WO2017067076A1 - Glass coating structure, fingerprint detection apparatus, and mobile terminal - Google Patents

Abstract

A glass coating layer structure, a fingerprint detection apparatus, and a mobile terminal. The glass coating structure comprises a glass substrate, and alternately stacked titanium oxynitride coating layers and silicon oxynitride oxide coating layers arranged facing downwards on the lower surface of the glass substrate; in the molecular formula of the titanium oxynitride and the silicon oxynitride, the ratio of nitrogen to oxygen is between 0.4:1 to 0.6:1. By means of alternately stacking titanium oxynitride coating layers and silicon oxynitride coating layers on the lower surface of a glass substrate, and maintaining the ratio of nitrogen to oxygen in the coating layer compounds between 0.4:1 to 0.6:1, a glass coating structure with a mirror effect can be created whilst ensuring insulation performance, and controlling the impact of the thickness of the coating layer on fingerprint detection within a very small range.

Description

Glass coating structure, fingerprint detecting device and mobile terminal

The present application claims the priority of the Chinese Patent Application No. PCT Application No.

Technical field

The invention relates to a glass coating structure, a fingerprint detecting device and a mobile terminal, in particular to a glass coating structure applied to fingerprint detection, a fingerprint detecting device comprising the glass plating structure and a mobile terminal including the fingerprint detecting device.

Background technique

At present, fingerprint recognition technology has been applied to products such as mobile terminals (such as computers). Among them, the capacitive push fingerprint detection method is widely used, and is specifically divided into active press detection and passive press detection.

The basic principle of passive press detection is shown in Figure 1. The entire detection system includes: a capacitive fingerprint sensor 10 at the bottom and an isolation layer (or a protective layer) overlying the capacitive fingerprint sensor 10, which is also the area where the finger is in direct contact. 11) wherein the capacitive fingerprint sensor 10 includes a plurality of capacitor plates arranged in a two-dimensional array (exemplarily labeled 5 capacitor plates P1-P5 in the figure), when the skin of the finger 12 is attached to the isolation layer 11 After the combination, a capacitance is formed between the skin of the finger 12 and the capacitor plate. Due to the presence of the fingerprint, a situation as shown in FIG. 1 is formed microscopically, and the skin of the finger 12 and the surface of the isolation layer 11 form a plurality of ridges and ridges. The distance between the different positions of the skin of the finger 12 and the respective capacitive plates is unequal, whereby different capacitance values are produced between the respective capacitive plates and the skin of the fingers 12. For example, the capacitance value formed at the crucible is Cv, and the capacitance value formed at the crucible is Cr. By measuring these capacitance values, fingerprint image information can be obtained, that is, each capacitor plate is used as a pixel to collect fingerprint image information.

The principle of active press detection is shown in FIG. 2. On the basis of the passive detection system, a metal ring 13 surrounding the isolation layer 11 is added. The metal ring 13 is connected to the bottom circuit, and the metal ring 13 is used to wake up the bottom layer. Capacitive fingerprint sensor 10 and through metal The ring 13 applies a certain current signal to the finger 12, thereby increasing the amount of charge on the skin of the finger 12, thereby enhancing the signal detected by the capacitive plate. As shown in FIG. 3, it shows a fingerprint image signal presented by detection of a capacitive fingerprint sensor.

In the above fingerprint detecting system, the upper and lower surfaces of the spacer layer 11 must be formed of an insulating material, otherwise the capacitance between the skin of the finger 12 and the capacitor plate will be destroyed, so that the fingerprint information cannot be detected. In addition, in the detection system with the metal ring 13, the portion of the isolation layer 11 that is in contact with the metal ring 13 must also be insulated. If the isolation layer 11 is electrically conductive, current on the metal ring 13 will flow through the isolation layer 11, thereby The signal is confusing and the fingerprint information cannot be detected.

In addition, since the detection range of the capacitive plate array of the capacitive fingerprint sensor 10 is small, the finger 12 is required to be close to the array of the capacitor plates, that is, the thickness of the isolation layer 11 is not required to be large, or the fingerprint detection effect is affected. Especially for the passive press detection system, the capacitive fingerprint sensor 10 is more sensitive to the thickness of the upper covered isolation layer 11, and the isolation layer 11 having a larger thickness cannot be used.

With the rapid development of mobile terminals such as mobile phones and tablet computers, mobile terminals tend to be thinner while continuing to pursue aesthetic effects. The area covered by the isolation layer 11 is also the area for fingerprint recognition, which is generally located on mobile terminals. The more prominent position, for example, is placed in the middle of the back cover of the mobile phone, or placed in the lower part of the front of the mobile phone. Therefore, the aesthetic appearance of the fingerprint recognition area will directly affect the overall appearance of the mobile phone. However, due to the above-mentioned limitations, in the prior art mobile terminal using the capacitive pressing type fingerprint detection method, the isolation layer 11 of the fingerprint recognition area is mostly made of ceramic or plastic, and the protection capacitor is simply realized in function. The fingerprint sensor 10 functions as an isolation package, but the glass mirror cannot be realized on the fingerprint detecting device.

In the prior art, the coating technology of the glass mirror surface is relatively mature. However, since the general mirror coating does not require high insulation and thickness, it is generally adopted by direct metal plating or by multi-layer coating. The effect of the coating layer thus formed is generally thick or non-insulating, and therefore, the thickness requirement for fingerprint detection cannot be satisfied. In addition, the fingerprint detection system itself adopts the principle of capacitance detection. The skin of the finger 12 and the array of the capacitor plates respectively serve as the two poles of the capacitor. According to the calculation formula of the capacitance, the size of the capacitor is related to the distance between the capacitor plates. Also related to the medium between the capacitor plates, the introduction of the coating layer will Increasing the amount of dielectric between the capacitor plates affects the value of the capacitor. The greater the thickness of the coating layer, the greater the effect on the capacitance value. Therefore, in order not to have a serious impact on fingerprint detection, objectively, it cannot be allowed to exist. A very thick coating layer exists.

Summary of the invention

It is an object of the present invention to provide a glass plating structure, a fingerprint detecting device and a mobile terminal, which can make a fingerprint mirroring effect of a black color on the premise that the fingerprint detecting effect is small.

In order to achieve the above object, the present invention provides a glass plating structure comprising a glass substrate, and an alternating layer of a titanium oxynitride coating layer and a silicon oxynitride coating layer are disposed downwardly on a lower surface of the glass substrate, wherein In the molecular formula of titanium oxynitride and silicon oxynitride, the ratio of nitrogen to oxygen is between 0.4:1 and 0.6:1.

The present invention also provides a fingerprint detecting device comprising: a capacitive fingerprint sensor, wherein the glass plating structure is attached to an upper portion of the capacitive fingerprint sensor.

The present invention further provides a mobile terminal including the above-mentioned fingerprint detecting device, the back cover of the mobile terminal is provided with an opening for performing fingerprint detection, and the fingerprint detecting device is located at a lower portion of the opening, and the fingerprint detecting device The upper surface of the glass plating structure is exposed from the opening.

The glass plating structure, the fingerprint detecting device and the mobile terminal provided by the invention alternately plate a titanium oxynitride coating layer and a silicon oxynitride coating layer on the lower surface of the glass substrate, and maintain the ratio of nitrogen to oxygen in the plating compound. Between 0.4:1 and 0.6:1, a glass-plated structure exhibiting a mirror-like effect of ochre is realized under the premise of ensuring insulation, and the influence of the thickness of the plating itself on fingerprint detection is controlled to be very small. Within the scope.

DRAWINGS

1 is a schematic diagram of a prior art fingerprint detection principle;

2 is a second schematic diagram of the principle of fingerprint detection in the prior art;

3 is a schematic diagram of a fingerprint detection image signal of the prior art;

Figure 4 is a schematic view showing the structure of a glass plating layer according to Embodiment 1 of the present invention;

Figure 5 is a schematic view showing the structure of a glass plating layer according to a third embodiment of the present invention;

6 is a schematic view showing the principle of coating of the sixth embodiment of the present invention;

FIG. 7 is a schematic diagram showing a reflectance curve corresponding to the first group of film structures in the second embodiment of the present invention; One of the figures;

8 is a second schematic diagram of a reflectance curve corresponding to a second group of film structures in Embodiment 2 of the present invention;

FIG. 9 is a third schematic diagram of a reflectance curve corresponding to the third group of film structures in the second embodiment of the present invention.

detailed description

The embodiments of the present invention are described in detail below with reference to the accompanying drawings.

The principle of the embodiment of the present invention is to achieve a mirror effect with a specific color by alternately plating a titanium oxynitride coating layer and a silicon oxynitride coating layer on the lower surface of the glass substrate, while ensuring insulation and overall The thickness of the coating is controlled to a very thin range, thereby reducing the impact on fingerprint detection.

Embodiment 1

As shown in FIG. 4, the embodiment relates to a glass plating structure, which is mainly used in a capacitive press type fingerprint detecting system, and functions as an isolation layer covering a capacitive fingerprint sensor. The structure of the glass plating layer includes a glass substrate 1 and The entire layer of the titanium oxide layer 2 and the silicon oxynitride layer 3, which are disposed alternately on the lower surface of the glass substrate, and the layer of the coating layer formed by the multilayer coating layer are also referred to as a film system.

Among them, in the molecular formula of titanium oxynitride and silicon oxynitride, the ratio of nitrogen to oxygen is approximately between 0.4:1 and 0.6:1. In practical applications, it is preferred to position the ratio of nitrogen to oxygen at 0.5. : 1, ie, the titanium oxynitride and silicon oxynitride formulas can be expressed as TIN _x O _y and SIN _x O _y , where x = 0.5 _y .

In the above structure, a plating structure in which a titanium oxynitride plating layer and the silicon oxynitride coating layer are alternately laminated is used to realize a mirror effect of the glass substrate, and the thickness can be thinner as a whole while ensuring insulation. The coating is used to achieve a brightly colored mirror effect.

Specifically, the reflectance of titanium oxynitride and silicon oxynitride is adjusted by controlling the ratio of nitrogen atoms to oxygen atoms in titanium oxynitride and silicon oxynitride to be between 0.4:1 and 0.6:1. The refractive index of titanium oxynitride is controlled to about 2.08, and the refractive index of silicon oxynitride is controlled to about 1.39. At the same time, the combination of layer number and layer thickness is controlled, and the effect is relatively thin when the overall thickness is thin. Bright, ochre mirror effect. The twilight mentioned here L = 54, A value = -3.5 - 2.9, B value = -7.6 - 6.1.

In addition, since the magnitude of the capacitance value is affected by the distance between the capacitor plates, in the structure of the embodiment of the present invention, the overall coating thickness can be controlled to be thin (can be controlled under the premise that the desired effect is satisfied) Within 1um), therefore, the impact on the capacitance value detection of the fingerprint sensor is small.

In addition, the magnitude of the capacitance value is also affected by the filled medium between the capacitor plates. When the type of the filler material is more, the capacitance value is also affected. In the plating structure of the embodiment of the present invention, only Two kinds of nitrogen oxides are used as the plating layer. Therefore, there are few kinds of substances between the finger skin and the capacitor plate array, and there is no metal plating layer, and the overall thickness of the plating layer is very thin, from between the capacitor plates. From the perspective of the filling material, the effect is also reduced to a small extent.

More preferably, the titanium oxynitride coating layer is located in the first layer, that is, the titanium oxynitride coating layer is first plated, and since the reflectance of the titanium oxynitride is relatively high, setting it on the first layer enables The entire film system is more colorful.

In this embodiment, the total number of coating layers of the titanium oxynitride coating layer 2 and the silicon oxynitride coating layer 3 is 4, and the total thickness of the plating layer can be controlled between 100 nm and 150 nm. Further, in the embodiment of the invention, the thickness of the glass substrate may be in the range of 170-180 um, preferably 175 um.

Embodiment 2

In this embodiment, based on the first embodiment, a specific plating structure is given: the total number of the coating layers is 4, the total thickness of the coating layer of the titanium oxynitride and the silicon oxynitride The ratio of the total thickness of the coating layer is between 0.4 and 0.5. This ratio is guaranteed to achieve a mirror effect of enamel in the case of plating only 4 layers, and the total thickness can be controlled below 150 nm, thereby reducing the The effect of capacitance detection. .

Among them, the structure of each layer can be distributed as follows:

The first coating layer is a titanium oxynitride coating having a thickness ranging from 5 to 10 nm;

The second coating layer is a silicon oxynitride coating having a thickness ranging from 50 to 85 nm;

The third coating layer is a titanium oxynitride coating having a thickness ranging from 25 to 40 nm;

The fourth coating layer is a silicon oxynitride coating having a thickness ranging from 15 to 25 nm.

Specifically, three examples of specific membrane system structures in the following table are given:

Table I

Layer number	First group	Second Group	The third group
First layer (TIN x O y )	6nm	9nm	7nm
Second layer (SIN x O y )	54nm	81nm	67nm
Third layer (TIN x O y )	25nm	37.5nm	30nm
The fourth layer (SIN x O y )	15nm	22.5nm	18nm
Total thickness	100nm	150nm	122nm
Thickness ratio of TIN x O y to SIN x O y	0.44	0.44	0.43

The reflectance curves of the three groups of film structures in the above table are shown in Figs. 7 to 9, in which the horizontal axis coordinate is the wavelength (nm) and the vertical axis is the refractive index (%), and the graphs of the following examples have the same horizontal and vertical coordinates. .

Embodiment 3

As shown in FIG. 5, in the present embodiment, on the basis of the above embodiments, a black ink layer is disposed under the entire plating layer, and by providing the ink layer, it is possible to better shield light and prevent stray light interference.

Further, it is also possible to print a certain hollow pattern when printing a black ink layer, for example, a hollow pattern of a printed fingerprint pattern, a hollow portion and a non-hollow portion, which differ in light transmittance and reflectivity, thereby The upper glass observation will present a corresponding pattern on the mirror background, so that the fingerprint area can be identified or decorated. Preferably, a pigment different from black may be further disposed in the hollow pattern, and more preferably, a pigment that contrasts with gray is filled, for example, a white pigment is filled, thereby making the pattern more conspicuous.

Embodiment 4

This embodiment mainly describes a method for manufacturing the glass plating structure of the first embodiment. As shown in FIG. 6, the glass plating structure of the present embodiment can be realized by an NCVM (non-conductive vacuum plating) process.

Specifically, a vacuum space as shown in FIG. 6 is disposed, and nitrogen gas and oxygen gas (preferably, a ratio of nitrogen gas to oxygen ratio of 0.5:1) are introduced thereto in a ratio of 0.4:1 to 0.6:1. Then, the titanium oxynitride plating layer forming step and the silicon oxynitride plating layer forming step are alternately performed to form alternately stacked silicon oxynitride plating layers and titanium oxynitride plating layers on the lower surface of the glass substrate.

The step of forming the titanium oxynitride coating layer is specifically: exciting the titanium raw material provided in the sealed space by an electron gun, evaporating the titanium raw material, reacting with nitrogen and oxygen in the sealed space, and then in the glass. A titanium oxynitride coating layer is formed downward on the lower surface of the substrate.

The silicon oxynitride coating layer forming process includes: exciting a silicon raw material disposed in the sealed space by an electron gun, evaporating the silicon raw material, reacting with nitrogen and oxygen in the sealed space, and then under the glass substrate A silicon oxynitride coating layer is formed on the surface downward.

The number of times of alternately performing the titanium oxynitride coating layer formation step and the silicon oxynitride coating layer formation step depends on the number of layers to be finally obtained, and the thickness of each layer is controlled by controlling the titanium oxynitride coating layer formation process and silicon nitrogen each time. The oxide plating layer formation step is realized.

In the above process, by controlling the ratio of nitrogen and oxygen to be introduced, the ratio of the nitrogen atom to the oxygen atom in the compound of the coating layer is controlled to achieve the reflectance of the titanium oxynitride and the silicon oxynitride. Adjustment, so that the refractive index of titanium oxynitride is controlled at about 2.08, and the refractive index of silicon oxynitride is controlled at about 1.39, and the combination of layer number and layer thickness is controlled, and the overall thickness is thin. The effect is brighter and the mirror effect of the twilight. This embodiment adopts a process. Since only two common metal and semiconductor materials are used, the process is simple to implement and convenient for batch generation.

Further, in the coating process, first, a titanium oxynitride plating layer forming step is performed so that the titanium oxynitride coating layer is located in the first layer, and since the reflectance of the titanium oxynitride is relatively high, In the first layer, the entire film system can be rendered more vivid colors.

In addition, in this embodiment, the total number of coating layers can be controlled in 4 layers, and the total thickness of the plating layer can be controlled between 100 nm and 150 nm. In addition, in the embodiment of the present invention, the thickness of the glass substrate can be in the range of 170-180 um. Preferably, it is 175 um.

Embodiment 5

The embodiment relates to a method for manufacturing the plating structure of the second embodiment, comprising: alternately performing a titanium oxynitride coating layer forming step and a silicon oxynitride coating layer forming step (may be It can be realized by performing four times alternately, so that the total number of the coating layers is 4 layers, and the ratio of the total thickness of the coating layer of the titanium oxynitride to the total thickness of the coating layer of the silicon oxynitride is 0.4 to Between 0.5.

Specifically, by alternately performing the titanium oxynitride plating layer forming step and the silicon oxynitride coating layer step, a plating structure having the following thickness is produced:

The first coating layer is a titanium oxynitride coating having a thickness ranging from 5 to 10 nm;

The second coating layer is a silicon oxynitride coating having a thickness ranging from 50 to 85 nm;

The third coating layer is a titanium oxynitride coating having a thickness ranging from 25 to 40 nm;

The fourth coating layer is a silicon oxynitride coating having a thickness ranging from 15 to 25 nm.

Wherein, the thickness of each layer can be realized by controlling the coating time, and an example of the specific thickness of each layer has been described in the second embodiment, and details are not described herein.

Embodiment 6

This embodiment mainly describes the structure of the above-described third embodiment. In the present embodiment, after the titanium oxynitride plating layer forming step and the silicon oxynitride plating layer forming step are alternately performed by the ink printing apparatus, a black ink layer is printed under the plating layer, thereby enabling better shading. To prevent stray light interference.

Further, printing a layer of black ink under the plating layer may include: printing a black ink layer having a fingerprint pattern hollow pattern, filling a pigment different from gray in a portion having a hollow; or printing only a hollow pattern without filling the pigment. Among them, the filling is preferably a pigment which contrasts with black, for example, a white pigment is filled, thereby making the pattern more conspicuous.

Example 7

The embodiment relates to a fingerprint detecting device, including: a capacitive fingerprint sensor, which can be any capacitive fingerprint sensor used in the prior art, and can be an active capacitive fingerprint sensor (for example, The fingerprint sensor produced by FPC can also be a passive capacitive fingerprint sensor. The glass plating structure of each of the above embodiments is attached to the upper portion of the capacitive fingerprint sensor as an isolation layer or a protective layer. The coated side faces the capacitive plate array of the capacitive fingerprint sensor, and the upper surface of the glass is externally used for contact. Fingerprint skin.

Example eight

The embodiment relates to a mobile terminal including the fingerprint detecting device of the eleventh embodiment, such as a mobile phone, a tablet computer, etc., and an opening for performing fingerprint detection is disposed on a back cover of the mobile terminal, and the fingerprint detecting device is located at the The upper portion of the opening is exposed from the opening of the glass plating structure of the fingerprint detecting device. In the above configuration, the area where the fingerprint is recognized is placed behind the mobile terminal, and an opening is formed in the back cover to expose the glass having a mirror effect to the area of fingerprint recognition. Since the glass coating layer of the embodiment of the invention can present a bright enamel mirror effect, the fingerprint recognition area of the mobile terminal can be made abnormal and beautiful, and the overall aesthetic effect of the mobile terminal can be improved.

Finally, it should be noted that the above embodiments are merely illustrative of the technical solutions of the present invention, and are not intended to be limiting; although the present invention has been described in detail with reference to the foregoing embodiments, those skilled in the art will understand that The technical solutions described in the foregoing embodiments may be modified, or some or all of the technical features may be equivalently replaced; and the modifications or substitutions do not deviate from the technical solutions of the embodiments of the present invention. range.

Claims (27)

1. A mobile terminal includes a casing, wherein the casing is provided with an opening, the opening is provided with a fingerprint detecting device, the fingerprint detecting device comprises a glass plating structure, and the glass plating structure comprises a glass substrate and a coating film a layer, the plating layer being disposed on one side of the glass substrate.
2. The mobile terminal of claim 1, wherein the fingerprint detecting device further comprises a fingerprint sensor, the glass plating structure being attached to one side of the fingerprint sensor.
3. The mobile terminal of claim 2, wherein the plating layer is located between the fingerprint sensor and the glass substrate.
4. The mobile terminal according to claim 1, wherein the plating layer is a plating layer that is alternately laminated.
5. The mobile terminal according to claim 4, wherein the alternately stacked plating layers are formed by alternately laminating coating layers of at least two kinds of nitrogen oxides.
6. The mobile terminal according to claim 5, wherein the coating layer of the at least two oxynitrides is a titanium oxynitride coating layer and a silicon oxynitride coating layer.
7. The mobile terminal according to claim 6, wherein the titanium oxynitride coating layer is located in the first layer, and the silicon oxynitride coating layer is located in the second layer.
8. The mobile terminal according to claim 6 or 7, wherein in the molecular formula of the titanium oxynitride and the silicon oxynitride, the ratio of nitrogen to oxygen is between 0.4:1 and 0.6:1.
9. The mobile terminal according to claim 8, wherein in the molecular formula of the titanium oxynitride and the silicon oxynitride, a ratio of nitrogen to oxygen is 0.5:1.
10. The mobile terminal according to claim 6 or 7, wherein the total number of the plating layers is 4, and the ratio of the total thickness of the titanium oxynitride coating layer to the total thickness of the silicon oxynitride coating layer Between 0.4 and 0.5.
11. A mobile terminal according to claim 10, characterized in that

    The first coating layer is a titanium oxynitride coating layer, and the thickness ranges from 5 to 10 nm;

    The second coating layer is a silicon oxynitride coating layer, and the thickness ranges from 50 to 85 nm;

    The third layer coating layer is a titanium oxynitride coating layer, and the thickness ranges from 25 to 40 nm;

    The fourth coating layer is a silicon oxynitride coating layer having a thickness ranging from 15 to 25 nm.
12. The mobile terminal according to any one of claims 1 to 7, characterized in that an ink layer is provided on one side of the plating layer.
13. The mobile terminal of claim 12, wherein the ink layer is a gray ink layer.
14. The mobile terminal according to claim 13, wherein in the gray ink layer, there is a hollow pattern or a filling pattern, and the filling pattern is filled with a pigment different from gray.
15. A glass plating structure comprising a glass substrate, wherein the glass plating structure further comprises a coating layer, the coating layer being disposed on one side of the glass substrate.
16. The glass plating structure according to claim 15, wherein the plating layer is a plating layer which is alternately laminated.
17. The glass plating layer structure according to claim 16, wherein the alternately laminated plating layers are formed by alternately laminating coating layers of at least two oxynitride compounds.
18. The glass coating structure according to claim 17, wherein the coating layer of the at least two oxynitrides is a titanium oxynitride coating layer and a silicon oxynitride coating layer.
19. The glass coating structure according to claim 18, wherein the titanium oxynitride coating layer is located in the first layer, and the silicon oxynitride coating layer is located in the second layer.
20. The glass coating structure according to claim 18 or 19, wherein in the molecular formula of the titanium oxynitride and the silicon oxynitride, the ratio of nitrogen to oxygen is between 0.4:1 and 0.6:1.
21. The glass coating structure according to claim 20, wherein a ratio of nitrogen to oxygen in the molecular formula of the titanium oxynitride and the silicon oxynitride is 0.5:1.
22. The glass coating structure according to claim 18 or 19, wherein the total number of the coating layers is 4, the total thickness of the titanium oxynitride coating layer and the total thickness of the silicon oxynitride coating layer. The ratio is between 0.4 and 0.5.
23. The glass coating structure according to claim 22, wherein

    The first coating layer is a titanium oxynitride coating layer, and the thickness ranges from 5 to 10 nm;

    The second coating layer is a silicon oxynitride coating layer, and the thickness ranges from 50 to 85 nm;

    The third layer coating layer is a titanium oxynitride coating layer, and the thickness ranges from 25 to 40 nm;

    The fourth coating layer is a silicon oxynitride coating layer having a thickness ranging from 15 to 25 nm.
24. The glass plating structure according to any one of claims 15 to 19, wherein an ink layer is provided on one side of the plating layer.
25. The glass coating structure according to claim 24, wherein the ink layer is a gray ink layer.
26. The glass plating structure according to claim 25, wherein in the gray ink layer, there is a hollow pattern or a filling pattern, and the filling pattern is filled with a pigment different from gray.
27. A fingerprint detecting device comprising: a fingerprint sensor, wherein the glass plating layer structure according to any one of claims 15 to 26 is attached to an upper portion of the fingerprint sensor.

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