WO2017067077A1 - Structure de revêtement de verre, dispositif de détection d'empreintes digitales et terminal mobile - Google Patents

Structure de revêtement de verre, dispositif de détection d'empreintes digitales et terminal mobile Download PDF

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Publication number
WO2017067077A1
WO2017067077A1 PCT/CN2015/099674 CN2015099674W WO2017067077A1 WO 2017067077 A1 WO2017067077 A1 WO 2017067077A1 CN 2015099674 W CN2015099674 W CN 2015099674W WO 2017067077 A1 WO2017067077 A1 WO 2017067077A1
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WIPO (PCT)
Prior art keywords
layer
coating
coating layer
silicon oxynitride
thickness ranging
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PCT/CN2015/099674
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English (en)
Chinese (zh)
Inventor
郝亚可
孙坤
孟祥发
梁倩
Original Assignee
乐视移动智能信息技术（北京）有限公司
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Publication of WO2017067077A1 publication Critical patent/WO2017067077A1/fr

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    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
    • C03C17/3429—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating
    • C03C17/3435—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising a nitride, oxynitride, boronitride or carbonitride
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06V—IMAGE OR VIDEO RECOGNITION OR UNDERSTANDING
    • G06V40/00—Recognition of biometric, human-related or animal-related patterns in image or video data
    • G06V40/10—Human or animal bodies, e.g. vehicle occupants or pedestrians; Body parts, e.g. hands
    • G06V40/12—Fingerprints or palmprints
    • G06V40/13—Sensors therefor
    • G06V40/1306—Sensors therefor non-optical, e.g. ultrasonic or capacitive sensing

Definitions

  • the invention relates to a glass coating structure, a fingerprint detecting device and a mobile terminal, in particular to a glass coating structure applied to fingerprint detection, a fingerprint detecting device comprising the glass plating structure and a mobile terminal including the fingerprint detecting device.
  • An object of the present invention is to provide a glass plating structure, a fingerprint detecting device and a mobile terminal, which can make the fingerprint detecting area exhibit a mirror effect of a rose gold color under the premise that the fingerprint detecting effect is small.
  • the present invention provides a glass plating structure comprising a glass substrate, and an alternating layer of a titanium oxynitride coating layer and a silicon oxynitride coating layer are disposed downwardly on a lower surface of the glass substrate, wherein
  • the ratio of nitrogen to oxygen is between 1.3:1 and 1.5:1.
  • the present invention also provides a fingerprint detecting device comprising: a capacitive fingerprint sensor, wherein the glass plating structure is attached to an upper portion of the capacitive fingerprint sensor.
  • the present invention further provides a mobile terminal including the above-mentioned fingerprint detecting device, the back cover of the mobile terminal is provided with an opening for performing fingerprint detection, and the fingerprint detecting device is located at a lower portion of the opening, and the fingerprint detecting device The upper surface of the glass plating structure is exposed from the opening.
  • the glass plating structure, the fingerprint detecting device and the mobile terminal provided by the invention alternately plate a titanium oxynitride coating layer and a silicon oxynitride coating layer on the lower surface of the glass substrate, and maintain the ratio of nitrogen to oxygen in the plating compound. Between 1.3:1 and 1.5:1, the glass coating structure exhibiting the mirror effect of rose gold color is realized under the premise of ensuring the insulation, and the influence of the thickness of the plating itself on the fingerprint detection is controlled to be very small. Within the scope.
  • An object of the present invention is to provide a glass plating structure, a fingerprint detecting device and a mobile terminal, which can make the fingerprint detecting area exhibit a mirror effect of a rose gold color under the premise that the fingerprint detecting effect is small.
  • the present invention provides a glass plating structure comprising a glass substrate, and an alternating layer of a titanium oxynitride coating layer and a silicon oxynitride coating layer are disposed downwardly on a lower surface of the glass substrate, wherein
  • the ratio of nitrogen to oxygen is between 1.3:1 and 1.5:1.
  • the present invention also provides a fingerprint detecting device comprising: a capacitive fingerprint sensor, wherein the glass plating structure is attached to an upper portion of the capacitive fingerprint sensor.
  • the present invention further provides a mobile terminal including the above-mentioned fingerprint detecting device, the back cover of the mobile terminal is provided with an opening for performing fingerprint detection, and the fingerprint detecting device is located at a lower portion of the opening, and the fingerprint detecting device The upper surface of the glass plating structure is exposed from the opening.
  • the glass plating structure, the fingerprint detecting device and the mobile terminal provided by the invention alternately plate a titanium oxynitride coating layer and a silicon oxynitride coating layer on the lower surface of the glass substrate, and maintain the ratio of nitrogen to oxygen in the plating compound. Between 1.3:1 and 1.5:1, the glass coating structure exhibiting the mirror effect of rose gold color is realized under the premise of ensuring the insulation, and the influence of the thickness of the plating itself on the fingerprint detection is controlled to be very small. Within the scope.
  • FIG. 1 is a schematic diagram of a prior art fingerprint detection principle
  • FIG. 2 is a second schematic diagram of the principle of fingerprint detection in the prior art
  • FIG. 3 is a schematic diagram of a fingerprint detection image signal of the prior art
  • Figure 4 is a schematic view showing the structure of a glass plating layer according to Embodiment 1 of the present invention.
  • Figure 5 is a schematic view showing the structure of a glass plating layer according to Embodiment 5 of the present invention.
  • FIG. 6 is a schematic view showing the principle of coating of the sixth embodiment of the present invention.
  • FIG. 7 is a schematic diagram of a reflectance curve corresponding to a first group of film structures in Embodiment 2 of the present invention.
  • FIG. 8 is a second schematic diagram of a reflectance curve corresponding to a second group of film structures in Embodiment 2 of the present invention.
  • FIG. 9 is a schematic view showing a reflectance curve corresponding to a third group of film structures in Embodiment 2 of the present invention. three;
  • FIG. 10 is a schematic diagram of a reflectance curve corresponding to a first group of film structures in Embodiment 3 of the present invention.
  • FIG. 11 is a second schematic diagram of a reflectance curve corresponding to a second group of film structures in Embodiment 3 of the present invention.
  • FIG. 12 is a third schematic diagram of a reflectance curve corresponding to a third group of film structures in Embodiment 3 of the present invention.
  • FIG. 13 is a schematic diagram of a reflectance curve corresponding to a first group of film structures in Embodiment 4 of the present invention.
  • FIG. 14 is a second schematic diagram of a reflectance curve corresponding to a second group of film structures in Embodiment 4 of the present invention.
  • FIG. 15 is a third schematic diagram of a reflectance curve corresponding to the third group of film structures in the fourth embodiment of the present invention.
  • the principle of the embodiment of the present invention is to achieve a mirror effect with a specific color by alternately plating a titanium oxynitride coating layer and a silicon oxynitride coating layer on the lower surface of the glass substrate, while ensuring insulation and overall
  • the thickness of the coating is controlled to a very thin range, thereby reducing the impact on fingerprint detection.
  • the embodiment relates to a glass plating structure, which is mainly used in a capacitive press type fingerprint detecting system, and functions as an isolation layer covering a capacitive fingerprint sensor.
  • the structure of the glass plating layer includes a glass substrate 1 and The entire layer of the titanium oxide layer 2 and the silicon oxynitride layer 3, which are disposed alternately on the lower surface of the glass substrate, and the layer of the coating layer formed by the multilayer coating layer are also referred to as a film system.
  • the ratio of nitrogen to oxygen is approximately between 1.3:1 and 1.5:1. In practical applications, the ratio of nitrogen to oxygen is positioned as a preferred solution.
  • a plating structure in which a titanium oxynitride plating layer and the silicon oxynitride coating layer are alternately laminated is used to realize a mirror effect of the glass substrate, and the thickness can be thinner as a whole while ensuring insulation.
  • the coating is used to achieve a brightly colored mirror effect.
  • the reflectance of titanium oxynitride and silicon oxynitride is adjusted by controlling the ratio of nitrogen atoms to oxygen atoms in titanium oxynitride and silicon oxynitride between 1.3:1 and 1.5:1.
  • the refractive index of titanium oxynitride is controlled to about 1.84, and the refractive index of silicon oxynitride is controlled to about 1.31.
  • the combination of layer number and layer thickness is controlled, and the effect is relatively thin when the overall thickness is thin.
  • the overall coating thickness can be controlled to be thin (can be controlled under the premise that the desired effect is satisfied) Within 1um), therefore, the impact on the capacitance value detection of the fingerprint sensor is small.
  • the magnitude of the capacitance value is also affected by the filled medium between the capacitor plates.
  • the capacitance value is also affected.
  • the plating structure of the embodiment of the present invention only Two kinds of nitrogen oxides are used as the plating layer. Therefore, there are few kinds of substances between the finger skin and the capacitor plate array, and there is no metal plating layer, and the overall thickness of the plating layer is very thin, from between the capacitor plates. From the perspective of the filling material, the effect is also reduced to a small extent.
  • the titanium oxynitride coating layer is located in the first layer, that is, the titanium oxynitride coating layer is first plated, and since the reflectance of the titanium oxynitride is relatively high, setting it on the first layer enables The entire film system is more colorful.
  • the total number of coating layers of the titanium oxynitride coating layer 2 and the silicon oxynitride coating layer 3 may be 5-7 layers, and the total thickness of the plating layer may be controlled between 280 nm and 1000 nm. Further, in the embodiment of the invention, the thickness of the glass substrate may be in the range of 170-180 um, preferably 175 um.
  • This embodiment provides a specific plating structure based on the first embodiment:
  • the total number of coating layers is 5 layers, and the ratio of the total thickness of the coating layer of the titanium oxynitride to the total thickness of the coating layer of the silicon oxynitride is between 1.55 and 1.65, ensuring that the ratio can be plated only 5
  • the mirror effect of rose gold is achieved, and the total thickness can be controlled to be less than 500 nm, thereby reducing the influence on the capacitance detection.
  • each layer can be distributed as follows:
  • the first coating layer is a titanium oxynitride coating having a thickness ranging from 45 to 70 nm;
  • the second coating layer is a silicon oxynitride coating having a thickness ranging from 55 to 90 nm;
  • the third coating layer is a titanium oxynitride coating having a thickness ranging from 45 to 70 nm;
  • the fourth coating layer is a silicon oxynitride coating having a thickness ranging from 55 to 90 nm;
  • the fifth layer coating layer is a titanium oxynitride coating layer, and the thickness ranges from 95 to 150 nm;
  • first layer and the third layer have the same thickness
  • second layer and the fourth layer have the same thickness
  • second layer and the fourth layer have a thickness greater than the thicknesses of the first layer and the third layer.
  • Second Group The third group First layer (TIN x O y ) 46nm 69nm 50nm Second layer (SIN x O y ) 59nm 89nm 66nm Third layer (TIN x O y ) 46nm 69nm 50nm The fourth layer (SIN x O y ) 59nm 89nm 66nm Fifth layer (TIN x O y ) 99nm 149nm 110nm Total thickness 309nm 465nm 342nm Thickness ratio of TIN x O y to SIN x O y 1.61 1.61 1.59
  • the reflectance curves of the three groups of film structures in the above table are shown in Figs. 7 to 9, in which the horizontal axis coordinate is the wavelength (nm) and the vertical axis is the refractive index (%), and the graphs of the following examples have the same horizontal and vertical coordinates. .
  • the total number of the coating layers is 6 layers
  • the total thickness of the coating layer of the titanium oxynitride and the silicon oxynitride is between 0.8 and 0.9, ensuring that this ratio can
  • the mirror effect of rose gold is achieved with only 6 coat layers, and the total thickness can be controlled below 600 nm, thereby reducing the effect on capacitance detection.
  • each layer can be distributed as follows:
  • the first coating layer is a titanium oxynitride coating having a thickness ranging from 75 to 95 nm;
  • the second coating layer is a silicon oxynitride coating having a thickness ranging from 75 to 95 nm;
  • the third coating layer is a titanium oxynitride coating having a thickness ranging from 75 to 95 nm;
  • the fourth coating layer is a silicon oxynitride coating having a thickness ranging from 75 to 95 nm;
  • the fifth layer coating layer is a titanium oxynitride coating layer having a thickness ranging from 75 to 95 nm;
  • the sixth layer coating layer is a silicon oxynitride coating layer having a thickness ranging from 110 to 135 nm;
  • first layer, the third layer and the fifth layer have the same thickness
  • the second layer and the fourth layer have the same thickness
  • the thicknesses of the second layer and the fourth layer are greater than the thicknesses of the third layer and the fifth layer.
  • Second Group The third group First layer (TIN x O y ) 76nm 50nm 90nm Second layer (SIN x O y ) 77nm 51nm 91nm Third layer (TIN x O y ) 76nm 50nm 90nm The fourth layer (SIN x O y ) 77nm 51nm 91nm Fifth layer (TIN x O y ) 76nm 50nm 90nm The sixth layer (SIN x O y ) 111nm 67nm 134nm Total thickness 493nm 319nm 586nm Thickness ratio of TIN x O y to SIN x O y 0.86 0.88 0.85
  • the total number of the coating layers is 7 layers
  • the total thickness of the coating layer of the titanium oxynitride and the silicon oxynitride is between 1.4 and 1.5. This ratio is ensured to achieve the mirror effect of rose gold with only 7 layers of plating, and the total thickness can be controlled below 950 nm, thereby reducing The effect on capacitance detection.
  • each layer can be distributed as follows:
  • the first coating layer is a titanium oxynitride coating having a thickness ranging from 65 to 130 nm;
  • the second coating layer is a silicon oxynitride coating having a thickness ranging from 65 to 130 nm;
  • the third coating layer is a titanium oxynitride coating having a thickness ranging from 65 to 130 nm;
  • the fourth coating layer is a silicon oxynitride coating having a thickness ranging from 65 to 130 nm;
  • the fifth layer coating layer is a titanium oxynitride coating layer, and the thickness ranges from 65 to 130 nm;
  • the sixth layer coating layer is a silicon oxynitride plating layer, and the thickness ranges from 65 to 130 nm;
  • the seventh layer coating layer is a titanium oxynitride coating layer having a thickness ranging from 80 to 170 nm;
  • the thicknesses of the first layer to the sixth layer are the same, and the thickness of the seventh layer is greater than the thickness of the first layer to the sixth layer.
  • Second Group The third group First layer (TIN x O y ) 99nm 66nm 129nm Second layer (SIN x O y ) 99nm 66nm 129nm Third layer (TIN x O y ) 99nm 66nm 129nm The fourth layer (SIN x O y ) 99nm 66nm 129nm Fifth layer (TIN x O y ) 99nm 66nm 129nm The sixth layer (SIN x O y ) 99nm 66nm 129nm The seventh layer (TIN x O y ) 128nm 84nm 165nm Total thickness 722nm 480nm 939nm Thickness ratio of TIN x O y to SIN x O y 1.43 1.42 1.42
  • an ink layer is disposed under the entire plating layer, and by providing an ink layer, light shielding can be better to prevent interference of stray light, and the invention is required for the invention.
  • the color achieved is preferably a gray ink layer printed, and the gray ink layer is capable of adjusting the background color to give a better rose gold effect.
  • the hollow pattern of the printed fingerprint pattern, the hollowed out portion and the non-hollowed portion have differences in light transmission and reflectivity, so that when viewed from the upper glass, a corresponding pattern will be presented on the mirror background, thereby enabling fingerprinting.
  • the area is marked or decorated.
  • a pigment different from gray may be further disposed in the hollow pattern, and more preferably, a pigment that contrasts with gray is filled, for example, a white pigment is filled, thereby making the pattern more conspicuous.
  • This embodiment mainly describes a method for manufacturing the glass plating structure of the first embodiment.
  • the glass plating structure of the present embodiment can be realized by an NCVM (non-conductive vacuum plating) process.
  • a vacuum space as shown in FIG. 6 is disposed, and nitrogen and oxygen (for example, nitrogen and oxygen in a ratio of 1.4:1) are introduced into the ratio between 1.3:1 and 1.5:1, and then
  • nitrogen and oxygen for example, nitrogen and oxygen in a ratio of 1.4:1
  • the titanium oxynitride plating layer forming step and the silicon oxynitride plating layer forming step are alternately performed to form an alternately stacked silicon oxynitride plating layer and a titanium oxynitride plating layer on the lower surface of the glass substrate.
  • the step of forming the titanium oxynitride coating layer is specifically: exciting the titanium raw material provided in the sealed space by an electron gun, evaporating the titanium raw material, reacting with nitrogen and oxygen in the sealed space, and then in the glass.
  • a titanium oxynitride coating layer is formed downward on the lower surface of the substrate.
  • the silicon oxynitride coating layer forming process includes: exciting a silicon raw material disposed in the sealed space by an electron gun, evaporating the silicon raw material, reacting with nitrogen and oxygen in the sealed space, and then under the glass substrate A silicon oxynitride coating layer is formed on the surface downward.
  • the number of times of alternately performing the titanium oxynitride coating layer formation step and the silicon oxynitride coating layer formation step depends on the number of layers to be finally obtained, and the thickness of each layer is controlled by controlling the titanium oxynitride coating layer formation process and silicon nitrogen each time.
  • the oxide plating layer formation step is realized.
  • the ratio of the nitrogen atom to the oxygen atom in the compound of the coating layer is controlled to achieve the reflectance of the titanium oxynitride and the silicon oxynitride. Adjusting, so that the refractive index of titanium oxynitride is controlled at about 1.84, and the refractive index of silicon oxynitride is controlled at about 1.31, and the combination of layer number and layer thickness is controlled, and the overall thickness is thin. a brighter rose gold mirror Surface effect.
  • This embodiment adopts a process. Since only two common metal and semiconductor materials are used, the process is simple to implement and convenient for batch generation.
  • a titanium oxynitride plating layer forming step is performed so that the titanium oxynitride coating layer is located in the first layer, and since the reflectance of the titanium oxynitride is relatively high, In the first layer, the entire film system can be rendered more vivid colors.
  • the total number of coating layers can be controlled in 5-7 layers, and the total thickness of the plating layer can be controlled between 280 nm and 1000 nm.
  • the thickness of the glass substrate can be 170-180 um. Within the range, it is preferably 175 um.
  • the embodiment relates to a method for manufacturing the plating structure of the second embodiment, which comprises: alternately performing a titanium oxynitride coating layer forming step and a silicon oxynitride coating layer forming step (which can be performed five times alternately).
  • the total number of coating layers is 5 layers, and the ratio of the total thickness of the coating layer of the titanium oxynitride to the total thickness of the coating layer of the silicon oxynitride is between 1.55 and 1.65.
  • the first coating layer is a titanium oxynitride coating having a thickness ranging from 45 to 70 nm;
  • the second coating layer is a silicon oxynitride coating having a thickness ranging from 55 to 90 nm;
  • the third coating layer is a titanium oxynitride coating having a thickness ranging from 45 to 70 nm;
  • the fourth coating layer is a silicon oxynitride coating having a thickness ranging from 55 to 90 nm;
  • the fifth layer coating layer is a titanium oxynitride coating layer, and the thickness ranges from 95 to 150 nm;
  • first layer and the third layer have the same thickness
  • second layer and the fourth layer have the same thickness
  • second layer and the fourth layer have a thickness greater than the thicknesses of the first layer and the third layer.
  • the thickness of each layer can be realized by controlling the coating time, and an example of the specific thickness of each layer has been described in the second embodiment, and details are not described herein.
  • the present embodiment relates to a method for manufacturing the plating structure of the third embodiment, which alternately executes a titanium oxynitride coating layer forming step and a silicon oxynitride coating layer forming step (which can be alternately performed)
  • the total number of the coating layers is 6 layers, and the ratio of the total thickness of the coating layer of the titanium oxynitride to the total thickness of the coating layer of the silicon oxynitride is 0.8 to 0.9. between.
  • the first coating layer is a titanium oxynitride coating having a thickness ranging from 75 to 95 nm;
  • the second coating layer is a silicon oxynitride coating having a thickness ranging from 75 to 95 nm;
  • the third coating layer is a titanium oxynitride coating having a thickness ranging from 75 to 95 nm;
  • the fourth coating layer is a silicon oxynitride coating having a thickness ranging from 75 to 95 nm;
  • the fifth layer coating layer is a titanium oxynitride coating layer having a thickness ranging from 75 to 95 nm;
  • the sixth layer coating layer is a silicon oxynitride coating layer having a thickness ranging from 110 to 135 nm;
  • first layer, the third layer and the fifth layer have the same thickness
  • the second layer and the fourth layer have the same thickness
  • the thicknesses of the second layer and the fourth layer are greater than the thicknesses of the third layer and the fifth layer.
  • the thickness of each layer can be realized by controlling the coating time, and an example of the specific thickness of each layer has been described in the third embodiment, and details are not described herein.
  • the present embodiment relates to a method for manufacturing the plating structure of the fourth embodiment, which alternately performs a titanium oxynitride coating layer forming step and a silicon oxynitride coating layer forming step (which can be performed alternately seven times), the coating layer
  • the total number is 7 layers, and the ratio of the total thickness of the coating layer of the titanium oxynitride to the total thickness of the coating layer of the silicon oxynitride is between 1.4 and 1.5.
  • a plating structure having the following thickness plating layer is produced:
  • the first coating layer is a titanium oxynitride coating having a thickness ranging from 65 to 130 nm;
  • the second coating layer is a silicon oxynitride coating having a thickness ranging from 65 to 130 nm;
  • the third coating layer is a titanium oxynitride coating having a thickness ranging from 65 to 130 nm;
  • the fourth coating layer is a silicon oxynitride coating having a thickness ranging from 65 to 130 nm;
  • the fifth layer coating layer is a titanium oxynitride coating layer, and the thickness ranges from 65 to 130 nm;
  • the sixth layer coating layer is a silicon oxynitride plating layer, and the thickness ranges from 65 to 130 nm;
  • the seventh layer coating layer is a titanium oxynitride coating layer having a thickness ranging from 80 to 170 nm;
  • the thicknesses of the first layer to the sixth layer are the same, and the thickness of the seventh layer is greater than the thickness of the first layer to the sixth layer.
  • the thickness of each layer can be realized by controlling the coating time, and an example of the specific thickness of each layer has been described in the fourth embodiment, and details are not described herein.
  • This embodiment mainly describes the structure of the above-described fifth embodiment.
  • an ink layer is printed on the lower side of the plating layer, whereby light shielding can be performed better.
  • printing a layer of gray ink under the plating layer may include: printing a gray ink layer having a fingerprint pattern hollow pattern, filling a pigment different from gray in a portion having a hollow; or printing only a hollow pattern without filling the pigment.
  • the filling is preferably a pigment which contrasts with the gray color, thereby making the pattern more conspicuous.
  • the embodiment relates to a fingerprint detecting device, including: a capacitive fingerprint sensor, which can be any capacitive fingerprint sensor used in the prior art, and can be an active capacitive fingerprint sensor (for example, The fingerprint sensor produced by FPC can also be a passive capacitive fingerprint sensor.
  • the glass plating structure of each of the above embodiments is attached to the upper portion of the capacitive fingerprint sensor as an isolation layer or a protective layer. The coated side faces the capacitive plate array of the capacitive fingerprint sensor, and the upper surface of the glass is externally used for contact. Fingerprint skin.
  • the embodiment relates to a mobile terminal including the fingerprint detecting device of the eleventh embodiment, such as a mobile phone, a tablet computer, etc., and an opening for performing fingerprint detection is disposed on a back cover of the mobile terminal, and the fingerprint detecting device is located at the The upper portion of the opening is exposed from the opening of the glass plating structure of the fingerprint detecting device.
  • the area of the fingerprint recognition is set.
  • a glass of rose gold color having a mirror effect is exposed by opening an opening in the back cover as an area for fingerprint recognition. Since the glass plating layer of the embodiment of the present invention can present a bright rose gold mirror effect, the fingerprint recognition area of the mobile terminal can be made abnormal and beautiful, and the overall aesthetic effect of the mobile terminal can be improved.

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Abstract

L'invention concerne une structure de revêtement de verre, un dispositif de détection d'empreintes digitales et un terminal mobile, ladite structure de revêtement de verre comprenant un substrat de verre (1), une alternance de couches de placage d'oxynitrure de titane (2) et de couches de placage d'oxynitrure de silicium (3) disposées vers le bas, sur la surface inférieure du substrat de verre (1), la proportion azote sur oxygène dans les formules moléculaires des couches de placage d'oxynitrure de titane et d'oxynitrure de silicium étant comprise entre 1,3:1 et 1,5:1. L'application d'une couche de placage d'oxynitrure de titane (2) alternée avec une couche de placage d'oxynitrure de silicium (3) sur la surface inférieure du substrat de verre (1), la proportion azote sur oxygène dans les compositions des couches de placage maintenue entre 1,3:1 et 1,5:1, et dans la mesure où l'isolation est assurée, on obtient une structure de revêtement de verre ayant un effet brillant de couleur or rose, et on maintient à un niveau très minime, l'incidence de l'épaisseur du revêtement sur la détection des empreintes digitales.
PCT/CN2015/099674 2015-10-20 2015-12-30 Structure de revêtement de verre, dispositif de détection d'empreintes digitales et terminal mobile WO2017067077A1 (fr)

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