WO2017067112A1 - Procédé de fabrication d'une structure de revêtement de verre - Google Patents

Procédé de fabrication d'une structure de revêtement de verre Download PDF

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Publication number
WO2017067112A1
WO2017067112A1 PCT/CN2016/071767 CN2016071767W WO2017067112A1 WO 2017067112 A1 WO2017067112 A1 WO 2017067112A1 CN 2016071767 W CN2016071767 W CN 2016071767W WO 2017067112 A1 WO2017067112 A1 WO 2017067112A1
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WO
WIPO (PCT)
Prior art keywords
oxynitride
coating layer
layer
manufacturing
titanium
Prior art date
Application number
PCT/CN2016/071767
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English (en)
Chinese (zh)
Inventor
苏斌
Original Assignee
乐视移动智能信息技术（北京）有限公司
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Publication of WO2017067112A1 publication Critical patent/WO2017067112A1/fr

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    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
    • C03C17/3429—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating
    • C03C17/3435—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising a nitride, oxynitride, boronitride or carbonitride
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F18/00—Pattern recognition
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/15—Deposition methods from the vapour phase

Definitions

  • the invention relates to a method for manufacturing a glass coating structure, in particular to a method for manufacturing a glass coating structure applied to fingerprint detection.
  • fingerprint recognition technology has been applied to products such as mobile terminals (such as computers).
  • the capacitive push fingerprint detection method is widely used, and is specifically divided into active press detection and passive press detection.
  • the basic principle of passive press detection is shown in Figure 1.
  • the entire detection system includes: a capacitive fingerprint sensor 10 at the bottom and an isolation layer (or a protective layer) overlying the capacitive fingerprint sensor 10, which is also the area where the finger is in direct contact. 11) wherein the capacitive fingerprint sensor 10 includes a plurality of capacitor plates arranged in a two-dimensional array (the five capacitive plates P1-P5 are exemplarily illustrated in the figure), when the skin of the finger 12 and the isolation layer 11 After the bonding, a capacitance is formed between the skin of the finger 12 and the capacitor plate. Due to the presence of the fingerprint, a situation as shown in FIG.
  • the skin of the finger 12 and the surface of the isolation layer 11 form a plurality of ridges and ridges.
  • the distance between the different positions of the skin of the finger 12 and the respective capacitive plates is unequal, whereby different capacitance values are generated between the respective capacitive plates and the skin of the fingers 12.
  • the capacitance value formed at the crucible is Cv
  • the capacitance value formed at the crucible is Cr.
  • FIG. 2 The principle of active press detection is shown in FIG. 2.
  • a metal ring 13 surrounding the isolation layer 11 is added.
  • the metal ring 13 is connected to the bottom circuit, and the metal ring 13 is used to wake up the bottom layer.
  • the capacitive fingerprint sensor 10 and a certain current signal are applied to the finger 12 through the metal ring 13, thereby increasing the power on the skin of the finger 12.
  • the amount of charge which in turn enhances the signal detected by the capacitor plates.
  • FIG. 3 it shows a fingerprint image signal presented by detection of a capacitive fingerprint sensor.
  • the upper and lower surfaces of the spacer layer 11 must be formed of an insulating material, otherwise the capacitance between the skin of the finger 12 and the capacitor plate will be destroyed, so that the fingerprint information cannot be detected.
  • the portion of the isolation layer 11 that is in contact with the metal ring 13 must also be insulated. If the isolation layer 11 is electrically conductive, current on the metal ring 13 will flow through the isolation layer 11, thereby The signal is confusing and the fingerprint information cannot be detected.
  • the capacitive fingerprint sensor 10 since the detection range of the capacitive plate array of the capacitive fingerprint sensor 10 is small, the finger 12 needs to be close to the capacitor plate array, that is, the thickness of the isolation layer 11 is not required to be large, or the fingerprint detection effect is affected. Especially for the passive press detection system, the capacitive fingerprint sensor 10 is more sensitive to the thickness of the upper covered isolation layer 11, and the isolation layer 11 having a larger thickness cannot be used.
  • the area covered by the isolation layer 11 is also the area for fingerprint recognition, which is generally located on mobile terminals.
  • the more prominent position, for example, is placed in the middle of the back cover of the mobile phone, or placed in the lower part of the front of the mobile phone. Therefore, the aesthetic appearance of the fingerprint recognition area will directly affect the overall appearance of the mobile phone.
  • the isolation layer 11 of the fingerprint recognition area is mostly made of ceramic or plastic, and the protection capacitor is simply realized in function.
  • the fingerprint sensor 10 functions as an isolation package, but the glass mirror cannot be realized on the fingerprint detecting device.
  • the coating technology of the glass mirror surface is relatively mature.
  • the general mirror coating does not require high insulation and thickness, it is generally adopted by direct metal plating or by multi-layer coating.
  • the effect of the coating layer thus formed is generally thick or non-insulating, and therefore, the thickness requirement for fingerprint detection cannot be satisfied.
  • the fingerprint detection system itself adopts the principle of capacitance detection.
  • the skin of the finger 12 and the array of the capacitor plates respectively serve as the two poles of the capacitor. According to the calculation formula of the capacitance, the size of the capacitor is related to the distance between the capacitor plates.
  • the introduction of the coating layer will increase the amount of medium between the capacitor plates, thereby affecting the size of the capacitance, the thickness of the coating layer The larger the effect, the greater the influence on the capacitance value. Therefore, in order not to have a serious influence on the fingerprint detection, it is objectively impossible to allow the existence of a thick coating layer.
  • the present invention provides a method of fabricating a glass coating structure, comprising:
  • Nitrogen and oxygen in a ratio of 0.4:1 to 0.6:1 are introduced into the vacuum space in which the glass substrate is disposed in the upper portion;
  • the titanium oxynitride plating layer forming step and the silicon oxynitride plating layer forming step are alternately performed, and an alternately stacked silicon oxynitride plating layer and a titanium oxynitride coating layer are formed downward on the lower surface of the glass substrate;
  • the titanium oxynitride coating layer forming step includes: exciting a titanium raw material disposed in the sealed space by an electron gun, evaporating the titanium raw material, reacting with nitrogen and oxygen in the sealed space, and then performing a reaction on the glass substrate Forming a titanium oxynitride coating layer downwardly on the lower surface;
  • the silicon oxynitride coating layer forming process includes: exciting a silicon raw material disposed in the sealed space by an electron gun, evaporating the silicon raw material, reacting with nitrogen and oxygen in the sealed space, and then performing a reaction on the glass substrate The lower surface of the lower surface forms a silicon oxynitride coating layer.
  • the method for manufacturing a glass coating structure comprises: alternately plating a titanium oxynitride coating layer and a silicon oxynitride coating layer on a lower surface of the glass substrate, and maintaining a ratio of nitrogen to oxygen in the plating compound at 0.4: Between 1 and 0.6:1, a glass-plated structure exhibiting a mirror-like effect of ochre is realized under the premise of ensuring insulation, and the influence of the thickness of the plating itself on fingerprint detection is controlled to a very small range.
  • FIG. 1 is a schematic diagram of a prior art fingerprint detection principle
  • FIG. 2 is a second schematic diagram of the principle of fingerprint detection in the prior art
  • FIG. 3 is a schematic diagram of a fingerprint detection image signal of the prior art
  • Figure 4 is a schematic view showing the structure of a glass plating layer according to Embodiment 1 of the present invention.
  • Figure 5 is a schematic view showing the structure of a glass plating layer according to a third embodiment of the present invention.
  • FIG. 6 is a schematic view showing the principle of coating of the sixth embodiment of the present invention.
  • FIG. 7 is a schematic diagram of a reflectance curve corresponding to a first group of film structures in Embodiment 2 of the present invention.
  • FIG. 8 is a second schematic diagram of a reflectance curve corresponding to a second group of film structures in Embodiment 2 of the present invention.
  • FIG. 9 is a third schematic diagram of a reflectance curve corresponding to the third group of film structures in the second embodiment of the present invention.
  • the principle of the embodiment of the present invention is to achieve a mirror effect with a specific color by alternately plating a titanium oxynitride coating layer and a silicon oxynitride coating layer on the lower surface of the glass substrate, while ensuring insulation and overall
  • the thickness of the coating is controlled to a very thin range, thereby reducing the impact on fingerprint detection.
  • the embodiment relates to a glass plating structure, which is mainly used in a capacitive press type fingerprint detecting system, and functions as an isolation layer covering a capacitive fingerprint sensor.
  • the structure of the glass plating layer includes a glass substrate 1 and The entire layer of the titanium oxide layer 2 and the silicon oxynitride layer 3 and the silicon oxynitride layer 3 which are alternately laminated on the lower surface of the glass substrate 1 and the multilayer coating layer are also referred to as a film system.
  • a plating structure in which a titanium oxynitride plating layer and the silicon oxynitride coating layer are alternately laminated is used to realize a mirror effect of the glass substrate, and the thickness can be thinner as a whole while ensuring insulation.
  • the coating is used to achieve a brightly colored mirror effect.
  • the reflectance of titanium oxynitride and silicon oxynitride is adjusted by controlling the ratio of nitrogen atoms to oxygen atoms in titanium oxynitride and silicon oxynitride to be between 0.4:1 and 0.6:1.
  • the refractive index of titanium oxynitride is controlled at about 2.08, and the silicon oxynitride is folded.
  • the firing rate is controlled at about 1.39.
  • the mirror effect of the brighter color is realized in the case where the overall thickness is thin.
  • the color of L is 54
  • the value of A is -3.5 to 2.9
  • the value of B is -7.6 to 6.1.
  • the overall coating thickness can be controlled to be thin (can be controlled under the premise that the desired effect is satisfied) Within 1um), therefore, the impact on the capacitance value detection of the fingerprint sensor is small.
  • the magnitude of the capacitance value is also affected by the filled medium between the capacitor plates.
  • the capacitance value is also affected.
  • the plating structure of the embodiment of the present invention only Two kinds of nitrogen oxides are used as the plating layer. Therefore, there are few kinds of substances between the finger skin and the capacitor plate array, and there is no metal plating layer, and the overall thickness of the plating layer is very thin, from between the capacitor plates. From the perspective of the filling material, the effect is also reduced to a small extent.
  • the titanium oxynitride coating layer is located in the first layer, that is, the titanium oxynitride coating layer is first plated, and since the reflectance of the titanium oxynitride is relatively high, setting it on the first layer enables The entire film system is more colorful.
  • the total number of coating layers of the titanium oxynitride coating layer 2 and the silicon oxynitride coating layer 3 is 4, and the total thickness of the plating layer can be controlled between 100 nm and 150 nm. Further, in the embodiment of the invention, the thickness of the glass substrate may be in the range of 170-180 um, preferably 175 um.
  • the total number of the coating layers is 4, the total thickness of the coating layer of the titanium oxynitride and the silicon oxynitride
  • the ratio of the total thickness of the coating layer is between 0.4 and 0.5. This ratio is guaranteed to achieve a mirror effect of enamel in the case of plating only 4 layers, and the total thickness can be controlled below 150 nm, thereby reducing the The effect of capacitance detection.
  • each layer can be distributed as follows:
  • the first coating layer is a titanium oxynitride coating having a thickness ranging from 5 to 10 nm;
  • the second coating layer is a silicon oxynitride coating having a thickness ranging from 50 to 85 nm;
  • the third coating layer is a titanium oxynitride coating having a thickness ranging from 25 to 40 nm;
  • the fourth coating layer is a silicon oxynitride coating having a thickness ranging from 15 to 25 nm.
  • the reflectance curves of the three groups of film structures in the above table are shown in Figs. 7 to 9, in which the horizontal axis coordinate is the wavelength (nm) and the vertical axis is the refractive index (%), and the graphs of the following examples have the same horizontal and vertical coordinates. .
  • a black ink layer is disposed under the entire plating layer, and by providing the ink layer, it is possible to better shield light and prevent stray light interference.
  • a certain hollow pattern when printing a black ink layer, for example, a hollow pattern of a printed fingerprint pattern, a hollow portion and a non-hollow portion, which differ in light transmittance and reflectivity, thereby The upper glass observation will present a corresponding pattern on the mirror background, so that the fingerprint area can be identified or decorated.
  • a pigment different from black may be further disposed in the hollow pattern, and more preferably, a pigment that contrasts with gray is filled, for example, a white pigment is filled, thereby making the pattern more conspicuous.
  • This embodiment mainly describes a method for manufacturing the glass plating structure of the first embodiment.
  • the glass plating structure of the present embodiment can be realized by an NCVM (non-conductive vacuum plating) process.
  • a vacuum space as shown in FIG. 6 is disposed, and nitrogen gas and oxygen gas (preferably, a ratio of nitrogen gas to oxygen gas of 0.5:1) are introduced thereto in a ratio of 0.4:1 to 0.6:1, and then alternated.
  • nitrogen gas and oxygen gas preferably, a ratio of nitrogen gas to oxygen gas of 0.5:1
  • the titanium oxynitride plating layer forming step and the silicon oxynitride plating layer forming step are performed to form an alternately stacked silicon oxynitride plating layer and a titanium oxynitride plating layer on the lower surface of the glass substrate.
  • the step of forming the titanium oxynitride coating layer is specifically: exciting the titanium raw material provided in the sealed space by an electron gun, evaporating the titanium raw material, reacting with nitrogen and oxygen in the sealed space, and then in the glass.
  • a titanium oxynitride coating layer is formed downward on the lower surface of the substrate.
  • the silicon oxynitride coating layer forming process includes: exciting a silicon raw material disposed in the sealed space by an electron gun, evaporating the silicon raw material, reacting with nitrogen and oxygen in the sealed space, and then under the glass substrate A silicon oxynitride coating layer is formed on the surface downward.
  • the number of times the titanium oxynitride coating layer formation process and the silicon oxynitride coating layer formation process are alternately performed depends on the number of layers to be finally obtained, and the thickness of each layer is controlled by controlling each titanium oxynitride coating layer formation process and silicon.
  • the oxynitride coating layer formation step is realized.
  • the ratio of the nitrogen atom to the oxygen atom in the compound of the coating layer is controlled to achieve the reflectance of the titanium oxynitride and the silicon oxynitride. Adjustment, so that the refractive index of titanium oxynitride is controlled at about 2.08, and the refractive index of silicon oxynitride is controlled at about 1.39, and the combination of layer number and layer thickness is controlled, and the overall thickness is thin. The effect is brighter and the mirror effect of the twilight.
  • This embodiment adopts a process. Since only two common metal and semiconductor materials are used, the process is simple to implement and convenient for batch generation.
  • a titanium oxynitride plating layer forming step is performed so that the titanium oxynitride coating layer is located in the first layer, and since the reflectance of the titanium oxynitride is relatively high, In the first layer, the entire film system can be rendered more vivid colors.
  • the total number of coating layers can be controlled in 4 layers, and the total thickness of the plating layer can be In order to control between 100 nm and 150 nm, in addition, in the embodiment of the invention, the thickness of the glass substrate may be in the range of 170-180 um, preferably 175 um.
  • the embodiment relates to a method for manufacturing the plating structure of the second embodiment, comprising: alternately performing a titanium oxynitride coating layer forming step and a silicon oxynitride coating layer forming step (which can be performed four times alternately).
  • the total number of coating layers is 4 layers, and the ratio of the total thickness of the coating layer of the titanium oxynitride to the total thickness of the coating layer of the silicon oxynitride is between 0.4 and 0.5.
  • the first coating layer is a titanium oxynitride coating having a thickness ranging from 5 to 10 nm;
  • the second coating layer is a silicon oxynitride coating having a thickness ranging from 50 to 85 nm;
  • the third coating layer is a titanium oxynitride coating having a thickness ranging from 25 to 40 nm;
  • the fourth coating layer is a silicon oxynitride coating having a thickness ranging from 15 to 25 nm.
  • the thickness of each layer can be realized by controlling the coating time, and an example of the specific thickness of each layer has been described in the second embodiment, and details are not described herein.
  • This embodiment mainly describes the structure of the above-described third embodiment.
  • a black ink layer is printed under the plating layer, thereby enabling better shading. To prevent stray light interference.
  • printing a layer of black ink under the plating layer may include: printing a black ink layer having a fingerprint pattern hollow pattern, filling a pigment different from gray in a portion having a hollow; or printing only a hollow pattern without filling the pigment.
  • the filling is preferably a pigment which contrasts with black, for example, a white pigment is filled, thereby making the pattern more conspicuous.
  • the embodiment relates to a fingerprint detecting device, including: a capacitive fingerprint sensor, the electric
  • the capacitive fingerprint sensor can be any capacitive fingerprint sensor used in the prior art, and can be an active capacitive fingerprint sensor (such as a fingerprint sensor manufactured by FPC) or a passive capacitive fingerprint sensor.
  • the glass plating structure of each of the above embodiments is attached to the upper portion of the capacitive fingerprint sensor as an isolation layer or a protective layer.
  • the coated side faces the capacitive plate array of the capacitive fingerprint sensor, and the upper surface of the glass is externally used for contact. Fingerprint skin.
  • the embodiment relates to a mobile terminal including the fingerprint detecting device of the seventh embodiment, such as a mobile phone, a tablet computer, etc., and an opening for performing fingerprint detection is opened on a back cover of the mobile terminal, and the fingerprint detecting device is located at the opening In the lower portion, an upper surface of the glass plating structure of the fingerprint detecting device is exposed from the opening.
  • the area where the fingerprint is recognized is placed behind the mobile terminal, and an opening is formed in the back cover to expose the glass having a mirror effect to the area of fingerprint recognition. Since the glass coating layer of the embodiment of the invention can present a bright enamel mirror effect, the fingerprint recognition area of the mobile terminal can be made abnormal and beautiful, and the overall aesthetic effect of the mobile terminal can be improved.

Abstract

L'invention concerne un procédé de fabrication d'une structure de revêtement de verre, ledit procédé consistant à : introduire de l'azote et de l'oxygène selon un rapport compris entre 0,4:1 et 0,6:1 dans un espace sous vide recouvert d'un substrat de verre ; produire alternativement une couche de revêtement d'oxynitrure de titane et une couche de revêtement d'oxynitrure de silicium, de manière à obtenir une alternance de couches de revêtement d'oxynitrure de silicium et de couches de revêtement d'oxynitrure de titane vers le bas, sur la surface inférieure du substrat de verre. En alternant les couches de revêtement d'oxynitrure de titane et les couches de revêtement d'oxynitrure de silicium sur la surface inférieure du substrat de verre, et en maintenant le rapport azote sur oxygène dans la composition des couches de revêtement à une valeur de 0,4:1 à 0,6:1, et dans la mesure où l'isolation est assurée, le procédé de l'invention permet d'obtenir une structure de revêtement de verre dotée d'un effet miroir teinté, et de réduire à un niveau minime, l'incidence de l'épaisseur des couches de revêtement sur la détection des empreintes digitales.
PCT/CN2016/071767 2015-10-20 2016-01-22 Procédé de fabrication d'une structure de revêtement de verre WO2017067112A1 (fr)

Applications Claiming Priority (2)

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CN201510683230 2015-10-20
CN201510683230.7 2015-10-20

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Citations (2)

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CN88101654A (zh) * 1987-03-26 1988-11-02 Ppg工业公司 氮氧钛喷镀膜
CN101400619A (zh) * 2006-03-10 2009-04-01 法国圣戈班玻璃厂 在反射中具有中性色的抗反射透明基材

Family Cites Families (3)

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Publication number Priority date Publication date Assignee Title
JPH04285033A (ja) * 1991-03-12 1992-10-09 Central Glass Co Ltd ＴｉＳｉＯＮ系多層薄膜被覆ガラスおよびその製法
KR101005989B1 (ko) * 2002-06-11 2011-01-05 코니카 미놀타 홀딩스 가부시키가이샤 표면 처리 방법 및 광학 부품
CN102615875B (zh) * 2012-03-22 2014-11-12 东莞劲胜精密组件股份有限公司 一种不连续金属质感银白色薄膜及其镀膜方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN88101654A (zh) * 1987-03-26 1988-11-02 Ppg工业公司 氮氧钛喷镀膜
CN101400619A (zh) * 2006-03-10 2009-04-01 法国圣戈班玻璃厂 在反射中具有中性色的抗反射透明基材

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