WO2017067076A1 - Structure de revêtement de verre, appareil de détection d'empreintes digitales et terminal mobile - Google Patents

Structure de revêtement de verre, appareil de détection d'empreintes digitales et terminal mobile Download PDF

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Publication number
WO2017067076A1
WO2017067076A1 PCT/CN2015/099673 CN2015099673W WO2017067076A1 WO 2017067076 A1 WO2017067076 A1 WO 2017067076A1 CN 2015099673 W CN2015099673 W CN 2015099673W WO 2017067076 A1 WO2017067076 A1 WO 2017067076A1
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WO
WIPO (PCT)
Prior art keywords
layer
coating layer
glass
coating
plating
Prior art date
Application number
PCT/CN2015/099673
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English (en)
Chinese (zh)
Inventor
苏斌
Original Assignee
乐视移动智能信息技术（北京）有限公司
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Publication of WO2017067076A1 publication Critical patent/WO2017067076A1/fr

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    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
    • C03C17/3429—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating
    • C03C17/3435—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising a nitride, oxynitride, boronitride or carbonitride
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F18/00—Pattern recognition
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06V—IMAGE OR VIDEO RECOGNITION OR UNDERSTANDING
    • G06V40/00—Recognition of biometric, human-related or animal-related patterns in image or video data
    • G06V40/10—Human or animal bodies, e.g. vehicle occupants or pedestrians; Body parts, e.g. hands
    • G06V40/12—Fingerprints or palmprints
    • G06V40/13—Sensors therefor
    • G06V40/1306—Sensors therefor non-optical, e.g. ultrasonic or capacitive sensing
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/90—Other aspects of coatings
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/17—Deposition methods from a solid phase

Definitions

  • the invention relates to a glass coating structure, a fingerprint detecting device and a mobile terminal, in particular to a glass coating structure applied to fingerprint detection, a fingerprint detecting device comprising the glass plating structure and a mobile terminal including the fingerprint detecting device.
  • fingerprint recognition technology has been applied to products such as mobile terminals (such as computers).
  • the capacitive push fingerprint detection method is widely used, and is specifically divided into active press detection and passive press detection.
  • the basic principle of passive press detection is shown in Figure 1.
  • the entire detection system includes: a capacitive fingerprint sensor 10 at the bottom and an isolation layer (or a protective layer) overlying the capacitive fingerprint sensor 10, which is also the area where the finger is in direct contact.
  • the capacitive fingerprint sensor 10 includes a plurality of capacitor plates arranged in a two-dimensional array (exemplarily labeled 5 capacitor plates P1-P5 in the figure), when the skin of the finger 12 is attached to the isolation layer 11 After the combination, a capacitance is formed between the skin of the finger 12 and the capacitor plate. Due to the presence of the fingerprint, a situation as shown in FIG.
  • the skin of the finger 12 and the surface of the isolation layer 11 form a plurality of ridges and ridges.
  • the distance between the different positions of the skin of the finger 12 and the respective capacitive plates is unequal, whereby different capacitance values are produced between the respective capacitive plates and the skin of the fingers 12.
  • the capacitance value formed at the crucible is Cv
  • the capacitance value formed at the crucible is Cr.
  • FIG. 2 The principle of active press detection is shown in FIG. 2.
  • a metal ring 13 surrounding the isolation layer 11 is added.
  • the metal ring 13 is connected to the bottom circuit, and the metal ring 13 is used to wake up the bottom layer.
  • Capacitive fingerprint sensor 10 and through metal The ring 13 applies a certain current signal to the finger 12, thereby increasing the amount of charge on the skin of the finger 12, thereby enhancing the signal detected by the capacitive plate.
  • FIG. 3 it shows a fingerprint image signal presented by detection of a capacitive fingerprint sensor.
  • the upper and lower surfaces of the spacer layer 11 must be formed of an insulating material, otherwise the capacitance between the skin of the finger 12 and the capacitor plate will be destroyed, so that the fingerprint information cannot be detected.
  • the portion of the isolation layer 11 that is in contact with the metal ring 13 must also be insulated. If the isolation layer 11 is electrically conductive, current on the metal ring 13 will flow through the isolation layer 11, thereby The signal is confusing and the fingerprint information cannot be detected.
  • the capacitive fingerprint sensor 10 since the detection range of the capacitive plate array of the capacitive fingerprint sensor 10 is small, the finger 12 is required to be close to the array of the capacitor plates, that is, the thickness of the isolation layer 11 is not required to be large, or the fingerprint detection effect is affected. Especially for the passive press detection system, the capacitive fingerprint sensor 10 is more sensitive to the thickness of the upper covered isolation layer 11, and the isolation layer 11 having a larger thickness cannot be used.
  • the area covered by the isolation layer 11 is also the area for fingerprint recognition, which is generally located on mobile terminals.
  • the more prominent position, for example, is placed in the middle of the back cover of the mobile phone, or placed in the lower part of the front of the mobile phone. Therefore, the aesthetic appearance of the fingerprint recognition area will directly affect the overall appearance of the mobile phone.
  • the isolation layer 11 of the fingerprint recognition area is mostly made of ceramic or plastic, and the protection capacitor is simply realized in function.
  • the fingerprint sensor 10 functions as an isolation package, but the glass mirror cannot be realized on the fingerprint detecting device.
  • the present invention provides a glass plating structure comprising a glass substrate, and an alternating layer of a titanium oxynitride coating layer and a silicon oxynitride coating layer are disposed downwardly on a lower surface of the glass substrate, wherein
  • the ratio of nitrogen to oxygen is between 0.4:1 and 0.6:1.
  • the present invention also provides a fingerprint detecting device comprising: a capacitive fingerprint sensor, wherein the glass plating structure is attached to an upper portion of the capacitive fingerprint sensor.
  • the present invention further provides a mobile terminal including the above-mentioned fingerprint detecting device, the back cover of the mobile terminal is provided with an opening for performing fingerprint detection, and the fingerprint detecting device is located at a lower portion of the opening, and the fingerprint detecting device The upper surface of the glass plating structure is exposed from the opening.
  • FIG. 2 is a second schematic diagram of the principle of fingerprint detection in the prior art
  • FIG. 3 is a schematic diagram of a fingerprint detection image signal of the prior art
  • Figure 4 is a schematic view showing the structure of a glass plating layer according to Embodiment 1 of the present invention.
  • Figure 5 is a schematic view showing the structure of a glass plating layer according to a third embodiment of the present invention.
  • FIG. 6 is a schematic view showing the principle of coating of the sixth embodiment of the present invention.
  • FIG. 7 is a schematic diagram showing a reflectance curve corresponding to the first group of film structures in the second embodiment of the present invention.
  • FIG. 8 is a second schematic diagram of a reflectance curve corresponding to a second group of film structures in Embodiment 2 of the present invention.
  • FIG. 9 is a third schematic diagram of a reflectance curve corresponding to the third group of film structures in the second embodiment of the present invention.
  • a plating structure in which a titanium oxynitride plating layer and the silicon oxynitride coating layer are alternately laminated is used to realize a mirror effect of the glass substrate, and the thickness can be thinner as a whole while ensuring insulation.
  • the coating is used to achieve a brightly colored mirror effect.
  • the magnitude of the capacitance value is also affected by the filled medium between the capacitor plates.
  • the capacitance value is also affected.
  • the plating structure of the embodiment of the present invention only Two kinds of nitrogen oxides are used as the plating layer. Therefore, there are few kinds of substances between the finger skin and the capacitor plate array, and there is no metal plating layer, and the overall thickness of the plating layer is very thin, from between the capacitor plates. From the perspective of the filling material, the effect is also reduced to a small extent.
  • the titanium oxynitride coating layer is located in the first layer, that is, the titanium oxynitride coating layer is first plated, and since the reflectance of the titanium oxynitride is relatively high, setting it on the first layer enables The entire film system is more colorful.
  • the total number of coating layers of the titanium oxynitride coating layer 2 and the silicon oxynitride coating layer 3 is 4, and the total thickness of the plating layer can be controlled between 100 nm and 150 nm. Further, in the embodiment of the invention, the thickness of the glass substrate may be in the range of 170-180 um, preferably 175 um.
  • the total number of the coating layers is 4, the total thickness of the coating layer of the titanium oxynitride and the silicon oxynitride
  • the ratio of the total thickness of the coating layer is between 0.4 and 0.5. This ratio is guaranteed to achieve a mirror effect of enamel in the case of plating only 4 layers, and the total thickness can be controlled below 150 nm, thereby reducing the The effect of capacitance detection. .
  • each layer can be distributed as follows:
  • the second coating layer is a silicon oxynitride coating having a thickness ranging from 50 to 85 nm;
  • the third coating layer is a titanium oxynitride coating having a thickness ranging from 25 to 40 nm;
  • the fourth coating layer is a silicon oxynitride coating having a thickness ranging from 15 to 25 nm.
  • Second Group The third group First layer (TIN x O y ) 6nm 9nm 7nm Second layer (SIN x O y ) 54nm 81nm 67nm Third layer (TIN x O y ) 25nm 37.5nm 30nm
  • the reflectance curves of the three groups of film structures in the above table are shown in Figs. 7 to 9, in which the horizontal axis coordinate is the wavelength (nm) and the vertical axis is the refractive index (%), and the graphs of the following examples have the same horizontal and vertical coordinates. .
  • a black ink layer is disposed under the entire plating layer, and by providing the ink layer, it is possible to better shield light and prevent stray light interference.
  • a certain hollow pattern when printing a black ink layer, for example, a hollow pattern of a printed fingerprint pattern, a hollow portion and a non-hollow portion, which differ in light transmittance and reflectivity, thereby The upper glass observation will present a corresponding pattern on the mirror background, so that the fingerprint area can be identified or decorated.
  • a pigment different from black may be further disposed in the hollow pattern, and more preferably, a pigment that contrasts with gray is filled, for example, a white pigment is filled, thereby making the pattern more conspicuous.
  • This embodiment mainly describes a method for manufacturing the glass plating structure of the first embodiment.
  • the glass plating structure of the present embodiment can be realized by an NCVM (non-conductive vacuum plating) process.
  • a vacuum space as shown in FIG. 6 is disposed, and nitrogen gas and oxygen gas (preferably, a ratio of nitrogen gas to oxygen ratio of 0.5:1) are introduced thereto in a ratio of 0.4:1 to 0.6:1. Then, the titanium oxynitride plating layer forming step and the silicon oxynitride plating layer forming step are alternately performed to form alternately stacked silicon oxynitride plating layers and titanium oxynitride plating layers on the lower surface of the glass substrate.
  • nitrogen gas and oxygen gas preferably, a ratio of nitrogen gas to oxygen ratio of 0.5:1
  • the step of forming the titanium oxynitride coating layer is specifically: exciting the titanium raw material provided in the sealed space by an electron gun, evaporating the titanium raw material, reacting with nitrogen and oxygen in the sealed space, and then in the glass.
  • a titanium oxynitride coating layer is formed downward on the lower surface of the substrate.
  • the silicon oxynitride coating layer forming process includes: exciting a silicon raw material disposed in the sealed space by an electron gun, evaporating the silicon raw material, reacting with nitrogen and oxygen in the sealed space, and then under the glass substrate A silicon oxynitride coating layer is formed on the surface downward.
  • the number of times of alternately performing the titanium oxynitride coating layer formation step and the silicon oxynitride coating layer formation step depends on the number of layers to be finally obtained, and the thickness of each layer is controlled by controlling the titanium oxynitride coating layer formation process and silicon nitrogen each time.
  • the oxide plating layer formation step is realized.
  • the ratio of the nitrogen atom to the oxygen atom in the compound of the coating layer is controlled to achieve the reflectance of the titanium oxynitride and the silicon oxynitride. Adjustment, so that the refractive index of titanium oxynitride is controlled at about 2.08, and the refractive index of silicon oxynitride is controlled at about 1.39, and the combination of layer number and layer thickness is controlled, and the overall thickness is thin. The effect is brighter and the mirror effect of the twilight.
  • This embodiment adopts a process. Since only two common metal and semiconductor materials are used, the process is simple to implement and convenient for batch generation.
  • a titanium oxynitride plating layer forming step is performed so that the titanium oxynitride coating layer is located in the first layer, and since the reflectance of the titanium oxynitride is relatively high, In the first layer, the entire film system can be rendered more vivid colors.
  • the total number of coating layers can be controlled in 4 layers, and the total thickness of the plating layer can be controlled between 100 nm and 150 nm.
  • the thickness of the glass substrate can be in the range of 170-180 um. Preferably, it is 175 um.
  • the embodiment relates to a method for manufacturing the plating structure of the second embodiment, comprising: alternately performing a titanium oxynitride coating layer forming step and a silicon oxynitride coating layer forming step (may be It can be realized by performing four times alternately, so that the total number of the coating layers is 4 layers, and the ratio of the total thickness of the coating layer of the titanium oxynitride to the total thickness of the coating layer of the silicon oxynitride is 0.4 to Between 0.5.
  • the first coating layer is a titanium oxynitride coating having a thickness ranging from 5 to 10 nm;
  • the second coating layer is a silicon oxynitride coating having a thickness ranging from 50 to 85 nm;
  • the third coating layer is a titanium oxynitride coating having a thickness ranging from 25 to 40 nm;
  • the fourth coating layer is a silicon oxynitride coating having a thickness ranging from 15 to 25 nm.
  • the thickness of each layer can be realized by controlling the coating time, and an example of the specific thickness of each layer has been described in the second embodiment, and details are not described herein.
  • This embodiment mainly describes the structure of the above-described third embodiment.
  • a black ink layer is printed under the plating layer, thereby enabling better shading. To prevent stray light interference.
  • printing a layer of black ink under the plating layer may include: printing a black ink layer having a fingerprint pattern hollow pattern, filling a pigment different from gray in a portion having a hollow; or printing only a hollow pattern without filling the pigment.
  • the filling is preferably a pigment which contrasts with black, for example, a white pigment is filled, thereby making the pattern more conspicuous.
  • the embodiment relates to a fingerprint detecting device, including: a capacitive fingerprint sensor, which can be any capacitive fingerprint sensor used in the prior art, and can be an active capacitive fingerprint sensor (for example, The fingerprint sensor produced by FPC can also be a passive capacitive fingerprint sensor.
  • the glass plating structure of each of the above embodiments is attached to the upper portion of the capacitive fingerprint sensor as an isolation layer or a protective layer. The coated side faces the capacitive plate array of the capacitive fingerprint sensor, and the upper surface of the glass is externally used for contact. Fingerprint skin.
  • the embodiment relates to a mobile terminal including the fingerprint detecting device of the eleventh embodiment, such as a mobile phone, a tablet computer, etc., and an opening for performing fingerprint detection is disposed on a back cover of the mobile terminal, and the fingerprint detecting device is located at the The upper portion of the opening is exposed from the opening of the glass plating structure of the fingerprint detecting device.
  • the area where the fingerprint is recognized is placed behind the mobile terminal, and an opening is formed in the back cover to expose the glass having a mirror effect to the area of fingerprint recognition. Since the glass coating layer of the embodiment of the invention can present a bright enamel mirror effect, the fingerprint recognition area of the mobile terminal can be made abnormal and beautiful, and the overall aesthetic effect of the mobile terminal can be improved.

Abstract

L'invention concerne une structure de couche de revêtement de verre, un appareil de détection d'empreintes digitales et un terminal mobile. La structure de revêtement de verre comprend un substrat de verre, et des couches de revêtement d'oxynitrure de titane et d'oxynitrure de silicium disposées par alternance vers le bas, sur la surface inférieure du substrat de verre ; dans les formules moléculaires des couches de revêtement d'oxynitrure de titane et d'oxynitrure de silicium, le rapport azote sur oxygène est compris entre 0,4:1 et 0,6:1. L'application de couches de revêtement d'oxynitrure de titane et de couches de revêtement d'oxynitrure de silicium alternées sur la surface inférieure du substrat de verre, et le rapport azote sur oxygène maintenu dans les compositions des couches de revêtement à une valeur comprise entre 0,4:1 et 0,6:1, et dans la mesure où l'isolation est assurée, on obtient une structure de revêtement de verre ayant un effet miroir, et on maintient à un niveau très minime l'incidence de l'épaisseur de la couche de revêtement sur la détection des empreintes digitales.
PCT/CN2015/099673 2015-10-20 2015-12-30 Structure de revêtement de verre, appareil de détection d'empreintes digitales et terminal mobile WO2017067076A1 (fr)

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CN201510683531.X 2015-10-20

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Citations (2)

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CN101400619A (zh) * 2006-03-10 2009-04-01 法国圣戈班玻璃厂 在反射中具有中性色的抗反射透明基材
CN104166846A (zh) * 2014-08-26 2014-11-26 南昌欧菲生物识别技术有限公司 指纹识别传感器封装结构以及超薄玻璃制造方法

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JPH04285033A (ja) * 1991-03-12 1992-10-09 Central Glass Co Ltd ＴｉＳｉＯＮ系多層薄膜被覆ガラスおよびその製法
KR101005989B1 (ko) * 2002-06-11 2011-01-05 코니카 미놀타 홀딩스 가부시키가이샤 표면 처리 방법 및 광학 부품
CN102089684B (zh) * 2008-05-15 2014-08-13 巴斯夫公司 薄膜结构的制造方法及其组合物
CN102615875B (zh) * 2012-03-22 2014-11-12 东莞劲胜精密组件股份有限公司 一种不连续金属质感银白色薄膜及其镀膜方法
CN103793689B (zh) * 2014-01-27 2017-06-06 南昌欧菲光科技有限公司 指纹识别传感器封装结构、电子设备及指纹识别传感器的制备方法
CN205917178U (zh) * 2015-10-20 2017-02-01 乐视移动智能信息技术（北京）有限公司 玻璃镀层结构、指纹检测装置及移动终端

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101400619A (zh) * 2006-03-10 2009-04-01 法国圣戈班玻璃厂 在反射中具有中性色的抗反射透明基材
CN104166846A (zh) * 2014-08-26 2014-11-26 南昌欧菲生物识别技术有限公司 指纹识别传感器封装结构以及超薄玻璃制造方法

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