WO2017038762A1 - 被覆工具 - Google Patents
被覆工具 Download PDFInfo
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- WO2017038762A1 WO2017038762A1 PCT/JP2016/075187 JP2016075187W WO2017038762A1 WO 2017038762 A1 WO2017038762 A1 WO 2017038762A1 JP 2016075187 W JP2016075187 W JP 2016075187W WO 2017038762 A1 WO2017038762 A1 WO 2017038762A1
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/36—Carbonitrides
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23B—TURNING; BORING
- B23B27/00—Tools for turning or boring machines; Tools of a similar kind in general; Accessories therefor
- B23B27/14—Cutting tools of which the bits or tips or cutting inserts are of special material
- B23B27/148—Composition of the cutting inserts
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/02—Pretreatment of the material to be coated
- C23C16/0272—Deposition of sub-layers, e.g. to promote the adhesion of the main coating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/34—Nitrides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/403—Oxides of aluminium, magnesium or beryllium
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
- C23C28/042—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material including a refractory ceramic layer, e.g. refractory metal oxides, ZrO2, rare earth oxides
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
- C23C28/044—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material coatings specially adapted for cutting tools or wear applications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23B—TURNING; BORING
- B23B2224/00—Materials of tools or workpieces composed of a compound including a metal
- B23B2224/04—Aluminium oxide
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23B—TURNING; BORING
- B23B2224/00—Materials of tools or workpieces composed of a compound including a metal
- B23B2224/32—Titanium carbide nitride (TiCN)
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23B—TURNING; BORING
- B23B2228/00—Properties of materials of tools or workpieces, materials of tools or workpieces applied in a specific manner
- B23B2228/10—Coatings
- B23B2228/105—Coatings with specified thickness
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23C—MILLING
- B23C2228/00—Properties of materials of tools or workpieces, materials of tools or workpieces applied in a specific manner
- B23C2228/10—Coating
Definitions
- This aspect relates to a coated tool having a coating layer on the surface of a substrate.
- coated tools it is required to improve wear resistance and fracture resistance.
- Patent Document 1 discloses a cutting tool in which a titanium nitride layer is physically vapor-deposited as a coating layer on the surface of a substrate. Further, it is disclosed that the crystal orientation of the titanium nitride crystal grains on the surface of the coating layer obtained by measurement with a backscattered electron diffraction (EBSD) apparatus is within a predetermined range.
- EBSD backscattered electron diffraction
- the cutting tool includes a substrate made of a cemented carbide and a coating layer positioned on the surface of the substrate.
- the coating layer is in contact with the substrate and Ti (C x N 1-x ) ( Backscattered electron diffraction (EBSD) by a scanning electron microscope with a backscattered electron diffraction imaging system of WC particles in a region having a depth of 5 ⁇ m from the surface of the substrate, the first layer containing 0 ⁇ x ⁇ 1) )
- EBSD Backscattered electron diffraction
- the KAM average value measured by the method is 1 ° or less.
- FIG. 1 It is a schematic perspective view of the cutting tool of one Embodiment. It is a schematic sectional drawing of the cutting tool shown in FIG.
- Coated tools are required to be able to be used under stricter processing conditions in order to increase processing efficiency, and improve adhesion between the substrate made of cemented carbide and the coating layer to suppress chipping and peeling of the coating layer. It is demanded.
- a cutting tool hereinafter simply referred to as a tool 1 is shown.
- the tool 1 includes a first surface 2 (upper surface in FIG. 1) and a second surface 3 (side surface in FIG. 1).
- the tool 1 includes a base body 4 and a coating layer 5 positioned on the base body 4.
- At least a part of the first surface 2 functions as a rake surface, and at least a part of the second surface 3 functions as a flank surface. Further, at least a part of the ridge line where the first surface 2 and the second surface 3 intersect forms the cutting edge 6.
- the substrate 4 is made of cemented carbide.
- cemented carbide examples include WC—Co, WC—TiC—Co, and WC—TiC—TaC—Co.
- WC tungsten carbide
- TiC titanium carbide
- TaC tantalum carbide
- Co cobalt
- composition is an example, As a structure of the base
- the covering layer 5 has a first layer 7 in contact with the substrate 4.
- the first layer 7 contains Ti (C x N 1-x ) (0 ⁇ x ⁇ 1).
- the KAM average value measured by an EBSD method using a scanning electron microscope with a backscattered electron diffraction image system of WC particles in a region 5 ⁇ m deep from the surface of the substrate 4 is 1 ° or less.
- the KAM average value is the above value, the deformation amount of the WC particles existing on the surface of the substrate 4 is reduced, and the residual stress between the substrate 4 and the first layer 7 is reduced.
- the adhesion between the substrate 4 and the coating layer 5 is enhanced and the peeling resistance of the coating layer 5 is improved, so that chipping of the coating layer 5 is suppressed.
- the KAM average value is 0.8 ° or less, the adhesion between the substrate 4 and the coating layer 5 can be further enhanced.
- KAM Kernel Average Misorientation
- KAM represents a local orientation difference which is a difference in crystal orientation between adjacent measurement points measured by the EBSD method
- the KAM value is a value having a correlation with the magnitude of plastic strain or the like. Further, since KAM reflects local deformation and transition density at the microscopic level, local plastic deformation at the microscopic level can be confirmed by measuring the KAM value.
- the KAM average value is obtained by measuring KAM values at each position in the observation region and averaging them.
- distortion may occur between the substrate made of cemented carbide and the coating layer in contact therewith. This is considered to be because carbon is reduced in a region near the surface of the substrate as compared with the inside of the substrate, and the surface of the substrate is altered in the step of forming the coating layer. As the surface of the substrate changes, minute plastic strain tends to remain in a part of the WC particles existing on the surface of the substrate, so that the coating layer is easily peeled off from the substrate when an impact is applied to the coated tool. There is a case.
- the strain between the base 4 and the coating layer 5 is reduced by suppressing the amount of carbon decrease in the region near the surface of the base 4 relative to the inside of the base 4.
- the KAM average value is 1 ° or less by suppressing the amount of decrease in carbon.
- the substrate 4 in this embodiment has a configuration in which the ratio of the carbon content in the region having a depth of 5 ⁇ m from the surface to the carbon content in the region having a depth of 200 ⁇ m or more from the surface is 0.95 to 1. It may be.
- the substrate 4 has a carbon content reduction amount of 5 mass at a depth of 5 ⁇ m from the surface located immediately below the coating layer 5 with respect to a carbon content in a region having a depth of 200 ⁇ m or more from the surface. % Or less.
- the adhesion between the substrate 4 and the coating layer 5 is further improved.
- the thickness of the first layer 7 is not particularly limited, but can be set to 6 to 15 ⁇ m, for example.
- the thickness of the 1st layer 7 is 6 micrometers or more, especially 10 micrometers or more, abrasion resistance is improved. Further, when the thickness of the first layer 7 is 15 ⁇ m or less, particularly 13 ⁇ m or less, the fracture resistance is improved.
- the first layer 7 containing Ti (C x N 1-x ) (0 ⁇ x ⁇ 1) may be composed of one layer, but in this embodiment, two regions are stacked. It has a configuration. Specifically, the first layer 7 has a first region 8 in contact with the base 4 and a second region 9 located on the first region 8.
- the carbon contained in the first region 8 may be less than the carbon contained in the second region 9.
- the first region 8 is mainly composed of titanium nitride (TiN)
- the second region 9 is composed mainly of titanium carbonitride (Ti (C x N 1-x ) (0 ⁇ x ⁇ 1 )).
- TiN titanium nitride
- Ti (C x N 1-x ) 0. ⁇ x ⁇ 1 )
- the adhesion between the substrate 4 and the first layer 7 is further enhanced.
- the first region 8 in the first layer 7 is made of TiN, the diffusion of the cemented carbide component from the base 4 to the coating layer 5 is suppressed, so that the surface of the base 4 is not altered. Can be suppressed.
- the first region 8 in the present embodiment is composed of titanium nitride particles having an average particle diameter of 0.05 to 0.5 ⁇ m, and the titanium nitride particles include columnar crystals extending in a direction perpendicular to the surface of the substrate 4. It has become.
- the present embodiment there are locations where epitaxial growth occurs between the WC particles located on the surface of the substrate 4 and the titanium nitride particles located on the substrate 4 side in the first region 8.
- Co is diffused at a ratio of 0.2 to 3 mass%.
- the adhesion between the substrate 4 and the coating layer 5 can be further enhanced.
- the second region 9 in the present embodiment has a so-called MT (Moderate Temperature) —a layer 9a mainly composed of titanium carbonitride and an HT (High Temperature) —titanium carbonitride mainly disposed on the layer 9a. And a layer 9b as a component.
- MT Mode Temperature
- HT High Temperature
- the layer 9a is made of columnar crystals containing acetonitrile (CH 3 CN) gas as a raw material and formed at a relatively low temperature of 780 to 900 ° C. At this time, the width of the columnar crystal in the direction parallel to the surface of the substrate 4 is 0.4 ⁇ m or less. When the columnar crystal has the above-described configuration, the adhesion between the base 4 and the first region 8 is further improved.
- the layer 9b is made of granular crystals formed at a relatively high temperature of 950 to 1100 ° C.
- triangular protrusions are formed on the surface of the layer 9b in a sectional view that tapers upward.
- the adhesion with the second layer 10 to be described later is increased, and peeling and chipping of the coating layer 5 can be suppressed.
- the thickness of the first region 8 is not particularly limited, but can be set to 0.5 to 3 ⁇ m, for example.
- the thickness of the second region 9 is not particularly limited, but can be set to 5.5 to 14.5 ⁇ m, for example.
- the thickness of the first region 8 is 0.5 to 3 ⁇ m, particularly 0.5 to 2.0 ⁇ m, and the thickness of the second region 9 is 5.5 to 14.5 ⁇ m, particularly 8.0 to 12.5 ⁇ m.
- the adhesion of the coating layer 5 to the substrate 4 can be further enhanced, and the wear resistance can be enhanced.
- the coating layer 5 in this embodiment further includes a second layer 10 and a third layer 11 in addition to the first layer 7.
- the second layer 10 is located on the first layer 7, and the third layer 11 is located on the second layer 10.
- the second layer 10 is located on the layer 9b.
- the second layer 10 contains titanium and oxygen, and is made of, for example, TiCO, TiNO, TiCNO, TiAlCO, TiAlCNO, or the like. Specifically, the second layer 10 in this embodiment contains Ti (C x N 1-xy O y ) (0 ⁇ x ⁇ 1, 0 ⁇ y ⁇ 1).
- the third layer 11 contains aluminum oxide.
- the wear resistance of the coating layer 6 can be further improved. Further, when the second layer 10 is located between the first layer 7 and the third layer 11, the adhesion between the first layer 7 and the third layer 11 can be enhanced.
- the aluminum oxide particles constituting the third layer 11 have an ⁇ -type crystal structure.
- the third layer 11 made of aluminum oxide having an ⁇ -type crystal structure has high hardness. Therefore, the wear resistance of the coating layer 6 can be increased.
- the second layer 10 contains Ti (C x N 1-xy O y )
- x + y 1, Ti (C x N 1-xy O y in the second layer 10).
- y becomes needle-like and has a crystal structure extending at a height of 0.05 to 0.5 ⁇ m in a direction perpendicular to the surface of the substrate 4. With this structure, the adhesion between the second region 9 and the third layer 11 can be enhanced.
- the third layer 11 is made of aluminum oxide having an ⁇ -type crystal structure
- the hardness of the third layer 11 can be increased and the wear resistance of the tool 1 can be improved.
- the coating layer 5 tends to be suppressed.
- each layer and the properties of the crystals constituting each layer are measured by observing an electron micrograph (scanning electron microscope (SEM) photograph or transmission electron microscope (TEM) photograph) in the cross section of the tool 1. It is possible.
- the form of the crystals constituting each layer of the coating layer 5 is columnar, which means that the ratio of the average crystal width to the length in the thickness direction of each coating layer 5 is 0.3 on average. Indicates the following state.
- the crystal form is defined as granular.
- the covering layer 5 in the present embodiment further includes a fourth layer 12 in addition to the first layer 7, the second layer 10, and the third layer 11.
- the fourth layer 12 is located on the third layer 11, and the fourth layer 12 is Ti (C x N 1-xy O y ) (0 ⁇ x ⁇ 1, 0 ⁇ y ⁇ 1). Contains.
- the fourth layer 12 may be made of other materials such as chromium nitride.
- the fourth layer 12 in this embodiment is provided with a thickness of 0.1 to 3 ⁇ m.
- the coating layer 6 of the present embodiment includes a first region 8 made of titanium nitride, a second region 9 made of a titanium carbonitride layer, a second layer 10, a third layer 11, and a fourth layer 12 in order from the base 4 side. Are made of laminated layers.
- the tool 1 cuts by applying the cutting edge 6 formed on at least a part of the ridgeline where the rake face and the flank face to the workpiece, and can exhibit the above-described excellent effects.
- the tool 1 of this embodiment is applicable to various uses, such as an excavation tool and a cutter, besides a cutting tool, and also has excellent mechanical reliability in this case.
- metal powder, carbon powder, etc. are appropriately added and mixed with inorganic powder such as metal carbide, nitride, carbonitride, oxide, etc. that can form the hard alloy to be the base 4 by firing.
- this mixed powder is molded into a predetermined tool shape by a known molding method such as press molding, casting molding, extrusion molding, cold isostatic pressing.
- substrate 4 which consists of a hard alloy mentioned above is produced by baking in a vacuum or non-oxidizing atmosphere. Then, the surface of the substrate 4 is subjected to polishing or honing of the cutting edge as desired.
- CVD chemical vapor deposition
- a mixed gas consisting of 1 to 5% by volume of carbon monoxide (CO) gas and the remainder of hydrogen (H 2 ) gas is prepared and introduced into the chamber with respect to the substrate 4 made of cemented carbide.
- Pretreatment is performed at a film temperature of 700 to 800 ° C. and 5 to 50 kPa. By this pretreatment, the carbon content ratio on the surface of the substrate 4 is improved.
- the carbon component is prevented from diffusing and moving to the first layer 7 side on the surface of the base 4, and the WC particles on the surface of the base 4 are large. Generation of distortion can be suppressed.
- a mixed gas composed of 0.5 to 10% by volume of titanium tetrachloride (TiCl 4 ) gas, 10 to 60% by volume of nitrogen (N 2 ) gas, and the balance of hydrogen (H 2 ) gas as a reaction gas composition.
- the first region 8 containing titanium nitride (TiN) as a main component is formed at a film forming temperature of 800 to 940 ° C. and 8 to 50 kPa.
- the film formation start temperature is 10 to 50 ° C. lower than the film formation temperature at the end of film formation, and the temperature is increased during film formation to suppress the diffusion of W and Co elements on the surface of the substrate. And it can suppress that a big distortion arises in the WC particle in the surface of substrate 4.
- the reaction gas composition is 0.5 to 10% by volume of titanium tetrachloride (TiCl 4 ) gas, 5 to 60% by volume of nitrogen (N 2 ) gas, and 0.1% of acetonitrile (CH 3 CN) gas in volume%.
- TiCl 4 titanium tetrachloride
- N 2 nitrogen
- CH 3 CN acetonitrile
- a mixed gas composed of 1 to 3.0% by volume and the remainder consisting of hydrogen (H 2 ) gas was prepared and introduced into the chamber, the film formation temperature was 780 to 880 ° C., 5 to 25 kPa, and MT-titanium carbonitride was added.
- a layer 9a as a main component is formed.
- the average crystal width of the columnar crystals of titanium carbonitride constituting the layer 9a is larger than the surface of the substrate 4 side.
- the side can be configured larger.
- a layer 9b mainly composed of HT-titanium carbonitride is formed in the second region 9.
- the specific film forming conditions of the HT-titanium carbonitride layer are as follows: titanium tetrachloride (TiCl 4 ) gas is 1 to 4% by volume, nitrogen (N 2 ) gas is 5 to 20% by volume, A mixed gas composed of 0.1 to 10% by volume of methane (CH 4 ) gas and the remaining hydrogen (H 2 ) gas is prepared and introduced into the chamber, and the film forming temperature is set to 900 to 1050 ° C. and 5 to 40 kPa. Form a film.
- the second layer 10 is produced.
- the specific film formation conditions for this embodiment are 3 to 15% by volume of titanium tetrachloride (TiCl 4 ) gas, 3 to 10% by volume of methane (CH 4 ) gas, and 10 to 10% of nitrogen (N 2 ) gas.
- a mixed gas consisting of 25% by volume, 0.5% to 2.0% by volume of carbon monoxide (CO) gas, and the balance of hydrogen (H 2 ) gas is prepared.
- These mixed gases are adjusted and introduced into the chamber to form a film at a film forming temperature of 900 to 1050 ° C. and 5 to 40 kPa.
- the nitrogen (N 2 ) gas may be changed to argon (Ar) gas.
- acicular crystals extending in a direction perpendicular to the surface of the substrate 4 are generated in the second layer 10, and the adhesion with the third layer 11 to be formed next can be improved.
- the third layer 11 is formed.
- nuclei of aluminum oxide crystals are formed. 5 to 10% by volume of aluminum trichloride (AlCl 3 ) gas, 0.1 to 1.0% by volume of hydrogen chloride (HCl) gas, 0.1 to 5.0% by volume of carbon dioxide (CO 2 ) gas, A mixed gas consisting of hydrogen (H 2 ) gas is used, and the temperature is set to 950 to 1100 ° C. and 5 to 10 kPa.
- AlCl 3 aluminum trichloride
- HCl hydrogen chloride
- CO 2 carbon dioxide
- the fourth layer 12 is formed as desired.
- the film forming conditions include titanium tetrachloride (TiCl 4 ) gas of 0.1 to 10% by volume and nitrogen (N 2 ) gas of 10 to 60 volume as the reaction gas composition. %, And the remaining mixed gas consisting of hydrogen (H 2 ) gas is adjusted and introduced into the chamber to form a film at a film forming temperature of 960 to 1100 ° C. and 10 to 85 kPa.
- the cutting edge 6 is processed smoothly, the welding of the work material is suppressed, and the tool is further excellent in fracture resistance.
- a coating layer was formed on the cemented carbide substrate by the chemical vapor deposition (CVD) method under the film formation conditions shown in Table 1 to produce a cutting tool.
- CVD chemical vapor deposition
- the fracture surface of the tool was observed with a scanning electron microscope (SEM), and the thickness of each layer was measured. Moreover, the measurement of KAM by the EBSD method was implemented as follows.
- the measurement area is divided into square areas (pixels) using EBSD (model number JSM7000F) manufactured by Oxford, and each divided area is incident on the sample surface.
- EBSD model number JSM7000F
- the Kikuchi pattern was obtained from the reflected electrons of the electron beam, and the orientation of the pixel was measured.
- the measured orientation data was analyzed using the analysis software of the system, and various parameters were calculated.
- the observation conditions were an acceleration voltage of 15 kV, a measurement area of 60 ⁇ m wide ⁇ 5 ⁇ m deep on the surface of the cemented carbide substrate, and a distance (step size) between adjacent pixels of 0.1 ⁇ m.
- An orientation difference between adjacent pixels of 5 ° or more was regarded as a crystal grain boundary.
- KAM calculates the average value of misorientation between a certain pixel in a crystal grain and an adjacent pixel existing in a range not exceeding the crystal grain boundary, and measures the KAM average value as an average value in all the pixels constituting the entire measurement area. did.
- the measurement of the said KAM average value measured about arbitrary 3 visual fields, and evaluated it with the average value. The results are shown in Tables 2 and 3.
- the thickness of the first region is 0.5 to 3 ⁇ m and the thickness of the second region is 5.5 to 14.5 ⁇ m.
- the flank wear width was small and the number of impacts was large.
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- Organic Chemistry (AREA)
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- General Chemical & Material Sciences (AREA)
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- Cutting Tools, Boring Holders, And Turrets (AREA)
Abstract
Description
(連続切削条件)
被削材 :クロムモリブデン鋼材(SCM435)
工具形状:CNMG120408
切削速度:300m/分
送り速度:0.30mm/rev
切り込み:1.5mm
切削時間:25分
その他 :水溶性切削液使用
評価項目:走査型電子顕微鏡にて刃先ホーニング部分を観察し、実際に摩耗している部分において、逃げ面におけるフランク摩耗幅を測定。
(断続切削条件)
被削材 :クロムモリブデン鋼 4本溝入り鋼材(SCM440)
工具形状:CNMG120408
切削速度:300m/分
送り速度:0.30mm/rev
切り込み:1.5mm
その他 :水溶性切削液使用
評価項目:欠損に至る衝撃回数を測定。
2・・・第1面
3・・・第2面
4・・・基体
5・・・被覆層
6・・・切刃
7・・・第1層
8・・・第1領域
9・・・第2領域
10・・第2層
11・・第3層
12・・第4層
Claims (7)
- 超硬合金からなる基体と、該基体の表面に位置する被覆層とを有し、
該被覆層は、前記基体に接するとともに、Ti(CxN1-x)(0≦x≦1)を含有する第1層を有し、
前記基体の表面から5μmまでの深さの領域におけるWC粒子の後方散乱電子回折像システム付きの走査電子顕微鏡による後方散乱電子回折(EBSD)法にて測定されたKAM平均値が1°以下である、被覆工具。 - 前記第1層の厚みが6~15μmである、請求項1に記載の被覆工具。
- 前記第1層は、前記基体に接する第1領域と、該第1領域の上に位置する第2領域とを有し、
前記第1領域に含まれる炭素が、前記第2領域に含まれる炭素よりも少ない、請求項1または2に記載の切削工具。 - 前記第1領域の厚みが0.5~3μmであり、前記第2領域の厚みが5.5~14.5μmである、請求項3に記載の被覆工具。
- 前記被覆層は、
前記第1層の上に位置するとともに、Ti(CxN1-x-yOy)(0<x<1、0<y<1)を含有する第2層と、
該第2層の上に位置するとともに、酸化アルミニウムを含有する第3層とをさらに有する、請求項1~4のいずれか1つに記載の被覆工具。 - 前記第1層は、前記基体の表面に対して垂直な方向に伸びた炭窒化チタンの柱状結晶を有し、
該柱状結晶における前記基体の表面に平行な方向の幅が0.4μm以下である、請求項1~5のいずれか1つに記載の被覆工具。 - 前記基体は、表面から200μm以上の深さの領域における炭素含有量に対し、表面から5μmまでの深さの領域における炭素含有量の比が、0.95~1である、請求項1~6のいずれか1つに記載の被覆工具。
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KR1020187005544A KR102141354B1 (ko) | 2015-08-29 | 2016-08-29 | 피복 공구 |
US15/755,589 US10837104B2 (en) | 2015-08-29 | 2016-08-29 | Coated tool |
DE112016003954.9T DE112016003954B4 (de) | 2015-08-29 | 2016-08-29 | Beschichtetes Werkzeug |
JP2017538017A JP6608937B2 (ja) | 2015-08-29 | 2016-08-29 | 被覆工具 |
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JP (1) | JP6608937B2 (ja) |
KR (1) | KR102141354B1 (ja) |
CN (1) | CN107921551B (ja) |
DE (1) | DE112016003954B4 (ja) |
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Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2019010707A (ja) * | 2017-06-30 | 2019-01-24 | 三菱マテリアル株式会社 | 硬質被覆層が優れた耐摩耗性・耐チッピング性を発揮する表面被覆切削工具 |
JP2019107720A (ja) * | 2017-12-18 | 2019-07-04 | 株式会社タンガロイ | 被覆切削工具 |
EP3567133A1 (en) | 2018-05-09 | 2019-11-13 | Tungaloy Corporation | Coated cutting tool |
LU100871B1 (en) * | 2018-07-11 | 2020-01-13 | Tungaloy Corp | Coated cutting tool |
US10766076B2 (en) | 2018-05-09 | 2020-09-08 | Tungaloy Corporation | Coated cutting tool |
JP2020151805A (ja) * | 2019-03-20 | 2020-09-24 | 三菱マテリアル株式会社 | 硬質被覆層が優れた耐摩耗性を発揮する表面被覆切削工具 |
JP2021160017A (ja) * | 2020-03-31 | 2021-10-11 | 株式会社タンガロイ | 被覆切削工具 |
WO2023276209A1 (ja) * | 2021-07-02 | 2023-01-05 | 京セラ株式会社 | 被覆工具 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2014223722A (ja) * | 2013-02-27 | 2014-12-04 | 京セラ株式会社 | 切削工具 |
JP2015101747A (ja) * | 2013-11-22 | 2015-06-04 | 住友電気工業株式会社 | 超硬合金およびこれを用いた表面被覆切削工具 |
Family Cites Families (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6200671B1 (en) * | 1995-11-30 | 2001-03-13 | Sandvik Ab | Coated turning insert and method of making it |
SE9504304D0 (sv) * | 1995-11-30 | 1995-11-30 | Sandvik Ab | Coated milling insert |
DE102004063816B3 (de) * | 2004-12-30 | 2006-05-18 | Walter Ag | Al2O3-Multilagenplatte |
SE529856C2 (sv) * | 2005-12-16 | 2007-12-11 | Sandvik Intellectual Property | Belagt hårdmetallskär, sätt att tillverka detta samt dess användning för fräsning |
JP4854359B2 (ja) * | 2006-03-29 | 2012-01-18 | 京セラ株式会社 | 表面被覆切削工具 |
US8185726B2 (en) * | 2006-04-27 | 2012-05-22 | Qualcomm Incorporated | Sleep optimization based on system information block scheduling |
US7906230B2 (en) * | 2006-09-05 | 2011-03-15 | Tungaloy Corporation | Coated cutting tool and method for producing the same |
WO2008066887A2 (en) * | 2006-11-30 | 2008-06-05 | Albert Einstein College Of Medicine Of Yeshiva University | Small molecule inhibitors of bcl6 |
SE532048C2 (sv) * | 2008-03-07 | 2009-10-13 | Seco Tools Ab | Oxidbelagt skärverktygsskär för spånavskiljande bearbetning av stål |
CN101532970B (zh) * | 2008-03-11 | 2011-07-20 | 宝山钢铁股份有限公司 | 多晶体中各组成晶粒的晶体取向和微观力学性能测定方法 |
KR101104493B1 (ko) * | 2009-06-17 | 2012-01-12 | 한국야금 주식회사 | 절삭공구 또는 내마모성 공구용 표면 피복 박막 |
JP5462549B2 (ja) * | 2009-08-20 | 2014-04-02 | 住友電気工業株式会社 | 超硬合金 |
JP2011152602A (ja) | 2010-01-27 | 2011-08-11 | Mitsubishi Materials Corp | 硬質被覆層がすぐれた耐欠損性を発揮する表面被覆切削工具 |
WO2011105420A1 (ja) * | 2010-02-24 | 2011-09-01 | 京セラ株式会社 | 切削工具 |
JP5815709B2 (ja) * | 2011-06-27 | 2015-11-17 | 京セラ株式会社 | 硬質合金および切削工具 |
JP6052502B2 (ja) | 2013-03-25 | 2016-12-27 | 三菱マテリアル株式会社 | 表面被覆超硬合金製切削工具 |
JP5835308B2 (ja) * | 2013-11-22 | 2015-12-24 | 住友電気工業株式会社 | 超硬合金およびこれを用いた表面被覆切削工具 |
-
2016
- 2016-08-29 CN CN201680049741.6A patent/CN107921551B/zh active Active
- 2016-08-29 KR KR1020187005544A patent/KR102141354B1/ko active IP Right Grant
- 2016-08-29 US US15/755,589 patent/US10837104B2/en active Active
- 2016-08-29 DE DE112016003954.9T patent/DE112016003954B4/de active Active
- 2016-08-29 JP JP2017538017A patent/JP6608937B2/ja active Active
- 2016-08-29 WO PCT/JP2016/075187 patent/WO2017038762A1/ja active Application Filing
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2014223722A (ja) * | 2013-02-27 | 2014-12-04 | 京セラ株式会社 | 切削工具 |
JP2015101747A (ja) * | 2013-11-22 | 2015-06-04 | 住友電気工業株式会社 | 超硬合金およびこれを用いた表面被覆切削工具 |
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2019010707A (ja) * | 2017-06-30 | 2019-01-24 | 三菱マテリアル株式会社 | 硬質被覆層が優れた耐摩耗性・耐チッピング性を発揮する表面被覆切削工具 |
JP2019107720A (ja) * | 2017-12-18 | 2019-07-04 | 株式会社タンガロイ | 被覆切削工具 |
JP7029106B2 (ja) | 2017-12-18 | 2022-03-03 | 株式会社タンガロイ | 被覆切削工具 |
EP3567133A1 (en) | 2018-05-09 | 2019-11-13 | Tungaloy Corporation | Coated cutting tool |
US10766076B2 (en) | 2018-05-09 | 2020-09-08 | Tungaloy Corporation | Coated cutting tool |
LU100871B1 (en) * | 2018-07-11 | 2020-01-13 | Tungaloy Corp | Coated cutting tool |
JP2020151805A (ja) * | 2019-03-20 | 2020-09-24 | 三菱マテリアル株式会社 | 硬質被覆層が優れた耐摩耗性を発揮する表面被覆切削工具 |
JP7373110B2 (ja) | 2019-03-20 | 2023-11-02 | 三菱マテリアル株式会社 | 硬質被覆層が優れた耐摩耗性を発揮する表面被覆切削工具 |
JP2021160017A (ja) * | 2020-03-31 | 2021-10-11 | 株式会社タンガロイ | 被覆切削工具 |
JP7051052B2 (ja) | 2020-03-31 | 2022-04-11 | 株式会社タンガロイ | 被覆切削工具 |
WO2023276209A1 (ja) * | 2021-07-02 | 2023-01-05 | 京セラ株式会社 | 被覆工具 |
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JP6608937B2 (ja) | 2019-11-20 |
KR20180034564A (ko) | 2018-04-04 |
KR102141354B1 (ko) | 2020-08-05 |
JPWO2017038762A1 (ja) | 2018-06-07 |
US20190010606A1 (en) | 2019-01-10 |
DE112016003954T5 (de) | 2018-05-09 |
DE112016003954B4 (de) | 2023-11-16 |
CN107921551B (zh) | 2019-12-20 |
US10837104B2 (en) | 2020-11-17 |
CN107921551A (zh) | 2018-04-17 |
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