WO2018093028A1 - Composition de résine photosensible auto-luminescente, filtre coloré préparé à l'aide de cette dernière et dispositif d'affichage d'image - Google Patents

Composition de résine photosensible auto-luminescente, filtre coloré préparé à l'aide de cette dernière et dispositif d'affichage d'image Download PDF

Info

Publication number
WO2018093028A1
WO2018093028A1 PCT/KR2017/009803 KR2017009803W WO2018093028A1 WO 2018093028 A1 WO2018093028 A1 WO 2018093028A1 KR 2017009803 W KR2017009803 W KR 2017009803W WO 2018093028 A1 WO2018093028 A1 WO 2018093028A1
Authority
WO
WIPO (PCT)
Prior art keywords
group
self
resin composition
photosensitive resin
weight
Prior art date
Application number
PCT/KR2017/009803
Other languages
English (en)
Korean (ko)
Inventor
왕현정
김형주
홍성훈
Original Assignee
동우화인켐 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 동우화인켐 주식회사 filed Critical 동우화인켐 주식회사
Priority to CN201780071640.3A priority Critical patent/CN109997079B/zh
Priority to JP2019527208A priority patent/JP6872017B2/ja
Publication of WO2018093028A1 publication Critical patent/WO2018093028A1/fr

Links

Images

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G02B5/223—Absorbing filters containing organic substances, e.g. dyes, inks or pigments
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J17/00—Gas-filled discharge tubes with solid cathode
    • H01J17/38—Cold-cathode tubes
    • H01J17/48—Cold-cathode tubes with more than one cathode or anode, e.g. sequence-discharge tube, counting tube, dekatron
    • H01J17/49—Display panels, e.g. with crossed electrodes, e.g. making use of direct current

Definitions

  • the present invention relates to a self-luminous photosensitive resin composition, a color filter manufactured using the same, and an image display device.
  • LCD liquid-crystal displays
  • the transmittance is controlled, and the three primary colors transmitted through the red, green, and blue color filters are mixed to realize full color.
  • the color filter is a thin film type optical component that extracts three colors of red, green, and blue from white light and enables the unit of fine pixels, and the size of one pixel is about tens to hundreds of micrometers.
  • a color filter includes a black matrix layer formed in a predetermined pattern on a transparent substrate for shielding the boundary between each pixel, and a plurality of colors (typically, red (R) and green (G) to form each pixel. And a pixel portion in which three primary colors of blue (B) are arranged in a predetermined order.
  • color filters have been adopted for a wide range of applications, such as notebook PCs, monitors, and mobile terminals, with the spread of flat panel displays as a key component to express colors in LCDs.
  • high color purity, high transmissivity, and low reflection type color filter manufacturing technologies are actively researched.
  • color filters are manufactured by coating three or more colors on a transparent substrate by a pigment dispersion method, electrodeposition method, printing method, dyeing method, transfer method, inkjet method, or the like.
  • a pigment dispersion method e.g., a pigment dispersion method, electrodeposition method, printing method, dyeing method, transfer method, inkjet method, or the like.
  • the pigment dispersion method using the pigment dispersion type photosensitive resin which is excellent in quality, precision, and performance is mainstream.
  • the pigment dispersion method which is one of the methods for implementing the color filter, coats the photosensitive resin composition including alkali soluble resin, photopolymerization monomer, photoinitiator, epoxy resin, solvent, and other additives on a transparent substrate provided with a black matrix, After exposing the pattern of the form to be formed, it is a method of forming a colored thin film by repeating a series of processes of removing the non-exposed areas with a solvent and thermally curing, and is active in manufacturing LCDs of mobile phones, laptops, monitors, and TVs. Is being applied.
  • pigments do not dissolve in solvents and exist as fine particles, they have recently reached a limit to display the sharper and more diverse colors required.
  • dyes have better color characteristics than pigments, studies have been conducted to replace pigments with dyes.
  • dyes also suffer from problems such as improving durability because they are less resistant to light and solvents, and ensuring sufficient solubility in solvents used in the production of color filters, although dyes are dissolved in solvents.
  • quantum dots that emits light instead of dyes or pigments has been proposed, as well as excellent color characteristics, higher color reproducibility, and improved performance such as high brightness and high contrast ratio.
  • Quantum dots emit light by themselves and can be used to generate light in the visible and infrared regions.
  • Quantum dots are small crystals of II-VI, III-V, IV-VI materials that typically have a diameter of 1 nm to 20 nm, smaller than the bulk exciton Bohr radius. Due to quantum confinement effects, the energy differences between the electronic states of a quantum dot are a function of both the composition and physical size of the quantum dot. Thus, the optical and optoelectronic properties of quantum dots can be tuned and adjusted by changing the physical size of the quantum dots.
  • the quantum dots absorb wavelengths shorter than the onset wavelength and emit light at the initiation wavelength.
  • the bandwidth of luminescence spectra of quantum dots is related to temperature dependent Doppler broadening, Heisenberg Uncertainty Principle and size distribution of quantum dots.
  • the emission band of the quantum dot can be controlled by varying the magnitude.
  • quantum dots can produce a range of unattainable colors using conventional dyes or pigments.
  • quantum dots are essentially non-scattering particles because of their nanoscale size.
  • it has a much shorter optical path than other dyes or pigments. Most of the light is absorbed by the quantum dots unless the thickness of the color filter is sufficient. Therefore, a method of controlling the thickness of the color filter, increasing the concentration of quantum dots, or introducing scattering particles has been proposed. Among these, problems in terms of color uniformity occur when adjusting thickness or concentration.
  • Korean Patent Laid-Open No. 10-2016-0060904 relates to an image display device including a self-luminous photosensitive resin composition and a color filter manufactured therefrom. And a self-luminous photosensitive resin composition comprising a scattering particle, a photopolymerizable compound, a photopolymerization initiator, an alkali-soluble resin and a solvent, and a color filter prepared therefrom.
  • Korean Patent Laid-Open No. 10-2016-0091708 relates to a color filter and an image display apparatus using the same; A first pixel layer including a quantum dot formed on the substrate; And a second pixel layer including scattering particles formed on the first pixel layer has a laminated structure.
  • Patent Document 1 Republic of Korea Patent Publication No. 10-2016-0060904 (2016.05.31.Dongwoo Fine Chem Co., Ltd.)
  • Patent Document 2 Republic of Korea Patent Publication No. 10-2016-0091708 (December 2016. Dongwoo Fine-Chem Co., Ltd.)
  • the present invention has been made to solve the above problems, by including a specific alkali-soluble resin and scattering particles together, the scattering material in the color filter pattern does not settle, and excellent color filter without the problem of lowering brightness and poor light retention rate It aims at providing the photosensitive resin composition which can be manufactured.
  • an object of the present invention is to provide a color filter made of the self-luminous photosensitive resin composition and an image display device including the same.
  • the self-luminous photosensitive resin composition according to an embodiment of the present invention for achieving the above object comprises scattering particles and an alkali-soluble resin, the alkali-soluble resin has a weight average molecular weight of 3000 to 15000 in terms of polystyrene, acrylic equivalent of 300 To 2000 g / eq.
  • the present invention is characterized by a color filter made of the self-luminous photosensitive resin composition and an image display device including the same.
  • the self-luminous photosensitive resin composition according to the present invention includes scattering particles and scattering in a color filter pattern by containing an alkali soluble resin having a weight average molecular weight of 3000 to 15000 in terms of polystyrene and an acrylic equivalent of 300 to 2000 g / eq. It is possible to manufacture an excellent color filter without the problem of lowering luminance and poor light retention rate without the sieve settling.
  • FIG. 1 is a diagram illustrating sedimentation by measuring TiO 2 sedimentation properties of a lower part of a pattern.
  • the self-luminous photosensitive resin composition of the present invention comprises scattering particles and an alkali-soluble resin, wherein the alkali-soluble resin has a weight average molecular weight of 3000 to 15000 in terms of polystyrene, and an acrylic equivalent of 300 to 2000 g / eq.
  • Alkali-soluble resin contained in the self-luminous photosensitive resin composition of this invention makes the non-exposed part of the photosensitive resin layer alkali-soluble, and can remove it, and serves to remain an exposure area
  • the alkali-soluble resin of the present invention has a polymerizable unsaturated bond to effectively form a protective layer around the surface of the quantum dot in the exposure step, to maintain the high brightness by excluding the effects of high temperature and oxygen radicals in the POB process as much as possible Can be.
  • the alkali-soluble resin preferably has a weight average molecular weight of 3000 to 15000 in terms of polystyrene, and when the weight average molecular weight of the alkali-soluble resin is in the above range, it is possible to reduce the settling properties of the scattering body.
  • the alkali-soluble resin is preferably an acrylic equivalent of 300 to 2000 g / eq, more preferably 500 to 1000 g / eq.
  • the alkali-soluble resin acrylic equivalent is within the above range, it is possible to prevent the quenching phenomenon during the color filter process.
  • the acrylic equivalent of the alkali-soluble resin exceeds the above range, the ability to effectively protect the quantum dot is insufficient, and it is not suitable because it is difficult to prevent the scattering body from settling, and when the acrylic equivalent is less than the above range, the luminous efficiency And it is good in the sedimentation surface, but there is a problem that does not dissolve during development, peeling.
  • the alkali-soluble resin according to the present invention by adjusting the weight average molecular weight and the acrylic equivalent as described above, evenly distributed composition in the pattern of the self-luminous photosensitive resin composition, so that light scattering effectively occurs, preventing the problem of scattering body settling In addition, there is an effect that can prevent the lowering of the luminance and poor light retention.
  • the acid value of the alkali-soluble resin may be in the range of 30 to 150mgKOH / g.
  • the acid value is a value measured as the amount of potassium hydroxide (mg) required to neutralize 1 g of the acrylic polymer and is involved in solubility.
  • the acid value of the alkali-soluble resin is less than the above range, the solubility in the alkaline developer is low and there is a risk of leaving a residue on the substrate, if the acid value exceeds the above range may be more likely to break the pattern.
  • it is 1.0-6.0, and, as for the molecular weight distribution of the said alkali-soluble resin, it is more preferable that it is 1.5-4.0. Developability is excellent in the molecular weight distribution of the said alkali-soluble resin being in the said range.
  • the self-luminous photosensitive resin composition including the alkali-soluble resin satisfying the above conditions, not only the protective layer is effectively formed on the surface of the quantum dot during the exposure step, but also the scattering body does not settle under the pattern as the degree of curing in the matrix is increased. Help to distribute the quantum dots evenly.
  • the alkali-soluble resin is not particularly limited as long as it has a polymerizable unsaturated bond, but specific examples of the monomer that can be used include 3- (acryloyloxy) -2-hydroxypropyl (meth) acrylate and 2-methoxy- 3-propy-2-noyloxy-propyl) -2-methyl-2-propinoate, (2-oxydanyl-3-propy-2-noyloxy-propyl) -2-butinoate, 1,3- Propanediol di (meth) acrylate, 1,3-butanediol di (meth) acrylate, hydroquinone di (meth) acrylate, 1,4-phenyline di (meth) acrylate, 1, 4-cyclohexanediol di (meth) acrylate, 2-propinoyloxymethyl-2-propinoate, triethylene glycol di (meth) acrylate, tetraethylene glycol di (meth) acrylate,
  • the alkali-soluble resin includes a repeating unit represented by the following formula (1), it is possible to more effectively control the sedimentation.
  • An alkyloxy group or C 1 to C 30 alkyloxycarbonylaminoalkyl group is C 1 to C 20 alkyl group, C 1 to C 20 alkoxy group, an aralkyl group of C 1 to C 20, C 6 to C 20 aryl group, C 1 to an acyloxy group of C 20, C 1 to C 20 acyl group, C 1 to C 20 alkoxycarbonyl group, C 6 to the C 20 arylcarbonyl group, C 1 to C 20 dialkylamino group, C 1 to C 20 alkylamino group, halogen atom, cyano group, furyl group, furfuryl group, tetrahydrofuryl group, tetrahydrofurfuryl group, Import of C 1 to C 20 alkylthio, trimethylsilyl group, and a trifluoromethyl group, a carboxyl group, a thieny
  • R 3 is represented by -R 5 -R 6 -COOH
  • R 7 to R 27 are the same as or different from each other, and are each independently hydrogen, C 1 to C 30 alkylene, C 6 to C 30 arylene group, or C 6 to C 30 cycloalkylene group,
  • R 4 is a C 1 to C 20 alkyl (meth) acrylate group.
  • R 2 is preferably a C 1 to C 20 alkyl group, C 1 to C 20 alkyloxy group, or C 1 to C 20 alkyloxycarbonylaminoalkyl group, methyl, ethyl, propylene, butyl Group, ethyleneoxy group, diethyleneoxy group, triethyleneoxy group, ethyloxycarbonylaminoethyl group are more preferable, and these are functional groups of a trivalent form.
  • the R 4 is an alkyl (meth) acrylate group is preferable, and an acrylate or methylacrylate group of C 1 to C 12 is more preferable.
  • R 6 is C 1 to C 20 alkylene, C 2 to C 20 alkenylene, C 6 to C 20 arylene group, or C 6 to C 20 cycloalkylene group, these are substituted with a carboxyl group or It is preferred to be unsubstituted.
  • R 6 is a methylene group, an ethylene group, a propylene group, isopropylene, pentylene, ethenylene, 2-methyl-ethenylene, dimethylpropylene group, butylene group, cyclohexylene group, 4-cyclohexynyl group, It is more preferable that they are a bicyclo [4.4.0] decylene group, a bicyclo [2.2.1] -2-heptinylene group, a phenylene group, a carboxyphenylene, or a naphthalenyl group.
  • an "alkyl group” includes straight or branched forms, for example methyl, ethyl, n-propyl, i-propylene, n-butyl, isobutyl, t-butyl, n-pentyl, n-hexyl , n-octyl, n-decyl and the like, alkylene means a divalent form of alkyl.
  • an "aryl group” includes phenyl, biphenyl, terphenyl, stilbenyl, naphthyl, anthracenyl, phenanthryl, pyrenyl, and the like, and arylene means a divalent form of aryl.
  • a "cycloalkyl group” refers to cyclopentyl, cyclohexyl, cycloheptyl, adamantyl, bornyl, norbornyl and norbornenyl and their condensed forms of dicyclopentyl, dicyclohexyl, dicycloheptyl , Diadamantyl, dibornyl, dinorbornyl or dinorbornenyl, and the like, cycloalkylene means a divalent form of cycloalkyl.
  • the alkali-soluble resin may be a homopolymer, or may be used in the form of a copolymer with another unsaturated monomer or a blend with a polymer polymerized with another unsaturated monomer.
  • the copolymer may be in the form of an alternating copolymer, a random copolymer or a block copolymer, and is not particularly limited in the present invention.
  • the kind of the copolymerizable monomer is not particularly limited, and specific examples thereof include methyl (meth) acrylate, ethyl (meth) acrylate, butyl (meth) acrylate, 2-hydroxyethyl (meth) acrylate, and amino.
  • Unsubstituted or substituted alkyl ester compounds of unsaturated carboxylic acids such as ethyl (meth) acrylate; Cyclopentyl (meth) acrylate, cyclohexyl (meth) acrylate, methylcyclohexyl (meth) acrylate, cycloheptyl (meth) acrylate, cyclooctyl (meth) acrylate, menthyl (meth) acrylate, cyclophene Tenyl (meth) acrylate, cyclohexenyl (meth) acrylate, cycloheptenyl (meth) acrylate, cyclooctenyl (meth) acrylate, mentadienyl (meth) acrylate, isobornyl (meth) acrylic Containing alicyclic substituents such as late, pinanyl (meth) acrylate, adamantyl (meth) acrylate
  • Vinyl cyanide compounds such as carboxylic acid vinyl esters such as vinyl acetate and vinyl propionate, (meth) acrylonitrile and? -Chloroacrylonitrile
  • Maleimide compounds such as N-cyclohexyl maleimide, N-phenyl maleimide, and N-benzyl maleimide, etc. are mentioned.
  • the content of the alkali-soluble resin is preferably contained in 5 to 80% by weight, more preferably in 10 to 70% by weight relative to 100% by weight of the self-luminous photosensitive resin composition.
  • the solubility in the developing solution is sufficient, so that pattern formation is easy, and the film reduction of the pixel portion of the exposed portion is prevented at the time of development, so that the missing property of the non-pixel portion is improved.
  • the scattering particles are used to increase the light efficiency of the color filter.
  • the light irradiated from the light source is incident on the color filter at a critical angle, and the spontaneous emission light spontaneously emitted by the incident light or the quantum dots meets the scattering particles and increases the light emission intensity due to the increase in the light path. Increasing the light efficiency.
  • the scattering particles may be any conventional inorganic material, preferably a metal oxide.
  • the metal oxide is Li, Be, B, Na, Mg, Al, Si, K, Ca, Sc, V, Cr, Mn, Fe, Ni, Cu, Zn, Ga, Ge, Rb, Sr, Y, Mo, Cs, Ba, La, Hf, W, Tl, Pb, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Ti, Sb, Sn, Zr, Nb, An oxide comprising one metal selected from the group consisting of Ce, Ta, In and combinations thereof is possible.
  • the scattering particles limit the average particle diameter and the content in the entire composition so as to sufficiently improve the emission intensity of the color filter.
  • the scattering particles preferably have an average particle diameter of 10 to 1000 nm, and have an average particle diameter of 50 to 500 nm. It is more preferable. If the scattering particle size is too small, a sufficient scattering effect of the light emitted from the quantum dots cannot be expected, and on the contrary, if the scattering particle size is too large, the surface of the self-luminous layer having a uniform quality or submerging cannot be obtained.
  • the scattering particles may be used from 0.1 to 50% by weight within 100% by weight of the self-luminous photosensitive resin composition, preferably from 0.5 to 30% by weight. If the content of the scattering particles is less than the above range can not secure the luminescence intensity to be obtained, if it exceeds the above range, the effect of further increasing the luminescence intensity is insufficient, and the stability of the composition may occur.
  • the self-luminous photosensitive resin composition according to the present invention includes a scattering particle which is a metal oxide in the alkali-soluble resin, so that the scattering particle can be prevented from settling over time.
  • Quantum dots are nanoscale semiconductor materials. Atoms form molecules, and molecules form clusters of small molecules called clusters to form nanoparticles, which are called quantum dots, especially when they are semiconducting.
  • the quantum dot When the quantum dot reaches the excited state from the outside, the quantum dot emits energy according to the corresponding energy band gap.
  • the photosensitive resin composition of this invention contains such a quantum dot particle, and the color filter manufactured from this can emit light (photoluminescence) by light irradiation.
  • a typical image display apparatus including a color filter
  • white light is transmitted through the color filter to implement color.
  • a part of the light is absorbed by the color filter, thereby degrading light efficiency.
  • the color filter made of the photosensitive resin composition of the present invention, since the color filter emits light by the light of the light source, more excellent light efficiency can be realized. In addition, since light having color is emitted, color reproducibility is more excellent, and light is emitted in all directions by photoluminescence, and thus viewing angle may be improved.
  • the quantum dot particle is not particularly limited as long as it is a quantum dot particle capable of emitting light by stimulation by light, for example, a group II-VI semiconductor compound; Group III-V semiconductor compounds; Group IV-VI semiconductor compounds; A Group IV element or a compound containing the same; And combinations thereof may be selected from the group. These can be used individually or in mixture of 2 or more types.
  • the II-VI semiconductor compound may be selected from the group consisting of CdS, CdSe, CdTe, ZnS, ZnSe, ZnTe, ZnO, HgS, HgSe, HgTe, and mixtures thereof; CdSeS, CdSeTe, CdSTe, ZnSeS, ZnSeTe, ZnSTe, HgSeS, HgSeTe, HgSTe, CdZnS, CdZnSe, CdZnTe, CdHgS, CdHgSe, CdHgTe, HgZnS, HgZnSe, HgZnTe And CdZnSeS, CdZnSeTe, CdZnSTe, CdHgSeS, CdHgSeTe, CdHgSTe, HgZnSeS, HgZnSeTe, HgZnSTe, and mixture
  • the group III-V semiconductor compound Binary elements selected from the group consisting of GaP, GaAs, GaSb, AlN, AlP, AlAs, AlSb, InN, InP, InAs, InSb, and mixtures thereof; Three-element compounds selected from the group consisting of GaNP, GaNAs, GaNSb, GaPAs, GaPSb, AlNP, AlNAs, AlNSb, AlPAs, AlPSb, InNP, InNAs, InNSb, InPAs, InPSb, GaAlNP, and mixtures thereof; And an elemental compound selected from the group consisting of GaAlNAs, GaAlNSb, GaAlPAs, GaAlPSb, GaInNP, GaInNAs, GaInNSb, GaInPAs, GaInPSb, InAlNP, InAlNAs, InAlNSb, InAlPAs, InAlPSb, and mixtures thereof.
  • the group IV-VI semiconductor compound is a binary element selected from the group consisting of SnS, SnSe, SnTe, PbS, PbSe, PbTe, and mixtures thereof; A three-element compound selected from the group consisting of SnSeS, SnSeTe, SnSTe, PbSeS, PbSeTe, PbSTe, SnPbS, SnPbSe, SnPbTe, and mixtures thereof; And SnPbSSe, SnPbSeTe, SnPbSTe, and an elemental compound selected from the group consisting of a mixture thereof, and the group IV element or the compound comprising the same is Si, Ge, and a mixture thereof. An element compound selected from; And a binary element compound selected from the group consisting of SiC, SiGe, and mixtures thereof.
  • the quantum dot particles are homogeneous single structure; Dual structures such as core-shell, gradient structures, and the like; Or a mixed structure thereof.
  • each core and shell may be made of the above-mentioned different semiconductor compounds.
  • the core may include one or more materials selected from the group consisting of CdSe, CdS, ZnS, ZnSe, CdTe, CdSeTe, CdZnS, PbSe, AgInZnS, and ZnO, but is not limited thereto.
  • the shell may include one or more materials selected from the group consisting of CdSe, ZnSe, ZnS, ZnTe, CdTe, PbS, TiO, SrSe, and HgSe, but is not limited thereto.
  • photoluminescence quantum dot particles may be classified into red quantum dot particles, green quantum dot particles, and blue quantum dot particles.
  • the quantum dot particles according to the present invention may be red quantum dot particles, green quantum dot particles or blue quantum dot particles.
  • the quantum dot particles may be synthesized by a wet chemical process, an organometallic chemical vapor deposition process, or a molecular beam epitaxy process.
  • the wet chemical process is a method of growing particles by adding a precursor material to an organic solvent. As the crystal grows, the organic solvent naturally coordinates the surface of the quantum dot crystal and acts as a dispersant, thereby controlling the growth of the crystal. Therefore, organic metal chemical vapor deposition (MOCVD) or molecular beam epitaxy (MBE) It is easier and cheaper to control nanoparticle growth than vapor deposition such as epitaxy.
  • MOCVD organic metal chemical vapor deposition
  • MBE molecular beam epitaxy
  • the content of the quantum dot particles according to the present invention is not particularly limited.
  • the content of the quantum dot particles is preferably included in 3 to 80% by weight of the total weight of the solid content of the self-luminous photosensitive resin composition, and more preferably included in 5 to 70% by weight. desirable. If the content of the quantum dot is less than the above range, the luminous efficiency may be insignificant, and if the content of the quantum dot exceeds the above range, there is a problem that it is difficult to form a pixel pattern due to the lack of a relatively different content of composition.
  • the photopolymerizable compound contained in the quantum dot photosensitive resin composition of this invention is a compound which can superpose
  • monofunctional monomers include nonylphenylcarbitol acrylate, 2-hydroxy-3-phenoxypropyl acrylate, 2-ethylhexylcarbitol acrylate, 2-hydroxyethyl acrylate and N-vinylpyrroli Money, etc.
  • bifunctional monomer examples include 1,6-hexanediol di (meth) acrylate, ethylene glycol di (meth) acrylate, neopentyl glycol di (meth) acrylate, triethylene glycol di (meth) acrylate, Bis (acryloyloxyethyl) ether of bisphenol A, 3-methylpentanediol di (meth) acrylate, etc. are mentioned.
  • polyfunctional monomers include trimethylolpropane tri (meth) acrylate, pentaerythritol tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, pentaerythritol penta (meth) acrylate, and dipenta Erythritol hexa (meth) acrylate etc. are mentioned.
  • bifunctional or higher polyfunctional monomers are preferably used.
  • the photopolymerizable compound is preferably contained 5 to 70% by weight, more preferably 7 to 65% by weight relative to the total weight percent solids of the self-luminous photosensitive resin composition.
  • the intensity or smoothness of the pixel portion may be good.
  • the photoinitiator which concerns on this invention is not restrict
  • the self-luminous photosensitive resin composition containing the photopolymerization initiator is highly sensitive, and the pixel pixels formed using the composition may have good strength and patternability of the pixel portion.
  • the self-luminous photosensitive resin composition containing them becomes more sensitive and productivity at the time of forming a color filter using this composition is preferable, it is preferable.
  • triazine type compound it is 2, 4-bis (trichloromethyl) -6- (4-methoxyphenyl) -1, 3, 5- triazine, 2, 4-bis (trichloromethyl) -6, for example. -(4-methoxynaphthyl) -1,3,5-triazine, 2,4-bis (trichloromethyl) -6-piperonyl-1,3,5-triazine, 2,4-bis (Trichloromethyl) -6- (4-methoxystyryl) -1,3,5-triazine, 2,4-bis (trichloromethyl) -6- [2- (5-methylfuran-2- Yl) ethenyl] -1,3,5-triazine, 2,4-bis (trichloromethyl) -6- [2- (furan-2-yl) ethenyl] -1,3,5-triazine , 2,4-bis (trichloromethyl) -6- [2- (furan
  • acetophenone type compound for example, diethoxyacetophenone, 2-hydroxy-2-methyl-1-phenylpropan-1-one, benzyl dimethyl ketal, 2-hydroxy-1- [4- (2- Hydroxyethoxy) phenyl] -2-methylpropane-1-one, 1-hydroxycyclohexylphenyl ketone, 2-methyl-1- (4-methylthiophenyl) -2-morpholinopropan-1-one , 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) butan-1-one, 2-hydroxy-2-methyl-1- [4- (1-methylvinyl) phenyl] propane- 1-one oligomer etc. are mentioned. Moreover, the compound represented by following formula (2) is mentioned.
  • R 28 to R 31 are each independently the same as or different from each other, and are substituted with a hydrogen atom, a halogen atom, a hydroxyl group, an alkyl group having 1 to 12 carbon atoms or an unsubstituted phenyl group and an alkyl group having 1 to 12 carbon atoms. Or an unsubstituted benzyl group or a naphthyl group unsubstituted or substituted with an alkyl group having 1 to 12 carbon atoms.
  • Specific examples of the compound represented by Formula 2 include 2-methyl-2-amino (4-morpholinophenyl) ethan-1-one and 2-ethyl-2-amino (4-morpholinophenyl) ethane- 1-one, 2-propyl-2-amino (4-morpholinophenyl) ethan-1-one, 2-butyl-2-amino (4-morpholinophenyl) ethan-1-one, 2-methyl- 2-amino (4-morpholinophenyl) propane-1-one, 2-methyl-2-amino (4-morpholinophenyl) butan-1-one, 2-ethyl-2-amino (4-morpholin Nophenyl) propane-1-one, 2-ethyl-2-amino (4-morpholinophenyl) butan-1-one, 2-methyl-2-methylamino (4-morpholinophenyl) propane-1- On, 2-methyl-2-dimethylamino (4-morpholinophenyl) propan-1-one, 2-methyl-2-die
  • biimidazole compound examples include 2,2'-bis (2-chlorophenyl) -4,4 ', 5,5'-tetraphenylbiimidazole and 2,2'-bis (2,3- Dichlorophenyl) -4,4 ', 5,5'-tetraphenylbiimidazole, 2,2'-bis (2-chlorophenyl) -4,4', 5,5'-tetra (alkoxyphenyl) biimi Dazole, 2,2'-bis (2-chlorophenyl) -4,4 ', 5,5'-tetra (trialkoxyphenyl) biimidazole, and a phenyl group at the 4,4', 5,5 'position is carbo The imidazole compound substituted with the alkoxy group etc.
  • 2,2'bis (2-chlorophenyl) -4,4 ', 5,5'-tetraphenylbiimidazole, 2,2'-bis (2,3-dichlorophenyl) -4,4', 5,5'-tetraphenylbiimidazole can be preferably used.
  • the other photoinitiator etc. which are normally used in this field can also be used together.
  • a benzoin compound, a benzophenone type compound, a thioxanthone type compound, an anthracene type compound etc. are mentioned, for example. These can be used individually or in combination of 2 or more types, respectively.
  • benzoin type compound benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin isobutyl ether, etc. are mentioned, for example.
  • benzophenone compounds include benzophenone, methyl 0-benzoylbenzoate, 4-phenyl benzophenone, 4-benzoyl-4'-methyldiphenylsulfide, 3,3 ', 4,4'-tetra ( tert-butylperoxycarbonyl) benzophenone, 2,4,6-trimethylbenzophenone, 4,4'-di (N, N'-dimethylamino) -benzophenone, etc. are mentioned.
  • thioxanthone type compound 2-isopropyl thioxanthone, 2, 4- diethyl thioxanthone, 2, 4- dichloro thioxanthone, 1-chloro-4- propoxy thioxanthone, etc. are mentioned, for example. Can be mentioned.
  • anthracene-based compound examples include 9,10-dimethoxyanthracene, 2-ethyl-9,10-dimethoxyanthracene, 9,10-diethoxyanthracene, 2-ethyl-9,10-diethoxyanthracene, and the like. Can be mentioned.
  • the photopolymerization initiator that can be used in combination with the photopolymerization initiator, one or more compounds selected from the group consisting of amine compounds, carboxylic acid compounds and the like may be preferably used.
  • amine compound in the photopolymerization start adjuvant examples include aliphatic amine compounds such as triethanolamine, methyldiethanolamine and triisopropanolamine, methyl 4-dimethylaminobenzoate, ethyl 4-dimethylaminobenzoate, and isoamyl 4-dimethylaminobenzoic acid.
  • carboxylic acid compound examples include phenylthioacetic acid, methylphenylthioacetic acid, ethylphenylthioacetic acid, methylethylphenylthioacetic acid, dimethylphenylthioacetic acid, methoxyphenylthioacetic acid, dimethoxyphenylthioacetic acid, chlorophenylthioacetic acid and dichloro And aromatic heteroacetic acids such as phenylthioacetic acid, N-phenylglycine, phenoxyacetic acid, naphthylthioacetic acid, N-naphthylglycine, and naphthoxyacetic acid.
  • the photopolymerization initiator of the present invention is preferably included in 0.1 to 20% by weight, more preferably in 1 to 10% by weight of the total weight percent solids of the self-luminous photosensitive resin composition.
  • the self-luminous photosensitive resin composition may be highly sensitive, so that the intensity of the pixel portion or the smoothness on the surface of the pixel portion may be good.
  • the photopolymerization initiation aid of the present invention is preferably included in 0.1 to 2% by weight, more preferably in 1 to 10% by weight of the total weight percent solids of the self-luminous photosensitive resin composition.
  • the amount of the photopolymerization initiation aid used is in the above range, the sensitivity efficiency of the self-luminous photosensitive resin composition is further increased, and the productivity of the color filter formed using the composition can be improved.
  • the solvent according to the present invention is not particularly limited and may be an organic solvent commonly used in the art.
  • ethylene glycol monoalkyl ethers such as ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monopropyl ether, and ethylene glycol monobutyl ether
  • Diethylene glycol dialkyl ethers such as diethylene glycol dimethyl ether, diethylene glycol diethyl ether, diethylene glycol dipropyl ether and diethylene glycol dibutyl ether
  • Ethylene glycol alkyl ether acetates such as methyl cellosolve acetate and ethyl cellosolve acetate
  • Propylene glycol dialkyl ethers such as propylene glycol monomethyl ether
  • Alkylene glycol alkyl ether acetates such as propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, propylene glycol monopropyl ether acetate, methoxy butyl acetate, and methoxy pent
  • the content of the solvent according to the present invention is not particularly limited, for example, it is preferably included in 60 to 90% by weight of the total weight percent of the photosensitive resin composition, it is preferably included in 70 to 85% by weight. When the content of the solvent is within the above range may be good coating properties.
  • the present invention provides a color filter made of the photosensitive resin composition.
  • the color filter of the present invention When the color filter of the present invention is applied to an image display device, since the light is emitted by the light of the display device light source, it is possible to implement more excellent light efficiency. In addition, since light having color is emitted, color reproducibility is more excellent, and light is emitted in all directions by photoluminescence, and thus viewing angle may be improved.
  • the color filter includes a substrate and a pattern layer formed on the substrate.
  • the substrate may be a substrate of the color filter itself, or may be a portion where the color filter is positioned in a display device or the like, and is not particularly limited.
  • the substrate may be glass, silicon (Si), silicon oxide (SiO x ), or a polymer substrate, and the polymer substrate may be polyethersulfone (PES) or polycarbonate (PC).
  • the pattern layer is a layer including the photosensitive resin composition of the present invention, and may be a layer formed by applying the photosensitive resin composition and exposing, developing and thermosetting in a predetermined pattern.
  • the pattern layer formed of the photosensitive resin composition may include a red pattern layer containing red quantum dot particles, a green pattern layer containing green quantum dot particles, and a blue pattern layer containing blue quantum dot particles.
  • the red pattern layer emits red light
  • the green pattern layer emits green light
  • the blue pattern layer emits blue light.
  • the emission light of the light source is not particularly limited when applied to the image display device, but a light source that emits blue light may be used in view of better color reproducibility.
  • the pattern layer may include only the pattern layer of two colors of red pattern layer, green pattern layer, and blue pattern layer.
  • the pattern layer further includes a transparent pattern layer containing no quantum dot particles.
  • a light source that emits light having a wavelength representing the remaining colors not included can be used.
  • the light source which emits blue light can be used.
  • the red quantum dot particles emit red light
  • the green quantum dot particles emit green light
  • the transparent pattern layer shows blue light as it is transmitted.
  • the color filter including the substrate and the pattern layer as described above may further include a partition formed between each pattern, and may further include a black matrix.
  • a protective film formed on the pattern layer of the color filter may be further included.
  • the present invention provides an image display device including the color filter.
  • the color filter of the present invention can be applied to various image display devices such as electroluminescent display devices, plasma display devices, field emission display devices, as well as ordinary liquid crystal display devices.
  • the image display apparatus of the present invention may include a color filter including a red pattern layer containing red quantum dot particles, a green pattern layer containing green quantum dot particles, and a blue pattern layer containing blue quantum dot particles.
  • the emission light of the light source is not particularly limited when applied to the image display device, but in view of better color reproducibility, a light source that emits blue light may be preferably used.
  • the image display device of the present invention may include a color filter including only a pattern layer of two colors among the red pattern layer, the green pattern layer, and the blue pattern layer.
  • the color filter further includes a transparent pattern layer containing no quantum dot particles.
  • a light source that emits light having a wavelength representing the remaining colors not included can be used.
  • the light source which emits blue light can be used.
  • the red quantum dot particles emit red light
  • the green quantum dot particles emit green light
  • the transparent pattern layer shows blue light as it is transmitted.
  • the image display device of the present invention is excellent in light efficiency, exhibits high luminance, is excellent in color reproducibility, and has a wide viewing angle.
  • a flask equipped with a stirrer, a thermometer reflux condenser, a dropping lot, and a nitrogen inlet tube was prepared, while 40 parts by weight of N-benzylmaleimide, 10 parts by weight of tricyclodecyl methacrylate, 50 parts by weight of acrylic acid, and meta-t- 4 parts by weight of butyl peroxy-2-ethylhexanoate, 20 parts by weight of propylene glycol monomethyl ether acetate (hereinafter referred to as "PGMEA”), 20 parts by weight of propylene glycol monomethyl ether, and then stir-mixed the monomer dropping lot 6 parts by weight of n-dodecanethiol and 24 parts by weight of PGMEA were added thereto, followed by stirring and mixing to prepare a dropping chain of a chain transfer agent.
  • N-benzylmaleimide 10 parts by weight of tricyclodecyl methacrylate
  • acrylic acid acrylic acid
  • a flask equipped with a stirrer, a thermometer reflux condenser, a dropping lot, and a nitrogen inlet tube was prepared, while 40 parts by weight of N-benzylmaleimide, 10 parts by weight of tricyclodecyl methacrylate, 50 parts by weight of acrylic acid, and meta-t- 4 parts by weight of butyl peroxy-2-ethylhexanoate, 20 parts by weight of propylene glycol monomethyl ether acetate (hereinafter referred to as "PGMEA”), 20 parts by weight of propylene glycol monomethyl ether, and then stir-mixed the monomer dropping lot 6 parts by weight of n-dodecanethiol and 24 parts by weight of PGMEA were added thereto, followed by stirring and mixing to prepare a dropping chain of a chain transfer agent.
  • N-benzylmaleimide 10 parts by weight of tricyclodecyl methacrylate
  • acrylic acid acrylic acid
  • a flask equipped with a stirrer, a thermometer reflux condenser, a dropping lot, and a nitrogen inlet tube was prepared, while 40 parts by weight of N-benzylmaleimide, 10 parts by weight of tricyclodecyl methacrylate, 50 parts by weight of acrylic acid, and meta-t- 4 parts by weight of butyl peroxy-2-ethylhexanoate, 20 parts by weight of propylene glycol monomethyl ether acetate (hereinafter referred to as "PGMEA”), 20 parts by weight of propylene glycol monomethyl ether, and then stir-mixed the monomer dropping lot 6 parts by weight of n-dodecanethiol and 24 parts by weight of PGMEA were added thereto, followed by stirring and mixing to prepare a dropping chain of a chain transfer agent.
  • N-benzylmaleimide 10 parts by weight of tricyclodecyl methacrylate
  • acrylic acid acrylic acid
  • Resin E-3 having a solid content of 29.1 wt%, a weight average molecular weight of 10,000, an acid value of 110 mgKOH / g, and an acrylic equivalent of 1450 g / eq.
  • a flask equipped with a stirrer, a thermometer reflux condenser, a dropping lot, and a nitrogen inlet tube was prepared, while 40 parts by weight of N-benzylmaleimide, 10 parts by weight of tricyclodecyl methacrylate, 50 parts by weight of acrylic acid, and meta-t- 4 parts by weight of butyl peroxy-2-ethylhexanoate, 20 parts by weight of propylene glycol monomethyl ether acetate (hereinafter referred to as "PGMEA”), 20 parts by weight of propylene glycol monomethyl ether, and then stir-mixed the monomer dropping lot 6 parts by weight of n-dodecanethiol and 24 parts by weight of PGMEA were added thereto, followed by stirring and mixing to prepare a dropping chain of a chain transfer agent.
  • N-benzylmaleimide 10 parts by weight of tricyclodecyl methacrylate
  • acrylic acid acrylic acid
  • Resin E-4 having a solid content of 29.1 wt%, a weight average molecular weight of 10,000, an acid value of 85 mgKOH / g, and an acrylic equivalent of 725 g / eq.
  • a flask equipped with a stirrer, a thermometer reflux condenser, a dropping lot, and a nitrogen inlet tube was prepared, while 35 parts by weight of N-benzylmaleimide, 10 parts by weight of tricyclodecyl methacrylate, 55 parts by weight of acrylic acid, and meta-t- 4 parts by weight of butyl peroxy-2-ethylhexanoate, 20 parts by weight of propylene glycol monomethyl ether acetate (hereinafter referred to as "PGMEA”), and 20 parts by weight of propylene glycol monomethyl ether were added, followed by stirring and mixing to add a monomer. Lots were prepared, 6 parts by weight of n-dodecanethiol and 24 parts by weight of PGMEA were added, followed by stirring and mixing to prepare a lot of chain transfer agent dropping lot.
  • N-benzylmaleimide 10 parts by weight of tricyclodecyl methacrylate
  • acrylic acid acrylic acid
  • Resin E-5 having a solid content of 29.1% by weight, a weight average molecular weight of 10,000, an acid value of 60 mgKOH / g, and an acrylic equivalent of 435 g / eq.
  • a flask equipped with a stirrer, a thermometer reflux condenser, a dropping lot, and a nitrogen inlet tube was prepared, while 35 parts by weight of N-benzylmaleimide, 10 parts by weight of tricyclodecyl methacrylate, 55 parts by weight of acrylic acid, and meta-t- 2 parts by weight of butyl peroxy-2-ethylhexanoate, 20 parts by weight of propylene glycol monomethyl ether acetate (hereinafter referred to as "PGMEA”) and 20 parts by weight of propylene glycol monomethyl ether, and then stirred and mixed to add monomer Lots were prepared, 6 parts by weight of n-dodecanethiol and 24 parts by weight of PGMEA were added, followed by stirring and mixing to prepare a lot of chain transfer agent dropping lot.
  • N-benzylmaleimide 10 parts by weight of tricyclodecyl methacrylate
  • acrylic acid acrylic acid
  • a flask equipped with a stirrer, a thermometer reflux condenser, a dropping lot, and a nitrogen inlet tube was prepared, while 40 parts by weight of N-benzylmaleimide, 10 parts by weight of tricyclodecyl methacrylate, 50 parts by weight of acrylic acid, and meta-t- 4 parts by weight of butyl peroxy-2-ethylhexanoate, 20 parts by weight of propylene glycol monomethyl ether acetate (hereinafter referred to as "PGMEA”), 20 parts by weight of propylene glycol monomethyl ether, and then stir-mixed the monomer dropping lot 6 parts by weight of n-dodecanethiol and 24 parts by weight of PGMEA were added thereto, followed by stirring and mixing to prepare a dropping chain of a chain transfer agent.
  • N-benzylmaleimide 10 parts by weight of tricyclodecyl methacrylate
  • acrylic acid acrylic acid
  • Example 1 to 8 and Comparative example 1 to 5 Self-luminescence Preparation of Photosensitive Resin Composition
  • polystyrene reduced weight average molecular weight and the acrylic equivalent of the total alkali-soluble resins included in the examples and the comparison are shown in Table 2 below.
  • Color filters were prepared using the self-luminous photosensitive resin compositions prepared in Examples 1 to 8 and Comparative Examples 1 to 5. That is, each of the self-luminous photosensitive resin compositions was coated on a glass substrate by spin coating, then placed on a heating plate and maintained at a temperature of 100 ° C. for 3 minutes to form a thin film. Subsequently, a test photomask having a transmissive pattern of 20 mm x 20 mm square and a line / space pattern of 1 ⁇ m to 100 ⁇ m was placed on the thin film and irradiated with ultraviolet rays at a distance of 100 ⁇ m from the test photomask.
  • the ultraviolet light source was irradiated with an exposure amount (365 nm) of 200 mJ / cm 2 under an atmosphere using an ultra high pressure mercury lamp (trade name USH-250D) manufactured by Ushio Denki Co., Ltd., and no special optical filter was used.
  • the thin film irradiated with ultraviolet rays was developed by soaking for 80 seconds in a KOH aqueous solution developing solution of pH 10.5.
  • the thin film coated glass plate was washed with distilled water, dried by blowing nitrogen gas, and heated in a heating oven at 150 ° C. for 10 minutes to prepare a color filter pattern.
  • the film thickness of the self-luminous color pattern prepared above was 3.0 ⁇ m.
  • the light-converted area was measured by a 365nm tube type 4W UV irradiator (VL-4LC, VILBER LOURMAT) on a pattern formed of a 20mm x 20mm square pattern among the color filters in which the self-luminous pixels were formed.
  • VL-4LC, VILBER LOURMAT 365nm tube type 4W UV irradiator
  • 8 to 8 and Comparative Examples 1 to 5 measured the light intensity (Intensity) in the 550nm region using a Spectrum meter (manufactured by Ocean Optics). It can be determined that the higher the measured light intensity (Intensity) is to exhibit an excellent self-luminous characteristics, the emission intensity (Intensity) measurement results are shown in Table 3 below.
  • the hard bake was carried out at 230 ° C. for 60 minutes, and the emission intensity before and after the hard bake was measured, and the level at which the luminous efficiency was maintained was confirmed.
  • the color pattern substrate prepared above was used to check the distribution of titanium (Ti) elements in the substrate, and thereby the degree of TiO 2 sedimentation under the pattern. This can be confirmed through Figs. 1 and 2.
  • Example 1 Luminous intensity Luminous intensity retention Sedimentation strength
  • Example 2 51241 52.3% ⁇ Example 3 55246 53.6% ⁇
  • Example 4 60152 59.1% ⁇
  • Example 5 57245 52.2% ⁇
  • Example 6 52476 54.1% ⁇
  • Example 7 52444 53.1% ⁇
  • Example 8 58658 56.9% ⁇ Comparative Example 1 20124 20.3% X Comparative Example 2 22101 22.5% X Comparative Example 3 52330 52.8% ⁇ Comparative Example 4 50079 50.9% ⁇ Comparative Example 5 21285 21.1% ⁇
  • Example 4 and Example 8 using an alkali-soluble resin containing a monomer of the formula (1) it can be seen that the TiO 2 sedimentation in the pattern can be completely controlled.
  • Comparative Examples 1, 2, and 5 when the double bond equivalent is 2000 g / eq or more, it can be confirmed that TiO 2 is precipitated at the bottom of the pattern as well as the luminescence intensity and retention is low. Referring to 4, when the weight average molecular weight is 15000 or more, the luminescence intensity and retention are maintained high, but it can be confirmed that sedimentation cannot be suppressed.

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Nonlinear Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Mathematical Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)

Abstract

La présente invention concerne une composition de résine photosensible auto-luminescente et, plus spécifiquement, une composition de résine photosensible auto-luminescente comprenant des particules de diffusion et une résine soluble dans les alcalis, la résine soluble dans les alcalis ayant un équivalent acrylique de 300 à 2000 g/éq. Par conséquent, la composition de résine photosensible auto-luminescente peut fournir un filtre coloré de haute qualité, présentant une excellente luminance, sans le problème de dégradation de l'efficacité lumineuse et de mauvaises propriétés photosensibles pendant la cuisson intense.
PCT/KR2017/009803 2016-11-21 2017-09-07 Composition de résine photosensible auto-luminescente, filtre coloré préparé à l'aide de cette dernière et dispositif d'affichage d'image WO2018093028A1 (fr)

Priority Applications (2)

Application Number Priority Date Filing Date Title
CN201780071640.3A CN109997079B (zh) 2016-11-21 2017-09-07 自发光感光性树脂组合物、利用其制造的滤色器及图像显示装置
JP2019527208A JP6872017B2 (ja) 2016-11-21 2017-09-07 自発光感光性樹脂組成物、これを利用して製造されたカラーフィルターおよび画像表示装置

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR1020160154714A KR102554277B1 (ko) 2016-11-21 2016-11-21 자발광 감광성 수지 조성물, 이를 이용하여 제조된 컬러필터 및 화상표시장치
KR10-2016-0154714 2016-11-21

Publications (1)

Publication Number Publication Date
WO2018093028A1 true WO2018093028A1 (fr) 2018-05-24

Family

ID=62145135

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/KR2017/009803 WO2018093028A1 (fr) 2016-11-21 2017-09-07 Composition de résine photosensible auto-luminescente, filtre coloré préparé à l'aide de cette dernière et dispositif d'affichage d'image

Country Status (5)

Country Link
JP (1) JP6872017B2 (fr)
KR (1) KR102554277B1 (fr)
CN (1) CN109997079B (fr)
TW (1) TWI770083B (fr)
WO (1) WO2018093028A1 (fr)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110865482A (zh) * 2018-08-27 2020-03-06 东友精细化工有限公司 滤色器及包含其的图像显示装置
JP2020138992A (ja) * 2019-02-26 2020-09-03 太陽インキ製造株式会社 透明基材用硬化性組成物、ドライフィルム、硬化物、遮光用部材およびディスプレイ用部材
JP2021533230A (ja) * 2018-08-03 2021-12-02 メルク パテント ゲゼルシャフト ミット ベシュレンクテル ハフツングMerck Patent Gesellschaft mit beschraenkter Haftung 組成物

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2021105164A (ja) * 2019-12-26 2021-07-26 住友化学株式会社 硬化性樹脂組成物および表示装置
KR20210115600A (ko) * 2020-03-13 2021-09-27 동우 화인켐 주식회사 광산란 감광성 수지 조성물, 컬러필터 및 화상표시장치
JP7405670B2 (ja) * 2020-03-30 2023-12-26 旭化成株式会社 ヘッドマウントディスプレイ用樹脂製導光体
JP2022041900A (ja) * 2020-08-31 2022-03-11 住友化学株式会社 積層体及び表示装置

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20080018122A (ko) * 2006-08-22 2008-02-27 신에쓰 가가꾸 고교 가부시끼가이샤 알칼리 수용액에 가용인 감광성 폴리이미드 수지, 상기수지를 포함하는 조성물 및 상기 조성물로부터 얻어지는 막
KR20150119067A (ko) * 2013-03-13 2015-10-23 쇼와 덴코 가부시키가이샤 블록이소시아나토기 함유 폴리머, 그 폴리머를 포함하는 조성물 및 그 용도
KR20160060904A (ko) * 2014-11-21 2016-05-31 동우 화인켐 주식회사 자발광 감광성 수지 조성물, 이로부터 제조된 컬러필터 및 상기 컬러필터를 포함하는 화상표시장치
KR20160103792A (ko) * 2015-02-25 2016-09-02 동우 화인켐 주식회사 자발광 감광성 수지 조성물, 이를 이용하여 제조된 컬러필터 및 화상표시장치
KR20160112506A (ko) * 2015-03-19 2016-09-28 동우 화인켐 주식회사 자발광 감광성 수지 조성물, 이를 포함하는 컬러필터 및 화상표시장치

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2013054868A1 (fr) * 2011-10-12 2013-04-18 東洋インキＳｃホールディングス株式会社 Composition de résine, film de revêtement, et film isolant pour panneau tactile
KR102069199B1 (ko) * 2013-09-05 2020-02-11 동우 화인켐 주식회사 투명화소 형성용 감광성 수지조성물
JP6826803B2 (ja) * 2014-08-26 2021-02-10 中国塗料株式会社 光硬化性樹脂組成物、該組成物から形成される硬化被膜および防眩フィルム、画像表示装置、並びに硬化被膜および防眩フィルムの製造方法
KR102153733B1 (ko) 2015-01-26 2020-09-08 동우 화인켐 주식회사 컬러필터 및 이를 이용한 화상표시장치
KR101995930B1 (ko) * 2015-02-25 2019-07-03 동우 화인켐 주식회사 양자점을 포함하는 경화 조성물, 이를 이용하여 제조된 컬러필터 및 화상표시장치

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20080018122A (ko) * 2006-08-22 2008-02-27 신에쓰 가가꾸 고교 가부시끼가이샤 알칼리 수용액에 가용인 감광성 폴리이미드 수지, 상기수지를 포함하는 조성물 및 상기 조성물로부터 얻어지는 막
KR20150119067A (ko) * 2013-03-13 2015-10-23 쇼와 덴코 가부시키가이샤 블록이소시아나토기 함유 폴리머, 그 폴리머를 포함하는 조성물 및 그 용도
KR20160060904A (ko) * 2014-11-21 2016-05-31 동우 화인켐 주식회사 자발광 감광성 수지 조성물, 이로부터 제조된 컬러필터 및 상기 컬러필터를 포함하는 화상표시장치
KR20160103792A (ko) * 2015-02-25 2016-09-02 동우 화인켐 주식회사 자발광 감광성 수지 조성물, 이를 이용하여 제조된 컬러필터 및 화상표시장치
KR20160112506A (ko) * 2015-03-19 2016-09-28 동우 화인켐 주식회사 자발광 감광성 수지 조성물, 이를 포함하는 컬러필터 및 화상표시장치

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2021533230A (ja) * 2018-08-03 2021-12-02 メルク パテント ゲゼルシャフト ミット ベシュレンクテル ハフツングMerck Patent Gesellschaft mit beschraenkter Haftung 組成物
US11965049B2 (en) 2018-08-03 2024-04-23 Merck Patent Gmbh Optical medium composition with nanosized light emitting material and (meth)acrylic polymer
CN110865482A (zh) * 2018-08-27 2020-03-06 东友精细化工有限公司 滤色器及包含其的图像显示装置
JP2020138992A (ja) * 2019-02-26 2020-09-03 太陽インキ製造株式会社 透明基材用硬化性組成物、ドライフィルム、硬化物、遮光用部材およびディスプレイ用部材
JP7254559B2 (ja) 2019-02-26 2023-04-10 太陽インキ製造株式会社 透明基材用硬化性組成物、ドライフィルム、硬化物、遮光用部材およびディスプレイ用部材

Also Published As

Publication number Publication date
KR102554277B1 (ko) 2023-07-11
KR20180056860A (ko) 2018-05-30
JP6872017B2 (ja) 2021-05-19
JP2019537064A (ja) 2019-12-19
CN109997079B (zh) 2023-03-10
TWI770083B (zh) 2022-07-11
TW201829726A (zh) 2018-08-16
CN109997079A (zh) 2019-07-09

Similar Documents

Publication Publication Date Title
KR101879016B1 (ko) 자발광 감광성 수지 조성물, 이로부터 제조된 컬러필터 및 상기 컬러필터를 포함하는 화상표시장치
WO2018093028A1 (fr) Composition de résine photosensible auto-luminescente, filtre coloré préparé à l'aide de cette dernière et dispositif d'affichage d'image
JP6592339B2 (ja) 自発光感光性樹脂組成物、これから製造されたカラーフィルタおよび前記カラーフィルタを含む画像表示装置
KR102418601B1 (ko) 자발광 감광성 수지 조성물, 이로부터 제조된 컬러필터 및 상기 컬러필터를 구비한 화상표시장치
KR101811103B1 (ko) 자발광 감광성 수지 조성물, 이로부터 제조된 컬러필터 및 상기 컬러필터를 구비한 화상표시장치
KR102052101B1 (ko) 자발광 감광성 수지 조성물, 이를 이용하여 제조된 컬러필터 및 화상표시장치
KR102028439B1 (ko) 자발광 감광성 수지 조성물, 이를 포함하는 컬러필터 및 화상표시장치
KR101865499B1 (ko) 컬러필터 및 화상표시장치
KR102431437B1 (ko) 컬러필터, 컬러필터의 제조방법 및 이를 구비한 화상표시장치
KR101941573B1 (ko) 자발광 감광성 수지 조성물, 이를 이용하여 제조된 컬러필터 및 화상 표시 장치
CN106569389B (zh) 自发光感光树脂组合物、滤色器和包括滤色器的显示设备
TWI725261B (zh) 黃色可固化樹脂組成物以及包含其之彩色濾光片與影像顯示裝置
TWI815801B (zh) 黃色可固化樹脂組成物以及包含其之彩色濾光片與影像顯示裝置
WO2018093090A1 (fr) Composition de résine photosensible, filtre coloré et dispositif d'affichage d'image
KR102206910B1 (ko) 자발광 감광성 수지 조성물, 이를 포함하는 컬러필터 및 화상표시장치
KR20170017544A (ko) 자발광 감광성 수지 조성물, 이로부터 제조된 컬러필터 및 상기 컬러필터를 구비한 화상표시장치
KR20180048488A (ko) 자발광 감광성 수지 조성물, 이를 포함하는 컬러필터 및 표시장치
KR20190108766A (ko) 황색 경화성 수지 조성물, 이를 이용하여 제조된 컬러필터 및 화상표시장치

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 17870797

Country of ref document: EP

Kind code of ref document: A1

ENP Entry into the national phase

Ref document number: 2019527208

Country of ref document: JP

Kind code of ref document: A

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 17870797

Country of ref document: EP

Kind code of ref document: A1