WO2018003760A1 - Flux composition, solder paste composition, and electronic circuit board - Google Patents

Flux composition, solder paste composition, and electronic circuit board Download PDF

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Publication number
WO2018003760A1
WO2018003760A1 PCT/JP2017/023462 JP2017023462W WO2018003760A1 WO 2018003760 A1 WO2018003760 A1 WO 2018003760A1 JP 2017023462 W JP2017023462 W JP 2017023462W WO 2018003760 A1 WO2018003760 A1 WO 2018003760A1
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WIPO (PCT)
Prior art keywords
mass
solder
solder alloy
resin
alloy powder
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PCT/JP2017/023462
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French (fr)
Japanese (ja)
Inventor
正也 新井
司 勝山
健 中野
敦史 堀
裕里加 宗川
Original Assignee
株式会社タムラ製作所
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Application filed by 株式会社タムラ製作所 filed Critical 株式会社タムラ製作所
Priority to JP2017549359A priority Critical patent/JP6363307B2/en
Priority to KR1020187006120A priority patent/KR102242412B1/en
Publication of WO2018003760A1 publication Critical patent/WO2018003760A1/en

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Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K35/00Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
    • B23K35/22Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by the composition or nature of the material
    • B23K35/24Selection of soldering or welding materials proper
    • B23K35/26Selection of soldering or welding materials proper with the principal constituent melting at less than 400 degrees C
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C12/00Alloys based on antimony or bismuth
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C13/00Alloys based on tin
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C13/00Alloys based on tin
    • C22C13/02Alloys based on tin with antimony or bismuth as the next major constituent

Definitions

  • the present invention relates to a flux composition, a solder paste composition, and an electronic circuit board having a solder joint formed using the same.
  • solder paste composition in which a flux and a solder alloy powder are mixed is printed on the substrate and is placed at a predetermined position.
  • a method of mounting an electronic component and forming a solder joint by heating it in a reflow furnace or the like is used for general purposes (hereinafter, this method is referred to as “reflow soldering method”).
  • the reflow soldering method has a drawback in that voids are likely to occur in the formed solder joints, compared to a soldering method using solder formed in a predetermined shape.
  • the main cause of this void is that when the solder alloy powder contained in the solder paste composition melts and agglomerates, the components contained in the flux composition, especially the volatile solvent, are not discharged from the agglomerated solder quickly. It is in.
  • a method for reducing the generation of the above-mentioned voids there is a method of blending a flux composition with a solvent that completely volatilizes at the stage of preheating during heating.
  • the solvent is used to adjust the solder paste composition to an appropriate viscosity and enhance its printability. Therefore, if the printing of the solder paste composition on the substrate is completed, the solvent becomes an unnecessary component.
  • the solder paste composition is easily dried on the metal mask, so that the viscosity of the solder paste composition increases during continuous printing, which may cause clogging of the metal mask opening and defective printing. There is.
  • a solder paste using a solvent that is higher by 5 ° C. or more than the melting peak temperature of solder has been proposed (see Patent Document 1).
  • the amount of the solvent vaporized before the solder melts is less than 15% by mass at the maximum. Therefore, after the solder paste is completely melted and the solder shows wettability, the vaporization thereof becomes active. Therefore, the solvent is easily discharged from the molten solder, and thus generation of voids is suppressed.
  • such a solvent may be used together with a flux component (eg, resin, thixotropic agent, activator, etc.) other than the solvent when only a part of the solvent is vaporized during reflow heating or when it is not substantially vaporized at all.
  • a flux residue it remains around the solder joint. Since the flux residue containing the solvent has a sticky property, dust and dust in the atmosphere are likely to adhere. Such a residue of flux adhered with dust or the like is deteriorated in insulation, so that its reliability may be significantly impaired.
  • the flux residue can also be removed by cleaning with a cleaning agent after soldering.
  • solder paste compositions have been widely used from the viewpoint of cost, environment, etc., and the importance of solder paste compositions that can suppress the stickiness of flux residue while suppressing the generation of voids is increasing. Increasingly.
  • the present invention solves the above problems, and in particular, provides a flux composition and a solder paste composition capable of suppressing the stickiness of the flux residue after soldering while suppressing the generation of voids during reflow soldering. Objective.
  • the flux composition of the present invention constitutes a solder paste composition by mixing with a solder alloy powder, and (A) a base resin, (B) an activator, (C) a thixotropic agent, (D) a solvent, and the solvent (D) includes (D-1) an organic acid ester having neither a carboxyl group nor a hydroxyl group, and the weight loss rate of the organic acid ester (D-1) (The temperature at which 100% by mass (measured using the TG method) is 180 ° C. or higher and the melting peak temperature of the solder alloy constituting the solder alloy powder is + 50 ° C. or lower, and the blending amount of the organic acid ester (D-1) Is characterized in that it is 10% by mass to 100% by mass with respect to the total amount of the solvent (D).
  • the temperature at which 100% by mass (measured using the TG method) is 180 ° C. or higher and lower than 225 ° C. is a feature thereof.
  • the temperature at which 100% by mass (measured using the TG method) is 180 ° C. or more and less than 250 ° C. is a feature thereof.
  • the organic acid ester (D-1) is characterized in that it is at least one of dimethyl adipate and dibutyl maleate.
  • the organic acid ester (D-1) is selected from dimethyl adipate, diisopropyl adipate, dibutyl maleate, dimethyl sebacate, diisobutyl adipate and diethyl sebacate It is characterized by being at least one kind.
  • the organic acid ester (D-1) is dimethyl adipate, diisopropyl adipate, dibutyl maleate, dimethyl sebacate, diisobutyl adipate, diethyl sebacate, sebacin It is characterized by being at least one selected from diisopropyl acid, dibutyl sebacate and dioctyl sebacate.
  • the base resin (A) comprises at least one of (A-1) rosin resin and (A-2) synthetic resin.
  • the synthetic resin (A-2) is acrylic resin, styrene-maleic acid resin, epoxy resin, urethane resin, polyester resin, phenoxy resin, terpene resin, polyalkylene carbonate, rosin resin having carboxyl group and dimer acid derivative It is characterized by being at least one selected from the group consisting of derivative compounds obtained by dehydration condensation with a flexible alcohol compound.
  • solder paste composition of the present invention is characterized by including the flux composition according to any one of (1) to (8) above and a solder alloy powder.
  • the solder alloy powder has an Ag content of 2% by mass to 3.1% by mass, Cu of more than 0% by mass and 1% by mass or less, and Sb of 1% by mass. % To 5% by mass, Bi from 0.5% to 4.5% by mass, Ni from 0.01% to 0.25% by mass, with the balance being Sn. To do.
  • the solder alloy powder further includes Co in an amount of 0.001% by mass to 0.25% by mass.
  • the electronic circuit board of the present invention is characterized by having a solder joint formed using the solder paste composition according to any one of (9) to (11) above.
  • the present invention it is possible to provide a flux composition and a solder paste composition that can suppress the stickiness of the flux residue after soldering while suppressing the generation of voids particularly during reflow soldering.
  • Flux composition contains (A) base resin, (B) activator, (C) thixotropic agent, and (D) solvent.
  • the base resin (A) for example, it is preferable to use at least one of (A-1) rosin resin and (A-2) synthetic resin.
  • Examples of the rosin resin (A-1) include rosins such as tall oil rosin, gum rosin, and wood rosin; polymerization, hydrogenation, heterogeneity, acrylation, maleation, esterification, or phenol addition reaction of rosin. And a modified rosin resin obtained by subjecting these rosin or rosin derivative and an unsaturated carboxylic acid (acrylic acid, methacrylic acid, maleic anhydride, fumaric acid, etc.) to a Diels-Alder reaction.
  • a modified rosin resin is particularly preferably used, and a hydrogenated acrylic acid-modified rosin resin hydrogenated by reacting acrylic acid is particularly preferably used.
  • the acid value of the rosin resin (A-1) is preferably 140 mgKOH / g to 350 mgKOH / g, and its weight average molecular weight is preferably 200 Mw to 1,000 Mw.
  • Examples of the synthetic resin (A-2) include acrylic resin, styrene-maleic acid resin, epoxy resin, urethane resin, polyester resin, phenoxy resin, terpene resin, polyalkylene carbonate, rosin resin having a carboxyl group, and dimer acid.
  • Derivative compounds formed by dehydration condensation with a derivative flexible alcohol compound are exemplified. In addition, you may use these individually by 1 type or in mixture of multiple types.
  • the acrylic resin can be obtained by, for example, homopolymerizing (meth) acrylate having an alkyl group having 1 to 20 carbon atoms or copolymerizing a monomer having the acrylate as a main component.
  • acrylic resins obtained by polymerizing methacrylic acid and monomers containing two saturated alkyl groups having 2 to 20 carbon atoms in which the carbon chain is linear are preferably used. It is done. In addition, you may use the said acrylic resin individually by 1 type or in mixture of multiple types.
  • any thermosetting resin having a reactive epoxy group at its end can be used, for example, bisphenol A type, bisphenol F type, bisphenol S type, biphenyl type, naphthalene type.
  • Cresol novolak type phenol novolak type, brominated bisphenol A type, hydrogenated bisphenol A type, bisphenol AF type, fluorene type, glycidyl ether type, glycidyl ester type, glycidyl amine type, alicyclic epoxy resin and the like.
  • Any urethane resin can be used as long as it is obtained by reacting a compound having a plurality of isocyanate groups in one molecule with a polyol compound having two or more hydroxyl groups in one molecule.
  • polyurethane resins containing an aliphatic component and an aromatic component are particularly preferred.
  • the urethane resin may be used alone or in combination of two or more.
  • polyester resin examples include polyethylene terephthalate, polytrimethylene terephthalate, polybutylene terephthalate, polyethylene naphthalate, and polybutylene naphthalate. In addition, you may use these individually by 1 type or in mixture of multiple types.
  • phenoxy resin examples include bisphenol A type phenoxy resin and bisphenol F type phenoxy resin. In addition, you may use these individually by 1 type or in mixture of multiple types.
  • polyalkylene carbonate examples include polyethylene carbonate, polypropylene carbonate, polybutene carbonate, polyisobutene carbonate, polypentene carbonate, polyhexene carbonate, polycyclopentene carbonate, polycyclohexene carbonate, polycycloheptene carbonate, polycyclooctene carbonate, and polylimonene.
  • carbonate examples include polypropylene carbonate and polybutylene carbonate. In addition, you may use these individually by 1 type or in mixture of multiple types.
  • rosin derivative compound obtained by dehydrating and condensing the rosin resin having a carboxyl group and a dimer acid derivative flexible alcohol compound
  • Rosin resin having a carboxyl group for example, Rosin such as tall oil rosin, gum rosin, wood rosin; hydrogenated rosin, polymerized rosin, heterogeneous rosin, acrylic acid modified rosin, rosin derivatives such as maleic acid modified rosin, etc. Can be used. These may be used alone or in combination of two or more.
  • examples of the dimer acid derivative flexible alcohol compound include compounds derived from dimer acid such as dimer diol, polyester polyol, and polyester dimer diol, and those having an alcohol group at the terminal thereof.
  • dimer acid such as dimer diol, polyester polyol, and polyester dimer diol
  • PRIPOL 2033, PRIPLAST 3197, PRIPLAST 1838 (manufactured by Croda Japan Co., Ltd.) and the like can be used.
  • the rosin derivative compound is obtained by dehydrating and condensing the rosin resin having a carboxyl group and the dimer acid derivative flexible alcohol compound.
  • the dehydration condensation method a generally used method can be used.
  • a preferred weight ratio when dehydrating and condensing the rosin resin having a carboxyl group and the dimer acid derivative flexible alcohol compound is 25:75 to 75:25, respectively.
  • the acid value of the synthetic resin (A-2) is preferably 0 mgKOH / g to 150 mgKOH / g, and the weight average molecular weight is preferably 1,000 Mw to 30,000 Mw.
  • the blending amount of the base resin (A) is preferably 10% by mass or more and 60% by mass or less, and more preferably 30% by mass or more and 55% by mass or less with respect to the total amount of the flux composition.
  • the blending amount is preferably 10% by mass or more and 50% by mass or less, and 15% by mass or more and 45% by mass or less with respect to the total amount of the flux composition. More preferably.
  • the blending amount of the rosin resin (A-1) is preferably 10% by mass or more and 60% by mass or less, and more preferably 15% by mass or more and 50% by mass or less with respect to the total amount of the flux composition. It is more preferable.
  • the blending ratio is preferably 20:80 to 50:50, and 25:75 to 40:60. More preferably.
  • activator (B) Activator Examples of the activator (B) include carboxylic acids and halogen-containing compounds. You may use these individually by 1 type or in mixture of multiple types.
  • carboxylic acids examples include monocarboxylic acids, dicarboxylic acids, and other organic acids.
  • monocarboxylic acid include propionic acid, butyric acid, valeric acid, caproic acid, enanthic acid, capric acid, lauric acid, myristic acid, pentadecylic acid, palmitic acid, margaric acid, stearic acid, tuberculostearic acid, arachidic acid , Behenic acid, lignoceric acid, glycolic acid and the like.
  • dicarboxylic acid examples include oxalic acid, malonic acid, succinic acid, glutaric acid, adipic acid, pimelic acid, suberic acid, azelaic acid, sebacic acid, fumaric acid, maleic acid, tartaric acid, diglycolic acid and the like.
  • organic acids include dimer acid, levulinic acid, lactic acid, acrylic acid, benzoic acid, salicylic acid, anisic acid, citric acid, and picolinic acid. In addition, you may use these individually by 1 type or in mixture of multiple types.
  • halogen-containing compound examples include a non-dissociative halogen compound (non-dissociative activator) and a dissociative halogen compound (dissociative activator).
  • non-dissociative activator examples include non-salt organic compounds in which halogen atoms are covalently bonded.
  • halogen atoms are covalently bonded.
  • chlorine, bromine, iodine, fluorine such as chlorinated compounds, brominated compounds, iodinated compounds, and fluorides.
  • the compound may be a compound by covalent bonding of each single element, or a compound in which two or more different halogen atoms are bonded by a covalent bond.
  • the compound preferably has a polar group such as a hydroxyl group such as a halogenated alcohol.
  • a polar group such as a hydroxyl group such as a halogenated alcohol.
  • the halogenated alcohol include brominated alcohols such as 2,3-dibromopropanol, 2,3-dibromobutanediol, 1,4-dibromo-2-butanol, and tribromoneopentyl alcohol; 1,3-dichloro- Examples include chlorinated alcohols such as 2-propanol and 1,4-dichloro-2-butanol; fluorinated alcohols such as 3-fluorocatechol; and other similar compounds.
  • Examples of the dissociative activator include base hydrochlorides and hydrobromides such as amines and imidazoles.
  • Examples of hydrochloric acid and hydrobromic acid salts include methylamine, dimethylamine, trimethylamine, ethylamine, diethylamine, triethylamine, n-propylamine, di-n-propylamine, tri-n-propylamine, isopropylamine , Diisopropylamine, butylamine, dibutylamine, tributylamine, cyclohexylamine, monoethanolamine, diethanolamine, triethanolamine and other amines with relatively small carbon numbers; imidazole, 2-methylimidazole, 2-ethylimidazole, 2-methyl- Hydrochloric acid salts such as 4-methylimidazole, 2-methyl-4-ethylimidazole, 2-ethyl-4-ethylimidazole, 2-propylimidazole, 2-propyl-4
  • the blending amount of the activator (B) is preferably 0.1% by mass or more and 30% by mass or more, and more preferably 2% by mass or more and 25% by mass or less with respect to the total amount of the flux composition.
  • the blending amount of the carboxylic acids used in the activator (B) is preferably 1% by mass or more and 25% by mass or less, and preferably 5% by mass or more and 15% by mass or less based on the total amount of the flux composition. Is more preferable.
  • the blending amount of the non-dissociative activator used in the activator (B) is preferably 0.1% by mass or more and 5% by mass or less, and 0.5% by mass with respect to the total amount of the flux composition.
  • the content is more preferably 3% by mass or less.
  • the blending amount of the dissociative activator used in the activator (B) is preferably 0.1% by mass or more and 3% by mass or less based on the total amount of the flux composition, and is 0.3% by mass. More preferably, it is 1.5 mass% or less.
  • the blending amount is preferably 0.1% by mass or more and 5% by mass or less, and 0.5% by mass or more and 3% by mass or less. More preferably.
  • thixotropic agent examples include hydrogenated castor oil, saturated fatty acid amides, saturated fatty acid bisamides, oxy fatty acids, dibenzylidene sorbitols, and the like. You may use these individually by 1 type or in mixture of multiple types. Further, the blending amount of the thickener is preferably 1% by mass or more and 15% by mass or less, and more preferably 3% by mass or more and 10% by mass or less with respect to the total amount of the flux.
  • solvent (D) Solvent examples include isopropyl alcohol, ethanol, acetone, toluene, xylene, ethyl acetate, ethyl cellosolve, butyl cellosolve, hexyl diglycol, (2-ethylhexyl) diglycol, phenyl glycol, butyl carbitol. , Octanediol, ⁇ -terpineol, ⁇ -terpineol, tetraethylene glycol dimethyl ether, trimellitic acid tris (2-ethylhexyl), bisisopropyl sebacate and the like can be used. You may use these individually by 1 type or in mixture of multiple types.
  • the solvent (D) preferably contains (D-1) an organic acid ester having neither a carboxyl group nor a hydroxyl group.
  • a solvent used for the flux composition a component containing either a carboxyl group or a hydroxyl group is generally used.
  • the activator is ionized when dissolved in such a solvent, thereby generating negatively charged organic acid ions (RCOO-) and halide ions.
  • RCOO- negatively charged organic acid ions
  • the carboxyl group and hydroxyl group are easily oriented around this ion, and as a result, they are solvated and a reaction between the solder alloy powder and the solvent occurs.
  • the organic acid ester (D-1) does not have any of the above carboxyl group and hydroxyl group, in the flux composition of this embodiment, a functional group that is easily oriented to ions ionized from the activator (B). Therefore, they are difficult to solvate. Therefore, the solder paste composition using the flux composition of the present embodiment can suppress the reaction between the solder alloy powder and the activator in an unheated storage state.
  • the flux composition containing the organic acid ester (D-1) can suppress the reaction between the solder alloy powder and the activator (B) during storage of the solder paste composition, the activator (B) The activity remains without adjusting the activity and blending amount, ensuring good wettability during soldering and suppressing the generation of voids.
  • the organic acid ester (D-1) Even if the organic acid ester (D-1) remains in the flux residue formed on the substrate, the organic acid ester (D-1) has both a carboxyl group and a hydroxyl group as described above. Therefore, the hygroscopicity of the flux residue can be suppressed, and it is considered that the insulation of the flux residue is hardly affected.
  • the weight loss rate of the organic acid ester (D-1) (measured using the TG method. Specifically, the TG curve was measured using a thermogravimetric-suggested thermal analyzer, and the weight loss rate was calculated thereby.
  • the same applies hereinafter) is preferably at least 180 ° C. and the melting peak temperature of the solder alloy constituting the solder alloy + 50 ° C. or less. Since such an organic acid ester (D-1) can suppress stickiness of the flux residue formed on the substrate, it is possible to impart good insulation to the flux residue. That is, the general reflow heating conditions of the solder paste composition are often set so that the peak temperature of the main heating is higher by 10 to 50 ° C. than the melting peak temperature of the solder.
  • the organic material has a weight loss rate of 100% by mass at a temperature higher than 180 ° C. and higher than the melting peak temperature of the solder alloy used as the solvent (D) in the flux composition.
  • the acid ester (D-1) By blending the acid ester (D-1), drying on the metal mask during printing becomes difficult to occur, stable continuous printability can be secured, and generation of voids under the above reflow heating conditions is suppressed. Further, it was found that stickiness of the formed flux residue can be suppressed.
  • the temperature at which the organic acid ester (D-1) becomes 100% by mass of the weight loss rate is 180 ° C. or higher And what is less than 225 degreeC is used preferably.
  • organic acid ester (D-1) include dimethyl adipate and dibutyl maleate. You may use these individually by 1 type or in mixture of multiple types.
  • the temperature at which the organic acid ester (D-1) becomes 100% by mass of the weight loss rate is 180 ° C. Those having a temperature of less than 250 ° C. are preferably used.
  • organic acid ester (D-1) include dimethyl adipate, diisopropyl adipate, dibutyl maleate, dimethyl sebacate, diisobutyl adipate, diethyl sebacate and the like. You may use these individually by 1 type or in mixture of multiple types.
  • the temperature at which the organic acid ester (D-1) becomes 100% by mass of the weight loss rate is 180 ° C. or higher.
  • a solder alloy having a melting peak temperature of + 50 ° C. or lower is preferably used.
  • organic acid ester (D-1) include dimethyl adipate, diisopropyl adipate, dibutyl maleate, dimethyl sebacate, diisobutyl adipate, diethyl sebacate, diisopropyl sebacate, dibutyl sebacate, thiooctyl sebacate. Etc. You may use these individually by 1 type or in mixture of multiple types.
  • the blending amount of the solvent (D) is preferably 20% by mass to 65% by mass with respect to the total amount of the flux composition.
  • the blending amount is more preferably 20% by mass or more and 60% by mass or less, and the particularly preferable blending amount is 25% by mass or more and 50% by mass or less.
  • the blending amount of the organic acid ester (D-1) is preferably 10% by mass to 100% by mass with respect to the total amount of the solvent (D).
  • an additive can be mix
  • the additive include an antioxidant, an antifoaming agent, a surfactant, and a matting agent. You may use these individually by 1 type or in mixture of multiple types.
  • the compounding quantity of the said additive is 0.5 mass% or more and 20 mass% or less with respect to the flux whole quantity, and it is more preferable that it is 1 mass% or more and 15 mass% or less.
  • solder paste composition of this embodiment is obtained by mixing the flux composition and the solder alloy powder.
  • solder alloy powder any of leaded / lead-free solder alloy powder can be used. That is, the solder paste composition of this embodiment uses the organic acid ester (D-1) suitable for the melting peak temperature regardless of the component of the solder alloy powder to be used. The stickiness of the flux residue after soldering can be suppressed while suppressing the generation.
  • alloys that can be used for the solder alloy powder include an alloy containing Sn and Pb, an alloy containing Sn and Pb and at least one of Ag, Bi and In, an alloy containing Sn and Ag, Sn and Pb.
  • Sn, Pb, Ag, Bi, In, Cu, Zn, Ga, Sb, Au, Pd, Ge, Ni, Cr, Al, P, etc. should be used as appropriate. Can do. Note that elements other than those listed above can be used in combination.
  • solder alloy powders containing Sb, Ag and Cu for example, Sn—Ag alloy solder, Sn—Ag—Cu solder alloy and Sn—Ag—Cu—Bi—Sb solder alloy powder are particularly preferable. Used.
  • solder alloy powder having the following alloy composition can improve the effect of suppressing the crack propagation of the solder joint formed. That is, the solder alloy powder has an Ag of 1% by mass to 3.1% by mass, Cu of more than 0% by mass to 1% by mass, Sb of 1% by mass to 5% by mass, and Bi of 0.0%. It is preferable that 5 mass% or more and 4.5 mass% or less, 0.01 mass% or more and 0.25 mass% or less of Ni are included, and the remainder consists of Sn.
  • the more preferable content of Ag is 2% by mass or more and 3.1% by mass or less
  • the more preferable content of Cu is 0.5% by mass or more and 1% by mass or less
  • the more preferable content of Sb is 2%.
  • the content of Bi is 3.1% to 4.5% by mass
  • the more preferable content of Ni is 0.01% to 0.15% by mass. It is.
  • the solder alloy powder preferably further contains Co in an amount of 0.001% by mass to 0.25% by mass. More preferable Co content is 0.001 mass% or more and 0.15 mass% or less.
  • the solder joint formed using the solder paste composition according to the present embodiment can be used in a harsh environment where the difference in temperature is intense and vibration is applied. Also, the crack progress of the solder joint can be suppressed. Furthermore, even when solder bonding is performed using an electronic component that has not been subjected to Ni / Pd / Au plating or Ni / Au plating, crack propagation near the interface between the solder bonding portion and the lower surface electrode of the electronic component can be suppressed. it can.
  • the amount of the solder alloy powder is preferably 65% by mass to 95% by mass with respect to the total amount of the solder paste composition. More preferably, the blending amount is 85% by weight to 93% by weight, and a particularly preferable blending amount is 87% by weight to 92% by weight.
  • the blending amount of the solder alloy powder is less than 65% by mass, a sufficient solder joint tends to be hardly formed when the obtained solder paste composition is used.
  • the content of the solder alloy powder exceeds 95% by mass, the flux composition as a binder is insufficient, and therefore, it tends to be difficult to mix the flux composition and the solder alloy powder.
  • the particle diameter of the solder alloy powder is preferably 1 ⁇ m or more and 40 ⁇ m or less, more preferably 5 ⁇ m or more and 35 ⁇ m or less, and particularly preferably 10 ⁇ m or more and 30 ⁇ m or less.
  • the solder paste composition of the present embodiment uses the flux composition containing the organic acid ester (D-1) suitable for the melting peak temperature of the solder alloy powder of the solder alloy powder, so that the void at the time of reflow soldering is used.
  • the stickiness of the flux residue after soldering can be suppressed while suppressing the generation.
  • the electronic circuit board according to the present embodiment includes a solder joint portion and a flux residue formed by using the solder paste composition (in this specification, the solder joint portion and the flux residue are combined together. It is preferable to have a solder joint ”.
  • the electronic circuit board is, for example, an electrode and a solder resist film formed at a predetermined position on the substrate, printed with the solder paste composition of the present embodiment using a mask having a predetermined pattern, and adapted to the pattern. It is manufactured by mounting parts at predetermined positions and reflowing them.
  • a solder joint is formed on the electrode, and the solder joint electrically joins the electrode and the electronic component. And on the said board
  • solder joint and the flux residue are formed using the solder paste composition, voids are hardly generated in the solder joint and the flux residue is difficult to stick. be able to. Moreover, the crack progress inhibitory effect of a solder joint part can also be improved by making the alloy composition of solder alloy powder into a specific element and content.
  • the synthetic resin (A-2) had a weight average molecular weight of 7,800 Mw, an acid value of 40 mgKOH / g, and a glass transition temperature of ⁇ 47 ° C.
  • solder alloy powder used in each Example and the comparative example is as follows.
  • Examples 1 to 20 and Comparative Examples 1 to 8 Sn-3Ag-0.5Cu solder alloy powder (melting peak temperature: 219 ° C.)
  • Examples 21 and 22 and Comparative Example 9 Sn-10Sb (melting peak temperature: 248 ° C.)
  • Examples 23 and 24 and Comparative Examples 10 and 11 Sn-58Bi (melting peak temperature: 139 ° C.)
  • Examples 25 to 28 and Comparative Example 12 Sn-3.5Ag-0.5Bi-8In (melting peak temperature: 202 ° C.)
  • Examples 29 and 30 Sn-3Ag-0.7Cu-3.5Bi-3Sb-0.04Ni-0.01Co (melting peak temperature: 223 ° C.)
  • Examples 31 and 32 Sn-3Ag-0.5Cu-4.5Bi-3Sb-0.03Ni (melting peak temperature: 222 ° C.)
  • Examples 33 and 34 Sn-3Ag-0.5Cu-3Bi-2Sb
  • a glass epoxy substrate provided with a solder resist having a pattern capable of mounting a 100-pin 0.5 mm pitch BGA and an electrode (diameter: 0.25 mm), and a metal mask having a thickness of 120 ⁇ m having the same pattern as the above pattern were prepared.
  • each solder paste composition was printed on the substrate using the metal mask.
  • this printing was performed by the method of printing continuously using 6 said board
  • this printing was performed by the method of printing continuously using 10 said board
  • the image volume inspection machine product name: aspire2, Co., Ltd. product made from Koyon Technology
  • a solder resist having a 6 mm diameter pattern, a glass epoxy substrate having a copper land, and a 150 ⁇ m thick metal mask having the same pattern as the above pattern were prepared.
  • each solder paste composition is printed on the glass epoxy substrate using the metal mask, and these are heated using a reflow furnace (product name: TNP-538EM, manufactured by Tamura Seisakusho Co., Ltd.), Produced.
  • the reflow conditions differ depending on the composition of the solder alloy powder used for each printed solder paste composition. The conditions are as follows. In any case, the oxygen concentration in the reflow furnace is 1500 ⁇ 500 ppm. Examples 1 to 20 and Comparative Examples 1 to 8: Preheating is performed at 170 to 180 ° C.
  • Examples 21 and 22 and Comparative Example 9 Preheating is performed from 180 ° C. to 200 ° C. for 90 seconds, peak temperature of 265 ° C., 250 ° C. or more is 30 seconds or less, and the cooling rate from the peak temperature to 235 ° C. is 3 C to 8 ° C./second
  • Examples 23 and 24 and Comparative Examples 10 and 11 Preheating from 100 ° C. to 110 ° C. for 90 seconds, peak temperature 160 ° C., 150 ° C.
  • Preheating is performed at 150 to 170 ° C. for 90 seconds, peak temperatures of 220 ° C. and 210 ° C. or more. 0 seconds or less, cooling rate from peak temperature to 190 ° C. is 3 ° C. to 8 ° C./second.
  • Examples 29 to 34 Preheating is performed from 170 ° C. to 180 ° C. for 90 seconds, peak temperature is 230 ° C., 220 ° C. or more is 30 seconds.
  • the cooling rate from the peak temperature to 200 ° C. is 3 ° C.
  • a glass epoxy substrate and a chip component having a size of 2.0 mm ⁇ 1.2 mm were prepared.
  • a solder resist and an electrode (1.25 mm ⁇ 1.0 mm) corresponding to the chip component are formed on the glass epoxy substrate, and a 150 ⁇ m thick metal mask having the same pattern is used on the glass epoxy substrate.
  • Each solder paste composition and each continuous rolling paste were printed, and chip parts were mounted.
  • each glass epoxy substrate was heated in a reflow furnace (product name: TNP-538EM, manufactured by Tamura Corporation) to prepare each test substrate.
  • the reflow conditions differ depending on the composition of the solder alloy powder used in each printed solder paste composition and each continuous rolling paste. The conditions are as follows.
  • the oxygen concentration in the reflow furnace is 1500 ⁇ 500 ppm.
  • Examples 1 to 20 and Comparative Examples 1 to 8 Preheating from 170 ° C. to 190 ° C. for 110 seconds, peak temperature 260 ° C., 200 ° C. or higher for 70 seconds and 220 ° C. or higher for 60 seconds, peak temperature to 200 ° C. Cooling rate from 3 ° C. to 8 ° C./sec.
  • Examples 21 and 22 and Comparative Example 9 Preheating at 180 ° C. to 210 ° C. for 110 seconds, peak temperature 290 ° C., 230 ° C. or higher for 70 seconds and 250 ° C. or higher for 60 seconds The cooling rate from the peak temperature to 235 ° C.
  • Examples 23 and 24 and Comparative Example 10 and Comparative Example 11 Preheating at 100 ° C. to 120 ° C. for 110 seconds, peak temperature 210 ° C., 130 The cooling rate from the peak temperature to 150 ° C. is from 3 ° C. to 8 ° C./sec.
  • Examples 25 to 28 and Comparative Example 2 Preheating at 150 to 180 ° C. for 110 seconds, peak temperature 250 ° C., 190 ° C. or higher for 70 seconds and 210 ° C. or higher for 60 seconds, cooling rate from peak temperature to 190 ° C. from 3 ° C. to 8 ° C./second
  • Examples 29 to 34 Preheating at 170 to 190 ° C.
  • ⁇ Void test> Each test board is manufactured under the same conditions as the solder ball test, and the surface state is observed with an X-ray transmission device (product name: SMX-160E, manufactured by Shimadzu Corporation), and a solder joint is formed. The ratio of the total area of voids in the region (void area ratio) was measured. In addition, the generation
  • Maximum value of void area ratio is 10% or less ⁇ : Maximum value of void area ratio is more than 10% and 13% or less ⁇ : Maximum value of void area ratio is more than 13% and 20% or less ⁇ : Void area The maximum rate is over 20%
  • a chip component (Ni / Sn plating) having a size of 3.2 mm ⁇ 1.6 mm, a solder resist having a pattern capable of mounting the chip component of the size, and an electrode (1.6 mm ⁇ 1.2 mm) connecting the chip component And a 150 ⁇ m-thick metal mask having the same pattern were prepared.
  • Each solder paste composition was printed on the glass epoxy substrate using the metal mask, and the chip component was mounted on each of the solder paste compositions. Thereafter, using a reflow furnace (product name: TNP-538EM, manufactured by Tamura Seisakusho Co., Ltd.), each glass epoxy substrate is heated to solder the glass epoxy substrate and the chip component to each other electrically.
  • the reflow conditions at this time are: preheating from 170 ° C. to 190 ° C. for 110 seconds, peak temperature of 245 ° C., time of 200 ° C. or higher for 65 seconds, time of 220 ° C. or higher for 45 seconds, peak temperature to 200 ° C.
  • the cooling rate was 3 ° C. to 8 ° C./second, and the oxygen concentration was set to 1500 ⁇ 500 ppm.
  • the solder paste compositions according to Examples 1 to 34 are stabilized by using the organic acid ester (D-1) that matches the melting peak temperature of the solder alloy constituting the solder alloy powder to be used. It can be seen that continuous printability can be ensured, and stickiness of the flux residue after soldering can be suppressed while suppressing the generation of voids during reflow soldering. Moreover, since these have good wettability during reflow, the generation of solder balls can also be suppressed. Furthermore, since they can suppress the reaction between the activator (B) and the solder alloy powder even if continuous squeezing is performed, it can be seen that even the continuous rolling paste can suppress the generation of voids and solder balls.
  • D-1 organic acid ester
  • Examples 25 to 28 using the solder alloy powder containing In can exhibit a good crack growth suppressing effect due to the effect of adding In.
  • Examples 29 to 34 in which the alloy composition of the solder alloy powder is a specific element and content the generation of solder balls and voids can be sufficiently suppressed, and the In-containing solder alloy powder can be obtained without adding In. It can be seen that the crack growth suppressing effect equivalent to or higher than that in the case of using can be exhibited.
  • Such a solder paste composition can be suitably used especially for an electronic circuit board that has a severe temperature difference and requires high reliability, such as an in-vehicle electronic circuit board.
  • dioctyl sebacate did not give good results because the melting peak temperature of the solder alloy powder used was less than 295 ° C.
  • the temperature at which the weight loss rate (measured using the TG method) is 100% by mass is the melting peak temperature + 50 ° C. or lower, and stable continuous printing , The effect of suppressing the generation of voids during reflow soldering and the effect of suppressing the stickiness of the flux residue.

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Abstract

The purpose of the invention is to provide a flux composition and a solder paste composition with which it is possible to suppress the stickiness of flux residue after soldering while suppressing the creation of voids during reflow soldering. To achieve this purpose, this flux composition is a flux composition that constitutes a solder paste composition by being mixed with a solder alloy powder, the flux composition comprising (A) a base resin, (B) an activator, (C) a thixotropic agent, and (D) a solvent, and being characterized in that: the solvent (D) includes (D-1) an organic acid ester that neither includes a carboxyl group nor a hydroxyl group; the temperature at which the weight reduction rate (measured by employing the TG method) of the organic acid ester (D-1) becomes 100 mass% is at least 180°C and at most 50°C above the melting peak temperature of the solder alloy constituting the solder alloy powder; and the amount of the organic acid ester (D-1) blended is from 10 mass% to 100 mass% with respect to the total amount of the solvent (D).

Description

フラックス組成物、ソルダペースト組成物及び電子回路基板Flux composition, solder paste composition, and electronic circuit board
 本発明はフラックス組成物、ソルダペースト組成物及びこれを用いて形成されたはんだ接合体を有する電子回路基板に関する。 The present invention relates to a flux composition, a solder paste composition, and an electronic circuit board having a solder joint formed using the same.
 従来、プリント配線板やシリコンウエハといった基板上に形成される電子回路に電子部品を接合するには、フラックスとはんだ合金粉末とを混合したソルダペースト組成物を基板上に印刷し、所定の位置に電子部品を搭載してこれをリフロー炉等の加熱ではんだ接合部を形成する方法が汎用的に用いられている(以下、この方法を「リフローはんだ付法」という。)。
 リフローはんだ付法は、予め決まった形で成形されたはんだを用いたはんだ付法と比較し、形成されたはんだ接合部にボイドが発生しやすいという欠点がある。このボイドの発生の主な原因は、ソルダペースト組成物に含まれるはんだ合金粉末が溶融し凝集する際にフラックス組成物に含まれる成分、特に揮発性の溶剤が速やかに凝集するはんだから排出されないことにある。
Conventionally, in order to join an electronic component to an electronic circuit formed on a substrate such as a printed wiring board or a silicon wafer, a solder paste composition in which a flux and a solder alloy powder are mixed is printed on the substrate and is placed at a predetermined position. A method of mounting an electronic component and forming a solder joint by heating it in a reflow furnace or the like is used for general purposes (hereinafter, this method is referred to as “reflow soldering method”).
The reflow soldering method has a drawback in that voids are likely to occur in the formed solder joints, compared to a soldering method using solder formed in a predetermined shape. The main cause of this void is that when the solder alloy powder contained in the solder paste composition melts and agglomerates, the components contained in the flux composition, especially the volatile solvent, are not discharged from the agglomerated solder quickly. It is in.
 近年の電子部品の小型化に伴うパッドの微細化や電子部品の高機能化による発熱量の増加により、それまでは許容されていたボイドが部品の放熱阻害や接合信頼性の低下に影響を及ぼすようになっている。例えば、3.2mm×1.6mmサイズのチップ部品において、その電極下に直径200μmのボイドが2箇所発生した場合と直径300μmのボイドが2箇所発生した場合、ボイドが無い場合と比べてそのはんだ接合部の接合寿命はそれぞれ0.85倍、0.63倍低下することが報告されている。このようにはんだ接合部におけるボイドの発生は電子機器や電子部品の信頼性を著しく損なう虞がある。 Due to the miniaturization of pads due to the recent miniaturization of electronic components and the increase in heat generation due to the higher functionality of electronic components, previously allowed voids have an effect on the heat dissipation inhibition of components and the deterioration of bonding reliability. It is like that. For example, in a chip component having a size of 3.2 mm × 1.6 mm, when two voids having a diameter of 200 μm are generated under the electrode and when two voids having a diameter of 300 μm are generated, the solder is compared with the case where there is no void. It has been reported that the joint life of the joint is reduced by 0.85 and 0.63 times, respectively. As described above, the generation of voids in the solder joints may significantly impair the reliability of electronic devices and electronic components.
 このようなボイドの低減方法として、従来、使用するフラックス組成物に適正量の活性剤を配合し、はんだ溶融時の流動性を向上してはんだ内部に発生したガスを排出する方法が用いられていた。しかしこのような活性剤ははんだ合金粉末とフラックス組成物とを混合した時点から反応が開始し、ソルダペースト組成物の使用段階には既にその活性力がある程度消費された状態にある。従ってこの場合、特に前述のような微細化パッドを有する電子部品においてははんだ付け時の十分なぬれ性を確保することが難しく、凝集するはんだからのガスの排出は難くなる。 As a method for reducing such voids, conventionally, a method of adding an appropriate amount of an activator to the flux composition to be used and improving the fluidity at the time of melting the solder to discharge the gas generated inside the solder has been used. It was. However, such an activator starts to react at the time when the solder alloy powder and the flux composition are mixed, and the active power has already been consumed to some extent at the use stage of the solder paste composition. Accordingly, in this case, particularly in an electronic component having the above-described miniaturized pad, it is difficult to ensure sufficient wettability during soldering, and it is difficult to discharge gas from the agglomerated solder.
 これを解決する方法として、はんだ合金粉末との反応による活性力の消費分に相当する活性剤を予めフラックス組成物に配合して高活性とし、はんだ溶融時の流動性を向上する方法が挙げられる。しかし高活性のために活性剤を増量すればはんだ付後に基板上に残留するフラックス残さの絶縁性が低下するため、これにより部品端子間の短絡が起こる虞がある。 As a method for solving this problem, there is a method in which an activator corresponding to the amount of activity consumed due to the reaction with the solder alloy powder is pre-mixed in the flux composition to increase the activity and improve the fluidity at the time of melting the solder. . However, if the amount of the activator is increased for high activity, the insulation of the flux residue remaining on the substrate after soldering is lowered, which may cause a short circuit between the component terminals.
 また上述のボイドの発生を低減する他の方法として、加熱中のプリヒートの段階で完全に揮発してしまう溶剤をフラックス組成物に配合する方法が挙げられる。通常、溶剤はソルダペースト組成物を適正な粘度に調整し、その印刷性を高めるために用いられる。そのため、基板上へのソルダペースト組成物の印刷が完了すれば、溶剤は不要な成分となる。
 しかし、このような揮発し易い溶剤を用いる場合、ソルダペースト組成物がメタルマスク上で乾燥し易くなるために連続印刷の過程で増粘し、メタルマスクの開口部詰まり及び印刷抜け不良を引き起こす虞がある。
Further, as another method for reducing the generation of the above-mentioned voids, there is a method of blending a flux composition with a solvent that completely volatilizes at the stage of preheating during heating. Usually, the solvent is used to adjust the solder paste composition to an appropriate viscosity and enhance its printability. Therefore, if the printing of the solder paste composition on the substrate is completed, the solvent becomes an unnecessary component.
However, when such a volatile solvent is used, the solder paste composition is easily dried on the metal mask, so that the viscosity of the solder paste composition increases during continuous printing, which may cause clogging of the metal mask opening and defective printing. There is.
 更にはリフローはんだ付におけるボイドの発生を低減させる他の方法として、フラックスに含有される溶剤の70質量%以上をTG法による測定で減量率が15質量%になる温度(TG-15温度)がはんだの溶融ピーク温度より5℃以上高温になる溶剤を用いたソルダペーストが提案されている(特許文献1参照)。当該溶剤は、はんだが溶融するまでに気化する量が最大でも15質量%より少ない。そのためソルダペーストが完全に溶融しはんだがぬれ性を示した後にその気化が盛んとなるため、溶剤は溶融はんだから排出され易く、よってボイドの発生が抑制されるものである。
 しかしこのような溶剤は、リフロー加熱中に一部しか溶剤が気化しない場合や実質的に全く気化しない場合、溶剤以外の気化しなかったフラックス成分(例:樹脂、チクソ剤、活性剤等)と共にフラックス残さとしてはんだ接合部周辺に残留してしまう。溶剤が含まれたフラックス残さはべたつく性質を有するため大気中の埃や塵が付着し易い。このような埃等の付着したフラックス残さは絶縁性が低下するため、その信頼性を著しく損なう虞がある。
 なお、フラックス残さははんだ付後に洗浄剤による洗浄で除去することもできる。しかし近年ではコスト面、環境面等の観点から無洗浄タイプのソルダペースト組成物が広く使用されており、ボイド発生を抑制しつつフラックス残さのべたつきを抑制し得るソルダペースト組成物の重要性はますます高まっている。
Furthermore, as another method for reducing the generation of voids in reflow soldering, a temperature (TG-15 temperature) at which a weight loss rate of 15% by mass is measured by the TG method when 70% by mass or more of the solvent contained in the flux is measured. A solder paste using a solvent that is higher by 5 ° C. or more than the melting peak temperature of solder has been proposed (see Patent Document 1). The amount of the solvent vaporized before the solder melts is less than 15% by mass at the maximum. Therefore, after the solder paste is completely melted and the solder shows wettability, the vaporization thereof becomes active. Therefore, the solvent is easily discharged from the molten solder, and thus generation of voids is suppressed.
However, such a solvent may be used together with a flux component (eg, resin, thixotropic agent, activator, etc.) other than the solvent when only a part of the solvent is vaporized during reflow heating or when it is not substantially vaporized at all. As a flux residue, it remains around the solder joint. Since the flux residue containing the solvent has a sticky property, dust and dust in the atmosphere are likely to adhere. Such a residue of flux adhered with dust or the like is deteriorated in insulation, so that its reliability may be significantly impaired.
The flux residue can also be removed by cleaning with a cleaning agent after soldering. However, in recent years, non-cleaning type solder paste compositions have been widely used from the viewpoint of cost, environment, etc., and the importance of solder paste compositions that can suppress the stickiness of flux residue while suppressing the generation of voids is increasing. Increasingly.
特許第4458043号公報Japanese Patent No. 4458043
 本発明は上記課題を解決するものであり、特にリフローはんだ付時のボイド発生を抑制しつつはんだ付後のフラックス残さのべとつきを抑制し得るフラックス組成物及びソルダペースト組成物を提供することをその目的とする。 The present invention solves the above problems, and in particular, provides a flux composition and a solder paste composition capable of suppressing the stickiness of the flux residue after soldering while suppressing the generation of voids during reflow soldering. Objective.
(1)本発明のフラックス組成物は、はんだ合金粉末と混合してソルダペースト組成物を構成するものであり、(A)ベース樹脂と、(B)活性剤と、(C)チクソ剤と、(D)溶剤とを含み、前記溶剤(D)として(D-1)カルボキシル基及びヒドロキシル基のいずれをも有さない有機酸エステルを含み、前記有機酸エステル(D-1)の減量率(TG法を用いて測定)が100質量%となる温度は180℃以上且つ前記はんだ合金粉末を構成するはんだ合金の溶融ピーク温度+50℃以下であり、前記有機酸エステル(D-1)の配合量は前記溶剤(D)全量に対して10質量%から100質量%であることをその特徴とする。 (1) The flux composition of the present invention constitutes a solder paste composition by mixing with a solder alloy powder, and (A) a base resin, (B) an activator, (C) a thixotropic agent, (D) a solvent, and the solvent (D) includes (D-1) an organic acid ester having neither a carboxyl group nor a hydroxyl group, and the weight loss rate of the organic acid ester (D-1) ( The temperature at which 100% by mass (measured using the TG method) is 180 ° C. or higher and the melting peak temperature of the solder alloy constituting the solder alloy powder is + 50 ° C. or lower, and the blending amount of the organic acid ester (D-1) Is characterized in that it is 10% by mass to 100% by mass with respect to the total amount of the solvent (D).
(2)上記(1)に記載の構成にあって、前記はんだ合金粉末を構成するはんだ合金の溶融ピーク温度が130℃以上175℃未満の場合における前記有機酸エステル(D-1)の減量率(TG法を用いて測定)が100質量%となる温度は180℃以上且つ225℃未満であることをその特徴とする。 (2) The weight loss rate of the organic acid ester (D-1) when the melting peak temperature of the solder alloy constituting the solder alloy powder is 130 ° C. or higher and lower than 175 ° C. The temperature at which 100% by mass (measured using the TG method) is 180 ° C. or higher and lower than 225 ° C. is a feature thereof.
(3)上記(1)に記載の構成にあって、前記はんだ合金粉末を構成するはんだ合金の溶融ピーク温度が175℃以上200℃未満の場合における前記有機酸エステル(D-1)の減量率(TG法を用いて測定)が100質量%となる温度は180℃以上且つ250℃未満であることをその特徴とする。 (3) The weight loss rate of the organic acid ester (D-1) when the melting peak temperature of the solder alloy constituting the solder alloy powder is 175 ° C. or higher and lower than 200 ° C. The temperature at which 100% by mass (measured using the TG method) is 180 ° C. or more and less than 250 ° C. is a feature thereof.
(4)上記(1)に記載の構成にあって、前記はんだ合金粉末を構成するはんだ合金の溶融ピーク温度が200℃以上の場合における前記有機酸エステル(D-1)の減量率(TG法を用いて測定)が100質量%となる温度は180℃以上且つ前記溶融ピーク温度+50℃以下であることをその特徴とする。 (4) The weight loss rate of the organic acid ester (D-1) when the melting peak temperature of the solder alloy constituting the solder alloy powder is 200 ° C. or higher (TG method) The temperature at which the measurement becomes 100% by mass is 180 ° C. or higher and the melting peak temperature + 50 ° C. or lower.
(5)上記(2)に記載の構成にあって、前記有機酸エステル(D-1)はアジピン酸ジメチル及びマレイン酸ジブチルの少なくとも一方であることをその特徴とする。 (5) In the constitution described in (2) above, the organic acid ester (D-1) is characterized in that it is at least one of dimethyl adipate and dibutyl maleate.
(6)上記(3)に記載の構成にあって、前記有機酸エステル(D-1)はアジピン酸ジメチル、アジピン酸ジイソプロピル、マレイン酸ジブチル、セバシン酸ジメチル、アジピン酸ジイソブチル及びセバシン酸ジエチルから選ばれる少なくとも1種であることをその特徴とする。 (6) In the constitution described in (3) above, the organic acid ester (D-1) is selected from dimethyl adipate, diisopropyl adipate, dibutyl maleate, dimethyl sebacate, diisobutyl adipate and diethyl sebacate It is characterized by being at least one kind.
(7)上記(4)に記載の構成にあって、前記有機酸エステル(D-1)はアジピン酸ジメチル、アジピン酸ジイソプロピル、マレイン酸ジブチル、セバシン酸ジメチル、アジピン酸ジイソブチル、セバシン酸ジエチル、セバシン酸ジイソプロピル、セバシン酸ジブチル及びセバシン酸ジオクチルから選ばれる少なくとも1種であることをその特徴とする。 (7) In the constitution described in (4) above, the organic acid ester (D-1) is dimethyl adipate, diisopropyl adipate, dibutyl maleate, dimethyl sebacate, diisobutyl adipate, diethyl sebacate, sebacin It is characterized by being at least one selected from diisopropyl acid, dibutyl sebacate and dioctyl sebacate.
(8)上記(1)から(7)のいずれか1に記載の構成にあって、前記ベース樹脂(A)は(A-1)ロジン系樹脂及び(A-2)合成樹脂の少なくとも一方を含み、前記合成樹脂(A-2)はアクリル樹脂、スチレン-マレイン酸樹脂、エポキシ樹脂、ウレタン樹脂、ポリエステル樹脂、フェノキシ樹脂、テルペン樹脂、ポリアルキレンカーボネート及びカルボキシル基を有するロジン系樹脂とダイマー酸誘導体柔軟性アルコール化合物とを脱水縮合してなる誘導体化合物からなる群より選択される少なくとも1種であることをその特徴とする。 (8) In the constitution described in any one of (1) to (7) above, the base resin (A) comprises at least one of (A-1) rosin resin and (A-2) synthetic resin. The synthetic resin (A-2) is acrylic resin, styrene-maleic acid resin, epoxy resin, urethane resin, polyester resin, phenoxy resin, terpene resin, polyalkylene carbonate, rosin resin having carboxyl group and dimer acid derivative It is characterized by being at least one selected from the group consisting of derivative compounds obtained by dehydration condensation with a flexible alcohol compound.
(9)本発明のソルダペースト組成物は、上記(1)から(8)のいずれか1に記載のフラックス組成物と、はんだ合金粉末とを含むことをその特徴とする。 (9) The solder paste composition of the present invention is characterized by including the flux composition according to any one of (1) to (8) above and a solder alloy powder.
(10)上記(9)に記載の構成にあって、前記はんだ合金粉末はAgを2質量%以上3.1質量%以下と、Cuを0質量%超1質量%以下と、Sbを1質量%以上5質量%以下と、Biを0.5質量%以上4.5質量%以下と、Niを0.01質量%以上0.25質量%以下含み、残部がSnからなることをその特徴とする。 (10) In the configuration described in (9) above, the solder alloy powder has an Ag content of 2% by mass to 3.1% by mass, Cu of more than 0% by mass and 1% by mass or less, and Sb of 1% by mass. % To 5% by mass, Bi from 0.5% to 4.5% by mass, Ni from 0.01% to 0.25% by mass, with the balance being Sn. To do.
(11)上記(10)に記載の構成にあって、前記はんだ合金粉末は更にCoを0.001質量%以上0.25質量%以下含むことをその特徴とする。 (11) In the configuration described in (10) above, the solder alloy powder further includes Co in an amount of 0.001% by mass to 0.25% by mass.
(12)本発明の電子回路基板は、上記(9)から(11)のいずれか1に記載のソルダペースト組成物を用いて形成されたはんだ接合体を有することをその特徴とする。 (12) The electronic circuit board of the present invention is characterized by having a solder joint formed using the solder paste composition according to any one of (9) to (11) above.
 本発明によれば、特にリフローはんだ付時のボイド発生を抑制しつつはんだ付後のフラックス残さのべとつきを抑制し得るフラックス組成物及びソルダペースト組成物を提供することができる。 According to the present invention, it is possible to provide a flux composition and a solder paste composition that can suppress the stickiness of the flux residue after soldering while suppressing the generation of voids particularly during reflow soldering.
 本発明のフラックス組成物、ソルダペースト組成物及び電子回路基板の一実施形態を以下に詳述する。なお、本発明がこれらの実施形態に限定されないのはもとよりである。 Embodiments of the flux composition, solder paste composition and electronic circuit board of the present invention are described in detail below. Of course, the present invention is not limited to these embodiments.
(1)フラックス組成物
 本実施形態のフラックス組成物は、(A)ベース樹脂と、(B)活性剤と、(C)チクソ剤と、(D)溶剤とを含む。
(1) Flux composition The flux composition of this embodiment contains (A) base resin, (B) activator, (C) thixotropic agent, and (D) solvent.
(A)ベース樹脂
 前記ベース樹脂(A)としては、例えば(A-1)ロジン系樹脂及び(A-2)合成樹脂の少なくとも一方を用いることが好ましい。
(A) Base Resin As the base resin (A), for example, it is preferable to use at least one of (A-1) rosin resin and (A-2) synthetic resin.
 前記ロジン系樹脂(A-1)としては、例えばトール油ロジン、ガムロジン、ウッドロジン等のロジン;ロジンを重合化、水添化、不均一化、アクリル化、マレイン化、エステル化若しくはフェノール付加反応等を行ったロジン誘導体;これらロジンまたはロジン誘導体と不飽和カルボン酸(アクリル酸、メタクリル酸、無水マレイン酸、フマル酸等)とをディールス・アルダー反応させて得られる変性ロジン樹脂等が挙げられる。これらの中でも特に変性ロジン樹脂が好ましく用いられ、アクリル酸を反応させて水素添加した水添アクリル酸変性ロジン樹脂が特に好ましく用いられる。なおこれらは1種単独でまたは複数種を混合して用いてもよい。 Examples of the rosin resin (A-1) include rosins such as tall oil rosin, gum rosin, and wood rosin; polymerization, hydrogenation, heterogeneity, acrylation, maleation, esterification, or phenol addition reaction of rosin. And a modified rosin resin obtained by subjecting these rosin or rosin derivative and an unsaturated carboxylic acid (acrylic acid, methacrylic acid, maleic anhydride, fumaric acid, etc.) to a Diels-Alder reaction. Among these, a modified rosin resin is particularly preferably used, and a hydrogenated acrylic acid-modified rosin resin hydrogenated by reacting acrylic acid is particularly preferably used. In addition, you may use these individually by 1 type or in mixture of multiple types.
 なお前記ロジン系樹脂(A-1)の酸価は140mgKOH/gから350mgKOH/gであることが好ましく、その重量平均分子量は200Mwから1,000Mwであることが好ましい。 The acid value of the rosin resin (A-1) is preferably 140 mgKOH / g to 350 mgKOH / g, and its weight average molecular weight is preferably 200 Mw to 1,000 Mw.
 前記合成樹脂(A-2)としては、例えばアクリル樹脂、スチレン-マレイン酸樹脂、エポキシ樹脂、ウレタン樹脂、ポリエステル樹脂、フェノキシ樹脂、テルペン樹脂、ポリアルキレンカーボネート及びカルボキシル基を有するロジン系樹脂とダイマー酸誘導体柔軟性アルコール化合物とを脱水縮合してなる誘導体化合物が挙げられる。なおこれらは1種単独でまたは複数種を混合して用いてもよい。 Examples of the synthetic resin (A-2) include acrylic resin, styrene-maleic acid resin, epoxy resin, urethane resin, polyester resin, phenoxy resin, terpene resin, polyalkylene carbonate, rosin resin having a carboxyl group, and dimer acid. Derivative compounds formed by dehydration condensation with a derivative flexible alcohol compound are exemplified. In addition, you may use these individually by 1 type or in mixture of multiple types.
 前記アクリル樹脂は、例えば炭素数1から20のアルキル基を有する(メタ)アクリレートを単重合、または当該アクリレートを主成分とするモノマーを共重合することにより得られる。このようなアクリル樹脂の中でも、特にメタクリル酸と炭素鎖が直鎖状である炭素数2から20の飽和アルキル基を2つ有するモノマーを含むモノマー類とを重合して得られるアクリル樹脂が好ましく用いられる。なお当該アクリル樹脂は、1種単独でまたは複数種を混合して用いてもよい。 The acrylic resin can be obtained by, for example, homopolymerizing (meth) acrylate having an alkyl group having 1 to 20 carbon atoms or copolymerizing a monomer having the acrylate as a main component. Among such acrylic resins, acrylic resins obtained by polymerizing methacrylic acid and monomers containing two saturated alkyl groups having 2 to 20 carbon atoms in which the carbon chain is linear are preferably used. It is done. In addition, you may use the said acrylic resin individually by 1 type or in mixture of multiple types.
 前記エポキシ樹脂としては、その末端に反応性のエポキシ基を有する熱硬化型の樹脂であればいずれも使用することができ、例えばビスフェノールA型、ビスフェノールF型、ビスフェノールS型、ビフェニル型、ナフタレン型、クレゾールノボラック型、フェノールノボラック型、臭素化ビスフェノールA型、水添ビスフェノールA型、ビスフェノールAF型、フルオレン型、グリシジルエーテル型、グリシジルエステル型、グリシジルアミン型、脂環型エポキシ樹脂等が挙げられる。なおこれらは1種単独でまたは複数種を混合して用いてもよい。 As the epoxy resin, any thermosetting resin having a reactive epoxy group at its end can be used, for example, bisphenol A type, bisphenol F type, bisphenol S type, biphenyl type, naphthalene type. Cresol novolak type, phenol novolak type, brominated bisphenol A type, hydrogenated bisphenol A type, bisphenol AF type, fluorene type, glycidyl ether type, glycidyl ester type, glycidyl amine type, alicyclic epoxy resin and the like. In addition, you may use these individually by 1 type or in mixture of multiple types.
 前記ウレタン樹脂としては、例えば1分子中に複数のイソシアネート基を有する化合物と1分子中に2つ以上のヒドロキシル基を有するポリオール化合物を反応させて得られるものであればいずれも使用することができ、その中でも特に脂肪族成分、芳香族成分を含むポリウレタン樹脂が好ましく用いられる。なお当該ウレタン樹脂は1種単独でまたは複数種を混合して用いてもよい。 Any urethane resin can be used as long as it is obtained by reacting a compound having a plurality of isocyanate groups in one molecule with a polyol compound having two or more hydroxyl groups in one molecule. Of these, polyurethane resins containing an aliphatic component and an aromatic component are particularly preferred. The urethane resin may be used alone or in combination of two or more.
 前記ポリエステル樹脂としては、例えばポリエチレンテレフタレート、ポリトリメチレンテレフタレート、ポリブチレンテレフタレート、ポリエチレンナフタレート、ポリブチレンナフタレート等が挙げられる。なおこれらは1種単独でまたは複数種を混合して用いてもよい。 Examples of the polyester resin include polyethylene terephthalate, polytrimethylene terephthalate, polybutylene terephthalate, polyethylene naphthalate, and polybutylene naphthalate. In addition, you may use these individually by 1 type or in mixture of multiple types.
 前記フェノキシ樹脂としては、例えばビスフェノールA型フェノキシ樹脂、ビスフェノールF型フェノキシ樹脂等が挙げられる。なおこれらは1種単独でまたは複数種を混合して用いてもよい。 Examples of the phenoxy resin include bisphenol A type phenoxy resin and bisphenol F type phenoxy resin. In addition, you may use these individually by 1 type or in mixture of multiple types.
 前記ポリアルキレンカーボネートとしては、例えば、ポリエチレンカーボネート、ポリプロピレンカーボネート、ポリブテンカーボネート、ポリイソブテンカーボネート、ポリペンテンカーボネート、ポリヘキセンカーボネート、ポリシクロペンテンカーボネート、ポリシクロヘキセンカーボネート、ポリシクロヘプテンカーボネート、ポリシクロオクテンカーボネート、ポリリモネンカーボネート等をポリプロピレンカーボネート、ポリブチレンカーボネート等が挙げられる。なおこれらは1種単独でまたは複数種を混合して用いてもよい。 Examples of the polyalkylene carbonate include polyethylene carbonate, polypropylene carbonate, polybutene carbonate, polyisobutene carbonate, polypentene carbonate, polyhexene carbonate, polycyclopentene carbonate, polycyclohexene carbonate, polycycloheptene carbonate, polycyclooctene carbonate, and polylimonene. Examples of the carbonate include polypropylene carbonate and polybutylene carbonate. In addition, you may use these individually by 1 type or in mixture of multiple types.
 前記カルボキシル基を有するロジン系樹脂とダイマー酸誘導体柔軟性アルコール化合物とを脱水縮合してなる誘導体化合物(以下、「ロジン誘導体化合物」という。)について、先ずカルボキシル基を有するロジン系樹脂としては、例えばトール油ロジン、ガムロジン、ウッドロジン等のロジン;水添ロジン、重合ロジン、不均一化ロジン、アクリル酸変性ロジン、マレイン酸変性ロジン等のロジン誘導体等が挙げられ、これら以外にもカルボキシル基を有するロジンであれば使用することができる。またこれらは1種単独でまたは複数種を混合して用いてもよい。
 次に前記ダイマー酸誘導体柔軟性アルコール化合物としては、例えばダイマージオール、ポリエステルポリオール、ポリエステルダイマージオールのようなダイマー酸から誘導される化合物であって、その末端にアルコール基を有するもの等が挙げられ、例えばPRIPOL2033、PRIPLAST3197、PRIPLAST1838(以上、クローダジャパン(株)製)等を用いることができる。
 前記ロジン誘導体化合物は、前記カルボキシル基を有するロジン系樹脂と前記ダイマー酸誘導体柔軟性アルコール化合物とを脱水縮合することにより得られる。この脱水縮合の方法としては一般的に用いられる方法を使用することができる。また、前記カルボキシル基を有するロジン系樹脂と前記ダイマー酸誘導体柔軟性アルコール化合物とを脱水縮合する際の好ましい重量比率は、それぞれ25:75から75:25である。
Regarding a derivative compound obtained by dehydrating and condensing the rosin resin having a carboxyl group and a dimer acid derivative flexible alcohol compound (hereinafter referred to as “rosin derivative compound”), as the rosin resin having a carboxyl group, for example, Rosin such as tall oil rosin, gum rosin, wood rosin; hydrogenated rosin, polymerized rosin, heterogeneous rosin, acrylic acid modified rosin, rosin derivatives such as maleic acid modified rosin, etc. Can be used. These may be used alone or in combination of two or more.
Next, examples of the dimer acid derivative flexible alcohol compound include compounds derived from dimer acid such as dimer diol, polyester polyol, and polyester dimer diol, and those having an alcohol group at the terminal thereof. For example, PRIPOL 2033, PRIPLAST 3197, PRIPLAST 1838 (manufactured by Croda Japan Co., Ltd.) and the like can be used.
The rosin derivative compound is obtained by dehydrating and condensing the rosin resin having a carboxyl group and the dimer acid derivative flexible alcohol compound. As the dehydration condensation method, a generally used method can be used. In addition, a preferred weight ratio when dehydrating and condensing the rosin resin having a carboxyl group and the dimer acid derivative flexible alcohol compound is 25:75 to 75:25, respectively.
 前記合成樹脂(A-2)の酸価は0mgKOH/gから150mgKOH/gであることが好ましく、その重量平均分子量は1,000Mwから30,000Mwであることが好ましい The acid value of the synthetic resin (A-2) is preferably 0 mgKOH / g to 150 mgKOH / g, and the weight average molecular weight is preferably 1,000 Mw to 30,000 Mw.
 また前記ベース樹脂(A)の配合量は、フラックス組成物全量に対して10質量%以上60質量%以下であることが好ましく、30質量%以上55質量%以下であることがより好ましい。
 前記ロジン系樹脂(A-1)を単独で用いる場合、その配合量はフラックス組成物全量に対して10質量%以上50質量%以下であることが好ましく、15質量%以上45質量%以下であることが更に好ましい。ロジン系樹脂(A-1)の配合量をこの範囲とすることで、良好なはんだ付性及び適度なフラックス残さ量とすることができる。
 また前記合成樹脂(A-2)を単独で用いる場合、その配合量はフラックス組成物全量に対して10質量%以上60質量%以下であることが好ましく、15質量%以上50質量%以下であることがより好ましい。
Further, the blending amount of the base resin (A) is preferably 10% by mass or more and 60% by mass or less, and more preferably 30% by mass or more and 55% by mass or less with respect to the total amount of the flux composition.
When the rosin resin (A-1) is used alone, the blending amount is preferably 10% by mass or more and 50% by mass or less, and 15% by mass or more and 45% by mass or less with respect to the total amount of the flux composition. More preferably. By setting the blending amount of the rosin resin (A-1) within this range, it is possible to obtain good solderability and an appropriate flux residual amount.
When the synthetic resin (A-2) is used alone, the blending amount is preferably 10% by mass or more and 60% by mass or less, and more preferably 15% by mass or more and 50% by mass or less with respect to the total amount of the flux composition. It is more preferable.
 更に前記ロジン系樹脂(A-1)と前記合成樹脂(A-2)とを併用する場合、その配合比率は20:80から50:50であることが好ましく、25:75から40:60であることがより好ましい。 Further, when the rosin resin (A-1) and the synthetic resin (A-2) are used in combination, the blending ratio is preferably 20:80 to 50:50, and 25:75 to 40:60. More preferably.
(B)活性剤
 前記活性剤(B)としては、例えばカルボン酸類、ハロゲンを含む化合物等が挙げられる。これらは1種単独でまたは複数種を混合して用いてもよい。
(B) Activator Examples of the activator (B) include carboxylic acids and halogen-containing compounds. You may use these individually by 1 type or in mixture of multiple types.
 前記カルボン酸類としては、例えばモノカルボン酸、ジカルボン酸等並びにその他の有機酸が挙げられる。
 前記モノカルボン酸としては、例えばプロピオン酸、酪酸、吉草酸、カプロン酸、エナント酸、カプリン酸、ラウリル酸、ミリスチン酸、ペンタデシル酸、パルミチン酸、マルガリン酸、ステアリン酸、ツベルクロステアリン酸、アラキジン酸、ベヘン酸、リグノセリン酸、グリコール酸等が挙げられる。
 ジカルボン酸としては、シュウ酸、マロン酸、コハク酸、グルタル酸、アジピン酸、ピメリン酸、スベリン酸、アゼライン酸、セバシン酸、フマル酸、マレイン酸、酒石酸、ジグリコール酸等が挙げられる。
 また前記その他の有機酸としては、ダイマー酸、レブリン酸、乳酸、アクリル酸、安息香酸、サリチル酸、アニス酸、クエン酸、ピコリン酸等が挙げられる。
 なおこれらは1種単独でまたは複数種を混合して用いてもよい。
Examples of the carboxylic acids include monocarboxylic acids, dicarboxylic acids, and other organic acids.
Examples of the monocarboxylic acid include propionic acid, butyric acid, valeric acid, caproic acid, enanthic acid, capric acid, lauric acid, myristic acid, pentadecylic acid, palmitic acid, margaric acid, stearic acid, tuberculostearic acid, arachidic acid , Behenic acid, lignoceric acid, glycolic acid and the like.
Examples of the dicarboxylic acid include oxalic acid, malonic acid, succinic acid, glutaric acid, adipic acid, pimelic acid, suberic acid, azelaic acid, sebacic acid, fumaric acid, maleic acid, tartaric acid, diglycolic acid and the like.
Examples of the other organic acids include dimer acid, levulinic acid, lactic acid, acrylic acid, benzoic acid, salicylic acid, anisic acid, citric acid, and picolinic acid.
In addition, you may use these individually by 1 type or in mixture of multiple types.
 前記ハロゲンを含む化合物としては、例えば非解離性のハロゲン化合物(非解離型活性剤)、解離性のハロゲン化合物(解離型活性剤)が挙げられる。
 前記非解離型活性剤としては、ハロゲン原子が共有結合により結合した非塩系の有機化合物が挙げられ、例えば塩素化物、臭素化物、ヨウ素化物、フッ化物のように塩素、臭素、ヨウ素、フッ素の各単独元素の共有結合による化合物でもよく、またこの2以上の異なるハロゲン原子を共有結合で結合する化合物でもよい。当該化合物は水性溶媒に対する溶解性を向上させるために、例えばハロゲン化アルコールのように水酸基等の極性基を有することが好ましい。当該ハロゲン化アルコールとしては、例えば2,3-ジブロモプロパノール、2,3-ジブロモブタンジオール、1,4-ジブロモ-2-ブタノール、トリブロモネオペンチルアルコール等の臭素化アルコール;1,3-ジクロロ-2-プロパノール、1,4-ジクロロ-2-ブタノール等の塩素化アルコール;3-フルオロカテコール等のフッ素化アルコール;その他のこれらに類する化合物が挙げられる。
Examples of the halogen-containing compound include a non-dissociative halogen compound (non-dissociative activator) and a dissociative halogen compound (dissociative activator).
Examples of the non-dissociative activator include non-salt organic compounds in which halogen atoms are covalently bonded. For example, chlorine, bromine, iodine, fluorine such as chlorinated compounds, brominated compounds, iodinated compounds, and fluorides. The compound may be a compound by covalent bonding of each single element, or a compound in which two or more different halogen atoms are bonded by a covalent bond. In order to improve the solubility in an aqueous solvent, the compound preferably has a polar group such as a hydroxyl group such as a halogenated alcohol. Examples of the halogenated alcohol include brominated alcohols such as 2,3-dibromopropanol, 2,3-dibromobutanediol, 1,4-dibromo-2-butanol, and tribromoneopentyl alcohol; 1,3-dichloro- Examples include chlorinated alcohols such as 2-propanol and 1,4-dichloro-2-butanol; fluorinated alcohols such as 3-fluorocatechol; and other similar compounds.
 また前記解離型活性剤としては、例えばアミン、イミダゾール等の塩基の塩化水素酸塩及び臭化水素酸塩が挙げられる。塩化水素酸及び臭化水素酸の塩の一例としては、メチルアミン、ジメチルアミン、トリメチルアミン、エチルアミン、ジエチルアミン、トリエチルアミン、n-プロピルアミン、ジ-n-プロピルアミン、トリ-n-プロピルアミン、イソプロピルアミン、ジイソプロピルアミン、ブチルアミン、ジブチルアミン、トリブチルアミン、シクロヘキシルアミン、モノエタノールアミン、ジエタノールアミン、トリエタノールアミン等の比較的炭素数の小さいアミン;イミダゾール、2-メチルイミダゾール、2-エチルイミダゾール、2-メチル-4-メチルイミダゾール、2-メチル-4-エチルイミダゾール、2-エチル-4-エチルイミダゾール、2-プロピルイミダゾール、2-プロピル-4-プロピルイミダゾール等の塩化水素酸塩及び臭化水素酸塩等が挙げられる。これらは1種単独でまたは複数種を混合して用いてもよい。 Examples of the dissociative activator include base hydrochlorides and hydrobromides such as amines and imidazoles. Examples of hydrochloric acid and hydrobromic acid salts include methylamine, dimethylamine, trimethylamine, ethylamine, diethylamine, triethylamine, n-propylamine, di-n-propylamine, tri-n-propylamine, isopropylamine , Diisopropylamine, butylamine, dibutylamine, tributylamine, cyclohexylamine, monoethanolamine, diethanolamine, triethanolamine and other amines with relatively small carbon numbers; imidazole, 2-methylimidazole, 2-ethylimidazole, 2-methyl- Hydrochloric acid salts such as 4-methylimidazole, 2-methyl-4-ethylimidazole, 2-ethyl-4-ethylimidazole, 2-propylimidazole, 2-propyl-4-propylimidazole Fine hydrobromic acid salts, and the like. You may use these individually by 1 type or in mixture of multiple types.
 前記活性剤(B)の配合量は、フラックス組成物全量に対して0.1質量%以上30質量%以上であることが好ましく、2質量%以上25質量%以下であることがより好ましい。 The blending amount of the activator (B) is preferably 0.1% by mass or more and 30% by mass or more, and more preferably 2% by mass or more and 25% by mass or less with respect to the total amount of the flux composition.
 前記活性剤(B)に使用される前記カルボン酸類の配合量は、フラックス組成物全量に対して1質量%以上25質量%以下であることが好ましく、5質量%以上15質量%以下であることがより好ましい。カルボン酸類の配合量をこの範囲とすることで、ソルダボール発生抑制及び良好なフラックス組成物の絶縁性を発揮することができる。 The blending amount of the carboxylic acids used in the activator (B) is preferably 1% by mass or more and 25% by mass or less, and preferably 5% by mass or more and 15% by mass or less based on the total amount of the flux composition. Is more preferable. By making the compounding quantity of carboxylic acid into this range, solder ball generation | occurrence | production suppression and the insulation of a favorable flux composition can be exhibited.
 また前記活性剤(B)に使用される前記非解離型活性剤の配合量は、フラックス組成物全量に対して0.1質量%以上5質量%以下であることが好ましく、0.5質量%以上3質量%以下であることがより好ましい。 The blending amount of the non-dissociative activator used in the activator (B) is preferably 0.1% by mass or more and 5% by mass or less, and 0.5% by mass with respect to the total amount of the flux composition. The content is more preferably 3% by mass or less.
 次に前記活性剤(B)に使用される前記解離型活性剤の配合量は、フラックス組成物全量に対して0.1質量%以上3質量%以下であることが好ましく、0.3質量%以上1.5質量%以下であることがより好ましい。 Next, the blending amount of the dissociative activator used in the activator (B) is preferably 0.1% by mass or more and 3% by mass or less based on the total amount of the flux composition, and is 0.3% by mass. More preferably, it is 1.5 mass% or less.
 更に前記解離型活性剤として前記アミン及びイミダゾールをそれぞれ単体で用いる場合、その配合量はそれぞれ0.1質量%以上5質量%以下であることが好ましく、0.5質量%以上3質量%以下であることがより好ましい。 Further, when the amine and imidazole are each used alone as the dissociative activator, the blending amount is preferably 0.1% by mass or more and 5% by mass or less, and 0.5% by mass or more and 3% by mass or less. More preferably.
(C)チクソ剤
 前記チクソ剤(C)としては、例えば水素添加ヒマシ油、飽和脂肪酸アミド、飽和脂肪酸ビスアミド類、オキシ脂肪酸類、ジベンジリデンソルビトール類等が挙げられる。これらは1種単独でまたは複数種を混合して用いてもよい。
 また前記増粘剤の配合量は、フラックス全量に対して1質量%以上15質量%以下であることが好ましく、3質量%以上10質量%以下であることがより好ましい。
(C) Thixotropic agent Examples of the thixotropic agent (C) include hydrogenated castor oil, saturated fatty acid amides, saturated fatty acid bisamides, oxy fatty acids, dibenzylidene sorbitols, and the like. You may use these individually by 1 type or in mixture of multiple types.
Further, the blending amount of the thickener is preferably 1% by mass or more and 15% by mass or less, and more preferably 3% by mass or more and 10% by mass or less with respect to the total amount of the flux.
(D)溶剤
 前記溶剤(D)としては、例えばイソプロピルアルコール、エタノール、アセトン、トルエン、キシレン、酢酸エチル、エチルセロソルブ、ブチルセロソルブ、ヘキシルジグリコール、(2-エチルヘキシル)ジグリコール、フェニルグリコール、ブチルカルビトール、オクタンジオール、αテルピネオール、βテルピネオール、テトラエチレングリコールジメチルエーテル、トリメリット酸トリス(2-エチルヘキシル)、セバシン酸ビスイソプロピル等を使用することができる。これらは1種単独でまたは複数種を混合して用いてもよい。
(D) Solvent Examples of the solvent (D) include isopropyl alcohol, ethanol, acetone, toluene, xylene, ethyl acetate, ethyl cellosolve, butyl cellosolve, hexyl diglycol, (2-ethylhexyl) diglycol, phenyl glycol, butyl carbitol. , Octanediol, α-terpineol, β-terpineol, tetraethylene glycol dimethyl ether, trimellitic acid tris (2-ethylhexyl), bisisopropyl sebacate and the like can be used. You may use these individually by 1 type or in mixture of multiple types.
 本実施形態のフラックス組成物においては、前記溶剤(D)として(D-1)カルボキシル基及びヒドロキシル基のいずれをも有さない有機酸エステルを含むことが好ましい。
 フラックス組成物に用いられる溶剤としては、カルボキシル基及びヒドロキシル基のいずれかを含む成分を用いるのが一般的である。フラックス組成物の成分のうち活性剤はこのような溶剤に溶解するに際して電離し、これにより負電荷を有する有機酸イオン(RCOO-)やハロゲン化物イオンが発生する。上記カルボキシル基及びヒドロキシル基はこのイオンの周囲に配向され易く、その結果これらが溶媒和され、はんだ合金粉末と溶剤との反応が起こる。
 しかし前記有機酸エステル(D-1)は上記カルボキシル基及びヒドロキシル基のいずれをも有さないため、本実施形態のフラックス組成物においては活性剤(B)から電離したイオンに配向し易い官能基がなく、よってこれらは溶媒和され難い。そのため、本実施形態のフラックス組成物を用いたソルダペースト組成物は、非加熱の保管状態におけるはんだ合金粉末と活性剤との反応を抑制し得る。
 このように前記有機酸エステル(D-1)を含むフラックス組成物はソルダペースト組成物の保管中におけるはんだ合金粉末と活性剤(B)との反応を抑制し得るため、活性剤(B)の活性度や配合量を調整せずともその活性力は残存され、はんだ付け時における良好なぬれ性を確保し、ボイドの発生を抑制することができる。
 なお、仮に基板上に形成されたフラックス残さに前記有機酸エステル(D-1)が残存したとしても、当該有機酸エステル(D-1)は上述の通りカルボキシル基及びヒドロキシル基のいずれをも有さないためにフラックス残さの吸湿性を抑制し得るため、そのフラックス残さの絶縁性には影響を及ぼし難いと考えられる。
In the flux composition of this embodiment, the solvent (D) preferably contains (D-1) an organic acid ester having neither a carboxyl group nor a hydroxyl group.
As a solvent used for the flux composition, a component containing either a carboxyl group or a hydroxyl group is generally used. Among the components of the flux composition, the activator is ionized when dissolved in such a solvent, thereby generating negatively charged organic acid ions (RCOO-) and halide ions. The carboxyl group and hydroxyl group are easily oriented around this ion, and as a result, they are solvated and a reaction between the solder alloy powder and the solvent occurs.
However, since the organic acid ester (D-1) does not have any of the above carboxyl group and hydroxyl group, in the flux composition of this embodiment, a functional group that is easily oriented to ions ionized from the activator (B). Therefore, they are difficult to solvate. Therefore, the solder paste composition using the flux composition of the present embodiment can suppress the reaction between the solder alloy powder and the activator in an unheated storage state.
Thus, since the flux composition containing the organic acid ester (D-1) can suppress the reaction between the solder alloy powder and the activator (B) during storage of the solder paste composition, the activator (B) The activity remains without adjusting the activity and blending amount, ensuring good wettability during soldering and suppressing the generation of voids.
Even if the organic acid ester (D-1) remains in the flux residue formed on the substrate, the organic acid ester (D-1) has both a carboxyl group and a hydroxyl group as described above. Therefore, the hygroscopicity of the flux residue can be suppressed, and it is considered that the insulation of the flux residue is hardly affected.
 また前記有機酸エステル(D-1)の減量率(TG法を用いて測定。具体的には、熱重量測定-示唆熱分析装置を用いてTG曲線を測定し、これにより減量率を算出する。以下同じ。)が100質量%となる温度は180℃以上且つ前記はんだ合金を構成するはんだ合金の溶融ピーク温度+50℃以下であることが好ましい。このような有機酸エステル(D-1)は基板上に形成されるフラックス残さのべたつきを抑制し得るため、当該フラックス残さに良好な絶縁性を付与することができる。
 即ち、ソルダペースト組成物の一般的なリフロー加熱条件は、本加熱のピーク温度をはんだの溶融ピーク温度より更に10℃から50℃高い温度になるように設定することが多い。
 本発明者等は鋭意研究の結果、フラックス組成物に前記溶剤(D)として180℃以上且つ使用するはんだ合金の溶融ピーク温度より50℃以内の高い温度で減量率が100質量%となる前記有機酸エステル(D-1)を配合することにより、印刷時におけるメタルマスク上での乾燥が発生し難くなり、安定した連続印刷性を確保でき、また上記リフロー加熱条件でのボイド発生を抑制しつつ、更に形成されたフラックス残さのべたつきを抑制し得ることが分かった。
The weight loss rate of the organic acid ester (D-1) (measured using the TG method. Specifically, the TG curve was measured using a thermogravimetric-suggested thermal analyzer, and the weight loss rate was calculated thereby. The same applies hereinafter) is preferably at least 180 ° C. and the melting peak temperature of the solder alloy constituting the solder alloy + 50 ° C. or less. Since such an organic acid ester (D-1) can suppress stickiness of the flux residue formed on the substrate, it is possible to impart good insulation to the flux residue.
That is, the general reflow heating conditions of the solder paste composition are often set so that the peak temperature of the main heating is higher by 10 to 50 ° C. than the melting peak temperature of the solder.
As a result of diligent research, the present inventors have found that the organic material has a weight loss rate of 100% by mass at a temperature higher than 180 ° C. and higher than the melting peak temperature of the solder alloy used as the solvent (D) in the flux composition. By blending the acid ester (D-1), drying on the metal mask during printing becomes difficult to occur, stable continuous printability can be secured, and generation of voids under the above reflow heating conditions is suppressed. Further, it was found that stickiness of the formed flux residue can be suppressed.
 例えば混合に用いるはんだ合金粉末のはんだ合金のピーク温度が130℃以上175℃未満の場合においては、前記有機酸エステル(D-1)として、その減量率の100質量%となる温度が180℃以上且つ225℃未満であるものが好ましく用いられる。このような有機酸エステル(D-1)としては、例えばアジピン酸ジメチル、マレイン酸ジブチル等が挙げられる。これらは1種単独でまたは複数種を混合して用いてもよい。 For example, when the peak temperature of the solder alloy powder of the solder alloy powder used for mixing is 130 ° C. or higher and lower than 175 ° C., the temperature at which the organic acid ester (D-1) becomes 100% by mass of the weight loss rate is 180 ° C. or higher And what is less than 225 degreeC is used preferably. Examples of such organic acid ester (D-1) include dimethyl adipate and dibutyl maleate. You may use these individually by 1 type or in mixture of multiple types.
 また例えば混合に用いるはんだ合金粉末のはんだ合金のピーク温度が175℃以上200℃未満の場合においては、前記有機酸エステル(D-1)として、その減量率の100質量%となる温度が180℃以上且つ250℃未満であるものが好ましく用いられる。このような有機酸エステル(D-1)としては、例えばアジピン酸ジメチル、アジピン酸ジイソプロピル、マレイン酸ジブチル、セバシン酸ジメチル、アジピン酸ジイソブチル、セバシン酸ジエチル等が挙げられる。これらは1種単独でまたは複数種を混合して用いてもよい。 For example, when the peak temperature of the solder alloy of the solder alloy powder used for mixing is 175 ° C. or more and less than 200 ° C., the temperature at which the organic acid ester (D-1) becomes 100% by mass of the weight loss rate is 180 ° C. Those having a temperature of less than 250 ° C. are preferably used. Examples of such organic acid ester (D-1) include dimethyl adipate, diisopropyl adipate, dibutyl maleate, dimethyl sebacate, diisobutyl adipate, diethyl sebacate and the like. You may use these individually by 1 type or in mixture of multiple types.
 更に例えば混合に用いるはんだ合金粉末のはんだ合金のピーク温度が205℃以上の場合においては、前記有機酸エステル(D-1)として、その減量率の100質量%となる温度が180℃以上であり、且つ前記はんだ合金を構成するはんだ合金の溶融ピーク温度+50℃以下であるものが好ましく用いられる。このような有機酸エステル(D-1)としては、例えばアジピン酸ジメチル、アジピン酸ジイソプロピル、マレイン酸ジブチル、セバシン酸ジメチル、アジピン酸ジイソブチル、セバシン酸ジエチル、セバシン酸ジイソプロピル、セバシン酸ジブチル、セバシン酸シオクチル等が挙げられる。これらは1種単独でまたは複数種を混合して用いてもよい。 Further, for example, when the peak temperature of the solder alloy of the solder alloy powder used for mixing is 205 ° C. or higher, the temperature at which the organic acid ester (D-1) becomes 100% by mass of the weight loss rate is 180 ° C. or higher. In addition, a solder alloy having a melting peak temperature of + 50 ° C. or lower is preferably used. Examples of such organic acid ester (D-1) include dimethyl adipate, diisopropyl adipate, dibutyl maleate, dimethyl sebacate, diisobutyl adipate, diethyl sebacate, diisopropyl sebacate, dibutyl sebacate, thiooctyl sebacate. Etc. You may use these individually by 1 type or in mixture of multiple types.
 前記溶剤(D)の配合量は、フラックス組成物全量に対して20質量%以上65質量%以下であることが好ましい。より好ましいその配合量は20質量%以上60質量%以下であり、特に好ましい配合量は25質量%以上50質量%以下である。
 また前記有機酸エステル(D-1)の配合量は、前記溶剤(D)全量に対して10質量%から100質量%であることが好ましい。
The blending amount of the solvent (D) is preferably 20% by mass to 65% by mass with respect to the total amount of the flux composition. The blending amount is more preferably 20% by mass or more and 60% by mass or less, and the particularly preferable blending amount is 25% by mass or more and 50% by mass or less.
The blending amount of the organic acid ester (D-1) is preferably 10% by mass to 100% by mass with respect to the total amount of the solvent (D).
 更に本実施形態のフラックス組成物には、必要に応じて添加剤を配合することができる。前記添加剤としては、例えば酸化防止剤、消泡剤、界面活性剤、つや消し剤等が挙げられる。これらは1種単独でまたは複数種を混合して用いてもよい。
 なお前記添加剤の配合量は、フラックス全量に対して0.5質量%以上20質量%以下であることが好ましく、1質量%以上15質量%以下であることがより好ましい。
Furthermore, an additive can be mix | blended with the flux composition of this embodiment as needed. Examples of the additive include an antioxidant, an antifoaming agent, a surfactant, and a matting agent. You may use these individually by 1 type or in mixture of multiple types.
In addition, it is preferable that the compounding quantity of the said additive is 0.5 mass% or more and 20 mass% or less with respect to the flux whole quantity, and it is more preferable that it is 1 mass% or more and 15 mass% or less.
(2)ソルダペースト組成物
 本実施形態のソルダペースト組成物は、上記フラックス組成物とはんだ合金粉末とを混合することにより得られる。
 前記はんだ合金粉末としては、有鉛/無鉛いずれのはんだ合金粉末であっても使用することができる。即ち本実施形態のソルダペースト組成物は、使用するはんだ合金粉末の成分を問わず、その溶融ピーク温度に適した前記有機酸エステル(D-1)を使用することにより、リフローはんだ付時のボイド発生を抑制しつつはんだ付後のフラックス残さのべとつきを抑制することができる。
(2) Solder paste composition The solder paste composition of this embodiment is obtained by mixing the flux composition and the solder alloy powder.
As the solder alloy powder, any of leaded / lead-free solder alloy powder can be used. That is, the solder paste composition of this embodiment uses the organic acid ester (D-1) suitable for the melting peak temperature regardless of the component of the solder alloy powder to be used. The stickiness of the flux residue after soldering can be suppressed while suppressing the generation.
 なお、前記はんだ合金粉末に用いることのできる合金の例示としては、Sn及びPbを含む合金、Sn及びPb並びにAg、Bi及びInの少なくとも1種を含む合金、Sn及びAgを含む合金、Sn及びCuを含む合金、Sn、Ag及びCuを含む合金、Sn及びBiを含む合金等が挙げられる。またこれら以外にも、例えばSn、Pb、Ag、Bi、In、Cu、Zn、Ga、Sb、Au、Pd、Ge、Ni、Cr、Al、P等を適宜組合せたはんだ合金粉末を使用することができる。なお、上記に挙げた元素以外であってもその組合せに使用することは可能である。
 なお、これらの中でも特にSb、Ag及びCuを含むはんだ合金粉末、例えばSn-Ag系合金はんだ、Sn-Ag-Cu系はんだ合金、Sn-Ag-Cu-Bi-Sb系はんだ合金の粉末が好ましく用いられる。
Examples of alloys that can be used for the solder alloy powder include an alloy containing Sn and Pb, an alloy containing Sn and Pb and at least one of Ag, Bi and In, an alloy containing Sn and Ag, Sn and Pb. Examples include alloys containing Cu, alloys containing Sn, Ag and Cu, alloys containing Sn and Bi, and the like. Besides these, for example, Sn, Pb, Ag, Bi, In, Cu, Zn, Ga, Sb, Au, Pd, Ge, Ni, Cr, Al, P, etc. should be used as appropriate. Can do. Note that elements other than those listed above can be used in combination.
Of these, solder alloy powders containing Sb, Ag and Cu, for example, Sn—Ag alloy solder, Sn—Ag—Cu solder alloy and Sn—Ag—Cu—Bi—Sb solder alloy powder are particularly preferable. Used.
 また、これらの中でも特に以下に挙げる合金組成のはんだ合金粉末を用いると、形成されるはんだ接合部の亀裂進展抑制効果を向上させることができる。
 即ち、前記はんだ合金粉末は、Agを1質量%以上3.1質量%以下と、Cuを0質量%超1質量%以下と、Sbを1質量%以上5質量%以下と、Biを0.5質量%以上4.5質量%以下と、Niを0.01質量%以上0.25質量%以下含み、残部がSnからなることが好ましい。
Of these, the use of a solder alloy powder having the following alloy composition can improve the effect of suppressing the crack propagation of the solder joint formed.
That is, the solder alloy powder has an Ag of 1% by mass to 3.1% by mass, Cu of more than 0% by mass to 1% by mass, Sb of 1% by mass to 5% by mass, and Bi of 0.0%. It is preferable that 5 mass% or more and 4.5 mass% or less, 0.01 mass% or more and 0.25 mass% or less of Ni are included, and the remainder consists of Sn.
 なお、Agのより好ましい含有量は2質量%以上3.1質量%以下であり、Cuのより好ましい含有量は0.5質量%以上1質量%以下であり、Sbのより好ましい含有量は2質量%以上4質量%以下であり、Biのより好ましい含有量は3.1質量%以上4.5質量%であり、Niのより好ましい含有量は0.01質量%以上0.15質量%以下である。 The more preferable content of Ag is 2% by mass or more and 3.1% by mass or less, the more preferable content of Cu is 0.5% by mass or more and 1% by mass or less, and the more preferable content of Sb is 2%. More preferably, the content of Bi is 3.1% to 4.5% by mass, and the more preferable content of Ni is 0.01% to 0.15% by mass. It is.
 また前記はんだ合金粉末は更にCoを0.001質量%以上0.25質量%以下含むことが好ましい。より好ましいCoの含有量は0.001質量%以上0.15質量%以下である。 The solder alloy powder preferably further contains Co in an amount of 0.001% by mass to 0.25% by mass. More preferable Co content is 0.001 mass% or more and 0.15 mass% or less.
 このようなはんだ合金粉末を使用することにより、本実施形態に係るソルダぺースト組成物を用いて形成されたはんだ接合部は、寒暖の差が激しく振動が負荷されるような過酷な環境下においてもはんだ接合部の亀裂進展を抑制できる。また更にNi/Pd/AuめっきやNi/Auめっきがなされていない電子部品を用いてはんだ接合をした場合においても、はんだ接合部と電子部品の下面電極の界面付近における亀裂進展を抑制することができる。 By using such a solder alloy powder, the solder joint formed using the solder paste composition according to the present embodiment can be used in a harsh environment where the difference in temperature is intense and vibration is applied. Also, the crack progress of the solder joint can be suppressed. Furthermore, even when solder bonding is performed using an electronic component that has not been subjected to Ni / Pd / Au plating or Ni / Au plating, crack propagation near the interface between the solder bonding portion and the lower surface electrode of the electronic component can be suppressed. it can.
 前記はんだ合金粉末の配合量は、ソルダペースト組成物全量に対して65質量%から95質量%であることが好ましい。より好ましいその配合量は85質量%から93質量%であり、特に好ましい配合量は87質量%から92質量%である。
 前記はんだ合金粉末の配合量が65質量%未満の場合には、得られるソルダペースト組成物を用いた場合に充分なはんだ接合が形成されにくくなる傾向にある。他方前記はんだ合金粉末の含有量が95質量%を超える場合にはバインダとしてのフラックス組成物が足りないため、フラックス組成物とはんだ合金粉末とを混合しにくくなる傾向にある。
The amount of the solder alloy powder is preferably 65% by mass to 95% by mass with respect to the total amount of the solder paste composition. More preferably, the blending amount is 85% by weight to 93% by weight, and a particularly preferable blending amount is 87% by weight to 92% by weight.
When the blending amount of the solder alloy powder is less than 65% by mass, a sufficient solder joint tends to be hardly formed when the obtained solder paste composition is used. On the other hand, when the content of the solder alloy powder exceeds 95% by mass, the flux composition as a binder is insufficient, and therefore, it tends to be difficult to mix the flux composition and the solder alloy powder.
 また前記はんだ合金粉末の粒子径は1μm以上40μm以下であることが好ましく、5μm以上35μm以下であることがより好ましく、10μm以上30μm以下であることが特に好ましい。 The particle diameter of the solder alloy powder is preferably 1 μm or more and 40 μm or less, more preferably 5 μm or more and 35 μm or less, and particularly preferably 10 μm or more and 30 μm or less.
 本実施形態のソルダペースト組成物は、はんだ合金粉末のはんだ合金の溶融ピーク温度に適した前記有機酸エステル(D-1)を配合したフラックス組成物を使用することにより、リフローはんだ付時のボイド発生を抑制しつつはんだ付後のフラックス残さのべとつきを抑制することができる。 The solder paste composition of the present embodiment uses the flux composition containing the organic acid ester (D-1) suitable for the melting peak temperature of the solder alloy powder of the solder alloy powder, so that the void at the time of reflow soldering is used. The stickiness of the flux residue after soldering can be suppressed while suppressing the generation.
(3)電子回路基板
 本実施形態の電子回路基板は、上記ソルダペースト組成物を用いて形成されるはんだ接合部とフラックス残さ(本明細書においては、はんだ接合部とフラックス残さとを併せて「はんだ接合体」という。)を有することが好ましい。当該電子回路基板は、例えば基板上の所定の位置に電極及びソルダレジスト膜を形成し、所定のパターンを有するマスクを用いて本実施形態のソルダペースト組成物を印刷し、当該パターンに適合する電子部品を所定の位置に搭載し、これをリフローすることにより作製される。
 このようにして作製された電子回路基板は、前記電極上にはんだ接合部が形成され、当該はんだ接合部は当該電極と電子部品とを電気的に接合する。そして前記基板上には、少なくともはんだ接合部に接着するようにフラックス残さが付着している。
(3) Electronic circuit board The electronic circuit board according to the present embodiment includes a solder joint portion and a flux residue formed by using the solder paste composition (in this specification, the solder joint portion and the flux residue are combined together. It is preferable to have a solder joint ”. The electronic circuit board is, for example, an electrode and a solder resist film formed at a predetermined position on the substrate, printed with the solder paste composition of the present embodiment using a mask having a predetermined pattern, and adapted to the pattern. It is manufactured by mounting parts at predetermined positions and reflowing them.
In the electronic circuit board thus manufactured, a solder joint is formed on the electrode, and the solder joint electrically joins the electrode and the electronic component. And on the said board | substrate, the flux residue has adhered so that it may adhere | attach to a solder joint part at least.
 本実施形態の電子回路基板は上記ソルダペースト組成物を用いてそのはんだ接合部及びフラックス残さが形成されているため、はんだ接合部にはボイドが発生し難く、且つフラックス残さのべとつき難いものとすることができる。またはんだ合金粉末の合金組成を特定の元素及び含有量とすることにより、はんだ接合部の亀裂進展抑制効果を向上することもできる。 In the electronic circuit board of the present embodiment, since the solder joint and the flux residue are formed using the solder paste composition, voids are hardly generated in the solder joint and the flux residue is difficult to stick. be able to. Moreover, the crack progress inhibitory effect of a solder joint part can also be improved by making the alloy composition of solder alloy powder into a specific element and content.
 以下、実施例及び比較例を挙げて本発明を詳述する。なお、本発明はこれらの実施例に限定されるものではない。 Hereinafter, the present invention will be described in detail with reference to Examples and Comparative Examples. The present invention is not limited to these examples.
<合成樹脂の作成>
 撹拌機、還流管、及び窒素導入管とを備えた500mlの4つ口フラスコにジエチレングリコールモノヘキシルエーテル200gを仕込み、これを110℃に加熱した。
 またメタクリル酸10質量%、2-エチルヘキシルメタクリレート51質量%、ラウリルアクリレート39質量%を混合したもの300gにアゾ系ラジカル開始剤としてジメチル2,2’-アゾビス(2-メチルプロピオネート)(製品名:V-601、和光純薬(株)製)を0.2質量%から5質量%を加えてこれを溶解させ、溶液を作製した。
 次いで当該溶液を上記4つ口フラスコに1.5時間かけて滴下したものを110℃で1時間撹拌した後に反応を終了させ、実施例に用いる合成樹脂(A-2)を得た。なお、当該合成樹脂(A-2)の重量平均分子量は7,800Mw、酸価は40mgKOH/g、ガラス転移温度は-47℃であった。
<Creation of synthetic resin>
200 g of diethylene glycol monohexyl ether was charged into a 500 ml four-necked flask equipped with a stirrer, a reflux tube, and a nitrogen introduction tube, and this was heated to 110 ° C.
Also, dimethyl 2,2′-azobis (2-methylpropionate) (product name) as an azo radical initiator in 300 g of 10% by weight of methacrylic acid, 51% by weight of 2-ethylhexyl methacrylate and 39% by weight of lauryl acrylate : V-601, manufactured by Wako Pure Chemical Industries, Ltd.) was added in an amount of 0.2% to 5% by mass to dissolve the solution to prepare a solution.
Then, the solution was added dropwise to the above four-necked flask over 1.5 hours and stirred at 110 ° C. for 1 hour, and then the reaction was terminated to obtain a synthetic resin (A-2) used in the examples. The synthetic resin (A-2) had a weight average molecular weight of 7,800 Mw, an acid value of 40 mgKOH / g, and a glass transition temperature of −47 ° C.
<ソルダペースト組成物の作製>
 表1から表4に記載の各成分を混練し、実施例1から34、及び比較例1から13に係る各フラックス組成物を得た。次いで当該各フラックス組成物11質量%と、以下に挙げるはんだ合金粉末89質量%とを混練し、実施例1から34、及び比較例1から13に係る各ソルダペースト組成物を得た。なお、特に記載のない限り、表1から4に記載の数値は質量%を意味するものとする。
 また合成樹脂(A-2)については上述の手順で作製したソルベント状の樹脂をエバポレーターを用いて溶剤を揮発させた上で使用している。そのため、表1から表4に記載の合成樹脂(A-2)の数値は、溶剤を揮発させた固形分のみを表す。
 なお、各実施例及び比較例において使用したはんだ合金粉末は以下の通りである。
 実施例1から20及び比較例1から8:Sn-3Ag-0.5Cuはんだ合金粉末(溶融ピーク温度:219℃)
 実施例21及び22並びに比較例9:Sn-10Sb(溶融ピーク温度:248℃)
 実施例23及び24並びに比較例10及び11:Sn-58Bi(溶融ピーク温度:139℃)
 実施例25から28及び比較例12:Sn-3.5Ag-0.5Bi-8In(溶融ピーク温度:202℃)
・実施例29及び30:Sn-3Ag-0.7Cu-3.5Bi-3Sb-0.04Ni-0.01Co(溶融ピーク温度:223℃)
・実施例31及び32:Sn-3Ag-0.5Cu-4.5Bi-3Sb-0.03Ni(溶融ピーク温度:222℃)
・実施例33及び34:Sn-3Ag-0.5Cu-3Bi-2Sb-0.03Ni(溶融ピーク温度:223℃)
・比較例13:Sn-0.5Ag-0.5Cu-3Bi-2Sb-0.04Ni(溶融ピーク温度:228℃)
 各有機酸エステル(D-1)成分について熱重量測定-示唆熱分析装置(製品名:STA7200RV、(株)日立ハイテクサイエンス製)を用い、TG曲線での減量率が100質量%になる温度を測定し、表1から4の成分名と併せて記載した。なお、その測定条件は、昇温速度を10℃/min、窒素ガス流量を200ml/minとし、サンプル量を10mgとした。
<Preparation of solder paste composition>
Each component described in Table 1 to Table 4 was kneaded to obtain each flux composition according to Examples 1 to 34 and Comparative Examples 1 to 13. Next, 11% by mass of each flux composition and 89% by mass of the solder alloy powder listed below were kneaded to obtain solder paste compositions according to Examples 1 to 34 and Comparative Examples 1 to 13. Unless otherwise specified, the numerical values shown in Tables 1 to 4 mean mass%.
As for the synthetic resin (A-2), the solvent-like resin produced by the above-described procedure is used after the solvent is volatilized using an evaporator. Therefore, the numerical value of the synthetic resin (A-2) described in Tables 1 to 4 represents only the solid content in which the solvent is volatilized.
In addition, the solder alloy powder used in each Example and the comparative example is as follows.
Examples 1 to 20 and Comparative Examples 1 to 8: Sn-3Ag-0.5Cu solder alloy powder (melting peak temperature: 219 ° C.)
Examples 21 and 22 and Comparative Example 9: Sn-10Sb (melting peak temperature: 248 ° C.)
Examples 23 and 24 and Comparative Examples 10 and 11: Sn-58Bi (melting peak temperature: 139 ° C.)
Examples 25 to 28 and Comparative Example 12: Sn-3.5Ag-0.5Bi-8In (melting peak temperature: 202 ° C.)
Examples 29 and 30: Sn-3Ag-0.7Cu-3.5Bi-3Sb-0.04Ni-0.01Co (melting peak temperature: 223 ° C.)
Examples 31 and 32: Sn-3Ag-0.5Cu-4.5Bi-3Sb-0.03Ni (melting peak temperature: 222 ° C.)
Examples 33 and 34: Sn-3Ag-0.5Cu-3Bi-2Sb-0.03Ni (melting peak temperature: 223 ° C.)
Comparative Example 13: Sn-0.5Ag-0.5Cu-3Bi-2Sb-0.04Ni (melting peak temperature: 228 ° C.)
For each organic acid ester (D-1) component, thermogravimetric-suggestion thermal analyzer (product name: STA7200RV, manufactured by Hitachi High-Tech Science Co., Ltd.) was used to determine the temperature at which the weight loss rate on the TG curve was 100% by mass. Measured and listed with the component names in Tables 1-4. The measurement conditions were a temperature rising rate of 10 ° C./min, a nitrogen gas flow rate of 200 ml / min, and a sample amount of 10 mg.
Figure JPOXMLDOC01-appb-T000001
Figure JPOXMLDOC01-appb-T000001
Figure JPOXMLDOC01-appb-T000002
Figure JPOXMLDOC01-appb-T000002
Figure JPOXMLDOC01-appb-T000003
Figure JPOXMLDOC01-appb-T000003
Figure JPOXMLDOC01-appb-T000004
※1 荒川化学工業(株)製 水添酸変性ロジン
※2 日本化成(株)製 脂肪酸ビスアマイド
※3 BASFジャパン(株)製 ヒンダードフェノール系酸化防止剤
Figure JPOXMLDOC01-appb-T000004
* 1 Hydrogenated acid-modified rosin manufactured by Arakawa Chemical Co., Ltd. * 2 Fatty acid bisamide manufactured by Nippon Kasei Co., Ltd. * 3 Hindered phenol antioxidant manufactured by BASF Japan
<印刷回復性試験>
 100ピン0.5mmピッチのBGAを実装できるパターンを有するソルダレジストと電極(直径0.25mm)を備えたガラスエポキシ基板と、前記パターンと同じパターンを有する厚さ120μmのメタルマスクを用意した。
 次いで、当該メタルマスクを用いて前記基板上に各ソルダペースト組成物を印刷した。なおこの印刷は、1種のソルダペースト組成物につき、6枚の前記基板を用いて連続印刷する方法により行った。
 当該連続印刷を行った後、メタルマスク上にある各ソルダペースト組成物を25℃-50%の環境下で1時間放置した。
 その後、このメタルマスク上にある各ソルダペースト組成物を前記基板上に印刷した。なおこの印刷は、1種のソルダペースト組成物につき、10枚の前記基板を用いて連続印刷する方法により行った。
 当該連続印刷を行った前記基板について、印刷順5番目から10番目までの直径0.25mmの電極部におけるその転写体積率を画像検査機(製品名:aspire2、(株)コーヨンテクノロジー製)を用いて測定し、以下の基準で評価した。その結果を表5から表8に表す。
 ◎:転写体積率35%以下の個数が0個
 ○:転写体積率35%以下の個数が1個以上10個以下
 △:転写体積率35%以下の個数が11個以上50個以下
 ×:転写体積率35%以下の個数が51個以上
<Print recovery test>
A glass epoxy substrate provided with a solder resist having a pattern capable of mounting a 100-pin 0.5 mm pitch BGA and an electrode (diameter: 0.25 mm), and a metal mask having a thickness of 120 μm having the same pattern as the above pattern were prepared.
Next, each solder paste composition was printed on the substrate using the metal mask. In addition, this printing was performed by the method of printing continuously using 6 said board | substrates about 1 type of solder paste compositions.
After the continuous printing, each solder paste composition on the metal mask was left for 1 hour in an environment of 25 ° C.-50%.
Thereafter, each solder paste composition on the metal mask was printed on the substrate. In addition, this printing was performed by the method of printing continuously using 10 said board | substrates about 1 type of solder paste compositions.
About the said board | substrate which performed the said continuous printing, the image volume inspection machine (product name: aspire2, Co., Ltd. product made from Koyon Technology) shows the transfer volume ratio in the electrode part of diameter 0.25mm from the 5th to 10th printing order. And measured according to the following criteria. The results are shown in Tables 5 to 8.
A: Number of transfer volume ratio 35% or less is zero 0: Number of transfer volume ratio 35% or less is 1 or more and 10 or less Δ: Number of transfer volume ratio 35% or less is 11 or more and 50 or less ×: Transfer 51 or more with a volume ratio of 35% or less
<フラックス残さ粘着性試験>
 直径6mmサイズのパターンを有するソルダレジストと銅ランドを有するガラスエポキシ基板と、前記パターンと同じパターンを有する厚さ150μmのメタルマスクを用意した。次いで当該メタルマスクを用いて前記ガラスエポキシ基板に各ソルダペースト組成物を印刷し、これらをリフロー炉(製品名:TNP-538EM、(株)タムラ製作所製)を用いて加熱し、各試験基板を作製した。なお、リフロー条件は印刷した各ソルダペースト組成物に用いたはんだ合金粉末の組成により異なる。その条件は以下の通りである。なお、いずれにおいてもリフロー炉内の酸素濃度は1500±500ppmである。
・実施例1から20及び比較例1から8:プリヒートを170℃から180℃で90秒間、ピーク温度230℃、220℃以上が30秒以下、ピーク温度から200℃までの冷却速度は3℃から8℃/秒
・実施例21及び22並びに比較例9:プリヒートを180℃から200℃で90秒間、ピーク温度265℃、250℃以上が30秒以下、ピーク温度から235℃までの冷却速度は3℃から8℃/秒
・実施例23及び24並びに比較例10及び11:プリヒートを100℃から110℃で90秒間、ピーク温度160℃、150℃以上が30秒以下、ピーク温度から120℃までの冷却速度は3℃から8℃/秒
・実施例25から28及び比較例12:プリヒートを150℃から170℃で90秒間、ピーク温度220℃、210℃以上が30秒以下、ピーク温度から190℃までの冷却速度は3℃から8℃/秒
・実施例29から34:プリヒートを170℃から180℃で90秒間、ピーク温度230℃、220℃以上が30秒以下、ピーク温度から200℃までの冷却速度は3℃から8℃/秒
・比較例13:プリヒートを170℃から180℃で90秒間、ピーク温度240℃、230℃以上が30秒以下、ピーク温度から200℃までの冷却速度は3℃から8℃/秒
 そして各試験基板を室温にて2時間放置した後、直径6mmパターンにはんだ付された各試験基板上に形成されたフラックス残さに直径300μmのはんだボールを振りかけ、これを各試験基板の側面が地面と並行となるようにして机に叩きつけ衝撃を与えた。その後、各試験基板上のフラックス残さに付着したはんだボール数をカウントし、以下の基準で評価した。その結果を表5から表8に表す。
 ◎:はんだボールの付着個数が0個
 ○:はんだボールの付着個数が1個以上10個以下
 △:はんだボールの付着個数が11個以上30個以下
 ×:はんだボールの付着個数が31個以上
<Flux residue adhesion test>
A solder resist having a 6 mm diameter pattern, a glass epoxy substrate having a copper land, and a 150 μm thick metal mask having the same pattern as the above pattern were prepared. Next, each solder paste composition is printed on the glass epoxy substrate using the metal mask, and these are heated using a reflow furnace (product name: TNP-538EM, manufactured by Tamura Seisakusho Co., Ltd.), Produced. The reflow conditions differ depending on the composition of the solder alloy powder used for each printed solder paste composition. The conditions are as follows. In any case, the oxygen concentration in the reflow furnace is 1500 ± 500 ppm.
Examples 1 to 20 and Comparative Examples 1 to 8: Preheating is performed at 170 to 180 ° C. for 90 seconds, peak temperature 230 ° C., 220 ° C. or more is 30 seconds or less, and the cooling rate from peak temperature to 200 ° C. is 3 ° C. 8 ° C./sec. Examples 21 and 22 and Comparative Example 9: Preheating is performed from 180 ° C. to 200 ° C. for 90 seconds, peak temperature of 265 ° C., 250 ° C. or more is 30 seconds or less, and the cooling rate from the peak temperature to 235 ° C. is 3 C to 8 ° C./second Examples 23 and 24 and Comparative Examples 10 and 11: Preheating from 100 ° C. to 110 ° C. for 90 seconds, peak temperature 160 ° C., 150 ° C. or higher to 30 seconds or shorter, peak temperature to 120 ° C. Cooling rate is 3 ° C. to 8 ° C./second. Examples 25 to 28 and Comparative Example 12: Preheating is performed at 150 to 170 ° C. for 90 seconds, peak temperatures of 220 ° C. and 210 ° C. or more. 0 seconds or less, cooling rate from peak temperature to 190 ° C. is 3 ° C. to 8 ° C./second. Examples 29 to 34: Preheating is performed from 170 ° C. to 180 ° C. for 90 seconds, peak temperature is 230 ° C., 220 ° C. or more is 30 seconds. Hereinafter, the cooling rate from the peak temperature to 200 ° C. is 3 ° C. to 8 ° C./second. Comparative Example 13: Preheating is performed at 170 ° C. to 180 ° C. for 90 seconds, peak temperature 240 ° C., 230 ° C. or higher is 30 seconds or shorter, peak temperature The cooling rate from 1 to 200 ° C. is from 3 ° C. to 8 ° C./sec. After leaving each test board at room temperature for 2 hours, the flux residue formed on each test board soldered to a 6 mm diameter pattern has a diameter of 300 μm. The solder balls were sprinkled and hit against a desk so that the side of each test board was parallel to the ground to give an impact. Thereafter, the number of solder balls attached to the flux residue on each test substrate was counted and evaluated according to the following criteria. The results are shown in Tables 5 to 8.
◎: Solder ball adherence number 0: Solder ball adherence number 1 or more and 10 or less △: Solder ball adherence number 11 or more and 30 or less ×: Solder ball adherence number 31 or more
<連続ローリングペーストの作製>
 各ソルダペースト組成物について、ポリウレタンゴム製スキージ(硬度90)を用いて、スキージ角度60°、印刷タクト30秒、及びストローク300mm、環境25℃-50%R.H.の条件下で4時間、連続的にスキージングを行った。
なお、試料投入量は500gであった。このようにして得られた連続スキージング後の各ソルダペースト組成物を以下「連続ローリングペースト」という。
<Preparation of continuous rolling paste>
For each solder paste composition, using a polyurethane rubber squeegee (hardness 90), a squeegee angle of 60 °, a printing tact time of 30 seconds, a stroke of 300 mm, and an environment of 25 ° C.-50% R.P. H. The squeezing was continuously performed for 4 hours under the above conditions.
Note that the amount of sample input was 500 g. Each solder paste composition after continuous squeezing thus obtained is hereinafter referred to as “continuous rolling paste”.
<ソルダボール試験>
 ガラスエポキシ基板と、2.0mm×1.2mmのサイズのチップ部品を用意した。当該ガラスエポキシ基板上に前記チップ部品に対応するソルダレジストと電極(1.25mm×1.0mm)とを形成し、これと同じパターンを有する厚さ150μmのメタルマスクを用いて前記ガラスエポキシ基板上に各ソルダペースト組成物と各連続ローリングペーストとをそれぞれ印刷し、チップ部品を搭載した。次いで各ガラスエポキシ基板をリフロー炉(製品名:TNP-538EM、(株)タムラ製作所製)で加熱し、各試験基板を作製した。なお、リフロー条件は、印刷した各ソルダペースト組成物・各連続ローリングペーストに用いたはんだ合金粉末の組成により異なる。その条件は以下の通りである。なお、いずれにおいてもリフロー炉内の酸素濃度は1500±500ppmである。
・実施例1から20及び比較例1から8:プリヒートを170℃から190℃で110秒間、ピーク温度260℃、200℃以上が70秒間及び220℃以上が60秒間、ピーク温度から200℃までの冷却速度は3℃から8℃/秒
・実施例21及び22並びに比較例9:プリヒートを180℃から210℃で110秒間、ピーク温度290℃、230℃以上が70秒間及び250℃以上が60秒間、ピーク温度から235℃までの冷却速度は3℃から8℃/秒
・実施例23及び24並びに比較例10及び比較例11:プリヒートを100℃から120℃で110秒間、ピーク温度210℃、130℃以上が70秒間及び150℃以上が60秒間、ピーク温度から150℃までの冷却速度は3℃から8℃/秒
・実施例25から28及び比較例12:プリヒートを150℃から180℃で110秒間、ピーク温度250℃、190℃以上が70秒間及び210℃以上が60秒間、ピーク温度から190℃までの冷却速度は3℃から8℃/秒
・実施例29から34:プリヒートを170℃から190℃で110秒間、ピーク温度260℃、200℃以上が70秒間及び220℃以上が60秒間、ピーク温度から200℃までの冷却速度は3℃から8℃/秒
・比較例13:プリヒートを170℃から190℃で110秒間、ピーク温度260℃、200℃以上が70秒間及び220℃以上が60秒間、ピーク温度から200℃までの冷却速度は3℃から8℃/秒
 前記各試験基板をX線透過装置(製品名:SMX-160E、(株)島津製作所製)を用いて観察し、チップ部品の周辺及びその下面に発生したソルダボール数とその径をカウントし、以下のように評価した。その結果を表5から表8に表す。
 ◎:2.0mm×1.2mmチップ抵抗10個あたりに発生したボール数が0個
 ○:2.0mm×1.2mmチップ抵抗10個あたりに発生したボール数が1個以上5個以下
 △:2.0mm×1.2mmチップ抵抗10個あたりに発生したボール数が6個以上10個以下
 ×:2.0mm×1.2mmチップ抵抗10個あたりに発生したボール数が11個以上
<Solder ball test>
A glass epoxy substrate and a chip component having a size of 2.0 mm × 1.2 mm were prepared. A solder resist and an electrode (1.25 mm × 1.0 mm) corresponding to the chip component are formed on the glass epoxy substrate, and a 150 μm thick metal mask having the same pattern is used on the glass epoxy substrate. Each solder paste composition and each continuous rolling paste were printed, and chip parts were mounted. Next, each glass epoxy substrate was heated in a reflow furnace (product name: TNP-538EM, manufactured by Tamura Corporation) to prepare each test substrate. The reflow conditions differ depending on the composition of the solder alloy powder used in each printed solder paste composition and each continuous rolling paste. The conditions are as follows. In any case, the oxygen concentration in the reflow furnace is 1500 ± 500 ppm.
Examples 1 to 20 and Comparative Examples 1 to 8: Preheating from 170 ° C. to 190 ° C. for 110 seconds, peak temperature 260 ° C., 200 ° C. or higher for 70 seconds and 220 ° C. or higher for 60 seconds, peak temperature to 200 ° C. Cooling rate from 3 ° C. to 8 ° C./sec. Examples 21 and 22 and Comparative Example 9: Preheating at 180 ° C. to 210 ° C. for 110 seconds, peak temperature 290 ° C., 230 ° C. or higher for 70 seconds and 250 ° C. or higher for 60 seconds The cooling rate from the peak temperature to 235 ° C. is 3 ° C. to 8 ° C./second. Examples 23 and 24 and Comparative Example 10 and Comparative Example 11: Preheating at 100 ° C. to 120 ° C. for 110 seconds, peak temperature 210 ° C., 130 The cooling rate from the peak temperature to 150 ° C. is from 3 ° C. to 8 ° C./sec. Examples 25 to 28 and Comparative Example 2: Preheating at 150 to 180 ° C. for 110 seconds, peak temperature 250 ° C., 190 ° C. or higher for 70 seconds and 210 ° C. or higher for 60 seconds, cooling rate from peak temperature to 190 ° C. from 3 ° C. to 8 ° C./second Examples 29 to 34: Preheating at 170 to 190 ° C. for 110 seconds, peak temperature 260 ° C., 200 ° C. or higher for 70 seconds and 220 ° C. or higher for 60 seconds, cooling rate from peak temperature to 200 ° C. from 3 ° C. to 8 ° C. C / sec. Comparative Example 13: Preheating at 170 ° C. to 190 ° C. for 110 seconds, peak temperature 260 ° C., 200 ° C. or higher for 70 seconds and 220 ° C. or higher for 60 seconds, cooling rate from peak temperature to 200 ° C. is 3 ° C. 8 ° C./second Each of the test substrates was observed using an X-ray transmission device (product name: SMX-160E, manufactured by Shimadzu Corporation), and the periphery of the chip component and Counting the number of solder balls and the diameter generated on the lower surface was evaluated as follows. The results are shown in Tables 5 to 8.
A: No. of balls generated per 10 pieces of 2.0 mm × 1.2 mm chip resistors B: No. of balls generated per 10 pieces of 2.0 mm × 1.2 mm chip resistors Δ: The number of balls generated per 10 2.0 mm × 1.2 mm chip resistors is 6 or more and 10 or less. ×: The number of balls generated per 10 2.0 mm × 1.2 mm chip resistors is 11 or more.
<ボイド試験>
 ソルダボール試験と同じ条件にて各試験基板を作製し、その表面状態をX線透過装置(製品名:SMX-160E、(株)島津製作所製)で観察し、はんだ接合部が形成されている領域に占めるボイドの総面積の割合(ボイドの面積率)を測定した。なおボイドの発生状況は各試験基板中20箇所のランドにおけるボイドの面積率の最大値を求め、以下のように評価した。その結果を表5から表8に表す。
 ◎:ボイドの面積率の最大値が10%以下
 ○:ボイドの面積率の最大値が10%超13%以下
 △:ボイドの面積率の最大値が13%超20%以下
 ×:ボイドの面積率の最大値が20%超
<Void test>
Each test board is manufactured under the same conditions as the solder ball test, and the surface state is observed with an X-ray transmission device (product name: SMX-160E, manufactured by Shimadzu Corporation), and a solder joint is formed. The ratio of the total area of voids in the region (void area ratio) was measured. In addition, the generation | occurrence | production situation of the void calculated | required the maximum value of the area ratio of the void in 20 lands in each test board | substrate, and evaluated it as follows. The results are shown in Tables 5 to 8.
◎: Maximum value of void area ratio is 10% or less ○: Maximum value of void area ratio is more than 10% and 13% or less △: Maximum value of void area ratio is more than 13% and 20% or less ×: Void area The maximum rate is over 20%
<亀裂進展抑制試験>
 3.2mm×1.6mmのサイズのチップ部品(Ni/Snめっき)と、当該サイズのチップ部品を実装できるパターンを有するソルダレジストおよび前記チップ部品を接続する電極(1.6mm×1.2mm)とを備えたガラスエポキシ基板と、同パターンを有する厚さ150μmのメタルマスクを用意した。
 前記ガラスエポキシ基板上に前記メタルマスクを用いて各ソルダペースト組成物を印刷し、それぞれ前記チップ部品を搭載した。
 その後、リフロー炉(製品名:TNP-538EM、(株)タムラ製作所製)を用いて前記各ガラスエポキシ基板を加熱してそれぞれに前記ガラスエポキシ基板と前記チップ部品とを電気的に接合するはんだ接合部を形成し、前記チップ部品を実装した。この際のリフロー条件は、プリヒートを170℃から190℃で110秒間、ピーク温度を245℃とし、200℃以上の時間が65秒間、220℃以上の時間が45秒間、ピーク温度から200℃までの冷却速度を3℃から8℃/秒とし、酸素濃度は1500±500ppmに設定した。
 次に、-40℃(30分間)から125℃(30分間)の条件に設定した冷熱衝撃試験装置(製品名:ES-76LMS、日立アプライアンス(株)製)を用い、冷熱衝撃サイクルを1,000、1,500、2,000、2,500、3,000サイクル繰り返す環境下に前記各ガラスエポキシ基板をそれぞれ曝した後これを取り出し、各試験基板を作製した。
 次いで各試験基板の対象部分を切り出し、これをエポキシ樹脂(製品名:エポマウント(主剤および硬化剤)、リファインテック(株)製)を用いて封止した。更に湿式研磨機(製品名:TegraPol-25、丸本ストルアス(株)、製)を用いて各試験基板に実装された前記チップ部品の中央断面が分かるような状態とし、形成されたはんだ接合部に発生した亀裂がはんだ接合部を完全に横断して破断に至っているか否かを走査電子顕微鏡(製品名:TM-1000、(株)日立ハイテクノロジーズ製)を用いて観察し、以下の基準にて評価した。その結果を表5から表8に表す。なお、各冷熱衝撃サイクルにおける評価チップ数は10個とした。
 ◎◎:3,000サイクルまではんだ接合部を完全に横断する亀裂が発生しない
 ◎:2,501から3,000サイクルの間ではんだ接合部を完全に横断する亀裂が発生
 〇:2,001から2,500サイクルの間ではんだ接合部を完全に横断する亀裂が発生
 △:2,000サイクル以下ではんだ接合部を完全に横断する亀裂が発生
<Crack growth inhibition test>
A chip component (Ni / Sn plating) having a size of 3.2 mm × 1.6 mm, a solder resist having a pattern capable of mounting the chip component of the size, and an electrode (1.6 mm × 1.2 mm) connecting the chip component And a 150 μm-thick metal mask having the same pattern were prepared.
Each solder paste composition was printed on the glass epoxy substrate using the metal mask, and the chip component was mounted on each of the solder paste compositions.
Thereafter, using a reflow furnace (product name: TNP-538EM, manufactured by Tamura Seisakusho Co., Ltd.), each glass epoxy substrate is heated to solder the glass epoxy substrate and the chip component to each other electrically. A part was formed, and the chip component was mounted. The reflow conditions at this time are: preheating from 170 ° C. to 190 ° C. for 110 seconds, peak temperature of 245 ° C., time of 200 ° C. or higher for 65 seconds, time of 220 ° C. or higher for 45 seconds, peak temperature to 200 ° C. The cooling rate was 3 ° C. to 8 ° C./second, and the oxygen concentration was set to 1500 ± 500 ppm.
Next, using a thermal shock test apparatus (product name: ES-76LMS, manufactured by Hitachi Appliances Co., Ltd.) set to -40 ° C (30 minutes) to 125 ° C (30 minutes), Each glass epoxy substrate was exposed to each other in an environment where 000, 1,500, 2,000, 2,500, and 3,000 cycles were repeated, and then taken out to prepare each test substrate.
Subsequently, the target part of each test board | substrate was cut out, and this was sealed using the epoxy resin (Product name: Epomount (main agent and hardening | curing agent), the refine tech Co., Ltd. product). Further, using a wet polishing machine (product name: TegraPol-25, manufactured by Marumoto Struers Co., Ltd.), the solder joints are formed so that the center cross section of the chip component mounted on each test substrate can be seen. Using a scanning electron microscope (Product name: TM-1000, manufactured by Hitachi High-Technologies Corporation) And evaluated. The results are shown in Tables 5 to 8. The number of evaluation chips in each thermal shock cycle was 10.
◎: No crack that completely crosses the solder joint until 3,000 cycles ◎: Crack that completely crosses the solder joint occurs between 2,501 and 3,000 cycles O: From 2,001 A crack that completely traverses the solder joint between 2,500 cycles occurred △: A crack that completely traverses the solder joint occurred after 2,000 cycles or less
Figure JPOXMLDOC01-appb-T000005
Figure JPOXMLDOC01-appb-T000005
Figure JPOXMLDOC01-appb-T000006
Figure JPOXMLDOC01-appb-T000006
Figure JPOXMLDOC01-appb-T000007
Figure JPOXMLDOC01-appb-T000007
Figure JPOXMLDOC01-appb-T000008
Figure JPOXMLDOC01-appb-T000008
 以上に示す通り、実施例1から34に係るソルダペースト組成物は、使用するはんだ合金粉末を構成するはんだ合金の溶融ピーク温度に合わせた前記有機酸エステル(D-1)を使用することにより安定した連続印刷性を確保でき、またリフローはんだ付時のボイド発生を抑制しつつはんだ付後のフラックス残さのべとつきを抑制し得ることが分かる。またこれらはリフロー時に良好なぬれ性を有しているため、ソルダボールの発生も抑制することができる。更には、これらは連続スキージングを行っても活性剤(B)とはんだ合金粉末との反応を抑制し得るため、連続ローリングペーストであってもボイド及びソルダボールの発生を抑制できることが分かる。
 Inを含有するはんだ合金粉末を用いた実施例25から28は、In添加の効果により、良好な亀裂進展抑制効果を発揮することができる。
 またはんだ合金粉末の合金組成を特定の元素及び含有量とした実施例29から34においては、ソルダボール及びボイドの発生を十分に抑制でき、またInを添加せずとも、In含有はんだ合金粉末を用いた場合と同等以上の亀裂進展抑制効果を発揮できることが分かる。このようなソルダペースト組成物は、特に車載用電子回路基板といった寒暖差が激しく且つ高い信頼性の求められる電子回路基板にも好適に用いることができる。
 なお、表1から表4の有機酸エステル(D-1)のうちセバシン酸ジオクチルについては、これに使用したはんだ合金粉末の溶融ピーク温度が295℃未満であったため良好な結果とならなかったが、溶融ピーク温度が295℃以上のはんだ合金粉末を用いる場合には、その減量率(TG法を用いて測定)が100質量%となる温度が前記溶融ピーク温度+50℃以下となり、安定した連続印刷性、リフローはんだ付時のボイド発生の抑制及びフラックス残さのべとつき抑制効果を奏し得るものである。

 
As described above, the solder paste compositions according to Examples 1 to 34 are stabilized by using the organic acid ester (D-1) that matches the melting peak temperature of the solder alloy constituting the solder alloy powder to be used. It can be seen that continuous printability can be ensured, and stickiness of the flux residue after soldering can be suppressed while suppressing the generation of voids during reflow soldering. Moreover, since these have good wettability during reflow, the generation of solder balls can also be suppressed. Furthermore, since they can suppress the reaction between the activator (B) and the solder alloy powder even if continuous squeezing is performed, it can be seen that even the continuous rolling paste can suppress the generation of voids and solder balls.
Examples 25 to 28 using the solder alloy powder containing In can exhibit a good crack growth suppressing effect due to the effect of adding In.
In Examples 29 to 34 in which the alloy composition of the solder alloy powder is a specific element and content, the generation of solder balls and voids can be sufficiently suppressed, and the In-containing solder alloy powder can be obtained without adding In. It can be seen that the crack growth suppressing effect equivalent to or higher than that in the case of using can be exhibited. Such a solder paste composition can be suitably used especially for an electronic circuit board that has a severe temperature difference and requires high reliability, such as an in-vehicle electronic circuit board.
Of the organic acid esters (D-1) in Tables 1 to 4, dioctyl sebacate did not give good results because the melting peak temperature of the solder alloy powder used was less than 295 ° C. When a solder alloy powder having a melting peak temperature of 295 ° C. or higher is used, the temperature at which the weight loss rate (measured using the TG method) is 100% by mass is the melting peak temperature + 50 ° C. or lower, and stable continuous printing , The effect of suppressing the generation of voids during reflow soldering and the effect of suppressing the stickiness of the flux residue.

Claims (12)

  1.  はんだ合金粉末と混合してソルダペースト組成物を構成するフラックス組成物であって、
    (A)ベース樹脂と、(B)活性剤と、(C)チクソ剤と、(D)溶剤とを含み、
     前記溶剤(D)として(D-1)カルボキシル基及びヒドロキシル基のいずれをも有さない有機酸エステルを含み、
     前記有機酸エステル(D-1)の減量率(TG法を用いて測定)が100質量%となる温度は180℃以上且つ前記はんだ合金粉末を構成するはんだ合金の溶融ピーク温度+50℃以下であり、
     前記有機酸エステル(D-1)の配合量は前記溶剤(D)全量に対して10質量%から100質量%であることを特徴とするフラックス組成物。
    A flux composition that is mixed with solder alloy powder to constitute a solder paste composition,
    (A) a base resin, (B) an activator, (C) a thixotropic agent, and (D) a solvent,
    The solvent (D) includes (D-1) an organic acid ester having neither a carboxyl group nor a hydroxyl group,
    The temperature at which the weight loss rate (measured using the TG method) of the organic acid ester (D-1) is 100% by mass is 180 ° C. or higher and the melting peak temperature of the solder alloy constituting the solder alloy powder + 50 ° C. or lower. ,
    The flux composition characterized in that the organic acid ester (D-1) is blended in an amount of 10% by mass to 100% by mass with respect to the total amount of the solvent (D).
  2.  前記はんだ合金粉末を構成するはんだ合金の溶融ピーク温度が130℃以上175℃未満の場合における前記有機酸エステル(D-1)の減量率(TG法を用いて測定)が100質量%となる温度は180℃以上且つ225℃未満であることを特徴とする請求項1に記載のフラックス組成物。 Temperature at which the weight loss rate (measured using the TG method) of the organic acid ester (D-1) becomes 100% by mass when the melting peak temperature of the solder alloy constituting the solder alloy powder is 130 ° C. or higher and lower than 175 ° C. It is 180 degreeC or more and less than 225 degreeC, The flux composition of Claim 1 characterized by the above-mentioned.
  3.  前記はんだ合金粉末を構成するはんだ合金の溶融ピーク温度が175℃以上205℃未満の場合における前記有機酸エステル(D-1)の減量率(TG法を用いて測定)が100質量%となる温度は180℃以上且つ255℃未満であることを特徴とする請求項1に記載のフラックス組成物。 Temperature at which the weight loss rate (measured using the TG method) of the organic acid ester (D-1) becomes 100% by mass when the melting peak temperature of the solder alloy constituting the solder alloy powder is 175 ° C. or higher and lower than 205 ° C. It is 180 degreeC or more and less than 255 degreeC, The flux composition of Claim 1 characterized by the above-mentioned.
  4.  前記はんだ合金粉末を構成するはんだ合金の溶融ピーク温度が205℃以上の場合における前記有機酸エステル(D-1)の減量率(TG法を用いて測定)が100質量%となる温度は180℃以上且つ前記溶融ピーク温度+50℃以下であることを特徴とする請求項1に記載のフラックス組成物。 When the melting peak temperature of the solder alloy constituting the solder alloy powder is 205 ° C. or higher, the temperature at which the weight loss rate of the organic acid ester (D-1) (measured using the TG method) is 100% by mass is 180 ° C. The flux composition according to claim 1, wherein the flux peak temperature is + 50 ° C. or less.
  5.  前記有機酸エステル(D-1)はアジピン酸ジメチル及びマレイン酸ジブチルの少なくとも一方であることを特徴とする請求項2に記載のフラックス組成物。 3. The flux composition according to claim 2, wherein the organic acid ester (D-1) is at least one of dimethyl adipate and dibutyl maleate.
  6.  前記有機酸エステル(D-1)はアジピン酸ジメチル、アジピン酸ジイソプロピル、マレイン酸ジブチル、セバシン酸ジメチル、アジピン酸ジイソブチル及びセバシン酸ジエチルから選ばれる少なくとも1種であることを特徴とする請求項3に記載のフラックス組成物。 The organic acid ester (D-1) is at least one selected from dimethyl adipate, diisopropyl adipate, dibutyl maleate, dimethyl sebacate, diisobutyl adipate and diethyl sebacate. The flux composition as described.
  7.  前記有機酸エステル(D-1)はアジピン酸ジメチル、アジピン酸ジイソプロピル、マレイン酸ジブチル、セバシン酸ジメチル、アジピン酸ジイソブチル、セバシン酸ジエチル、セバシン酸ジイソプロピル、セバシン酸ジブチル及びセバシン酸ジオクチルから選ばれる少なくとも1種であることを特徴とする請求項4に記載のフラックス組成物。 The organic acid ester (D-1) is at least one selected from dimethyl adipate, diisopropyl adipate, dibutyl maleate, dimethyl sebacate, diisobutyl adipate, diethyl sebacate, diisopropyl sebacate, dibutyl sebacate and dioctyl sebacate. The flux composition according to claim 4, which is a seed.
  8.  前記ベース樹脂(A)は(A-1)ロジン系樹脂及び(A-2)合成樹脂の少なくとも一方を含み、
     前記合成樹脂(A-2)はアクリル樹脂、スチレン-マレイン酸樹脂、エポキシ樹脂、ウレタン樹脂、ポリエステル樹脂、フェノキシ樹脂、テルペン樹脂、ポリアルキレンカーボネート及びカルボキシル基を有するロジン系樹脂とダイマー酸誘導体柔軟性アルコール化合物とを脱水縮合してなる誘導体化合物からなる群より選択される少なくとも1種であることを特徴とする請求項1から請求項7のいずれか1項に記載のフラックス組成物。
    The base resin (A) includes at least one of (A-1) rosin resin and (A-2) synthetic resin,
    The synthetic resin (A-2) is an acrylic resin, styrene-maleic acid resin, epoxy resin, urethane resin, polyester resin, phenoxy resin, terpene resin, polyalkylene carbonate, rosin resin having a carboxyl group, and dimer acid derivative flexibility. The flux composition according to any one of claims 1 to 7, wherein the flux composition is at least one selected from the group consisting of derivative compounds obtained by dehydration condensation with an alcohol compound.
  9.  請求項1から請求項8のいずれか1項に記載のフラックス組成物と、はんだ合金粉末とを含むことを特徴とするソルダペースト組成物。 A solder paste composition comprising the flux composition according to any one of claims 1 to 8 and a solder alloy powder.
  10.  前記はんだ合金粉末はAgを2質量%以上3.1質量%以下と、Cuを0質量%超1質量%以下と、Sbを1質量%以上5質量%以下と、Biを0.5質量%以上4.5質量%以下と、Niを0.01質量%以上0.25質量%以下含み、残部がSnからなることを特徴とする請求項9に記載のソルダペースト組成物。 The solder alloy powder contains 2% by mass to 3.1% by mass of Ag, more than 0% by mass and 1% by mass or less of Cu, 1% by mass to 5% by mass of Sb, and 0.5% by mass of Bi. The solder paste composition according to claim 9, wherein the solder paste composition contains not less than 4.5% by mass and not more than 0.01% by mass and not more than 0.01% by mass and not more than 0.25% by mass with the balance being Sn.
  11.  前記はんだ合金粉末は更にCoを0.001質量%以上0.25質量%以下含むことを特徴とする請求項10に記載のソルダペースト組成物。 The solder paste composition according to claim 10, wherein the solder alloy powder further contains Co in an amount of 0.001 mass% to 0.25 mass%.
  12.  請求項9から請求項11のいずれか1項に記載のソルダペースト組成物を用いて形成されたはんだ接合体を有することを特徴とする電子回路基板。

     
    An electronic circuit board comprising a solder joint formed using the solder paste composition according to any one of claims 9 to 11.

PCT/JP2017/023462 2016-06-29 2017-06-26 Flux composition, solder paste composition, and electronic circuit board WO2018003760A1 (en)

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CN110605499A (en) * 2018-06-14 2019-12-24 千住金属工业株式会社 Flux, solder paste, substrate, electronic device, and substrate manufacturing method
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