WO2016078229A1 - 液晶显示像素结构及其制作方法 - Google Patents

液晶显示像素结构及其制作方法 Download PDF

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WO2016078229A1
WO2016078229A1 PCT/CN2015/072366 CN2015072366W WO2016078229A1 WO 2016078229 A1 WO2016078229 A1 WO 2016078229A1 CN 2015072366 W CN2015072366 W CN 2015072366W WO 2016078229 A1 WO2016078229 A1 WO 2016078229A1
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pixel
liquid crystal
crystal display
passivation layer
different
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PCT/CN2015/072366
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English (en)
French (fr)
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赵锋
邱钟毅
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深圳市华星光电技术有限公司
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Priority to US14/423,426 priority Critical patent/US9632368B2/en
Publication of WO2016078229A1 publication Critical patent/WO2016078229A1/zh

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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G—PHYSICS
    • G02—OPTICS
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    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
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    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/133345—Insulating layers
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    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
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    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
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    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
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    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
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    • G—PHYSICS
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    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1343—Electrodes
    • G02F1/13439—Electrodes characterised by their electrical, optical, physical properties; materials therefor; method of making
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/1368—Active matrix addressed cells in which the switching element is a three-electrode device
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/133397—Constructional arrangements; Manufacturing methods for suppressing after-image or image-sticking
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G02F1/13378—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation
    • G02F1/133792—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation by etching
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/136286—Wiring, e.g. gate line, drain line
    • G02F1/136295—Materials; Compositions; Manufacture processes
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2201/00—Constructional arrangements not provided for in groups G02F1/00 - G02F7/00
    • G02F2201/12—Constructional arrangements not provided for in groups G02F1/00 - G02F7/00 electrode
    • G02F2201/121—Constructional arrangements not provided for in groups G02F1/00 - G02F7/00 electrode common or background
    • G—PHYSICS
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    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
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    • G02F2201/00—Constructional arrangements not provided for in groups G02F1/00 - G02F7/00
    • G02F2201/40—Arrangements for improving the aperture ratio

Definitions

  • the present invention relates to the field of display technologies, and in particular, to a liquid crystal display pixel structure and a method of fabricating the same.
  • LCD Liquid crystal display
  • PDAs personal digital assistants
  • digital cameras computer screens or laptop screens, etc.
  • liquid crystal displays which include a casing, a liquid crystal display panel disposed in the casing, and a backlight module disposed in the casing.
  • the liquid crystal display panel is the main component of the liquid crystal display, but the liquid crystal display panel itself does not emit light, and the light source provided by the backlight module needs to be used to display the image normally.
  • a liquid crystal display panel is formed by laminating two glass substrates, and liquid crystal is poured between two glass substrates, and pixel electrodes and a common electrode are respectively disposed on opposite sides of the two glass substrates, and liquid crystal molecules are controlled by energization or not. Change the direction and refract the light from the backlight module to produce a picture.
  • the existing LCD In the existing LCD, a serious color washout phenomenon occurs at a large viewing angle, although the prior art has improved the degree of color shift at a large viewing angle of the LCD by using a multi-domain display pixel design. However, the color shift phenomenon is still serious, and this situation is more obvious in a Vertical Alignment (VA) type LCD. Moreover, the existing pixel design for improving the color shift at a large viewing angle needs to set the pixel as the main (Sub) region and the sub (Sub) region, and control the Main region and the Sub region through different Thin Film Transistors (TFTs), respectively.
  • TFTs Thin Film Transistors
  • TFT means more complicated control circuits and a reduction in pixel aperture ratio.
  • the conventional liquid crystal display pixel structure includes a lower substrate 100 , a passivation layer 200 covering the upper surface of the lower substrate 100 , a pixel electrode 300 disposed on the passivation layer 200 , and an upper substrate 400 . And a common electrode 500 covering the lower surface of the upper substrate 400, each pixel being disposed in four domains.
  • the pixel electrode 300 adopts a strip (space/space) arranged at equal intervals like a grating.
  • the structure needs to be patterned by a yellow light process; the passivation layer 200 is directly deposited on the lower substrate 100, and other areas except the Via hole need not be patterned by a yellow light process; that is, blunt
  • the layer 200 is substantially flat, and the pixel electrode 300 has a stripe pattern.
  • FIG. 4 and FIG. 5 in the liquid crystal display pixel structure, at the same driving voltage, there is only one rotation behavior of the liquid crystal in each pixel, so that the liquid crystal deflection angle ⁇ is the same, although each pixel is set to a four-domain pair. The color shift under a large viewing angle has been improved, but the effect is not good and the color shift is still serious.
  • An object of the present invention is to provide a liquid crystal display pixel structure capable of remarkably improving a color shift phenomenon at a large viewing angle, and which is simple in driving control circuit and high in pixel aperture ratio.
  • the object of the present invention is to provide a method for fabricating a liquid crystal display pixel structure, which has low requirements on a yellow light device and a process technology, and the liquid crystal display pixel structure obtained by the method has a significant color shift phenomenon under a large viewing angle. improve.
  • the present invention provides a liquid crystal display pixel structure, including: a lower substrate, a passivation layer disposed on an upper surface of the lower substrate, a pixel electrode disposed on the passivation layer, an upper substrate, and a lower substrate a common electrode of the surface; each pixel is provided with a plurality of domains; in one pixel, the passivation layer includes at least two groove structures of different depths, and the pixel electrode continuously covers the trench structure continuously without interruption The trench structure of different depths divides one pixel into different regions, so that liquid crystals of different regions in one pixel generate different deflection angles under the same driving voltage.
  • the trench structure includes a recess and a protrusion adjacent to the recess, the recess having a depth less than or equal to a thickness of the passivation layer.
  • the depth value of the recessed portion of the trench structure is not fixed, and is optimally adjusted according to the thickness and design requirements of the passivation layer;
  • the area ratio of different regions in the one pixel is not fixed, and the change and adjustment are performed according to design requirements;
  • the width value of the depressed portion and the width value of the adjacent convex portion are not fixed, and are changed and adjusted according to design requirements.
  • the trench structures of different depths divide one pixel into different regions along the diagonal direction of each domain.
  • the trench structures of different depths divide one pixel into different regions in the horizontal and vertical directions.
  • the trench structures of different depths divide one pixel into different regions along its oblique direction.
  • the pixel electrode is an ITO electrode
  • the common electrode is an ITO electrode
  • the invention also provides a method for fabricating a liquid crystal display pixel structure, comprising the following steps:
  • Step 1 providing a substrate, depositing a passivation layer on the lower substrate;
  • Step 2 etching the passivation layer by a yellow light process
  • the passivation layer is etched into at least two different depth trench structures
  • the trench structures of different depths divide one pixel into different regions
  • Step 3 depositing a pixel electrode on the passivation layer having a trench structure of at least two different depths, so that the pixel electrode continuously covers the trench structure without interruption;
  • Step 4 Providing an upper substrate on which a common electrode is deposited.
  • the trench structure includes a recess and a protrusion adjacent to the recess, the recess having a depth less than or equal to a thickness of the passivation layer.
  • the depth value of the recessed portion of the trench structure is not fixed, and is optimally adjusted according to the thickness and design requirements of the passivation layer;
  • the area ratio of different regions in the one pixel is not fixed, and the change and adjustment are performed according to design requirements;
  • the width value of the depressed portion and the width value of the adjacent convex portion are not fixed, and are changed and adjusted according to design requirements.
  • the present invention provides a liquid crystal display pixel structure in which a passivation layer in one pixel includes at least two trench structures of different depths, and one pixel is divided into different regions to achieve the same driving. Under voltage, the liquid crystals in different regions of a pixel produce different deflection angles, which can significantly improve the color shift phenomenon under a large viewing angle. Compared with the existing liquid crystal display pixel structure, the number of TFTs can be reduced, and the driving control circuit is simpler.
  • the aperture ratio is higher; the method for fabricating a liquid crystal display pixel structure provided by the present invention etches the passivation layer such that the passivation layer in one pixel is etched into at least two different depth trench structures, and the pixel electrode Directly deposited on the trench structure, high transmittance performance can be realized without high-definition trench structure, and the requirements for the yellow light device and the process technology are low.
  • the liquid crystal display pixel structure obtained by the method has a large viewing angle. The color shift phenomenon underneath is significantly improved.
  • FIG. 1 is a perspective view showing a structure of a conventional liquid crystal display pixel
  • Figure 2 is a cross-sectional view corresponding to C in Figure 1;
  • FIG. 3 is a schematic plan view showing a structure of a conventional liquid crystal display pixel
  • FIG. 4 is a schematic diagram of liquid crystal deflection of a conventional liquid crystal display pixel structure
  • FIG. 5 is a schematic diagram showing measurement results of color shift improvement of a conventional liquid crystal display pixel structure
  • FIG. 6 is a perspective view of a first embodiment of a liquid crystal display pixel structure of the present invention.
  • Figure 7 is a cross-sectional view corresponding to E in Figure 6;
  • FIG. 8 is a schematic plan view showing a first embodiment of a liquid crystal display pixel structure of the present invention.
  • FIG. 9 is a schematic diagram of liquid crystal deflection of a region A in a first embodiment of a liquid crystal display pixel structure according to the present invention.
  • FIG. 10 is a schematic diagram of liquid crystal deflection of a region B in a first embodiment of a liquid crystal display pixel structure according to the present invention.
  • FIG. 11 is a schematic diagram of a color shift improvement measurement result of a first embodiment of a liquid crystal display pixel structure according to the present invention.
  • FIG. 12 is a plan view showing a second embodiment of a liquid crystal display pixel structure of the present invention.
  • FIG. 13 is a plan view showing a third embodiment of a liquid crystal display pixel structure according to the present invention.
  • FIG. 14 is a flow chart of a method of fabricating a liquid crystal display pixel structure of the present invention.
  • a first embodiment of a liquid crystal display pixel structure includes: a lower substrate 1 , a passivation layer 2 disposed on an upper surface of the lower substrate 1 , and a passivation layer.
  • the pixel electrode 3 on the second surface, the upper substrate 4, and the common electrode 5 provided on the lower surface of the upper substrate 4.
  • the pixel electrode 3 is an ITO electrode
  • the common electrode 5 is an ITO electrode.
  • Each pixel is provided with a plurality of domains; in one pixel, the passivation layer 2 includes at least two different depths of trench structures, and the pixel electrodes 3 continuously and continuously cover the trench structures, the different depths The trench structure divides one pixel into different regions. In the first embodiment, four pixels are disposed for each pixel, which are respectively domain 1, domain 2, domain 3, and domain 4. In one pixel, the passivation layer 2 includes two different depth trench structures.
  • the passivation layer 2 It needs to be patterned by the yellow light process to obtain trench structures of different depths.
  • the pixel electrode 3 continuously and continuously covers the trench structure, which does not need a yellow light process, but is directly deposited on the trench structure of the passivation layer 2.
  • the trench structure includes a recess 21 and a protrusion 23 adjacent to the recess 21 , the depth of the recess 21 being less than or equal to the thickness of the passivation layer 2 . .
  • the depth value of the recessed portion 21 of the trench structure is not fixed, and can be optimally adjusted according to the thickness and design requirements of the passivation layer 2.
  • the width value L1 of the recessed portion 21 and the adjacent convex portion 23 The width value L3 is not fixed and can be changed and adjusted according to design requirements, so the liquid crystal display pixel structure of the present invention does not require a high-definition groove structure.
  • the two different depth groove structures divide one pixel into a region A and a region B along a diagonal direction of each domain, and divide the domain 1 into 1 along a diagonal direction of the domain 1.
  • -A and 1-B dividing domain 2 into 2-A and 2-B along the diagonal direction of domain 2
  • dividing domain 3 into 3-A and 3-B along the diagonal direction of domain 3
  • the diagonal direction of the domain 4 divides the domain 4 into 4-A and 4-B, which is equivalent to one pixel setting eight domains.
  • the liquid crystal deflection angle ⁇ A of the region A is different from the liquid crystal deflection angle ⁇ B of the region B, and the beneficial effects are as shown in FIG.
  • the liquid crystal display pixel structure of the present invention can realize different deflection angles of liquid crystals in different regions of one pixel under the same driving voltage, and can significantly improve the color shift phenomenon under a large viewing angle compared with the existing liquid crystal display pixel structure. Moreover, the number of TFTs can be reduced, the drive control circuit is made simpler, and the pixel aperture ratio is higher.
  • the first embodiment only illustrates the case where the area ratio of the area A and the area B is 1:1, but the area ratio of the area A and the area B is not limited to 1:1, and may be 1:2, 1:3, 2:3, 3:5, etc., that is, the area ratio of different areas in one pixel is not fixed, and can be changed and adjusted according to design requirements.
  • Figure 12 is a view showing a second embodiment of the liquid crystal display pixel structure of the present invention.
  • the second embodiment is different from the first embodiment in that the two different depth groove structures divide one pixel into a region A and a region B in the horizontal and vertical directions, and can be expanded into groove structures of different depths.
  • the horizontal and vertical directions divide one pixel into different regions, and the others are the same as those in the first embodiment, and are not described herein again.
  • Fig. 13 is a view showing a third embodiment of the liquid crystal display pixel structure of the present invention.
  • the third embodiment is different from the first embodiment in that the two different depth groove structures divide one pixel into the area A and the area B along the oblique direction thereof, and can be expanded into different depths of the groove structure along the same
  • the oblique direction divides one pixel into different regions, and the others are the same as the first embodiment, and are not described herein again.
  • the present invention further provides a method for fabricating a liquid crystal display pixel structure, including the following steps:
  • Step 1 Provide a substrate 1 on which a passivation layer 2 is deposited.
  • Step 2 Etching the passivation layer 2 by a yellow light process.
  • the passivation layer 2 is etched into at least two trench structures of different depths.
  • the trench structures of different depths divide one pixel into different regions.
  • Step 3 Depositing the pixel electrode 3 on the passivation layer 2 having a trench structure of at least two different depths so that the pixel electrode 3 continuously covers the trench structure without interruption.
  • the pixel electrode 3 is directly deposited on the trench structure, and high transmittance performance can be realized without a high-definition trench structure.
  • Step 4 An upper substrate 4 is provided, and a common electrode 5 is deposited on the upper substrate 4.
  • the trench structure includes a recess 21 and a protrusion 23 adjacent to the recess 21, and the depth of the recess 21 is less than or equal to the thickness of the passivation layer 2.
  • the depth value of the recessed portion 21 of the trench structure is not fixed, and can be optimally adjusted according to the thickness and design requirements of the passivation layer 2; the area ratio of different regions in the one pixel is not fixed, and can be performed according to design requirements.
  • the adjustment is made; the width value L1 of the recessed portion 21 and the width value L3 of the adjacent convex portion 23 are not fixed, and can be changed and adjusted according to design requirements.
  • the trench structure does not need to meet high-precision requirements, so the method has low requirements on the yellow light device and the process technology, and the liquid crystal display pixel structure obtained by the method has a significant improvement in color shift phenomenon under a large viewing angle.
  • the liquid crystal display pixel structure of the present invention divides one pixel into different regions by providing a passivation layer in one pixel including at least two groove structures of different depths, and realizes one pixel under the same driving voltage.
  • the liquid crystals in different regions generate different deflection angles, which can significantly improve the color shift phenomenon under a large viewing angle.
  • the invention provides a method for fabricating a liquid crystal display pixel structure, wherein the passivation layer is etched such that the passivation layer in one pixel is etched into at least two different depths of the trench structure, and the pixel electrode is directly deposited on the trench Structurally, high transmittance performance can be realized without high-definition groove structure, and requirements for yellow light equipment and process technology are low, and color shift phenomenon of liquid crystal display pixel structure obtained by the method at a large viewing angle is low. There has been a significant improvement.

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Abstract

一种液晶显示像素结构及其制作方法，该液晶显示像素结构包括：下基板（1）、设于下基板（1）上表面的钝化层（2）、设于钝化层（2）上的像素电极（3）、上基板（4）、及设于上基板（4）下表面的公共电极（5）；每一像素设置多畴；在一个像素内，所述钝化层（2）包括至少两种不同深度的沟槽结构，像素电极（3）连续不间断的覆盖于沟槽上，所述不同深度的沟槽结构将一个像素划分成不同区域，实现在同一驱动电压下，一个像素内不同区域的液晶产生不同的偏转角。能够显著改善大视角下的色偏现象，并使驱动控制电路简单，像素开口率高。

Description

液晶显示像素结构及其制作方法 技术领域
本发明涉及显示技术领域，尤其涉及一种液晶显示像素结构及其制作方法。
背景技术
液晶显示装置(LCD，Liquid Crystal Display)具有机身薄、省电、无辐射等众多优点，得到了广泛的应用。如：液晶电视、移动电话、个人数字助理(PDA)、数字相机、计算机屏幕或笔记本电脑屏幕等，在平板显示领域中占主导地位。
现有市场上的液晶显示器大部分为背光型液晶显示器，其包括壳体、设于壳体内的液晶显示面板及设于壳体内的背光模组。液晶显示面板是液晶显示器的主要组件，但液晶显示面板本身不发光，需要借由背光模组提供的光源来正常显示影像。
通常液晶显示面板由两片玻璃基板贴合而成，且在两片玻璃基板之间灌入液晶，分别在两片玻璃基板的相对内侧设置像素电极、公共电极，通过通电与否来控制液晶分子改变方向，将背光模组的光线折射出来产生画面。
现有的LCD中，大视角下会发生严重的色偏(color washout)现象，尽管现有技术已经通过采用多畴(multi domain)显示的像素设计，来改善LCD大视角下的色偏程度，但是色偏现象仍较严重，这种状况在垂直配向(Vertical Alignment，VA)型的LCD中更为明显。而且现有的改善大视角下色偏的像素设计需要将像素设置为主(Main)区和次(Sub)区，分别通过不同的薄膜晶体管(Thin Film Transistor，TFT)来控制Main区和Sub区，并分别给Main区和Sub区提供不同的驱动电压，使Main区和Sub区的液晶产生不同的转动行为，从而对大视角下的伽马(Gamma)特性进行混合补偿，来达到改善色偏的目的，但是更多的TFT意味着更复杂的控制电路及像素开口率的降低。
请同时参阅图1、图2、图3，现有液晶显示像素结构包括下基板100、覆盖下基板100上表面的钝化层200、设于钝化层200上的像素电极300、上基板400、及覆盖上基板400下表面的公共电极500，每一像素设置为四畴。像素电极300采用类似于光栅的以等间距间隔排列的条状(line/space) 结构，需通过黄光制程进行图案化处理；钝化层200直接沉积于下基板100上，除了过孔(Via hole)以外，其它区域均不需要通过黄光制程进行图案化处理；即，钝化层200基本是平坦的，像素电极300具有条状图案。如图4、图5所示，上述液晶显示像素结构在同一驱动电压下，每一像素内液晶的转动行为只有一种，从而液晶偏转角Θ是相同的，虽然每一像素设置为四畴对大视角下的色偏有一定改善，但是效果不佳，色偏仍较严重。
发明内容
本发明的目的在于提供一种液晶显示像素结构，能够显著改善大视角下的色偏现象，并使驱动控制电路简单，像素开口率高。
本发明的目的还在于提供一种液晶显示像素结构的制作方法，其对黄光设备和制程工艺的要求较低，通过该方法制得的液晶显示像素结构在大视角下的色偏现象有显著改善。
为实现上述目的，本发明提供一种液晶显示像素结构，包括：下基板、设于下基板上表面的钝化层、设于钝化层上的像素电极、上基板、及设于上基板下表面的公共电极；每一像素设置多畴；一个像素内，所述钝化层包括至少两种不同深度的沟槽结构，所述像素电极连续不间断的覆盖于所述沟槽结构上，所述不同深度的沟槽结构将一个像素划分成不同区域，实现在同一驱动电压下，一个像素内不同区域的液晶产生不同的偏转角。
所述沟槽结构包括凹陷部、及与所述凹陷部相邻的凸起部，所述凹陷部的深度小于或等于钝化层的厚度。
所述沟槽结构的凹陷部的深度值不固定，根据所述钝化层的厚度和设计需求进行优化调整；
所述一个像素内不同区域的面积比例不固定，根据设计需要进行变更调整；
所述凹陷部的宽度值和相邻的凸起部的宽度值不固定，根据设计需要进行变更调整。
所述不同深度的沟槽结构沿每个畴的对角线方向将一个像素划分成不同区域。
所述不同深度的沟槽结构沿水平和垂直方向将一个像素划分成不同区域。
所述不同深度的沟槽结构沿其倾斜方向将一个像素划分成不同区域。
所述像素电极为ITO电极，所述公共电极为ITO电极。
本发明还提供一种液晶显示像素结构的制作方法，包括如下步骤：
步骤1、提供一下基板，在所述下基板上沉积钝化层；
步骤2、通过黄光制程对所述钝化层进行蚀刻；
一个像素内，所述钝化层被蚀刻出至少两种不同深度的沟槽结构；
所述不同深度的沟槽结构将一个像素划分成不同区域；
步骤3、在具有至少两种不同深度的沟槽结构的钝化层上沉积像素电极，使所述像素电极连续不间断的覆盖于沟槽结构上；
步骤4、提供一上基板，在所述上基板上沉积公共电极。
所述沟槽结构包括凹陷部、及与所述凹陷部相邻的凸起部，所述凹陷部的深度小于或等于钝化层的厚度。
所述沟槽结构的凹陷部的深度值不固定，根据所述钝化层的厚度和设计需求进行优化调整；
所述一个像素内不同区域的面积比例不固定，根据设计需要进行变更调整；
所述凹陷部的宽度值和相邻的凸起部的宽度值不固定，根据设计需要进行变更调整。
本发明的有益效果：本发明提供的的一种液晶显示像素结构，通过设置一个像素内的钝化层包括至少两种不同深度的沟槽结构，将一个像素划分成不同区域，实现在同一驱动电压下，一个像素内不同区域的液晶产生不同的偏转角，能够显著改善大视角下的色偏现象，与现有液晶显示像素结构相比，能够减少TFT数量，使驱动控制电路更简单，像素开口率更高；本发明提供的一种液晶显示像素结构的制作方法，对钝化层进行蚀刻，使得一个像素内的钝化层被蚀刻出至少两种不同深度的沟槽结构，而像素电极直接沉积于沟槽结构上，无需高精细的沟槽结构即可实现高的穿透率表现，对黄光设备和制程工艺的要求较低，通过该方法制得的液晶显示像素结构在大视角下的色偏现象有显著改善。
附图说明
下面结合附图，通过对本发明的具体实施方式详细描述，将使本发明的技术方案及其它有益效果显而易见。
附图中，
图1为现有液晶显示像素结构的立体示意图；
图2为对应图1中C处的剖视图；
图3为现有液晶显示像素结构的平面示意图；
图4为现有液晶显示像素结构的液晶偏转示意图；
图5为现有液晶显示像素结构的色偏改善量测结果示意图；
图6为本发明液晶显示像素结构的第一实施例的立体示意图；
图7为对应图6中E处的剖视图；
图8为本发明液晶显示像素结构的第一实施例的平面示意图；
图9为本发明液晶显示像素结构的第一实施例中区域A的液晶偏转示意图；
图10为本发明液晶显示像素结构的第一实施例中区域B的液晶偏转示意图；
图11为本发明液晶显示像素结构的第一实施例的色偏改善量测结果示意图；
图12为本发明液晶显示像素结构的第二实施例的平面示意图；
图13为本发明液晶显示像素结构的第三实施例的平面示意图；
图14为本发明液晶显示像素结构的制作方法的流程图。
具体实施方式
为更进一步阐述本发明所采取的技术手段及其效果，以下结合本发明的优选实施例及其附图进行详细描述。
请同时参阅图图6、图7、图8，为本发明液晶显示像素结构的第一实施例，包括：下基板1、设于下基板1上表面的钝化层2、设于钝化层2上的像素电极3、上基板4、及设于上基板4下表面的公共电极5。
所述像素电极3为ITO电极，所述公共电极5为ITO电极。每一像素设置多畴；一个像素内，所述钝化层2包括至少两种不同深度的沟槽结构，所述像素电极3连续不间断的覆盖于所述沟槽结构上，所述不同深度的沟槽结构将一个像素划分成不同区域。在该第一实施例中，每一像素设置四畴，分别为畴1、畴2、畴3、畴4；一个像素内，所述钝化层2包括两种不同深度的沟槽结构，该两种不同深度的沟槽结构将一个像素划分成两个不同的区域，分别为区域A、区域B，区域A内的沟槽深度DA小于区域B内的沟槽深度DB，所述钝化层2需经黄光制程进行图案化处理以得到不同深度的沟槽结构。所述像素电极3连续不间断的覆盖于所述沟槽结构上，其无需黄光制程，而是直接沉积于钝化层2的沟槽结构上。
具体的，如图7所示，所述沟槽结构包括凹陷部21、及与所述凹陷部21相邻的凸起部23，所述凹陷部21的深度小于或等于钝化层2的厚度。所述沟槽结构的凹陷部21的深度值不固定，可根据所述钝化层2的厚度和设计需求进行优化调整。所述凹陷部21的宽度值L1和相邻的凸起部23的 宽度值L3不固定，可根据设计需要进行变更调整，所以本发明的液晶显示像素结构无需高精细的沟槽结构。
如图8所示，所述两种不同深度的沟槽结构沿每个畴的对角线方向将一个像素划分成区域A与区域B，沿畴1的对角线方向将畴1划分成1-A与1-B，沿畴2的对角线方向将畴2划分成2-A与2-B，沿畴3的对角线方向将畴3划分成3-A与3-B，沿畴4的对角线方向将畴4划分成4-A与4-B，等效于一个像素设置了八畴。如图9、图10所示，同一驱动电压下，区域A的液晶偏转角ΘA与区域B的液晶偏转角ΘB不同，由此产生的有益效果如图11所示，大视角下的色偏现象得到了显著改善。因此，本发明的液晶显示像素结构能够实现同一驱动电压下，一个像素内不同区域的液晶产生不同的偏转角，相比于现有的液晶显示像素结构既能够显著改善大视角下的色偏现象，又能够减少TFT数量，使驱动控制电路更简单，像素开口率更高。
值得一提的是，该第一实施例仅示意出了区域A与区域B的面积比例为1：1的情况，但区域A与区域B的面积比例并不局限于1:1，还可为1:2、1:3、2:3、3:5等，即一个像素内不同区域的面积比例不固定，可根据设计需要进行变更调整。
图12所示为本发明液晶显示像素结构的第二实施例。该第二实施例与第一实施例的区别在于，所述两种不同深度的沟槽结构沿水平和垂直方向将一个像素划分成区域A与区域B，可扩展为不同深度的沟槽结构沿水平和垂直方向将一个像素划分成不同区域，其它与第一实施例相同，此处不再赘述。
图13所示为本发明液晶显示像素结构的第三实施例。该第三实施例与第一实施例的区别在于，所述两种不同深度的沟槽结构沿其倾斜方向将一个像素划分成区域A与区域B，可扩展为不同深度的沟槽结构沿其倾斜方向将一个像素划分成不同区域，其它与第一实施例相同，此处不再赘述。
请参阅图14，同时参阅图6至图8，本发明还提供一种液晶显示像素结构的制作方法，包括如下步骤：
步骤1、提供一下基板1，在所述下基板1上沉积钝化层2。
步骤2、通过黄光制程对所述钝化层2进行蚀刻。
一个像素内，所述钝化层2被蚀刻出至少两种不同深度的沟槽结构。
所述不同深度的沟槽结构将一个像素划分成不同区域。
步骤3、在具有至少两种不同深度的沟槽结构的钝化层2上沉积像素电极3，使所述像素电极3连续不间断的覆盖于沟槽结构上。
该步骤3中，像素电极3直接沉积于沟槽结构上，无需高精细的沟槽结构即可实现高的穿透率表现。
步骤4、提供一上基板4，在所述上基板4上沉积公共电极5。
具体的，所述沟槽结构包括凹陷部21、及与所述凹陷部21相邻的凸起部23，所述凹陷部21的深度小于或等于钝化层2的厚度。
所述沟槽结构的凹陷部21的深度值不固定，可根据所述钝化层2的厚度和设计需求进行优化调整；所述一个像素内不同区域的面积比例不固定，可根据设计需要进行变更调整；所述凹陷部21的宽度值L1和相邻的凸起部23的宽度值L3不固定，可根据设计需要进行变更调整。所述沟槽结构无需达到高精细的要求，所以该方法对黄光设备和制程工艺的要求较低，通过该方法制得的液晶显示像素结构在大视角下的色偏现象有显著改善。
综上所述，本发明的液晶显示像素结构，通过设置一个像素内的钝化层包括至少两种不同深度的沟槽结构，将一个像素划分成不同区域，实现在同一驱动电压下，一个像素内不同区域的液晶产生不同的偏转角，能够显著改善大视角下的色偏现象，与现有液晶显示像素结构相比，能够减少TFT数量，使驱动控制电路更简单，像素开口率更高；本发明提供的一种液晶显示像素结构的制作方法，对钝化层进行蚀刻，使得一个像素内的钝化层被蚀刻出至少两种不同深度的沟槽结构，而像素电极直接沉积于沟槽结构上，无需高精细的沟槽结构即可实现高的穿透率表现，对黄光设备和制程工艺的要求较低，通过该方法制得的液晶显示像素结构在大视角下的色偏现象有显著改善。
以上所述，对于本领域的普通技术人员来说，可以根据本发明的技术方案和技术构思作出其他各种相应的改变和变形，而所有这些改变和变形都应属于本发明权利要求的保护范围。

Claims (15)

  1. 一种液晶显示像素结构，包括：下基板、设于下基板上表面的钝化层、设于钝化层上的像素电极、上基板、及设于上基板下表面的公共电极；每一像素设置多畴；一个像素内，所述钝化层包括至少两种不同深度的沟槽结构，所述像素电极连续不间断的覆盖于所述沟槽结构上，所述不同深度的沟槽结构将一个像素划分成不同区域，实现在同一驱动电压下，一个像素内不同区域的液晶产生不同的偏转角。
  2. 如权利要求1所述的液晶显示像素结构，其中，所述沟槽结构包括凹陷部、及与所述凹陷部相邻的凸起部，所述凹陷部的深度小于或等于钝化层的厚度。
  3. 如权利要求2所述的液晶显示像素结构，其中，所述沟槽结构的凹陷部的深度值不固定，根据所述钝化层的厚度和设计需求进行优化调整；
    所述一个像素内不同区域的面积比例不固定，根据设计需要进行变更调整；
    所述凹陷部的宽度值和相邻的凸起部的宽度值不固定，根据设计需要进行变更调整。
  4. 如权利要求3所述的液晶显示像素结构，其中，所述不同深度的沟槽结构沿每个畴的对角线方向将一个像素划分成不同区域。
  5. 如权利要求3所述的液晶显示像素结构，其中，所述不同深度的沟槽结构沿水平和垂直方向将一个像素划分成不同区域。
  6. 如权利要求3所述的液晶显示像素结构，其中，所述不同深度的沟槽结构沿其倾斜方向将一个像素划分成不同区域。
  7. 如权利要求1所述的液晶显示像素结构，其中，所述像素电极为ITO电极，所述公共电极为ITO电极。
  8. 一种液晶显示像素结构的制作方法，包括如下步骤：
    步骤1、提供一下基板，在所述下基板上沉积钝化层；
    步骤2、通过黄光制程对所述钝化层进行蚀刻；
    一个像素内，所述钝化层被蚀刻出至少两种不同深度的沟槽结构；
    所述不同深度的沟槽结构将一个像素划分成不同区域；
    步骤3、在具有至少两种不同深度的沟槽结构的钝化层上沉积像素电极，使所述像素电极连续不间断的覆盖于沟槽结构上；
    步骤4、提供一上基板，在所述上基板上沉积公共电极。
  9. 如权利要求8所述的液晶显示像素结构的制作方法，其中，所述沟槽结构包括凹陷部、及与所述凹陷部相邻的凸起部，所述凹陷部的深度小于或等于钝化层的厚度。
  10. 如权利要求9所述的液晶显示像素结构的制作方法，其中，所述沟槽结构的凹陷部的深度值不固定，根据所述钝化层的厚度和设计需求进行优化调整；
    所述一个像素内不同区域的面积比例不固定，根据设计需要进行变更调整；
    所述凹陷部的宽度值和相邻的凸起部的宽度值不固定，根据设计需要进行变更调整。
  11. 一种液晶显示像素结构，包括：下基板、设于下基板上表面的钝化层、设于钝化层上的像素电极、上基板、及设于上基板下表面的公共电极；每一像素设置多畴；一个像素内，所述钝化层包括至少两种不同深度的沟槽结构，所述像素电极连续不间断的覆盖于所述沟槽结构上，所述不同深度的沟槽结构将一个像素划分成不同区域，实现在同一驱动电压下，一个像素内不同区域的液晶产生不同的偏转角；
    其中，所述沟槽结构包括凹陷部、及与所述凹陷部相邻的凸起部，所述凹陷部的深度小于或等于钝化层的厚度；
    其中，所述像素电极为ITO电极，所述公共电极为ITO电极。
  12. 如权利要求11所述的液晶显示像素结构，其中，所述沟槽结构的凹陷部的深度值不固定，根据所述钝化层的厚度和设计需求进行优化调整；
    所述一个像素内不同区域的面积比例不固定，根据设计需要进行变更调整；
    所述凹陷部的宽度值和相邻的凸起部的宽度值不固定，根据设计需要进行变更调整。
  13. 如权利要求12所述的液晶显示像素结构，其中，所述不同深度的沟槽结构沿每个畴的对角线方向将一个像素划分成不同区域。
  14. 如权利要求12所述的液晶显示像素结构，其中，所述不同深度的沟槽结构沿水平和垂直方向将一个像素划分成不同区域。
  15. 如权利要求12所述的液晶显示像素结构，其中，所述不同深度的沟槽结构沿其倾斜方向将一个像素划分成不同区域。
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