WO2018036343A1 - 触控显示模组、其制作方法及显示装置 - Google Patents

触控显示模组、其制作方法及显示装置 Download PDF

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Publication number
WO2018036343A1
WO2018036343A1 PCT/CN2017/095234 CN2017095234W WO2018036343A1 WO 2018036343 A1 WO2018036343 A1 WO 2018036343A1 CN 2017095234 W CN2017095234 W CN 2017095234W WO 2018036343 A1 WO2018036343 A1 WO 2018036343A1
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WIPO (PCT)
Prior art keywords
touch
layer
shadow mask
touch electrode
display module
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/CN2017/095234
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English (en)
French (fr)
Inventor
吴玲艳
刘洋
张雷
谢涛峰
张卫
魏广超
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BOE Technology Group Co Ltd
Hefei Xinsheng Optoelectronics Technology Co Ltd
Original Assignee
BOE Technology Group Co Ltd
Hefei Xinsheng Optoelectronics Technology Co Ltd
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Application filed by BOE Technology Group Co Ltd, Hefei Xinsheng Optoelectronics Technology Co Ltd filed Critical BOE Technology Group Co Ltd
Priority to US15/743,488 priority Critical patent/US20190018514A1/en
Publication of WO2018036343A1 publication Critical patent/WO2018036343A1/zh
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0443—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using a single layer of sensing electrodes
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0446—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using a grid-like structure of electrodes in at least two directions, e.g. using row and column electrodes
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/46—Manufacturing multilayer circuits
    • H05K3/4644—Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits
    • H05K3/467—Adding a circuit layer by thin film methods
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04103—Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04111—Cross over in capacitive digitiser, i.e. details of structures for connecting electrodes of the sensing pattern where the connections cross each other, e.g. bridge structures comprising an insulating layer, or vias through substrate
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/0412—Digitisers structurally integrated in a display
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/03—Conductive materials
    • H05K2201/032—Materials
    • H05K2201/0326—Inorganic, non-metallic conductor, e.g. indium-tin oxide [ITO]
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/10—Details of components or other objects attached to or integrated in a printed circuit board
    • H05K2201/10007—Types of components
    • H05K2201/10128—Display
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/05—Patterning and lithography; Masks; Details of resist
    • H05K2203/0502—Patterning and lithography

Definitions

  • Embodiments of the present invention relate to a touch display module, a method of fabricating the same, and a display device.
  • the embodiment of the invention provides a touch display module, a manufacturing method thereof and a display device.
  • the embodiment of the invention can reduce the color difference between the touch area and the frame area.
  • At least one embodiment of the present invention provides a touch display module including a display panel and a touch display module attached to the display panel; the touch module is divided into touches with touch electrodes a region and a frame region having a black matrix, the touch module includes a base substrate, a first shadow mask layer and a second shadow mask layer on a side of the substrate substrate adjacent to the display panel; The shadow mask is located between the touch electrode and the substrate; the second shadow mask is located on a side of the touch electrode away from the substrate; in the dark state display mode, The color difference between the touch area and the border area is less than a preset value.
  • the color difference ⁇ E of the touch area and the border area in the Lab color mode is less than 1.
  • the color difference between the stacked structure of the first shadow mask, the touch electrode, and the second shadow layer and the black matrix is less than the preset value.
  • the first shadow mask is the film layer closest to the substrate substrate.
  • the touch control electrode includes a first touch electrode and a second touch electrode having a plurality of sub-electrodes insulated from the first touch electrode;
  • the touch module further includes: a bridge pattern a conductive layer, wherein a bridge pattern in the conductive layer is used to connect the sub-electrodes of the second touch electrode; and two are located between the conductive layer and the first touch electrode and expose the bridge point The first insulating layer at the end.
  • the touch module further includes a flexible circuit board connecting portion electrically connected to the touch electrode in the frame region; and the second color erasing layer exposes a region where the connecting portion is located.
  • the touch module further includes a second insulating layer between each of the touch electrodes, the first insulating layer, and the black matrix and the second color erasing layer.
  • the material of the second insulating layer is an optical glue.
  • At least one of the first shadow mask and the second shadow mask is in direct contact with the touch electrode.
  • the first shadow mask is a composite film layer composed of a tantalum pentoxide film layer and a silicon dioxide film layer.
  • the second shadow mask is a composite film layer composed of a tantalum pentoxide film layer and a silicon dioxide film layer; or the second shadow mask layer is a silicon oxynitride film layer.
  • the material of the touch electrode and the conductive layer is indium tin oxide.
  • the thickness of the touch electrode is The thickness range of the tantalum pentoxide film layer in the first shadow mask layer is The thickness of the silicon dioxide film layer is The thickness range of the ruthenium pentoxide film layer in the second shadow mask layer is The thickness of the silicon dioxide film layer is The thickness of the silicon oxynitride film layer in the second color erasing layer is
  • the thickness of the tantalum pentoxide film layer in the first shadow mask layer is The thickness of the silicon dioxide film layer is The thickness of the silicon oxynitride film layer in the second color erasing layer is
  • the thickness of the tantalum pentoxide film layer in the first shadow mask layer is The thickness of the silicon dioxide film layer is The thickness of the ruthenium pentoxide film layer in the second shadow mask is The thickness of the silicon dioxide film layer is
  • the touch display module further includes an optical adhesive layer, and the optical adhesive layer connects the display panel and the second negative image layer.
  • At least one embodiment of the present invention provides a method of fabricating a touch display module according to any of the preceding claims, the method comprising: forming the first shadow mask on the substrate; a side of the base substrate on which the first shadow erasing layer is formed to form a touch electrode; and the base substrate is formed with One side of the touch electrode forms a second shadow mask to form a touch module; and one side of the base substrate on which the first shadow layer and the second shadow layer are formed Attached to the display panel.
  • the method further includes forming a flexible circuit board connection portion electrically connected to the touch electrode in the frame region after forming the touch electrode and before forming the second shadow mask layer.
  • the forming the second shadow mask comprises: shielding a region where the connecting portion is located by using a mask, and forming a second shadow mask on a side of the base substrate on which the touch electrode is formed; Alternatively, after forming a whole layer of the second shadow mask film on the side of the base substrate on which the touch electrode is formed, the second shadow mask film covering the region where the connecting portion is located is removed by using an etching paste. To form the second shadowing layer.
  • At least one embodiment of the present invention further provides a touch module including a display panel and a touch module, the display panel includes an opposite array substrate and a counter substrate, and the opposite substrate is located on the array substrate
  • the touch module includes a touch electrode, a first color erasing layer, and a second color erasing layer, and the touch electrodes are along the display panel and the touch
  • the arrangement direction of the modules is between the first shadow mask layer and the second shadow mask layer.
  • the touch module is divided into a touch area having the touch electrode and a frame area having a black light shielding material; in the dark state display mode, the first shadow layer, the touch electrode, and A color difference between the laminated structure of the second color erasing layer and the black light shielding material is less than the preset value.
  • At least one embodiment of the present invention provides a display device comprising the touch display module according to any of the above.
  • FIG. 1A is a schematic structural diagram of a touch display module according to an embodiment of the present invention.
  • FIG. 1B is a schematic structural diagram of a touch module in a touch display module according to an embodiment of the present disclosure
  • 2A is a flowchart of a method for fabricating a touch display module according to an embodiment of the present invention
  • 2B is a flowchart of a part of steps of a method for manufacturing a touch display module according to an embodiment of the present invention
  • 2C is a flowchart of a part of steps of a method for manufacturing a touch display module according to an embodiment of the present invention
  • FIG. 3 is a schematic structural diagram corresponding to each step in a process of manufacturing a touch module in a touch display module according to an embodiment of the present disclosure
  • FIG. 3f is a top plan view showing a partial structure of an FPC connecting portion according to an embodiment of the present invention.
  • FIG. 4 is a schematic structural diagram of another touch display module according to an embodiment of the present invention.
  • the embodiment of the invention provides a touch display module, a manufacturing method thereof and a display device.
  • the touch display module includes a display panel and a touch module attached to the display panel; the touch module is divided into a touch area having a touch electrode and a frame area having a black matrix, the touch module
  • the substrate includes a first shadowing layer and a second color erasing layer on a side of the substrate substrate adjacent to the display panel; the first shadowing layer is located between the touch electrode and the substrate; the second color erasing layer
  • the touch sensor is located on a side away from the substrate; in the dark display mode, the color difference between the touch area and the border area is less than a preset value, for example, the preset value is greater than 0 and less than or equal to 1.
  • the first shadow layer The color difference between the stacked structure of the touch electrode and the second color erasing layer (ie, the combination of the three) and the black matrix is less than the preset value.
  • the thickness of the second shadow layer is greater than the thickness of the first shadow layer, so that a better integrated black effect can be obtained; or the thickness of the second shadow layer can be equal to or less than the thickness of the first shadow layer.
  • the second color erasing layer may make the optical refractive index of the region where the touch electrode is located equal to the optical refractive index of other regions (for example, the frame region); generally, the optical refractive index and other regions of the region where the touch electrode is located in the manufacturing process
  • the optical refractive index is close, that is, the error is within a preset range, and it is considered that the optical refractive index of the region where the touch electrode is located is equal to the optical refractive index of other regions. In this way, the touch electrode can be erased.
  • the thickness of the second shadow mask is thicker than that of the first shadow layer.
  • the first color erasing layer and the second color erasing layer can make the color difference of the touch area and the frame area smaller than a preset value in the dark state display mode, and the preset value is reached.
  • the maximum color difference of the desired integrated black effect For example, in the dark state display mode, the color difference ⁇ E of the touch area and the border area in the Lab color mode is less than 1, and the Lab color mode is determined by the CIE (Commission Internationale Eclairage) organization to theoretically include all that the human eye can see. The color mode of the color.
  • the visual impression to the viewer is that the colors of the two areas are identical; in the Lab color mode, L represents the brightness value, and a represents the red-green color. Value, b represents the yellow-blue value, the color difference of the two colors Where ⁇ L represents the difference in luminance values of the two colors, ⁇ a represents the difference between the red and green values of the two colors, and ⁇ b represents the difference in the yellow-blue values of the two colors.
  • the display side of the display panel is provided with a first shadow mask layer and a second shadow mask layer
  • the second shadow mask layer can not only achieve the shadow elimination of the touch electrodes
  • the second shadow mask can also make the color difference between the touch area and the frame area in the dark state display mode very small under the cooperation of the first shadow layer, which improves the integrated black effect.
  • the second shadow mask can also protect the touch module and reduce the scratch rate in the manufacturing process.
  • a possible touch display module includes a display panel 10 , a touch module 20 , and an optical adhesive layer connecting the display panel 10 and the touch module 20 . 30.
  • the touch module 20 is divided into a touch area having a touch electrode 001 and a frame area having a black matrix 002 (the entire black matrix 02)
  • the touch panel 20 includes a base substrate 003 on a side of the base substrate 003 adjacent to the display panel 10, and includes a first shadow mask 004 and a second layer in the touch region and the frame region.
  • the first shadow layer 004 is located between the touch electrode 001 and the substrate 003, for example, the first shadow layer 004 is in direct contact with the touch electrode 001 and/or the substrate 003;
  • the layer 005 is located on a side of the touch electrode 001 away from the substrate 003, and the black matrix 002 is located between the first shadow layer 004 and the second shadow layer 005; the thickness of the second shadow layer 005 is greater than the first shadow
  • the thickness of the layer 004, and the thickness of the first shadow layer 004 and the thickness of the second shadow layer 005 satisfy the condition that in the dark state display mode, the color difference ⁇ E of the touch region and the frame region in the Lab color mode is less than 1.
  • the first shadow mask 004 is a transparent insulating film covering the entire touch area and the entire frame area.
  • the entire upper surface and the entire lower surface of the first shadow layer are planar.
  • the second color erasing layer 005 is a transparent insulating film covering at least the entire touch area.
  • the upper surface and the lower surface of the second shadow mask 005 corresponding to the entire touch area are planar.
  • the first shadow layer 004 is closest to the substrate.
  • the film layer of 003, that is, the first shadow layer 004 is in direct contact with the base substrate 003.
  • the second shadow mask 005 is the film layer farthest from the substrate 003, for example, the second shadow layer 005 and the optical layer.
  • the glue layer 30 is directly joined (as shown in Figure 1A), which achieves a better integrated black effect.
  • the optical adhesive layer 30 connects the display panel 10 and the second shadow mask 005, and is a planar structure covering the entire touch area and the entire frame area.
  • the display panel 10 includes an array substrate and a counter substrate which are disposed opposite to each other, and a connection portion that connects the two.
  • the display panel 10 may be an active light-emitting display panel such as a liquid crystal panel or an OLED (Organic Light Emitting Diode) display panel.
  • the touch display module includes touch electrodes respectively disposed in the row direction and the column direction, one of which serves as a driving electrode and the other serves as a sensing electrode.
  • the touch electrodes disposed along the row direction and the touch electrodes disposed along the column direction are all a complete electrode.
  • one of the directions is a complete electrode and the other direction is divided into a plurality of sub-electrodes. It should be noted that the complete electrode refers to that the entire electrode is formed through the same layer.
  • the touch electrode 001 shown in FIG. 1A and FIG. 1B includes a complete first touch electrode 001a and a second touch electrode 001b having a plurality of sub-electrodes insulated from the first touch electrode; the touch module further includes a conductive layer 006 having a bridge pattern, and a bridge pattern in the conductive layer 006 is used to connect the second a sub-electrode of the touch electrode 001b; and a first insulating layer 007 between the conductive layer 006 and the first touch electrode 001a and exposing both ends of the bridge point.
  • the first insulating layer 007 mainly serves to insulate the first touch electrode and the second touch electrode.
  • the two ends of the bridge point in the conductive layer are not covered by the first insulating layer to ensure the sub-electrode of the second touch electrode 001b.
  • the electrodes can be electrically connected to both ends of the bridge point.
  • the first insulating layer 007 is also located in the region where the black matrix 002 is located, and the portion of the first insulating layer 007 located in the bezel region is located between the black matrix 002 and the second erasing layer 005. This can play an antistatic role.
  • the touch panel 20 is connected to a flexible printed circuit (FPC).
  • FPC flexible printed circuit
  • the touch module 20 further includes a flexible circuit board (FPC) electrically connected to the touch electrode 001 in the frame region.
  • the connecting portion 008; the second erasing layer 005 exposes the area where the FPC connecting portion 008 is located.
  • the area where the FPC connection portion 008 is located does not have the occlusion of the second shadow mask layer 005 to ensure electrical properties.
  • the first shadow mask layer 004 is a composite film layer composed of a tantalum pentoxide film layer and a silicon dioxide film layer.
  • the tantalum pentoxide film layer is located between the silicon dioxide film layer and the base substrate 003, that is, the distance between the tantalum pentoxide film layer and the display panel 10 is greater than the distance from the silicon dioxide film layer to the display panel 10.
  • the second shadow mask layer 005 is a composite film layer composed of a tantalum pentoxide film layer and a silicon dioxide film layer.
  • the distance between the tantalum pentoxide film layer and the display panel 10 is greater than the silicon dioxide film layer to the display panel.
  • a distance of 10; or, the second color erasing layer 005 is a silicon oxynitride film layer.
  • the refractive index of the silicon dioxide layer for light having a wavelength of 550 nm is 1.4-1.5, for example 1.47; the wavelength of the tantalum pentoxide film layer is The refractive index of light of 550 nm is 2.2-2.5, for example 2.34; the refractive index of the silicon oxynitride film layer for light having a wavelength of 550 nm is 1.6-1.7, for example 1.67.
  • the material of the touch electrode 001 and the conductive layer 006 is Indium Tin Oxide (ITO).
  • ITO Indium Tin Oxide
  • the thickness of the touch electrode 001 ie, the thickness of the sub-electrode of the second touch electrode 001b in the direction perpendicular to the bearing surface perpendicular to the substrate 003 is (Angstrom)
  • the thickness range of the ruthenium pentoxide film layer in the first shadow layer is
  • the thickness of the silicon dioxide film layer is
  • the thickness range of the ruthenium pentoxide film layer in the second shadow layer is
  • the thickness of the silicon dioxide film layer is The thickness of the silicon oxynitride film layer in the second color erasing layer is
  • the thickness of the tantalum pentoxide film layer in the first shadow layer is The thickness of the silicon dioxide film layer is The thickness of the silicon oxynitride film layer in the second shadow layer is
  • the thickness of the tantalum pentoxide film layer in the first shadow layer is The thickness of the silicon dioxide film layer is The thickness of the tantalum pentoxide film layer in the second shadow layer is The thickness of the silicon dioxide film layer is
  • the ITO touch electrode is listed as a better thickness parameter for the integrated black effect.
  • the thickness of the second shadowing layer can be determined according to the thickness of the touch electrode, and then the thickness of the first shadowing layer is determined, thereby making the thickness of the first shadowing layer.
  • the thickness of the second color erasing layer satisfies the condition that the color difference ⁇ E of the touch area and the border area in the Lab color mode is less than 1.
  • the thickness of the ITO touch electrode is The thickness of the silicon dioxide film layer in the first shadow layer is And the thickness of the ruthenium pentoxide film layer is And the thickness of the silicon oxynitride film layer in the second color erasing layer is The thickness of the ITO touch electrode is The thickness of the silicon dioxide film layer in the first shadow layer is And the thickness of the ruthenium pentoxide film layer is And the thickness of the silicon oxynitride film layer in the second color erasing layer is The thickness of the ITO touch electrode is The thickness of the silicon dioxide film layer in the first shadow layer is And the thickness of the ruthenium pentoxide film layer is And the thickness of the silicon oxynitride film layer in the second color erasing layer is
  • the touch display module shown in FIG. 1A and FIG. 1B further includes a second insulating layer 009, which is located in each of the touch electrode 001, the first insulating layer 007, and the black matrix 002, and the second color erasing layer. Between 005.
  • the second insulating layer 009 may be made of a material other than a material that has a subtractive effect on the touch electrodes.
  • the material of the second insulating layer 009 does not include any of tantalum pentoxide, silicon dioxide, and silicon oxynitride.
  • the material of the second insulating layer 009 is a transparent optical adhesive to prevent the second insulating layer from increasing the chromatic aberration between the stacked structure of the first color erasing layer, the second color erasing layer and the touch electrode and the black matrix.
  • At least one of the first shadow mask 004 and/or the second shadow mask 005 is in direct contact with the touch electrode 001.
  • the insulating layer increases the laminated structure between the first color erasing layer, the second color erasing layer and the touch electrode and the black matrix. Color difference.
  • the embodiment of the present invention further provides a method for fabricating a touch display module according to any of the above embodiments.
  • the method includes at least the following steps: Step 210, on a substrate Forming a first color erasing layer; forming a touch electrode on a side of the base substrate on which the first color erasing layer is formed; and step 230, forming a second color erasing layer on a side of the base substrate on which the touch electrode is formed a step of forming a touch module; and step 240, attaching, to the display panel, a side of the base substrate on which the first shadow mask layer and the second shadow mask layer are formed, wherein the thickness of the second shadow mask layer is greater than the first The thickness of the shadowing layer, and the thickness of the first shadowing layer and the thickness of the second shadowing layer satisfy the condition: in the dark state display mode, the color difference of the touch area and the border area is less than a preset value, for example, the preset
  • the second color erasing layer may make the optical refractive index of the region where the touch electrode is located equal to the optical refractive index of other regions; in the manufacturing process, the optical refractive index of the region where the touch electrode is located and the optical of other regions
  • the refractive index is infinitely close, that is, the error is within a preset range, and it is considered that the optical refractive index of the region where the touch electrode is located is equal to the optical refractive index of other regions. In this way, the touch electrode can be erased.
  • the thickness of the second shadow mask layer is thicker than that of the first shadow mask layer.
  • the first color erasing layer and the second color erasing layer can make the color difference of the touch area and the frame area smaller than a preset value in the dark state display mode, and the preset value is reached.
  • the maximum color difference of the desired integrated black effect For example, when the color difference ⁇ E of the touch area and the border area in the Lab color mode is less than 1, the visual impression to the viewer is that the colors of the two areas are consistent; in the Lab color mode, L represents the brightness value, and a represents the red-green value.
  • b represents the yellow-blue value; the color difference of the two colors
  • ⁇ L represents the difference in luminance values of the two colors
  • ⁇ a represents the difference between the red and green values of the two colors
  • ⁇ b represents the difference in the yellow-blue values of the two colors.
  • the first color erasing layer and the second color erasing layer are disposed in the touch display module, and the second color erasing layer can not only achieve the shadow elimination of the touch electrode, but also the second color erasing layer.
  • the color difference between the touch area and the frame area in the dark state display mode can be made very small, which improves the integrated black effect.
  • the second shadow mask can also protect the touch module and reduce the scratch rate in the manufacturing process.
  • a touch electric power is formed on a side of the base substrate on which the first color erasing layer is formed.
  • the manufacturing method provided by the embodiment of the present invention further includes: forming and touching in the frame region.
  • forming a second color erasing layer on a side of the base substrate on which the touch electrode is formed includes: shielding a region where the FPC connecting portion is located by using a mask, and forming a second side on the side of the base substrate on which the touch electrode is formed a shadowing layer (as shown in FIG. 2B); or, after forming a whole layer of the second shadowing layer film on the side of the base substrate on which the touch electrode is formed, removing the area covering the FPC connecting portion by using the etching paste The second shadow film is formed to form a second shadow layer (as shown in Figure 2C).
  • the second erasing layer is not covered by the FPC connecting portion, so the second erasing layer does not affect the conductivity of the FPC connecting portion.
  • the ITO electrode is taken as an example to describe the manufacturing method of the touch display module provided by the embodiment of the present invention in more detail.
  • the touch module in this embodiment is an OGS touch module, and the specific manufacturing steps of the touch module include the following steps 1 to 8.
  • Step 1 As shown in FIG. 3a, a first shadowing layer 004 is formed on the substrate 003.
  • the base substrate 003 is a glass substrate, a quartz substrate, or a plastic substrate.
  • the first shadow mask layer 004 in this step includes a tantalum pentoxide film layer and a silicon dioxide film layer which are sequentially stacked, and the thicknesses are respectively with
  • the first shadowing layer is formed by a sputtering process, so that the stability of the first shadowing layer is better.
  • Step 2 As shown in FIG. 3b, a black matrix 002 is formed on a frame region on the side of the base substrate 003 on which the first erasing layer 004 is formed.
  • an entire black matrix may be overlaid on the first shadow mask 004, and then subjected to a photolithography process to retain only the black matrix of the border region.
  • Step 3 as shown in FIG. 3c, a conductive layer 006 having a bridge pattern is formed on the base substrate 003.
  • Step 4 as shown in FIG. 3d, a first insulating layer 007 is formed on a side of the base substrate 003 on which the conductive layer 006 is formed.
  • the first insulating layer 007 is located on the black matrix 002 and the conductive layer 006 and exposes the insulating layer 006. Both ends of the bridge pattern.
  • Step 5 As shown in FIG. 3e, a first touch electrode 001a and a second touch electrode 001b are formed on a side of the base substrate 003 where the first insulating layer 007 is formed, and the second touch electrode 001b is sub-electric
  • the poles are electrically connected by a bridge pattern.
  • Step 6 as shown in FIG. 3f, the side of the base substrate 003 on which the first touch electrode 001a and the second touch electrode 001b are formed is electrically connected to each of the first touch electrode 001a and the second touch electrode 001b.
  • the FPC connection portion 008 see the top view of the partial structure shown in Fig. 3f'.
  • Step 7 As shown in FIG. 3g, a side covering the black matrix 002, the first touch electrode 001a, the second touch electrode 001b, and the first insulating layer 007 is formed on a side of the base substrate 003 where the FPC connecting portion 008 is formed. Two insulating layers 009.
  • the FPC connection portion 008 is not covered by the second insulating layer 009, but is exposed to ensure its conductivity, and, for example, some thick ground (GND) lines (not shown) Part of the surface shown) will also be exposed.
  • GND thick ground
  • Step 8 masking the area where the FPC connection portion 008 is located by using a mask plate; or sputtering the film for forming the second shadow mask layer on the entire surface, and etching the paste layer to form a second substrate 003
  • One side of the insulating layer 009 forms a second shadow layer 005.
  • the structure obtained in this step can be seen in Figure 1.
  • the second shadow mask is a silicon oxynitride film layer and the thickness is Alternatively, the second shadow mask is a tantalum pentoxide film layer and a silicon dioxide film layer which are sequentially stacked, and the thicknesses are respectively with
  • the second shadow mask is formed by a sputtering technique, so that the stability of the second shadow mask is better.
  • the touch display module After the touch module is manufactured according to the above steps, the side of the base substrate 003 on which the first shadowing layer and the second color erasing layer are formed is fully attached to the display panel, thereby forming a touch display module.
  • the touch display module obtained by the manufacturing method of the embodiment can realize that the color difference ⁇ E of the touch area and the frame area in the Lab color mode is less than 1 in the dark state display mode, thereby greatly improving the integrated black effect.
  • the touch display module includes a display panel 10 and a touch module 20 .
  • the display panel 10 includes an opposite array substrate 11 and an opposite substrate 12 (for example, a color filter substrate), and a connection portion 13 (which is made of, for example, a sealing material) connecting the two; the opposite substrate 12 is located on the array substrate 11 and the touch mode.
  • the touch panel 20 includes a touch electrode 001 (including, for example, a first touch electrode 001a and a second touch electrode 001b intersecting in the extending direction), a first color erasing layer 004, and a second color erasing layer. 005, and the touch electrode 001 is located in the first shadow layer 004 and the first direction along the arrangement direction of the display panel 10 and the touch module 20 Between the two coloring layers 005.
  • the present invention can effectively improve the shadow elimination effect by forming a shadow elimination layer on both sides of the touch electrode 001.
  • the touch module includes a touch area having a touch electrode 001 and a frame area having a black light-shielding material (for example, a black matrix) 002'; in the dark state display mode, the first shadow layer 004 and the touch
  • the color difference between the laminated structure of the electrode 001 and the second color erasing layer 005 in the touch area and the black light-shielding material 002' is less than a preset value.
  • the color difference between the touch area and the frame area is less than the preset value, for example, the preset value is greater than 0 and less than or equal to 1. This can reduce the color difference between the touch area and the border area, thereby improving the integrated black effect.
  • the first shadow mask 004 is located on a side of the touch electrode 001 away from the opposite substrate 12
  • the second shadow mask layer 005 is located between the touch electrode 001 and the opposite substrate 12, and the thickness of the second shadow mask layer 005 is greater than The thickness of the first shadow layer 004. This will result in a better integrated black effect.
  • the touch display module can be in the OGS mode, that is, the touch module 20 is attached to the display panel through the optical adhesive layer, as shown in FIG. 1A; or the touch display module can also be an On cell.
  • the mode that is, the touch module 20 is directly formed on the opposite substrate 12 of the display panel 10, and is bonded to the cover plate 003' through the optical adhesive layer 30 (for example, the first shadow layer 004 and the optical adhesive layer 30 are directly Contact), as shown in Figure 4.
  • the distance from the second shadow layer 005 to the display panel 10 is smaller than the distance from the first shadow layer 004 to the display panel 10.
  • the embodiment of the present invention further provides a display device, including the touch display module according to any of the above embodiments.
  • the first color erasing layer and the second color erasing layer are disposed in the touch display module, and the second color erasing layer can not only achieve the The shadow of the touch electrode, and the second shadow mask layer can also make the color difference between the touch area and the border area adjacent to the touch area in the dark state display mode. Very small, this improves the one-piece black effect.
  • the second shadow mask can also protect the touch module and reduce the scratch rate in the manufacturing process.

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Abstract

一种触控显示模组、其制作方法及显示装置。该触控显示模组包括显示面板(10)和贴附在显示面板(10)上的触控模组(20)；该触控模组(20)分为具有触控电极(001)的触控区域和具有黑矩阵(002)的边框区域，该触控模组(20)包括衬底基板(003)和位于衬底基板(003)靠近显示面板的一侧的第一消影层(004)和第二消影层(005)；第一消影层(004)位于触控电极(001)和衬底基板(003)之间；第二消影层(005)位于触控电极(001)远离衬底基板(003)的一侧；在暗态显示模式下，触控区域和边框区域的色差小于预设值。该触控显示装置可以降低触控区域与边框区域的色差。

Description

触控显示模组、其制作方法及显示装置 技术领域
本发明实施例涉及一种触控显示模组、其制作方法及显示装置。
背景技术
对于大部分触控显示产品，在其触控模组和显示面板贴合后，在触控区域和边框区域会出现明显的色差，为了提高视觉效果，需要尽可能的减小触控区域和边框区域的色差，达到一体黑的效果。针对一体化(OGS，One Glass Solution)触控模组，一种方案是改变边框区域的黑矩阵材料，但是该方案的效果并不理想。
发明内容
本发明实施例提供一种触控显示模组、其制作方法及显示装置，本发明实施例可以降低触控区域与边框区域的色差。
本发明的至少一个实施例提供一种触控显示模组，其包括显示面板和贴附在所述显示面板上的触控显示模组；该触控模组分为具有触控电极的触控区域和具有黑矩阵的边框区域，该触控模组包括衬底基板、位于所述衬底基板靠近所述显示面板的一侧的第一消影层和第二消影层；所述第一消影层位于所述触控电极和所述衬底基板之间；所述第二消影层位于所述触控电极远离所述衬底基板的一侧；在暗态显示模式下，所述触控区域和所述边框区域的色差小于预设值。
例如，在暗态显示模式下，所述触控区域和所述边框区域在Lab色彩模式下的色差ΔE小于1。
例如，在暗态显示模式下，所述第一消影层、所述触控电极和所述第二消影层的叠层结构与所述黑矩阵之间的色差小于所述预设值。
例如，所述第一消影层为最靠近所述衬底基板的膜层。
例如，所述触控电极包括第一触控电极和与所述第一触控电极绝缘设置的具有多个子电极的第二触控电极；所述触控模组还包括：具有桥点图案的 导电层，其中，所述导电层中的桥点图案用于连接所述第二触控电极的子电极；以及位于所述导电层与所述第一触控电极之间且露出桥点的两端的第一绝缘层。
例如，所述触控模组在所述边框区域还包括与所述触控电极电连接的柔性线路板连接部；所述第二消影层暴露出所述连接部所在区域。
例如，所述触控模组还包括位于所述触控电极、所述第一绝缘层和所述黑矩阵中的每个与所述第二消影层之间的第二绝缘层。
例如，所述第二绝缘层的材料为光学胶。
例如，所述第一消影层和所述第二消影层中的至少一个与所述触控电极直接接触。
例如，所述第一消影层为五氧化二铌膜层和二氧化硅膜层组成的复合膜层。
例如，所述第二消影层为五氧化二铌膜层和二氧化硅膜层组成的复合膜层；或者，所述第二消影层为氮氧化硅膜层。
例如，所述触控电极和所述导电层的材料为氧化铟锡。
例如，所述触控电极的厚度为
Figure PCTCN2017095234-appb-000001
时，所述第一消影层中的五氧化二铌膜层的厚度范围是
Figure PCTCN2017095234-appb-000002
二氧化硅膜层的厚度范围是
Figure PCTCN2017095234-appb-000003
所述第二消影层中的五氧化二铌膜层的厚度范围是
Figure PCTCN2017095234-appb-000004
二氧化硅膜层的厚度范围是
Figure PCTCN2017095234-appb-000005
所述第二消影层中的氮氧化硅膜层的厚度范围是
Figure PCTCN2017095234-appb-000006
例如，所述第一消影层中的五氧化二铌膜层的厚度是
Figure PCTCN2017095234-appb-000007
二氧化硅膜层的厚度是
Figure PCTCN2017095234-appb-000008
所述第二消影层中的氮氧化硅膜层的厚度是
Figure PCTCN2017095234-appb-000009
例如，所述第一消影层中的五氧化二铌膜层的厚度是
Figure PCTCN2017095234-appb-000010
二氧化硅膜层的厚度是
Figure PCTCN2017095234-appb-000011
所述第二消影层中的五氧化二铌膜层的厚度是
Figure PCTCN2017095234-appb-000012
二氧化硅膜层的厚度是
Figure PCTCN2017095234-appb-000013
例如，所述的触控显示模组还包括光学胶层，所述光学胶层连接所述显示面板和所述第二消影层。
本发明的至少一个实施例提供一种如以上任一项所述的触控显示模组的制作方法，该方法包括：在所述衬底基板上形成所述第一消影层；在所述衬底基板形成有所述第一消影层的一侧形成触控电极；在所述衬底基板形成有 所述触控电极的一侧形成第二消影层，以形成触控模组；以及将所述衬底基板形成有所述第一消影层和所述第二消影层的一侧贴附在显示面板上。
例如，该方法还包括：在形成触控电极之后并且在形成所述第二消影层之前，在所述边框区域形成与所述触控电极电连接的柔性线路板连接部。在该方法中，形成所述第二消影层包括：利用掩膜版遮挡所述连接部所在区域，在所述衬底基板形成有所述触控电极的一侧形成第二消影层；或者，在所述衬底基板形成有所述触控电极的一侧形成一整层第二消影层薄膜之后，利用刻蚀膏去除覆盖所述连接部所在区域的第二消影层薄膜，以形成所述第二消影层。
本发明的至少一个实施例还提供一种触控模组，其包括显示面板和触控模组，所述显示面板包括相对的阵列基板和对置基板，所述对置基板位于所述阵列基板和所述触控模组之间，所述触控模组包括触控电极、第一消影层和第二消影层，并且所述触控电极在沿所述显示面板和所述触控模组的排列方向上位于所述第一消影层和所述第二消影层之间。
例如，所述触控模组分为具有所述触控电极的触控区域和具有黑色遮光材料的边框区域；在暗态显示模式下，所述第一消影层、所述触控电极和所述第二消影层的叠层结构与所述黑色遮光材料之间的色差小于所述预设值。
本发明的至少一个实施例提供一种显示装置，其包括如以上任一项所述的触控显示模组。
附图说明
为了更清楚地说明本发明实施例的技术方案，下面将对实施例的附图作简单地介绍，显而易见地，下面描述中的附图仅仅涉及本发明的一些实施例，而非对本发明的限制。
图1A为本发明实施例提供的一种触控显示模组的结构示意图；
图1B为本发明实施例提供的一种触控显示模组中的触控模组的结构示意图；
图2A为本发明实施例提供的一种触控显示模组的制作方法流程图；
图2B为本发明实施例提供的一种触控显示模组的制作方法的部分步骤的流程图；
图2C为本发明实施例提供的一种触控显示模组的制作方法的部分步骤的流程图；
图3a～图3g为本发明实施例提供的一种触控显示模组中触控模组的制作过程中的每个步骤对应的结构示意图；
图3f’为本发明实施例提供的制作FPC连接部时的部分结构的俯视示意图；
图4为本发明实施例提供的另一种触控显示模组的结构示意图。
具体实施方式
为使本发明实施例的目的、技术方案和优点更加清楚，下面将结合本发明实施例的附图，对本发明实施例的技术方案进行清楚、完整地描述。显然，所描述的实施例是本发明的一部分实施例，而不是全部的实施例。基于所描述的本发明的实施例，本领域普通技术人员在无需创造性劳动的前提下所获得的所有其他实施例，都属于本发明保护的范围。
除非另外定义，本公开使用的技术术语或者科学术语应当为本发明所属领域内具有一般技能的人士所理解的通常意义。本公开中使用的“第一”、“第二”以及类似的词语并不表示任何顺序、数量或者重要性，而只是用来区分不同的组成部分。“包括”或者“包含”等类似的词语意指出现该词前面的元件或者物件涵盖出现在该词后面列举的元件或者物件及其等同，而不排除其他元件或者物件。“连接”或者“相连”等类似的词语并非限定于物理的或者机械的连接，而是可以包括电性的连接，不管是直接的还是间接的。“上”、“下”、“左”、“右”等仅用于表示相对位置关系，当被描述对象的绝对位置改变后，则该相对位置关系也可能相应地改变。
本发明实施例提供一种触控显示模组、其制作方法及显示装置。该触控显示模组包括显示面板和贴附在显示面板上的触控模组；该触控模组分为具有触控电极的触控区域和具有黑矩阵的边框区域，该触控模组包括衬底基板、位于在衬底基板靠近显示面板的一侧的第一消影层和第二消影层；第一消影层位于触控电极和衬底基板之间；第二消影层位于触控电极远离衬底基板的一侧；在暗态显示模式下，触控区域和边框区域的色差小于预设值，例如，该预设值大于0且小于或等于1。例如，在暗态显示模式下，第一消影层、 触控电极和第二消影层的叠层结构(即三者的组合)与黑矩阵之间的色差小于所述预设值。
例如，第二消影层的厚度大于第一消影层的厚度，这样可以获得更好的一体黑效果；或者，第二消影层的厚度也可以等于或小于第一消影层的厚度。
例如，第二消影层可以使得触控电极所在区域的光学折射率等于其它区域(例如边框区域)的光学折射率；一般，在制作工艺中，触控电极所在区域的光学折射率与其它区域的光学折射率接近，即误差在预设范围内，都认为触控电极所在区域的光学折射率与其它区域的光学折射率相等。这样，可以实现对触控电极进行消影。
例如，由于第二消影层还要对触控电极进行消影，因而第二消影层的厚度要比第一消影层厚。本发明实施例中，第一消影层和第二消影层在预定厚度下，能够使得在暗态显示模式下，触控区域和边框区域的色差小于预设值，该预设值为达到所需一体黑效果的最大色差值。例如，在暗态显示模式下，触控区域和边框区域在Lab色彩模式下的色差ΔE小于1，Lab色彩模式是CIE(Commission Internationale Eclairage)组织确定的一个理论上包括了人眼可以看见的所有色彩的色彩模式。在触控区域和边框区域在Lab色彩模式下的色差ΔE小于1的情况下，给观看者的视觉感受就是两个区域的颜色一致；在Lab色彩模式中，L表示亮度值，a表示红绿色值，b表示黄蓝色值，两个颜色的色差
Figure PCTCN2017095234-appb-000014
其中，ΔL表示两个颜色的亮度值的差值，Δa表示两个颜色的红绿色值的差值，Δb表示两个颜色的黄蓝色值的差值。
本发明实施例中，在触控显示模组中显示面板的显示侧设置有第一消影层和第二消影层，第二消影层不仅可以实现对触控电极的消影，并且该第二消影层在第一消影层的配合下，还可以使得在暗态显示模式下触控区域与边框区域的色差非常小，这提高了一体黑效果。另外，第二消影层还可以起到对触控模组的保护作用，降低在制作工艺中的刮伤不良率。
下面结合附图和实施例对本发明的方案进行更详细地说明。
在本发明的至少一个实施例中，如图1A所示，一种可能的触控显示模组包括显示面板10、触控模组20以及连接显示面板10和触控模组20的光学胶层30。触控模组的具体结构如图1A和图1B所示，该触控模组20分为具有触控电极001的触控区域和具有黑矩阵002的边框区域(整个黑矩阵02 所在的区域为边框区域)，该触控模组20包括衬底基板003，在衬底基板003靠近显示面板10的一侧，在触控区域和边框区域包括第一消影层004和第二消影层005；第一消影层004位于触控电极001和衬底基板003之间，例如第一消影层004与触控电极001和/或衬底基板003直接接触；第二消影层005位于触控电极001远离衬底基板003的一侧，并且黑矩阵002位于第一消影层004和第二消影层005之间；第二消影层005的厚度大于第一消影层004的厚度，且第一消影层004的厚度与第二消影层005的厚度满足条件：在暗态显示模式下，触控区域和边框区域在Lab色彩模式下的色差ΔE小于1。
例如，第一消影层004为覆盖整个触控区域和整个边框区域的透明绝缘薄膜。例如，第一消影层的整个上表面和整个下表面都为平面。
例如，第二消影层005为至少覆盖整个触控区域的透明绝缘薄膜。例如，第二消影层005的对应于整个触控区域的上表面和下表面都为平面。
由于第一消影层004的膜层位置对一体黑效果有一定的影响，为了进一步提高一体黑效果，例如，如图1A和图1B所示，第一消影层004为最靠近衬底基板003的膜层，即第一消影层004与衬底基板003直接接触。例如，在第一消影层004为最靠近衬底基板003的膜层的基础上，第二消影层005为最远离衬底基板003的膜层，例如，第二消影层005与光学胶层30直接连接(如图1A所示)，这样能够达到较佳的一体黑效果。
例如，光学胶层30连接显示面板10和第二消影层005，并且为覆盖整个触控区域和整个边框区域的面状结构。
例如，显示面板10包括相对设置的阵列基板和对置基板、以及将二者连接起来的连接部。例如，显示面板10可以为液晶面板或OLED(有机发光二极管)显示面板等主动发光的显示面板。
例如，触控显示模组中包括分别沿行方向和列方向设置的触控电极，其中一个作为驱动电极，另一个作为感应电极。在一种可能的实施例中，沿行方向设置的触控电极和沿列方向设置的触控电极都是一条完整的电极。在另一种可能的实施例中，其中一个方向的为一条完整的电极，另一个方向分为多个子电极。需要说明的是，所述的完整的电极指的是整个电极通过同一层形成。
如图1A和图1B所示的触控电极001包括完整的第一触控电极001a和 与第一触控电极绝缘设置的具有多个子电极的第二触控电极001b；该触控模组还包括具有桥点图案的导电层006，导电层006中的桥点图案用于连接第二触控电极001b的子电极；以及位于导电层006与第一触控电极001a之间且露出桥点的两端的第一绝缘层007。第一绝缘层007主要起到对第一触控电极和第二触控电极绝缘的作用，导电层中的桥点的两端无第一绝缘层覆盖，以保证第二触控电极001b的子电极能够与桥点的两端进行电连接。例如，如图1A和图1B所示，第一绝缘层007还位于黑矩阵002所在区域，并且第一绝缘层007的位于边框区域中的部分位于黑矩阵002和第二消影层005之间，这样可以起到抗静电的作用。
由于触控电极需要与柔性线路板(Flexible Printed Circuit，FPC)连接，例如，如图1B所示，触控模组20在边框区域还包括与触控电极001电连接的柔性线路板(FPC)连接部008；第二消影层005暴露出FPC连接部008所在区域。本实施例中，FPC连接部008所在区域没有第二消影层005的遮挡以确保电性。
例如，第一消影层004为五氧化二铌膜层和二氧化硅膜层组成的复合膜层。例如，五氧化二铌膜层位于二氧化硅膜层与衬底基板003之间，即五氧化二铌膜层到显示面板10的距离大于二氧化硅膜层到显示面板10的距离。
例如，第二消影层005为五氧化二铌膜层和二氧化硅膜层组成的复合膜层，例如，五氧化二铌膜层到显示面板10的距离大于二氧化硅膜层到显示面板10的距离；或者，第二消影层005为氮氧化硅膜层。
例如，对于第一消影层和第二消影层的上述材料，二氧化硅膜层的对于波长为550nm的光的折射率为1.4-1.5，例如1.47；五氧化二铌膜层的对于波长为550nm的光的折射率为2.2-2.5，例如2.34；氮氧化硅膜层的对于波长为550nm的光的折射率为1.6-1.7，例如1.67。
例如，触控电极001和导电层006的材料为氧化铟锡(Indium Tin Oxide，ITO)。基于此，为了达到较好的一体黑效果，触控电极001的厚度(即第二触控电极001b的子电极的在垂直于衬底基板003的承载面方向上的厚度)为
Figure PCTCN2017095234-appb-000015
(埃)时，第一消影层中的五氧化二铌膜层的厚度范围是
Figure PCTCN2017095234-appb-000016
二氧化硅膜层的厚度范围是
Figure PCTCN2017095234-appb-000017
第二消影层中的五氧化二铌膜层的厚度范围是
Figure PCTCN2017095234-appb-000018
二氧化硅膜层的厚度范围是
Figure PCTCN2017095234-appb-000019
第二消影 层中的氮氧化硅膜层的厚度范围是
Figure PCTCN2017095234-appb-000020
为了进一步达到较好的一体黑效果，例如，第一消影层中的五氧化二铌膜层的厚度是
Figure PCTCN2017095234-appb-000021
二氧化硅膜层的厚度是
Figure PCTCN2017095234-appb-000022
第二消影层中的氮氧化硅膜层的厚度是
Figure PCTCN2017095234-appb-000023
为了进一步达到较好的一体黑效果，例如，第一消影层中的五氧化二铌膜层的厚度是
Figure PCTCN2017095234-appb-000024
二氧化硅膜层的厚度是
Figure PCTCN2017095234-appb-000025
第二消影层中的五氧化二铌膜层的厚度是
Figure PCTCN2017095234-appb-000026
二氧化硅膜层的厚度是
Figure PCTCN2017095234-appb-000027
以上仅是以
Figure PCTCN2017095234-appb-000028
的ITO触控电极为例，列举的较好的一体黑效果的厚度参数。具体实施时，如果ITO触控电极为其它的厚度，可以根据触控电极的厚度，确定第二消影层的厚度，再确定第一消影层的厚度，进而使得第一消影层的厚度与第二消影层的厚度满足条件：触控区域和边框区域在Lab色彩模式下的色差ΔE小于1。
例如，ITO触控电极的厚度为
Figure PCTCN2017095234-appb-000029
第一消影层中的二氧化硅膜层的厚度为
Figure PCTCN2017095234-appb-000030
且五氧化二铌膜层的厚度为
Figure PCTCN2017095234-appb-000031
并且第二消影层中的氮氧化硅膜层的厚度为
Figure PCTCN2017095234-appb-000032
ITO触控电极的厚度为
Figure PCTCN2017095234-appb-000033
第一消影层中的二氧化硅膜层的厚度为
Figure PCTCN2017095234-appb-000034
且五氧化二铌膜层的厚度为
Figure PCTCN2017095234-appb-000035
并且第二消影层中的氮氧化硅膜层的厚度为
Figure PCTCN2017095234-appb-000036
ITO触控电极的厚度为
Figure PCTCN2017095234-appb-000037
第一消影层中的二氧化硅膜层的厚度为
Figure PCTCN2017095234-appb-000038
且五氧化二铌膜层的厚度为
Figure PCTCN2017095234-appb-000039
并且第二消影层中的氮氧化硅膜层的厚度为
Figure PCTCN2017095234-appb-000040
例如，如图1A和图1B所示的触控显示模组还包括第二绝缘层009，其位于触控电极001、第一绝缘层007和黑矩阵002中的每个与第二消影层005之间。
例如，第二绝缘层009可以采用除对触控电极有消影作用的材料之外的其它材料。例如，第二绝缘层009的材料不包括五氧化二铌、二氧化硅和氮氧化硅中的任一种。例如，第二绝缘层009的材料为透明光学胶，以避免第二绝缘层增大第一消影层、第二消影层和触控电极的叠层结构与黑矩阵之间的色差。
例如，第一消影层004和/或第二消影层005中的至少一个与触控电极001直接接触。这样可以避免消影层与触控电极之间在设置绝缘层的情况下该绝缘层增大第一消影层、第二消影层和触控电极的叠层结构与黑矩阵之间 的色差。
基于同样的发明构思，本发明实施例还提供一种如以上任意实施例的触控显示模组的制作方法，如图2A所示，该方法至少包括如下步骤：步骤210、在衬底基板上形成第一消影层；步骤220、在衬底基板形成有第一消影层的一侧形成触控电极；步骤230、在衬底基板形成有触控电极的一侧形成第二消影层，以形成触控模组；步骤240、将衬底基板形成有第一消影层和第二消影层的一侧贴附在显示面板上，其中，第二消影层的厚度大于第一消影层的厚度，且第一消影层的厚度与第二消影层的厚度满足条件：在暗态显示模式下，触控区域和边框区域的色差小于预设值，例如，该预设值大于0且小于或等于1。
在本发明实施例中，第二消影层可以使得触控电极所在区域的光学折射率等于其它区域的光学折射率；在制作工艺中，触控电极所在区域的光学折射率与其它区域的光学折射率无限接近，即误差在预设范围内，都认为触控电极所在区域的光学折射率与其它区域的光学折射率相等。这样，可以实现对触控电极进行消影。
在本发明实施例中，由于第二消影层还要对触控电极进行消影，因而第二消影层的厚度要比第一消影层厚。本发明实施例中，第一消影层和第二消影层在预定厚度下，能够使得在暗态显示模式下，触控区域和边框区域的色差小于预设值，该预设值为达到所需一体黑效果的最大色差值。例如，触控区域和边框区域在Lab色彩模式下的色差ΔE小于1时，给观看者的视觉感受就是两个区域的颜色一致；在Lab色彩模式中，L表示亮度值，a表示红绿色值，b表示黄蓝色值；两个颜色的色差
Figure PCTCN2017095234-appb-000041
其中，ΔL表示两个颜色的亮度值的差值，Δa表示两个颜色的红绿色值的差值，Δb表示两个颜色的黄蓝色值的差值。
本发明实施例中，在触控显示模组中设置有第一消影层和第二消影层，第二消影层不仅可以实现对触控电极的消影，并且该第二消影层在第一消影层的配合下，还可以使得在暗态显示模式下触控区域与边框区域的色差非常小，这提高了一体黑效果。另外，第二消影层还可以起到对触控模组的保护作用，降低在制作工艺中的刮伤不良率。
具体实施例时，例如，在衬底基板形成有第一消影层的一侧形成触控电 极之后，在衬底基板形成有触控电极的一侧形成第二消影层之前，如图2B和图2C所示，本发明实施例提供的制作方法还包括：在边框区域形成与触控电极电连接的FPC连接部。相应的，在衬底基板形成有触控电极的一侧形成第二消影层，包括：利用掩膜版遮挡FPC连接部所在区域，在衬底基板形成有触控电极的一侧形成第二消影层(如图2B所示)；或者，在衬底基板形成有触控电极的一侧形成一整层第二消影层薄膜之后，利用刻蚀膏去除覆盖FPC连接部所在区域的第二消影层薄膜，以形成第二消影层(如图2C所示)。
本实施例中，在FPC连接部没有覆盖第二消影层，因此第二消影层不会影响FPC连接部的导电性。
下面以触控电极为
Figure PCTCN2017095234-appb-000042
的ITO电极为例，对本发明实施例提供的触控显示模组的制作方法进行更加详细地说明。
本实施例中的触控模组为OGS触控模组，该触控模组的具体的制作步骤包括如下步骤一至步骤八。
步骤一、如图3a所示，在衬底基板003上形成第一消影层004。
例如，衬底基板003为玻璃基板、石英基板或塑料基板。
例如，该步骤中的第一消影层004包括依次层叠的五氧化二铌膜层和二氧化硅膜层，且厚度分别为
Figure PCTCN2017095234-appb-000043
和
Figure PCTCN2017095234-appb-000044
例如，该步骤中，第一消影层是溅镀(Sputter)工艺形成的，这样第一消影层的稳定性更好。
步骤二、如图3b所示，在衬底基板003形成有第一消影层004的一侧的边框区域形成黑矩阵002。
该步骤中，例如，可以先在第一消影层004上覆盖一整层的黑矩阵，然后经过光刻蚀工艺，仅保留边框区域的黑矩阵。
步骤三、如图3c所示，在衬底基板003形成具有桥点图案的导电层006。
步骤四、如图3d所示，在衬底基板003形成有导电层006的一侧形成第一绝缘层007，该第一绝缘层007位于黑矩阵002和导电层006上且露出绝缘层006的桥点图案的两端。
步骤五、如图3e所示，在衬底基板003形成有第一绝缘层007的的一侧形成第一触控电极001a和第二触控电极001b，该第二触控电极001b的子电 极通过桥点图案电连接。
步骤六、如图3f所示，在衬底基板003形成有第一触控电极001a和第二触控电极001b的一侧形成与各第一触控电极001a和第二触控电极001b电连接的FPC连接部008，可参见如图3f’所示的部分结构的俯视图。
步骤七、如图3g所示，在衬底基板003形成有FPC连接部008的一侧形成覆盖黑矩阵002、第一触控电极001a、第二触控电极001b和第一绝缘层007的第二绝缘层009。
从图3g中可以看出，FPC连接部008没有被第二绝缘层009覆盖，而是暴露出来，以保证其导电性，另外，例如，一些粗的接地(Ground，GND)线(图中未示出)的部分表面也会暴露出来。
步骤八、利用掩膜版遮挡住FPC连接部008所在区域；或整面溅射用于形成第二消影层的薄膜后采用刻蚀膏刻蚀的方式，在衬底基板003形成有第二绝缘层009的一侧形成第二消影层005。该步骤中得到的结构可以参见图1。
该步骤中，例如。第二消影层为氮氧化硅膜层且厚度是
Figure PCTCN2017095234-appb-000045
或者，第二消影层为依次层叠的五氧化二铌膜层和二氧化硅膜层，且厚度分别为
Figure PCTCN2017095234-appb-000046
和
Figure PCTCN2017095234-appb-000047
该步骤中，例如第二消影层是采用溅射技术形成的，这样第二消影层的稳定性更好。
按照以上步骤制作得到的触控模组后，将上述衬底基板003形成有第一消影层和第二消影层的一侧全贴合在显示面板上，即制作得到触控显示模组。本实施例的制作方法得到的触控显示模组，能够实现在暗态显示模式下，触控区域和边框区域在Lab色彩模式下的色差ΔE小于1，从而大大提高一体黑效果。
本发明的至少一个实施例还提供一种触控显示模组，如图4所示，该触控显示模组包括显示面板10和触控模组20。显示面板10包括相对的阵列基板11和对置基板12(例如彩膜基板)、以及连接二者的连接部13(其例如采用密封材料制作)；对置基板12位于阵列基板11和触控模组20之间；触控模组20包括触控电极001(其例如包括延伸方向相交的第一触控电极001a和第二触控电极001b)、第一消影层004和第二消影层005，并且触控电极001在沿显示面板10和触控模组20的排列方向上位于第一消影层004和第 二消影层005之间。
本发明实施通过在触控电极001的两侧形成消影层，可以有效提高消影效果。
例如，触控模组包括分为具有触控电极001的触控区域和具有黑色遮光材料(例如黑矩阵)002’的边框区域；在暗态显示模式下，第一消影层004、触控电极001和第二消影层005在触控区域中的叠层结构与黑色遮光材料002’之间的色差小于预设值。在这种情况下，在暗态显示模式下，触控区域和边框区域的色差小于该预设值，例如，该预设值大于0且小于或等于1。这样可以降低触控区域与边框区域的色差，从而提高一体黑效果。
例如，第一消影层004位于触控电极001远离对置基板12的一侧，第二消影层005位于触控电极001和对置基板12之间，第二消影层005的厚度大于第一消影层004的厚度。这样可以获得更好的一体黑效果。
例如，该触控显示模组可以为OGS模式，即触控模组20通过光学胶层与显示面板贴合在一起，如图1A所示；或者，该触控显示模组也可以为On cell模式，即触控模组20直接形成在显示面板10的对置基板12上，并且通过光学胶层30与盖板003’贴合在一起(例如第一消影层004与光学胶层30直接接触)，如图4所示。在这两种模式中，第二消影层005到显示面板10的距离都小于第一消影层004到显示面板10的距离。
图4所示实施例中各结构的设置方式可参考图1所示实施例中的相关描述，重复之处不再赘述。
基于同样的发明构思，本发明实施例还提供一种显示装置，包括如以上任意实施例的触控显示模组。
本发明实施例提供的触控显示模组、其制作方法及显示装置中，在触控显示模组中设置有第一消影层和第二消影层，第二消影层不仅可以实现对触控电极的消影，并且该第二消影层在第一消影层的配合下，还可以使得在暗态显示模式下触控区域以及与触控区域相邻的边框区域之间的色差非常小，这提高了一体黑效果。另外，第二消影层还可以起到对触控模组的保护作用，降低在制作工艺中的刮伤不良率。
以上所述仅是本发明的示范性实施方式，而非用于限制本发明的保护范围，本发明的保护范围由所附的权利要求确定。
本申请要求于2016年8月25日递交的中国专利申请第201610726278.6号的优先权，在此全文引用上述中国专利申请公开的内容以作为本申请的一部分。

Claims (20)

  1. 一种触控显示模组，包括：
    显示面板；和
    贴附在所述显示面板上的触控模组，其中，所述触控模组分为具有触控电极的触控区域和具有黑矩阵的边框区域，所述触控模组包括衬底基板、以及位于所述衬底基板靠近所述显示面板的一侧的第一消影层和第二消影层；
    其中：
    所述第一消影层位于所述触控电极和所述衬底基板之间；
    所述第二消影层位于所述触控电极远离所述衬底基板的一侧；
    在暗态显示模式下，所述触控区域和所述边框区域的色差小于预设值。
  2. 根据权利要求1所述的触控显示模组，其中，在暗态显示模式下，所述触控区域和所述边框区域在Lab色彩模式下的色差ΔE小于1。
  3. 根据权利要求1或2所述的触控显示模组，其中，在暗态显示模式下，所述第一消影层、所述触控电极和所述第二消影层的叠层结构与所述黑矩阵之间的色差小于所述预设值。
  4. 根据权利要求1至3中任一项所述的触控显示模组，其中，所述第一消影层为最靠近所述衬底基板的膜层。
  5. 根据权利要求1至4中任一项所述的触控显示模组，其中，所述触控电极包括第一触控电极和与所述第一触控电极绝缘设置的具有多个子电极的第二触控电极；
    所述触控模组还包括：
    具有桥点图案的导电层，其中，所述导电层中的桥点图案用于连接所述第二触控电极的子电极；以及
    位于所述导电层与所述第一触控电极之间且露出桥点的两端的第一绝缘层。
  6. 根据权利要求5所述的触控显示模组，其中，所述触控模组还包括第二绝缘层，所述第二绝缘层位于所述触控电极、所述第一绝缘层和所述黑矩阵中的每一个与所述第二消影层之间。
  7. 根据权利要求6所述的触控显示模组，其中，所述第二绝缘层的材料 为光学胶。
  8. 根据权利要求1至5中任一项所述的触控显示模组，其中，所述第一消影层和所述第二消影层中的至少一个与所述触控电极直接接触。
  9. 根据权利要求1至8中任一项所述的触控显示模组，其中，所述触控模组在所述边框区域还包括与所述触控电极电连接的柔性线路板连接部；
    所述第二消影层暴露出所述连接部所在区域。
  10. 根据权利要求1至9中任一项所述的触控显示模组，其中，所述第一消影层为五氧化二铌膜层和二氧化硅膜层组成的复合膜层。
  11. 根据权利要求10所述的触控显示模组，其中，所述第二消影层为五氧化二铌膜层和二氧化硅膜层组成的复合膜层；或者，所述第二消影层为氮氧化硅膜层。
  12. 根据权利要求11所述的触控显示模组，其中，所述触控电极和所述导电层的材料为氧化铟锡。
  13. 根据权利要求12所述的触控显示模组，其中，所述触控电极的厚度为
    Figure PCTCN2017095234-appb-100001
    时，所述第一消影层中的五氧化二铌膜层的厚度范围是
    Figure PCTCN2017095234-appb-100002
    二氧化硅膜层的厚度范围是
    Figure PCTCN2017095234-appb-100003
    所述第二消影层中的五氧化二铌膜层的厚度范围是
    Figure PCTCN2017095234-appb-100004
    二氧化硅膜层的厚度范围是
    Figure PCTCN2017095234-appb-100005
    所述第二消影层中的氮氧化硅膜层的厚度范围是
    Figure PCTCN2017095234-appb-100006
  14. 根据权利要求13所述的触控显示模组，其中，
    所述第一消影层中的五氧化二铌膜层的厚度是
    Figure PCTCN2017095234-appb-100007
    二氧化硅膜层的厚度是
    Figure PCTCN2017095234-appb-100008
    所述第二消影层中的氮氧化硅膜层的厚度是
    Figure PCTCN2017095234-appb-100009
    或者
    所述第一消影层中的五氧化二铌膜层的厚度是
    Figure PCTCN2017095234-appb-100010
    二氧化硅膜层的厚度是
    Figure PCTCN2017095234-appb-100011
    所述第二消影层中的五氧化二铌膜层的厚度是
    Figure PCTCN2017095234-appb-100012
    二氧化硅膜层的厚度是
    Figure PCTCN2017095234-appb-100013
  15. 根据权利要求1至14中任一项所述的触控显示模组，还包括光学胶层，其中，所述光学胶层连接所述显示面板和所述第二消影层。
  16. 一种如权利要求1～5中任一项所述的触控显示模组的制作方法，包括：
    在所述衬底基板上形成所述第一消影层；
    在所述衬底基板的形成有所述第一消影层的一侧形成触控电极；
    在所述衬底基板的形成有所述触控电极的一侧形成第二消影层，以形成触控模组；以及
    将所述衬底基板的形成有所述第一消影层和所述第二消影层的一侧贴附在显示面板上。
  17. 根据权利要求16所述的制作方法，还包括：
    在形成所述触控电极之后并且在形成所述第二消影层之前，在所述边框区域形成与所述触控电极电连接的柔性线路板连接部；
    其中，形成所述第二消影层包括：
    利用掩膜版遮挡所述连接部所在区域，在所述衬底基板形成有所述触控电极的一侧形成第二消影层；或者，在所述衬底基板形成有所述触控电极的一侧形成一整层第二消影层薄膜之后，利用刻蚀膏去除覆盖所述连接部所在区域的第二消影层薄膜，以形成所述第二消影层。
  18. 一种触控显示模组，包括：
    显示面板，其包括相对的阵列基板和对置基板；以及
    触控模组，其中，所述对置基板位于所述阵列基板和所述触控模组之间，
    其中，所述触控模组包括触控电极、第一消影层和第二消影层，并且所述触控电极在沿所述显示面板和所述触控模组的排列方向上位于所述第一消影层和所述第二消影层之间。
  19. 根据权利要求18所述的触控显示模组，其中，所述触控模组分为具有所述触控电极的触控区域和具有黑色遮光材料的边框区域；在暗态显示模式下，所述第一消影层、所述触控电极和所述第二消影层的叠层结构与所述黑色遮光材料之间的色差小于所述预设值。
  20. 一种显示装置，包括如权利要求1～15中任一项所述的触控显示模组或如权利要求18或19所述的触控显示模组。
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