CN205917178U - Glass plating layer structure , fingerprint detection device and mobile terminal - Google Patents
Glass plating layer structure , fingerprint detection device and mobile terminal Download PDFInfo
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- CN205917178U CN205917178U CN201521128990.3U CN201521128990U CN205917178U CN 205917178 U CN205917178 U CN 205917178U CN 201521128990 U CN201521128990 U CN 201521128990U CN 205917178 U CN205917178 U CN 205917178U
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Abstract
The utility model provides a glass plating layer structure, fingerprint detection device and mobile terminal, wherein, glass plating layer structure includes a glass base plate glass substrate's lower surface is provided with range upon range of titanium nitrogen oxide coating film layer and silicon nitrogen oxide coating film layer in turn downwards, and wherein, in titanium nitrogen oxide and silicon nitrogen oxide's the molecular formula, the proportion of nitrogen and oxygen is 0.4: 1 to 0.6: 1 between. The utility model discloses an on alternative titanium plating nitrogen oxide coating film layer of glass substrate's lower surface and silicon nitrogen oxide coating film layer to the messenger plates the proportion that stratification closed nitrogen and oxygen in the thing and keeps 0.4: 1 to 0.6: 1 between to under the prerequisite of guaranteeing insulating nature, the glass plating layer structure who presents the mirror effect of tarnish has been realized, and control the thickness of cladding material itself at very little within range to fingerprint detection's influence.
Description
The patent application claims applying date is October 20, the Chinese patent of Application No. 201520816062x in 2015
The priority of application, and above-mentioned patent application is incorporated herein by reference in full.
Technical field
This utility model is related to a kind of glass coating structure, finger print detection device and mobile terminal, and more particularly, to one kind should
For the glass coating structure of fingerprint detection, the finger print detection device comprising this glass coating structure and comprise this fingerprint detection dress
The mobile terminal put.
Background technology
At present, fingerprint identification technology has been applied on the products such as mobile terminal (as computer).Wherein, electric capacity pressing type refers to
Marks detection method application is relatively broad, is specifically divided into active pressing detection and passive type pressing detection again.
The ultimate principle of passive type pressing detection is as shown in figure 1, whole detecting system includes: the condenser type positioned at bottom refers to
Stricture of vagina sensor 10 and cover sealing coat on capacitive fingerprint sensing device 10 and (or be protective layer, be also that finger directly connects
Tactile region) 11, wherein, capacitive fingerprint sensing device 10 includes multiple capacitor plates (the in figure example with two-dimensional array
Property mark out 5 capacitor plate p1-p5), after the skin of finger 12 is fitted with sealing coat 11, the skin of finger 12 and electric capacity
Form electric capacity between pole plate, due to the presence of fingerprint, situation as shown in Figure 1 formed on microcosmic, the skin of finger 12 with every
Absciss layer 11 surface defines many places ridge and valley, and the distance between the diverse location of the skin of finger 12 and each capacitor plate are not
Equal, thus, each capacitor plate just creates different capacitances between the skin of finger 12.For example formed at ridge
Capacitance be cv, at valley formed capacitance be cr, by measuring these capacitances, be obtained in that information in fingerprint,
Be each capacitor plate as a pixel, to collect information in fingerprint.
The principle of active pressing detection as shown in Fig. 2 increased on the basis of passive type detecting system be looped around every
Becket 13 around absciss layer 11, becket 13 is connected with bottom circuit, and the effect of becket 13 is used to wake up the electricity of bottom
Appearance formula fingerprint sensor 10 and certain current signal is applied to finger 12 by becket 13, thus increasing the skin of finger 12
Amount of charge on skin, and then enhance the signal detected by capacitor plate.In above-mentioned fingerprint detection system, isolation
The upper and lower surface of layer 11 has to be formed by insulant, not so will destroy the electricity between the skin of finger 12 and capacitor plate
Hold, thus finger print information cannot be detected.Additionally, in the detecting system with becket 13, sealing coat 11 and becket 13
The part of contact also must be insulation, if sealing coat 11 is conductive, the electric current on becket 13 will flow through sealing coat 11, from
And cause signal chaotic, finger print information equally cannot be detected.
Further, since the detection range very little of the capacitor plate array of capacitive fingerprint sensing device 10, this is accomplished by finger
12 is close apart from capacitor plate array, that is, require sealing coat 11 thickness very big, not so also can affect fingerprint detection effect.Especially
It is the system for passive type pressing detection, and capacitive fingerprint sensing device 10 is to the thickness of the sealing coat 11 that top covers more
Sensitivity is it is impossible to use the larger sealing coat 11 of thickness.
With developing rapidly of the mobile terminals such as mobile phone, panel computer, mobile terminal is while trending towards slimming
Constantly investigate aesthetic, the region that sealing coat 11 is covered namely carries out the region of fingerprint recognition, and it is on mobile terminals
It is typically in more prominent position, for example, be arranged on the bonnet centre position of mobile phone, or the bottom being arranged on mobile phone front
Deng.Therefore, fingerprint recognition region aesthetic measure will directly affect the overall appearance of mobile phone.But, due to above-mentioned many limits
System, the mobile terminal of the fingerprint detection mode of employing electric capacity pressing type of the prior art, the sealing coat in its fingerprint recognition region
11 most using pottery or the material such as plastics, functionally only simple realization protection capacitive fingerprint sensing device 10 every
From encapsulation effect, but, glass-mirror cannot be realized on finger print detection device.
In prior art, the coating technique of glass-mirror is more ripe, but, due to general filming on mirror surface, will not be right
Insulating properties and thickness requirement are higher, typically can by the way of direct plating metal, or realize wanting by the plated film of multilamellar
Effect, the film plating layer so being formed is typically thicker or on-insulated, therefore, it is impossible to meet the thickness requirement of fingerprint detection.This
Outward, above-mentioned fingerprint detection system uses capacitance detecting principle in itself, and the skin of finger 12 is with capacitor plate array respectively
As the two poles of the earth of electric capacity, according to capacitance calculation formula, the size of electric capacity except relevant with the distance between capacitor plate, also
Medium between capacitor plate is relevant, and the introducing of film plating layer will increase the media quantity between capacitor plate, thus affecting
The size of capacitance, the thickness of film plating layer is bigger, and the impact to capacitance is also bigger, therefore, in order to not cause to fingerprint detection
Serious impact, objectively also cannot allow there is very thick film plating layer presence.
Utility model content
The purpose of this utility model is to provide a kind of glass coating structure, finger print detection device and mobile terminal, can
So that fingerprint detection region assumes the mirror effect of tarnish under the premise of less to fingerprint detection influential effect.
To achieve these goals, this utility model provides a kind of glass coating structure, including a glass substrate, in institute
State glass substrate lower surface down-set have alternately laminated titanium-nitrogen-oxygen compound film plating layer and silicon nitrogen oxides film plating layer, its
In, in the molecular formula of titanium-nitrogen-oxygen compound and silicon nitrogen oxides, the ratio of nitrogen and oxygen is between 0.4:1 to 0.6:1.
This utility model additionally provides a kind of finger print detection device, comprising: capacitive fingerprint sensing device, in described condenser type
The top of fingerprint sensor is pasted with above-mentioned glass coating structure.
This utility model provides a kind of mobile terminal including above-mentioned finger print detection device again, after described mobile terminal
Cover the opening offering for carrying out fingerprint detection, described finger print detection device is located at described lower opening portion, described fingerprint inspection
Expose from described opening above the glass coating structure surveying device.
Glass coating structure, finger print detection device and mobile terminal that this utility model provides, by glass substrate
Lower surface replaces titanizing nitrogen oxides film plating layer and silicon nitrogen oxides film plating layer, and makes the ratio of nitrogen in coating compound and oxygen
It is maintained between 0.4:1 to 0.6:1, thus it is achieved that assuming the mirror effect of tarnish on the premise of ensureing insulating properties
Glass coating structure, and by the thickness of coating itself, the impact to fingerprint detection controls in very little scope.
Brief description
Fig. 1 is one of schematic diagram of fingerprint detection principle of prior art；
Fig. 2 is the two of the schematic diagram of fingerprint detection principle of prior art；
The schematic diagram of the glass coating structure of Fig. 3 this utility model embodiment one；
Fig. 4 is the schematic diagram of the glass coating structure of this utility model embodiment three；
Fig. 5 is the Principle of plating schematic diagram of this utility model embodiment six；
Fig. 6 is one of corresponding reflectance curve schematic diagram of first group of film structure in this utility model embodiment two；
Fig. 7 is two of the corresponding reflectance curve schematic diagram of second group of film structure in this utility model embodiment two；
Fig. 8 is three of the 3rd group of film structure corresponding reflectance curve schematic diagram in this utility model embodiment two.
Specific embodiment
Below in conjunction with the accompanying drawings this utility model embodiment is described in detail.
The principle of this utility model embodiment is, replaces titanizing nitrogen oxides plated film by the lower surface in glass substrate
Layer and silicon nitrogen oxides film plating layer, to realize the mirror effect with particular color, simultaneously insulating properties also to be ensured and general
The THICKNESS CONTROL of overall coating is in very thin scope, thus reducing the impact to fingerprint detection.
Embodiment one
As shown in figure 3, the present embodiment is related to a kind of glass coating structure, it is mainly used in electric capacity pressing type fingerprint detection system
In system, serve as and cover sealing coat on capacitive fingerprint sensing device, the structure of this glass coating include glass substrate 1 and
The down-set alternately laminated titanium-nitrogen-oxygen compound film plating layer 2 of the lower surface of described glass substrate and silicon nitrogen oxides film plating layer 3,
The plated film Rotating fields of the entirety that multicoating layer is formed are also referred to as membrane system.
Wherein, in the molecular formula of titanium-nitrogen-oxygen compound and silicon nitrogen oxides, the ratio of nitrogen and oxygen is substantially in 0.4:1 to 0.6:1
Between, in actual applications, more preferably, the ratio of nitrogen and oxygen is positioned at 0.5:1, i.e. titanium-nitrogen-oxygen compound and silicon nitrogen oxidation
Thing molecular formula can be expressed as tinxoyAnd sinxoy, wherein x=0.5y.
In said structure, employ titanium-nitrogen-oxygen compound film plating layer and the alternately laminated plating of described silicon nitrogen oxides film plating layer
Rotating fields, to realize the mirror effect of glass substrate, on the premise of ensureing insulating properties, can be with the relatively thin coating of integral thickness
To realize brightly painted mirror effect.
Specifically, by controlling the ratio of nitrogen-atoms and oxygen atom in titanium-nitrogen-oxygen compound and silicon nitrogen oxides in 0.4:1
To between 0.6:1, the reflectance of titanium-nitrogen-oxygen compound and silicon nitrogen oxides is adjusted, by the refractive index control of titanium-nitrogen-oxygen compound
System 2.08 about, the refractive index of silicon nitrogen oxides is controlled 1.39 about, in combination with the control of the number of plies and thickness, whole
It is achieved that the mirror effect of the more beautiful tarnish of effect in the case that body thickness is relatively thin.L=54, a of tarnish mentioned here
Value=- 3.5-2.9, b value=- 7.6-6.1.
Further, since the size of capacitance is affected by the distance between capacitor plate, in this utility model embodiment
Structure in, overall coating film thickness can be controlled very thin and (on the premise of meeting desirable effect, can control in 1um
Within), therefore, for the capacitance detection impact very little of fingerprint sensor.
Additionally, the size of capacitance also can be affected by the medium of the filling between capacitor plate, when filler kind
When class is more, also capacitance can be affected, in the coating structure of embodiment of the present utility model, use only
, as coating, therefore, the species of the material between finger skin and capacitor plate array is less, and does not have for two kinds of nitrogen oxides
There is metal class coating, and the integral thickness of coating is again very thin, for the angle of filler between capacitor plate, impact
It is reduced to very little.
More preferably, titanium-nitrogen-oxygen compound film plating layer is located at ground floor, plates titanium-nitrogen-oxygen compound film plating layer at first, by
Higher in the luminance factor of titanium-nitrogen-oxygen compound, therefore, being located at ground floor, that whole membrane system can be made to present is more gorgeous
Color.
In the present embodiment, the film plating layer sum of described titanium-nitrogen-oxygen compound film plating layer 2 and described silicon nitrogen oxides film plating layer 3
For 4 layers, coating gross thickness can control between 100nm to 150nm.In addition, in embodiment of the present utility model, glass base
The thickness of plate can be in the range of 170-180um, preferably 175um.
Embodiment two
The present embodiment, on the basis of embodiment one, gives a kind of specific coating structure: described film plating layer sum is 4
Layer, the gross thickness of film plating layer of described titanium-nitrogen-oxygen compound is arrived 0.4 with the ratio of the gross thickness of the film plating layer of described silicon nitrogen oxides
It is ensured that this ratio just can realize the mirror effect of tarnish in the case of only plating 4 layers of film plating layer between 0.5, and can
Gross thickness is controlled in below 150nm, thus reducing the impact to capacitance detecting.
Wherein, every layer of structure can be using following thickness distribution:
Described ground floor film plating layer is titanium-nitrogen-oxygen compound coating, and thickness range is 5-10nm；
Described second layer film plating layer is silicon nitrogen oxides coating, and thickness range is 50-85nm；
Described third layer film plating layer is titanium-nitrogen-oxygen compound coating, and thickness range is 25-40nm；
Described 4th layer of film plating layer is silicon nitrogen oxides coating, and thickness range is 15-25nm.
Specifically, three groups of concrete film structure examples in following table are given:
Table one
In upper table, as shown in Figure 6 to 8, wherein transverse axis coordinate is wavelength (nm) to the reflectance curve of three groups of film structures,
The longitudinal axis is refractive index (%), and the curve chart transverse and longitudinal coordinate of following examples is identical.
Embodiment three
As shown in figure 4, the present embodiment is on the basis of the various embodiments described above, the lower section of whole coating be provided with one layer black
Color ink layer, by arranging ink layer, can preferably carry out shading, prevent the interference of veiling glare.
Further, certain pierced pattern can also be printed, for example, printing refers to when process black ink layer
The pierced pattern of stricture of vagina figure, the part of openwork part and non-hollow out, light transmission and reflexive have differences, thus from
Layer glass observation will present corresponding pattern under mirrored background and be identified or fill such that it is able to realize finger-print region
Decorations.Preferably, the pigment being different from black can be set again in pierced pattern, it is highly preferred that filling is presented a contrast with Lycoperdon polymorphum Vitt
Pigment, for example, fill Chinese white, thus allowing pattern to become apparent from.
Example IV
The present embodiment mainly illustrates to manufacture the glass coating structure manufacture method of above-described embodiment one, as figure 5 illustrates, this enforcement
The glass coating structure of example can be realized using ncvm (non-conducting vacuum plating) technique.
Specifically, vacuum space as shown in Figure 5 is set, and is passed through nitrogen between 0.4:1 to 0.6:1 for the ratio thereto
Gas and oxygen (preferably, the ratio of nitrogen and oxygen is 0.5:1), are then alternately performed titanium-nitrogen-oxygen compound film plating layer generation process
With silicon nitrogen oxides film plating layer generation process, thus the lower surface in glass substrate is formed down alternately laminated silicon nitrogen oxides
Film plating layer and titanium-nitrogen-oxygen compound film plating layer.
Wherein, titanium-nitrogen-oxygen compound film plating layer generation process is arranged on described confined space particularly as follows: exciting by electron gun
In titanium material, make the evaporation of described titanium material, with described confined space in nitrogen and after oxygen reacts, in glass substrate
Lower surface be formed down titanium-nitrogen-oxygen compound film plating layer.
Silicon nitrogen oxides film plating layer generation process includes: excites the silicon being arranged in described confined space former by electron gun
Material, makes the evaporation of described silicon raw material, with described confined space in nitrogen and after oxygen reacts, in the lower surface of glass substrate
It is formed down silicon nitrogen oxides film plating layer.
It is alternately performed titanium-nitrogen-oxygen compound film plating layer generation process and the number of times of silicon nitrogen oxides film plating layer generation process depends on
In the number of plies that will finally obtain, and every layer of thickness passes through to control each titanium-nitrogen-oxygen compound film plating layer generation process and silicon nitrogen oxidation
Thing film plating layer generation process is realizing.
In above-mentioned technique, by controlling the ratio of the nitrogen being passed through and oxygen, to realize in the compound to film plating layer
The control of the ratio of nitrogen-atoms and oxygen atom, thus reaching the adjustment of the reflectance to titanium-nitrogen-oxygen compound and silicon nitrogen oxides, from
And control the refractive index of titanium-nitrogen-oxygen compound 2.08 about, the refractive index of silicon nitrogen oxides is controlled 1.39 about, simultaneously
In conjunction with the control of the number of plies and thickness, it is achieved that the minute surface of the more beautiful tarnish of effect is imitated in the case that integral thickness is relatively thin
Really.The present embodiment adopts technique, due to only used two kinds of common metals and semi-conducting material, therefore, in the realization of its technique
Relatively simple, it is convenient for Mass production.
Additionally, more preferably, in coating process, carry out titanium-nitrogen-oxygen compound film plating layer generation process first so that titanium
Nitrogen oxides film plating layer is located at ground floor, and because the luminance factor of titanium-nitrogen-oxygen compound is higher, therefore, being located at ground floor can
Whole membrane system is made to present more gorgeous color.
Additionally, in the present embodiment, film plating layer sum can control at 4 layers, and coating gross thickness can control in 100nm extremely
Between 150nm, in addition, in embodiment of the present utility model, the thickness of glass substrate can in the range of 170-180um,
It is preferably 175um.
Embodiment five
The present embodiment is related to manufacture the manufacture method of the coating structure of above-described embodiment two, comprising: be alternately performed titanium-nitrogen-oxygen
Compound film plating layer generation process and silicon nitrogen oxides film plating layer generation process (can be alternately performed four times to can achieve), make described
Film plating layer sum is 4 layers, and the gross thickness of film plating layer of described titanium-nitrogen-oxygen compound and the film plating layer of described silicon nitrogen oxides
The ratio of gross thickness is between 0.4 to 0.5.
Specifically, by being alternately performed titanium-nitrogen-oxygen compound film plating layer generation process and silicon nitrogen oxides film plating layer operation, raw
Become the coating structure of following thickness:
Described ground floor film plating layer is titanium-nitrogen-oxygen compound coating, and thickness range is 5-10nm；
Described second layer film plating layer is silicon nitrogen oxides coating, and thickness range is 50-85nm；
Described third layer film plating layer is titanium-nitrogen-oxygen compound coating, and thickness range is 25-40nm；
Described 4th layer of film plating layer is silicon nitrogen oxides coating, and thickness range is 15-25nm.
Wherein, every layer of thickness can be by controlling the plated film time to realize, and the example of every layer of concrete thickness is being implemented
It is stated that here is not repeating in example two.
Embodiment six
The present embodiment mainly illustrates to make the structure that above-described embodiment three is related to.Set by ink printing in the present embodiment
Standby, after being alternately performed titanium-nitrogen-oxygen compound film plating layer generation process and silicon nitrogen oxides film plating layer generation process, under coating
Side prints one layer of black ink layer such that it is able to preferably carry out shading, prevents the interference of veiling glare.
Further, may include that printing has fingerprint graph hollow out figure in coating one layer of black ink layer printed below
The black ink layer of case, is partially filled with, have a hollow out, the pigment being different from Lycoperdon polymorphum Vitt；Can also only printing pierced pattern and not
Filler pigment.Wherein, filling the pigment preferably presenting a contrast with black, for example, filling Chinese white, thus making pattern brighter
Aobvious.
Embodiment seven
The present embodiment is related to a kind of finger print detection device, comprising: capacitive fingerprint sensing device, this capacitive fingerprint sensing device
Can be the arbitrary a capacitive fingerprint sensing device adopting in prior art, can be active capacitive fingerprint sensing device
(fingerprint sensor that for example fpc company produces) or passive type capacitive fingerprint sensing device.In above-mentioned capacitance type fingerprint
The top of sensor is pasted with the glass coating structure of the various embodiments described above, using as sealing coat or protective layer, the one of plated film
Facing to the capacitor plate array of capacitive fingerprint sensing device, for contacting fingerprint skin above glass externally.
Embodiment eight
The present embodiment is related to a kind of mobile terminal of the finger print detection device comprising embodiment 11, such as mobile phone, flat board
Computer etc., covers the opening offering for carrying out fingerprint detection after mobile terminal, and described finger print detection device is located at institute
State lower opening portion, expose from described opening above the glass coating structure of described finger print detection device.In said structure, will refer to
The region of stricture of vagina identification has been arranged on after mobile terminal, by after cover and open up opening, allow the tarnish with mirror effect
Glass expose, as the region of fingerprint recognition.Glass coating due to this utility model embodiment can assume beautiful Qiang
Color mirror effect, therefore, it is possible to make the fingerprint recognition region of mobile terminal abnormal substantially and attractive in appearance, can deduct a percentage mobile whole
The overall appearance effect at end.
Last it is noted that various embodiments above is only in order to illustrating the technical solution of the utility model, rather than it is limited
System；Although being described in detail to this utility model with reference to foregoing embodiments, those of ordinary skill in the art should
Understand: it still can be modified to the technical scheme described in foregoing embodiments, or to wherein some or all of
Technical characteristic carries out equivalent；And these modifications or replacement, do not make the essence of appropriate technical solution depart from this practicality new
The scope of type each embodiment technical scheme.
Claims (23)
1. a kind of mobile terminal, including shell it is characterised in that described shell is provided with opening, is provided with finger at described opening
Stricture of vagina detection means, described finger print detection device includes glass coating structure, and described glass coating structure includes glass substrate and plating
Film layer, described film plating layer is arranged on the side of described glass substrate.
2. mobile terminal according to claim 1 is it is characterised in that described finger print detection device also includes fingerprint sensing
Device, described glass coating structure is attached to described fingerprint sensor side.
3. mobile terminal according to claim 2 is it is characterised in that described film plating layer is located at described fingerprint sensor and institute
State between glass substrate.
4. mobile terminal according to claim 1 is it is characterised in that described film plating layer is alternately laminated film plating layer.
5. mobile terminal according to claim 4 is it is characterised in that described alternately laminated film plating layer is by least two nitrogen
The alternately laminated composition of film plating layer of oxide.
6. mobile terminal according to claim 5 is it is characterised in that the film plating layer of described at least two oxynitride is
Titanium-nitrogen-oxygen compound film plating layer and silicon nitrogen oxides film plating layer.
7. mobile terminal according to claim 6 it is characterised in that described titanium-nitrogen-oxygen compound film plating layer be located at ground floor,
Described silicon nitrogen oxides film plating layer is located at the second layer.
8. the mobile terminal according to claim 6 or 7 is 4 layers it is characterised in that described film plating layer is total, described titanium nitrogen
The ratio of the gross thickness of the gross thickness of oxide coating layer and described silicon nitrogen oxides film plating layer is between 0.4 to 0.5.
9. mobile terminal according to claim 8 it is characterised in that
Described ground floor film plating layer is titanium-nitrogen-oxygen compound film plating layer, and thickness range is 5-10nm；
Described second layer film plating layer is silicon nitrogen oxides film plating layer, and thickness range is 50-85nm；
Described third layer film plating layer is titanium-nitrogen-oxygen compound film plating layer, and thickness range is 25-40nm；
Described 4th layer of film plating layer is silicon nitrogen oxides film plating layer, and thickness range is 15-25nm.
10. the mobile terminal according to any one of claim 1-7 is it is characterised in that arrange in the side of described film plating layer
There is ink layer.
11. mobile terminals according to claim 10 are it is characterised in that described ink layer is gray oil layer of ink.
12. mobile terminals according to claim 11 are it is characterised in that in described gray oil layer of ink, have hollow out figure
Case or have filling pattern, described filling pattern is filled with the pigment being different from Lycoperdon polymorphum Vitt.
A kind of 13. glass coating structures, including glass substrate it is characterised in that described glass coating structure also includes film plating layer,
Described film plating layer is arranged on the side of described glass substrate.
14. glass coating structures according to claim 13 are it is characterised in that described film plating layer is alternately laminated plated film
Layer.
15. glass coating structures according to claim 14 are it is characterised in that described alternately laminated film plating layer is by least
The alternately laminated composition of film plating layer of two kinds of oxynitride.
16. glass coating structures according to claim 15 are it is characterised in that the plating of described at least two oxynitride
Film layer is titanium-nitrogen-oxygen compound film plating layer and silicon nitrogen oxides film plating layer.
17. glass coating structures according to claim 16 are it is characterised in that described titanium-nitrogen-oxygen compound film plating layer is located at the
One layer, described silicon nitrogen oxides film plating layer is located at the second layer.
The 18. glass coating structures according to claim 16 or 17 are 4 layers it is characterised in that described film plating layer is total, institute
The ratio stating the gross thickness of titanium-nitrogen-oxygen compound film plating layer and the gross thickness of described silicon nitrogen oxides film plating layer is between 0.4 to 0.5.
19. glass coating structures according to claim 18 it is characterised in that
Described ground floor film plating layer is titanium-nitrogen-oxygen compound film plating layer, and thickness range is 5-10nm；
Described second layer film plating layer is silicon nitrogen oxides film plating layer, and thickness range is 50-85nm；
Described third layer film plating layer is titanium-nitrogen-oxygen compound film plating layer, and thickness range is 25-40nm；
Described 4th layer of film plating layer is silicon nitrogen oxides film plating layer, and thickness range is 15-25nm.
20. glass coating structures according to any one of claim 13-17 it is characterised in that in described film plating layer one
Side is provided with ink layer.
21. glass coating structures according to claim 20 are it is characterised in that described ink layer is gray oil layer of ink.
22. glass coating structures according to claim 21 are it is characterised in that in described gray oil layer of ink, having and engrave
Null pattern or have filling pattern, described filling pattern is filled with the pigment being different from Lycoperdon polymorphum Vitt.
A kind of 23. finger print detection devices are it is characterised in that include: fingerprint sensor, attach on the top of described fingerprint sensor
There is the glass coating structure described in any one of the claims 13 to 22.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201520816062 | 2015-10-20 | ||
| CN201520816062X | 2015-10-20 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN205917178U true CN205917178U (en) | 2017-02-01 |
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ID=57876075
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201521128990.3U Expired - Fee Related CN205917178U (en) | 2015-10-20 | 2015-12-30 | Glass plating layer structure , fingerprint detection device and mobile terminal |
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| CN (1) | CN205917178U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105884208A (en) * | 2015-10-20 | 2016-08-24 | 乐视移动智能信息技术（北京）有限公司 | Glass coating structure, fingerprint detection device and mobile terminal |
| CN108924302A (en) * | 2018-07-12 | 2018-11-30 | 广州视源电子科技股份有限公司 | L OGO-replaceable intelligent mirror and processing technology thereof and electronic product |
-
2015
- 2015-12-30 CN CN201521128990.3U patent/CN205917178U/en not_active Expired - Fee Related
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105884208A (en) * | 2015-10-20 | 2016-08-24 | 乐视移动智能信息技术（北京）有限公司 | Glass coating structure, fingerprint detection device and mobile terminal |
| CN108924302A (en) * | 2018-07-12 | 2018-11-30 | 广州视源电子科技股份有限公司 | L OGO-replaceable intelligent mirror and processing technology thereof and electronic product |
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