WO2016150133A1 - 触控基板和显示装置 - Google Patents

触控基板和显示装置 Download PDF

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Publication number
WO2016150133A1
WO2016150133A1 PCT/CN2015/090742 CN2015090742W WO2016150133A1 WO 2016150133 A1 WO2016150133 A1 WO 2016150133A1 CN 2015090742 W CN2015090742 W CN 2015090742W WO 2016150133 A1 WO2016150133 A1 WO 2016150133A1
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WIPO (PCT)
Prior art keywords
touch
electrode
electrodes
layer
touch substrate
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Ceased
Application number
PCT/CN2015/090742
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English (en)
French (fr)
Inventor
马涛
史文杰
黄寅虎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BOE Technology Group Co Ltd
Hefei Xinsheng Optoelectronics Technology Co Ltd
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BOE Technology Group Co Ltd
Hefei Xinsheng Optoelectronics Technology Co Ltd
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Application filed by BOE Technology Group Co Ltd, Hefei Xinsheng Optoelectronics Technology Co Ltd filed Critical BOE Technology Group Co Ltd
Priority to US14/914,708 priority Critical patent/US10088941B2/en
Publication of WO2016150133A1 publication Critical patent/WO2016150133A1/zh
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0446—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using a grid-like structure of electrodes in at least two directions, e.g. using row and column electrodes
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/0412—Digitisers structurally integrated in a display
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0443—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using a single layer of sensing electrodes
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04103—Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04111—Cross over in capacitive digitiser, i.e. details of structures for connecting electrodes of the sensing pattern where the connections cross each other, e.g. bridge structures comprising an insulating layer, or vias through substrate

Definitions

  • Embodiments of the present invention relate to a touch substrate and a display device.
  • OGS On Glass Solution touch refers to a technology in which a touch electrode is disposed on a protective plate outside the display panel. That is to say, the protection board functions both as a protection and also as a touch substrate, thereby making the structure of the display device simple.
  • Embodiments of the present invention provide a touch substrate and a display device with good erasing effect and simple preparation process.
  • An embodiment of the present invention provides a touch substrate including a plurality of touch electrodes made of a transparent conductive material for touch control, wherein the touch electrodes are disposed on the same layer, and adjacent touch electrodes are disposed.
  • the touch panel further includes: a shadow removing layer disposed only at an interval between adjacent touch electrodes and an edge portion of each touch electrode, wherein the image forming layer is made of a transparent insulating material.
  • the “touch electrode” refers to an electrode for implementing a touch function, which may be a plurality of electrodes of the same type, and may also include a plurality of electrodes of different types and structures.
  • “Setting on the same layer” means that the touch electrodes are formed of the same material layer, so they are in the same position in the laminated relationship, but they do not mean that they must be equal to the distance between the substrates.
  • the "shadowing layer disposed only at the interval between the adjacent touch electrodes and the edge portions of the touch electrodes” means that a part of the shadow mask is located at an interval between adjacent touch electrodes, and the other portion is located at each touch electrode.
  • the edge portion overlaps with the touch electrode; however, the above description only indicates that the projection of the shadow mask and the touch electrode on the substrate conforms to the above positional relationship, and does not indicate that the shadow mask and the touch electrode are in the same layer, nor does it represent two Must be in direct contact.
  • the shadow mask layer is composed of a transparent resin material; the thickness of the shadow mask layer is between 1 micrometer and 2.5 micrometers.
  • the shadow mask layer is composed of a transparent inorganic insulating material; the thickness of the shadow mask layer is between 0.08 micrometers and 0.15 micrometers.
  • the width of the shadow mask at the edge of the touch electrode is between 5 microns and 50 microns.
  • the width between adjacent touch electrodes is between 25 micrometers and 40 micrometers.
  • the shadow mask located at the edge of the touch electrode is disposed above the touch electrode.
  • the touch electrode includes a plurality of first electrodes and second electrodes disposed at intersections; each of the first electrodes is in a continuous strip shape; each of the second electrodes is located between the first electrodes Separate second electrode sheets are formed, and adjacent second electrode sheets are connected by a metal bridge, and the color erasing layer is disposed between the metal bridge and the first electrode.
  • the shadowing layer is composed of a transparent resin material.
  • the first electrode is a sensing electrode, and the second electrode is a scanning electrode; or the first electrode is a scanning electrode, and the second electrode is a sensing electrode.
  • Another embodiment of the present invention provides a display device including the above touch substrate.
  • the display device further includes a display panel, and the touch substrate is disposed on a light exiting side of the display panel.
  • 1 is a schematic top plan view of a touch substrate
  • Figure 2 is a partial cross-sectional structural view of Figure 1 along line AA;
  • Figure 3 is a partial cross-sectional structural view of Figure 1 taken along line BB;
  • FIG. 4 is a schematic top plan view of a touch substrate according to an embodiment of the present invention.
  • Figure 5 is a partial cross-sectional structural view of Figure 4 along line AA;
  • Figure 6 is a partial cross-sectional structural view of Figure 4 taken along line BB.
  • the substrate 9 of the touch substrate has a spaced-apart touch electrode 1 made of a transparent conductive material (such as indium tin oxide, ie, ITO) disposed on the same layer.
  • a transparent conductive material such as indium tin oxide, ie, ITO
  • the touch electrode 1 may include a scan electrode (second electrode 12) and a sensing electrode (first electrode 11), wherein the sensing electrodes are strip-shaped.
  • Each of the scanning electrodes is composed of a plurality of scanning electrode sheets (second electrode sheets 121) located between the sensing electrodes. Adjacent scanning electrode sheets are connected by a metal bridge 3 that spans the sensing electrodes. The metal bridge 3 and the sensing electrode are separated by an insulating layer 2. Since the indium tin oxide has a large resistivity, in order to lower the resistance, the thickness of the above touch electrode 1 is large, especially for a large-sized touch substrate. Because indium tin oxide is transparent, it is different from air, so when it is thick, it will be visible to the outside world, affecting the display.
  • a shadowing layer 4 covering the entire substrate which is made of a transparent inorganic insulating material such as silicon dioxide, is added to the insulating layer 2 and the metal bridge 3, thereby reducing the visibility of the touch electrode 1 by the refractive index matching function. Shadow).
  • an overcoate (OC) 5 covering the touch substrate may be added.
  • the protective layer 5 is made of a transparent organic material such as a resin, and can also have an effect of eliminating the image.
  • the above-described elimination effects of the erasing layer 4 and the protective layer 5 are still unsatisfactory, and they need to be separately manufactured, resulting in a complicated manufacturing process and structure of the product.
  • Embodiments of the present invention provide a touch substrate and a display device with good erasing effect and simple preparation process.
  • the embodiment provides a touch substrate.
  • the touch substrate is, for example, a touch substrate in an OGS mode. That is, the touch structure such as the touch electrode 1 is located in the touch substrate, and the touch substrate can be disposed outside the display panel and serves as a protection board for protecting the display panel.
  • the touch substrate includes a plurality of touch electrodes 1 made of a transparent conductive material for touch. Each of the touch electrodes 1 is disposed on the same layer, and there is a space between adjacent touch electrodes 1.
  • the touch electrode 1 for implementing the touch function is provided in the touch substrate.
  • These touch electrodes 1 can be made of a transparent conductive material such as indium tin oxide to allow light to pass therethrough.
  • each touch electrode 1 is located in the same layer. Since the touch electrodes 1 are located in the same layer, the touch electrodes 1 cannot be in contact with each other in order to prevent them from being electrically connected to each other. Therefore, a space must be provided between adjacent touch electrodes 1. In other words, the projections of the touch electrodes 1 on the substrate 9 of the touch substrate do not overlap each other.
  • each touch electrode 1 is formed of the same material layer. Therefore, they belong to the same layer in terms of a cascading relationship. However, this does not mean that their distance from the substrate 9 is necessarily the same.
  • the touch substrate of the present embodiment further includes an erasing layer 4 disposed only at intervals of the adjacent touch electrodes 1 and at the edge portions of the touch electrodes 1 .
  • the shadow mask 4 is composed of a transparent insulating material.
  • a transparent (such as a transmittance greater than 90%) and an insulating shadow mask 4 is also provided in the touch substrate.
  • the portion of the erasing layer 4 is located at the interval between the touch electrodes 1 and the other portion is located at the edge portion of the touch electrode 1 to form an overlap.
  • the projection of the erasing layer 4 on the substrate 9 should fill the gap of the projection of the touch electrode 1 on the substrate 9, while the projection of the erasing layer 4 on the substrate 9 is also in the edge portion of the touch electrode 1.
  • the projected portions on the substrate coincide.
  • the above description does not mean that the shadow mask 4 and the touch electrode 1 are in the same layer, nor does it mean that the two must be in direct contact.
  • the erasing layer 4 of the present embodiment can achieve a better image subtracting effect than the complete erasing layer 4. This is because the visual effect of the touch electrode 1 is mainly caused by its edges. That is, at the boundary between the touch electrode 1 and the touchless electrode 1 (ie, the edge of the touch electrode 1), the transmittance and the refractive index difference are large due to the different structures on both sides of the edge of the touch electrode 1. So the junction is the easiest to see. Since there is no difference in the structure inside the touch electrode 1, it is not easy to be seen.
  • the erasing layer 4 of the present embodiment is distributed at the gap and the edge portion of the touch electrode 1.
  • the erasing layer 4 is present on both sides of the edge of the touch electrode 1 (the above boundary), so that the difference in transmittance and refractive index between the two sides of the touch electrode 1 can be reduced, so that the edge of the touch electrode 1 is not Easy to be seen, achieving good shadowing.
  • a portion where the erasing layer 4 overlaps the touch electrode 1 is located above the touch electrode 1.
  • the opaque layer 4 is located above the touch electrode 1 instead of under the touch electrode 1 , so that the overlap with the touch electrode 1 is necessarily better than the touch electrode. 1 is further away from the substrate 9.
  • the portion of the erasing layer 4 overlapping the touch electrode 1 may be directly disposed on the touch electrode 1 (ie, in contact with the touch electrode 1), or may have other structures on the touch electrode 1
  • the shadow layer 4 is located on the structure.
  • the touch electrode 1 is generally thin and has to be electrically conductive, so that the structure of the lower side should be as flat as possible to prevent the touch electrode 1 from being broken.
  • the opaque layer 4 is disposed above the touch electrode 1 to ensure that the structure under the touch electrode 1 is relatively flat.
  • the portion where the shadow mask 4 overlaps the touch electrode 1 is located below the touch electrode 1.
  • the width between the adjacent touch electrodes 1 is between 25 micrometers and 40 micrometers.
  • the width of the shadow mask 4 located at the edge of the touch electrode 1 is between 5 micrometers and 50 micrometers. That is, the width of the overlapping portion of the erasing layer 4 and the touch electrode 1 on each side thereof is, for example, 5 micrometers to 50 micrometers. between.
  • the touch electrode 1 includes a plurality of first electrodes 11 and second electrodes 12 disposed at intersections; and each of the first electrodes 11 is continuous. Strip.
  • Each of the second electrodes 12 is composed of a plurality of divided second electrode sheets 121 located between the respective first electrodes 11. Adjacent second electrode sheets 121 are connected by a metal bridge 3. An erasing layer 4 is disposed between the metal bridge 3 and the first electrode 11.
  • the touch electrode 1 can be divided into two electrodes which are disposed at the intersection.
  • the first electrode 11 is strip-shaped (horizontal distribution in the drawing). Since the two electrodes are disposed in the same layer and cannot be in contact, the first electrode 11 divides each of the second electrodes 12 into a plurality of mutually spaced portions (second electrode sheets 121). These second electrode sheets 121 may be connected by a metal bridge 3 that spans the first electrode 11.
  • the metal bridge 3 may be made of a metal such as titanium or molybdenum.
  • an insulating layer 2 is provided between the metal bridge 3 and the first electrode 11.
  • the insulating layer 2 may be the above-mentioned anechoic layer 4.
  • the insulating layer 2 (the anechoic layer 4) at this time is not only located at the metal bridge 3 but at the interval and edge of the touch electrode 1.
  • the department has settings.
  • the erasing layer 4 is simultaneously used as the insulating layer 2, the insulating layer 2 is an essential structure originally for the touch electrode 1 of the above form.
  • the insulating layer 2 is an essential structure originally for the touch electrode 1 of the above form.
  • the above-mentioned image forming layer 4 is composed of a transparent resin material and has a thickness of between 1 ⁇ m and 2.5 ⁇ m.
  • the above-described image forming layer 4 (insulating layer 2) can be formed of a common resin material such as an epoxy resin or an acrylic resin.
  • the existing insulating layer 2 is mostly made of a transparent resin material, and the process is uniform if the material is not changed; on the other hand, the resin material can be directly developed after being exposed in the pattern, without being performed. Etching, so the preparation method is also relatively simple.
  • the coloring layer 4 is formed of a transparent resin material, it needs to have a large thickness, usually between 1 ⁇ m and 2.5 ⁇ m.
  • the shadow mask 4 may also be composed of a transparent inorganic insulating material and have a thickness of between 0.08 ⁇ m and 0.15 ⁇ m.
  • the shadow mask 4 with a conventional transparent inorganic insulating material, for example, Silicon oxide, silicon nitride, silicon oxynitride, and the like.
  • a conventional transparent inorganic insulating material for example, Silicon oxide, silicon nitride, silicon oxynitride, and the like.
  • the image forming layer 4 is an inorganic material, its thickness can be relatively thin, about 0.08 micrometers to 0.15 micrometers.
  • the above metal bridge 3 and the erasing layer 4 are disposed on the first electrode 11 to ensure the flatness under the first electrode 11.
  • the first electrode 11 is a sensing electrode and the second electrode 12 is a scanning electrode.
  • a scan signal can be applied to each of the second electrodes 12 in turn. Since the adjacent portions of the first electrode 11 and the second electrode 12 form a capacitance, an induced signal is generated on the first electrode 11. When a touch occurs, the capacitance between the first electrode 11 and the second electrode 12 changes, and the corresponding sensing signal on the second electrode 12 also changes, so that the position of the touch can be determined and touch can be realized.
  • the first electrode 11 is a scan electrode and the second electrode 12 is a sensing electrode, it is also possible to change the signal in each electrode accordingly.
  • the touch electrode 1 can also be other known structures.
  • the touch electrodes 1 may be in the form of a sheet and formed as an array on the substrate, and each touch electrode 1 is directly connected to the driving chip through the lead wires, and can generate an independent sensing signal (induction with the touch finger, also Become "self-contained” to drive.
  • touch substrate other known structures, such as a buffer layer, a black matrix, a lead, etc., may also be included, which will not be described in detail herein.
  • the embodiment provides a display device including the above touch substrate.
  • the display device further includes a display panel for performing display, and the touch substrate is disposed on the light exiting side of the display panel.
  • the display panel may be, for example, a liquid crystal display panel, an organic light emitting diode display panel, an electronic paper display panel, or the like.
  • the touch substrate is, for example, the above OGS mode, so that it can be disposed outside the display panel, both for implementing the touch function and as a protection board for protecting the display panel.
  • the display device of this embodiment may be any product having a display function and a touch function, such as a liquid crystal display device, an OLED display device, a mobile phone, a tablet computer, a television, a display, a notebook computer, a digital photo frame, a navigator, and the like.
  • a liquid crystal display device such as a liquid crystal display device, an OLED display device, a mobile phone, a tablet computer, a television, a display, a notebook computer, a digital photo frame, a navigator, and the like.
  • the erasing layer is located only at the electrode spacing and the electrode edge portion, instead of covering the entire touch substrate.
  • the inventors have found that the edge of the touch electrode is most visually obvious, that is, the structure of the "electrode” and “electrodeless” junctions is different on both sides, and the visual effect is large and easy to be seen; therefore, the image forming layer of the present invention As long as there are points on both sides of the junction
  • the cloth can reduce the difference of transmittance and refractive index on both sides of the junction, so that the junction is not obvious, so as to achieve better shadow elimination effect; in addition, the above-mentioned shadow elimination layer can simultaneously serve as a bridge between the metal bridge and the electrode.
  • the insulating layer does not require additional steps, the preparation method and structure are simple, and the cost is low.

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  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Theoretical Computer Science (AREA)
  • Human Computer Interaction (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Position Input By Displaying (AREA)

Abstract

一种触控基板(100)和显示装置，该触控基板(100)包括多个用于触控的、由透明导电材料构成的触控电极(1)，各触控电极(1)设置在同一层，相邻触控电极(1)间有间隔，且所述触控基板(100)还包括：仅设于相邻触控电极(1)间隔处以及各触控电极(1)边缘部的消影层(4)，所述消影层(4)由透明绝缘材料构成。该触控基板(100)和显示装置消影效果好且制备工艺简单。

Description

触控基板和显示装置 技术领域
本发明的实施例涉及一种触控基板和显示装置。
背景技术
OGS(On Glass Solution)触控是指将触控电极设在显示面板外的保护板上的技术。也就是说，保护板既起到保护作用，也同时作为触控基板，由此使显示装置的结构简单。
发明内容
本发明的实施例提供了一种消影效果好且制备工艺简单的触控基板和显示装置。
本发明的一个实施例提供了一种触控基板，其包括用于触控的、由透明导电材料构成的多个触控电极，各触控电极设置在同一层，相邻触控电极间有间隔，且所述触控基板还包括：仅设于相邻触控电极间隔处以及各触控电极边缘部的消影层，所述消影层由透明绝缘材料构成。
本公开中，“触控电极”是指用于实现触控功能的电极，其可为多个同类型的电极，也可包括多种不同类型、结构的电极。
“设置在同一层”是指各触控电极是由同一个材料层形成的，故它们在层叠关系上处于相同的位置，但并不代表它们必须与基底间的距离相等。
“仅设于相邻触控电极间隔处以及各触控电极边缘部的消影层”是指消影层的一部分位于相邻触控电极之间的间隔处，另一部分则位于各触控电极的边缘部并与触控电极交叠；但以上描述仅表示消影层和触控电极在基底上的投影符合以上位置关系，而不表示消影层和触控电极同层，也不表示二者必须直接接触。
例如，所述消影层由透明树脂材料构成；所述消影层的厚度在1微米～2.5微米之间。
例如，所述消影层由透明无机绝缘材料构成；所述消影层的厚度在0.08微米～0.15微米之间。
例如，位于触控电极边缘部的消影层的宽度在5微米～50微米之间。
例如，相邻所述触控电极间的间隔的宽度25微米～40微米之间。
例如，位于触控电极边缘部的消影层设于触控电极上方。
例如，所述触控电极包括多个交叉设置的第一电极和第二电极；每个所述第一电极为连续的条状；每个所述第二电极由位于各第一电极间的多个分开的第二电极片组成，相邻第二电极片通过金属桥连接，所述金属桥与第一电极之间设有所述消影层。
例如，所述消影层由透明树脂材料构成。
例如，所述第一电极为感应电极，第二电极为扫描电极；或所述第一电极为扫描电极，第二电极为感应电极。
本发明的另一个实施例提供了一种显示装置，其包括上述的触控基板。
例如，所述显示装置还包括显示面板，所述触控基板设于所述显示面板的出光侧。
附图说明
为了更清楚地说明本发明实施例的技术方案，下面将对实施例的附图作简单地介绍，显而易见地，下面描述中的附图仅仅涉及本发明的一些实施例，而非对本发明的限制。
图1为一种触控基板的俯视结构示意图；
图2为图1沿AA线的局部剖面结构示意图；
图3为图1沿BB线的局部剖面结构示意图；
图4为本发明的实施例的触控基板的俯视结构示意图；
图5为图4沿AA线的局部剖面结构示意图；
图6为图4沿BB线的局部剖面结构示意图。
具体实施方式
为使本发明实施例的目的、技术方案和优点更加清楚，下面将结合本发明实施例的附图，对本发明实施例的技术方案进行清楚、完整地描述。显然，所描述的实施例是本发明的一部分实施例，而不是全部的实施例。基于所描述的本发明的实施例，本领域普通技术人员在无需创造性劳动的前提下所获得的所有其他实施例，都属于本发明保护的范围。如图1至图3所示， 触控基板的基底9上具有设置在同一层的、间隔的、由透明导电材料(如氧化铟锡，即ITO)构成的触控电极1。触控电极1可包括扫描电极(第二电极12)和感应电极(第一电极11)，其中感应电极为条状。每个扫描电极则由位于感应电极间的多个扫描电极片(第二电极片121)组成。相邻扫描电极片通过跨过感应电极的金属桥3连接。金属桥3与感应电极间被绝缘层2隔开。因为氧化铟锡电阻率较大，所以为了降低电阻，以上触控电极1的厚度较大，大尺寸触控基板尤其如此。因为氧化铟锡虽然透明，但毕竟不同于空气，所以当厚度大时会在外界可见，影响显示。因此，在绝缘层2和金属桥3上增设由二氧化硅等透明无机绝缘材料构成的、覆盖整个基板的消影层4，从而通过折射率匹配作用降低触控电极1的可见性(即消影)。若消影层4的消影效果不理想，则还可增设覆盖触控基板的保护层(overcoate，OC)5。保护层5由树脂等透明有机材料构成，也可起到消影的效果。但是，以上的消影层4和保护层5的消影效果仍不理想，并且它们需要单独制造，导致产品的制备工艺和结构复杂。本发明的实施例提供了一种消影效果好且制备工艺简单的触控基板和显示装置。
实施例1：
如图4至图6所示，本实施例提供一种触控基板。
触控基板例如为OGS模式的触控基板。即，触控电极1等触控结构位于该触控基板中，并且该触控基板可设于显示面板外侧，同时作为保护显示面板用的保护板。
该触控基板包括用于触控的、由透明导电材料构成的多个触控电极1。各触控电极1设置在同一层，且相邻触控电极1间有间隔。
也就是说，在触控基板中设有用于实现触控功能的触控电极1。这些触控电极1可由透明导电材料(如氧化铟锡)制成的，以允许光线透过。同时，各触控电极1位于同一层中。而由于各触控电极1位于同一层中，所以为防止它们相互导通，各触控电极1不能相互接触。因此，相邻的触控电极1之间必须设有间隔。或者说，各触控电极1在触控基板的基底9上的投影不互相重叠。
本公开中“设置在同一层”是指各触控电极1是由同一个材料层形成的。因此，从层叠关系上看它们属于同一层。但是，这并不表示它们与基底9间的距离必然相同。
本实施例的触控基板还包括仅设于相邻触控电极1间隔处以及各触控电极1边缘部的消影层4。消影层4由透明绝缘材料构成。
也就是说，在触控基板中还设有透明(如透过率大于90％)且绝缘的消影层4。而该消影层4一部分位于各触控电极1之间的间隔处，另一部分则位于触控电极1的边缘部并形成交叠。或者说，消影层4在基底9上的投影应填满触控电极1在基底9上的投影的间隙，同时消影层4在基底9上的投影还与触控电极1边缘部分在在基底上的投影部分重合。当然，应当理解，以上描述并不代表消影层4和触控电极1同层，也不表示二者必须直接接触。
经过研究发现，与完整的消影层4相比，本实施例的消影层4可起到更好的消影效果。这是因为触控电极1的视觉效果主要是由其边缘造成的。即，在有触控电极1和无触控电极1的交界处(即触控电极1边缘)，由于触控电极1的边缘的两侧的结构不同，透过率、折射率差异较大，所以该交界处最容易被看到。而由于触控电极1内部各处的结构无差别，所以反而不容易被看到。本实施例的消影层4在触控电极1的间隙处和边缘部均有分布。即，消影层4在触控电极1的边缘(以上交界)两侧都存在，从而可降低触控电极1边缘两侧的透过率、折射率的差异，使触控电极1的边缘不容易被看到，达到良好的消影效果。
例如，消影层4与触控电极1交叠的部分位于触控电极1上方。
也就是说，从层级关系上看，消影层4是位于触控电极1之上的，而非在触控电极1之下，从而其与触控电极1的交叠部必然比触控电极1更远离基底9。当然，消影层4与触控电极1交叠的部分可直接设在触控电极1上(即与触控电极1接触)，或者也可以是在触控电极1上有其他结构，而消影层4在位于该结构上。
之所以如此，是因为触控电极1一般厚度较薄且要保证导电性，故其下侧的结构应尽量平整，以免触控电极1产生断裂。而将消影层4设于触控电极1上方可以保证触控电极1之下的结构比较平整。
当然，消影层4与触控电极1交叠的部分位于触控电极1的下方也是可行的。
例如，相邻触控电极1间的间隔的宽度25微米～40微米之间。例如，位于触控电极1边缘部的消影层4的宽度在5微米～50微米之间。也就是说，消影层4与其每侧的触控电极1的交叠部分的宽度例如在5微米～50微米之 间。
经研究发现，当消影层4、触控电极1的尺寸符合以上范围时，可以达到更好的消影效果。
例如，作为本实施例的一种方式，如图4至图6所示，触控电极1包括多个交叉设置的第一电极11和第二电极12；且每个第一电极11为连续的条状。每个第二电极12由位于各第一电极11间的多个分开的第二电极片121组成。相邻第二电极片121通过金属桥3连接。该金属桥3与第一电极11之间设有消影层4。
也就是说，如图4所示，触控电极1可分为两种交叉设置的电极。例如，第一电极11为条状(图中横向分布)。由于两种电极设置在同一层且不能接触，所以第一电极11会将每个第二电极12分为多个相互隔开的部分(第二电极片121)。这些第二电极片121可通过跨过第一电极11的金属桥3相连。金属桥3可由钛、钼等金属构成。为了防止该金属桥3与第一电极11接触，所以金属桥3与第一电极11间设有绝缘层2。在本实施例中，该绝缘层2可以即为以上消影层4，当然，此时的绝缘层2(消影层4)不仅位于金属桥3处，而在触控电极1的间隔和边缘部都有设置。
可见，本实施例中例如以消影层4同时作为绝缘层2的优点在于，对于以上形式的触控电极1，绝缘层2是本来就有的必要结构。这样就不必再额外增加单独的形成消影层4的步骤，而只要改变绝缘层2的图形即可，从而可简化制备工艺。
例如，以上消影层4由透明树脂材料构成，且其厚度在1微米～2.5微米之间。
也就是说，可以用环氧树脂、丙烯酸树脂等常见的树脂材料形成以上的消影层4(绝缘层2)。这是因为一方面现有的绝缘层2多采用透明树脂材料制造，若不改变其材料则有利于工艺的统一；另一方面，树脂材料在构图时只要曝光后即可直接显影，而不必进行刻蚀，故其制备方法也比较简便。而当采用透明树脂材料构成消影层4时，其需要有较大的厚度，通常在1微米～2.5微米之间。
例如，作为本实施例的另一种方式，消影层4也可由透明无机绝缘材料构成，且其厚度在0.08微米～0.15微米之间。
也就是说，也可以用常规的透明无机绝缘材料构成消影层4，例如使用 氧化硅、氮化硅、氮氧化硅等。当消影层4为无机材料时，其厚度可相对较薄，约在0.08微米～0.15微米。
例如，如图4所示，如前所述，以上金属桥3和消影层4设于第一电极11之上，以保证第一电极11下方的平整。
例如，以上第一电极11为感应电极，第二电极12为扫描电极。
也就是说，可轮流向各第二电极12施加扫描信号。由于第一电极11与第二电极12的相邻部分会形成电容，所以第一电极11上会产生感应信号。当有触摸发生时，触摸处第一电极11与第二电极12间的电容变化，相应的第二电极12上的感应信号也变化，从而可确定出触摸的位置，实现触控。
当然，若第一电极11为扫描电极，而第二电极12为感应电极，也是可行的，只要相应的改变各电极中的信号即可。
当然，以上描述的只是触控电极1的一种具体形式。触控电极1也可为其他已知结构。例如：触控电极1可为片状，并在基板上形成为阵列，而每个触控电极1均通过引线直接连接驱动芯片，并可产生独立的感应信号(与触摸手指间的感应，也成为“自容式”)以进行驱动。
当然，在触控基板中，还可包括其他的已知结构，如缓冲层、黑矩阵、引线等，在此不再详细介绍。
实施例2：
本实施例提供一种显示装置，其包括上述的触控基板。
例如，显示装置还包括用于进行显示的显示面板，而触控基板设于显示面板的出光侧。该显示面板例如可以为液晶显示面板、有机发光二极管显示面板、电子纸显示面板等。
也就是说，触控基板例如为以上的OGS模式，从而其可设在显示面板的外侧，既用于实现触控功能，又作为保护显示面板的保护板。
本实施例的显示装置可为液晶显示装置、OLED显示装置、手机、平板电脑、电视机、显示器、笔记本电脑、数码相框、导航仪等任何具有显示功能和触控功能的产品。
本发明至少一实施例的显示装置的触控基板中，消影层仅位于电极间隔处和电极边缘部，而非布满整个触控基板。发明人发现，触控电极的边缘在视觉上最明显，即“有电极”和“无电极”的交界处两侧结构不同，视觉效果差别大，容易被看到；因此本发明的消影层只要在该交界处两侧均有分 布即可降低了交界处两侧的透过率、折射率的差异，使交界处不明显，从而达到更好的消影效果；另外，以上的消影层可同时作为金属桥与电极间的绝缘层，故其不需增加额外工序，制备方法和结构简单，成本低。
可以理解的是，以上实施方式仅仅是为了说明本发明的原理而采用的示例性实施方式，然而本发明并不局限于此。对于本领域内的普通技术人员而言，在不脱离本发明的精神和实质的情况下，可以做出各种变型和改进，这些变型和改进也视为本发明的保护范围。
本申请要求于2015年3月20日递交的中国专利申请第201510125435.3号的优先权，在此全文引用上述中国专利申请公开的内容以作为本申请的一部分。

Claims (12)

  1. 一种触控基板，包括：
    多个用于触控的、由透明导电材料构成的触控电极，其中，各触控电极设置在同一层，相邻触控电极间有间隔；以及
    仅设于相邻触控电极间隔处以及各触控电极边缘部的消影层，其中，所述消影层由透明绝缘材料构成。
  2. 根据权利要求1所述的触控基板，其中，所述消影层由透明树脂材料构成。
  3. 根据权利要求2所述的触控基板，其中，所述消影层的厚度在1微米～2.5微米之间。
  4. 根据权利要求1所述的触控基板，其中，所述消影层由透明无机绝缘材料构成。
  5. 根据权利要求4所述的触控基板，其中，所述消影层的厚度在0.08微米～0.15微米之间。
  6. 根据权利要求1-5的任一项所述的触控基板，其中，
    位于触控电极边缘部的消影层的宽度在5微米～50微米之间。
  7. 根据权利要求1-6的任一项所述的触控基板，其中，
    相邻所述触控电极间的间隔的宽度20微米～40微米之间。
  8. 根据权利要求1-7的任一项所述的触控基板，其中，
    位于触控电极边缘部的消影层设于触控电极上方。
  9. 根据权利要求1-8的任一项所述的触控基板，其中，所述触控电极包括多个交叉设置的第一电极和第二电极；
    每个所述第一电极为连续的条状；
    每个所述第二电极由位于各第一电极间的多个分开的第二电极片组成，相邻第二电极片通过金属桥连接，所述金属桥与第一电极之间设有所述消影层。
  10. 根据权利要求1-9的任一项所述的触控基板，其中，
    所述第一电极为感应电极，第二电极为扫描电极；或
    所述第一电极为扫描电极，第二电极为感应电极。
  11. 一种显示装置，包括触控基板，其中，所述触控基板为权利要求1 至10中任意一项所述的触控基板。
  12. 根据权利要求11所述的显示装置，还包括显示面板，其中，所述触控基板设于所述显示面板的出光侧。
PCT/CN2015/090742 2015-03-20 2015-09-25 触控基板和显示装置 Ceased WO2016150133A1 (zh)

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