WO2018062255A1 - Copper alloy sheet for heat dissipation component, heat dissipation component, and method for producing heat dissipation component - Google Patents

Copper alloy sheet for heat dissipation component, heat dissipation component, and method for producing heat dissipation component Download PDF

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Publication number
WO2018062255A1
WO2018062255A1 PCT/JP2017/034913 JP2017034913W WO2018062255A1 WO 2018062255 A1 WO2018062255 A1 WO 2018062255A1 JP 2017034913 W JP2017034913 W JP 2017034913W WO 2018062255 A1 WO2018062255 A1 WO 2018062255A1
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Prior art keywords
copper alloy
heat
heat dissipation
mass
dissipation component
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PCT/JP2017/034913
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French (fr)
Japanese (ja)
Inventor
大輔 橋本
昌泰 西村
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株式会社神戸製鋼所
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Publication of WO2018062255A1 publication Critical patent/WO2018062255A1/en

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    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C9/00Alloys based on copper
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C9/00Alloys based on copper
    • C22C9/06Alloys based on copper with nickel or cobalt as the next major constituent
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22FCHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS AND NON-FERROUS ALLOYS
    • C22F1/00Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working
    • C22F1/08Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working of copper or alloys based thereon
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F28HEAT EXCHANGE IN GENERAL
    • F28FDETAILS OF HEAT-EXCHANGE AND HEAT-TRANSFER APPARATUS, OF GENERAL APPLICATION
    • F28F21/00Constructions of heat-exchange apparatus characterised by the selection of particular materials
    • F28F21/08Constructions of heat-exchange apparatus characterised by the selection of particular materials of metal
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K7/00Constructional details common to different types of electric apparatus
    • H05K7/20Modifications to facilitate cooling, ventilating, or heating
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C13/00Alloys based on tin
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C13/00Alloys based on tin
    • C22C13/02Alloys based on tin with antimony or bismuth as the next major constituent
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22FCHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS AND NON-FERROUS ALLOYS
    • C22F1/00Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working

Definitions

  • the present disclosure relates to a heat sink, a heat sink, a copper alloy plate for heat dissipating parts used for a heat pipe and the like for processing heat generated from a CPU of a computer, an LED lamp, and the like.
  • the present invention relates to a copper alloy plate for a heat dissipation component that is used when a process of heating to a high temperature such as brazing, diffusion bonding, deaeration, or the like is included as part of the manufacturing process of the heat dissipation component.
  • tubular heat pipes and flat heat pipes having high heat conductivity and heat transport capability have been proposed as heat dissipating parts having higher heat dissipating properties.
  • the heat pipe exhibits higher heat dissipation characteristics than the heat sink by cyclically performing evaporation (heat absorption from the CPU) and condensation (release of absorbed heat) of the refrigerant sealed inside. It has also been proposed to solve the heat generation problem of semiconductor devices by combining heat pipes with heat radiating components such as heat sinks and fans.
  • Patent Documents 1 and 2 describe an Fe—P-based copper alloy plate as a material for a heat dissipation component.
  • a tubular heat pipe (see Patent Document 3) is formed by sintering copper powder in a tube to form a wick, heat-degassing treatment, brazing and sealing one end, and putting a refrigerant in the tube under vacuum or reduced pressure. And the other end is brazed and sealed.
  • the planar heat pipe (see Patent Documents 4 and 5) is a further improvement of the heat dissipation performance of the tubular heat pipe.
  • a flat heat pipe has been proposed in which the inner surface is roughened, grooved, and the like, similar to the tubular heat pipe.
  • a method of brazing, etc. after joining two upper and lower pure copper plates that have undergone processing such as press molding, punching, cutting, etching, etc. by brazing, diffusion bonding, welding, etc. Seal with.
  • a degassing process may be performed in a joining process.
  • a heat dissipation component having the same internal structure as the vapor chamber and continuously supplying the refrigerant from the outside is used (see Patent Document 6). ).
  • This type of heat dissipation component does not require a low pressure inside the housing.
  • the members used for the casing of this type of heat radiation component and the method for manufacturing the casing are basically the same as those of the vapor chamber.
  • the heat radiating plate and the heat sink are heated to about 200 to 700 ° C. in the soldering and brazing processes.
  • Tubular heat pipes and planar heat pipes are heated to about 800 to 1000 ° C. in steps such as sintering, degassing, brazing using phosphor copper brazing (BCuP-2, etc.), diffusion bonding, and welding.
  • BCuP-2 phosphor copper brazing
  • the softening is severe when heated at a temperature of 600 ° C. or higher.
  • the crystal grains become abruptly coarsened.
  • the manufactured heat pipe is easily deformed when it is attached to a heat sink, a semiconductor device, or incorporated into a PC case, and the structure inside the heat pipe changes, and the unevenness of the surface increases.
  • the desired heat dissipation performance cannot be exhibited.
  • transformation what is necessary is just to thicken the thickness of a pure copper plate, but if it does so, the mass and thickness of a heat pipe will increase. When the thickness increases, there is a problem that the gap inside the PC casing is reduced and the convective heat transfer performance is lowered.
  • the copper alloy plates (Cu—Fe—P alloys) described in Patent Documents 1 and 2 are softened when heated at a temperature of 600 ° C. or higher, and the conductivity is greatly reduced as compared with pure copper. For this reason, for example, when a flat heat pipe is manufactured through processes such as sintering, degassing, brazing, diffusion bonding, welding, etc., it is easily deformed by the process of transporting and handling the heat pipe, incorporating it into the substrate, etc. . Moreover, the expected performance as a heat pipe cannot be obtained due to the decrease in conductivity.
  • the embodiment of the present invention has been made in view of the above problems when a process of heating to a temperature of 600 ° C. or higher is included in a part of the process of manufacturing a heat dissipation component from pure copper or a copper alloy plate. It aims at providing the copper alloy board which can give sufficient intensity
  • a precipitation hardening type copper alloy improves strength and conductivity by performing an aging treatment after the solution treatment.
  • the precipitation hardening type copper alloy after solution treatment, after applying plastic working in the cold and introducing the plastic strain that becomes the precipitation site into the alloy, if not aging treatment, strength and conductivity by aging treatment
  • the rate improvement effect may be low.
  • plastic processing is not applied after the heating process. Therefore, when the heat radiating component is manufactured from a plate material of a precipitation hardening type copper alloy, the strength and conductivity may not be sufficiently improved even if an aging treatment is performed after the heating step corresponding to the solution treatment.
  • the present inventors add plastic working after the heating step by limiting the composition range of Co and P and the Co / P ratio in the Cu—C Cincinnati—P alloy among precipitation hardening type copper alloys. Even when the aging treatment is performed without any problems, the inventors have found that the strength and conductivity of the heat dissipating component are greatly improved, and have reached the embodiments of the present invention.
  • the copper alloy plate for heat dissipation component is used when a process of heating to 600 ° C. or higher and an aging treatment are included as part of the process of manufacturing the heat dissipation component, Co: 0.05 to 0.9 mass%, P: 0.01 to 0.25 mass%, the balance is made of Cu and inevitable impurities, Co content (mass%) is [Co], P content (mass%) is [P ], [Co] / [P] is 2 to 6, 0.2% proof stress is 100 MPa or more, elongation is 3% or more, and has excellent bending workability.
  • the copper alloy sheet has a 0.2% proof stress of 150 MPa or more and an electrical conductivity of 70% IACS or more after aging at 850 ° C.
  • a 0.2% proof stress of the copper alloy plate of 150 MPa or more corresponds to Hv75 or more in terms of hardness.
  • the copper alloy plate for a heat dissipation component can further contain 1.0% by mass or less (not including 0% by mass) of Zn as an alloy element, if necessary.
  • the copper alloy plate for heat radiating components according to the embodiment of the present invention further includes Fe, Ni, Si, Al, Mn, Cr, Sn, Ti, Zr, Ag, and Mg as alloy elements as necessary.
  • One or two or more kinds can be contained in a total amount of 0.005 to 0.5% by mass or less.
  • the copper alloy plate may contain one or more of Fe, Ni, Si, Al, Mn, Cr, Sn, Ti, Zr, Ag, and Mg and Zn at the same time.
  • the copper alloy plate which concerns on embodiment of this invention is used when the process and aging treatment which are heated to 600 degreeC or more are included as a part of process of manufacturing a thermal radiation component. That is, the heat-radiating component manufactured using the copper alloy plate according to the embodiment of the present invention is subjected to aging treatment without being subjected to plastic working after high-temperature heating to 600 ° C. or higher, and the strength is improved. Since the copper alloy plate according to the embodiment of the present invention has a high strength (0.2% proof stress) of 100 MPa or more, the copper alloy plate is not easily deformed in conveyance and handling when the copper alloy plate is processed into a heat radiating component. Moreover, since it has an elongation of 3% or more and excellent bending workability, the processing can be performed without any trouble.
  • the 0.2% proof stress is 150 MPa or more and the conductivity is 70% IACS or more. Since the copper alloy plate according to the embodiment of the present invention has high strength after aging treatment, a heat dissipation component such as a heat pipe manufactured using the copper alloy plate is attached to a heat sink, a semiconductor device, or a PC housing When assembled in the heat sink, the heat dissipating component is hardly deformed.
  • the copper alloy plate according to the embodiment of the present invention has a conductivity lower than that of a pure copper plate, but can be thinned because of its high strength after aging treatment, and can compensate for a decrease in conductivity in terms of heat dissipation performance. .
  • the copper alloy plate for heat dissipation components is processed into a predetermined shape by press molding, punching, cutting, etching, etc., and is subjected to high temperature heating (degassing, bonding (brazing, diffusion bonding, welding), sintering, etc. For heat dissipation).
  • high temperature heating degassing, bonding (brazing, diffusion bonding, welding), sintering, etc.
  • the embodiment of the present invention assumes the case where the high-temperature heating is performed at about 600 ° C. to 1050 ° C.
  • a copper alloy plate according to an embodiment of the present invention is made of a Co—P based copper alloy having a composition to be described later, and when heated within the temperature range, at least a part of the Co—P compound precipitated in the base material before heating. Is dissolved in the base material, crystal grains grow, and softening and decrease in conductivity occur.
  • the copper alloy plate according to the embodiment of the present invention has a strength (0.2% proof stress) after heating at 850 ° C. for 30 minutes, followed by water cooling, and then aging treatment, 150 MPa or more, and a conductivity of 70% IACS or more.
  • Heating at 850 ° C. for 30 minutes is a heating condition that assumes the above-described high-temperature heating process in the manufacture of a heat dissipation component.
  • the copper alloy plate according to the embodiment of the present invention is heated at high temperature under these conditions, the Co—P compound precipitated in the base material before heating is dissolved in the base material, crystal grains grow, soften, and conduct The rate drops.
  • the copper alloy sheet is subjected to an aging treatment, a fine Co—P compound is precipitated. Thereby, the intensity
  • the aging treatment can be performed, for example, by (a) maintaining the precipitation temperature range for a certain time during the cooling step after high-temperature heating, (b) cooling to room temperature after high-temperature heating, and then reheating to the precipitation temperature range and holding for a certain time. (C) After the step (a), it can be carried out by a method such as reheating to the precipitation temperature range and holding for a certain time.
  • Specific aging treatment conditions include a condition of holding at a temperature range of 300 to 580 ° C. for 5 minutes to 10 hours. When priority is given to improving the strength, the temperature-time conditions at which fine Co-P compounds are generated. When priority is given to improving the conductivity, the temperature of over-aging that reduces Co and P dissolved in the base material is reduced. What is necessary is just to select time conditions suitably.
  • the copper alloy plate after the aging treatment has a lower electrical conductivity than the pure copper plate after high-temperature heating, but the strength is significantly higher than that of the pure copper plate.
  • heat dissipation parts such as a heat pipe manufactured using the copper alloy board concerning the embodiment of the present invention, are aging-treated after high temperature heating.
  • the aging treatment conditions are as described above.
  • the heat-dissipating component (copper alloy plate) after the aging treatment has high strength and can prevent deformation of the heat-dissipating component when it is attached to a heat sink, a semiconductor device, or incorporated in a PC housing or the like.
  • the copper alloy plate (after aging treatment) according to the embodiment of the present invention since the copper alloy plate (after aging treatment) according to the embodiment of the present invention has higher strength than that of a pure copper plate, it can be thinned (0.1 to 1.0 mm thick). The heat dissipation performance of the parts can be improved, and the decrease in conductivity when compared with a pure copper plate can be compensated.
  • the copper alloy plate according to the embodiment of the present invention has a high-temperature heating temperature of less than 850 ° C. (600 ° C. or more) or more than 850 ° C. (1050 ° C. or less), after the aging treatment, at a pressure of 150 MPa or more. 2% yield strength and 70% IACS or higher conductivity can be achieved.
  • the copper alloy plate according to the embodiment of the present invention is processed into a heat radiation component by press molding, punching, cutting, etching, or the like before being heated at a high temperature of 600 ° C. or higher. It is preferable that the copper alloy plate has a strength that does not easily deform during conveyance and handling during the processing, and has mechanical characteristics that allow the processing to be performed without hindrance. More specifically, the copper alloy sheet according to the embodiment of the present invention has a 0.2% proof stress of 100 MPa or more and an elongation of 3% or more, and has excellent bending workability. If the above characteristics are satisfied, the tempering of the copper alloy sheet is not a problem. For example, any of a solution-treated material, an aging-treated material, and a cold-rolled aging-treated material can be used. The elongation is preferably 6% or more.
  • the bending workability it is required that no cracks occur at the bent part. Furthermore, it is preferable that rough skin does not occur at the bend line and its vicinity. Even in the case of copper alloy plates of the same material, the ease of occurrence of cracking and rough skin due to bending depends on the ratio R / t of the bending radius R and the plate thickness t.
  • the bending processability of the copper alloy plate is usually performed by bending the direction of the bend line in the rolling parallel direction and the perpendicular direction at R / t ⁇ 2. In this case, it is required that no cracks occur.
  • the bending workability of the copper alloy plate it is preferable that no crack is generated by bending of R / t ⁇ 1.5, and it is more preferable that no crack is generated by bending of R / t ⁇ 1.0.
  • the bending workability of a copper alloy plate is generally tested with a test piece having a plate width of 10 mm (see the bending workability test in Examples described later).
  • the average crystal grain size (cutting method) measured in the plate width direction on the surface of the copper alloy plate is preferably 20 ⁇ m or less, and 15 ⁇ m or less. Is more preferable, and it is still more preferable that it is 10 micrometers or less.
  • the heat dissipation component manufactured by processing the copper alloy plate according to the embodiment of the present invention is softened when heated to a temperature of 600 ° C. or higher. It is preferable that the heat dissipating component after high-temperature heating has a strength that does not easily deform during conveyance and handling when performing an aging treatment. For that purpose, it is preferable to have a 0.2% yield strength of 50 MPa or more at the stage of heating at 850 ° C. for 30 minutes and then water cooling.
  • the heat-radiating component manufactured using the copper alloy plate according to the embodiment of the present invention is subjected to an aging treatment, and if necessary, at least a part of the outer surface mainly for the purpose of improving corrosion resistance and solderability.
  • An Sn coating layer is formed on the surface.
  • the Sn coating layer includes electroplating, electroless plating, or those formed by heating to a melting point of Sn or lower or higher than the melting point of Sn.
  • the Sn coating layer includes Sn metal and an Sn alloy, and the Sn alloy includes one or more of Bi, Ag, Cu, Ni, In, and Zn as alloy elements in addition to Sn in a total amount of 5% by mass or less. Things.
  • a base plating such as Ni, Co, Fe or the like can be formed under the Sn coating layer. These undercoats have a function as a barrier for preventing diffusion of Cu and alloy elements from the base material, and a function for preventing damage by increasing the surface hardness of the heat dissipation component.
  • a Cu-Sn alloy layer is formed by plating Cu on the base plating, further plating Sn, and then performing a heat treatment to heat to a temperature lower than or higher than the melting point of Sn to form a Cu-Sn alloy layer and Sn A three-layer structure of the coating layer can also be used.
  • the Cu—Sn alloy layer has a function as a barrier for preventing the diffusion of Cu and alloy elements from the base material, and a function for preventing damage by increasing the surface hardness of the heat dissipation component.
  • a Ni coating layer is formed on at least a part of the outer surface as necessary.
  • the Ni coating layer has a barrier that prevents the diffusion of Cu and alloy elements from the base material, a damage prevention by increasing the surface hardness of the heat dissipation component, and a function of improving corrosion resistance.
  • the composition of the copper alloy plate according to the embodiment of the present invention is composed of Co: 0.05 to 0.9% by mass, P: 0.01 to 0.25% by mass, and the balance Cu and inevitable impurities.
  • [Co] / [P] is 2 to 6, where [% by mass] is [Co] and the P content (% by mass) is [P].
  • Co forms a P compound (Co—P compound) with P and improves the strength and stress relaxation resistance of the copper alloy sheet. This P compound has a high solid solution temperature, and even if the copper alloy plate is heated to a high temperature of 600 ° C.
  • the higher the heating temperature of the copper alloy plate the higher the concentration of frozen vacancies after water cooling, and the more the nucleation sites of precipitates, the more the number density of precipitates can be increased by the subsequent aging treatment. Contributes to improvement in strength after aging treatment. If the Co content is less than 0.05% by mass or the P content is less than 0.01% by mass, the precipitation amount of the P compound is small, and the strength and stress relaxation resistance of the copper alloy cannot be improved.
  • Co is 0.05 to 0.9 mass%
  • the P content is 0.01 to 0.25 mass%.
  • the lower limit of the Co content is preferably 0.10% by mass, more preferably 0.15% by mass, and the upper limit is preferably 0.75% by mass, more preferably 0.60% by mass.
  • the lower limit of the P content is preferably 0.02% by mass, more preferably 0.03% by mass, and the upper limit is preferably 0.23% by mass, more preferably 0.22% by mass.
  • the P content is required within the above range.
  • the P content that does not contribute to precipitation is preferably as small as possible within the range where hydrogen embrittlement can be prevented.
  • the content ratio [Co] / [P] of Co and P is set to be in the range of 2-6.
  • [Co] / [P] is less than 2
  • the amount of P that does not contribute to the formation of the Co—P compound and dissolves in the base material increases, and when [Co] / [P] exceeds 6,
  • the amount of Co dissolved in the base material increases, and in any case, the conductivity of the copper alloy sheet after the aging treatment cannot be made 70% IACS or more.
  • the copper alloy may further contain Zn: 1.0% by mass or less (excluding 0% by mass), or / and Fe, Ni, Sn, Si, Al, Mn, Cr, Ti, Zr, Ag. 1 or 2 or more of Mg can be contained in a total amount of 0.005 to 0.5% by mass.
  • Zn has the effect
  • soldering may be required, and after manufacturing the heat dissipation component, Sn plating may be performed to improve corrosion resistance.
  • a copper alloy plate containing Zn is suitably used for manufacturing such a heat dissipation component.
  • the Zn content exceeds 1.0% by mass, the solder wettability decreases. Therefore, when Zn is contained, the Zn content is 1.0% by mass or less (not including 0% by mass). To do.
  • the Zn content is preferably 0.7% by mass or less, more preferably 0.5% by mass or less.
  • the Zn content is less than 0.01% by mass, the contribution to the improvement of the heat-resistant peelability is small, and the Zn content is preferably 0.01% by mass or more.
  • Zn content 0.05 mass% or more is more preferable, and 0.1 mass% or more is further more preferable.
  • the copper alloy plate of embodiment of this invention contains Zn, when it heats at the temperature of 500 degreeC or more, Zn will vaporize depending on heating atmosphere, the surface property of a copper alloy plate will be reduced, or a heating furnace will be contaminated. There are things to do. From the viewpoint of preventing vaporization of Zn, the Zn content is preferably 0.5% by mass or less, more preferably 0.4% by mass or less, further preferably 0.3% by mass or less, and still more preferably. 0.2 mass% or less.
  • Fe, Ni, Sn, Si, Al, Mn, Cr, Ti, Zr, Ag, and Mg have an effect of improving the strength and heat resistance of the copper alloy, and therefore one or more of these elements are contained. , Added as needed. However, if the content of these elements is large, the electrical conductivity of the copper alloy sheet is lowered. Therefore, when one or more of these elements are added, the total content is 0.005 to 0.5 mass. % Range.
  • Fe and Ni form phosphides ((Ni, Fe) -P compounds) with P in the same manner as Co. The effect of improving the strength of the copper alloy sheet due to the formation of phosphide is greatest for Co, followed by Fe and Ni.
  • Fe and Ni form an phosphide and P that did not form a phosphide with Co (reduced P dissolved in the base material), and have the effect of improving the strength of the copper alloy plate.
  • Fe has an effect of suppressing grain coarsening during high-temperature heating.
  • the Fe content is preferably 0.01% by mass or more, and the Ni content is preferably 0.02% by mass or more.
  • the Fe content is preferably 0.05% by mass or less, and the Ni content is preferably 0.1% by mass or less.
  • Sn and Mg are dissolved in the copper alloy matrix and have an effect of improving the strength and stress relaxation resistance of the copper alloy sheet.
  • the temperature or operating environment of the heat dissipating component is 80 ° C or higher, creep deformation occurs and the contact area with a heat source such as a CPU is reduced, reducing heat dissipation, but improving stress relaxation resistance. Thus, this phenomenon can be suppressed.
  • Sn content is 0.02 mass% or more
  • Mg content is 0.01 mass% or more.
  • the Sn content is preferably 0.2% by mass or less and the Mg content is preferably 0.2% by mass or less.
  • Si, Al, and Mn have the effect of improving the strength and heat resistance of the copper alloy.
  • content of Si, Al, and Mn is 0.01 mass% or more.
  • the Si content is 0.2% by mass or less
  • the Al content is 0.2% by mass or less
  • the Mn content is 0.1% by mass or less. It is preferable to do.
  • Cr, Ti, and Zr have the effect of improving the strength and heat resistance of the copper alloy and suppressing the coarsening of crystal grains during high-temperature heating.
  • both Cr content and Ti content are 0.01 mass% or more, and Zr content is 0.005 mass% or more.
  • the Cr content is 0.2% by mass or less, the Ti content is 0.1% by mass or less, and the Zr content is 0.05% by mass or less. It is preferable to do.
  • These elements easily form inclusions such as oxides and sulfides of several ⁇ m to several tens of ⁇ m, and when the inclusions are present on the surface, the corrosion resistance of the copper alloy plate is lowered.
  • the content of the element is in the above range, no particular problem occurs.
  • Ag has the effect of improving the strength and heat resistance of the copper alloy.
  • the Ag content is preferably in the range of 0.005 to 0.02 mass%.
  • H is preferably less than 1.5 ppm (mass ppm, the same applies hereinafter), more preferably less than 1 ppm, because it collects at the grain boundaries and the interface between inclusions and the base material during heating and generates swelling.
  • O is preferably less than 20 ppm, more preferably less than 15 ppm.
  • S, Pb, Bi, Sb, Se, As are preferably less than 30 ppm in total, and more preferably less than 20 ppm.
  • the total content of these elements is preferably less than 10 ppm, more preferably less than 5 ppm.
  • the copper alloy sheet according to the embodiment of the present invention comprises (1) hot rolling-cold rolling-annealing, (2) hot rolling-cold rolling-annealing-cold rolling after soaking the ingot. 3) It can be produced by processes such as hot rolling, cold rolling, annealing, cold rolling, and low temperature annealing.
  • the cold rolling-annealing step may be performed a plurality of times.
  • the annealing includes softening annealing, recrystallization annealing, or precipitation annealing (aging treatment).
  • the heating temperature may be selected from the range of 600 to 950 ° C.
  • the heating time may be selected from the range of 5 seconds to 1 hour.
  • continuous annealing is preferably performed at 600 to 950 ° C., preferably 670 to 900 ° C. for 3 minutes or less.
  • an aging treatment it is preferable to perform the aging treatment under a condition that the temperature is maintained at about 350 to 580 ° C. for 0.5 to 10 hours.
  • this aging treatment can be performed in a later step.
  • the final cold rolling is preferably selected from a range of a processing rate of 5 to 80% in accordance with the target 0.2% proof stress and bending workability.
  • Low temperature annealing softens the copper alloy plate without recrystallization in order to restore the ductility of the copper alloy plate.
  • continuous annealing it is maintained at 300 to 650 ° C. for about 1 second to 5 minutes. It is good to set in.
  • batch-type annealing it is preferable that the solid temperature of the copper alloy plate is maintained at 250 ° C. to 400 ° C. for about 5 minutes to 1 hour.
  • a copper alloy plate having excellent bending workability with a 0.2% proof stress of 100 MPa or more and an elongation of 3% or more can be produced. Further, this copper alloy sheet has a 0.2% proof stress of 150 MPa or more and a conductivity of 70% IACS or more when aging treatment is performed at 850 ° C. for 30 minutes and then at 500 ° C. for 2 hours. In order to enable good bonding (no bonding failure, high bonding strength, etc.) by a method such as diffusion bonding or brazing at a temperature of 600 ° C.
  • the surface roughness of the copper alloy plate (product) is The arithmetic average roughness Ra is 0.3 ⁇ m or less, the maximum height roughness Rz is 1.5 ⁇ m or less, and the internal oxidation depth is 0.5 ⁇ m or less, preferably 0.3 ⁇ m or less.
  • the surface roughness in the roll axis direction of the rolling roll used for the final cold rolling is, for example, Ra: 0.15 ⁇ m Rz: 1.0 ⁇ m or less, or polishing such as buffing or electrolytic polishing may be performed on the copper alloy plate after the final cold rolling.
  • the annealing atmosphere should be reducible and the dew point should be ⁇ 5 ° C. or less, or the annealed copper alloy sheet should be mechanically polished
  • the generated internal oxide layer may be removed or thinned by electrolytic polishing (buffing, brushing, etc.).
  • the copper alloy plate according to the embodiment of the present invention As a standard manufacturing method, the copper alloy plate according to the embodiment of the present invention, as a standard manufacturing method, after soaking the ingot and hot rolling, cold rolling, recrystallization treatment with solution, cold rolling (can be omitted) ), Manufactured in the aging treatment process. Cold rolling after recrystallization treatment with solution treatment can be omitted. Further, after the aging treatment, cold rolling can be further performed.
  • a copper alloy plate produced by this production method using a copper alloy having the above composition has high strength (0.2% proof stress is 300 MPa or more), elongation is 3% or more, and has excellent bending workability. Further, when this copper alloy sheet is heated at 850 ° C. for 30 minutes and then heated at 500 ° C. for 2 hours, it has a 0.2% proof stress of 150 MPa or more and a conductivity of 70% IACS or more.
  • Melting and casting can be performed by ordinary methods such as continuous casting and semi-continuous casting.
  • the homogenization treatment is preferably held for 30 minutes or more after the inside of the ingot reaches a temperature of 800 ° C. or higher.
  • the holding time of the homogenization treatment is more preferably 1 hour or more, and further preferably 2 hours or more.
  • hot rolling is started at a temperature of 800 ° C. or higher.
  • the hot rolling is preferably completed at a temperature of 600 ° C. or higher, and then rapidly cooled by a method such as water cooling.
  • the end temperature of hot rolling is preferably 600 ° C. or higher, and more preferably 700 ° C. or higher.
  • the structure of the hot-rolled material rapidly cooled after hot rolling becomes a recrystallized structure.
  • the recrystallization process accompanied by solutionization described later can also be performed by performing rapid cooling after hot rolling.
  • a copper alloy sheet having a desired recrystallized structure (fine recrystallized structure) is obtained after the subsequent recrystallization process.
  • the recrystallization treatment with solution treatment is performed at 600 to 950 ° C., preferably at 670 to 900 ° C. for 3 minutes or less.
  • the content of Co and P in the copper alloy is small, it is preferable to carry out in a lower temperature region within the above temperature range, and when the content of Co and P is large, it is preferably carried out in a higher temperature region within the above temperature range.
  • the aging treatment is performed under the condition of holding at a heating temperature of about 300 to 580 ° C. for 0.5 to 10 hours. If the heating temperature is less than 300 ° C., the amount of precipitation is small, and if it exceeds 580 ° C., the precipitate tends to become coarse.
  • the lower limit of the heating temperature is preferably 350 ° C, and the upper limit is preferably 570 ° C, more preferably 560 ° C.
  • the holding time for the aging treatment is appropriately selected depending on the heating temperature, and is carried out within the range of 0.5 to 10 hours. If this holding time is less than 0.5 hours, precipitation is insufficient, and if it exceeds 10 hours, the amount of precipitation is saturated and productivity is lowered.
  • the lower limit of the holding time is preferably 1 hour, more preferably 2 hours.
  • Copper alloys having the compositions shown in Tables 1 and 2 were cast to produce ingots each having a thickness of 45 mm.
  • H which is an inevitable impurity, was less than 1 ppm
  • O was less than 15 ppm
  • S, Pb, Bi, Sb, Se, and As were less than 20 ppm in total.
  • Each ingot was subjected to a soaking treatment at 965 ° C. for 3 hours, followed by hot rolling to obtain a hot-rolled material having a plate thickness of 15 mm, and quenching (water cooling) from a temperature of 650 ° C. or higher.
  • the surface roughness of any copper alloy plate is Ra: 0.08 to 0.15 ⁇ m, Rz: 0.8 to 1.2 ⁇ m, and the cross section of the plate thickness
  • the internal oxidation depth measured by a scanning electron microscope (observation magnification: 15000 times) was 0.1 ⁇ m or less.
  • each measurement test of electrical conductivity, mechanical characteristics, bending workability, and solder wettability was performed in the following manner. The results are shown in Tables 3 and 4.
  • the obtained copper alloy sheet was heated at 850 ° C. for 30 minutes and then water-cooled, and further heated at 500 ° C. for 2 hours (aging precipitation treatment) as test materials, respectively. A measurement test was conducted. The results are shown in Tables 3 and 4.
  • the conductivity was measured by a four-terminal method using a double bridge in accordance with the nonferrous metal material conductivity measurement method defined in JIS-H0505.
  • Mechanism of conductivity A JIS No. 5 tensile test piece was cut out from the specimen so that the longitudinal direction was parallel to the rolling direction, and a tensile test was performed in accordance with JIS-Z2241, thereby measuring the yield strength and elongation.
  • the yield strength is a tensile strength corresponding to a permanent elongation of 0.2%.
  • solder wettability A strip-shaped test piece having a width of 10 mm and a length of 35 mm is collected from each sample material so that the longitudinal direction is parallel to the rolling direction, and dip-coated for 1 second on an inactive flux ( ⁇ 100 manufactured by Nippon ⁇ Metals Co., Ltd.).
  • the solder wetting time was measured by the meniscograph method (according to JIS C0053 soldering test method (equilibrium method), SAT5100 manufactured by Reska Co., Ltd.).
  • the solder used was Sn-3 mass% Ag-0.5 mass% Cu maintained at 260 ⁇ 5 ° C., and the test was performed under the test conditions of an immersion speed of 25 mm / sec, an immersion depth of 5 mm, and an immersion time of 5 sec. A solder wetting time of 2 seconds or less was evaluated as having excellent solder wettability. Except for Comparative Example 5, the solder wetting time was 2 seconds or less.
  • the copper alloy sheets of Examples 1 to 18 shown in Tables 1 and 3 were subjected to an aging treatment in which the alloy composition satisfied the provisions of the embodiment of the present invention, heated at 850 ° C. for 30 minutes, and then heated at 500 ° C. for 2 hours.
  • the later strength (0.2% proof stress) is 150 MPa or more, and the conductivity is 70% IACS or more.
  • the copper alloy sheet before being heated at 850 ° C. has a strength (0.2% yield strength) of 100 MPa or more and an elongation of 3% or more, and is excellent in bending workability and solder wettability. Even after heating at 850 ° C., many have a strength of 50 MPa or more (0.2% yield strength).
  • the yield strength value after aging treatment of Example 6 was 162 MPa, and the hardness was Hv83 (measured at a test force of 0.49 N).
  • the copper alloy sheets of Comparative Examples 1 to 8 shown in Tables 2 and 4 are inferior in some characteristics as shown below.
  • Comparative Example 1 since the Co content is excessive, bending workability is inferior, and the strength and electrical conductivity after aging treatment are low.
  • Comparative Example 2 since the P content was excessive, cracks occurred during hot rolling, and it was not possible to proceed to the process after hot rolling.
  • Comparative Example 3 [Co] / [P] is high, and the strength and conductivity after the aging treatment are low.
  • [Co] / [P] is low, and the strength and conductivity after aging treatment are low.
  • Comparative Example 5 the Zn content was excessive and the solder wettability was poor as described above.
  • Comparative Example 6 since the sum of elements other than the main elements (Al, Mn, etc.) was excessive, the electrical conductivity after the aging treatment was low. Since the comparative example 7 lacked P content, the intensity
  • Examples 2 and 10 Of the copper alloy plates shown in Tables 1 and 2, representative examples (Examples 2 and 10, Comparative Examples 3 and 4) were heated at 1000 ° C. for 30 minutes and then water-cooled, and further heated at 500 ° C. for 2 hours (aging treatment). Then, using the copper alloy plate as a test material, each measurement test of conductivity and mechanical properties was performed by the method described in Example 1. The results are shown in Table 5.
  • Aspect 1 Co: 0.05 to 0.9 mass%, P: 0.01 to 0.25 mass%, the balance is made of Cu and inevitable impurities, the Co content is [Co], and the P content is [P].
  • [Co] / [P] is 2 to 6, 0.2% proof stress is 100 MPa or more, elongation is 3% or more, has excellent bending workability, is heated at 850 ° C. for 30 minutes and then water-cooled. Then, after aging treatment at 500 ° C. for 2 hours, the 0.2% proof stress is 150 MPa or more and the conductivity is 70% IACS or more.
  • a copper alloy sheet for a heat-dissipating component characterized by including a process for aging and an aging treatment.
  • the copper alloy plate for heat-radiating components described in the aspect 1 is characterized by containing not more than 1.0% by mass of Zn (not including 0% by mass).
  • Aspect 3 Further, it is characterized by containing 0.005 to 0.5 mass% in total of one or more of Fe, Ni, Sn, Si, Al, Mn, Cr, Ti, Zr, Ag, and Mg.
  • Aspect 4 After processing the copper alloy plate for a heat-dissipating part described in any one of the aspects 1 to 3 into a predetermined shape, a process of heating to 600 ° C.
  • a heat radiating component manufacturing method comprising obtaining a heat radiating component having a 0.2% proof stress and a conductivity of 70% IACS or higher.
  • Aspect 5 After the aging treatment, the Sn covering layer is formed on at least a part of the outer surface of the heat dissipating component.
  • Aspect 6 After the aging treatment, the Ni covering layer is formed on at least a part of the outer surface of the heat dissipating part.

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Abstract

This copper alloy sheet for a heat dissipation component is characterized in that: the copper alloy sheet for a heat dissipation component comprises 0.05-0.9% by mass of Co, and 0.01-0.25% by mass of P, the balance being Cu and inevitable impurities; [Co]/[P] is 2-6 when [Co] represents the Co content and [P] represents the P content; the 0.2% proof stress is 100 MPa or more; the elongation is 3% or more; the bending workability is excellent; the 0.2% proof stress is 150 MPa or more and the conductivity is 70% IACS or more after heating at 850°C for 30 minutes followed by cooling with water and then an aging treatment of heating at 500°C for 2 hours; and a process of heating to a temperature of 600°C or higher and an aging treatment are included as part of a process for producing a heat dissipation component.

Description

放熱部品用銅合金板、放熱部品、及び放熱部品の製造方法Copper alloy plate for heat dissipation component, heat dissipation component, and manufacturing method of heat dissipation component
 本開示は、コンピューターのCPU、LEDランプ等から発生する熱を処理する放熱板、ヒートシンク、ヒートパイプ等に用いる放熱部品用銅合金板に関する。特に、放熱部品の製造プロセスの一部として、ろう付け、拡散接合、脱気等、高温に加熱するプロセスが含まれる場合に用いられる放熱部品用銅合金板に関する。 The present disclosure relates to a heat sink, a heat sink, a copper alloy plate for heat dissipating parts used for a heat pipe and the like for processing heat generated from a CPU of a computer, an LED lamp, and the like. In particular, the present invention relates to a copper alloy plate for a heat dissipation component that is used when a process of heating to a high temperature such as brazing, diffusion bonding, deaeration, or the like is included as part of the manufacturing process of the heat dissipation component.
 デスク型PC、ノート型PC等に搭載されるCPUの動作速度の高速化及び高集積密度化が急速に進展し、これらのCPUからの発熱量が一段と増大している。CPUの温度が一定以上の温度に上昇すると、誤作動、熱暴走などの原因となるため、CPU等の半導体装置からの効果的な放熱は切実な問題となっている。
 半導体装置の熱を吸収し、大気中に放散させる放熱部品してヒートシンクが使われている。ヒートシンクには高熱伝導性が求められることから、素材として熱伝導率の大きい銅、アルミニウムなどが用いられる。しかし、対流熱抵抗が、ヒートシンクの性能を制限しており、発熱量が増大する高機能電子部品の放熱要求を満たすことが難しくなってきている。
The speed of operation and the increase in integration density of CPUs mounted on desk-type PCs, notebook-type PCs and the like are rapidly progressing, and the amount of heat generated from these CPUs is further increased. When the temperature of the CPU rises above a certain level, it causes malfunctions, thermal runaway, etc., so effective heat dissipation from a semiconductor device such as a CPU is a serious problem.
Heat sinks are used as heat dissipating parts that absorb the heat of semiconductor devices and dissipate them into the atmosphere. Since the heat sink is required to have high thermal conductivity, copper, aluminum, or the like having a high thermal conductivity is used as a material. However, the convective heat resistance limits the performance of the heat sink, and it has become difficult to satisfy the heat dissipation requirement of high-functional electronic components that increase the amount of heat generation.
 このため、より高い放熱性を有する放熱部品として、高い熱伝導性及び熱輸送能力を備える管状ヒートパイプ及び平面状ヒートパイプ(ベーパーチャンバー)が提案されている。ヒートパイプは、内部に封入した冷媒の蒸発(CPUからの吸熱)と凝縮(吸収した熱の放出)が循環的に行われることにより、ヒートシンクに比べて高い放熱特性を発揮する。また、ヒートパイプをヒートシンクやファンといった放熱部品と組合せることにより、半導体装置の発熱問題を解決することが提案されている。 For this reason, tubular heat pipes and flat heat pipes (vapor chambers) having high heat conductivity and heat transport capability have been proposed as heat dissipating parts having higher heat dissipating properties. The heat pipe exhibits higher heat dissipation characteristics than the heat sink by cyclically performing evaporation (heat absorption from the CPU) and condensation (release of absorbed heat) of the refrigerant sealed inside. It has also been proposed to solve the heat generation problem of semiconductor devices by combining heat pipes with heat radiating components such as heat sinks and fans.
 放熱板、ヒートシンク、ヒートパイプ等に用いられる放熱部品の素材として、導電率及び耐食性に優れる純銅製(無酸素銅:C1020)の板又は管が多用されている。成形加工性を確保するため、素材として軟質の焼鈍材(O材)または1/4H調質材が用いられるが、後述する放熱部品の製造工程において、変形及び疵が発生しやすい、打抜き加工時にバリが出やすい、打抜き金型が磨耗しやすい等の問題がある。一方、特許文献1,2には、放熱部品の素材としてFe-P系の銅合金板が記載されている。 As a material for heat dissipation parts used for heat dissipation plates, heat sinks, heat pipes, etc., pure copper (oxygen-free copper: C1020) plates or tubes having excellent conductivity and corrosion resistance are frequently used. In order to ensure moldability, soft annealed material (O material) or 1 / 4H tempered material is used as the material, but deformation and wrinkles are likely to occur in the manufacturing process of the heat dissipating parts described later, during punching processing There are problems such as burrs being easily generated and punching dies being easily worn. On the other hand, Patent Documents 1 and 2 describe an Fe—P-based copper alloy plate as a material for a heat dissipation component.
 放熱板及びヒートシンクは、純銅板をプレス成形、打抜き加工、切削、穴開け加工、エッチングなどにより所定形状に加工後、必要に応じてNiめっき、Snめっきを行ってからはんだ、ろう、接着剤等でCPU等の半導体装置と接合する。
 管状ヒートパイプ(特許文献3参照)は、銅粉末を管内に焼結してウィックを形成し、加熱脱ガス処理後、一端をろう付け封止し、真空又は減圧下で管内に冷媒を入れてからもう一方の端部をろう付け封止して製造する。
For heat sinks and heat sinks, pure copper plates are processed into a predetermined shape by press molding, punching, cutting, drilling, etching, etc., and then subjected to Ni plating and Sn plating as required before solder, brazing, adhesive, etc. To join with a semiconductor device such as a CPU.
A tubular heat pipe (see Patent Document 3) is formed by sintering copper powder in a tube to form a wick, heat-degassing treatment, brazing and sealing one end, and putting a refrigerant in the tube under vacuum or reduced pressure. And the other end is brazed and sealed.
 平面状ヒートパイプ(特許文献4,5参照)は、管状ヒートパイプの放熱性能を更に向上させたものである。平面状ヒートパイプとして、冷媒の凝縮と蒸発を効率的に行うために、管状ヒートパイプと同様に、内面に粗面化加工、溝加工等を行ったものが提案されている。プレス成形、打抜き加工、切削、エッチングなどの加工を行った上下2枚の純銅板を、ろう付け、拡散接合、溶接等の方法により接合し、内部に冷媒を入れた後、ろう付け等の方法により封止する。接合工程で脱ガス処理が行われることがある。 The planar heat pipe (see Patent Documents 4 and 5) is a further improvement of the heat dissipation performance of the tubular heat pipe. In order to efficiently condense and evaporate the refrigerant, a flat heat pipe has been proposed in which the inner surface is roughened, grooved, and the like, similar to the tubular heat pipe. A method of brazing, etc. after joining two upper and lower pure copper plates that have undergone processing such as press molding, punching, cutting, etching, etc. by brazing, diffusion bonding, welding, etc. Seal with. A degassing process may be performed in a joining process.
 また、平面状ヒートパイプとして、外面部材と、外面部材の内部に収容される内部部材とより構成されたものが提案されている。内部部材は、冷媒の凝縮、蒸発、輸送を促進するために、外面部材の内部に一又は複数配置されるもので、種々の形状のフィン、突起、穴、スリット等が加工されている。この形式の平面状ヒートパイプにおいても、内部部材を外面部材の内部に配置した後、ろう付け、拡散接合等の方法により外面部材と内部部材を接合一体化し、冷媒を入れた後、ろう付け等の方法により封止する。
 電子部品の発熱がさらに大きくなり、ベーパーチャンバーの放熱能力を超える場合、ベーパーチャンバーと同様の内部構造を有し、冷媒を外部から連続的に供給する形式の放熱部品が用いられる(特許文献6参照)。このタイプの放熱部品は、筐体内部を低圧にする必要がない。このタイプの放熱部品の筐体に用いられる部材、及び筐体の製造方法は基本的にベーパーチャンバーと同じである。
Moreover, what was comprised from the outer surface member and the internal member accommodated in the inside of an outer surface member as a planar heat pipe is proposed. One or a plurality of internal members are arranged inside the outer surface member in order to promote condensation, evaporation, and transport of the refrigerant, and various shapes of fins, protrusions, holes, slits, and the like are processed. Also in this type of flat heat pipe, after placing the internal member inside the external surface member, the external surface member and the internal member are joined and integrated by a method such as brazing or diffusion bonding, brazing, etc. It seals by the method of.
When the heat generation of the electronic component further increases and exceeds the heat dissipation capability of the vapor chamber, a heat dissipation component having the same internal structure as the vapor chamber and continuously supplying the refrigerant from the outside is used (see Patent Document 6). ). This type of heat dissipation component does not require a low pressure inside the housing. The members used for the casing of this type of heat radiation component and the method for manufacturing the casing are basically the same as those of the vapor chamber.
特開2003-277853号公報JP 2003-277853 A 特開2014-189816号公報JP 2014-189816 A 特開2008-232563号公報JP 2008-232563 A 特開2007-315745号公報JP 2007-315745 A 特開2014-134347号公報JP 2014-134347 A 国際公開第2014/171276号International Publication No. 2014/171276
 これらの放熱部品の製造工程において、放熱板、ヒートシンクは、はんだ付け、ろう付けの工程で200~700℃程度に加熱される。管状ヒートパイプ、平面状ヒートパイプは、焼結、脱ガス、りん銅ロウ(BCuP-2等)を用いたろう付け、拡散接合、溶接などの工程で800~1000℃程度に加熱される。
 例えば、ヒートパイプの素材として純銅板を用いた場合、600℃以上の温度で加熱をしたときの軟化が激しい。また、急激な結晶粒の粗大化が生じる。このため、ヒートシンク、半導体装置への取付け、又はPC筐体への組込み等の際に、製造したヒートパイプが変形しやすく、ヒートパイプ内部の構造が変化してしまい、また表面の凹凸が大きくなり、所期の放熱性能を発揮できなくなってしまう問題がある。また、このような変形を避けるには純銅板の厚さを厚くすればよいが、そうするとヒートパイプの質量、及び厚さが増大する。厚さが増大した場合、PC筐体内部の隙間が小さくなり、対流伝熱性能が低下する問題がある。
In the manufacturing process of these heat radiating components, the heat radiating plate and the heat sink are heated to about 200 to 700 ° C. in the soldering and brazing processes. Tubular heat pipes and planar heat pipes are heated to about 800 to 1000 ° C. in steps such as sintering, degassing, brazing using phosphor copper brazing (BCuP-2, etc.), diffusion bonding, and welding.
For example, when a pure copper plate is used as the heat pipe material, the softening is severe when heated at a temperature of 600 ° C. or higher. In addition, the crystal grains become abruptly coarsened. For this reason, the manufactured heat pipe is easily deformed when it is attached to a heat sink, a semiconductor device, or incorporated into a PC case, and the structure inside the heat pipe changes, and the unevenness of the surface increases. There is a problem that the desired heat dissipation performance cannot be exhibited. Moreover, in order to avoid such a deformation | transformation, what is necessary is just to thicken the thickness of a pure copper plate, but if it does so, the mass and thickness of a heat pipe will increase. When the thickness increases, there is a problem that the gap inside the PC casing is reduced and the convective heat transfer performance is lowered.
 また、特許文献1,2に記載された銅合金板(Cu-Fe-P系合金)も、600℃以上の温度で加熱をすると軟化し、さらに純銅に比べて導電率が大きく低下する。このため、焼結、脱ガス、ろう付け、拡散接合、溶接等の工程を経て例えば平面状ヒートパイプを製造した場合、同ヒートパイプの搬送及びハンドリング、基盤への組込み工程等で容易に変形する。また、導電率が低下することで、ヒートパイプとしての所期の性能が出なくなる。 Also, the copper alloy plates (Cu—Fe—P alloys) described in Patent Documents 1 and 2 are softened when heated at a temperature of 600 ° C. or higher, and the conductivity is greatly reduced as compared with pure copper. For this reason, for example, when a flat heat pipe is manufactured through processes such as sintering, degassing, brazing, diffusion bonding, welding, etc., it is easily deformed by the process of transporting and handling the heat pipe, incorporating it into the substrate, etc. . Moreover, the expected performance as a heat pipe cannot be obtained due to the decrease in conductivity.
 本発明の実施形態は、純銅又は銅合金板から放熱部品を製造するプロセスの一部に600℃以上の温度に加熱するプロセスが含まれる場合の上記問題点に鑑みてなされたもので、600℃以上の温度に加熱するプロセスを経て製造された放熱部品に、十分な強度と放熱性能を持たせることができる銅合金板を提供することを目的とする。 The embodiment of the present invention has been made in view of the above problems when a process of heating to a temperature of 600 ° C. or higher is included in a part of the process of manufacturing a heat dissipation component from pure copper or a copper alloy plate. It aims at providing the copper alloy board which can give sufficient intensity | strength and heat dissipation performance to the thermal radiation component manufactured through the process heated to the above temperature.
 析出硬化型銅合金は、溶体化処理後、時効処理を行うことで、強度及び導電率が向上する。しかし、析出硬化型銅合金は、溶体化処理後、冷間で塑性加工を加えて析出サイトとなる塑性歪みを合金中に導入した後、時効処理を行うのでなければ、時効処理による強度及び導電率の向上効果が低い場合がある。
 ろう付け、拡散接合、溶接等の加熱工程を経て製作されたベーパチャンバー等の放熱部品の場合、前記加熱工程後に塑性加工が加えられることはない。従って、前記放熱部品を析出硬化型銅合金の板材から製作した場合に、溶体化処理に相当する上記加熱工程後、時効処理を施しても、強度及び導電率が十分向上しない場合がある。
 一方、本発明者らは、析出硬化型銅合金のうちCu-Cо-P系合金において、Co、Pの組成範囲及びCo/P比を限定することにより、上記加熱工程後、塑性加工を加えることなく時効処理した場合でも、放熱部品の強度及び導電率が大きく向上することを見出し、本発明の実施形態に到達した。
A precipitation hardening type copper alloy improves strength and conductivity by performing an aging treatment after the solution treatment. However, the precipitation hardening type copper alloy, after solution treatment, after applying plastic working in the cold and introducing the plastic strain that becomes the precipitation site into the alloy, if not aging treatment, strength and conductivity by aging treatment The rate improvement effect may be low.
In the case of a heat-radiating component such as a vapor chamber manufactured through a heating process such as brazing, diffusion bonding, or welding, plastic processing is not applied after the heating process. Therefore, when the heat radiating component is manufactured from a plate material of a precipitation hardening type copper alloy, the strength and conductivity may not be sufficiently improved even if an aging treatment is performed after the heating step corresponding to the solution treatment.
On the other hand, the present inventors add plastic working after the heating step by limiting the composition range of Co and P and the Co / P ratio in the Cu—Cо—P alloy among precipitation hardening type copper alloys. Even when the aging treatment is performed without any problems, the inventors have found that the strength and conductivity of the heat dissipating component are greatly improved, and have reached the embodiments of the present invention.
 本発明の実施形態に係る放熱部品用銅合金板は、放熱部品を製造するプロセスの一部として、600℃以上に加熱するプロセスと時効処理が含まれる場合に用いられ、Co:0.05~0.9質量%、P:0.01~0.25質量%、残部がCu及び不可避不純物からなり、Co含有量(質量%)を[Co]とし、P含有量(質量%)を[P]としたとき、[Co]/[P]が2~6であり、0.2%耐力が100MPa以上、伸びが3%以上で、優れた曲げ加工性を有する。そして、この銅合金板は、850℃で30分加熱後水冷し、次いで500℃で2時間加熱する時効処理をした後の0.2%耐力が150MPa以上、導電率が70%IACS以上である。なお、銅合金板の0.2%耐力が150MPa以上は、硬さに換算すればHv75以上に相当する。引張試験による0.2%耐力の測定が困難な場合、JISZ2244(2009)の規定に準拠してビッカース硬さを測定することで、0.2%耐力が150MPa以上であるかどうかを推測できる。 The copper alloy plate for heat dissipation component according to the embodiment of the present invention is used when a process of heating to 600 ° C. or higher and an aging treatment are included as part of the process of manufacturing the heat dissipation component, Co: 0.05 to 0.9 mass%, P: 0.01 to 0.25 mass%, the balance is made of Cu and inevitable impurities, Co content (mass%) is [Co], P content (mass%) is [P ], [Co] / [P] is 2 to 6, 0.2% proof stress is 100 MPa or more, elongation is 3% or more, and has excellent bending workability. The copper alloy sheet has a 0.2% proof stress of 150 MPa or more and an electrical conductivity of 70% IACS or more after aging at 850 ° C. for 30 minutes, followed by water cooling and then heating at 500 ° C. for 2 hours. . A 0.2% proof stress of the copper alloy plate of 150 MPa or more corresponds to Hv75 or more in terms of hardness. When it is difficult to measure the 0.2% yield strength by a tensile test, it can be estimated whether the 0.2% yield strength is 150 MPa or more by measuring the Vickers hardness in accordance with the provisions of JISZ2244 (2009).
 上記放熱部品用銅合金板は、必要に応じて、合金元素としてさらに、Znを1.0質量%以下(0質量%を含まず)含有することができる。また、本発明の実施形態に係る放熱部品用銅合金板は、必要に応じて、合金元素としてさらに、Fe,Ni,Si,Al,Mn,Cr,Sn,Ti,Zr,Ag,Mgのうち1種又は2種以上を合計で0.005~0.5質量%以下含有することができる。上記銅合金板は、Fe,Ni,Si,Al,Mn,Cr,Sn,Ti,Zr,Ag,Mgの1種又は2種以上とZnを同時に含有することができる。 The copper alloy plate for a heat dissipation component can further contain 1.0% by mass or less (not including 0% by mass) of Zn as an alloy element, if necessary. Moreover, the copper alloy plate for heat radiating components according to the embodiment of the present invention further includes Fe, Ni, Si, Al, Mn, Cr, Sn, Ti, Zr, Ag, and Mg as alloy elements as necessary. One or two or more kinds can be contained in a total amount of 0.005 to 0.5% by mass or less. The copper alloy plate may contain one or more of Fe, Ni, Si, Al, Mn, Cr, Sn, Ti, Zr, Ag, and Mg and Zn at the same time.
 本発明の実施形態に係る銅合金板は、放熱部品を製造するプロセスの一部として、600℃以上に加熱するプロセスと時効処理が含まれる場合に使用される。つまり、本発明の実施形態に係る銅合金板を用いて製造した放熱部品は、600℃以上に高温加熱後、塑性加工を受けることなく時効処理され、強度が向上している。
 本発明の実施形態に係る銅合金板は、100MPa以上の高い強度(0.2%耐力)を有するため、銅合金板を放熱部品に加工する際の搬送及びハンドリングにおいて容易に変形しない。また、3%以上の伸び及び優れた曲げ加工性を有するため、前記加工が支障なく実行できる。
The copper alloy plate which concerns on embodiment of this invention is used when the process and aging treatment which are heated to 600 degreeC or more are included as a part of process of manufacturing a thermal radiation component. That is, the heat-radiating component manufactured using the copper alloy plate according to the embodiment of the present invention is subjected to aging treatment without being subjected to plastic working after high-temperature heating to 600 ° C. or higher, and the strength is improved.
Since the copper alloy plate according to the embodiment of the present invention has a high strength (0.2% proof stress) of 100 MPa or more, the copper alloy plate is not easily deformed in conveyance and handling when the copper alloy plate is processed into a heat radiating component. Moreover, since it has an elongation of 3% or more and excellent bending workability, the processing can be performed without any trouble.
 本発明の実施形態に係る銅合金板は、850℃に30分加熱し、次いで時効処理を行ったとき、0.2%耐力が150MPa以上、導電率が70%IACS以上である。本発明の実施形態に係る銅合金板は、時効処理後の強度が高いため、この銅合金板を用いて製造したヒートパイプ等の放熱部品を、ヒートシンク、半導体装置へ取り付け、又はPC筐体等に組み込む際に、該放熱部品が変形しにくい。また、本発明の実施形態に係る銅合金板は、導電率が純銅板より低いが、時効処理後の強度が高いため薄肉化でき、放熱性能の点で導電率の低下分を補うことができる。 When the copper alloy plate according to the embodiment of the present invention is heated to 850 ° C. for 30 minutes and then subjected to an aging treatment, the 0.2% proof stress is 150 MPa or more and the conductivity is 70% IACS or more. Since the copper alloy plate according to the embodiment of the present invention has high strength after aging treatment, a heat dissipation component such as a heat pipe manufactured using the copper alloy plate is attached to a heat sink, a semiconductor device, or a PC housing When assembled in the heat sink, the heat dissipating component is hardly deformed. In addition, the copper alloy plate according to the embodiment of the present invention has a conductivity lower than that of a pure copper plate, but can be thinned because of its high strength after aging treatment, and can compensate for a decrease in conductivity in terms of heat dissipation performance. .
 以下、本発明の実施形態に係る放熱部品用銅合金板について、より詳細に説明する。
 本発明の実施形態に係る銅合金板は、プレス成形、打抜き加工、切削、エッチングなどにより所定形状に加工され、高温加熱(脱ガス、接合(ろう付け、拡散接合、溶接)、焼結等のための加熱)を経て、放熱部品に仕上げられる。放熱部品の種類及び製造方法により前記高温加熱の加熱条件が異なるが、本発明の実施形態では、前記高温加熱を600℃~1050℃程度で行う場合を想定している。本発明の実施形態に係る銅合金板は後述する組成のCo-P系銅合金からなり、前記温度範囲内に加熱すると、加熱前の母材に析出していたCo-P化合物の少なくとも一部が母材に固溶し、結晶粒が成長し、軟化及び導電率の低下が生じる。
Hereinafter, the copper alloy plate for heat dissipation components according to the embodiment of the present invention will be described in more detail.
The copper alloy plate according to the embodiment of the present invention is processed into a predetermined shape by press molding, punching, cutting, etching, etc., and is subjected to high temperature heating (degassing, bonding (brazing, diffusion bonding, welding), sintering, etc. For heat dissipation). Although the heating conditions for the high-temperature heating differ depending on the type of the heat dissipating component and the manufacturing method, the embodiment of the present invention assumes the case where the high-temperature heating is performed at about 600 ° C. to 1050 ° C. A copper alloy plate according to an embodiment of the present invention is made of a Co—P based copper alloy having a composition to be described later, and when heated within the temperature range, at least a part of the Co—P compound precipitated in the base material before heating. Is dissolved in the base material, crystal grains grow, and softening and decrease in conductivity occur.
 本発明の実施形態に係る銅合金板は、850℃で30分加熱後水冷し、次いで時効処理した後の強度(0.2%耐力)が150MPa以上、導電率が70%IACS以上である。850℃で30分の加熱は、放熱部品の製造における前記高温加熱のプロセスを想定した加熱条件である。本発明の実施形態に係る銅合金板をこの条件で高温加熱すると、加熱前の母材に析出していたCo-P化合物が母材に固溶し、結晶粒が成長し、軟化、及び導電率の低下が生じる。次いで前記銅合金板を時効処理すると、微細なCo-P化合物が析出する。これにより、前記高温加熱により低下した強度及び導電率が顕著に改善する。 The copper alloy plate according to the embodiment of the present invention has a strength (0.2% proof stress) after heating at 850 ° C. for 30 minutes, followed by water cooling, and then aging treatment, 150 MPa or more, and a conductivity of 70% IACS or more. Heating at 850 ° C. for 30 minutes is a heating condition that assumes the above-described high-temperature heating process in the manufacture of a heat dissipation component. When the copper alloy plate according to the embodiment of the present invention is heated at high temperature under these conditions, the Co—P compound precipitated in the base material before heating is dissolved in the base material, crystal grains grow, soften, and conduct The rate drops. Next, when the copper alloy sheet is subjected to an aging treatment, a fine Co—P compound is precipitated. Thereby, the intensity | strength and electrical conductivity which were reduced by the said high temperature heating improve notably.
 前記時効処理は、例えば、(a)高温加熱後の冷却工程中に析出温度範囲に一定時間保持する、(b)高温加熱後室温まで冷却し、その後析出温度範囲に再加熱して一定時間保持する、(c)前記(a)の工程後、析出温度範囲に再加熱して一定時間保持する、等の方法で実施することができる。
 具体的な時効処理条件として、300~580℃の温度範囲で5分~10時間保持する条件が挙げられる。強度の向上を優先するときは微細なCo-P化合物が生成する温度-時間条件を、導電率の向上を優先するときは母材に固溶するCo、Pが減少する過時効気味の温度-時間条件を、適宜選定すればよい。
The aging treatment can be performed, for example, by (a) maintaining the precipitation temperature range for a certain time during the cooling step after high-temperature heating, (b) cooling to room temperature after high-temperature heating, and then reheating to the precipitation temperature range and holding for a certain time. (C) After the step (a), it can be carried out by a method such as reheating to the precipitation temperature range and holding for a certain time.
Specific aging treatment conditions include a condition of holding at a temperature range of 300 to 580 ° C. for 5 minutes to 10 hours. When priority is given to improving the strength, the temperature-time conditions at which fine Co-P compounds are generated. When priority is given to improving the conductivity, the temperature of over-aging that reduces Co and P dissolved in the base material is reduced. What is necessary is just to select time conditions suitably.
 時効処理後の銅合金板は、高温加熱後の純銅板に比べて導電率は低いが、強度は純銅板に比べて顕著に高くなる。この効果を得るため、本発明の実施形態に係る銅合金板を用いて製造したヒートパイプ等の放熱部品は、高温加熱後時効処理される。時効処理条件は、前記のとおりである。時効処理後の放熱部品(銅合金板)は強度が高く、ヒートシンク、半導体装置へ取り付け、又はPC筐体等に組み込む際に、該放熱部品の変形を防止できる。また、本発明の実施形態に係る銅合金板(時効処理後)は、純銅板に比べて強度が高いため、薄肉化(0.1~1.0mm厚)することができ、そのことにより放熱部品の放熱性能を高め、純銅板と比べた場合の導電率の低下分を補うことができる。
 なお、本発明の実施形態に係る銅合金板は、高温加熱の温度が850℃未満(600℃以上)又は850℃超(1050℃以下)であっても、時効処理後に、150MPa以上の0.2%耐力、及び70%IACS以上の導電率を達成できる。
The copper alloy plate after the aging treatment has a lower electrical conductivity than the pure copper plate after high-temperature heating, but the strength is significantly higher than that of the pure copper plate. In order to acquire this effect, heat dissipation parts, such as a heat pipe manufactured using the copper alloy board concerning the embodiment of the present invention, are aging-treated after high temperature heating. The aging treatment conditions are as described above. The heat-dissipating component (copper alloy plate) after the aging treatment has high strength and can prevent deformation of the heat-dissipating component when it is attached to a heat sink, a semiconductor device, or incorporated in a PC housing or the like. In addition, since the copper alloy plate (after aging treatment) according to the embodiment of the present invention has higher strength than that of a pure copper plate, it can be thinned (0.1 to 1.0 mm thick). The heat dissipation performance of the parts can be improved, and the decrease in conductivity when compared with a pure copper plate can be compensated.
In addition, the copper alloy plate according to the embodiment of the present invention has a high-temperature heating temperature of less than 850 ° C. (600 ° C. or more) or more than 850 ° C. (1050 ° C. or less), after the aging treatment, at a pressure of 150 MPa or more. 2% yield strength and 70% IACS or higher conductivity can be achieved.
 本発明の実施形態に係る銅合金板は、600℃以上の温度に高温加熱される前に、プレス成形、打抜き加工、切削、エッチングなどにより、放熱部品に加工される。銅合金板は、前記加工に際しての搬送及びハンドリングにおいて容易に変形しない強度を有し、前記加工が支障なく実行できる機械的特性を有することが好ましい。より具体的には、本発明の実施形態に係る銅合金板は、0.2%耐力が100MPa以上、伸びが3%以上であり、優れた曲げ加工性を有する。以上の特性を満たしていれば、銅合金板の調質は問題にならない。例えば溶体化処理材、時効処理上がり、時効処理上り材を冷間圧延したものなど、いずれも使用可能である。伸びは、6%以上であることが好ましい。 The copper alloy plate according to the embodiment of the present invention is processed into a heat radiation component by press molding, punching, cutting, etching, or the like before being heated at a high temperature of 600 ° C. or higher. It is preferable that the copper alloy plate has a strength that does not easily deform during conveyance and handling during the processing, and has mechanical characteristics that allow the processing to be performed without hindrance. More specifically, the copper alloy sheet according to the embodiment of the present invention has a 0.2% proof stress of 100 MPa or more and an elongation of 3% or more, and has excellent bending workability. If the above characteristics are satisfied, the tempering of the copper alloy sheet is not a problem. For example, any of a solution-treated material, an aging-treated material, and a cold-rolled aging-treated material can be used. The elongation is preferably 6% or more.
 前記曲げ加工性については、曲げ部で割れが発生しないことが求められる。さらに、曲げ線及びその近傍において、肌荒れが発生しないことが好ましい。同一材質の銅合金板であっても、曲げによる割れ及び肌荒れの発生しやすさは、曲げ半径Rと板厚tの比率R/tに依存する。銅合金板を用いてベーパーチャンバー等の放熱部品を製造する場合、銅合金板の曲げ加工性として、通常、曲げ線の方向が圧延平行方向、及び直角方向共にR/t≦2の曲げを行った場合に割れが発生しないことが求められる。銅合金板の曲げ加工性として、R/t≦1.5の曲げで割れが発生しないことが好ましく、R/t≦1.0の曲げで割れが発生しないことがより好ましい。銅合金板の曲げ加工性は、一般に板幅10mmの試験片で試験される(後述する実施例の曲げ加工性試験を参照)。銅合金板材を曲げ加工する場合、曲げ幅が大きいほど割れが発生しやすくなることから、放熱部品として特に曲げ幅が大きい場合には、R/t=1.0の曲げで割れが発生しないことが好ましく、R/t=0.5の曲げで割れが発生しないことがより好ましい。また、曲げ線及びその近傍で肌荒れを発生させないためには、銅合金板の表面において板幅方向に測定した平均結晶粒径(切断法)が20μm以下であることが好ましく、15μm以下であることがより好ましく、10μm以下であることが一層好ましい。 For the bending workability, it is required that no cracks occur at the bent part. Furthermore, it is preferable that rough skin does not occur at the bend line and its vicinity. Even in the case of copper alloy plates of the same material, the ease of occurrence of cracking and rough skin due to bending depends on the ratio R / t of the bending radius R and the plate thickness t. When manufacturing heat dissipation parts such as a vapor chamber using a copper alloy plate, the bending processability of the copper alloy plate is usually performed by bending the direction of the bend line in the rolling parallel direction and the perpendicular direction at R / t ≦ 2. In this case, it is required that no cracks occur. As the bending workability of the copper alloy plate, it is preferable that no crack is generated by bending of R / t ≦ 1.5, and it is more preferable that no crack is generated by bending of R / t ≦ 1.0. The bending workability of a copper alloy plate is generally tested with a test piece having a plate width of 10 mm (see the bending workability test in Examples described later). When bending copper alloy sheets, cracks are more likely to occur as the bending width increases. Therefore, if the bending width is particularly large as a heat-dissipating part, cracks will not occur when bending at R / t = 1.0. Is preferable, and it is more preferable that no crack is generated by bending with R / t = 0.5. In order not to cause rough skin at the bend line and the vicinity thereof, the average crystal grain size (cutting method) measured in the plate width direction on the surface of the copper alloy plate is preferably 20 μm or less, and 15 μm or less. Is more preferable, and it is still more preferable that it is 10 micrometers or less.
 先に述べたとおり、本発明の実施形態に係る銅合金板を加工して製造した放熱部品は、600℃以上の温度に高温加熱すると軟化する。高温加熱後の放熱部品は、さらに時効処理を施す際の搬送及びハンドリングにおいて容易に変形しない強度を有することが好ましい。そのためには、850℃で30分加熱後水冷した段階で、50MPa以上の0.2%耐力を有することが好ましい。 As described above, the heat dissipation component manufactured by processing the copper alloy plate according to the embodiment of the present invention is softened when heated to a temperature of 600 ° C. or higher. It is preferable that the heat dissipating component after high-temperature heating has a strength that does not easily deform during conveyance and handling when performing an aging treatment. For that purpose, it is preferable to have a 0.2% yield strength of 50 MPa or more at the stage of heating at 850 ° C. for 30 minutes and then water cooling.
 本発明の実施形態に係る銅合金板を用いて製造された放熱部品は、時効処理を受けた後、必要に応じて、耐食性及びはんだ付け性の向上を主目的として、少なくとも外表面の一部にSn被覆層が形成される。Sn被覆層には、電気めっき、無電解めっき、あるいはこれらのめっき後、Snの融点以下又は融点以上に加熱して形成されたものが含まれる。Sn被覆層には、Sn金属とSn合金が含まれ、Sn合金としては、Sn以外に合金元素としてBi,Ag,Cu,Ni,In,Znのうち1種以上を合計で5質量%以下含むものが挙げられる。 The heat-radiating component manufactured using the copper alloy plate according to the embodiment of the present invention is subjected to an aging treatment, and if necessary, at least a part of the outer surface mainly for the purpose of improving corrosion resistance and solderability. An Sn coating layer is formed on the surface. The Sn coating layer includes electroplating, electroless plating, or those formed by heating to a melting point of Sn or lower or higher than the melting point of Sn. The Sn coating layer includes Sn metal and an Sn alloy, and the Sn alloy includes one or more of Bi, Ag, Cu, Ni, In, and Zn as alloy elements in addition to Sn in a total amount of 5% by mass or less. Things.
 Sn被覆層の下に、Ni,Co,Fe等の下地めっきを形成することができる。これらの下地めっきは、母材からのCu及び合金元素の拡散を防止するバリアとしての機能、及び放熱部品の表面硬さを大きくすることによる傷つき防止の機能を有する。前記下地めっきの上にCuをめっきし、さらにSnをめっき後、Snの融点以下又は融点以上に加熱する熱処理を行ってCu-Sn合金層を形成し、下地めっき、Cu-Sn合金層及びSn被覆層の3層構成とすることもできる。Cu-Sn合金層は、母材からのCu及び合金元素の拡散を防止するバリアとしての機能、及び放熱部品の表面硬さを大きくすることによる傷つき防止の機能を有する。 A base plating such as Ni, Co, Fe or the like can be formed under the Sn coating layer. These undercoats have a function as a barrier for preventing diffusion of Cu and alloy elements from the base material, and a function for preventing damage by increasing the surface hardness of the heat dissipation component. A Cu-Sn alloy layer is formed by plating Cu on the base plating, further plating Sn, and then performing a heat treatment to heat to a temperature lower than or higher than the melting point of Sn to form a Cu-Sn alloy layer and Sn A three-layer structure of the coating layer can also be used. The Cu—Sn alloy layer has a function as a barrier for preventing the diffusion of Cu and alloy elements from the base material, and a function for preventing damage by increasing the surface hardness of the heat dissipation component.
 また、本発明の実施形態に係る銅合金板を用いて製造された放熱部品は、時効処理を受けた後、必要に応じて、少なくとも外表面の一部にNi被覆層が形成される。Ni被覆層は、母材からのCu及び合金元素の拡散を防止するバリア、放熱部品の表面硬さを大きくすることによる傷つき防止、及び耐食性を向上させる機能を有する。 In addition, after the heat dissipation component manufactured using the copper alloy plate according to the embodiment of the present invention is subjected to an aging treatment, a Ni coating layer is formed on at least a part of the outer surface as necessary. The Ni coating layer has a barrier that prevents the diffusion of Cu and alloy elements from the base material, a damage prevention by increasing the surface hardness of the heat dissipation component, and a function of improving corrosion resistance.
 次に本発明の実施形態に係る銅合金板の組成について説明する。
 本発明の実施形態に係る銅合金の組成は、Co:0.05~0.9質量%、P:0.01~0.25質量%、及び残部Cu及び不可避不純物からなり、Co含有量(質量%)を[Co]とし、P含有量(質量%)を[P]としたとき、[Co]/[P]が2~6である。
 Coは、Pとの間にP化合物(Co-P化合物)を生成し、銅合金板の強度及び耐応力緩和特性を向上させる。このP化合物は固溶温度が高く、銅合金板が600℃以上の高温(例えば850℃)に加熱されても一部は比較的安定に存在し、結晶粒径の粗大化が防止される。一方、銅合金板の加熱温度が高いほど、水冷後の凍結空孔濃度が高くなり、析出物の核生成サイトが増えるため、続いて行われる時効処理により析出物の数密度を増やすことができ、これは時効処理後の強度の向上に寄与する。Co含有量が0.05質量%未満又はP含有量が0.01質量%未満では、P化合物の析出量が少なく、銅合金の強度及び耐応力緩和特性を向上させることができない。一方、Co含有量が0.9質量%を超え又はP含有量が0.25質量%を超えると、時効処理後の銅合金において70%IACS以上の導電率を達成できない。また、粗大な酸化物、晶出物、析出物などが生成して熱間加工性が低下し、かつ銅合金板の強度、耐応力緩和特性、及び曲げ加工性が低下する。従って、Coは0.05~0.9質量%、P含有量は0.01~0.25質量%とする。Co含有量の下限値は、好ましくは0.10質量%、より好ましくは0.15質量%であり、上限値は、好ましくは0.75質量%、より好ましくは0.60質量%である。P含有量の下限値は、好ましくは0.02質量%、より好ましくは0.03質量%であり、上限値は、好ましくは0.23質量%、より好ましくは0.22質量%である。
Next, the composition of the copper alloy plate according to the embodiment of the present invention will be described.
The composition of the copper alloy according to the embodiment of the present invention is composed of Co: 0.05 to 0.9% by mass, P: 0.01 to 0.25% by mass, and the balance Cu and inevitable impurities. [Co] / [P] is 2 to 6, where [% by mass] is [Co] and the P content (% by mass) is [P].
Co forms a P compound (Co—P compound) with P and improves the strength and stress relaxation resistance of the copper alloy sheet. This P compound has a high solid solution temperature, and even if the copper alloy plate is heated to a high temperature of 600 ° C. or higher (for example, 850 ° C.), a part thereof exists relatively stably and the coarsening of the crystal grain size is prevented. On the other hand, the higher the heating temperature of the copper alloy plate, the higher the concentration of frozen vacancies after water cooling, and the more the nucleation sites of precipitates, the more the number density of precipitates can be increased by the subsequent aging treatment. Contributes to improvement in strength after aging treatment. If the Co content is less than 0.05% by mass or the P content is less than 0.01% by mass, the precipitation amount of the P compound is small, and the strength and stress relaxation resistance of the copper alloy cannot be improved. On the other hand, when the Co content exceeds 0.9% by mass or the P content exceeds 0.25% by mass, a conductivity of 70% IACS or more cannot be achieved in the copper alloy after aging treatment. Moreover, a coarse oxide, a crystallized substance, a precipitate, etc. generate | occur | produce and hot workability falls, and the intensity | strength of a copper alloy board, stress relaxation resistance, and bending workability fall. Therefore, Co is 0.05 to 0.9 mass%, and the P content is 0.01 to 0.25 mass%. The lower limit of the Co content is preferably 0.10% by mass, more preferably 0.15% by mass, and the upper limit is preferably 0.75% by mass, more preferably 0.60% by mass. The lower limit of the P content is preferably 0.02% by mass, more preferably 0.03% by mass, and the upper limit is preferably 0.23% by mass, more preferably 0.22% by mass.
 上記作用のため、Pの含有量は上記の範囲内で必要とされるが、その一方で、析出に寄与しないPの含有量は、水素脆性を防止できる範囲でなるべく少ないことが好ましい。この点から、CoとPの含有量比[Co]/[P]が、2~6の範囲内となるようにする。[Co]/[P]が2未満では、Co-P化合物の形成に寄与せず母材に固溶するPの量が多くなり、[Co]/[P]が6を超えると、同様に母材に固溶するCoの量が多くなり、いずれにしても時効処理後の銅合金板の導電率を70%IACS以上にできない。また、[Co]/[P]が2未満又は6を超える場合、Co-P化合物の形成に寄与しないCo又はPが多くなり、銅合金板の時効処理後の強度が十分向上しない。[Co]/[P]の下限値は、好ましくは2.2、より好ましくは2.5、さらに好ましくは3.0であり、[Co]/[P]の上限値は好ましくは5.0、より好ましくは4.5である。 For the above-described action, the P content is required within the above range. On the other hand, the P content that does not contribute to precipitation is preferably as small as possible within the range where hydrogen embrittlement can be prevented. From this point, the content ratio [Co] / [P] of Co and P is set to be in the range of 2-6. When [Co] / [P] is less than 2, the amount of P that does not contribute to the formation of the Co—P compound and dissolves in the base material increases, and when [Co] / [P] exceeds 6, The amount of Co dissolved in the base material increases, and in any case, the conductivity of the copper alloy sheet after the aging treatment cannot be made 70% IACS or more. When [Co] / [P] is less than 2 or exceeds 6, Co or P that does not contribute to the formation of the Co—P compound increases, and the strength of the copper alloy sheet after aging treatment is not sufficiently improved. The lower limit of [Co] / [P] is preferably 2.2, more preferably 2.5, still more preferably 3.0, and the upper limit of [Co] / [P] is preferably 5.0. More preferably, it is 4.5.
 上記銅合金は、必要に応じてさらに、Zn:1.0質量%以下(0質量%を含まず)、又は/及びFe,Ni,Sn,Si,Al,Mn,Cr,Ti,Zr,Ag,Mgのうち1種又は2種以上を合計で0.005~0.5質量%を含むことができる。ただし、これらの元素を添加することで、時効処理後の銅合金板の導電率が、70%IACSを下回るのは避けなくてはならない。
 Znは、銅合金板のはんだの耐熱剥離性及びSnめっきの耐熱剥離性を改善する作用を有する。放熱部品を半導体装置へ組み込むとき、はんだ付けが必要な場合があり、また、放熱部品を製造後、耐食性改善のためSnめっきを行う場合がある。このような放熱部品の製造に、Znを含有する銅合金板が好適に用いられる。しかし、Znの含有量が1.0質量%を越えると、はんだ濡れ性が低下するため、Znを含有する場合、Znの含有量は1.0質量%以下(0質量%を含まず)とする。Znの含有量は好ましくは0.7質量%以下、より好ましくは0.5質量%以下とする。一方、Zn含有量が0.01質量%未満では、耐熱剥離性の改善への寄与が小さく、Znの含有量は0.01質量%以上であることが好ましい。Zn含有量は0.05質量%以上がより好ましく、0.1質量%以上がさらに好ましい。
 なお、本発明の実施形態の銅合金板がZnを含む場合、500℃以上の温度で加熱すると、加熱雰囲気によってはZnが気化し、銅合金板の表面性状を低下させたり、加熱炉を汚染することがある。Znの気化を防止するとの観点からは、Znの含有量は好ましくは0.5質量%以下とし、より好ましくは0.4質量%以下、さらに好ましくは0.3質量%以下、よりさらに好ましくは0.2質量%以下とする。
If necessary, the copper alloy may further contain Zn: 1.0% by mass or less (excluding 0% by mass), or / and Fe, Ni, Sn, Si, Al, Mn, Cr, Ti, Zr, Ag. 1 or 2 or more of Mg can be contained in a total amount of 0.005 to 0.5% by mass. However, it must be avoided that the conductivity of the copper alloy sheet after the aging treatment falls below 70% IACS by adding these elements.
Zn has the effect | action which improves the heat-resistant peelability of the solder of a copper alloy board, and the heat-resistant peelability of Sn plating. When incorporating a heat dissipation component into a semiconductor device, soldering may be required, and after manufacturing the heat dissipation component, Sn plating may be performed to improve corrosion resistance. A copper alloy plate containing Zn is suitably used for manufacturing such a heat dissipation component. However, if the Zn content exceeds 1.0% by mass, the solder wettability decreases. Therefore, when Zn is contained, the Zn content is 1.0% by mass or less (not including 0% by mass). To do. The Zn content is preferably 0.7% by mass or less, more preferably 0.5% by mass or less. On the other hand, when the Zn content is less than 0.01% by mass, the contribution to the improvement of the heat-resistant peelability is small, and the Zn content is preferably 0.01% by mass or more. As for Zn content, 0.05 mass% or more is more preferable, and 0.1 mass% or more is further more preferable.
In addition, when the copper alloy plate of embodiment of this invention contains Zn, when it heats at the temperature of 500 degreeC or more, Zn will vaporize depending on heating atmosphere, the surface property of a copper alloy plate will be reduced, or a heating furnace will be contaminated. There are things to do. From the viewpoint of preventing vaporization of Zn, the Zn content is preferably 0.5% by mass or less, more preferably 0.4% by mass or less, further preferably 0.3% by mass or less, and still more preferably. 0.2 mass% or less.
 Fe,Ni,Sn,Si,Al,Mn,Cr,Ti,Zr,Ag,Mgは、銅合金の強度及び耐熱性を向上させる作用を有するため、これらの元素のうち1種又は2種以上が、必要に応じて添加される。しかし、これらの元素の含有量が多いと銅合金板の導電率が低下するため、これらの元素の1種又は2種以上を添加する場合、その合計含有量は0.005~0.5質量%の範囲とする。
 上記元素のうちFe,Niは、Coと同様に、Pとの間にりん化物((Ni,Fe)-P化合物)を生成する。りん化物の形成による銅合金板の強度向上効果は、Coが最も大きく、次いでFe、Niの順である。Fe、Niは、Coとりん化物を形成しなかったPとりん化物を形成し(母材に固溶するPが減少)、銅合金板の強度を向上させる効果を有する。また、Feは高温加熱時の結晶粒粗大化抑制効果を有する。これらの効果を得るため、Fe含有量は0.01質量%以上、Ni含有量は0.02質量%以上であることが好ましい。一方、導電率の低下を抑制するため、Fe含有量は0.05質量%以下とし、Ni含有量は0.1質量%以下とすることが好ましい。
Fe, Ni, Sn, Si, Al, Mn, Cr, Ti, Zr, Ag, and Mg have an effect of improving the strength and heat resistance of the copper alloy, and therefore one or more of these elements are contained. , Added as needed. However, if the content of these elements is large, the electrical conductivity of the copper alloy sheet is lowered. Therefore, when one or more of these elements are added, the total content is 0.005 to 0.5 mass. % Range.
Of these elements, Fe and Ni form phosphides ((Ni, Fe) -P compounds) with P in the same manner as Co. The effect of improving the strength of the copper alloy sheet due to the formation of phosphide is greatest for Co, followed by Fe and Ni. Fe and Ni form an phosphide and P that did not form a phosphide with Co (reduced P dissolved in the base material), and have the effect of improving the strength of the copper alloy plate. Fe has an effect of suppressing grain coarsening during high-temperature heating. In order to obtain these effects, the Fe content is preferably 0.01% by mass or more, and the Ni content is preferably 0.02% by mass or more. On the other hand, in order to suppress the decrease in conductivity, the Fe content is preferably 0.05% by mass or less, and the Ni content is preferably 0.1% by mass or less.
 Sn,Mgは、銅合金母相に固溶して、銅合金板の強度及び耐応力緩和特性を向上させる効果がある。放熱部品の温度又は使用環境が80℃又はそれ以上となると、クリ-プ変形が生じてCPU等の熱源との接触面積が小さくなり、放熱性が低下するが、耐応力緩和特性を向上させることで、この現象を抑制できる。この効果を得るため、Sn含有量は0.02質量%以上、Mg含有量は0.01質量%以上であることが好ましい。一方、銅合金板の導電率の低下を防止するとの観点から、Sn含有量は0.2質量%以下とし、Mg含有量は0.2質量%以下とすることが好ましい。
 Si,Al,Mnは、銅合金の強度及び耐熱性を向上させる効果がある。この効果を得るため、Si,Al,Mnの含有量は、いずれも0.01質量%以上であることが好ましい。一方、銅合金板の導電率の低下を防止するとの観点から、Si含有量は0.2質量%以下、Al含有量は0.2質量%以下、Mn含有量は0.1質量%以下とすることが好ましい。
Sn and Mg are dissolved in the copper alloy matrix and have an effect of improving the strength and stress relaxation resistance of the copper alloy sheet. When the temperature or operating environment of the heat dissipating component is 80 ° C or higher, creep deformation occurs and the contact area with a heat source such as a CPU is reduced, reducing heat dissipation, but improving stress relaxation resistance. Thus, this phenomenon can be suppressed. In order to acquire this effect, it is preferable that Sn content is 0.02 mass% or more, and Mg content is 0.01 mass% or more. On the other hand, from the viewpoint of preventing a decrease in the conductivity of the copper alloy plate, the Sn content is preferably 0.2% by mass or less and the Mg content is preferably 0.2% by mass or less.
Si, Al, and Mn have the effect of improving the strength and heat resistance of the copper alloy. In order to acquire this effect, it is preferable that content of Si, Al, and Mn is 0.01 mass% or more. On the other hand, from the viewpoint of preventing the decrease in conductivity of the copper alloy plate, the Si content is 0.2% by mass or less, the Al content is 0.2% by mass or less, and the Mn content is 0.1% by mass or less. It is preferable to do.
 Cr、Ti、Zrは、銅合金の強度及び耐熱性を向上させ、高温加熱時の結晶粒の粗大化を抑制する効果がある。この効果を得るため、Cr含有量とTi含有量はいずれも0.01質量%以上、Zr含有量は0.005質量%以上であることが好ましい。一方、銅合金板の導電率の低下を防止するとの観点から、Cr含有量は0.2質量%以下、Ti含有量は0.1質量%以下、Zr含有量は0.05質量%以下とすることが好ましい。なお、これらの元素は、数μm~数10μm程度の酸化物系、硫化物系などの介在物を形成しやすく、前記介在物が表面に存在したとき銅合金板の耐食性を低下させるが、これらの元素の含有量が上記範囲のとき、特に問題は生じない。
 Agは銅合金の強度及び耐熱性を向上させる効果がある。Ag含有量は好ましくは0.005~0.02質量%の範囲とする。
Cr, Ti, and Zr have the effect of improving the strength and heat resistance of the copper alloy and suppressing the coarsening of crystal grains during high-temperature heating. In order to acquire this effect, it is preferable that both Cr content and Ti content are 0.01 mass% or more, and Zr content is 0.005 mass% or more. On the other hand, from the viewpoint of preventing a decrease in conductivity of the copper alloy plate, the Cr content is 0.2% by mass or less, the Ti content is 0.1% by mass or less, and the Zr content is 0.05% by mass or less. It is preferable to do. These elements easily form inclusions such as oxides and sulfides of several μm to several tens of μm, and when the inclusions are present on the surface, the corrosion resistance of the copper alloy plate is lowered. When the content of the element is in the above range, no particular problem occurs.
Ag has the effect of improving the strength and heat resistance of the copper alloy. The Ag content is preferably in the range of 0.005 to 0.02 mass%.
 不可避不純物であるH、O、S、Pb、Bi、Sb、Se、Asは、銅合金板が600℃以上の温度に長時間加熱されると粒界に集まり、加熱中及び加熱後の粒界割れ並びに粒界脆化等を引起す可能性があるため、これらの元素の含有量は低減することが好ましい。Hは、加熱中に粒界、介在物と母材との界面に集まり、膨れを発生させることから、好ましくは1.5ppm(質量ppm、以下同じ)未満とし、より好ましくは1ppm未満とする。Oは、好ましくは20ppm未満、より好ましくは15ppm未満とする。S、Pb、Bi、Sb、Se、Asは、好ましくは合計で30ppm未満、より好ましくは20ppm未満とする。特にBi、Sb、Se、Asについては、好ましくはこれらの元素の合計含有量を10ppm未満、より好ましくは5ppm未満とする。 The inevitable impurities H, O, S, Pb, Bi, Sb, Se, As gather at the grain boundary when the copper alloy plate is heated to a temperature of 600 ° C. or higher for a long time, and the grain boundary during and after heating Since there is a possibility of causing cracks and grain boundary embrittlement, the content of these elements is preferably reduced. H is preferably less than 1.5 ppm (mass ppm, the same applies hereinafter), more preferably less than 1 ppm, because it collects at the grain boundaries and the interface between inclusions and the base material during heating and generates swelling. O is preferably less than 20 ppm, more preferably less than 15 ppm. S, Pb, Bi, Sb, Se, As are preferably less than 30 ppm in total, and more preferably less than 20 ppm. In particular, for Bi, Sb, Se and As, the total content of these elements is preferably less than 10 ppm, more preferably less than 5 ppm.
 本発明の実施形態に係る銅合金板は、鋳塊を均熱処理後、(1)熱間圧延-冷間圧延-焼鈍、(2)熱間圧延-冷間圧延-焼鈍-冷間圧延、(3)熱間圧延-冷間圧延-焼鈍-冷間圧延-低温焼鈍、等の工程で製造できる。上記(1)~(3)において、冷間圧延-焼鈍の工程を複数回行ってもよい。
 前記焼鈍には、軟化焼鈍、再結晶焼鈍又は析出焼鈍(時効処理)が含まれる。軟化焼鈍又は再結晶焼鈍の場合は、加熱温度を600~950℃の範囲から、加熱時間を5秒~1時間の範囲から選定するとよい。軟化焼鈍又は再結晶焼鈍が溶体化処理を兼ねる場合は、600~950℃、好ましくは670~900℃に3分以下保持する連続焼鈍を行うとよい。時効処理の場合、350~580℃程度の温度範囲に0.5~10時間保持する条件で行うとよい。軟化焼鈍又は再結晶焼鈍が溶体化処理を兼ねる場合、後工程でこの時効処理を行うことができる。
The copper alloy sheet according to the embodiment of the present invention comprises (1) hot rolling-cold rolling-annealing, (2) hot rolling-cold rolling-annealing-cold rolling after soaking the ingot. 3) It can be produced by processes such as hot rolling, cold rolling, annealing, cold rolling, and low temperature annealing. In the above (1) to (3), the cold rolling-annealing step may be performed a plurality of times.
The annealing includes softening annealing, recrystallization annealing, or precipitation annealing (aging treatment). In the case of softening annealing or recrystallization annealing, the heating temperature may be selected from the range of 600 to 950 ° C., and the heating time may be selected from the range of 5 seconds to 1 hour. When soft annealing or recrystallization annealing also serves as a solution treatment, continuous annealing is preferably performed at 600 to 950 ° C., preferably 670 to 900 ° C. for 3 minutes or less. In the case of an aging treatment, it is preferable to perform the aging treatment under a condition that the temperature is maintained at about 350 to 580 ° C. for 0.5 to 10 hours. When softening annealing or recrystallization annealing also serves as a solution treatment, this aging treatment can be performed in a later step.
 最終冷間圧延は、目標とする0.2%耐力と曲げ加工性に合わせて、加工率5~80%の範囲から選定するとよい。
 低温焼鈍は、銅合金板の延性の回復のため、銅合金板を再結晶させることなく軟化させるもので、連続焼鈍による場合は300~650℃の雰囲気に1秒~5分程度保持されるように定めるとよい。また、バッチ式焼鈍の場合は、銅合金板の実体温度が250℃~400℃に5分~1時間程度保持されるように定めるとよい。
 以上の製造方法により、0.2%耐力が100MPa以上、伸びが3%以上で、優れた曲げ加工性を有する銅合金板を製造することができる。また、この銅合金板は、850℃で30分加熱し、次いで500℃で2時間加熱する時効処理をしたとき、150MPa以上の0.2%耐力、70%IACS以上の導電率を有する。
 また、600℃以上の温度で拡散接合、ろう付などの方法により良好な接合(接合不良がない、接合強度が高い等)を可能にするには銅合金板(製品)の表面粗さが、算術平均粗さRaで0.3μm以下、最大高さ粗さRzで1.5μm以下であり、内部酸化深さが0.5μm以下、望ましくは0.3μm以下であることが望ましい。
 銅合金板(製品)の表面粗さをRa:0.3μm、Rz:1.5μm以下とするには最終冷間圧延に用いる圧延ロールのロール軸方向の表面粗さを例えばRa:0.15μm、Rz:1.0μm以下にする、または最終冷間圧延後の銅合金板にバフ研磨、電解研磨等の研磨を行えばよい。また、銅合金板(製品)の内部酸化深さを0.5μm以下とするには、焼鈍雰囲気を還元性とすると共に露点を-5℃以下とする、または焼鈍後の銅合金板を機械研磨(バフ、ブラシなど)若しくは電解研磨することにより、生成した内部酸化層を除去する、あるいは薄くしてやればよい。
The final cold rolling is preferably selected from a range of a processing rate of 5 to 80% in accordance with the target 0.2% proof stress and bending workability.
Low temperature annealing softens the copper alloy plate without recrystallization in order to restore the ductility of the copper alloy plate. In the case of continuous annealing, it is maintained at 300 to 650 ° C. for about 1 second to 5 minutes. It is good to set in. In the case of batch-type annealing, it is preferable that the solid temperature of the copper alloy plate is maintained at 250 ° C. to 400 ° C. for about 5 minutes to 1 hour.
By the above production method, a copper alloy plate having excellent bending workability with a 0.2% proof stress of 100 MPa or more and an elongation of 3% or more can be produced. Further, this copper alloy sheet has a 0.2% proof stress of 150 MPa or more and a conductivity of 70% IACS or more when aging treatment is performed at 850 ° C. for 30 minutes and then at 500 ° C. for 2 hours.
In order to enable good bonding (no bonding failure, high bonding strength, etc.) by a method such as diffusion bonding or brazing at a temperature of 600 ° C. or higher, the surface roughness of the copper alloy plate (product) is The arithmetic average roughness Ra is 0.3 μm or less, the maximum height roughness Rz is 1.5 μm or less, and the internal oxidation depth is 0.5 μm or less, preferably 0.3 μm or less.
To make the surface roughness of the copper alloy plate (product) Ra: 0.3 μm, Rz: 1.5 μm or less, the surface roughness in the roll axis direction of the rolling roll used for the final cold rolling is, for example, Ra: 0.15 μm Rz: 1.0 μm or less, or polishing such as buffing or electrolytic polishing may be performed on the copper alloy plate after the final cold rolling. In order to reduce the internal oxidation depth of the copper alloy sheet (product) to 0.5 μm or less, the annealing atmosphere should be reducible and the dew point should be −5 ° C. or less, or the annealed copper alloy sheet should be mechanically polished The generated internal oxide layer may be removed or thinned by electrolytic polishing (buffing, brushing, etc.).
 本発明の実施形態に係る銅合金板は、標準的な製造方法として、鋳塊を均熱処理し、熱間圧延した後、冷間圧延、溶体化を伴う再結晶処理、冷間圧延(省略可)、時効処理の工程で製造される。溶体化を伴う再結晶処理後の冷間圧延は省略することができる。また、前記時効処理後、さらに冷間圧延を行うこともできる。前記組成の銅合金を用い、この製造方法により製造した銅合金板は、高強度(0.2%耐力が300MPa以上)を有し、伸びが3%以上で、優れた曲げ加工性を有する。また、この銅合金板を850℃で30分加熱し、次いで500℃で2時間加熱する時効処理をしたとき、150MPa以上の0.2%耐力、70%IACS以上の導電率を有する。 As a standard manufacturing method, the copper alloy plate according to the embodiment of the present invention, as a standard manufacturing method, after soaking the ingot and hot rolling, cold rolling, recrystallization treatment with solution, cold rolling (can be omitted) ), Manufactured in the aging treatment process. Cold rolling after recrystallization treatment with solution treatment can be omitted. Further, after the aging treatment, cold rolling can be further performed. A copper alloy plate produced by this production method using a copper alloy having the above composition has high strength (0.2% proof stress is 300 MPa or more), elongation is 3% or more, and has excellent bending workability. Further, when this copper alloy sheet is heated at 850 ° C. for 30 minutes and then heated at 500 ° C. for 2 hours, it has a 0.2% proof stress of 150 MPa or more and a conductivity of 70% IACS or more.
 溶解、鋳造は、連続鋳造、半連続鋳造などの通常の方法によって行うことができる。なお、銅溶解原料として、S、Pb、Bi、Se、As含有量の少ないものを使用することが好ましい。また、銅合金溶湯に被覆する木炭の赤熱化(水分除去)、地金、スクラップ原料、鋳造樋、鋳型の乾燥、及び溶湯の脱酸等に注意し、O、Hを低減することが好ましい。 Melting and casting can be performed by ordinary methods such as continuous casting and semi-continuous casting. In addition, it is preferable to use what has little S, Pb, Bi, Se, As content as a copper melt | dissolution raw material. In addition, it is preferable to reduce O and H by paying attention to red heat (removal of water) of charcoal coated on the molten copper alloy, metal, scrap raw material, cast iron, drying of the mold, deoxidation of the molten metal, and the like.
 均質化処理は、鋳塊内部が800℃以上の温度に到達後、30分以上保持することが好ましい。均質化処理の保持時間は1時間以上がより好ましく、2時間以上がさらに好ましい。
 均質化処理後、熱間圧延を800℃以上の温度で開始する。熱間圧延材に粗大なCo-P析出物が形成されないように、熱間圧延は600℃以上の温度で終了し、その温度から水冷等の方法により急冷することが好ましい。熱間圧延後の急冷開始温度が600℃より低いと、粗大なCo-P析出物が形成され、組織が不均一になりやすく、銅合金板(製品板)の強度が低下する。熱間圧延の終了温度は600℃以上の温度であることが好ましく、700℃以上の温度であることがより好ましい。なお、熱間圧延後急冷した熱間圧延材の組織は再結晶組織となる。後述の溶体化を伴う再結晶処理は熱間圧延後の急冷を行うことで兼ねることができる。
The homogenization treatment is preferably held for 30 minutes or more after the inside of the ingot reaches a temperature of 800 ° C. or higher. The holding time of the homogenization treatment is more preferably 1 hour or more, and further preferably 2 hours or more.
After the homogenization treatment, hot rolling is started at a temperature of 800 ° C. or higher. In order to prevent coarse Co—P precipitates from being formed on the hot rolled material, the hot rolling is preferably completed at a temperature of 600 ° C. or higher, and then rapidly cooled by a method such as water cooling. When the rapid cooling start temperature after hot rolling is lower than 600 ° C., coarse Co—P precipitates are formed, the structure tends to be non-uniform, and the strength of the copper alloy plate (product plate) decreases. The end temperature of hot rolling is preferably 600 ° C. or higher, and more preferably 700 ° C. or higher. In addition, the structure of the hot-rolled material rapidly cooled after hot rolling becomes a recrystallized structure. The recrystallization process accompanied by solutionization described later can also be performed by performing rapid cooling after hot rolling.
 熱間圧延後の冷間圧延により、銅合金板に一定の歪みを加えることで、続く再結晶処理後に、所望の再結晶組織(微細な再結晶組織)を有する銅合金板が得られる。
 溶体化を伴う再結晶処理は、600~950℃、好ましくは670~900℃で3分以下の保持の条件で行う。銅合金中のCo、Pの含有量が少ない場合は、上記温度範囲内のより低温領域で、Co、Pの含有量が多い場合は、上記温度範囲内のより高温領域で行うことが好ましい。この再結晶処理により、Co、Pを銅合金母材に固溶させると共に、曲げ加工性が良好となる再結晶組織(結晶粒径が1~20μm)を形成することができる。この再結晶処理の温度が600℃より低いと、Co,Pの母材への固溶量が少なくなり、時効処理後の強度が低下する。一方、再結晶処理の温度が950℃を超え又は処理時間が3分を超えると、再結晶粒が粗大化する。
By applying a certain strain to the copper alloy sheet by cold rolling after hot rolling, a copper alloy sheet having a desired recrystallized structure (fine recrystallized structure) is obtained after the subsequent recrystallization process.
The recrystallization treatment with solution treatment is performed at 600 to 950 ° C., preferably at 670 to 900 ° C. for 3 minutes or less. When the content of Co and P in the copper alloy is small, it is preferable to carry out in a lower temperature region within the above temperature range, and when the content of Co and P is large, it is preferably carried out in a higher temperature region within the above temperature range. By this recrystallization treatment, Co and P can be dissolved in the copper alloy base material, and a recrystallized structure (crystal grain size of 1 to 20 μm) can be formed with good bending workability. When the temperature of this recrystallization process is lower than 600 ° C., the amount of Co and P dissolved in the base material decreases, and the strength after the aging process decreases. On the other hand, when the temperature of the recrystallization treatment exceeds 950 ° C. or the treatment time exceeds 3 minutes, the recrystallized grains become coarse.
 溶体化を伴う再結晶処理後は、(a)時効処理する、(b)冷間圧延及び時効処理する、(c)冷間圧延及び時効処理後、さらに製品厚さまで冷間圧延する、又は(d)前記(c)の後に低温焼鈍(延性の回復)を行う。
 時効処理は、先に記載したとおり、加熱温度300~580℃程度で0.5~10時間保持する条件で行う。この加熱温度が300℃未満では析出量が少なく、580℃を超えると析出物が粗大化しやすい。加熱温度の下限は、好ましくは350℃とし、上限は好ましくは570℃、より好ましくは560℃とする。時効処理の保持時間は、加熱温度により適宜選択し、0.5~10時間の範囲内で行う。この保持時間が0.5時間未満では析出が不十分となり、10時間を越えても析出量が飽和し、生産性が低下する。保持時間の下限は、好ましくは1時間、より好ましくは2時間とする。
After recrystallization treatment with solution, (a) aging treatment, (b) cold rolling and aging treatment, (c) after cold rolling and aging treatment, further cold rolling to product thickness, or ( d) After the step (c), low temperature annealing (recovery of ductility) is performed.
As described above, the aging treatment is performed under the condition of holding at a heating temperature of about 300 to 580 ° C. for 0.5 to 10 hours. If the heating temperature is less than 300 ° C., the amount of precipitation is small, and if it exceeds 580 ° C., the precipitate tends to become coarse. The lower limit of the heating temperature is preferably 350 ° C, and the upper limit is preferably 570 ° C, more preferably 560 ° C. The holding time for the aging treatment is appropriately selected depending on the heating temperature, and is carried out within the range of 0.5 to 10 hours. If this holding time is less than 0.5 hours, precipitation is insufficient, and if it exceeds 10 hours, the amount of precipitation is saturated and productivity is lowered. The lower limit of the holding time is preferably 1 hour, more preferably 2 hours.
 表1,2に示す組成の銅合金を鋳造し、それぞれ厚さ45mmの鋳塊を作製した。この銅合金において、不可避不純物であるHは1ppm未満、Oは15ppm未満、S、Pb、Bi、Sb、Se、Asは合計で20ppm未満であった。
 各鋳塊に対し965℃で3時間の均熱処理を行い、続いて熱間圧延を行って板厚15mmの熱間圧延材とし、650℃以上の温度から焼き入れ(水冷)した。焼き入れ後の熱間圧延材の両面を1mmずつ研磨した後、目標板厚0.6mmまで冷間粗圧延し、800℃に20秒保持する再結晶処理(溶体化を伴う)を行った。次いで500℃で2時間の析出焼鈍後、50%の仕上げ冷間圧延を施し、板厚0.3mmとし、さらに330℃で20秒間の低温焼鈍(歪み取り焼鈍)を行い、銅合金板を製造した。なお、板厚0.3mmの各銅合金板(比較例No.2のみ熱間圧延割れ材)で分析した組成も表1、2の値と同じであった。また、いずれの銅合金板(比較例No.2を除く)についても、その表面粗さは、Ra:0.08~0.15μm、Rz:0.8~1.2μmであり、板厚断面を研磨して走査電子顕微鏡(観察倍率15000倍)により測定した内部酸化深さは0.1μm以下であった。
Copper alloys having the compositions shown in Tables 1 and 2 were cast to produce ingots each having a thickness of 45 mm. In this copper alloy, H, which is an inevitable impurity, was less than 1 ppm, O was less than 15 ppm, and S, Pb, Bi, Sb, Se, and As were less than 20 ppm in total.
Each ingot was subjected to a soaking treatment at 965 ° C. for 3 hours, followed by hot rolling to obtain a hot-rolled material having a plate thickness of 15 mm, and quenching (water cooling) from a temperature of 650 ° C. or higher. After polishing both sides of the hot-rolled material after quenching by 1 mm, cold rolling was performed to a target plate thickness of 0.6 mm, and recrystallization treatment (with solution) was performed at 800 ° C. for 20 seconds. Next, after precipitation annealing at 500 ° C. for 2 hours, 50% finish cold rolling is performed to obtain a sheet thickness of 0.3 mm, and further, low-temperature annealing (distortion annealing) is performed at 330 ° C. for 20 seconds to produce a copper alloy sheet. did. In addition, the composition analyzed by each copper alloy plate with a plate thickness of 0.3 mm (only Comparative Example No. 2 was hot-rolled cracked material) was also the same as the values in Tables 1 and 2. The surface roughness of any copper alloy plate (excluding Comparative Example No. 2) is Ra: 0.08 to 0.15 μm, Rz: 0.8 to 1.2 μm, and the cross section of the plate thickness The internal oxidation depth measured by a scanning electron microscope (observation magnification: 15000 times) was 0.1 μm or less.
Figure JPOXMLDOC01-appb-T000001
Figure JPOXMLDOC01-appb-T000001
Figure JPOXMLDOC01-appb-T000002
Figure JPOXMLDOC01-appb-T000002
 得られた銅合金板を供試材として、下記要領で、導電率、機械的特性、曲げ加工性、はんだ濡れ性の各測定試験を行った。その結果を表3,4に示す。
 また、得られた銅合金板を850℃で30分間加熱後水冷したもの、さらに500℃で2時間加熱(時効析出処理)したものを、それぞれ供試材として、導電率及び機械的特性の各測定試験を行った。その結果を表3,4に示す。
Using the obtained copper alloy plate as a test material, each measurement test of electrical conductivity, mechanical characteristics, bending workability, and solder wettability was performed in the following manner. The results are shown in Tables 3 and 4.
The obtained copper alloy sheet was heated at 850 ° C. for 30 minutes and then water-cooled, and further heated at 500 ° C. for 2 hours (aging precipitation treatment) as test materials, respectively. A measurement test was conducted. The results are shown in Tables 3 and 4.
(導電率の測定)
 導電率の測定は、JIS-H0505に規定されている非鉄金属材料導電率測定法に準拠し、ダブルブリッジを用いた四端子法で行った。
(機械的特性)
 供試材から、長手方向が圧延平行方向となるようにJIS5号引張り試験片を切り出し、JIS-Z2241に準拠して引張り試験を実施して、耐力と伸びを測定した。耐力は永久伸び0.2%に相当する引張強さである。
(Measurement of conductivity)
The conductivity was measured by a four-terminal method using a double bridge in accordance with the nonferrous metal material conductivity measurement method defined in JIS-H0505.
(Mechanical properties)
A JIS No. 5 tensile test piece was cut out from the specimen so that the longitudinal direction was parallel to the rolling direction, and a tensile test was performed in accordance with JIS-Z2241, thereby measuring the yield strength and elongation. The yield strength is a tensile strength corresponding to a permanent elongation of 0.2%.
(曲げ加工性)
 曲げ加工性の測定は、伸銅協会標準JBMA-T307に規定されるW曲げ試験方法に従い実施した。各供試材から幅10mm、長さ30mmの試験片を切り出し、R/t=1.0となる冶具を用いて、G.W.(Good Way(曲げ軸が圧延方向に垂直))及びB.W.(Bad Way(曲げ軸が圧延方向に平行))の曲げを行った。次いで、曲げ部における割れの有無を100倍の光学顕微鏡により目視観察し、G.W.及びB.W.の双方で割れの発生がないものをP(P:Pass、合格)、G.W.又はB.W.のいずれか一方又は双方で割れが発生したものをF(F:Fail、不合格)、と評価した。
(Bending workability)
The measurement of the bending workability was carried out according to the W bending test method specified in JBMA-T307 standard of the copper elongation association. A test piece having a width of 10 mm and a length of 30 mm was cut out from each sample material, and a jig with R / t = 1.0 was used. W. (Good Way (bending axis is perpendicular to rolling direction)) and B.I. W. (Bad Way (bending axis is parallel to the rolling direction)) was performed. Next, the presence or absence of cracks in the bent portion was visually observed with a 100 × optical microscope. W. And B. W. P (P: Pass, pass), G. W. Or B. W. Those in which cracks occurred in one or both of these were evaluated as F (F: Fail, rejected).
(はんだ濡れ性)
 各供試材から長手方向が圧延方向と平行になるよう、幅10mm、長さ35mmの短冊状試験片を採取し、非活性フラックス(株式会社日本αメタルズ製α100)に1秒間浸漬塗布した後、メニスコグラフ法にてはんだ濡れ時間を測定した(JISC0053はんだ付け試験方法(平衡法)に準拠、株式会社レスカ製SAT5100)。はんだは260±5℃に保持したSn-3質量%Ag-0.5質量%Cuを用い、浸漬速度を25mm/sec、浸漬深さを5mm、浸漬時間を5secの試験条件で実施した。はんだ濡れ時間が2秒以下のものをはんだ濡れ性が優れると評価した。なお、比較例5以外は、はんだ濡れ時間が2秒以下であった。
(Solder wettability)
A strip-shaped test piece having a width of 10 mm and a length of 35 mm is collected from each sample material so that the longitudinal direction is parallel to the rolling direction, and dip-coated for 1 second on an inactive flux (α100 manufactured by Nippon α Metals Co., Ltd.). The solder wetting time was measured by the meniscograph method (according to JIS C0053 soldering test method (equilibrium method), SAT5100 manufactured by Reska Co., Ltd.). The solder used was Sn-3 mass% Ag-0.5 mass% Cu maintained at 260 ± 5 ° C., and the test was performed under the test conditions of an immersion speed of 25 mm / sec, an immersion depth of 5 mm, and an immersion time of 5 sec. A solder wetting time of 2 seconds or less was evaluated as having excellent solder wettability. Except for Comparative Example 5, the solder wetting time was 2 seconds or less.
Figure JPOXMLDOC01-appb-T000003
Figure JPOXMLDOC01-appb-T000003
Figure JPOXMLDOC01-appb-T000004
Figure JPOXMLDOC01-appb-T000004
 表1,3に示す実施例1~18の銅合金板は、合金組成が本発明の実施形態の規定を満たし、850℃で30分間加熱し、次いで500℃で2時間加熱する時効処理をした後の強度(0.2%耐力)が150MPa以上で、かつ導電率が70%IACS以上である。また、850℃で加熱する前の銅合金板の特性は、強度(0.2%耐力)が100MPa以上、伸びが3%以上であり、曲げ加工性及びはんだ濡れ性も優れている。850℃で加熱後も、多くは50MPa以上の強度(0.2%耐力)を有する。なお、実施例6(Co、Pの含有量が下限値に近い)の時効処理後の耐力値は162MPa、硬さはHv83(試験力0.49Nで測定)であった。 The copper alloy sheets of Examples 1 to 18 shown in Tables 1 and 3 were subjected to an aging treatment in which the alloy composition satisfied the provisions of the embodiment of the present invention, heated at 850 ° C. for 30 minutes, and then heated at 500 ° C. for 2 hours. The later strength (0.2% proof stress) is 150 MPa or more, and the conductivity is 70% IACS or more. The copper alloy sheet before being heated at 850 ° C. has a strength (0.2% yield strength) of 100 MPa or more and an elongation of 3% or more, and is excellent in bending workability and solder wettability. Even after heating at 850 ° C., many have a strength of 50 MPa or more (0.2% yield strength). In addition, the yield strength value after aging treatment of Example 6 (Co and P contents close to the lower limit values) was 162 MPa, and the hardness was Hv83 (measured at a test force of 0.49 N).
 これに対し、表2,4に示す比較例1~8の銅合金板は、以下に示すように、何らかの特性が劣る。
 比較例1は、Co含有量が過剰なため、曲げ加工性が劣り、時効処理後の強度及び導電率が低い。
 比較例2は、P含有量が過剰なため、熱間圧延時に割れが生じて、熱間圧延後の工程に進むことができなかった。
 比較例3は、[Co]/[P]が高く、時効処理後の強度及び導電率が低い。
 比較例4は、[Co]/[P]が低く、時効処理後の強度及び導電率が低い。
 比較例5は、Zn含有量が過剰で、先に述べたようにはんだ濡れ性が劣っていた。
 比較例6は、主要元素以外の元素(Al、Mn等)の合計が過剰であったため、時効処理後の導電率が低い。
 比較例7は、P含有量が不足したため、時効処理後の強度及び導電率が低い。
 比較例8は、Co含有量が不足したため、時効処理後の強度が低い。
On the other hand, the copper alloy sheets of Comparative Examples 1 to 8 shown in Tables 2 and 4 are inferior in some characteristics as shown below.
In Comparative Example 1, since the Co content is excessive, bending workability is inferior, and the strength and electrical conductivity after aging treatment are low.
In Comparative Example 2, since the P content was excessive, cracks occurred during hot rolling, and it was not possible to proceed to the process after hot rolling.
In Comparative Example 3, [Co] / [P] is high, and the strength and conductivity after the aging treatment are low.
In Comparative Example 4, [Co] / [P] is low, and the strength and conductivity after aging treatment are low.
In Comparative Example 5, the Zn content was excessive and the solder wettability was poor as described above.
In Comparative Example 6, since the sum of elements other than the main elements (Al, Mn, etc.) was excessive, the electrical conductivity after the aging treatment was low.
Since the comparative example 7 lacked P content, the intensity | strength and electrical conductivity after an aging treatment are low.
In Comparative Example 8, since the Co content was insufficient, the strength after the aging treatment was low.
 表1,2に示す銅合金板のうち代表的なもの(実施例2,10、比較例3,4)について、1000℃で30分間加熱後水冷し、さらに500℃で2時間加熱(時効処理)し、当該銅合金板を供試材として、導電率及び機械的特性の各測定試験を、実施例1に記載した方法で行った。その結果を表5に示す。 Of the copper alloy plates shown in Tables 1 and 2, representative examples (Examples 2 and 10, Comparative Examples 3 and 4) were heated at 1000 ° C. for 30 minutes and then water-cooled, and further heated at 500 ° C. for 2 hours (aging treatment). Then, using the copper alloy plate as a test material, each measurement test of conductivity and mechanical properties was performed by the method described in Example 1. The results are shown in Table 5.
Figure JPOXMLDOC01-appb-T000005
Figure JPOXMLDOC01-appb-T000005
 表5に示すように、実施例2,10は、1000℃で30分間加熱し、次いで時効処理した後の強度(0.2%耐力)が150MPa以上で、かつ導電率が70%IACS以上である。表5に示す個々の数値を、850℃で30分間加熱し、次いで時効処理した後の測定結果(表参照)と比較すると、数値に大きい違いはない。
 一方、比較例3、4は、1000℃で30分間加熱し、次いで時効処理した後の強度及び導電率が基準(0.2%耐力が150MPa以上、導電率が70%IACS以上)に達していない。
As shown in Table 5, in Examples 2 and 10, the strength (0.2% yield strength) after heating at 1000 ° C. for 30 minutes and then aging treatment was 150 MPa or more, and the conductivity was 70% IACS or more. is there. When the individual numerical values shown in Table 5 are compared with the measurement results (see the table) after heating at 850 ° C. for 30 minutes and then aging treatment, the numerical values are not significantly different.
On the other hand, in Comparative Examples 3 and 4, the strength and conductivity after heating at 1000 ° C. for 30 minutes and then aging treatment reached the standard (0.2% proof stress is 150 MPa or more, conductivity is 70% IACS or more). Absent.
 本明細書の開示内容は、以下の態様を含む。

態様1:
 Co:0.05~0.9質量%、P:0.01~0.25質量%、残部がCu及び不可避不純物からなり、Co含有量を[Co]とし、P含有量を[P]としたとき、[Co]/[P]が2~6であり、 0.2%耐力が100MPa以上、伸びが3%以上で、優れた曲げ加工性を有し、850℃で30分加熱後水冷し、次いで500℃で2時間加熱する時効処理をした後の0.2%耐力が150MPa以上、導電率が70%IACS以上であり、放熱部品を製造するプロセスの一部に600℃以上に加熱するプロセスと時効処理が含まれることを特徴とする放熱部品用銅合金板。

態様2:
 さらに、Znを1.0質量%以下(0質量%を含まず)含有することを特徴とする態様1に記載された放熱部品用銅合金板。

態様3:
 さらに、Fe,Ni,Sn,Si,Al,Mn,Cr,Ti,Zr,Ag,Mgのうち1種又は2種以上を合計で0.005~0.5質量%含有することを特徴とする態様1又は2に記載された放熱部品用銅合金板。

態様4:
 態様1~3のいずれかに記載された放熱部品用銅合金板を所定形状に加工した後、600℃以上に加熱するプロセスを施し、続いて塑性加工を加えることなく時効処理を行い、150MPa以上の0.2%耐力及び70%IACS以上の導電率を有する放熱部品を得ることを特徴とする放熱部品の製造方法。

態様5:
 時効処理後、放熱部品の外表面の少なくとも一部にSn被覆層を形成することを特徴とする態様4に記載された放熱部品の製造方法。

態様6:
 時効処理後、放熱部品の外表面の少なくとも一部にNi被覆層を形成することを特徴とする態様4に記載された放熱部品の製造方法。
The disclosure of the present specification includes the following aspects.

Aspect 1:
Co: 0.05 to 0.9 mass%, P: 0.01 to 0.25 mass%, the balance is made of Cu and inevitable impurities, the Co content is [Co], and the P content is [P]. [Co] / [P] is 2 to 6, 0.2% proof stress is 100 MPa or more, elongation is 3% or more, has excellent bending workability, is heated at 850 ° C. for 30 minutes and then water-cooled. Then, after aging treatment at 500 ° C. for 2 hours, the 0.2% proof stress is 150 MPa or more and the conductivity is 70% IACS or more. A copper alloy sheet for a heat-dissipating component, characterized by including a process for aging and an aging treatment.

Aspect 2:
Furthermore, the copper alloy plate for heat-radiating components described in the aspect 1 is characterized by containing not more than 1.0% by mass of Zn (not including 0% by mass).

Aspect 3:
Further, it is characterized by containing 0.005 to 0.5 mass% in total of one or more of Fe, Ni, Sn, Si, Al, Mn, Cr, Ti, Zr, Ag, and Mg. The copper alloy plate for heat radiating components described in the aspect 1 or 2.

Aspect 4:
After processing the copper alloy plate for a heat-dissipating part described in any one of the aspects 1 to 3 into a predetermined shape, a process of heating to 600 ° C. or higher is performed, and then an aging treatment is performed without adding plastic processing to 150 MPa or higher A heat radiating component manufacturing method comprising obtaining a heat radiating component having a 0.2% proof stress and a conductivity of 70% IACS or higher.

Aspect 5:
After the aging treatment, the Sn covering layer is formed on at least a part of the outer surface of the heat dissipating component.

Aspect 6:
After the aging treatment, the Ni covering layer is formed on at least a part of the outer surface of the heat dissipating part.
 本出願は、出願日が2016年9月29日である日本国特許出願、特願第2016-190664号を基礎出願とする優先権主張を伴う。特願第2016-190664号は参照することにより本明細書に取り込まれる。 This application is accompanied by a priority claim based on Japanese Patent Application No. 2016-190664, whose application date is September 29, 2016. Japanese Patent Application No. 2016-190664 is incorporated herein by reference.

Claims (10)

  1.  Co:0.05~0.9質量%、P:0.01~0.25質量%、残部がCu及び不可避不純物からなり、Co含有量を[Co]とし、P含有量を[P]としたとき、[Co]/[P]が2~6であり、 0.2%耐力が100MPa以上、伸びが3%以上で、優れた曲げ加工性を有し、850℃で30分加熱後水冷し、次いで500℃で2時間加熱する時効処理をした後の0.2%耐力が150MPa以上、導電率が70%IACS以上であり、放熱部品を製造するプロセスの一部に600℃以上に加熱するプロセスと時効処理が含まれることを特徴とする放熱部品用銅合金板。 Co: 0.05 to 0.9 mass%, P: 0.01 to 0.25 mass%, the balance is made of Cu and inevitable impurities, the Co content is [Co], and the P content is [P]. [Co] / [P] is 2-6, 0.2% proof stress is 100 MPa or more, elongation is 3% or more, has excellent bending workability, is heated at 850 ° C. for 30 minutes and then water-cooled. Then, after aging treatment at 500 ° C. for 2 hours, the 0.2% proof stress is 150 MPa or more and the conductivity is 70% IACS or more. A copper alloy sheet for a heat-dissipating component, characterized in that the process includes an aging process and an aging treatment.
  2.  さらに、Znを1.0質量%以下(0質量%を含まず)含有することを特徴とする請求項1に記載された放熱部品用銅合金板。 Furthermore, the copper alloy plate for heat-radiating components according to claim 1, further comprising 1.0% by mass or less (not including 0% by mass) of Zn.
  3.  さらに、Fe,Ni,Sn,Si,Al,Mn,Cr,Ti,Zr,Ag,Mgのうち1種又は2種以上を合計で0.005~0.5質量%含有することを特徴とする請求項1に記載された放熱部品用銅合金板。 Further, it is characterized by containing 0.005 to 0.5 mass% in total of one or more of Fe, Ni, Sn, Si, Al, Mn, Cr, Ti, Zr, Ag, and Mg. The copper alloy plate for heat radiating components according to claim 1.
  4.  さらに、Fe,Ni,Sn,Si,Al,Mn,Cr,Ti,Zr,Ag,Mgのうち1種又は2種以上を合計で0.005~0.5質量%含有することを特徴とする請求項2に記載された放熱部品用銅合金板。 Further, it is characterized by containing 0.005 to 0.5 mass% in total of one or more of Fe, Ni, Sn, Si, Al, Mn, Cr, Ti, Zr, Ag, and Mg. The copper alloy plate for heat radiating components according to claim 2.
  5.  請求項1~4のいずれかに記載された放熱部品用銅合金板を所定形状に加工した後、600℃以上に加熱するプロセスを施し、続いて塑性加工を加えることなく時効処理を行い、150MPa以上の0.2%耐力及び70%IACS以上の導電率を有する放熱部品を得ることを特徴とする放熱部品の製造方法。 A copper alloy plate for a heat dissipation component according to any one of claims 1 to 4 is processed into a predetermined shape, and then subjected to a process of heating to 600 ° C or higher, followed by an aging treatment without applying plastic processing, and 150 MPa A method of manufacturing a heat dissipation component, characterized by obtaining a heat dissipation component having the above 0.2% proof stress and a conductivity of 70% IACS or higher.
  6.  時効処理後、放熱部品の外表面の少なくとも一部にSn被覆層を形成することを特徴とする請求項5に記載された放熱部品の製造方法。 6. The method of manufacturing a heat dissipation component according to claim 5, wherein an Sn coating layer is formed on at least a part of the outer surface of the heat dissipation component after the aging treatment.
  7.  時効処理後、放熱部品の外表面の少なくとも一部にNi被覆層を形成することを特徴とする請求項5に記載された放熱部品の製造方法。 6. The method of manufacturing a heat dissipation component according to claim 5, wherein a Ni coating layer is formed on at least a part of the outer surface of the heat dissipation component after the aging treatment.
  8.  請求項1~4のいずれかに記載された放熱部品用銅合金板から製造され、600℃以上に加熱するプロセスの後、時効処理を受けたことを特徴とする放熱部品。 A heat dissipating part manufactured from the copper alloy plate for heat dissipating parts according to any one of claims 1 to 4 and subjected to an aging treatment after a process of heating to 600 ° C or higher.
  9.  外表面の少なくとも一部にSn被覆層が形成されていることを特徴とする請求項8に記載された放熱部品。 The heat dissipating component according to claim 8, wherein an Sn coating layer is formed on at least a part of the outer surface.
  10.  外表面の少なくとも一部にNi被覆層が形成されていることを特徴とする請求項8に記載された放熱部品。 The heat dissipating component according to claim 8, wherein a Ni coating layer is formed on at least a part of the outer surface.
PCT/JP2017/034913 2016-09-29 2017-09-27 Copper alloy sheet for heat dissipation component, heat dissipation component, and method for producing heat dissipation component WO2018062255A1 (en)

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2022085723A1 (en) * 2020-10-23 2022-04-28 三菱マテリアル株式会社 Slit copper material, part for electric/electronic device, bus bar, heat dissipation substrate
JP2022069413A (en) * 2020-10-23 2022-05-11 三菱マテリアル株式会社 Slit copper material, component for electronic/electric devices, bus bar, and heat dissipation substrate
CN114807672A (en) * 2022-03-23 2022-07-29 中南大学 Cu-Zn-Cr-Zr-Fe-Si alloy and preparation method thereof

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109628791B (en) * 2018-12-10 2020-12-22 江西理工大学 Copper alloy and preparation method thereof

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000001728A (en) * 1998-06-16 2000-01-07 Mitsubishi Materials Corp Seamless copper alloy tube for heat exchanger excellent in 0.2% proof stress and fatigue strength
WO2004079026A1 (en) * 2003-03-03 2004-09-16 Sambo Copper Alloy Co.,Ltd. Heat-resisting copper alloy materials
JP2008255382A (en) * 2007-03-30 2008-10-23 Kobelco & Materials Copper Tube Inc Copper alloy tube
WO2016152648A1 (en) * 2015-03-23 2016-09-29 株式会社神戸製鋼所 Copper alloy sheet for heat dissipating component and heat dissipating component
WO2016158391A1 (en) * 2015-03-27 2016-10-06 株式会社神戸製鋼所 Copper alloy sheet for heat dissipation component, and heat dissipation component
JP6151813B1 (en) * 2016-03-23 2017-06-21 株式会社神戸製鋼所 Vapor chamber manufacturing method
WO2017110759A1 (en) * 2015-12-25 2017-06-29 株式会社神戸製鋼所 Copper alloy plate for heat-dissipation component

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000001728A (en) * 1998-06-16 2000-01-07 Mitsubishi Materials Corp Seamless copper alloy tube for heat exchanger excellent in 0.2% proof stress and fatigue strength
WO2004079026A1 (en) * 2003-03-03 2004-09-16 Sambo Copper Alloy Co.,Ltd. Heat-resisting copper alloy materials
JP2008255382A (en) * 2007-03-30 2008-10-23 Kobelco & Materials Copper Tube Inc Copper alloy tube
WO2016152648A1 (en) * 2015-03-23 2016-09-29 株式会社神戸製鋼所 Copper alloy sheet for heat dissipating component and heat dissipating component
WO2016158391A1 (en) * 2015-03-27 2016-10-06 株式会社神戸製鋼所 Copper alloy sheet for heat dissipation component, and heat dissipation component
WO2017110759A1 (en) * 2015-12-25 2017-06-29 株式会社神戸製鋼所 Copper alloy plate for heat-dissipation component
JP6151813B1 (en) * 2016-03-23 2017-06-21 株式会社神戸製鋼所 Vapor chamber manufacturing method

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2022085723A1 (en) * 2020-10-23 2022-04-28 三菱マテリアル株式会社 Slit copper material, part for electric/electronic device, bus bar, heat dissipation substrate
JP2022069413A (en) * 2020-10-23 2022-05-11 三菱マテリアル株式会社 Slit copper material, component for electronic/electric devices, bus bar, and heat dissipation substrate
JP7342923B2 (en) 2020-10-23 2023-09-12 三菱マテリアル株式会社 Slit copper materials, parts for electronic and electrical equipment, bus bars, heat dissipation boards
CN114807672A (en) * 2022-03-23 2022-07-29 中南大学 Cu-Zn-Cr-Zr-Fe-Si alloy and preparation method thereof
CN114807672B (en) * 2022-03-23 2023-09-08 中南大学 Cu-Zn-Cr-Zr-Fe-Si alloy and method for producing same

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