构的复合光阻材料31，制作过程非常的方便简单，有利于进行大规模的复合光阻材料31的生产，进一步的减少生产成本；将获得的三层结构的复合光阻材料31铺设在主动开关2上，通过进行简单的黄光制程，对复合光阻材料31进行三次蚀刻过程，透过蚀刻液的反应选择性来分别蚀刻钝化料层32或颜色料层33，就可以非常好的形成复合光阻层3，颜色料层33设在两层钝化料层32之间，能够非常好的对颜色料层33进行保护，有效的防止后续制程使颜色料层33的有机材料释放出一些有害杂质气体，从而实现对显示面板的有效保护，增加其效率及寿命；同时钝化料层32能够有效的对主动开关2进行保护，能够非常有效的避免后续制程中清洗剂对主动开关2的源极21和漏极22的直接腐蚀，使得源极21和漏极22能够保持完好，从而减少产生断线问题，有效的降低报废成本，进而提升显示面板的品质。
如图10和图11所示，复合光阻材料31的制作步骤包括：
S41：在高分子材料中添加钝化料和颜色料的混合物；
S42：采用光固化工艺和热反应制程获得一层结构的复合光阻材料。
将钝化料321和颜色料331的混合物添加到高分子材料4中，通过光固化工艺和热反应制程，可造成一层高分子结构与添加料的化学反应，RGB颜色层 则由颜色料331决定，有效的获得获得一层结构的复合光阻材料31；将获得的一层结构的复合光阻材料31铺设在主动开关2上，通过进行简单的黄光制程，对复合光阻材料31进行蚀刻过程，透过蚀刻液的反应选择性来分别蚀刻钝化料层32或颜色料层33，就可以非常好的形成复合光阻层3，能够有效的对主动开关2进行保护，能够非常有效的避免后续制程中清洗剂对主动开关2的源极21和漏极22的直接腐蚀，使得源极21和漏极22能够保持完好，从而减少产生断线的问题，有效的降低报废成本，进而提升显示面板的品质。
如图12所示，采用光罩制程获得覆盖主动开关2的复合光阻层3的步骤包括：
S51：在复合光阻材料上设置感光材料；
S52：采用光罩制程获得复合光阻层的图案；
S53：采用蚀刻液蚀刻获得复合光阻层；
S54：去除残留的感光材料。
将感光材料设在复合光阻材料31上，通过光罩制程对感光材料进行曝光显影，从而获得所需的复合光阻层3的图案，然后采用蚀刻液对复合光阻材料31进行蚀刻，从而可以非常方便简单的获得复合光阻层3，通过清洗液对残留在复合光阻层3上的光阻材料进行去除，方便显示面板后续制程的操作，然后在复合光阻层3上进行其他的制程，从而能够非常方便的制作显示面板；通过复合光阻层3的设置，能够非常优化并减少显示面板的制程数目，使得显示面板的可以更加方便的被生产，有利于减少显示面板的工序，进一步的减少显示面板的生产时间，更好的提高显示面板的生产效率；省去了CVD溅镀SiNx形成保护层6的制程，可以非常好的减少显示面板的生产成本，进一步的提升显示面板的市场竞争力；而且复合光阻层3具有RGB颜色，可以非常好的替代彩色光阻层5，可取代需要使用CVD/Etching制程的麻烦，只需要简单的黄光制程，即可一次性的完成保护层6与RBG有色光阻层，使得复合光阻层3的设置非常的方便简单，可以很好的简化显示面板的生产流程，更好的显示面板的生产效率。
根据本申请的另一个方面，本申请还公开了一种显示装置，显示装置包括如上的显示面板，关于显示面板的具体结构和连接关系可参见图1至图4在此不再一一详述。
在上述实施例中，所述基板1的材料可以选用玻璃、塑料等。
在上述实施例中，显示面板包括液晶面板、等离子面板等，以液晶面板为例，液晶面板包括阵列基板和彩膜基板(CF)，所述阵列基板与彩膜基板相对设置，所述阵列基板与彩膜基板之间设有液晶和间隔单元(photo spacer，PS)，所述阵列基板上设有薄膜晶体管(TFT)，彩膜基板上设有彩色滤光层。
在上述实施例中，彩膜基板可包括TFT阵列，彩膜及TFT阵列可形成于同一基板上，阵列基板可包括彩色滤光层。
在上述实施例中，本申请的显示面板可为曲面型面板。
以上内容是结合具体的优选实施方式对本申请所作的进一步详细说明，不能认定本申请的具体实施只局限于这些说明。对于本申请所属技术领域的普通技术人员来说，在不脱离本申请构思的前提下，还可以做出若干简单推演或替换，都应当视为属于本申请的保护范围。

Claims (18)

  1. 一种显示面板，包括：
    基板；
    主动开关，设置在基板上；
    所述主动开关包括设置于基板上的栅极，设置在栅极上方的半导体层，以及设置在半导体层上方的源极和漏极；所述源极和漏极上设置有具有介电特性的复合光阻层，所述复合光阻层在源极和漏极相对位置设有窗口；所述复合光阻层采用复合光阻材料制成；所述复合光阻材料包括一层钝化料层和一层颜色料层，所述钝化料层与所述颜色料层堆叠设置。
  2. 一种显示面板，包括：
    基板；
    主动开关，设置在基板上；
    所述主动开关上设置有具有介电特性的复合光阻层，所述复合光阻层覆盖设在所述主动开关上。
  3. 如权利要求2所述的一种显示面板，其中，所述主动开关包括设置于基板上的栅极，设置在栅极上方的半导体层，以及设置在半导体层上方的源极和漏极；所述复合光阻层覆盖在源极和漏极上。
  4. 如权利要求3所述的一种显示面板，其中，所述复合光阻层在源极和漏极相对位置设有窗口。
  5. 如权利要求2所述的一种显示面板，其中，所述复合光阻层采用复合光阻材料制成，所述复合光阻材料为至少一层钝化料层和至少一层颜色料层。
  6. 如权利要求5所述的一种显示面板，其中，所述主动开关包括设置于基板上的栅极，设置在栅极上方的半导体层，以及设置在半导体层上方的源极和漏极；所述复合光阻层覆盖在源极和漏极上。
  7. 如权利要求6所述的一种显示面板，其中，所述复合光阻层在源极和漏 极相对位置设有窗口。
  8. 如权利要求5所述的一种显示面板，其中，所述钝化料层和所述颜色料层均设置一层，所述钝化料层与所述颜色料层堆叠设置。
  9. 如权利要求8所述的一种显示面板，其中，所述主动开关包括设置于基板上的栅极，设置在栅极上方的半导体层，以及设置在半导体层上方的源极和漏极；所述复合光阻层覆盖在源极和漏极上。
  10. 如权利要求9所述的一种显示面板，其中，所述复合光阻层在源极和漏极相对位置设有窗口。
  11. 如权利要求5所述的一种显示面板，其中，所述钝化料层设置两层，所述颜色料层设置一层，所述颜色料层设在两层所述钝化料层之间。
  12. 如权利要求11所述的一种显示面板，其中，所述主动开关包括设置于基板上的栅极，设置在栅极上方的半导体层，以及设置在半导体层上方的源极和漏极；所述复合光阻层覆盖在源极和漏极上。
  13. 如权利要求12所述的一种显示面板，其中，所述复合光阻层在源极和漏极相对位置设有窗口。
  14. 一种显示面板的制造方法，所述显示面板包括基板和设在基板上的主动开关，所述制造方法包括步骤：
    在主动开关上设置复合光阻材料；
    采用光罩制程获得覆盖所述主动开关的复合光阻层。
  15. 如权利要求14所述的一种显示面板的制造方法，其中，所述复合光阻材料包括一层钝化料层和一层颜色料层，所述复合光阻材料的制作步骤包括：
    在高分子材料的下层添加钝化料；
    在高分子材料的上层添加颜色料；
    采用光固化工艺和热反应制程获得双层结构的复合光阻材料。
  16. 如权利要求14所述的一种显示面板的制造方法，其中，所述复合光阻材料包括两层钝化料层和一层颜色料层，所述复合光阻材料的制作步骤包括：
    在高分子材料的下层添加钝化料；
    在高分子材料的中层添加颜色料；
    在高分子材料的上层添加钝化料；
    采用光固化工艺和热反应制程获得三层结构的复合光阻材料。
  17. 如权利要求14所述的一种显示面板的制造方法，其中，所述复合光阻材料的制作步骤包括：
    在高分子材料中添加钝化料和颜色料的混合物；
    采用光固化工艺和热反应制程获得一层结构的复合光阻材料。
  18. 如权利要求14所述的一种显示面板的制造方法，其中，所述采用光罩制程获得覆盖所述主动开关的复合光阻层的步骤包括：
    在复合光阻材料上设置感光材料；
    采用光罩制程获得复合光阻层的图案；
    采用蚀刻液蚀刻获得复合光阻层；
    去除残留的感光材料。
    。
PCT/CN2017/084118 2017-03-16 2017-05-12 一种显示面板及制造方法和显示装置 WO2018171022A1 (zh)

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