WO2016062698A1 - Ensemble formant magnétron - Google Patents

Ensemble formant magnétron Download PDF

Info

Publication number
WO2016062698A1
WO2016062698A1 PCT/EP2015/074226 EP2015074226W WO2016062698A1 WO 2016062698 A1 WO2016062698 A1 WO 2016062698A1 EP 2015074226 W EP2015074226 W EP 2015074226W WO 2016062698 A1 WO2016062698 A1 WO 2016062698A1
Authority
WO
WIPO (PCT)
Prior art keywords
assembly
end block
arrangement
chamber wall
process chamber
Prior art date
Application number
PCT/EP2015/074226
Other languages
German (de)
English (en)
Inventor
Sebastian Siegert
Gerit Stude
Gerd Arnold
Florian Wiegand
Original Assignee
Von Ardenne Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Von Ardenne Gmbh filed Critical Von Ardenne Gmbh
Publication of WO2016062698A1 publication Critical patent/WO2016062698A1/fr

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
    • H01J37/3405—Magnetron sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3435—Target holders (includes backing plates and endblocks)

Definitions

  • Magnetron arrangement The invention relates to a magnetron arrangement.
  • workpieces or substrates may be processed or treated, e.g. machined, coated, heated, etched and / or structurally altered.
  • One method of coating a substrate is sputtering, so-called sputtering or sputter deposition.
  • a plasma-forming gas (the so-called working gas) can be ionized by means of a cathode and with the plasma formed in the process a material to be deposited, the so-called target material, is atomized.
  • the so-called working gas can be ionized by means of a cathode and with the plasma formed in the process a material to be deposited, the so-called target material, is atomized.
  • Target material can then be brought to a substrate to which it can attach and form a layer.
  • a modification of cathode sputtering is, for example, sputtering by means of a magnetron, the so-called
  • Magnetron sputtering For magnetron sputtering, the formation of the plasma can be assisted by means of a magnetic field which determines the ionization rate of the plasma-forming gas
  • Target material may require this relative to that
  • the cathode can be configured tubular, as a so-called tube cathode, which may have a target base tube (also called carrier tube) whose outer circumferential surface is at least partially covered by target material.
  • a magnet system for generating the target base tube Inside the target base tube, a magnet system for generating the target base tube.
  • Target base tube arranged target material under the
  • components used to rotatably support and supply a tube cathode eg, rotary feedthrough, rolling bearing, mechanical drive, electrical feed, and / or seal
  • end block e.g., rotary feedthrough, rolling bearing, mechanical drive, electrical feed, and / or seal
  • End blocks may form an end block pair for holding a tube cathode at their opposite ends
  • End portions and can be mounted for processing a substrate in a suitable processing chamber or be.
  • the end blocks of the Endblockcrus are mounted such that their bearings (or the axis of rotation of the bearings) are aligned as possible in alignment. Even a small axial offset and / or angular offset (which can overlap) of the rolling bearing (or their axes of rotation) to each other, the assembly of the tube cathode complicate and / or additionally load the bearings mechanically due to the associated
  • the tube cathode may be supported at one of its end portions by means of a support to compensate for angular misalignment. The achieved with it
  • Endblock pairs conventionally firmly connected to the tube cathode, so that the tube cathode of the set alignment of the end blocks adds, whereby, however, a mechanically overdetermined connection with the tube cathode can arise, which can lead to additional mechanical loads on the bearings, as they absorb all forces occurring.
  • a tube cathode e.g., the carrier tube
  • fabrication of a tube cathode is subject to certain manufacturing tolerances which help to make the tube cathode of an ideal, e.g.
  • a tubular cathode to be mounted may be slightly curved, for example. Therefore, the
  • Tube cathode itself in carefully aligned
  • the magnetronan can have a base assembly which between an end block of the Endblockcrus and the
  • Processing chamber can be or can be mounted and a
  • the socket assembly may be e.g. a shifting tilting, panning and / or twisting of the
  • Endblocks allow so that this can align with the tube cathode and the tilting moment is reduced in the end block. This can be a power and torque reduced
  • Tube cathode is rotated), e.g. one
  • the axial offset and / or the angular offset can be adapted to a position of the tube cathode in a time-dependent manner.
  • tube cathodes e.g. allows tube cathodes to be used with larger manufacturing tolerances.
  • Tube cathode used the life of the end blocks in a magnetron according to various
  • Such a magnetron arrangement can, for example, for
  • Manufacturing tolerances of the tube cathode used are not or only slightly influenced. Furthermore, can
  • the ⁇ is a ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇
  • Socket assembly combined with an existing magnetron and / or existing Endblockcruen.
  • the base assembly may be set up so that it to the existing mounting arrangements of
  • Processing chamber and end blocks of the magnetron arrangement fits. This makes it possible to inexpensively convert an existing processing arrangement.
  • a magnetron arrangement may vary according to various aspects
  • Embodiments comprising: a process chamber wall (which may be part of a processing chamber, for example); a first end block arrangement and a second
  • An end block assembly capable of forming an end block pair for rotatably supporting and supplying a tubular cathode; and a socket assembly to which the first end block assembly may be attached;
  • the process chamber wall having a first attachment assembly for securing the socket assembly to the process chamber wall and a second attachment assembly for securing the second endblock assembly to the process chamber wall
  • a relative position of the first end block arrangement to the second end block arrangement can be defined; and wherein the base assembly for deflecting the first end block assembly along at least two degrees of freedom relative to the
  • Process chamber wall may be formed.
  • the base assembly for deflecting the first Endblock- arrangement may be formed from the relative position.
  • the relative position of the first end block arrangement to the second end block arrangement may, for example, the required distance of the first end block arrangement to the second
  • Tube cathode between the two end block assemblies may have a length in a range of about 1 meter to about 6 meters, e.g. in a range of about 2 m to about 5 m, e.g. in a range of about 3 m to about 4 m.
  • a fastening arrangement may comprise a connecting element, e.g. a bolt, a set screw, a rivet, a clamp, a threaded nut or a screw.
  • a mounting arrangement may have a mating opening (or recess) for receiving a connector, e.g. a through hole, a blind hole or a threaded hole, e.g. Through holes in the
  • a mounting arrangement may facilitate securing the socket assembly and / or an end block assembly by means of a threaded or riveted connection.
  • the first attachment assembly may provide the socket assembly with a location (eg, a spatial position and / or a spatial orientation) in which the socket assembly on the Process chamber wall mounted or can be.
  • the second mounting arrangement of the second Endblock- arrangement specify a position in which the second Endblock- arrangement can be mounted on the process chamber wall or can be.
  • the base arrangement may predetermine a deflection region, for example a spatial region and / or an angular region, in which the first end block arrangement can be deflected, eg rotatable about an axis (rotational degree of freedom) and / or movable along one direction
  • Socket assembly predetermined deflection range may define a relative position of the first end block assembly to the second Endblock- arrangement.
  • the relative position may e.g. the
  • the first Endblock- arrangement is deflectable.
  • the first Endblock- arrangement is deflectable.
  • Deflection range define a maximum angular misalignment and / or a maximum axial offset between the Endblock-arrangements, which enables the socket assembly.
  • Angular displacement in a range of about -1 ° to about + 1 °, e.g. in a range of about -0.5 ° to about + 0.5 °, e.g. in a range of about -0.25 ° to about + 0.25 °, e.g. in a range of
  • the angular displacement about which the first end block assembly is pivotal may angularly offset the end blocks of the end block pair
  • Angular offset can be understood as an angle between the axes of rotation of the end blocks of the end block pair.
  • the axis of rotation of an end block may be from a bearing of the end block, e.g.
  • a rolling bearing of the end block (in other words, the rotational support of the end block) to be defined.
  • the ⁇ is a ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇
  • Socket assembly a movement (in other words a linear deflection) of the first end block along a
  • an endblock assembly may include an endblock for supplying the tube cathode with a medium (e.g., with a coolant) and / or with
  • the other end block assembly may have an end block for supplying the tubular cathode with mechanical energy, a so-called drive end block.
  • the medium and / or the mechanical energy may be supplied to the endblock from outside the processing chamber through a chamber wall of the processing chamber by means of a feed assembly of the endblock assembly.
  • the driving components of the umbilical assembly e.g., shaft, gearbox, and / or belt
  • the end block assembly having the drive end block and the power supply
  • An end block arrangement of the end block pair may further be arranged such that the tube cathode can be replaced after, for example, the target material has been consumed.
  • the tube cathode may be removably attached to the end block assembly.
  • the tube cathode at one end portion or at both (axial) end portions by means of an end block arrangement, which together form a Endblockplo be stored.
  • an end block assembly (e.g., with the drive end block) may have a hollow shaft into which an end portion of the tube cathode may or may not be inserted.
  • an endblock assembly (e.g., with the media endblock) may include a coupling to which the
  • Tube cathode can be connected, so that the
  • Tube cathode may be connected in a vacuum-tight manner to a pipeline inside the Endblock- arrangement for passing coolant through the tube cathode.
  • Each Endblock- arrangement of Endblockclams can be part of a
  • an end block assembly may include an end block having a base housing, the components for rotatably supporting the tube cathode, e.g. a rolling bearing, a seal and / or a shaft may be supported by the base housing.
  • the base housing may e.g. be vacuum-tight and pressure-stable, so that inside the end block, a pressure greater than in the processing chamber can be generated.
  • an endblock assembly may include
  • Cover housing for protecting the end block before
  • the cover housing may surround the base housing and be supported by the base housing of the end block, eg, thermally and / or electrically isolated from the base housing.
  • the cover housing may surround the base housing and be supported by the base housing of the end block, eg, thermally and / or electrically isolated from the base housing.
  • Socket assembly from a through hole (a so-called supply opening) for receiving a
  • the socket assembly may be configured (e.g.
  • the socket arrangement can have corresponding seals), that the interior of the passage opening can be sealed, e.g. to an exterior of the socket assembly.
  • the socket arrangement can
  • Process chamber wall and / or can be connected to an interior of an end block, e.g. vacuum-tight.
  • the first ⁇ is the first ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇
  • Inserting the socket assembly and / or the second fastening arrangement may have a second insertion portion for insertion of the second end block assembly.
  • a fastening arrangement can, for example, a
  • Insertion section in the form of a recess, e.g. one
  • Projection e.g. in the form of a collar (e.g., a collar), into which the socket assembly and / or a socket
  • End block arrangement can be inserted.
  • the first ⁇ is the first ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇
  • Socket assembly may be formed in the relative position to each other.
  • Centering be designed in the form of a so-called centering recess.
  • an end block arrangement may be arranged such that a portion of the
  • Base housing e.g., a so-called centering collar
  • End block arrangement can be inserted into a plug-in section.
  • a centering recess in the process chamber wall can form a centering collar of a component to be fastened thereto,
  • a socket assembly or an end block be adapted to center the component in the
  • the socket assembly may include a male portion (also referred to as a third male portion) into which the first end block assembly may be inserted.
  • the third male portion also referred to as a third male portion
  • Inserted portion for centering the first Endblock- arrangement be formed in the relative position to the second Endblock- arrangement.
  • the first ⁇ is the first ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇
  • Plug-in portion may be part of a process chamber wall penetrating the second through hole into which the second end block assembly may be inserted.
  • the first passage opening and the second passage opening may be designed to receive a supply structure.
  • the ⁇ is a ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇
  • Socket assembly having a resilient member which defines a rest position of the first end block assembly relative to the second end block assembly from which the first end block assembly is deflectable, e.g. around the linear deflection and / or the angular displacement.
  • the resilient element can be designed to generate a restoring force in the direction of the rest position, wherein the restoring force can be generated when the first end block arrangement is deflected from the rest position.
  • the ⁇ is a ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇
  • Socket assembly for deflecting the first end block assembly relative to a rotational axis of a rotatably mounted by means of the Endblockpresss tube cathode may be formed.
  • the base assembly for deflecting the first Endblock arrangement in operation (ie during sputtering and rotation) of the tube cathode may be formed.
  • the axis of rotation about which a tube cathode is rotated be considered as temporally and spatially constant. If the tube cathode is curved, for example, this is asymmetrical from the
  • Rotated axis For example, if an end portion of the tube cathode is asymmetrically deflected out of the axis of rotation, in other words offset from the axis of rotation, its offset can rotate about the axis of rotation when the tube cathode is rotated. From the socket assembly, this offset can be added.
  • each endblock assembly of the endblock pair may include a supply arrangement for supplying a tubular cathode with one or more media (e.g., coolant, e.g., pneumatic, e.g., lubricant).
  • media e.g., coolant, e.g., pneumatic, e.g., lubricant.
  • a magnetron arrangement may vary according to various aspects
  • Embodiments comprise: a
  • Bearing block which are arranged together for rotatably supporting and supplying a tubular cathode; a socket assembly to which the end block assembly is attached;
  • Process chamber wall a first mounting arrangement for
  • a socket assembly for deflecting the end block assembly along at least two degrees of freedom relative to the
  • Process chamber wall is formed.
  • the endblock assembly may be used to drive and supply the tube cathode
  • the bearing block only for rotatable bearings of the tubular cathode can be set up.
  • the bearing block can be an abutment to the
  • Form end block arrangement on which an end portion of the tube cathode may be supported.
  • the chamber wall may be part of a chamber housing or a chamber lid of the processing chamber.
  • the side of the chamber wall facing the end block pair (in the assembled state) also called process-side or vacuum-side
  • process-side or vacuum-side the side of the chamber wall facing the end block pair (in the assembled state)
  • Processing chamber are located and facing away from the end block pair side (also called the atmosphere side) of the chamber wall may be during a sputtering outside of the
  • Processing chamber are located.
  • the chamber wall is part of a chamber lid
  • Processing chamber having a chamber housing with a chamber opening for receiving the chamber lid.
  • the chamber lid may close the chamber opening in a vacuum-tight manner when the chamber lid is received in the chamber opening, so that the processing chamber can be pumped off to form a vacuum and / or a process atmosphere within the chamber
  • the chamber lid For opening the chamber housing, the chamber lid may be detachably arranged by the chamber housing and / or be pivotally attached to the chamber housing.
  • a magnetron arrangement may vary according to various aspects
  • Embodiments comprise: a
  • Process chamber lid for covering a
  • Process chamber opening in a process chamber (also referred to as a processing chamber), wherein the
  • a plug-in portion e.g. in the form of a recess and / or an opening, may have; a first end block assembly and a second end block assembly having an end block pair for rotatably supporting a
  • Forming tube cathode wherein the second end block arrangement can be at least partially inserted into the insertion section, for example, such that it is rigid with the Process chamber lid may be connected (in other words, the insertion portion for rigidly connecting the second end block assembly may be formed with the process chamber lid); and wherein the first end block assembly is along
  • At least two degrees of freedom can be mounted deflectable relative to the second end block assembly on the process chamber lid.
  • a magnetron arrangement may vary according to various aspects
  • Embodiments comprising: a chamber lid for covering a chamber opening; a first end block assembly and a second end block assembly forming an end block pair for rotatably supporting and supplying a tubular cathode; a socket assembly for coupling the first end block assembly to the process chamber lid;
  • Chamber lid a first insertion portion, e.g. in the form of a depression, in which the
  • Socket assembly may be at least partially inserted, and wherein the chamber lid has a second insertion portion, e.g. in the form of a recess may have, in which the second end block assembly may be at least partially inserted, so that a relative position of the second Endblock- arrangement to the base assembly by means of
  • Insert sections can be defined; and where the
  • Socket assembly may be configured such that the first end block assembly along at least two degrees of freedom can be deflectably coupled to the process chamber lid.
  • the socket assembly may be configured such that the first end block assembly may be deflectable along multiple degrees of freedom, e.g. along two or three translatory degrees of freedom, along two or three rotational degrees of freedom along one, two or three translational degrees of freedom and one
  • a rotational degree of freedom (also called rotational degree of freedom) can be understood as rotation about an axis.
  • a translatory degree of freedom also called rotational degree of freedom
  • Translational degree of freedom can be understood as movement (e.g., displacement) along one direction.
  • the number of degrees of freedom can be expressed as a number of mutually independent movement possibilities, e.g. are understood as the number of mutually transverse directions / axes, along which system a system can be moved, or along which the first end block arrangement can be deflected.
  • the magnetron assembly may further comprise a tube cathode for
  • the magnetron assembly can be disposed within a processing chamber and attached to a chamber wall of the processing chamber.
  • Magnetron arrangement and the processing chamber may be part of a processing arrangement.
  • the processing arrangement may further comprise a transport system for transporting a
  • the sputtering should be done in a vacuum.
  • the processing chamber can be set up as a vacuum chamber and coupled to a pump system, so that a vacuum and / or a negative pressure within the processing chamber
  • Processing chamber be set up so that the
  • Ambient conditions (the process conditions) within the processing chamber may be adjusted or regulated during sputtering.
  • the processing chamber can do this, for example
  • the processing chamber an ion-forming gas (process gas) or a gas mixture (eg a process gas and a reactive gas) by means of a
  • Gas supply are supplied to form a
  • reactive magnetron sputtering can be the atomized
  • Target material reacts with the reactive gas and the
  • Magnetron assembly as described herein may be any magnetron assembly as described herein.
  • a processing arrangement e.g.
  • Vacuum coating system can be used with a tube magnetron.
  • the processing chamber may be configured and operated such that within the processing chamber a vacuum, or process atmosphere, is generated at a pressure of less than 1 mbar, e.g. less than
  • Magnetron arrangement comprising: a
  • Process chamber wall a first end block assembly and a second end block assembly forming an end block pair for rotatably supporting and supplying a tubular cathode; a socket assembly to which the first end block assembly is attached; wherein the process chamber wall is a first
  • Attachment assembly for securing the second Endblock- arrangement on the process chamber wall
  • a socket assembly for deflecting the first end block assembly along at least two degrees of freedom relative to the first end block assembly
  • Process chamber wall is formed; the first one
  • Fastening arrangement has a second insertion portion for insertion of the second end block assembly in the second insertion portion, so that a relative position of the second end block arrangement is defined to the socket assembly by means of the insertion portions.
  • Magnetron arrangement comprising: a
  • Bearing block which are arranged together for rotatably supporting and supplying a tubular cathode; a socket assembly to which the end block assembly is attached;
  • Process chamber wall a first mounting arrangement for
  • Process chamber wall is formed; the first one
  • Fastening arrangement has a second insertion portion for inserting the bearing block in the second insertion portion, so that the relative position of the bearing block is defined to the base assembly by means of the insertion portions.
  • Socket assembly between the process chamber wall and the first end block assembly may be arranged.
  • the ⁇ is a ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇
  • Socket assembly process to be brought into physical contact with the process chamber wall in physical contact (i.e., on this process side), e.g. be plugged in or become.
  • the at least two degrees of freedom may each be transverse to an axis of rotation of the first end block arrangement.
  • the at least two degrees of freedom one or two
  • Translational degrees of freedom transverse to the axis of rotation and / or have one or two rotational degrees of freedom about a transverse axis to the axis of rotation.
  • the first ⁇ is the first ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇
  • Male portion limit a maximum angular misalignment and / or a maximum misalignment that allows the first end block assembly and socket assembly to be secured relative to each other on the process chamber wall (i.e., limit misalignment of the two).
  • Mounting arrangement i.e., the angular offset and / or
  • Axial misalignment limited by fastening may be smaller than the deflection range of the socket assembly (i.e., the angular misalignment and / or misalignment caused by
  • Deflecting the first endblock assembly is effected), i. in at least the degrees of freedom of the socket arrangement, e.g. less than half the size of the misalignment, e.g. less than a quarter as large, e.g. less than an eighth of a size.
  • a malposition (caused, for example, by manufacturing tolerances) can be reduced or substantially eliminated, which can result from the mounting of the base arrangement on the process chamber wall, or from the mounting means used therefor, and by means of the second mounting arrangement (or the second
  • a e.g.
  • Process chamber wall or from the used for it
  • Insertion portion define a misalignment of the second end block assembly and the socket assembly (or a rest position of the end block assembly attached thereto) relative to each other to an angle less than a range of about -0.5 ° to about + 0.5 °, e.g. less than a range of about -0.25 ° to about + 0.25 °, e.g. less than a range of about -0.1 ° to about + 0.1 °, e.g. less than a range of about -0.05 ° to about + 0.05 °, e.g. less than a range of about -0.02 ° to about + 0.02 °, e.g. smaller than a range of about -0.01 ° to about + 0.01 °.
  • the mounting state may have an uncertainty in the mounting angle, which is smaller than the corresponding area.
  • the first ⁇ is the first ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇
  • the mounting state may be an uncertainty in the
  • 1A and 1B each show a magnetron arrangement according to various embodiments in one
  • 2A and 2B each show a magnetron arrangement according to various embodiments in one
  • FIG. 3A and 3B each show a magnetron arrangement according to various embodiments in one
  • Figure 4 shows a magnetron according to various aspects
  • FIG. 5 shows a socket assembly according to various aspects
  • Figure 6 shows a cover according to different
  • FIG. 7 shows a magnetron arrangement according to various
  • a mechanical attachment method for a media endblock and / or a drive endblock is provided which determines the degrees of freedom of the system (e.g.
  • Translational degrees of freedom and three rotational degrees of freedom at least in part, e.g. up to a specific limit (the maximum angular deflection and / or maximum linear deflection). This can be a force and
  • torque-reduced storage (based on the tolerances of the tube cathode) of the tube cathode (also referred to as target tube) can be achieved.
  • a statically completely determined system can positively affect the life of the rotary bearing (e.g., the rolling bearings) and the seals in the end blocks.
  • FIG. 1A illustrates a magnetron assembly 100 according to various embodiments in a schematic
  • the magnetron assembly 100 may include a process chamber wall 102 for holding end block assembly (s). Further, the magnetron assembly 100 may include a first endblock assembly 104 and a second end block assembly 106. Further, the magnetron assembly 100 may include a socket assembly 114
  • Each of the end block assemblies 104, 106 may include at least one end block.
  • the first end block assembly 104 may include a media end block and the second end block assembly 106 may include a drive end block.
  • the process chamber wall 102 may include a first
  • Attachment arrangement 124 by means of which the base assembly 114 may be attached to the process chamber wall 102 or can be. Furthermore, the process chamber wall 102 may have a second attachment arrangement 126, by means of which the second end block arrangement 106 on the
  • Process chamber wall 102 may be attached or may be.
  • the fastener assemblies 124, 126 may include, for example, one or more through openings in the process chamber wall 102 through which screws are inserted into the process chamber wall 102
  • Socket assembly 114 and / or the second end block assembly 106 may or may be screwed, e.g. in one
  • a relative position of the first end block arrangement 104 to the second end block arrangement 106 can be defined (for example predetermined), e.g. a distance (in the direction 101) and / or an orientation (e.g., an angular position) to each other.
  • first end block assembly 104 and the second end block assembly 106 may be spaced apart and with their axes of rotation
  • the ⁇ is a ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇
  • Base assembly 114 may be configured such that the first end block assembly 104 along at least two
  • Degrees of freedom e.g. along two or three
  • translatory degrees of freedom or another Combination of degrees of freedom, as described herein, is deflectable relative to the process chamber wall 102.
  • Process chamber wall 102 (for example, along direction 101) be deflected.
  • FIG. 1B illustrates a magnetron assembly 150 according to various embodiments in a schematic
  • the ⁇ is a ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇
  • Magnetronan extract 150 a tube cathode 108 or a
  • Carrier tube of a tube cathode 108 have.
  • the tube cathode 108 may be rotatably mounted about a rotational axis (e.g., along direction 101) of the tube cathode 108 for sputtering by means of the first end block assembly 104 and the second end block assembly 106.
  • the ⁇ is a ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇
  • Base assembly 154 has a resilient element 114f (shown here simplified as a spring).
  • resilient element 114f may be used as a component
  • the elastic element 114f may be stretched / upset to a yield point without plastically deforming or being deformed only slightly plastically (e.g., less than 0.2% permanent set) or without breaking. According to different
  • the resilient member 114f may resiliently resiliency to a strain of greater than about 1%, eg, greater than about 10%, eg, greater than about 50%, eg, greater than about 100%.
  • a resilient element 114f made of an elastomer formed, for example, can also be deformed more than 100%, for example, more than 150%. The deformation can as
  • Ratio of the change in length (or width change) to the original length (or width) of a stretched or compressed elastic element 114f understood. If the elastic element 114f is stretched / compressed, this can generate a restoring force, which is directed against the stretching / compression. The restoring force (measured at constant strain / compression) can be greater the harder the resilient element 114f is, i. the larger its spring constant.
  • the elastic limit and / or the spring constant of the resilient element 114f may or may not be affected by the material and / or a shape of the resilient element 114f.
  • resilient element 114f may be greater, the greater a modulus of elasticity of the elastic material or the greater a material thickness of the elastic
  • the elastic element 114f may be greater, the greater the hardness, e.g. Shore hardness, of elastic material. For a given
  • the elastic member 114f may be formed.
  • the elastic member 114f may be formed.
  • elastic element 114f is an elastic material with a small elastic modulus (eg smaller than 10 kN / mm 2 , eg smaller than 1 kN / mm 2 , eg smaller than 0.1 kN / mm 2 , eg smaller than 0.05 kN / mm 2) (eg rubber)), for example a plastic such as an elastomer
  • Silicone rubber fluorinated silicone rubber
  • Natural rubber or another suitable (eg soft and / or vacuum-compatible) plastic may comprise silicon.
  • the ⁇ is a ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇
  • spring-elastic element 114f have an elastic material with a high modulus of elasticity (eg greater than 10 kN / mm 2 ), for example a metal such as steel (eg spring steel) or a metal alloy or an intermetallic
  • the resilient element 114f may be a metal spring (e.g., in the form of a cup spring,
  • the resilient element 114f may have a rest position (e.g., a spatial position or spatial orientation) of the first end block assembly 104 relative to the second
  • end block arrangement 106 Define end block arrangement 106. If the first endblock assembly 104 is e.g. deflected from the rest position, by means of the resilient element 114f, a restoring force can be generated, which is directed in the direction of the rest position. In other words, the rest position of the first
  • FIG. 2A illustrates a magnetron assembly 200 according to various embodiments in a schematic
  • the ⁇ is a ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇
  • Magnetron 200 includes a first end block assembly 104 (see Fig.lA) having a first end block 204 and a second end block assembly 106 (see Fig.lA) with a second end block 206. According to various embodiments, the first end block assembly 104 (see Fig.lA) having a first end block 204 and a second end block assembly 106 (see Fig.lA) with a second end block 206. According to various embodiments, the
  • Socket assembly (not shown in Fig. 2A, e.g., Fig. 1A or Fig. 1B) may allow rotational movement of the first end block 204 through an angle 201w, e.g. along a direction 201, wherein the direction 201 may lie in a plane which is e.g. along the axis of rotation of the tube cathode 108, e.g. along direction 101, can run.
  • the rotational movement may allow angular displacement of the axes of rotation of the two end blocks 204, 206 to each other, e.g. an angular offset in the size of the angle 201w.
  • FIG. 2B illustrates a magnetron assembly 250 according to various embodiments in a schematic
  • the ⁇ is a ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇
  • Base assembly (not shown in Fig. 2B, compare for example Fig. 1A or Fig. 1B) to allow movement of the first end block 204 by a distance 203t, e.g. along a direction 203, e.g. transverse to the axis of rotation of the tube cathode 108, e.g. across to direction 101.
  • the movement may allow misalignment of the axes of rotation of the two end block assemblies 104, 106, e.g. one
  • the socket assembly may allow movement of the first end block 204 by the distance 203t, e.g. transverse to direction 203, e.g. along the axis of rotation of the tube cathode 108, e.g. along the direction 101. This may make it possible to compensate for the thermal expansion of the tube cathode by means of the base arrangement.
  • FIGS. 3A and 3B each illustrate one
  • Magnetron arrangement 300 according to various embodiments in a schematic perspective view. According to various embodiments, the
  • the chamber lid 302 may include a lid housing 102g configured to receive components for supplying the tubular cathode 108.
  • a drive to rotate the tube cathode 108 a pump to convey coolant, e.g. Cooling water, a pipe for supplying the required coolant, a surge tank for holding coolant, e.g. Cooling water, a pipe for supplying the required coolant, a surge tank for holding coolant, e.g. Cooling water, a pipe for supplying the required coolant, a surge tank for holding coolant, e.g. Cooling water, a pipe for supplying the required coolant, a surge tank for holding coolant, e.g. Cooling water, a pipe for supplying the required coolant, a surge tank for holding coolant, e.g. Cooling water, a pipe for supplying the required coolant, a surge tank for holding coolant, e.g. Cooling water, a pipe for supplying the required coolant, a surge tank for holding
  • Coolant, electrical supply lines and electrical connections for supplying the tubular cathode 108 may be arranged with electrical energy or similar components.
  • each end block arrangement 104, 106 of the magnetron arrangement 300 can be realized by means of a
  • Socket assembly 314 as described herein may be attached and along three translational
  • Degrees of freedom e.g. along axis X, along axis Y and along axis Z, be deflectable.
  • each one can
  • End block assembly 104, 106 of magnetron assembly 300 along three rotational degrees of freedom, e.g. about axis X, about axis Y and about axis Z, be deflected.
  • Magnetron assembly 300 thus allows for resilient suspension of an end block assembly 104, 106 (e.g., with a media end block) on chamber lid 302 (also referred to as a process lid or magnetron lid) having multiple degrees of freedom, e.g. a total of six degrees of freedom per
  • Endblock arrangement 104, 106 within the limits of the maximum angular deflection and / or maximum linear deflection leaves open, so that all effects of manufacturing tolerances of a tubular cathode 108 (also referred to as target tolerances) by means of the elastic suspension (on the
  • Attachment point can be compensated.
  • the first end block assembly 104 of the end block pair eg, the end block assembly with the media end block
  • the end block assembly 106 fixedly secured to the chamber lid 302 may have a reduced number of degrees of freedom, for example, degrees of freedom of rotation about those axes (eg, axis X and axis Y) transverse to a surface, eg, a plane may be omitted
  • Chamber lid 302 is attached or can be. Does the second attachment assembly 126 (see
  • End block assembly 106 is firmly attached, a
  • Insertion portion (not shown in Fig. 3B, see, for example, Fig. 4), e.g. a so-called centering recess,
  • the socket assembly 414 may include a first socket member 114a that may be secured to the process chamber wall 102 (chamber wall) by the first mounting assembly 124. Further, the pedestal assembly 414 may include a second pedestal member 114b having a second pedestal member 114b
  • Mounting arrangement 424 e.g. several screws or
  • Threaded rods for securing an endblock assembly may be on the second socket member 114b.
  • the first pedestal member 114a and the second pedestal member 114b may be configured to intermesh with play so that the second pedestal member 114a is deflectable relative to the first pedestal member 114b.
  • the first socket member 114a may have a groove 114n and the second socket member 114b may have a projection 114v which may be inserted into the groove 114n.
  • the groove 114n and the projection 114v may be formed such that a gap may remain between the two socket members 114a, 114b when they are nested, which allows the two socket members 114a, 114b to be deflected relative to each other.
  • the socket members 114a, 114b of the socket assembly may be e.g. may be made of a metal, e.g. made of steel or aluminum.
  • the ⁇ is a ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇
  • Process chamber wall 102 having a first insertion portion as part of a through hole 402o, in which a
  • the process chamber wall 102 may include a second plug-in portion in the form of a through-hole (not shown) into which the second end-block assembly 106, e.g. one
  • Plug-in portion of the end block 206 of the second Endblock- arrangement 106 be inserted or can be. According to various embodiments, the first
  • Insertion portion for centering the base assembly 414 may be formed in a predetermined position relative to the process chamber wall 102.
  • the centering collar 114r of the socket assembly 414 can be positively locked in the
  • the second insertion portion for centering the second end block assembly 106 may be formed in a predetermined position relative to the process chamber wall 102.
  • an endblock arrangement e.g. the first end block assembly 104, as shown in Fig. 4, has further socket members 404d, e.g. in the form of a spacer element for adjusting a distance between its end block and the process chamber wall 102, or in the form of an insulating element for thermally and / or electrically insulating the end block of the
  • a spacer can be used, for example, to form an insulating element from a thermally and / or electrically insulating material, e.g. a ceramic or a
  • the further base element 404d can be arranged clearly between the corresponding end block and the base arrangement 414 and / or the process chamber wall 102.
  • the ⁇ is a ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇
  • Socket assembly 414 has a third male portion in the form of a recess 114e in the second socket member 114b into which the first end block assembly 104, e.g. the end block or the further base element 404d, as shown in Figure 4, at least partially, be inserted or can be.
  • the recess 114e may be mated to a protruding portion of the first end block assembly 104, e.g. a base housing or the further base element 404d, be set up.
  • Einsteckabites can specify a position in which the first end block assembly 104 relative to the second
  • Base member 114b may be attached or may be. According to various embodiments, the third
  • Base member 404d as well as for inserting the end block (for example, when no further base member 404d is used) may be formed.
  • FIG. 5 illustrates a socket assembly 514 according to FIG.
  • the ⁇ is a ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇
  • Socket assembly 514 has a resilient member 114f in the form of a plastic plate 514p, e.g. made of an elastomer, e.g. a rubber plate or silicone plate.
  • the plate 514p may have a gap between the first
  • the plate can
  • the ⁇ is a ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇
  • Socket assembly 514 penetrated by a through hole 514d for receiving a supply arrangement.
  • the through hole 514d may be so
  • Socket assembly 514 can be brought into it.
  • supply assembly may be attached to the end block 204 of the first end block assembly 104 and for mounting the first end block assembly 104 in the first end block assembly 104
  • the ⁇ is a ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇
  • Socket assembly 514 has a sealing structure 524d with a
  • Seal eg a vacuum seal, eg one Rubber seal, exhibit.
  • the vacuum seal eg one Rubber seal
  • Sealing structure 524d have a recess in the socket assembly 514 in which the seal can be or be attached.
  • the socket assembly 514 may be mounted on one of
  • Sealing structure for sealing against the process chamber wall 102 or the base assembly 514 have, for. an attached to an end block 204, 206, the base housing or the other base member 404d sealing structure.
  • a base housing and / or a cover housing of an end block assembly 104, 106 may e.g. may be made of a metal, e.g. made of steel or aluminum.
  • FIG. 6 illustrates a cover housing 600 according to FIG.
  • a cover housing 600 may include at least two cover members 602, 604, e.g. a first cover member 602 in the form of a cover and a second cover 604 in the form of a lid.
  • the first cover member 602 and the second cover member 604 may be configured to nest, e.g. such that they are plugged into each other
  • the two cover elements 602, 604 can have corresponding insertion sections in the form of grooves or projections which engage in one another in a nested condition of the two cover elements 602, 604. Further, the two cover members 602, 604 may be formed to form a common through hole 600o.
  • the through hole 600o may be a shaft or a coupling for connecting or attaching the
  • the ⁇ is a ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇
  • a third cover member 606 may be surrounded in the form of a pipe socket or a tube, which makes it possible to cover a part of the shaft or the coupling to which a tube cathode can or can be fastened.
  • the third cover member 606 may according to
  • a cover housing 600 may be a locking element
  • Cover members 602, 604 may be formed with each other.
  • the locking element 600v may be adjustably supported, wherein when adjusting the
  • an end block e.g., its rotary union
  • stray plasma during sputtering, which may otherwise atomize the end block.
  • Sputtering heat is generated, which in a vacuum by means of radiation on adjacent components in the vicinity of the plasma
  • the end block may be at least partially covered by the cover 600 or be.
  • FIG. 7 illustrates a magnetron assembly 700 according to various embodiments in a schematic
  • a shaft 702 may extend into and / or extend into the common via opening for supporting a tube cathode.
  • the shaft may be part of an end block, which by means of Cover housing 600 is covered, wherein the shaft 702 be supported rotatably supported in the base housing of the end block.
  • the shaft 702 may be configured to attach a tube cathode to the shaft 700, as described above.
  • the end block may be secured to a chamber wall 102 by a socket member 714 as described herein.
  • the cover housing 600 may be configured such that it covers at least part of the base element 714 for protecting the base element 714.
  • the base member 714 may be configured to fit under a cover housing 600.
  • the first cover member 602 may have a male portion 702 in the form of a projection, the second one
  • Cover member 604 may have a male portion 704 in the form of a bolt (e.g., a guide pin).
  • the bolt may be designed for insertion under the projection.
  • the first cover 602 a may have a male portion 704 in the form of a bolt (e.g., a guide pin). The bolt may be designed for insertion under the projection.
  • the first cover 602 a may have a male portion 704 in the form of a bolt (e.g., a guide pin).
  • the bolt may be designed for insertion under the projection.
  • Inserting portion in the form of a groove or a groove (not shown) in which the bolt can be inserted or can be. It can thus be made possible that the two cover elements 602, 604 are positively connected to one another in a nested condition.
  • the guide pin and its guide in the first cover member 602 By means of the guide pin and its guide in the first cover member 602, unfolding of the cover housing 600 can be prevented, e.g. when the two cover members 602, 604 are locked together, the guide pin may be fixedly connected to the first cover member 602.
  • Such a cover 600 allows a reduction in the number of parts due to the integration of the tube and / or the
  • the locking element 600v of the cover 600 may be in the form of a locking bolt secured against rotation with one-sided internal thread and screw located therein. To adjust the locking element 600v, the screw in the locking bolt can be rotated.
  • the locking element 600v may be configured such that the screw can be rotated from one or both sides, then one
  • the locking of the cover 600 can be done by means of a positive connection when unscrewing the screw, wherein when unscrewing the screw, a displacement of the locking bolt can be done, which may be limited by a corresponding stop or can be.
  • This can be made possible by means of the locking element 600v a quick and easy installation De ⁇ .
  • the fixing of the cover 600 can be made possible by means of positive gripping the cover 602, 604 to corresponding insulators end block the insulators can be firmly connected to the base housing of the end block.
  • the insulators may for example be in the form of (eg thermally and / or electrically insulating) spacers.
  • Cover housing 600 thermally and / or electrically isolated from the end block to be attached. This can
  • one e.g., the spacers
  • Cover housing 600 should be as small and uniform as possible.
  • insulators between the end block and the cover 600 may be arranged.
  • Such a cover housing 600 can both cover a single end block, as well as for covering two
  • Endblock pairs be formed.
  • the two next to each other arranged end blocks of different Endblockglobe may be part of a so-called Doppelmagnetrons for rotatably supporting two juxtaposed tubular cathodes.
  • the two end block assemblies mounted by the socket assembly 714 can move relative to each other.
  • the two end block assemblies can be at the same electrical potential.
  • the surface may be roughened or be to
  • a metal such as aluminum or a
  • the cover elements 602, 604 inexpensive to manufacture and cost-effective and can, for. compared to steel have a greater heat conduction. This may result in a good thermal behavior of the cover elements 602, 604, since the metal by means of radiation

Abstract

L'invention concerne un ensemble formant magnétron (100, 200, 250, 300, 400, 700) qui peut comporter selon divers modes de réalisation les éléments suivants : une paroi de chambre de processus (102) ; un premier ensemble de bloc d'extrémité (104) et un second ensemble de bloc d'extrémité (106) qui forment une paire de blocs d'extrémité pour supporter à rotation et alimenter une cathode tubulaire (108) ; un ensemble de socle (114, 154, 314, 4, 714) auquel est fixé le premier ensemble de bloc d'extrémité (104) ; la paroi de chambre de processus (102) peut comporter un premier ensemble de fixation (124) destiné à fixer l'ensemble de socle (114, 154, 314, 4114) à la paroi de chambre de processus (102) et un second ensemble de fixation (126) destiné à fixer le second ensemble de bloc d'extrémité (106) à la paroi de chambre de processus (102) ; le premier ensemble de fixation (124) et le second ensemble de fixation (126) permet de définir la position relative du premier ensemble de bloc d'extrémité (104) par rapport au second ensemble de bloc d'extrémité (106) ; et l'ensemble de socle (114, 154, 314, 414, 514, 714) peut être configuré de manière à dévier le premier ensemble de bloc d'extrémité sur au moins deux degrés de liberté par rapport à la paroi de chambre de processus (102).
PCT/EP2015/074226 2014-10-20 2015-10-20 Ensemble formant magnétron WO2016062698A1 (fr)

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DE102014115280.8A DE102014115280B4 (de) 2014-10-20 2014-10-20 Magnetronanordnung
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CN109621652A (zh) * 2018-12-28 2019-04-16 合肥中车轨道交通车辆有限公司 一种高压防护结构

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US5620577A (en) * 1993-12-30 1997-04-15 Viratec Thin Films, Inc. Spring-loaded mount for a rotatable sputtering cathode
WO2006042808A1 (fr) * 2004-10-18 2006-04-27 Bekaert Advanced Coatings Bloc terminal pour dispositif de pulverisation de cible rotative
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WO2006042808A1 (fr) * 2004-10-18 2006-04-27 Bekaert Advanced Coatings Bloc terminal pour dispositif de pulverisation de cible rotative
WO2007147757A1 (fr) * 2006-06-19 2007-12-27 Bekaert Advanced Coatings Pièce insérée pour une entretoise d'une installation de pulvérisation
DE102008033902A1 (de) * 2008-07-18 2010-01-21 Von Ardenne Anlagentechnik Gmbh Endblock für eine Magnetronanordnung mit einem rotierenden Target und Vakuumbeschichtungsanlage

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