WO2018120343A1 - 一种平曲面共用改善液晶显示穿透率的方法 - Google Patents

一种平曲面共用改善液晶显示穿透率的方法 Download PDF

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WO2018120343A1
WO2018120343A1 PCT/CN2017/071788 CN2017071788W WO2018120343A1 WO 2018120343 A1 WO2018120343 A1 WO 2018120343A1 CN 2017071788 W CN2017071788 W CN 2017071788W WO 2018120343 A1 WO2018120343 A1 WO 2018120343A1
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Prior art keywords
substrate
line
curved surface
tracking
liquid crystal
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English (en)
French (fr)
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宋彦君
李祥
谢忠憬
邱钟毅
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TCL China Star Optoelectronics Technology Co Ltd
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Shenzhen China Star Optoelectronics Technology Co Ltd
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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G02F1/13378—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation
    • G02F1/133788—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation by light irradiation, e.g. linearly polarised light photo-polymerisation
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/136209—Light shielding layers, e.g. black matrix, incorporated in the active matrix substrate, e.g. structurally associated with the switching element
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/133377—Cells with plural compartments or having plurality of liquid crystal microcells partitioned by walls, e.g. one microcell per pixel
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G02F1/133753—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers with different alignment orientations or pretilt angles on a same surface, e.g. for grey scale or improved viewing angle
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G02F1/13394—Gaskets; Spacers; Sealing of cells spacers regularly patterned on the cell subtrate, e.g. walls, pillars
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/133354—Arrangements for aligning or assembling substrates
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G02F1/13398—Spacer materials; Spacer properties

Definitions

  • the present invention relates to the field of liquid crystal manufacturing, and in particular to a method for improving the transmittance of a liquid crystal display by using a flat curved surface.
  • BPS Black Photo Spacer
  • BM Black Matrix
  • UV2A technology is a method for vertical alignment of liquid crystals.
  • Ultraviolet light (UV) passes through a mask to illuminate different regions of a pixel.
  • PI undergoes a photochemical reaction, and after liquid crystal is dropped, liquid crystal can be formed.
  • a certain angle of alignment Compared with the PSVA alignment method, UV2A has the advantages of better liquid crystal efficiency than PSVA and lower liquid crystal cost.
  • the CF side has a black matrix 3 or an RGB color group, and the mask 1 can be aligned and tracked with the black matrix pattern 3 or the RGB pattern.
  • the inventors of the present invention provide a method for improving the transmittance of liquid crystal display by making the BPS+UV2A compatible flat curved surface, thereby obtaining a more desirable liquid crystal display transmittance.
  • the present invention provides a method for improving the transmittance of a liquid crystal display by a flat curved surface, which comprises the following steps:
  • the substrate comprising an array substrate and a CF substrate, wherein a spacer and a black matrix are disposed on one side of the array substrate, and a transparent conductive electrode having a full film surface is disposed on one side of the CF substrate ;
  • the flat curved surface shares a method for improving the transmittance of the liquid crystal display, wherein in the step (2), the tracking line is a straight line.
  • the flat curved surface shares a method for improving the transmittance of the liquid crystal display, wherein in the step (2), the tracking line is a segmented line segment.
  • the flat curved surface shares a method for improving the transmittance of the liquid crystal display.
  • the tracking line after the box is engraved on the corresponding data line area.
  • the tracking line after the box is engraved on the area of the corresponding gate line.
  • the flat curved surface shares a method for improving the transmittance of the liquid crystal display.
  • the mask is translated by a distance of half a pixel, and the second exposure is started. To complete the exposure of the two quadrants of the CF substrate.
  • the flat curved surface shares a method for improving the transmittance of the liquid crystal display, wherein the tracking line has a width of 10 to 150 um.
  • the flat curved surface shares a method for improving the transmittance of the liquid crystal display, wherein the length of the tracking line runs through the entire substrate.
  • the flat curved surface shares a method for improving the transmittance of the liquid crystal display, wherein the number of the tracking lines is 1 to 20.
  • the flat curved surface shares a method for improving the transmittance of the liquid crystal display, wherein the tracking line is located outside the pixel opening area.
  • the flat curved surface shares a method for improving the transmittance of the liquid crystal display, wherein the tracking line is an ITO tracking line or an IZO tracking line.
  • the invention has the beneficial effects that the laser patterning method overcomes the technical bias and can make the BPS+UV2A compatible, and provides the ideal transmittance, especially for the curved liquid crystal display.
  • 1A is a top plan view of a prior art UV2A process
  • 1B is a side view of a prior art UV2A process
  • UV2A is a top view of a UV2A process in the prior art using BPS technology
  • 2B is a side view of a UV2A process in the prior art using BPS technology
  • 3A is a plan view showing an initial state of a line on a ITO using a laser according to the present invention
  • 3B is a top plan view of a process for marking a line on an ITO using a laser according to the present invention
  • 4A is a schematic view showing the direction of the CF side exposure scan parallel to the data line;
  • Figure 4B shows a schematic view of the ITO and ITO trace lines
  • 4C is a schematic view showing alignment of an ITO tracking line and a data line
  • 5A is a schematic view showing the direction of the CF side exposure scan parallel to the gate line;
  • Figure 5B shows a schematic view of the ITO and ITO trace lines
  • 5C is a schematic view showing alignment of an ITO trace line and a gate line
  • FIG. 6A is a schematic diagram of tracking a ITO trace line engraved by a laser during a exposure process
  • FIG. 6B is another schematic diagram of the masking of the ITO trace line engraved by the laser during the exposure process.
  • the invention relates to a method for improving the transmittance of a liquid crystal display by a flat curved surface, which mainly comprises the following steps:
  • a substrate is fabricated based on a BPS process, wherein the PS and the black matrix of the substrate are disposed on one side of the array substrate (Array), and the transparent conductive electrode (ITO) of the full film surface is disposed on the side of the CF (color filter) substrate. Or IZO) 7; It should be noted that a transparent conductive electrode (ITO or IZO) provided with a full-film surface on the CF substrate side is a technical feature of the BPS process.
  • the mark may also be located around the substrate, so that the CF substrate is on the UV2A exposure machine and the mark pair Position, complete the alignment of the precise position, and carry out the subsequent cell process; it should be noted that by setting the mark, the CF substrate and the array substrate can be accurately aligned to improve the product yield.
  • a straight line is etched by etching on the ITO by a laser according to a set position, and the straight line (ie, the ITO trace line 4) needs a gate line 6 or data on the side of the array substrate.
  • the light shielding areas of line 5 are aligned;
  • the laser should engrave a segmented line segment on a transparent conducting electrode (eg ITO).
  • a transparent conducting electrode eg ITO
  • the length of each segment of the ITO tracking line 4 is greater than or equal to the gap between adjacent segments.
  • the exposure accuracy is not as good as the segmented line segment, but the quadrant ITO tracking line or the IZO tracking line can achieve the quadrant exposure accuracy to meet the general needs.
  • the width of the ITO trace line in the form of a straight line or a line segment is 10 to 150 um, and the length thereof extends through the entire substrate.
  • the number of ITO trace lines is preferably 1 to 20, but the data of the trace line is not limited thereto. .
  • the position of the ITO tracking line is aligned with the gate line 6 or the data line 5 on one side of the array substrate after being formed into a box, and is located outside the pixel (pixel) open area. It should be noted that the ITO tracking line is located. The imaging effect is not affected outside the pixel opening area.
  • the mask 1 tracks the ITO trace line carved by the laser, and when the exposure of the first quadrant is completed, the mask 1 is translated. A half pixel (pixel) distance begins the second exposure, thereby enabling exposure of the two quadrants of the CF substrate.
  • the distance that the mask 1 moves is (2n+1)*0.5P, where P is the distance of one pixel, and n is 0, 1, 2, . That is, as long as the mask 1 shifts the distance of the half pixel of (2n+1) times and starts the second exposure, the exposure of the two quadrants of the CF substrate can be completed.
  • the present invention provides a method for improving the transmittance of a liquid crystal display by using a flat curved surface.
  • the laser patterning method overcomes the technical bias and enables BPS+UV2A to be compatible and provides an ideal transmittance. Especially, it provides ideal technical support for curved LCD screens.

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Liquid Crystal (AREA)

Abstract

一种平曲面共用改善液晶显示穿透率的方法，其包括以下步骤：1.基于BPS工艺制程制作出基板（2），基板（2）包括阵列基板和CF基板，阵列基板一侧设置有间隔物和黑矩阵（3），CF基板一侧设置透明导电极；2.利用激光在CF基板上刻上标记，使CF基板在UV2A曝光机台上与标记对位；3.利用激光在透明导电极上刻出追踪线（4），追踪线（4）与阵列基板一侧的栅极线（6）或数据线（5）的遮光区对齐；4.对基板（2）进行曝光，掩膜版（1）对追踪线（4）进行追踪。该方法利用激光图形化的方法，克服了技术偏见而能够使BPS+UV2A兼容使用，并提供了理想的穿透率。

Description

一种平曲面共用改善液晶显示穿透率的方法
相关申请的交叉引用
本申请要求享有于2016年12月30日提交的名称为“一种平曲面共用改善液晶显示穿透率的方法”的中国专利申请CN201611258212.5优先权，该申请的全部内容通过引用并入本文中。
技术领域
本发明涉及液晶制造领域，特别涉及一种平曲面共用改善液晶显示穿透率的方法。
背景技术
随着液晶显示技术的发展，出现了曲面屏幕，而出于曲面设计的考虑，通常采用BPS(Black Photo Spacer)设计来省去黑矩阵(Black Matrix，简称BM)制程。这是因为BPS既能起到PS(Photo Spacer，间隙控制)的支撑作用，又能在边框(frame)区遮光，即PS与黑矩阵集成于一道制程。同时，由于BPS设计在阵列(Array)基板，制作在下基板上，即可避免上下基板错位导致的光学特性不良。然而，BPS无法与UV2A技术兼容，原因将于下文进行简要的阐述。
UV2A技术为液晶垂直配向的一种方法，紫外光(UV)通过掩膜版(Mask)，对像素(pixel)中不同区域进行照光，PI发生光化学反应，在液晶滴入后，可对液晶形成一定角度的配向。对比PSVA配向方法，UV2A具有液晶效率优于PSVA、液晶成本较低等优点。
如图1A和图1B所示，在UV2A制程中，需使用掩膜版1，因对像素中不同区域曝光，为保证精确性，曝光平移过程中，掩膜版1需与面板2设计中特定的图形做对位及追踪。在一般的基板中，CF侧有黑矩阵3或RGB色组，掩膜版1可与黑矩阵图形3或RGB图形对位及追踪。
如图2A和图2B所示，当使用BPS技术时，CF侧无PS、黑矩阵，只有一层ITO透明电极，因此，无任何图形供UV2A追踪曝光，故BPS+UV2A技术无 法兼容，也就无法兼具BPS和UV2A的优点。
鉴于此，本发明的发明人提供一种能够使BPS+UV2A进行兼容的平曲面共用改善液晶显示穿透率的方法，从而获得更加理想的液晶显示穿透率。
发明内容
本发明的目的是提供一种平曲面共用改善液晶显示穿透率的方法，其能够使BPS+UV2A进行兼容，从而获得更加理想的液晶显示穿透率。
为达上述目的，本发明提供一种平曲面共用改善液晶显示穿透率的方法，其包括以下步骤：
(1)基于BPS工艺制程制作出基板，所述基板包括阵列基板和CF基板，其中，阵列基板一侧设置有间隔物和黑矩阵，所述CF基板一侧设置有全膜面的透明导电极；
(2)利用激光在CF基板的指定位置处刻上标记，使CF基板在UV2A曝光机台上与所述标记对位；
(3)利用激光在所述透明导电极上刻出追踪线，所述追踪线与阵列基板一侧的栅极线或数据线的遮光区对齐；
(4)对基板进行曝光，掩膜版对所述追踪线进行追踪。
所述的平曲面共用改善液晶显示穿透率的方法，其中，在步骤(2)中，所述追踪线为直线。
所述的平曲面共用改善液晶显示穿透率的方法，其中，在步骤(2)中，所述追踪线为分段的线段。
所述的平曲面共用改善液晶显示穿透率的方法，其中，在步骤(3)中，当对CF侧曝光扫描与数据线平行时，则成盒后追踪线刻在对应数据线的区域上；当对CF侧曝光扫描的方向与栅极线平行时，则成盒后追踪线刻在对应栅极线的区域上。
所述的平曲面共用改善液晶显示穿透率的方法，其中，在步骤(4)中，当完成第一象限的曝光后，将掩膜版平移半颗像素的距离，开始第二次曝光此，以完成CF基板两个象限的曝光。
所述的平曲面共用改善液晶显示穿透率的方法，其中，所述追踪线的宽度为10～150um。
所述的平曲面共用改善液晶显示穿透率的方法，其中，所述追踪线的长度贯穿整个基板。
所述的平曲面共用改善液晶显示穿透率的方法，其中，所述追踪线的的数量为1～20条。
所述的平曲面共用改善液晶显示穿透率的方法，其中，所述追踪线位于像素开口区外。
所述的平曲面共用改善液晶显示穿透率的方法，其中，所述追踪线为ITO追踪线或IZO追踪线。
本发明的有益效果是：其利用激光图形化的方法，克服了技术偏见而能够使BPS+UV2A兼容使用，并提供理想的穿透率，尤其为曲面液晶显示屏提供了十分理想的技术支持。
附图说明
在下文中将基于实施例并参考附图来对本发明进行更详细的描述。其中：
图1A为现有技术中的UV2A制程的俯视图；
图1B为现有技术中的UV2A制程的侧视图；
图2A为现有技术中的采用BPS技术时的UV2A制程的俯视图；
图2B为现有技术中的采用BPS技术时的UV2A制程的侧视图；
图3A为根据本发明的利用激光在ITO上刻线的初始状态的俯视图；
图3B为根据本发明的利用激光在ITO上刻线的过程中的俯视图；
图4A为对CF侧曝光扫描的方向与数据线平行的示意图；
图4B显示了ITO与ITO追踪线的示意图；
图4C为ITO追踪线与数据线对齐的示意图；
图5A为对CF侧曝光扫描的方向与栅极线平行的示意图；
图5B显示了ITO与ITO追踪线的示意图；
图5C为ITO追踪线与栅极线对齐的示意图；
图6A为曝光过程中，掩膜版对激光所刻出的ITO追踪线进行追踪的示意图；
图6B为曝光过程中，掩膜版对激光所刻出的ITO追踪线进行追踪的另一示意图。
在附图中，相同的部件使用相同的附图标记。附图并未按照实际的比例。
具体实施方式
下面将结合附图对本发明作进一步说明。
本发明一种平曲面共用改善液晶显示穿透率的方法，其主要包括以下步骤：
(1)基于BPS工艺制程制作出基板，所述基板的PS和黑矩阵均设置在阵列基板(Array)一侧，而CF(color filter)基板一侧设置有全膜面的透明导电极(ITO或IZO)7；需要说明的是，在CF基板一侧设置有全膜面的透明导电极(ITO或IZO)是BPS工艺制程的技术特点。
(2)利用激光在CF基板的指定位置处刻上标记，除了在显示区内做追踪线标记，该标记也可位于基板的四周位置，使CF基板在UV2A曝光机台上与所述标记对位，完成精准位置的配向，进行后续的成盒(Cell)制程；需要说明的是，通过设置标记能够使CF基板与阵列基板精确对位，提高产品良率。
(3)如图3A和图3B所示，利用激光按照设定位置在ITO上通过蚀刻刻出直线，所述直线(即ITO追踪线4)需要与阵列基板一侧的栅极线6或数据线5的遮光区对齐；
此处需要说明的是，当对CF侧曝光扫描与数据线5平行时，则成盒后ITO追踪线4刻在数据线区域上(如图4A至图4C所示)；当对CF侧曝光扫描的方向与栅极线6平行时，则成盒后ITO追踪线4刻在栅极线区域上(如图5A至图5C所示)。在生产过程中需严格遵守该条件进行操作。
优选地，为保证CF基板上的透明导电极(ITO或IZO)的全面导通性，激光应在透明导电极(例如ITO)上刻出分段的线段。需要说明的是，所形成的ITO追踪线4为直线或线段时，其所完成的象限(domain)曝光精度是不同的，具体可根据产品需求进行选择。为了获得最优的CF基板上的透明导电极(ITO或IZO)的全面导通性，ITO追踪线4的每段线段的长度大于等于相邻线段之间的间隙。
此外需要说明的是，当ITO追踪线或IZO追踪线为直线时，其曝光精度虽不及分段的线段，然而直线的ITO追踪线或IZO追踪线所完成的象限曝光精度仍能够满足一般需求。
优选地，呈现出直线或线段形态的ITO追踪线的宽度为10～150um，并且其长度贯穿整个基板，此外ITO追踪线的数量优选为1～20条，但追踪线的数据不以此为限。
优选地，所述ITO追踪线的位置在成盒后会与阵列基板一侧的栅极线6或数据线5对齐，并位于像素(pixel)开口区外，需要说明的是，ITO追踪线位于像素开口区外不影响成像效果。
(4)如图6A和图6B所示，曝光过程中，掩膜版1对激光所刻出的ITO追踪线进行追踪，当完成第一象限(domain)的曝光后，将掩膜版1平移半颗像素(pixel)的距离，开始第二次曝光，由此，可完成CF基板两个象限的曝光。
具体地，所述掩膜版1移动的距离为(2n+1)*0.5P，其中，P为一颗像素的距离，n为0、1、2,……。即，只要掩膜版1平移(2n+1)倍的半颗像素的距离，并开始第二次曝光，即可完成CF基板两个象限的曝光。
综上所述，本发明提供了一种平曲面共用改善液晶显示穿透率的方法，利用激光图形化的方法，克服了技术偏见而能够使BPS+UV2A兼容使用，并提供理想的穿透率，尤其为曲面液晶显示屏提供了十分理想的技术支持。
虽然已经参考优选实施例对本发明进行了描述，但在不脱离本发明的范围的情况下，可以对其进行各种改进并且可以用等效物替换其中的部件。尤其是，只要不存在结构冲突，各个实施例中所提到的各项技术特征均可以任意方式组合起来。本发明并不局限于文中公开的特定实施例，而是包括落入权利要求的范围内的所有技术方案。

Claims (10)

  1. 一种平曲面共用改善液晶显示穿透率的方法，其中，包括以下步骤：
    (1)基于BPS工艺制程制作出基板，所述基板包括阵列基板和CF基板，其中，阵列基板一侧设置有间隔物和黑矩阵，所述CF基板一侧设置有全膜面的透明导电极；
    (2)利用激光在CF基板的指定位置处刻上标记，使CF基板在UV2A曝光机台上与所述标记对位；
    (3)利用激光在所述透明导电极上刻出追踪线，所述追踪线与阵列基板一侧的栅极线或数据线的遮光区对齐；
    (4)对基板进行曝光，掩膜版对所述追踪线进行追踪。
  2. 根据权利要求1所述的平曲面共用改善液晶显示穿透率的方法，其中，在步骤(2)中，所述追踪线为直线。
  3. 根据权利要求1所述的平曲面共用改善液晶显示穿透率的方法，其中，在步骤(2)中，所述追踪线为分段的线段。
  4. 根据权利要求1所述的平曲面共用改善液晶显示穿透率的方法，其中，在步骤(3)中，当对CF侧曝光扫描与数据线平行时，则成盒后追踪线刻在对应数据线的区域上；当对CF侧曝光扫描的方向与栅极线平行时，则成盒后追踪线刻在对应栅极线的区域上。
  5. 根据权利要求1所述的平曲面共用改善液晶显示穿透率的方法，其中，在步骤(4)中，当完成第一象限的曝光后，将掩膜版平移半颗像素的距离，开始第二次曝光此，以完成CF基板两个象限的曝光。
  6. 根据权利要求1所述的平曲面共用改善液晶显示穿透率的方法，其中，所述追踪线的宽度为10～150um。
  7. 根据权利要求1所述的平曲面共用改善液晶显示穿透率的方法，其中，所述追踪线的长度贯穿整个基板。
  8. 根据权利要求1所述的平曲面共用改善液晶显示穿透率的方法，其中，所述追踪线的的数量为1～20条。
  9. 根据权利要求1所述的平曲面共用改善液晶显示穿透率的方法，其中，所述追踪线位于像素开口区外。
  10. 根据权利要求1所述的平曲面共用改善液晶显示穿透率的方法，其中，所述追踪线为ITO追踪线或IZO追踪线。
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