WO2017017911A1 - 電極の製造方法 - Google Patents
電極の製造方法 Download PDFInfo
- Publication number
- WO2017017911A1 WO2017017911A1 PCT/JP2016/003262 JP2016003262W WO2017017911A1 WO 2017017911 A1 WO2017017911 A1 WO 2017017911A1 JP 2016003262 W JP2016003262 W JP 2016003262W WO 2017017911 A1 WO2017017911 A1 WO 2017017911A1
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- WO
- WIPO (PCT)
- Prior art keywords
- silver fine
- producing
- electrode according
- fine particles
- electrode
- Prior art date
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- NLJMYIDDQXHKNR-UHFFFAOYSA-K sodium citrate Chemical compound O.O.[Na+].[Na+].[Na+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O NLJMYIDDQXHKNR-UHFFFAOYSA-K 0.000 description 1
- GGCZERPQGJTIQP-UHFFFAOYSA-N sodium;9,10-dioxoanthracene-2-sulfonic acid Chemical compound [Na+].C1=CC=C2C(=O)C3=CC(S(=O)(=O)O)=CC=C3C(=O)C2=C1 GGCZERPQGJTIQP-UHFFFAOYSA-N 0.000 description 1
- 239000004071 soot Substances 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 235000000346 sugar Nutrition 0.000 description 1
- 150000008163 sugars Chemical class 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 229920001864 tannin Polymers 0.000 description 1
- 235000018553 tannin Nutrition 0.000 description 1
- 239000001648 tannin Substances 0.000 description 1
- 150000003505 terpenes Chemical class 0.000 description 1
- 235000007586 terpenes Nutrition 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 238000002076 thermal analysis method Methods 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- HPGGPRDJHPYFRM-UHFFFAOYSA-J tin(iv) chloride Chemical compound Cl[Sn](Cl)(Cl)Cl HPGGPRDJHPYFRM-UHFFFAOYSA-J 0.000 description 1
- YJGJRYWNNHUESM-UHFFFAOYSA-J triacetyloxystannyl acetate Chemical compound [Sn+4].CC([O-])=O.CC([O-])=O.CC([O-])=O.CC([O-])=O YJGJRYWNNHUESM-UHFFFAOYSA-J 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 239000000230 xanthan gum Substances 0.000 description 1
- 229920001285 xanthan gum Polymers 0.000 description 1
- 235000010493 xanthan gum Nutrition 0.000 description 1
- 229940082509 xanthan gum Drugs 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/28—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
- H01L21/283—Deposition of conductive or insulating materials for electrodes conducting electric current
- H01L21/288—Deposition of conductive or insulating materials for electrodes conducting electric current from a liquid, e.g. electrolytic deposition
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
- C09D5/24—Electrically-conducting paints
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D11/00—Inks
- C09D11/52—Electrically conductive inks
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D201/00—Coating compositions based on unspecified macromolecular compounds
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02041—Cleaning
- H01L21/02043—Cleaning before device manufacture, i.e. Begin-Of-Line process
- H01L21/02052—Wet cleaning only
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
- H01L21/0226—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process
- H01L21/02282—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process liquid deposition, e.g. spin-coating, sol-gel techniques, spray coating
- H01L21/02288—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process liquid deposition, e.g. spin-coating, sol-gel techniques, spray coating printing, e.g. ink-jet printing
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02518—Deposited layers
- H01L21/02587—Structure
- H01L21/0259—Microstructure
- H01L21/02601—Nanoparticles
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/12—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns
Definitions
- the present invention relates to an electrode manufacturing method, for example, an electrode manufacturing method used as an electrode for a thin film transistor (TFT) substrate.
- TFT thin film transistor
- Patent Document 1 discloses a conductive ink substantially free of a binder component for forming a conductive pattern by a relief printing method, and has a volume average particle size (Mv).
- Conductive particles of 10 to 700 nm, a release agent, a surface energy adjusting agent, and a solvent component are essential components.
- the solvent component has a solvent with a surface energy of 27 mN / m or more at 25 ° C. and a boiling point under atmospheric pressure.
- a soot conductive ink is proposed which is a mixture with a volatile solvent at 120 ° C. or lower, and has a surface energy of 10 to 21 mN / m at 25 ° C.
- Patent Document 2 WO2010 / 113931
- a method for forming an organic transistor by transferring a pattern using a liquid-repellent transfer base plate such as a microcontact printing method or a reversal printing method.
- Optimal ink that is, a uniform ink coating can be formed on the surface of a liquid-repellent transfer base plate, and an ink-dried film or semi-dried film can be easily transferred onto a transfer substrate from the transfer base plate.
- a possible organic semiconductor ink composition has been proposed.
- an organic transistor having excellent electrical characteristics can be produced while forming an organic semiconductor pattern having excellent electrical characteristics while being capable of forming a shape-selective and site-selective. It is said that an organic semiconductor pattern can be formed only in a necessary area of a circuit when manufacturing a TFT.
- the present inventors have invented a conductive ink that can be applied to a substrate having low heat resistance and can obtain sufficient conductivity even when the baking temperature is lowered (Japanese Patent Application No. 2014). -238100 and Japanese Patent Application No. 2014-238101), when used for an electrode such as a TFT, an organic residue that does not hinder the conductivity may not be able to efficiently inject carriers into the semiconductor. There was room for.
- an object of the present invention is an electrode that can be applied to a substrate having a low amount of organic residue that does not impair conductivity even at a low baking temperature, and can be applied to an electrode such as a TFT. It is in providing the manufacturing method of.
- the present inventor can obtain an electrode with very little organic residue by bringing the electrode surface formed at a low baking temperature into contact with a specific solution. Has been found to be extremely effective in achieving the above, and the present invention has been achieved.
- an organic residue that does not impede conductivity even at a low baking temperature is obtained by washing at least a part of the conductive film with an acidic solution. Therefore, an electrode that can be suitably used for an electrode such as a TFT can be obtained.
- the electrode is preferably an electrode for a thin film transistor (TFT).
- TFT thin film transistor
- the acidic solution contains sulfuric acid.
- the conductive ink in the electrode manufacturing method of the present invention various inks can be used, but mainly those described below can be preferably used.
- (1) comprising metal nanoparticles, a short-chain amine having 5 or less carbon atoms, a highly polar solvent, and a dispersant having an acid value for dispersing the metal nanoparticles, A metal nanoparticle dispersion having a partition coefficient logP of ⁇ 1.0 to 1.4 (metal nanoparticle dispersion A).
- metal nanoparticle dispersion A metal nanoparticle dispersion having a partition coefficient logP of ⁇ 1.0 to 1.4
- the metal nanoparticle dispersion A it is preferable that the metal nanoparticle dispersion further contains a protective dispersant having an acid value. Moreover, it is preferable that the said short chain amine is an alkoxyamine.
- the acid value of the protective dispersant is preferably 5 to 200. Furthermore, it is preferable that the protective dispersant has a functional group derived from phosphoric acid. Furthermore, it is preferable that the highly polar solvent is methanol, ethanol, isopropyl alcohol or n-propyl alcohol.
- the high boiling point solvent preferably contains 1,3-butylene glycol, 2,4-diethyl-1,5-pentanediol or octanediol. Further, it is preferable that the conductive ink B further contains a hydrofluoroether.
- the organic matter residue is small enough not to impede conductivity, and can be applied to a substrate having low heat resistance, and is also suitable for an electrode such as a TFT.
- An electrode manufacturing method that can be used can be provided.
- FIG. 4 is a graph showing output characteristics of a TFT in Example 1.
- 6 is a graph showing output characteristics of TFTs in Comparative Example 1. It is a graph which shows the result of having evaluated the cleaning effect of a conductive film in the electrode obtained in Example 1 and comparative example 1.
- FIG. 4 is a graph showing output characteristics of a TFT in Example 1.
- 6 is a graph showing output characteristics of TFTs in Comparative Example 1. It is a graph which shows the result of having evaluated the cleaning effect of a conductive film in the electrode obtained in Example 1 and comparative example 1.
- the present invention includes a first step of forming a pre-firing coating by printing or applying a conductive ink mainly composed of metal nanoparticles, and a second step of firing the pre-firing coating to form a conductive coating. And a third step of cleaning by bringing an acidic solution into contact with at least a part of the conductive film.
- a pre-firing film is formed by printing or applying a conductive ink mainly composed of metal nanoparticles.
- Conventionally known methods can be employed for the printing and coating methods in the first step.
- the shape and pattern of the pre-firing film may also be a conventionally known one.
- the conductive ink has silver fine particles (silver nanoparticles), a short-chain amine having 5 or less carbon atoms, a highly polar solvent, and an acid value for dispersing the silver fine particles.
- a silver fine particle dispersion containing a dispersant preferably has a partition coefficient logP of ⁇ 1.0 to 1.4 (the above-mentioned metal nanoparticle dispersion A).
- the above-mentioned silver fine particle dispersion is a silver fine particle dispersion having a low temperature sintering property in which silver fine particles are uniformly dispersed in various solvents (especially highly polar solvents), and a conductive film is formed by sintering the silver fine particle composite.
- a conductive film having good conductivity can be formed at a low temperature.
- the conductive film composed of the specific silver nanoparticles described in the present embodiment is preferable because the reason is not always clear by using an amine-based dispersant described later, but an acidic solution and an amine. This is because the dispersant in the system is more likely to interact and the cleaning effect is exhibited.
- an electrode that can be fired at a low temperature and can exhibit good TFT characteristics can be obtained more reliably.
- the amino group in one molecule of the amine has a relatively high polarity and tends to cause an interaction due to a hydrogen bond, but a portion other than these functional groups has a relatively low polarity. Furthermore, each amino group tends to exhibit alkaline properties. Accordingly, when the amine is localized (attached) on at least a part of the surface of the silver fine particles (that is, when at least a part of the surface of the silver fine particles is coated), the amine and the inorganic particles can sufficiently have an affinity. And aggregation of silver fine particles can be prevented (dispersibility is improved).
- the functional group of amine is adsorbed on the surface of the silver fine particles with an appropriate strength and prevents mutual contact between the silver fine particles, thereby contributing to the stability of the silver fine particles in the storage state. Moreover, it is thought that the fusion
- the amine constituting the silver fine particle dispersion a short chain amine having 5 or less carbon atoms
- the amine attached to at least a part of the surface of the silver fine particles by heating can be easily removed.
- Good low-temperature sinterability for example, sinterability at 100 to 350 ° C.
- the distribution coefficient logP of the short chain amine is set to -1.0 to 1.4. If the distribution coefficient logP is -1.0 or less, the polarity of the short chain amine is too high. This is because it rapidly proceeds and it becomes difficult to control the formation of silver fine particles, and if the distribution coefficient logP is 1.5 or more, it is difficult to disperse in a highly polar solvent because the polarity of amine coordinated to silver is low.
- Log P is calculated as a distribution coefficient. Therefore, the distribution coefficient logP means that it is one index that indicates whether or not a range of polar solvent can disperse the silver fine particles.
- the method for measuring the partition coefficient logP is not particularly limited, and can be determined by, for example, flask shaking method, high performance liquid chromatography (HPLC) method, and calculation using a quantitative structure-activity relationship algorithm. Literature values published on websites such as centers may be used.
- the silver fine particle dispersion includes an acid value dispersant added after the synthesis of the silver fine particles (that is, a dispersant having an acid value for dispersing the silver fine particles).
- the “dispersant having an acid value” as used herein includes all dispersants that do not have an amine value or a hydroxyl value as an adsorbing group or a functional group. By using such a dispersant, the dispersion stability of the silver fine particles in the solvent can be improved.
- the acid value of the dispersant is preferably 5 to 200, and the dispersant preferably has a functional group derived from phosphoric acid.
- the “dispersant having an acid value” is preferable is not necessarily clear, but the present inventors not only adsorb metal, but also adsorb in a denser form by interacting with a short chain amine. It is thought that it exhibits high dispersibility while having low-temperature sinterability.
- a dispersant having a high polarity When it is desired to disperse silver fine particles in a highly polar solvent described later, it is generally effective to use a dispersant having a high polarity.
- a short-chain amine having a lower log P it is conceivable to use a short-chain amine having a lower log P, but the short-chain amine generally exhibits reducibility and may not keep the reaction rate properly. Specifically, the reaction rate is excessively increased, and silver fine particles having excellent dispersibility may not be formed. Therefore, by adding a more polar dispersant after the synthesis of the silver fine particles, it is possible to improve only the compatibility with the dispersion medium (surface modification) while leaving the silver fine particles intact.
- the acid value of the dispersant is 5 or more, adsorption by an acid-base interaction starts to occur on a metal substance coordinated with an amine and the particle surface is basic, and if it is 200 or less, an adsorption site is excessively formed. Since it does not have, it adsorb
- the dispersant since the dispersant has a functional group derived from phosphoric acid, phosphorus P interacts with and attracts the metal M through the oxygen O, and is therefore most effective for adsorption with metals and metal compounds. It is preferable because suitable dispersibility can be obtained by the amount of adsorption.
- the “acid value” is expressed in mg of potassium hydroxide required to neutralize the acidic component contained in 1 g of the sample.
- the acid value measurement method include an indicator method (p-naphtholbenzein indicator) and a potentiometric titration method.
- ⁇ ISO6618-1997 Neutralization titration method by indicator titration method ⁇ corresponding to indicator titration method (acid value)
- ⁇ ISO6619-1988 Corresponding to potentiometric titration method (acid value) ⁇ potentiometric titration method (acid value)
- the silver fine particle dispersion may further contain a dispersant (protective dispersant) having an acid value as a protective agent added before the synthesis of the silver fine particles.
- a dispersant protecting dispersant
- the “protective dispersant” herein may be the same as the “dispersant having an acid value” added after the synthesis of the silver fine particles.
- a highly polar solvent means a solvent that is generally incompatible with a low polarity solvent such as hexane or toluene, such as water or an alcohol having a short carbon number.
- a low polarity solvent such as hexane or toluene, such as water or an alcohol having a short carbon number.
- an alcohol having 1 to 6 carbon atoms is used. More preferably, it is used.
- an alcohol having 1 to 6 carbon atoms as a highly polar solvent, there is a problem when a low polarity solvent is used, for example, when a silver fine particle dispersion is laminated on a resin, the solvent may attack the underlying resin layer. Can be avoided.
- the silver fine particles can be favorably dispersed in the highly polar solvent. Furthermore, although the mechanism is not necessarily clear, the alkoxy group of alkoxyamine interacts efficiently with water vapor, which is preferable in that sufficient grain growth can be promoted.
- the particle size of the silver fine particles constituting the silver fine particle dispersion is suitably a nanometer size that desirably causes a melting point drop, desirably 1 to 200 nm. However, if necessary, a particle size of micrometer size may be included. Good.
- the conductive film obtained in the present embodiment is a sintered body formed from silver fine particles and formed by external heating, and has good conductivity equivalent to the conductivity originally possessed by the silver fine particles.
- the silver fine particle dispersion (conductive ink) used for forming the conductive film will be described in more detail below.
- the silver fine particle dispersion (conductive ink) used for forming the conductive film is not particularly limited as long as the effects of the present invention are not impaired, and various conventionally known silver fine particle dispersions can be used.
- the above-mentioned silver fine particle dispersion is a silver fine particle dispersion having a low temperature sintering property in which silver fine particles are uniformly dispersed in various solvents (especially highly polar solvents), and a conductive film is formed by sintering the silver fine particle composite. By doing so, a conductive film having good conductivity can be formed at a low temperature.
- the average particle size of the silver fine particles in the silver fine particle dispersion of the present embodiment is not particularly limited as long as the effect of the present invention is not impaired. It preferably has a diameter, for example, it may be 1 to 200 nm. Further, it is preferably 2 to 100 nm. If the average particle diameter of the silver fine particles is 1 nm or more, the silver fine particles have good low-temperature sinterability, and the production of silver fine particles is practical without increasing the cost. Moreover, if it is 200 nm or less, the dispersibility of a silver fine particle does not change easily over time, and it is preferable.
- the silver fine particle dispersion may be added with a metal whose ionization column is more noble than hydrogen, that is, gold, copper, platinum, palladium, or the like in consideration of the problem of migration, for example.
- the particle size of the silver fine particles in the silver fine particle dispersion of the present embodiment may not be constant.
- the silver fine particle dispersion contains a dispersant described later as an optional component, it may contain a metal particle component having an average particle size of more than 200 nm, but it does not cause aggregation, and the effect of the present invention is achieved.
- a metal particle component having an average particle diameter of more than 200 nm may be included as long as the component is not significantly impaired.
- the particle size of the silver fine particles in the silver fine particle dispersion of the present embodiment can be measured by a dynamic light scattering method, a small-angle X-ray scattering method, and a wide-angle X-ray diffraction method.
- the crystallite diameter determined by the wide-angle X-ray diffraction method is appropriate.
- RINT-UltimaIII manufactured by Rigaku Corporation can be used to measure 2 ⁇ in the range of 30 to 80 ° by the diffraction method.
- the sample may be measured by extending it thinly so that the surface becomes flat on a glass plate having a recess of about 0.1 to 1 mm in depth at the center.
- the crystallite diameter (D) calculated by substituting the half width of the obtained diffraction spectrum into the following Scherrer equation using JADE manufactured by Rigaku Corporation may be used as the particle diameter.
- D K ⁇ / Bcos ⁇
- K Scherrer constant (0.9)
- ⁇ wavelength of X-ray
- B half width of diffraction line
- ⁇ Bragg angle.
- a short-chain amine having 5 or less carbon atoms is attached to at least a part of the surface of the silver fine particles.
- a trace amount of organic matter contained as an impurity from the beginning, a trace amount of organic matter mixed in the manufacturing process described later, a residual reducing agent that could not be removed in the cleaning process, a residual dispersant, etc. may be attached.
- the short-chain amine having 5 or less carbon atoms is not particularly limited as long as the distribution coefficient logP is ⁇ 1.0 to 1.4, and may be linear or branched. You may have a chain.
- Examples of the short chain amine include ethylamine ( ⁇ 0.3) propylamine (0.5), butylamine (1.0), N- (3-methoxypropyl) propane-1,3-diamine ( ⁇ 0.
- 1,2-ethanediamine N- (3-methoxypropyl) formamide (-0.2), 2-methoxyethylamine (-0.9), 3-methoxypropylamine (-0.5), 3 -Ethoxypropylamine (-0.1), 1,4-butanediamine (-0.9), 1,5-pentanediamine (-0.6), pentanolamine (-0.3), aminoisobutanol (-0.8) and the like are mentioned, among which alkoxyamine is preferably used.
- the short chain amine may be a compound containing a functional group other than an amine such as a hydroxyl group, a carboxyl group, an alkoxy group, a carbonyl group, an ester group, or a mercapto group.
- the said amine may be used independently, respectively and may use 2 or more types together.
- the boiling point at normal pressure is preferably 300 ° C. or lower, more preferably 250 ° C. or lower.
- the silver particle dispersion of this embodiment may contain a carboxylic acid in addition to the short-chain amine having 5 or less carbon atoms as long as the effects of the present invention are not impaired.
- the carboxyl group in one molecule of the carboxylic acid has a relatively high polarity and tends to cause an interaction due to a hydrogen bond, but a portion other than these functional groups has a relatively low polarity. Furthermore, the carboxyl group tends to exhibit acidic properties.
- the carboxylic acid is localized (attached) on at least a part of the surface of the silver fine particles (that is, covers at least a part of the surface of the silver fine particles) in the silver particle dispersion of the present embodiment, the solvent. And silver fine particles can be made to sufficiently adhere to each other and aggregation of silver fine particles can be prevented (dispersibility is improved).
- carboxylic acid compounds having at least one carboxyl group can be widely used, and examples thereof include formic acid, oxalic acid, acetic acid, hexanoic acid, acrylic acid, octylic acid, and oleic acid.
- a part of carboxyl groups of the carboxylic acid may form a salt with a metal ion.
- 2 or more types of metal ions may be contained.
- the carboxylic acid may be a compound containing a functional group other than a carboxyl group, such as an amino group, a hydroxyl group, an alkoxy group, a carbonyl group, an ester group, or a mercapto group.
- the number of carboxyl groups is preferably equal to or greater than the number of functional groups other than carboxyl groups.
- the said carboxylic acid may be used independently, respectively and may use 2 or more types together.
- the boiling point at normal pressure is preferably 300 ° C. or lower, more preferably 250 ° C. or lower.
- amines and carboxylic acids form amides. Since the amide group also adsorbs moderately on the surface of the silver fine particles, the amide group may adhere to the surface of the silver fine particles.
- the content of the organic component in the colloid is 0.5 to 50 It is preferable that it is mass%. If the organic component content is 0.5% by mass or more, the storage stability of the resulting silver fine particle dispersion tends to be improved, and if it is 50% by mass or less, the silver fine particle dispersion is obtained by heating. There exists a tendency for the electroconductivity of a sintered body to be good. A more preferable content of the organic component is 1 to 30% by mass, and a more preferable content is 2 to 15% by mass.
- the silver fine particle dispersion of the present embodiment is obtained by dispersing silver fine particles in various high polar solvents.
- High polar solvents include methanol, ethanol, propanol, isopropanol, butanol, isobutanol, 2-butanol, pentanol, hexanol, isoamyl alcohol, furfuryl alcohol, nitromethane, acetonitrile, pyridine, acetone cresol, dimethylformamide, dioxane, ethylene Glycol, glycerin, phenol, p-cresol, propyl acetate, isopropyl acetate, tert-butanol, 1-pentanol, 2-pentanol, 4-methyl-2-pentanol, 3-methyl-1-pentanol, 3- Methyl-2-pentanol, 2-butanol, 1-hexanol, 2-hexanol 2-pentanone, 2-heptanone, 2- (2
- the silver particle dispersion of the present embodiment further includes a “dispersant having an acid value” added after the synthesis of silver fine particles in order to disperse the silver fine particles.
- a dispersant having an acid value added after the synthesis of silver fine particles in order to disperse the silver fine particles.
- the acid value of the dispersant is more preferably from 5 to 200, and it is further preferable that the dispersant has a functional group derived from phosphoric acid.
- the acid value of the dispersant is 5 or more, adsorption with an acid-base interaction starts to occur on a metal substance that coordinates with the amine and the particle surface is basic. This is because it does not have an adsorption site and adsorbs in a suitable form.
- the dispersant since the dispersant has a functional group derived from phosphoric acid, phosphorus P interacts with and attracts the metal M through the oxygen O, and is therefore most effective for adsorption with metals and metal compounds. This is because suitable dispersibility can be obtained by the amount of adsorption.
- Examples of the polymer dispersant having an acid value of 5 to 200 include SOLPERSE-16000, 21000, 41000, 41090, 43000, 44000, 46000, and 54000 in the SOLSPERSE series of Lubrizol.
- DISPERBYK-102, 110, 111, 170, 190.194N, 2015.2090, 2096 and the like are listed, and in Evonik's TEGO® Dispers series, 610, 610S, 630, 651, 655, 750W, 755W and the like are listed.
- Disparon series manufactured by Enomoto Kasei Co., Ltd. DA-375, DA-1200 and the like are listed.
- In the Floren series manufactured by Kyoei Chemical Industry Co., Ltd., WK-13E, G-700, -900 can be exemplified GW-1500, GW-1640, WK-13E.
- the content when the dispersant is contained in the silver fine particle dispersion of the present embodiment may be adjusted according to desired properties such as viscosity.
- desired properties such as viscosity.
- the content is preferably 0.5 to 20% by mass, and when used as a silver paste, the content of the dispersant is preferably 0.1 to 10% by mass.
- the content of the polymer dispersant is preferably 0.1 to 15% by mass.
- the content of the polymer dispersant is 0.1% or more, the dispersion stability of the obtained silver fine particle dispersion is improved.
- the content is too large, the low-temperature sinterability is lowered.
- the more preferable content of the polymer dispersant is 0.3 to 10% by mass, and still more preferable content is 0.5 to 8% by mass.
- the dispersion of this embodiment further has a weight reduction rate of 20% by mass or less when heated from room temperature to 200 ° C. by thermal analysis, and a weight reduction rate of 10% when heated from 200 ° C. to 500 ° C. It is preferable that it is below mass%.
- the weight loss rate up to 200 ° C. mainly indicates the content of the short-chain amine, which is a low-temperature component that contributes to low-temperature sinterability, and the weight loss rate at 200 to 500 ° C. is mainly the dispersion stability.
- the silver fine particle dispersion of this embodiment may further contain a dispersant (protective dispersant) having an acid value as a protective agent added before the synthesis of the silver fine particles.
- a dispersant protecting dispersant
- the “protective dispersant” referred to here may be of the same type or different type as the “dispersant having an acid value” added after the synthesis of the silver fine particles.
- the silver fine particle dispersion of the present embodiment has an appropriate viscosity, adhesion, drying property or printing depending on the purpose of use within a range not impairing the effects of the present invention.
- Such optional components are not particularly limited.
- the resin component examples include polyester resins, polyurethane resins such as blocked isocyanate, polyacrylate resins, polyacrylamide resins, polyether resins, melamine resins, and terpene resins. May be used alone or in combination of two or more.
- the thickener examples include clay minerals such as clay, bentonite or hectorite, for example, emulsions such as polyester emulsion resins, acrylic emulsion resins, polyurethane emulsion resins or blocked isocyanates, methyl cellulose, carboxymethyl cellulose, and hydroxyethyl cellulose. , Hydroxypropylcellulose, cellulose derivatives of hydroxypropylmethylcellulose, polysaccharides such as xanthan gum or guar gum, etc., and these may be used alone or in combination of two or more.
- clay minerals such as clay, bentonite or hectorite
- emulsions such as polyester emulsion resins, acrylic emulsion resins, polyurethane emulsion resins or blocked isocyanates, methyl cellulose, carboxymethyl cellulose, and hydroxyethyl cellulose.
- Hydroxypropylcellulose cellulose derivatives of hydroxypropylmethylcellulose
- polysaccharides such as
- a surfactant different from the above organic components may be added.
- the coating surface becomes rough and the solid content tends to be uneven due to the difference in volatilization rate during drying.
- the surfactant that can be used in the present embodiment is not particularly limited, and any of an anionic surfactant, a cationic surfactant, and a nonionic surfactant can be used.
- an anionic surfactant for example, alkylbenzene sulfonic acid Salt, quaternary ammonium salt and the like.
- fluorine-based surfactants and silicone-based surfactants are preferred because an effect can be obtained with a small amount of addition.
- the silver fine particles contained in the silver fine particle dispersion of the present embodiment are silver fine particles in which an alkoxyamine having a distribution coefficient log P of ⁇ 1.0 to 1.4 and a carbon number of 5 or less is attached to at least a part of the surface. Preferably there is.
- the silver fine particles By attaching an alkoxyamine having a partition coefficient logP of ⁇ 1.0 to 1.4 and having 5 or less carbon atoms to at least a part of the surface of the silver fine particles, the silver fine particles can be used for various solvents (particularly highly polar solvents). Excellent dispersibility and low-temperature sinterability can be imparted.
- the solvent various solvents can be used as long as the effects of the present invention are not impaired, and a solvent having an SP value (solubility parameter) of 7.0 to 15.0 can be used.
- SP value solubility parameter
- the phase is combined with the short-chain amine having 5 or less carbon atoms. It is preferable to use an alcohol having 1 to 6 carbon atoms because of good solubility.
- Examples of the solvent having an SP value (solubility parameter) of 7.0 to 15.0 include hexane (7.2), triethylamine (7.3), ethyl ether (7.7), and n-octane (7. 8), cyclohexane (8.3), n-amyl acetate (8.3), isobutyl acetate (8.3), methyl isopropyl ketone (8.4), amyl benzene (8.5) butyl acetate (8.5) ), Carbon tetrachloride (8.6), ethylbenzene (8.7), p-xylene (8.8), toluene (8.9), methyl propyl ketone (8.9) ethyl acetate (8.9), Tetrahydrofuran (9.2), methyl ethyl ketone (9.3), chloroform (9.4), acetone (9.8), dioxane (10.1), pyridine (10.8), is
- the particle size of the silver fine particles of the present embodiment is a nanometer size that desirably causes a melting point drop, and preferably 1 to 200 nm. However, if necessary, particles of a micrometer size may be included.
- the conductive ink for transfer printing has a metal nanoparticle, a solvent containing ethanol, and a hydroxyl group. And 0.1 to 3.0% by mass of a high-boiling solvent (the above-mentioned conductive ink B).
- the solid content which has the metal particle dispersion in other words, metal colloid particle
- distributes these solid content are included.
- the “dispersion medium” may dissolve a part of the solid content.
- the dispersibility of the metal colloid particles in the metal colloid liquid can be improved. Therefore, the content of the metal component in the metal colloid liquid can be reduced. Even if it is increased, the colloidal metal particles are less likely to aggregate and good dispersion stability can be maintained.
- the “dispersibility” as used herein indicates whether or not the dispersion state of the metal particles in the metal colloid liquid is excellent immediately after the metal colloid liquid is prepared (whether it is uniform or not).
- Dispersion stability indicates whether or not the dispersion state of the metal particles in the metal colloid liquid is maintained after a predetermined time has elapsed after preparing the metal colloid liquid, It can also be said to be “low sedimentation aggregation”.
- the “organic component” in the metal colloid particle is an organic substance that substantially constitutes the metal colloid particle together with the metal component.
- the organic component includes trace organic substances contained in the metal as impurities from the beginning, organic substances adhering to the metal component from trace organic substances mixed in the manufacturing process described later, residual reducing agent that could not be removed in the cleaning process, residual dispersion It does not include organic substances that adhere to trace amounts of metal components such as agents.
- the “trace amount” is specifically intended to be less than 1% by mass in the metal colloid particles. Since the metal colloid particles in this embodiment contain an organic component, the dispersion stability in the metal colloid liquid is high. Therefore, even if the content of the metal component in the metal colloid liquid is increased, the metal colloid particles are less likely to aggregate, and as a result, good dispersibility is maintained.
- the “solid content” of the metal colloid liquid in the present embodiment means that after removing the dispersion medium from the metal colloid liquid using silica gel or the like, for example, it is dried at room temperature of 30 ° C. or lower (for example, 25 ° C.) for 24 hours.
- the solid content that remains is usually contained metal particles, residual organic components, residual reducing agent, and the like.
- Various methods can be employed as a method of removing the dispersion medium from the metal colloid liquid using silica gel. For example, a metal colloid liquid is applied on a glass substrate and placed in a sealed container containing silica gel. What is necessary is just to remove a dispersion medium by leaving a glass substrate with a coating film for 24 hours or more.
- the preferable solid content is 1 to 60% by mass.
- the solid content concentration is 1% by mass or more, the metal content in the conductive ink for transfer printing can be secured, and the conductive efficiency does not decrease.
- the solid content concentration is 60% by mass or less, the viscosity of the metal colloid liquid does not increase, the handling is easy, it is industrially advantageous, and a flat thin film can be formed.
- a more preferable solid content is 5 to 40% by mass.
- the conductive ink for transfer printing contains 0.1 to 3.0% by mass of a high boiling point solvent having a hydroxyl group.
- the high boiling point solvent having a hydroxyl group is 1,3-butylene glycol (boiling point: 203 ° C.), 2,4-diethyl-1,5-pentanediol (boiling point: 150 ° C./5 mmHg, 200 ° C. or more at 1 atm) or octane. It is preferably selected from diols (boiling point: 243 ° C.).
- “High-boiling solvent” refers to a solvent having a boiling point of 200 ° C. or higher.
- an ink suitable for transfer printing with a small addition amount can be obtained. can do.
- the ink applied on the silicone blanket can be semi-dried in a short time, and the printing tact can be shortened.
- the addition amount of the high boiling point solvent having a hydroxyl group is 0.1 to 3.0% by mass. If the amount is less than 0.1% by mass, the amount is too small to easily form an ink suitable for the transfer printing method. If the amount exceeds 3.0% by mass, the time to reach a semi-dry state suitable for the transfer printing method is reached. It becomes longer and disadvantageous in terms of printing tact.
- the addition amount of the high boiling point solvent having a hydroxyl group is 0.3 to 2.0% by mass, but it is more sure that the ink is suitable for the transfer printing method, and it is a semi-dry state suitable for the transfer printing method. This is particularly preferable from the viewpoint of shortening the time required to reach the position and being advantageous in terms of printing tact.
- a highly volatile solvent such as ethanol is added to improve the drying property of the ink.
- the transfer printing conductive ink can be quickly adjusted to a viscosity suitable for printing.
- the highly volatile solvent include one or more selected from the group of solvents having a boiling point of less than 100 ° C. such as ethanol, methanol, propyl alcohol, isopropyl alcohol, acetone, n-butanol, sec-butanol, tert-butanol and the like. Low boiling solvents can be used.
- the conductive ink for transfer printing preferably contains a fluorine solvent such as hydrofluoroether. Since the fluorine solvent has a low surface tension, it can exhibit good wettability with respect to the silicone blanket, and since the boiling point is relatively low, it can provide good drying properties. Of these, hydrofluoroethers are more preferable than fluorine solvents containing halogen atoms from the viewpoint of the ozone depletion coefficient.
- hydrofluoroether has an ether bond than hydrofluorocarbons, so it has a high polarity and has the advantage of hardly causing the silicone blanket to swell, and has good compatibility with alcohols such as ethanol, This is more preferable because it has an effect of being excellent in compatibility with metal particles dispersed in alcohol.
- a fluorine-based surfactant having a fluorine atom may be added for the purpose of improving the wettability with respect to the silicone blanket.
- the content is preferably 0.01 to 2% by mass.
- the surface tension is 22 mN / m or less.
- the surface tension of 22 mN / m or less can be realized by adjusting the component ratio of the conductive ink for transfer printing according to the present invention.
- the lower limit of the surface tension may be about 13 mN / m.
- the surface tension referred to in the present invention is obtained by measurement based on the principle of the plate method (Wilhelmy method). For example, the surface tension is measured by a fully automatic surface tension meter CBVP-Z manufactured by Kyowa Interface Science Co., Ltd. can do.
- the method for producing silver fine particles and the silver fine particle dispersion according to the present embodiment includes a step of producing silver fine particles, and a dispersant having an acid value for dispersing the silver fine particles is added to and mixed with the silver fine particles.
- the first pre-process it is preferable to add 2 mol or more of short chain amine to 1 mol of metallic silver.
- an appropriate amount of the short chain amine can be attached to the surface of the silver fine particles produced by the reduction, and various solvents (particularly, Excellent dispersibility and low-temperature sinterability with respect to a highly polar solvent) can be imparted.
- the particle size of the silver fine particles obtained is a nanometer size that causes a melting point drop depending on the composition of the liquid mixture in the first pre-process and the reduction conditions (for example, heating temperature, heating time, etc.) in the second pre-process.
- the thickness is 1 to 200 nm.
- particles of micrometer size may be included as necessary.
- the method for taking out the silver fine particles from the silver fine particle dispersion obtained in the second pre-process is not particularly limited, and examples thereof include a method for washing the silver fine particle dispersion.
- silver salts such as silver nitrate, silver sulfate, silver chloride, silver oxide, silver acetate, silver oxalate, silver formate, silver nitrite, silver chlorate, and silver sulfide. These are not particularly limited as long as they can be reduced, and may be dissolved in an appropriate solvent or may be used as dispersed in a solvent. These may be used alone or in combination.
- the method for reducing these silver compounds in the raw material liquid is not particularly limited.
- a method using a reducing agent a method of irradiating light such as ultraviolet rays, an electron beam, ultrasonic waves or thermal energy, a method of heating, etc. Is mentioned.
- a method using a reducing agent is preferable from the viewpoint of easy operation.
- Examples of the reducing agent include amine compounds such as dimethylaminoethanol, methyldiethanolamine, triethanolamine, phenidone, and hydrazine; for example, hydrogen compounds such as sodium borohydride, hydrogen iodide, and hydrogen gas; for example, carbon monoxide.
- amine compounds such as dimethylaminoethanol, methyldiethanolamine, triethanolamine, phenidone, and hydrazine
- hydrogen compounds such as sodium borohydride, hydrogen iodide, and hydrogen gas
- carbon monoxide for example, carbon monoxide.
- Oxides such as sulfurous acid; for example, ferrous sulfate, iron oxide, iron fumarate, iron lactate, iron oxalate, iron sulfide, tin acetate, tin chloride, tin diphosphate, tin oxalate, tin oxide, sulfuric acid
- Low valent metal salts such as tin; for example, sugars such as ethylene glycol, glycerin, formaldehyde, hydroquinone, pyrogallol, tannin, tannic acid, salicylic acid, D-glucose, etc.
- sugars such as ethylene glycol, glycerin, formaldehyde, hydroquinone, pyrogallol, tannin, tannic acid, salicylic acid, D-glucose, etc.
- light and / or heat may be added to promote the reduction reaction.
- organic component, solvent and reducing agent for example, the above metal salt is dissolved in an organic solvent (for example, toluene) to form a metal salt.
- organic solvent for example, toluene
- the method include preparing a solution, adding a short-chain amine as a dispersant or a protective dispersant having an acid value to the metal salt solution, and then gradually dropping a solution in which the reducing agent is dissolved.
- the dispersant in addition to the silver fine particles, a metal ion counter ion, a reducing agent residue, there is a dispersant, and the concentration of the electrolyte and the organic matter in the whole liquid tend to be high.
- the silver fine particles are agglomerated due to high electrical conductivity, etc., and are easily precipitated.
- the conductivity of the metal salt may deteriorate if the counter ion of the metal salt, the residue of the reducing agent, or an excessive amount of dispersant remaining in the amount necessary for dispersion remains. Therefore, by washing the solution containing silver fine particles to remove excess residues, silver fine particles coated with an organic substance can be obtained with certainty.
- washing method for example, a dispersion containing silver fine particles coated with an organic component is allowed to stand for a certain period of time, and after removing the resulting supernatant, a solvent for precipitating silver fine particles (for example, water, methanol, Methanol / water mixed solvent, etc.) is added and stirred again, and the method of removing the supernatant liquid after standing for a certain period of time is repeated several times, the method of performing centrifugation instead of the above standing, Examples thereof include a desalting method using a filtration device, an ion exchange device, and the like. By removing excess residue and removing the organic solvent by such washing, silver fine particles coated with the “short-chain amine or the dispersant having an acid value” of the present embodiment can be obtained.
- a solvent for precipitating silver fine particles for example, water, methanol, Methanol / water mixed solvent, etc.
- the metal colloid dispersion liquid is a mixture of the silver fine particles coated with the short-chain amine obtained in the above or the protective dispersant having an acid value and the dispersion medium described in the present embodiment. Is obtained.
- the method of mixing the silver fine particles coated with the “short-chain amine or the protective dispersant having an acid value” and the dispersion medium is not particularly limited, and is performed by a conventionally known method using a stirrer or a stirrer. Can do. An ultrasonic homogenizer with an appropriate output may be applied by stirring with a spatula or the like.
- the production method is not particularly limited.
- the metal colloid dispersion liquid composed of silver and other metals
- the metal colloid dispersion liquid is coated with the above organic substance.
- a dispersion containing silver fine particles and a dispersion containing other metal particles may be produced separately and then mixed, or a silver ion solution and other metal ion solution may be mixed. Thereafter, reduction may be performed.
- atomic silver produced by heating a complex compound generated from a metal compound such as silver oxalate containing silver and a short-chain amine and decomposing the metal compound such as oxalate ion contained in the complex compound
- a metal compound such as silver oxalate containing silver and a short-chain amine
- decomposing the metal compound such as oxalate ion contained in the complex compound
- the metal amine complex decomposition method for producing silver fine particles coated with amine by thermally decomposing a complex compound of a metal compound in the presence of amine decomposition of the metal amine complex which is a single kind of molecule is performed. Since the atomic metal is generated by the reaction, it is possible to generate the atomic metal uniformly in the reaction system, and the reaction is configured as compared with the case where the metal atom is generated by the reaction between multiple components. Inhomogeneity of the reaction due to fluctuations in the composition of the components is suppressed, which is particularly advantageous when producing a large amount of silver fine particles on an industrial scale.
- a short chain amine molecule is coordinated to the metal atom to be generated, and the movement of the metal atom when aggregation occurs due to the action of the short chain amine molecule coordinated to the metal atom. Is assumed to be controlled. As a result, it is possible to produce silver fine particles that are very fine and have a narrow particle size distribution according to the metal amine complex decomposition method.
- short-chain amine molecules have a relatively weak coordination bond on the surface of the silver fine particles to be produced, and these form a dense protective film on the surface of the silver fine particles. It is possible to produce coated silver fine particles having an excellent surface and excellent surface. In addition, since the short-chain amine molecules forming the film can be easily detached by heating or the like, it is possible to produce silver fine particles that can be sintered at a very low temperature.
- the number of carbon atoms is 5 or less with respect to the dispersant having an acid value constituting the coating of the coated silver fine particles.
- the dispersion of the present embodiment obtained as described above can be used as it is, but various inorganic components can be used as long as the dispersion stability and low-temperature sinterability of the conductive ink and conductive paste are not impaired. And organic components can be added.
- the second step firing the pre-fired film formed in the first step.
- This firing may be performed by a conventionally known method and conditions.
- the conductive film is baked by baking the pre-fired film that has undergone the first and second steps so that the temperature is 300 ° C. or less (preferably less than 180 ° C.). (Conductive film pattern) can be formed.
- the lower limit of the firing temperature is not necessarily limited, and is a temperature at which a conductive film pattern can be formed on a substrate, and a temperature at which the organic components and the like can be removed by evaporation or decomposition within a range that does not impair the effects of the present invention. (A part may remain within a range that does not impair the effects of the present invention, but it is desirable that all be removed desirably).
- a conductive film pattern exhibiting high conductivity can be formed even by a low-temperature heat treatment at about 100 ° C. Therefore, the conductive film pattern can be formed on a relatively heat-sensitive substrate. Can be formed. Moreover, baking time is not specifically limited, A conductive film pattern can be formed on a base material according to baking temperature.
- the pre-firing film obtained through the first step in the present embodiment is a sintered body formed from silver fine particles and formed by external heating, and has good conductivity equivalent to the conductivity inherent to the silver fine particles. Have moderate roughness and reflectivity.
- a third step is performed in which at least a part of the conductive coating formed in the second step is contacted with an acidic solution for cleaning.
- the electrode of this embodiment is obtained by the third step.
- an acidic solution may be brought into contact with at least a part of the conductive coating, and this “contact” is a concept including “dipping”, “spraying” and the like. Moreover, it is the concept also including dripping an acidic solution on a conductive film.
- the acidic solution used in the present embodiment may contain sulfuric acid or hydrochloric acid as long as it can effectively wash the conductive film.
- 1 to 50% by mass, preferably 5 to 30% by mass of acid is used.
- An acidic solution with a concentration is desirable.
- the acid concentration is 1% by mass or more, a cleaning effect is obtained, and when the acid concentration is 50% by mass or less, deterioration of the film base material and other members forming the conductive film can be suppressed.
- it is 5 mass% or more the effect of washing
- the acidic solution may contain a surfactant or a water-soluble solvent in order to improve the wettability to the surface of the conductive coating.
- the surfactant is not particularly limited, and for example, any of an anionic surfactant, a cationic surfactant, and a nonionic surfactant can be used.
- an anionic surfactant for example, an alkylbenzene sulfonate, a quaternary ammonium salt, and the like.
- a fluorine-based surfactant that can sufficiently reduce the surface free energy with a small amount of addition can be suitably used.
- the water-soluble solvent include methanol, ethanol, isopropyl alcohol, n-propyl alcohol, and the like.
- a fluorosurfactant (Surflon) manufactured by AGC Seimi Chemical Co., Ltd. can be suitably used.
- DP Clean 320 manufactured by Okuno Pharmaceutical Co., Ltd.
- the environmental temperature of the cleaning by contact in the third step may be room temperature or may be heated as necessary.
- washing with water or a water-soluble solvent is preferable.
- the thickness of the conductive film (that is, the electrode) after the third step is not particularly limited, and may be appropriately determined depending on the use of the obtained electrode.
- the thickness is 0.05 to 1 ⁇ m. It is preferable that it is 0.1 to 0.5 ⁇ m. If it is 0.05 micrometer or more, suitable conduction
- the electrode obtained after the cleaning of the conductive film in the third step is subjected to surface modification (post-step) by SAM (self-assembled film) for the purpose of further improving the carrier injection property of the electrode. Also good.
- SAM for example, pentafluorobenzenethiol (PFBT), phosphonic acid, or a derivative thereof can be suitably used.
- the conductive ink of this embodiment can obtain a conductive film pattern having sufficient conductivity even when heated and baked at a lower temperature than the conventional conductive ink. Therefore, it is possible to use a base material having a lower heat-resistant temperature than the conventional one in a temperature range higher than this low firing temperature.
- Examples of the material constituting such a base material include polyamide (PA), polyimide (PI), polyamideimide (PAI), polyethylene terephthalate (PET), polybutylene terephthalate (PBT), polyethylene naphthalate (PEN), and the like.
- Polyester, polycarbonate (PC), polyethersulfone (PES), vinyl resin, fluororesin, liquid crystal polymer, ceramics, glass or metal can be used.
- the substrate may have various shapes such as a plate shape or a strip shape, and may be rigid or flexible. The thickness of the substrate can also be selected as appropriate. In order to improve adhesiveness or adhesion, or for other purposes, a substrate on which a surface layer is formed or a substrate that has been subjected to a surface treatment such as a hydrophilic treatment may be used.
- the substrate in order to further improve the adhesion between the substrate and the conductive film pattern (conductive film or electrode), the substrate may be subjected to a surface treatment.
- a surface treatment method include a method of performing a dry treatment such as a corona treatment, a plasma treatment, a UV treatment, and an electron beam treatment, and a method of previously providing a primer layer and a conductive ink receiving layer on a substrate.
- Suitable primer layers include, for example, polyurethane, polyimide, polyamideimide, polyvinyl alcohol, polyvinylphenol, polyester, polyethylene, polyphenylene sulfide, unsubstituted or halogen atom-substituted polyparaxylylene, polyacrylonitrile, cyanoethyl pullulan, polymethyl methacrylate, silyl. Sesquioxane, polyvinyl butyral, and the like can be used.
- polyurethane examples include -COO-H, -COOR, -COO-NH + R 2 and -COO-NH 4+ described in Japanese Patent Application No. 2015-060183, where R and R 2 are respectively Independently, a linear or branched alkyl group, the same cycloalkyl group, the same alkylene group, the same oxyalkylene group, the same aryl group, the same aralkyl group, the same heterocyclic group, the same alkoxy group which may have a substituent Group, the same alkoxycarbonyl group, and the same acyl group), and a polyurethane resin having a breaking elongation of 600% or more is preferable.
- the obtained mixed solution was transferred to an oil bath and heated and stirred at 120 ° C. Immediately after the start of stirring, a reaction involving the generation of carbon dioxide started, and then stirring was performed until the generation of carbon dioxide was completed, thereby obtaining a suspension in which silver fine particles were suspended in the amine mixture.
- the silver fine particle dispersion a obtained as described above and other components shown in Table 1 were added and mixed to prepare a conductive ink a.
- the quantity of the component shown in Table 1 is shown by the mass%.
- the silver fine particle dispersion b obtained as described above and the other components shown in Table 2 were added and mixed to prepare a conductive ink b.
- the quantity of the component shown in Table 2 is shown by the mass%.
- Example 1 a TFT having a top gate bottom contact type structure shown in FIG. 1 was produced.
- a PEN (polyethylene naphthalate) substrate 1 “Hydran HW-312B” manufactured by DIC is diluted 3 times with ethanol as a base 2, and a resin layer forming ink is applied to the glass substrate using a spin coater. The layer forming ink was deposited at 2000 rpm for 30 seconds. Then, the resin layer was formed by heating at 120 degreeC for 30 minutes. Next, the conductive ink a was applied on a silicone blanket with a bar coater (No. 7), the glass relief was pressed, and the non-image part (unnecessary part) was transferred and removed.
- the SD (source-drain) electrode pattern was transferred to the base 2 on the substrate 1 by pressing the substrate against the blanket material (first step).
- the obtained SD electrode pattern was baked under the conditions of 120 ° C. ⁇ 30 minutes to form a conductive film laminate (1, 2, 3) (second step).
- the conductive film was immersed in “DP Clean 320 (100 g / 1 L of water) manufactured by Okuno Pharmaceutical Co., Ltd. for 30 seconds at 45 ° C. and then rinsed with pure water to obtain the electrode 3 of the present invention. (Third step).
- a semiconductor F8T2 (Poly [(9,9-dioctylfluorenyl-2,7-diyl) -co-bithiophene]) manufactured by Sigma-Aldrich is dissolved in tetralin to form an SD electrode pattern by inkjet. Application was performed between the electrodes 3. Thereafter, the semiconductor layer 4 was formed by heating in a nitrogen atmosphere under conditions of 100 ° C. ⁇ 5 minutes. Thereafter, a fluorine-based insulating film 5 was formed using a spin coater under conditions of 3000 rpm ⁇ 30 seconds. Then, it formed on the conditions of 100 degreeC x 5 minutes. Next, a G (gate) electrode pattern was printed in the same manner as the SD electrode pattern. The obtained G electrode pattern was baked under the conditions of 120 ° C. ⁇ 30 minutes, and the G electrode 6 was formed to produce a TFT (top gate bottom contact type) having the structure shown in FIG.
- a TFT top gate bottom contact type
- Example 1 A TFT was produced in the same manner as in Example 1 except that “DP Clean 320 (100 g / 1 L of water)” manufactured by Okuno Pharmaceutical Co., Ltd. was not used.
- Example 2 Instead of “DP Clean 320 (100 g / 1 L of water)” manufactured by Okuno Pharmaceutical Co., Ltd., a 10% sulfuric acid, 10% IPA aqueous solution was used, and the sample was immersed in room temperature for 1 minute. A TFT was produced.
- Example 3 As in Example 1, after cleaning the surface of the electrode 3, the substrate was immersed in an IPA solution of pentafluorobenzenethiol (PFBT) for 1 minute, then immersed and washed in IPA, and then at 60 ° C. for 1 minute. A TFT was produced in the same manner as in Example 1 except that the substrate was dried in the same manner as in Example 1.
- PFBT pentafluorobenzenethiol
- Example 4 A TFT was produced in the same manner as in Example 1 except that the conductive ink b was used instead of the conductive ink a.
- Example 5 A TFT was produced in the same manner as in Example 2 except that a 10% aqueous solution of sulfuric acid was used.
- FIGS. 2 and 3 a graph showing the output characteristics of the TFT in Example 1 and a graph showing the output characteristics of the TFT in Comparative Example 1 are shown in FIGS. 2 and 3, respectively.
- Example 3 shows that the TFT characteristics are relatively inferior.
- Example 3 shows that the surface of the SD electrode is appropriately modified by PFBT and exhibits good TFT characteristics.
- Example 4 is a relatively good result by using ink b, although the mobility and ON-OFF ratio are slightly inferior to those of Example 1 using ink a.
- Example 5 the processing unevenness on the surface of the SD electrode is visually observed, but it can be seen that relatively good TFT characteristics are exhibited.
- FIG. 4 is a graph showing the results of evaluating the cleaning effect of the conductive film in the electrodes obtained in Example 1 and Comparative Example 1.
- Example 1 the work functions calculated by AC-2 are 4.4 eV (Example 1) and 4.8 eV (Comparative Example 1), respectively, and Example 1 is closer to bulk silver (4.3 eV). And the yield (vertical axis) has risen, so even if the same energy is applied, more photoelectrons are emitted, and as a result, efficient carrier injection has been determined. Is done.
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Abstract
Description
金属ナノ粒子を主成分とする導電性インクを印刷又は塗布することにより焼成前被膜を形成する第一工程と、
前記焼成前被膜を焼成して導電性被膜を形成する第二工程と、
前記導電性被膜の少なくとも一部に酸性溶液を接触させて洗浄する第三工程と、
を含むことを特徴とする電極の製造方法
を提供する。
(1)金属ナノ粒子と、炭素数が5以下である短鎖アミンと、高極性溶媒と、前記金属ナノ粒子を分散させるための酸価を有する分散剤と、を含み、前記短鎖アミンの分配係数logPが-1.0~1.4である金属ナノ粒子分散体を含む(金属ナノ粒子分散体A)。
(2)金属ナノ粒子と、エタノールを含む溶媒と、水酸基を有する高沸点溶剤0.1~3.0質量%と、を含む(導電性インクB)。
また、前記短鎖アミンがアルコキシアミンであること、が好ましい。
また、前記保護分散剤の酸価が5~200であること、が好ましい。
更に、前記保護分散剤がリン酸由来の官能基を有すること、が好ましい。
更にまた、前記高極性溶媒がメタノール、エタノール、イソプロピルアルコール又はn-プロピルアルコールであること、が好ましい。
また、前記導電性インクBは、更にハイドロフルオロエーテルを含むこと、が好ましい。
第一工程においては、金属ナノ粒子を主成分とする導電性インクを印刷又は塗布することにより焼成前被膜を形成する。この第一工程における印刷や塗布の方法については、従来公知の方法を採用することができる。焼成前被膜の形状やパターンについても、従来公知のものでよい。
・ISO6618-1997:指示薬滴定法による中和価試験法→指示薬滴定法(酸価)に対応
・ISO6619-1988:電位差滴定法(酸価)→電位差滴定法(酸価)に対応
本実施形態の銀微粒子分散体における銀微粒子の平均粒径は、本発明の効果を損なわない範囲であれば特に制限されるものではないが、融点降下が生じるような平均粒径を有するのが好ましく、例えば、1~200nmであればよい。更には、2~100nmであるのが好ましい。銀微粒子の平均粒径が1nm以上であれば、銀微粒子が良好な低温焼結性を具備すると共に銀微粒子製造がコスト高とならず実用的である。また、200nm以下であれば、銀微粒子の分散性が経時的に変化しにくく、好ましい。
D=Kλ/Bcosθ
ここで、K:シェラー定数(0.9)、λ:X線の波長、B:回折線の半値幅、θ:ブラッグ角である。
本実施形態の銀微粒子分散体において、銀微粒子の表面の少なくとも一部には炭素数が5以下である短鎖アミンが付着している。なお、銀微粒子の表面には、原料に最初から不純物として含まれる微量有機物、後述する製造過程で混入する微量有機物、洗浄過程で除去しきれなかった残留還元剤、残留分散剤等のように、微量の有機物が付着していてもよい。
本実施形態の銀微粒子分散体は、種々の高極性溶媒に銀微粒子が分散したものである。
本実施形態の銀粒子分散体には、更に、銀微粒子を分散させるために銀微粒子合成後に添加される「酸価を有する分散剤」を含む。かかる分散剤を用いることで、溶媒中の銀微粒子の分散安定性を向上させることができる。ここで、当該分散剤の酸価は5~200であることがより好ましく、また、当該分散剤がリン酸由来の官能基を有することが更に好ましい。
本実施形態の銀微粒子分散体は、更に、銀微粒子合成前に添加される保護剤としての酸価を有する分散剤(保護分散剤)を含んでいてもよい。ここでいう「保護分散剤」は、上記の銀微粒子合成後に添加される「酸価を有する分散剤」と同じ種類のものでも異なる種類のものであってもよい。
本実施形態の銀微粒子分散体には、上記の成分に加えて、本発明の効果を損なわない範囲で、使用目的に応じた適度な粘性、密着性、乾燥性又は印刷性等の機能を付与するために、例えばバインダーとしての役割を果たすオリゴマー成分、樹脂成分、有機溶剤(固形分の一部を溶解又は分散していてよい。)、界面活性剤、増粘剤又は表面張力調整剤等の任意成分を添加してもよい。かかる任意成分としては、特に限定されない。
本実施形態における金属コロイド粒子は、有機成分を含んでいるため、金属コロイド液中での分散安定性が高い。そのため、金属コロイド液中の金属成分の含有量を増大させても金属コロイド粒子が凝集しにくく、その結果、良好な分散性が保たれる。
ついで、前記第一工程で形成した焼成前被膜を焼成する。この焼成は従来公知の方法及び条件で実施すればよい。例えば従来公知のギアオーブン等を用いて、上記の第一工程及び第二工程を経た焼成前被膜をそ温度が300℃以下(好ましくは180℃未満)となるように焼成することによって導電性被膜(導電膜パターン)を形成することができる。
次に、上記の第二工程で形成した導電性被膜の少なくとも一部に、酸性溶液を接触させて洗浄する第三工程を実施する。当該第三工程により、本実施形態の電極を得る。
3-メトキシプロピルアミン(和光純薬工業(株)製試薬一級、炭素数:4、logP:-0.5)8.9gと、高分子分散剤であるDISPERBYK-102を0.3gと、を混合し、マグネティックスターラにてよく撹拌してアミン混合液を生成した(添加したアミンのモル比は銀に対して5)。次いで、撹拌を行いながら、シュウ酸銀3.0gを添加した。シュウ酸銀の添加後、室温で攪拌を続けることでシュウ酸銀を粘性のある白色の物質へと変化させ、当該変化が外見的に終了したと認められる時点で撹拌を終了した。
10N-NaOH水溶液を3mL添加してアルカリ性にした水50mLに、クエン酸3ナトリウム2水和物17g、タンニン酸0.36gを溶解した。得られた溶液に対して3.87mol/L硝酸銀水溶液3mLを添加し、2時間攪拌を行い銀コロイド水溶液を得た。得られた銀コロイド水溶液に対し、導電率が30μS/cm以下になるまで透析することで脱塩を行った。透析後、2100rpm(920G)、10分の条件で遠心分離を行うことで、粗大銀コロイド粒子を除去し、銀微粒子分散体bを得た。
本実施例においては、図1に示すトップゲートボトムコンタクト型構造を有するTFTを作製した。
PEN(ポリエチレンナフタレート)基板1上に、下地2としてDIC社製の「ハイドランHW-312B」をエタノールで3倍希釈することで樹脂層形成インクを、スピンコーターを用いて、ガラス基板上に樹脂層形成インクを2000rpm、30秒の条件で成膜した。その後、120℃で30分加熱することで樹脂層を形成させた。次いで、導電性インクaをシリコーン製ブランケット上にバーコーター(No.7)で塗布し、ガラス凸版を押圧し、非画像部(不要部分)を転写して除去した。更に、ブランケット材に基材を押圧することでS-D(ソース-ドレイン)電極パターンを基材1上の下地2に転写した(第一工程)。
得られたS-D電極パターンを120℃×30分の条件で焼成し導電性被膜積層体(1,2,3)を形成した(第二工程)。
次に、上記導電性被膜を奥野製薬工業(株)製の「DPクリーン320(100g/水1L)に45℃で30秒間浸漬した後、純水にてリンスし、本発明の電極3を得た(第三工程)。
その後、スピンコーターを用いて、3000rpm×30秒の条件でフッ素系の絶縁膜5を形成した。その後、100℃×5分の条件で形成した。
次いで、上記のS-D電極パターンと同様に、G(ゲート)電極パターンを印刷した。得られたG電極パターンを120℃×30分の条件で焼成し、G電極6を形成することで図1に示す構造のTFT(トップゲートボトムコンタクト型)を作製した。
奥野製薬工業(株)製の「DPクリーン320(100g/水1L)」を用いなかったこと以外は実施例1と同様にして、TFTを作製した。
奥野製薬工業(株)製の「DPクリーン320(100g/水1L)」の代わりに、硫酸10%、IPA10%水溶液を用い、室温で1分浸漬させた以外は実施例1と同様にして、TFTを作製した。
実施例1と同様に、電極3の表面を洗浄した後、ペンタフルオロベンゼンチオール(PFBT)のIPA溶液に基板を1分浸漬し、その後IPAに浸漬・洗浄した後、60℃、1分の条件で基板を乾燥させた以外は、実施例1と同様にして、TFTを作製した。
導電性インクaの代わりに導電性インクbを用いたこと以外は実施例1と同様にして、TFTを作製した。
≪実施例5≫
硫酸10%水溶液を用いたこと以外は、実施例2と同様にして、TFTを作製した。
奥野製薬工業(株)製の「DPクリーン320(100g/水1L)」の代わりに、奥野製薬工業(株)製の「OPC-180クリーナー(200g/水1L)」を用い、60℃で1分浸漬させた以外は実施例1と同様にして、TFTを作製した。
奥野製薬工業(株)製の「DPクリーン320(100g/水1L)」の代わりに、奥野製薬工業(株)製の「OPCクリーン65(500g/水1L)」を用い、室温で1分浸漬させた以外は実施例1と同様にして、TFTを作製した。
上記の実施例1~4及び比較例1~3において得られたTFT素子の特性を、Agilent社製のB1500Aを用いて評価した。ゲート電圧を0Vから80Vまで、ドレイン電圧を0Vから80Vまで走査したときの出力特性を測定し、ドレイン電圧が-80Vの時のゲート電圧とドレイン電流の関係より、移動度とON-OFF比を算出した。結果を表3に示した。
また、実施例3から、PFBTによってS-D電極表面が適切に修飾されており、良好なTFT特性を示していることが伺える。実施例4は、インクbを用いることで、移動度とON-OFF比がインクaを用いた実施例1の結果よりもやや劣るものの、比較的良好な結果である。更に、実施例5では、目視で、S-D電極表面上の処理ムラが認められるが、比較的良好なTFT特性を示していることがわかる。
次に、上記の導電性インクを用いて得られた電極の洗浄効果について、実施例1及び比較例1に相当する実験を行って、追加的に評価試験を行った。
(1)導電性インクaをシリコーン製ブランケット上にバーコーター(No.7)で塗布し、ブランケット材に基材を押圧することでベタ膜を基材に転写した。得られたベタ膜を120℃×30分の条件で焼成し導電性被膜を形成した。次いで、奥野製薬工業(株)製の「DPクリーン320(100g/水1L)に45℃で30秒間浸漬した後、純水にてリンスした。これにより、本発明の電極を得た。
(2)奥野製薬工業(株)製の「DPクリーン320(100g/水1L)」を用いなかったこと以外は上記(1)と同様とし、比較用電極を得た。
Claims (15)
- 金属ナノ粒子を主成分とする導電性インクを印刷又は塗布することにより焼成前被膜を形成する第一工程と、
前記焼成前被膜を焼成して導電性被膜を形成する第二工程と、
前記導電性被膜の少なくとも一部に酸性溶液を接触させて洗浄する第三工程と、
を含むことを特徴とする電極の製造方法。 - 前記電極が薄膜トランジスタ(TFT)用の電極であること、
を特徴とする請求項1に記載の電極の製造方法。 - 前記酸性溶液が硫酸を含むこと、
を特徴とする請求項1又は2に記載の電極の製造方法。 - 前記酸性溶液が界面活性剤又は水溶性溶剤を含むこと、
を特徴とする請求項1~3のいずれかに記載の電極の製造方法。 - 前記水溶性溶剤がメタノール、エタノール、イソプロピルアルコール、n-プロピルアルコールのいずれかであることを特徴とする請求項1~4のいずれかに記載の電極の製造方法。
- 前記金属ナノ粒子が銀ナノ粒子であること、
を特徴とする請求項1~5のいずれかに記載の電極の製造方法。 - 前記導電性インクが、
金属ナノ粒子と、炭素数が5以下である短鎖アミンと、高極性溶媒と、前記金属ナノ粒子を分散させるための酸価を有する分散剤と、を含み、前記短鎖アミンの分配係数logPが-1.0~1.4である金属ナノ粒子分散体を含むこと、
を特徴とする請求項1~6のいずれかに記載の電極の製造方法。 - 前記金属ナノ粒子分散体が、更に、酸価を有する保護分散剤を含むこと、
を特徴とする請求項7に記載の電極の製造方法。 - 前記短鎖アミンがアルコキシアミンであること、
を特徴とする請求項7又は8に記載の電極の製造方法。 - 前記保護分散剤の酸価が5~200であること、
を特徴とする請求項7~9のいずれかに記載の電極の製造方法。 - 前記保護分散剤がリン酸由来の官能基を有すること、
を特徴とする請求項7~10のいずれかに記載の電極の製造方法。 - 前記高極性溶媒がメタノール、エタノール、イソプロピルアルコール又はn-プロピルアルコールであること、
を特徴とする請求項7~11のいずれかに記載の電極の製造方法。 - 前記導電性インクが、
金属ナノ粒子と、
エタノールを含む溶媒と、
水酸基を有する高沸点溶剤0.1~3.0質量%と、を含むこと、
を特徴とする請求項1~12のいずれかに記載の電極の製造方法。 - 前記高沸点溶剤が、1,3-ブチレングリコール、2,4-ジエチル-1,5-ペンタンジオール又はオクタンジオールを含むこと、
を特徴とする請求項13に記載の電極の製造方法。 - 前記導電性インクが、更にハイドロフルオロエーテルを含むこと、
を特徴とする請求項13又は14に記載の電極の製造方法。
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