WO2016152648A1 - Copper alloy sheet for heat dissipating component and heat dissipating component - Google Patents

Copper alloy sheet for heat dissipating component and heat dissipating component Download PDF

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Publication number
WO2016152648A1
WO2016152648A1 PCT/JP2016/058122 JP2016058122W WO2016152648A1 WO 2016152648 A1 WO2016152648 A1 WO 2016152648A1 JP 2016058122 W JP2016058122 W JP 2016058122W WO 2016152648 A1 WO2016152648 A1 WO 2016152648A1
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mass
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copper alloy
heat
aging treatment
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PCT/JP2016/058122
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French (fr)
Japanese (ja)
Inventor
大輔 橋本
昌泰 西村
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株式会社神戸製鋼所
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Priority claimed from JP2015201655A external-priority patent/JP6031576B2/en
Application filed by 株式会社神戸製鋼所 filed Critical 株式会社神戸製鋼所
Priority to KR1020177030337A priority Critical patent/KR101979531B1/en
Priority to CN201680017424.6A priority patent/CN107429322B/en
Publication of WO2016152648A1 publication Critical patent/WO2016152648A1/en

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    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C9/00Alloys based on copper
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C9/00Alloys based on copper
    • C22C9/01Alloys based on copper with aluminium as the next major constituent
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C9/00Alloys based on copper
    • C22C9/02Alloys based on copper with tin as the next major constituent
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C9/00Alloys based on copper
    • C22C9/04Alloys based on copper with zinc as the next major constituent
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C9/00Alloys based on copper
    • C22C9/05Alloys based on copper with manganese as the next major constituent
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C9/00Alloys based on copper
    • C22C9/10Alloys based on copper with silicon as the next major constituent
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/34Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
    • H01L23/36Selection of materials, or shaping, to facilitate cooling or heating, e.g. heatsinks
    • H01L23/373Cooling facilitated by selection of materials for the device or materials for thermal expansion adaptation, e.g. carbon
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C13/00Alloys based on tin
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C13/00Alloys based on tin
    • C22C13/02Alloys based on tin with antimony or bismuth as the next major constituent
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22FCHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS AND NON-FERROUS ALLOYS
    • C22F1/00Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22FCHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS AND NON-FERROUS ALLOYS
    • C22F1/00Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working
    • C22F1/08Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working of copper or alloys based thereon

Definitions

  • the present invention relates to a copper alloy plate for a heat dissipation component and a heat dissipation component.
  • tubular heat pipes and flat heat pipes (vapor chambers) having high heat conductivity and heat transport capability have been proposed as heat dissipating parts having higher heat dissipating properties.
  • the heat pipe exhibits higher heat dissipation characteristics than the heat sink by cyclically performing evaporation (heat absorption from the CPU) and condensation (release of absorbed heat) of the refrigerant sealed inside.
  • evaporation heat absorption from the CPU
  • condensation release of absorbed heat
  • Patent Documents 1 and 2 describe an Fe—P-based copper alloy plate as a material for a heat dissipation component.
  • a tubular heat pipe (see Patent Document 3) is formed by sintering copper powder in a tube to form a wick, heat-degassing treatment, brazing and sealing one end, and putting a refrigerant in the tube under vacuum or reduced pressure. And the other end is brazed and sealed.
  • the planar heat pipe (see Patent Documents 4 and 5) is a further improvement of the heat dissipation performance of the tubular heat pipe.
  • a pipe having a roughened surface or a groove formed on the inner surface has been proposed in the same manner as the tubular heat pipe.
  • a method of brazing, etc. after joining two upper and lower pure copper plates that have undergone processing such as press molding, punching, cutting or etching, by brazing, diffusion bonding or welding, etc. Seal with.
  • a degassing process may be performed in a joining process.
  • planar heat pipe one constituted by an outer member and an inner member accommodated in the outer member has been proposed.
  • One or more internal members are arranged inside the outer surface member in order to promote the condensation, evaporation and transport of the refrigerant, and fins, protrusions, holes or slits of various shapes are processed.
  • the inner member is arranged inside the outer surface member, the outer surface member and the inner member are joined and integrated by a method such as brazing or diffusion joining, brazing, etc. It seals by the method of.
  • the heat radiating plate and the heat sink are heated to about 200 to 700 ° C. in the soldering or brazing process.
  • Tubular heat pipes and planar heat pipes are heated to about 800 to 1000 ° C. by processes such as sintering, degassing, brazing using phosphor copper brazing (BCuP-2 or the like), diffusion bonding or welding.
  • BCuP-2 or the like phosphor copper brazing
  • the softening is severe when heated at a temperature of 650 ° C. or higher.
  • a rapid coarsening of crystal grains occurs.
  • the manufactured heat pipe is easily deformed when attached to a heat sink or a semiconductor device, or incorporated into a PC housing, the structure inside the heat pipe changes, and the surface unevenness increases. There is a problem that the desired heat dissipation performance cannot be exhibited. Moreover, in order to avoid such a deformation
  • the copper alloy plates (Fe—P type) described in Patent Documents 1 and 2 are softened when heated at a temperature of 650 ° C. or higher, and the conductivity is greatly reduced as compared with pure copper. For this reason, when, for example, a planar heat pipe is manufactured through processes such as sintering, degassing, brazing, or diffusion bonding, the heat pipe is easily deformed by a process of transporting and handling or assembling the heat pipe. Moreover, the expected performance as a heat pipe cannot be obtained due to the decrease in conductivity.
  • the present invention has been made in view of the above problems when a process of heating to a temperature of 650 ° C. or higher is included in a part of the process of manufacturing a heat dissipation component from pure copper or a copper alloy plate.
  • An object of the present invention is to provide a copper alloy plate capable of giving sufficient heat resistance and heat dissipation performance to a heat dissipation component manufactured through a heating process.
  • a precipitation hardening type copper alloy improves strength and conductivity by performing an aging treatment after the solution treatment.
  • the precipitation hardening type copper alloy after solution treatment, after applying plastic working in the cold and introducing the plastic strain that becomes the precipitation site into the alloy, if not aging treatment, strength and conductivity by aging treatment
  • the rate improvement effect may be low.
  • plastic processing is not applied after the heating process. Therefore, when the heat-radiating component is manufactured from a precipitation-strengthening-type copper alloy plate, the strength and conductivity may not be sufficiently improved even if an aging treatment is performed after the heating step corresponding to the solution treatment.
  • the present inventors apply plastic working after the heating step by limiting the composition range of Fe and P and the Fe / P ratio in the Cu—Fe—P alloy among precipitation hardening type copper alloys.
  • the present inventors have found that the strength and conductivity of the heat dissipating parts are greatly improved even when the aging treatment is performed without any aging treatment, and the present invention has been achieved.
  • the copper alloy plate for heat dissipation component according to the present invention is used when a process of heating to 650 ° C. or more and an aging treatment are included as part of the process of manufacturing the heat dissipation component, and Fe: 0.07 to 0.7 % By mass, P: 0.2% by mass or less, Fe content (% by mass) is [Fe], and P content (% by mass) is [P]. ] / [P] is 2 to 5, the remainder is made of Cu and inevitable impurities, heated at 850 ° C. for 30 minutes, then water-cooled, then 0.2% proof stress after aging treatment is 100 MPa or more, conductivity is 50 % IACS or higher. The Fe content [Fe] and the P content [P] are both mass%.
  • the copper alloy plate for heat dissipation components according to the present invention can further contain Sn as an alloy element.
  • the copper alloy plate has points A (0.1, 0.006), B (0.5, 0.006), C (0.05, 1.1), D shown in FIG. Fe and Sn within the range surrounded by (0.05, 0.05) (including on the boundary line).
  • the P content and [Fe] / [P] are the same as above.
  • This copper alloy is heated at 850 ° C. for 30 minutes, then water-cooled, and after aging treatment, the 0.2% proof stress is 100 MPa or more, and the conductivity is 45% IACS or more.
  • the copper alloy sheet further contains 1.5 mass% or less (not including 0 mass%) of Zn as an alloy element, if necessary, and / or Mn: 0.1 mass% or less (0 mass%) Mg: 0.2 mass% or less (not including 0 mass%), Si: 0.2 mass% or less (not including 0 mass%), Al: 0.2 mass% or less (0 mass) %), Cr: 0.2 mass% or less (not including 0 mass%), Ti: 0.1 mass% or less (not including 0 mass%) and Zr: 0.05 mass% or less (0 1 type or 2 types or more can be contained in a total of 0.5% or less (excluding 0 mass%).
  • the copper alloy plate according to the present invention is used when a process of heating to 650 ° C. or more and an aging treatment are included as part of the process of manufacturing a heat dissipation component. That is, the heat radiating component manufactured using the copper alloy plate according to the present invention is subjected to aging treatment after high-temperature heating to 650 ° C. or higher, and the strength is improved.
  • the copper alloy sheet according to the present invention is heated to 850 ° C. for 30 minutes and then subjected to an aging treatment, the 0.2% proof stress is 100 MPa or more, and the conductivity is 50% IACS or more (when Sn is not included) or 45 % IACS or more (when Sn is included).
  • the copper alloy plate according to the present invention has high strength after aging treatment, when a heat-radiating component such as a heat pipe manufactured using this copper alloy plate is attached to a heat sink or a semiconductor device, or incorporated into a PC housing or the like. In addition, the heat radiating component is not easily deformed.
  • the copper alloy plate according to the present invention has a conductivity lower than that of a pure copper plate, but since the strength after the aging treatment is high, the copper alloy plate can be thinned and can compensate for a decrease in conductivity in terms of heat dissipation performance.
  • the copper alloy sheet according to the present invention is processed into a predetermined shape by press molding, punching, cutting or etching, and heated for high temperature heating (degassing, bonding (brazing, diffusion bonding or welding) or sintering). ) To finish heat dissipation parts.
  • high temperature heating degassing, bonding (brazing, diffusion bonding or welding) or sintering.
  • the present invention assumes a case where the high-temperature heating is performed at about 650 ° C. to 1050 ° C.
  • the copper alloy plate according to the present invention is made of an Fe—P based copper alloy having the composition described later, and when heated within the above temperature range, at least a part of the Fe—P compound or Fe, etc. precipitated before heating is dissolved. Then, crystal grains grow, and softening and conductivity decrease occur.
  • the copper alloy plate according to the present invention is heated at 850 ° C. for 30 minutes, then water-cooled, and then subjected to an aging treatment (strength (0.2% yield strength)) of 100 MPa or more, and conductivity of 50% IACS or more or 45% IACS or more. is there.
  • Heating at 850 ° C. for 30 minutes is a heating condition that assumes the above-described high-temperature heating process in the manufacture of a heat dissipation component.
  • the copper alloy plate according to the present invention is heated at a high temperature under these conditions, the Fe—P compound or Fe or the like deposited before heating is dissolved, crystal grains grow, softening, and conductivity decrease.
  • fine Fe—P compounds, Fe and the like are precipitated. Thereby, the intensity
  • the aging treatment is (a) maintained for a certain time in the precipitation temperature range during the cooling step after high-temperature heating, (b) cooled to room temperature after high-temperature heating, and then reheated to the precipitation temperature range and maintained for a certain time. (C) After the step (a), it can be carried out by a method such as reheating to the precipitation temperature range and holding for a certain period of time.
  • Specific aging treatment conditions include a condition of holding at a temperature range of 350 to 600 ° C. for 5 minutes to 10 hours.
  • the temperature-time condition under which fine Fe-P precipitates are formed.
  • the temperature-time condition is such that Fe and P that are dissolved in the solution are reduced. May be selected as appropriate.
  • the copper alloy plate after the aging treatment has a lower electrical conductivity than the pure copper plate after high-temperature heating, but the strength is significantly higher than that of the pure copper plate.
  • heat dissipation parts such as a heat pipe manufactured using the copper alloy board concerning the present invention, are subjected to aging treatment after high temperature heating.
  • the aging treatment conditions are as described above.
  • the heat-dissipating component (copper alloy plate) after the aging treatment has high strength and can prevent deformation of the heat-dissipating component when it is attached to a heat sink or a semiconductor device or incorporated in a PC housing or the like.
  • the copper alloy plate according to the present invention (after aging treatment) has a higher strength than that of a pure copper plate, and therefore can be thinned (0.1 to 1.0 mm thick). The performance can be enhanced and the decrease in conductivity when compared with a pure copper plate can be compensated.
  • the copper alloy plate according to the present invention has a 0.2% yield strength of 100 MPa or more after aging treatment even when the temperature of high-temperature heating is less than 850 ° C. (650 ° C. or more) or more than 850 ° C. (1050 ° C. or less). And conductivity of 50% IACS or higher or 45% IACS or higher.
  • the copper alloy plate according to the present invention is processed into a member of a heat dissipation component by press molding, punching, cutting, etching, or the like before being heated to a temperature of 650 ° C. or higher. It is preferable that the copper alloy plate has a strength that does not easily deform during conveyance and handling during the processing, and has mechanical characteristics that allow the processing to be performed without hindrance. More specifically, the copper alloy sheet according to the present invention has a 0.2% proof stress of 150 MPa or more, an elongation of 5% or more, an average crystal grain size of 20 ⁇ m or less, and excellent bending workability (see Examples described later). It is preferable. If the above characteristics are satisfied, the tempering of the copper alloy sheet is not a problem.
  • any of a solution treated material, an aging treated up material, a material obtained by cold rolling a solution treated material or a material obtained by cold rolling an aging treated up material can be used.
  • the average crystal grain size exceeds 20 ⁇ m, roughing of the surface of the plate due to processing (press forming, bending processing, punching processing, cutting, etching, etc.) when processing into heat-radiating parts, generation of burrs or etching due to punching or cutting processing Problems such as a decrease in dimensional accuracy may occur.
  • the crystal grains are further coarsened by high-temperature heating to a temperature of 650 ° C. or higher thereafter, and flatness as a heat dissipation component is lowered. Therefore, the average crystal grain size measured on the surface of the plate before being heated at a high temperature to 650 ° C. or higher is preferably 20 ⁇ m or less, and more preferably 15 ⁇ m or less.
  • the heat dissipation component manufactured by processing the copper alloy plate according to the present invention softens when heated to a temperature of 650 ° C. or higher. It is preferable that the heat dissipating component after high-temperature heating has a strength that does not easily deform during conveyance and handling when performing an aging treatment. For that purpose, it is preferable to have a 0.2% yield strength of 40 MPa or more at the stage of heating at 850 ° C. for 30 minutes and then water cooling.
  • the heat-radiating component manufactured using the copper alloy plate according to the present invention is subjected to aging treatment, and if necessary, at least a part of the outer surface is coated with Sn for the purpose of improving corrosion resistance and solderability.
  • a layer is formed.
  • the Sn coating layer includes electroplating or electroless plating, or those formed by heating to a melting point of Sn or lower or higher than the melting point of Sn.
  • the Sn coating layer includes Sn metal and an Sn alloy, and the Sn alloy includes one or more of Bi, Ag, Cu, Ni, In, and Zn as alloy elements in addition to Sn in a total amount of 5% by mass or less. Things.
  • a base plating such as Ni, Co or Fe can be formed under the Sn coating layer. These undercoats have a function as a barrier for preventing the diffusion of Cu or alloy elements from the base material and a function for preventing damage by increasing the surface hardness of the heat dissipation component.
  • a Cu-Sn alloy layer is formed by plating Cu on the base plating, further plating Sn, and then performing a heat treatment to heat to a temperature lower than or higher than the melting point of Sn to form a Cu-Sn alloy layer and Sn A three-layer structure of the coating layer can also be used.
  • the Cu—Sn alloy layer has a function as a barrier for preventing diffusion of Cu or an alloy element from the base material and a function for preventing damage by increasing the surface hardness of the heat dissipation component.
  • a Ni coating layer is formed on at least a part of the outer surface as necessary.
  • the Ni coating layer has a function as a barrier for preventing the diffusion of Cu or an alloy element from the base material, a function for preventing damage by increasing the surface hardness of the heat dissipation component, and a function for improving corrosion resistance.
  • the composition of the copper alloy sheet according to the present invention will be described separately for the case where Sn is not included and the case where Sn is included.
  • the composition of the copper alloy contains Fe: 0.07 to 0.7 mass%, P: 0.2 mass% or less, and the ratio of the Fe content [Fe] and the P content [P]. [Fe] / [P] is 2 to 5, with the balance being Cu and inevitable impurities.
  • Zn is contained in an amount of 1.5% by mass or less (not including 0% by mass), and / or Mn: 0.1% by mass or less (not including 0% by mass), Mg: 0.2 % By mass or less (not including 0% by mass), Si: 0.2% by mass or less (not including 0% by mass), Al: 0.2% by mass or less (not including 0% by mass), Cr: 0.00%.
  • 2 or more types can be contained 0.5% or less (excluding 0 mass%) in total.
  • the reason for adding each element will be described.
  • Fe forms a compound with P and has the effect of improving the strength and conductivity of the copper alloy sheet after aging treatment.
  • the Fe content is less than 0.07% by mass, the 0.2% yield strength after high-temperature heating and aging treatment is less than 100 MPa.
  • the conductivity after high-temperature heating and aging treatment is less than 50% IACS. Therefore, the Fe content is set to 0.07 to 0.7% by mass.
  • the lower limit of the Fe content is preferably 0.15% by mass, and the upper limit is preferably 0.65% by mass.
  • the Fe—P compound mainly precipitates when subjected to aging treatment without plastic working after solution treatment. In comparison, the precipitate of Fe alone is significantly reduced.
  • the P has an action of reducing the amount of oxygen contained in the copper alloy by a deoxidation action and preventing hydrogen embrittlement when the heat dissipation component is heated in a reducing atmosphere containing hydrogen.
  • the solid solution P is heated to the precipitation temperature to form an Fe—P compound to improve the strength, heat resistance, and conductivity of the copper alloy.
  • the P content exceeds 0.2% by mass, cracking occurs when the ingot is hot-rolled and subsequent processing becomes impossible, so the upper limit of the P content is 0.2% by mass. %.
  • the P content that does not contribute to precipitation is preferably as small as possible within a range in which hydrogen embrittlement can be prevented.
  • the ratio [Fe] / [P] when the Fe content (% by mass) is [Fe] and the P content (% by mass) is [P] is 2-5. Try to be within range. If [Fe] / [P] is less than 2, the amount of P that does not contribute to the formation of the Fe—P compound is increased, and if [Fe] / [P] exceeds 5, it is similarly dissolved. In any case, the conductivity of the copper alloy sheet after the aging treatment cannot be increased to 50% IACS or more. Further, when [Fe] / [P] is less than 2 or exceeds 5, Fe or P that does not contribute to the formation of the Fe—P compound increases, and the strength of the copper alloy sheet after the aging treatment is not sufficiently improved.
  • the lower limit of [Fe] / [P] is preferably 2.5, more preferably 3.0, and the upper limit of [Fe] / [P] is preferably 4.5, more preferably 4.0. .
  • Zn has an effect of improving the heat-resistant peelability of the solder of the copper alloy plate and the heat-resistant peelability of Sn plating, and thus is added as necessary.
  • soldering may be required, and Sn plating may be performed after manufacturing the heat dissipation component.
  • a copper alloy plate containing Zn is suitably used for manufacturing such a heat dissipation component.
  • the upper limit of the Zn content is preferably 0.7% by mass or less, and more preferably 0.5% by mass or less.
  • the Zn content is less than 0.01% by mass, it is insufficient for improving the heat-resistant peelability, and the Zn content is preferably 0.01% by mass or more.
  • the lower limit of the Zn content is more preferably 0.05% by mass and even more preferably 0.1% by mass.
  • Mn, Mg, Si, Al, Cr, Ti, and Zr have the effect of improving the strength and heat resistance of the copper alloy, one or more of these are added as necessary. Even if a small amount of Mn, Mg, Si, and Al is contained, the electrical conductivity of the copper alloy is lowered, so that the upper limit values are Mn: 0.1% by mass, Mg: 0.2% by mass, Si: 0.0. 2% by mass and Al: 0.2% by mass. Cr, Ti, and Zr easily form inclusions such as oxides and sulfides of several ⁇ m to several tens of ⁇ m, and cold rolling creates a gap between the inclusions and the base material. When it is present on the surface, it reduces the corrosion resistance of the copper alloy.
  • the upper limit values of Cr, Ti, and Zr are Cr: 0.2 mass%, Ti: 0.1 mass%, and Zr: 0.05 mass%.
  • the total content of these elements is 0.5% by mass or less (not including 0% by mass).
  • the lower limit of the total content of one or more of these elements is preferably 0.01% by mass, more preferably 0.02% by mass, and even more preferably 0.03% by mass.
  • the composition of the copper alloy is as follows: point A (0.1, 0.006), point B (0.5, 0.006), point C (0.05, 1.1), point shown in FIG. Fe and Sn within a range surrounded by D (0.05, 0.05) (including on the boundary line), P is contained in an amount of 0.2% by mass or less, and the balance is made of Cu and inevitable impurities.
  • the ratio [Fe] / [P] of the Fe content [Fe] and the P content [P] is 2 to 5.
  • Zn is contained in an amount of 1.5% by mass or less (not including 0% by mass), and / or Mn: 0.1% by mass or less (not including 0% by mass), Mg: 0.2 % By mass or less (not including 0% by mass), Si: 0.2% by mass or less (not including 0% by mass), Al: 0.2% by mass or less (not including 0% by mass), Cr: 0.00%.
  • Fe forms a compound with P, and has the effect
  • the content of Fe and Sn is within the range surrounded by points A, B, C and D shown in FIG. 1, the strength after aging treatment (0.2% proof stress) is 100 MPa or more and the conductivity is 45. % IACS or higher.
  • the lower limit of the Fe content is preferably 0.07% by mass, more preferably 0.15% by mass.
  • the upper limit value of Fe is determined depending on the Sn content, and is a value equal to or smaller than the line segment BC of FIG.
  • the copper alloy plate according to the present invention is manufactured, for example, by hot rolling an ingot and then repeating cold rolling and heat treatment (aging treatment) once or twice or more.
  • a copper alloy sheet produced using the copper alloy having the above composition under the following conditions has a 0.2% proof stress of 150 MPa or more, an elongation of 5% or more, and excellent bending workability.
  • after heating at 850 ° C. for 30 minutes it has a 0.2% yield strength of 40 MPa or more, and then an aging treatment, and then a 0.2% yield strength of 100 MPa or more and a conductivity of 50% IACS or more or 45% IACS or more.
  • Melting or casting can be performed by a normal method such as continuous casting or semi-continuous casting.
  • the ingot is preferably subjected to a homogenization treatment, and the homogenization treatment is preferably held for 30 minutes or more after the temperature inside the ingot reaches 800 ° C.
  • the holding time of the homogenization treatment is more preferably 1 hour or more, and further preferably 2 hours or more.
  • hot rolling is started at a temperature of 800 ° C. or higher.
  • the hot rolling is preferably finished at a temperature of 600 ° C. or higher and then rapidly cooled by a method such as water cooling.
  • the rapid cooling start temperature after hot rolling is lower than 600 ° C., coarse Fe—P precipitates are formed, the structure tends to be uneven, and the strength of the copper alloy plate (product plate) is lowered.
  • hot-rolled material is cold-rolled to product thickness and subjected to aging treatment
  • hot-rolled material is subjected to cold-rolling and aging treatment, and further cold-rolled to product thickness.
  • Low temperature annealing recovery of ductility
  • the aging treatment is performed under the condition of holding at a heating temperature of about 300 to 600 ° C. for 0.5 to 10 hours. When the heating temperature is less than 300 ° C., the amount of precipitation is small, and when it exceeds 600 ° C., the precipitate tends to be coarsened.
  • the lower limit of the heating temperature is preferably 350 ° C, and the upper limit is preferably 580 ° C.
  • the holding time for the aging treatment is appropriately selected depending on the heating temperature, and is carried out within the range of 0.5 to 10 hours. When the holding time is 0.5 hours or less, the precipitation is insufficient, and even if the holding time exceeds 10 hours, the amount of precipitation is saturated and the productivity is lowered.
  • the lower limit of the holding time is preferably 1 hour, more preferably 2 hours.
  • a copper alloy having a composition shown in Tables 1 to 4 (pure copper only in Comparative Example 13) was cast to produce ingots each having a thickness of 45 mm. Each ingot was subjected to a soaking treatment at 965 ° C. for 3 hours, followed by hot rolling to obtain a hot-rolled material having a plate thickness of 15 mm, and quenching (water cooling) from a temperature of 700 ° C. or higher. After polishing both sides of the hot-rolled material after quenching by 1 mm each, cold rough rolling to a target plate thickness of 0.6 mm, aging treatment held at 500 ° C. for 2 hours, then 50% finish cold rolling And a copper alloy plate having a thickness of 0.3 mm was produced.
  • each measurement test of conductivity, mechanical properties, bending workability, and solder wettability was performed in the following manner.
  • the obtained copper alloy plate was evacuated at room temperature, heated with Ar gas substitution, heated for 30 minutes after the plate temperature reached 850 ° C., and further cooled with water at 500 ° C.
  • Each test for electrical conductivity and mechanical properties was performed using samples heated for 2 hours (aging treatment) as test materials. The test results are shown in Tables 1 to 4.
  • the conductivity was measured by a four-terminal method using a double bridge in accordance with the nonferrous metal material conductivity measurement method defined in JIS-H0505.
  • the dimensions of the test piece are 15 mm wide and 300 mm long.
  • a JIS No. 5 tensile test piece was cut out from the test material so that the longitudinal direction was parallel to the rolling direction, and a tensile test was performed in accordance with JIS-Z2241 to measure the yield strength and elongation.
  • the yield strength is a tensile strength corresponding to a permanent elongation of 0.2%.
  • a square test piece having a length of 30 mm and a width of 30 mm was cut out from the test material, and its surface (rolled surface) was mirror-polished, followed by water 120 ⁇ 10 ⁇ 6 m 3 , hydrochloric acid 30 ⁇ 10 ⁇ 6 m 3 , chloride chloride It etched with the corrosive liquid which consists of 10 g of ferrous iron.
  • the etched plate surface was observed with an optical microscope (observation magnification: 100 to 400 times) and determined by the cutting method of JISH0501-1986.
  • the cutting direction was a direction perpendicular to the rolling direction.
  • the average crystal grain size was obtained at three locations for the same sample, and the average value at three locations (rounded to the nearest 0.1 ⁇ m) was taken as the average crystal grain size for that sample.
  • the measurement of the bending workability was carried out according to the W bending test method specified in JBMA-T307 standard of the copper elongation association.
  • the presence or absence of cracks in the bent portion was visually observed with a 100 ⁇ optical microscope.
  • solder wettability A strip-shaped test piece was collected from each test material, and the inactive flux was dip coated for 1 second, and then the solder wetting time was measured by the menisograph method.
  • the solder used was Sn-3 mass% Ag-0.5 mass% Cu maintained at 260 ⁇ 5 ° C., and the test was performed under the test conditions of an immersion speed of 25 mm / sec, an immersion depth of 5 mm, and an immersion time of 5 sec.
  • a solder wetting time of 2 seconds or less was evaluated as having excellent solder wettability. Except for Comparative Examples 10 and 24, the solder wetting time was 2 seconds or less.
  • the copper alloy sheets of Examples 1 to 17 shown in Table 1 have an alloy composition that satisfies the provisions of the present invention, and are heated at 850 ° C. for 30 minutes and then subjected to aging treatment (0.2% yield strength) of 100 MPa or more. And the electrical conductivity is 50% IACS or more.
  • the copper alloy plates of Comparative Examples 1 to 12 and the pure copper plate of Comparative Example 13 shown in Table 2 are inferior in some characteristics as shown below. Since the comparative example 1 has little Fe content, the intensity
  • Comparative Examples 7 and 8 since [Fe] / [P] is low, P that does not contribute to the precipitation of the Fe—P compound even after the aging treatment is dissolved, and the electrical conductivity after the aging treatment is low.
  • Comparative Example 9 since [Fe] / [P] is low, the Fe—P compound is hardly precipitated even after the aging treatment, and the strength is low.
  • Comparative Example 10 the Zn content is excessive, the electrical conductivity after the aging treatment is low, and the solder wettability is inferior.
  • Comparative Example 11 the content of other elements is excessive, and the electrical conductivity after aging treatment is low.
  • Comparative Example 13 is a conventional pure copper plate, which has high electrical conductivity but has low strength even after aging treatment.
  • the copper alloy plates of Examples 18 to 38 shown in Table 3 have an alloy composition that satisfies the provisions of the present invention, and are heated at 850 ° C. for 30 minutes and then subjected to aging treatment (0.2% yield strength) of 100 MPa or more. And the electrical conductivity is 45% IACS or higher.
  • the copper alloy sheets of Comparative Examples 14 to 24 shown in Table 4 are inferior in some characteristics as shown below.
  • Comparative Example 14 the content of Fe and Sn is out of the range of ABCD in FIG. 1 (the Fe content is small), so the strength after aging treatment is low.
  • Comparative Examples 15 to 17 the Fe and Sn contents are out of the range of ABCD in FIG. 1 (the Sn content is excessive), so the conductivity after the aging treatment is low.
  • the strength after aging treatment is low because the Fe and Sn contents are out of the range of ABCD in FIG. 1 (the Fe content is small).
  • Examples 1, 3, 19, and 24 and Comparative Examples 1, 5, 14, and 15 were evacuated at room temperature and then replaced with Ar gas and heated. Then, after the temperature of the plate material reaches 1000 ° C., it is heated for 30 minutes and then water-cooled, and the water-cooled material is further heated at 500 ° C. for 2 hours (aging treatment). Each measurement test of mechanical properties was performed by the method described in Example 1. The results are shown in Table 5.
  • Aspect 1 Fe: 0.07 to 0.7% by mass, P: 0.2% by mass or less, and the ratio [Fe] / [P] of Fe content [Fe] to P content [P] is 2
  • the balance consists of Cu and inevitable impurities, and after heating at 850 ° C. for 30 minutes and then water cooling, 0.2% proof stress after aging treatment is 100 MPa or more, conductivity is 50% IACS or more, and heat dissipation
  • a copper alloy sheet for a heat-radiating component characterized in that a part of the process for producing the component includes a process of heating to 650 ° C. or more and an aging treatment.
  • Aspect 2 Point A (0.1, 0.006), point B (0.5, 0.006), point C (0.05, 1.1), point D (0.05, 0.05) shown in FIG. ) Fe and Sn in the range enclosed (including the boundary line), and P: 0.2 mass% or less, the ratio [Fe] / [P] of the Fe content [Fe] and P content [P] P] is 2 to 5, the balance is made of Cu and inevitable impurities, and after heating at 850 ° C. for 30 minutes, water cooling, and then aging treatment, 0.2% proof stress is 100 MPa or more, and conductivity is 45% IACS.
  • a copper alloy plate for a heat radiating component characterized in that a part of the process for manufacturing the heat radiating component includes a process of heating to 650 ° C. or more and an aging treatment.
  • Aspect 3 Furthermore, Zn is 1.5 mass% or less (excluding 0 mass%), Zn is contained,
  • the copper alloy plate for heat radiating components described in the aspect 1 characterized by the above-mentioned.
  • Aspect 4 Furthermore, Mn: 0.1% by mass or less (not including 0% by mass), Mg: 0.2% by mass or less (not including 0% by mass), Si: 0.2% by mass or less (including 0% by mass) ), Al: 0.2% by mass or less (not including 0% by mass), Cr: 0.2% by mass or less (not including 0% by mass), Ti: 0.1% by mass or less (0% by mass) Not including) and Zr: 0.05% by mass or less (not including 0% by mass), including one or more in total of 0.5% by mass or less (not including 0% by mass)
  • Aspect 5 Furthermore, it contains 1.5 mass% or less (excluding 0 mass%) of Zn, The copper alloy plate for heat radiating components described in the aspect 2 characterized by the above-mentioned.
  • Aspect 6 Furthermore, Mn: 0.1% by mass or less (not including 0% by mass), Mg: 0.2% by mass or less (not including 0% by mass), Si: 0.2% by mass or less (including 0% by mass) ), Al: 0.2% by mass or less (not including 0% by mass), Cr: 0.2% by mass or less (not including 0% by mass), Ti: 0.1% by mass or less (0% by mass) Not including) and Zr: 0.05% by mass or less (not including 0% by mass), including one or more in total of 0.5% by mass or less (not including 0% by mass)
  • Aspect 7 The copper alloy for a heat-radiating component according to any one of aspects 1, 3 and 4, wherein the average crystal grain size of the plate surface measured in the plate material before heating at 850 ° C. for 30 minutes is 20 ⁇ m or less.
  • Aspect 8 The copper alloy for heat-radiating components according to any one of aspects 2, 5 and 6, wherein the average crystal grain size of the plate surface measured in the plate material before heating at 850 ° C. for 30 minutes is 20 ⁇ m or less.
  • Aspect 9 A copper alloy plate for a heat-dissipating part described in any one of aspects 1, 3, 4, or 7, wherein an Fe—P compound is deposited, and has a 0.2% proof stress of 100 MPa or more and an electric conductivity of 50% IACS or more.
  • Aspect 12 The heat dissipating component according to aspect 9 or 10, wherein a Ni coating layer is formed on at least a part of the outer surface.
  • the present application includes a Japanese patent application filed on March 23, 2015, Japanese Patent Application No. 2015-058957, and a Japanese patent application filed on October 12, 2015, Japanese Patent Application No. 2015-2015. Accompanied by priority claim with 2016655 as the basic application. Japanese Patent Application No. 2015-058957 and Japanese Patent Application No. 2015-201665 are incorporated herein by reference.

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Abstract

Provided is a copper alloy sheet, with which a heat dissipating component can be given sufficient strength and heat dissipation capacity after being manufactured, in cases where a process of heating to 650°C or more is included as part of a heat dissipating component manufacturing process. The copper alloy sheet for heat dissipating components comprises 0.07 to 0.7 mass% of Fe, 0.2 mass% or less of P, with the ratio of the Fe content [Fe] and the P content [P], or [Fe]/[P], being from 2 to 5, and a remainder of Cu and inevitable impurities. The 0.2% proof stress is no less than 100 Mpa and the conductivity is no less than 50% IACS, subsequent to heating for 30 minutes at 850°C followed by water cooling and then aging treatment. If the copper alloy includes Sn, the contents of Sn and Fe are set to be within the range surrounded by point A (0.1, 0.006), point B (0.5, 0.006), point C (0.05, 1.1), and point D (0.05, 0.05) shown in drawing.

Description

放熱部品用銅合金板及び放熱部品Copper alloy plate for heat dissipation parts and heat dissipation parts
 本発明は、放熱部品用銅合金板及び放熱部品に関する。 The present invention relates to a copper alloy plate for a heat dissipation component and a heat dissipation component.
 デスク型PC又はノート型PC等に搭載されるCPUの動作速度の高速化及び高密度化が急速に進展し、これらのCPUからの発熱量が一段と増大している。CPUの温度が一定以上の温度に上昇すると、誤作動又は熱暴走などの原因となるため、CPU等の半導体装置からの効果的な放熱は切実な問題となっている。
 半導体装置の熱を吸収し、大気中に放散させる放熱部品してヒートシンクが使われている。ヒートシンクには高熱伝導性が求められることから、素材として熱伝導率の大きい銅又はアルミニウムなどが用いられる。しかし、対流熱抵抗が、ヒートシンクの性能を制限しており、発熱量が増大する高機能電子部品の放熱要求を満たすことが難しくなってきている。
The speed of operation and the increase in density of CPUs mounted on desk-type PCs or notebook PCs are rapidly increasing, and the amount of heat generated from these CPUs is increasing further. When the temperature of the CPU rises to a certain level or more, it may cause malfunction or thermal runaway, so effective heat dissipation from a semiconductor device such as a CPU is a serious problem.
Heat sinks are used as heat dissipating parts that absorb the heat of semiconductor devices and dissipate them into the atmosphere. Since the heat sink is required to have high thermal conductivity, copper or aluminum having a high thermal conductivity is used as a material. However, the convective heat resistance limits the performance of the heat sink, and it has become difficult to satisfy the heat dissipation requirement of high-functional electronic components that increase the amount of heat generation.
 このため、より高い放熱性を有する放熱部品として、高い熱伝導性及び熱輸送能力を備える管状ヒートパイプ及び平面状ヒートパイプ(ベーパーチャンバ)が提案されている。ヒートパイプは、内部に封入した冷媒の蒸発(CPUからの吸熱)と凝縮(吸収した熱の放出)が循環的に行われることにより、ヒートシンクに比べて高い放熱特性を発揮する。また、ヒートパイプをヒートシンク又はファンといった放熱部品と組合せることにより、半導体装置の発熱問題を解決することが提案されている。 For this reason, tubular heat pipes and flat heat pipes (vapor chambers) having high heat conductivity and heat transport capability have been proposed as heat dissipating parts having higher heat dissipating properties. The heat pipe exhibits higher heat dissipation characteristics than the heat sink by cyclically performing evaporation (heat absorption from the CPU) and condensation (release of absorbed heat) of the refrigerant sealed inside. In addition, it has been proposed to solve the heat generation problem of a semiconductor device by combining a heat pipe with a heat dissipation component such as a heat sink or a fan.
 放熱板、ヒートシンク又はヒートパイプ等に用いられる放熱部品の素材として、導電率及び耐食性に優れる純銅製(無酸素銅:C1020)の板又は管が多用されている。成形加工性を確保するため、素材として軟質の焼鈍材(O材)又は1/4H調質材が用いられるが、後述する放熱部品の製造工程において、変形又は疵が発生しやすい、打抜き加工時にバリが出やすい又は打抜き金型が磨耗しやすい等の問題がある。一方、特許文献1及び2には、放熱部品の素材としてFe-P系の銅合金板が記載されている。 As a material for a heat radiating component used for a heat radiating plate, a heat sink or a heat pipe, a pure copper (oxygen-free copper: C1020) plate or tube having excellent conductivity and corrosion resistance is frequently used. In order to ensure molding processability, soft annealed material (O material) or 1 / 4H tempered material is used as a raw material. There are problems such as burrs being easily generated or punching dies being easily worn. On the other hand, Patent Documents 1 and 2 describe an Fe—P-based copper alloy plate as a material for a heat dissipation component.
 放熱板及びヒートシンクは、純銅板をプレス成形、打抜き加工、切削、穴開け加工及びエッチングなどにより所定形状に加工後、必要に応じてNiめっき又はSnめっきを行ってからはんだ、ろう又は接着剤等でCPU等の半導体装置と接合する。
 管状ヒートパイプ(特許文献3参照)は、銅粉末を管内に焼結してウィックを形成し、加熱脱ガス処理後、一端をろう付け封止し、真空又は減圧下で管内に冷媒を入れてからもう一方の端部をろう付け封止して製造する。
For heatsinks and heatsinks, pure copper plates are processed into a predetermined shape by press molding, punching, cutting, drilling, etching, etc., and then subjected to Ni plating or Sn plating as necessary before soldering, brazing or adhesives, etc. To join with a semiconductor device such as a CPU.
A tubular heat pipe (see Patent Document 3) is formed by sintering copper powder in a tube to form a wick, heat-degassing treatment, brazing and sealing one end, and putting a refrigerant in the tube under vacuum or reduced pressure. And the other end is brazed and sealed.
 平面状ヒートパイプ(特許文献4及び5参照)は、管状ヒートパイプの放熱性能を更に向上させたものである。平面状ヒートパイプとして、冷媒の凝縮と蒸発を効率的に行うために、管状ヒートパイプと同様に、内面に粗面化加工又は溝加工等を行ったものが提案されている。プレス成形、打抜き加工、切削又はエッチングなどの加工を行った上下2枚の純銅板を、ろう付け、拡散接合又は溶接等の方法により接合し、内部に冷媒を入れた後、ろう付け等の方法により封止する。接合工程で脱ガス処理が行われることがある。 The planar heat pipe (see Patent Documents 4 and 5) is a further improvement of the heat dissipation performance of the tubular heat pipe. As a flat heat pipe, in order to efficiently condense and evaporate the refrigerant, a pipe having a roughened surface or a groove formed on the inner surface has been proposed in the same manner as the tubular heat pipe. A method of brazing, etc. after joining two upper and lower pure copper plates that have undergone processing such as press molding, punching, cutting or etching, by brazing, diffusion bonding or welding, etc. Seal with. A degassing process may be performed in a joining process.
 また、平面状ヒートパイプとして、外面部材と、外面部材の内部に収容される内部部材とより構成されたものが提案されている。内部部材は、冷媒の凝縮、蒸発及び輸送を促進するために、外面部材の内部に一又は複数配置されるもので、種々の形状のフィン、突起、穴又はスリット等が加工されている。この形式の平面状ヒートパイプにおいても、内部部材を外面部材の内部に配置した後、ろう付け又は拡散接合等の方法により外面部材と内部部材を接合一体化し、冷媒を入れた後、ろう付け等の方法により封止する。 Further, as a planar heat pipe, one constituted by an outer member and an inner member accommodated in the outer member has been proposed. One or more internal members are arranged inside the outer surface member in order to promote the condensation, evaporation and transport of the refrigerant, and fins, protrusions, holes or slits of various shapes are processed. Also in this type of flat heat pipe, after the inner member is arranged inside the outer surface member, the outer surface member and the inner member are joined and integrated by a method such as brazing or diffusion joining, brazing, etc. It seals by the method of.
特開2003-277853号公報JP 2003-277853 A 特開2014-189816号公報JP 2014-189816 A 特開2008-232563号公報JP 2008-232563 A 特開2007-315754号公報JP 2007-315754 A 特開2014-134347号公報JP 2014-134347 A
 これらの放熱部品の製造工程において、放熱板及びヒートシンクは、はんだ付け又はろう付けの工程で200~700℃程度に加熱される。管状ヒートパイプ、平面状ヒートパイプは、焼結、脱ガス、りん銅ロウ(BCuP-2等)を用いたろう付け、拡散接合又は溶接などの工程で800~1000℃程度に加熱される。
 例えば、ヒートパイプの素材として純銅板を用いた場合、650℃以上の温度で加熱をしたときの軟化が激しい。また、急激な結晶粒の粗大化が発生する。このため、ヒートシンク若しくは半導体装置への取付け、又はPC筐体への組込み等の際に、製造したヒートパイプが変形しやすく、ヒートパイプ内部の構造が変化してしまい、また表面の凹凸が大きくなり、所期の放熱性能を発揮できなくなってしまう問題がある。また、このような変形を避けるには純銅板の厚さを厚くすればよいが、そうするとヒートパイプの質量、及び厚さが増大する。厚さが増大した場合、PC筐体内部の隙間が小さくなり、対流伝熱性能が低下する問題がある。
In the manufacturing process of these heat radiating components, the heat radiating plate and the heat sink are heated to about 200 to 700 ° C. in the soldering or brazing process. Tubular heat pipes and planar heat pipes are heated to about 800 to 1000 ° C. by processes such as sintering, degassing, brazing using phosphor copper brazing (BCuP-2 or the like), diffusion bonding or welding.
For example, when a pure copper plate is used as the material for the heat pipe, the softening is severe when heated at a temperature of 650 ° C. or higher. In addition, a rapid coarsening of crystal grains occurs. For this reason, the manufactured heat pipe is easily deformed when attached to a heat sink or a semiconductor device, or incorporated into a PC housing, the structure inside the heat pipe changes, and the surface unevenness increases. There is a problem that the desired heat dissipation performance cannot be exhibited. Moreover, in order to avoid such a deformation | transformation, what is necessary is just to thicken the thickness of a pure copper plate, but if it does so, the mass and thickness of a heat pipe will increase. When the thickness increases, there is a problem that the gap inside the PC casing is reduced and the convective heat transfer performance is lowered.
 また、特許文献1及び2に記載された銅合金板(Fe-P系)も、650℃以上の温度で加熱をすると軟化し、さらに純銅に比べて導電率が大きく低下する。このため、焼結、脱ガス、ろう付け又は拡散接合等の工程を経て例えば平面状ヒートパイプを製造した場合、同ヒートパイプの搬送及びハンドリング又は基盤への組込み工程等で容易に変形する。また、導電率が低下することで、ヒートパイプとしての所期の性能が出なくなる。 Also, the copper alloy plates (Fe—P type) described in Patent Documents 1 and 2 are softened when heated at a temperature of 650 ° C. or higher, and the conductivity is greatly reduced as compared with pure copper. For this reason, when, for example, a planar heat pipe is manufactured through processes such as sintering, degassing, brazing, or diffusion bonding, the heat pipe is easily deformed by a process of transporting and handling or assembling the heat pipe. Moreover, the expected performance as a heat pipe cannot be obtained due to the decrease in conductivity.
 本発明は、純銅又は銅合金板から放熱部品を製造するプロセスの一部に650℃以上の温度に加熱するプロセスが含まれる場合の上記問題点に鑑みてなされたもので、650℃以上の温度に加熱するプロセスを経て製造された放熱部品に、十分な強度と放熱性能を持たせることができる銅合金板を提供することを目的とする。 The present invention has been made in view of the above problems when a process of heating to a temperature of 650 ° C. or higher is included in a part of the process of manufacturing a heat dissipation component from pure copper or a copper alloy plate. An object of the present invention is to provide a copper alloy plate capable of giving sufficient heat resistance and heat dissipation performance to a heat dissipation component manufactured through a heating process.
 析出硬化型銅合金は、溶体化処理後、時効処理を行うことで、強度及び導電率が向上する。しかし、析出硬化型銅合金は、溶体化処理後、冷間で塑性加工を加えて析出サイトとなる塑性歪みを合金中に導入した後、時効処理を行うのでなければ、時効処理による強度及び導電率の向上効果が低い場合がある。
 ろう付け、拡散接合又は溶接等の加熱工程を経て製作されたベーパチャンバ等の放熱部品の場合、前記加熱工程後に塑性加工が加えられることはない。従って、前記放熱部品を析出強化型銅合金の板材から製作した場合に、溶体化処理に相当する上記加熱工程後、時効処理を施しても、強度及び導電率が十分向上しない場合がある。
 一方、本発明者らは、析出硬化型銅合金のうちCu-Fe-P系合金において、Fe、Pの組成範囲及びFe/P比を限定することにより、上記加熱工程後、塑性加工を加えることなく時効処理した場合でも、放熱部品の強度及び導電率が大きく向上することを見出し、本発明に到達した。
A precipitation hardening type copper alloy improves strength and conductivity by performing an aging treatment after the solution treatment. However, the precipitation hardening type copper alloy, after solution treatment, after applying plastic working in the cold and introducing the plastic strain that becomes the precipitation site into the alloy, if not aging treatment, strength and conductivity by aging treatment The rate improvement effect may be low.
In the case of a heat radiating component such as a vapor chamber manufactured through a heating process such as brazing, diffusion bonding, or welding, plastic processing is not applied after the heating process. Therefore, when the heat-radiating component is manufactured from a precipitation-strengthening-type copper alloy plate, the strength and conductivity may not be sufficiently improved even if an aging treatment is performed after the heating step corresponding to the solution treatment.
On the other hand, the present inventors apply plastic working after the heating step by limiting the composition range of Fe and P and the Fe / P ratio in the Cu—Fe—P alloy among precipitation hardening type copper alloys. The present inventors have found that the strength and conductivity of the heat dissipating parts are greatly improved even when the aging treatment is performed without any aging treatment, and the present invention has been achieved.
 本発明に係る放熱部品用銅合金板は、放熱部品を製造するプロセスの一部として、650℃以上に加熱するプロセスと時効処理が含まれる場合に用いられ、Fe:0.07~0.7質量%、P:0.2質量%以下を含有し、Feの含有量(質量%)を[Fe]とし、Pの含有量(質量%)を[P]としたときの両者の比[Fe]/[P]が2~5であり、残部がCu及び不可避不純物からなり、850℃で30分加熱後水冷し、次いで時効処理した後の0.2%耐力が100MPa以上、導電率が50%IACS以上である。なお、Feの含有量[Fe]とPの含有量[P]はいずれも質量%である。 The copper alloy plate for heat dissipation component according to the present invention is used when a process of heating to 650 ° C. or more and an aging treatment are included as part of the process of manufacturing the heat dissipation component, and Fe: 0.07 to 0.7 % By mass, P: 0.2% by mass or less, Fe content (% by mass) is [Fe], and P content (% by mass) is [P]. ] / [P] is 2 to 5, the remainder is made of Cu and inevitable impurities, heated at 850 ° C. for 30 minutes, then water-cooled, then 0.2% proof stress after aging treatment is 100 MPa or more, conductivity is 50 % IACS or higher. The Fe content [Fe] and the P content [P] are both mass%.
 本発明に係る放熱部品用銅合金板は、合金元素としてさらにSnを含むことができる。この場合、銅合金板は、図1に示す点A(0.1,0.006)、点B(0.5,0.006)、点C(0.05,1.1)、点D(0.05,0.05)で囲まれる範囲内(境界線上を含む)のFe及びSnを含む。Pの含有量と[Fe]/[P]は上記と同じである。この銅合金を、850℃で30分加熱後水冷し、次いで時効処理した後の0.2%耐力は100MPa以上、導電率は45%IACS以上である。
 上記銅合金板は、必要に応じて、合金元素としてさらにZnを1.5質量%以下(0質量%を含まず)含有し、又は/及び、Mn:0.1質量%以下(0質量%を含まず)、Mg:0.2質量%以下(0質量%を含まず)、Si:0.2質量%以下(0質量%を含まず)、Al:0.2質量%以下(0質量%を含まず)、Cr:0.2質量%以下(0質量%を含まず)、Ti:0.1質量%以下(0質量%を含まず)及びZr:0.05質量%以下(0質量%を含まず)のうち1種又は2種以上を合計で0.5%以下(0質量%を含まず)含有することができる。
The copper alloy plate for heat dissipation components according to the present invention can further contain Sn as an alloy element. In this case, the copper alloy plate has points A (0.1, 0.006), B (0.5, 0.006), C (0.05, 1.1), D shown in FIG. Fe and Sn within the range surrounded by (0.05, 0.05) (including on the boundary line). The P content and [Fe] / [P] are the same as above. This copper alloy is heated at 850 ° C. for 30 minutes, then water-cooled, and after aging treatment, the 0.2% proof stress is 100 MPa or more, and the conductivity is 45% IACS or more.
The copper alloy sheet further contains 1.5 mass% or less (not including 0 mass%) of Zn as an alloy element, if necessary, and / or Mn: 0.1 mass% or less (0 mass%) Mg: 0.2 mass% or less (not including 0 mass%), Si: 0.2 mass% or less (not including 0 mass%), Al: 0.2 mass% or less (0 mass) %), Cr: 0.2 mass% or less (not including 0 mass%), Ti: 0.1 mass% or less (not including 0 mass%) and Zr: 0.05 mass% or less (0 1 type or 2 types or more can be contained in a total of 0.5% or less (excluding 0 mass%).
 本発明に係る銅合金板は、放熱部品を製造するプロセスの一部として、650℃以上に加熱するプロセスと時効処理が含まれる場合に使用される。つまり、本発明に係る銅合金板を用いて製造した放熱部品は、650℃以上に高温加熱後時効処理され、強度が向上している。
 本発明に係る銅合金板は、850℃に30分加熱し、次いで時効処理を行ったとき、0.2%耐力が100MPa以上、導電率が50%IACS以上(Snを含まない場合)又は45%IACS以上(Snを含む場合)である。本発明に係る銅合金板は、時効処理後の強度が高いため、この銅合金板を用いて製造したヒートパイプ等の放熱部品を、ヒートシンク若しくは半導体装置へ取り付け、又はPC筐体等に組み込む際に、該放熱部品が変形しにくい。また、本発明に係る銅合金板は、導電率が純銅板より低いが、時効処理後の強度が高いため薄肉化でき、放熱性能の点で導電率の低下分を補うことができる。
The copper alloy plate according to the present invention is used when a process of heating to 650 ° C. or more and an aging treatment are included as part of the process of manufacturing a heat dissipation component. That is, the heat radiating component manufactured using the copper alloy plate according to the present invention is subjected to aging treatment after high-temperature heating to 650 ° C. or higher, and the strength is improved.
When the copper alloy sheet according to the present invention is heated to 850 ° C. for 30 minutes and then subjected to an aging treatment, the 0.2% proof stress is 100 MPa or more, and the conductivity is 50% IACS or more (when Sn is not included) or 45 % IACS or more (when Sn is included). Since the copper alloy plate according to the present invention has high strength after aging treatment, when a heat-radiating component such as a heat pipe manufactured using this copper alloy plate is attached to a heat sink or a semiconductor device, or incorporated into a PC housing or the like. In addition, the heat radiating component is not easily deformed. In addition, the copper alloy plate according to the present invention has a conductivity lower than that of a pure copper plate, but since the strength after the aging treatment is high, the copper alloy plate can be thinned and can compensate for a decrease in conductivity in terms of heat dissipation performance.
本発明に係る銅合金板の組成のうちFeとSnの範囲を示す図である。It is a figure which shows the range of Fe and Sn among the compositions of the copper alloy plate which concerns on this invention.
 以下、本発明に係る放熱部品用銅合金板について、より詳細に説明する。
 本発明に係る銅合金板は、プレス成形、打抜き加工、切削又はエッチングなどにより所定形状に加工され、高温加熱(脱ガス、接合(ろう付け、拡散接合又は溶接)又は焼結等のための加熱)を経て、放熱部品に仕上げられる。放熱部品の種類又は製造方法により前記高温加熱の加熱条件が異なるが、本発明では、前記高温加熱を650℃~1050℃程度で行う場合を想定している。本発明に係る銅合金板は後述する組成のFe-P系銅合金からなり、前記温度範囲内に加熱すると、加熱前に析出していたFe-P化合物又はFe等の少なくとも一部が固溶し、結晶粒が成長し、軟化及び導電率の低下が生じる。
Hereinafter, the copper alloy plate for heat dissipation component according to the present invention will be described in more detail.
The copper alloy sheet according to the present invention is processed into a predetermined shape by press molding, punching, cutting or etching, and heated for high temperature heating (degassing, bonding (brazing, diffusion bonding or welding) or sintering). ) To finish heat dissipation parts. Although the heating conditions for the high-temperature heating differ depending on the type of heat-radiating component or the manufacturing method, the present invention assumes a case where the high-temperature heating is performed at about 650 ° C. to 1050 ° C. The copper alloy plate according to the present invention is made of an Fe—P based copper alloy having the composition described later, and when heated within the above temperature range, at least a part of the Fe—P compound or Fe, etc. precipitated before heating is dissolved. Then, crystal grains grow, and softening and conductivity decrease occur.
 本発明に係る銅合金板は、850℃で30分加熱後水冷し、次いで時効処理した後の強度(0.2%耐力)が100MPa以上、導電率が50%IACS以上又は45%IACS以上である。850℃で30分の加熱は、放熱部品の製造における前記高温加熱のプロセスを想定した加熱条件である。本発明に係る銅合金板をこの条件で高温加熱すると、加熱前に析出していたFe-P化合物又はFe等が固溶し、結晶粒が成長し、軟化、及び導電率の低下が生じる。次いで前記銅合金板を時効処理すると、微細なFe-P化合物、Fe等が析出する。これにより、前記高温加熱により低下した強度及び導電率が顕著に改善する。 The copper alloy plate according to the present invention is heated at 850 ° C. for 30 minutes, then water-cooled, and then subjected to an aging treatment (strength (0.2% yield strength)) of 100 MPa or more, and conductivity of 50% IACS or more or 45% IACS or more. is there. Heating at 850 ° C. for 30 minutes is a heating condition that assumes the above-described high-temperature heating process in the manufacture of a heat dissipation component. When the copper alloy plate according to the present invention is heated at a high temperature under these conditions, the Fe—P compound or Fe or the like deposited before heating is dissolved, crystal grains grow, softening, and conductivity decrease. Next, when the copper alloy plate is subjected to an aging treatment, fine Fe—P compounds, Fe and the like are precipitated. Thereby, the intensity | strength and electrical conductivity which were reduced by the said high temperature heating improve notably.
 前記時効処理は、(a)高温加熱後の冷却工程中に析出温度範囲に一定時間保持する、(b)高温加熱後室温まで冷却し、その後析出温度範囲に再加熱して一定時間保持する、(c)前記(a)の工程後、析出温度範囲に再加熱して一定時間保持する、等の方法で実施することができる。
 具体的な時効処理条件として、350~600℃の温度範囲で5分~10時間保持する条件が挙げられる。強度の向上を優先するときは微細なFe-P析出物が生成する温度-時間条件を、導電率の向上を優先するときは固溶するFe及びPが減少する過時効気味の温度-時間条件を、適宜選定すればよい。
The aging treatment is (a) maintained for a certain time in the precipitation temperature range during the cooling step after high-temperature heating, (b) cooled to room temperature after high-temperature heating, and then reheated to the precipitation temperature range and maintained for a certain time. (C) After the step (a), it can be carried out by a method such as reheating to the precipitation temperature range and holding for a certain period of time.
Specific aging treatment conditions include a condition of holding at a temperature range of 350 to 600 ° C. for 5 minutes to 10 hours. When priority is given to improving the strength, the temperature-time condition under which fine Fe-P precipitates are formed. When priority is given to improving the conductivity, the temperature-time condition is such that Fe and P that are dissolved in the solution are reduced. May be selected as appropriate.
 時効処理後の銅合金板は、高温加熱後の純銅板に比べて導電率は低いが、強度は純銅板に比べて顕著に高くなる。この効果を得るため、本発明に係る銅合金板を用いて製造したヒートパイプ等の放熱部品は、高温加熱後時効処理される。時効処理条件は、前記のとおりである。時効処理後の放熱部品(銅合金板)は強度が高く、ヒートシンク若しくは半導体装置へ取り付け、又はPC筐体等に組み込む際に、該放熱部品の変形を防止できる。また、本発明に係る銅合金板(時効処理後)は、純銅板に比べて強度が高いため、薄肉化(0.1~1.0mm厚)することができ、そのことにより放熱部品の放熱性能を高め、純銅板と比べた場合の導電率の低下分を補うことができる。
 なお、本発明に係る銅合金板は、高温加熱の温度が850℃未満(650℃以上)又は850℃超(1050℃以下)であっても、時効処理後に、100MPa以上の0.2%耐力、及び50%IACS以上又は45%IACS以上の導電率を達成できる。
The copper alloy plate after the aging treatment has a lower electrical conductivity than the pure copper plate after high-temperature heating, but the strength is significantly higher than that of the pure copper plate. In order to acquire this effect, heat dissipation parts, such as a heat pipe manufactured using the copper alloy board concerning the present invention, are subjected to aging treatment after high temperature heating. The aging treatment conditions are as described above. The heat-dissipating component (copper alloy plate) after the aging treatment has high strength and can prevent deformation of the heat-dissipating component when it is attached to a heat sink or a semiconductor device or incorporated in a PC housing or the like. In addition, the copper alloy plate according to the present invention (after aging treatment) has a higher strength than that of a pure copper plate, and therefore can be thinned (0.1 to 1.0 mm thick). The performance can be enhanced and the decrease in conductivity when compared with a pure copper plate can be compensated.
Note that the copper alloy plate according to the present invention has a 0.2% yield strength of 100 MPa or more after aging treatment even when the temperature of high-temperature heating is less than 850 ° C. (650 ° C. or more) or more than 850 ° C. (1050 ° C. or less). And conductivity of 50% IACS or higher or 45% IACS or higher.
 本発明に係る銅合金板は、650℃以上の温度に高温加熱される前に、プレス成形、打抜き加工、切削又はエッチングなどにより、放熱部品の部材に加工される。銅合金板は、前記加工に際しての搬送及びハンドリングにおいて容易に変形しない強度を有し、前記加工が支障なく実行できる機械的特性を有することが好ましい。より具体的には、本発明に係る銅合金板は、0.2%耐力150MPa以上、伸び5%以上、平均結晶粒径20μm以下、及び優れた曲げ加工性(後述する実施例参照)を有することが好ましい。以上の特性を満たしていれば、銅合金板の調質は問題にならない。例えば溶体化処理材、時効処理上り材、溶体化処理材を冷間圧延したもの又は時効処理上り材を冷間圧延したものなど、いずれも使用可能である。
 平均結晶粒径が20μmを超えると、放熱部品に加工するときの加工(プレス成形、曲げ加工、打抜き加工、切削、エッチングなど)により、板表面の肌荒れ、打抜き若しくは切削加工によるばりの発生又はエッチングによる寸法精度の低下などの問題が発生することがある。また、その後の650℃以上の温度に高温加熱により結晶粒が更に粗大化し、放熱部品としての平坦性が低下する。したがって、650℃以上の温度に高温加熱される前の板材表面で測定した平均結晶粒径は20μm以下であることが好ましく、15μm以下であることがさらに好ましい。
The copper alloy plate according to the present invention is processed into a member of a heat dissipation component by press molding, punching, cutting, etching, or the like before being heated to a temperature of 650 ° C. or higher. It is preferable that the copper alloy plate has a strength that does not easily deform during conveyance and handling during the processing, and has mechanical characteristics that allow the processing to be performed without hindrance. More specifically, the copper alloy sheet according to the present invention has a 0.2% proof stress of 150 MPa or more, an elongation of 5% or more, an average crystal grain size of 20 μm or less, and excellent bending workability (see Examples described later). It is preferable. If the above characteristics are satisfied, the tempering of the copper alloy sheet is not a problem. For example, any of a solution treated material, an aging treated up material, a material obtained by cold rolling a solution treated material or a material obtained by cold rolling an aging treated up material can be used.
When the average crystal grain size exceeds 20 μm, roughing of the surface of the plate due to processing (press forming, bending processing, punching processing, cutting, etching, etc.) when processing into heat-radiating parts, generation of burrs or etching due to punching or cutting processing Problems such as a decrease in dimensional accuracy may occur. Further, the crystal grains are further coarsened by high-temperature heating to a temperature of 650 ° C. or higher thereafter, and flatness as a heat dissipation component is lowered. Therefore, the average crystal grain size measured on the surface of the plate before being heated at a high temperature to 650 ° C. or higher is preferably 20 μm or less, and more preferably 15 μm or less.
 先に述べたとおり、本発明に係る銅合金板を加工して製造した放熱部品は、650℃以上の温度に高温加熱すると軟化する。高温加熱後の放熱部品は、さらに時効処理を施す際の搬送及びハンドリングにおいて容易に変形しない強度を有することが好ましい。そのためには、850℃で30分加熱後水冷した段階で、40MPa以上の0.2%耐力を有することが好ましい。 As described above, the heat dissipation component manufactured by processing the copper alloy plate according to the present invention softens when heated to a temperature of 650 ° C. or higher. It is preferable that the heat dissipating component after high-temperature heating has a strength that does not easily deform during conveyance and handling when performing an aging treatment. For that purpose, it is preferable to have a 0.2% yield strength of 40 MPa or more at the stage of heating at 850 ° C. for 30 minutes and then water cooling.
 本発明に係る銅合金板を用いて製造された放熱部品は、時効処理を受けた後、必要に応じて、耐食性及びはんだ付け性の向上を主目的として、少なくとも外表面の一部にSn被覆層が形成される。Sn被覆層には、電気めっき又は無電解めっき、あるいはこれらのめっき後、Snの融点以下又は融点以上に加熱して形成されたものが含まれる。Sn被覆層には、Sn金属とSn合金が含まれ、Sn合金としては、Sn以外に合金元素としてBi,Ag,Cu,Ni,In及びZnのうち1種以上を合計で5質量%以下含むものが挙げられる。 The heat-radiating component manufactured using the copper alloy plate according to the present invention is subjected to aging treatment, and if necessary, at least a part of the outer surface is coated with Sn for the purpose of improving corrosion resistance and solderability. A layer is formed. The Sn coating layer includes electroplating or electroless plating, or those formed by heating to a melting point of Sn or lower or higher than the melting point of Sn. The Sn coating layer includes Sn metal and an Sn alloy, and the Sn alloy includes one or more of Bi, Ag, Cu, Ni, In, and Zn as alloy elements in addition to Sn in a total amount of 5% by mass or less. Things.
 Sn被覆層の下に、Ni,Co又はFe等の下地めっきを形成することができる。これらの下地めっきは、母材からのCu又は合金元素の拡散を防止するバリアとしての機能、及び放熱部品の表面硬さを大きくすることによる傷つき防止の機能を有する。前記下地めっきの上にCuをめっきし、さらにSnをめっき後、Snの融点以下又は融点以上に加熱する熱処理を行ってCu-Sn合金層を形成し、下地めっき、Cu-Sn合金層及びSn被覆層の3層構成とすることもできる。Cu-Sn合金層は、母材からのCu又は合金元素の拡散を防止するバリアとしての機能、及び放熱部品の表面硬さを大きくすることによる傷つき防止の機能を有する。 A base plating such as Ni, Co or Fe can be formed under the Sn coating layer. These undercoats have a function as a barrier for preventing the diffusion of Cu or alloy elements from the base material and a function for preventing damage by increasing the surface hardness of the heat dissipation component. A Cu-Sn alloy layer is formed by plating Cu on the base plating, further plating Sn, and then performing a heat treatment to heat to a temperature lower than or higher than the melting point of Sn to form a Cu-Sn alloy layer and Sn A three-layer structure of the coating layer can also be used. The Cu—Sn alloy layer has a function as a barrier for preventing diffusion of Cu or an alloy element from the base material and a function for preventing damage by increasing the surface hardness of the heat dissipation component.
 また、本発明に係る銅合金板を用いて製造された放熱部品は、時効処理を受けた後、必要に応じて、少なくとも外表面の一部にNi被覆層が形成される。Ni被覆層は、母材からのCu又は合金元素の拡散を防止するバリアとしての機能、放熱部品の表面硬さを大きくすることによる傷つき防止の機能、及び耐食性を向上させる機能を有する。 Further, after the heat dissipation component manufactured using the copper alloy plate according to the present invention is subjected to an aging treatment, a Ni coating layer is formed on at least a part of the outer surface as necessary. The Ni coating layer has a function as a barrier for preventing the diffusion of Cu or an alloy element from the base material, a function for preventing damage by increasing the surface hardness of the heat dissipation component, and a function for improving corrosion resistance.
 次に本発明に係る銅合金板の組成について、Snを含まない場合とSnを含む場合に分けて説明する。
(銅合金がSnを含まない場合)
 この場合、銅合金の組成は、Fe:0.07~0.7質量%、P:0.2質量%以下を含有し、Feの含有量[Fe]とPの含有量[P]の比[Fe]/[P]が2~5であり、残部がCu及び不可避不純物からなる。必要に応じて、Znを1.5質量%以下(0質量%を含まず)含有し、又は/及び、Mn:0.1質量%以下(0質量%を含まず)、Mg:0.2質量%以下(0質量%を含まず)、Si:0.2質量%以下(0質量%を含まず)、Al:0.2質量%以下(0質量%を含まず)、Cr:0.2質量%以下(0質量%を含まず)、Ti:0.1質量%以下(0質量%を含まず)及びZr:0.05質量%以下(0質量%を含まず)のうち1種又は2種以上を合計で0.5%以下(0質量%を含まず)含有することができる。以下、各元素の添加理由について説明する。
Next, the composition of the copper alloy sheet according to the present invention will be described separately for the case where Sn is not included and the case where Sn is included.
(When the copper alloy does not contain Sn)
In this case, the composition of the copper alloy contains Fe: 0.07 to 0.7 mass%, P: 0.2 mass% or less, and the ratio of the Fe content [Fe] and the P content [P]. [Fe] / [P] is 2 to 5, with the balance being Cu and inevitable impurities. If necessary, Zn is contained in an amount of 1.5% by mass or less (not including 0% by mass), and / or Mn: 0.1% by mass or less (not including 0% by mass), Mg: 0.2 % By mass or less (not including 0% by mass), Si: 0.2% by mass or less (not including 0% by mass), Al: 0.2% by mass or less (not including 0% by mass), Cr: 0.00%. One of 2% by mass or less (not including 0% by mass), Ti: 0.1% by mass or less (not including 0% by mass) and Zr: 0.05% by mass or less (not including 0% by mass) Or 2 or more types can be contained 0.5% or less (excluding 0 mass%) in total. Hereinafter, the reason for adding each element will be described.
 FeはPと化合物を形成し、時効処理後の銅合金板の強度及び導電率を向上させる作用を有する。しかし、Fe含有量が0.07質量%未満では、高温加熱及び時効処理後の0.2%耐力が100MPa未満となる。一方、Fe含有量が0.7質量%を超えると、高温加熱及び時効処理後の導電率が50%IACS未満となる。従って、Fe含有量は0.07~0.7質量%とする。Fe含有量の下限は好ましくは0.15質量%であり、上限は好ましくは0.65質量%である。本発明に係る銅合金板のFe含有量の範囲においては、溶体化処理後、塑性加工せずに時効処理した場合、主にFe-P化合物が析出する。それに比べ、Fe単体の析出物は大幅に少なくなる。 Fe forms a compound with P and has the effect of improving the strength and conductivity of the copper alloy sheet after aging treatment. However, if the Fe content is less than 0.07% by mass, the 0.2% yield strength after high-temperature heating and aging treatment is less than 100 MPa. On the other hand, if the Fe content exceeds 0.7% by mass, the conductivity after high-temperature heating and aging treatment is less than 50% IACS. Therefore, the Fe content is set to 0.07 to 0.7% by mass. The lower limit of the Fe content is preferably 0.15% by mass, and the upper limit is preferably 0.65% by mass. In the range of the Fe content of the copper alloy sheet according to the present invention, the Fe—P compound mainly precipitates when subjected to aging treatment without plastic working after solution treatment. In comparison, the precipitate of Fe alone is significantly reduced.
 Pは、脱酸作用により銅合金に含まれる酸素量を低減し、放熱部品を水素を含む還元雰囲気で加熱したときの水素脆性を防止する作用を有する。また、固溶したPは析出温度に加熱することにより、Fe-P化合物を形成して銅合金の強度、耐熱性、及び導電率を向上させる。しかし、Pの含有量が0.2質量%を超えると、鋳塊を熱間圧延するときに割れが発生し、その後の加工ができなくなることから、P含有量の上限値は0.2質量%とする。
 上記作用のため、Pの含有量はある程度必要とされるが、その一方で、析出に寄与しないPの含有量は、水素脆性を防止できる範囲でなるべく少ないことが好ましい。この点から、Feの含有量(質量%)を[Fe]とし、Pの含有量(質量%)を[P]としたときの両者の比[Fe]/[P]が、2~5の範囲内となるようにする。[Fe]/[P]が2未満では、Fe-P化合物の形成に寄与せず固溶するPの量が多くなり、[Fe]/[P]が5を超えると、同様に固溶するFeの量が多くなり、いずれにしても時効処理後の銅合金板の導電率を50%IACS以上にできない。また、[Fe]/[P]が2未満又は5を超える場合、Fe-P化合物の形成に寄与しないFe又はPが多くなり、銅合金板の時効処理後の強度が十分向上しない。[Fe]/[P]の下限値は、好ましくは2.5、より好ましくは3.0、[Fe]/[P]の上限値は好ましくは4.5、より好ましくは4.0である。
P has an action of reducing the amount of oxygen contained in the copper alloy by a deoxidation action and preventing hydrogen embrittlement when the heat dissipation component is heated in a reducing atmosphere containing hydrogen. The solid solution P is heated to the precipitation temperature to form an Fe—P compound to improve the strength, heat resistance, and conductivity of the copper alloy. However, if the P content exceeds 0.2% by mass, cracking occurs when the ingot is hot-rolled and subsequent processing becomes impossible, so the upper limit of the P content is 0.2% by mass. %.
Although the P content is required to some extent due to the above action, on the other hand, the P content that does not contribute to precipitation is preferably as small as possible within a range in which hydrogen embrittlement can be prevented. From this point, the ratio [Fe] / [P] when the Fe content (% by mass) is [Fe] and the P content (% by mass) is [P] is 2-5. Try to be within range. If [Fe] / [P] is less than 2, the amount of P that does not contribute to the formation of the Fe—P compound is increased, and if [Fe] / [P] exceeds 5, it is similarly dissolved. In any case, the conductivity of the copper alloy sheet after the aging treatment cannot be increased to 50% IACS or more. Further, when [Fe] / [P] is less than 2 or exceeds 5, Fe or P that does not contribute to the formation of the Fe—P compound increases, and the strength of the copper alloy sheet after the aging treatment is not sufficiently improved. The lower limit of [Fe] / [P] is preferably 2.5, more preferably 3.0, and the upper limit of [Fe] / [P] is preferably 4.5, more preferably 4.0. .
 Znは、銅合金板のはんだの耐熱剥離性及びSnめっきの耐熱剥離性を改善する作用を有するため、必要に応じて添加される。放熱部品を半導体装置へ組み込むとき、はんだ付けが必要な場合があり、また、放熱部品を製造後、Snめっきを行う場合がある。このような放熱部品の製造に、Znを含有する銅合金板が好適に用いられる。しかし、Znの含有量が1.5質量%を超えると、はんだ濡れ性が低下し、導電率も低下するため、Znの含有量は1.5質量%以下とする。Znの含有量の上限値は0.7質量%以下が好ましく、0.5質量%以下がより好ましい。一方、Zn含有量が0.01質量%未満では、耐熱剥離性の改善には不十分であり、Znの含有量は0.01質量%以上であることが好ましい。Zn含有量の下限値は0.05質量%がより好ましく、0.1質量%がさらに好ましい。 Zn has an effect of improving the heat-resistant peelability of the solder of the copper alloy plate and the heat-resistant peelability of Sn plating, and thus is added as necessary. When incorporating a heat dissipation component into a semiconductor device, soldering may be required, and Sn plating may be performed after manufacturing the heat dissipation component. A copper alloy plate containing Zn is suitably used for manufacturing such a heat dissipation component. However, if the Zn content exceeds 1.5% by mass, the solder wettability decreases and the electrical conductivity also decreases, so the Zn content is set to 1.5% by mass or less. The upper limit of the Zn content is preferably 0.7% by mass or less, and more preferably 0.5% by mass or less. On the other hand, if the Zn content is less than 0.01% by mass, it is insufficient for improving the heat-resistant peelability, and the Zn content is preferably 0.01% by mass or more. The lower limit of the Zn content is more preferably 0.05% by mass and even more preferably 0.1% by mass.
 Mn、Mg、Si、Al、Cr、Ti、Zrは、銅合金の強度及び耐熱性を向上させる作用を有するため、これらの1種又は2種以上が必要に応じて添加される。Mn、Mg、Si及びAlは、少量含有させても銅合金の導電率を低下させることから、それぞれ上限値を、Mn:0.1質量%、Mg:0.2質量%、Si:0.2質量%及びAl:0.2質量%とする。Cr、Ti及びZrは、数μm~数10μm程度の酸化物系、硫化物系などの介在物を形成しやすく、冷間圧延により前記介在物と母材の間に隙間ができ、前記介在物が表面に存在したとき銅合金の耐食性を低下させる。従って、Cr、Ti及びZrの上限値は、Cr:0.2質量%、Ti:0.1質量%及びZr:0.05質量%とする。また、Mn、Mg、Si、Al、Cr、Ti及びZrのうち複数種類の元素が銅合金に含まれ、その合計含有量が0.5質量%を超えると、銅合金の導電率が低下する。従って、これらの元素の合計含有量は0.5質量%以下(0質量%を含まず)とする。一方、これらの元素の1種又は2種以上の合計含有量の下限値は、好ましくは0.01質量%、より好ましくは0.02質量%、さらに好ましくは0.03質量%である。 Since Mn, Mg, Si, Al, Cr, Ti, and Zr have the effect of improving the strength and heat resistance of the copper alloy, one or more of these are added as necessary. Even if a small amount of Mn, Mg, Si, and Al is contained, the electrical conductivity of the copper alloy is lowered, so that the upper limit values are Mn: 0.1% by mass, Mg: 0.2% by mass, Si: 0.0. 2% by mass and Al: 0.2% by mass. Cr, Ti, and Zr easily form inclusions such as oxides and sulfides of several μm to several tens of μm, and cold rolling creates a gap between the inclusions and the base material. When it is present on the surface, it reduces the corrosion resistance of the copper alloy. Therefore, the upper limit values of Cr, Ti, and Zr are Cr: 0.2 mass%, Ti: 0.1 mass%, and Zr: 0.05 mass%. Moreover, when multiple types of elements are contained in a copper alloy among Mn, Mg, Si, Al, Cr, Ti, and Zr and the total content exceeds 0.5 mass%, the electrical conductivity of the copper alloy decreases. . Therefore, the total content of these elements is 0.5% by mass or less (not including 0% by mass). On the other hand, the lower limit of the total content of one or more of these elements is preferably 0.01% by mass, more preferably 0.02% by mass, and even more preferably 0.03% by mass.
(銅合金がSnを含む場合)
 この場合、銅合金の組成は、図1に示す点A(0.1,0.006)、点B(0.5,0.006)、点C(0.05,1.1)、点D(0.05,0.05)で囲まれる範囲内(境界線上を含む)のFe及びSnと、Pを0.2質量%以下含み、残部がCu及び不可避不純物からなる。Feの含有量[Fe]とPの含有量[P]の比[Fe]/[P]が2~5とされる。必要に応じて、Znを1.5質量%以下(0質量%を含まず)含有し、又は/及び、Mn:0.1質量%以下(0質量%を含まず)、Mg:0.2質量%以下(0質量%を含まず)、Si:0.2質量%以下(0質量%を含まず)、Al:0.2質量%以下(0質量%を含まず)、Cr:0.2質量%以下(0質量%を含まず)、Ti:0.1質量%以下(0質量%を含まず)及びZr:0.05質量%以下(0質量%を含まず)のうち1種又は2種以上を合計で0.5質量%以下(0質量%を含まず)含有する。
(When the copper alloy contains Sn)
In this case, the composition of the copper alloy is as follows: point A (0.1, 0.006), point B (0.5, 0.006), point C (0.05, 1.1), point shown in FIG. Fe and Sn within a range surrounded by D (0.05, 0.05) (including on the boundary line), P is contained in an amount of 0.2% by mass or less, and the balance is made of Cu and inevitable impurities. The ratio [Fe] / [P] of the Fe content [Fe] and the P content [P] is 2 to 5. If necessary, Zn is contained in an amount of 1.5% by mass or less (not including 0% by mass), and / or Mn: 0.1% by mass or less (not including 0% by mass), Mg: 0.2 % By mass or less (not including 0% by mass), Si: 0.2% by mass or less (not including 0% by mass), Al: 0.2% by mass or less (not including 0% by mass), Cr: 0.00%. One of 2% by mass or less (not including 0% by mass), Ti: 0.1% by mass or less (not including 0% by mass) and Zr: 0.05% by mass or less (not including 0% by mass) Or 2 or more types are contained in total 0.5 mass% or less (0 mass% is not included).
 FeはPと化合物を形成し、時効処理後の銅合金板の強度及び導電率を向上させる作用を有する。Fe、Snの含有量が、図1に示す点A、B、C及びDで囲まれる範囲内であれば、時効処理後の強度(0.2%耐力)が100MPa以上、かつ導電率が45%IACS以上となる。
 Fe含有量の下限値は、好ましくは0.07質量%、より好ましくは0.15質量%である。一方、図1より、Feの上限値はSnの含有量に依存して決まり、図1の線分BC以下の値となる。なお、Feの含有量(質量%)を[Fe]とし、Snの含有量(質量%)を[Sn]としたとき、線分BCによる[Fe]と[Sn]との関係式は、次の式で表すことができる。
  [Fe]=-0.411×[Sn]+0.502
 例えば、Snの含有量が0.4質量%の場合、Fe含有量の上限値は0.338質量%であり、Snの含有量が0.2質量%の場合、Fe含有量の上限値は0.420質量%である。
 Sn含有量の下限値は、好ましくは0.01質量%、より好ましくは0.02質量%、上限値は、好ましくは0.5質量%、より好ましくは0.4質量%である。
 P及びZn並びにMn、Mg、Si、Al、Cr、Ti及びZrの作用及び含有量については、銅合金がSnを含まない場合と同じであり、説明を省略する。
Fe forms a compound with P, and has the effect | action which improves the intensity | strength and electrical conductivity of the copper alloy plate after an aging treatment. If the content of Fe and Sn is within the range surrounded by points A, B, C and D shown in FIG. 1, the strength after aging treatment (0.2% proof stress) is 100 MPa or more and the conductivity is 45. % IACS or higher.
The lower limit of the Fe content is preferably 0.07% by mass, more preferably 0.15% by mass. On the other hand, from FIG. 1, the upper limit value of Fe is determined depending on the Sn content, and is a value equal to or smaller than the line segment BC of FIG. When the Fe content (% by mass) is [Fe] and the Sn content (% by mass) is [Sn], the relational expression between [Fe] and [Sn] by the line segment BC is as follows: It can be expressed by the following formula.
[Fe] = − 0.411 × [Sn] +0.502
For example, when the Sn content is 0.4 mass%, the upper limit of the Fe content is 0.338 mass%, and when the Sn content is 0.2 mass%, the upper limit of the Fe content is 0.420% by mass.
The lower limit of the Sn content is preferably 0.01% by mass, more preferably 0.02% by mass, and the upper limit is preferably 0.5% by mass, more preferably 0.4% by mass.
About the effect | action and content of P and Zn and Mn, Mg, Si, Al, Cr, Ti, and Zr, it is the same as the case where a copper alloy does not contain Sn, and description is abbreviate | omitted.
 本発明に係る銅合金板は、例えば、鋳塊を熱間圧延した後、冷間圧延と熱処理(時効処理)を1回又は2回以上繰り返すことで製造される。前記組成の銅合金を用い、以下の条件で製造した銅合金板は、0.2%耐力が150MPa以上、伸びが5%以上、及び優れた曲げ加工性を有する。また、850℃で30分加熱後に、40MPa以上の0.2%耐力を有し、次いで時効処理した後、100MPa以上の0.2%耐力及び50%IACS以上又は45%IACS以上の導電率を有する。 The copper alloy plate according to the present invention is manufactured, for example, by hot rolling an ingot and then repeating cold rolling and heat treatment (aging treatment) once or twice or more. A copper alloy sheet produced using the copper alloy having the above composition under the following conditions has a 0.2% proof stress of 150 MPa or more, an elongation of 5% or more, and excellent bending workability. In addition, after heating at 850 ° C. for 30 minutes, it has a 0.2% yield strength of 40 MPa or more, and then an aging treatment, and then a 0.2% yield strength of 100 MPa or more and a conductivity of 50% IACS or more or 45% IACS or more. Have.
 溶解又は鋳造は、連続鋳造又は半連続鋳造などの通常の方法によって行うことができる。なお、銅溶解原料として、S、Pb、Bi、Se及びAsの含有量の少ないものを使用することが好ましい。また、銅合金溶湯に被覆する木炭の赤熱化(水分除去)、地金、スクラップ原料、樋、鋳型の乾燥、及び溶湯の脱酸等に注意し、O及びHを低減することが好ましい。 Melting or casting can be performed by a normal method such as continuous casting or semi-continuous casting. In addition, it is preferable to use what has little content of S, Pb, Bi, Se, and As as a copper melt | dissolution raw material. In addition, it is preferable to reduce O and H by paying attention to the red heat (moisture removal) of charcoal to be coated on the molten copper alloy, bare metal, scrap raw material, firewood, mold drying, deoxidation of the molten metal, and the like.
 鋳塊に対し、均質化処理を行うことが好ましく、均質化処理は、鋳塊内部の温度が800℃到達後、30分以上保持することが好ましい。均質化処理の保持時間は1時間以上がより好ましく、2時間以上がさらに好ましい。
 均質化処理後、熱間圧延を800℃以上の温度で開始する。熱間圧延材に粗大なFe、又はFe-P析出物が形成されないように、熱間圧延は600℃以上の温度で終了し、その温度から水冷等の方法により急冷することが好ましい。熱間圧延後の急冷開始温度が600℃より低いと、粗大なFe-P析出物が形成され、組織が不均一になりやすく、銅合金板(製品板)の強度が低下する。
The ingot is preferably subjected to a homogenization treatment, and the homogenization treatment is preferably held for 30 minutes or more after the temperature inside the ingot reaches 800 ° C. The holding time of the homogenization treatment is more preferably 1 hour or more, and further preferably 2 hours or more.
After the homogenization treatment, hot rolling is started at a temperature of 800 ° C. or higher. In order to prevent coarse Fe or Fe—P precipitates from being formed on the hot rolled material, the hot rolling is preferably finished at a temperature of 600 ° C. or higher and then rapidly cooled by a method such as water cooling. When the rapid cooling start temperature after hot rolling is lower than 600 ° C., coarse Fe—P precipitates are formed, the structure tends to be uneven, and the strength of the copper alloy plate (product plate) is lowered.
 熱間圧延後は、(a)熱間圧延材を製品厚さまで冷間圧延し、時効処理する、(b)熱間圧延材を冷間圧延及び時効処理し、さらに製品厚さまで冷間圧延する、又は(c)前記(b)の後に低温焼鈍(延性の回復)を行う。
 時効処理(析出処理)は、加熱温度300~600℃程度で0.5~10時間保持する条件で行う。この加熱温度が300℃未満では析出量が少なく、600℃を超えると析出物が粗大化しやすい。加熱温度の下限は、好ましくは350℃とし、上限は好ましくは580℃とする。時効処理の保持時間は、加熱温度により適宜選択し、0.5~10時間の範囲内で行う。この保持時間が0.5時間以下では析出が不十分となり、10時間を越えても析出量が飽和し、生産性が低下する。保持時間の下限は、好ましくは1時間、より好ましくは2時間とする。
After hot rolling, (a) hot-rolled material is cold-rolled to product thickness and subjected to aging treatment, (b) hot-rolled material is subjected to cold-rolling and aging treatment, and further cold-rolled to product thickness. Or (c) Low temperature annealing (recovery of ductility) is performed after (b).
The aging treatment (precipitation treatment) is performed under the condition of holding at a heating temperature of about 300 to 600 ° C. for 0.5 to 10 hours. When the heating temperature is less than 300 ° C., the amount of precipitation is small, and when it exceeds 600 ° C., the precipitate tends to be coarsened. The lower limit of the heating temperature is preferably 350 ° C, and the upper limit is preferably 580 ° C. The holding time for the aging treatment is appropriately selected depending on the heating temperature, and is carried out within the range of 0.5 to 10 hours. When the holding time is 0.5 hours or less, the precipitation is insufficient, and even if the holding time exceeds 10 hours, the amount of precipitation is saturated and the productivity is lowered. The lower limit of the holding time is preferably 1 hour, more preferably 2 hours.
 表1~4に示す組成の銅合金(比較例13のみ純銅)を鋳造し、それぞれ厚さ45mmの鋳塊を作製した。各鋳塊に対し965℃で3時間の均熱処理を行い、続いて熱間圧延を行って板厚15mmの熱間圧延材とし、700℃以上の温度から焼き入れ(水冷)した。焼き入れ後の熱間圧延材の両面を1mmずつ研磨した後、目標板厚0.6mmまで冷間粗圧延し、500℃で2時間保持する時効処理を行い、次いで50%の仕上げ冷間圧延を施し、板厚0.3mmの銅合金板を製造した。 A copper alloy having a composition shown in Tables 1 to 4 (pure copper only in Comparative Example 13) was cast to produce ingots each having a thickness of 45 mm. Each ingot was subjected to a soaking treatment at 965 ° C. for 3 hours, followed by hot rolling to obtain a hot-rolled material having a plate thickness of 15 mm, and quenching (water cooling) from a temperature of 700 ° C. or higher. After polishing both sides of the hot-rolled material after quenching by 1 mm each, cold rough rolling to a target plate thickness of 0.6 mm, aging treatment held at 500 ° C. for 2 hours, then 50% finish cold rolling And a copper alloy plate having a thickness of 0.3 mm was produced.
Figure JPOXMLDOC01-appb-T000001
Figure JPOXMLDOC01-appb-T000001
Figure JPOXMLDOC01-appb-T000002
Figure JPOXMLDOC01-appb-T000002
Figure JPOXMLDOC01-appb-T000003
Figure JPOXMLDOC01-appb-T000003
Figure JPOXMLDOC01-appb-T000004
Figure JPOXMLDOC01-appb-T000004
 得られた銅合金板を供試材として、下記要領で、導電率、機械的特性、曲げ加工性及びはんだ濡れ性の各測定試験を行った。
 また、得られた銅合金板を室温で真空引き後、Arガス置換して加熱し、板材の温度が850℃に到達してから30分間加熱後水冷したもの、前記水冷材をさらに500℃で2時間加熱(時効処理)したものを、それぞれ供試材として、導電率及び機械的特性の各測定試験を行った。
 各試験結果を表1~4に示す。
Using the obtained copper alloy plate as a test material, each measurement test of conductivity, mechanical properties, bending workability, and solder wettability was performed in the following manner.
In addition, the obtained copper alloy plate was evacuated at room temperature, heated with Ar gas substitution, heated for 30 minutes after the plate temperature reached 850 ° C., and further cooled with water at 500 ° C. Each test for electrical conductivity and mechanical properties was performed using samples heated for 2 hours (aging treatment) as test materials.
The test results are shown in Tables 1 to 4.
(導電率の測定)
 導電率の測定は、JIS-H0505に規定されている非鉄金属材料導電率測定法に準拠し、ダブルブリッジを用いた四端子法で行った。試験片の寸法は幅15mm及び長さ300mmである。
(機械的特性)
 供試材から、長手方向が圧延平行方向となるようにJIS5号引張り試験片を切り出し、JIS-Z2241に準拠して引張り試験を実施して、耐力と延びを測定した。耐力は永久伸び0.2%に相当する引張強さである。
(平均結晶粒径)
 供試材から、長さ30mm及び幅30mmの正方形試験片を切出し、その表面(圧延面)を鏡面研摩した後、水120×10-6、塩酸30×10-6、塩化第二鉄10gよりなる腐食液でエッチングした。エッチングした板表面を光学顕微鏡で観察し(観察倍率100~400倍)、JISH0501-1986の切断法により求めた。切断方向は圧延方向に直角な方向とした。同一試料に対して3箇所で平均結晶粒径を求め、3箇所の平均値(0.1μmの位を四捨五入)をその試料の平均結晶粒径とした。
(Measurement of conductivity)
The conductivity was measured by a four-terminal method using a double bridge in accordance with the nonferrous metal material conductivity measurement method defined in JIS-H0505. The dimensions of the test piece are 15 mm wide and 300 mm long.
(Mechanical properties)
A JIS No. 5 tensile test piece was cut out from the test material so that the longitudinal direction was parallel to the rolling direction, and a tensile test was performed in accordance with JIS-Z2241 to measure the yield strength and elongation. The yield strength is a tensile strength corresponding to a permanent elongation of 0.2%.
(Average crystal grain size)
A square test piece having a length of 30 mm and a width of 30 mm was cut out from the test material, and its surface (rolled surface) was mirror-polished, followed by water 120 × 10 −6 m 3 , hydrochloric acid 30 × 10 −6 m 3 , chloride chloride It etched with the corrosive liquid which consists of 10 g of ferrous iron. The etched plate surface was observed with an optical microscope (observation magnification: 100 to 400 times) and determined by the cutting method of JISH0501-1986. The cutting direction was a direction perpendicular to the rolling direction. The average crystal grain size was obtained at three locations for the same sample, and the average value at three locations (rounded to the nearest 0.1 μm) was taken as the average crystal grain size for that sample.
(曲げ加工性)
 曲げ加工性の測定は、伸銅協会標準JBMA-T307に規定されるW曲げ試験方法に従い実施した。各供試材から幅10mm、長さ30mmの試験片を切り出し、R/t=0.2となる冶具を用いて、G.W.(Good Way(曲げ軸が圧延方向に垂直))及びB.W.(Bad Way(曲げ軸が圧延方向に平行))の曲げを行った。次いで、曲げ部における割れの有無を100倍の光学顕微鏡により目視観察し、G.W.又はB.W.の双方で割れの発生がないものを○(合格)、G.W.又はB.W.のいずれか一方又は双方で割れが発生したものを×(不合格)、と評価した。
(Bending workability)
The measurement of the bending workability was carried out according to the W bending test method specified in JBMA-T307 standard of the copper elongation association. A test piece having a width of 10 mm and a length of 30 mm was cut out from each specimen, and a jig with R / t = 0.2 was used to W. (Good Way (bending axis is perpendicular to rolling direction)) and B.I. W. (Bad Way (bending axis is parallel to the rolling direction)) was performed. Next, the presence or absence of cracks in the bent portion was visually observed with a 100 × optical microscope. W. Or B. W. No cracks on both sides (circle) (pass), G. W. Or B. W. Those in which cracking occurred in either one or both were evaluated as x (failed).
(はんだ濡れ性)
 各供試材から短冊状試験片を採取し、非活性フラックスを1秒間浸漬塗布した後、メニスコグラフ法にてはんだ濡れ時間を測定した。はんだは260±5℃に保持したSn-3質量%Ag-0.5質量%Cuを用い、浸漬速度を25mm/sec、浸漬深さを5mm及び浸漬時間を5secの試験条件で実施した。はんだ濡れ時間が2秒以下のものをはんだ濡れ性が優れると評価した。なお、比較例10及び24以外は、はんだ濡れ時間が2秒以下であった。
(Solder wettability)
A strip-shaped test piece was collected from each test material, and the inactive flux was dip coated for 1 second, and then the solder wetting time was measured by the menisograph method. The solder used was Sn-3 mass% Ag-0.5 mass% Cu maintained at 260 ± 5 ° C., and the test was performed under the test conditions of an immersion speed of 25 mm / sec, an immersion depth of 5 mm, and an immersion time of 5 sec. A solder wetting time of 2 seconds or less was evaluated as having excellent solder wettability. Except for Comparative Examples 10 and 24, the solder wetting time was 2 seconds or less.
 表1に示す実施例1~17の銅合金板は、合金組成が本発明の規定を満たし、850℃で30分間加熱し、次いで時効処理した後の強度(0.2%耐力)が100MPa以上で、かつ導電率が50%IACS以上である。 The copper alloy sheets of Examples 1 to 17 shown in Table 1 have an alloy composition that satisfies the provisions of the present invention, and are heated at 850 ° C. for 30 minutes and then subjected to aging treatment (0.2% yield strength) of 100 MPa or more. And the electrical conductivity is 50% IACS or more.
 これに対し、表2に示す比較例1~12の銅合金板及び比較例13の純銅板は、以下に示すように、何らかの特性が劣る。
 比較例1は、Fe含有量が少ないため、時効処理後の強度が低い。
 比較例2~4は、[Fe]/[P]が高く、時効処理後もFe-P化合物の析出が十分でなく、時効処理後の導電率が低い。比較例2及び3は時効処理後の強度も低い。
 比較例5は、Fe含有量が過剰なため、時効処理後の導電率が低い。
 比較例6は、P含有量が過剰で熱間圧延時に割れを生じ、熱間圧延後の工程に進むことができなかった。
 比較例12は、Fe含有量が1.0%を超え、Fe含有量が過剰で、[Fe]/[P]が7を超えるため、時効処理後の導電率が比較例5より更に低い。
On the other hand, the copper alloy plates of Comparative Examples 1 to 12 and the pure copper plate of Comparative Example 13 shown in Table 2 are inferior in some characteristics as shown below.
Since the comparative example 1 has little Fe content, the intensity | strength after an aging treatment is low.
In Comparative Examples 2 to 4, [Fe] / [P] is high, the Fe—P compound is not sufficiently precipitated even after the aging treatment, and the electrical conductivity after the aging treatment is low. Comparative Examples 2 and 3 also have low strength after aging treatment.
In Comparative Example 5, since the Fe content is excessive, the electrical conductivity after the aging treatment is low.
In Comparative Example 6, the P content was excessive and cracked during hot rolling, and the process could not proceed to the process after hot rolling.
In Comparative Example 12, since the Fe content exceeds 1.0%, the Fe content is excessive, and [Fe] / [P] exceeds 7, the conductivity after the aging treatment is lower than that of Comparative Example 5.
 比較例7及び8は、[Fe]/[P]が低いため、時効処理後もFe-P化合物の析出に寄与しないPが固溶し、時効処理後の導電率が低い。
 比較例9は、[Fe]/[P]が低いため、時効処理後もFe-P化合物の析出が少なく、強度が低い。
 比較例10は、Zn含有量が過剰で、時効処理後の導電率が低く、また、はんだ濡れ性が劣る。
 比較例11は、その他元素の含有量が過剰であり、時効処理後の導電率が低い。
 比較例13は従来の純銅板であり、導電率は高いが、強度は時効処理後も低い。
In Comparative Examples 7 and 8, since [Fe] / [P] is low, P that does not contribute to the precipitation of the Fe—P compound even after the aging treatment is dissolved, and the electrical conductivity after the aging treatment is low.
In Comparative Example 9, since [Fe] / [P] is low, the Fe—P compound is hardly precipitated even after the aging treatment, and the strength is low.
In Comparative Example 10, the Zn content is excessive, the electrical conductivity after the aging treatment is low, and the solder wettability is inferior.
In Comparative Example 11, the content of other elements is excessive, and the electrical conductivity after aging treatment is low.
Comparative Example 13 is a conventional pure copper plate, which has high electrical conductivity but has low strength even after aging treatment.
 表3に示す実施例18~38の銅合金板は、合金組成が本発明の規定を満たし、850℃で30分間加熱し、次いで時効処理した後の強度(0.2%耐力)が100MPa以上で、かつ導電率が45%IACS以上である。 The copper alloy plates of Examples 18 to 38 shown in Table 3 have an alloy composition that satisfies the provisions of the present invention, and are heated at 850 ° C. for 30 minutes and then subjected to aging treatment (0.2% yield strength) of 100 MPa or more. And the electrical conductivity is 45% IACS or higher.
 これに対し、表4に示す比較例14~24の銅合金板は、以下に示すように、何らかの特性が劣る。
 比較例14は、FeとSnの含有量が図1のABCDの範囲から外れている(Fe含有量が少ない)ため、時効処理後の強度が低い。
 比較例15~17は、FeとSnの含有量が図1のABCDの範囲から外れている(Sn含有量が過剰)ため、時効処理後の導電率が低い。
 比較例18~20は、FeとSnの含有量が図1のABCDの範囲から外れている(Fe含有量が少ない)ため、時効処理後の強度が低い。
 比較例21は、[Fe]/[P]が低いため、時効処理後もFe-P化合物の析出に寄与しないPが固溶し、時効処理後の導電率が低い。
 比較例22は、P含有量が過剰で熱間圧延時に割れを生じ、熱間圧延後の工程に進むことができなかった。
 比較例23は、[Fe]/[P]が高いため、Fe-P化合物の析出に寄与しないFeが固溶し、時効処理後の導電率が低い。
 比較例24は、Zn含有量が過剰で、はんだ濡れ性が劣る。
On the other hand, the copper alloy sheets of Comparative Examples 14 to 24 shown in Table 4 are inferior in some characteristics as shown below.
In Comparative Example 14, the content of Fe and Sn is out of the range of ABCD in FIG. 1 (the Fe content is small), so the strength after aging treatment is low.
In Comparative Examples 15 to 17, the Fe and Sn contents are out of the range of ABCD in FIG. 1 (the Sn content is excessive), so the conductivity after the aging treatment is low.
In Comparative Examples 18 to 20, the strength after aging treatment is low because the Fe and Sn contents are out of the range of ABCD in FIG. 1 (the Fe content is small).
In Comparative Example 21, since [Fe] / [P] is low, P which does not contribute to the precipitation of the Fe—P compound after the aging treatment is dissolved, and the electrical conductivity after the aging treatment is low.
In Comparative Example 22, the P content was excessive and cracked during hot rolling, and the process after hot rolling could not proceed.
In Comparative Example 23, since [Fe] / [P] is high, Fe that does not contribute to the precipitation of the Fe—P compound is dissolved, and the electrical conductivity after the aging treatment is low.
In Comparative Example 24, the Zn content is excessive and the solder wettability is poor.
 表1~4に示す銅合金板のうち代表的なもの(実施例1,3,19及び24と比較例1,5,14及び15)について、室温で真空引き後、Arガス置換して加熱し、板材の温度が1000℃に到達してから30分間加熱後水冷し、さらに前記水冷材を500℃で2時間加熱(時効処理)し、当該銅合金板を供試材として、導電率及び機械的特性の各測定試験を、実施例1に記載した方法で行った。その結果を表5に示す。 Representative copper alloy plates shown in Tables 1 to 4 (Examples 1, 3, 19, and 24 and Comparative Examples 1, 5, 14, and 15) were evacuated at room temperature and then replaced with Ar gas and heated. Then, after the temperature of the plate material reaches 1000 ° C., it is heated for 30 minutes and then water-cooled, and the water-cooled material is further heated at 500 ° C. for 2 hours (aging treatment). Each measurement test of mechanical properties was performed by the method described in Example 1. The results are shown in Table 5.
Figure JPOXMLDOC01-appb-T000005
Figure JPOXMLDOC01-appb-T000005
 表5に示すように、実施例1,3,19及び24は、1000℃で30分間加熱し、次いで時効処理した後の強度(0.2%耐力)が100MPa以上で、かつ導電率が50%IACS以上(Snを含まない場合)又は45%IACS以上(Snを含む場合)である。個々の数値を、850℃で30分間加熱し、次いで時効処理した後の測定結果(表1及び3参照)と比較すると、数値に大きい違いはない。
 一方、比較例1,5,14及び15は、1000℃で30分間加熱し、次いで時効処理した後の強度又は導電率の一方又は双方が劣る。
As shown in Table 5, in Examples 1, 3, 19 and 24, the strength (0.2% proof stress) after heating at 1000 ° C. for 30 minutes and then aging treatment was 100 MPa or more and the conductivity was 50. % IACS or more (when Sn is not included) or 45% IACS or more (when Sn is included). When the individual numerical values are compared with the measurement results after heating at 850 ° C. for 30 minutes and then aging treatment (see Tables 1 and 3), there is no significant difference in the numerical values.
On the other hand, Comparative Examples 1, 5, 14 and 15 are inferior in one or both of strength and conductivity after heating at 1000 ° C. for 30 minutes and then aging treatment.
 本明細書の開示内容は、以下の態様を含む。
態様1:
 Fe:0.07~0.7質量%、P:0.2質量%以下を含有し、Feの含有量[Fe]とPの含有量[P]の比[Fe]/[P]が2~5であり、残部がCu及び不可避不純物からなり、850℃で30分加熱後水冷し、次いで時効処理した後の0.2%耐力が100MPa以上、導電率が50%IACS以上であり、放熱部品を製造するプロセスの一部に650℃以上に加熱するプロセスと時効処理が含まれることを特徴とする放熱部品用銅合金板。

態様2:
 図1に示す点A(0.1,0.006)、点B(0.5,0.006)、点C(0.05,1.1)、点D(0.05,0.05)で囲まれる範囲内(含む境界線)のFe及びSnと、P:0.2質量%以下を含み、Feの含有量[Fe]とPの含有量[P]の比[Fe]/[P]が2~5であり、残部がCu及び不可避的不純物からなり、850℃で30分加熱後水冷し、次いで時効処理した後の0.2%耐力が100MPa以上、導電率が45%IACS以上であり、放熱部品を製造するプロセスの一部に650℃以上に加熱するプロセスと時効処理が含まれることを特徴とする放熱部品用銅合金板。

態様3:
 さらに、Znを1.5質量%以下(0質量%を含まず)含有することを特徴とする態様1に記載された放熱部品用銅合金板。

態様4:
 さらに、Mn:0.1質量%以下(0質量%を含まず)、Mg:0.2質量%以下(0質量%を含まず)、Si:0.2質量%以下(0質量%を含まず)、Al:0.2質量%以下(0質量%を含まず)、Cr:0.2質量%以下(0質量%を含まず)、Ti:0.1質量%以下(0質量%を含まず)及びZr:0.05質量%以下(0質量%を含まず)のうち1種又は2種以上を合計で0.5質量%以下(0質量%を含まず)含有することを特徴とする態様1又は3に記載された放熱部品用銅合金。

態様5:
 さらに、Znを1.5質量%以下(0質量%を含まず)含有することを特徴とする態様2に記載された放熱部品用銅合金板。

態様6:
 さらに、Mn:0.1質量%以下(0質量%を含まず)、Mg:0.2質量%以下(0質量%を含まず)、Si:0.2質量%以下(0質量%を含まず)、Al:0.2質量%以下(0質量%を含まず)、Cr:0.2質量%以下(0質量%を含まず)、Ti:0.1質量%以下(0質量%を含まず)及びZr:0.05質量%以下(0質量%を含まず)のうち1種又は2種以上を合計で0.5質量%以下(0質量%を含まず)含有することを特徴とする態様2又は5に記載された放熱部品用銅合金。

態様7:
 850℃で30分間加熱前の板材において測定した板表面の平均結晶粒径が20μm以下であることを特徴とする態様1、3又は4のいずれかに記載された放熱部品用銅合金。

態様8:
 850℃で30分間加熱前の板材において測定した板表面の平均結晶粒径が20μm以下であることを特徴とする態様2、5又は6のいずれかに記載された放熱部品用銅合金。

態様9:
 態様1,3,4又は7のいずれかに記載された放熱部品用銅合金板からなり、Fe-P化合物が析出していて、100MPa以上の0.2%耐力及び50%IACS以上の導電率を有することを特徴とする放熱部品。

態様10:
 態様2,5,6又は8のいずれかに記載された放熱部品用銅合金板からなり、Fe-P化合物が析出していて、100MPa以上の0.2%耐力及び45%IACS以上の導電率を有することを特徴とする放熱部品。

態様11:
 外表面の少なくとも一部にSn被覆層が形成されていることを特徴とする態様9又は10に記載された放熱部品。

態様12:
 外表面の少なくとも一部にNi被覆層が形成されていることを特徴とする態様9又は10に記載された放熱部品。
The disclosure of the present specification includes the following aspects.
Aspect 1:
Fe: 0.07 to 0.7% by mass, P: 0.2% by mass or less, and the ratio [Fe] / [P] of Fe content [Fe] to P content [P] is 2 The balance consists of Cu and inevitable impurities, and after heating at 850 ° C. for 30 minutes and then water cooling, 0.2% proof stress after aging treatment is 100 MPa or more, conductivity is 50% IACS or more, and heat dissipation A copper alloy sheet for a heat-radiating component, characterized in that a part of the process for producing the component includes a process of heating to 650 ° C. or more and an aging treatment.

Aspect 2:
Point A (0.1, 0.006), point B (0.5, 0.006), point C (0.05, 1.1), point D (0.05, 0.05) shown in FIG. ) Fe and Sn in the range enclosed (including the boundary line), and P: 0.2 mass% or less, the ratio [Fe] / [P] of the Fe content [Fe] and P content [P] P] is 2 to 5, the balance is made of Cu and inevitable impurities, and after heating at 850 ° C. for 30 minutes, water cooling, and then aging treatment, 0.2% proof stress is 100 MPa or more, and conductivity is 45% IACS. A copper alloy plate for a heat radiating component, characterized in that a part of the process for manufacturing the heat radiating component includes a process of heating to 650 ° C. or more and an aging treatment.

Aspect 3:
Furthermore, Zn is 1.5 mass% or less (excluding 0 mass%), Zn is contained, The copper alloy plate for heat radiating components described in the aspect 1 characterized by the above-mentioned.

Aspect 4:
Furthermore, Mn: 0.1% by mass or less (not including 0% by mass), Mg: 0.2% by mass or less (not including 0% by mass), Si: 0.2% by mass or less (including 0% by mass) ), Al: 0.2% by mass or less (not including 0% by mass), Cr: 0.2% by mass or less (not including 0% by mass), Ti: 0.1% by mass or less (0% by mass) Not including) and Zr: 0.05% by mass or less (not including 0% by mass), including one or more in total of 0.5% by mass or less (not including 0% by mass) The copper alloy for heat radiating components described in the aspect 1 or 3.

Aspect 5:
Furthermore, it contains 1.5 mass% or less (excluding 0 mass%) of Zn, The copper alloy plate for heat radiating components described in the aspect 2 characterized by the above-mentioned.

Aspect 6:
Furthermore, Mn: 0.1% by mass or less (not including 0% by mass), Mg: 0.2% by mass or less (not including 0% by mass), Si: 0.2% by mass or less (including 0% by mass) ), Al: 0.2% by mass or less (not including 0% by mass), Cr: 0.2% by mass or less (not including 0% by mass), Ti: 0.1% by mass or less (0% by mass) Not including) and Zr: 0.05% by mass or less (not including 0% by mass), including one or more in total of 0.5% by mass or less (not including 0% by mass) The copper alloy for heat radiating components described in the aspect 2 or 5.

Aspect 7:
The copper alloy for a heat-radiating component according to any one of aspects 1, 3 and 4, wherein the average crystal grain size of the plate surface measured in the plate material before heating at 850 ° C. for 30 minutes is 20 μm or less.

Aspect 8:
The copper alloy for heat-radiating components according to any one of aspects 2, 5 and 6, wherein the average crystal grain size of the plate surface measured in the plate material before heating at 850 ° C. for 30 minutes is 20 μm or less.

Aspect 9:
A copper alloy plate for a heat-dissipating part described in any one of aspects 1, 3, 4, or 7, wherein an Fe—P compound is deposited, and has a 0.2% proof stress of 100 MPa or more and an electric conductivity of 50% IACS or more. A heat dissipating component characterized by comprising:

Aspect 10:
A copper alloy plate for a heat-dissipating component described in any one of aspects 2, 5, 6 or 8, on which an Fe—P compound is deposited, 0.2% proof stress of 100 MPa or more, and conductivity of 45% IACS or more A heat dissipating component characterized by comprising:

Aspect 11:
The heat radiating component according to the aspect 9 or 10, wherein an Sn coating layer is formed on at least a part of the outer surface.

Aspect 12:
The heat dissipating component according to aspect 9 or 10, wherein a Ni coating layer is formed on at least a part of the outer surface.
 本出願は、出願日が2015年3月23日である日本国特許出願、特願第2015-058957号、及び出願日が2015年10月12日である日本国特許出願、特願第2015-201655号を基礎出願とする優先権主張を伴う。特願第2015-058957号および特願第2015-201655号は参照することにより本明細書に取り込まれる。 The present application includes a Japanese patent application filed on March 23, 2015, Japanese Patent Application No. 2015-058957, and a Japanese patent application filed on October 12, 2015, Japanese Patent Application No. 2015-2015. Accompanied by priority claim with 2016655 as the basic application. Japanese Patent Application No. 2015-058957 and Japanese Patent Application No. 2015-201665 are incorporated herein by reference.

Claims (22)

  1.  Fe:0.07~0.7質量%、P:0.2質量%以下を含有し、Feの含有量[Fe]とPの含有量[P]の比[Fe]/[P]が2~5であり、残部がCu及び不可避不純物からなり、850℃で30分加熱後水冷し、次いで時効処理した後の0.2%耐力が100MPa以上、導電率が50%IACS以上であり、放熱部品を製造するプロセスの一部に650℃以上に加熱するプロセスと時効処理が含まれることを特徴とする放熱部品用銅合金板。 Fe: 0.07 to 0.7% by mass, P: 0.2% by mass or less, and the ratio [Fe] / [P] of Fe content [Fe] to P content [P] is 2 The balance consists of Cu and inevitable impurities, and after heating at 850 ° C. for 30 minutes and then water cooling, 0.2% proof stress after aging treatment is 100 MPa or more, conductivity is 50% IACS or more, and heat dissipation A copper alloy sheet for a heat-radiating component, characterized in that a part of the process for producing the component includes a process of heating to 650 ° C. or more and an aging treatment.
  2.  図1に示す点A(0.1,0.006)、点B(0.5,0.006)、点C(0.05,1.1)、点D(0.05,0.05)で囲まれる範囲内(含む境界線)のFe及びSnと、P:0.2質量%以下を含み、Feの含有量[Fe]とPの含有量[P]の比[Fe]/[P]が2~5であり、残部がCu及び不可避的不純物からなり、850℃で30分加熱後水冷し、次いで時効処理した後の0.2%耐力が100MPa以上、導電率が45%IACS以上であり、放熱部品を製造するプロセスの一部に650℃以上に加熱するプロセスと時効処理が含まれることを特徴とする放熱部品用銅合金板。 Point A (0.1, 0.006), point B (0.5, 0.006), point C (0.05, 1.1), point D (0.05, 0.05) shown in FIG. ) Fe and Sn in the range enclosed (including the boundary line), and P: 0.2 mass% or less, the ratio [Fe] / [P] of the Fe content [Fe] and P content [P] P] is 2 to 5, the balance is made of Cu and inevitable impurities, and after heating at 850 ° C. for 30 minutes, water cooling, and then aging treatment, 0.2% proof stress is 100 MPa or more, and conductivity is 45% IACS. A copper alloy plate for a heat radiating component, characterized in that a part of the process for manufacturing the heat radiating component includes a process of heating to 650 ° C. or more and an aging treatment.
  3.  さらに、Znを1.5質量%以下(0質量%を含まず)含有することを特徴とする請求項1に記載された放熱部品用銅合金板。 Furthermore, the copper alloy plate for heat-radiating components according to claim 1, further comprising Zn in an amount of 1.5% by mass or less (not including 0% by mass).
  4.  さらに、Mn:0.1質量%以下(0質量%を含まず)、Mg:0.2質量%以下(0質量%を含まず)、Si:0.2質量%以下(0質量%を含まず)、Al:0.2質量%以下(0質量%を含まず)、Cr:0.2質量%以下(0質量%を含まず)、Ti:0.1質量%以下(0質量%を含まず)及びZr:0.05質量%以下(0質量%を含まず)のうち1種又は2種以上を合計で0.5質量%以下(0質量%を含まず)含有することを特徴とする請求項1に記載された放熱部品用銅合金。 Furthermore, Mn: 0.1% by mass or less (not including 0% by mass), Mg: 0.2% by mass or less (not including 0% by mass), Si: 0.2% by mass or less (including 0% by mass) ), Al: 0.2% by mass or less (not including 0% by mass), Cr: 0.2% by mass or less (not including 0% by mass), Ti: 0.1% by mass or less (0% by mass) Not including) and Zr: 0.05% by mass or less (not including 0% by mass), including one or more in total of 0.5% by mass or less (not including 0% by mass) The copper alloy for heat dissipation components according to claim 1.
  5.  さらに、Mn:0.1質量%以下(0質量%を含まず)、Mg:0.2質量%以下(0質量%を含まず)、Si:0.2質量%以下(0質量%を含まず)、Al:0.2質量%以下(0質量%を含まず)、Cr:0.2質量%以下(0質量%を含まず)、Ti:0.1質量%以下(0質量%を含まず)及びZr:0.05質量%以下(0質量%を含まず)のうち1種又は2種以上を合計で0.5質量%以下(0質量%を含まず)含有することを特徴とする請求項3に記載された放熱部品用銅合金。 Furthermore, Mn: 0.1% by mass or less (not including 0% by mass), Mg: 0.2% by mass or less (not including 0% by mass), Si: 0.2% by mass or less (including 0% by mass) ), Al: 0.2% by mass or less (not including 0% by mass), Cr: 0.2% by mass or less (not including 0% by mass), Ti: 0.1% by mass or less (0% by mass) Not including) and Zr: 0.05% by mass or less (not including 0% by mass), including one or more in total of 0.5% by mass or less (not including 0% by mass) The copper alloy for heat radiating components according to claim 3.
  6.  さらに、Znを1.5質量%以下(0質量%を含まず)含有することを特徴とする請求項2に記載された放熱部品用銅合金板。 Furthermore, the copper alloy plate for heat-radiating components according to claim 2, further comprising Zn in an amount of 1.5% by mass or less (not including 0% by mass).
  7.  さらに、Mn:0.1質量%以下(0質量%を含まず)、Mg:0.2質量%以下(0質量%を含まず)、Si:0.2質量%以下(0質量%を含まず)、Al:0.2質量%以下(0質量%を含まず)、Cr:0.2質量%以下(0質量%を含まず)、Ti:0.1質量%以下(0質量%を含まず)及びZr:0.05質量%以下(0質量%を含まず)のうち1種又は2種以上を合計で0.5質量%以下(0質量%を含まず)含有することを特徴とする請求項2に記載された放熱部品用銅合金。 Furthermore, Mn: 0.1% by mass or less (not including 0% by mass), Mg: 0.2% by mass or less (not including 0% by mass), Si: 0.2% by mass or less (including 0% by mass) ), Al: 0.2% by mass or less (not including 0% by mass), Cr: 0.2% by mass or less (not including 0% by mass), Ti: 0.1% by mass or less (0% by mass) Not including) and Zr: 0.05% by mass or less (not including 0% by mass), including one or more in total of 0.5% by mass or less (not including 0% by mass) The copper alloy for heat radiating components according to claim 2.
  8.  さらに、Mn:0.1質量%以下(0質量%を含まず)、Mg:0.2質量%以下(0質量%を含まず)、Si:0.2質量%以下(0質量%を含まず)、Al:0.2質量%以下(0質量%を含まず)、Cr:0.2質量%以下(0質量%を含まず)、Ti:0.1質量%以下(0質量%を含まず)及びZr:0.05質量%以下(0質量%を含まず)のうち1種又は2種以上を合計で0.5質量%以下(0質量%を含まず)含有することを特徴とする請求項6に記載された放熱部品用銅合金。 Furthermore, Mn: 0.1% by mass or less (not including 0% by mass), Mg: 0.2% by mass or less (not including 0% by mass), Si: 0.2% by mass or less (including 0% by mass) ), Al: 0.2% by mass or less (not including 0% by mass), Cr: 0.2% by mass or less (not including 0% by mass), Ti: 0.1% by mass or less (0% by mass) Not including) and Zr: 0.05% by mass or less (not including 0% by mass), including one or more in total of 0.5% by mass or less (not including 0% by mass) The copper alloy for heat radiating components according to claim 6.
  9.  850℃で30分間加熱前の板材において測定した板表面の平均結晶粒径が20μm以下であることを特徴とする請求項1、3、4又は5のいずれかに記載された放熱部品用銅合金。 6. The copper alloy for heat dissipation components according to claim 1, wherein the average crystal grain size of the plate surface measured in the plate material before heating at 850 ° C. for 30 minutes is 20 μm or less. .
  10.  850℃で30分間加熱前の板材において測定した板表面の平均結晶粒径が20μm以下であることを特徴とする請求項2、6、7又は8のいずれかに記載された放熱部品用銅合金。 9. The copper alloy for heat-radiating components according to claim 2, wherein the average crystal grain size of the plate surface measured in the plate material before heating at 850 ° C. for 30 minutes is 20 μm or less. .
  11.  請求項1、3、4又は5のいずれかに記載された放熱部品用銅合金板からなり、Fe-P化合物が析出していて、100MPa以上の0.2%耐力及び50%IACS以上の導電率を有することを特徴とする放熱部品。 It consists of the copper alloy plate for heat radiating components as described in any one of Claims 1, 3, 4, or 5, and the Fe-P compound has precipitated, 0.2% yield strength of 100 MPa or more, and conductivity of 50% IACS or more. A heat dissipation component characterized by having a rate.
  12.  請求項9に記載された放熱部品用銅合金板からなり、Fe-P化合物が析出していて、100MPa以上の0.2%耐力及び50%IACS以上の導電率を有することを特徴とする放熱部品。 A heat dissipation component comprising the copper alloy plate for heat dissipation component according to claim 9, wherein an Fe-P compound is deposited, and has a 0.2% proof stress of 100 MPa or more and a conductivity of 50% IACS or more. parts.
  13.  請求項2、6、7又は8のいずれかに記載された放熱部品用銅合金板からなり、Fe-P化合物が析出していて、100MPa以上の0.2%耐力及び45%IACS以上の導電率を有することを特徴とする放熱部品。 A copper alloy plate for a heat dissipation component according to any one of claims 2, 6, 7, or 8, wherein an Fe-P compound is deposited, and has a 0.2% proof stress of 100 MPa or more and a conductivity of 45% IACS or more. A heat dissipation component characterized by having a rate.
  14.  請求項10に記載された放熱部品用銅合金板からなり、Fe-P化合物が析出していて、100MPa以上の0.2%耐力及び45%IACS以上の導電率を有することを特徴とする放熱部品。 A heat dissipation comprising the copper alloy plate for a heat dissipation component according to claim 10, wherein an Fe-P compound is precipitated, and has a 0.2% proof stress of 100 MPa or more and a conductivity of 45% IACS or more. parts.
  15.  外表面の少なくとも一部にSn被覆層が形成されていることを特徴とする請求項11に記載された放熱部品。 The heat-radiating component according to claim 11, wherein an Sn coating layer is formed on at least a part of the outer surface.
  16.  外表面の少なくとも一部にSn被覆層が形成されていることを特徴とする請求項12に記載された放熱部品。 The heat dissipating component according to claim 12, wherein an Sn coating layer is formed on at least a part of the outer surface.
  17.  外表面の少なくとも一部にNi被覆層が形成されていることを特徴とする請求項11に記載された放熱部品。 The heat-radiating component according to claim 11, wherein a Ni coating layer is formed on at least a part of the outer surface.
  18.  外表面の少なくとも一部にNi被覆層が形成されていることを特徴とする請求項12に記載された放熱部品。 13. The heat dissipating component according to claim 12, wherein a Ni coating layer is formed on at least a part of the outer surface.
  19.  外表面の少なくとも一部にSn被覆層が形成されていることを特徴とする請求項13に記載された放熱部品。 14. The heat dissipating component according to claim 13, wherein an Sn coating layer is formed on at least a part of the outer surface.
  20.  外表面の少なくとも一部にSn被覆層が形成されていることを特徴とする請求項14に記載された放熱部品。 The heat-radiating component according to claim 14, wherein a Sn coating layer is formed on at least a part of the outer surface.
  21.  外表面の少なくとも一部にNi被覆層が形成されていることを特徴とする請求項13に記載された放熱部品。 The heat dissipating component according to claim 13, wherein a Ni coating layer is formed on at least a part of the outer surface.
  22.  外表面の少なくとも一部にNi被覆層が形成されていることを特徴とする請求項14に記載された放熱部品。 The heat dissipating component according to claim 14, wherein a Ni coating layer is formed on at least a part of the outer surface.
PCT/JP2016/058122 2015-03-23 2016-03-15 Copper alloy sheet for heat dissipating component and heat dissipating component WO2016152648A1 (en)

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WO2017110759A1 (en) * 2015-12-25 2017-06-29 株式会社神戸製鋼所 Copper alloy plate for heat-dissipation component
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