WO2018016418A1 - 半導体製造装置用部品 - Google Patents
半導体製造装置用部品 Download PDFInfo
- Publication number
- WO2018016418A1 WO2018016418A1 PCT/JP2017/025609 JP2017025609W WO2018016418A1 WO 2018016418 A1 WO2018016418 A1 WO 2018016418A1 JP 2017025609 W JP2017025609 W JP 2017025609W WO 2018016418 A1 WO2018016418 A1 WO 2018016418A1
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- Prior art keywords
- rare earth
- ceramic member
- susceptor
- bonding layer
- bonding
- Prior art date
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- 238000004519 manufacturing process Methods 0.000 title claims abstract description 34
- 239000004065 semiconductor Substances 0.000 title claims abstract description 23
- 239000000919 ceramic Substances 0.000 claims abstract description 52
- 229910052761 rare earth metal Inorganic materials 0.000 claims abstract description 52
- 239000000463 material Substances 0.000 claims abstract description 24
- 150000002910 rare earth metals Chemical class 0.000 claims abstract description 20
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims abstract description 12
- 229910052760 oxygen Inorganic materials 0.000 claims abstract description 12
- 239000001301 oxygen Substances 0.000 claims abstract description 12
- 239000000126 substance Substances 0.000 claims abstract description 12
- 229910052693 Europium Inorganic materials 0.000 claims description 4
- 229910052688 Gadolinium Inorganic materials 0.000 claims description 4
- 229910052779 Neodymium Inorganic materials 0.000 claims description 4
- 229910052771 Terbium Inorganic materials 0.000 claims description 4
- 229910052727 yttrium Inorganic materials 0.000 claims description 4
- 238000005304 joining Methods 0.000 abstract description 12
- -1 rare earth hydroxide Chemical class 0.000 abstract description 12
- 230000007423 decrease Effects 0.000 abstract description 5
- 238000012360 testing method Methods 0.000 description 19
- 230000000052 comparative effect Effects 0.000 description 15
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 15
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 14
- 238000002441 X-ray diffraction Methods 0.000 description 11
- 238000005259 measurement Methods 0.000 description 11
- 238000011156 evaluation Methods 0.000 description 10
- 238000010438 heat treatment Methods 0.000 description 10
- 238000007689 inspection Methods 0.000 description 10
- 239000000843 powder Substances 0.000 description 9
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 7
- 239000007767 bonding agent Substances 0.000 description 7
- 238000005516 engineering process Methods 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 238000012986 modification Methods 0.000 description 4
- 230000004048 modification Effects 0.000 description 4
- 239000004020 conductor Substances 0.000 description 3
- 238000001514 detection method Methods 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 3
- 230000001629 suppression Effects 0.000 description 3
- OAYXUHPQHDHDDZ-UHFFFAOYSA-N 2-(2-butoxyethoxy)ethanol Chemical compound CCCCOCCOCCO OAYXUHPQHDHDDZ-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 229920005822 acrylic binder Polymers 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 238000004506 ultrasonic cleaning Methods 0.000 description 2
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 230000005856 abnormality Effects 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 238000005219 brazing Methods 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000000921 elemental analysis Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 238000001020 plasma etching Methods 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
Images
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6831—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using electrostatic chucks
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- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B37/00—Joining burned ceramic articles with other burned ceramic articles or other articles by heating
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- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B37/00—Joining burned ceramic articles with other burned ceramic articles or other articles by heating
- C04B37/003—Joining burned ceramic articles with other burned ceramic articles or other articles by heating by means of an interlayer consisting of a combination of materials selected from glass, or ceramic material with metals, metal oxides or metal salts
- C04B37/005—Joining burned ceramic articles with other burned ceramic articles or other articles by heating by means of an interlayer consisting of a combination of materials selected from glass, or ceramic material with metals, metal oxides or metal salts consisting of glass or ceramic material
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/48—Manufacture or treatment of parts, e.g. containers, prior to assembly of the devices, using processes not provided for in a single one of the subgroups H01L21/06 - H01L21/326
- H01L21/4803—Insulating or insulated parts, e.g. mountings, containers, diamond heatsinks
- H01L21/4807—Ceramic parts
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67098—Apparatus for thermal treatment
- H01L21/67103—Apparatus for thermal treatment mainly by conduction
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68757—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a coating or a hardness or a material
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B3/00—Ohmic-resistance heating
- H05B3/10—Heating elements characterised by the composition or nature of the materials or by the arrangement of the conductor
- H05B3/12—Heating elements characterised by the composition or nature of the materials or by the arrangement of the conductor characterised by the composition or nature of the conductive material
- H05B3/14—Heating elements characterised by the composition or nature of the materials or by the arrangement of the conductor characterised by the composition or nature of the conductive material the material being non-metallic
- H05B3/141—Conductive ceramics, e.g. metal oxides, metal carbides, barium titanate, ferrites, zirconia, vitrous compounds
- H05B3/143—Conductive ceramics, e.g. metal oxides, metal carbides, barium titanate, ferrites, zirconia, vitrous compounds applied to semiconductors, e.g. wafers heating
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B3/00—Ohmic-resistance heating
- H05B3/20—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater
- H05B3/22—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater non-flexible
- H05B3/28—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater non-flexible heating conductor embedded in insulating material
- H05B3/283—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater non-flexible heating conductor embedded in insulating material the insulating material being an inorganic material, e.g. ceramic
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- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2237/00—Aspects relating to ceramic laminates or to joining of ceramic articles with other articles by heating
- C04B2237/02—Aspects relating to interlayers, e.g. used to join ceramic articles with other articles by heating
- C04B2237/04—Ceramic interlayers
- C04B2237/06—Oxidic interlayers
- C04B2237/066—Oxidic interlayers based on rare earth oxides
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- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2237/00—Aspects relating to ceramic laminates or to joining of ceramic articles with other articles by heating
- C04B2237/30—Composition of layers of ceramic laminates or of ceramic or metallic articles to be joined by heating, e.g. Si substrates
- C04B2237/32—Ceramic
- C04B2237/36—Non-oxidic
- C04B2237/366—Aluminium nitride
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
- H01L21/60—Attaching or detaching leads or other conductive members, to be used for carrying current to or from the device in operation
- H01L2021/60007—Attaching or detaching leads or other conductive members, to be used for carrying current to or from the device in operation involving a soldering or an alloying process
- H01L2021/60022—Attaching or detaching leads or other conductive members, to be used for carrying current to or from the device in operation involving a soldering or an alloying process using bump connectors, e.g. for flip chip mounting
- H01L2021/60097—Applying energy, e.g. for the soldering or alloying process
- H01L2021/6015—Applying energy, e.g. for the soldering or alloying process using conduction, e.g. chuck heater, thermocompression
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/74—Apparatus for manufacturing arrangements for connecting or disconnecting semiconductor or solid-state bodies and for methods related thereto
- H01L2224/75—Apparatus for connecting with bump connectors or layer connectors
- H01L2224/7525—Means for applying energy, e.g. heating means
- H01L2224/75251—Means for applying energy, e.g. heating means in the lower part of the bonding apparatus, e.g. in the apparatus chuck
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/74—Apparatus for manufacturing arrangements for connecting or disconnecting semiconductor or solid-state bodies and for methods related thereto
- H01L2224/75—Apparatus for connecting with bump connectors or layer connectors
- H01L2224/75981—Apparatus chuck
- H01L2224/75985—Material
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/102—Material of the semiconductor or solid state bodies
- H01L2924/1025—Semiconducting materials
- H01L2924/1026—Compound semiconductors
- H01L2924/1032—III-V
- H01L2924/10323—Aluminium nitride [AlN]
Definitions
- the technology disclosed in this specification relates to a component for a semiconductor manufacturing apparatus.
- a susceptor (heating device) is used as a component for semiconductor manufacturing equipment.
- the susceptor includes, for example, a plate-shaped ceramic holding member having a heater therein, a cylindrical ceramic supporting member disposed on one surface side of the holding member, and the holding member and the supporting member. And a bonding layer that bonds the one surface of the holding member and the one surface of the support member that are disposed and face each other.
- a wafer is disposed on the holding surface opposite to the one surface of the holding member. The susceptor heats the wafer disposed on the holding surface using heat generated by applying a voltage to the heater.
- the holding member and the supporting member are formed of a material mainly composed of AlN (aluminum nitride) having a relatively high thermal conductivity, and the bonding layer includes a rare earth element and oxygen.
- a material formed of a material containing a rare earth single oxide having only the above-mentioned is known (for example, see Patent Document 1).
- rare earth hydroxide When the rare earth single oxide reacts with moisture, rare earth hydroxide is produced. This rare earth hydroxide becomes easier to produce as the temperature increases.
- the susceptor may be washed with chemicals or water before use and dried at a high temperature. Then, in the susceptor using the bonding layer containing the rare earth single oxide described above, the rare earth single oxide contained in the bonding layer reacts with moisture to generate a rare earth hydroxide, and the rare earth hydroxide is The powder may dry and become powder and may adhere to the wafer as foreign matter. In addition, the bonding strength between the holding member and the support member may be reduced due to the hollow portion of the bonding layer from which the rare earth hydroxide is removed.
- Such a problem is not limited to the joining of the holding member and the support member constituting the susceptor, but is a common problem for joining ceramic members constituting a holding device such as an electrostatic chuck, for example.
- Such a problem is not limited to the holding device, and is a problem common to bonding of ceramic members constituting components for a semiconductor manufacturing apparatus such as a shower head, for example.
- a component for a semiconductor manufacturing apparatus disclosed in this specification includes a first ceramic member formed of a material containing AlN as a main component and a second ceramic member formed of a material containing AlN as a main component.
- a semiconductor manufacturing apparatus comprising: a member; and a bonding layer that is disposed between the first ceramic member and the second ceramic member and bonds the first ceramic member and the second ceramic member.
- the bonding layer includes a perovskite oxide represented by a chemical formula ABO 3 (where A is a rare earth element and B is Al), and includes only a rare earth element and oxygen. Contains no oxides.
- the bonding layer includes a perovskite oxide represented by the chemical formula ABO 3 (where A is a rare earth element and B is Al (aluminum)), and includes a rare earth element. And rare earth single oxides containing only oxygen and oxygen. Since this perovskite oxide is a stable substance that hardly reacts with moisture as compared with a rare earth single oxide, scattering of the rare earth hydroxide and the bonding strength between the first ceramic member and the second ceramic member. Can be suppressed.
- ABO 3 where A is a rare earth element and B is Al (aluminum)
- a semiconductor manufacturing apparatus component disclosed in the present specification includes a first ceramic member formed of a material containing AlN as a main component and a second ceramic member formed of a material containing AlN as a main component.
- Semiconductor manufacturing comprising: a member; and a plurality of joint portions that are disposed between the first ceramic member and the second ceramic member and join the first ceramic member and the second ceramic member.
- the joint includes a perovskite oxide represented by a chemical formula ABO 3 (where A is a rare earth element and B is Al), and includes only a rare earth element and oxygen. Contains no single oxide.
- the joint includes a perovskite oxide represented by the chemical formula ABO 3 (where A is a rare earth element and B is Al (aluminum)). And rare earth single oxides containing only oxygen and oxygen. Since this perovskite oxide is a stable substance that hardly reacts with moisture as compared with a rare earth single oxide, scattering of the rare earth hydroxide and the bonding strength between the first ceramic member and the second ceramic member. Can be suppressed.
- ABO 3 where A is a rare earth element and B is Al (aluminum)
- the rare earth element included in the perovskite oxide may include at least one of Gd, Nd, Tb, Eu, and Y.
- the use of a bonding layer or a bonding portion containing a perovskite oxide having at least one of Gd, Nd, Tb, Eu, and Y makes it possible to scatter the rare earth hydroxide. A decrease in bonding strength between the ceramic member and the second ceramic member can be suppressed.
- a holding device such as an electrostatic chuck or a vacuum chuck, a heating device such as a susceptor, or a semiconductor manufacturing device such as a shower head. It can be realized in the form of a component.
- FIG. 1 is a perspective view schematically showing an external configuration of a susceptor 100 in the present embodiment
- FIG. 2 is an explanatory diagram schematically showing an XZ cross-sectional configuration of the susceptor 100 in the present embodiment.
- XYZ axes orthogonal to each other for specifying the direction are shown.
- the positive direction of the Z-axis is referred to as the upward direction
- the negative direction of the Z-axis is referred to as the downward direction.
- the susceptor 100 is actually installed in a different direction. Also good.
- the susceptor 100 corresponds to a semiconductor manufacturing apparatus component in the claims.
- the susceptor 100 is an apparatus that holds an object (for example, a wafer W) and heats it to a predetermined processing temperature.
- a thin film forming apparatus for example, a CVD apparatus or a sputtering apparatus
- an etching apparatus that is used in a semiconductor device manufacturing process.
- a plasma etching apparatus for example, a plasma etching apparatus.
- the susceptor 100 includes a holding member 10 and a support member 20 that are arranged in a predetermined arrangement direction (in the present embodiment, the vertical direction (Z-axis direction)).
- the holding member 10 and the supporting member 20 are configured such that the lower surface of the holding member 10 (hereinafter referred to as “holding side bonding surface S2”) and the upper surface of the supporting member 20 (hereinafter referred to as “supporting side bonding surface S3”) It arrange
- the susceptor 100 further includes a bonding layer 30 disposed between the holding-side bonding surface S2 of the holding member 10 and the support-side bonding surface S3 of the support member 20.
- the holding member 10 corresponds to the first ceramic member in the claims
- the support member 20 corresponds to the second ceramic member in the claims.
- the holding member 10 is, for example, a circular flat plate-like member, and is formed of ceramics whose main component is AlN (aluminum nitride).
- the main component here means a component having the largest content ratio (weight ratio).
- the diameter of the holding member 10 is, for example, about 100 mm to 500 mm, and the thickness of the holding member 10 is, for example, about 3 mm to 15 mm.
- a heater 50 composed of a linear resistance heating element formed of a conductive material (for example, tungsten or molybdenum).
- a pair of end portions of the heater 50 are disposed in the vicinity of the center portion of the holding member 10.
- a pair of vias 52 are provided inside the holding member 10.
- Each via 52 is a linear conductor extending in the vertical direction, and the upper end of each via 52 is connected to each end of the heater 50, and the lower end of each via 52 is connected to the holding side of the holding member 10. It arrange
- a pair of power receiving electrodes 54 is disposed in the vicinity of the central portion of the holding-side joining surface S2 of the holding member 10. Each power receiving electrode 54 is connected to the lower end of each via 52. Thereby, the heater 50 and each receiving electrode 54 are electrically connected.
- the support member 20 is, for example, a cylindrical member extending in the vertical direction, and has a through hole 22 penetrating in the vertical direction from the support side joining surface S3 (upper surface) to the lower surface S4. Similar to the holding member 10, the support member 20 is formed of ceramics mainly composed of AlN.
- the outer diameter of the support member 20 is, for example, about 30 mm to 90 mm, the inner diameter is, for example, about 10 mm to 60 mm, and the length in the vertical direction is, for example, about 100 mm to 300 mm.
- a pair of electrode terminals 56 are accommodated in the through hole 22 of the support member 20. Each electrode terminal 56 is a rod-shaped conductor extending in the vertical direction.
- the upper ends of the electrode terminals 56 are joined to the power receiving electrodes 54 by brazing.
- the heater 50 When a voltage is applied to the pair of electrode terminals 56 from a power source (not shown), the heater 50 generates heat to warm the holding member 10, and the upper surface of the holding member 10 (hereinafter referred to as “holding surface S ⁇ b> 1”).
- the held wafer W is heated.
- the heater 50 is arrange
- two metal wires 60 (only one is shown in FIG. 2) of the thermocouple are accommodated.
- Each metal wire 60 is disposed so as to extend in the vertical direction, and an upper end portion 62 of each metal wire 60 is embedded in the central portion of the holding member 10. Thereby, the temperature in the holding member 10 is measured, and the temperature control of the wafer W is realized based on the measurement result.
- the joining layer 30 is an annular sheet layer, and joins the holding side joining surface S2 of the holding member 10 and the supporting side joining surface S3 of the support member 20.
- the bonding layer 30 is made of a material that contains GdAlO 3 and Al 2 O 3 (alumina) and does not contain a rare earth single oxide having only rare earth elements and oxygen.
- the outer diameter of the bonding layer 30 is, for example, about 30 mm to 90 mm, the inner diameter is, for example, about 10 mm to 60 mm, and the thickness is, for example, about 50 ⁇ m to 70 ⁇ m.
- “not including a rare earth single oxide” means that the content of the rare earth single oxide in the bonding layer 30 is less than 2 wt%.
- A-2. Manufacturing method of susceptor 100 Next, a method for manufacturing the susceptor 100 in the present embodiment will be described. First, the holding member 10 and the support member 20 are prepared. As described above, both the holding member 10 and the support member 20 are made of ceramics whose main component is AlN. In addition, since the holding member 10 and the support member 20 can be manufactured by a well-known manufacturing method, description of a manufacturing method is abbreviate
- the holding-side joining surface S2 of the holding member 10 and the support-side joining surface S3 of the supporting member 20 are lapped so that the surface roughness of each joining surface S2, S3 is 1 ⁇ m or less and the flatness is 10 ⁇ m or less.
- a bonding agent is applied to at least one of the holding-side bonding surface S2 of the holding member 10 and the support-side bonding surface S3 of the support member 20.
- GdAlO 3 powder and Al 2 O 3 powder are mixed at a predetermined ratio, and further mixed with an acrylic binder and butyl carbitol to form a paste-like bonding agent.
- the composition ratio of the forming material of the paste-like bonding agent is, for example, 48 mol% for GdAlO 3 and 52 mol% for Al 2 O 3 .
- the laminated body of the holding member 10 and the support member 20 is placed in a hot press furnace and heated while being pressurized in nitrogen. Thereby, the paste-like bonding agent is melted to form the bonding layer 30, and the holding member 10 and the support member 20 are bonded by the bonding layer 30.
- the pressure in this heating / pressure bonding is preferably set within a range of 0.1 MPa to 15 MPa. When the pressure in the heating and pressure bonding is set to 0.1 MPa or more, a gap that is not bonded is generated between the bonded members even when the surface of the bonded member (the holding member 10 or the support member 20) is wavy.
- the temperature in this heating / pressure bonding is increased to 1750 ° C.
- the state at 1750 ° C. is maintained for about 10 minutes, and then the temperature in the hot press furnace is lowered to room temperature.
- post-treatment polishshing of outer periphery and upper and lower surfaces, formation of terminals, etc.
- the susceptor 100 of the embodiment is manufactured by the manufacturing method described above.
- the susceptor of the comparative example includes a holding member, a support member, and a bonding layer.
- the susceptor 100 of the example and the susceptor of the comparative example are common in the following points.
- the susceptor 100 of the embodiment differs from the susceptor of the comparative example in the following points.
- the material of the bonding layer 30 of the susceptor 100 of the example: GdAlO 3 and Al 2 O 3 are included, and a rare earth single oxide having only rare earth elements and oxygen is not included.
- the manufacturing method of the susceptor of the comparative example is different from the above-described manufacturing method of the susceptor 100 of the embodiment in that Gd 2 O 3 powder is mixed with acrylic binder and butyl carbitol instead of GdAlO 3 powder and Al 2 O 3 powder. By doing so, the point of forming a paste-like bonding agent is different, but the other points are basically the same.
- the first He leak test was performed immediately after the manufacture of the susceptor 100 of the example.
- the susceptor 100 of the example is subjected to ultrasonic cleaning in a solvent, and then subjected to ultrasonic cleaning in pure water.
- the cleaned susceptor 100 is placed in a dryer at 120 ° C. Dry for 4 hours.
- the 2nd He leak test was done about the susceptor 100 of the Example after drying.
- the bonding layer 30 of the susceptor 100 of the example was cut, and the state of the cut surface was visually observed.
- the cut surface of the bonding layer 30 of the susceptor 100 of the example was observed by SEM.
- elemental analysis was performed on the cut surface of the bonding layer 30 of the susceptor 100 of the example by EDS, and the configuration of the bonding layer 30 was identified by XRD measurement.
- FIG. 3 is an explanatory view showing the result of XRD measurement of the susceptor 100 of the example
- FIG. 4 is an explanatory view showing the result of XRD measurement of the susceptor of the comparative example.
- the bonding layer 30 contains GdAlO 3 and Al 2 O 3 and does not contain a rare earth single oxide before and after the water resistance test.
- the configuration composition ratio, etc.
- the bonding layer contained only Gd 2 O 3 before the water resistance test, but after the water resistance test, the bonding layer was Gd (OH ) Only 3 were included. That is, in the susceptor of the comparative example, the material for forming the bonding layer is changed from Gd 2 O 3 to Gd (OH) 3 before and after the water resistance test.
- the bonding layer of the susceptor of the comparative example contains Gd 2 O 3 that is a rare earth single oxide, Gd 2 O 3 reacts with moisture by being washed, so that Gd 2 O 3 is a rare earth hydroxide. (OH) 3 is produced. After that, when the bonding layer is dried at a high temperature, Gd (OH) 3 is scattered as powder, and a portion of the bonding layer from which Gd (OH) 3 is removed becomes a cavity, thereby bonding the bonding layer. Strength decreases. For this reason, after the water resistance test, a He leak is detected in the He leak test, and adhesion of powder to the cut surface of the bonding layer 30 is observed in the appearance inspection and the SEM inspection. In the EDS and XRD measurements, the bonding layer is observed. It is considered that the forming material of Gd (OH) 3 was changed.
- the bonding layer 30 of the susceptor 100 of the embodiment contains GdAlO 3 and Al 2 O 3 and does not contain a rare earth single oxide.
- GdAlO 3 is a perovskite oxide, and the perovskite oxide is a stable substance that hardly reacts with moisture as compared with a rare earth single oxide. For this reason, according to the bonding layer 30 of the susceptor 100 of the embodiment, scattering of the rare earth hydroxide and a decrease in the bonding strength of the bonding layer can be suppressed.
- the holding member 10 and the support member 20 may be bonded by a plurality of bonding portions instead of the bonding layer 30. Specifically, a plurality of joint portions arranged on one virtual plane orthogonal to the facing direction of the holding member 10 and the support member 20 are discretely formed between the holding member 10 and the support member 20. In addition, the holding member 10 and the support member 20 may be partially connected via AlN particles, which are forming materials of the holding member 10 and the support member 20.
- a second bonding layer composition different from the bonding layer 30 (bonding portion) ( A second joint portion) may be interposed. That is, the holding member 10 and the support member 20 may be bonded through a plurality of bonding layers or bonding portions having different compositions.
- the ceramics forming the holding member 10 and the support member 20 in the embodiment and the modification may contain other elements as long as they contain AlN (aluminum nitride) as a main component.
- the material for forming the bonding layer 30 is a perovskite oxide other than GdAlO 3 (chemical formula ABO 3 (where A is a rare earth element and B is Al). May be included).
- This rare earth element preferably contains at least one of Gd, Nd, Tb, Eu, and Y.
- generation of rare earth hydroxide can be suppressed by mixing and baking an alumina with a perovskite type oxide.
- the manufacturing method of the susceptor 100 in the above embodiment is merely an example, and various modifications are possible.
- the present invention is not limited to the susceptor 100, and includes other heating devices such as polyimide heaters, a ceramic plate and a base plate, and a holding device (for example, an electrostatic chuck or a vacuum chuck) that holds an object on the surface of the ceramic plate. ), And other semiconductor manufacturing apparatus parts such as a shower head.
- other heating devices such as polyimide heaters, a ceramic plate and a base plate, and a holding device (for example, an electrostatic chuck or a vacuum chuck) that holds an object on the surface of the ceramic plate. ), And other semiconductor manufacturing apparatus parts such as a shower head.
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Abstract
Description
A-1.サセプタ100の構成:
図1は、本実施形態におけるサセプタ100の外観構成を概略的に示す斜視図であり、図2は、本実施形態におけるサセプタ100のXZ断面構成を概略的に示す説明図である。各図には、方向を特定するための互いに直交するXYZ軸が示されている。本明細書では、便宜的に、Z軸正方向を上方向といい、Z軸負方向を下方向というものとするが、サセプタ100は実際にはそのような向きとは異なる向きで設置されてもよい。サセプタ100は、請求の範囲における半導体製造装置用部品に相当する。
保持部材10は、例えば円形平面の板状部材であり、AlN(窒化アルミニウム)を主成分とするセラミックスにより形成されている。なお、ここでいう主成分とは、含有割合(重量割合)の最も多い成分を意味する。保持部材10の直径は、例えば100mm~500mm程度であり、保持部材10の厚さは、例えば3mm~15mm程度である。
支持部材20は、例えば上下方向に延びた円筒状部材であり、支持側接合面S3(上面)から下面S4まで上下方向に貫通する貫通孔22が形成されている。支持部材20は、保持部材10と同様に、AlNを主成分とするセラミックスにより形成されている。支持部材20の外径は、例えば30mm~90mm程度であり、内径は、例えば10mm~60mm程度であり、上下方向の長さは、例えば100mm~300mm程度である。支持部材20の貫通孔22内には、一対の電極端子56が収容されている。各電極端子56は、上下方向に延びる棒状の導電体である。各電極端子56の上端は、各受電電極54にロウ付けにより接合されている。一対の電極端子56に電源(図示せず)から電圧が印加されると、ヒータ50が発熱することによって保持部材10が温められ、保持部材10の上面(以下、「保持面S1」という)に保持されたウェハWが温められる。なお、ヒータ50は、保持部材10の保持面S1をできるだけ満遍なく温めるため、例えばZ方向視で略同心円状に配置されている。なお、支持部材20の貫通孔22内には、熱電対の2本の金属線60(図2では1本のみ図示)が収容されている。各金属線60は、上下方向に延びように配置され、各金属線60の上端部分62は、保持部材10の中央部に埋め込まれている。これにより、保持部材10内の温度が測定され、その測定結果に基づきウェハWの温度制御が実現される。
接合層30は、円環状のシート層であり、保持部材10の保持側接合面S2と支持部材20の支持側接合面S3とを接合している。接合層30は、GdAlO3とAl2O3(アルミナ)とを含み、希土類元素と酸素とのみを有する希土類単一酸化物を含まない材料により形成されている。接合層30の外径は、例えば30mm~90mm程度であり、内径は、例えば10mm~60mm程度であり、厚さは、例えば50μm~70μm程度である。なお、ここでいう「希土類単一酸化物を含まない」とは、接合層30中における希土類単一酸化物の含有割合が2重量%未満であることをいう。
次に、本実施形態におけるサセプタ100の製造方法を説明する。はじめに、保持部材10と支持部材20とを準備する。上述したように、保持部材10と支持部材20とは、いずれもAlNを主成分とするセラミックスにより形成されている。なお、保持部材10および支持部材20は、公知の製造方法によって製造可能であるため、ここでは製造方法の説明を省略する。
実施例のサセプタ100と比較例のサセプタとについて、以下に説明する性能評価を行った。
実施例のサセプタ100は、上述した製造方法で製造されたものである。比較例のサセプタは、保持部材と支持部材と接合層とを備える。実施例のサセプタ100と比較例のサセプタとは、以下の点で共通している。
(保持部材の構成)
・材料:AlNを主成分とするセラミックス
・直径:100mm~500mm
・厚さ:3mm~15mm
(支持部材の構成)
・材料:AlNを主成分とするセラミックス
・外径:30mm~90mm
・内径:10mm~60mm
・上下方向の長さ:100mm~300mm
(接合層の外形)
・外径:30mm~90mm
・内径:10mm~60mm
・厚さ:50μm~70μm
(接合層の材料)
・実施例のサセプタ100の接合層30の材料:GdAlO3とAl2O3とを含み、希土類元素と酸素とのみを有する希土類単一酸化物を含まない。
・比較例のサセプタの接合層の材料:希土類単一酸化物であるGd2O3を含む。
比較例のサセプタの製造方法は、実施例のサセプタ100の上述の製造方法に対して、GdAlO3粉末およびAl2O3粉末の代わりに、Gd2O3粉末をアクリルバインダおよびブチルカルビトールと共に混合することにより、ペースト状の接合剤を形成する点が相違しているが、これ以外の点は基本的に共通している。
(接合層の接合強度の評価について)
接合層の接合強度の評価として、実施例のサセプタ100および比較例のサセプタについて、He(ヘリウム)リーク試験を行った。Heリーク試験では、例えば、実施例のサセプタ100の支持部材20の下側開口端にHeリークディテクタ(図示せず)を連結し、接合層30の外周側からHeガスを吹き付ける。そして、Heリークディテクタの検出結果に基づき、接合層30におけるHeのリークの検出の有無を確認した。Heのリークが検出されることは、接合層30中に空洞が存在しているために接合強度が低いことを意味する。本実施形態では、実施例のサセプタ100の製造直後に、1回目のHeリーク試験を行った。次に、実施例のサセプタ100に対し、溶剤中で超音波洗浄を行い、次に純水中で超音波洗浄を行い、洗浄後の実施例のサセプタ100を乾燥器に配置して120℃で4時間乾燥させた。そして、乾燥後の実施例のサセプタ100について、2回目のHeリーク試験を行った。
接合層における水酸化物生成の抑制の評価として、実施例のサセプタ100および比較例のサセプタについて、耐水試験の前後に、外観検査と、SEM(走査型電子顕微鏡)検査と、EDS(エネルギー分散型X分析)およびXRD(X線回折)測定とを行った。耐水試験では、例えば、実施例のサセプタ100を、オートクレーブに配置し、飽和蒸気(飽和水蒸気量は1.2kg/m3)によって高温高圧(123℃、0.22MPa)の環境下に12時間放置した。外観検査では、実施例のサセプタ100の接合層30を切断し、その切断面の状態を目視によって観察した。SEM検査では、実施例のサセプタ100の接合層30の切断面をSEMによって観察した。EDSおよびXRD測定では、実施例のサセプタ100の接合層30の切断面についてEDSによって元素分析を行い、XRD測定によって接合層30の構成を同定した。
(接合層の接合強度の評価について)
実施例のサセプタ100では、1回目および2回目のHeリーク試験のいずれにおいても、Heのリークは検出されなかった。一方、比較例のサセプタでは、1回目のHeリーク試験において、Heのリークは検出されなかったが、2回目のHeリーク試験において、Heのリークが検出された。
図3は、実施例のサセプタ100のXRD測定の結果を示す説明図であり、図4は、比較例のサセプタのXRD測定の結果を示す説明図である。実施例のサセプタ100では、外観検査およびSEM検査のいずれにおいても、耐水試験の前後で、接合層30の切断面の状態に変化は見られなかった。また、EDSおよびXRD測定では、図3に示すように、耐水試験の前後のいずれにおいても、接合層30は、GdAlO3とAl2O3とを含み、希土類単一酸化物を含んでおらず、耐水試験の前後で、接合層30の構成(組成比等)に変化は見られなかった。
比較例のサセプタの接合層は、希土類単一酸化物であるGd2O3を含んでいるため、洗浄されることによって、Gd2O3が水分と反応して、希土類水酸化物であるGd(OH)3が生成される。その後、接合層が高温で乾燥されると、Gd(OH)3が粉体となって飛散し、接合層の内、Gd(OH)3が抜けた部分が空洞になることによって接合層の接合強度が低下する。このため、耐水試験の後において、Heリーク試験ではHeのリークが検出され、外観検査およびSEM検査では接合層30の切断面への粉体の付着等が見られ、EDSおよびXRD測定では接合層の形成材料がGd(OH)3に変化したと考えられる。
本明細書で開示される技術は、上述の実施形態に限られるものではなく、その要旨を逸脱しない範囲において種々の形態に変形することができ、例えば次のような変形も可能である。
Claims (3)
- AlNを主成分とする材料により形成された第1のセラミックス部材と、
AlNを主成分とする材料により形成された第2のセラミックス部材と、
前記第1のセラミックス部材と前記第2のセラミックス部材との間に配置され、前記第1のセラミックス部材と前記第2のセラミックス部材とを接合する接合層と、を備える半導体製造装置用部品において、
前記接合層は、化学式ABO3(但し、Aは希土類元素であり、BはAlである。)で表されるペロブスカイト型酸化物を含み、希土類元素と酸素とのみを有する希土類単一酸化物を含まないことを特徴とする、半導体製造装置用部品。 - AlNを主成分とする材料により形成された第1のセラミックス部材と、
AlNを主成分とする材料により形成された第2のセラミックス部材と、
前記第1のセラミックス部材と前記第2のセラミックス部材との間に配置され、前記第1のセラミックス部材と前記第2のセラミックス部材とを接合する複数の接合部と、を備える半導体製造装置用部品において、
前記接合部は、化学式ABO3(但し、Aは希土類元素であり、BはAlである。)で表されるペロブスカイト型酸化物を含み、希土類元素と酸素とのみを有する希土類単一酸化物を含まないことを特徴とする、半導体製造装置用部品。 - 請求項1または請求項2に記載の半導体製造装置用部品において、
前記ペロブスカイト型酸化物が有する前記希土類元素は、Gd、Nd、Tb、Eu、Yの少なくとも1種を含むことを特徴とする、半導体製造装置用部品。
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JP3604888B2 (ja) * | 1997-01-30 | 2004-12-22 | 日本碍子株式会社 | 窒化アルミニウム質セラミックス基材の接合体、窒化アルミニウム質セラミックス基材の接合体の製造方法及び接合剤 |
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JP6434836B2 (ja) * | 2015-03-20 | 2018-12-05 | 日本碍子株式会社 | 複合体、ハニカム構造体及び複合体の製造方法 |
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CN109476553B (zh) | 2021-09-10 |
CN109476553A (zh) | 2019-03-15 |
US20190304813A1 (en) | 2019-10-03 |
JP6462949B2 (ja) | 2019-01-30 |
JPWO2018016418A1 (ja) | 2018-07-19 |
TW201811713A (zh) | 2018-04-01 |
KR102209158B1 (ko) | 2021-01-28 |
KR20190019172A (ko) | 2019-02-26 |
TWI655170B (zh) | 2019-04-01 |
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