WO2018111043A1 - Composition photopolymérisable pour former un motif de cadre, procédé de fabrication de motif de cadre de substrat d'affichage l'utilisant, motif de cadre ainsi fabriqué - Google Patents

Composition photopolymérisable pour former un motif de cadre, procédé de fabrication de motif de cadre de substrat d'affichage l'utilisant, motif de cadre ainsi fabriqué Download PDF

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Publication number
WO2018111043A1
WO2018111043A1 PCT/KR2017/014866 KR2017014866W WO2018111043A1 WO 2018111043 A1 WO2018111043 A1 WO 2018111043A1 KR 2017014866 W KR2017014866 W KR 2017014866W WO 2018111043 A1 WO2018111043 A1 WO 2018111043A1
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Prior art keywords
bezel pattern
forming
photopolymerizable composition
bezel
pattern
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PCT/KR2017/014866
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English (en)
Korean (ko)
Inventor
박성은
유재현
김아름
김준형
Original Assignee
주식회사 엘지화학
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Priority to JP2019510798A priority Critical patent/JP6870194B2/ja
Priority to CN201780060232.8A priority patent/CN109804312A/zh
Publication of WO2018111043A1 publication Critical patent/WO2018111043A1/fr

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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/133308—Support structures for LCD panels, e.g. frames or bezels
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography

Definitions

  • the present invention relates to a photopolymerizable composition for forming a bezel pattern, a method of manufacturing a bezel pattern of a display substrate using the same, and a bezel pattern manufactured thereby.
  • circuits for applying an electric signal to operate the device are located at four edges of the inside of the device. Circuits made of metals such as copper or aluminum reflect external light and require a bezel to block it. Conventionally, a separate plastic structure case has been used, but recently, a method of directly forming a bezel pattern on a touch screen or a thin film transistor substrate using a printing method such as screen printing or inkjet has been used.
  • a solvent having a low boiling point is removed, a solvent having a high boiling point, or a solvent-free composition composed of only a reactive component having a high boiling point is used as in FIG. 2.
  • a solvent having a high boiling point is used, the drying problem can be solved, but since evaporation is too slow, a residual solvent remains in the film even after curing, resulting in poor curing rate and film characteristics.
  • Patent Document 1 KR 10-2013-0112003 A
  • the present invention by forming a bezel pattern using a photopolymerizable composition for forming a bezel pattern having a high boiling point, but does not lower the curing reaction rate, thereby remaining in the thin film in the process film characteristics It aims at forming the bezel pattern which does not show a fall and hardening inhibition.
  • This invention provides the photopolymerizable composition for bezel pattern formation containing a coloring agent, an epoxy compound, an oxetane compound, a photoinitiator, and a solvent whose boiling point is 190-280 degreeC.
  • the present invention using the photopolymerizable composition for forming a bezel pattern, forming a bezel pattern on a substrate; And curing the bezel pattern. It provides a method of manufacturing a bezel pattern for a display substrate comprising a.
  • the present invention provides a bezel pattern for a display substrate formed by curing the photopolymerizable composition for forming a bezel pattern.
  • the present invention provides a display substrate including the bezel pattern for the display substrate.
  • the photopolymerizable composition for forming bezel patterns which has a high boiling point and does not decrease the curing reaction rate, is used, in forming a bezel pattern, it remains in the thin film in the process and exhibits no deterioration in film properties and hardening inhibition. There is an advantage.
  • FIG. 1 is a schematic diagram showing an inkjet process according to the prior art.
  • Figure 2 is a schematic diagram showing another inkjet process according to the prior art.
  • This invention provides the photopolymerizable composition for bezel pattern formation containing a coloring agent, an epoxy compound, an oxetane compound, a photoinitiator, and a solvent whose boiling point is 190-280 degreeC.
  • the photopolymerizable composition for forming a bezel pattern of the present invention may further include any one or more selected from the group consisting of a surfactant, an adhesion promoter, a diluent and a photosensitizer.
  • a radically polymerizable compound and a cationic polymerizable compound may be mainly used in the photopolymerizable composition for forming a bezel pattern.
  • the radically polymerizable compound is not suitable for curing a thin film because it suffers from a hardening disorder due to oxygen, and is not suitable for forming a bezel pattern due to its high adhesion shrinkage and low adhesion to a glass substrate.
  • the cationic polymerization type compound it is generally advantageous for curing the thin film because the curing shrinkage rate is low and the influence by oxygen is small.
  • the photopolymerizable composition for bezel pattern formation used by this invention contains an epoxy compound as a cationic curing component.
  • the epoxy compound is selected from a bisphenol type epoxy compound, a novolak type epoxy compound, a glycidyl ester type epoxy compound, a glycidyl amine type epoxy compound, a linear aliphatic epoxy compound, a biphenyl type epoxy compound, and an alicyclic epoxy compound. It may be one kind or a mixture of two kinds.
  • the alicyclic epoxy compound may mean a compound including at least one epoxidized aliphatic ring group.
  • the epoxidized aliphatic ring group means an epoxy group bonded to an alicyclic ring, for example, a 3,4-epoxycyclopentyl group, 3,4-epoxy Cyclohexyl group, 3,4-epoxycyclopentylmethyl group, 3,4-epoxycyclohexylmethyl group, 2- (3,4-epoxycyclopentyl) ethyl group, 2- (3,4-epoxycyclohexyl) ethyl group, 3- Functional groups, such as a (3, 4- epoxycyclo petyl) propyl group or 3- (3, 4- epoxy cyclohexyl) propyl group, can be illustrated.
  • the hydrogen atom constituting the alicyclic ring in the above may be optionally substituted with a substituent such as an alkyl group.
  • a substituent such as an alkyl group.
  • the content of the epoxy compound is preferably 5 to 40% by weight, and more preferably 10 to 30% by weight based on the total weight of the photopolymerizable composition for forming the bezel pattern. When it exceeds 40 weight%, the viscosity of a composition will rise and when it is less than 5 weight%, hardening sensitivity will fall.
  • the photopolymerizable composition for forming a bezel pattern includes an oxetane compound as another cationically polymerizable monomer.
  • the oxetane compound is a compound having a four-membered cyclic ether group in its molecular structure, and can act to lower the viscosity of the cationic cured ink composition (eg, less than 50 cPs at 25 ° C.).
  • oxetane compound For example, "Alon oxetane OXT-101", “Alon oxetane OXT-121", “Alon oxetane OXT-211", “Alon oxetane OXT-221" of Toagosei Co., Ltd., or "Alonoxetane OXT-212" etc. can be used. These can be used individually or in combination of 2 or more types.
  • the content of the oxetane compound may be 20 to 70% by weight, and more preferably 40 to 60% by weight, based on the total weight of the photopolymerizable composition for forming bezel patterns. When it exceeds 70 weight%, hardening sensitivity will be low, and when it is less than 20 weight%, a viscosity will rise and coating property will fall.
  • the oxetane compound of this invention can be used including the oxetane compound which has one oxetane ring, and the oxetane compound which has two oxetane rings.
  • the viscosity and the flexibility of the membrane can be adjusted.
  • an oxetane compound having one oxetane ring The content range of the oxetane compound having two oxetane rings is in the range of 1:16 to 1: 3. It is preferable to use.
  • the ink composition of the present invention includes, as a cationic photopolymerization initiator, a compound which produces a cation species or bronsted acid by irradiation of ultraviolet rays, for example, an iodonium salt or a sulfonium salt, but is not limited thereto. It doesn't happen.
  • the iodonium salt or sulfonium salt may cause a curing reaction to form a polymer by reacting monomers having unsaturated double bonds contained in the ink during UV curing, and may use a photosensitizer according to polymerization efficiency.
  • the photopolymerization initiator may have an anion represented by SbF 6- , AsF 6- , BF 6- , (C 6 F 5 ) 4 B-, PF 6 -or RfnF 6-n , but is not limited thereto. It doesn't happen.
  • the photopolymerization initiator is preferably included in 0.5 to 10% by weight based on the total weight of the photopolymerizable composition for bezel pattern formation. If the content of the photopolymerization initiator is less than 0.5% by weight, the curing reaction may not be sufficient. If the content of the photopolymerization initiator is more than 10% by weight, all of the photopolymerization initiator may not be dissolved or the viscosity may increase, thereby decreasing the coating property.
  • the ink composition may include a solvent having a boiling point of 190 to 280 ° C. in order to improve the coating property by decreasing the viscosity of the ink to increase fluidity, and to prevent a decrease in shading density per unit thickness, and more preferably, a boiling point.
  • the solvent which is 200-260 degreeC can be included.
  • the nozzle may not be dried during inkjet printing, and the curing rate may not be lowered, thereby causing problems in curing of the coating film.
  • any one or more selected from the group consisting of alcohols, glycols and glycol ethers having a boiling point of 190 to 280 ° C can be used.
  • the glycol-based ether having a boiling point of 190 to 280 ° C. may be an alkylene glycol alkyl ether having C 1 to C 6 carbon atoms in the alkyl glycol moiety, more preferably ethylene glycol alkyl ether, diethylene glycol alkyl ether, triethylene glycol alkyl Any one or more selected from the group consisting of ether, tetraethylene glycol alkyl ether, propylene glycol alkyl ether, dipropylene glycol alkyl ether, and glycol dialkylene ether may be used, and most preferably the number of carbon atoms in the alkyl ether portion is C1 to It is possible to use monoalkyl ether having one alkyl group of C4 or dialkyl ether having two alkyl groups of C1 to C4 number of carbon atoms in the alkyl ether portion.
  • the content of the solvent is preferably 1 to 40% by weight based on the total weight of the photopolymerizable composition for forming bezel patterns. When the content of the solvent is more than 40% by weight, the curing sensitivity is lowered.
  • the photopolymerizable composition for forming a bezel pattern includes a colorant.
  • the colorant may be used in the form of a pigment dispersion containing one or more pigments, dyes or mixtures thereof, and is not particularly limited as long as it can express colors as necessary.
  • carbon black, graphite, a metal oxide, an organic black pigment etc. can be used as said pigment.
  • Examples of carbon black include cysto 5HIISAF-HS, cysto KH, cysto 3HHAF-HS, cysto NH, cysto 3M, cysto 300HAF-LS, cysto 116HMMAF-HS, cysto 116MAF, cysto FMFEF-HS , Sisto SOFEF, Sisto VGPF, Sisto SVHSRF-HS and Sisto SSRF (Donghae Carbon Co., Ltd.); Diagram Black II, Diagram Black N339, Diagram Black SH, Diagram Black H, Diagram LH, Diagram HA, Diagram SF, Diagram N550M, Diagram M, Diagram E, Diagram G, Diagram R, Diagram N760M, Diagram LR, # 2700, # 2600, # 2400, # 2350, # 2300, # 2200, # 1000, # 980, # 900, MCF88, # 52, # 50, # 47, # 45, # 45L, # 25, # CF9, # 95, # 3030, # 3050, MA7, MA77, MA8, MA11, MA
  • aniline black, lactam black, or perylene black series may be used, but is not limited thereto.
  • the photopolymerizable composition for forming a bezel pattern is cured by irradiation of ultraviolet rays (for example, 250 or 450 nm), more preferably, long wavelength ultraviolet rays (for example, 360 nm to 410 nm), and thus a certain level of optical density (OD). Characterized in having a.
  • the content of the colorant is preferably 1 to 15% by weight, and more preferably 3 to 10% by weight based on the total weight of the photopolymerizable composition for forming bezel patterns. If the content of the colorant is less than 1% by weight, there is no level of OD applicable to the bezel, and if it is more than 15% by weight, the excess colorant is not dispersed in the ink and a precipitate may be formed.
  • the OD value may be maintained in the range of 0.1 to 1.5 per 1.0 ⁇ m of the film thickness.
  • the photopolymerizable composition for forming a bezel pattern includes a surfactant that lowers the surface tension of the ink composition to exhibit a small taper angle.
  • the surfactant is preferably included in 0.1 to 5.0% by weight, more preferably 0.5 to 3.0% by weight relative to the total weight of the photopolymerizable composition for bezel pattern formation.
  • amount of the surfactant is less than 0.1% by weight, the effect of lowering the surface tension of the composition is not sufficient, so that the coating cannot be uniformly applied when the composition is coated on the substrate, and when the content is greater than 5.0% by weight, the surfactant is used in an excessive amount. There is a problem that the compatibility and anti-foaming of the composition is rather reduced.
  • the bezel pattern forming photopolymerizable composition may further include a photosensitizer to compensate for the curability in the long wavelength active energy ray.
  • the photosensitizers are anthracene, 9,10-dibutoxyanthracene, 9,10-dimethoxy
  • Anthracene-based compounds such as anthracene, 9,10-diethoxy anthracene and 2-ethyl-9,10-dimethoxyanthracene; Benzophenone, 4,4-bis (dimethylamino) benzophenone, 4,4-bis (diethylamino) benzophenone, 2,4,6-trimethylaminobenzophenone, methyl-o-benzoylbenzoate, 3,3 Benzophenone compounds such as dimethyl-4-methoxybenzophenone and 3,3,4,4-tetra (t-butylperoxycarbonyl) benzophenone; Acetophenone; Ketone compounds such as dimethoxy acetophenone, diethoxy acetophenone, 2-hydroxy-2-methyl-1-phenylpropan-1-one, and propanone; Perylene; Fluorenone compounds such as 9-florenone, 2-chloro-9-prorenone, and 2-methyl-9-florenone; Such as thioxan
  • the photosensitizer is preferably included in an amount of 1 to 200 parts by weight, more preferably 10 to 100 parts by weight, based on 100 parts by weight of the photopolymerization initiator. If less than 1 part by weight can not be expected to increase the curing sensitivity at the desired wavelength, if more than 200 parts by weight there is a problem in that the photosensitizer is not dissolved and the adhesion and crosslinking density of the pattern is reduced.
  • the photopolymerizable composition for forming a bezel pattern may further include an adhesion promoter as an additive.
  • the film attached to the bezel pattern is repeatedly contracted and expanded according to the use conditions such as temperature and humidity, so that the bezel pattern is stressed so that the film and the bezel may be removed from the glass substrate.
  • at least one silane compound selected from the group consisting of an alkoxy silane compound, an epoxy silane compound, an aminophenyl silane compound, an amino silane compound, a mercapto silane compound and a vinyl silane compound is used as an adhesion promoter. When used, excellent results can be obtained.
  • epoxy silane compounds are more preferable as the adhesion promoter of the present invention.
  • the adhesion promoter is preferably included in 0.1 to 15% by weight based on the total weight of the ink composition, more preferably 2 to 10% by weight. If the amount is less than 0.1 wt%, the bezel pattern may not be prevented from being peeled from the glass substrate. If the amount is more than 15 wt%, the viscosity of the ink solution may be increased and the dispersibility may be low.
  • the photopolymerizable composition for forming a bezel pattern used in the present invention spreads within a short time immediately after inkjet printing, exhibits excellent coating film properties, and cures to exhibit excellent adhesive properties. Therefore, when applying the photopolymerizable composition for forming the bezel pattern, it is preferable to install a UV-lamp immediately behind the inkjet head so as to be curable at the same time as inkjet printing.
  • the curing dose is 1 to 10,000 mJ / cm 2, and preferably 80 to 2,000 mJ / cm 2.
  • the photopolymerizable composition for forming a bezel pattern is cured by absorbing radiation in a wavelength range of 250 nm to 450 nm, preferably 360 nm to 410 nm.
  • the photopolymerizable composition for forming a bezel pattern is, for example, suitable for an inkjet process by having a viscosity of 1 to 20 mPa ⁇ s at 25 ° C.
  • the photopolymerizable composition for bezel pattern formation which has said viscosity range has favorable discharge at a process temperature.
  • the said process temperature means the temperature heated so that the viscosity of a curable ink composition may become low.
  • the process temperature may be 10 ° C to 100 ° C, preferably 20 ° C to 70 ° C.
  • the photopolymerizable composition for forming a bezel pattern may have a residual mass after elapse of two hours when evaporated in a convection oven at 35 ° C., for example, 85% or more, so that the evaporation rate is low, but the curing rate and the film properties are not poor. do.
  • An upper end portion of the bezel pattern formed of the photopolymerizable composition for forming a bezel pattern is attached to the upper substrate through an adhesive layer for forming an upper substrate. Since the adhesive for the upper base material such as a polyvinyl alcohol-based pressure-sensitive adhesive, a polyurethane-based pressure-sensitive adhesive and the like excellent adhesive force, when using the photopolymerizable composition for forming the bezel pattern it is possible to obtain an effect of improving the adhesion between the bezel pattern and the upper substrate.
  • the adhesive for the upper base material such as a polyvinyl alcohol-based pressure-sensitive adhesive, a polyurethane-based pressure-sensitive adhesive and the like excellent adhesive force, when using the photopolymerizable composition for forming the bezel pattern it is possible to obtain an effect of improving the adhesion between the bezel pattern and the upper substrate.
  • the method for manufacturing a bezel pattern of the display substrate of the present invention uses the photopolymerizable composition for forming the bezel pattern.
  • the method of manufacturing a bezel pattern of the display substrate of the present invention a) using the photopolymerizable composition for forming the bezel pattern, forming a bezel pattern on the substrate; And b) curing the bezel pattern.
  • the method for manufacturing a bezel pattern of the display substrate of the present invention may further include a step of cleaning and drying the substrate before the step of forming the bezel pattern. This is to selectively perform the surface treatment according to the surface energy of the substrate in order to improve the coating property of the ink and to remove stains caused by foreign substances.
  • the surface treatment may be performed by a treatment such as a wet surface treatment, UV ozone, atmospheric pressure plasma.
  • a method selected from inkjet printing, gravure coating, and reverse offset coating using an ultraviolet curing composition may be used instead of photolithography and screen printing. It is preferable that the viscosity of the ink composition of this invention is 1-20 mPa * s in order to apply the said method.
  • An ink composition having a low viscosity of 1 to 20 mPa ⁇ s is applied at a height of 0.1 to 20 ⁇ m, more specifically 0.5 to 5 ⁇ m, to form a bezel pattern on a specific portion of the substrate by the above method.
  • the applied composition is cured through exposure including ultraviolet rays, and as a result, a bezel pattern having a thin film thickness of 0.1 to 20 ⁇ m, more specifically 0.5 to 5 ⁇ m, can be produced.
  • a light source for curing the photopolymerizable composition for forming a bezel pattern of the present invention for example, mercury vapor arc (arc), carbon arc, Xe arc, LED curing machine, etc. which emit light having a wavelength of 250 to 450 nm, but not necessarily It is not limited.
  • the optical density after curing the photopolymerizable composition for forming the bezel pattern is 0.1 to 1.5 based on a film thickness of 1.0 ⁇ m, and may be 0.5 to 1.0 as necessary. In this case, there is an advantage of excellent shielding characteristics by the bezel pattern. If the optical density exceeds 1.5, the required content of the pigment to be added is very high, which may adversely affect the ink manufacturing and inkjet process, and may inhibit the curing of the photopolymerizable composition for bezel pattern formation by radiation. have.
  • the present invention provides a bezel pattern of a display substrate manufactured by the above method.
  • the bezel pattern refers to a pattern formed on the edges of various devices such as a watch and a display device.
  • the optical density of the bezel pattern may be 0.1 to 1.5 based on a film thickness of 1.0 ⁇ m, and may be 0.5 to 1.0 as necessary. In this case, there is an advantage of excellent shielding characteristics by the bezel pattern. If the optical density exceeds 1.5, the required content of the pigment to be added is very high, which may adversely affect the ink manufacturing and inkjet process, and may inhibit the curing of the photopolymerizable composition for bezel pattern formation by radiation. have.
  • the present invention provides a display substrate including the bezel pattern.
  • the display includes a plasma display panel (PDP), a light emitting diode (LED), an organic light emitting diode (OLED), a liquid crystal display (LCD), a thin film transistor liquid crystal
  • PDP plasma display panel
  • LED light emitting diode
  • OLED organic light emitting diode
  • LCD liquid crystal display
  • TFT thin film transistor-liquid crystal display
  • CRT cathode ray tube
  • A1 Carbon Black Pigment Dispersion (BK-5026, Tokushiki Co., Ltd.)
  • KBM-403 (3-glycidoxypropyl trimethoxysilane, Shin-Etsu Silicone)
  • DEGBEA diethylene glycol monobutyl ether acetate, hereinafter BCA, boiling point 248 degreeC
  • DEGEEA diethylene glycol monoethyl ether acetate, hereinafter ECA, boiling point 220 °C
  • G3 DEGDBE (diethylene glycol dibutyl ether, hereinafter BDGy, boiling point 250 °C)
  • G4 DPMA (dipropylene glycol methyl ether acetate, boiling point 220 °C)
  • G5 EGBE (ethylene glycol monobutyl ether, hereinafter BCs, boiling point 170 °C)
  • TPGBE tripropylene glycol butyl ether, boiling point 291 °C
  • G7 benzyl alcohol (boiling point 205 °C)
  • G8 diethylene glycol (boiling point 245 ° C)
  • H1 triethylene glycol divinyl ether, BASF
  • compositions prepared in Examples 1 to 5 and Comparative Examples 1 to 4 were coated on the cleaned LCD glass substrate by an inkjet coating method so as to have a thickness of 2 ⁇ m after curing.
  • the bezel pattern was formed by curing the coating layer by irradiating UV under the following conditions within 1 minute after coating.
  • UV irradiator used a high pressure mercury lamp, and was irradiated with a light amount of 1000mJ / cm 2 based on UV.
  • a bezel pattern was formed on the upper surface of the display panel (hereinafter referred to as Panel 1) according to the method of Preparation Example 1, and an NRT polarizing film manufactured by LG Chemical using an acrylic adhesive layer was attached as an upper substrate. After attachment, the surroundings were encapsulated with a sealant to prevent the ingress of moisture and foreign matter into the gap between the polarizing film and the pattern.
  • each composition was placed in a convection oven at a temperature of 35 degrees for a period of time to observe the rate of evaporation of the composition.
  • the definition of evaporation rate was calculated as the ratio of the residue to the initial relative value by placing each composition in an aluminum dish by 1 g weight using a micro balance and then measuring the weight of the composition remaining after the passage of time in a convection oven. The measurement results are shown in Table 2 below. After 2 hours have elapsed after the start of evaporation, the residual mass ratio is 85% or more, and less than 85%.
  • Each composition was continuously discharged for 1 minute using an experimental inkjet printer (UJ-200, UniJet), and then the discharge was stopped for 15 minutes to allow drying of the nozzle to take a rest time, and then again discharged onto paper. Was carried out. It was evaluated whether the discharge of each composition was performed smoothly. The measurement results are shown in Table 2 below. When the ink is normally discharged on the paper and a normal printed matter is output, the result is indicated by ⁇ . When the discharge is poor due to drying of the ink, the quality of the printed product is deteriorated. Is represented by X.
  • Each said composition was apply
  • a UV irradiation apparatus high pressure mercury lamp, Innocure 5000, Cheil UV
  • Example Viscosity Evaporation rate Jetting Stability Curing sensitivity Optical density / thickness
  • Examples 1 to 5 according to the present invention used a glycol alkyl ether solvent having a boiling point of 210 °C to 260 °C, because of the low evaporation rate was good jetting stability, the curing was also good.
  • Examples 6 to 7 used glycol and alcohol solvents having a boiling point of 190 ° C. to 280 ° C., and evaporation rate and jetting stability were good. Although the curing sensitivity was good, it was somewhat insufficient compared with Examples 1-5.
  • Comparative Example 1 used a glycol alkyl ether solvent having a relatively low boiling point of 170 ° C., so that the evaporation rate was high, and thus the jetting stability was poor.
  • Comparative Example 2 has a good boiling stability because the evaporation rate is low because the boiling point is 291 °C excessively high glycol alkyl ether solvent, but the curing rate was poor.
  • the boiling point of the monomer compounds such as ECC and DOX is higher than 210 ° C., but the jetting stability is good. Was needed.
  • the content of the non-reactive volatile component in the liquid film was low, there was no reduction in the thickness before or after curing, so that the shading density / thickness was relatively insufficient.
  • Comparative Example 4 contained more than 40% of the ratio of the ECC composition, although the solvent was included, unlike the Comparative Example 3, the viscosity was high, and thus, the temperature was required.

Abstract

La présente invention concerne une composition photopolymérisable pour former un motif de cadre comprenant un colorant, un composé époxy, un composé oxétane, un initiateur de photopolymérisation, et un solvant ayant un point d'ébullition de 190 à 280 °C ; un procédé de fabrication d'un motif de cadre d'un substrat d'affichage l'utilisant ; et un motif de cadre l'utilisant.
PCT/KR2017/014866 2016-12-16 2017-12-15 Composition photopolymérisable pour former un motif de cadre, procédé de fabrication de motif de cadre de substrat d'affichage l'utilisant, motif de cadre ainsi fabriqué WO2018111043A1 (fr)

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JP2019510798A JP6870194B2 (ja) 2016-12-16 2017-12-15 ベゼルパターン形成用光重合性組成物、それを用いたディスプレイ基板のベゼルパターンの製造方法及びこれにより製造されたベゼルパターン
CN201780060232.8A CN109804312A (zh) 2016-12-16 2017-12-15 用于形成边框图案的可光聚合的组合物、显示面板的边框图案的制造方法、制造的边框图案

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KR1020160172292A KR102226800B1 (ko) 2016-12-16 2016-12-16 베젤 패턴 형성용 광중합성 조성물, 이를 이용한 디스플레이 기판의 베젤 패턴의 제조방법 및 이에 의하여 제조된 베젤 패턴
KR10-2016-0172292 2016-12-16

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KR20180070059A (ko) 2018-06-26
JP6870194B2 (ja) 2021-05-12
JP2019534341A (ja) 2019-11-28

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