WO2017118067A1 - 光学式指纹识别显示屏及显示装置 - Google Patents

光学式指纹识别显示屏及显示装置 Download PDF

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Publication number
WO2017118067A1
WO2017118067A1 PCT/CN2016/098043 CN2016098043W WO2017118067A1 WO 2017118067 A1 WO2017118067 A1 WO 2017118067A1 CN 2016098043 W CN2016098043 W CN 2016098043W WO 2017118067 A1 WO2017118067 A1 WO 2017118067A1
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WIPO (PCT)
Prior art keywords
display screen
refractive index
photosensitive elements
light guiding
array substrate
Prior art date
Application number
PCT/CN2016/098043
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English (en)
French (fr)
Inventor
刘伟
董学
陈小川
王海生
丁小梁
刘英明
赵卫杰
杨盛际
李昌峰
王鹏鹏
Original Assignee
京东方科技集团股份有限公司
北京京东方光电科技有限公司
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Application filed by 京东方科技集团股份有限公司, 北京京东方光电科技有限公司 filed Critical 京东方科技集团股份有限公司
Priority to US15/326,928 priority Critical patent/US10664679B2/en
Publication of WO2017118067A1 publication Critical patent/WO2017118067A1/zh

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    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61B—DIAGNOSIS; SURGERY; IDENTIFICATION
    • A61B5/00—Measuring for diagnostic purposes; Identification of persons
    • A61B5/117—Identification of persons
    • A61B5/1171—Identification of persons based on the shapes or appearances of their bodies or parts thereof
    • A61B5/1172—Identification of persons based on the shapes or appearances of their bodies or parts thereof using fingerprinting
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06V—IMAGE OR VIDEO RECOGNITION OR UNDERSTANDING
    • G06V40/00—Recognition of biometric, human-related or animal-related patterns in image or video data
    • G06V40/10—Human or animal bodies, e.g. vehicle occupants or pedestrians; Body parts, e.g. hands
    • G06V40/12—Fingerprints or palmprints
    • G06V40/13—Sensors therefor
    • G06V40/1318—Sensors therefor using electro-optical elements or layers, e.g. electroluminescent sensing
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
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    • G02F1/13306—Circuit arrangements or driving methods for the control of single liquid crystal cells
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    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
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    • H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
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    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
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    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/13306—Circuit arrangements or driving methods for the control of single liquid crystal cells
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    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/133308—Support structures for LCD panels, e.g. frames or bezels
    • G02F1/133331—Cover glasses
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    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/133374—Constructional arrangements; Manufacturing methods for displaying permanent signs or marks
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/13338—Input devices, e.g. touch panels
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix
    • G—PHYSICS
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    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/1368—Active matrix addressed cells in which the switching element is a three-electrode device
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/15—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components having potential barriers, specially adapted for light emission
    • H01L27/153—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components having potential barriers, specially adapted for light emission in a repetitive configuration, e.g. LED bars
    • H01L27/156—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components having potential barriers, specially adapted for light emission in a repetitive configuration, e.g. LED bars two-dimensional arrays
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/08—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors
    • H01L31/10—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors characterised by potential barriers, e.g. phototransistors
    • H01L31/101—Devices sensitive to infrared, visible or ultraviolet radiation
    • H01L31/112—Devices sensitive to infrared, visible or ultraviolet radiation characterised by field-effect operation, e.g. junction field-effect phototransistor
    • H01L31/113—Devices sensitive to infrared, visible or ultraviolet radiation characterised by field-effect operation, e.g. junction field-effect phototransistor being of the conductor-insulator-semiconductor type, e.g. metal-insulator-semiconductor field-effect transistor
    • H01L31/1136—Devices sensitive to infrared, visible or ultraviolet radiation characterised by field-effect operation, e.g. junction field-effect phototransistor being of the conductor-insulator-semiconductor type, e.g. metal-insulator-semiconductor field-effect transistor the device being a metal-insulator-semiconductor field-effect transistor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
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    • H01L31/12—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof structurally associated with, e.g. formed in or on a common substrate with, one or more electric light sources, e.g. electroluminescent light sources, and electrically or optically coupled thereto
    • H01L31/16—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof structurally associated with, e.g. formed in or on a common substrate with, one or more electric light sources, e.g. electroluminescent light sources, and electrically or optically coupled thereto the semiconductor device sensitive to radiation being controlled by the light source or sources
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
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    • H10K59/122—Pixel-defining structures or layers, e.g. banks
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    • H10K59/173—Passive-matrix OLED displays comprising banks or shadow masks
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    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
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    • H10K59/60—OLEDs integrated with inorganic light-sensitive elements, e.g. with inorganic solar cells or inorganic photodiodes
    • H10K59/65—OLEDs integrated with inorganic image sensors

Definitions

  • the present disclosure relates to the field of display technologies, and in particular, to an optical fingerprint recognition display screen and a display device.
  • FIG. 1 illustrates a structural schematic diagram of an optical fingerprint recognition device disposed in a display substrate.
  • each fingerprint device 001 is composed of two thin film transistors, one of which is a switching transistor 002 that controls a switch, and the other is a photo transistor 003 that is a photo sensor.
  • the switching transistor 002 controls a switch
  • the photo transistor 003 that is a photo sensor.
  • the current difference of each of the phototransistors 003 is sequentially read, whereby the detection of the fingerprint valleys can be realized.
  • the reflected light received by the photo transistor 003 is mixed with a lot of useless information. This affects the detection of the fingerprint detection signal, and causes the signal-to-noise ratio of the signal of the optical fingerprint recognition detection structure to be low, thereby limiting the detection accuracy.
  • the embodiments of the present disclosure provide an optical fingerprint recognition display screen and a display device for solving the problem that the reflected light received by the phototransistor device in the existing optical fingerprint recognition device is mixed with a lot of useless information, thereby causing detection. A problem with limited accuracy.
  • an embodiment of the present disclosure provides an optical fingerprint recognition display screen, including: an opposite opposite substrate and an array substrate; and the array substrate is disposed facing the opposite direction a plurality of photosensitive elements for fingerprint recognition on one side of the substrate; a mesh on a side of the array substrate facing the opposite substrate or a side of the opposite substrate facing the array substrate a black matrix layer, a mesh area of the mesh black matrix layer corresponding to the photosensitive element; and a gap between each of the photosensitive element and the opposite substrate and covering at least each of the photosensitive elements A plurality of light guiding members.
  • each of the photosensitive elements is included in a fingerprint identification component, and the fingerprint identification component is disposed on the array substrate facing the opposite substrate. On one side.
  • each of the photosensitive elements is disposed at a gap between pixels of the array substrate, and in the mesh black matrix layer
  • the mesh area is in one-to-one correspondence with the photosensitive elements.
  • the photosensitive elements are evenly distributed at a gap between pixels of the array substrate.
  • a refractive index of the light guiding member is greater than a surface of the light guiding member and the opposite substrate facing away from the light guiding member.
  • the refractive index of each of the film layers is greater than the refractive index of the film layer at the same level as the light guiding member.
  • the display screen includes a liquid crystal display, and the light guiding member includes a transparent spacer corresponding to the photosensitive element in one-to-one correspondence.
  • the refractive index of the spacer is greater than the refractive index of the liquid crystal molecules in the liquid crystal display, and is larger than the opposite substrate.
  • the refractive index of each film layer is greater than the refractive index of the liquid crystal molecules in the liquid crystal display, and is larger than the opposite substrate.
  • the display screen includes an electroluminescence display screen, and the light guiding member includes a transparent pixel defining layer.
  • the refractive index of the pixel defining layer is greater than the refractive index of each film layer in the light emitting device in the electroluminescent display screen, And greater than the refractive index of each of the opposite substrate layers.
  • the display screen provided by the embodiment of the present disclosure further includes: a protective cover disposed on a side of the opposite substrate facing away from the array substrate,
  • the surface of the protective cover facing away from the opposite substrate includes a rough surface at least at a position corresponding to a mesh area of the mesh black matrix layer.
  • the embodiment of the present disclosure further provides a display device, including the above optical fingerprint recognition display screen provided by the embodiment of the present disclosure.
  • Embodiments of the present disclosure provide an optical fingerprint recognition display screen and a display device.
  • the optical fingerprint identification display screen includes opposite facing substrates and an array substrate; a plurality of photosensitive elements disposed on a side of the array substrate facing the opposite substrate for fingerprint recognition; and the array substrate facing the opposite substrate a mesh black matrix layer on one side or a side of the opposite substrate facing the array substrate, the mesh area of the mesh black matrix layer corresponding to the photosensitive element; and, disposed on each of the photosensitive element and the opposite substrate And covering at least a plurality of light guiding members of each photosensitive element.
  • the light guiding member Since the light guiding member is added above the photosensitive member and the light guiding member and the opposite substrate are in contact with each other, the light reflected off the fingerprint valley will preferentially enter the light guiding member after passing through the mesh region of the black matrix layer.
  • the light guiding member covers the respective photosensitive members, the light is directly irradiated onto the photosensitive member after being refracted inside the light guiding member. In this way, the loss of the ridge light before it hits the respective photosensitive elements is reduced.
  • the reflection of the light guiding member and the occlusion of the black matrix layer the interference of the display light and the ambient light as interference light to the valley light is shielded, and further mutual interference between the photosensitive elements is shielded. Thereby, more accurate fingerprint detection is achieved, and the accuracy of fingerprint recognition is improved.
  • FIG. 1 is a schematic structural view of a prior art optical fingerprint recognition device
  • FIG. 2 is a schematic structural diagram of an optical fingerprint recognition display screen according to an embodiment of the present disclosure
  • FIG. 3 is a top plan view of an optical fingerprint recognition display screen according to an embodiment of the present disclosure.
  • FIG. 4 is a schematic structural diagram of an optical fingerprint recognition display screen including a liquid crystal display screen according to an embodiment of the present disclosure.
  • optical fingerprint recognition display screen and the display device provided by the embodiments of the present disclosure are described in detail below with reference to the accompanying drawings.
  • An embodiment of the present disclosure provides an optical fingerprint recognition display screen, as shown in FIG. 2, including: an opposite opposite substrate 100 and an array substrate 200; and is disposed on a side of the array substrate 200 facing the opposite substrate 100.
  • a plurality of photosensitive elements 300 for fingerprint recognition a mesh black matrix layer 400 disposed on a side of the array substrate 200 facing the opposite substrate 100 or a side of the opposite substrate 100 facing the array substrate 200, a mesh black
  • the mesh area A of the matrix layer 400 corresponds to the photosensitive element 300, and the black matrix layer 400 is disposed on the opposite substrate 100 as an example in FIG. 2; and is disposed on each of the photosensitive element 300 and the opposite substrate 100.
  • a plurality of light guiding members 500 are provided between at least one of the photosensitive members 300.
  • each of the photosensitive elements 300 may also be included in a fingerprint recognition member (not shown) which may be disposed on a side of the array substrate 200 facing the opposite substrate 100.
  • the light guiding member 500 is added above the photosensitive member 300, and the light guiding member 500 and the opposite substrate 100 are in contact with each other, the light reflected off the fingerprint valley is passed through the black matrix.
  • the mesh area A of layer 400 will then enter the light directing component 500 maximally.
  • the light guiding member 500 covers the respective photosensitive elements 300, the light is directly irradiated onto the photosensitive member 300 after being refracted inside the light guiding member 500. Thus, the loss of the ridge light before the respective photosensitive elements 300 is irradiated is reduced.
  • the reflection of the light guiding member 500 and the blocking action of the black matrix layer 400 shield the interference of the display light and the ambient light as interference light with the valley light, and further the mutual interference between the photosensitive elements 300. Thereby, more accurate fingerprint detection is achieved, and the accuracy of fingerprint recognition is improved.
  • the fingerprint identification component for implementing the optical fingerprint recognition function may have various specific implementation structures, which are not limited herein.
  • the photosensitive element 300 disposed in the fingerprint recognition component may be implemented by using a photodiode or other devices having light-sensitive characteristics, which is not limited herein.
  • the fingerprint in the fingerprint identification component identification may specifically refer to a fingerprint of a finger, or may refer to a fingerprint of other parts of the living body, such as a palm print or the like. Such textures fall within the scope of the embodiments of the present disclosure as long as they are capable of characterizing the unique identity of the organism.
  • the photosensitive element 300 of each fingerprint recognition component is generally Will be disposed on the array substrate 200 At the gap between the pixels 600. That is, the photosensitive element 300 is disposed in a region of the display region B that is originally blocked by the black matrix layer 400. At this time, the black matrix layer 400 is subjected to a hole opening process to form a mesh area A which is in one-to-one correspondence with the position of the photosensitive element 300.
  • the photosensitive element 300 of each fingerprint identification component is in the gap between the pixels 600 of the array substrate 200, in accordance with a specific embodiment. It is generally evenly distributed.
  • the display screen may further include a protective cover 700 disposed on a side of the opposite substrate 100 facing away from the array substrate 200.
  • the outer surface of the protective cover 700 i.e., the surface facing away from the opposite substrate 100
  • the outer surface of the protective cover 700 may be micro-processed to form a rough surface.
  • the law of refraction of light can be utilized in design. That is to say, in the case where light enters the optically dense material from the light-diffusing material, total reflection can occur when the incident angle satisfies a certain condition.
  • the refractive index of the light guiding member 500 is selected to be larger than between the outer surface of the light guiding member 500 and the opposite substrate 100 (ie, the surface facing away from the light guiding member 500).
  • the refractive index of each of the film layers, and also the refractive index of the light guiding member 500 is selected to be larger than the refractive index of the film layer at the same level as the light guiding member 500.
  • the specific display panel type of the above display screen provided by the embodiment of the present disclosure will be different depending on the implementation manner of the light guiding member 500 disposed on the photosensitive element 300.
  • the foregoing display screen provided by the embodiment of the present disclosure is a liquid crystal display screen.
  • a spacer 501 is generally disposed between the array substrate 200 and the opposite substrate 100. Therefore, part of the spacers 501 can be changed and set as a transparent spacer 501 that corresponds one-to-one with the photosensitive element 300.
  • the refractive index of the spacer 501 may be greater than the refractive index of the liquid crystal molecules and larger than the refractive index of each of the film layers in the counter substrate 100.
  • the refractive index of the spacer 501 may be greater than the refractive index of the glass substrate, and the refractive index of the alignment layer, and the like.
  • the spacer 501 may be a right cone as shown in FIG. 4, an inverted cone, a trapezoidal rectangular body, a cube, or the like.
  • the orthographic projection of the spacer 501 on the array substrate 200 should cover the photosensitive element 300.
  • such an orthographic projection can be slightly larger than the photosensitive element 300.
  • the photosensitive element 300 is rectangular, and the orthographic projections of the spacer 501 and the mesh area A of the black matrix layer 400 are coincident in a circular shape.
  • the light is first emitted by the backlight 800.
  • the light-receiving element 300 can only be moved from its peripheral area due to the occlusion of the photosensitive element 300, after which it passes.
  • the liquid crystal cell and the respective film layers thereon reach the protective cover 700 of the display screen.
  • the light returns to the liquid crystal cell with different intensity reflections due to the difference between the human and the valley of the finger.
  • the micro-processing of the protective cover 700 due to the micro-processing of the protective cover 700, light reflected off the fingerprint valley can enter the spacer from the windowed region of the black matrix layer 400 (ie, the mesh region), and linear or total reflection is achieved. propagation.
  • the light that reflects off the valley will enter the spacer 501 less due to the difference in angle of incidence.
  • the interfering light will also not easily enter the spacer. In this way, fingerprint information between the respective photosensitive elements 300 and interference of other interfering light rays to the useful light to be acquired are reduced, thereby achieving more accurate fingerprint detection and improving the accuracy of fingerprint recognition.
  • a pixel defining layer is generally disposed between respective pixels of the array substrate 200. Therefore, a part of the pixel defining layer can be changed and designed to cover the transparent pixel defining layer of the photosensitive element 300.
  • the refractive index of the pixel defining layer may be greater than the refractive index of each of the film layers in the light emitting device, and greater than the refractive index of each of the film layers in the opposite substrate 100.
  • the refractive index of the pixel defining layer may be greater than the refractive index of the glass substrate, the refractive index of the cathode, and the refractive index of the light emitting layer, and the like.
  • an embodiment of the present disclosure further provides a display device.
  • the display device includes the above optical fingerprint recognition display screen provided by the embodiment of the present disclosure.
  • the display The device can be any product or component having a display function such as a mobile phone, a tablet computer, a television, a display, a notebook computer, a digital photo frame, a navigator, and the like.
  • a display function such as a mobile phone, a tablet computer, a television, a display, a notebook computer, a digital photo frame, a navigator, and the like.
  • Embodiments of the present disclosure provide the above optical fingerprint recognition display screen and display device.
  • the optical fingerprint identification display screen includes opposite facing substrates and an array substrate; a plurality of photosensitive elements disposed on a side of the array substrate facing the opposite substrate for fingerprint recognition; and the array substrate facing the opposite substrate a meshed black matrix layer on one side or a side of the opposite substrate facing the array substrate, the meshed black matrix layer corresponding to the photosensitive element; and disposed between each of the photosensitive elements and the opposite substrate and covering at least a plurality of light guiding members of each photosensitive element.
  • the light guiding member Since the light guiding member is added above the photosensitive member, and the light guiding member and the opposite substrate are in contact with each other, the light reflected off the fingerprint valley will preferentially enter the light guiding member after passing through the mesh region of the black matrix layer.
  • the light guiding member covers the respective photosensitive members, the light is directly irradiated onto the photosensitive member after being refracted inside the light guiding member. In this way, the loss of the ridge light before it hits the respective photosensitive elements is reduced.
  • the reflection of the light guiding member and the occlusion of the black matrix layer the interference of the display light and the ambient light as interference light to the valley light is shielded, and further mutual interference between the photosensitive elements is shielded. Thereby, more accurate fingerprint detection is achieved, and the accuracy of fingerprint recognition is improved.

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Abstract

一种光学式指纹识别显示屏及显示装置。将用于指纹识别的多个感光元件（300）设置于阵列基板（200）上，使网状黑矩阵层（400）的网孔区域（A）与感光元件（300）对应，并且在每一个感光元件（300）与对向基板（100）之间设置至少覆盖每一个感光元件（300）的多个导光部件（500）。由于导光部件（500）与对向基板（100）相互接触，所以反射离开指纹谷脊的光线在经过黑矩阵层（400）的网孔区域（A）之后将最大化地进入导光部件（500），并且在导光部件（500）内部发生折射之后直接照射到感光元件（300）上。这样，减少了谷脊光线照射到各个感光元件（300）之前的损失。而且，通过导光部件（500）的反射作用和黑矩阵层（400）的遮挡作用，屏蔽了作为干扰光线的显示光线和环境光线对于谷脊光线的干扰，以及感光元件（300）之间的相互干扰。由此，实现了更精确化的指纹检测，提高了指纹识别的精准度。

Description

光学式指纹识别显示屏及显示装置 技术领域
本公开涉及显示技术领域，尤其涉及光学式指纹识别显示屏及显示装置。
背景技术
近年来，随着显示技术的高速发展，具有生物识别功能的移动产品逐渐进入人们的生活工作中。特别地，指纹技术凭借着其唯一身份特性而备受人们越来越多的重视。目前，基于硅基工艺的按压式和滑动式指纹识别技术已经整合入移动产品中。而且，未来人们关注的核心也是显示区域内的指纹识别技术。
图1图示了设置在显示基板中的光学式指纹识别器件的结构示意图。具体地，每个指纹器件001由两个薄膜晶体管组成，其中一个为控制开关的开关晶体管002，而另一个为作为感光元件(photo sensor)的感光晶体管003。当进行指纹扫描时，由于指纹谷脊之间的差异，照射到手指上的光将会产生不同的反射，从而使得到达感光晶体管003的光强出现变化，并且产生不同的光电流差异。在开关晶体管002的控制下，依次读出各个感光晶体管003的电流差异，由此可以实现对指纹谷脊的检测。
在具体实施中，由于环境光以及入射光的干扰，在上述光学式指纹识别器件中，由感光晶体管003接收到的反射回来的光线夹杂了许多无用信息。这影响着对指纹检测信号的检测，并且导致这种光学式指纹识别检测结构的信号的信噪比较低，从而使检测精准度受限。
发明内容
有鉴于此，本公开实施例提供了光学式指纹识别显示屏及显示装置，用以解决现有光学式指纹识别器件中由于感光晶体管器件接收到的反射回来的光线夹杂了许多无用信息从而致使检测精准度受限的问题。
因此，本公开实施例提供了一种光学式指纹识别显示屏，包括：相对而置的对向基板和阵列基板；设置于所述阵列基板面向所述对向 基板的一侧上以用于指纹识别的多个感光元件；设置于所述阵列基板面向所述对向基板的一侧上或所述对向基板面向所述阵列基板的一侧上的网状黑矩阵层，所述网状黑矩阵层的网孔区域与所述感光元件对应；以及，设置于每一个所述感光元件与所述对向基板之间并且至少覆盖每一个所述感光元件的多个导光部件。
根据一种可能的实现方式，在本公开实施例提供的上述显示屏中，每一个所述感光元件包括在指纹识别部件中，所述指纹识别部件设置于所述阵列基板面向所述对向基板的一侧上。
根据一种可能的实现方式，在本公开实施例提供的上述显示屏中，每一个所述感光元件设置于所述阵列基板的像素之间的间隙处，并且所述网状黑矩阵层中的网孔区域与所述感光元件一一对应。
根据一种可能的实现方式，在本公开实施例提供的上述显示屏中，所述感光元件在所述阵列基板的像素之间的间隙处均匀分布。
根据一种可能的实现方式，在本公开实施例提供的上述显示屏中，所述导光部件的折射率大于在所述导光部件与所述对向基板背离所述导光部件的表面之间的每一个膜层的折射率，并且大于与所述导光部件位于同一水平面的膜层的折射率。
根据一种可能的实现方式，在本公开实施例提供的上述显示屏中，所述显示屏包括液晶显示屏，并且所述导光部件包括与所述感光元件一一对应的透明隔垫物。
根据一种可能的实现方式，在本公开实施例提供的上述显示屏中，所述隔垫物的折射率大于所述液晶显示屏中的液晶分子的折射率，并且大于所述对向基板中的每一个膜层的折射率。
根据一种可能的实现方式，在本公开实施例提供的上述显示屏中，所述显示屏包括电致发光显示屏，并且所述导光部件包括透明的像素限定层。
根据一种可能的实现方式，在本公开实施例提供的上述显示屏中，所述像素限定层的折射率大于所述电致发光显示屏中的发光器件内的每一个膜层的折射率，并且大于所述对向基板中的每一个膜层的折射率。
根据一种可能的实现方式，本公开实施例提供的上述显示屏还包括：设置于所述对向基板背离所述阵列基板的一侧上的保护盖板，其 中至少在与所述网状黑矩阵层的网孔区域对应的位置处，所述保护盖板背离所述对向基板的表面包括粗糙表面。
本公开实施例提供还提供了一种显示装置，包括：本公开实施例提供的上述光学式指纹识别显示屏。
本公开实施例提供了光学式指纹识别显示屏及显示装置。该光学式指纹识别显示屏包括相对而置的对向基板和阵列基板；设置于阵列基板面向对向基板的一侧上以用于指纹识别的多个感光元件；设置于阵列基板面向对向基板的一侧上或对向基板面向阵列基板的一侧上的网状黑矩阵层，该网状黑矩阵层的网孔区域与感光元件对应；以及，设置于每一个感光元件与对向基板之间并且至少覆盖每一个感光元件的多个导光部件。由于在感光元件的上方增加导光部件并且导光部件与对向基板相互接触，所以反射离开指纹谷脊的光线在经过黑矩阵层的网孔区域之后将最大化地进入导光部件。另外，由于导光部件覆盖各个感光元件，所以光线在导光部件内部发生折射之后将直接照射到感光元件上。这样，减少了谷脊光线照射到各个感光元件之前的损失。而且，通过导光部件的反射作用和黑矩阵层的遮挡作用，屏蔽了作为干扰光线的显示光线和环境光线对于谷脊光线的干扰，以及进一步地感光元件之间的相互干扰。由此，实现了更精确化的指纹检测，并且提高了指纹识别的精准度。
附图说明
图1为现有技术光学式指纹识别器件的结构示意图；
图2为本公开实施例提供的光学式指纹识别显示屏的结构示意图；
图3为本公开实施例提供的光学式指纹识别显示屏的俯视示意图；以及
图4为本公开实施例提供的光学式指纹识别显示屏包括液晶显示屏时的结构示意图。
具体实施方式
下面结合附图，对本公开实施例提供的光学式指纹识别显示屏及显示装置的具体实施方式进行详细地说明。
附图中各部件的形状和大小不代表显示屏的真实比例，其目的只 是示意说明本公开内容。
本公开实施例提供了一种光学式指纹识别显示屏，如图2所示，包括：相对而置的对向基板100和阵列基板200；设置于阵列基板200面向对向基板100的一侧上以用于指纹识别的多个感光元件300；设置于阵列基板200面向对向基板100的一侧上或对向基板100面向阵列基板200的一侧上的网状黑矩阵层400，网状黑矩阵层400的网孔区域A与感光元件300对应，在图2中以黑矩阵层400设置于对向基板100上为例进行说明；以及，设置于每一个感光元件300与对向基板100之间并且至少覆盖每一个感光元件300的多个导光部件500。作为具体示例，每一个感光元件300也可以包括在指纹识别部件(未示出)中，该指纹识别部件可以设置在阵列基板200面向对向基板100的一侧上。
在本公开实施例提供的上述显示屏中，由于在感光元件300的上方增加导光部件500，并且导光部件500与对向基板100相互接触，所以反射离开指纹谷脊的光线在经过黑矩阵层400的网孔区域A之后将最大化地进入导光部件500。另外，由于导光部件500覆盖各个感光元件300，所以光线在导光部件500内部发生折射之后将直接照射到感光元件300上。这样，减小了谷脊光线照射到各个感光元件300之前的损失。而且，通过导光部件500的反射作用和黑矩阵层400的遮挡作用，屏蔽了作为干扰光线的显示光线和环境光线对于谷脊光线的干扰，以及进一步地感光元件300之间的相互干扰。由此，实现了更精确化的指纹检测，并且提高了指纹识别的精准度。
根据具体实施例，在本公开实施例提供的上述显示屏中，用于实现光学式指纹识别功能的指纹识别部件可以具有多种具体实施结构，在此不做限定。当然，具体地，设置在指纹识别部件中的感光元件300既可以采用感光二极管实现，也可以采用其他具有光敏感特性的器件实现，在此不做限定。另外，在本公开实施例提供的上述显示屏中，指纹识别部件识别中的指纹具体可以是指手指的指纹，也可以是指生物体其他部位的指纹，例如掌纹之类。只要能够表征生物体的唯一身份特性，这样的纹理就都落入本公开实施例的保护范围内。
根据具体实施例，在本公开实施例提供的上述显示屏中，为了使实现指纹识别功能的感光元件300不占用显示屏的开口率，如图3所示，各个指纹识别部件的感光元件300一般会设置于阵列基板200的 像素600之间的间隙处。也就是说，将感光元件300设置在显示区域B中原本被黑矩阵层400所遮挡的区域。此时，对黑矩阵层400进行开孔处理，形成与感光元件300所在位置一一对应的网孔区域A。这样，一方面可以便于反射离开指纹谷脊的光线在经过该网孔区域A之后入射到导光部件500。同时另一方面，可以防止作为干扰光线的环境光照射到导光部件500和感光元件300，从而提高各个感光元件300的信噪比。
根据具体实施例，为了便于指纹的检测与识别，在本公开实施例提供的上述显示屏中，如图3所示，各个指纹识别部件的感光元件300在阵列基板200的像素600之间的间隙处一般均匀分布。
进一步地，为了使反射离开谷脊的光线最大化地射入到导光部件500中，可以在谷脊与显示屏接触的位置处进行微处理。通过这样的微处理，使反射离开谷脊的光线可以更多地入射至显示屏内部的导光部件500中。例如，一般地，如图2所示，显示屏还可以包括设置于对向基板100背离阵列基板200的一侧上的保护盖板700。而且，至少在与黑矩阵层400的网孔区域A对应的位置处，可以对保护盖板700的外表面(即，背离对向基板100的表面)进行微处理以形成粗糙表面。
进一步地，在本公开实施例提供的上述显示屏中，为了使反射离开谷脊的光线在进入导光部件500之后可以尽可能多地减少损失，在设计时可以利用光的折射定律。也就是说，在光线从光疏材料进入光密材料的情况下，当入射角满足一定的条件时，可以发生全反射。这样，在选取导光部件500的材料时，将导光部件500的折射率选择成大于在导光部件500与对向基板100的外表面(即，背离导光部件500的表面)之间的每一个膜层的折射率，而且，还将导光部件500的折射率选择成大于与导光部件500位于同一水平面的膜层的折射率。由此，反射离开谷脊的光线可以在导光部件500中产生全反射现象，而同时避免外界其他干扰光线进入导光部件500。这样，减少了反射离开指纹谷脊的光线之间的相互干扰。
根据具体实施例，本公开实施例提供的上述显示屏所具有的具体显示面板类型将取决于设置在感光元件300上的导光部件500的实现方式而有所不同。
具体地，在本公开实施例提供的上述显示屏为液晶显示屏的情况 下，在阵列基板200与对向基板100之间一般设置有隔垫物501。因此，可以对部分隔垫物501进行变更并将其设置为与感光元件300一一对应的透明隔垫物501。此时，隔垫物501的折射率可以大于液晶分子的折射率，并且大于对向基板100中各个膜层的折射率。例如，隔垫物501的折射率可以大于玻璃衬底的折射率，以及取向层的折射率等。而且，在具体实施例中，对于隔垫物501的形状并无特定要求。具体地，隔垫物501可以是如图4所示的正圆锥体，也可以是倒圆锥体，还可以是梯形体长方体或立方体等。另外，如图4所示，隔垫物501在阵列基板200上的正投影应覆盖感光元件300。一般地，这样的正投影可以稍大于感光元件300。具体地，如图3中所示，感光元件300为长方形，隔垫物501和黑矩阵层400的网孔区域A的正投影重合为圆形。
如图4所示，当使用显示屏进行指纹识别时，光线首先由背光800射出，在经由阵列基板200之后，由于感光元件300的遮挡而只能从其周边区域向上传射，在此之后经过液晶盒及其上各个膜层而到达显示屏的保护盖板700。在人体手指进行触控之后，由于人体手指谷脊间的差异，光线以不同强度的反射返回到液晶盒内。另外，由于保护盖板700的微处理，使得反射离开指纹谷脊的光线能从黑矩阵层400的开窗区(即，网孔区域)进入隔垫物中，并且实现了直线传播或全反射传播。然而，对于其他区域，反射离开谷脊的光线将由于入射角度的差异而较少地进入该隔垫物501。此外，干扰光线也将不易进入隔垫物。以此方式，减小了各个感光元件300之间指纹信息以及其他干扰光线对所要获取的有用光线的干扰，从而实现了更精确化的指纹检测，并且提高了指纹识别的精准度。
具体地，在本公开实施例提供的上述显示屏为电致发光显示屏的情况下，在阵列基板200的各个像素之间一般设置有像素限定层(PDL)。因此，可以对部分像素限定层进行变更，并且将其设计为覆盖感光元件300的透明像素限定层。此时，像素限定层的折射率可以大于发光器件中各个膜层的折射率，并且大于对向基板100中各个膜层的折射率。例如，像素限定层的折射率可以大于玻璃衬底的折射率，阴极的折射率，以及发光层的折射率等。
基于同一公开构思，本公开实施例还提供了一种显示装置。该显示装置包括本公开实施例提供的上述光学式指纹识别显示屏。该显示 装置可以为手机、平板电脑、电视机、显示器、笔记本电脑、数码相框、导航仪等任何具有显示功能的产品或部件。关于该显示装置的实施例可以参见上述光学式指纹识别显示屏的实施例，重复之处不再赘述。
本公开实施例提供了上述光学式指纹识别显示屏及显示装置。该光学式指纹识别显示屏包括相对而置的对向基板和阵列基板；设置于阵列基板面向对向基板的一侧上以用于指纹识别的多个感光元件；设置于阵列基板面向对向基板的一侧上或对向基板面向阵列基板的一侧上的网状黑矩阵层，该网状黑矩阵层与感光元件对应；以及，设置于每一个感光元件与对向基板之间并且至少覆盖每一个感光元件的多个导光部件。由于在感光元件的上方增加导光部件，并且导光部件与对向基板相互接触，所以反射离开指纹谷脊的光线在经过黑矩阵层的网孔区域之后将最大化地进入导光部件。另外，由于导光部件覆盖各个感光元件，所以光线在导光部件内部发生折射之后将直接照射到感光元件上。这样，减少了谷脊光线照射到各个感光元件之前的损失。而且，通过导光部件的反射作用和黑矩阵层的遮挡作用，屏蔽了作为干扰光线的显示光线和环境光线对于谷脊光线的干扰，以及进一步地感光元件之间的相互干扰。由此，实现了更精确化的指纹检测，并且提高了指纹识别的精准度。
显然，本领域的技术人员可以对本公开进行各种改动和变型而不脱离本公开的精神和范围。这样，倘若本公开的这些修改和变型属于本公开权利要求及其等同技术的范围之内，则本公开也意图包含这些改动和变型在内。

Claims (11)

  1. 一种光学式指纹识别显示屏，包括：
    相对而置的对向基板和阵列基板；
    设置于所述阵列基板面向所述对向基板的一侧上以用于指纹识别的多个感光元件；
    设置于所述阵列基板面向所述对向基板的一侧上或所述对向基板面向所述阵列基板的一侧上的网状黑矩阵层，所述网状黑矩阵层的网孔区域与所述感光元件对应；以及
    设置于每一个所述感光元件与所述对向基板之间并且至少覆盖每一个所述感光元件的多个导光部件。
  2. 如权利要求1所述的显示屏，其中
    每一个所述感光元件包括在指纹识别部件中，所述指纹识别部件设置于所述阵列基板面向所述对向基板的一侧上。
  3. 如权利要求1所述的显示屏，其中
    每一个所述感光元件设置于所述阵列基板的像素之间的间隙处，并且
    所述网状黑矩阵层中的网孔区域与所述感光元件一一对应。
  4. 如权利要求3所述的显示屏，其中
    所述感光元件在所述阵列基板的像素之间的间隙处均匀分布。
  5. 如权利要求1所述的显示屏，其中
    所述导光部件的折射率大于在所述导光部件与所述对向基板背离所述导光部件的表面之间的每一个膜层的折射率，并且大于与所述导光部件位于同一水平面的膜层的折射率。
  6. 如权利要求5所述的显示屏，其中
    所述显示屏包括液晶显示屏，并且
    所述导光部件包括与所述感光元件一一对应的透明隔垫物。
  7. 如权利要求6所述的显示屏，其中
    所述隔垫物的折射率大于所述液晶显示屏中的液晶分子的折射率，并且大于所述对向基板中的每一个膜层的折射率。
  8. 如权利要求5所述的显示屏，其中
    所述显示屏包括电致发光显示屏，并且
    所述导光部件包括透明的像素限定层。
  9. 如权利要求8所述的显示屏，其中
    所述像素限定层的折射率大于所述电致发光显示屏中的发光器件内的每一个膜层的折射率，并且大于所述对向基板中的每一个膜层的折射率。
  10. 如权利要求1-8中任一项所述的显示屏，还包括：
    设置于所述对向基板背离所述阵列基板的一侧上的保护盖板，其中至少在与所述网状黑矩阵层的网孔区域对应的位置处，所述保护盖板背离所述对向基板的表面包括粗糙表面。
  11. 一种显示装置，包括：如权利要求1-10中任一项所述的光学式指纹识别显示屏。
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