WO2016122046A1 - Inductive heating linear evaporation deposition apparatus - Google Patents

Inductive heating linear evaporation deposition apparatus Download PDF

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Publication number
WO2016122046A1
WO2016122046A1 PCT/KR2015/002324 KR2015002324W WO2016122046A1 WO 2016122046 A1 WO2016122046 A1 WO 2016122046A1 KR 2015002324 W KR2015002324 W KR 2015002324W WO 2016122046 A1 WO2016122046 A1 WO 2016122046A1
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WIPO (PCT)
Prior art keywords
nozzle
storage space
induction heating
disposed
deposition apparatus
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PCT/KR2015/002324
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English (en)
French (fr)
Inventor
Joo-In LEE
Yong-Hyeon Shin
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Korea Research Institute Of Standards And Science
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Publication of WO2016122046A1 publication Critical patent/WO2016122046A1/en

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/26—Vacuum evaporation by resistance or inductive heating of the source
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02612—Formation types
    • H01L21/02617—Deposition types
    • H01L21/02631—Physical deposition at reduced pressure, e.g. MBE, sputtering, evaporation
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
    • H10K71/164—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using vacuum deposition

Definitions

  • the present invention generally relates to linear evaporation deposition apparatuses and, more particularly, to inductive heating linear evaporation deposition apparatuses for an organic thin film deposition.
  • organic layers including a light emitting layer are formed by using a thermal deposition method that is a type of physical deposition method.
  • an organic layer including an organic light emitting layer is conventionally formed by means of a thermal deposition process.
  • the thermal deposition process is suitable for mass production because an organic layer is formed in a scan manner where a substrate moves in a straight line direction in a deposition apparatus and the scan deposition manner is advantageous in material efficiency and thickness uniformity.
  • a heater line for heating an organic material is disposed outside a deposition source to make it difficult to uniformly control temperature of the deposition source. Therefore, it is difficult to form a uniform organic thin film. Since temperature of the heater line is much higher than heating temperature of the deposition source, distance between the deposition source and the deposition substrate must be long due to temperature increase of a mask on a deposition substrate. Thus, a vacuum chamber increases in volume to incur high costs for manufacturing of a deposition apparatus. In addition, since organic powders filled in the deposition source are heated to rush out of the deposition source during evaporation deposition of the organic material, the substrate and the vacuum chamber are contaminated and usage efficiency of the organic material is reduced.
  • Embodiments of the present invention provide an upward or downward linear evaporation deposition apparatus employing a simple induction heating manner.
  • Embodiments of the present invention provide an upward or downward linear evaporation deposition apparatus employing an induction heating manner that may reduce an injection angle to spatially deposit a uniform thin film with high straightness and to manufacture a high-definition OLED panel.
  • Embodiments of the present invention provide an upward or downward linear evaporation deposition apparatus that prevents organic powers filled in an evaporation source from getting out of the evaporation source by heating during evaporation deposition of an organic material to suppress contamination of a substrate and a vacuum chamber and improve usage efficiency of the organic material.
  • Embodiments of the present invention provide an upward or downward linear evaporation deposition apparatus that reduces the total temperature of an evaporation source by induction heating and prevents temperature of a mask on a deposition substrate from increasing to accurately form a fine pattern by a mask .
  • a linear evaporation deposition apparatus may include a vacuum container including a slit extending in a first direction; an evaporation crucible inserted into the slit to be disposed inside the vacuum container, including a storage space to store a deposition material, being made of a conductive material, heating the deposition material to generate vapor, injecting the vapor through a plurality of nozzles parts each connecting with the storage space, and extending in the first direction; an induction heating coil generating an induced electric field, extending in the first direction, and being disposed outside the vacuum container to inductively heat the evaporation crucible; and a dielectric window coupled with a surrounding portion of the slit of the vacuum container to seal the vacuum container, being disposed between the induction heating coil and the evaporation crucible, passing through the induced electric field generated by the induction heating coil, and extending in the first direction.
  • the evaporation crucible may include the storage space extending in the first direction and store the deposition material; a body part with the shape of a square container including nozzle coupling through-holes arranged in the first direction and surrounding the storage space; a widthwise obstacle protruding from a side surface of the body part in a second direction perpendicular to the first direction to be coupled with the slit; and a plurality of nozzle parts including coupling screw threads formed on their respective outer circumferential surfaces, being inserted into the storage space to be disposed therein, connecting with the storage space, and being arranged in the first direction.
  • the nozzle coupling through-hole may be screw-coupled with the coupling screw thread.
  • the nozzle part may include a jet nozzle disposed in the storage space and having a through-hole formed in its center; and a gasket portion compressed by the jet nozzle to seal the nozzle coupling through-hole.
  • the jet nozzle may include a cylindrical upper nozzle disposed in the storage space, the upper nozzle having a first through-hole with a constant internal diameter; a taper nozzle disposed in the storage space, the taper nozzle having a second through-hole whose internal diameter increases gradually, being continuously connected to the upper nozzle, and having gradually increasing external and internal diameters; a cylindrical lower nozzle having a third through-hole with a constant internal diameter, the lower nozzle being continuously connected to the taper nozzle; and a nozzle flange disposed outside the storage space, the nozzle flange having the shape of a washer connected to the lower nozzle.
  • the coupling screw thread may be formed on an outer circumferential surface of the lower nozzle.
  • the upper nozzle may include a guide upper nozzle to guide the vapor, the guide upper nozzle having a constant external diameter; and a fixed upper nozzle connected to the guide upper nozzle, the fixed upper nozzle having a greater external diameter than the guide upper nozzle.
  • the fixed upper nozzle may include a position adjustment screw thread formed on an outer side surface.
  • the linear evaporation deposition apparatus may further include a nozzle cover to guide the vapor.
  • the nozzle covers may include a cylindrical cover body part disposed to surround the upper nozzle and screw-coupled with the position adjustment screw thread, the cylindrical cover body part having a plurality of through-holes along its side surface and whose one end is open and the other end is closed; and a position adjustment nut portion inserted into an outer circumferential surface of the fixed upper nozzle to be screw-coupled with the position adjustment screw thread.
  • the linear evaporation deposition apparatus may further include a heat insulating member disposed between the widthwise obstacle and the vacuum container.
  • the body part may include a body part top plate extending in the first direction and disposed on an upper surface of the body part.
  • the body part top plate may be welded with the body part to be integrated in one body.
  • the evaporation crucible may be disposed on a lower surface of the vacuum container and upwardly injects vapor against a gravity direction to form a thin film on a substrate.
  • the evaporation crucible may include a storage space extending in the first direction and being defined to store the deposition material; a body part including a plurality of nozzle coupling through-holes arranged on an upper surface in the first direction and surrounding the storage space, the body part having a shape of a square container; a widthwise obstacle protruding from a side surface of the body part in a second direction perpendicular to the first direction to be coupled with a projection of the slit; and a plurality of nozzle parts including coupling screw threads formed on upper portions of their respective outer circumferential surfaces, the nozzle parts each being inserted into the nozzle coupling through-hole, connecting with the storage space in a third direction perpendicular to the first and second directions, and being arranged in the first direction.
  • the coupling screw thread may be screw-
  • the nozzle part may include a jet nozzle disposed in the storage space and having a through-hole formed in its center; and a gasket portion to seal the storage space.
  • the jet nozzle may include a lower nozzle having a first through-hole with a constant internal diameter and provided as a cylindrical nozzle; a taper nozzle having a second through-hole with a gradually increasing internal diameter and continuously connected to the lower nozzle to gradually increase in external and internal diameters; an upper nozzle having a third through-hole with a constant diameter, continuously connected to the taper nozzle, and provided as a cylindrical nozzle; and a nozzle flange connected to the upper nozzle and provided in the form of a washer.
  • the coupling screw thread may be formed on an outer circumferential surface of the lower nozzle.
  • the lower nozzle may include a guide lower nozzle to guide the deposition material, the guide upper nozzle having a constant external diameter; and a fixed lower nozzle connected to the guide lower nozzle, the fixed lower nozzle having a greater external diameter than the guide upper nozzle.
  • the fixed lower nozzle may include a position adjustment screw thread formed on an outer side surface.
  • the linear evaporation deposition apparatus may further include a nozzle cover to guide the vapor.
  • the nozzle cover may include a cylindrical cover body part disposed to surround the lower nozzle and screw-coupled with the position adjustment screw thread, the cylindrical cover body part including a plurality of through-holes along its side surface and whose one end is open and the other is closed; and a position adjustment nut part inserted into an outer circumferential surface of the fixed lower nozzle to be screw-coupled with the position adjustment screw thread.
  • the evaporation crucible may downwardly inject vapor in a gravity direction to form a thin film on a substrate.
  • the evaporation crucible may include a storage space extending in the first direction and being defined to store the deposition material; a body part including a plurality of nozzle coupling through-holes arranged in the first direction and surrounding the storage space, the body part having a square container; a widthwise obstacle protruding from a side surface of the body part in a second direction perpendicular to the first direction to be coupled to a projection of the slit of the vacuum container; and a plurality of nozzle parts including coupling screw threads formed on upper portions of their respective outer circumferential surfaces, the nozzle parts being disposed inwardly toward the vacuum container, each being inserted into the nozzle coupling through-hole to be screw-coupled to the coupling screw thread and the nozzle coupling through-hole, connecting with the storage space, and being arranged in the first direction.
  • the nozzle part may include a jet nozzle disposed in the storage space and having a through-hole formed in its center; a nozzle flange including a plurality of auxiliary through-holes disposed outside the storage space, connecting with the through-holes, and extending in a radial direction in a spherical coordinate system, the nozzle flange having a shape of a truncated circular cone; and a gasket portion disposed between the nozzle flange and the nozzle coupling through-hole to seal the storage space.
  • the jet nozzle may include a guide jet nozzle to guide the deposition material, the guide jet nozzle having a constant external diameter; and a fixed jet nozzle connected to the guide jet nozzle, the fixed jet nozzle having a larger external diameter than the guide jet nozzle.
  • the fixed jet nozzle may include a position adjustment screw thread formed on its outer side surface.
  • the linear evaporation deposition apparatus may further include a nozzle cover to guide the vapor.
  • the nozzle cover may include a cylindrical cover part disposed to surround the upper jet nozzle and screw-coupled with the position adjustment screw thread, the cylindrical over part including a plurality of through-holes along its side surface and whose one end is open and the other is closed; and a position adjustment nut part inserted into an outer circumferential surface of the fixed jet nozzle to be screw-coupled with the position adjustment screw thread.
  • the dielectric window may include a reflective coating to reflect infrared light at its lower surface.
  • the reflective coating may make temperature uniform when the evaporation crucible is inductively heated.
  • the induction heating coil may include a first induction heating coil disposed on a disposition plane of the dielectric window and extending in the first direction and a second induction heating line extending parallel to the first induction heating line.
  • the first induction heating line and the second induction heating line may be electrically connected in series.
  • the linear evaporation deposition apparatus may further include an AC power supply to supply AC power to the induction heating coil.
  • the induction heating coil may be bent in a direction perpendicular to a disposition plane of the dielectric window to extend in the first direction.
  • a distance between the induction heating coil and the evaporation crucible may vary depending on a position of the evaporation crucible to control heating temperature depending on the position of the evaporation crucible.
  • the induction heating coil may include a first induction heating coil extending from a center portion of the vacuum container in the first direction; and second and third induction heating coils extending from both edge portions of the vacuum container in the first direction.
  • the first induction heating coil may be connected to a first AC power supply
  • the second induction heating coil may be connected to a second AC power supply
  • the third heating induction coil may be connected to a third AC power supply.
  • the linear evaporation deposition apparatus may further include a through-hole penetrating in the second direction; and a stopper removably attached to the through-hole to refill the storage space with the deposition material.
  • a linear evaporation deposition apparatus may include an evaporation crucible disposed inside a vacuum container having a slit extending in a first direction, the evaporation crucible having a storage space to store a deposition material, being made of a conductive material, heating the deposition material to generate vapor, injecting the vapor through a plurality of nozzle parts each connecting with the storage space, and extending in the first direction; an induction heating coil to establish an induced electric field, the induction heating coil inductively heating the evaporation crucible, extending in the first direction, and being disposed outside the storage space to inductively heat the evaporation crucible; and a dielectric window coupled with a surrounding portion of the slit of the vacuum container to seal the vacuum container, the dielectric window being disposed between the inducting heating coil and the evaporation crucible, transmitting an induced electric field established by the induction heating coil, and extending in the first direction.
  • the evaporation crucible may include the storage space extending in the first direction, the storage space being defined to store the deposition material; a body part including a plurality of nozzle coupling through-holes arranged in the first direction and surrounding the storage space, the body part having the shape of a square container; and a plurality of nozzle parts inserted into the storage space to be disposed thereat, the nozzle parts each connecting with the storage space and being arranged in the first direction.
  • downward and upward linear evaporation deposition apparatuses using induction heating include a technique to prevent nozzle blocking and increase of substrate temperature caused by high-frequency induction heating, a technique using a nozzle cover to prevent organic powders from getting out of an evaporation source, a technique to adjust the injection amount of vapor generated from organic powders by adjusting a position of the nozzle cover, and a linear deposition technique to reduce an injection angle of evaporated vapor using a semi-elliptical or parabolic nozzle.
  • use efficiency of organic materials may be improved, substrate and chamber contamination caused by organic powders or the like may be prevented, and a thin film may be uniformly deposited on a large-area substrate.
  • high-definition OLED panels may be manufactured.
  • the induction heating linear evaporation deposition apparatus may conveniently perform disassembly and assembly for refilling and cleaning with a simple structure to easily manage a process and reduce process costs.
  • FIG. 1A is a cutting perspective view of an evaporation deposition apparatus according to an embodiment of the present invention.
  • FIG. 1B is a cross-sectional view taken along a line I-I' in FIG. 1A.
  • FIG. 1C is a cross-sectional view taken along a line II-II' in FIG. 1A.
  • FIG. 1D is a top plan view of the evaporation deposition apparatus in FIG. 1A.
  • FIG. 1E is a perspective view of a nozzle part in FIG. 1A.
  • FIG. 1F is a cross-sectional view of the nozzle part in FIG. 1E.
  • FIG. 2A is a cross-sectional view of a width direction illustrating an evaporation deposition apparatus according to another embodiment of the present invention.
  • FIG. 2B is a cross-sectional view of a width direction illustrating an evaporation part of the evaporation deposition apparatus in FIG. 2A.
  • FIG. 2C is a cross-sectional view of a length direction illustrating the evaporation part of the evaporation deposition apparatus in FIG. 2A.
  • FIG. 3A is a cross-sectional view of a width direction illustrating an evaporation deposition apparatus according to another embodiment of the present invention.
  • FIG. 3B is a perspective view of a nozzle part of the evaporation deposition apparatus in FIG. 3A.
  • FIG. 3C is a cross-sectional view of a length direction illustrating an evaporation part of the evaporation deposition apparatus in FIG. 3A.
  • FIG. 4 is a top plan view of a linear evaporation deposition apparatus according to another embodiment of the present invention.
  • FIG. 5 is a cross-sectional view taken in a length direction of an evaporation deposition apparatus according to another embodiment of the present invention.
  • FIG. 6 is a cross-sectional view of an evaporation deposition apparatus according to another embodiment of the present invention.
  • FIG. 7 illustrates a test result using an evaporation deposition apparatus according to the present invention.
  • an inventor of the present invention discloses an evaporation deposition apparatus using a dielectric tube protruding to the outside of a vacuum container and an induction heating coil surrounding the dielectric tube.
  • a linear deposition apparatus a plurality of point evaporation sources must be mounted and an AC power supply is required for each of the point evaporation sources. Since these point evaporation sources may have their own characteristics, it is difficult to uniformly perform evaporation deposition.
  • An evaporation deposition apparatus includes a single evaporation crucible.
  • An induction heating coil may be disposed outside a vacuum container and may inductively heat the evaporation crucible with spatial uniformity.
  • Induction heating means is spatially spaced apart from the evaporation crucible and disposed outside the vacuum container.
  • the evaporation deposition apparatus provides a simple structure. Since the evaporation crucible does not have an electrical interconnection inside the vacuum container, it is easy to perform disassembly and assembly for refilling an organic material.
  • the evaporation crucible includes a plurality of nozzle parts that can be disassembled and assembled, some of the nozzle parts may be selectively replaced. Since a nozzle part of the evaporation crucible is disassembled, a problematic nozzle part may be selectively removed and may be replaced with a new nozzle part.
  • Temperatures depending on respective positions of the nozzle parts may be controlled by distance between the evaporation crucible and the induction heating coil and reflective coating of a dielectric window.
  • a thin film of uniform thickness may be deposited using a technique for controlling temperatures depending on respective positions of the nozzle parts and a technique for adjusting a position of a nozzle cap to adjust the injection amount of vapor generated from an organic powder.
  • thickness distribution of a thin film deposited in an injection direction of vapor evaporated at a nozzle of an evaporation source may be expressed as an n-order cosine function.
  • the order n may be expressed as a function of b/a (“b” being length of a semi-elliptical or parabolic nozzle to inject vapor and “a” being a diameter of an outlet of the nozzle).
  • b/a increases, an injection angle of the vapor is reduced to obtain a thin film thickness distribution with straightness.
  • Deposition nozzles with high straightness may be linearly arranged.
  • a linear evaporation deposition apparatus with high straightness when nozzle parts having a high ratio of b/a (“b” being length of a nozzle and “a” being a diameter of an outlet of the nozzle) are mounted, a linear evaporation deposition apparatus with high straightness may be easily implemented.
  • the linear evaporation deposition apparatus with high straightness may significantly reduce shadow effect that occurs due to thickness of a mask used when an organic material is deposited.
  • the linear evaporation deposition apparatus with high straightness may be used as a technique for manufacturing a high-definition OLED panel such as UHD TV.
  • FIG. 1A is a cutting perspective view of an evaporation deposition apparatus according to an embodiment of the present invention.
  • FIG. 1B is a cross-sectional view taken along a line I-I' in FIG. 1A.
  • FIG. 1C is a cross-sectional view taken along a line II-II' in FIG. 1A.
  • FIG. 1D is a top plan view of the evaporation deposition apparatus in FIG. 1A.
  • FIG. 1E is a perspective view of a nozzle part in FIG. 1A.
  • FIG. 1F is a cross-sectional view of the nozzle part in FIG. 1E.
  • an evaporation deposition apparatus 100 includes a vacuum container 110, an evaporation crucible 120, an induction heating coil 130, and a dielectric window 140.
  • the vacuum container 110 includes a slit 112 extending in a first direction (x-axis direction).
  • the evaporation crucible 120 is inserted into the slit 112 to be disposed inside the vacuum container 110, includes a storage space 123 to store a deposition material 10, is made of a conductive material, heats the deposition material 10 to generate vapor, injects the vapor through a plurality of nozzles parts 170 each connecting with the storage space 123, and extends in the first direction.
  • the induction heating coil 130 generates an induced electric field, inductively heats the evaporation crucible 120, extends in the first direction, and is disposed outside the vacuum container 110 to inductively heat the evaporation crucible 120.
  • the dielectric window 140 is coupled with a surrounding portion of the slit 112 of the vacuum container 110 to seal the vacuum container 110, is disposed between the induction heating coil 130 and the evaporation crucible 120, passes through the induced electric field generated by the induction heating coil 130, and extends in the first direction (x-axis direction).
  • the deposition material 10 may be an organic light-emitting material. Specifically, the deposition material 10 may be an organic light-emitting material such as ALQ3. The deposition material 10 may be heated to be vaporized or sublimated. The deposition material 10 may be vaporized to be injected in a direction of a substrate 162 through the nozzle part 170.
  • the substrate 162 may be an OLED-formed glass or plastic substrate.
  • the substrate 162 may be a quadrangular substrate.
  • the substrate 162 may be scanned relatively to the evaporation crucible 120, and an entire surface of the substrate 162 may be deposited with a deposition material.
  • the vacuum container 110 may be a rectangular parallelepiped chamber of a metal material.
  • the vacuum container 110 may include a body chamber 111b and a top plate 111a.
  • the evaporation crucible 120 may be disposed on the top plate 111a of the vacuum container 110.
  • the top plate 111a may be a metal material.
  • the vacuum container 110 may include a valve and an exhaust pump to keep a vacuum state.
  • the vacuum container 110 may include a substrate 162 on which a deposition material is deposited and a substrate holder 166 to hold the substrate 162.
  • the substrate holder 166 may include transfer means for transferring the substrate 162 in a specific direction (y-axis direction).
  • the mask 164 may be disposed between the substrate 162 and the evaporation crucible 120.
  • the mask 164 may be disposed adjacent to the substrate 162 to form a deposition pattern on the substrate 162.
  • the mask 164 may be transferred simultaneously to the substrate 162.
  • a disposition plane of the top plate 111a of the vacuum container 110 may be a plane defined by a second direction (y-axis direction) perpendicular to the first direction.
  • the substrate 162 may be vertically spaced apart from the disposition plane of the top plate 111a in a third direction (z-axis direction) to be disposed inside the vacuum container 110.
  • the top plate 111a of the vacuum container 110 may include the slit 112 extending in the first direction.
  • the slit 112 may have length between tens of centimeters and several meters.
  • the slit 112 may have width between several millimeters and tens of millimeters. Only one evaporation crucible may be inserted into the slit 112.
  • the slit 112 may include a projection 112a to lock the evaporation crucible 120.
  • the projection 112a may be in the form of steps having a plane lower than an upper surface of the top plate .
  • An O-ring groove may be formed on the upper surface of the top plate to keep a vacuum state.
  • the O-ring groove 113 may be disposed to cover the surrounding portion of the slit 112.
  • the dielectric window 140 may be aligned with the O-ring groove 113. Thus, the dielectric window 140 may seal the vacuum container 110.
  • the evaporation crucible 120 may be in the form of rectangular parallelepiped extending in the first direction (x-axis direction).
  • the evaporation crucible 120 may be inserted into the slit 112 to be aligned in the first direction.
  • An upper surface of the evaporation crucible 120 may be slightly lower than that of the top plate 111a.
  • the evaporation crucible 120 may be in the form of rectangular parallelepiped, and the plurality of nozzle parts 170 may be inserted into a lower surface of the evaporation crucible 120 to be disposed therein.
  • the evaporation crucible 120 may be made of a conductive material metal such as stainless steel, aluminum, and copper or a metal-alloy.
  • the evaporation crucible 120 may be inductively heated.
  • the induction heating coil 130 may extend in the first direction to generate an induced electric field in the first direction.
  • the evaporation crucible 120 may include the storage space 123, a body part 121 with the shape of a square container, a widthwise obstacle 127, and the plurality of nozzle parts 170.
  • the storage space 123 may extend in the first direction and store the deposition material 10.
  • the body part 121 may include nozzle coupling through-holes 121a arranged in the first direction and may be in the form of a square container surrounding the storage space 123.
  • the widthwise obstacle 127 may protrude from a side surface of the body part 121 in a second direction (y-axis direction) perpendicular to the first direction to be coupled with the projection 112a of the slit 112.
  • the plurality of nozzle parts 170 may include coupling screw threads 176a formed on the respective outer circumferential surfaces, may be inserted into the storage space 123 to be disposed therein, may connect with the storage space 123, and may be arranged in the first direction.
  • the storage space 123 may be a cavity with a shape of rectangular parallelepiped extending in the first direction.
  • the storage space 123 may be a space formed inside the body part 121.
  • the storage space 123 may store a deposition material.
  • nozzle parts to inject vapor in a third direction may be arranged in the first direction at regular intervals.
  • the body part 121 may be in the form of a rectangular parallelepiped extending in the first direction.
  • the body part 121 may include a body part top plate 122 disposed on its upper surface.
  • the body plate top plate 122 may be in the form of a square plate.
  • the body part top plate 122 may be welded with the body part 121 to be integrated in one body and to provide the storage space 123.
  • the body part top plate 122 may be heated by the induction heating coil and may allow the evaporation crucible 120 to be maintained at predetermined temperature by heat transfer.
  • the body part 121 may include a through-hole 125 penetrating in the second direction (or width direction) and a stopper 126 removably attached to the through-hole 125 to refill the storage space 123 with the deposition material.
  • the through-hole 125 is sealed via the stopper 126, and the stopper 126 may be detached to refill the deposition material.
  • the through-hole 125 may be in the form of a female screw, and the stopper 126 may be in the form of a male screw.
  • the widthwise obstacle 127 may protrude in a width direction (second direction or y-axis direction) of the slit 112 on an upper side surface of the body part 122.
  • the widthwise obstacle 127 may be disposed at the projection 111a formed at the slit 112.
  • an upper surface of the evaporation crucible 120 may be slightly lower than that of the top plate 122.
  • the dielectric window 140 may be disposed on an upper surface of the top plate 111a to stably maintain a vacuum state.
  • the nozzle part 170 may include a jet nozzle 171 disposed in the storage space 123 and having a through-hole formed in its center and a gasket portion 182 compressed by the jet nozzle 171 to seal the nozzle coupling through-hole 121a.
  • the gasket portion 182 may prevent leakage of the vapor and perform efficient heat transfer.
  • the gasket portion 182 may be in the form of a flat plate washer.
  • a material of the gasket portion 182 may be a metal material with superior heat conductivity such as copper.
  • the jet nozzle 171 may include an upper nozzle 172 having a first through-hole 174a with a constant internal diameter and provided as a cylindrical nozzle, a taper nozzle 175 having a second through-hole 175a with a gradually increasing internal diameter and continuously connected to the upper nozzle 172 to gradually increase in external and internal diameters, a lower nozzle 176 having a third through-hole 176a with a constant diameter, continuously connected to the taper nozzle 175, and provided as a cylindrical nozzle, and a nozzle flange 177 connected to the lower nozzle 176 and provided in the form of a washer.
  • the coupling screw thread 176a may be formed on an outer circumferential surface of the lower nozzle 176.
  • the vapor may be injected through the nozzle flange 177.
  • a diameter of the through-hole of the nozzle part 170 may gradually increase as processing in a direction of a nozzle outlet.
  • a particle distribution depending on evaporated particles (vapor) may be expressed as an n-order cosine function.
  • the particle distribution may be expressed as a function of length/diameter (b/a, “b” being total length of the second and third through-holes 174a and 175a and “a” being a diameter of an outlet of the third through-hole 176a).
  • a linear evaporation deposition apparatus with high straightness may significantly reduce shadow effect to be used as a technique for manufacturing a high-definition OLED panel such as UHD TV.
  • the taper nozzle 175 increases in the diameter of the second through-hole 175a as progressing in a direction of a nozzle outlet.
  • the second through-hole 175a may be semi-elliptical or parabolic.
  • An outer diameter of the taper nozzle may be substantially equal to that of a nozzle cover 178 or 179.
  • the nozzle part 171 may be inserted into the nozzle coupling through-hole 121a to be coupled therewith.
  • the lower nozzle 176 may serve to couple the nozzle part 171 with the body part 121.
  • the coupling screw thread 176a may be formed on the outer circumferential surface of the lower nozzle 176.
  • the coupling screw thread 176a may be screw-coupled with the nozzle coupling through-hole 121a.
  • the nozzle flange 177 may compress the gasket portion 182 to seal the storage space 123.
  • the nozzle flange 177 may be in the form of a washer connected to the lower nozzle 176 and compress the gasket portion 182 to seal the nozzle coupling through-hole 121a.
  • the nozzle flange 177 may be continuously connected to the through-hole of the jet nozzle 171 to inject the vapor.
  • the outer circumferential side surface of the nozzle flange 177 may be processed to have parallel planes 177a.
  • the parallel planes 177a may be used during disassembly and assembly using a tool such as spanner.
  • the upper nozzle 174 may include a guide upper nozzle 172 which guides the vapor and has a constant external diameter and a fixed upper nozzle 173 that is connected to the guide upper nozzle 172 and has a greater external diameter than the guide upper nozzle 172.
  • the fixed upper nozzle 173 may include a position adjustment screw thread 173a formed on an outer side surface.
  • the vapor may be provided to the first through-hole 174a of the upper nozzle 174 along an outer circumferential surface of the guide upper nozzle 172.
  • the nozzle cover 179 and 178 includes a cylindrical cover body part 179 and a position adjustment nut portion 178.
  • the cylindrical cover body part 179 are disposed to surround the upper nozzle 174, screw-coupled with the position adjustment screw thread 173a, and have a plurality of through-holes 179a along its side surface.
  • the nozzle covers 179a and 178 comprise a cylindrical cover body part 179 whose one end is open and the other end is closed and a position adjustment nut portion 178 inserted into an outer circumferential surface of the fixed upper nozzle to be screw-coupled with the position adjustment screw thread 173a.
  • a difference between an internal diameter of the nozzle cover 179 and an external diameter of the upper nozzle 172 is made between tens of micrometers and hundreds of micrometers to prevent organic powder from popping out through a nozzle.
  • An inflow rate of the vapor flowing into the first through-hole 174a of the upper nozzle 174 may vary depending on fixed positions of the nozzle cover 178 and 179.
  • the induction heating coil 130 may be disposed on the dielectric window 140 and extend in a length direction (x-axis direction) of the slit.
  • the induction heating coil 130 is disposed outside the vacuum container 110.
  • the induction heating coil 130 may inductively heat the evaporation crucible 130.
  • the induction heating coil 130 may include a first induction heating line 132 that is disposed on a disposition plane of the dielectric window 140 and extends in the first direction and a second induction heating coil 134 extending parallel to the first induction heating coil 132.
  • a direction of current of the first induction coil 132 and a direction of current of the second induction coil 134 may be opposite to each other.
  • the first induction heating line 132 and the second induction heating line 134 may be electrically connected to each other.
  • the induced electric field may pass through the dielectric window 140 to heat the evaporation crucible 120.
  • One end of the first induction heating line 132 and one end of the second induction heating line 134 may be connected to each other, and the other end of the first induction heating line 132 and the other end of the second induction heating line 134 may be connected to AC power supply 136.
  • a driving frequency of the AC power supply 136 may be between tens of kHz to several MHz.
  • the AC power supply 136 may adjust the magnitude of the AC power supply 136 by feeding back a signal of a temperature controller or a thin-film thickness monitor.
  • the dielectric window 140 may be in the form of a band extending in a length direction (first direction) of the slit 112.
  • the dielectric window 140 may have a thickness enough to maintain a pressure difference in a vacuum state.
  • the dielectric window 140 may cover the slit 112 to maintain the inside of the vacuum container 110 at the vacuum state.
  • the dielectric window 140 may be made of glass, quartz, ceramic or alumina.
  • the dielectric window 140 may include a reflective coating 142 to reflect infrared light at its lower surface.
  • the reflective coating 142 may re-reflect radiant heat of the evaporation crucible 120 to the evaporation crucible 120.
  • the reflective coating 142 may be disposed on the entire lower surface of the dielectric window 140 or a portion of a lower surface of the dielectric window 140 to locally control temperature.
  • the evaporation crucible 120 may have a structure where heat loss is greater at the edge than in the center. For example, when a reflection coating region is disposed at both edges of the evaporation crucible 120, the heat loss may be reduced at the edge. Thus, a spatial temperature difference may be reduced.
  • a heat insulating member 150 may be disposed between the widthwise obstacle 127 and the protrusion 112a of the vacuum container 110. Thus, the heat insulating member 150 may minimize heat transfer between the heated evaporation crucible 120 and the top plate 111a.
  • the heat insulating member 150 may extend in length direction of the slit 112.
  • the heat insulating member 150 may be a heat insulating member for high-temperature vacuum. More specifically, the heat insulating member 150 may made of a glass fiber.
  • the heat insulating member 150 may be disposed between the widthwise obstacle 127 and the vacuum container 110.
  • a distance “d” between adjacent nozzle parts may have a predetermined relationship with a distance “e” between a lower surface of the nozzle part and the substrate.
  • a ratio of d to e (d:e) may be 1:3 to 1:4. That is, the distance “d” between the lower surface of the nozzle part and the substrate may be about three to four times longer than the distance “d” between the adjacent nozzle parts.
  • FIG. 2A is a cross-sectional view of a width direction illustrating an evaporation deposition apparatus according to another embodiment of the present invention.
  • FIG. 2B is a cross-sectional view of a width direction illustrating an evaporation part of the evaporation deposition apparatus in FIG. 2A.
  • FIG. 2C is a cross-sectional view of a length direction illustrating the evaporation part of the evaporation deposition apparatus in FIG. 2A.
  • a linear evaporation deposition apparatus 200 includes a vacuum container 210, an evaporation crucible 220, an induction heating coil 230, and a dielectric window 240.
  • the vacuum container 210 has a slit 212 extending in a first direction.
  • the evaporation crucible 220 is inserted into the slit 212 to be disposed inside the vacuum container 210, includes a storage space 223 to store a deposition material 10, is made of a conductive material, heats the deposition material 10 to generate vapor, injects the vapor through a plurality of nozzle parts 270 each connecting with the storage space 223, and extends in the first direction.
  • the induction heating coil 230 establishes an induced electric field, inductively heats the evaporation crucible 220, extends in the first direction, and is disposed outside the vacuum container 210 to the inductively heat the evaporation crucible 220.
  • the dielectric window 240 is coupled with a surrounding portion of the slit 212 of the vacuum container 210 to seal the vacuum container 210, is disposed between the induction heating coil 230 and the evaporation crucible 220, transmits the induced electric field established by the induction heating coil 230, and extends in the first direction.
  • the evaporation crucible 220 injects vapor upwardly against a gravity direction to form a thin film on a substrate 162.
  • the vacuum container 210 may be a rectangular parallelepiped chamber of a metal material.
  • the vacuum container 210 may include a body chamber 211b and a bottom plate 211a.
  • the evaporation crucible 220 may be disposed at the bottom plate 211a of the vacuum container 210.
  • the bottom plate 211a may be a metal material.
  • the vacuum container 210 may include a valve and an exhaust pump to maintain a vacuum state.
  • the vacuum container 210 may include a substrate 162 on which a deposition material is deposited and a substrate holder 166 to hold the substrate 162.
  • the substrate holder 166 may include transfer means for transferring the substrate 162 in a specific direction (y-axis direction).
  • a mask 164 may be disposed between the substrate 162 and the evaporation crucible 220.
  • the mask 164 may be disposed adjacent to the substrate 162 to form a deposition pattern on the substrate 162.
  • the mask 164 may move simultaneously to the substrate 162.
  • a disposition plane of the bottom plate 211a of the vacuum container 210 may be a plane defined by the first direction (x-axis direction) and a second direction (y-axis direction) perpendicular to the first direction.
  • the substrate 162 may be perpendicularly spaced apart from the disposition plate of the substrate 111a in a third direction (z-axis direction) to be disposed inside the vacuum container 210.
  • the bottom plate 211a of the vacuum container 210 may have the slit 212 extending in the first direction. Length of the slit 212 may be between tens of centimeters and several meters. Width of the slit 212 may be between several millimeters and tens of millimeters. Only one evaporation crucible 220 may be inserted into the slit 212.
  • the slit 212 may include a projection 212a to lock the evaporation crucible 220.
  • the projection 212a may be in the form of steps having a plane higher than a lower surface of the bottom plate 211a.
  • An O-ring groove may be formed on the lower surface of the bottom plate 211a to maintain a vacuum state.
  • the O-ring groove 213 may be disposed to cover a surrounding portion of the slit 212.
  • the dielectric window 240 may be aligned with the O-ring groove 213. Thus, the dielectric window 240 may seal the vacuum container 210.
  • the evaporation crucible 220 may be in the form of a rectangular parallelepiped extending in the first direction (x-axis direction).
  • the evaporation crucible 220 may be inserted into the slit 212 to be aligned in the first direction.
  • a lower surface of the evaporation crucible 220 may be slightly higher than an upper surface of the bottom plate 211a.
  • the evaporation crucible 220 may be in the form of a rectangular parallelepiped, and a plurality of nozzle parts 270 may be inserted into an upper surface of the evaporation crucible 220 to be disposed thereat.
  • the evaporation crucible 220 may be made of a conductive metal such as stainless steel, aluminum, and copper or a metal-alloy.
  • the evaporation crucible 220 may be inductively heated. An induced electric field may be established in the first direction, and the induction heating coil 230 may extend in the first direction.
  • the evaporation crucible 220 may include a storage space 223, a body part 221, a widthwise obstacle 227, and a plurality of nozzle parts 270.
  • the storage space 223 may extend in the first direction (x-axis direction) and store the deposition material 10.
  • the body part 221 may include nozzle coupling through-holes 221a arranged in the first direction and may be in the form of a square container surrounding the storage space 223.
  • the widthwise obstacle 227 may protrude from a lower side surface of the body part 221 in a second direction perpendicular to the first direction to be coupled with the projection 212a of the slit 212.
  • the nozzle parts 270 may include coupling screw threads 276a formed on upper portions of their respective outer circumferential surfaces, are inserted into the nozzle coupling through-holes 221a, respectively, connect with the storage space 223 in a third direction (z-axis direction) perpendicular to the first direction and the second direction, and are arranged in the first direction.
  • the coupling screw thread 276a may be screw-coupled with the nozzle coupling through-hole 221a.
  • the nozzle parts may include coupling screw threads 276a formed on their respective outer circumferential surfaces, may be inserted into the storage space 223 to be disposed therein, may connect with the storage space 223, and may be arranged in the first direction.
  • the storage space 223 may be a cavity having a form of a rectangular parallelepiped extending in the first direction.
  • the storage space 223 may be a space defined inside the body part 221.
  • the storage space 223 may store a deposition material.
  • the nozzle parts to inject vapor in the third direction may be arranged at regular intervals in the first direction.
  • the body part 221 may be in the form of a rectangular parallelepiped extending in the first direction.
  • the body part 221 may include a through-hole 225 penetrating in the second direction (or width direction) and a stopper 226 removably attached to the through-hole 225 to refill the storage space 223 with the deposition material.
  • the through-hole 225 is sealed via the stopper 226, and the stopper 126 may be detached to refill the deposition material.
  • the through-hole 225 may be in the form of a female screw, and the stopper 126 may be in the form of a male screw.
  • the widthwise obstacle 227 may protrude in a width direction (second direction or y-axis direction) of the slit 212 on an upper side surface of the body part 221.
  • the widthwise obstacle 227 may be disposed at the projection 212a formed at the slit 212.
  • a lower surface of the evaporation crucible 220 may be slightly higher than that of the top plate 211a.
  • the dielectric window 240 may be disposed on a lower surface of the top plate 211a to stably maintain a vacuum state.
  • the nozzle part 270 may include a jet nozzle 271 disposed in the storage space 223 and having a through-hole formed in its center and a gasket portion 182 compressed by the jet nozzle 271 to seal the nozzle coupling through-hole 221a.
  • the gasket portion 282 may prevent leakage of the vapor and perform efficient heat transfer.
  • the gasket portion 282 may be in the form of a flat plate washer.
  • a material of the gasket portion 282 may be a metal material with superior heat conductivity such as copper.
  • the jet nozzle 271 may include a cylindrical lower nozzle 274 having a first through-hole 274a with a constant internal diameter, a taper nozzle 275 having a second through-hole 275a with a gradually increasing internal diameter and continuously connected to the lower nozzle 274 to gradually increase in external and internal diameters, a cylindrical upper nozzle 276 having a third through-hole 276a with a constant diameter and continuously connected to the taper nozzle 275, and a nozzle flange 277 connected to the upper nozzle 276 and provided in the form of a washer.
  • the coupling screw thread 276a may be formed on an outer circumferential surface of the upper nozzle 276. The vapor may be injected through the nozzle flange 277.
  • the taper nozzle 275 increases in the diameter of the second through-hole 275a as progressing in a direction of a nozzle outlet.
  • the second through-hole 275a may be semi-elliptical or parabolic.
  • An external diameter of the taper nozzle 275 may be substantially equal to that of a nozzle cover 279.
  • the nozzle part 271 may be inserted into the nozzle coupling through-hole 221a to be coupled therewith.
  • the upper nozzle 276 may serve to couple the nozzle part 271 with the body part 221.
  • the coupling screw thread 276a may be formed on the outer circumferential surface of the upper nozzle 276.
  • the coupling screw thread 276a may be screw-coupled with the nozzle coupling through-hole 221a.
  • the nozzle flange 277 may compress the gasket portion 282 to seal the storage space 223.
  • the nozzle flange 277 may be in the form of a washer connected to the upper nozzle 276 and compress the gasket portion 282 to seal the nozzle coupling through-hole 221a.
  • the nozzle flange 277 may be continuously connected to the through-hole of the jet nozzle 271 to inject the vapor.
  • the outer circumferential side surface of the nozzle flange 277 may be processed to have parallel planes 177a. The parallel planes may be used during disassembly and assembly using a tool such as spanner.
  • the lower nozzle 274 may include a guide lower nozzle 272 which guides the vapor and has a constant external diameter and a fixed lower nozzle 273 that is connected to the guide lower nozzle 272 and has a greater external diameter than the guide lower nozzle 272.
  • the fixed lower nozzle 273 may include a position adjustment screw thread 273a formed on an outer side surface.
  • the vapor may be provided to the first through-hole 274a of the lower nozzle 274 along an outer circumferential surface of the guide lower nozzle 272.
  • the nozzle cover 279 and 278 comprises a cylindrical cover body part 279 and a position adjustment nut portion 278.
  • the cylindrical cover body part 279 is disposed to surround the lower nozzle 274, is screw-coupled with the position adjustment screw thread 273a, and has a plurality of through-holes 279a along its side surface.
  • the nozzle cover 279 and 278 comprises a cylindrical cover body part 279 whose one end is open and the other end is closed and a position adjustment nut portion 278 inserted into an outer circumferential surface of the fixed lower nozzle 273 to be screw-coupled with the position adjustment screw thread 273a.
  • a difference between an internal diameter of the nozzle cover 279 and an external diameter of the upper nozzle 272 is made between tens of micrometers and hundreds of micrometers to prevent organic powder from popping out through a nozzle.
  • An inflow rate of the vapor flowing into the first through-hole 274a of the lower nozzle 274 may vary depending on fixed position of the nozzle cover 278 and 279.
  • the induction heating coil 230 may be disposed on the dielectric window 240 and extend in a length direction (x-axis direction) of the slit.
  • the induction heating coil 230 is disposed outside the vacuum container 210.
  • the induction heating coil 230 may inductively heat the evaporation crucible 230.
  • the induction heating coil 230 may include a first induction heating line 232 that is disposed on a disposition plane of the dielectric window 240 and extends in the first direction and a second induction heating coil 234 extending parallel to the first induction heating coil 232.
  • a direction of current of the first induction coil 232 and a direction of current of the second induction coil 234 may be opposite to each other.
  • the first induction heating line 232 and the second induction heating line 234 may be electrically connected to each other.
  • the induced electric field may pass through the dielectric window 240 to heat the evaporation crucible 220.
  • One end of the first induction heating line 232 and one end of the second induction heating line 234 may be connected to each other, and the other end of the first induction heating line 232 and the other end of the second induction heating line 234 may be connected to AC power supply 136.
  • a driving frequency of the AC power supply 136 may be between tens of kHz to several MHz.
  • the AC power supply 136 may adjust the magnitude of the AC power supply 136 by feeding back a signal of a temperature controller or a thin-film thickness monitor.
  • the dielectric window 240 may be in the form of a band extending in a length direction (first direction) of the slit 112.
  • the dielectric window 240 may have a thickness enough to maintain a pressure difference in a vacuum state.
  • the dielectric window 240 may cover the slit 112 to maintain the inside of the vacuum container 210 at the vacuum state.
  • the dielectric window 240 may be made of glass, quartz, ceramic or alumina.
  • the dielectric window 140 may include a reflective coating 242 to reflect infrared light at its upper surface.
  • the reflective coating 242 may re-reflect radiant heat of the evaporation crucible 220 to the evaporation crucible 220.
  • the reflective coating 242 may be performed on the entire lower surface of the dielectric window 240 or a portion of a lower surface of the dielectric window 240 to locally control temperature.
  • the evaporation crucible 220 may have a structure where heat loss is greater at the edge than in the center. For example, when a reflectively coating region is disposed at both edges of the evaporation crucible 220, the heat loss may be reduced at the edge. Thus, a spatial temperature difference may be reduced.
  • a heat insulating member 250 may be disposed between the widthwise obstacle 227 and the protrusion 212a of the vacuum container 210. Thus, the heat insulating member 250 may minimize heat transfer between the heated evaporation crucible 220 and the bottom plate 211a.
  • the heat insulating member 250 may extend in length direction of the slit 212.
  • the heat insulating member 250 may be a heat insulating member for high-temperature vacuum. More specifically, the heat insulating member 250 may made of a glass fiber.
  • the heat insulating member 250 may be disposed between the widthwise obstacle 227 and the vacuum container 210.
  • An auxiliary heat insulating member 251 may be disposed between a lower surface of the evaporation crucible 220 and an upper surface of the dielectric window 240 to perform a heat insulating function.
  • FIG. 3A is a cross-sectional view of a width direction illustrating an evaporation deposition apparatus according to another embodiment of the present invention.
  • FIG. 3B is a perspective view of a nozzle part of the evaporation deposition apparatus in FIG. 3A.
  • FIG. 3C is a cross-sectional view of a length direction illustrating an evaporation part of the evaporation deposition apparatus in FIG. 3A.
  • an evaporation deposition apparatus 400 includes a vacuum container 110, an evaporation crucible 420, an induction heating coil 130, and a dielectric window 140.
  • the vacuum container 110 has a slit 112 extending in a first direction (x-axis direction).
  • the evaporation crucible 420 is inserted into the slit 112 to be disposed inside the vacuum container 110, includes a storage space 123 to store a deposition material 10, is made of a conductive material, heats the deposition material 10 to generate vapor, injects the vapor through a plurality of nozzle parts 470 each connecting with the storage space 123, and extends in the first direction.
  • the induction heating coil 130 establishes an induced electric field, inductively heats the evaporation crucible 420, extends in the first direction, and is disposed outside the vacuum container 110 to the inductively heat the evaporation crucible 420.
  • the dielectric window 140 is coupled with a surrounding portion of the slit 112 of the vacuum container 110 to seal the vacuum container 110, is disposed between the induction heating coil 130 and the evaporation crucible 420, transmits the induced electric field established by the induction heating coil 130, and extends in the first direction (x-axis direction).
  • the evaporation crucible 420 injects vapor downwardly in a gravity direction to form a thin film on a substrate.
  • the evaporation crucible 420 may be in the form of rectangular parallelepiped extending in the first direction (x-axis direction). The evaporation crucible 420 may be inserted into the slit 112 to be aligned in the first direction. An upper surface of the evaporation crucible 420 may be slightly lower than that of the top plate 111a.
  • the evaporation crucible 420 may be in the form of rectangular parallelepiped, and the plurality of nozzle parts 470 may be inserted into a lower surface of the evaporation crucible 420 to be disposed therein.
  • the evaporation crucible 420 may be made of a conductive material metal such as stainless steel, aluminum, and copper or a metal-alloy.
  • the evaporation crucible 420 may be inductively heated.
  • the induction heating coil 130 may extend in the first direction.
  • the evaporation crucible 420 may include the storage space 123, a body part 121 with the shape of a square container, a widthwise obstacle 127, and the plurality of nozzle parts 470.
  • the storage space 123 may extend in the first direction and store the deposition material 10.
  • the body part 121 may include nozzle coupling through-holes 121a arranged in the first direction and may be in the form of a square container surrounding the storage space 123.
  • the widthwise obstacle 127 may protrude from a side surface of the body part 121 in a second direction (y-axis direction) perpendicular to the first direction to be coupled with the projection 112a of the slit 112.
  • the plurality of nozzle parts 470 may include coupling screw threads 476a formed on their respective outer circumferential surfaces, may be disposed toward the inside of the vacuum container 110, may be inserted into the nozzle coupling through-holes, respectively, may connect with the storage space 123, and may be arranged in the first direction.
  • the coupling screw thread 476a may be screw-coupled with the nozzle coupling through-hole 121a.
  • the plurality of nozzles 470 may include coupling screw threads 476a formed on their respective outer circumferential surfaces, may be inserted into the storage space 123 to be disposed therein, may connect with the storage space 123, and may be arranged in the first direction.
  • the storage space 123 may be a cavity with a shape of rectangular parallelepiped extending in the first direction.
  • the storage space 123 may be a space formed inside the body part 121.
  • the storage space 123 may store a deposition material.
  • nozzle parts to inject vapor in a third direction may be arranged in the first direction at regular intervals.
  • the body part 121 may be in the form of a rectangular parallelepiped extending in the first direction.
  • the body part 121 may include a body part top plate 122 disposed on its upper surface.
  • the body plate top plate 122 may be in the form of a square plate.
  • the body part top plate 122 may be welded with the body part 121 to be integrated in one body.
  • the body part 122 may be in the form of a square plate and may provide the storage space 123.
  • the body part top plate 122 may be heated by the induction heating coil and may allow the evaporation crucible 420 to be maintained at predetermined temperature by heat transfer and radiation.
  • the body part 121 may include a through-hole 125 penetrating in the second direction (or width direction) and a stopper 126 removably attached to the through-hole 125 to refill the storage space 123 with the deposition material.
  • the through-hole 125 is sealed via the stopper 126, and the stopper 126 may be detached to refill the deposition material.
  • the through-hole 125 may be in the form of a female screw, and the stopper 126 may be in the form of a male screw.
  • the widthwise obstacle 127 may project in a width direction (second direction or y-axis direction) of the slit 112 on an upper side surface of the body part 122.
  • the widthwise obstacle 127 may be disposed at the projection 111a formed at the slit 112.
  • an upper surface of the evaporation crucible 420 may be slightly lower than that of the top plate 122.
  • the dielectric window 140 may be disposed on an upper surface of the top plate 111a to stably maintain a vacuum state.
  • the nozzle part 470 may include a jet nozzle 474, a nozzle flange 477, and a gasket portion 482.
  • the jet nozzle 474 may be disposed in the storage space 123 and may have a through-hole 474a formed in its center.
  • the nozzle flange 477 may include a plurality of auxiliary through-holes 477a that are disposed outside the storage space 123, connect with the through-hole 474a, and extend in a radial direction in a spherical coordinate system.
  • the nozzle flange 477 may be in the form of a truncated circular cone.
  • the gasket portion 482 may be disposed between the nozzle flange 477 and the nozzle coupling through-hole 121a to seal the storage space 123.
  • the jet nozzle 474 and the nozzle flange 477 may be integrated in one body.
  • the gasket portion 482 may prevent leakage of the vapor and perform efficient heat transfer.
  • the gasket portion 482 may be in the form of a flat plate washer.
  • a material of the gasket portion 482 may be a metal material with superior heat conductivity such as copper.
  • the jet nozzle 474 may include a guide jet nozzle 472 that guides the deposition material 10 and has a constant external diameter and a fixed jet nozzle 473 that is connected to the guide jet nozzle 472 and has a greater external diameter than the guide jet nozzle 472.
  • the coupling screw thread 476a may be formed on a lower side surface of the fixed jet nozzle 473.
  • the coupling screw thread 476a may be screw-coupled with the coupling through-hole 121a.
  • the nozzle flange 477 may compress the gasket portion 482 to seal the storage space 123.
  • the nozzle flange 477 may be in the form of a truncated circular cone connected to the fixed jet nozzle 473. An upper surface of the circular cone may compress the gasket portion 482. A plurality of auxiliary through-holes 477a may be disposed on an outer circumferential surface of the circular cone to connect with the through-hole 477a. The auxiliary through-holes 477a may inject vapor onto a large area.
  • the outer side surface of the nozzle flange 177 may be processed to have parallel planes. The parallel planes may be used during disassembly and assembly using a tool such as spanner.
  • the nozzle covers 178 and 179 may include a cover body part 179 and a position adjustment nut part 178.
  • the cover body part 179 may be disposed to surround the guide jet nozzle 472, may be screw-coupled with the position adjustment screw thread 473a, and may have a plurality of through-holes 179a along its side surface.
  • One end of the cover body part 179 may be open, and the other end thereof may be in the form of a closed cylinder.
  • the position adjustment nut part 178 may be inserted into an outer circumferential surface of the fixed jet nozzle 473 to be screw-coupled with the position adjustment screw thread 473a.
  • the induction heating coil 130 may be disposed on the dielectric window 140 and extend in a length direction (x-axis direction) of the slit.
  • the induction heating coil 130 is disposed outside the vacuum container 110.
  • the induction heating coil 130 may inductively heat the evaporation crucible 130.
  • the induction heating coil 130 may include a first induction heating line 132 that is disposed on a disposition plane of the dielectric window 140 and extends in the first direction and a second induction heating coil 134 extending parallel to the first induction heating coil 132.
  • a direction of current of the first induction coil 132 and a direction of current of the second induction coil 134 may be opposite to each other.
  • the first induction heating line 132 and the second induction heating line 134 may be electrically connected to each other.
  • the induced electric field may pass through the dielectric window 140 to heat the evaporation crucible 420.
  • One end of the first induction heating line 132 and one end of the second induction heating line 134 may be connected to each other, and the other end of the first induction heating line 132 and the other end of the second induction heating line 134 may be connected to an AC power supply 136.
  • a driving frequency of the AC power supply 136 may be between tens of KHz and several MHz.
  • the dielectric window 140 may be in the form of a band extending in a length direction (first direction) of the slit 112.
  • the dielectric window 140 may have a thickness enough to maintain a pressure difference in a vacuum state.
  • the dielectric window 140 may cover the slit 112 to maintain the inside of the vacuum container 110 at the vacuum state.
  • the dielectric window 140 may be made of glass, quartz, ceramic or alumina.
  • the dielectric window 140 may include a reflective coating 142 to reflect infrared light onto its lower surface.
  • the reflective coating 142 may re-reflect radiant heat of the evaporation crucible 120 to the evaporation crucible 120.
  • the reflective coating 142 may be performed on the entire lower surface of the dielectric window 140 or a portion of a lower surface of the dielectric window 140 to locally control temperature.
  • the evaporation crucible 120 may have a structure where heat loss is greater at the edge than in the center. For example, when a reflectively coated region is disposed at both edges of the evaporation crucible 120, the heat loss may be reduced at the edge. Thus, a spatial temperature difference may be reduced.
  • a heat insulating member 150 may be disposed between the widthwise obstacle 127 and a protrusion 112a of the vacuum container 110. Thus, the heat insulating member 150 may minimize heat transfer between the heated evaporation crucible 120 and the top plate 111a.
  • the heat insulating member 150 may extend in length direction of the slit 112.
  • the heat insulating member 150 may be a heat insulating member for high-temperature vacuum. More specifically, the heat insulating member 150 may made of a glass fiber.
  • the heat insulating member 150 may be disposed between the widthwise obstacle 127 and the vacuum container 110.
  • FIG. 4 is a top plan view of a linear evaporation deposition apparatus according to another embodiment of the present invention.
  • an evaporation deposition apparatus 100a includes a vacuum container 110, an evaporation crucible 120, induction heating coils 130a, 130b, and 130c, and a dielectric window 140.
  • the vacuum container 110 has a slit 112 extending in a first direction (x-axis direction).
  • the evaporation crucible 120 is inserted into the slit 112 to be disposed inside the vacuum container 110, includes a storage space 123 to store a deposition material 10, is made of a conductive material, heats the deposition material 10 to generate vapor, injects the vapor through a plurality of nozzle parts 470 each connecting with the storage space 123, and extends in the first direction.
  • the induction heating coils 130a, 130b, and 130c establish an induced electric field, inductively heat the evaporation crucible 120, extend in the first direction, and are disposed outside the vacuum container 110 to the inductively heat the evaporation crucible 420.
  • the dielectric window 140 is coupled with a surrounding portion of the slit 112 of the vacuum container 110 to seal the vacuum container 110, is disposed between the induction heating coils 130a, 130b, and 130c and the evaporation crucible 120, transmits the induced electric field established by the induction heating coils 130a, 130b, and 130c, and extend in the first direction (x-axis direction).
  • the evaporation deposition apparatus 100a may be a downward evaporation deposition apparatus.
  • the induction heating coils 130a, 130b, and 130c may include a first induction heating coil 130a extending from the center portion of a top plate of the vacuum container 110 in the first direction and second and third induction heating coils 130b and 130c extending from both edge portions of the vacuum container 110 in the first direction.
  • the first induction heating coil 130a may be connected to a first AC power supply 136a
  • the second induction heating coil 130b may be connected to a second AC power supply 136b
  • the third induction heating coil 130c may be connected to a third AC power supply 136c.
  • the first, second, and third AC power supplies 136a, 136b, and 136c may be set to be different from each other to maintain deposition uniformity.
  • the first induction heating coil 130a may inductively heat the center portion of the evaporation crucible 120
  • the second induction heating coil 130b may inductively heat a right portion of the evaporation crucible 120.
  • the third induction heating coil 130c may inductively heat a left portion of the evaporation crucible 120.
  • temperature of the evaporation crucible 120 may be adjusted depending on positions or regions.
  • the first to third induction heating coils 130a, 130b, and 130c may have two wire structures in which current flows in opposite directions.
  • FIG. 5 is a cross-sectional view taken in a length direction of an evaporation deposition apparatus according to another embodiment of the present invention.
  • an evaporation deposition apparatus 100b includes a vacuum container 110, an evaporation crucible 120, an induction heating coil 131, and a dielectric window 140.
  • the vacuum container 110 has a slit 112 extending in a first direction (x-axis direction).
  • the evaporation crucible 120 is inserted into the slit 112 to be disposed inside the vacuum container 110, includes a storage space 123 to store a deposition material 10, is made of a conductive material, heats the deposition material 10 to generate vapor, injects the vapor through a plurality of nozzle parts 170 each connecting with the storage space 123, and extends in the first direction.
  • the induction heating coil 131 establishes an induced electric field, inductively heats the evaporation crucible 120, extends in the first direction, and are disposed outside the vacuum container 110 to the inductively heat the evaporation crucible 120.
  • the dielectric window 140 is coupled with a surrounding portion of the slit 112 of the vacuum container 110 to seal the vacuum container 110, is disposed between the induction heating coil 131 and the evaporation crucible 120, transmits the induced electric field established by the induction heating coil 131, and extends in the first direction (x-axis direction).
  • the evaporation deposition apparatus 100b may be a downward evaporation deposition apparatus.
  • the induction heating coil 131 may be bent in a direction (z-axis direction) perpendicular to a disposition plane of the dielectric window 140 to extend in the first direction.
  • a vertical direction between the induction heating coil 131 and the evaporation crucible 120 may vary depending on the position of the evaporation crucible 120.
  • the induction heating coil 131 may be divided into three regions and a distance between the induction heating coil 131 and an upper surface of the evaporation crucible 120 in a center region may be y1.
  • a distance between the induction heating coil 131 and an upper surface of the evaporation crucible 120 in a left/right region may be y2.
  • a distance between the induction heating coil 131 and the evaporation crucible 120 causes the heating degree of the evaporation crucible 120 to be different.
  • a uniform temperature distribution may be achieved from temperatures that are different depending on positions.
  • a reflective coating 142 to reflect infrared light may be locally formed on an upper surface of the dielectric window 140 to achieve uniformity of the temperatures that are different depending on positions of the evaporation crucible 120.
  • FIG. 6 is a cross-sectional view of an evaporation deposition apparatus according to another embodiment of the present invention.
  • an evaporation deposition apparatus 100c includes a vacuum container 110, an evaporation crucible 120, an induction heating coil 130, and a dielectric window 140.
  • the vacuum container 110 has a slit 112 extending in a first direction (x-axis direction).
  • the evaporation crucible 120 is inserted into the slit 112 to be disposed inside the vacuum container 110, includes a storage space 123 to store a deposition material 10, is made of a conductive material, heats the deposition material 10 to generate vapor, injects the vapor through a plurality of nozzle parts 170 each connecting with the storage space 123, and extends in the first direction.
  • the induction heating coil 130 establishes an induced electric field, inductively heats the evaporation crucible 120, extends in the first direction, and are disposed outside the vacuum container 110 to the inductively heat the evaporation crucible 120.
  • the dielectric window 140 is coupled with a surrounding portion of the slit 112 of the vacuum container 110 to seal the vacuum container 110, is disposed between the induction heating coil 130 and the evaporation crucible 120, transmits the induced electric field established by the induction heating coil 130, and extends in the first direction (x-axis direction).
  • the evaporation deposition apparatus 100b may be a downward evaporation deposition apparatus.
  • a vertical distance between the plurality of nozzle parts 170 and a substrate 162 may vary depending on the first direction.
  • the nozzle part 170 may include a jet nozzle 171 that is disposed in the storage space 123 and has a through-hole formed in its center and a gasket portion 182 that is compressed by the jet nozzle 171 to seal a nozzle coupling through-hole. As thickness of the gasket portion 182 is adjusted, height of a lower surface of the nozzle part 170 may vary depending on a position.
  • height of a lower surface of a body part may vary depending on the position.
  • FIG. 7 illustrates a test result using an evaporation deposition apparatus according to the present invention.
  • a distance between a substrate and a nozzle outlet was fixed to 10 cm.
  • a hollow circle denotes a particle distribution of a nozzle part (radial nozzle), which shows a result when an angle “d” between a through-hole of a jet nozzle and an auxiliary through-hole of a nozzle flange is 60 degrees.
  • the particle distribution is wider than the square of cosine.
  • a hollow triangle, a hollow quadrangle, and a solid circle show a test result of a nozzle part (linear nozzle) in Fig. 1.
  • a ratio of length “b” of the jet nozzle and a diameter “a” of the jet nozzle (b/a) may be expressed as a function.
  • straightness increases.
  • downward and upward linear evaporation deposition apparatuses using induction heating include a technique to prevent nozzle blocking and increase of substrate temperature caused by high-frequency induction heating, a technique using a nozzle cover to prevent organic powders from getting out of an evaporation source, a technique to adjust the injection amount of vapor generated from organic powders by adjusting a position of the nozzle cover, and a linear deposition technique to reduce an injection angle of evaporated vapor using a semi-elliptical or parabolic nozzle.
  • use efficiency of organic materials may be improved, substrate and chamber contamination caused by organic powders or the like may be prevented, and a thin film may be uniformly deposited on a large-area substrate.
  • high-definition OLED panels may be manufactured.
  • the induction heating linear evaporation deposition apparatus may conveniently perform disassembly and assembly for refilling and cleaning with a simple structure to easily manage a process and reduce process costs.

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PCT/KR2015/002324 2015-01-30 2015-03-11 Inductive heating linear evaporation deposition apparatus WO2016122046A1 (en)

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DE102021006249A1 (de) * 2021-12-17 2023-06-22 Singulus Technologies Aktiengesellschaft Beschichtungsquelle, Beschichtungsanlage und Verfahren zur Beschichtung von Substraten

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