WO2018139092A1 - Résonateur - Google Patents
Résonateur Download PDFInfo
- Publication number
- WO2018139092A1 WO2018139092A1 PCT/JP2017/044787 JP2017044787W WO2018139092A1 WO 2018139092 A1 WO2018139092 A1 WO 2018139092A1 JP 2017044787 W JP2017044787 W JP 2017044787W WO 2018139092 A1 WO2018139092 A1 WO 2018139092A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- magnetization
- layer
- magnetic field
- free layer
- magnetization free
- Prior art date
Links
- 230000005415 magnetization Effects 0.000 claims abstract description 340
- 230000005291 magnetic effect Effects 0.000 claims abstract description 206
- 230000000694 effects Effects 0.000 claims abstract description 114
- 125000006850 spacer group Chemical group 0.000 claims abstract description 59
- 230000003068 static effect Effects 0.000 claims description 3
- 239000010410 layer Substances 0.000 description 330
- 230000008859 change Effects 0.000 description 39
- 230000005350 ferromagnetic resonance Effects 0.000 description 30
- 238000012546 transfer Methods 0.000 description 21
- 238000004804 winding Methods 0.000 description 20
- 239000004020 conductor Substances 0.000 description 15
- 230000005290 antiferromagnetic effect Effects 0.000 description 10
- 239000000463 material Substances 0.000 description 10
- 229910045601 alloy Inorganic materials 0.000 description 7
- 239000000956 alloy Substances 0.000 description 7
- 229910052751 metal Inorganic materials 0.000 description 7
- 239000002184 metal Substances 0.000 description 7
- 239000003302 ferromagnetic material Substances 0.000 description 6
- 238000006243 chemical reaction Methods 0.000 description 5
- 238000013016 damping Methods 0.000 description 5
- 239000011810 insulating material Substances 0.000 description 5
- 239000000696 magnetic material Substances 0.000 description 5
- 229910052802 copper Inorganic materials 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 230000008054 signal transmission Effects 0.000 description 4
- 229910003321 CoFe Inorganic materials 0.000 description 3
- 229910019236 CoFeB Inorganic materials 0.000 description 3
- 238000004891 communication Methods 0.000 description 3
- 229910052737 gold Inorganic materials 0.000 description 3
- 229910001291 heusler alloy Inorganic materials 0.000 description 3
- 238000004088 simulation Methods 0.000 description 3
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 230000008878 coupling Effects 0.000 description 2
- 238000010168 coupling process Methods 0.000 description 2
- 238000005859 coupling reaction Methods 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 238000010295 mobile communication Methods 0.000 description 2
- 230000010355 oscillation Effects 0.000 description 2
- 239000002356 single layer Substances 0.000 description 2
- 229910015371 AuCu Inorganic materials 0.000 description 1
- 229910019222 CoCrPt Inorganic materials 0.000 description 1
- 229910000684 Cobalt-chrome Inorganic materials 0.000 description 1
- 229910002546 FeCo Inorganic materials 0.000 description 1
- -1 FeCoB Inorganic materials 0.000 description 1
- 229910015136 FeMn Inorganic materials 0.000 description 1
- 229910005335 FePt Inorganic materials 0.000 description 1
- 229910001030 Iron–nickel alloy Inorganic materials 0.000 description 1
- 229910019041 PtMn Inorganic materials 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 239000010952 cobalt-chrome Substances 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910052761 rare earth metal Inorganic materials 0.000 description 1
- 150000002910 rare earth metals Chemical class 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 229910000938 samarium–cobalt magnet Inorganic materials 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/33—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only
- G11B5/39—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/82—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by variation of the magnetic field applied to the device
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/22—Constructional features of resonators consisting of magnetostrictive material
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N50/00—Galvanomagnetic devices
- H10N50/10—Magnetoresistive devices
Abstract
La présente invention concerne un résonateur (1) pourvu d'un élément à effet magnétorésistif (2), d'une unité d'application de champ magnétique externe (3), et d'une unité de transmission d'énergie (4). L'élément à effet magnétorésistif (2) comprend : une couche fixe de magnétisation (21) ayant une magnétisation dans une première direction; une couche libre de magnétisation (23) ayant une magnétisation dont la direction varie; et une couche d'espacement (22) disposée entre la couche fixe de magnétisation (21) et la couche libre de magnétisation (23). L'unité d'application de champ magnétique externe (3) applique un champ magnétique externe d'une seconde direction sur la couche libre de magnétisation (23). L'unité de transmission d'énergie (4) transmet à l'élément à effet magnétorésistif (2) de l'énergie destinée à faire vibrer la magnétisation de la couche libre de magnétisation (23). L'angle formé par la seconde direction par rapport à la première direction se situe dans la plage de 90° à 150°.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2017-010195 | 2017-01-24 | ||
JP2017010195A JP2020047965A (ja) | 2017-01-24 | 2017-01-24 | 共振器 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2018139092A1 true WO2018139092A1 (fr) | 2018-08-02 |
Family
ID=62978776
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2017/044787 WO2018139092A1 (fr) | 2017-01-24 | 2017-12-13 | Résonateur |
Country Status (2)
Country | Link |
---|---|
JP (1) | JP2020047965A (fr) |
WO (1) | WO2018139092A1 (fr) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2020088949A (ja) * | 2018-11-19 | 2020-06-04 | 日産自動車株式会社 | 磁気回路 |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008064499A (ja) * | 2006-09-05 | 2008-03-21 | Toshiba Corp | 磁気センサー |
JP2008170416A (ja) * | 2006-12-14 | 2008-07-24 | Tdk Corp | 磁気デバイス及び周波数アナライザ |
JP2011181756A (ja) * | 2010-03-02 | 2011-09-15 | Canon Anelva Corp | マイクロ波素子 |
JP2013045840A (ja) * | 2011-08-23 | 2013-03-04 | National Institute Of Advanced Industrial & Technology | 電界強磁性共鳴励起方法及びそれを用いた磁気機能素子 |
JP2016096377A (ja) * | 2014-11-12 | 2016-05-26 | 国立研究開発法人産業技術総合研究所 | マイクロ波検波器及びマイクロ波検波方法 |
US20160277000A1 (en) * | 2015-03-16 | 2016-09-22 | Tdk Corporation | Magnetoresistive effect device |
-
2017
- 2017-01-24 JP JP2017010195A patent/JP2020047965A/ja active Pending
- 2017-12-13 WO PCT/JP2017/044787 patent/WO2018139092A1/fr active Application Filing
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008064499A (ja) * | 2006-09-05 | 2008-03-21 | Toshiba Corp | 磁気センサー |
JP2008170416A (ja) * | 2006-12-14 | 2008-07-24 | Tdk Corp | 磁気デバイス及び周波数アナライザ |
JP2011181756A (ja) * | 2010-03-02 | 2011-09-15 | Canon Anelva Corp | マイクロ波素子 |
JP2013045840A (ja) * | 2011-08-23 | 2013-03-04 | National Institute Of Advanced Industrial & Technology | 電界強磁性共鳴励起方法及びそれを用いた磁気機能素子 |
JP2016096377A (ja) * | 2014-11-12 | 2016-05-26 | 国立研究開発法人産業技術総合研究所 | マイクロ波検波器及びマイクロ波検波方法 |
US20160277000A1 (en) * | 2015-03-16 | 2016-09-22 | Tdk Corporation | Magnetoresistive effect device |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2020088949A (ja) * | 2018-11-19 | 2020-06-04 | 日産自動車株式会社 | 磁気回路 |
JP7206835B2 (ja) | 2018-11-19 | 2023-01-18 | 日産自動車株式会社 | 磁気回路 |
Also Published As
Publication number | Publication date |
---|---|
JP2020047965A (ja) | 2020-03-26 |
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