WO2018024133A1 - 一种触控屏及其制作方法、外挂式触摸显示装置 - Google Patents

一种触控屏及其制作方法、外挂式触摸显示装置 Download PDF

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Publication number
WO2018024133A1
WO2018024133A1 PCT/CN2017/094262 CN2017094262W WO2018024133A1 WO 2018024133 A1 WO2018024133 A1 WO 2018024133A1 CN 2017094262 W CN2017094262 W CN 2017094262W WO 2018024133 A1 WO2018024133 A1 WO 2018024133A1
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WO
WIPO (PCT)
Prior art keywords
touch
metal
detection electrode
wiring layer
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/CN2017/094262
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English (en)
French (fr)
Inventor
王静
谢晓冬
朱顺成
何敏
张贵玉
郑启涛
许邹明
李冬
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BOE Technology Group Co Ltd
Hefei Xinsheng Optoelectronics Technology Co Ltd
Original Assignee
BOE Technology Group Co Ltd
Hefei Xinsheng Optoelectronics Technology Co Ltd
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Application filed by BOE Technology Group Co Ltd, Hefei Xinsheng Optoelectronics Technology Co Ltd filed Critical BOE Technology Group Co Ltd
Priority to US15/750,320 priority Critical patent/US20190064957A1/en
Publication of WO2018024133A1 publication Critical patent/WO2018024133A1/zh
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/0412—Digitisers structurally integrated in a display
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/0416—Control or interface arrangements specially adapted for digitisers
    • G06F3/04164—Connections between sensors and controllers, e.g. routing lines between electrodes and connection pads
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04103—Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0445—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using two or more layers of sensing electrodes, e.g. using two layers of electrodes separated by a dielectric layer
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0446—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using a grid-like structure of electrodes in at least two directions, e.g. using row and column electrodes

Definitions

  • Embodiments of the present disclosure relate to a touch screen, a method of fabricating the same, and an external touch display device.
  • touch technology can be roughly divided into four types: resistive, capacitive, infrared, and acoustic. Among them, resistive and capacitive types are currently the largest market, and other technologies are unlikely to catch up in the short term. As people's experience with touches is recognized, capacitive touch technology is gradually replacing resistive touch technology. Capacitive touch technology can be divided into mutual capacitive touch technology and self-capacitive touch technology. Since mutual capacitive touch technology can realize multi-touch, mutual capacitive touch technology has become the mainstream and future development trend in the market.
  • the mutual capacitive touch display device can be classified into an external touch display device and an in-cell touch display device.
  • the external touch display device can be mainly divided into G+G, GFF, One Glass Solution (OGS) and On cell
  • the On cell structure touch display device refers to embedding the touch screen into the touch screen.
  • a touch screen is disposed between the color filter substrate of the display device and the polarizer, that is, on the liquid crystal panel.
  • At least one embodiment of the present disclosure provides a method of fabricating a touch screen, including: forming a pattern of a first touch detection electrode on a substrate; forming at least the first in a frame region of the substrate a pattern of the first metal wiring layer electrically connected to the touch detecting electrode; forming a first insulating layer on a side of the first metal wiring layer away from the base substrate; away from the first insulating layer Forming a second touch detecting electrode on one side of the base substrate; and forming a second metal wiring layer electrically connected to at least the second touch detecting electrode in the frame region of the base substrate Graphics.
  • the pattern of the first metal wiring layer and the pattern of the second metal wiring layer are formed by using the same mask.
  • forming the pattern of the first metal wiring layer and the pattern of the second metal wiring layer by using the same mask include: forming and using the same mask a first metal line connected to the first touch detection electrode and a second metal line connected to the second touch detection electrode.
  • the method further includes: using an evaporation process on a side of the second metal wiring layer away from the substrate A second insulating layer is formed.
  • the method before the pattern of the first touch detection electrode is formed on the substrate, the method further includes: forming a black matrix in a frame region of the substrate substrate Graphics.
  • the first metal wiring layer includes the first metal line and a first connection line disposed in the same layer as the first metal line, the first The connecting line is isomorphic to the second metal line.
  • the second metal wiring layer includes the second metal line and a second connection line disposed in the same layer as the second metal line, the second The connecting line is isomorphic to the first metal line.
  • the first touch detection electrode is a touch drive electrode
  • the second touch detection electrode is a touch sensing electrode
  • the first touch The detecting electrode is a touch sensing electrode
  • the second touch detecting electrode is a touch driving electrode
  • At least one embodiment of the present disclosure provides a touch screen including: a substrate; a first touch detection electrode disposed on the substrate; and a film layer disposed at the first touch detection electrode a first metal wiring layer at least one side of the substrate substrate and electrically connected to the first touch detecting electrode; and the first metal wiring layer a first insulating layer away from a side of the substrate; a second touch detecting electrode disposed on a side of the first insulating layer away from the substrate; and a second touch detecting a second metal wiring layer at least adjacent to the substrate of the substrate and located at a side of the substrate substrate and electrically connected to at least the second touch detection electrode.
  • the patterns of the first metal wiring layer and the second metal wiring layer are the same.
  • the first metal trace layer includes a first metal line connected to the first touch detection electrode
  • the second metal trace layer includes The second The second metal line connected to the touch detection electrode
  • the first metal wiring layer includes the first metal line and a first connection line disposed in the same layer as the first metal line, where the A connecting line is isomorphous to the second metal line.
  • the second metal wiring layer includes the second metal line and a second connection line disposed in the same layer as the second metal line, where the The two connecting lines are identical to the first metal line.
  • the first touch detection electrode is a touch drive electrode
  • the second touch detection electrode is a touch sensing electrode
  • the first touch The control detecting electrode is a touch sensing electrode
  • the second touch detecting electrode is a touch driving electrode.
  • the touch screen according to an embodiment of the present disclosure further includes: a black matrix disposed between the base substrate and the first touch detection electrode and located in the frame area.
  • the touch screen according to an embodiment of the present disclosure further includes: a second insulating layer disposed on a side of the second metal wiring layer away from the substrate.
  • At least one embodiment of the present disclosure further provides an external touch display device, including: an array substrate; an opposite substrate, the pair of the array substrate; and a touch screen located at the opposite substrate away from the array On one side of the substrate, the touch screen includes the touch screen according to any of the above.
  • the touch screen and the manufacturing method thereof and the external touch display device of the present disclosure form a first touch detection electrode and a second touch detection electrode of a different layer structure on the base substrate, and the base substrate is The frame region forms a first metal wiring layer connected to the first touch detection electrode and a second metal wiring layer connected to the second touch detection electrode, so that the metal wiring layer is located only in the frame region of the substrate substrate, and The first touch detection electrode and the second touch electrode are insulated from each other by the first insulating layer, and the first touch detection electrode or the second touch detection electrode is connected without designing a bridge. Avoid solving the problem of bridge point shadowing.
  • FIG. 1 is a schematic flow chart of a method for fabricating a touch screen according to an embodiment of the present disclosure
  • FIGS. 2(a) to 2(h) are schematic structural diagrams of a method for fabricating a touch screen after each step is performed according to an embodiment of the present disclosure
  • FIG. 3 is a schematic structural diagram of a touch screen according to an embodiment of the present disclosure.
  • FIG. 4 is a schematic structural diagram of a metal wiring layer according to an embodiment of the present disclosure.
  • FIG. 5 is a schematic structural diagram of a second touch screen according to an embodiment of the present disclosure.
  • FIG. 6 is a schematic structural diagram of a third touch screen according to an embodiment of the present disclosure.
  • FIG. 7 is a schematic structural diagram of an external touch display device according to an embodiment of the present disclosure.
  • FIG. 8 is a schematic structural diagram of a second external touch display device according to an embodiment of the present disclosure.
  • FIG. 9 is a schematic structural diagram of a third external touch display device according to an embodiment of the present disclosure.
  • SLOC single layer on cell
  • ITO Indium Tin Oxides
  • SLOC products cannot achieve large-size multi-touch.
  • some touch manufacturers have adopted a transparent optical adhesive material as an insulating layer and designed a via hole in the transparent optical adhesive material, thereby reducing the number of masks, and solving the shadow elimination problem by using an ITO bridge instead of a metal bridge, so that the usual 6 Mask (Mask) Becomes 5Mask.
  • the present disclosure provides a touch screen, a manufacturing method thereof, and an external touch display device.
  • the method for manufacturing the touch screen comprises: forming a first touch detection electrode and a second touch detection electrode of a different layer structure on the base substrate, and forming a connection with the first touch detection electrode in a frame region of the base substrate; a first metal trace layer and a second metal trace layer connected to the second touch detection electrode, such that the metal trace layer is only located in the frame region of the base substrate, and the first touch detection electrode in the touch region is
  • the second touch electrodes are insulated from each other by the first insulating layer, and the first touch detection electrodes or the second touch detection electrodes are connected without designing bridges, thereby avoiding the problem of bridge point elimination.
  • the touch screen provided by the embodiment of the present disclosure does not need to use ITO material in the metal wiring area of the frame area, and the touch area does not need to design a transparent optical adhesive (OC) insulating layer, thereby reducing the design cost. Therefore, the touch screen provided by the embodiment of the present disclosure solves the problem of bridge point elimination under the premise of reducing the cost, thereby improving the competitiveness of the product.
  • OC transparent optical adhesive
  • each film layer in the drawings do not reflect the true scale, and are merely intended to illustrate the present invention.
  • At least one embodiment of the present disclosure provides a method for fabricating a touch screen, the method comprising the following steps S101-S105:
  • S103 forming a first insulating layer on a side of the first metal wiring layer away from the substrate.
  • the first insulating layer is simultaneously formed on the touch area and the frame area of the base substrate.
  • the upper side of the above-mentioned lining substrate refers to the side away from the first metal wiring layer.
  • S104 forming a pattern of the second touch detection electrodes above the first insulation layer. It should be noted that the above upper surface of the first insulating layer refers to a side away from the substrate.
  • S105 forming a pattern of the second metal wiring layer electrically connected to at least the second touch-over detecting electrode in the frame region of the base substrate.
  • first touch detection electrode can be used as a touch drive electrode
  • second touch detection electrode can be used as a touch sensing electrode
  • first touch detection electrode can be used as a touch sensing electrode
  • second touch The control detection electrode is used as the touch drive electrode, and the embodiment of the present invention is not limited herein.
  • a method for fabricating a touch panel includes: forming a pattern of a first touch detection electrode on a base substrate; and forming a second portion electrically connected to the first touch detection electrode in a frame region of the base substrate a pattern of a metal wiring layer; a pattern of a first insulating layer formed over the substrate substrate having the first metal wiring layer; a pattern of the second touch detecting electrode formed over the first insulating layer; and a substrate on the substrate
  • the frame region forms a pattern of at least a second metal trace layer electrically connected to the second touch-over detecting electrode.
  • the method for fabricating the touch panel forms a first touch detection electrode and a second touch detection electrode of a different layer structure on the base substrate, and forms a frame region of the base substrate.
  • the control detection electrode and the second touch electrode are insulated from each other by the first insulating layer, and the first touch detection electrode or the second touch detection electrode is connected without designing a bridge, thereby avoiding the problem of eliminating the bridge point elimination.
  • the touch screen provided by the embodiment of the present disclosure does not need to be made of ITO material in the metal wiring area of the frame area, and the touch area does not need to design the OC insulating layer, thereby reducing the design cost. Therefore, the touch screen provided by the embodiment of the present disclosure solves the problem of bridge point elimination under the premise of reducing the cost, thereby improving the competitiveness of the product.
  • the pattern of the first touch detection electrode may include a plurality of first touch detection electrodes extending along the first direction and insulated in the second direction; each of the first touch detection electrodes includes being arranged along the first direction Multiple diamond shaped electrode blocks, or any other shape of electrode block.
  • the pattern of the second touch detection electrode may include a plurality of second touch detection electrodes extending in the second direction and insulated in the first direction; each of the second touch detection electrodes includes being arranged along the second direction Multiple diamond shaped electrode blocks, or any other shape of electrode block.
  • the touch screen includes a touch area and a frame area, that is, the base substrate also includes a touch area and a frame area.
  • the touch area of the touch screen provided by the embodiment of the present disclosure does not include a metal trace layer, and only the frame area forms a metal trace layer, thereby avoiding the problem of metal shadow elimination.
  • the first mask is formed by using the same mask.
  • the pattern of the layer and the pattern of the second metal trace layer can be distributed and simultaneously turned on to realize large-scale multi-touch and touch. Good results.
  • the same mask is used in forming the first metal wiring layer and the second metal wiring layer, so that Only one Mask is required to form the first metal trace layer and the second metal trace layer.
  • the manufacturing method of the touch screen provided by the embodiment of the present disclosure can be fabricated by using three masks, the first mask is used to form a pattern of the first touch detection electrode on the substrate, and the second mask is used for the second mask. A pattern of the first metal wiring layer and a pattern of the second metal wiring layer are formed in the frame region, and the third mask is used to form a pattern of the second touch detecting electrode over the first insulating layer. Therefore, the method for fabricating the touch screen provided by the embodiment of the present disclosure can adopt the same mask when forming the first metal wiring layer and the second metal wiring layer, so that four channels can be used when forming the touch screen. Process, 3 masks are formed.
  • the pattern of the first metal wiring layer and the second metal wiring layer is formed by using the same mask, including: forming and using the same mask. a first metal line connected to the touch detection electrode and a second metal line connected to the second touch detection electrode.
  • the first metal wiring layer and the second metal wiring layer are formed by using the same mask
  • the mask is included in the mask.
  • the first metal wiring layer includes a first metal line connected to the first touch detecting electrode and a first connecting line disposed in the same layer as the first metal line, the pattern of the first connecting line and the second metal line
  • the graphics are the same.
  • a via hole may be disposed in the first insulating layer such that the first connection line is electrically connected to the second touch detection electrode, or no via hole is disposed, so that the first connection line is insulated from the second touch detection electrode.
  • the second metal wiring layer includes a second metal line connected to the second touch detecting electrode and a second connecting line disposed in the same layer as the second metal line, the pattern of the second connecting line and the first metal line The graphics are the same.
  • a via may be disposed in the first insulating layer such that the second connecting line is electrically connected to the first touch detecting electrode, or no via is disposed, so that the second connecting line is insulated from the first touch detecting electrode.
  • the method further includes: using an evaporation process on the substrate substrate having the second metal wiring layer A second insulating layer is formed.
  • the second insulating layer can be used as a protective layer of the touch screen, which improves the shadow elimination effect of the touch screen.
  • the material of the insulating layer is silicon oxynitride or silicon dioxide.
  • the insulating layer in the embodiment of the present disclosure includes a first insulating layer and a second insulating layer. Therefore, the materials of the first insulating layer and the second insulating layer may be any one of silicon oxynitride or silicon dioxide or A combination of the two; or a combination of either or both of the material of the first insulating layer or the second insulating layer, silicon oxynitride or silicon dioxide, is not limited herein. Among them, silicon oxynitride or dioxide
  • the second insulating layer made of silicon can be used as a protective layer of the touch screen, thereby further avoiding bridge point shadowing and improving the shadow elimination effect of the touch screen pattern.
  • the method before the pattern of the first touch detection electrode is formed on the substrate, the method further includes: forming a black matrix pattern in the frame region of the substrate substrate. .
  • a pattern forming a black matrix is used to block the first metal trace layer and the second metal trace layer of the bezel area.
  • the black matrix is located below the first touch detection electrode of the frame region in the embodiment of the present disclosure, the portion of the black matrix overlapping the first touch detection electrode forms a closed loop, thereby The static electricity on the touch detection electrode is released to the GND trace through the closed loop of the black matrix, and then connected to the GND line through the GND pin pin on the printed circuit board to discharge the static electricity. Therefore, the black matrix in the touch screen is further prevented from being electrostatically broken, and the conductive area or the short circuit is prevented from being formed in the touch area.
  • An embodiment of the present disclosure provides a method for fabricating a touch screen, the method comprising the following steps:
  • Step 1 A pattern of the black matrix 02 is formed in the frame region of the base substrate 01 as shown in Fig. 2(a).
  • the pattern of the black matrix can be formed by a patterning process of coating, exposure, and development on the substrate substrate; it should be noted that the pattern forming the black matrix is an optional step, and step 2 can be directly performed.
  • Step 2 As shown in FIG. 2(b), a pattern of the first touch detection electrodes 03 is formed on the frame region and the touch region of the base substrate 01.
  • the pattern of the first touch detection electrode 03 may include a plurality of patterns extending in the first direction and insulated in the second direction.
  • the ITO film layer may be coated on the base substrate, the photoresist is coated, the photoresist is exposed and developed, and finally the ITO film layer is etched to form a pattern of the first touch detection electrode.
  • the figure of the first touch detection electrode includes not only the structure shown in FIG. 2( c ) but also other shapes. The embodiment of the present disclosure is not limited herein.
  • Step 3 forming a pattern of the first metal wiring layer 04 electrically connected to the first touch detecting electrode in the frame region of the base substrate 01 by using a mask, as shown in FIG. 2(d).
  • the pattern of the first metal wiring layer can be formed by performing metal plating on the frame region of the base substrate, coating the photoresist, exposing and developing the photoresist, and then etching the metal plating film.
  • Step 4 forming a pattern of the first insulating layer 05 over the first metal trace layer, as shown in FIG. 2(e) Shown.
  • the pattern of the first insulating layer may be formed by evaporation, and the pattern of the first insulating layer may be a full layer structure.
  • Step 5 forming a pattern of the second touch detection electrode 06 above the first insulating layer 05, as shown in FIG. 2(f).
  • the first insulating layer is located between the first metal trace layer and the second touch detection electrode, and is located between the first touch detection electrode and the second touch detection electrode.
  • the shape of the second touch detection electrode is the same as that of the first touch detection electrode in FIG. 2( c ), and the projection of each second touch detection electrode on the base substrate and the first touch detection electrode are The projections on the base substrate do not overlap.
  • Step 6 forming a pattern of the second metal wiring layer 07 over the second touch detecting electrode 06 by using the same mask, as shown in FIG. 2(g).
  • the second metal wiring layer is the same as the mask used in the first metal wiring layer, and includes metal plating, photoresist coating, and photoresist on the second touch detecting electrode of the frame region of the substrate substrate. Exposure, development, and etching of the metal plating film to form a pattern of the second metal wiring layer.
  • Step 7 A second insulating layer 08 is formed over the second metal wiring layer 07 as shown in FIG. 2(h).
  • the second insulating layer is located in the frame region and the touch region, and the pattern of the second insulating layer may be formed by evaporation.
  • the material of the first insulating layer and the second insulating layer is SiNxOy or SiO2.
  • the material of the first touch detection electrode and the second touch detection electrode is indium tin oxide.
  • the touch screen is formed by the above steps 1 to 7, and both of the steps 1 to 7 need to be patterned by a patterning process.
  • the patterning process may include only a photolithography process, or may include a photolithography process and an etching step, and may also include other processes for forming a predetermined pattern, such as printing, inkjet, etc.;
  • the photolithography process includes film formation, exposure, A process of forming a pattern by using a photoresist, a mask, an exposure machine, or the like in a process such as development.
  • a corresponding patterning process can be selected in accordance with the structure formed in the present invention.
  • the embodiment of the present disclosure further provides a touch screen.
  • the touch screen includes: a base substrate 01; a first touch detection electrode 03 disposed on the base substrate; a first metal trace layer electrically connected to at least the first touch detection electrode of the frame region 011 of the substrate substrate 01 on the film layer of the touch detection electrode 03 (the side away from the substrate 01) a first insulating layer 05 disposed on the first metal wiring layer 04; a second touch detecting electrode 06 disposed on the first insulating layer 05; and a film layer disposed on the first touch detecting electrode
  • the second metal wiring layer 07 is electrically connected to at least the second touch detecting electrode 06 at the frame region 011 (on the side away from the substrate 01).
  • the patterns of the first metal wiring layer and the second metal wiring layer are the same.
  • the patterns of the first metal wiring layer and the second metal wiring layer are the same, so that in the preparation When a metal trace layer and a second metal trace layer are formed, the same mask can be used, thereby saving the number of masks for making the touch screen and saving cost.
  • the first metal trace layer includes a first metal line 031 connected to the first touch detection electrode 03 .
  • the second metal wiring layer includes a second metal line 071 connected to the second touch detecting electrode 06 (the dotted line frame in FIG. 4 only represents a region for forming the second touch detecting electrode).
  • the first metal line is used to connect the printed circuit board and the first touch detection electrode
  • the second metal line is used to connect the printed circuit board and the second touch detection electrode.
  • the first metal wiring layer includes a first metal line 031 and a first connection line 032 disposed in the same layer as the first metal line 031 (and Two metal wires 071 are the same shape). Since the first connection line is identical to the second metal line, the first connection line is located on a side of the second metal line adjacent to the substrate.
  • the second metal wiring layer includes a second metal line 071 and a second connection line 072 disposed in the same layer as the first metal line 071 (and A metal wire 031 is the same shape). Since the second connection line is identical to the first metal line, the first metal line is located on a side of the second connection line adjacent to the substrate.
  • the first touch detection electrode is a touch drive electrode
  • the second touch detection electrode is a touch sensing electrode
  • the first touch detection electrode is a touch sensing electrode
  • the second touch detection electrode is a touch driving electrode. electrode.
  • the touch screen further includes: a black matrix 02 disposed in a frame area between the base substrate 01 and the first touch detection electrode 03 .
  • the black matrix is used to block the first metal trace layer and the second metal trace layer of the frame region. Since the black matrix is located below the first touch detection electrode of the frame region in the embodiment of the present disclosure, the black matrix and the black matrix are The overlapping portion of the first touch detection electrode forms a closed loop, so that the static electricity on the first touch detection electrode above the black matrix is released to the GND trace through the closed loop of the black matrix, and then passes through the printed circuit board.
  • the upper GND pin is connected to the GND line to discharge static electricity. Therefore, the black matrix in the touch screen is further prevented from being electrostatically broken, and the conductive area or the short circuit is prevented from being formed in the touch area.
  • the touch screen further includes: a second insulating layer 08 disposed on the second metal trace layer 07 .
  • the materials of the first insulating layer and the second insulating layer are both silicon oxynitride or silicon dioxide.
  • the second insulating layer made of silicon oxynitride or silicon dioxide can be used as a protective layer of the touch screen, thereby further avoiding bridge point shadowing and improving the pattern of the touch screen. Shadow effect.
  • an embodiment of the present disclosure further provides an external touch display device.
  • the array substrate 1 and the opposite substrate 2 disposed on the opposite side of the array substrate 1 and the opposite substrate 1 are disposed away from the array substrate 1 .
  • the base substrate 01 of the touch screen 3 is the opposite substrate 2 .
  • the external touch display device further includes a polarizer 4 above the touch screen 3, an optical clear resin (OCR) 5 located above the polarizer, and a cover 6 above the OCR.
  • OCR optical clear resin
  • the base substrate 01 of the touch screen 3 is a cover of the external touch display device.
  • the external touch display device further includes: a polarizer 4 located between the touch screen and the opposite substrate, and an OCR 5 located between the polarizer 4 and the touch screen 3.
  • the embodiment of the present disclosure provides a touch screen, a method for fabricating the same, and an external touch display device.
  • the method for manufacturing the touch screen includes: forming a pattern of the first touch detection electrode on the substrate; Forming a frame region of the base substrate to form a pattern of at least a first metal trace layer electrically connected to the first touch detection electrode; forming a first insulation over the substrate substrate having the first metal trace layer a pattern of the layer; a pattern of the second touch detection electrode is formed above the first insulation layer; and a second portion electrically connected to the second touch detection electrode is formed in the frame region of the substrate substrate The pattern of the metal trace layer.
  • the first touch detection electrode and the second touch detection electrode of the different layer structure are formed on the base substrate, and the frame area of the base substrate is Forming a first metal wiring layer connected to the first touch detecting electrode and a second metal wiring layer connected to the second touch detecting electrode, so that the metal wiring layer is only located in the frame area, and the first in the touch area
  • the touch detection electrode and the second touch electrode are insulated from each other by the first insulating layer, and the first touch detection electrode or the second touch detection electrode is connected without designing a bridge, thereby avoiding the bridge point elimination.
  • the touch screen provided by the embodiment of the present disclosure does not need to be made of ITO material in the metal wiring area of the frame area, and the touch area does not need to design the OC insulating layer, thereby reducing the design cost. Therefore, the touch screen provided by the embodiment of the present disclosure solves the problem of bridge point elimination under the premise of reducing the cost, thereby improving the competitiveness of the product.

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Abstract

一种触控屏及其制作方法、外挂式触摸显示装置，用以在降低成本的前提下，解决桥点消影的问题，从而提高产品的竞争力。该触控屏的制作方法包括：在衬底基板(01)上形成第一触控检测电极(03)的图形；在衬底基板(01)的边框区域形成至少与第一触控检测电极(03)电性相连的第一金属走线层(04)的图形；在第一金属走线层(04)远离衬底基板(01)的一侧形成第一绝缘层(05)的图形；在第一绝缘层(05)远离衬底基板(01)的一侧形成第二触控检测电极(06)的图形；以及在衬底基板(01)的边框区域形成至少与第二触控过检测电极(06)电性相连的第二金属走线层(07)的图形。

Description

一种触控屏及其制作方法、外挂式触摸显示装置
本申请要求于2016年08月04日递交的中国专利申请第201610631632.7号的优先权，在此全文引用上述中国专利申请公开的内容以作为本申请的一部分。
技术领域
本公开实施例涉及一种触控屏及其制作方法、外挂式触摸显示装置。
背景技术
自触摸技术兴起以来，其普及度越来越高，依照感应方式的不同，触摸技术大致可以分为电阻式、电容式、红外线式、声波式四类。其中电阻式与电容式目前的市场用量最大，其他技术短期内恐很难赶上。随着人们对触摸的体验认可，电容式触摸技术正逐渐取代电阻触摸技术。电容式触摸技术可以分为互容式触摸技术和自容式触摸技术，由于互容式触摸技术可以实现多点触控，因此互容式触摸技术成为市场上的主流和未来发展的趋势。
通常，互容式触摸显示装置可以分为外挂式触摸显示装置和内嵌式触摸显示装置。其中，外挂式触摸显示装置主要可以分为G+G、GFF、单片式触控面板(One Glass Solution，OGS)和On cell等类型，其中On cell结构的触摸显示装置是指将触摸屏嵌入到显示装置的彩色滤光片基板和偏光片之间，即在液晶面板上设置触控屏。
发明内容
本公开至少一个实施例提供一种触控屏的制作方法，其包括：在衬底基板上形成第一触控检测电极的图形；在所述衬底基板的边框区域形成至少与所述第一触控检测电极电性相连的第一金属走线层的图形；在所述第一金属走线层远离所述衬底基板的一侧形成第一绝缘层；在所述第一绝缘层远离所述衬底基板的一侧形成第二触控检测电极的图形；以及在所述衬底基板的边框区域形成至少与所述第二触控过检测电极电性相连的第二金属走线层的图形。
例如，在本公开一实施例提供的制作方法中，采用同一掩膜版形成所述第一金属走线层的图形和所述第二金属走线层的图形。
例如，在本公开一实施例提供的制作方法中，采用同一掩膜版形成所述第一金属走线层的图形和所述第二金属走线层的图形包括：采用同一掩膜板形成与所述第一触控检测电极连接的第一金属线和与所述第二触控检测电极连接的第二金属线。
例如，在本公开一实施例提供的制作方法中，形成第二金属走线层的图形之后，还包括：采用蒸镀工艺在所述第二金属走线层远离所述衬底基板的一侧形成第二绝缘层。
例如，在本公开一实施例提供的制作方法中，在所述衬底基板上形成所述第一触控检测电极的图形之前，还包括：在所述衬底基板的边框区域形成黑矩阵的图形。
例如，在本公开一实施例提供的制作方法中，所述第一金属走线层包括所述第一金属线和与所述第一金属线同层设置的第一连接线，所述第一连接线与所述第二金属线同形。
例如，在本公开一实施例提供的制作方法中，所述第二金属走线层包括所述第二金属线和与所述第二金属线同层设置的第二连接线，所述第二连接线与所述第一金属线同形。
例如，在本公开一实施例提供的制作方法中，所述第一触控检测电极为触控驱动电极，所述第二触控检测电极为触控感应电极，或者，所述第一触控检测电极为触控感应电极，所述第二触控检测电极为触控驱动电极。
本公开至少一个实施例提供一种触控屏，其包括：衬底基板；设置在所述衬底基板上的第一触控检测电极；设置在所述第一触控检测电极所在膜层远离所述衬底基板的一侧且位于所述衬底基板的边框区域的至少与所述第一触控检测电极电性相连的第一金属走线层；设置在所述第一金属走线层远离所述衬底基板的一侧的第一绝缘层；设置在所述第一绝缘层远离所述衬底基板的一侧的第二触控检测电极；以及设置在所述第二触控检测电极所在膜层远离所述衬底基板的一侧且位于所述衬底基板的边框区域的至少与所述第二触控检测电极电性相连的第二金属走线层。
例如，在本公开一实施例提供的触控屏中，所述第一金属走线层和第二金属走线层的图形相同。
例如，在本公开一实施例提供的触控屏中，所述第一金属走线层包括与所述第一触控检测电极连接的第一金属线，所述第二金属走线层包括与所述第二 触控检测电极连接的第二金属线。
例如，在本公开一实施例提供的触控屏中，所述第一金属走线层包括所述第一金属线和与所述第一金属线同层设置的第一连接线，所述第一连接线与所述第二金属线同形。
例如，在本公开一实施例提供的触控屏中，所述第二金属走线层包括所述第二金属线和与所述第二金属线同层设置的第二连接线，所述第二连接线与所述第一金属线同形。
例如，在本公开一实施例提供的触控屏中，所述第一触控检测电极为触控驱动电极，所述第二触控检测电极为触控感应电极，或者，所述第一触控检测电极为触控感应电极，所述第二触控检测电极为触控驱动电极。
例如，本公开一实施例提供的触控屏还包括：设置在所述衬底基板和所述第一触控检测电极之间的且位于所述边框区域的黑矩阵。
例如，本公开一实施例提供的触控屏还包括：设置在所述第二金属走线层远离所述衬底基板的一侧的第二绝缘层。
本公开至少一个实施例还提供一种外挂式触摸显示装置，其包括：阵列基板；对向基板，与所述阵列基板对盒设；以及触控屏，位于所述对向基板远离所述阵列基板一侧，所述触控屏包括根据上述任一项所述的触控屏。
本公开实施例提供的触控屏及其制作方法、外挂式触摸显示装置通过在衬底基板上形成异层结构的第一触控检测电极和第二触控检测电极，且在衬底基板的边框区域形成与第一触控检测电极连接的第一金属走线层和与第二触控检测电极连接的第二金属走线层，使得金属走线层仅位于衬底基板的边框区域，并且使得触控区域中的第一触控检测电极和第二触控电极之间通过第一绝缘层相互绝缘，无需设计桥接来实现第一触控检测电极或第二触控检测电极的相连，从而避免了解决了桥点消影的问题。
附图说明
图1为本公开实施例提供的一种触控屏的制作方法的流程示意图；
图2(a)-图2(h)为本公开实施例提供的一种触控屏的制作方法在每个步骤执行后的结构示意图；
图3为本公开实施例提供的一种触控屏的结构示意图；
图4为本公开实施例提供的一种金属走线层的结构示意图；
图5为本公开实施例提供的第二种触控屏的结构示意图；
图6为本公开实施例提供的第三种触控屏的结构示意图；
图7为本公开实施例提供的一种外挂式触摸显示装置的结构示意图；
图8为本公开实施例提供的第二种外挂式触摸显示装置的结构示意图；
图9为本公开实施例提供的第三种外挂式触摸显示装置的结构示意图。
实施方式
为使本公开实施例的目的、技术方案和优点更加清楚，下面将结合本公开实施例的附图，对本公开实施例的技术方案进行清楚、完整地描述。显然，所描述的实施例是本公开的一部分实施例，而不是全部的实施例。基于所描述的本公开的实施例，本领域普通技术人员在无需创造性劳动的前提下所获得的所有其他实施例，都属于本公开保护的范围。
除非另外定义，本公开使用的技术术语或者科学术语应当为本公开所属领域内具有一般技能的人士所理解的通常意义。本公开中使用的“第一”、“第二”以及类似的词语并不表示任何顺序、数量或者重要性，而只是用来区分不同的组成部分。“包括”或者“包含”等类似的词语意指出现该词前面的元件或者物件涵盖出现在该词后面列举的元件或者物件及其等同，而不排除其他元件或者物件。“连接”或者“相连”等类似的词语并非限定于物理的或者机械的连接，而是可以包括电性的连接，不管是直接的还是间接的。
在通常的触摸显示装置领域中，无论是On cell还是OGS都面临着高开发成本，工艺流程复杂程度高，Mask数量多，桥点可视性差等问题。为了有效降低触控模块成本，同时满足多点触控性能，近两年触控业者积极着手研发减少光罩数，降低工艺流程复杂程度的技术，并布局发展OGS、On cell或GF薄膜技术。
目前，已有部分触控厂家着手生产单层图案在玻璃上(single layer on cell，SLOC)的产品，SLOC产品因其制作工艺简单，制作成本低廉而备受关注。然而，在SLOC产品的大规模生产使用过程中，因其触控区域及走线区域均使用铟锡氧化物(Indium Tin Oxides，ITO)材料制作，由于ITO方阻较高，通道阻抗过大，SLOC产品无法实现大尺寸多点触控。另外，一些触控厂家又通过将透明光学胶材料作为绝缘层并在透明光学胶材料中设计过孔，从而减少光罩数，并通过使用ITO桥代替金属桥解决消影问题，使通常的6掩膜版(Mask) 变为5Mask。然而，这些设计并不能从根本上大幅度的减少研发费用、降低生产成本，提升产品综合竞争力，解决桥点可视性问题。
本公开提供一种触控屏及其制作方法、外挂式触摸显示装置。该触控屏的制作方法通过在衬底基板上形成异层结构的第一触控检测电极和第二触控检测电极，且在衬底基板的边框区域形成与第一触控检测电极连接的第一金属走线层和与第二触控检测电极连接的第二金属走线层，使得金属走线层仅位于衬底基板的边框区域，并且使得触控区域中的第一触控检测电极和第二触控电极之间通过第一绝缘层相互绝缘，无需设计桥接来实现第一触控检测电极或第二触控检测电极的相连，从而避免了解决了桥点消影的问题。另外且本公开实施例提供的触控屏，在边框区域的金属走线区无需采用ITO材料进行制作，且触控区域也无需设计透明光学胶(OC)绝缘层，从而降低了设计的成本。因此，本公开实施例提供的触控屏，在降低成本的前提下，解决桥点消影的问题，从而提高产品的竞争力。
下面结合附图，对本公开实施例提供的触控屏及其制作方法、外挂式触摸显示装置的实施方式进行详细地说明。
附图中各膜层的厚度和形状不反映真实比例，目的只是示意说明本发明内容。
参见图1，本公开至少一个实施例提供一种触控屏的制作方法，该方法包括以下步骤S101-S105：
S101：在衬底基板上形成第一触控检测电极的图形。
S102：在衬底基板的边框区域形成至少与第一触控检测电极电性相连的第一金属走线层的图形。
S103：在第一金属走线层远离衬底基板的一侧形成第一绝缘层。需要说明的是，第一绝缘层同时形成在衬底基板的触控区和边框区域。另外，上述的衬地基板的上方是指远离第一金属走线层的一侧。
S104：在第一绝缘层的上方形成第二触控检测电极的图形。需要说明的是，上述的第一绝缘层的上方是指远离衬底基板的一侧。
S105：在衬底基板的边框区域形成至少与第二触控过检测电极电性相连的第二金属走线层的图形。
需要说明的是，第一触控检测电极可以作为触控驱动电极，第二触控检测电极作为触控感应电极；或者，第一触控检测电极作为触控感应电极，第二触 控检测电极作为触控驱动电极，本发明实施例在此不作限制。
本公开实施例提供的触控屏的制作方法包括：在衬底基板上形成第一触控检测电极的图形；在衬底基板的边框区域形成至少与第一触控检测电极电性相连的第一金属走线层的图形；在具有第一金属走线层的衬底基板上方形成第一绝缘层的图形；在第一绝缘层的上方形成第二触控检测电极的图形；在衬底基板的边框区域形成至少与第二触控过检测电极电性相连的第二金属走线层的图形。因此，本公开实施例提供的上述触控屏的制作方法通过在衬底基板上形成异层结构的第一触控检测电极和第二触控检测电极，且在衬底基板的边框区域形成与第一触控检测电极连接的第一金属走线层和与第二触控检测电极连接的第二金属走线层，使得金属走线层仅位于边框区域，且触控区域中的第一触控检测电极和第二触控电极之间通过第一绝缘层相互绝缘，无需设计桥接实现第一触控检测电极或第二触控检测电极的相连，从而避免了解决了桥点消影的问题，且本公开实施例提供的触控屏，在边框区域的金属走线区无需采用ITO材料进行制作，且触控区域也无需设计OC绝缘层，从而降低了设计的成本。因此，本公开实施例提供的触控屏，在降低成本的前提下，解决桥点消影的问题，从而提高产品的竞争力。
例如，第一触控检测电极的图形可包括多个沿第一方向延伸，沿第二方向绝缘设置的多个第一触控检测电极；各第一触控检测电极包括沿第一方向排布的多个菱形电极块，或者其他任何形状的电极块。
例如，第二触控检测电极的图形可包括多个沿第二方向延伸，沿第一方向绝缘设置的多个第二触控检测电极；各第二触控检测电极包括沿第二方向排布的多个菱形电极块，或者其他任何形状的电极块。
例如，触控屏包括触控区域和边框区域，即衬底基板也包括触控区域和边框区域。本公开实施例提供的触控屏的触控区域不包括金属走线层，仅有边框区域形成金属走线层，从而避免了金属消影的问题。
例如，在本公开实施例提供的上述触控屏的制作方法中，为了进一步减少触控屏的制作成本，减少光罩次数，本公开实施例中，采用同一掩膜版形成第一金属走线层的图形和第二金属走线层的图形。因此，本公开实施例提供的触控屏的制作方法中，可以实现第一金属走线层和第二金属走线层分布制作，同时导通的作用，实现大尺寸多点触控，触控效果好的目的。
例如，在形成第一金属走线层和第二金属走线层时采用同一掩膜版，使得 形成第一金属走线层和第二金属走线层仅需要一个Mask。本公开实施例提供的触控屏的制作方法可以采用3个Mask制作，第一个掩膜版用于在衬底基板上形成第一触控检测电极的图形，第二个掩膜版用于在边框区域形成第一金属走线层的图形和第二金属走线层的图形，第三个掩膜版用于在第一绝缘层上方形成第二触控检测电极的图形。因此，本公开实施例提供的触控屏的制作方法，通过在形成第一金属走线层和第二金属走线层时采用同一掩膜版，使得在形成触控屏时，可以采用4道制程，3个掩膜版形成。
例如，本公开实施例提供的上述触控屏的制作方法中，采用同一掩膜版形成第一金属走线层和第二金属走线层的图形，包括：采用同一掩膜板形成与第一触控检测电极连接的第一金属线，和与第二触控检测电极连接的第二金属线的图形。
例如，在采用同一掩膜版形成第一金属走线层和第二金属走线层时，在形成于第一触控检测电极相连的第一金属走线层时，该掩膜版中包括用于形成第二金属走线层的图形，因此，同时形成用于与第二触控检测电极相连的第二金属走线层。例如，第一金属走线层包括与第一触控检测电极连接的第一金属线和与第一金属线同层设置的第一连接线，该第一连接线的图形与第二金属线的图形相同。例如，可以在第一绝缘层中设置过孔使得第一连接线与第二触控检测电极电性相连，或者不设置过孔，使得第一连接线与第二触控检测电极相绝缘。同理，第二金属走线层包括与第二触控检测电极连接的第二金属线和与第二金属线同层设置的第二连接线，该第二连接线的图形与第一金属线的图形相同。例如，可以在第一绝缘层中设置过孔使得第二连接线与第一触控检测电极电性相连，或者不设置过孔，使得第二连接线与第一触控检测电极相绝缘。
例如，本公开实施例提供的上述触控屏的制作方法中，形成第二金属走线层的图形之后，该方法还包括：采用蒸镀工艺在具有第二金属走线层的衬底基板上方形成第二绝缘层。其中，第二绝缘层可以作为触控屏的保护层，提高了触控屏的图案的消影效果。
例如，本公开实施例提供的上述触控屏的制作方法中，绝缘层的材料为氮氧化硅或二氧化硅。其中，本公开实施例中的绝缘层包括第一绝缘层和第二绝缘层，因此，第一绝缘层和第二绝缘层的材料可以均为氮氧化硅或二氧化硅中的任一种或两种的组合；或者，第一绝缘层或第二绝缘层的材料氮氧化硅或二氧化硅中的任一种或两种的组合，在此不作限定。其中，将氮氧化硅或二氧化 硅制作的第二绝缘层可以作为触控屏的保护层，从而进一步避免桥点消影，提高了触控屏的图案的消影效果。
例如，本公开实施例提供的上述触控屏的制作方法中，在衬底基板上形成第一触控检测电极的图形之前，该方法还包括：在衬底基板的边框区域形成黑矩阵的图形。形成黑矩阵的图形用于遮挡边框区域的第一金属走线层和第二金属走线层。
另外，由于本公开实施例中黑矩阵位于边框区域的第一触控检测电极的下方，因此，黑矩阵与第一触控检测电极搭接的部分形成了闭合回路，从而将黑矩阵上方的第一触控过检测电极上的静电通过该黑矩阵的闭合回路释放到GND走线上，然后通过印刷电路板上的GND pin引脚与GND线相连，将静电进行释放。因此，进一步避免了触控屏中黑矩阵被静电击穿，防止触控区域形成导电通道或短路现象。
本公开一实施例提供一种触控屏的制作方法，该方法包括以下步骤：
步骤1：在衬底基板01的边框区域形成黑矩阵02的图形，如图2(a)所示。例如，可通过在衬底基板基板上经过涂覆、曝光、显影的构图工艺形成黑矩阵的图形；需要说明的是，形成黑矩阵的图形为可选步骤，可以直接执行步骤2。
步骤2：如图2(b)所示，在衬底基板01的边框区域和触控区域形成第一触控检测电极03的图形。为了进一步说明第一触控检测电极的结构，参见图2(c)所示，第一触控检测电极03的图形可包括多个沿第一方向延伸，沿第二方向绝缘设置的多个第一触控检测电极03；各第一触控检测电极03包括沿第一方向排布的多个菱形电极块030，或者其他任何形状的电极块。例如，可通过在衬底基板上进行镀膜一层ITO膜层、涂覆光刻胶、对光刻胶进行曝光、显影，最后对ITO膜层进行刻蚀，形成第一触控检测电极的图形。需要说明的是，第一触控检测电极的图形不仅包括图2(c)所示的结构，可以为其他形状的结构，本公开实施例在此不作限定。
步骤3：采用掩膜版在衬底基板01的边框区域形成与第一触控检测电极电性相连的第一金属走线层04的图形，如图2(d)所示。例如，可通过在衬底基板的边框区域进行金属镀膜、涂覆光刻胶、对光刻胶进行曝光、显影，然后对金属镀膜进行刻蚀，形成第一金属走线层的图形。
步骤4：在第一金属走线层上方形成第一绝缘层05的图形，如图2(e) 所示。例如，形成第一绝缘层的图形时可以通过蒸镀的方式，且第一绝缘层的图形为整层结构。
步骤5：在第一绝缘层05的上方形成第二触控检测电极06的图形，如图2(f)所示。第一绝缘层位于第一金属走线层与第二触控检测电极之间，且位于第一触控检测电极和第二触控检测电极之间。第二触控检测电极的形状与图2(c)中的第一触控检测电极的形状相同，且每一第二触控检测电极在衬底基板上的投影与第一触控检测电极在衬底基板上的投影不重叠。
步骤6：采用同一掩膜版在第二触控检测电极06的上方形成第二金属走线层07的图形，如图2(g)所示。第二金属走线层与第一金属走线层采用的掩膜版相同，包括在衬底基板的边框区域的第二触控检测电极上方进行金属镀膜、涂覆光刻胶、对光刻胶进行曝光、显影，然后对金属镀膜进行刻蚀，形成第二金属走线层的图形。
步骤7：在第二金属走线层07的上方形成第二绝缘层08，如图2(h)所示。第二绝缘层位于边框区域和触控区域，第二绝缘层的图形可以通过蒸镀的方式形成。例如，第一绝缘层和第二绝缘层的材料为SiNxOy或SiO2。
例如，第一触控检测电极和第二触控检测电极的材料为氧化铟锡。
例如，通过上述步骤1至7形成触控屏，步骤1至7中均需要采用构图工艺进行构图。构图工艺可只包括光刻工艺，或，可以包括光刻工艺以及刻蚀步骤，同时还可以包括打印、喷墨等其他用于形成预定图形的工艺；光刻工艺是指包括成膜、曝光、显影等工艺过程的利用光刻胶、掩模板、曝光机等形成图形的工艺。例如，可根据本发明中所形成的结构选择相应的构图工艺。
基于同一发明思想，本公开实施例还提供了一种触控屏，参见图3，触控屏包括：衬底基板01；设置在衬底基板上的第一触控检测电极03；设置在第一触控检测电极03所在膜层之上(远离衬底基板01的一侧)且位于衬底基板01的边框区域011的至少与第一触控检测电极电性相连的第一金属走线层04；设置在第一金属走线层04之上的第一绝缘层05；设置在第一绝缘层05之上的第二触控检测电极06；以及设置在第一触控检测电极所在膜层之上(远离衬底基板01的一侧)且位于边框区域011的至少与第二触控检测电极06电性相连的第二金属走线层07。
例如，在本公开实施例提供的触控屏中，第一金属走线层和第二金属走线层的图形相同。第一金属走线层和第二金属走线层的图形相同，使得在制备第 一金属走线层和第二金属走线层时，可以采用同一掩膜版形成，从而节省了制作触控屏的掩膜版次数，节省了成本。
例如，在本公开实施例提供的上述触控屏中，参见图4，第一金属走线层包括：与第一触控检测电极03连接的第一金属线031。第二金属走线层包括与第二触控检测电极06(图4中虚线框仅代表用于形成第二触控检测电极的区域)连接的第二金属线071。其中，第一金属线用于连接印刷电路板和第一触控检测电极，第二金属线用于连接印刷电路板和第二触控检测电极。
例如，在本公开实施例提供的上述触控屏中，参见图4，第一金属走线层包括第一金属线031和与第一金属线031同层设置的第一连接线032(与第二金属线071同形)。由于第一连接线与第二金属线同形，因此第一连接线位于第二金属线靠近衬底基板的一侧。
例如，在本公开实施例提供的上述触控屏中，参见图4，第二金属走线层包括第二金属线071和与第为金属线071同层设置的第二连接线072(与第一金属线031同形)。由于第二连接线与第一金属线同形，因此第一金属线位于第二连接线靠近衬底基板的一侧。
例如，第一触控检测电极为触控驱动电极，第二触控检测电极为触控感应电极，或者，第一触控检测电极为触控感应电极，第二触控检测电极为触控驱动电极。
例如，本公开实施例提供的上述触控屏中，参见图5，触控屏还包括：设置在衬底基板01和第一触控检测电极03之间的边框区域的黑矩阵02。其中，黑矩阵用于遮挡边框区域的第一金属走线层和第二金属走线层，由于本公开实施例中黑矩阵位于边框区域的第一触控检测电极的下方，因此，黑矩阵与第一触控检测电极搭接的部分形成了闭合回路，从而将黑矩阵上方的第一触控过检测电极上的静电通过该黑矩阵的闭合回路释放到GND走线上，然后通过印刷电路板上的GND pin引脚与GND线相连，将静电进行释放。因此，进一步避免了触控屏中黑矩阵被静电击穿，防止触控区域形成导电通道或短路现象。
例如，本公开实施例提供的上述触控屏中，参见图6，触控屏还包括：设置在第二金属走线层07之上的第二绝缘层08。
例如，本公开实施例提供的触控屏中，第一绝缘层和第二绝缘层的材料均为氮氧化硅或二氧化硅。其中，将氮氧化硅或二氧化硅制作的第二绝缘层可以作为触控屏的保护层，从而进一步避免桥点消影，且提高了触控屏的图案的消 影效果。
基于同一发明思想，本公开实施例还提供了一种外挂式触摸显示装置，参见图7，包括对盒设置的阵列基板1和对向基板2，以及位于对向基板1远离阵列基板1一侧的，本公开实施例提供的任一种触控屏3。
例如，本公开实施例提供的上述外挂式触摸显示装置中，针对on cell结构的外挂式触摸显示装置，参见图8，触控屏3的衬底基板01为对向基板2。较佳地，外挂式触摸显示装置还包括位于触控屏3上方的偏光片4，位于偏光片上方的光学透明树脂层(optical clear resin，OCR)5，以及位于OCR上方的盖板6。
例如，本公开实施例提供的上述外挂式触摸显示装置中，针对OGS结构的外挂式触摸显示装置，参见图9，触控屏3的衬底基板01为外挂式触摸显示装置的盖板。较佳地，外挂式触摸显示装置还包括：位于触控屏和对向基板之间的偏光片4，以及位于偏光片4和触控屏3之间的OCR5。
本公开实施例提供了一种触控屏及其制作方法、外挂式触摸显示装置，所述触控屏的制作方法，包括：在衬底基板上形成第一触控检测电极的图形；在所述衬底基板的边框区域形成至少与所述第一触控检测电极电性相连的第一金属走线层的图形；在具有所述第一金属走线层的衬底基板上方形成第一绝缘层的图形；在所述第一绝缘层的上方形成第二触控检测电极的图形；在所述衬底基板的边框区域形成至少与所述第二触控过检测电极电性相连的第二金属走线层的图形。因此，本公开实施例提供的上述触控屏的制作方法中，通过在衬底基板上形成异层结构的第一触控检测电极和第二触控检测电极，且在衬底基板的边框区域形成与第一触控检测电极连接的第一金属走线层和与第二触控检测电极连接的第二金属走线层，使得金属走线层仅位于边框区域，且触控区域中的第一触控检测电极和第二触控电极之间通过第一绝缘层相互绝缘，无需设计桥接实现第一触控检测电极或第二触控检测电极的相连，从而避免了解决了桥点消影的问题，且本公开实施例提供的触控屏，在边框区域的金属走线区无需采用ITO材料进行制作，且触控区域也无需设计OC绝缘层，从而降低了设计的成本。因此，本公开实施例提供的触控屏，在降低成本的前提下，解决桥点消影的问题，从而提高产品的竞争力。
显然，本领域的技术人员可以对本发明进行各种改动和变型而不脱离本发明的精神和范围。这样，倘若本发明的这些修改和变型属于本发明权利要求及 其等同技术的范围之内，则本发明也意图包含这些改动和变型在内。

Claims (17)

  1. 一种触控屏的制作方法，包括：
    在衬底基板上形成第一触控检测电极的图形；
    在所述衬底基板的边框区域形成至少与所述第一触控检测电极电性相连的第一金属走线层的图形；
    在所述第一金属走线层的远离所述衬底基板的一侧形成第一绝缘层；
    在所述第一绝缘层远离所述衬底基板的一侧形成第二触控检测电极的图形；以及
    在所述衬底基板的边框区域形成至少与所述第二触控过检测电极电性相连的第二金属走线层的图形。
  2. 根据权利要求1所述的制作方法，其中，采用同一掩膜版形成所述第一金属走线层的图形和所述第二金属走线层的图形。
  3. 根据权利要求2所述的制作方法，其中，采用同一掩膜版形成所述第一金属走线层的图形和所述第二金属走线层的图形包括：
    采用同一掩膜板形成与所述第一触控检测电极连接的第一金属线和与所述第二触控检测电极连接的第二金属线。
  4. 根据权利要求3所述的制作方法，其中，形成第二金属走线层的图形之后，还包括：
    采用蒸镀工艺在所述第二金属走线层的远离所述衬底基板的一侧形成第二绝缘层。
  5. 根据权利要求1-4中任一项所述的制作方法，其中，在所述衬底基板上形成所述第一触控检测电极的图形之前，还包括：
    在所述衬底基板的边框区域形成黑矩阵的图形。
  6. 根据权利要求3所述的制作方法，其中，所述第一金属走线层包括所述第一金属线和与所述第一金属线同层设置的第一连接线，所述第一连接线与所述第二金属线同形。
  7. 根据权利要求3所述的制作方法，其中，所述第二金属走线层包括所述第二金属线和与所述第二金属线同层设置的第二连接线，所述第二连接线与所述第一金属线同形。
  8. 根据权利要求1-7中任一项所述的制作方法，其中，所述第一触控检 测电极为触控驱动电极，所述第二触控检测电极为触控感应电极，或者，所述第一触控检测电极为触控感应电极，所述第二触控检测电极为触控驱动电极。
  9. 一种触控屏，包括：
    衬底基板；
    设置在所述衬底基板上的第一触控检测电极；
    设置在所述第一触控检测电极所在膜层远离所述衬底基板的一侧且位于所述衬底基板的边框区域的至少与所述第一触控检测电极电性相连的第一金属走线层；
    设置在所述第一金属走线层远离所述衬底基板的一侧的第一绝缘层；
    设置在所述第一绝缘层远离所述衬底基板的一侧的第二触控检测电极；以及
    设置在所述第二触控检测电极所在膜层远离所述衬底基板的一侧且位于所述衬底基板的边框区域的至少与所述第二触控检测电极电性相连的第二金属走线层。
  10. 根据权利要求6所述的触控屏，其中，所述第一金属走线层和第二金属走线层的图形相同。
  11. 根据权利要求10所述的触控屏，其中，所述第一金属走线层包括与所述第一触控检测电极连接的第一金属线，所述第二金属走线层包括与所述第二触控检测电极连接的第二金属线。
  12. 根据权利要求11所述的方法，其中，所述第一金属走线层包括所述第一金属线和与所述第一金属线同层设置的第一连接线，所述第一连接线与所述第二金属线同形。
  13. 根据权利要求11所述的方法，其中，所述第二金属走线层包括所述第二金属线和与所述第二金属线同层设置的第二连接线，所述第二连接线与所述第一金属线同形。
  14. 根据权利要求9-13中任一项所述的方法，其中，所述第一触控检测电极为触控驱动电极，所述第二触控检测电极为触控感应电极，或者，所述第一触控检测电极为触控感应电极，所述第二触控检测电极为触控驱动电极。
  15. 根据权利要求9-13中任一项所述的触控屏，还包括：
    设置在所述衬底基板和所述第一触控检测电极之间的且位于所述边框区域的黑矩阵。
  16. 根据权利要求9-13中任一项所述的触控屏，还包括：
    设置在所述第二金属走线层远离所述衬底基板的一侧的第二绝缘层。
  17. 一种外挂式触摸显示装置，包括：
    阵列基板；
    对向基板，与所述阵列基板对盒设；以及
    触控屏，位于所述对向基板远离所述阵列基板一侧,
    其中，所述触控屏包括根据权利要求9-16中任一项所述的触控屏。
PCT/CN2017/094262 2016-08-04 2017-07-25 一种触控屏及其制作方法、外挂式触摸显示装置 Ceased WO2018024133A1 (zh)

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KR102937329B1 (ko) * 2020-07-10 2026-03-11 삼성디스플레이 주식회사 디지타이저 및 표시 장치
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