WO2017190381A1 - 一种内嵌触摸液晶面板及其阵列基板 - Google Patents

一种内嵌触摸液晶面板及其阵列基板 Download PDF

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Publication number
WO2017190381A1
WO2017190381A1 PCT/CN2016/083072 CN2016083072W WO2017190381A1 WO 2017190381 A1 WO2017190381 A1 WO 2017190381A1 CN 2016083072 W CN2016083072 W CN 2016083072W WO 2017190381 A1 WO2017190381 A1 WO 2017190381A1
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Prior art keywords
metal layer
metal
layer
touch
array substrate
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Ceased
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English (en)
French (fr)
Inventor
邹恭华
王英琪
黄俊宏
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Wuhan China Star Optoelectronics Technology Co Ltd
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Wuhan China Star Optoelectronics Technology Co Ltd
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Priority to US15/117,651 priority Critical patent/US10108063B2/en
Publication of WO2017190381A1 publication Critical patent/WO2017190381A1/zh
Anticipated expiration legal-status Critical
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    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/0412—Digitisers structurally integrated in a display
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0445—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using two or more layers of sensing electrodes, e.g. using two layers of electrodes separated by a dielectric layer
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/13338—Input devices, e.g. touch panels
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/136286—Wiring, e.g. gate line, drain line
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0446—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using a grid-like structure of electrodes in at least two directions, e.g. using row and column electrodes
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
    • H10D86/40—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs
    • H10D86/441—Interconnections, e.g. scanning lines
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
    • H10D86/40—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs
    • H10D86/60—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs wherein the TFTs are in active matrices
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04111—Cross over in capacitive digitiser, i.e. details of structures for connecting electrodes of the sensing pattern where the connections cross each other, e.g. bridge structures comprising an insulating layer, or vias through substrate

Definitions

  • the present invention relates to the field of touch technologies, and in particular, to an embedded touch liquid crystal panel and an array substrate thereof.
  • the touch screen is the simplest and most convenient way of human-computer interaction, so the touch screen is increasingly applied to various electronic products.
  • touch screen products can be divided into four types: infrared touch screen, capacitive touch screen, resistive touch screen and surface acoustic wave touch screen; among them, capacitive touch screen has long life, high light transmittance and can support many Point touch and other advantages have become the mainstream touch screen technology.
  • Capacitive touch screens include surface capacitive and projected capacitive, and the projected capacitive type can be divided into self-capacitance and mutual capacitance. For self-capacitance touch structures, due to the accuracy of their touch sensing and high signal-to-noise ratio, they are favored by major panel manufacturers.
  • the self-capacitance touch structure utilizes the principle of self-capacitance to realize the detection of the finger touch position.
  • a plurality of self-capacitance electrodes disposed in the same layer and insulated from each other are disposed in the touch structure, and when the human body does not touch the screen, the respective capacitor electrodes are The capacitive capacity is a fixed value.
  • the capacitance of the self-capacitance electrode corresponding to the touch position is a fixed value superimposed on the human body capacitance, and the touch detection chip passes the detection of the respective capacitor electrode during the touch time period.
  • the change in capacitance value can determine the touch position.
  • FIG. 1 is a schematic structural view of a conventional array substrate having a touch screen structure.
  • the array substrate includes a glass substrate 1 and a first metal layer 2, a first insulating layer 3a, a second metal layer 4, a second insulating layer 3b, and a common electrode which are sequentially stacked on the glass substrate 1.
  • the first metal layer 2 is provided with a plurality of scanning lines
  • the second metal layer 4 is provided with a plurality of data lines
  • the scanning lines and the data lines are perpendicular to each other in the routing direction.
  • the common electrode layer 5 is divided into a plurality of touch sensing electrodes 5a, a plurality of touch sensing electrodes 5a are arranged in an array, and a plurality of metal connecting lines 6a are disposed in the third metal layer 6.
  • Each of the touch sensing electrodes 5a needs to be connected to the touch detection chip 8 through a separate metal connection line 6a.
  • the routing direction of the metal connection line 6a is set to be the same as the routing direction of the data line, and the projection of the metal connection line 6a in the third metal layer 6 in the second metal layer 4 should be It is coincident with the data line.
  • the touch sensing electrode 5a and the corresponding metal connection line 6a are electrically connected through a via hole (not shown in the drawing) located in the third insulating layer 3c, and for each column of the touch sensing electrodes 5a, The metal connection line 6a is not connected to the front touch sensing electrode before being connected to the corresponding touch sensing electrode 5a.
  • the metal connecting line 6a After connecting to the corresponding touch sensing electrode 5a, the metal connecting line 6a will not be connected with the rear touch sensing electrode. Continue to connect.
  • the common electrode layer 5 is multiplexed into the touch sensing electrode 5a. Therefore, the common electrode layer 5 (the touch sensing electrode 5a) transmits the common voltage (Vcom) and the time sharing in a display time of one frame. Touch signal.
  • the sensitivity of the touch is related to the trace impedance of the metal connection line 6a and the self-capacitance of the touch sensing electrode 5a, so that the writing and reading of the touch pulse signal are not affected by the signal delay. It is necessary to reduce the trace impedance of the metal connection line 6a and the coupling capacitance formed between the metal connection line 6a and the touch sensing electrode 5a.
  • R ⁇ ⁇ L / S
  • L represents the length
  • S represents the line surface
  • ⁇ is the resistivity
  • S is proportional to the thickness and width of the trace.
  • the width of the single metal connection line 6a is increased, The aperture ratio of the display area is lowered; if multiple metal connection lines 6a are used and the walking line is connected to one touch sensing electrode 5a, the total resistance of the wiring is reduced, but the number of metal connection lines 6a is increased and touched.
  • the coupling capacitance formed between the sensing electrodes 5a also does not improve the touch sensitivity.
  • the present invention provides an in-line touch liquid crystal panel and an array substrate thereof, by improving the wiring structure of each layer disposed in the array substrate, without increasing connection lines and touches.
  • the coupling capacitance formed by the sensing electrode the impedance of the connection trace is reduced, and the touch sensitivity is improved.
  • An array substrate embedded with a touch liquid crystal panel comprising: a glass substrate; and a first metal layer, a second metal layer, a third metal layer, and a common electrode layer sequentially formed on the glass substrate and insulated from each other; a plurality of data lines extending along the first direction are disposed in a metal layer; the second metal layer Providing a plurality of scanning lines extending along the second direction, wherein the third metal layer is provided with a plurality of connecting traces extending along the first direction; the common electrode layer is divided into a plurality of touch sensing electrodes, The touch sensing electrode is electrically connected to the touch detection chip through the connection trace; wherein, in the second metal layer, between two adjacent scan lines, corresponding to the connection trace At a position of the projection in the second metal layer, a plurality of metal lines extending along the first direction are further disposed, the metal lines are insulated from the scan lines, and two ends of each metal line are electrically connected To a connecting trace directly above the metal line; wherein the second direction is perpen
  • a first insulating layer is disposed between the first metal layer and the second metal layer, and a second insulating layer is disposed between the second metal layer and the third metal layer, the third A third insulating layer is disposed between the metal layer and the common electrode layer.
  • the fourth electrode layer and the pixel electrode layer are sequentially disposed on the common electrode layer.
  • connection trace is connected to the touch sensing electrode through a first via disposed in the third insulating layer.
  • both ends of the metal line are connected to a connection trace directly above the metal line through a second via provided in the second insulating layer.
  • connection trace in the first metal layer falls on the data line.
  • the touch sensing electrode is configured to transmit a common voltage and a touch signal in a time-sharing manner during a display time of one frame.
  • the present invention also provides an in-cell touch liquid crystal panel comprising a thin film transistor array substrate and a color filter substrate disposed opposite to each other, and further comprising a liquid crystal layer between the thin film transistor array substrate and the color filter substrate, wherein
  • the thin film transistor array substrate is an array substrate as described above.
  • the embedded touch liquid crystal panel and the array substrate thereof provided by the embodiments of the present invention have the first metal layer as a data line trace layer and the second metal layer as a scan line trace layer.
  • the third metal layer is disposed as a connection trace layer of the touch sensing electrode and is located under the touch sensing electrode, and at the same time, a metal wire is further disposed on the second metal layer, and the metal wire is connected in parallel to the connection of the touch sensing electrode.
  • the newly added metal line is located in the second metal layer, which is separated from the touch sensing electrodes located in the common electrode layer by a plurality of structural layers, and the metal lines and connections
  • the projection relationships of the traces overlap each other, so the added metal lines have little effect on the coupling capacitance formed by the connection traces and the touch sensing electrodes.
  • FIG. 1 is a schematic structural view of a conventional array substrate having a touch screen structure
  • FIG. 2 is a diagram showing the interconnection of a touch sensing electrode and a metal connecting line in the array substrate of FIG. 1;
  • FIG. 3 is a schematic structural diagram of an array substrate embedded with a touch liquid crystal panel according to an embodiment of the present invention.
  • FIG. 4 is a schematic structural view of a first metal layer in an embodiment of the present invention.
  • FIG. 5 is a schematic structural view of a second metal layer in an embodiment of the present invention.
  • FIG. 6 is a schematic structural view of a third metal layer in an embodiment of the present invention.
  • FIG. 7 is a diagram showing the connection between a touch sensing electrode and a connection trace in the embodiment of the present invention.
  • FIG. 8 is a schematic structural view showing a metal wire and a connecting wire connected to each other in an embodiment of the present invention.
  • FIG. 9 is a schematic structural diagram of an in-cell touch liquid crystal panel according to an embodiment of the present invention.
  • the embodiment first provides an array substrate with a touch liquid crystal panel embedded therein, and the touch structure is embedded in the thin film transistor array substrate.
  • the array substrate 100 includes a glass substrate 10, and a first metal layer 11, a second metal layer 12, a third metal layer 13, and a common electrode layer 14 which are sequentially formed on the glass substrate 10 and insulated from each other.
  • a first insulating layer 15a is disposed between the first metal layer 11 and the second metal layer 12, and a second insulating layer 15b is disposed between the second metal layer 12 and the third metal layer 13.
  • a third insulating layer 15c is disposed between the third metal layer 13 and the common electrode layer 14.
  • a fourth insulating layer 15d and a pixel electrode layer 16 are sequentially disposed on the common electrode layer 14, and the pixel electrode layer 16 includes a plurality of pixel electrodes 16a.
  • the first metal layer 11 is disposed along the first direction (as in FIG. 4).
  • a plurality of data lines 11a extending in the Y direction; the data lines 11a are for supplying data signals to pixel units in the array substrate 100.
  • one pixel unit in the array substrate 100 generally includes a thin film transistor (not shown in the drawing) and a pixel electrode 16a.
  • a plurality of scan lines 12a extending in a second direction (such as the X direction in FIG. 5) are disposed in the second metal layer 12; the data lines 12a are used in the array substrate 100.
  • the pixel unit provides a scan signal. As shown in FIG.
  • the third metal layer 13 is provided with a plurality of connection traces 13a extending in a first direction (such as the Y direction in FIG. 6); the connection traces 13a are used for transmitting touch. Signal.
  • the common electrode layer 14 is divided into a plurality of touch sensing electrodes 14 a , and the plurality of touch sensing electrodes 14 a are arranged in an array to form an embedded touch structure, and the touch sensing electrodes 14 a pass through
  • the connection traces 13a of the third metal layer 13 are electrically connected to the external touch detection chip 17, wherein the connection traces 13a in FIG. 7 are indicated by broken lines, mainly for explaining that the third metal layer 13 is oppositely Located below the common electrode layer 14; further, referring to FIG.
  • connection trace 13a is connected to the first via 18 provided in the third insulating layer 15c (not shown in FIG. 7)
  • the touch sensing electrode 14a The common electrode layer 14 is multiplexed into the touch sensing electrode 14a. Therefore, the touch sensing electrode 14a transmits the common voltage (Vcom) and the touch signal in a time-sharing manner during the display time of one frame.
  • Vcom common voltage
  • the X direction and the Y direction are perpendicular to each other.
  • connection trace 13a the arrangement and extension of the connection traces 13 a are mainly shown, so the lengths of the connection traces 13 a shown in FIG. 6 are equal, but in the actual structure, refer to the figure. 7.
  • the length of the connection trace 13a connected to the different touch sensing electrodes 14a may be different.
  • the extending direction of the connecting trace 13a in the third metal layer 13 is identical to the extending direction of the data line 11a in the first metal layer 11 (see Y in FIGS. 4 and 6). The direction), and in order not to affect the aperture ratio of the display area, the projection of the connection trace 13a in the first metal layer 11 should fall on the data line 11a.
  • the position of the projection in 12 is also provided with a plurality of metal wires 12b extending in the first direction (the Y direction in FIGS. 5 and 8), and the metal wires 12b and the scanning wires 12a are insulated from each other (each There is a gap between both ends of one metal wire 12b and the adjacent scanning wire 12a, and two ends of each metal wire 12b are electrically connected to the connection wires 13a directly above the metal wire 12b.
  • both ends of the metal wire 12b are connected to the connection trace 13a located directly above the metal wire 12b through the second via hole 19 provided in the second insulating layer 15b.
  • the newly added metal line 12b is connected in parallel to the connection trace 13a of the touch sensing electrode 14a, which reduces the impedance of the connection trace 13a; and the newly added metal line 12b is located in the second metal layer.
  • a plurality of structural layers are spaced apart from the touch sensing electrodes 14a located in the common electrode layer 14, and the projection relationship of the metal wires 12b and the connecting traces 13a overlap each other, so the added metal wires 12b are connected to each other.
  • the influence of the coupling capacitance formed by the line 13a and the touch sensing electrode 14a is small, and therefore, the added metal line 12b in the second metal layer 12 can improve the touch sensitivity.
  • the embodiment further provides an in-cell touch liquid crystal panel.
  • the in-line touch liquid crystal panel includes the thin film transistor array substrate 100 provided in the foregoing embodiment, and further includes a color filter disposed opposite to the array substrate 100.
  • the optical substrate 200 and the liquid crystal layer 300 disposed between the array substrate 100 and the color filter substrate 200.
  • the embedded touch liquid crystal panel and the array substrate provided by the embodiments of the present invention improve the wiring structure of each layer disposed in the array substrate without increasing the connection trace and the touch sensing electrode.
  • the coupling capacitor the impedance of the connection trace is reduced, and the touch sensitivity is improved.

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  • Theoretical Computer Science (AREA)
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  • General Physics & Mathematics (AREA)
  • Human Computer Interaction (AREA)
  • Nonlinear Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
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Abstract

一种内嵌触摸液晶面板及其阵列基板（100），其中的阵列基板（100）包括玻璃基板（10）以及依次形成于所述玻璃基板（10）上且相互绝缘的第一金属层（11）、第二金属层（12）、第三金属层（13）以及公共电极层（14）；所述第二金属层（12中设置有多条扫描线（12a）；所述第三金属层（13）中设置有多条连接走线（13a）；所述公共电极层（14）被分割为多个触控感应电极（14a），所述触控感应电极（14a）通过所述连接走线（13a）电性连接到触控侦测芯片（17）；在所述第二金属层（12）中还设置有多条金属线（12b），金属线（12b）与扫描线（12a）相互绝缘，每一条金属线（12b）的两端分别电性连接到位于该条金属线（12b）正上方的连接走线（13a）；其中，第二方向与第一方向相互垂直。所述内嵌触摸液晶面板及其阵列基板（100），可减小触控感应电极（14a）的连接走线（13a）的阻抗，提高了触控灵敏度。

Description

一种内嵌触摸液晶面板及其阵列基板 技术领域
本发明涉及触控技术领域,尤其涉及一种内嵌触摸液晶面板及其阵列基板。
背景技术
触摸显示屏作为一种输入媒介,是目前最简单、方便的一种人机交互方式，因此触摸显示屏越来越多地应用到各种电子产品中。基于不同的工作原理以及传输信息的介质，触摸屏产品可以分为四种：红外线触摸屏、电容式触摸屏、电阻触摸屏和表面声波触摸屏；其中电容式触摸屏由于具有寿命长、透光率高、可以支持多点触控等优点成为目前主流的触摸屏技术。电容式触摸屏包括表面电容式和投射电容式，其中投射电容式又可以分为自电容式和互电容式。对于自电容触摸结构，由于其触控感应的准确度和信噪比比较高，因而受到了各大面板厂家青睐。
目前，自电容触摸结构利用自电容的原理实现检测手指触摸位置，具体为：在触摸结构中设置多个同层设置且相互绝缘的自电容电极，当人体未触碰屏幕时，各自电容电极所承受的电容为一固定值，当人体触碰屏幕时，触碰位置对应的自电容电极所承受的电容为固定值叠加人体电容，触控侦测芯片在触控时间段通过检测各自电容电极的电容值变化可以判断出触控位置。
对于自电容式内嵌(in-cell)触摸屏，通常是将触摸屏结构中的触控感应电极和金属连接线直接设置在阵列基板或滤光基板上。图1是现有的一种具有触摸屏结构的阵列基板的结构示意图。如图1所示，该阵列基板包括玻璃基板1以及依次叠层设置在玻璃基板1上的第一金属层2、第一绝缘层3a、第二金属层4、第二绝缘层3b、公共电极层5、第三绝缘层3c、第三金属层6、第四绝缘层3d以及像素电极层7。其中，第一金属层2中设置有多条扫描线，第二金属层4中设置有多条数据线，扫描线与数据线在走线方向上相互垂直。其中，参阅图1和图2，公共电极层5被分割为多个触控感应电极5a,多个触控感应电极5a呈阵列分布，第三金属层6中设置有多条金属连接线6a,每一个触控感应电极5a需要通过单独的金属连接线6a连接到触控侦测芯片8。具体地，为了不影响 显示区域的开口率，金属连接线6a的走线方向设置为与所述数据线的走线方向相同，并且位于第三金属层6中的金属连接线6a在第二金属层4中的投影应当是与所述数据线重合的。进一步地，触控感应电极5a与对应的金属连接线6a是通过位于第三绝缘层3c中的过孔(附图中未示出)电性连接，并且，对于一列触控感应电极5a，每根金属连接线6a连接到相应的触控感应电极5a前均不与前面的触控感应电极相连，连接到相应的触控感应电极5a后该金属连接线6a将不与后面的触控感应电极继续连接。其中，由于公共电极层5被复用为触控感应电极5a，因此在一帧画面的显示时间内，所述公共电极层5(触控感应电极5a)分时地传递公共电压(Vcom)和触控信号。
如上的触摸屏结构中，触控的灵敏度与金属连接线6a的走线阻抗及触控感应电极5a的自电容的大小相关，为了让触控脉冲信号的写入和读出不受信号延迟的影响，需要减小金属连接线6a的走线阻抗以及金属连接线6a与触控感应电极5a之间形成的耦合电容。根据阻抗计算公式：R＝ρ×L/S，L表示长度，S表示线载面，ρ为电阻率，S与走线厚度和宽成正比。在第三金属层6的长度、厚度和电阻率不变的情况下，为了减少金属连接线6a的走线阻抗对触控信号的影响，如果将单根金属连接线6a的宽度增大，则会降低显示区域的开口率；如果采用多根金属连接线6a并行走线连接到一个触控感应电极5a的方式降低走线的总阻值，但是增加金属连接线6a的数量会增加与触控感应电极5a之间形成的耦合电容，也无法提高触控灵敏度。
因此，在内嵌触摸屏结构中，如何减小触控感应电极的连接走线的阻抗以提高触控灵敏度是亟待解决的问题。
发明内容
鉴于现有技术存在的不足，本发明提供了一种内嵌触摸液晶面板及其阵列基板，通过对设置于阵列基板中的各层走线结构进行改进，在不增大连接走线与触控感应电极形成的耦合电容的情况下，减小了连接走线的阻抗，提高了触控灵敏度。
为了实现上述目的，本发明采用了如下的技术方案：
一种内嵌触摸液晶面板的阵列基板，其包括玻璃基板以及依次形成于所述玻璃基板上且相互绝缘的第一金属层、第二金属层、第三金属层以及公共电极层；所述第一金属层中设置有沿第一方向延伸的多条数据线；所述第二金属层 中设置有沿第二方向延伸的多条扫描线所述第三金属层中设置有沿第一方向延伸的多条连接走线；所述公共电极层被分割为多个触控感应电极，所述触控感应电极通过所述连接走线电性连接到触控侦测芯片；其中，在所述第二金属层中，位于相邻的两条扫描线之间，对应于所述连接走线在所述第二金属层中的投影的位置，还设置有沿第一方向延伸的多条金属线，所述金属线与所述扫描线相互绝缘，每一条金属线的两端分别电性连接到位于该条金属线正上方的连接走线；其中，第二方向与第一方向相互垂直。
其中，所述第一金属层和所述第二金属层之间设置有第一绝缘层，所述第二金属层和所述第三金属层之间设置有第二绝缘层，所述第三金属层和所述公共电极层之间设置有第三绝缘层。
其中，所述公共电极层上还依次设置有第四绝缘层和像素电极层。
其中，所述连接走线通过设置于所述第三绝缘层中的第一过孔连接到所述触控感应电极。
其中，所述金属线的两端通过设置于所述第二绝缘层中的第二过孔连接到位于该条金属线正上方的连接走线。
其中，所述连接走线在所述第一金属层中的投影落在所述数据线上。
其中，在一帧画面的显示时间内，所述触控感应电极用于分时地传递公共电压和触控信号。
本发明还提供了一种内嵌触摸液晶面板，包括相对设置的薄膜晶体管阵列基板和彩色滤光基板，还包括位于所述薄膜晶体管阵列基板和所述彩色滤光基板之间的液晶层，其中，所述薄膜晶体管阵列基板为如上所述的阵列基板。
相比于现有技术，本发明实施例提供的内嵌触摸液晶面板及其阵列基板，将第一金属层设置为数据线走线层，将第二金属层设置为扫描线走线层，将第三金属层设置为触控感应电极的连接走线层并且位于触控感应电极的下方，同时，在第二金属层还设置有金属线，通过将金属线并联到触控感应电极的连接走线，减小了连接走线的阻抗；并且，新增加的金属线位于第二金属层，其与位于公共电极层中的触控感应电极之间间隔着多个结构层，并且金属线与连接走线的投影关系是相互重叠，因此增加的金属线对于连接走线与触控感应电极形成的耦合电容的影响很小。基于以上，通过对设置于阵列基板中的各层走线结构进行改进，减小了触控感应电极的连接走线的阻抗，提高了触控灵敏度。
附图说明
图1是现有的一种具有触摸屏结构的阵列基板的结构示意图；
图2是如图1的阵列基板中触控感应电极与金属连接线相互连接的图示；
图3是本发明实施例提供的内嵌触摸液晶面板的阵列基板的结构示意图；
图4是本发明实施例中的第一金属层的结构示意图；
图5是本发明实施例中的第二金属层的结构示意图；
图6是本发明实施例中的第三金属层的结构示意图；
图7是本发明实施例中的触控感应电极与连接走线相互连接的图示；
图8是本发明实施例中的金属线与连接走线相互连接的结构示意图；
图9是本发明实施例提供的内嵌触摸液晶面板的结构示意图。
具体实施方式
为使本发明的目的、技术方案和优点更加清楚，下面结合附图对本发明的具体实施方式进行详细说明。这些优选实施方式的示例在附图中进行了例示。附图中所示和根据附图描述的本发明的实施方式仅仅是示例性的，并且本发明并不限于这些实施方式。
在此，还需要说明的是，为了避免因不必要的细节而模糊了本发明，在附图中仅仅示出了与根据本发明的方案密切相关的结构和/或处理步骤，而省略了与本发明关系不大的其他细节。
参阅图3-图8，本实施例首先提供了一种内嵌触摸液晶面板的阵列基板，将触摸结构内嵌于薄膜晶体管阵列基板中。如图3所示，该阵列基板100包括玻璃基板10以及依次形成于所述玻璃基板10上且相互绝缘的第一金属层11、第二金属层12、第三金属层13以及公共电极层14；所述第一金属层11和所述第二金属层12之间设置有第一绝缘层15a，所述第二金属层12和所述第三金属层13之间设置有第二绝缘层15b，所述第三金属层13和所述公共电极层14之间设置有第三绝缘层15c。进一步地，所述公共电极层14上还依次设置有第四绝缘层15d和像素电极层16，像素电极层16包括多个像素电极16a。
其中，如图4所示，所述第一金属层11中设置有沿第一方向(如图4中的 Y方向)延伸的多条数据线11a；所述数据线11a是用于向阵列基板100中的像素单元提供数据信号。需要说明的是，阵列基板100中的一个像素单元通常包括薄膜晶体管(附图中未示出)以及像素电极16a。如图5所示，所述第二金属层12中设置有沿第二方向(如图5中的X方向)延伸的多条扫描线12a；所述数据线12a是用于向阵列基板100中的像素单元提供扫描信号。如图6所示，所述第三金属层13中设置有沿第一方向(如图6中的Y方向)延伸的多条连接走线13a；所述连接走线13a是用于传递触控信号的。如图7所示，所述公共电极层14被分割为多个触控感应电极14a，多个触控感应电极14a呈阵列排布形成内嵌的触摸结构，所述触控感应电极14a通过所述第三金属层13中的连接走线13a电性连接到外部的触控侦测芯片17，其中，图7中的连接走线13a用虚线标示，主要是为了说明第三金属层13相对地位于公共电极层14的下方；进一步地，参阅图7，所述连接走线13a通过设置于所述第三绝缘层15c(图7中未示出)中的第一过孔18连接到所述触控感应电极14a。其中，由于公共电极层14被复用为触控感应电极14a，因此在一帧画面的显示时间内，所述触控感应电极14a分时地传递公共电压(Vcom)和触控信号。附图中，X方向与Y方向相互垂直。
需要说明的是，如图6中主要是示出了连接走线13a的排布方式和延伸走向，因此图6中示出的连接走线13a的长度相等，但是在实际的结构中，参阅图7，连接到不同的触控感应电极14a的连接走线13a的长度是有可能不相同。另外，参阅图4和图6，第三金属层13中的连接走线13a的延伸方向与第一金属层11中的数据线11a的延伸方向是一致的(如图4和图6中的Y方向)，并且，为了不影响显示区域的开口率，所述连接走线13a在所述第一金属层11中的投影应当要落在所述数据线11a上。
在本实施例中，参阅图5和图8，在所述第二金属层12中，位于相邻的两条扫描线12a之间，对应于所述连接走线13a在所述第二金属层12中的投影的位置，还设置有沿第一方向(图5和图8中的Y方向)延伸的多条金属线12b，所述金属线12b与所述扫描线12a是相互绝缘的(每一条金属线12b的两端与邻近的扫描线12a之间都具有间隙)，每一条金属线12b的两端分别电性连接到位于该条金属线12b正上方的连接走线13a。具体地，所述金属线12b的两端通过设置于所述第二绝缘层15b中的第二过孔19连接到位于该条金属线12b正上方的连接走线13a。新增加的金属线12b并联到触控感应电极14a的连接走线13a，减小了连接走线13a的阻抗；并且，新增加的金属线12b位于第二金属层 12，其与位于公共电极层14中的触控感应电极14a之间间隔着多个结构层，并且金属线12b与连接走线13a的投影关系是相互重叠，因此增加的金属线12b对于连接走线13a与触控感应电极14a形成的耦合电容的影响很小，因此，在第二金属层12中增加的金属线12b可以提高触控灵敏度。
本实施例还提供了一种内嵌触摸液晶面板，如图9所示，该内嵌触摸液晶面板包括前述实施例中提供的薄膜晶体管阵列基板100，还包括与阵列基板100相对设置的彩色滤光基板200，以及设置于阵列基板100和彩色滤光基板200之间的液晶层300。
综上所述，本发明实施例提供的内嵌触摸液晶面板及其阵列基板，通过对设置于阵列基板中的各层走线结构进行改进，在不增大连接走线与触控感应电极形成的耦合电容的情况下，减小了连接走线的阻抗，提高了触控灵敏度。
需要说明的是，在本文中，诸如第一和第二等之类的关系术语仅仅用来将一个实体或者操作与另一个实体或操作区分开来，而不一定要求或者暗示这些实体或操作之间存在任何这种实际的关系或者顺序。而且，术语“包括”、“包含”或者其任何其他变体意在涵盖非排他性的包含，从而使得包括一系列要素的过程、方法、物品或者设备不仅包括那些要素，而且还包括没有明确列出的其他要素，或者是还包括为这种过程、方法、物品或者设备所固有的要素。在没有更多限制的情况下，由语句“包括一个……”限定的要素，并不排除在包括所述要素的过程、方法、物品或者设备中还存在另外的相同要素。
以上所述仅是本申请的具体实施方式，应当指出，对于本技术领域的普通技术人员来说，在不脱离本申请原理的前提下，还可以做出若干改进和润饰，这些改进和润饰也应视为本申请的保护范围。

Claims (16)

  1. 一种内嵌触摸液晶面板的阵列基板，其中，包括玻璃基板以及依次形成于所述玻璃基板上且相互绝缘的第一金属层、第二金属层、第三金属层以及公共电极层；
    所述第一金属层中设置有沿第一方向延伸的多条数据线；
    所述第二金属层中设置有沿第二方向延伸的多条扫描线；
    所述第三金属层中设置有沿第一方向延伸的多条连接走线；
    所述公共电极层被分割为多个触控感应电极，所述触控感应电极通过所述连接走线电性连接到触控侦测芯片；
    其中，在所述第二金属层中，位于相邻的两条扫描线之间，对应于所述连接走线在所述第二金属层中的投影的位置，还设置有沿第一方向延伸的多条金属线，所述金属线与所述扫描线相互绝缘，每一条金属线的两端分别电性连接到位于该条金属线正上方的连接走线；
    其中，第二方向与第一方向相互垂直。
  2. 根据权利要求1所述的阵列基板，其中，所述第一金属层和所述第二金属层之间设置有第一绝缘层，所述第二金属层和所述第三金属层之间设置有第二绝缘层，所述第三金属层和所述公共电极层之间设置有第三绝缘层。
  3. 根据权利要求2所述的阵列基板，其中，所述公共电极层上还依次设置有第四绝缘层和像素电极层。
  4. 根据权利要求2所述的阵列基板，其中，所述连接走线通过设置于所述第三绝缘层中的第一过孔连接到所述触控感应电极。
  5. 根据权利要求2所述的阵列基板，其中，所述金属线的两端通过设置于所述第二绝缘层中的第二过孔连接到位于该条金属线正上方的连接走线。
  6. 根据权利要求1所述的阵列基板，其中，所述连接走线在所述第一金属层中的投影落在所述数据线上。
  7. 根据权利要求5所述的阵列基板，其中，所述连接走线在所述第一金属层中的投影落在所述数据线上。
  8. 根据权利要求1所述的阵列基板，其中，在一帧画面的显示时间内，所述触控感应电极用于分时地传递公共电压和触控信号。
  9. 一种内嵌触摸液晶面板，包括相对设置的薄膜晶体管阵列基板和彩色滤光基板，还包括位于所述薄膜晶体管阵列基板和所述彩色滤光基板之间的液晶层，其中，所述薄膜晶体管阵列基板包括玻璃基板以及依次形成于所述玻璃基板上且相互绝缘的第一金属层、第二金属层、第三金属层以及公共电极层；
    所述第一金属层中设置有沿第一方向延伸的多条数据线；
    所述第二金属层中设置有沿第二方向延伸的多条扫描线；
    所述第三金属层中设置有沿第一方向延伸的多条连接走线；
    所述公共电极层被分割为多个触控感应电极，所述触控感应电极通过所述连接走线电性连接到触控侦测芯片；
    其中，在所述第二金属层中，位于相邻的两条扫描线之间，对应于所述连接走线在所述第二金属层中的投影的位置，还设置有沿第一方向延伸的多条金属线，所述金属线与所述扫描线相互绝缘，每一条金属线的两端分别电性连接到位于该条金属线正上方的连接走线；
    其中，第二方向与第一方向相互垂直。
  10. 根据权利要求9所述的内嵌触摸液晶面板，其中，所述第一金属层和所述第二金属层之间设置有第一绝缘层，所述第二金属层和所述第三金属层之间设置有第二绝缘层，所述第三金属层和所述公共电极层之间设置有第三绝缘层。
  11. 根据权利要求10所述的内嵌触摸液晶面板，其中，所述公共电极层上还依次设置有第四绝缘层和像素电极层。
  12. 根据权利要求10所述的内嵌触摸液晶面板，其中，所述连接走线通过设置于所述第三绝缘层中的第一过孔连接到所述触控感应电极。
  13. 根据权利要求10所述的内嵌触摸液晶面板，其中，所述金属线的两端通过设置于所述第二绝缘层中的第二过孔连接到位于该条金属线正上方的连接走线。
  14. 根据权利要求9所述的内嵌触摸液晶面板，其中，所述连接走线在所 述第一金属层中的投影落在所述数据线上。
  15. 根据权利要求13所述的内嵌触摸液晶面板，其中，所述连接走线在所述第一金属层中的投影落在所述数据线上。
  16. 根据权利要求9所述的内嵌触摸液晶面板，其中，在一帧画面的显示时间内，所述触控感应电极用于分时地传递公共电压和触控信号。
PCT/CN2016/083072 2016-05-04 2016-05-24 一种内嵌触摸液晶面板及其阵列基板 Ceased WO2017190381A1 (zh)

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