WO2016055166A2 - Film de revêtement, structure en couches et procédé de revêtement d'un substrat - Google Patents

Film de revêtement, structure en couches et procédé de revêtement d'un substrat Download PDF

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Publication number
WO2016055166A2
WO2016055166A2 PCT/EP2015/002001 EP2015002001W WO2016055166A2 WO 2016055166 A2 WO2016055166 A2 WO 2016055166A2 EP 2015002001 W EP2015002001 W EP 2015002001W WO 2016055166 A2 WO2016055166 A2 WO 2016055166A2
Authority
WO
WIPO (PCT)
Prior art keywords
coating
substrate
carrier film
coating material
film
Prior art date
Application number
PCT/EP2015/002001
Other languages
German (de)
English (en)
Other versions
WO2016055166A3 (fr
Inventor
Ralph Domnick
Original Assignee
Ralph Domnick
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ralph Domnick filed Critical Ralph Domnick
Publication of WO2016055166A2 publication Critical patent/WO2016055166A2/fr
Publication of WO2016055166A3 publication Critical patent/WO2016055166A3/fr

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0015—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterized by the colour of the layer
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation

Definitions

  • the invention relates to a method for coating a substrate, in which a coating material is transferred by laser irradiation from a carrier to the substrate.
  • the invention relates to a coating film suitable for carrying out the method and to a layer structure produced according to the method.
  • DE 102 37 732 B4 discloses a laser beam marking method in which a marking material is first applied to one side of a carrier substrate.
  • the array of carrier substrate and target substrate is then processed with a transfer / conversion laser beam such that the marking material is transferred and bonded to the target substrate from the carrier substrate, the marker material being received in recesses of the carrier substrate such that transfer occurs in a preferred direction ,
  • At least one pigment-containing layer which may be in the form of a plastic film is brought into contact with a substrate to be printed surface in order then to be transferred for example by means' of a Nd-YAG laser, excimer laser or a nitrogen laser pigments to the substrate surface.
  • the substrate may be a glass or plastic article.
  • pigments DE 195 17 625 A1 mentions carbon, metal compounds and metals.
  • CONFIRMATION COPY US 6,177,151 Bl discloses a method for direct laser-based labeling, which in addition to the transfer of metals to a substrate and the order of numerous other materials, such as materials
  • Workpieces to be marked may consist of metal, plastic, ceramics, glass or glass ceramics.
  • DE 101 52 073 AI describes a laser transfer film, which is intended for permanent labeling of components.
  • carrier material for example, a PVC film or PET film is used.
  • a colored laser marking is for example from the
  • the layer system used for plastic parts is made up of two superimposed layers, wherein the first layer contains an energy absorber and the second layer serves as a labeling medium.
  • the invention is based on the object, a laser transfer method, that is working with a carrier medium method for laser-based labeling or other structured coating of workpieces, compared to the cited prior art, especially in terms of ease of use, variety of applications, as well as reliable, precise Reproducibility of the parameters of the coating produced by the process.
  • This object is achieved by a method for coating a substrate according to claim 1. Further, the object is achieved by a suitable for use in the process coating film according to claim 12. Furthermore, the object is achieved by a layer structure according to claim
  • a carrier film made of PET polyethylene terephthalate
  • a coating material is deposited by means of physical vapor deposition, ie PVD (physical vapor deposition) coating.
  • the carrier film coating can be formed either by the coating material alone or by the coating material in combination with at least one further component.
  • the coated carrier film is brought into areal contact with a substrate to be coated. Subsequently, from a partial surface of the carrier foil by laser irradiation, in particular irradiation with a pulsed laser,
  • the laser beam can strike the coating material applied to the carrier film punctiform, linear or flat. After the transfer caused by the laser irradiation and, if appropriate, conversion of the coating material, the carrier foil with the non-transferred coating material still thereon is removed from the substrate, whereby the layer structure is completed.
  • a post-processing of the layer structure is usually not provided, but in principle - for example, by applying another layer - possible.
  • the coating can be applied to a variety of materials such as glass, metals, textiles, ceramics or plastic. As coating materials are all
  • Suitable materials that can be deposited by the PVD process are a variety of known coating materials available, which are selectable on the basis of their electrical, optical and mechanical properties and chemical resistance.
  • metallic coating materials are exemplified iron, gold, silver and titanium.
  • semiconductors and ceramic materials are usable as a coating material.
  • an SiO x N y -coating deposited in the PVD method that is to say a SiO x N y -PVD layer, is suitable as material with which the carrier foil is coated.
  • DE 10 2009 033 511 A1 which discloses silicon-oxide-nitrides as components of a micromirror arrangement
  • DE 10 2010 013 038 A1 which describes SiO x N y as a barrier layer for a photovoltaic cell
  • SiOxNy PVD layer forms a corrosion protection layer on the product.
  • the corrosion protection is thermally activated during the transfer of the material to the substrate by the SiO x N y layer irreversibly dissolves by heating by laser to typically several hundred degrees Celsius, and thus a sealed
  • the coating which can be produced from various materials can be applied to the substrate in the form of a label, a decoration or-in the case of metallic coating materials-in the form of printed conductors.
  • the layer thickness is preferably minimized to such an extent that the desired effect just barely occurs.
  • the thickness of the coating material on the coating film can be less than 100 nm.
  • Various color effects can be generated in a rational manner by varying the parameters of the laser irradiation during the production of the coating in a single operation.
  • the carrier film coating is constructed in three layers.
  • an intermediate layer (“Laser Release"), on which the coating material is deposited, is located directly on the carrier film
  • the sum of the thickness of the intermediate layer and the thickness of the cover layer is preferably not greater than the thickness of the cover layer ("laser adhesive") provided for direct contacting of the substrate
  • Coating material for example, at most half as large as the thickness of the coating material.
  • the carrier foil coating is formed by two metal layers, wherein one layer is the main coating component and the other layer is an auxiliary component.
  • the auxiliary component is located between the carrier film and the main coating component and has a substantially lower thickness than the main coating component, for example less than one quarter of the thickness of the main coating component.
  • the main coating component is gold and the auxiliary component is tin.
  • the gold is preferably present in a thickness of at least 30 nm and at most 300 nm and the tin in a thickness of at least 2 nm and at most 80 nm.
  • the entire carrier film coating is formed exclusively by a single metallic component.
  • This may in particular be a titanium layer.
  • a part of the titanium can be deliberately oxidized, resulting in different color effects depending on the parameters set.
  • Titanium layer has to produce part surfaces of a substrate to be coated in different colors. In this case, sharp transitions between the different colored partial surfaces can be produced.
  • Protective layer is formed on the substrate.
  • the coating is thus not only resistant to corrosion itself, but also represents a protective coating against corrosion on the product.
  • the gentle melting even at low energies is favored by a high nanoporosity of the coating material located on the substrate.
  • a carrier film is preferably used, to which different materials are applied, which differ from each other in terms of their porosity:
  • a PVD layer for example of tin
  • another material for example gold, with less or virtually no porosity and a smaller layer thickness is sputtered or vapor-deposited onto this layer.
  • Carrier film on the substrate is achievable by one and the same point of the substrate several times with material
  • Substrate is performed several times in succession, in temporally separate steps. This is possible in two different ways: Either the Carrier film between the laser irradiations shifted on the surface of the substrate, so that at each
  • Irradiation material is removed from another surface portion of the carrier sheet, or the local relation between the carrier sheet and substrate remains during the
  • Substrate be coated one or more times, the material transfer from the carrier film to the substrate in a significantly wide interval of possible distances between the carrier film and substrate feasible. In this case, for example, a distance between substrate and carrier film of up to 0.2 mm or even up to 0.4 mm are present. If known, in which areas the surface of the carrier film
  • Substrate is deepened, for example, only the
  • recessed areas, only the surrounding areas or all areas of the substrate are coated by transferred from the carrier film material.
  • the material undergoes a chemical change in this way, it can be used to generate targeted color effects. For example, it comes during the material transfer to a dependent on the path length oxidation of the material.
  • the different degree of oxidation perceptible to the finished product with the naked eye corresponds to the position of the depressions on the substrate surface. This is especially true in cases where titanium is transferred from the carrier sheet to the substrate. With titanium as coating material, therefore, even without variation of the parameters of the laser irradiation are closed layers
  • Substrate are recognizable, generated by the aforementioned variation of parameters of the laser irradiation.
  • FIGS. 1 and 2 show an example of a laser-assisted application of a coating material to a substrate using a three-layer coated carrier film
  • FIGS. 3 and 4 in illustrations analogous to FIGS. 1 and 2
  • Components namely gold and tin, formed carrier film coating.
  • a laser emitter 1 serves to transfer a coating material from a carrier film 3 made of PET (polyethylene terephthalate), that is, a polyester film, to a substrate 4
  • a carrier film 3 made of PET (polyethylene terephthalate), that is, a polyester film
  • Substrate 4 in all exemplary embodiments is in each case a workpiece made of a non-metallic material
  • the carrier film 3 is transparent and has a thickness of 75 m.
  • the coating material 2 together with further components (FIG. 1, FIG. 3) or alone (FIG. 2) forms a carrier film coating denoted by 5.
  • the coating material 2 is deposited as a PVD layer on the carrier film 3.
  • the coating material 2 can be applied to the substrate 4 by sputtering or vapor deposition.
  • the carrier film coating 5 is therefore very uniform and can be produced with high material quality.
  • the carrier film coating 5 is constructed in three layers: The coating material 2 is separated from the carrier film 3 by an intermediate layer 6, which contributes significantly to easy detachability of the carrier film 3 from the coating material 2 after the end of the laser irradiation. That on the
  • Carrier film 3 located coating material 2 is covered by a cover layer 7, which forms a surface of the total designated 8 coating film and acts as a primer.
  • the intermediate layer 6 and the cover layer 7 are each only a few nm thick. Overall, the thickness of the carrier film coating 5 is between 80 nm and 300 nm. This is an opaque, that is opaque coating. Thinner, semi-transparent layers can likewise be transferred to the substrate 4.
  • Arrangement of coating film 8 and substrate 4 processed by means of a dashed line in Fig. 1 symbolized laser beam.
  • the laser beam almost completely penetrates the transparent carrier film 3 and heats the coating material 2, which thereby acts on the substrate 4 is transmitted and firmly connects with this.
  • Coating film 8 is transferred to the substrate, this may be subjected to an at least partial chemical conversion and in particular with components of the
  • FIGS. 3 and 4 illustrate two different embodiments, which differ from one another with regard to the materials used, but not with regard to the cross-sectional configurations which can be seen in the figures.
  • Carrier film coating 5 exclusively of titanium as
  • Coating material 2 is formed.
  • the laser irradiation transforms a part of the titanium into titanium oxide, which in a targeted way produces different color effects on the titanium dioxide
  • Substrate 4 can be achieved.
  • the carrier film coating 5 is 250 nm thick and is in the PVD method with the following
  • Titanium target power 2 x 2000
  • the carrier film coating 5 can be produced, for example, using a CC800 / 9 sputtering system from CemeCon AG, D-52146 Würselen. The transfer of the coating material 2 of the
  • Coating foil 8 onto the substrate 4 takes place with the aid of an Nd-YAG laser of the type PowerLine E R-10 from Rofin-Sinar, Madison, MI 48170, USA, with the following settings:
  • the variation of the overlap generates different colors of the coating material 2 on the substrate 4, namely glass.
  • interference effects play a role.
  • An intermediate layer 6 or a cover layer 7 are in
  • Embodiment according to FIGS. 3 and 4 is not required, since the coating material 2, namely titanium, takes over the function of these layers. In the same way as on
  • Glass can titanium as a coating material 2 with adjustable color, depending on the thickness opaque or in any fine gradations more or less translucent, even on steel, ceramic, plastic, porcelain and textiles, both of synthetic fibers and natural fibers applied.
  • the surface of the substrate 4 structures for example in the form of depressions, have, which have an influence on the coating color.
  • the carrier film coating 5 is formed by a gold-tin alloy as the coating material 2.
  • the proportion of gold is greater than the proportion to tin in the coating material 2.
  • the forming on the substrate gold-tin layer has a golden color and is very adhesive.
  • the carrier film coating 5 is purely metallic in the embodiment of FIGS.
  • FIGS. 5 and 6 it is not constructed as a single layer, but as a two-layer, namely, a main coating component 9 and an auxiliary component 10.
  • the auxiliary component 10 separates the main coating component 9 from the carrier film 3.
  • the auxiliary component 10 is in the form of a tin layer with a thickness of 2 to 80 nm.
  • the main coating component 9 is a
  • Components 9, 10 of the carrier film coating 5 are sputtered onto the carrier film 3.
  • the main coating component 9 is detached from the carrier film 3, almost simultaneously a portion of the tin forming the auxiliary component 10 reaching the interface between the main coating component 9 and the substrate 4, namely an article made of glass.
  • tin used is in a purity of more than 98%, the gold also used for sputtering in a purity of at least 99.99% before.
  • the chamber pressure during coating is about 700 mPa.
  • the auxiliary component 10 (tin) deposited on the carrier film by the PVD method has a thickness of 50 nm, and the main coating component 9 (gold) has a thickness of 200 nm.
  • the coating material 2 has a uniform coloring on the substrate 4.

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  • Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Toxicology (AREA)
  • Health & Medical Sciences (AREA)
  • Laminated Bodies (AREA)
  • Physical Vapour Deposition (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Laser Beam Processing (AREA)

Abstract

L'invention concerne un substrat (4), consistant en particulier en un matériau non métallique, qui est muni d'un revêtement de la manière suivante : un matériau de revêtement (2) est déposé par dépôt physique en phase vapeur sur un film support (3) en polyéthylène téréphtalate; le film support (3) muni du matériau de revêtement (2) est mis en contact avec un substrat (4) à recouvrir; le matériau de revêtement (2) est partiellement transféré du film support (3) au substrat (4) par rayonnement laser; le film support (3) est éliminé du substrat (4) conjointement avec le matériau de revêtement (2) non transféré.
PCT/EP2015/002001 2014-10-10 2015-10-09 Film de revêtement, structure en couches et procédé de revêtement d'un substrat WO2016055166A2 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102014015119.0 2014-10-10
DE102014015119.0A DE102014015119B4 (de) 2014-10-10 2014-10-10 Beschichtungsfolie, Schichtaufbau, sowie Verfahren zum Beschichten eines Substrats

Publications (2)

Publication Number Publication Date
WO2016055166A2 true WO2016055166A2 (fr) 2016-04-14
WO2016055166A3 WO2016055166A3 (fr) 2016-06-09

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PCT/EP2015/002001 WO2016055166A2 (fr) 2014-10-10 2015-10-09 Film de revêtement, structure en couches et procédé de revêtement d'un substrat

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DE (1) DE102014015119B4 (fr)
WO (1) WO2016055166A2 (fr)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102020135064A1 (de) 2020-12-29 2022-06-30 Ara-Coatings GmbH & Co. KG Beschichtung und Verfahren zum Beschichten eines Substrats
DE102020135061A1 (de) 2020-12-29 2022-06-30 Ralph Domnick Beschichtungsverfahren und Silizium enthaltende Beschichtung
CN115890008A (zh) * 2023-02-21 2023-04-04 苏州智慧谷激光智能装备有限公司 玻璃激光打白码方法

Citations (8)

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Publication number Priority date Publication date Assignee Title
DE19517625A1 (de) 1995-05-13 1996-11-14 Budenheim Rud A Oetker Chemie Verfahren zum musterförmigen Bedrucken fester Substratoberflächen
WO1999016625A1 (fr) 1997-09-08 1999-04-08 Thermark, Llc Procede de marquage par laser
US6177151B1 (en) 1999-01-27 2001-01-23 The United States Of America As Represented By The Secretary Of The Navy Matrix assisted pulsed laser evaporation direct write
DE10152073A1 (de) 2001-10-25 2003-05-08 Tesa Ag Laser-Transferfolie zum dauerhaften Beschriften von Bauteilen
DE10237732B4 (de) 2002-08-17 2004-08-26 BLZ Bayerisches Laserzentrum Gemeinnützige Forschungsgesellschaft mbH Laserstrahlmarkierungsverfahren sowie Markierungsvorrichtung zur Laserstrahlmarkierung eines Zielsubstrats
DE102004053376A1 (de) 2003-11-10 2005-06-09 Merck Patent Gmbh Farbige Lasermarkierung
DE102009033511A1 (de) 2009-07-15 2011-01-20 Carl Zeiss Smt Ag Mikrospiegelanordnung mit Anti-Reflexbeschichtung sowie Verfahren zu deren Herstellung
DE102010013038A1 (de) 2010-03-26 2011-09-29 Sunfilm Ag Verfahren zum Bearbeiten eines Substrats für mindestens eine Fotovoltaikzelle sowie Anordnung umfassend ein solches Substrat und Fotovoltaikzelle

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DE4430390C2 (de) * 1993-09-09 1995-08-10 Krone Ag Verfahren zur Herstellung von strukturierten Metallisierungen auf Oberflächen
US7014885B1 (en) 1999-07-19 2006-03-21 The United States Of America As Represented By The Secretary Of The Navy Direct-write laser transfer and processing
JP2002222694A (ja) 2001-01-25 2002-08-09 Sharp Corp レーザー加工装置及びそれを用いた有機エレクトロルミネッセンス表示パネル
JP2003249351A (ja) * 2002-02-22 2003-09-05 Sharp Corp 有機ｌｅｄ素子の製造方法
DE102005026038A1 (de) 2005-06-03 2006-12-07 Boraglas Gmbh Verfahren zur Markierung von Objektoberflächen

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19517625A1 (de) 1995-05-13 1996-11-14 Budenheim Rud A Oetker Chemie Verfahren zum musterförmigen Bedrucken fester Substratoberflächen
WO1999016625A1 (fr) 1997-09-08 1999-04-08 Thermark, Llc Procede de marquage par laser
US6177151B1 (en) 1999-01-27 2001-01-23 The United States Of America As Represented By The Secretary Of The Navy Matrix assisted pulsed laser evaporation direct write
DE10152073A1 (de) 2001-10-25 2003-05-08 Tesa Ag Laser-Transferfolie zum dauerhaften Beschriften von Bauteilen
DE10237732B4 (de) 2002-08-17 2004-08-26 BLZ Bayerisches Laserzentrum Gemeinnützige Forschungsgesellschaft mbH Laserstrahlmarkierungsverfahren sowie Markierungsvorrichtung zur Laserstrahlmarkierung eines Zielsubstrats
DE102004053376A1 (de) 2003-11-10 2005-06-09 Merck Patent Gmbh Farbige Lasermarkierung
DE102009033511A1 (de) 2009-07-15 2011-01-20 Carl Zeiss Smt Ag Mikrospiegelanordnung mit Anti-Reflexbeschichtung sowie Verfahren zu deren Herstellung
DE102010013038A1 (de) 2010-03-26 2011-09-29 Sunfilm Ag Verfahren zum Bearbeiten eines Substrats für mindestens eine Fotovoltaikzelle sowie Anordnung umfassend ein solches Substrat und Fotovoltaikzelle

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102020135064A1 (de) 2020-12-29 2022-06-30 Ara-Coatings GmbH & Co. KG Beschichtung und Verfahren zum Beschichten eines Substrats
DE102020135061A1 (de) 2020-12-29 2022-06-30 Ralph Domnick Beschichtungsverfahren und Silizium enthaltende Beschichtung
WO2022144315A1 (fr) 2020-12-29 2022-07-07 Ralph Domnick Procédé de revêtement et revêtement contenant du silicium
WO2022144299A1 (fr) 2020-12-29 2022-07-07 Ara-Coatings GmbH & Co. KG Revêtement et procédé de revêtement d'un substrat
DE102020135064B4 (de) 2020-12-29 2022-12-22 Ara-Coatings GmbH & Co. KG Beschichtung und Verfahren zum Beschichten eines Substrats
CN115890008A (zh) * 2023-02-21 2023-04-04 苏州智慧谷激光智能装备有限公司 玻璃激光打白码方法

Also Published As

Publication number Publication date
WO2016055166A3 (fr) 2016-06-09
DE102014015119B4 (de) 2024-07-25
DE102014015119A1 (de) 2016-04-14

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